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JPH05114693A - Semiconductor device - Google Patents

Semiconductor device

Info

Publication number
JPH05114693A
JPH05114693A JP27537091A JP27537091A JPH05114693A JP H05114693 A JPH05114693 A JP H05114693A JP 27537091 A JP27537091 A JP 27537091A JP 27537091 A JP27537091 A JP 27537091A JP H05114693 A JPH05114693 A JP H05114693A
Authority
JP
Japan
Prior art keywords
chip
wiring pattern
insulating film
semiconductor device
lead frame
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP27537091A
Other languages
Japanese (ja)
Inventor
Hiromichi Sawatani
博道 沢谷
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP27537091A priority Critical patent/JPH05114693A/en
Publication of JPH05114693A publication Critical patent/JPH05114693A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48225Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • H01L2224/48227Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item

Landscapes

  • Lead Frames For Integrated Circuits (AREA)

Abstract

PURPOSE:To realize multichip mounting at a high packaging density in the state of one package of a chip-on-chip structure. CONSTITUTION:An IC chip 2 is fixed to the bed 1 of a lead frame. An insulating film 4 of a polyimide resin on which a wiring pattern 13 is expanded is formed on the chip 2 and a plurality of semiconductor chips respectively having sizes smaller than that of the chip 2 is fixed to the film 4. Then a desired circuit is constituted by connecting the IC chip 2 and semiconductor chips 5 to the wiring pattern 13 through bonding wires 14-1, 14-2, and 14-3.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、リードフレーム上への
マルチチップ実装を達成する1パッケージ化された半導
体装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a one-packaged semiconductor device which achieves multi-chip mounting on a lead frame.

【0002】[0002]

【従来の技術】リードフレーム上へのマルチチップ実装
は、特開昭60−41249号公報、特開昭60−18
9958号公報等に記載されている。図3は上記各公報
と同様な構成のマルチチップ実装の樹脂封止型半導体装
置を示す断面図である。
2. Description of the Related Art A multi-chip mounting method on a lead frame is disclosed in JP-A-60-41249 and JP-A-60-18.
It is described in Japanese Patent Publication No. 9958. FIG. 3 is a cross-sectional view showing a multi-chip mounted resin-sealed semiconductor device having a configuration similar to that of the above publications.

【0003】図3において、リードフレームのベッド31
上に配線シート32が固着され、その上にそれぞれの機能
を持つICチップ33,34,35が各々固着されている。こ
のチップ33,34,35は導体配線36を介してワイヤボンデ
ィングされ、それぞれのチッ・プ間及びリードフレーム
のリード37との接続を構成している。ICチップ33,3
4,35はベッド31とリード37の一方端と共に樹脂38によ
り封止されている。
In FIG. 3, the bed 31 of the lead frame is shown.
The wiring sheet 32 is fixed on the top, and the IC chips 33, 34, 35 having respective functions are fixed on the wiring sheet 32. The chips 33, 34, and 35 are wire-bonded via the conductor wiring 36 to form connections between the chips and the leads 37 of the lead frame. IC chip 33,3
4, 35 are sealed with resin 38 together with the bed 31 and one end of the lead 37.

【0004】上記構成では、パッケージ内のシステム規
模が大きくなるにつれて、個々のチップサイズが大きく
なり、XY方向(平面的)に広がりやすい。従って、高
密度実装するには困難である。
In the above configuration, as the system scale in the package increases, the individual chip size also increases, and it tends to spread in the XY directions (planar). Therefore, it is difficult to perform high-density mounting.

【0005】また、リードフレームのパターンやベッド
上の例えば配線シート32のような回路基板を利用するマ
ルチチップ実装は、微細パターンに制約があり、集積度
の向上がそれほど期待できない。
Further, in multi-chip mounting using a pattern of a lead frame or a circuit board such as a wiring sheet 32 on a bed, there is a restriction on a fine pattern, and improvement in the degree of integration cannot be expected so much.

【0006】[0006]

【発明が解決しようとする課題】このように従来では、
個々のチップサイズが大きくなるほど高密度なマルチチ
ップ実装が困難になるという欠点がある。この発明は上
記事情を考慮してなされたものであり、その目的は高密
度なマルチチップ実装を実現する半導体装置を提供する
ことにある。
As described above, in the prior art,
There is a drawback that high-density multi-chip mounting becomes more difficult as the individual chip size increases. The present invention has been made in consideration of the above circumstances, and an object of the present invention is to provide a semiconductor device which realizes high-density multi-chip mounting.

【0007】[0007]

【課題を解決するための手段】この発明は、リードフレ
ームのベッドに固着されたICチップと、前記ICチッ
プ上に形成された絶縁膜と、前記絶縁膜上に形成された
配線パターンと、前記絶縁膜上に固着された前記ICチ
ップより小さい複数の半導体チップと、前記ICチップ
及び半導体チップ各々と前記配線パターンとが配線接続
される第1の接続手段と、前記ICチップ及び半導体チ
ップ各々が相互に配線接続される第2の接続手段と、前
記ICチップと前記リードフレームのリードとが配線接
続される第3の接続手段とを具備したことを特徴として
いる。
According to the present invention, an IC chip fixed to a bed of a lead frame, an insulating film formed on the IC chip, a wiring pattern formed on the insulating film, and A plurality of semiconductor chips smaller than the IC chip fixed on the insulating film; first connecting means for connecting the IC chip and the semiconductor chip to the wiring pattern; and the IC chip and the semiconductor chip respectively. It is characterized in that it is provided with a second connecting means which is wire-connected to each other and a third connecting means which is wire-connected to the IC chip and the lead of the lead frame.

【0008】[0008]

【作用】この発明ではポリイミド系の絶縁膜上に配線パ
ターンを形成することにより、複雑な配線パターンが絶
縁膜上に展開できる。これにより、ICチップ上の半導
体チップ相互の配線接続が集積されやすくなる。
In the present invention, a wiring pattern is formed on a polyimide-based insulating film, so that a complicated wiring pattern can be developed on the insulating film. This facilitates the integration of wiring connections between the semiconductor chips on the IC chip.

【0009】[0009]

【実施例】以下、図面を参照してこの発明を実施例によ
り説明する。図1はこの発明に係るマルチチップ実装の
半導体装置の構成を示す封止前の斜視図である。ICチ
ップの上に、このICチップよりも小さい半導体チップ
や半導体素子が複数搭載されたチップ・オン・チップの
構造である。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described below with reference to the accompanying drawings. FIG. 1 is a perspective view showing a structure of a multi-chip-mounted semiconductor device according to the present invention before sealing. This is a chip-on-chip structure in which a plurality of semiconductor chips or semiconductor elements smaller than the IC chip are mounted on the IC chip.

【0010】リードフレームのベッド1 上にICチップ
2 が固着されている。ICチップ2上にはSiN等から
なる表面保護膜3 が形成され、その上にはポリイミド等
からなる10μm程度の絶縁膜4 が形成されている。こ
の絶縁膜4 上にチップ2 よりもチップ面積の小さい半導
体チップ5 〜12が固着されている。半導体チップ5 〜12
は例えばICチップや、受動素子である。
An IC chip on the bed 1 of the lead frame
2 is stuck. A surface protection film 3 made of SiN or the like is formed on the IC chip 2, and an insulating film 4 made of polyimide or the like and having a thickness of about 10 μm is formed on the surface protection film 3. Semiconductor chips 5 to 12 having a smaller chip area than the chip 2 are fixed on the insulating film 4. Semiconductor chips 5-12
Is, for example, an IC chip or a passive element.

【0011】絶縁膜4 上には上記半導体チップ5 〜12相
互が配線されるための電極配線パターン13が形成されて
いる。電極配線パターン13の形成周囲はSiN等の保護
膜16が形成されている。
An electrode wiring pattern 13 for wiring the semiconductor chips 5 to 12 is formed on the insulating film 4. A protective film 16 such as SiN is formed around the electrode wiring pattern 13.

【0012】ICチップ2 やその上の各々の半導体チッ
プ5 〜12は、それぞれ配線パターン13を介し、または介
さずに必要なワイヤボンディングがなされる。ボンディ
ングワイヤ14-1は各々チップの電極パッドと電極配線パ
ターン13とを接続するボンディングワイヤである。ボン
ディングワイヤ14-2はチップどうしを接続するボンディ
ングワイヤである。ボンディングワイヤ14-3はチップ2
の電極パッドからリードフレームのリード15に繋がるボ
ンディングワイヤである。チップ2 の周辺は電極パッド
が配列され、ボンディングがなされるため表面保護膜3
と絶縁膜4 が除去されている。
The IC chip 2 and the respective semiconductor chips 5 to 12 on the IC chip 2 are subjected to necessary wire bonding with or without the wiring pattern 13 interposed therebetween. The bonding wire 14-1 is a bonding wire that connects the electrode pad of each chip and the electrode wiring pattern 13. The bonding wire 14-2 is a bonding wire that connects chips. Bonding wire 14-3 is chip 2
Is a bonding wire that connects the electrode pad to the lead 15 of the lead frame. Since the electrode pads are arranged around the periphery of the chip 2 and bonding is performed, the surface protective film 3
And the insulating film 4 have been removed.

【0013】これらICチップ2 及び半導体チップ5 〜
12は、各々結線に必要なボンディングワイヤが形成さ
れ、図2に示す断面図のように、ベッド1 とリード15の
一方端を含んで例えば樹脂21により封止された1パッケ
ージ化された半導体装置となる。なお、図1と同一の箇
所には同一符号を付している。
The IC chip 2 and the semiconductor chips 5 to
Reference numeral 12 denotes a semiconductor device in which a bonding wire necessary for connection is formed, and which includes one end of the bed 1 and the lead 15 and is sealed by, for example, a resin 21 as shown in the sectional view of FIG. Becomes The same parts as those in FIG. 1 are designated by the same reference numerals.

【0014】チップ2 上にチップ5 〜12を固着する接着
部材21は、通常のICと同様に導電性ペーストあるいは
絶縁性ペーストを使用すればよい。またボンディングワ
イヤ14や電極配線パターン13の配線材料は、Al、Al
- Si、Al- Si- Cu、Cu等が考えられる。ま
た、電極配線パターン13の周囲を保護するSiN等の保
護膜16はボンディングワイヤ14-1が接続されるパッド部
を除いて覆う構成にすると信頼性がさらに向上する。
As the adhesive member 21 for fixing the chips 5 to 12 on the chip 2, a conductive paste or an insulating paste may be used as in a normal IC. The wiring material of the bonding wire 14 and the electrode wiring pattern 13 is Al, Al
-Si, Al-Si-Cu, Cu, etc. are considered. Further, if the protective film 16 such as SiN that protects the periphery of the electrode wiring pattern 13 is covered except the pad portion to which the bonding wire 14-1 is connected, the reliability is further improved.

【0015】表面に電極配線パターン13が構成されたポ
リイミド系の絶縁膜4 はメタルと保護膜のパターン形成
のみで製作工程が短い。また、基板上に配線パターンを
展開するよりも複雑化が可能である。このような利点か
ら、マルチチップ実装の開発期間の短縮が期待できる。
The polyimide insulating film 4 having the electrode wiring pattern 13 formed on the surface has a short manufacturing process only by forming a pattern of a metal and a protective film. Further, it is possible to make it more complicated than to develop the wiring pattern on the substrate. Due to these advantages, it is expected that the development period of multi-chip mounting will be shortened.

【0016】さらに、ユーザへの納期短縮を達成するた
めに、電極配線パターン13は、予め幾つかのテストパタ
ーンに分類しておいてもよい。類似電極配線パターンを
選択し、レーザカッティング等により、配線を切断しな
がら回路構成するということも可能である。
Further, in order to shorten the delivery time to the user, the electrode wiring pattern 13 may be classified into some test patterns in advance. It is also possible to select a similar electrode wiring pattern and cut the wiring by laser cutting or the like to configure the circuit.

【0017】[0017]

【発明の効果】以上説明したようにこの発明によれば、
複雑な配線パターンを絶縁膜上に展開することにより、
ICチップ上の半導体チップ相互の配線接続が集積され
やすくなるので、高密度なマルチチップ実装を実現する
1パッケージ化された半導体装置を提供することができ
る。
As described above, according to the present invention,
By developing a complicated wiring pattern on the insulating film,
Since the wiring connections between the semiconductor chips on the IC chip are easily integrated, it is possible to provide a single-packaged semiconductor device that realizes high-density multi-chip mounting.

【図面の簡単な説明】[Brief description of drawings]

【図1】この発明の実施例に係る半導体装置の構成を示
す斜視図。
FIG. 1 is a perspective view showing the configuration of a semiconductor device according to an embodiment of the invention.

【図2】この発明の実施例に係る樹脂封止で1パッケー
ジ化した半導体装置の構成を示す断面図。
FIG. 2 is a cross-sectional view showing the configuration of a semiconductor device packaged in one package with resin sealing according to an embodiment of the present invention.

【図3】従来の樹脂封止型半導体装置の構成を示す断面
図。
FIG. 3 is a cross-sectional view showing the configuration of a conventional resin-sealed semiconductor device.

【符号の説明】[Explanation of symbols]

1…ベッド、 2…ICチップ、 3…表面保護膜、 4…絶
縁膜、 5〜12…半導体チップ、13…電極配線パターン、
14-1〜14-3…ボンディングワイヤ、15…リード、16…保
護膜、22…樹脂。
1 ... Bed, 2 ... IC chip, 3 ... Surface protective film, 4 ... Insulating film, 5-12 ... Semiconductor chip, 13 ... Electrode wiring pattern,
14-1 to 14-3 ... Bonding wire, 15 ... Lead, 16 ... Protective film, 22 ... Resin.

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 リードフレームのベッドに固着されたI
Cチップと、前記ICチップ上に形成された絶縁膜と、
前記絶縁膜上に形成された配線パターンと、前記絶縁膜
上に固着された前記ICチップより小さい複数の半導体
チップと、前記ICチップ及び半導体チップ各々と前記
配線パターンとが配線接続される第1の接続手段と、前
記ICチップ及び半導体チップ各々が相互に配線接続さ
れる第2の接続手段と、前記ICチップと前記リードフ
レームのリードとが配線接続される第3の接続手段とを
具備したことを特徴とする半導体装置。
1. An I fixed to a bed of a lead frame
A C chip, an insulating film formed on the IC chip,
A wiring pattern formed on the insulating film, a plurality of semiconductor chips smaller than the IC chip fixed on the insulating film, and the IC chip and each of the semiconductor chips and the wiring pattern are connected by wiring. Connection means, second connection means for interconnecting the IC chip and semiconductor chip to each other, and third connection means for interconnecting the IC chip and the lead of the lead frame. A semiconductor device characterized by the above.
【請求項2】 前記ICチップ上に形成され配線パター
ンが展開された前記絶縁膜はポリイミド系の部材であ
り、前記第1の接続手段がなされる前記配線パターンの
接続部を除いて保護膜で覆われていることを特徴とする
請求項1記載の半導体装置。
2. The insulating film formed on the IC chip and having a developed wiring pattern is a polyimide-based member, and is a protective film except for the connection portion of the wiring pattern where the first connecting means is formed. The semiconductor device according to claim 1, wherein the semiconductor device is covered.
JP27537091A 1991-10-23 1991-10-23 Semiconductor device Pending JPH05114693A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP27537091A JPH05114693A (en) 1991-10-23 1991-10-23 Semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP27537091A JPH05114693A (en) 1991-10-23 1991-10-23 Semiconductor device

Publications (1)

Publication Number Publication Date
JPH05114693A true JPH05114693A (en) 1993-05-07

Family

ID=17554540

Family Applications (1)

Application Number Title Priority Date Filing Date
JP27537091A Pending JPH05114693A (en) 1991-10-23 1991-10-23 Semiconductor device

Country Status (1)

Country Link
JP (1) JPH05114693A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6078514A (en) * 1997-09-09 2000-06-20 Fujitsu Limited Semiconductor device and semiconductor system for high-speed data transfer
US6534847B2 (en) * 1999-02-05 2003-03-18 Rohm Co., Ltd. Semiconductor device
KR100420880B1 (en) * 1999-06-02 2004-03-02 세이코 엡슨 가부시키가이샤 Multichip Mounted structure, Electro-optical apparatus, and Electronic apparatus
WO2007052476A1 (en) * 2005-11-02 2007-05-10 Matsushita Electric Industrial Co., Ltd. Electronic circuit device and method for manufacturing same
US8089142B2 (en) * 2002-02-13 2012-01-03 Micron Technology, Inc. Methods and apparatus for a stacked-die interposer

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6078514A (en) * 1997-09-09 2000-06-20 Fujitsu Limited Semiconductor device and semiconductor system for high-speed data transfer
US6534847B2 (en) * 1999-02-05 2003-03-18 Rohm Co., Ltd. Semiconductor device
KR100420880B1 (en) * 1999-06-02 2004-03-02 세이코 엡슨 가부시키가이샤 Multichip Mounted structure, Electro-optical apparatus, and Electronic apparatus
US8089142B2 (en) * 2002-02-13 2012-01-03 Micron Technology, Inc. Methods and apparatus for a stacked-die interposer
US8476117B2 (en) 2002-02-13 2013-07-02 Micron Technology, Inc. Methods and apparatus for a stacked-die interposer
WO2007052476A1 (en) * 2005-11-02 2007-05-10 Matsushita Electric Industrial Co., Ltd. Electronic circuit device and method for manufacturing same
US7910406B2 (en) 2005-11-02 2011-03-22 Panasonic Corporation Electronic circuit device and method for manufacturing same

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