JPH0552762U - Acceleration sensor - Google Patents
Acceleration sensorInfo
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- JPH0552762U JPH0552762U JP11001091U JP11001091U JPH0552762U JP H0552762 U JPH0552762 U JP H0552762U JP 11001091 U JP11001091 U JP 11001091U JP 11001091 U JP11001091 U JP 11001091U JP H0552762 U JPH0552762 U JP H0552762U
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- insulating film
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Abstract
(57)【要約】
【目的】 静電容量型加速度センサにおいて、マス部が
静止電極に接触して静電吸着することを防止する。
【構成】 枠型をしたフレーム１の中央にマス部２が配
設されており、マス部２は４本のビーム３によって両持
ち状にフレーム１に支持されている。マス部２は、ビー
ム３の変形によって図中Ｘ方向に自由に微小変位可能と
なっている。フレーム１の上面及び下面には絶縁性のカ
バー４，５が接着されている。上面側のカバー４の内面
には静止電極６が形成されており、静止電極６は所定の
膜厚の絶縁膜７により被覆されている。
(57) [Abstract] [Purpose] In a capacitance type acceleration sensor, to prevent the mass portion from contacting a stationary electrode and electrostatically adsorbing. [Structure] A mass portion 2 is disposed at the center of a frame-shaped frame 1, and the mass portion 2 is supported by the frame 1 in a cantilevered manner by four beams 3. The mass 2 can be freely displaced in the X direction in the figure by the deformation of the beam 3. Insulating covers 4 and 5 are adhered to the upper and lower surfaces of the frame 1. A stationary electrode 6 is formed on the inner surface of the cover 4 on the upper surface side, and the stationary electrode 6 is covered with an insulating film 7 having a predetermined film thickness.
Description
【０００１】[0001]
本考案は加速度センサに関する。具体的には、加速度ないし振動によって生じ るマス部の変位を電極間の静電容量の変化として検出する加速度センサに関する 。 The present invention relates to an acceleration sensor. Specifically, the present invention relates to an acceleration sensor that detects displacement of a mass portion caused by acceleration or vibration as a change in capacitance between electrodes.
【０００２】[0002]
図６は従来の静電容量型の加速度センサ２０を示す断面図である。この加速度 センサ２０にあっては、角枠状をしたフレーム２１内の中央にブロック状のマス 部２２が配設されており、マス部２２は４本の平行な薄いビーム２３によってフ レーム２１に両持ち状に支持されている。従って、マス部２２は、ビーム２３の 弾性変形によってマス部２２の厚さ方向（図６中のＸ方向）に微小変位できる。 FIG. 6 is a sectional view showing a conventional capacitance type acceleration sensor 20. In this acceleration sensor 20, a block-shaped mass portion 22 is arranged in the center of a frame 21 having a square frame shape, and the mass portion 22 is formed into a frame 21 by four parallel thin beams 23. It is supported in a two-sided manner. Therefore, the mass portion 22 can be slightly displaced in the thickness direction of the mass portion 22 (X direction in FIG. 6) by elastic deformation of the beam 23.
【０００３】 また、フレーム２１の上面及び下面にはカバー２４，２５が重ねられており、 カバー２４，２５の周辺部を接着剤等によってフレーム２１に接着されている。 上面側のカバー２４の内面には静止電極２６が設けられており、この静止電極２ ６とマス部２２の電極面２２ａによりコンデンサが形成されている。Further, covers 24 and 25 are superposed on the upper surface and the lower surface of the frame 21, and the peripheral portions of the covers 24 and 25 are bonded to the frame 21 with an adhesive or the like. The stationary electrode 26 is provided on the inner surface of the cover 24 on the upper surface side, and the stationary electrode 26 and the electrode surface 22a of the mass portion 22 form a capacitor.
【０００４】 しかして、ビーム２３に支持されたマス部２２が加速度を受けてＸ方向に変位 した場合、マス部２２の変位量に応じてマス部２２の電極面２２ａと静止電極２ ６の間のギャップ量が変化して当該コンデンサの静電容量が変わる。この静電容 量の変化は電圧の変化に変換され、電圧の変化から加速度が検出される。When the mass portion 22 supported by the beam 23 is displaced in the X direction due to acceleration, the gap between the electrode surface 22 a of the mass portion 22 and the stationary electrode 26 is changed according to the displacement amount of the mass portion 22. Changes the amount of gap and changes the capacitance of the capacitor. This change in electrostatic capacity is converted into a change in voltage, and the acceleration is detected from the change in voltage.
【０００５】[0005]
このような加速度センサ２０にあっては、静電容量の変化を電圧の変化に変換 して出力させるため、マス部２２の電極面２２ａと静止電極２６との間に直流電 圧が印加されている。このため、マス部２２の電極面２２ａと静止電極２６の間 には静電吸引力が発生しており、加速度によりマス部２２が大きく変位し、マス 部２２の電極面２２ａと静止電極２６が近づき過ぎると、マス部２２に作用する 静電吸引力がマス部２２を弾性的に復帰させようとするビーム２３の弾性力より も大きくなり、マス部２２が静止電極２６に静電吸着し、加速度が測定不能にな るという問題があった。 In the acceleration sensor 20 as described above, a DC voltage is applied between the electrode surface 22a of the mass portion 22 and the stationary electrode 26 in order to convert a change in capacitance into a change in voltage for output. .. Therefore, an electrostatic attraction force is generated between the electrode surface 22a of the mass portion 22 and the stationary electrode 26, the mass portion 22 is largely displaced by acceleration, and the electrode surface 22a of the mass portion 22 and the stationary electrode 26 are separated from each other. If it gets too close, the electrostatic attraction force acting on the mass portion 22 becomes larger than the elastic force of the beam 23 that tries to elastically restore the mass portion 22, and the mass portion 22 electrostatically adsorbs to the stationary electrode 26, There was a problem that the acceleration could not be measured.
【０００６】 しかも、こうしてマス部２２が静止電極２６に静電吸着した場合には、一度加 速度センサ２０の電源を切るなどしてマス部２２を静止電極２６から離さないと 、再び加速度センサを動作させることができなかった。Further, when the mass portion 22 is electrostatically attracted to the stationary electrode 26 in this way, the mass sensor 22 is not separated from the stationary electrode 26 by once turning off the power supply of the acceleration sensor 20 or the like, and then the acceleration sensor is again operated. I couldn't get it to work.
【０００７】 本考案は叙上の従来例の欠点に鑑みてなされたものであり、その目的とすると ころは、静電容量型の加速度センサにおいてマス部が静止電極に静電吸着して動 作不能になることを防止することにある。The present invention has been made in view of the drawbacks of the above-described conventional examples. The purpose of the present invention is to operate an electrostatic capacitance type acceleration sensor in which a mass portion is electrostatically attracted to a stationary electrode. It is to prevent being disabled.
【０００８】[0008]
本考案による加速度センサは、弾性を有するビームにより支持体にマス部を揺 動自在に支持させ、当該マス部の電極面に対向させて静止電極を設け、当該マス 部の電極面と当該静止電極のうち少なくとも一方の上に所定の厚み以上の絶縁膜 を配設したことを特徴としている。 In the acceleration sensor according to the present invention, a mass part is swingably supported by a support by an elastic beam, and a stationary electrode is provided so as to face the electrode surface of the mass part. The electrode surface of the mass part and the stationary electrode are provided. It is characterized in that an insulating film having a predetermined thickness or more is provided on at least one of them.
【０００９】 また、上記絶縁膜には、パターンを施してもよい。Further, the insulating film may be patterned.
【００１０】[0010]
本考案にあっては、マス部の電極面と静止電極のうち少なくとも一方に所定厚 み以上の絶縁膜を形成しているので、マス部の電極面と静止電極とは当該絶縁膜 の厚み以上に接近できない。従って、絶縁膜の所定厚みをマス部の電極面と静止 電極が静電吸着する間隔よりも大きく設定しておけば、マス部が大きく変位して 静止電極に接近してもマス部の電極面と静止電極とが静電吸着する恐れがない。 In the present invention, since the insulating film having a predetermined thickness or more is formed on at least one of the electrode surface of the mass portion and the stationary electrode, the electrode surface of the mass portion and the stationary electrode are not less than the thickness of the insulating film. Can't approach. Therefore, if the predetermined thickness of the insulating film is set larger than the distance at which the electrode surface of the mass part and the static electrode are electrostatically attracted, even if the mass part is largely displaced and approaches the static electrode, the electrode surface of the mass part There is no risk of electrostatic adsorption between the stationary electrode and the stationary electrode.
【００１１】 しかも、マス部と静止電極とは絶縁膜によって隔てられているので、たとえ静 止電極の上に形成された絶縁膜にマス部が衝突したり、あるいは、マス部の上に 形成された絶縁膜が静止電極に衝突したりしても、マス部と静止電極とが短絡す ることがなく、マス部と静止電極が接触して回路等に短絡電流が流れるのを防止 でき、回路等を保護させることができる。Moreover, since the mass portion and the stationary electrode are separated by the insulating film, the mass portion collides with the insulating film formed on the stationary electrode, or is formed on the mass portion. Even if the insulating film collides with the stationary electrode, the mass portion and the stationary electrode are not short-circuited, and it is possible to prevent a short-circuit current from flowing to the circuit due to the contact between the mass portion and the stationary electrode. Etc. can be protected.
【００１２】 また、絶縁膜をパターン化してあると、マス部が静止電極側へ接近するときに マス部と静止電極の間の空気の流れが悪くなり、マス部の空気抵抗が大きくなる ので、マス部が大きな変位速度で静止電極に接近してもマス部の変位速度が減衰 させられ、マス部と静止電極との衝突を防止することができる。Further, if the insulating film is patterned, the air flow between the mass portion and the stationary electrode becomes poor when the mass portion approaches the stationary electrode side, and the air resistance of the mass portion becomes large. Even if the mass portion approaches the stationary electrode at a large displacement speed, the displacement speed of the mass portion is attenuated, and the collision between the mass portion and the stationary electrode can be prevented.
【００１３】[0013]
図１及び図２は本考案の一実施例による加速度センサ１０を示す断面図及び一 部破断した斜視図である。角枠状をしたフレーム１の中央に配設されたマス部２ は、４本のビーム３によってフレーム１に両持ち状に支持されており、マス部２ はビーム３の弾性変形によって厚さ方向（図中のＸ方向）に自由に微小変位でき る。なお、このフレーム１、マス部２及びビーム３は、シリコンウエハを半導体 製造プロセスにより加工して一体に形成されており、全体が導電性を有している 。 1 and 2 are a sectional view and a partially broken perspective view showing an acceleration sensor 10 according to an embodiment of the present invention. The mass portion 2 disposed in the center of the rectangular frame-shaped frame 1 is supported by the frame 1 in a cantilevered manner by the four beams 3, and the mass portion 2 is elastically deformed by the beam 3 in the thickness direction. A small displacement can be freely performed (X direction in the figure). The frame 1, the mass 2 and the beam 3 are integrally formed by processing a silicon wafer by a semiconductor manufacturing process, and are entirely conductive.
【００１４】 また、フレーム１の上面及び下面にはパイレックスガラス製のカバー４，５が 重ねられ、カバー４，５の周辺部は接着剤等によってフレーム１に接着されてい る。この上面側のカバー４を内面側から見た斜視図を図３に示す。このカバー４ の内面側には金属製の静止電極６が設けられており、静止電極６は絶縁膜７によ り覆われている。この絶縁膜７は、例えば真空蒸着法等の薄膜技術によって形成 してもよく、スクリーン印刷等の厚膜技術によって形成してもよい。Further, covers 4 and 5 made of Pyrex glass are superposed on the upper surface and the lower surface of the frame 1, and peripheral portions of the covers 4 and 5 are bonded to the frame 1 with an adhesive or the like. FIG. 3 shows a perspective view of the cover 4 on the upper surface side as seen from the inner surface side. A stationary electrode 6 made of metal is provided on the inner surface side of the cover 4, and the stationary electrode 6 is covered with an insulating film 7. The insulating film 7 may be formed by a thin film technique such as a vacuum deposition method or a thick film technique such as screen printing.
【００１５】 しかして、カバー４の静止電極６とこの静止電極６に対向しているマス部２の 電極面２ａとによって加速度検出用のコンデンサが形成されている。加速度セン サ１０が加速度を感じると、慣性力とビーム３の弾性力のためにマス部２が加速 度に比例した変位量だけ変位し、静止電極６とマス部２の間の距離が変化し、当 該コンデンサの静電容量が変化する。よって、静電容量検出回路により、ビーム ３及びフレーム１を通してマス部２と静止電極６との間に電圧を印加しておき、 電極面２ａと静止電極６の間の静電容量の変化を電圧変化に変換して加速度を検 出する。Thus, the stationary electrode 6 of the cover 4 and the electrode surface 2a of the mass portion 2 facing the stationary electrode 6 form a capacitor for acceleration detection. When the acceleration sensor 10 senses acceleration, the mass portion 2 is displaced by a displacement amount proportional to the acceleration due to the inertial force and the elastic force of the beam 3, and the distance between the stationary electrode 6 and the mass portion 2 changes. The capacitance of the capacitor changes. Therefore, a voltage is applied between the mass portion 2 and the stationary electrode 6 through the beam 3 and the frame 1 by the electrostatic capacity detection circuit, and a change in the electrostatic capacity between the electrode surface 2a and the stationary electrode 6 is detected by the voltage. Convert to change and detect acceleration.
【００１６】 また、静止電極６の表面は絶縁膜７によって覆われているから、マス部２の電 極面２ａと静止電極６とは絶縁膜７の膜厚以上には接近することができない。従 って、絶縁膜７の膜厚を適当に選択すれば、マス部２と静止電極６との静電吸着 を防止することができる。Moreover, since the surface of the stationary electrode 6 is covered with the insulating film 7, the electrode surface 2 a of the mass portion 2 and the stationary electrode 6 cannot be closer than the thickness of the insulating film 7. Therefore, if the film thickness of the insulating film 7 is appropriately selected, electrostatic attraction between the mass portion 2 and the stationary electrode 6 can be prevented.
【００１７】 そこで、マス部２と静止電極６の静電吸着を防止できる絶縁膜７の膜厚につい て考える。図４の説明図においては、マス部２と静止電極６は距離ｓを隔てて配 置されており、マス部２の電極面２ａと静止電極６との間には静電容量検出回路 ８によって電圧Ｖを印加されている。Therefore, the thickness of the insulating film 7 that can prevent electrostatic attraction between the mass portion 2 and the stationary electrode 6 will be considered. In the explanatory view of FIG. 4, the mass portion 2 and the stationary electrode 6 are arranged with a distance s between them, and a capacitance detection circuit 8 is provided between the electrode surface 2a of the mass portion 2 and the stationary electrode 6. The voltage V is applied.
【００１８】 まず、まだ絶縁膜７が形成されていない場合について考える。いま、マス部２ が静止電極６側へ距離ｙだけ変位し、マス部２と静止電極６との間の距離がｄ＝ ｓ−ｙとなっているとする。このとき、マス部には、静止電極側へ向けて Ｆ１＝（ε0Ｖ2Ｓ）／（２ｄ2） の静電吸引力が働いており、同時に、ビーム３の弾性復元力によって静止電極６ と反対側へ向けて Ｆ２＝ｋｙ＝ｋ（ｓ−ｄ） の弾性力が働いている。ここで、ε0は真空の誘電率、Ｓはマス部２の電極面２ ａと静止電極６の対向面積、ｋはビーム全体によるＸ方向でのバネ定数である。 そして、マス部に働く力がＦ１＞Ｆ２となると、慣性力が零になってもマス部２ が復帰できなくなり、マス部２と静止電極６が静電吸着を起こす。すなわち、マ ス部２が （ε0Ｖ2Ｓ）／（２ｄ0 2）＝ｋ（ｓ−ｄ0） で決まる距離ｄ0よりも接近する（ｄ＜ｄ0）と静止電極６に静電吸着され、以後 、電圧Ｖを低下させるか、または、静電容量検出回路８をオフにしなければ、加 速度センサ１０を動作させられなくなる。First, consider a case where the insulating film 7 is not formed yet. Now, it is assumed that the mass portion 2 is displaced toward the stationary electrode 6 side by the distance y, and the distance between the mass portion 2 and the stationary electrode 6 is d = sy. At this time, the electrostatic attraction force of F1 = (ε 0 V 2 S) / (2d 2 ) acts on the mass portion toward the stationary electrode side, and at the same time, the elastic restoring force of the beam 3 causes the stationary electrode 6 to move. The elastic force of F2 = ky = k (s−d) is working toward the opposite side. Here, ε 0 is the dielectric constant of vacuum, S is the facing area between the electrode surface 2 a of the mass portion 2 and the stationary electrode 6, and k is the spring constant in the X direction due to the entire beam. When the force acting on the mass portion becomes F1> F2, the mass portion 2 cannot be restored even if the inertial force becomes zero, and the mass portion 2 and the stationary electrode 6 cause electrostatic attraction. That is, when the mass portion 2 comes closer than the distance d 0 determined by (ε 0 V 2 S) / (2d 0 2 ) = k (s−d 0 ) (d <d 0 ), the static electrode 6 is electrostatically charged. After being adsorbed, the acceleration sensor 10 cannot be operated unless the voltage V is lowered or the electrostatic capacitance detection circuit 8 is turned off thereafter.
【００１９】 そこで、本実施例にあっては、静止電極６の上に絶縁膜７を設け、絶縁膜７の 膜厚ｔによってマス部２がｄ0よりも小さな距離まで静止電極に接近するのを防 止している。もっとも、マス部２と静止電極６の間に絶縁膜７が挿入されている ため、マス部２に働く静電吸引力Ｆ１は、絶縁膜７の比誘電率をεrとすると、 Ｆ１＝（εr2ε0Ｖ2Ｓ）／（２ｄ2） となるので、絶縁膜の膜厚は、 （εr2ε0Ｖ2Ｓ）／（２ｄ1 2）＝ｋ（ｓ−ｄ1） で決まるｄ1よりも大きな膜厚ｔ（＞ｄ1）にする必要がある。Therefore, in this embodiment, the insulating film 7 is provided on the stationary electrode 6, and the mass portion 2 approaches the stationary electrode to a distance smaller than d 0 depending on the thickness t of the insulating film 7. To prevent. However, since the insulating film 7 is inserted between the mass portion 2 and the stationary electrode 6, the electrostatic attractive force F1 acting on the mass portion 2 is F1 = (εr when the relative permittivity of the insulating film 7 is εr. 2 ε 0 V 2 S) / (2d 2 ), the film thickness of the insulating film is determined by (εr 2 ε 0 V 2 S) / (2d 1 2 ) = k (s−d 1 ) d 1 It is necessary to make the film thickness t (> d 1 ) larger than that.
【００２０】 なお、マス部２が絶縁膜７に接触しても、マス部２と静止電極６とが短絡する ことがないので、マス部２と静止電極６との間に短絡電流が流れることがなく、 静電容量検出回路８を短絡電流から保護することができる。Even if the mass portion 2 comes into contact with the insulating film 7, the mass portion 2 and the stationary electrode 6 are not short-circuited, so that a short-circuit current flows between the mass portion 2 and the stationary electrode 6. Therefore, the capacitance detection circuit 8 can be protected from a short circuit current.
【００２１】 図５は本考案の別な実施例による加速度センサに用いられている上面側のカバ ー４を示す斜視図である。フレーム１の上に接着される上面側のカバー４の内面 側には静止電極６が接合されており、静止電極６の四隅にはそれぞれＬ字形をし た絶縁膜１１が設けられている。この絶縁膜１１もマス部２の電極面２ａと静止 電極６とが静電吸着するのを防止するため、所定厚み以上の膜厚に形成されてい る。FIG. 5 is a perspective view showing a top cover 4 used in an acceleration sensor according to another embodiment of the present invention. The stationary electrode 6 is bonded to the inner surface of the cover 4 on the upper surface side, which is adhered onto the frame 1, and the L-shaped insulating films 11 are provided at the four corners of the stationary electrode 6, respectively. This insulating film 11 is also formed to have a film thickness of a predetermined thickness or more in order to prevent electrostatic attraction between the electrode surface 2a of the mass portion 2 and the stationary electrode 6.
【００２２】 この実施例にあっては、絶縁膜１１が略環状にパターン化されているので、大 きな加速度が加わってマス部２が静止電極６側へ大きく変位すると、マス部２と 静止電極６と略環状の絶縁膜９とで形成される空間１２の空気が圧縮され、圧縮 空気の緩衝作用でマス部２の静止電極６への変位速度をダンピングすることがで き、衝突時の衝撃を緩和させられる。よって、マス部２の静止電極６への衝突時 の衝撃を緩和してビーム３が破損するのを防止できる。In this embodiment, since the insulating film 11 is patterned in a substantially annular shape, when a large acceleration is applied and the mass portion 2 is largely displaced to the stationary electrode 6 side, the mass portion 2 and the mass portion 2 become stationary. The air in the space 12 formed by the electrode 6 and the substantially annular insulating film 9 is compressed, and the displacement speed of the mass portion 2 to the stationary electrode 6 can be damped by the buffering action of the compressed air. The shock can be alleviated. Therefore, it is possible to prevent the beam 3 from being damaged by alleviating the impact when the mass portion 2 collides with the stationary electrode 6.
【００２３】 また、マス部２が静止電極６から遠ざかるときも、マス部２の電極面２ａと静 止電極６と略環状の絶縁膜１１とで形成される空間１２の空気が減圧されること により、マス部２の遠ざかる速度がダンピングされるので、マス部２が下面側の カバー５に衝突してビーム３が破損するのも防止できる。Further, even when the mass portion 2 moves away from the stationary electrode 6, the air in the space 12 formed by the electrode surface 2 a of the mass portion 2, the stationary electrode 6 and the substantially annular insulating film 11 is depressurized. As a result, the moving speed of the mass portion 2 is damped, so that it is possible to prevent the mass portion 2 from colliding with the cover 5 on the lower surface side and damaging the beam 3.
【００２４】 また、絶縁膜１１の間には隙間１３が設けられているので、絶縁膜１１によっ て囲まれた空間１２で圧縮された空気は隙間１３から漏れ出る。マス部２の変位 をダンピングしていると、加速度センサの感度が低下する恐れがあるので、空気 を一部絶縁膜１１の隙間１３から漏らすことによって加速度センサの感度低下を 防止している。Since the gap 13 is provided between the insulating films 11, the air compressed in the space 12 surrounded by the insulating film 11 leaks out from the gap 13. Damping the displacement of the mass portion 2 may lower the sensitivity of the acceleration sensor. Therefore, the air is partially leaked from the gap 13 of the insulating film 11 to prevent the sensitivity of the acceleration sensor from being lowered.
【００２５】 なお、上記のいずれの実施例においても、マス部自体が導電性を有していたが 、非導電性材料で形成されたマス部の表面に電極を設けて電極面を形成してもよ い。また、上記実施例では、絶縁膜を静止電極に設けているが、マス部に絶縁膜 を設けてもよく、あるいは、静止電極とマス部の両方に絶縁膜を設けてもよい。Although the mass portion itself has conductivity in any of the above-mentioned embodiments, an electrode surface is formed by providing an electrode on the surface of the mass portion formed of a non-conductive material. Good. Further, in the above embodiment, the insulating film is provided on the stationary electrode, but the insulating film may be provided on the mass portion, or the insulating film may be provided on both the stationary electrode and the mass portion.
【００２６】[0026]
本考案によれば、マス部が静止電極に接近しても、絶縁膜によって一定距離以 上に接近するのを防止でき、マス部の電極面と静止電極とが静電吸着して加速度 センサが動作不良となるのを防止することができる。 According to the present invention, even if the mass portion approaches the stationary electrode, it can be prevented from approaching beyond a certain distance by the insulating film, the electrode surface of the mass portion and the stationary electrode are electrostatically adsorbed, and the acceleration sensor is It is possible to prevent malfunction.
【００２７】 しかも、マス部と静止電極とは絶縁膜によって隔てられているので、マス部と 静止電極とが衝突して短絡することがなく、回路等を短絡電流から保護すること ができる。Moreover, since the mass portion and the stationary electrode are separated by the insulating film, the mass portion and the stationary electrode do not collide with each other to cause a short circuit, and the circuit or the like can be protected from a short circuit current.
【００２８】 また、絶縁膜をパターン化してあると、マス部が変位するときの空気抵抗が大 きくなるので、マス部と静止電極とが衝突しにくくなる。従って、マス部と静止 電極との衝突によるビームの破損を防止でき、加速度センサの耐衝撃性を高める ことができる。Further, if the insulating film is patterned, air resistance when the mass portion is displaced becomes large, so that the mass portion and the stationary electrode are less likely to collide with each other. Therefore, it is possible to prevent the beam from being damaged due to the collision between the mass portion and the stationary electrode, and it is possible to improve the impact resistance of the acceleration sensor.
【図１】本考案の一実施例による加速度センサを示す断
面図である。FIG. 1 is a sectional view showing an acceleration sensor according to an embodiment of the present invention.
【図２】同上の加速度センサの一部破断した斜視図であ
る。FIG. 2 is a partially cutaway perspective view of the above acceleration sensor.
【図３】同上の加速度センサにおけるカバーの内面側か
ら見た斜視図である。FIG. 3 is a perspective view of the above acceleration sensor seen from the inner surface side of the cover.
【図４】同上のマス部に作用する静電吸引力を説明する
ための図である。FIG. 4 is a diagram for explaining an electrostatic attraction force that acts on the above-mentioned mass portion.
【図５】本考案の別な実施例による加速度センサにおけ
るカバーの内面側から見た斜視図である。FIG. 5 is a perspective view of the acceleration sensor according to another embodiment of the present invention as viewed from the inner surface side of the cover.
【図６】従来例による加速度センサの断面図である。FIG. 6 is a sectional view of an acceleration sensor according to a conventional example.
１ フレーム ２ マス部 ２ａ 電極面 ３ ビーム ６ 静止電極 ７，１１ 絶縁膜 1 frame 2 mass part 2a electrode surface 3 beam 6 stationary electrode 7, 11 insulating film
Claims (2)
部を揺動自在に支持させ、当該マス部の電極面に対向さ
せて静止電極を設け、当該マス部の電極面と当該静止電
極のうち少なくとも一方の上に所定の厚み以上の絶縁膜
を配設した加速度センサ。1. A mass part is swingably supported by a support by an elastic beam, and a stationary electrode is provided so as to face the electrode surface of the mass part. An acceleration sensor in which an insulating film having a predetermined thickness or more is provided on at least one side.
徴とする請求項１に記載の加速度センサ。2. The acceleration sensor according to claim 1, wherein the insulating film is patterned.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11001091U JPH0552762U (en) | 1991-12-13 | 1991-12-13 | Acceleration sensor |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11001091U JPH0552762U (en) | 1991-12-13 | 1991-12-13 | Acceleration sensor |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0552762U true JPH0552762U (en) | 1993-07-13 |
Family
ID=14524831
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11001091U Pending JPH0552762U (en) | 1991-12-13 | 1991-12-13 | Acceleration sensor |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0552762U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007078439A (en) * | 2005-09-13 | 2007-03-29 | Sony Corp | Capacitance detection type sensor element |
| JP2011220745A (en) * | 2010-04-06 | 2011-11-04 | Denso Corp | Dynamic quantity sensor and manufacturing method for the same |
-
1991
- 1991-12-13 JP JP11001091U patent/JPH0552762U/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007078439A (en) * | 2005-09-13 | 2007-03-29 | Sony Corp | Capacitance detection type sensor element |
| JP2011220745A (en) * | 2010-04-06 | 2011-11-04 | Denso Corp | Dynamic quantity sensor and manufacturing method for the same |
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