JPH05181145A - Substrate for liquid crystal element and its production - Google Patents
Substrate for liquid crystal element and its productionInfo
- Publication number
- JPH05181145A JPH05181145A JP31821491A JP31821491A JPH05181145A JP H05181145 A JPH05181145 A JP H05181145A JP 31821491 A JP31821491 A JP 31821491A JP 31821491 A JP31821491 A JP 31821491A JP H05181145 A JPH05181145 A JP H05181145A
- Authority
- JP
- Japan
- Prior art keywords
- stamper
- film
- substrate
- liquid crystal
- crystal element
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Landscapes
- Liquid Crystal (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】この発明は液晶素子用基板および
その製造方法に係り、特に画質の良い液晶素子を構成で
きる液晶素子用基板およびその製造方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a liquid crystal element substrate and a method for manufacturing the same, and more particularly to a liquid crystal element substrate and a method for manufacturing the same that can form a liquid crystal element with high image quality.
【0002】[0002]
【従来の技術】図4は、本発明者が先に提案した液晶素
子用基板を示す断面図である。この基板は基板本体2と
厚さ数μmの配向膜1とから構成されている。基板本体
2はガラス製の基板7とその上に形成された透明電極8
とから構成されている。基板本体2上に積層された配向
膜1はポリイミド等の高分子膜を素材とするもので、そ
の表面にはスタンプ法によって凹凸形状が形成されてい
る。2. Description of the Related Art FIG. 4 is a sectional view showing a liquid crystal element substrate previously proposed by the present inventor. This substrate is composed of a substrate body 2 and an alignment film 1 having a thickness of several μm. The substrate body 2 includes a glass substrate 7 and a transparent electrode 8 formed thereon.
It consists of and. The alignment film 1 laminated on the substrate body 2 is made of a polymer film such as polyimide as a material, and its surface is provided with an uneven shape by a stamping method.
【0003】本発明者らはこのような配向膜1を形成す
る方法として、図5に示すようなプレス装置4を用いる
方法を検討した。このプレス装置4は台座11と上プレ
ート6とで構成されている。台座11は高分子膜が塗布
された基板本体2を載置する場所である。上プレート6
は自重により前記高分子膜に圧力をかけるもので、その
下面には所定の凹凸形状が形成されたスタンパー3が取
り付けられている。このスタンパー3の周囲にはストッ
パー5が設けられている。As a method of forming such an alignment film 1, the present inventors have studied a method of using a press device 4 as shown in FIG. The pressing device 4 is composed of a pedestal 11 and an upper plate 6. The pedestal 11 is a place on which the substrate body 2 coated with the polymer film is placed. Upper plate 6
Is to apply pressure to the polymer film by its own weight, and a stamper 3 having a predetermined uneven shape is attached to the lower surface thereof. A stopper 5 is provided around the stamper 3.
【0004】このようなプレス装置4を用いて基板を製
造するにはまず、ポリイミドなどからなるの高分子膜を
塗布した基板本体2を台座11に載置し、ついで上プレ
ート6を降下させる。すると前記高分子膜の表面にスタ
ンパー3の表面に形成された凹凸形状が転写され、高分
子膜は配向膜1となる。この時配向膜1の厚さはストッ
パー5が台座11に当接し、それによって上プレート6
の高分子膜1への進入が阻止されることによって定ま
る。In order to manufacture a substrate using such a press device 4, first, the substrate body 2 coated with a polymer film made of polyimide or the like is placed on the pedestal 11, and then the upper plate 6 is lowered. Then, the uneven shape formed on the surface of the stamper 3 is transferred to the surface of the polymer film, and the polymer film becomes the alignment film 1. At this time, the thickness of the alignment film 1 is such that the stopper 5 abuts on the pedestal 11 so that the upper plate 6
Is determined by blocking the invasion of the polymer into the polymer film 1.
【0005】[0005]
【発明が解決しようとする課題】しかしこのようにスト
ッパー5を設けたプレス装置4を使用して高分子膜の表
面に凹凸形状を形成すると、以下に示す不都合が生じ
た。まず、ストッパー5の下面、台座11の上面、およ
びスタンパー3を取り付けている上プレート6の下面が
高精度に仕上げられていないと、すなわち平坦度や平行
度の精度が低いと、高分子膜の表面全体にスタンパー3
を均一に当接させることができない。このような場合は
スタンパー3に形成された凹凸形状が均一に高分子膜の
表面に転写されずに表面形状が不均一な配向膜1が形成
されたり、膜厚の不均一な配向膜1を有する基板が製造
されてしまう。この配向膜の表面形状の不均一性や配向
膜1の厚さのばらつきは、ドメインの発生を招き、液晶
分子の配向に影響を及ぼし、ひいては液晶素子の画質に
まで悪影響を及ぼす。また、液晶層と透明電極8との間
の絶縁性の場所によるむらを生じる可能性もある。この
ような問題を防止するためには、前記平坦度や平行度の
精度を高めればよいが、現実には配向膜1に求められて
いる厚さ数μmという膜厚、その表面に均一にスタンパ
ーの形状を転写すること、更にその膜厚の均一性を達成
できる程度にまで前記プレス装置4の平坦度や平行度を
高めることは不可能である。However, when an uneven shape is formed on the surface of the polymer film by using the pressing device 4 provided with the stopper 5 as described above, the following inconvenience occurs. First, if the lower surface of the stopper 5, the upper surface of the pedestal 11, and the lower surface of the upper plate 6 to which the stamper 3 is attached are not finished with high accuracy, that is, if the accuracy of flatness and parallelism is low, the polymer film of Stamper 3 on the entire surface
Cannot be evenly contacted. In such a case, the uneven shape formed on the stamper 3 is not uniformly transferred to the surface of the polymer film, and the alignment film 1 having a non-uniform surface shape is formed, or the alignment film 1 having a non-uniform film thickness is formed. The substrate it has will be manufactured. The non-uniformity of the surface shape of the alignment film and the variation in the thickness of the alignment film 1 lead to the generation of domains, which affects the alignment of liquid crystal molecules, and adversely affects the image quality of the liquid crystal element. Further, there is a possibility that unevenness may occur due to an insulating place between the liquid crystal layer and the transparent electrode 8. In order to prevent such a problem, the accuracy of the flatness and parallelism may be increased. However, in reality, the film thickness of several μm required for the alignment film 1 and the stamper on the surface thereof are uniform. It is impossible to transfer the above shape and further increase the flatness and parallelism of the pressing device 4 to the extent that the uniformity of the film thickness can be achieved.
【0006】本発明は前記事情に鑑みてなされたもの
で、表面形状が均一で、均一な膜厚を有する配向膜1を
製作し易い液晶素子用基板、およびその製造方法を提供
することを目的とする。The present invention has been made in view of the above circumstances, and it is an object of the present invention to provide a substrate for a liquid crystal element in which an alignment film 1 having a uniform surface shape and a uniform film thickness can be easily manufactured, and a manufacturing method thereof. And
【0007】[0007]
【課題を解決するための手段】請求項1記載の液晶素子
用基板では、スタンプ深さ規制用スペーサーが分散され
た配向膜を基板本体上に形成したことにより前記問題の
解決を図った。In the liquid crystal device substrate according to the first aspect, the above problem is solved by forming an alignment film in which a stamp depth regulating spacer is dispersed on the substrate body.
【0008】請求項2記載の液晶素子の製造方法は、請
求項1記載の液晶素子用基板を製造する方法であって、
まずスタンプ深さ規制用スペーサーが分散されている膜
を基板本体上に積層し、ついで凹凸形状が形成されてい
るスタンパーを前記スペーサーによってスタンパーの進
入が阻止されるまで膜に押し付けることにより前記問題
の解決を図った。A method for producing a liquid crystal element according to a second aspect is a method for producing a substrate for a liquid crystal element according to the first aspect,
First, a film in which the stamp depth control spacers are dispersed is laminated on the substrate body, and then a stamper having an uneven shape is pressed against the film until the stamper prevents the stamper from entering the film. I tried to solve it.
【0009】前記スペーサーの形状は特に限定されない
が、どの様に配置されても高さが変わることのない球形
が好ましい。スぺーサーの粒径は、スぺーサーが分散さ
れている膜の膜厚と表面に形成されている凹凸の深さと
に関係しており、粒径は80〜1500オングストロー
ムが好ましい。スペーサーの粒径が80オングストロー
ムより小さいと、基板内面における膜厚の制御が困難で
あるという不都合が生じるとともに、膜の表面に形成さ
れる凹凸形状が安定しなくなる。スぺーサーの粒径が1
500オングストロームを超えると、膜の厚さも同等あ
るいはそれ以上となり光の透過率が減少し、液晶素子の
表示コントラストが低下したり、膜の容量が増大し表示
に有効に働く電圧が低下したりする。スペーサーの素材
としては配向膜の表面に凹凸形状を形成するときスペー
サー自身も加熱されるので、加熱によって高さが変化し
ないような熱膨張係数の小さいものが適している。ま
た、表面に凹凸形状が形成されかつ全体の形状が平坦で
あるスタンパーを用いて配向膜の表面に凹凸形状を形成
する場合、膜厚を均一にするには、スペーサーを100
〜1000個/mm2 程度の密度で分布させることが望
ましい。The shape of the spacer is not particularly limited, but a spherical shape whose height does not change regardless of the arrangement is preferable. The particle size of the spacer is related to the film thickness of the film in which the spacer is dispersed and the depth of the irregularities formed on the surface, and the particle size is preferably 80 to 1500 angstroms. If the particle size of the spacer is smaller than 80 angstrom, it is difficult to control the film thickness on the inner surface of the substrate, and the uneven shape formed on the surface of the film becomes unstable. Spacer particle size is 1
When it exceeds 500 angstroms, the film thickness becomes equal to or more than that, the light transmittance decreases, and the display contrast of the liquid crystal element decreases, or the film capacity increases and the voltage effectively acting for display decreases. .. As a material for the spacer, a material having a small coefficient of thermal expansion so that the height does not change due to heating is suitable because the spacer itself is also heated when the uneven shape is formed on the surface of the alignment film. Further, in the case of forming a concavo-convex shape on the surface of the alignment film by using a stamper having a concavo-convex shape on the surface and having a flat overall shape, the spacer should be 100
It is desirable to distribute at a density of about 1000 pieces / mm 2 .
【0010】表面に凹凸形状が形成されかつ全体の形状
が湾曲しているスタンパーを用いて配向膜の表面に凹凸
形状を形成する場合には、スペーサーの分布密度を10
0〜3000個/mm2 程度にすることが望ましい。全
体の形状が平坦であるスタンパーを用いる場合、スタン
パーをスペーサーに当接させるとき圧力が分散されるの
で、比較的低密度(100〜1000個/mm2 程度)
に分散されたスペーサーにより、押し付けられるスタン
パーを支持することができる。他方、全体の形状が湾曲
しているスタンパーを用いる場合、スタンパーをスペー
サーに当接させるとき圧力が分散されないので、その圧
力に耐え得るように比較的高密度(100〜3000個
/mm2 程度)にスペーサーを配向膜中に分散させる必
要がある。When the uneven shape is formed on the surface of the alignment film by using a stamper having the uneven shape on the surface and the entire shape is curved, the spacer distribution density is set to 10
It is desirable to set it to about 0 to 3000 pieces / mm 2 . When using a stamper whose overall shape is flat, the pressure is dispersed when the stamper is brought into contact with the spacer, so the density is relatively low (100 to 1000 pieces / mm 2 ).
The stampers to be pressed can be supported by the spacers dispersed in the. On the other hand, when using a stamper with a curved overall shape, the pressure is not dispersed when the stamper is brought into contact with the spacer, so the density is relatively high (about 100 to 3000 pieces / mm 2 ) so as to withstand the pressure. It is necessary to disperse spacers in the alignment film.
【0011】[0011]
【作用】請求項1の液晶素子用基板は、スタンプ深さ規
制用スペーサーが分散された配向膜を基板本体上に形成
したものなので、この配向膜を製造するためにスタンパ
ーを膜に押し付けたとき、前記スペーサーによってスタ
ンパーの進入が阻止され、スタンパーはそれ以上基板本
体に近づくことがない。スペーサーは配向膜全体に分散
しているので配向膜の表面形状が均一で膜厚も均一とな
る。In the liquid crystal device substrate according to the first aspect of the present invention, the alignment film in which the stamp depth regulating spacers are dispersed is formed on the substrate body. Therefore, when the stamper is pressed against the film to manufacture the alignment film. The spacers prevent the stamper from entering, and the stamper does not approach the substrate body any more. Since the spacers are dispersed throughout the alignment film, the surface shape of the alignment film is uniform and the film thickness is uniform.
【0012】請求項2の製造方法では、請求項1記載の
液晶素子用基板を製造する方法であって、まずスタンプ
深さ規制用スペーサーが分散されている膜を基板本体上
に積層し、ついで凹凸形状が形成されているスタンパー
を前記スペーサーによってスタンパーの進入が阻止され
るまで膜に押し付けるので、スタンパーの進入はスペー
サーによって所定の位置で阻止され、その位置以上スタ
ンパーが基板本体に近づくことがない。その結果、表面
形状が均一で膜厚の均一な配向膜を形成することができ
る。According to a second aspect of the present invention, there is provided a method of producing the liquid crystal element substrate according to the first aspect, wherein a film in which the stamp depth regulating spacers are dispersed is first laminated on the substrate main body, and then the film is formed. Since the stamper having the uneven shape is pressed against the film until the spacer prevents the stamper from entering, the spacer prevents the stamper from entering at a predetermined position, and the stamper does not approach the substrate body beyond that position. .. As a result, an alignment film having a uniform surface shape and a uniform film thickness can be formed.
【0013】[0013]
【実施例】以下、図面を参照して本発明の液晶素子用基
板およびその製造方法を詳しく説明する。なお前記従来
例と同一構成部分には、同一符号を符して説明を簡略化
する。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS A liquid crystal element substrate and a method for manufacturing the same according to the present invention will be described in detail below with reference to the drawings. The same components as those of the conventional example are designated by the same reference numerals to simplify the description.
【0014】(実施例1)図1は本実施例の液晶素子用
基板を示す断面図である。この液晶素子用基板は基板本
体2と配向膜1とから構成されている。基板本体2はガ
ラス基板7の上にITOからなる透明電極8が形成され
ているものである。配向膜1はポリエーテルケトン(P
ES)中にガラス粒子10が分散されてなる膜であり、
基板本体2上に形成されている。配向膜1中のガラス粒
子10の直径は700オングストロームであり、配向膜
1の膜厚は800オングストロームである。ガラス粒子
10は配向膜1中に500個/mm2 程度に分散されて
いる(Embodiment 1) FIG. 1 is a cross-sectional view showing a liquid crystal element substrate of this embodiment. This liquid crystal element substrate is composed of a substrate body 2 and an alignment film 1. The substrate body 2 has a transparent electrode 8 made of ITO formed on a glass substrate 7. The alignment film 1 is made of polyetherketone (P
ES) is a film in which glass particles 10 are dispersed,
It is formed on the substrate body 2. The glass particles 10 in the alignment film 1 have a diameter of 700 Å, and the alignment film 1 has a thickness of 800 Å. The glass particles 10 are dispersed in the alignment film 1 at about 500 particles / mm 2 .
【0015】上記液晶素子用基板は以下に示す工程によ
って製作された。 予め、1−メチル−2−ピロリドンを溶媒とし、その
溶媒にガラス粒子10とPESとを加え、混合溶液を調
整した。 基板本体2上に前記混合溶液を所定の形状に印刷をし
た。 前記混合溶液を乾燥させることにより溶媒を蒸発さ
せ、高分子膜を形成した。この高分子膜の厚さは800
オングストロームであった。 高分子膜を有する基板本体2を200〜240℃に加
熱し、図2に示すように、その表面にスタンパー3を2
00kg/cm2 の圧力で押し付けた。このスタンパー
3は表面にピッチ2800オングストローム、深さ10
0オングストロームの凹凸模様が形成されたものであ
る。本実施例の液晶素子用基板では、配向膜1中にガラ
ス粒子10が高密度(500個/mm2 程度)に分散さ
れているので、スタンパー3の凸部12がガラス粒子1
0の頂点に当接してスタンパー3の進入が阻止される確
率が高い。よってこの配向膜1は谷部における膜厚がガ
ラス粒子10の粒径と同じものとなる。The liquid crystal element substrate was manufactured by the following steps. In advance, 1-methyl-2-pyrrolidone was used as a solvent, and glass particles 10 and PES were added to the solvent to prepare a mixed solution. The mixed solution was printed in a predetermined shape on the substrate body 2. The solvent was evaporated by drying the mixed solution to form a polymer film. The thickness of this polymer film is 800
It was Angstrom. The substrate body 2 having the polymer film is heated to 200 to 240 ° C., and the stamper 3 is attached to the surface of the substrate body 2 as shown in FIG.
It was pressed at a pressure of 00 kg / cm 2 . The stamper 3 has a pitch of 2800 angstroms and a depth of 10 on the surface.
An uneven pattern of 0 angstrom was formed. In the liquid crystal element substrate of this example, the glass particles 10 are dispersed in the alignment film 1 at a high density (about 500 particles / mm 2 ).
It is highly probable that the stamper 3 will be blocked by the apex of 0. Therefore, this alignment film 1 has the same film thickness at the valley as the particle size of the glass particles 10.
【0016】本実施例の液晶素子用基板では、ガラス粒
子10が分散されている配向膜1を基板本体2上に形成
したものなので、この配向膜1を製造するためにスタン
パー3を膜に押し付けたとき、前記ガラス粒子10によ
ってスタンパー3の進入が阻止され、スタンパー3はそ
れ以上基板本体2に近づくことがない。ガラス粒子10
は配向膜1全体に分散しているので配向膜1の膜厚は均
一となる。従って、本実施例の液晶素子用基板は、均一
な膜厚を有する配向膜1を備えた液晶素子用基板となっ
た。In the liquid crystal device substrate of this embodiment, the alignment film 1 in which the glass particles 10 are dispersed is formed on the substrate main body 2. Therefore, in order to manufacture the alignment film 1, the stamper 3 is pressed against the film. At this time, the glass particles 10 prevent the stamper 3 from entering, and the stamper 3 does not approach the substrate body 2 any more. Glass particles 10
Are dispersed throughout the alignment film 1, so that the film thickness of the alignment film 1 is uniform. Therefore, the liquid crystal element substrate of this example was a liquid crystal element substrate provided with the alignment film 1 having a uniform film thickness.
【0017】本実施例の製造方法では、まずガラス粒子
10が分散されている膜を基板本体2上に積層し、つい
で凹凸形状が形成されているスタンパー3を前記ガラス
粒子10によってスタンパー3の進入が阻止されるまで
膜に押し付けるので、スタンパー3の進入はガラス粒子
10によって所定の位置で阻止され、その位置以上スタ
ンパー3が基板本体2に近づくことがない。その結果、
膜厚の均一な配向膜1を形成することができる。従っ
て、本実施例の製造方法によれば膜厚の均一な配向膜1
を備えた液晶素子用基板を製造することができる。In the manufacturing method of this embodiment, first, the film in which the glass particles 10 are dispersed is laminated on the substrate body 2, and then the stamper 3 having the uneven shape is introduced into the stamper 3 by the glass particles 10. The glass particles 10 prevent the stamper 3 from entering at a predetermined position, and the stamper 3 does not approach the substrate body 2 beyond that position. as a result,
The alignment film 1 having a uniform film thickness can be formed. Therefore, according to the manufacturing method of this embodiment, the alignment film 1 having a uniform thickness is formed.
It is possible to manufacture a liquid crystal element substrate having
【0018】(実施例2)図3は本実施例の液晶素子用
基板を示す断面図である。この液晶素子用基板の配向膜
1中にはガラス粒子10が低密度(100個/mm2 程
度)に分散されている。このようにガラス粒子10が比
較的低密度で分散されている場合、スタンパー3の凸部
12がガラス粒子10に接すると、ガラス粒子10はス
タンパー3の進入にともなって、傾斜する側面に沿って
動かされスタンパー3の凹部に入り込む。(Embodiment 2) FIG. 3 is a sectional view showing a liquid crystal element substrate of this embodiment. Glass particles 10 are dispersed at a low density (about 100 particles / mm 2 ) in the alignment film 1 of the liquid crystal element substrate. In this way, when the glass particles 10 are dispersed at a relatively low density, when the protrusions 12 of the stamper 3 come into contact with the glass particles 10, the glass particles 10 move along the inclined side surface as the stamper 3 enters. It is moved into the recess of the stamper 3.
【0019】本実施例の液晶素子用基板ではガラス粒子
10にスタンパー3の傾斜する側面が接することによっ
てスタンパー3の高分子膜への進入が阻止される。この
結果、この実施例の液晶素子用基板では、ガラス粒子1
0が配向膜1の表面に形成された凸部に入り込み、配向
膜1の傾斜する側面に接した状態となっている。従っ
て、本実施例液晶素子用基板においても実施例1と同様
な作用効果が得られる。In the liquid crystal element substrate of this embodiment, the glass particles 10 are contacted with the inclined side surfaces of the stamper 3 to prevent the stamper 3 from entering the polymer film. As a result, in the liquid crystal element substrate of this example, the glass particles 1
0 enters the convex portion formed on the surface of the alignment film 1 and is in contact with the inclined side surface of the alignment film 1. Therefore, also in the liquid crystal element substrate of this embodiment, the same operational effect as in Embodiment 1 can be obtained.
【0020】また、本実施例の液晶素子用基板では、ガ
ラス粒子10の粒径、またはスタンパー3の表面に形成
された凸部の斜面の傾斜角を変えることによっても配向
膜1の膜厚を制御できる。Further, in the liquid crystal element substrate of this embodiment, the film thickness of the alignment film 1 can be changed by changing the particle diameter of the glass particles 10 or the inclination angle of the slope of the convex portion formed on the surface of the stamper 3. You can control.
【0021】[0021]
【発明の効果】請求項1記載の液晶素子用基板は、スタ
ンプ深さ規制用スペーサーが分散されている配向膜を基
板本体上に形成したものなので、この配向膜を製造する
ためにスタンパーを膜に押し付けたとき、前記スペーサ
ーによってスタンパーの進入が阻止され、スタンパーは
それ以上基板本体に近づくことがない。スペーサーは配
向膜全体に分散しているので配向膜の表面形状は均一と
なり膜厚も均一となる。従って請求項1記載の液晶素子
用基板は、表面形状が均一で膜厚も均一な配向膜を備え
た液晶素子用基板となる。The substrate for a liquid crystal device according to claim 1 has an alignment film, in which spacers for controlling stamp depth are dispersed, formed on the substrate body. Therefore, a stamper film is formed to manufacture this alignment film. When pressed against, the spacer prevents the stamper from entering, and the stamper does not approach the substrate body any more. Since the spacers are dispersed throughout the alignment film, the surface shape of the alignment film is uniform and the film thickness is also uniform. Therefore, the liquid crystal element substrate according to claim 1 is a liquid crystal element substrate provided with an alignment film having a uniform surface shape and a uniform film thickness.
【0022】請求項2記載の製造方法は、請求項1記載
の液晶素子用基板を製造する方法であって、まずスタン
プ深さ規制用スペーサーが分散されている膜を基板本体
上に積層し、ついで凹凸形状が形成されているスタンパ
ーを前記スペーサーによってスタンパーの進入が阻止さ
れるまで膜に押し付けるので、スタンパーの進入はスペ
ーサーによって所定の位置で阻止され、その位置以上ス
タンパーが基板に近づくことがない。その結果、表面形
状が均一で膜厚も均一な配向膜を形成することができ
る。従って請求項2記載の製造方法によれば、表面形状
が均一で膜厚も均一な配向膜を備えた液晶素子用基板を
製造することができる。According to a second aspect of the present invention, there is provided a method of producing the liquid crystal element substrate according to the first aspect, wherein a film having a stamp depth regulating spacer dispersed therein is first laminated on the substrate body, Next, since the stamper having the uneven shape is pressed against the film until the stamper prevents the stamper from entering, the spacer prevents the stamper from entering at a predetermined position, and the stamper does not approach the substrate beyond that position. .. As a result, an alignment film having a uniform surface shape and a uniform film thickness can be formed. Therefore, according to the manufacturing method of the second aspect, it is possible to manufacture a liquid crystal element substrate provided with an alignment film having a uniform surface shape and a uniform film thickness.
【図1】実施例1の液晶素子用基板を示す概略断面図FIG. 1 is a schematic cross-sectional view showing a liquid crystal element substrate of Example 1.
【図2】実施例1の液晶素子用基板の配向膜を製造して
いる工程を説明するための概略断面図FIG. 2 is a schematic cross-sectional view for explaining a process of manufacturing an alignment film of a liquid crystal element substrate of Example 1.
【図3】実施例2の液晶素子用基板を示す概略断面図FIG. 3 is a schematic cross-sectional view showing a liquid crystal element substrate of Example 2.
【図4】従来の液晶素子用基板を示す概略断面図FIG. 4 is a schematic cross-sectional view showing a conventional liquid crystal element substrate.
【図5】従来の液晶素子用基板の配向膜を製造している
工程を説明するための概略断面図FIG. 5 is a schematic cross-sectional view for explaining a process of manufacturing an alignment film of a conventional liquid crystal element substrate.
1 配向膜 2 基板本体 3 スタンパー 10 スペーサー(ガラス粒子) 1 Alignment film 2 Substrate body 3 Stamper 10 Spacer (glass particles)
Claims (2)
れた配向膜を基板本体上に形成したことを特徴とする液
晶素子用基板。1. A substrate for a liquid crystal element, wherein an alignment film in which a stamp depth regulating spacer is dispersed is formed on a substrate body.
る方法であって、まずスタンプ深さ規制用スペーサーが
分散されている膜を基板本体上に積層し、ついで凹凸形
状が形成されているスタンパーを前記スペーサーによっ
て進入が阻止されるまで膜に押し付けることを特徴とす
る液晶素子用基板の製造方法。2. The method for manufacturing a substrate for liquid crystal device according to claim 1, wherein a film in which a stamp depth regulating spacer is dispersed is first laminated on a substrate body, and then an uneven shape is formed. A method for manufacturing a substrate for a liquid crystal device, characterized in that a stamper present is pressed against the film until the spacer prevents entry.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP31821491A JPH05181145A (en) | 1991-12-02 | 1991-12-02 | Substrate for liquid crystal element and its production |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP31821491A JPH05181145A (en) | 1991-12-02 | 1991-12-02 | Substrate for liquid crystal element and its production |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH05181145A true JPH05181145A (en) | 1993-07-23 |
Family
ID=18096710
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP31821491A Withdrawn JPH05181145A (en) | 1991-12-02 | 1991-12-02 | Substrate for liquid crystal element and its production |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH05181145A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0867288A2 (en) | 1994-04-27 | 1998-09-30 | Mitsubishi Denki Kabushiki Kaisha | Recording head |
CN100410777C (en) * | 2005-07-27 | 2008-08-13 | 中华映管股份有限公司 | Base plate structure for forming alignment layer by ink jet method and liquid crystal panel produced therewith |
-
1991
- 1991-12-02 JP JP31821491A patent/JPH05181145A/en not_active Withdrawn
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0867288A2 (en) | 1994-04-27 | 1998-09-30 | Mitsubishi Denki Kabushiki Kaisha | Recording head |
CN100410777C (en) * | 2005-07-27 | 2008-08-13 | 中华映管股份有限公司 | Base plate structure for forming alignment layer by ink jet method and liquid crystal panel produced therewith |
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Legal Events
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A300 | Withdrawal of application because of no request for examination |
Free format text: JAPANESE INTERMEDIATE CODE: A300 Effective date: 19990311 |