JPH05311103A - Printing ink for silver conductor circuit and method for forming silver conductor circuit - Google Patents
Printing ink for silver conductor circuit and method for forming silver conductor circuitInfo
- Publication number
- JPH05311103A JPH05311103A JP14655492A JP14655492A JPH05311103A JP H05311103 A JPH05311103 A JP H05311103A JP 14655492 A JP14655492 A JP 14655492A JP 14655492 A JP14655492 A JP 14655492A JP H05311103 A JPH05311103 A JP H05311103A
- Authority
- JP
- Japan
- Prior art keywords
- silver
- conductor circuit
- component
- silver conductor
- forming
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Parts Printed On Printed Circuit Boards (AREA)
- Paints Or Removers (AREA)
- Inks, Pencil-Leads, Or Crayons (AREA)
- Manufacturing Of Printed Wiring (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、電子工業材料として用
いられる各種基材上に銀導体回路を形成させるための印
刷インキと形成方法に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a printing ink and a forming method for forming a silver conductor circuit on various substrates used as electronic industrial materials.
【0002】[0002]
【従来の技術】従来、基材上に銀の導体回路を形成させ
るには銀ペーストを用いたスクリーン印刷法が盛んに用
いられてきた。この方法では安価で多量に印刷パターン
が作成できるが、50μmのライン/スペースのファイン
パターンではその形成が困難となるという欠点があっ
た。又、スクリーン印刷は版にスクリーンのメッシュを
用いることから、大きな基材への印刷に対しては位置ず
れを起こすことから位置精度が悪くなるという欠点があ
った。2. Description of the Related Art Conventionally, a screen printing method using a silver paste has been widely used for forming a silver conductor circuit on a substrate. Although this method is inexpensive and can produce a large amount of printed patterns, it has a drawback that it is difficult to form a fine pattern having a line / space of 50 μm. Further, in screen printing, since a screen mesh is used for the printing plate, there is a drawback that the positional accuracy is deteriorated because of positional deviation when printing on a large base material.
【0003】一方、ファインパターンの形成方法とし
て、フォトリソ法が行なわれている。この方法は微細な
ファインパターンの形成ができるが、製造のための設備
が大掛かりになり、工程が複雑で手間を要することか
ら、生産コストが高くつき、安価に製品を供給できない
という欠点があった。又、前記樹脂に金属銀粉末のみを
用いて膜を形成した場合、レベリング性がなく、細部に
までインキが広がらないため、表面が粗い状態になる。
あるいは下地が透ける程粗いという欠点もあった。これ
により、導体部からの異常放電や抵抗値の増大という問
題もあった。On the other hand, a photolithography method is used as a method for forming a fine pattern. Although this method can form a fine pattern, it requires a large amount of equipment for manufacturing, has complicated processes, and requires labor, resulting in high production cost and low cost of supplying products. .. Further, when a film is formed by using only metallic silver powder for the resin, there is no leveling property and the ink does not spread to the details, so the surface becomes rough.
There was also a drawback that the base was so rough that it was transparent. As a result, there are also problems such as abnormal discharge from the conductor portion and an increase in resistance value.
【0004】[0004]
【発明が解決しようとする課題】本発明は上記従来法の
欠点を解消するためになされたもので樹脂成分、溶剤成
分、添加成分、銀成分およびフラックス成分とを溶解、
混練した銀導体回路用オフセット印刷インキを用いてパ
ターンを基材上にオフセット印刷し、焼成後位置精度の
高いかつライン/スペースの解像力の高くかつレベリン
グ性の良いファインパターンの形成法を提供することを
目的とする。SUMMARY OF THE INVENTION The present invention has been made to solve the above-mentioned drawbacks of the conventional method, and dissolves a resin component, a solvent component, an additive component, a silver component and a flux component,
PROBLEM TO BE SOLVED: To provide a method for offset printing of a pattern on a substrate using a kneaded offset printing ink for a silver conductor circuit to form a fine pattern with high positional accuracy after firing, high line / space resolution and good leveling property. With the goal.
【0005】[0005]
【課題を解決するための手段】本発明の方法はアルキッ
ド樹脂、変性アルキッド樹脂、脂肪酸エポキシ樹脂、ウ
レタン化油、ロジンおよびマレイン化油より選ばれる少
なくとも1種以上の樹脂成分と溶剤成分、添加成分、銀
成分およびフラックス成分とを溶解、混練した銀導体回
路用オフセット印刷インキを用いてパターンを基材上に
オフセット印刷する工程、この印刷パターンをそのまま
/又は活性エネルギー線の照射及び/又は加熱によって
硬化せしめる工程、硬化せしめた印刷パターンをそのま
ま/又は同一パターンで重ね刷りする工程、印刷パター
ンを焼成する工程とから成ることを特徴とする銀導体回
路の形成方法である。The method of the present invention comprises at least one resin component selected from alkyd resin, modified alkyd resin, fatty acid epoxy resin, urethanized oil, rosin and maleated oil, a solvent component and an additive component. A step of offset-printing a pattern on a substrate using an offset printing ink for a silver conductor circuit in which a silver component and a flux component are dissolved and kneaded, and the printing pattern is left as it is or / or by irradiation with active energy rays and / or heating. A method of forming a silver conductor circuit comprising a step of curing, a step of overprinting the cured print pattern as it is or the same pattern, and a step of firing the print pattern.
【0006】本発明の樹脂はオフセット印刷の印刷適性
に合う樹脂を選ぶ必要があり、アルキッド樹脂、変性ア
ルキッド樹脂、脂肪酸変性エポキシ樹脂、ウレタン化
油、ロジンおよびマレイン化油などがよく、単独あるい
は混合したものを用いる。樹脂量は銀の含有量によって
も異なるが印刷適性から考慮すると3〜40%であるとよ
い。As the resin of the present invention, it is necessary to select a resin that suits the printability of offset printing, and alkyd resin, modified alkyd resin, fatty acid modified epoxy resin, urethanized oil, rosin and maleated oil, etc. are preferable, and they may be used alone or as a mixture. Use the one that you made. Although the amount of resin varies depending on the content of silver, it is preferably 3 to 40% in consideration of printability.
【0007】本発明で用いる溶剤は特に限定するもので
ないが固形の樹脂や添加物を液状に溶解させる目的と粘
度を下げるための粘ちょう剤の役割のためにある。固形
の樹脂を溶解させるために用いられるものとしてキシレ
ン、トルエン、ブタノール、ミネラルスピリッツ、石油
系溶剤(ソルベッソ、ナフサ)、メチルイソブチルケト
ン、パイン油、ターピニョール等があり、その他粘度を
下げるために3〜6号ソルベントが用いられる。The solvent used in the present invention is not particularly limited, but it has the purpose of dissolving a solid resin and additives in a liquid state and the role of a thickener for lowering the viscosity. Xylene, toluene, butanol, mineral spirits, petroleum solvents (solveso, naphtha), methyl isobutyl ketone, pine oil, terpinol, etc. are used to dissolve solid resins. No. 6 solvent is used.
【0008】金属銀粉末は粒径0.05〜 1.0μmの球状、
好ましくは 0.1〜 0.5μmの粒径で単分散したものがよ
い。フレーク状の粉末は 0.1〜10μm、更に好ましくは
0.5〜5μmのものがよく、球状のもの単独か、フレー
クを銀の割合で10%〜75%、好ましくは20%〜50%混ぜ
るとよい。この時の銀粉末の純度は95〜99.9%のものを
用いる。銀の球状粉末の粒径が0.05〜 1.0μmとしたの
は0.05μm未満では粒径が小さすぎ、弾性が出ないため
印刷適性が不適であることと、サブミクロン以下の粒径
であるためハンドリングの困難さが生じるからである。The metallic silver powder is spherical with a particle size of 0.05 to 1.0 μm,
It is preferably monodispersed with a particle size of 0.1 to 0.5 μm. The flake powder is 0.1-10 μm, more preferably
0.5 to 5 μm is preferable, and spherical ones may be used alone or flakes may be mixed in a silver ratio of 10% to 75%, preferably 20% to 50%. The silver powder used at this time has a purity of 95-99.9%. The particle size of the spherical silver powder was set to 0.05 to 1.0 μm because if the particle size is less than 0.05 μm, the particle size is too small and the printability is unsatisfactory due to lack of elasticity, and the particle size is less than submicron. This is because the difficulty of
【0009】一方、 1.0μmを超えるとインキング時に
ローラー上の均一にインキがのらずに安定した印刷がで
きないという問題がある。球状粉末にフレーク状粉末を
混ぜるのはフレークがライン上に位置したとき粉末どお
しの接触が大きくとれ、導体の抵抗が下げられるという
利点があるからである。On the other hand, when the thickness exceeds 1.0 μm, there is a problem that ink cannot be uniformly deposited on the roller during inking and stable printing cannot be performed. The reason why the flake powder is mixed with the spherical powder is that when the flakes are located on the line, there is a large contact between the powders and the resistance of the conductor is reduced.
【0010】本発明の銀を含有する有機金属化合物はカ
ルボン酸塩、アセチルアセテート塩、金属アルコキシド
がよい。カルボン酸塩は2−エチルヘキサン酸、オクチ
ル酸、ネオデカン酸、ナフテン酸などでよく、カルボン
酸であれば特に限定するものではない。又、金属アルコ
キシドに用いられるアルコールは炭素数が1〜12のもの
であればよい。The silver-containing organometallic compound of the present invention is preferably a carboxylate, an acetylacetate or a metal alkoxide. The carboxylic acid salt may be 2-ethylhexanoic acid, octylic acid, neodecanoic acid, naphthenic acid or the like, and is not particularly limited as long as it is a carboxylic acid. The alcohol used for the metal alkoxide may be one having 1 to 12 carbon atoms.
【0011】本発明の銀を含有するコロイドはコロイド
粒子径が 100〜1000Åのものであればよく、有機溶媒に
存在しているコロイド溶液をインキに用いるとよい。前
記の銀を含有する有機金属化合物やコロイドを金属銀粉
末以外に添加することにより、細部まで十分銀成分が行
き渡り、下地が透けることがなくなる。これによりファ
インパターン断線が防止でき、抵抗値の低減にもつなが
る。又、平滑性が向上することから、膜の表面粗さも少
なくなる。The silver-containing colloid of the present invention may have a colloidal particle size of 100 to 1000Å, and a colloidal solution existing in an organic solvent may be used for the ink. By adding the above-mentioned silver-containing organometallic compound or colloid other than the metallic silver powder, the silver component is sufficiently spread to the details, and the undercoat is not transparent. As a result, fine pattern disconnection can be prevented and the resistance value can be reduced. Further, since the smoothness is improved, the surface roughness of the film is also reduced.
【0012】本発明の添加成分はレベリング剤、重合開
始剤、酸化促進剤、皮はり防止剤、増粘剤、金属キレー
ト樹脂、分散剤、フィラーであり、インキの適性に応じ
て添加する。例えば、レベリング剤であればシリコン系
化合物を 0.1〜数%添加するとよい。重合開始剤ではア
クリルオリゴマー、酸化促進剤ではナフテン酸コバル
ト、ナフテン酸マンガン、皮はり防止剤ではメチルエチ
ルケトンオキシム、増粘剤では増粘ワニス、金属キレー
ト樹脂ではアマニ油脂肪酸塩、ステアリン酸塩、オレイ
ン酸塩などがある。The additive components of the present invention are a leveling agent, a polymerization initiator, an oxidation promoter, an anti-skinning agent, a thickener, a metal chelate resin, a dispersant and a filler, which are added depending on the suitability of the ink. For example, if it is a leveling agent, it is advisable to add 0.1 to several% of a silicon compound. Acrylic oligomer as polymerization initiator, cobalt naphthenate and manganese naphthenate as oxidation promoter, methyl ethyl ketone oxime as anti-skinning agent, thickening varnish as thickener, linseed oil fatty acid salt, stearate, oleic acid as metal chelate resin. There is salt etc.
【0013】フィラーはAl2 O3 、TiO2 、BiO
2 、SnO2 等の微粉末を用いればよく、0.05μmから
10μm以下の粉末を用いればよい。フィラーは焼成時に
銀薄膜内や銀と基材の界面に生ずるひずみを取り除く、
あるいは低減させる目的で加えるものである。又、耐薬
品性の向上にもつながる。フラックス成分は有機金属化
合物および/又はガラスフリットで加えればよい。金属
成分としてPb、B、Si、Zn、Bi、Sn、Cr、
Mn、Ti、Al、アルカリ、アルカリ土類等が含まれ
ているものを選ぶ。有機金属化合物としては2−エチル
ヘキサン酸塩、ナフテン酸塩、ネオデカン酸塩、金属ア
ルコキシド、アマニ油脂肪酸塩、オレイン酸塩、ステア
リン酸塩、アセチルアセトン塩などが用いられる。The filler is Al 2 O 3 , TiO 2 , BiO
2 , fine powder such as SnO 2 may be used, and from 0.05 μm
A powder of 10 μm or less may be used. The filler removes the strain generated in the silver thin film and the interface between the silver and the substrate during firing,
Alternatively, it is added for the purpose of reduction. It also leads to improved chemical resistance. The flux component may be added with an organometallic compound and / or a glass frit. Pb, B, Si, Zn, Bi, Sn, Cr as metal components,
A material containing Mn, Ti, Al, alkali, alkaline earth or the like is selected. As the organic metal compound, 2-ethylhexanoate, naphthenate, neodecanoate, metal alkoxide, linseed oil fatty acid salt, oleate, stearate, acetylacetone salt and the like are used.
【0014】フラックス成分は銀の導体薄膜と基材との
密着をよくする目的で加えるものであり、例えば基材が
ガラス基板であればPbO−B2 O3 −SiO2 、Pb
O−B2 O3 −ZnO2 系の軟化点が 350〜 600℃程度
のガラスフリットを用いればよく、アルミナ基板であれ
ばSiO2 −Al2 O3 −CaO、SiO2 −PbO−
CaO系高軟化点のガラスフリットを用いればよい。The flux component is added for the purpose of improving the adhesion between the silver conductor thin film and the base material. For example, if the base material is a glass substrate, PbO-B 2 O 3 -SiO 2 , Pb.
A glass frit with a softening point of OB 2 O 3 —ZnO 2 system of about 350 to 600 ° C. may be used. For an alumina substrate, SiO 2 —Al 2 O 3 —CaO, SiO 2 —PbO—
A CaO-based glass frit having a high softening point may be used.
【0015】前記の樹脂、溶剤、添加剤フラックス成分
および銀成分はプレミックスの後、三本ロールにて充分
均質になるまで溶解、混練する。このように調整された
銀導体回路用印刷インキを用いてオフセット印刷するこ
とにより、所定パターンが得られる。所定パターンの印
刷方法はオフセット印刷であり、平板、凹版のいずれで
あってもかまわず、版からブランケット、ブランケット
から基材へとインキの転写がおこなわれることにより所
定パターンが得られる。所定パターンのインキ転写が1
回で十分に行なわれない場合には重ね刷りを行なえばよ
い。この重ね刷りを行なうことで、インキの転写総量お
よび膜厚を増すことができる。重ね刷りはそのまま続け
て行なってよいが、重ね刷りの際、バックトラッピング
により転写量が増さないようであれば、重ね刷りの前に
パターン上のインキを硬化させることでバックトラッピ
ングを防止することができる。硬化方法には活性エネル
ギー線の照射及び/又は加熱によって硬化することがで
きる。活性エネルギー線は紫外線、赤外線、電子線を意
味し、これらの活性エネルギー線と加熱を組み合わせる
ことにより硬化が進む。硬化をより促進させるには紫外
線硬化樹脂、重合開始剤、酸化促進剤を添加するとよ
い。The above-mentioned resin, solvent, additive flux component and silver component are premixed and then melted and kneaded by a three-roll mill until they are sufficiently homogeneous. A predetermined pattern is obtained by offset printing using the printing ink for a silver conductor circuit thus adjusted. The printing method of the predetermined pattern is offset printing, which may be a flat plate or an intaglio plate, and the predetermined pattern is obtained by transferring the ink from the plate to the blanket or from the blanket to the substrate. 1 pattern ink transfer
If the number of times is not sufficient, overprinting may be performed. By performing this overprinting, the total amount of ink transfer and the film thickness can be increased. Overprinting may be continued, but if backtrapping does not increase the transfer amount during overprinting, prevent backtrapping by curing the ink on the pattern before overprinting. You can The curing method can be curing by irradiation with active energy rays and / or heating. Active energy rays mean ultraviolet rays, infrared rays, and electron rays, and curing proceeds by combining these active energy rays and heating. To further accelerate the curing, it is advisable to add an ultraviolet curable resin, a polymerization initiator and an oxidation accelerator.
【0016】上記のように基材上の印刷されたパターン
が平滑にならない場合には、印刷パターンをプレスする
ことにより表面の平滑化を促すことができる。プレスの
方法は基材全体に均一に力が加わるように基材上にシー
トあるいは薄板を乗せ、全体に圧力を加える。この際プ
レスの回数やプレス圧を多くすると線の太りにつなが
る。When the printed pattern on the base material is not smooth as described above, it is possible to promote the smoothing of the surface by pressing the printed pattern. In the pressing method, a sheet or thin plate is placed on the base material so that force is uniformly applied to the whole base material, and pressure is applied to the whole base material. At this time, increasing the number of presses and the press pressure leads to thickening of the line.
【0017】オフセット印刷により得られた所定パター
ンは焼成工程に供される。焼成温度は樹脂成分、溶剤成
分、添加成分等の内に含まれる有機物が蒸発、昇華ある
いは分解しなければならない温度で、 300℃以上である
ことが望まれる。又、銀と基材との密着をよくするには
フラックス成分が融解し、基材との界面に反応相を形成
させなければならず、その融解に必要な温度まで上げて
焼成しなければならない。The predetermined pattern obtained by offset printing is subjected to a firing process. The firing temperature is a temperature at which the organic substances contained in the resin component, the solvent component, the additive component and the like must be evaporated, sublimated or decomposed, and is preferably 300 ° C. or higher. Further, in order to improve the adhesion between silver and the base material, the flux component must be melted and a reaction phase must be formed at the interface with the base material, and the temperature must be raised to the temperature required for melting and baked. ..
【0018】[0018]
【実施例】以下に本発明の実施例及び従来例について説
明する。EXAMPLES Examples of the present invention and conventional examples will be described below.
【0019】[0019]
【製造例1】アルキッド樹脂(大日本インキ化学工業
製:ベッコゾールEL−8001)16gに0.3μm球状金属
銀粉末80g、ガラスフリット(旭硝子製:1350)4g、
2−エチルヘキサン酸銀を 9.3gとをプレミックスした
後、三本ロールにて混練し、銀インキを作製した。[Production Example 1] 16 g of alkyd resin (Dainippon Ink and Chemicals: Becksol EL-8001), 80 g of 0.3 μm spherical metallic silver powder, 4 g of glass frit (1350, Asahi Glass),
After premixing silver 2-ethylhexanoate with 9.3 g, the mixture was kneaded with a three-roll mill to prepare a silver ink.
【0020】[0020]
【製造例2】フェノール変性アルキッド樹脂(大日本イ
ンキ化学工業製:ベッコゾール1341)10gに 0.3μm球
状金属銀粉末85g、ガラスフリット(旭硝子製:1370)
4.5gアセチルアセテート銀10g、メチルエチルケトン
オキシム1gとを混練し、インキを作製した。[Production Example 2] 10 g of phenol-modified alkyd resin (manufactured by Dainippon Ink and Chemicals, Inc .: Beccosol 1341), 85 g of 0.3 μm spherical metallic silver powder, glass frit (1370 manufactured by Asahi Glass)
4.5 g of acetyl acetate silver and 10 g of methyl ethyl ketone oxime were kneaded to prepare an ink.
【0021】[0021]
【製造例3】脂肪酸変性エポキシ樹脂(大日本インキ化
学工業製:ベッコゾールP−786-50)10gに 0.5μm球
状金属銀粉末85g、メチルエチルケトンオキシム1g、
ナフテン酸コバルト 1.5g、ガラスフリット(旭硝子
製:1307) 3.5g、30%銀含有銀コロイド9gとを混練
し、インキを作製した。[Production Example 3] 10 g of fatty acid-modified epoxy resin (manufactured by Dainippon Ink and Chemicals, Inc .: Beckosol P-786-50), 85 g of 0.5 μm spherical metallic silver powder, 1 g of methyl ethyl ketone oxime,
Ink was prepared by kneading 1.5 g of cobalt naphthenate, 3.5 g of glass frit (1307 manufactured by Asahi Glass Co., Ltd.), and 9 g of silver colloid containing 30% silver.
【0022】[0022]
【製造例4】ロジン(大日本インキ化学工業製:ヘッカ
サイドJ−896 )10gに30%銀含有銀コロイドターピョ
ール溶液を加えてロジンを溶解した後これに 0.3μm球
状金属銀粉末40g、5μmのフレーク状銀粉末40g、メ
チルエチルケトンオキシム1g、ガラスフリット(旭硝
子製:1350)3gを混合、混練しインキを作製した。[Production Example 4] To 10 g of rosin (manufactured by Dainippon Ink and Chemicals, Inc .: Heckaside J-896) was added a 30% silver-containing silver colloid terpyol solution to dissolve the rosin, and then 0.3 μm spherical metallic silver powder 40 g, 5 μm 40 g of flaky silver powder, 1 g of methyl ethyl ketone oxime, and 3 g of glass frit (1350 manufactured by Asahi Glass) were mixed and kneaded to prepare an ink.
【0023】[0023]
【製造例5】ウレタン化油(大日本インキ化学工業製:
バーノックTD−125 )15gに 0.1μm球状金属銀粉末
75g、オイゲノール1g、増粘ワニス 3.5gオクチル酸
鉛1.5g、オクチル酸ビスマス1g、ナフテン酸銀10g
を混練し、インキを作製した。[Production Example 5] Urethane oil (manufactured by Dainippon Ink and Chemicals:
BURNOCK TD-125) 0.1 μm spherical metallic silver powder per 15 g
75 g, eugenol 1 g, thickening varnish 3.5 g lead octylate 1.5 g, bismuth octylate 1 g, silver naphthenate 10 g
Was kneaded to prepare an ink.
【0024】[0024]
【製造例6】アルキッド樹脂(大日本インキ化学工業
製:ベッコゾールEL−8001)16gに0.3μmの球状金
属銀粉末80g、ガラスフリット(旭硝子製:1350)4g
とをプレミックスした後、三本ロールにて混練し、銀イ
ンキを作製した。[Production Example 6] 16 g of alkyd resin (manufactured by Dainippon Ink and Chemicals, Inc .: Beckosol EL-8001), 80 g of spherical metallic silver powder of 0.3 μm, and 4 g of glass frit (manufactured by Asahi Glass: 1350).
After being premixed with each other, they were kneaded with a triple roll to prepare a silver ink.
【0025】[0025]
【製造例7】フェノール変性アルキッド樹脂(大日本イ
ンキ化学工業製:ベッコゾール1341)10gに 0.3μm球
状金属銀粉末85g、ガラスフリット(旭硝子製:1370)
4.5g、メチルエチルケトンオキシム1gとを混練し、
インキを作製した。[Production Example 7] Phenol-modified alkyd resin (manufactured by Dainippon Ink & Chemicals, Inc .: Beckol 1341) 10 g, 0.3 μm spherical metallic silver powder 85 g, glass frit (Asahi Glass: 1370)
Knead 4.5 g and 1 g of methyl ethyl ketone oxime,
An ink was made.
【0026】[0026]
【製造例8】脂肪酸変性エポキシ樹脂(大日本インキ化
学工業製:ベッコゾールP−786-50)10gに 0.5μm球
状金属銀粉末85g、メチルエチルケトンオキシム1g、
ナフテン酸コバルト 1.5g、ガラスフリット(旭硝子
製:1307) 3.5gとを混練し、インキを作製した。[Production Example 8] 10 g of fatty acid-modified epoxy resin (manufactured by Dainippon Ink and Chemicals, Inc .: Beckozol P-786-50), 85 g of 0.5 μm spherical metallic silver powder, 1 g of methyl ethyl ketone oxime,
Ink was prepared by kneading 1.5 g of cobalt naphthenate and 3.5 g of glass frit (1307 manufactured by Asahi Glass).
【0027】[0027]
【実施例1】製造例1から5のインキを用いてガラス基
板上に50cm×50cmの所定パターンを4回重ね刷りのオフ
セット印刷後、紫外線を1分照射した。同様に4回印刷
と紫外線照射をくり返し、合計20回印刷した。 550℃、
10分で焼成した表面粗さの測定結果を表1に示す。Example 1 The inks of Production Examples 1 to 5 were offset-printed on a glass substrate with a predetermined pattern of 50 cm × 50 cm four times by overprinting and then irradiated with ultraviolet rays for 1 minute. Similarly, printing was repeated 4 times and UV irradiation was repeated, and printing was performed 20 times in total. 550 ° C,
Table 1 shows the measurement results of the surface roughness after firing for 10 minutes.
【0028】[0028]
【表1】 [Table 1]
【0029】[0029]
【従来例1】製造例6から8のインキを用いて実施例1
と同様の操作を行なった結果を表1に示す。Conventional Example 1 Example 1 using the inks of Production Examples 6 to 8
Table 1 shows the result of performing the same operation as.
【0030】[0030]
【実施例2】製造例1から5のインキを用いてガラス基
板上に50cm×50cmの所定パターンをオフセット印刷によ
り10回重ね刷りを行い、5分間 120℃で加熱硬化後さら
に10回印刷を行なった。その表面粗さを測定した結果を
表1に示す。[Example 2] Using the inks of Production Examples 1 to 5, a predetermined pattern of 50 cm x 50 cm was overprinted 10 times by offset printing on a glass substrate, heated and cured at 120 ° C for 5 minutes, and then printed 10 times more. It was The results of measuring the surface roughness are shown in Table 1.
【0031】[0031]
【従来例2】製造例6から8のインキを用いて実施例2
と同様の操作を行なった結果を表1に示す。Conventional Example 2 Example 2 using the inks of Production Examples 6 to 8
Table 1 shows the result of performing the same operation as.
【0032】[0032]
【発明の効果】以上述べたように、本発明の銀導体回路
用印刷インキおよび銀導体回路の形成方法を用いると、
レベリング性が大幅に向上し、またファインパターンの
断線が防止でき、抵抗値の低減にもつながるという画期
的な効果を奏するものである。As described above, when the printing ink for silver conductor circuits and the method for forming silver conductor circuits of the present invention are used,
The leveling property is significantly improved, the fine pattern can be prevented from being broken, and the resistance value can be reduced, which is an epoch-making effect.
Claims (13)
脂肪酸エポキシ樹脂、ウレタン化油、ロジンおよびマレ
イン化油より選ばれる少なくとも1種以上の樹脂成分と
銀成分およびフラックス成分とを含有することを特徴と
する銀導体回路用印刷インキ。1. An alkyd resin, a modified alkyd resin,
A printing ink for a silver conductor circuit, comprising at least one resin component selected from fatty acid epoxy resin, urethanized oil, rosin and maleated oil, and a silver component and a flux component.
始剤、酸化促進剤、皮はり防止剤、増粘剤、金属キレー
ト樹脂、分散剤、フィラーのうち1種または2種以上を
含有する請求項1に記載の銀導体回路用印刷インキ。2. A solvent component, a leveling agent, a polymerization initiator, an oxidation promoter, an anti-skinning agent, a thickener, a metal chelate resin, a dispersant, and one or more selected from fillers. The printing ink for a silver conductor circuit according to 1.
び/又は 0.5〜5μmのフレーク状粉末、及び銀を含有
する有機金属化合物及び/又は銀を含有するコロイドで
ある、請求項1または請求項2に記載の銀導体回路用印
刷インキ。3. The silver component is a spherical powder having a particle size of 0.05 to 1.0 μm and / or a flake powder having a particle size of 0.5 to 5 μm, and an organometallic compound containing silver and / or a colloid containing silver. Alternatively, the printing ink for a silver conductor circuit according to claim 2.
ン酸塩、アセチルアセテート塩又は金属アルコキシドで
ある請求項3に記載の銀導体回路用印刷インキ。4. The printing ink for silver conductor circuits according to claim 3, wherein the silver-containing organometallic compound is a carboxylate, an acetylacetate or a metal alkoxide.
又はガラスフリットである請求項1、請求項2、請求項
3または請求項4に記載の銀導体回路用印刷インキ。5. The flux component is an organometallic compound and / or
Alternatively, the printing ink for silver conductor circuits according to claim 1, claim 2, claim 3 or claim 4, which is a glass frit.
脂肪酸エポキシ樹脂、ウレタン化油、ロジンおよびマレ
イン化油より選ばれる少なくとも1種以上の樹脂成分と
銀成分およびフラックス成分とを含有する銀導体回路用
印刷インキを用いて、パターンを基材上にオフセット印
刷する工程、この印刷パターンをそのまま/又は活性エ
ネルギー線の照射及び/又は加熱によって硬化せしめる
工程、硬化せしめた印刷パターンをそのまま/又は同一
パターンで重ね刷りする工程、印刷パターンを焼成する
工程とから成ることを特徴とする銀導体回路の形成方
法。6. An alkyd resin, a modified alkyd resin,
A pattern is offset onto a substrate using a printing ink for a silver conductor circuit containing at least one resin component selected from fatty acid epoxy resin, urethanized oil, rosin and maleated oil, and a silver component and a flux component. From the step of printing, the step of curing this print pattern as it is / or by irradiation with active energy rays and / or heating, the step of overprinting the cured print pattern as it is / or the same pattern, and the step of baking the print pattern. A method for forming a silver conductor circuit, which comprises:
分、レベリング剤、重合開始剤、酸化促進剤、皮はり防
止剤、増粘剤、金属キレート樹脂、分散剤、フィラーの
うち1種または2種以上を含有する請求項6に記載の銀
導体回路の形成方法。7. The silver conductor circuit printing ink further comprises one or more of a solvent component, a leveling agent, a polymerization initiator, an oxidation accelerator, an anti-skinning agent, a thickener, a metal chelate resin, a dispersant and a filler. 7. The method for forming a silver conductor circuit according to claim 6, containing at least one kind.
び/又は 0.5〜5μmのフレーク状粉末、及び銀を含有
する有機金属化合物及び/又は銀を含有するコロイドで
ある、請求項6又は請求項7に記載の銀導体回路の形成
方法。8. The silver component is a spherical powder having a particle size of 0.05 to 1.0 μm and / or a flake powder having a particle size of 0.5 to 5 μm, and an organometallic compound containing silver and / or a colloid containing silver. Alternatively, the method for forming a silver conductor circuit according to claim 7.
ン酸塩、アセチルアセテート塩又は金属アルコキシドで
ある請求項8に記載の銀導体回路の形成方法。9. The method for forming a silver conductor circuit according to claim 8, wherein the organometallic compound containing silver is a carboxylate, an acetylacetate or a metal alkoxide.
又はガラスフリットである請求項6、請求項7、請求項
8または請求項9に記載の銀導体回路の形成方法。10. The organometallic compound and / or the flux component
Alternatively, the method for forming a silver conductor circuit according to claim 6, claim 7, claim 8, or claim 9 is a glass frit.
請求項7、請求項8、請求項9または請求項10に記載の
銀導体回路の形成方法。11. The firing temperature is 300 ° C. or higher, 6.
The method for forming a silver conductor circuit according to claim 7, claim 8, claim 9, or claim 10.
の印刷パターンをプレスすることにより印刷パターン表
面の平滑化を促す請求項6、請求項7、請求項8、請求
項9、請求項10または請求項11に記載の銀導体回路の形
成方法。12. The method according to claim 6, claim 7, claim 8, claim 9, and claim 9, wherein after the predetermined pattern is printed on the base material, the print pattern is pressed to promote smoothing of the surface of the print pattern. The method for forming a silver conductor circuit according to claim 10 or 11.
子線のうち1種以上である請求項6、請求項7、請求項
8、請求項9、請求項10、請求項11または請求項12に記
載の銀導体回路の形成方法。13. The method according to claim 6, claim 7, claim 8, claim 9, claim 10, claim 11 or claim 12, wherein the active energy ray is at least one of ultraviolet ray, infrared ray and electron beam. A method for forming the silver conductor circuit described.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14655492A JPH05311103A (en) | 1992-05-12 | 1992-05-12 | Printing ink for silver conductor circuit and method for forming silver conductor circuit |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14655492A JPH05311103A (en) | 1992-05-12 | 1992-05-12 | Printing ink for silver conductor circuit and method for forming silver conductor circuit |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH05311103A true JPH05311103A (en) | 1993-11-22 |
Family
ID=15410295
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14655492A Pending JPH05311103A (en) | 1992-05-12 | 1992-05-12 | Printing ink for silver conductor circuit and method for forming silver conductor circuit |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH05311103A (en) |
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---|---|---|---|---|
WO2000062586A1 (en) * | 1999-04-14 | 2000-10-19 | Allied Photochemical, Inc. | Ultraviolet curable silver composition and related method |
JP2001207088A (en) * | 2000-01-27 | 2001-07-31 | Matsushita Electric Ind Co Ltd | Silver ink and its manufacturing method, and method for manufacturing electronic part |
WO2002020872A3 (en) * | 2000-09-06 | 2003-01-16 | Allied Photochemical Inc | Uv curable silver chloride compositions for producing silver coatings |
WO2003038838A1 (en) * | 2001-10-31 | 2003-05-08 | Fujikura Kasei Co., Ltd. | Ag COMPOUND PASTE |
JP2004168961A (en) * | 2002-11-22 | 2004-06-17 | Konica Minolta Holdings Inc | Active energy beam-curing type ink and printed material by using the same |
JP2005248061A (en) * | 2004-03-05 | 2005-09-15 | Toyo Ink Mfg Co Ltd | Conductive ink and non-contact medium using the same |
JP2006519291A (en) * | 2003-01-29 | 2006-08-24 | パレレック インコーポレイテッド | High conductivity ink with improved adhesion |
KR100660928B1 (en) * | 2004-09-25 | 2006-12-26 | 주식회사 잉크테크 | Organic silver ink for direct wiring |
WO2007029902A1 (en) * | 2005-09-07 | 2007-03-15 | Exax Inc. | Silver organo-sol ink for forming electrically conductive patterns |
JP2007182547A (en) * | 2005-12-30 | 2007-07-19 | Ind Technol Res Inst | Highly electroconductive ink composition and method for producing metallic electroconductive pattern |
WO2007094567A1 (en) * | 2006-02-13 | 2007-08-23 | Exax Inc. | Silver organo-sol ink for forming electrically conductive patterns |
US8070986B2 (en) * | 2007-01-30 | 2011-12-06 | Exax Inc. | Silver paste for forming conductive layers |
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-
1992
- 1992-05-12 JP JP14655492A patent/JPH05311103A/en active Pending
Cited By (18)
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---|---|---|---|---|
WO2000062586A1 (en) * | 1999-04-14 | 2000-10-19 | Allied Photochemical, Inc. | Ultraviolet curable silver composition and related method |
US6713000B2 (en) * | 1999-04-14 | 2004-03-30 | Allied Photochemical, Inc. | Ultraviolet curable silver composition and related method |
JP2001207088A (en) * | 2000-01-27 | 2001-07-31 | Matsushita Electric Ind Co Ltd | Silver ink and its manufacturing method, and method for manufacturing electronic part |
WO2002020872A3 (en) * | 2000-09-06 | 2003-01-16 | Allied Photochemical Inc | Uv curable silver chloride compositions for producing silver coatings |
WO2003038838A1 (en) * | 2001-10-31 | 2003-05-08 | Fujikura Kasei Co., Ltd. | Ag COMPOUND PASTE |
US6942825B2 (en) | 2001-10-31 | 2005-09-13 | Fujikura Kasei Co., Ltd. | Silver compound paste |
JP2004168961A (en) * | 2002-11-22 | 2004-06-17 | Konica Minolta Holdings Inc | Active energy beam-curing type ink and printed material by using the same |
JP2006519291A (en) * | 2003-01-29 | 2006-08-24 | パレレック インコーポレイテッド | High conductivity ink with improved adhesion |
JP2005248061A (en) * | 2004-03-05 | 2005-09-15 | Toyo Ink Mfg Co Ltd | Conductive ink and non-contact medium using the same |
JP4595353B2 (en) * | 2004-03-05 | 2010-12-08 | 東洋インキ製造株式会社 | Conductive ink and non-contact type medium using the same |
KR100660928B1 (en) * | 2004-09-25 | 2006-12-26 | 주식회사 잉크테크 | Organic silver ink for direct wiring |
WO2007029902A1 (en) * | 2005-09-07 | 2007-03-15 | Exax Inc. | Silver organo-sol ink for forming electrically conductive patterns |
US7976737B2 (en) | 2005-09-07 | 2011-07-12 | Exax Inc. | Silver organo-sol ink for forming electronically conductive patterns |
JP2007182547A (en) * | 2005-12-30 | 2007-07-19 | Ind Technol Res Inst | Highly electroconductive ink composition and method for producing metallic electroconductive pattern |
JP4653716B2 (en) * | 2005-12-30 | 2011-03-16 | 財団法人工業技術研究院 | Highly conductive ink composition and method for producing metal conductive pattern |
WO2007094567A1 (en) * | 2006-02-13 | 2007-08-23 | Exax Inc. | Silver organo-sol ink for forming electrically conductive patterns |
US8070986B2 (en) * | 2007-01-30 | 2011-12-06 | Exax Inc. | Silver paste for forming conductive layers |
JP2012503840A (en) * | 2008-08-29 | 2012-02-09 | エスエスシーピー・カンパニー・リミテッド | Conductive paste composition |
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