JPH0554622B2 - - Google Patents
Info
- Publication number
- JPH0554622B2 JPH0554622B2 JP18102584A JP18102584A JPH0554622B2 JP H0554622 B2 JPH0554622 B2 JP H0554622B2 JP 18102584 A JP18102584 A JP 18102584A JP 18102584 A JP18102584 A JP 18102584A JP H0554622 B2 JPH0554622 B2 JP H0554622B2
- Authority
- JP
- Japan
- Prior art keywords
- illumination
- inspected
- image
- binarization
- defects
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 230000007547 defect Effects 0.000 claims description 56
- 238000005286 illumination Methods 0.000 claims description 55
- 239000008188 pellet Substances 0.000 claims description 47
- 239000004065 semiconductor Substances 0.000 claims description 42
- 238000003384 imaging method Methods 0.000 claims description 19
- 238000007689 inspection Methods 0.000 claims description 19
- 238000000034 method Methods 0.000 description 11
- 238000001514 detection method Methods 0.000 description 6
- 238000011179 visual inspection Methods 0.000 description 5
- 230000000007 visual effect Effects 0.000 description 4
- 230000006870 function Effects 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 2
- 230000002950 deficient Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000005336 cracking Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000007717 exclusion Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000003909 pattern recognition Methods 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/9501—Semiconductor wafers
Landscapes
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Closed-Circuit Television Systems (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18102584A JPS6157837A (ja) | 1984-08-30 | 1984-08-30 | 外観検査装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18102584A JPS6157837A (ja) | 1984-08-30 | 1984-08-30 | 外観検査装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6157837A JPS6157837A (ja) | 1986-03-24 |
| JPH0554622B2 true JPH0554622B2 (ko) | 1993-08-13 |
Family
ID=16093445
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP18102584A Granted JPS6157837A (ja) | 1984-08-30 | 1984-08-30 | 外観検査装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6157837A (ko) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0541551Y2 (ko) * | 1987-02-16 | 1993-10-20 | ||
| JP2801916B2 (ja) * | 1988-09-29 | 1998-09-21 | 大日本印刷株式会社 | 欠陥検査装置 |
| JPH04297886A (ja) * | 1991-03-05 | 1992-10-21 | Mitsubishi Electric Corp | レーザ測距装置 |
| JP3189500B2 (ja) * | 1993-06-25 | 2001-07-16 | 松下電器産業株式会社 | 電子部品の外観検査装置および外観検査方法 |
| JP5022793B2 (ja) * | 2007-07-02 | 2012-09-12 | 日東電工株式会社 | 半導体ウエハの欠陥位置検出方法 |
| CN104458763A (zh) * | 2014-12-12 | 2015-03-25 | 元亮科技有限公司 | 广视野表面缺陷检测装置 |
| JP7102271B2 (ja) * | 2018-07-17 | 2022-07-19 | ファスフォードテクノロジ株式会社 | 半導体製造装置および半導体装置の製造方法 |
| CN110208286B (zh) * | 2019-06-21 | 2020-08-28 | 上海精测半导体技术有限公司 | 一种检测设备 |
-
1984
- 1984-08-30 JP JP18102584A patent/JPS6157837A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6157837A (ja) | 1986-03-24 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |