JPH0499285A - Surface treatment of copper and copper alloy - Google Patents
Surface treatment of copper and copper alloyInfo
- Publication number
- JPH0499285A JPH0499285A JP21228590A JP21228590A JPH0499285A JP H0499285 A JPH0499285 A JP H0499285A JP 21228590 A JP21228590 A JP 21228590A JP 21228590 A JP21228590 A JP 21228590A JP H0499285 A JPH0499285 A JP H0499285A
- Authority
- JP
- Japan
- Prior art keywords
- copper
- methylbenzimidazole
- alkyl
- aqueous solution
- general formula
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 title claims abstract description 49
- 239000010949 copper Substances 0.000 title claims abstract description 49
- 229910052802 copper Inorganic materials 0.000 title claims abstract description 49
- 238000004381 surface treatment Methods 0.000 title claims abstract description 7
- 229910000881 Cu alloy Inorganic materials 0.000 title claims description 23
- 239000000126 substance Substances 0.000 claims abstract description 53
- 239000007864 aqueous solution Substances 0.000 claims description 39
- 238000000034 method Methods 0.000 claims description 37
- 150000007524 organic acids Chemical class 0.000 claims description 17
- 239000002184 metal Substances 0.000 claims description 13
- 229910052751 metal Inorganic materials 0.000 claims description 13
- 150000003752 zinc compounds Chemical class 0.000 claims description 12
- 239000005749 Copper compound Substances 0.000 claims description 9
- 150000001880 copper compounds Chemical class 0.000 claims description 9
- 125000000217 alkyl group Chemical group 0.000 claims description 6
- -1 methylbenzimidazole compound Chemical class 0.000 claims description 6
- 125000004432 carbon atom Chemical group C* 0.000 claims description 5
- 238000011282 treatment Methods 0.000 abstract description 21
- 239000002253 acid Substances 0.000 abstract description 5
- 239000011248 coating agent Substances 0.000 abstract description 3
- 238000000576 coating method Methods 0.000 abstract description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 51
- 239000000203 mixture Substances 0.000 description 42
- 238000007739 conversion coating Methods 0.000 description 33
- 229910000679 solder Inorganic materials 0.000 description 31
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 26
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 20
- 238000006243 chemical reaction Methods 0.000 description 19
- 235000011054 acetic acid Nutrition 0.000 description 17
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 10
- 235000019253 formic acid Nutrition 0.000 description 10
- ZOIORXHNWRGPMV-UHFFFAOYSA-N acetic acid;zinc Chemical compound [Zn].CC(O)=O.CC(O)=O ZOIORXHNWRGPMV-UHFFFAOYSA-N 0.000 description 9
- QGZKDVFQNNGYKY-UHFFFAOYSA-N ammonia Natural products N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 9
- 239000004246 zinc acetate Substances 0.000 description 9
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 description 6
- BGKOQGKVYNNKPY-UHFFFAOYSA-N 4-methyl-2-nonyl-1h-benzimidazole Chemical compound C1=CC=C2NC(CCCCCCCCC)=NC2=C1C BGKOQGKVYNNKPY-UHFFFAOYSA-N 0.000 description 5
- IFZRRIPBCLXGIY-UHFFFAOYSA-N 6-methyl-2-nonyl-1h-benzimidazole Chemical compound C1=C(C)C=C2NC(CCCCCCCCC)=NC2=C1 IFZRRIPBCLXGIY-UHFFFAOYSA-N 0.000 description 5
- 150000001875 compounds Chemical class 0.000 description 5
- OPQARKPSCNTWTJ-UHFFFAOYSA-L copper(ii) acetate Chemical compound [Cu+2].CC([O-])=O.CC([O-])=O OPQARKPSCNTWTJ-UHFFFAOYSA-L 0.000 description 5
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 5
- 239000007788 liquid Substances 0.000 description 5
- 239000000243 solution Substances 0.000 description 5
- ZAQWXILRCPEGCT-UHFFFAOYSA-N 6-methyl-2-undecyl-1h-benzimidazole Chemical compound C1=C(C)C=C2NC(CCCCCCCCCCC)=NC2=C1 ZAQWXILRCPEGCT-UHFFFAOYSA-N 0.000 description 4
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 4
- 229910021529 ammonia Inorganic materials 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 239000011701 zinc Substances 0.000 description 4
- 229910052725 zinc Inorganic materials 0.000 description 4
- LDZYRENCLPUXAX-UHFFFAOYSA-N 2-methyl-1h-benzimidazole Chemical compound C1=CC=C2NC(C)=NC2=C1 LDZYRENCLPUXAX-UHFFFAOYSA-N 0.000 description 3
- YNVMXYIPRINTOK-UHFFFAOYSA-N 4-methyl-2-undecyl-1h-benzimidazole Chemical compound C1=CC=C2NC(CCCCCCCCCCC)=NC2=C1C YNVMXYIPRINTOK-UHFFFAOYSA-N 0.000 description 3
- CLDPHUAFVPZLSV-UHFFFAOYSA-N 6-methyl-2-octyl-1h-benzimidazole Chemical compound C1=C(C)C=C2NC(CCCCCCCC)=NC2=C1 CLDPHUAFVPZLSV-UHFFFAOYSA-N 0.000 description 3
- RSWGJHLUYNHPMX-UHFFFAOYSA-N Abietic-Saeure Chemical class C12CCC(C(C)C)=CC2=CCC2C1(C)CCCC2(C)C(O)=O RSWGJHLUYNHPMX-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- KHPCPRHQVVSZAH-HUOMCSJISA-N Rosin Chemical class O(C/C=C/c1ccccc1)[C@H]1[C@H](O)[C@@H](O)[C@@H](O)[C@@H](CO)O1 KHPCPRHQVVSZAH-HUOMCSJISA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 3
- 229960003280 cupric chloride Drugs 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000005755 formation reaction Methods 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- 150000003505 terpenes Chemical class 0.000 description 3
- 235000007586 terpenes Nutrition 0.000 description 3
- 229920005992 thermoplastic resin Polymers 0.000 description 3
- KHPCPRHQVVSZAH-UHFFFAOYSA-N trans-cinnamyl beta-D-glucopyranoside Chemical class OC1C(O)C(O)C(CO)OC1OCC=CC1=CC=CC=C1 KHPCPRHQVVSZAH-UHFFFAOYSA-N 0.000 description 3
- CDPYBHGJWYBTGH-UHFFFAOYSA-N 2-hexyl-6-methyl-1h-benzimidazole Chemical compound C1=C(C)C=C2NC(CCCCCC)=NC2=C1 CDPYBHGJWYBTGH-UHFFFAOYSA-N 0.000 description 2
- AXNUJYHFQHQZBE-UHFFFAOYSA-N 3-methylbenzene-1,2-diamine Chemical compound CC1=CC=CC(N)=C1N AXNUJYHFQHQZBE-UHFFFAOYSA-N 0.000 description 2
- PABIBFWANRYHSW-UHFFFAOYSA-N 4-methyl-2-octyl-1h-benzimidazole Chemical compound C1=CC=C2NC(CCCCCCCC)=NC2=C1C PABIBFWANRYHSW-UHFFFAOYSA-N 0.000 description 2
- RWXZXCZBMQPOBF-UHFFFAOYSA-N 5-methyl-1H-benzimidazole Chemical compound CC1=CC=C2N=CNC2=C1 RWXZXCZBMQPOBF-UHFFFAOYSA-N 0.000 description 2
- OWJJMCYAKBKGON-UHFFFAOYSA-N 6-methyl-2-pentyl-1h-benzimidazole Chemical compound C1=C(C)C=C2NC(CCCCC)=NC2=C1 OWJJMCYAKBKGON-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 2
- JPVYNHNXODAKFH-UHFFFAOYSA-N Cu2+ Chemical compound [Cu+2] JPVYNHNXODAKFH-UHFFFAOYSA-N 0.000 description 2
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 2
- AEMRFAOFKBGASW-UHFFFAOYSA-N Glycolic acid Chemical compound OCC(O)=O AEMRFAOFKBGASW-UHFFFAOYSA-N 0.000 description 2
- 239000013032 Hydrocarbon resin Substances 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 2
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 150000001879 copper Chemical class 0.000 description 2
- 150000004699 copper complex Chemical class 0.000 description 2
- 229910001431 copper ion Inorganic materials 0.000 description 2
- GHVNFZFCNZKVNT-UHFFFAOYSA-N decanoic acid Chemical compound CCCCCCCCCC(O)=O GHVNFZFCNZKVNT-UHFFFAOYSA-N 0.000 description 2
- 238000005238 degreasing Methods 0.000 description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 229920006270 hydrocarbon resin Polymers 0.000 description 2
- 238000007654 immersion Methods 0.000 description 2
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- YGSDEFSMJLZEOE-UHFFFAOYSA-N salicylic acid Chemical compound OC(=O)C1=CC=CC=C1O YGSDEFSMJLZEOE-UHFFFAOYSA-N 0.000 description 2
- 238000005476 soldering Methods 0.000 description 2
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 2
- 238000009736 wetting Methods 0.000 description 2
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 description 2
- ONDPHDOFVYQSGI-UHFFFAOYSA-N zinc nitrate Chemical compound [Zn+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O ONDPHDOFVYQSGI-UHFFFAOYSA-N 0.000 description 2
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- KWXMCOSRMGUVNJ-UHFFFAOYSA-N 2-butyl-4-methyl-1h-benzimidazole Chemical compound C1=CC=C2NC(CCCC)=NC2=C1C KWXMCOSRMGUVNJ-UHFFFAOYSA-N 0.000 description 1
- PKWBIPJGJPPPOB-UHFFFAOYSA-N 2-butyl-6-methyl-1h-benzimidazole Chemical compound C1=C(C)C=C2NC(CCCC)=NC2=C1 PKWBIPJGJPPPOB-UHFFFAOYSA-N 0.000 description 1
- MKLLVTVNDXUBND-UHFFFAOYSA-N 2-heptadecyl-4-methyl-1h-benzimidazole Chemical compound C1=CC=C2NC(CCCCCCCCCCCCCCCCC)=NC2=C1C MKLLVTVNDXUBND-UHFFFAOYSA-N 0.000 description 1
- ROLDRAMHAAUNNF-UHFFFAOYSA-N 2-heptadecyl-6-methyl-1h-benzimidazole Chemical compound C1=C(C)C=C2NC(CCCCCCCCCCCCCCCCC)=NC2=C1 ROLDRAMHAAUNNF-UHFFFAOYSA-N 0.000 description 1
- SKQXYXHRRHGZHU-UHFFFAOYSA-N 2-heptyl-6-methyl-1h-benzimidazole Chemical compound C1=C(C)C=C2NC(CCCCCCC)=NC2=C1 SKQXYXHRRHGZHU-UHFFFAOYSA-N 0.000 description 1
- OYGJENONTDCXGW-UHFFFAOYSA-N 2-pentyl-1h-benzimidazole Chemical compound C1=CC=C2NC(CCCCC)=NC2=C1 OYGJENONTDCXGW-UHFFFAOYSA-N 0.000 description 1
- LLEASVZEQBICSN-UHFFFAOYSA-N 2-undecyl-1h-imidazole Chemical compound CCCCCCCCCCCC1=NC=CN1 LLEASVZEQBICSN-UHFFFAOYSA-N 0.000 description 1
- QCXGJTGMGJOYDP-UHFFFAOYSA-N 4-methyl-1h-benzimidazole Chemical compound CC1=CC=CC2=C1N=CN2 QCXGJTGMGJOYDP-UHFFFAOYSA-N 0.000 description 1
- KKECAJNLCGRKJL-UHFFFAOYSA-N 4-methyl-2-propyl-1h-benzimidazole Chemical compound C1=CC(C)=C2NC(CCC)=NC2=C1 KKECAJNLCGRKJL-UHFFFAOYSA-N 0.000 description 1
- DGRGLKZMKWPMOH-UHFFFAOYSA-N 4-methylbenzene-1,2-diamine Chemical compound CC1=CC=C(N)C(N)=C1 DGRGLKZMKWPMOH-UHFFFAOYSA-N 0.000 description 1
- OTLNPYWUJOZPPA-UHFFFAOYSA-N 4-nitrobenzoic acid Chemical compound OC(=O)C1=CC=C([N+]([O-])=O)C=C1 OTLNPYWUJOZPPA-UHFFFAOYSA-N 0.000 description 1
- RCVFZYIDHRLOHX-UHFFFAOYSA-N 6-methyl-2-propyl-1h-benzimidazole Chemical compound C1=C(C)C=C2NC(CCC)=NC2=C1 RCVFZYIDHRLOHX-UHFFFAOYSA-N 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 1
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
- 239000005711 Benzoic acid Substances 0.000 description 1
- 235000007575 Calluna vulgaris Nutrition 0.000 description 1
- 239000005632 Capric acid (CAS 334-48-5) Substances 0.000 description 1
- JJLJMEJHUUYSSY-UHFFFAOYSA-L Copper hydroxide Chemical compound [OH-].[OH-].[Cu+2] JJLJMEJHUUYSSY-UHFFFAOYSA-L 0.000 description 1
- 239000005750 Copper hydroxide Substances 0.000 description 1
- 229910021591 Copper(I) chloride Inorganic materials 0.000 description 1
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 description 1
- 241001072332 Monia Species 0.000 description 1
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 1
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 1
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 description 1
- 238000005411 Van der Waals force Methods 0.000 description 1
- CANRESZKMUPMAE-UHFFFAOYSA-L Zinc lactate Chemical compound [Zn+2].CC(O)C([O-])=O.CC(O)C([O-])=O CANRESZKMUPMAE-UHFFFAOYSA-L 0.000 description 1
- RAOSIAYCXKBGFE-UHFFFAOYSA-K [Cu+3].[O-]P([O-])([O-])=O Chemical compound [Cu+3].[O-]P([O-])([O-])=O RAOSIAYCXKBGFE-UHFFFAOYSA-K 0.000 description 1
- 239000001361 adipic acid Substances 0.000 description 1
- 235000011037 adipic acid Nutrition 0.000 description 1
- 125000002723 alicyclic group Chemical group 0.000 description 1
- 229920006271 aliphatic hydrocarbon resin Polymers 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 229920006272 aromatic hydrocarbon resin Polymers 0.000 description 1
- 235000010233 benzoic acid Nutrition 0.000 description 1
- ODWXUNBKCRECNW-UHFFFAOYSA-M bromocopper(1+) Chemical compound Br[Cu+] ODWXUNBKCRECNW-UHFFFAOYSA-M 0.000 description 1
- 239000006172 buffering agent Substances 0.000 description 1
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 150000001869 cobalt compounds Chemical class 0.000 description 1
- 230000009918 complex formation Effects 0.000 description 1
- 229910001956 copper hydroxide Inorganic materials 0.000 description 1
- 229910000365 copper sulfate Inorganic materials 0.000 description 1
- OXBLHERUFWYNTN-UHFFFAOYSA-M copper(I) chloride Chemical compound [Cu]Cl OXBLHERUFWYNTN-UHFFFAOYSA-M 0.000 description 1
- XTVVROIMIGLXTD-UHFFFAOYSA-N copper(II) nitrate Chemical compound [Cu+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O XTVVROIMIGLXTD-UHFFFAOYSA-N 0.000 description 1
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 description 1
- 229940045803 cuprous chloride Drugs 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- MFGZXPGKKJMZIY-UHFFFAOYSA-N ethyl 5-amino-1-(4-sulfamoylphenyl)pyrazole-4-carboxylate Chemical compound NC1=C(C(=O)OCC)C=NN1C1=CC=C(S(N)(=O)=O)C=C1 MFGZXPGKKJMZIY-UHFFFAOYSA-N 0.000 description 1
- 239000001530 fumaric acid Substances 0.000 description 1
- 235000011087 fumaric acid Nutrition 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 150000002460 imidazoles Chemical class 0.000 description 1
- 239000004310 lactic acid Substances 0.000 description 1
- 235000014655 lactic acid Nutrition 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- 150000002816 nickel compounds Chemical class 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- FJKROLUGYXJWQN-UHFFFAOYSA-N papa-hydroxy-benzoic acid Natural products OC(=O)C1=CC=C(O)C=C1 FJKROLUGYXJWQN-UHFFFAOYSA-N 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- DYFXGORUJGZJCA-UHFFFAOYSA-N phenylmethanediamine Chemical compound NC(N)C1=CC=CC=C1 DYFXGORUJGZJCA-UHFFFAOYSA-N 0.000 description 1
- OXNIZHLAWKMVMX-UHFFFAOYSA-N picric acid Chemical compound OC1=C([N+]([O-])=O)C=C([N+]([O-])=O)C=C1[N+]([O-])=O OXNIZHLAWKMVMX-UHFFFAOYSA-N 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 235000019260 propionic acid Nutrition 0.000 description 1
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 1
- 229960004889 salicylic acid Drugs 0.000 description 1
- 235000002906 tartaric acid Nutrition 0.000 description 1
- 239000011975 tartaric acid Substances 0.000 description 1
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 1
- WGIWBXUNRXCYRA-UHFFFAOYSA-H trizinc;2-hydroxypropane-1,2,3-tricarboxylate Chemical compound [Zn+2].[Zn+2].[Zn+2].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O.[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O WGIWBXUNRXCYRA-UHFFFAOYSA-H 0.000 description 1
- 239000011592 zinc chloride Substances 0.000 description 1
- 235000005074 zinc chloride Nutrition 0.000 description 1
- 239000011746 zinc citrate Substances 0.000 description 1
- 235000006076 zinc citrate Nutrition 0.000 description 1
- 229940068475 zinc citrate Drugs 0.000 description 1
- SRWMQSFFRFWREA-UHFFFAOYSA-M zinc formate Chemical compound [Zn+2].[O-]C=O SRWMQSFFRFWREA-UHFFFAOYSA-M 0.000 description 1
- 239000011576 zinc lactate Substances 0.000 description 1
- 229940050168 zinc lactate Drugs 0.000 description 1
- 235000000193 zinc lactate Nutrition 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
- LRXTYHSAJDENHV-UHFFFAOYSA-H zinc phosphate Chemical compound [Zn+2].[Zn+2].[Zn+2].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O LRXTYHSAJDENHV-UHFFFAOYSA-H 0.000 description 1
- 229910000165 zinc phosphate Inorganic materials 0.000 description 1
- NWONKYPBYAMBJT-UHFFFAOYSA-L zinc sulfate Chemical compound [Zn+2].[O-]S([O-])(=O)=O NWONKYPBYAMBJT-UHFFFAOYSA-L 0.000 description 1
- 229910000368 zinc sulfate Inorganic materials 0.000 description 1
- 229960001763 zinc sulfate Drugs 0.000 description 1
- JDLYKQWJXAQNNS-UHFFFAOYSA-L zinc;dibenzoate Chemical compound [Zn+2].[O-]C(=O)C1=CC=CC=C1.[O-]C(=O)C1=CC=CC=C1 JDLYKQWJXAQNNS-UHFFFAOYSA-L 0.000 description 1
- ZPEJZWGMHAKWNL-UHFFFAOYSA-L zinc;oxalate Chemical compound [Zn+2].[O-]C(=O)C([O-])=O ZPEJZWGMHAKWNL-UHFFFAOYSA-L 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F11/00—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent
- C23F11/08—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent in other liquids
- C23F11/10—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent in other liquids using organic inhibitors
- C23F11/14—Nitrogen-containing compounds
- C23F11/149—Heterocyclic compounds containing nitrogen as hetero atom
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Abstract
Description
【発明の詳細な説明】
産業上の利用分野
本発明は銅及び銅合金の表面に耐熱性に優れた化成被膜
を形成する方法に関するものであり、特に硬質プリント
配線板及びフレキシブルプリント配線板における回路部
のプリフラックス処理として好適な方法を提供するもの
である。DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application The present invention relates to a method for forming a chemical conversion film with excellent heat resistance on the surface of copper and copper alloys, and particularly relates to a method for forming a chemical conversion film with excellent heat resistance on the surface of copper and copper alloys, and in particular for forming circuits on rigid printed wiring boards and flexible printed wiring boards. The present invention provides a method suitable for preflux treatment of parts.
従来の技術
銅あるいは銅合金の表面に、2位長鎖アルキルイミダゾ
ール化合物の被膜を形成する表面処理方法が、特公昭4
6−17046号、同48−11454号、同48−2
5621号、同49−1983号、同49−26183
号、同58−22545号、同61−41988号及び
特開昭61−90492号公報に記載されている。Conventional technology A surface treatment method for forming a film of a 2-position long-chain alkylimidazole compound on the surface of copper or copper alloy was developed in the Japanese Patent Publication Publication No. 4
No. 6-17046, No. 48-11454, No. 48-2
No. 5621, No. 49-1983, No. 49-26183
No. 58-22545, No. 61-41988, and Japanese Unexamined Patent Publication No. 61-90492.
また銅あるいは銅合金の表面にヘンズイミダヅール系化
合物の化成被膜を形成する方法として、特開昭58−5
01281号公報に5−メチルベンズイミダゾールを用
いる処理が開示されている。In addition, as a method for forming a chemical conversion film of a henzimidazur compound on the surface of copper or copper alloy, JP-A-58-5
No. 01281 discloses a treatment using 5-methylbenzimidazole.
発明が解決しようとする課題
近時プリント配線板に対する電子部品の接合方法として
、表面実装法が多く採用されるようになり、チップ部品
の仮止め、部品装置の両面装着あるいはチップ部品とデ
ィスクリート部品の混載などにより、プリント配線板が
高温下に曝されるようになった。Problems to be Solved by the Invention In recent years, surface mounting methods have been increasingly adopted as a method for bonding electronic components to printed wiring boards. Due to mixed mounting, printed wiring boards are now exposed to high temperatures.
しかしながら、従来知られている2位長鎖アルキルイミ
ダゾールの化成被膜を銅回路部に形成したものは、室温
近辺においては安定しているか高温下では変色し、時と
してはんだ付けに支障を来たす惧れがあった。However, conventionally known chemical conversion coatings of 2-position long-chain alkylimidazole formed on copper circuits are stable at around room temperature, but discolor at high temperatures, and there is a risk that they may interfere with soldering. was there.
また特開昭58−501281号公報に記載の表面処理
方法は、5−メチルベンズイミダゾールが水に比較的溶
は易いため、好ましい膜厚と認められる0゜08μm以
上の化成被膜を形成することができず、加熱時における
下地保護の役割を果し難いものであった。Furthermore, in the surface treatment method described in JP-A-58-501281, since 5-methylbenzimidazole is relatively easily soluble in water, it is possible to form a chemical conversion film with a thickness of 0.08 μm or more, which is considered to be a preferable film thickness. Therefore, it was difficult to fulfill the role of protecting the base during heating.
このようにプリント配線板の表面実装法に対応して、銅
金属の表面により耐熱性に優れたプリフラックス被膜を
形成することが望まれていた。Thus, in response to the surface mounting method of printed wiring boards, it has been desired to form a preflux coating with better heat resistance on the surface of copper metal.
課題を解決するための手段
本発明者等は、このような事情に鑑み鋭意試験を重ねた
結果、銅あるいは銅合金の表面に、下記の一般式Iで示
される2−アルキル−4−メチルベンズイミダゾール化
合物と下記の一般式■で示される2−アルキル−5−メ
チルベンズイミダゾール化合物の両者(以下2−アルキ
ル−メチルベンズイミダゾール混合物という)
(以下余白)
(但し、式中R1は炭素数3以上のアルキル基を示す)
及び有機酸の夫々を含む水溶液を接触させることによっ
て、耐熱性に優れた化成被膜が得られることを見い出し
、本発明を完遂するに至った。Means for Solving the Problems In view of the above circumstances, the inventors of the present invention have conducted intensive tests and found that 2-alkyl-4-methylbenz represented by the following general formula I is added to the surface of copper or copper alloy. Both an imidazole compound and a 2-alkyl-5-methylbenzimidazole compound represented by the following general formula (hereinafter referred to as a 2-alkyl-methylbenzimidazole mixture) (hereinafter referred to as a margin) (However, in the formula, R1 has 3 or more carbon atoms. (indicates an alkyl group)
The present inventors have discovered that a chemical conversion film with excellent heat resistance can be obtained by contacting an aqueous solution containing an organic acid and an organic acid, and have completed the present invention.
本発明方法の実施において用いられる2−アルキル−メ
チルベンズイミダゾール混合物の代表的なものとしては
、2−プロピル−4−メチルベンズイミダゾール七2−
プロピル−5−メチルベンズイミダゾールの混合物、2
−ブチル−4−メチルベンズイミダゾールと2−ブチル
−5−メチルベンズイミダゾールの混合物、2−ベンチ
ルー4−メチルベンズイミダゾールと2−ベンチルー5
−メチルベンズイミダゾールの混合物、2−へキシル−
4−メチルベンズイミダゾールと2−ヘキシル−5−メ
チルベンズイミダゾールの混合物、2−へブチル−4−
メチルベンズイミダゾールと2−へ7’チル−5−メチ
ルベンズイミダゾールの混合物、2−オクチル−4−メ
チルベンズイミダゾールと2−オクチル−5−メチルベ
ンズイミダゾールの混合L 2−ノニル−4−メチルベ
ンズイミダゾールと2−ノニル−5−メチルベンズイミ
ダゾールの混合物、2−ウンデシル−4−メチルベンズ
イミダゾールと2−ウンデシル−5〜メチルベンズイミ
ダゾールの混合物、2−ヘプタデシル−4−メチルベン
ズイミダゾールと2−ハブタテシル−5−メチルベンズ
イミダゾールの混合物並びにこれらの塩である。Representative 2-alkyl-methylbenzimidazole mixtures used in the practice of the invention include 2-propyl-4-methylbenzimidazole 72-
mixture of propyl-5-methylbenzimidazole, 2
-Mixture of butyl-4-methylbenzimidazole and 2-butyl-5-methylbenzimidazole, 2-benziru-4-methylbenzimidazole and 2-benziru-5
-Mixture of methylbenzimidazole, 2-hexyl-
Mixture of 4-methylbenzimidazole and 2-hexyl-5-methylbenzimidazole, 2-hebutyl-4-
Mixture of methylbenzimidazole and 2-7'thyl-5-methylbenzimidazole, Mixture of 2-octyl-4-methylbenzimidazole and 2-octyl-5-methylbenzimidazole L 2-nonyl-4-methylbenzimidazole and 2-nonyl-5-methylbenzimidazole; a mixture of 2-undecyl-4-methylbenzimidazole and 2-undecyl-5-methylbenzimidazole; - mixtures of methylbenzimidazole and their salts.
2−アルキル−4−メチルベンズイミダゾール化合物は
、2.3−ジアミノトルエンと対応するカルボン酸を加
熱縮合することにより容易に得られ一部2−アルキルー
5−メチルベンズイミダゾール化合物は、3,4−ジア
ミノトルエンと対応するカルボン酸を加熱縮合すること
により容易に得られる。前記の方法により夫々単独に得
られた2アルキル−4−メチルベンズイミダゾール化合
物と2−アルキル−5−メチルベンズイミダゾール化合
物を2:8ないし8:2の割合で混合することにより、
本発明方法において用いられる2アルキル−メチルベン
ズイミダゾール混合物が得られる。2-alkyl-4-methylbenzimidazole compounds can be easily obtained by heating and condensing 2,3-diaminotoluene with the corresponding carboxylic acid. It can be easily obtained by heating and condensing diaminotoluene and the corresponding carboxylic acid. By mixing the 2-alkyl-4-methylbenzimidazole compound and the 2-alkyl-5-methylbenzimidazole compound obtained individually by the above method in a ratio of 2:8 to 8:2,
The 2-alkyl-methylbenzimidazole mixture used in the process of the invention is obtained.
また2、3−ジアミノトルエン及び3,4−ジアミノト
ルエンの混合物とカルボン酸を反応させることにより、
本発明方法において用いられる2−アルキル−メチルベ
ンズイミダゾール混合物を容易に得ることができる。Also, by reacting a mixture of 2,3-diaminotoluene and 3,4-diaminotoluene with a carboxylic acid,
The 2-alkyl-methylbenzimidazole mixture used in the process of the invention can be easily obtained.
但し、炭素数が3より少ないアルキル基を有する2−ア
ルキル−メチルベンズイミダゾール混合物を用いた場合
、銅金属の表面に形成された化成被膜の一部が溶出する
傾向があり、また炭素数が大きいアルキル基を持つ2−
アルキル−メチルベンズイミダゾール混合物を使用する
と、2−アルキル−メチルベンズイミダゾール混合物を
溶解して処理液を造る際に大量の有機酸が必要になるた
め、前記混合物のうち2−ペンチル−4−メチルベンズ
イミダゾールと2−ペンチル−5−メチルベンズイミダ
ゾールの混合物、2−一・キシル−4メチルヘンズイミ
ダゾールと2−ヘキシル−5−メチルベンズイミダゾー
ルの混合物、2−へブチル−4−メチルベンズイミダゾ
ールと2−ヘプチル−5−メチルベンズイミダゾールの
混合物、2−オクチル−4−メチルベンズイミダゾール
と2−オクチル−5−メチルベンズイミダゾールの混合
物、2−ノニル−4−メチルベンズイミダゾールと2〜
ノニル−5−メチルベンズイミダシルの混合物、2−ウ
ンデシル−4−メチルベンズイミダゾールと2−ウンデ
シル−5−メチルベンズイミダゾールの混合物及びこれ
らの塩が特に好適である。However, when using a 2-alkyl-methylbenzimidazole mixture having an alkyl group with fewer than 3 carbon atoms, a part of the chemical conversion film formed on the surface of copper metal tends to be eluted; 2- with an alkyl group
When an alkyl-methylbenzimidazole mixture is used, a large amount of organic acid is required when dissolving the 2-alkyl-methylbenzimidazole mixture to prepare a treatment solution. A mixture of imidazole and 2-pentyl-5-methylbenzimidazole, a mixture of 2-1-xyl-4-methylhenzimidazole and 2-hexyl-5-methylbenzimidazole, a mixture of 2-hebutyl-4-methylbenzimidazole and 2- A mixture of heptyl-5-methylbenzimidazole, a mixture of 2-octyl-4-methylbenzimidazole and 2-octyl-5-methylbenzimidazole, a mixture of 2-nonyl-4-methylbenzimidazole and 2-
Particularly preferred are mixtures of nonyl-5-methylbenzimidazole, mixtures of 2-undecyl-4-methylbenzimidazole and 2-undecyl-5-methylbenzimidazole, and salts thereof.
2−アルキル−4−メチルベンズイミダゾールと2−ア
ルキル−5−メチルベンズイミダゾールの混合比を、2
:8ないし8:2の範囲として処理した場合の金属表面
の化成被膜は、半田濡れ性に優れている。The mixing ratio of 2-alkyl-4-methylbenzimidazole and 2-alkyl-5-methylbenzimidazole was 2.
The chemical conversion coating on the metal surface when treated in the range of :8 to 8:2 has excellent solder wettability.
本発明方法の実施に当っては、水に対して2−アルキル
−メチルベンズイミダゾール混合物を0゜01〜5%の
範囲、好ましくは0.1〜2%の割合で添加し、これら
を水に溶解させるために、有機酸を加えて2−アルキル
−メチルベンズイミダゾール混合物を水に可溶な塩とす
ればよい。In carrying out the method of the present invention, a 2-alkyl-methylbenzimidazole mixture is added to water in a proportion of 0.01 to 5%, preferably 0.1 to 2%. For dissolution, an organic acid may be added to render the 2-alkyl-methylbenzimidazole mixture into a water-soluble salt.
本発明方法の実施において用いられる有機酸としては、
蟻酸、酢酸、乳酸、プロピオン酸、カプリン酸、グリコ
ール酸、アクリル酸、安息香酸、パラニトロ安息香酸、
パラブチル安息香酸、パラトルエンスルフォン酸、ピク
リン酸、サリチル酸、−一トルイル酸、蓚酸、琥珀酸、
マレイン酸、フマール酸、酒石酸、アジピン酸等があり
、水に対して0.01〜15%の範囲、好ましくは0.
2〜5%の割合で添加すれば良い。The organic acids used in carrying out the method of the present invention include:
Formic acid, acetic acid, lactic acid, propionic acid, capric acid, glycolic acid, acrylic acid, benzoic acid, paranitrobenzoic acid,
Parabutylbenzoic acid, paratoluenesulfonic acid, picric acid, salicylic acid, -monotoluic acid, oxalic acid, succinic acid,
Maleic acid, fumaric acid, tartaric acid, adipic acid, etc. are included in the range of 0.01 to 15%, preferably 0.01% to 15% based on water.
It may be added at a rate of 2 to 5%.
本発明方法を実施するには、銅あるいは銅合金の表面に
研磨、脱脂、ソフトエツチング、酸洗浄等の処理を行っ
たのち、金属表面を処理液中に浸漬するかあるいは金属
表面に処理液を塗布または噴霧すれば良い。To carry out the method of the present invention, the surface of copper or copper alloy is subjected to treatments such as polishing, degreasing, soft etching, and acid cleaning, and then the metal surface is immersed in a treatment solution or the metal surface is coated with a treatment solution. It can be applied or sprayed.
本発明方法における銅あるいは銅合金の表面に2−アル
キル−メチルベンズイミダゾール混合物及び有機酸を含
む水溶液を接触させる工程は、水溶液の温度を約20°
Cから60′Cとし、接触時間を1秒ないし数分間接触
させれば良い。In the method of the present invention, the step of bringing an aqueous solution containing a 2-alkyl-methylbenzimidazole mixture and an organic acid into contact with the surface of copper or a copper alloy involves controlling the temperature of the aqueous solution to about 20°C.
C to 60'C and the contact time is from 1 second to several minutes.
本発明者等は前記特定発明の方法において、金属表面に
生じる2−アルキル−メチルベンズイミダゾール混合物
の化成被膜に、さらに耐熱性を付与する試みを行った結
果、2−アルキル−メチルベンズイミダゾール混合物及
び有機酸を含む水溶液に少なくとも亜鉛化合物あるいは
銅化合物のいずれか一種を添加した水溶液を銅あるいは
銅合金の表面に接触させる方法(以下「−段処理法」と
いう)によって所期の目的を達成することができる。The present inventors conducted an attempt to impart further heat resistance to the chemical conversion film of the 2-alkyl-methylbenzimidazole mixture formed on the metal surface in the method of the specific invention, and found that the 2-alkyl-methylbenzimidazole mixture and Achieving the desired purpose by a method in which an aqueous solution containing an organic acid and at least one of a zinc compound or a copper compound is brought into contact with the surface of copper or copper alloy (hereinafter referred to as "-step treatment method"). I can do it.
また同様の化成被膜の耐熱性の更なる向上は銅あるいは
銅合金の表面に2−アルキル−メチルベンズイミダゾー
ル混合物及び有機酸を含む水溶液を接触させ、続いて前
記処理が行われた金属表面に少なくとも亜鉛化合物ある
いは銅化合物のいずれか一種を含む水溶液を接触させる
方法(以下「二段処理法」という)によっても得ること
ができる。Furthermore, the heat resistance of similar chemical conversion coatings can be further improved by contacting the surface of copper or copper alloy with an aqueous solution containing a 2-alkyl-methylbenzimidazole mixture and an organic acid, and then applying at least It can also be obtained by a method of contacting an aqueous solution containing either a zinc compound or a copper compound (hereinafter referred to as "two-stage treatment method").
これらの方法に使用することができる亜鉛化合物め代表
的なものとしては、酸化亜鉛、蟻酸亜鉛、酢酸亜鉛、蓚
酸亜鉛、乳酸亜鉛、クエン酸亜鉛、安息香酸亜鉛、サリ
チル酸亜鈴、硫酸亜鉛、硝酸亜鉛、リン酸亜鉛等であり
、また銅化合物の代表的なものとしては、塩化第一銅、
塩化第二洞、水酸化銅、リン酸銅、酢酸銅、硫酸銅、硝
酸銅、臭化銅等であり、いずれも水に対して0.02〜
10%の範囲、好ましくは0.1〜5%の割合で添加す
ればよい。Typical zinc compounds that can be used in these methods include zinc oxide, zinc formate, zinc acetate, zinc oxalate, zinc lactate, zinc citrate, zinc benzoate, zinc salicylate, zinc sulfate, and zinc nitrate. , zinc phosphate, etc. Typical copper compounds include cuprous chloride,
These include dichloride, copper hydroxide, copper phosphate, copper acetate, copper sulfate, copper nitrate, copper bromide, etc., all of which have a concentration of 0.02 to 0.02 to water.
It may be added at a rate of 10%, preferably 0.1 to 5%.
また、この場合亜鉛化合物あるいは銅化合物を含む水溶
液に有機酸、無機酸及びアンモニア水あるいはアミン類
等の緩衝作用を有する物質を添加して、溶液のpHを安
定にすることが好ましい。Further, in this case, it is preferable to stabilize the pH of the solution by adding an organic acid, an inorganic acid, and a buffering substance such as aqueous ammonia or amines to the aqueous solution containing the zinc compound or copper compound.
本発明の一段処理法は、2−アルキル−メチルベンズイ
ミダゾール混合物及び有機酸を含む水溶液に、少なくと
も亜鉛化合物あるいは銅化合物のいずれか一種を添加し
たものを用いる以外は特定発明と全く同様の方法によっ
て行うことができる。The one-stage treatment method of the present invention is carried out in exactly the same manner as in the specified invention, except that at least one of a zinc compound or a copper compound is added to an aqueous solution containing a 2-alkyl-methylbenzimidazole mixture and an organic acid. It can be carried out.
また本発明の二段処理法において、2−アルキル−メチ
ルベンズイミダゾール混合物と有m6を含む水溶液を銅
あるいは銅合金の表面に接触したのち、化成被膜が形成
された金属表面を少なくとも亜鉛化合物あるいは銅化合
物のいずれか一種を含む水溶液に約20°Cないし60
゛Cの温度て5秒ないし数分間浸漬すれば良い。Furthermore, in the two-stage treatment method of the present invention, after an aqueous solution containing a 2-alkyl-methylbenzimidazole mixture and m6 is brought into contact with the surface of copper or a copper alloy, the metal surface on which a chemical conversion film has been formed is coated with at least a zinc compound or copper. About 20°C to 60°C to an aqueous solution containing any one of the compounds.
It may be immersed at a temperature of 5 seconds to several minutes.
本発明方法においては、特定発明に亜鉛化合物、銅化合
物、ニッケル化合物及びコバルト化合物を二種以上添加
して実施することもできる。The method of the present invention can also be carried out by adding two or more kinds of zinc compounds, copper compounds, nickel compounds, and cobalt compounds to the specified invention.
また本発明方法の実施において、化成被膜上に熱可塑性
樹脂の二層構造を形成し、耐熱性を向上させることも可
能である。Furthermore, in carrying out the method of the present invention, it is also possible to form a two-layer structure of thermoplastic resin on the chemical conversion film to improve heat resistance.
即ち銅あるいは銅合金の表面に2−アルキルメチルベン
ズイミダゾール混合物の化成被膜を形成したのち、ロジ
ン、ロジンエステル等のロジン誘導体、テルペン樹脂、
テルペンフェノール樹脂等のテルペン樹脂誘導体及び芳
香族炭化水素樹脂、脂肪族炭化水素樹脂、脂環族炭化水
素樹脂等の炭化水素樹脂などからなる耐熱性ti優れた
熱可塑性樹脂をトルエン、酢酸エチル、IPA等の)容
媒に溶解し、ロールコータ−法等により化成被股上に膜
厚1〜30μ、好ましくは2〜20μの厚みになるよう
に均一・ムこ塗布し、化成被膜と熱可塑性樹脂の二層構
造を形成すればよい。That is, after forming a chemical conversion film of a 2-alkylmethylbenzimidazole mixture on the surface of copper or copper alloy, rosin, rosin derivatives such as rosin ester, terpene resin,
Thermoplastic resins with excellent heat resistance consisting of terpene resin derivatives such as terpene phenol resins and hydrocarbon resins such as aromatic hydrocarbon resins, aliphatic hydrocarbon resins, and alicyclic hydrocarbon resins are mixed with toluene, ethyl acetate, and IPA. etc.) and apply it uniformly and evenly onto the chemical conversion coating using a roll coater method or the like to a thickness of 1 to 30μ, preferably 2 to 20μ, to separate the chemical conversion coating and thermoplastic resin. A two-layer structure may be formed.
作用
銅あるいは銅合金の表面に、2−アルキル−メチルベン
ズイミダゾール混合物及び有機酸を含む水?g ’t&
を接触させると、2〜アルキル−メチルベンズイミダゾ
ール混合物と銅との錯体形成反応及び2−アルキル−メ
チルベンズイミダゾール混合物間の水素結合とファンデ
ルワールス力の両作用により、局部的に銅錯体となった
2−アルキルメチルベンズイミダゾール混合物の化成被
膜が銅表面上に形成される。Effect: Water containing 2-alkyl-methylbenzimidazole mixture and organic acid on the surface of copper or copper alloy? g't&
When brought into contact with each other, a copper complex is locally formed due to the complex formation reaction between the 2-alkyl-methylbenzimidazole mixture and copper and the effects of hydrogen bonding and van der Waals forces between the 2-alkyl-methylbenzimidazole mixture. A conversion coating of a 2-alkylmethylbenzimidazole mixture is formed on the copper surface.
このようにして形成された化成被膜を放置しあるいは加
熱すると銅表面からの銅の移行が起こり、2−アルキル
−メチルベンズイミダゾール混合物の大部分が2−アル
キルーメチルヘンズイミダヅール銅錯体となり、2−ア
ルキル−メチルベンズイミダゾールからなる化成被膜は
共役したヘンゼン環を含むので、熱的に安定しているも
のと思われる。When the chemical conversion film formed in this way is left or heated, copper migrates from the copper surface, and most of the 2-alkyl-methylbenzimidazole mixture becomes a 2-alkyl-methylhenzimidazole copper complex. , 2-alkyl-methylbenzimidazole contains a conjugated Hensen ring, and is therefore considered to be thermally stable.
銅金属の表面に2−アルキル−4−メチルベンズイミダ
ゾールと2−アルキル−5−メチルベンズイミダゾール
の混合物からなる化成被膜を形成した場合、夫々の化合
物を単独で処理した場合↓ご比べて、はんだ濡れ性↓こ
優れた化成被膜が得られるが、その理由については定か
でない。When a chemical conversion film made of a mixture of 2-alkyl-4-methylbenzimidazole and 2-alkyl-5-methylbenzimidazole is formed on the surface of copper metal, the solder A chemical conversion film with excellent wettability can be obtained, but the reason for this is not clear.
銅あるいは銅合金の表面に2−アルキル−メチルベンズ
イミダゾール混合物及び有機酸を含む水溶液を接触させ
、続いて前記処理がされた金属表面を亜鉛化合物を含む
水溶液に接触させると、亜鉛化合物を含む水溶液から亜
鉛が化成被膜中に取り込まれて、一部2−アルキルーメ
チルベンズイミダヅール銅錯体が含まれるものの、大部
分が銅錯体よりも熱的乙こかなり安定な2−アルキル−
メチル−、ンズイミダヅール亜鉛錯体からなる化成被膜
がさらに形成されるので耐熱性が向上すると考えられる
。When the surface of copper or copper alloy is brought into contact with an aqueous solution containing a 2-alkyl-methylbenzimidazole mixture and an organic acid, and then the treated metal surface is brought into contact with an aqueous solution containing a zinc compound, an aqueous solution containing a zinc compound is formed. Zinc is incorporated into the conversion coating, and although some 2-alkyl-methylbenzimidazur copper complexes are included, the majority is 2-alkyl-methylbenzimidazole, which is much more thermally stable than copper complexes.
It is thought that heat resistance is improved because a chemical conversion film consisting of a methyl-dzimidazur zinc complex is further formed.
銅あるいは銅合金の表面に2−アルキル−メチルベンズ
イミダゾール混合物、有機酸及び亜鉛化合物を含む水溶
液を接触させる場合には、2−アルキル−メチルベンズ
イミダゾールの化成被膜が金属表面に形成される過程に
おいて、亜鉛が化成被膜中に取り込まれ、2−アルキル
−メチルベンズイミダゾール亜鉛錯体を形成するため、
化成被膜の耐熱性が向上すると考えられる。When the surface of copper or copper alloy is brought into contact with an aqueous solution containing a 2-alkyl-methylbenzimidazole mixture, an organic acid, and a zinc compound, in the process of forming a conversion film of 2-alkyl-methylbenzimidazole on the metal surface. , since zinc is incorporated into the conversion coating to form a 2-alkyl-methylbenzimidazole zinc complex;
It is thought that the heat resistance of the chemical conversion coating is improved.
また、銅あるいは銅合金の表面に2−アルキルメチルベ
ンズイミダゾール混合物、有機酸及び銅化合物を含む水
溶液を接触させる場合には、2アルキル−メチルベンズ
イミダゾールの化成1膜が金属表面に形成される過程に
おいて、水溶液中の銅イオンが2−アルキル−メチルベ
ンズイミダゾール銅錯体の生成を促進し、化成被膜の形
成速度が早まる。In addition, when the surface of copper or copper alloy is brought into contact with an aqueous solution containing a 2-alkylmethylbenzimidazole mixture, an organic acid, and a copper compound, a chemical conversion film of 2-alkylmethylbenzimidazole is formed on the metal surface. In this method, copper ions in the aqueous solution promote the formation of a 2-alkyl-methylbenzimidazole copper complex, increasing the rate of formation of the chemical conversion film.
銅イオンを水溶液から化成被膜に供給すると、2−アル
キル−メチルベンズイミダゾール銅錯体の均質な化成被
膜を生じ、化成被膜中の錯体化していない2 アルキル
メチル−・ンズ・イミダゾールの比率を減少さ一廿る
ことQこより、化成被膜の耐熱性か向上すると思われる
。Supplying copper ions from an aqueous solution to the conversion coating produces a homogeneous conversion coating of 2-alkyl-methylbenzimidazole copper complexes and reduces the proportion of uncomplexed 2-alkyl-methylbenzimidazole in the conversion coating. It is thought that the heat resistance of the chemical conversion coating is improved due to the Q factor.
実施例
以下実施例及び比較例によって、本発明方法を具体的5
二説明する。EXAMPLES The following examples and comparative examples demonstrate the method of the present invention in detail.
2.Explain.
なお、これらの試験において金属表面における化成被膜
の厚さは、所定の大きさの試験片を0.5%塩酸水溶液
に浸漬して、ペンズイミダヅール化合物を抽出し、紫外
線分光光度計を用いてこの抽出液中に含まれるイミダゾ
ール類の濃度を測定し、化成被膜の厚さに換算したもの
である。In addition, in these tests, the thickness of the chemical conversion coating on the metal surface was determined by immersing a test piece of a predetermined size in a 0.5% hydrochloric acid aqueous solution, extracting the penzimidadur compound, and measuring it with an ultraviolet spectrophotometer. The concentration of imidazoles contained in this extract was measured using the method, and was converted into the thickness of the chemical conversion film.
またはんだ濡れ時間は、テストピース(5mm X50
mmX0.3肛の銅板)を脱脂し、次いでソフトエ・ノ
チングしたのち、各処理液による処理及び加熱処理を行
い、測定直前にポストフランクス〔商品名rJS−64
J■弘輝製〕に浸漬して、はんだ濡れ性試験器(SAT
−2000,elレスカ製)を使用して測定したもので
あり、その測定条件は、はんだ温度240’C,浸ン責
深さ2mm、ン9ン責スピード16mm/secとした
。The solder wetting time is measured using a test piece (5mm x 50
After degreasing a copper plate (mm x 0.3 mm) and then soft etching, it was treated with each treatment solution and heat treated, and immediately before measurement, it was coated with PostFranks [trade name rJS-64].
solder wettability tester (SAT).
The measurement conditions were a solder temperature of 240'C, an immersion depth of 2 mm, and an immersion speed of 16 mm/sec.
実施例1
脱脂及びソフトエツチング処理をした銅板テストピース
を、2−ペンチル−4−メチルベンズイミダゾール0.
5%、2−ペンチル−5−メチルベンズイミダゾール0
.5%、酢酸2.5%及び酢酸亜鉛0.5%を含む水溶
液に、液温50°Cで45秒間浸漬して取り出し水洗し
た。Example 1 A copper plate test piece that had been degreased and soft-etched was treated with 0.2-pentyl-4-methylbenzimidazole.
5%, 2-pentyl-5-methylbenzimidazole 0
.. It was immersed in an aqueous solution containing 5% zinc acetate, 2.5% acetic acid, and 0.5% zinc acetate at a temperature of 50°C for 45 seconds, and was then taken out and washed with water.
このようにして得られたテストピース表面の化成被膜厚
は0.15μmであった。The thickness of the chemical conversion coating on the surface of the test piece thus obtained was 0.15 μm.
前記処理を行ったテストピースの処理直後のもの及び9
6時間室温で放置したもの並びに温度60°C1湿度9
5%RHの恒温恒湿器に入れて96時間加熱したものの
それぞれについて、無加熱及び200°Cの温度で10
分間加熱した場合のはんだ濡れ性を測定したところ、そ
のはんだ濡れ時間は表1に示した実施例2
脱脂及びソフトエツチング処理をした銅板テストピース
を、2−へブチル−4−・メチルベンズイミダゾール1
.2%、2−へブチル−5−メチルベンズイミダゾール
0.8%、蟻酸6.0%及び酢酸亜鉛1.5%を含む水
溶液に、液温40°Cで12秒間浸漬して取り出し水洗
した。Immediately after treatment of the test piece subjected to the above treatment and 9
Items left at room temperature for 6 hours and temperature 60°C 1 humidity 9
For each of those heated for 96 hours in a constant temperature and humidity chamber at 5% RH, 10
The solder wettability was measured when heated for 1 minute, and the solder wetting time was as shown in Table 1.Example 2 A copper plate test piece that had been degreased and soft etched was
.. 2%, 2-hebutyl-5-methylbenzimidazole 0.8%, formic acid 6.0% and zinc acetate 1.5% for 12 seconds at a temperature of 40°C, taken out and washed with water.
このようにして得られたテストピース表面の化成被膜厚
は0.16μmであり、はんだ濡れ性試験の結果は表2
に示したとおりであった。The thickness of the chemical conversion coating on the surface of the test piece thus obtained was 0.16 μm, and the results of the solder wettability test are shown in Table 2.
It was as shown in
実施例3
脱脂及びソフトエツチング処理をした銅板テストピース
を、2−ノニル−4−メチルベンズイミダゾール0.3
%、2−ノニル−5−メチルベンズイミダゾール0.2
%、蟻酸5.0%及び酢酸亜鉛0.8%を含む水溶液に
、液温40°Cで10秒間浸漬して取り出し水洗した。Example 3 A copper plate test piece that had been degreased and soft etched was treated with 2-nonyl-4-methylbenzimidazole 0.3
%, 2-nonyl-5-methylbenzimidazole 0.2
%, formic acid 5.0% and zinc acetate 0.8% for 10 seconds at a liquid temperature of 40°C, taken out and washed with water.
このようにして得られたテストピース表面の化成被膜厚
は0.20μmであり、はんだ濡れ性試験の実施例4
脱脂及びソフトエツチング処理をした銅板テストピース
を、2−オクチル−4−メチルベンズイミダゾール0.
35%、2−オクチル−5−メチルベンズイミダゾール
0.15%、蟻酸4.0%及び酢酸亜鉛0.8%を含む
水溶液に、液温40″Cで13秒間浸漬して取り出し水
洗した。The thickness of the chemical conversion coating on the surface of the test piece thus obtained was 0.20 μm. 0.
35%, 2-octyl-5-methylbenzimidazole 0.15%, formic acid 4.0% and zinc acetate 0.8% for 13 seconds at a liquid temperature of 40''C, taken out and washed with water.
このようにして得られたテストピース表面の化成被膜厚
は0.20μmであり、はんだ濡れ性試験の結果は表4
に示したとおりであった。The thickness of the chemical conversion coating on the surface of the test piece thus obtained was 0.20 μm, and the results of the solder wettability test are shown in Table 4.
It was as shown in
実施例5
脱脂及びソフトエツチング処理をした円板テストピース
を、2−ウンデシル−4−メチルベンズイミダゾール0
.03%、2−ウンデシル−5−メチルベンズイミダゾ
ール0.07%、酢酸9.2%及び塩化亜鉛0.7%を
含む水溶液に、液温40°Cで60秒間浸漬して取り出
し水洗した。Example 5 A disk test piece that had been degreased and soft etched was treated with 2-undecyl-4-methylbenzimidazole 0.
.. The sample was immersed in an aqueous solution containing 0.03%, 2-undecyl-5-methylbenzimidazole, 0.07%, acetic acid, 9.2%, and zinc chloride at a temperature of 40° C. for 60 seconds, and was taken out and washed with water.
このようにして得られたテストピース表面の化成被膜厚
は0.18μmであり、はんだ濡れ性試験の結果は表5
に示したとおりであった。The thickness of the chemical conversion coating on the surface of the test piece thus obtained was 0.18 μm, and the results of the solder wettability test are shown in Table 5.
It was as shown in
表5 はんだ濡れ性
(単位:秒)
表6 はんだ濡れ性
(単位:秒)
実施例6
脱脂及びソフトエンチング処理をした刷板テストピース
を、2−ベンチルー4−メチルベンズイミダゾール0.
2%、2−ベンチルー5−メチルベンズイミダゾール0
.8%、酢酸2.5%及び塩化第二fI0.5%を含む
水溶液に、液温50°Cで18秒間浸漬して取り出し水
洗した。Table 5 Solder wettability (unit: seconds) Table 6 Solder wettability (unit: seconds) Example 6 A plate test piece that had been degreased and soft-etched was coated with 2-benzene-4-methylbenzimidazole 0.
2%, 2-benziru-5-methylbenzimidazole 0
.. The sample was immersed in an aqueous solution containing 8% acetic acid, 2.5% acetic acid, and 0.5% fI chloride at a temperature of 50°C for 18 seconds, then taken out and washed with water.
このようにして得られたテストピース表面の化成被膜厚
は0.18μmであり、はんだ濡れ性試験の結果は表6
に示したとおりであった。The thickness of the chemical conversion coating on the surface of the test piece thus obtained was 0.18 μm, and the results of the solder wettability test are shown in Table 6.
It was as shown in
実施例7
脱脂及びソフトエツチング処理をした銅板テストピース
を、2−ヘプチル−4−メチルベンズイミダゾール0.
64%、2−へブチル−5−メチル−・ンズイミダゾー
ル0.16%、蟻酸6.0%及び酢酸銅0.2%を含む
水溶液に、液温50“Cて8秒間浸漬して取り出し水洗
した。Example 7 A copper plate test piece that had been degreased and soft-etched was treated with 0.2-heptyl-4-methylbenzimidazole.
64%, 2-hebutyl-5-methyl-nzimidazole 0.16%, formic acid 6.0% and copper acetate 0.2%, immersed in an aqueous solution containing 64%, 2-hebutyl-5-methyl-nzimidazole 0.16%, formic acid 6.0% and copper acetate 0.2% for 8 seconds at a temperature of 50"C, taken out and washed with water. did.
このようにして得られたテストピース表面の化成被膜厚
は0.26μmであり、はんだ濡れ性試験の結果は表7
に示したとおりであった。The thickness of the chemical conversion coating on the surface of the test piece thus obtained was 0.26 μm, and the results of the solder wettability test are shown in Table 7.
It was as shown in
表7 はんだ濡れ性 (単位:秒)表8 はん
だ濡れ性 (単位5秒)実施例8
脱脂及びソフトエツチング処理をした銅板テストピース
を、2−ノニル−4−メチルベンズイミダゾール0.1
2%、2−ノニル−5−メチルベンズイミダゾール0.
08%、酢酸5.0%及び塩化第二銅0.1%を含む水
溶液に、液温50°Cで7秒間浸漬して取り出し水洗し
た。Table 7 Solder wettability (unit: seconds) Table 8 Solder wettability (unit: 5 seconds) Example 8 A copper plate test piece that had been degreased and soft etched was treated with 2-nonyl-4-methylbenzimidazole 0.1
2%, 2-nonyl-5-methylbenzimidazole 0.
The sample was immersed in an aqueous solution containing 0.8% acetic acid, 5.0% acetic acid, and 0.1% cupric chloride at a temperature of 50°C for 7 seconds, then taken out and washed with water.
このようにして得られたテストピース表面の化成被膜厚
は0.28μmであり、はんだ濡れ性試験の結果は表8
に示したとおりであった。The thickness of the chemical conversion coating on the surface of the test piece thus obtained was 0.28 μm, and the results of the solder wettability test are shown in Table 8.
It was as shown in
実施例9
脱脂及びソフトエンチング処理をした銅板テストピース
を、2−ウンデシル−4−メチル−・ンズイミダゾール
0.07%、2−ウンデシル−5−メチルベンズイミダ
ゾール0.03%、酢酸9.2%及び塩化第二w40.
2%を含む水溶液に、液温40℃で30秒間浸漬して取
り出し水洗した。Example 9 A copper plate test piece that had been degreased and soft-etched was treated with 0.07% of 2-undecyl-4-methyl-nzimidazole, 0.03% of 2-undecyl-5-methylbenzimidazole, and 9.2% of acetic acid. % and fernic chloride w40.
It was immersed in an aqueous solution containing 2% for 30 seconds at a temperature of 40°C, taken out, and washed with water.
このようにして得られたテストピース表面の化成被膜厚
は0.18μmであり、はんだ濡れ性試験の結果は表9
に示したとおりであった。The thickness of the chemical conversion coating on the surface of the test piece thus obtained was 0.18 μm, and the results of the solder wettability test are shown in Table 9.
It was as shown in
実施例工0
脱脂及びソフトエツチング処理をした銅板テストピース
を、2−ヘプタデシル−4−メチルベンズイミダゾール
0.06%、2−ヘプタデシル−5メチルヘンズイミダ
ゾール0.04%、酢酸is、s%及び酢酸銅0.3%
を含む水溶液に、液温40’Cで50秒間浸漬して取り
出し水洗した。Example Work 0 A copper plate test piece that had been degreased and soft etched was treated with 2-heptadecyl-4-methylbenzimidazole 0.06%, 2-heptadecyl-5-methylbenzimidazole 0.04%, acetic acid is, s%, and acetic acid. Copper 0.3%
The sample was immersed in an aqueous solution containing the following for 50 seconds at a temperature of 40'C, taken out and washed with water.
このようにして得られたテストピース表面の化成被膜厚
は0.20μmであり、はんだ濡れ性試験の実施例11
脱脂及びソフトエンチング処理をした銅板テストピース
を、2−ペンチルー4−メチルベンズイミダゾール0.
6%、2−ペンチル−5−メチル−・ンズイミダゾール
0.4%及びeF、酸2.5%を含む水溶液に、液温5
0゛Cで40秒間浸漬して取り出し水洗した。続いて酢
酸亜鉛2.0%、酢酸0.09%及びアンモニア0.0
4%を含む水溶液に、前記テストピースを液温50°C
で30秒間浸漬して取り出し水洗した。The thickness of the chemical conversion coating on the surface of the test piece thus obtained was 0.20 μm. 0.
6%, 2-pentyl-5-methyl-nzimidazole 0.4% and eF, an aqueous solution containing 2.5% acid at a temperature of 5%.
It was immersed at 0°C for 40 seconds, taken out and washed with water. followed by 2.0% zinc acetate, 0.09% acetic acid and 0.0 ammonia.
The test piece was placed in an aqueous solution containing 4% at a temperature of 50°C.
It was immersed in water for 30 seconds, then taken out and washed with water.
このようにして得られたテストピース表面の化成被膜厚
は0,12μmであり、はんだ濡れ性試験の結果は表1
1に示したとおりであった。The thickness of the chemical conversion coating on the surface of the test piece thus obtained was 0.12 μm, and the results of the solder wettability test are shown in Table 1.
It was as shown in 1.
(以下余白)
実施例12
前記実施例において、酢酸亜鉛、酢酸及びアンモニアを
含む水溶液による処理を行わなかった以外は、全く同様
の処理を行ったところ、テストピース表面の化成被膜は
0.16μmであり、そのはんだ濡れ性試験を測定した
結果は、表12に示したとおりであった。(The following is a blank space) Example 12 When the same treatment as in the above Example was performed except that the treatment with the aqueous solution containing zinc acetate, acetic acid, and ammonia was not performed, the chemical conversion coating on the surface of the test piece was 0.16 μm. The results of the solder wettability test were as shown in Table 12.
実施例13
脱脂及びソフトエツチング処理をした1′1阪テストピ
ースを、2−ヘプチル ・1−メチルヘンス1ミダヅー
ル0.3%、2−へブチル−5−メチルヘンズイミダヅ
ール0.2%及び蟻酸0.7%を含む水溶液に、液温4
0°Cで25秒間浸漬して取り出し水洗した。続いて酢
酸銅2.0%、酢酸0.09%及びアンモニア0.04
%を含む水溶液乙こ、前記テストピースを液温50°C
で30秒間浸漬して取り出し水洗した。Example 13 A 1'1 test piece that had been degreased and soft-etched was treated with 0.3% of 2-heptyl-1-methylhenzimidazur, 0.2% of 2-heptyl-5-methylhenzimidazur, and 0.2% of 2-heptyl-5-methylhenzimidazur. In an aqueous solution containing 0.7% formic acid, the liquid temperature was 4.
It was immersed at 0°C for 25 seconds, taken out and washed with water. followed by 2.0% copper acetate, 0.09% acetic acid and 0.04% ammonia.
% of the aqueous solution, the test piece was heated to a liquid temperature of 50°C.
It was immersed in water for 30 seconds, then taken out and washed with water.
このようにして得られたテストピース表面の化成被膜厚
は0.15μmであり、はんだ濡れ性試験の結果は表1
3に示したとおりであった。The thickness of the chemical conversion coating on the surface of the test piece thus obtained was 0.15 μm, and the results of the solder wettability test are shown in Table 1.
It was as shown in 3.
実施例14
実施例13において、酢酸銅、酢酸及びアンモニアを含
む水溶液による処理を行わなかった以外は、全く同様の
処理を繰り返したところ、テストピース表面の化成被膜
は0.17μmであり、そのはんだ濡れ性試験を測定し
た結果は、表14に示したとおりてあった。Example 14 The same treatment as in Example 13 was repeated except that the treatment with the aqueous solution containing copper acetate, acetic acid, and ammonia was not performed, and the chemical conversion coating on the surface of the test piece was 0.17 μm, and the solder The results of the wettability test are shown in Table 14.
モニア0.04%を含む水溶液に、前記テストピースを
液温50°Cで30秒間浸漬して取り出し水洗した。The test piece was immersed in an aqueous solution containing 0.04% Monia for 30 seconds at a temperature of 50° C., then taken out and washed with water.
このようにして得られたテスj・ピース表面の化成被膜
厚は0.19μmであり、はんだ濡れ性試験の結果は表
15に示したとおりてあった。The thickness of the chemical conversion coating on the surface of the TESJ piece thus obtained was 0.19 μm, and the results of the solder wettability test were as shown in Table 15.
表15 はんだ濡れ性 (単位5秒)実施例
15
脱脂及びソフトエツチング処理をした銅板テストヒース
を、2−ノニル−4−メチルベンズイミタツール0.4
%、2−ノニル−5−メチルベンズイミダゾール0.1
%及び蟻酸5.0%を含む水溶液に、液温50°Cで3
0秒間浸漬して取り出し水洗した。Table 15 Solder wettability (unit: 5 seconds) Example 15 A copper plate test heath that had been degreased and soft etched was treated with a 2-nonyl-4-methylbenzimiter tool of 0.4
%, 2-nonyl-5-methylbenzimidazole 0.1
% and formic acid at a temperature of 50°C.
It was immersed for 0 seconds, then taken out and washed with water.
続いて塩化第二銅2.0%、酢酸0.09%及びアン実
施例16
実施例工5において、塩化第二銅、酢酸及びアンモニア
を含む水溶液による処理を行わなかった以外は、全〈実
施例15と同様の処理を行ったところ、テストピース表
面の化成被膜は0.20μmであり、そのはんだ濡れ性
試験を測定した結果は、表16に示したとおりであった
。Next, cupric chloride 2.0%, acetic acid 0.09% and ammonium Example 16. When the same treatment as in Example 15 was performed, the chemical conversion coating on the surface of the test piece was 0.20 μm, and the results of the solder wettability test were as shown in Table 16.
(以下余白)
216 はんだ濡れ性 (単位:秒)比較例
1
脱脂及びソフトエツチング処理をした銅板のテス(−ヒ
ースを、2−ウンデシルイミダゾール1.0%及び酢酸
1.6%を含む水溶液に、液温50°Cで20秒間浸漬
して取り出し水洗したところ、テストピース表面の化成
被膜厚は0.23μmであり、前記各実施例と同様にし
てはんだ濡れ性を調べた結果は表17に示したとおりで
あった。(Left below) 216 Solder wettability (Unit: seconds) Comparative Example 1 A copper plate test (heather) that had been degreased and soft-etched was soaked in an aqueous solution containing 1.0% of 2-undecylimidazole and 1.6% of acetic acid. When the test piece was immersed in the liquid for 20 seconds at a temperature of 50°C and then taken out and washed with water, the thickness of the chemical conversion coating on the surface of the test piece was 0.23 μm.The results of examining the solder wettability in the same manner as in the previous examples are shown in Table 17. It was as shown.
比較例2
脱脂及びソフトエ2・チング処理をした銅板のテストピ
ースを、2−ペンチルベンズイミダゾール1.0%、酢
酸2.5%及び塩化第二銅0.5%を含む水溶液に、液
温50°Cで15秒間浸漬して取り出し水洗したところ
、テストピース表面の化成被膜厚は0.17μmであり
、前記各実施例と同様にしてはんだ濡れ性を調べた結果
は表18に示したとおりであった。Comparative Example 2 A copper plate test piece that had been degreased and soft etched was placed in an aqueous solution containing 1.0% of 2-pentylbenzimidazole, 2.5% of acetic acid, and 0.5% of cupric chloride at a temperature of 50°C. When the test piece was immersed for 15 seconds at °C and then taken out and washed with water, the thickness of the chemical conversion coating on the surface of the test piece was 0.17 μm.The results of examining the solder wettability in the same manner as in the previous examples are shown in Table 18. there were.
表18 はんだ濡れ性 (単位5秒)比較例
3
脱脂及びソフトエツチング処理をした銅板のテストピー
スを、2−ノニル−4−メチルベンズイミダゾール0.
5%、蟻酸1.6%及び酢酸亜鉛0.8%を含む水溶液
に、液温40°Cで7秒間浸漬して取り出し水洗したと
ころ、テストピース表面の化成被膜厚は0.20μmで
あり、前記各実施例と同様にしてはんだ濡れ性を調べた
結果は表19に示したとおりであった。Table 18 Solder wettability (unit: 5 seconds) Comparative Example 3 A test piece of a copper plate that had been degreased and soft etched was treated with 2-nonyl-4-methylbenzimidazole 0.5%.
When the test piece was immersed in an aqueous solution containing 5% formic acid, 1.6% formic acid, and 0.8% zinc acetate at a temperature of 40°C for 7 seconds and then taken out and washed with water, the thickness of the chemical conversion coating on the surface of the test piece was 0.20 μm. The solder wettability was investigated in the same manner as in each of the above Examples, and the results are shown in Table 19.
表19 はんだ濡れ性 (単位5秒)発明の
効果
本発明方法によれば、銅あるいは銅合金の表面にアルキ
ルヘンズイミダゾール化合物を主成分とする耐熱性に優
れた化成被膜を形成することができ、特にプリント配線
板の表面実装法におけるはんだ付は性を改善しうるもの
である。Table 19 Solder wettability (unit: 5 seconds) Effects of the invention According to the method of the present invention, it is possible to form a chemical conversion film with excellent heat resistance, which is mainly composed of an alkylhenzimidazole compound, on the surface of copper or copper alloy. In particular, soldering properties in the surface mounting method of printed wiring boards can be improved.
特許出願人 四国化成工業株式会社Patent applicant: Shikoku Kasei Kogyo Co., Ltd.
Claims (4)
示される2−アルキル−4−メチルベンズイミダゾール
化合物、下記の一般式IIで示される2−アルキル−5−
メチルベンズイミダゾール化合物及び有機酸を含む水溶
液を接触させることを特徴とする銅及び銅合金の表面処
理方法。 一般式 I ▲数式、化学式、表等があります▼ 一般式II▲数式、化学式、表等があります▼ (但し、式中R_1は炭素数3以上のアルキル基を示す
)(1) A 2-alkyl-4-methylbenzimidazole compound represented by the following general formula I, a 2-alkyl-5-methylbenzimidazole compound represented by the following general formula II on the surface of copper or copper alloy.
A method for surface treatment of copper and copper alloys, which comprises contacting an aqueous solution containing a methylbenzimidazole compound and an organic acid. General formula I ▲ Contains mathematical formulas, chemical formulas, tables, etc. ▼ General formula II ▲ Contains mathematical formulas, chemical formulas, tables, etc. ▼ (However, R_1 in the formula represents an alkyl group with 3 or more carbon atoms)
示される2−アルキル−4−メチルベンズイミダゾール
化合物、下記の一般式IIで示される2−アルキル−5−
メチルベンズイミダゾール化合物、有機酸及び亜鉛化合
物あるいは銅化合物を含む水溶液を接触させることを特
徴とする銅及び銅合金の表面処理方法。 一般式 I ▲数式、化学式、表等があります▼ 一般式II▲数式、化学式、表等があります▼ (但し、式中R_1は炭素数3以上のアルキル基を示す
)(2) A 2-alkyl-4-methylbenzimidazole compound represented by the following general formula I or a 2-alkyl-5-methylbenzimidazole compound represented by the following general formula II on the surface of copper or copper alloy.
A method for surface treatment of copper and copper alloys, which comprises contacting an aqueous solution containing a methylbenzimidazole compound, an organic acid, and a zinc compound or a copper compound. General formula I ▲ Contains mathematical formulas, chemical formulas, tables, etc. ▼ General formula II ▲ Contains mathematical formulas, chemical formulas, tables, etc. ▼ (However, R_1 in the formula represents an alkyl group with 3 or more carbon atoms)
示される2−アルキル−4−メチルベンズイミダゾール
化合物、下記の一般式IIで示される2−アルキル−5−
メチルベンズイミダゾール化合物及び有機酸を含む水溶
液を接触させ、続いて前記処理が行われた金属表面に銅
化合物あるいは亜鉛化合物を含む水溶液を接触させるこ
とを特徴とする銅及び銅合金の表面処理方法。 一般式 I ▲数式、化学式、表等があります▼ 一般式II▲数式、化学式、表等があります▼ (但し、式中R_1は炭素数3以上のアルキル基を示す
)(3) A 2-alkyl-4-methylbenzimidazole compound represented by the following general formula I or a 2-alkyl-5-methylbenzimidazole compound represented by the following general formula II on the surface of copper or copper alloy.
A method for surface treatment of copper and copper alloys, which comprises contacting an aqueous solution containing a methylbenzimidazole compound and an organic acid, and then contacting the treated metal surface with an aqueous solution containing a copper compound or a zinc compound. General formula I ▲ Contains mathematical formulas, chemical formulas, tables, etc. ▼ General formula II ▲ Contains mathematical formulas, chemical formulas, tables, etc. ▼ (However, R_1 in the formula represents an alkyl group with 3 or more carbon atoms)
合物、2−アルキル−5−メチルベンズイミダゾール化
合物の混合比を2:8ないし8:2の範囲にしたことを
特徴とする請求項(1)、請求項(2)、及び請求項(
3)に記載の方法。(4) Claim (1) characterized in that the mixing ratio of the 2-alkyl-4-methylbenzimidazole compound and the 2-alkyl-5-methylbenzimidazole compound is in the range of 2:8 to 8:2; Claim (2), and claim (
The method described in 3).
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2212285A JP2972295B2 (en) | 1990-08-10 | 1990-08-10 | Copper and copper alloy surface treatment method |
KR1019900018311A KR100208555B1 (en) | 1989-11-13 | 1990-11-13 | Surface treatment method for copper and copper alloys |
US07/611,660 US5173130A (en) | 1989-11-13 | 1990-11-13 | Process for surface treatment of copper and copper alloy |
EP90312379A EP0428383A1 (en) | 1989-11-13 | 1990-11-13 | Process for surface treatment of copper and copper alloy |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2212285A JP2972295B2 (en) | 1990-08-10 | 1990-08-10 | Copper and copper alloy surface treatment method |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH0499285A true JPH0499285A (en) | 1992-03-31 |
JP2972295B2 JP2972295B2 (en) | 1999-11-08 |
Family
ID=16620070
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2212285A Expired - Lifetime JP2972295B2 (en) | 1989-11-13 | 1990-08-10 | Copper and copper alloy surface treatment method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2972295B2 (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04173983A (en) * | 1990-11-07 | 1992-06-22 | Shikoku Chem Corp | Surface treatment of copper and copper alloy |
JP2009046761A (en) * | 2007-07-20 | 2009-03-05 | Mec Kk | Surface treatment agent |
-
1990
- 1990-08-10 JP JP2212285A patent/JP2972295B2/en not_active Expired - Lifetime
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04173983A (en) * | 1990-11-07 | 1992-06-22 | Shikoku Chem Corp | Surface treatment of copper and copper alloy |
JP2009046761A (en) * | 2007-07-20 | 2009-03-05 | Mec Kk | Surface treatment agent |
Also Published As
Publication number | Publication date |
---|---|
JP2972295B2 (en) | 1999-11-08 |
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