JPH0526162B2 - - Google Patents
Info
- Publication number
- JPH0526162B2 JPH0526162B2 JP15486586A JP15486586A JPH0526162B2 JP H0526162 B2 JPH0526162 B2 JP H0526162B2 JP 15486586 A JP15486586 A JP 15486586A JP 15486586 A JP15486586 A JP 15486586A JP H0526162 B2 JPH0526162 B2 JP H0526162B2
- Authority
- JP
- Japan
- Prior art keywords
- refractive index
- film
- optical thickness
- index film
- high refractive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 230000003287 optical effect Effects 0.000 claims description 25
- 239000000758 substrate Substances 0.000 claims description 6
- 238000002834 transmittance Methods 0.000 claims description 4
- 239000010408 film Substances 0.000 description 45
- 239000012788 optical film Substances 0.000 description 4
- 229910010413 TiO 2 Inorganic materials 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 238000004611 spectroscopical analysis Methods 0.000 description 3
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000003086 colorant Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Landscapes
- Optical Filters (AREA)
Description
【発明の詳細な説明】
[産業上の利用分野]
この発明は、被測定対象の性状を光学的に測定
する光学的測定装置に使用する多層干渉膜フイル
タに関するものである。DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a multilayer interference film filter used in an optical measuring device that optically measures the properties of an object to be measured.
[従来の技術]
被測定対象の厚み、水分、色あい等の性状の測
定において、測定波長の両側近傍に比較波長を設
け、比較演算を行うことにより、被測定対象の性
状を3色を用いて行う測定方法がある。[Prior art] When measuring the properties of an object to be measured, such as thickness, moisture, color tone, etc., comparison wavelengths are provided near both sides of the measurement wavelength, and comparison calculations are performed to determine the properties of the object to be measured using three colors. There are measurement methods that can be used.
従来、3波長の分光をする場合、3個のフイル
タを多回転セレクタに設け、モータで回転させて
分光する方法がとられていた。 Conventionally, when performing spectroscopy of three wavelengths, a method has been used in which three filters are provided in a multi-rotation selector and rotated by a motor to perform spectroscopy.
[この発明が解決しようとする問題点]
しかしながら、このように3個のフイルタを用
いると装置の大型可化、モータの発熱等の問題点
があつた。[Problems to be Solved by the Invention] However, when three filters are used in this way, there are problems such as the device becoming larger and the motor generating heat.
このため、比較波長の2波長の分光を、ダブル
ピークをもつ多層干渉膜フイルタにより1枚のフ
イルタで実現することにより測定系の簡素化、高
精度化を図ることができる。 Therefore, the measurement system can be simplified and highly accurate by realizing spectroscopy of two comparison wavelengths with a single filter using a multilayer interference film filter having a double peak.
この発明の目的は、以上の点に鑑み、基準波長
の両側近傍に2つのピークをもつ多層干渉膜フイ
ルタを提供することである。 In view of the above points, an object of the present invention is to provide a multilayer interference film filter having two peaks near both sides of a reference wavelength.
[問題点を解決するための手段]
この発明は、基板側より、光学的膜厚λ/4の
高屈折率膜、光学的膜厚λ/4の低屈折率膜と高
屈折率膜との交互層を少くとも1組、光学的膜厚
λ/2の低屈折率膜、光学的膜厚λ/4の高屈折
率膜、光学的膜厚λ/2の低屈折率膜、光学的膜
厚がλ/4の高屈折率膜と低屈折率膜との交互層
を少くとも1組、光学的膜厚λ/4の高屈折率膜
を積層した多層膜で、基準波長λの両側近傍に2
つのピークをもつ多層干渉膜フイルタである。[Means for Solving the Problems] This invention consists of a high refractive index film with an optical thickness of λ/4, a low refractive index film with an optical thickness of λ/4, and a high refractive index film from the substrate side. At least one set of alternating layers, a low refractive index film with an optical thickness of λ/2, a high refractive index film with an optical thickness of λ/4, a low refractive index film with an optical thickness of λ/2, an optical film. A multilayer film consisting of at least one set of alternating layers of a high refractive index film and a low refractive index film with a thickness of λ/4, and a stack of high refractive index films with an optical thickness of λ/4, near both sides of the reference wavelength λ. to 2
This is a multilayer interference film filter with two peaks.
[実施例]
第1図は、この発明の一実施例を示す構成説明
図である。[Embodiment] FIG. 1 is a configuration explanatory diagram showing an embodiment of the present invention.
一般に、干渉膜フイルタは、蒸着、スパツタリ
ング等で高屈折率膜と低屈折率膜とを交互に積層
させるもので、高屈折率膜の材料としては、Ge、
Si、TiO2、ZrO2、ZnS等が用いられ、低屈折率
膜の材料としては、SiO、SiO2、MgF2等が用い
られる。 Generally, interference film filters are made by laminating high refractive index films and low refractive index films alternately by vapor deposition, sputtering, etc. The materials for the high refractive index films include Ge,
Si, TiO 2 , ZrO 2 , ZnS, etc. are used, and as the material of the low refractive index film, SiO, SiO 2 , MgF 2 etc. are used.
次に、このような高屈折率膜、低屈折率膜を用
いたフイルタの構成を第1図について説明する。 Next, the structure of a filter using such a high refractive index film and a low refractive index film will be explained with reference to FIG.
図において、Sは、ガラス等の基板で、基準波
長をλとし、この基板S側より、光学的膜厚λ/
4の高屈折率膜1、光学的膜厚λ/4の低屈折率
膜2と光学的膜厚λ/4の高屈折率膜3との交互
層を少くとも1組、光学的膜厚λ/2の低屈折率
膜4、光学的膜厚λ/4の高屈折率膜5、光学的
膜厚λ/2の低屈折率膜6、光学的膜厚λ/4の
高屈折率膜7と光学的膜厚λ/4の低屈折率膜8
との交互層を少くとも1組、光学的膜厚λ/4の
高屈折率膜9を積層した膜より構成され、最外層
は外部媒質に接している。 In the figure, S is a substrate such as glass, the reference wavelength is λ, and the optical film thickness λ/
At least one set of alternating layers of a high refractive index film 1 with an optical thickness of λ/4, a low refractive index film 2 with an optical thickness of λ/4, and a high refractive index film 3 with an optical thickness of λ/4; /2 low refractive index film 4, optical thickness λ/4 high refractive index film 5, optical film thickness λ/2 low refractive index film 6, optical film thickness λ/4 high refractive index film 7 and a low refractive index film 8 with an optical thickness of λ/4.
The high refractive index film 9 has an optical thickness of λ/4 and is laminated with at least one set of alternating layers, and the outermost layer is in contact with an external medium.
たとえば、高屈折率膜にTiO2、低屈折率膜に
SiO2を用い、交互層の数を3とし、基準波長λ
=1.0μmとすれば、第2図で示すように、基準波
長λの両側近傍に2つのピークを持つ多層干渉膜
フイルタ(ダブルピークフイルタ)が得られる。 For example, TiO 2 is used for high refractive index films, and TiO 2 is used for low refractive index films.
SiO 2 is used, the number of alternating layers is 3, and the reference wavelength λ
= 1.0 μm, a multilayer interference film filter (double peak filter) having two peaks near both sides of the reference wavelength λ is obtained as shown in FIG.
なお、交互層の数は、1〜3位が適当である。 Note that the number of alternate layers is suitably 1 to 3.
第3図は、この発明の他の実施例を示し、第1
図の実施例において、基板Sと多層膜の高屈折率
膜1との間に光学的膜厚λ/4の低屈折率膜1
0、多層膜の最外層の高屈折率膜9に光学的膜厚
λ/4の低屈折率膜11を設けている。この場合
も、第2図のような基準波長λの両側近傍に2つ
のピークをもつ同様の多層干渉膜フイルタが得ら
れる。 FIG. 3 shows another embodiment of the invention;
In the embodiment shown in the figure, a low refractive index film 1 having an optical thickness of λ/4 is placed between the substrate S and the high refractive index film 1 of the multilayer film.
0, a low refractive index film 11 having an optical thickness of λ/4 is provided on the high refractive index film 9 as the outermost layer of the multilayer film. In this case as well, a similar multilayer interference film filter having two peaks near both sides of the reference wavelength λ as shown in FIG. 2 can be obtained.
なお、この場合交互層の数だけみると、2〜4
位となる。 In this case, if we look only at the number of alternating layers, it is 2 to 4.
It becomes the rank.
[発明の効果]
高屈折率膜、低屈折率膜を、以上述べたように
積層させることにより、基準波長の両側近傍に2
つのピークをもつ多層干渉膜フイルタ(ダブルピ
ークフイルタ)が得られ、各種光学的測定に用い
ることができる。[Effect of the invention] By stacking the high refractive index film and the low refractive index film as described above, two
A multilayer interference film filter (double peak filter) with two peaks is obtained and can be used for various optical measurements.
第1図、第3図は、この発明の一実施例を示す
構成説明図、第2図は、この発明のフイルタの透
過率特性図である。
S……基板、1,3,5,7,9……高屈折率
膜、2,4,6,8,10,11……低屈折率
膜。
1 and 3 are configuration explanatory diagrams showing one embodiment of the present invention, and FIG. 2 is a transmittance characteristic diagram of the filter of the present invention. S...Substrate, 1,3,5,7,9...High refractive index film, 2,4,6,8,10,11...Low refractive index film.
Claims (1)
膜、光学的膜厚λ/4の低屈折率膜と高屈折率膜
との交互層を少くとも1組、光学的膜厚がλ/2
の低屈折率膜、光学的膜厚λ/4の高屈折率膜、
光学的膜厚λ/2の低屈折率膜、光学的膜厚λ/
4の高屈折率膜と低屈折率膜との交互層を少くと
も1組、光学的膜厚λ/4の高屈折率膜を積層し
た多層膜で、基準波長λでは透過率が低くその両
側近傍の波長では透過率が高い2つのピークを持
つことを特徴とする多層干渉膜フイルタ。 2 前記基板と多層膜との間、および多層膜の最
外層に光学的膜厚λ/4の低屈折率膜を設けたこ
とを特徴とする特許請求の範囲第1項記載の多層
干渉膜フイルタ。 3 前記交互層の数を1から3としたことを特徴
とする特許請求の範囲第1項または第2項記載の
多層干渉膜フイルタ。[Claims] 1. At least one set of alternating layers of a high refractive index film with an optical thickness of λ/4, a low refractive index film with an optical thickness of λ/4, and a high refractive index film from the substrate side. , optical thickness is λ/2
A low refractive index film with an optical thickness of λ/4, a high refractive index film with an optical thickness of λ/4,
Low refractive index film with optical thickness λ/2, optical thickness λ/2
A multilayer film consisting of at least one set of alternating layers of high refractive index films and low refractive index films (4) and high refractive index films with an optical thickness of λ/4, which have low transmittance at the reference wavelength λ, and have low transmittance at the reference wavelength λ. A multilayer interference film filter characterized by having two peaks of high transmittance at nearby wavelengths. 2. The multilayer interference film filter according to claim 1, characterized in that a low refractive index film with an optical thickness of λ/4 is provided between the substrate and the multilayer film and on the outermost layer of the multilayer film. . 3. The multilayer interference film filter according to claim 1 or 2, characterized in that the number of said alternating layers is 1 to 3.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15486586A JPS6310106A (en) | 1986-07-01 | 1986-07-01 | Multi-layered interference film filter |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15486586A JPS6310106A (en) | 1986-07-01 | 1986-07-01 | Multi-layered interference film filter |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6310106A JPS6310106A (en) | 1988-01-16 |
JPH0526162B2 true JPH0526162B2 (en) | 1993-04-15 |
Family
ID=15593607
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP15486586A Granted JPS6310106A (en) | 1986-07-01 | 1986-07-01 | Multi-layered interference film filter |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6310106A (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0674823A (en) * | 1992-08-27 | 1994-03-18 | Kubota Corp | Wave length calibration method for spectroscopic analyzer |
JP4383194B2 (en) * | 2004-02-03 | 2009-12-16 | 古河電気工業株式会社 | Dielectric multilayer filter having predetermined wavelength optical characteristics, design method thereof, design program thereof, and optical add / drop system using the dielectric multilayer filter |
-
1986
- 1986-07-01 JP JP15486586A patent/JPS6310106A/en active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS6310106A (en) | 1988-01-16 |
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