JPH0527402A - Photosensitive material processing device - Google Patents
Photosensitive material processing deviceInfo
- Publication number
- JPH0527402A JPH0527402A JP20548991A JP20548991A JPH0527402A JP H0527402 A JPH0527402 A JP H0527402A JP 20548991 A JP20548991 A JP 20548991A JP 20548991 A JP20548991 A JP 20548991A JP H0527402 A JPH0527402 A JP H0527402A
- Authority
- JP
- Japan
- Prior art keywords
- processing
- liquid
- tank
- photosensitive material
- passage
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Photographic Processing Devices Using Wet Methods (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、ハロゲン化銀写真感光
材料(以下、単に感光材料という)を湿式処理する感光
材料処理装置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a light-sensitive material processing apparatus for wet-processing a silver halide photographic light-sensitive material (hereinafter, simply referred to as light-sensitive material).
【0002】[0002]
【従来の技術】感光材料の湿式処理は、2以上の処理槽
内に貯溜されている処理液(例えば、現像液、漂白液、
定着液、水洗水等)中に感光材料を順次搬送して浸漬す
ることにより行われる。2. Description of the Related Art Wet processing of light-sensitive materials is carried out by processing solutions (for example, developing solution, bleaching solution, etc.) stored in two or more processing tanks.
It is carried out by successively transporting and immersing the light-sensitive material in a fixing solution, washing water, etc.).
【0003】従来、このような処理を行う感光材料処理
装置では、各処理槽内に貯留された処理液の液面は開放
しているため、処理液の蒸発や温度低下、空気との接触
による処理液の変質・劣化等の問題が生じていた。Conventionally, in a photosensitive material processing apparatus for performing such processing, since the liquid level of the processing liquid stored in each processing tank is open, it is caused by evaporation of the processing liquid, temperature drop, and contact with air. Problems such as alteration / deterioration of the treatment liquid occurred.
【0004】これを解決するものとして、処理液の液面
をパラフィンのような流体層で覆うとともに、感光材料
の処理液中への搬入および処理液外への搬出を可能とす
るために、流体層に開口を形成する開口形成手段を設け
た感光材料処理装置が開示されている(特開平01−3
10351号)。As a solution to this problem, the surface of the processing liquid is covered with a fluid layer such as paraffin, and the fluid is used to allow the photosensitive material to be carried in and out of the processing liquid. There is disclosed a photosensitive material processing apparatus provided with an opening forming means for forming an opening in a layer (Japanese Patent Laid-Open No. 01-3.
10351).
【0005】しかしながら、感光材料処理装置では、開
口形成手段は、例えば、駆動源、可動板、これらを接続
するリンク機構等で構成されており、感光材料が通過す
る毎これらが作動するため、構造が複雑であり、装置の
大型化を招くという問題がある。また、可動部に処理液
中の成分が析出したり、可動部が腐食したりすることが
原因で、故障が生じることもある。However, in the light-sensitive material processing apparatus, the opening forming means is composed of, for example, a drive source, a movable plate, a link mechanism connecting these, and the like, and these are activated each time the light-sensitive material passes, so that the structure is formed. However, there is a problem that the device is complicated and the device becomes large. Further, a failure may occur due to the components in the treatment liquid being deposited on the movable part or the movable part being corroded.
【0006】また、近年では、装置の小型化や環境問題
等の観点から、処理液の補充量および排液量をより低減
することが課題とされているが、上記感光材料処理装置
では、処理液の補充量および排液量を低減する工夫はな
されていない。In recent years, from the viewpoints of downsizing of the apparatus, environmental problems, etc., it has been a subject to further reduce the replenishment amount and the drainage amount of the processing liquid. No measures have been taken to reduce the liquid replenishment amount and drainage amount.
【0007】[0007]
【発明が解決しようとする課題】本発明の目的は、簡易
な構成で処理液の蒸発や変質・劣化を防止することがで
き、また、処理液の補充量および排液量を低減すること
ができる感光材料処理装置を提供することにある。SUMMARY OF THE INVENTION An object of the present invention is to prevent evaporation, deterioration and deterioration of a processing liquid with a simple structure, and to reduce the amount of the processing liquid to be replenished and the amount of the discharged liquid. An object of the present invention is to provide a photosensitive material processing device capable of processing.
【0008】[0008]
【課題を解決するための手段】このような目的は、下記
(1)の本発明により達成される。The above object is achieved by the present invention described in (1) below.
【0009】(1) ハロゲン化銀写真感光材料を湿式
で処理する感光材料処理装置であって、処理液が入れら
れた複数の処理槽と、前記ハロゲン化銀写真感光材料を
所定の経路で搬送する搬送手段と、隣接する処理槽同士
を連通する槽間移動用通路と、前記ハロゲン化銀写真感
光材料の搬入用通路と、前記ハロゲン化銀写真感光材料
の搬出用通路と、前記槽間移動用通路、搬入用通路およ
び搬出用通路のそれぞれにこれらの通路を遮蔽するよう
に設置されたブレードと、前記各処理槽内の処理液液面
に浮上し、この液面を覆う流体層と、前記各処理液の液
面レベルが一定となるように処理液を補充する補充装置
とを有することを特徴とする感光材料処理装置。(1) A light-sensitive material processing apparatus for wet-processing a silver halide photographic light-sensitive material, comprising a plurality of processing tanks containing a processing solution and the silver halide photographic light-sensitive material conveyed through a predetermined route. Transporting means, a passage between tanks for communicating adjacent processing tanks, a passage for carrying in the silver halide photographic light-sensitive material, a passage for carrying out the silver halide photographic light-sensitive material, and a movement between the tanks. Blades, which are installed so as to shield these passages in each of the passage for carrying in, the passage for carrying in and the passage for carrying out, and a fluid layer which floats on the liquid surface of the processing liquid in each of the processing tanks and covers the liquid surface, A photosensitive material processing apparatus, comprising: a replenishing device that replenishes the processing liquid so that the liquid level of each processing liquid becomes constant.
【0010】[0010]
【実施例】以下、本発明の感光材料処理装置を、添付図
面に示す好適実施例について詳細に説明する。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS The photosensitive material processing apparatus of the present invention will be described in detail below with reference to the preferred embodiments shown in the accompanying drawings.
【0011】図1は、本発明の感光材料処理装置の構成
例を示す断面側面図、図2は、図1中のII−II線での断
面図である。これらの図に示すように、感光材料処理装
置1Aは、図示しないケーシングを有し、このケーシン
グ内には、それぞれ所定の容積を有する現像槽2、漂白
槽3、定着槽4、水洗槽5および安定化槽6が、図1中
左側からこの順に並設されている。FIG. 1 is a sectional side view showing a structural example of a photosensitive material processing apparatus of the present invention, and FIG. 2 is a sectional view taken along line II-II in FIG. As shown in these drawings, the photosensitive material processing apparatus 1A has a casing (not shown), and inside the casing, a developing tank 2, a bleaching tank 3, a fixing tank 4, a washing tank 5 and The stabilizing tanks 6 are arranged side by side in this order from the left side in FIG.
【0012】これらの処理槽2〜6には、それぞれ現像
液、漂白液、定着液、水洗水および安定化液が、所定の
レベルまで入れられている。これらの各処理液は、図示
しないヒータ等の加温手段により、例えば、20〜50
℃程度の温度に温調されている。Each of these processing tanks 2 to 6 contains a developing solution, a bleaching solution, a fixing solution, washing water, and a stabilizing solution up to a predetermined level. Each of these processing liquids is, for example, 20 to 50 by a heating means such as a heater (not shown).
The temperature is controlled to about ℃.
【0013】処理槽2〜6には、例えばネガフィルムの
ような感光材料Sを各槽内を所定の経路で搬送する搬送
ローラ7が配置されている。また、各処理槽2〜6の底
部付近には、下降してきた感光材料Sを上方向へ向ける
円弧状の反転ガイド8が設置されている。このような搬
送ローラ7、反転ガイド8等により、感光材料Sの搬送
手段が構成される。In the processing tanks 2 to 6, there are arranged carrying rollers 7 for carrying a photosensitive material S such as a negative film through a predetermined path in each tank. Further, an arc-shaped inversion guide 8 for directing the descending photosensitive material S upward is installed near the bottoms of the processing tanks 2 to 6. The transport roller 7, the reversing guide 8 and the like constitute a transport unit for the photosensitive material S.
【0014】現像槽2と漂白槽3との間の槽壁9には、
槽壁9を貫通する筺体10が設置され、この筺体10内
に現像槽2と漂白槽3とを連通し感光材料Sが通過する
槽間移動用通路11が形成される。また、漂白槽3と定
着槽4、定着槽4と水洗槽5、水洗槽5と安定化槽6と
の間の各槽壁9にも、同様の筺体10が設置され、槽間
移動用通路11が形成されている。On the tank wall 9 between the developing tank 2 and the bleaching tank 3,
A housing 10 is installed so as to penetrate the tank wall 9, and an inter-tank moving passage 11 that connects the developing tank 2 and the bleaching tank 3 and through which the photosensitive material S passes is formed in the housing 10. In addition, the same housing 10 is installed on each tank wall 9 between the bleaching tank 3 and the fixing tank 4, the fixing tank 4 and the washing tank 5, and the washing tank 5 and the stabilizing tank 6, and a passage for moving between tanks is provided. 11 is formed.
【0015】筺体10の上部先端部は湾曲しており、槽
間移動用通路11を通過した感光材料Sが次の処理槽内
にて下方に搬送されるようなガイドの役割を果してい
る。The tip of the upper portion of the housing 10 is curved, and plays a role of a guide so that the photosensitive material S passing through the inter-tank moving passage 11 is conveyed downward in the next processing tank.
【0016】各槽間移動用通路11内には、槽間移動用
通路11を実質的に遮蔽する一対のブレード12が設置
されている。A pair of blades 12 that substantially shield the inter-tank movement passage 11 are installed in each inter-tank movement passage 11.
【0017】ブレード12は、好ましくは先端に向かっ
て厚さが漸減する薄肉状の弾性材料で構成され、その先
端部同士を密着させて設置することにより、槽間移動用
通路11における処理液の流通を実質的に遮断している
(シール効果)。また、ブレード12間を感光材料Sが
通過する際には、感光材料Sが密着している両ブレード
12の先端部を押し広げ、その先端部と摺動しつつ通過
する。このとき、感光材料Sの両面に付着した処理液は
拭い取られ(スクイズ効果)次の処理槽への持ち込みが
防止される。上記シール効果およびスクイズ効果によ
り、コンタミによる処理液の劣化が防止され、良好な写
真性が得られると共に、処理液の補充量および排液量の
低減が可能となる。 ブレード12の構成材料として
は、例えば、天然ゴム、イソプレンゴム、クロロプレン
ゴム、ブチルゴム、フッ素ゴム、ブタジエンゴム、スチ
レンブタジエンゴム、エチレンプロピレンゴム、シリコ
ーンゴム、クロロスルホン化ポリエチレン、ウレタンゴ
ム、多硫化ゴム、アクリルゴム、エピクロルヒドリンゴ
ム等の各種ゴムや、シリコーン樹脂、軟質ポリ塩化ビニ
ル、ポリエチレン(特に、中密度または低密度PE)、
ポリプロピレン、フッ素樹脂、アイオノマー樹脂、サー
モラン、サンプレーン、ミラストマー、ハイトレルのよ
うなエラストマー等の各種軟質樹脂等を挙げることがで
きる。The blade 12 is preferably made of a thin elastic material whose thickness gradually decreases toward the tip, and by installing the tip portions in close contact with each other, the treatment liquid in the passage 11 for moving between tanks can be treated. It substantially blocks distribution (seal effect). Further, when the photosensitive material S passes between the blades 12, the photosensitive material S pushes and spreads the tips of the blades 12 in close contact with each other, and slides on the tips. At this time, the processing liquid adhering to both surfaces of the photosensitive material S is wiped off (squeeze effect), and it is prevented from being brought into the next processing tank. Due to the sealing effect and the squeeze effect, deterioration of the processing liquid due to contamination can be prevented, good photographic properties can be obtained, and the replenishment amount and drainage amount of the processing liquid can be reduced. As the constituent material of the blade 12, for example, natural rubber, isoprene rubber, chloroprene rubber, butyl rubber, fluororubber, butadiene rubber, styrene butadiene rubber, ethylene propylene rubber, silicone rubber, chlorosulfonated polyethylene, urethane rubber, polysulfide rubber, Various rubbers such as acrylic rubber and epichlorohydrin rubber, silicone resin, soft polyvinyl chloride, polyethylene (especially medium or low density PE),
Examples include various soft resins such as polypropylene, fluororesins, ionomer resins, thermolans, sunplanes, milastomers, and elastomers such as Hytrel.
【0018】また、これらのうちでも、耐久性に優れる
材料が好ましく、この点では、ウレタンゴム、フッ素樹
脂、天然ゴム、ブタジエンゴム、クロロプレンゴム、ポ
リプロピレンまたは上記各種エラストマーが好ましい。Of these, materials having excellent durability are preferable, and in this respect, urethane rubber, fluororesin, natural rubber, butadiene rubber, chloroprene rubber, polypropylene or the above various elastomers are preferable.
【0019】ブレード12の先端部同士の接触面圧は、
上記シール効果およびスクイズ効果が有効に発揮される
程度に調整され、10〜500g/cm2 程度、特に、30
〜150g/cm2 程度とするのが好ましい。The contact surface pressure between the tips of the blades 12 is
It is adjusted to the extent that the above-mentioned sealing effect and squeeze effect are effectively exerted, and is approximately 10 to 500 g / cm 2 , particularly 30
It is preferably about 150 g / cm 2 .
【0020】なお、図示の例では、一対のブレードが示
されているが、これに限らず、例えば、筺体10の一方
の内壁に一片のブレードの基部を固定し、そのブレード
の先端部が筺体10の他方の内壁に接触するような構成
とすることもできる。この場合、筺体内壁のブレード先
端部が接触する部分は、通路11内に向けて突出してい
るのが好ましい。Although a pair of blades are shown in the illustrated example, the present invention is not limited to this. For example, the base of one blade is fixed to one inner wall of the housing 10, and the tip of the blade is attached to the housing. The other inner wall of 10 may be contacted. In this case, it is preferable that a portion of the inner wall of the housing which is brought into contact with the blade tip end portion projects into the passage 11.
【0021】各処理槽2〜6内の処理液の液面13に
は、液面13全体を覆う流体層14が浮上している。こ
れにより、処理液の蒸発や変質・劣化を防止することが
できる。On the liquid surface 13 of the processing liquid in each of the processing tanks 2 to 6, a fluid layer 14 that covers the entire liquid surface 13 floats. As a result, it is possible to prevent the processing liquid from evaporating and being deteriorated or deteriorated.
【0022】流体層14を構成する流体は、処理液より
比重が小さく(好ましくは、比重が1.0未満)、処理
液と相溶、混和せず、かつ処理液と反応して感光材料の
処理性に悪影響を及ぼすことがないものである。また、
この流体(液状または半固状)は、比較的粘度が高いも
の、例えば、温度20〜50℃で5〜500cps 程度、
特に、30〜200cps 程度のものであるのが好まし
い。The fluid constituting the fluid layer 14 has a specific gravity smaller than that of the processing liquid (preferably a specific gravity of less than 1.0), is not compatible with or miscible with the processing liquid, and reacts with the processing liquid to form a photosensitive material. It does not adversely affect the processability. Also,
This fluid (liquid or semi-solid) has a relatively high viscosity, for example, about 5 to 500 cps at a temperature of 20 to 50 ° C.,
Particularly, it is preferably about 30 to 200 cps.
【0023】このような流体の具体例としては、流動パ
ラフィン、液晶、シリコーンオイル等の各種合成オイ
ル、亜麻仁油、桐油等の各種天然オイル、トリクレジイ
ルフォスフェート、ジブチルフェノール等を挙げること
ができ、そのなかでも特に、流動パラフィンやシリコー
ンオイルが好ましい。Specific examples of such a fluid include liquid paraffin, liquid crystals, various synthetic oils such as silicone oil, various natural oils such as flaxseed oil and tung oil, tricresylyl phosphate, dibutylphenol and the like. Of these, liquid paraffin and silicone oil are particularly preferable.
【0024】また、流体層14の厚さは、処理液の蒸
発、変質・劣化等を十分に防止し得る程度とすればよ
く、用いる流体の種類(組成)、流体による被覆面積等
にもよるが、例えば、流動パラフィンの場合、厚さ0.
1〜30mm程度、特に1〜15mm程度とするのが好まし
い。The thickness of the fluid layer 14 may be such that evaporation, alteration and deterioration of the treatment liquid can be sufficiently prevented, and it depends on the type (composition) of the fluid used and the area covered by the fluid. Is, for example, liquid paraffin, the thickness is 0.
It is preferably about 1 to 30 mm, particularly about 1 to 15 mm.
【0025】なお、本発明では、各処理槽2〜6毎に、
その処理液に適するように流体層14の厚さや流体の種
類を変えてもよい。In the present invention, each processing tank 2 to 6 is
The thickness of the fluid layer 14 and the type of fluid may be changed to suit the processing liquid.
【0026】また、図示と異なり、流体層14を構成す
る流体が、各処理槽2〜6同士を流通可能な構成として
もよい。Further, unlike the illustration, the fluid forming the fluid layer 14 may be configured to be able to flow through the respective processing tanks 2 to 6.
【0027】最初の処理槽である現像槽2には、内部に
感光材料Sを現像液中に搬入するための搬入用通路16
が形成された筺体15が設置されている。図1に示すよ
うに、この筺体15は、流体層14を貫通し、その下端
は現像液中に没しており、その上端は流体層14より上
方の空中に位置している。これにより、搬入用通路16
内には、流体層14の流体は侵入しないようになってい
る。A loading passage 16 for loading the photosensitive material S into the developing solution is provided in the developing tank 2 which is the first processing tank.
A housing 15 in which is formed is installed. As shown in FIG. 1, the housing 15 penetrates the fluid layer 14, its lower end is submerged in the developer, and its upper end is located above the fluid layer 14 in the air. As a result, the loading passage 16
The fluid of the fluid layer 14 does not enter the inside.
【0028】また、搬入用通路16内には、搬入用通路
16を実質的に遮蔽する前記ブレード11と同様のブレ
ード17が、その先端部を下方に向けて設置されてい
る。A blade 17 similar to the blade 11 that substantially shields the carry-in passage 16 is installed in the carry-in passage 16 with its tip end facing downward.
【0029】最後の処理槽である安定化槽6には、内部
に感光材料Sを安定液から搬出するための搬出用通路1
9が形成された筺体18が設置されている。図1に示す
ように、この筺体18は、流体層14を貫通し、その下
端は安定液中に没しており、その上端は流体層14より
上方の空中に位置している。これにより、搬出用通路1
9内には、流体層14の流体は侵入しないようになって
いる。The stabilizing bath 6, which is the last processing bath, has a passage 1 for carrying out the photosensitive material S from the stabilizing solution therein.
A housing 18 in which 9 is formed is installed. As shown in FIG. 1, the housing 18 penetrates the fluid layer 14, its lower end is immersed in the stabilizing liquid, and its upper end is located above the fluid layer 14 in the air. As a result, the unloading passage 1
The fluid of the fluid layer 14 does not enter into the inside 9.
【0030】また、搬出用通路19内には、搬出用通路
19を実質的に遮蔽する前記ブレード11と同様のブレ
ード20が、その先端部を上方に向けて設置されてい
る。A blade 20 similar to the blade 11 that substantially shields the unloading passage 19 is installed in the unloading passage 19 with its tip end facing upward.
【0031】このように、本発明では、感光材料Sを搬
入、搬出する手段は、駆動源や機械的な可動部がないた
め、構造の複雑化、装置の大型化を招くこともなく、故
障もない。As described above, according to the present invention, the means for loading and unloading the photosensitive material S does not have a drive source or mechanically movable portion, so that the structure does not become complicated and the apparatus becomes large in size, and it fails. Nor.
【0032】搬送ローラ7の回転により、感光材料S
は、まず搬入用通路16を通り、ブレード17間を経て
現像液中に導入され、反転ガイド8にて上方に向けて反
転した後、槽間移動用通路11を通り、ブレード11間
を経て漂白液中に導入され、以下同様にして定着液、水
洗水、安定液に順次浸漬され、搬出用通路19を通り、
ブレード20間を経て安定化槽6外へ搬出され、その
後、乾燥がなされる。このようにして感光材料Sは所定
の経路で搬送され、各処理液に順次浸漬されて処理され
るが、その間、大気中を通過せず、かつ流体層14の流
体と接触することはない。The photosensitive material S is rotated by the rotation of the conveying roller 7.
Is first introduced into the developer through the carrying-in passage 16 and between the blades 17, and is inverted upward by the reversing guide 8 and then passed through the inter-tank moving passage 11 and bleached between the blades 11. It is introduced into the solution, and thereafter similarly dipped in the fixing solution, the washing water, and the stabilizing solution in sequence, and passes through the carry-out passage 19,
It is carried out of the stabilizing tank 6 through the space between the blades 20 and then dried. In this way, the photosensitive material S is conveyed by a predetermined path and sequentially dipped in each processing solution for processing, but during that time, it does not pass through the atmosphere and does not come into contact with the fluid in the fluid layer 14.
【0033】各処理槽2〜6には、新たな処理液(補充
液)を補充する補充装置21が設置されている。漂白槽
3に設置された補充装置21について代表的に説明する
と、図2に示すように、補充装置21は、先端が漂白槽
3の底部を貫通して設置され、漂白液の補充液を漂白槽
3内に供給する給液管22と、この給液管22の途中に
設置されたポンプ23と、基端が漂白槽3の側壁を貫通
して設置された排液管24とで構成されている。A replenishing device 21 for replenishing a new processing liquid (replenishing liquid) is installed in each of the processing tanks 2 to 6. The replenishing device 21 installed in the bleaching tank 3 will be described representatively. As shown in FIG. 2, the replenishing device 21 has a tip penetrating the bottom of the bleaching tank 3 to bleach the replenishing solution of the bleaching solution. It is composed of a liquid supply pipe 22 for supplying into the bath 3, a pump 23 installed in the middle of the liquid supply pipe 22, and a drain pipe 24 having a base end penetrating a side wall of the bleaching bath 3. ing.
【0034】給液管22の基端は、処理液を貯留するス
トックタンク(図示せず)に接続されている。The base end of the liquid supply pipe 22 is connected to a stock tank (not shown) for storing the processing liquid.
【0035】排液管24の基端25は、漂白槽3内の漂
白液の液面13より所定距離下方の位置に設置され、排
液管24の先端26は、液面13とほぼ等しい高さに設
置される。The base end 25 of the drainage pipe 24 is installed at a position lower than the liquid level 13 of the bleaching liquid in the bleaching tank 3 by a predetermined distance, and the tip end 26 of the drainage pipe 24 has a height substantially equal to the liquid level 13. Will be installed.
【0036】このような補充装置21において、ポンプ
23を作動して、漂白液の補充液を給液管22を介して
漂白槽3内に供給すると、漂白槽3内の漂白液は増量
し、液面13は上昇傾向を示す。この増量分に相当する
疲労した漂白液は、排液管24を介して、オーバーフロ
ーにより漂白槽3外へ排出される。従って、漂白槽3内
の漂白液の液面レベルは、排液管24の先端26とほぼ
等しい高さに保持される。In such a replenishing device 21, when the pump 23 is operated to supply the bleaching liquid replenishing liquid into the bleaching tank 3 through the liquid supply pipe 22, the amount of the bleaching liquid in the bleaching tank 3 is increased, The liquid surface 13 shows a rising tendency. The fatigued bleaching solution corresponding to this increased amount is discharged to the outside of the bleaching tank 3 through the drainage pipe 24 by overflow. Therefore, the liquid level of the bleaching liquid in the bleaching tank 3 is maintained at a height almost equal to the tip 26 of the drainage pipe 24.
【0037】漂白槽3以外の処理槽2、4、5、6につ
いても、上記と同様の補充装置21が設置されている。The replenishing device 21 similar to the above is also installed in the processing tanks 2, 4, 5 and 6 other than the bleaching tank 3.
【0038】各処理液の供給量(補充量)の好ましい値
を下記表1に示す。The preferable values of the supply amount (replenishment amount) of each processing solution are shown in Table 1 below.
【0039】[0039]
【表1】 [Table 1]
【0040】本発明では、上述したように、処理液の蒸
発や変質・劣化が抑制されるので、表1に示すように、
各処理液の補充量は、従来の50〜90%程度と小量で
あり、その結果排液量も小量となる。In the present invention, as described above, the evaporation, alteration and deterioration of the treatment liquid are suppressed, so that as shown in Table 1,
The replenishment amount of each processing liquid is as small as 50 to 90% of the conventional amount, and as a result, the drainage amount is also small.
【0041】なお、このような処理液の補充は、感光材
料Sの処理と同期して行なうのが好ましい。It is preferable that the replenishment of the processing solution be performed in synchronization with the processing of the photosensitive material S.
【0042】図3は、本発明の感光材料処理装置の他の
構成例を示す断面側面図である。同図に示す感光材料処
理装置1Bは、処理液の補充装置の構成が異なる以外
は、前記感光材料処理装置1Aと同様である。従って、
前記感光材料処理装置1Aと同様の事項については、そ
の説明を省略する。FIG. 3 is a sectional side view showing another structural example of the photosensitive material processing apparatus of the present invention. The photosensitive material processing apparatus 1B shown in the figure is the same as the photosensitive material processing apparatus 1A except that the structure of the processing liquid replenishing device is different. Therefore,
Description of the same items as those of the photosensitive material processing apparatus 1A will be omitted.
【0043】感光材料処理装置1Bにおいて、各処理槽
2〜6には、新たな処理液(補充液)を補充する補充装
置29が設置されている。現像槽2に設置された補充装
置21について代表的に説明すると、補充装置29は、
現像液液面13より上方に位置する気密性の補充液タン
ク30と、この補充液タンク30の底部に接続され、補
充液タンク30内の補充液を現像槽2へ案内する供給路
31と、この供給路31の下端に設けられた下向きの補
充口32と、この補充口32に設けられ、流体層14に
浮くフロートよりなる第1の弁33と、この第1の弁3
3とは別個に開閉し、供給路31の上流側に設けられた
第2の弁34とで構成されている。In the photosensitive material processing apparatus 1B, a replenishing device 29 for replenishing a new processing liquid (replenishing liquid) is installed in each of the processing tanks 2 to 6. A typical description of the replenishing device 21 installed in the developing tank 2 is as follows.
An airtight replenisher tank 30 located above the developer level 13 and a supply path 31 connected to the bottom of the replenisher tank 30 for guiding the replenisher tank 30 to the developer tank 2. A downward replenishment port 32 provided at the lower end of the supply path 31, a first valve 33 provided at the replenishment port 32 and made of a float floating in the fluid layer 14, and the first valve 3
3, and a second valve 34 provided on the upstream side of the supply path 31 to open and close separately.
【0044】箱型をなす補充液タンク30は気密に構成
されており、供給路31のみを介して外部と連通してい
る。補充タンク30内には、現像液の補充液Rが満たさ
れている。この補充液Rの濃度は、現像槽2内の現像液
Dの濃度の1.0〜2.0倍程度に調整されているが好
ましい。The box-shaped replenisher tank 30 is airtight and communicates with the outside only through the supply passage 31. The replenishment tank 30 is filled with the replenisher R of the developer. The concentration of the replenisher R is preferably adjusted to about 1.0 to 2.0 times the concentration of the developer D in the developing tank 2.
【0045】補充液タンク30および供給路31は十分
な剛性を有していることが好ましく、例えば、ステンレ
スのような金属またはポリ塩化ビニル、ポリエチレン、
ポリカーボネート等の硬質プラスチックで構成されてい
る。The replenisher tank 30 and the supply passage 31 preferably have sufficient rigidity. For example, metal such as stainless steel or polyvinyl chloride, polyethylene,
It is made of hard plastic such as polycarbonate.
【0046】図3および図4は、それぞれ、補充装置2
9における供給路31付近を拡大して示す断面側面図で
あり、図3は弁33、34が閉じた状態、図4は弁3
3、34が開いた状態を示す。これらの図に示すよう
に、供給路31の下端には流体層14の液面140に対
向するように、水平な開口面を有する補充口32が設け
られ、この補充口32は、現像液Dの液面13の高さが
適正となるような液面140の高さに設定されている。3 and 4 respectively show the replenishing device 2
9 is an enlarged sectional side view showing the vicinity of the supply passage 31 in FIG. 9, FIG. 3 is a state in which valves 33 and 34 are closed, and FIG.
The state where 3, 34 are open is shown. As shown in these drawings, a replenishment port 32 having a horizontal opening surface is provided at the lower end of the supply path 31 so as to face the liquid surface 140 of the fluid layer 14. The height of the liquid surface 140 is set so that the height of the liquid surface 13 is appropriate.
【0047】補充口32には、板状を成す第1の弁33
が回動可能に取り付けられている。第1の弁33は、フ
ロートである弁体330と、補充口32の端部に設けら
れ、弁体330を開閉自在に支持する蝶番(支点)33
1とから構成されている。弁体330は、流体層14の
流体より比重が小さくなるように構成されている。The replenishing port 32 has a plate-shaped first valve 33.
Is rotatably attached. The first valve 33 is provided at the end of the valve body 330, which is a float, and the replenishment port 32, and a hinge (fulcrum) 33 that supports the valve body 330 in an openable and closable manner.
1 and 1. The valve body 330 is configured to have a smaller specific gravity than the fluid in the fluid layer 14.
【0048】弁体330を中実とした場合、その構成材
料としては、例えばポリエチレン(比重d=0.9
1)、変性ポリオレフィン(比重d=0.90)、エチ
レンビニルアセラート(比重d=0.93)等が挙げら
れる。また、弁体330を中空構造とすることもでき、
この場合には、あらゆる樹脂が使用可能である。When the valve body 330 is solid, its constituent material is, for example, polyethylene (specific gravity d = 0.9).
1), modified polyolefin (specific gravity d = 0.90), ethylene vinyl ascerate (specific gravity d = 0.93) and the like. Further, the valve body 330 may have a hollow structure,
In this case, any resin can be used.
【0049】供給路31内において、第1の弁33より
補充液タンク30側には、第2の弁34が設けられてい
る。この第2の弁34は、供給路31内の横段面積が漸
減する狭幅部341と、球状(または円柱状)の弁体3
42とから構成されている。In the supply passage 31, a second valve 34 is provided on the replenisher tank 30 side with respect to the first valve 33. The second valve 34 includes a narrow width portion 341 in which the horizontal area of the supply passage 31 gradually decreases, and a spherical (or columnar) valve body 3.
And 42.
【0050】弁体342は、補充液Rよりも比重が小さ
く、その外径は、狭幅部341の最小内径(または幅)
より大きく、これにより、弁体342はその浮力により
上方へ付勢され、狭幅部341の開口343を遮蔽す
る。The valve body 342 has a smaller specific gravity than the replenisher R, and its outer diameter is the minimum inner diameter (or width) of the narrow portion 341.
The valve body 342 is larger, and thus the valve body 342 is urged upward by its buoyancy to block the opening 343 of the narrow portion 341.
【0051】弁体342は、中実でも中空でもよく、そ
の構成材料も前記第1の弁33の弁体330と同様のも
のが使用可能である。The valve element 342 may be solid or hollow, and the constituent material thereof may be the same as that of the valve element 330 of the first valve 33.
【0052】また、各処理槽2〜6の底部には、それぞ
れ、処理槽2〜6に連通する排液管35が接続されてお
り、これらの各排液管35の途中には、電磁バルブのよ
うなバルブ36が設置されている。このバルブ36は、
通常は閉じた状態とされているが、処理液の補充をする
際には、所定時間開状態とされ、これにより各処理槽2
〜6内の処理液は、落差により排出される。Further, drain pipes 35 communicating with the treatment baths 2 to 6 are connected to the bottoms of the treatment baths 2 to 6, and electromagnetic valves are provided in the middle of the drain pipes 35. The valve 36 like this is installed. This valve 36
Normally, it is in a closed state, but when replenishing the processing liquid, it is opened for a predetermined time, whereby each processing tank 2
The processing liquids in 6 to 6 are discharged due to the head.
【0053】なお、バルブ36に代え、処理液排液用の
ポンプを設置してもよい。Instead of the valve 36, a pump for discharging the processing liquid may be installed.
【0054】次に、感光材料処理装置1Bにおける補充
装置29の作用について説明する。Next, the operation of the replenishing device 29 in the photosensitive material processing apparatus 1B will be described.
【0055】図4に示すように、補充口32が流体層1
4の液面140と接触している場合には、補充液タンク
30内に空気が入らないため、補充液Rの供給は行われ
ない。As shown in FIG. 4, the replenishment port 32 has the fluid layer 1
4 is in contact with the liquid surface 140, the air does not enter the replenisher tank 30, so that the replenisher R is not supplied.
【0056】感光材料Sの処理に際しては、バルブ36
を所定時間開き、前記表1に示すような量の現像液を排
液管35を介して現像槽2外へ排出する。これにより、
現像槽2内の現像液が減少し、図5に示すように、液面
13および140が下降し、液面140が補充口32か
ら離れ、この液面140に追随して弁体330が下降
し、第1の弁33が開く。When processing the photosensitive material S, the valve 36 is used.
Is opened for a predetermined time, and the amount of the developing solution as shown in Table 1 is discharged to the outside of the developing tank 2 through the drain pipe 35. This allows
As the developer in the developing tank 2 decreases, as shown in FIG. 5, the liquid surfaces 13 and 140 descend, the liquid surface 140 separates from the replenishment port 32, and the valve body 330 descends following the liquid surface 140. Then, the first valve 33 opens.
【0057】そのため、補充口32から補充液Rが流出
し、同時に補充口32から空気が入り込み、供給路31
内を浮上し、補充タンク30内に溜る。このとき、補充
口32からの補充液Rの流出に伴なって、上方の補充液
タンク30から補充液Rが供給路31内を流下し、第2
の弁34の弁体342が押し下げられて、第2の弁34
が開放する。補充液Rの流出量、すなわち、現像槽への
供給量は、前記排液管35からの排液量にほぼ等しい量
である。Therefore, the replenishing liquid R flows out from the replenishing port 32, and at the same time, air enters from the replenishing port 32, and the supply passage 31
The inside is floated and accumulated in the replenishment tank 30. At this time, with the outflow of the replenishment liquid R from the replenishment port 32, the replenishment liquid R flows down from the upper replenishment liquid tank 30 in the supply path 31,
The valve body 342 of the second valve 34 is pushed down, and the second valve 34
Opens. The outflow amount of the replenishing liquid R, that is, the supply amount to the developing tank is substantially equal to the drainage amount from the drainage pipe 35.
【0058】このような補充液Rの供給によって液面1
3および140が再度上昇し、補充口32に液面140
が達すると、これに伴ない、弁体330はその浮力によ
り上昇して、第1の弁33が閉じ、また同時に、弁体3
42の浮上により狭幅部341の開口343を遮蔽して
第2の弁34も閉じ、補充液Rの供給は止まる。By supplying such a replenisher R, the liquid level 1
3 and 140 rise again, and the liquid level 140
Then, the valve body 330 rises due to its buoyancy, the first valve 33 closes, and at the same time, the valve body 3
Due to the floating of 42, the opening 343 of the narrow portion 341 is blocked, the second valve 34 is also closed, and the supply of the replenisher R is stopped.
【0059】このような構成とすることによって、液面
13の下降、特に、極わずかな下降に対しても直ちに補
充液Rが供給されるので、現像液Dの液面13を適正な
レベルに一定に保つことが可能となる。このように、現
像液Dの液面レベルが一定であるため、処理時間が変動
することなく、処理性のバラツキが防止できる。With such a structure, the replenisher R is immediately supplied even when the liquid level 13 is lowered, in particular, even when the liquid level 13 is extremely lowered, so that the liquid level 13 of the developing solution D is brought to an appropriate level. It is possible to keep it constant. In this way, since the liquid surface level of the developing solution D is constant, it is possible to prevent variations in processability without changing the processing time.
【0060】なお、補充液Rは、前記排液管35から排
液を行なったときのみ供給されるのではなく、他の要
因、例えば、感光材料Sによる現像液の持ち出しにより
液面13および140が下降したときにも、これを回復
すべく供給される。現像液については、感光材料Sによ
る持ち出し量等によっては、排液管35から排液を行な
わなくてもよいことがある。Note that the replenisher R is not supplied only when the liquid is drained from the drain pipe 35, but is caused by other factors, for example, by taking out the developer by the photosensitive material S, the liquid surfaces 13 and 140. When is lowered, it is supplied to recover it. The developer may not be drained from the drain pipe 35 depending on the carry-out amount of the photosensitive material S and the like.
【0061】現像槽2以外の処理槽3〜6についても、
補充装置29の構成、作用は前記と同様である。Regarding the processing tanks 3 to 6 other than the developing tank 2,
The configuration and operation of the replenishing device 29 are the same as described above.
【0062】本発明の感光材料処理装置において、処理
対象とされ感光材料Sの種類は特に限定されず、カラー
および黒白のいずれであってもよい。例えば、カラーネ
ガフィルム、カラー反転フィルム、カラーポジフィル
ム、カラー印画紙、カラー反転印画紙、黒白ネガフィル
ム、黒白反転フィルム、X線写真感光材料、黒白印画
紙、黒白反転印画紙、マイクロフィルム等が挙げられ、
そのサイズも特に限定されない。In the light-sensitive material processing apparatus of the present invention, the kind of the light-sensitive material S to be processed is not particularly limited and may be color or black and white. For example, color negative film, color reversal film, color positive film, color photographic paper, color reversal photographic paper, black and white negative film, black and white reversal film, X-ray photographic light sensitive material, black and white photographic paper, black and white reversal photographic paper, microfilm and the like. ,
The size is also not particularly limited.
【0063】また、本発明の感光材料処理装置は、例え
ば、大型自動現像機、小型自動現像機(ミニラボ)、湿
式の複写機、プリンタープロセッサー、ビデオプリンタ
ープロセッサー、写真プリント作成コインマシーン、検
版用カラーペーパー処理機等の各種感光材料処理装置に
適用することができる。The light-sensitive material processing apparatus of the present invention is, for example, a large automatic developing machine, a small automatic developing machine (minilab), a wet copying machine, a printer processor, a video printer processor, a photographic print making coin machine, and a plate inspection machine. It can be applied to various photosensitive material processing devices such as color paper processing machines.
【0064】以上、本発明の感光材料処理装置を、図示
の構成例について説明したが、本発明は、これらに限定
されるものではない。特に、処理槽の構成、配列につい
ては、処理する感光材料の種類等に応じて適宜決定さ
れ、例えば、カラー印画紙の処理では、通常、現像槽、
漂白定着槽および水洗槽の3槽を並設した構成となる。
また、隣接する処理槽間、例えば現像槽2と漂白槽3と
の間に、予備水洗槽や調整槽を設ける等、種々の目的の
処理槽を追加することもできる。Although the photosensitive material processing apparatus of the present invention has been described above with reference to the illustrated structural examples, the present invention is not limited to these. In particular, the configuration and arrangement of the processing tank are appropriately determined according to the type of photosensitive material to be processed, and for example, in the processing of color photographic paper, a developing tank is usually used.
The bleach-fixing tank and the washing tank are arranged side by side.
Further, it is possible to add processing tanks for various purposes such as providing a preliminary water washing tank or an adjusting tank between adjacent processing tanks, for example, between the developing tank 2 and the bleaching tank 3.
【0065】[0065]
【発明の効果】以上述べたように、本発明の感光材料処
理装置によれば、処理液に浮上する流体層により処理液
の液面を覆うため、処理液の蒸発や変質・劣化を防止す
ることができ、そのため、処理液の補充量および排液量
を低減することができる。As described above, according to the photosensitive material processing apparatus of the present invention, since the liquid surface of the processing liquid is covered with the fluid layer that floats on the processing liquid, the evaporation, deterioration and deterioration of the processing liquid are prevented. Therefore, the replenishment amount and the drainage amount of the processing liquid can be reduced.
【0066】しかも、感光材料を搬入、搬出する手段と
して、駆動源や機械的な可動部を設けなくてもよいた
め、構造の複雑化、装置の大型化を招くこともなく、故
障もない。Moreover, since it is not necessary to provide a driving source or a mechanically movable portion as means for loading and unloading the photosensitive material, the structure is not complicated, the apparatus is not enlarged, and there is no failure.
【0067】さらに、処理液の液面が一定に保たれるた
め、液面の変動による処理性のバラツキが防止され、良
好な写真性と安定的に得ることができる。Furthermore, since the liquid level of the processing liquid is kept constant, variations in processability due to fluctuations in the liquid level are prevented, and good photographic properties and stable photographic properties can be obtained.
【図1】本発明の感光材料処理装置の構成例を示す断面
側面図である。FIG. 1 is a sectional side view showing a configuration example of a photosensitive material processing apparatus of the present invention.
【図2】図1中のII−II線での断面図である。FIG. 2 is a sectional view taken along line II-II in FIG.
【図3】本発明の感光材料処理装置の他の構成例を示す
断面側面図である。FIG. 3 is a sectional side view showing another configuration example of the photosensitive material processing apparatus of the present invention.
【図4】補充装置の構成例を示す拡大断面側面図であ
る。FIG. 4 is an enlarged cross-sectional side view showing a configuration example of a replenishing device.
【図5】補充装置の構成例を示す拡大断面側面図であ
る。FIG. 5 is an enlarged cross-sectional side view showing a configuration example of a replenishing device.
1A、1B 感光材料処理装置 2 現像槽 3 漂白槽 4 定着槽 5 水洗槽 6 安定化槽 7 搬送ローラ 8 反転ガイド 9 槽壁 10 筺体 11 槽間移動用通路 12 ブレード 13 液面 14 流体層 15 筺体 16 搬入用通路 17 ブレード 18 筺体 19 搬出用通路 20 ブレード 21 補充装置 22 給液管 23 ポンプ 24 排液管 25 基端 26 先端 29 補充装置 30 補充液タンク 31 供給路 32 補充口 33 第1の弁 330 弁体 331 蝶番 34 第2の弁 341 狭幅部 342 弁体 343 開口 35 排液管 36 バルブ D 現像液 R 補充液 S 感光材料 1A, 1B Photosensitive material processing device 2 Developing tank 3 Bleaching tank 4 Fixing tank 5 Rinsing tank 6 Stabilizing tank 7 Conveying roller 8 Reversing guide 9 Tank wall 10 Housing 11 Tank moving passage 12 Blade 13 Liquid level 14 Fluid layer 15 Housing 16 Carrying In Passage 17 Blade 18 Enclosure 19 Carrying Out Passage 20 Blade 21 Replenishing Device 22 Liquid Supply Pipe 23 Pump 24 Drainage Pipe 25 Base End 26 Tip 29 Replenishing Device 30 Replenishing Liquid Tank 31 Supply Channel 32 Replenishing Port 33 First Valve 330 valve body 331 hinge 34 second valve 341 narrow portion 342 valve body 343 opening 35 drainage pipe 36 valve D developer R replenisher S photosensitive material
Claims (1)
する感光材料処理装置であって、 処理液が入れられた複数の処理槽と、前記ハロゲン化銀
写真感光材料を所定の経路で搬送する搬送手段と、隣接
する処理槽同士を連通する槽間移動用通路と、前記ハロ
ゲン化銀写真感光材料の搬入用通路と、前記ハロゲン化
銀写真感光材料の搬出用通路と、前記槽間移動用通路、
搬入用通路および搬出用通路のそれぞれにこれらの通路
を遮蔽するように設置されたブレードと、前記各処理槽
内の処理液液面に浮上し、この液面を覆う流体層と、前
記各処理液の液面レベルが一定となるように処理液を補
充する補充装置とを有することを特徴とする感光材料処
理装置。Claim: What is claimed is: 1. A photosensitive material processing apparatus for wet-processing a silver halide photographic light-sensitive material, comprising: a plurality of processing tanks containing a processing solution; and the silver halide photographic light-sensitive material. Conveying means for conveying along a predetermined path, inter-tank moving passages for communicating adjacent processing tanks, a passage for carrying in the silver halide photographic light-sensitive material, and a passage for carrying out the silver halide photographic light-sensitive material. , A passage for moving between the tanks,
Blades installed so as to shield these passages in the carry-in passage and the carry-out passage, respectively, a fluid layer that floats on the liquid surface of the treatment liquid in each treatment tank and covers the liquid surface, and each treatment. And a replenishing device for replenishing the processing liquid so that the liquid surface level becomes constant.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3205489A JP2722421B2 (en) | 1991-07-22 | 1991-07-22 | Photosensitive material processing equipment |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3205489A JP2722421B2 (en) | 1991-07-22 | 1991-07-22 | Photosensitive material processing equipment |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH0527402A true JPH0527402A (en) | 1993-02-05 |
JP2722421B2 JP2722421B2 (en) | 1998-03-04 |
Family
ID=16507704
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3205489A Expired - Lifetime JP2722421B2 (en) | 1991-07-22 | 1991-07-22 | Photosensitive material processing equipment |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2722421B2 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0631185A1 (en) * | 1993-06-11 | 1994-12-28 | Fuji Photo Film Co., Ltd. | Method for continuously processing silver halide color photosensitive material |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01310351A (en) * | 1988-06-09 | 1989-12-14 | Fuji Photo Film Co Ltd | Device for processing photosensitive material |
JPH01319038A (en) * | 1988-06-20 | 1989-12-25 | Fuji Photo Film Co Ltd | Automatic developing device for silver halide photography |
-
1991
- 1991-07-22 JP JP3205489A patent/JP2722421B2/en not_active Expired - Lifetime
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01310351A (en) * | 1988-06-09 | 1989-12-14 | Fuji Photo Film Co Ltd | Device for processing photosensitive material |
JPH01319038A (en) * | 1988-06-20 | 1989-12-25 | Fuji Photo Film Co Ltd | Automatic developing device for silver halide photography |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0631185A1 (en) * | 1993-06-11 | 1994-12-28 | Fuji Photo Film Co., Ltd. | Method for continuously processing silver halide color photosensitive material |
Also Published As
Publication number | Publication date |
---|---|
JP2722421B2 (en) | 1998-03-04 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPH02124570A (en) | Processing device for photosensitive material | |
JPH0527402A (en) | Photosensitive material processing device | |
US5669035A (en) | Apparatus for processing a silver halide photosensitive material | |
JP4359410B2 (en) | Photosensitive material processing equipment | |
JP2696762B2 (en) | Photosensitive material processing equipment | |
JP2648986B2 (en) | Photosensitive material processing equipment | |
JP2722425B2 (en) | Photosensitive material processing equipment | |
JP2759294B2 (en) | Photosensitive material processing equipment with air shut off by water development | |
JP3768562B2 (en) | Photosensitive material processing equipment | |
US5093678A (en) | Processor with laminar fluid flow wick | |
JP2668299B2 (en) | Photosensitive material processing equipment | |
JPH02205846A (en) | Processing device for photosensitive material | |
JP2648978B2 (en) | Photosensitive material processing equipment | |
JPH07175194A (en) | Photograph-liquid processing station | |
JP3545509B2 (en) | Photosensitive material processing equipment | |
JP3657716B2 (en) | Photosensitive material processing equipment | |
JP3614999B2 (en) | Photosensitive material processing equipment | |
JP2648986C (en) | ||
JPH01267648A (en) | Device and method for processing photosensitive material | |
JP2722427B2 (en) | Blade assembly and photosensitive material processing apparatus | |
JPH0268548A (en) | Device for processing photosensitive material | |
JPH04237045A (en) | Photosensitive material processing device | |
JPH04269745A (en) | Device for processing photosensitive material | |
JP2813842B2 (en) | Photosensitive material processing equipment | |
JPH03257451A (en) | Washing device for photosensitive material |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
S111 | Request for change of ownership or part of ownership |
Free format text: JAPANESE INTERMEDIATE CODE: R313111 |
|
FPAY | Renewal fee payment (prs date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20071128 Year of fee payment: 10 |
|
R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
FPAY | Renewal fee payment (prs date is renewal date of database) |
Year of fee payment: 10 Free format text: PAYMENT UNTIL: 20071128 |
|
FPAY | Renewal fee payment (prs date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20081128 Year of fee payment: 11 |
|
FPAY | Renewal fee payment (prs date is renewal date of database) |
Year of fee payment: 12 Free format text: PAYMENT UNTIL: 20091128 |
|
FPAY | Renewal fee payment (prs date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20091128 Year of fee payment: 12 |
|
FPAY | Renewal fee payment (prs date is renewal date of database) |
Year of fee payment: 13 Free format text: PAYMENT UNTIL: 20101128 |
|
FPAY | Renewal fee payment (prs date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20111128 Year of fee payment: 14 |
|
EXPY | Cancellation because of completion of term | ||
FPAY | Renewal fee payment (prs date is renewal date of database) |
Year of fee payment: 14 Free format text: PAYMENT UNTIL: 20111128 |