JPH0485331A - Heat-resistant compound for laminate material and production of laminate material by using said compound - Google Patents
Heat-resistant compound for laminate material and production of laminate material by using said compoundInfo
- Publication number
- JPH0485331A JPH0485331A JP20090790A JP20090790A JPH0485331A JP H0485331 A JPH0485331 A JP H0485331A JP 20090790 A JP20090790 A JP 20090790A JP 20090790 A JP20090790 A JP 20090790A JP H0485331 A JPH0485331 A JP H0485331A
- Authority
- JP
- Japan
- Prior art keywords
- compound
- formula
- heat
- prepreg
- laminate material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 150000001875 compounds Chemical class 0.000 title claims abstract description 18
- 239000002648 laminated material Substances 0.000 title claims abstract description 8
- 238000004519 manufacturing process Methods 0.000 title claims description 10
- 125000000962 organic group Chemical group 0.000 claims abstract description 13
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims abstract description 10
- 239000011889 copper foil Substances 0.000 claims abstract description 10
- 239000013557 residual solvent Substances 0.000 claims abstract description 10
- 239000011342 resin composition Substances 0.000 claims abstract description 9
- 239000003960 organic solvent Substances 0.000 claims abstract description 7
- 239000002966 varnish Substances 0.000 claims abstract description 3
- 229920005989 resin Polymers 0.000 claims description 10
- 239000011347 resin Substances 0.000 claims description 10
- 238000000465 moulding Methods 0.000 claims description 6
- 238000010438 heat treatment Methods 0.000 claims description 5
- 239000012779 reinforcing material Substances 0.000 claims description 4
- 239000000126 substance Substances 0.000 claims description 4
- 238000000034 method Methods 0.000 claims description 3
- 238000003825 pressing Methods 0.000 claims description 2
- -1 ester imide Chemical class 0.000 abstract description 33
- 238000003860 storage Methods 0.000 abstract description 4
- 239000000203 mixture Substances 0.000 abstract 1
- 230000002787 reinforcement Effects 0.000 abstract 1
- 238000006243 chemical reaction Methods 0.000 description 28
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 19
- 239000002904 solvent Substances 0.000 description 12
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 9
- 239000011521 glass Substances 0.000 description 8
- 239000000243 solution Substances 0.000 description 7
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 6
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 6
- 239000003822 epoxy resin Substances 0.000 description 6
- 239000004744 fabric Substances 0.000 description 6
- 239000002798 polar solvent Substances 0.000 description 6
- 229920000647 polyepoxide Polymers 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- 239000002253 acid Substances 0.000 description 5
- 238000001723 curing Methods 0.000 description 5
- 238000001035 drying Methods 0.000 description 5
- 229920001721 polyimide Polymers 0.000 description 5
- 239000000047 product Substances 0.000 description 5
- YYROPELSRYBVMQ-UHFFFAOYSA-N 4-toluenesulfonyl chloride Chemical compound CC1=CC=C(S(Cl)(=O)=O)C=C1 YYROPELSRYBVMQ-UHFFFAOYSA-N 0.000 description 4
- DLFVBJFMPXGRIB-UHFFFAOYSA-N Acetamide Chemical compound CC(N)=O DLFVBJFMPXGRIB-UHFFFAOYSA-N 0.000 description 4
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 4
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 4
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 4
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 4
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 description 4
- 150000008065 acid anhydrides Chemical class 0.000 description 4
- 150000004984 aromatic diamines Chemical class 0.000 description 4
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 4
- 239000003795 chemical substances by application Substances 0.000 description 4
- 150000004985 diamines Chemical class 0.000 description 4
- 229920001971 elastomer Polymers 0.000 description 4
- 239000000806 elastomer Substances 0.000 description 4
- 239000012046 mixed solvent Substances 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 3
- ZHNUHDYFZUAESO-UHFFFAOYSA-N Formamide Chemical compound NC=O ZHNUHDYFZUAESO-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 150000001412 amines Chemical class 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 150000001991 dicarboxylic acids Chemical class 0.000 description 3
- 239000000835 fiber Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 229920003986 novolac Polymers 0.000 description 3
- 229920002601 oligoester Polymers 0.000 description 3
- 150000002989 phenols Chemical class 0.000 description 3
- 239000009719 polyimide resin Substances 0.000 description 3
- 235000013824 polyphenols Nutrition 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- 125000006158 tetracarboxylic acid group Chemical group 0.000 description 3
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 2
- PLIKAWJENQZMHA-UHFFFAOYSA-N 4-aminophenol Chemical compound NC1=CC=C(O)C=C1 PLIKAWJENQZMHA-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- LCGLNKUTAGEVQW-UHFFFAOYSA-N Dimethyl ether Chemical compound COC LCGLNKUTAGEVQW-UHFFFAOYSA-N 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- 239000004642 Polyimide Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- OXIKYYJDTWKERT-UHFFFAOYSA-N [4-(aminomethyl)cyclohexyl]methanamine Chemical compound NCC1CCC(CN)CC1 OXIKYYJDTWKERT-UHFFFAOYSA-N 0.000 description 2
- 238000013006 addition curing Methods 0.000 description 2
- 230000001476 alcoholic effect Effects 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 125000003277 amino group Chemical group 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 125000003118 aryl group Chemical group 0.000 description 2
- TZCXTZWJZNENPQ-UHFFFAOYSA-L barium sulfate Chemical compound [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 description 2
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- CCAFPWNGIUBUSD-UHFFFAOYSA-N diethyl sulfoxide Chemical compound CCS(=O)CC CCAFPWNGIUBUSD-UHFFFAOYSA-N 0.000 description 2
- 150000002009 diols Chemical class 0.000 description 2
- ZZTCPWRAHWXWCH-UHFFFAOYSA-N diphenylmethanediamine Chemical compound C=1C=CC=CC=1C(N)(N)C1=CC=CC=C1 ZZTCPWRAHWXWCH-UHFFFAOYSA-N 0.000 description 2
- 238000005553 drilling Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000003063 flame retardant Substances 0.000 description 2
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 2
- 239000011256 inorganic filler Substances 0.000 description 2
- 229910003475 inorganic filler Inorganic materials 0.000 description 2
- QQVIHTHCMHWDBS-UHFFFAOYSA-N isophthalic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1 QQVIHTHCMHWDBS-UHFFFAOYSA-N 0.000 description 2
- 230000007774 longterm Effects 0.000 description 2
- 239000004745 nonwoven fabric Substances 0.000 description 2
- QWVGKYWNOKOFNN-UHFFFAOYSA-N o-cresol Chemical compound CC1=CC=CC=C1O QWVGKYWNOKOFNN-UHFFFAOYSA-N 0.000 description 2
- 229920005575 poly(amic acid) Polymers 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 238000006116 polymerization reaction Methods 0.000 description 2
- 150000008442 polyphenolic compounds Chemical class 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 239000001294 propane Substances 0.000 description 2
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 2
- 238000010992 reflux Methods 0.000 description 2
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 2
- 238000005476 soldering Methods 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 150000003462 sulfoxides Chemical class 0.000 description 2
- OUPZKGBUJRBPGC-UHFFFAOYSA-N 1,3,5-tris(oxiran-2-ylmethyl)-1,3,5-triazinane-2,4,6-trione Chemical compound O=C1N(CC2OC2)C(=O)N(CC2OC2)C(=O)N1CC1CO1 OUPZKGBUJRBPGC-UHFFFAOYSA-N 0.000 description 1
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- CBCKQZAAMUWICA-UHFFFAOYSA-N 1,4-phenylenediamine Chemical compound NC1=CC=C(N)C=C1 CBCKQZAAMUWICA-UHFFFAOYSA-N 0.000 description 1
- VVOIQBFMTVCINR-WWMZEODYSA-N 11-deoxycorticosterone pivalate Chemical compound C1CC2=CC(=O)CC[C@]2(C)[C@@H]2[C@@H]1[C@@H]1CC[C@H](C(=O)COC(=O)C(C)(C)C)[C@@]1(C)CC2 VVOIQBFMTVCINR-WWMZEODYSA-N 0.000 description 1
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 1
- PCAXITAPTVOLGL-UHFFFAOYSA-N 2,3-diaminophenol Chemical compound NC1=CC=CC(O)=C1N PCAXITAPTVOLGL-UHFFFAOYSA-N 0.000 description 1
- BLPURQSRCDKZNX-UHFFFAOYSA-N 2,4,6-tris(oxiran-2-ylmethoxy)-1,3,5-triazine Chemical compound C1OC1COC(N=C(OCC1OC1)N=1)=NC=1OCC1CO1 BLPURQSRCDKZNX-UHFFFAOYSA-N 0.000 description 1
- RLYCRLGLCUXUPO-UHFFFAOYSA-N 2,6-diaminotoluene Chemical compound CC1=C(N)C=CC=C1N RLYCRLGLCUXUPO-UHFFFAOYSA-N 0.000 description 1
- HCPJEHJGFKWRFM-UHFFFAOYSA-N 2-amino-5-methylphenol Chemical compound CC1=CC=C(N)C(O)=C1 HCPJEHJGFKWRFM-UHFFFAOYSA-N 0.000 description 1
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 1
- VEORPZCZECFIRK-UHFFFAOYSA-N 3,3',5,5'-tetrabromobisphenol A Chemical compound C=1C(Br)=C(O)C(Br)=CC=1C(C)(C)C1=CC(Br)=C(O)C(Br)=C1 VEORPZCZECFIRK-UHFFFAOYSA-N 0.000 description 1
- ZBMISJGHVWNWTE-UHFFFAOYSA-N 3-(4-aminophenoxy)aniline Chemical compound C1=CC(N)=CC=C1OC1=CC=CC(N)=C1 ZBMISJGHVWNWTE-UHFFFAOYSA-N 0.000 description 1
- CWLKGDAVCFYWJK-UHFFFAOYSA-N 3-aminophenol Chemical compound NC1=CC=CC(O)=C1 CWLKGDAVCFYWJK-UHFFFAOYSA-N 0.000 description 1
- YBRVSVVVWCFQMG-UHFFFAOYSA-N 4,4'-diaminodiphenylmethane Chemical compound C1=CC(N)=CC=C1CC1=CC=C(N)C=C1 YBRVSVVVWCFQMG-UHFFFAOYSA-N 0.000 description 1
- HLBLWEWZXPIGSM-UHFFFAOYSA-N 4-Aminophenyl ether Chemical compound C1=CC(N)=CC=C1OC1=CC=C(N)C=C1 HLBLWEWZXPIGSM-UHFFFAOYSA-N 0.000 description 1
- NFVPEIKDMMISQO-UHFFFAOYSA-N 4-[(dimethylamino)methyl]phenol Chemical compound CN(C)CC1=CC=C(O)C=C1 NFVPEIKDMMISQO-UHFFFAOYSA-N 0.000 description 1
- UHUUGQDYCYKQTC-UHFFFAOYSA-N 4-[2,2,2-tris(4-hydroxyphenyl)ethyl]phenol Chemical compound C1=CC(O)=CC=C1CC(C=1C=CC(O)=CC=1)(C=1C=CC(O)=CC=1)C1=CC=C(O)C=C1 UHUUGQDYCYKQTC-UHFFFAOYSA-N 0.000 description 1
- JCRRFJIVUPSNTA-UHFFFAOYSA-N 4-[4-(4-aminophenoxy)phenoxy]aniline Chemical compound C1=CC(N)=CC=C1OC(C=C1)=CC=C1OC1=CC=C(N)C=C1 JCRRFJIVUPSNTA-UHFFFAOYSA-N 0.000 description 1
- WFCQTAXSWSWIHS-UHFFFAOYSA-N 4-[bis(4-hydroxyphenyl)methyl]phenol Chemical compound C1=CC(O)=CC=C1C(C=1C=CC(O)=CC=1)C1=CC=C(O)C=C1 WFCQTAXSWSWIHS-UHFFFAOYSA-N 0.000 description 1
- QGNGOGOOPUYKMC-UHFFFAOYSA-N 4-hydroxy-6-methylaniline Chemical compound CC1=CC(O)=CC=C1N QGNGOGOOPUYKMC-UHFFFAOYSA-N 0.000 description 1
- OECTYKWYRCHAKR-UHFFFAOYSA-N 4-vinylcyclohexene dioxide Chemical compound C1OC1C1CC2OC2CC1 OECTYKWYRCHAKR-UHFFFAOYSA-N 0.000 description 1
- YIROYDNZEPTFOL-UHFFFAOYSA-N 5,5-Dimethylhydantoin Chemical compound CC1(C)NC(=O)NC1=O YIROYDNZEPTFOL-UHFFFAOYSA-N 0.000 description 1
- ULKLGIFJWFIQFF-UHFFFAOYSA-N 5K8XI641G3 Chemical compound CCC1=NC=C(C)N1 ULKLGIFJWFIQFF-UHFFFAOYSA-N 0.000 description 1
- 239000005995 Aluminium silicate Substances 0.000 description 1
- KLSJWNVTNUYHDU-UHFFFAOYSA-N Amitrole Chemical compound NC1=NC=NN1 KLSJWNVTNUYHDU-UHFFFAOYSA-N 0.000 description 1
- 229910015900 BF3 Inorganic materials 0.000 description 1
- 229930185605 Bisphenol Natural products 0.000 description 1
- 229920000049 Carbon (fiber) Polymers 0.000 description 1
- SUAKHGWARZSWIH-UHFFFAOYSA-N N,N‐diethylformamide Chemical compound CCN(CC)C=O SUAKHGWARZSWIH-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 1
- GKXVJHDEWHKBFH-UHFFFAOYSA-N [2-(aminomethyl)phenyl]methanamine Chemical compound NCC1=CC=CC=C1CN GKXVJHDEWHKBFH-UHFFFAOYSA-N 0.000 description 1
- FDLQZKYLHJJBHD-UHFFFAOYSA-N [3-(aminomethyl)phenyl]methanamine Chemical compound NCC1=CC=CC(CN)=C1 FDLQZKYLHJJBHD-UHFFFAOYSA-N 0.000 description 1
- NIYNIOYNNFXGFN-UHFFFAOYSA-N [4-(hydroxymethyl)cyclohexyl]methanol;7-oxabicyclo[4.1.0]heptane-4-carboxylic acid Chemical compound OCC1CCC(CO)CC1.C1C(C(=O)O)CCC2OC21.C1C(C(=O)O)CCC2OC21 NIYNIOYNNFXGFN-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 1
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 description 1
- 235000012211 aluminium silicate Nutrition 0.000 description 1
- 229920006231 aramid fiber Polymers 0.000 description 1
- 150000004982 aromatic amines Chemical class 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- WTEOIRVLGSZEPR-UHFFFAOYSA-N boron trifluoride Substances FB(F)F WTEOIRVLGSZEPR-UHFFFAOYSA-N 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- 239000001506 calcium phosphate Substances 0.000 description 1
- 229910000389 calcium phosphate Inorganic materials 0.000 description 1
- 235000011010 calcium phosphates Nutrition 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 239000004917 carbon fiber Substances 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 239000002734 clay mineral Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 229930003836 cresol Natural products 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- XXBDWLFCJWSEKW-UHFFFAOYSA-N dimethylbenzylamine Chemical compound CN(C)CC1=CC=CC=C1 XXBDWLFCJWSEKW-UHFFFAOYSA-N 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000004210 ether based solvent Substances 0.000 description 1
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 1
- 150000002460 imidazoles Chemical class 0.000 description 1
- 150000003949 imides Chemical class 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- NLYAJNPCOHFWQQ-UHFFFAOYSA-N kaolin Chemical compound O.O.O=[Al]O[Si](=O)O[Si](=O)O[Al]=O NLYAJNPCOHFWQQ-UHFFFAOYSA-N 0.000 description 1
- 239000005453 ketone based solvent Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- ZLNQQNXFFQJAID-UHFFFAOYSA-L magnesium carbonate Chemical compound [Mg+2].[O-]C([O-])=O ZLNQQNXFFQJAID-UHFFFAOYSA-L 0.000 description 1
- 239000001095 magnesium carbonate Substances 0.000 description 1
- 229910000021 magnesium carbonate Inorganic materials 0.000 description 1
- VTHJTEIRLNZDEV-UHFFFAOYSA-L magnesium dihydroxide Chemical compound [OH-].[OH-].[Mg+2] VTHJTEIRLNZDEV-UHFFFAOYSA-L 0.000 description 1
- 239000000347 magnesium hydroxide Substances 0.000 description 1
- 229910001862 magnesium hydroxide Inorganic materials 0.000 description 1
- CSNNHWWHGAXBCP-UHFFFAOYSA-L magnesium sulphate Substances [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 1
- 235000019341 magnesium sulphate Nutrition 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910000000 metal hydroxide Inorganic materials 0.000 description 1
- 150000004692 metal hydroxides Chemical class 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 1
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 description 1
- 239000010445 mica Substances 0.000 description 1
- 229910052618 mica group Inorganic materials 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 235000010755 mineral Nutrition 0.000 description 1
- ABMDIECEEGFXNC-UHFFFAOYSA-N n-ethylpropanamide Chemical compound CCNC(=O)CC ABMDIECEEGFXNC-UHFFFAOYSA-N 0.000 description 1
- 239000004843 novolac epoxy resin Substances 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 238000010094 polymer processing Methods 0.000 description 1
- 239000012744 reinforcing agent Substances 0.000 description 1
- 230000003014 reinforcing effect Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 239000012756 surface treatment agent Substances 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 238000001029 thermal curing Methods 0.000 description 1
- 238000012719 thermal polymerization Methods 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 1
- 230000001988 toxicity Effects 0.000 description 1
- 231100000419 toxicity Toxicity 0.000 description 1
- QORWJWZARLRLPR-UHFFFAOYSA-H tricalcium bis(phosphate) Chemical compound [Ca+2].[Ca+2].[Ca+2].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O QORWJWZARLRLPR-UHFFFAOYSA-H 0.000 description 1
- SRPWOOOHEPICQU-UHFFFAOYSA-N trimellitic anhydride Chemical compound OC(=O)C1=CC=C2C(=O)OC(=O)C2=C1 SRPWOOOHEPICQU-UHFFFAOYSA-N 0.000 description 1
- 238000005829 trimerization reaction Methods 0.000 description 1
- DSROZUMNVRXZNO-UHFFFAOYSA-K tris[(1-naphthalen-1-yl-3-phenylnaphthalen-2-yl)oxy]alumane Chemical compound C=1C=CC=CC=1C=1C=C2C=CC=CC2=C(C=2C3=CC=CC=C3C=CC=2)C=1O[Al](OC=1C(=C2C=CC=CC2=CC=1C=1C=CC=CC=1)C=1C2=CC=CC=C2C=CC=1)OC(C(=C1C=CC=CC1=C1)C=2C3=CC=CC=C3C=CC=2)=C1C1=CC=CC=C1 DSROZUMNVRXZNO-UHFFFAOYSA-K 0.000 description 1
- 239000010456 wollastonite Substances 0.000 description 1
- 229910052882 wollastonite Inorganic materials 0.000 description 1
- 239000002759 woven fabric Substances 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
- 235000014692 zinc oxide Nutrition 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0313—Organic insulating material
- H05K1/032—Organic insulating material consisting of one material
- H05K1/0346—Organic insulating material consisting of one material containing N
Landscapes
- Reinforced Plastic Materials (AREA)
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
- Paints Or Removers (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、耐熱性、耐湿性、保存安定性に優れた耐熱性
積層材用化合物及びこれを用いた耐熱性積層材に関する
。DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention relates to a compound for heat-resistant laminate materials having excellent heat resistance, moisture resistance, and storage stability, and a heat-resistant laminate material using the same.
近年、電子機器の発達は目ざましく、銅張積層板の使用
も多種多様となり、かつ優れた特性のものが要求されて
いる。とりわけ、配線の高密度化にともなって、配線板
の多層化、スルーホールの小径化が進み、ドリル加工時
のスミア発生が少ない等加工性の良好な銅張積層板が求
められている。In recent years, the development of electronic devices has been remarkable, and copper-clad laminates have been used in a wide variety of ways, and those with excellent properties are required. In particular, as wiring becomes more dense, wiring boards become more multilayered and through-holes become smaller in diameter, there is a need for copper-clad laminates that have good workability, such as less smearing during drilling.
一方、生産性の向上、低コスト化の要請にともない、配
線板の実装工程でホットエアーレヘラーやりフローハン
ダ付は等ますます厳しい加工条件が加えられている。こ
れらの中で基板である銅張積層板の耐熱性、耐湿性はこ
れまで以上に優れたものが求められるようになってきた
。On the other hand, with the demand for improved productivity and lower costs, increasingly strict processing conditions are being added to the wiring board mounting process, such as hot air rehaler and flow soldering. Among these, copper-clad laminates serving as substrates are required to have better heat resistance and moisture resistance than ever before.
近年、これらの要求を満たすために、一般に銅張積層板
用として広く用いられているエポキシ樹脂に代わって、
付加硬化型のポリイミド樹脂が利用されるようになって
きている。このポリイミド樹脂を銅張積層板用積層板に
用いた場合、ドリル加工時のスミアの発生がほとんど無
くなり、また、加工工程や長期試験での耐熱性が格段に
改良されるという利点を有することが知られている。し
かし乍ら、従来用いられてきた付加硬化型のポリイミド
樹脂は以下に述べるような種々の問題点を有していた。In recent years, in order to meet these demands, in place of epoxy resin, which is generally widely used for copper-clad laminates,
Addition-curing polyimide resins have come into use. When this polyimide resin is used for copper-clad laminates, it has the advantage of almost no smearing during drilling, and the heat resistance during processing and long-term tests is significantly improved. Are known. However, conventionally used addition-curing polyimide resins have had various problems as described below.
即ち、不飽和ジカルボン酸のN、N’ −ビスイミドと
ジアミノジフェニルメタンとを反応させたものは、積層
板用として優れたものであるが、反面、ジアミノジフェ
ニルメタンは反応性が高く、ワニスやプリプレグの可使
時間が短いという問題がある。更に、ジアミノジフェニ
ルメタンの生体への毒性が問題となることがある。また
、不飽和ジカルボン酸のN、N’ −ビスイミドとジア
ミノフェノールとを反応成分とするものは、積層板用と
してバランスのとれた特性を示し、加工性も優れている
が、耐湿性が劣るという問題点があり、例えば、得られ
た積層板の長期保存には、吸湿に格別の注意を払わなけ
ればならない、更に、不飽和ジカルボン酸のN、N’−
ビスイミドアミノ安息香酸とを反応させたものは、積層
板用として好適であるが、低沸点溶媒に対して溶解性が
悪く、プリプレグ作成時のガラス布等への塗布に問題点
を有し、さらに樹脂溶液の保存にも注意しなければなら
ない等の問題点があった。That is, a product obtained by reacting N,N'-bisimide, an unsaturated dicarboxylic acid, with diaminodiphenylmethane is excellent for use in laminates. There is a problem that the usage time is short. Furthermore, the toxicity of diaminodiphenylmethane to living organisms may pose a problem. In addition, products containing N,N'-bisimide, an unsaturated dicarboxylic acid, and diaminophenol as reaction components exhibit well-balanced properties and excellent processability for laminated boards, but are said to have poor moisture resistance. There are some problems, for example, for long-term storage of the obtained laminate, special attention must be paid to moisture absorption, and furthermore, unsaturated dicarboxylic acid N, N'-
Products reacted with bisimidoaminobenzoic acid are suitable for use in laminates, but they have poor solubility in low-boiling point solvents and have problems when applied to glass cloth, etc. when making prepregs. Furthermore, there were other problems such as the need to be careful in storing the resin solution.
本発明者等は、かかる実情に鑑み、これらの技術的gI
!題を解決すべく鋭意検討を重ねた結果、本発明に到達
したものである。In view of the above circumstances, the present inventors have developed these technical gI
! The present invention was developed as a result of extensive research to solve the problem.
即ち、本発明の第1は、一般式(I)
(式中、Ar、 Arz、 Ar:+は2価の有機基で
あり、Ar、、 Art、 Arzはそれぞれ同種であ
ってもよく、異種であってもよい。mは1〜30の整数
である。That is, the first aspect of the present invention is the general formula (I) (wherein Ar, Arz, and Ar:+ are divalent organic groups, and Ar, Art, and Arz may be the same or different. m may be an integer of 1 to 30.
)で示される化合物を主成分とすることを特徴とする耐
熱性積層材用化合物を、
本発明の第2は、前記化合物を有機溶剤に溶解してワニ
ス状樹脂組成物を調製し、次いで補強材を該ワニス樹脂
組成分で塗布・含浸させたのち所定の残溶剤濃度となる
ように乾燥してプリプレグを作成し、該プリプレグの1
枚又は2枚以上を2枚の銅箔の間に挟み込み、加熱加圧
して一体成形することを特徴とする両面銅箔積層板の製
造方法を、
それぞれ内容とするものである。) The second aspect of the present invention is to prepare a varnish-like resin composition by dissolving the compound in an organic solvent, and then reinforcing the compound. A prepreg is prepared by coating and impregnating the material with the varnish resin composition and then drying it to a predetermined residual solvent concentration.
Each content is a method of manufacturing a double-sided copper foil laminate, which is characterized by sandwiching one or more sheets of copper foil between two sheets of copper foil and integrally molding them by heating and pressing.
まず、本発明の熱硬化性化合物の製造法について述べる
。First, the method for producing the thermosetting compound of the present invention will be described.
才ず、アルゴン、チン素等の不活性ガス雰囲気中必要量
のパラトルエンスルフオン酸クロリドC以下、TsCl
と記す。)を計り取り、反応系を室温以下、好ましくは
10°C以下、更に好ましくは水冷下にしたのち、ピリ
ジンを発熱に注意しながらシリンジより滴下した。充分
に反応させたのち計算量のトリメリット酸無水物(以下
、TMAと記す。)をアプロテイクな極性溶媒に溶解し
たのち加える。そののち一般式(It)に示されるジオ
ール〔1]
HOArz−OH(U )
〔1〕
(式中、Artは2価の有機基を示す。)を水冷下に上
記と同一のアブロテイクな極性溶媒に溶解したのち加え
る。反応を完結させるべく室温下においても適宜反応さ
せる。ここで、共重合体を得るために、一般式(I[[
)等で示される有機テトラカルボン酸二無水物〔2〕
]111
[2]
(式中、Ar、は4価の有機基を示す。)を加えておく
ことも可能である。次に、再度反応系を氷冷し、上記と
同一のアプロティクな極性溶媒に熔解した一般式(IV
)で示されるジアミン〔3〕HJ Ar+ NHz
(IV)〔3〕
(式中、Ar+は2価の有機基を示す。)を加える。The required amount of para-toluenesulfonic acid chloride C or TsCl in an inert gas atmosphere such as argon or tin
It is written as ) was weighed out and the reaction system was cooled to room temperature or lower, preferably 10°C or lower, more preferably water-cooled, and then pyridine was added dropwise from a syringe while being careful not to generate heat. After sufficient reaction, a calculated amount of trimellitic anhydride (hereinafter referred to as TMA) is dissolved in an aprotic polar solvent and then added. Thereafter, the diol [1] HOArz-OH (U) [1] represented by the general formula (It) (in the formula, Art represents a divalent organic group) was cooled with water and treated with the same abrogated polar solvent as above. Add after dissolving. In order to complete the reaction, the reaction is appropriately carried out at room temperature. Here, in order to obtain a copolymer, the general formula (I[[
) etc. It is also possible to add an organic tetracarboxylic dianhydride [2] ]111 [2] (wherein, Ar represents a tetravalent organic group). Next, the reaction system was ice-cooled again, and the general formula (IV
) diamine [3]HJ Ar+ NHz
(IV) [3] (In the formula, Ar+ represents a divalent organic group.) is added.
この際、両末端アミノ基停止テレケリツクなオリゴエス
テルアミック酸溶液を得るように予め計算量のジアミン
を加えることが肝要である。オリゴエステルアミック酸
溶液を充分に反応させたのち、反応系を60°Cに加熱
した中で反応を継続する。At this time, it is important to add a calculated amount of diamine in advance so as to obtain a telechelic oligoester amic acid solution terminated with amino groups at both ends. After the oligoester amic acid solution is sufficiently reacted, the reaction is continued while the reaction system is heated to 60°C.
そののち、末端アミノ基を上記と同一のアプロティクな
極性溶媒に熔解した一般式(V)で示される芳香族酸無
水物〔4〕
〔4〕
(式中、Arsは2価の有機基を示す、)で停止した一
般式(Vl)で表されるオリゴエステルアミンク酸
(式中、Ar、、 Arzは2価の有機基、Ar3は1
価の有機基であり、Ar+、^r、、Ar、はそれぞれ
同種であってもよく、異種であってもよい、また、mは
1〜30の整数である。)を合成する。Thereafter, the aromatic acid anhydride represented by the general formula (V) [4] [4] (where Ars represents a divalent organic group) is prepared by dissolving the terminal amino group in the same aprotic polar solvent as above. , ) terminated with oligoester amine citric acid represented by the general formula (Vl) (where Ar, , Arz are divalent organic groups, Ar3 is 1
Ar+, ^r, and Ar may be the same or different types, and m is an integer of 1 to 30. ).
最後に、上記アミック酸溶液を熱的に閉環・脱水させる
ために、非溶媒を加えたのち還流・共沸下、一般式(I
)で表されるエステルイミドオリゴマーに変換する。Finally, in order to thermally ring-close and dehydrate the above amic acid solution, a non-solvent is added, and then the general formula (I
) into an ester imide oligomer.
ここで、使用する非溶媒は芳香族炭化水素であるキシレ
ン、トルエン、ヘンゼン等であれば特に制限なく使用で
きるが、好ましくは、ヘンゼンを使用するのがよい。反
応は、共沸・留去する水をディーン・スターク還流器を
用いて反応理論量の水が集められるまで還流させる。反
応後は、水あるいはアルコール系の溶媒中に激しく撹拌
させながらポリイミド溶液を注くことで、ポリイミドを
パウダーとして沈澱させる。パウダーは、濾過して集め
たのち80℃・減圧下に48時間乾燥させる。Here, the nonsolvent to be used can be aromatic hydrocarbons such as xylene, toluene, and Hensen without any particular restriction, but Hensen is preferably used. In the reaction, water to be azeotropically distilled off is refluxed using a Dean-Stark reflux device until the stoichiometric amount of water for the reaction is collected. After the reaction, the polyimide solution is poured into water or an alcoholic solvent with vigorous stirring to precipitate the polyimide as a powder. The powder is collected by filtration and then dried at 80° C. under reduced pressure for 48 hours.
本発明に用いられる有機テトラカルボン酸二無水物とし
ては、あらゆる構造の有機テトラカルボン酸二無水物が
使用可能であるが、上記一般式(I)のArn基は4価
の有機基であり、芳香族基であるこ2が好ましい、この
Δr4基を具体的に例示すると、次の物を挙げることが
出来る。As the organic tetracarboxylic dianhydride used in the present invention, organic tetracarboxylic dianhydride having any structure can be used, but the Arn group in the above general formula (I) is a tetravalent organic group, Specific examples of the Δr4 group, which is preferably an aromatic group, include the following.
CF。C.F.
CF、l
これらの有機テトラカルボン酸二無水物を単独又は二種
以上組み合わせて用いてもよい、より具体的には、緒特
性のバランス面から、
の少なくとも1種以上を主成分とすることが好適である
。CF,l These organic tetracarboxylic dianhydrides may be used alone or in combination of two or more. More specifically, from the viewpoint of balance of properties, at least one of the following may be used as the main component. suitable.
本発明に用いられるジオールは、一般式(II)HOA
rz O)I (II)〔±〕
(式中、Ar2は2価の有機基)で示され、該ジオール
化合物(土〕のArzは本質的には2価の有機基ならな
んでも使用可能であり、具体的には、本発明に用いられ
るジアミンは、
一般式(IV)
(式中、Ar
は2価の有機基)
で示され、
該ジア
ミン化合物〔1〕
の^r1は2価の有機基なら何で
も使用可能であり、
具体的には、
具体的には、
である。The diol used in the present invention has the general formula (II) HOA
rz O) I (II) [±] (In the formula, Ar2 is a divalent organic group), and Arz of the diol compound (earth) can essentially be any divalent organic group. Specifically, the diamine used in the present invention is represented by the general formula (IV) (wherein Ar is a divalent organic group), and ^r1 of the diamine compound [1] is a divalent organic group. Anything can be used, specifically, .
CF3
等を挙げることができるが、
芳香族基が望ましく、
具体的には、
の少なくとも1種以上を主成分とすることが好適である
。Examples include CF3, but aromatic groups are preferable, and specifically, it is preferable to have at least one or more of the following as the main component.
末端停止用に本発明で使用される芳香族酸無水物は、一
般式(V)
等があるが、
コスト、取扱の点で、
特に好ましく
は、
〔4〕
で表され、
該芳香族酸無水物〔土〕
のAr、を例示
すると、
である。The aromatic acid anhydride used in the present invention for terminal termination has the general formula (V), etc., but in terms of cost and handling, it is particularly preferably represented by [4], and the aromatic acid anhydride is An example of the material [earth] Ar is as follows.
ポリアミド酸溶液の生成反応に使用されるアプロティク
な極性有m溶媒としては、例えば、ジメチルスルホキシ
ド、ジエチルスルホキシド等のスルホキシド系溶媒、N
、N’−ジメチルホルムアミド、N、N’−ジエチルホ
ルムアミド等のホルムアミド系溶媒、N、N’ −ジメ
チルアセトアミド、N、N’−ジエチルアセトアミド等
アセトアミド系溶媒等を挙げることができる。これらを
単独又は2種以上の混合溶媒として用いることもできる
。更に、これらのアプロティクな極性溶媒とともに、メ
タノール、エタノール、イソプロパツール、ヘンゼンメ
チルセロソルブ等のポリアミック酸の非溶媒との混合溶
媒として用いることもできる。好ましくは、ジメチルホ
ルムアミド(以下、DMFと記す。)を用いることが生
成するポリマーの色調、収率等の点から望ましい。Examples of aprotic polar solvents used in the production reaction of polyamic acid solutions include sulfoxide solvents such as dimethyl sulfoxide and diethyl sulfoxide, N
, N'-dimethylformamide, N,N'-diethylformamide, and other formamide solvents; and N,N'-dimethylacetamide, N,N'-diethylacetamide, and other acetamide solvents. These solvents can be used alone or as a mixed solvent of two or more. Furthermore, it can also be used as a mixed solvent with a non-solvent for polyamic acid such as methanol, ethanol, isopropanol, Hensen's methyl cellosolve, etc., along with these aprotic polar solvents. Preferably, it is desirable to use dimethylformamide (hereinafter referred to as DMF) from the viewpoint of the color tone of the produced polymer, yield, etc.
本発明に係る反応性を有するエステルイミドオリゴマー
から特に高い耐熱性を有する硬化物を与えることについ
ての機構は明確ではないが、アセチレンの熱硬化(3量
化)によるベンゼン骨格形成あるいはナジック環の開環
、熱重合の効果であるといわれている〔例えば、竹串力
、高分子加工、第37巻、第7号、347ページ、19
88年]。Although the mechanism for producing a cured product with particularly high heat resistance from the reactive ester imide oligomer according to the present invention is not clear, the formation of a benzene skeleton by thermal curing (trimerization) of acetylene or the opening of a Nazick ring , is said to be an effect of thermal polymerization [for example, Takekushiriki, Polymer Processing, Vol. 37, No. 7, p. 347, 19
1988].
また、数平均重合度[DP;P、 J、フローツ、P
r1nciples of Polymer Chem
istry: CornellUniversity
Press: Ithaca、 NY、 91ページ、
1953年〕をコントロールするために、重合比nは1
〜30、好ましくはは1〜25、更に好ましくは1〜2
0がよい。上記範囲より大きくなると、有機溶媒溶解性
が落ちるという欠点が出る。また、上記範囲より小さい
場合は、機械的強度の点で問題が出る。In addition, the number average degree of polymerization [DP; P, J, Floats, P
r1nciples of Polymer Chem
istry:CornellUniversity
Press: Ithaca, NY, 91 pages,
1953], the polymerization ratio n was set to 1.
~30, preferably 1-25, more preferably 1-2
0 is good. If it exceeds the above range, there will be a drawback that solubility in organic solvents will decrease. Moreover, if it is smaller than the above range, problems will arise in terms of mechanical strength.
本発明のエステルイミドオリゴマーから硬化物を得るに
際し、必要に応してエポキシ樹脂やエポキシ樹脂硬化剤
、硬化促進剤、充填剤、難燃剤、補強剤、表面処理剤、
顔料、各種エラストマーなどを併用することが出来る。When obtaining a cured product from the esterimide oligomer of the present invention, an epoxy resin, an epoxy resin curing agent, a curing accelerator, a filler, a flame retardant, a reinforcing agent, a surface treatment agent,
Pigments, various elastomers, etc. can be used in combination.
エポキシ樹脂とは分子中に2個以上のエポキシ(グリシ
ジル)基を有する化合物であり、例示するとビスフェノ
ールA1ビスフエノールF、ハイドロキノン、レゾルシ
ン、フルルグリシン、トリス−(4−ヒドロキシフェニ
ル)メタン、■、12.2.−テトラキス(4−ヒドロ
キシフェニル)エタン等の2価あるいは3価以上のフェ
ノール類又はテトラブロムビスフェノールAやブロム化
ポリフェノール類から誘導されるノボラックなどのハロ
ゲン化ポリフェノール類から誘導されるグリシジルエー
テル化合物、フェノール、オルトクレゾール等のフェノ
ール類とホルムアルデヒドの反応生成物であるノボラッ
ク系エポキシ樹脂、アニリン、バラアミノフェノール、
メタアミノフェノール、4−アミノ−メタクレゾール、
6−アミノ−メタクレゾール、4.4′−ジアミノジフ
ェニルメタン、8,8′−ジアミノジフェニルメタン、
4,4′−ジアミノジフェニルエーテル、3.4′−ジ
アミノジフェニルエーテル、1,4−ビス(4−アミノ
フェノキシ)ベンゼン、14−ビス(3−アミノフェノ
キシ)ベンゼン、1゜3−ビス(3−アミノフェノキシ
)ベンゼン、2゜2−ビス(4−アミノフェノキシフェ
ニル)プロパン、バラフェニレンジアミン、メタフェニ
レンジアミン、2.4−1−ルエンジアミン、2,6−
トルエンジアミン、バラキシリレンジアミン、メタキシ
リレンジアミン、1,4−シクロヘキサンビス(メチル
アミン)、1.4−シクロヘキサン−ビス(メチルアミ
ン)、5−アミノ−1(4′−アミノフェニル)−1’
、8.8−トリメチルインダン、6−アミノ−1−(4
−アミノフェニル)−1−,8,8−)リメチルインダ
ン等から誘導されるアミン系エポキシ樹脂、パラオキシ
安息香酸、テレフタル酸、イソフタル酸等の芳香族カル
ボン酸から誘導されるグリシジルエステル系化合物、5
,5−ジメチルヒダントイン等がら誘導されるヒダント
イン系エポキシ樹脂、2.2ビス(3,4−エポキシシ
クロヘキシル)プロパン、2,2−ビスC4−(2,3
−エポキシプロビル)シクロヘキシル〕プロパン、ビニ
ルシクロヘキセンジオキサイド、3,4−エポキシシク
ロヘキサンカルボキシレート等の脂環式エポキシ樹脂、
その他、トリグリシジルイソシアヌレート、2,4.6
−トリグリシドキシーs−トリアジン等が挙げられ、こ
れらは1種又は2種以上組み合わせて用いられる。Epoxy resin is a compound having two or more epoxy (glycidyl) groups in the molecule, and examples include bisphenol A1 bisphenol F, hydroquinone, resorcinol, flurglycine, tris-(4-hydroxyphenyl)methane, .2. - Glycidyl ether compounds and phenols derived from divalent or trivalent or higher valent phenols such as tetrakis(4-hydroxyphenyl)ethane, or halogenated polyphenols such as novolak derived from tetrabromobisphenol A and brominated polyphenols. , novolac epoxy resin which is a reaction product of phenols such as orthocresol and formaldehyde, aniline, paraaminophenol,
meta-aminophenol, 4-amino-metacresol,
6-amino-metacresol, 4,4'-diaminodiphenylmethane, 8,8'-diaminodiphenylmethane,
4,4'-diaminodiphenyl ether, 3,4'-diaminodiphenyl ether, 1,4-bis(4-aminophenoxy)benzene, 14-bis(3-aminophenoxy)benzene, 1゜3-bis(3-aminophenoxy) ) Benzene, 2゜2-bis(4-aminophenoxyphenyl)propane, paraphenylenediamine, metaphenylenediamine, 2.4-1-lyenediamine, 2,6-
Toluene diamine, baraxylylene diamine, metaxylylene diamine, 1,4-cyclohexane-bis(methylamine), 1,4-cyclohexane-bis(methylamine), 5-amino-1(4'-aminophenyl)-1 '
, 8.8-trimethylindane, 6-amino-1-(4
Amine-based epoxy resins derived from -aminophenyl)-1-,8,8-)limethylindane, glycidyl ester compounds derived from aromatic carboxylic acids such as paraoxybenzoic acid, terephthalic acid, isophthalic acid, etc. 5
, 5-dimethylhydantoin, etc., 2.2-bis(3,4-epoxycyclohexyl)propane, 2,2-bisC4-(2,3
-Alicyclic epoxy resins such as epoxypropyl)cyclohexyl]propane, vinylcyclohexene dioxide, 3,4-epoxycyclohexane carboxylate,
Others, triglycidyl isocyanurate, 2,4.6
-triglycidoxy-s-triazine and the like, which may be used alone or in combination of two or more.
エポキシ硬化剤としては、芳香族アミンやキシリレンジ
アミン等の脂肪族アミン等のアミン系硬化剤、フェノー
ルノボラックやクレゾールノボラック等のポリフェノー
ル化合物、ヒドラジド化合物等が例示され、これらは1
種又は2種以上組み合わせて用いられる。Examples of epoxy curing agents include amine curing agents such as aromatic amines and aliphatic amines such as xylylene diamine, polyphenol compounds such as phenol novolak and cresol novolac, and hydrazide compounds.
It can be used as a species or in combination of two or more species.
硬化促進剤としてはベンジルジメチルアミン、2.4.
6−1−リス(ジメチルアミノメチル)フェノール、1
.8−ジアザビシクロウンデセン等のアミン類や、2−
エチル−4−メチルイミダゾール等のイミダゾール化合
物、三フフ化ホウ素アミン錯体等が例示でき、これらは
1種又は2種以上組み合わせて用いられる。As a curing accelerator, benzyldimethylamine, 2.4.
6-1-Lis(dimethylaminomethyl)phenol, 1
.. Amines such as 8-diazabicycloundecene, 2-
Examples include imidazole compounds such as ethyl-4-methylimidazole, boron trifluoride amine complexes, and these may be used alone or in combination of two or more.
機械的強度を改良するためにエラストマーの添加も効果
的である。エラストマーとは、具体的には、以下のもの
を例示することができる。Addition of elastomers to improve mechanical strength is also effective. Specifically, the elastomer can be exemplified by the following.
F
(X+Y=3)
R: −COOH(CTBN CTB)COOCH
zCHCHzOCOCH=CHt (νTBN)H
上記記載のエラストマーは、5ilastic (LS
−420) 、Sylgard (I84)はダウコー
ニング社から、ハイカー ・ATBN (I300x1
6等) 、CTB (2000X162)、Cr8N
(I300x13.1300x8.1300x31)
、νTBN (I300X23)は■宇部興産から、3
Fはモンサンド社により製造されている。F (X+Y=3) R: -COOH(CTBN CTB) COOCH
zCHCHzOCOCH=CHt (νTBN)H The elastomer described above is 5ilastic (LS
-420), Sylgard (I84) from Dow Corning, Hiker ATBN (I300x1
6 etc.), CTB (2000X162), Cr8N
(I300x13.1300x8.1300x31)
, νTBN (I300X23) is from ■Ube Industries, 3
F is manufactured by Monsando.
また、難燃性付与のため難燃材、無機充填剤を適宜を適
宜配合することが出来る。無機充填剤としては、水不溶
性で、絶縁性のものが用いられる。Further, flame retardants and inorganic fillers may be appropriately blended to impart flame retardancy. The inorganic filler used is water-insoluble and insulating.
その例としては、シリカ、アルミナジルコニア、二酸化
チタン、亜鉛華等の金属酸化物;水酸化マグネシウム、
水酸化アルミニウム等の金属水酸化物;タルク、カオリ
ン、雲母、ワラストナイト、粘度鉱物等の天然鉱物;炭
酸カルシウム、炭酸マグネシウム、硫酸バリウム、リン
酸カルシウム等の不溶性塩等があり、これらは単独又は
2種以上組み合わせて用いられる。Examples include metal oxides such as silica, alumina zirconia, titanium dioxide, and zinc white; magnesium hydroxide;
Metal hydroxides such as aluminum hydroxide; natural minerals such as talc, kaolin, mica, wollastonite, and clay minerals; insoluble salts such as calcium carbonate, magnesium carbonate, barium sulfate, and calcium phosphate; these may be used singly or in combination. Used in combination of more than one species.
補強材としては、炭素繊維、ガラス繊維、アラミド繊維
、ヘクトラ等の液晶ポリエステル繊維、ポリベンゾチア
ゾール(PBT)繊維、アルミナ繊維等からなる織布、
不織布、マント、紙(ペーパー)あるいはこれらの組合
せが例示できる。これらの補強材は、接着性付与のため
シランカンプリング剤処理を併用することも効果的であ
る。As reinforcing materials, woven fabrics made of carbon fiber, glass fiber, aramid fiber, liquid crystal polyester fiber such as Hectra, polybenzothiazole (PBT) fiber, alumina fiber, etc.
Examples include nonwoven fabric, cloak, paper, or a combination thereof. It is also effective to treat these reinforcing materials with a silane camping agent in order to impart adhesion.
次に、代表的な塗布工程を例を挙げて説明する。Next, a typical coating process will be explained using an example.
一般式(I)
で表されるエステルイミドオリゴマーを所定の樹脂濃度
になるように所定量の有機溶剤で溶解・攪拌することに
より、均一なワニス状樹脂組成物を得る。このようにし
て製造した樹脂組成物を、ガラス布、ガラス不織布、ガ
ラスペーパー等の補強材に塗布・含浸したのち、熱風循
環乾燥炉内で50〜250°C1好ましくは50〜20
0°C1更に好ましくは100〜200°Cの温度範囲
内で、所定の残溶剤濃度になるように炉内滞留時間を設
定・乾燥し、耐熱性積層板用プリプレグを製造する。A uniform varnish-like resin composition is obtained by dissolving and stirring the ester imide oligomer represented by the general formula (I) in a predetermined amount of an organic solvent to a predetermined resin concentration. After coating and impregnating the resin composition produced in this way on a reinforcing material such as glass cloth, glass nonwoven fabric, glass paper, etc., the resin composition is dried in a hot air circulation drying oven at 50 to 250°C, preferably 50 to 250°C.
A heat-resistant laminate prepreg is produced by setting and drying the furnace residence time within a temperature range of 0° C., more preferably 100 to 200° C., so as to achieve a predetermined residual solvent concentration.
使用される有機溶剤としては、例えば、ジメチルスルホ
キシド、ジエチルスルホキシド等のスルホキシド系溶剤
、N、N’ −ジメチルホルムアミド、N、 N’−
ジエチルホルムアミド等のホルムアミド系溶剤、N、N
’−ジメチルアセトアミド、N、N’−ジエチルアセト
アミド等のアセトアミド系溶剤、ジメチルエーテル、ジ
エチルエーテル、ジオキサン等のエーテル系溶剤;アセ
トン、メチルエチルケトン等のケトン系溶剤等を挙げる
ことができる。これらを単独又は2種以上の混合溶剤と
して用いることもできる。更に、これらの有機極性溶剤
とともに、メタノール、エタノール、イソプロパツール
等のアルコール系溶剤、ヘンゼン、メチルセロソルブ等
との混合溶剤として用いることもできる。Examples of the organic solvent used include sulfoxide solvents such as dimethyl sulfoxide and diethyl sulfoxide, N,N'-dimethylformamide, N,N'-
Formamide solvents such as diethylformamide, N, N
Examples include acetamide solvents such as '-dimethylacetamide and N,N'-diethylacetamide; ether solvents such as dimethyl ether, diethyl ether, and dioxane; and ketone solvents such as acetone and methyl ethyl ketone. These can also be used alone or as a mixed solvent of two or more. Furthermore, in addition to these organic polar solvents, it can also be used as a mixed solvent with alcoholic solvents such as methanol, ethanol, and isopropanol, Hensen, methyl cellosolve, and the like.
有機溶剤に溶解稀釈時の樹脂濃度は、プリプレグ時の樹
脂濃度との関係から5〜75重量%、好ましくは15〜
65重量%、更に好ましくは35〜65重量%の範囲で
使用するのが望ましい。プリプレグの残溶剤濃度は、残
溶剤/樹脂比計算で1〜20重量%、好ましくは1〜1
0重景%、更に好ましくは1〜5重量%の範囲で調整す
るのが望ましい。上記範囲よりも大きくなると、プリプ
レグ成形後の積層板の機械特性が低いという問題が発生
する。また、上記範囲よりも小さいと、プリプレグ成形
時に残存溶剤が揮発するためボイドの発生が起こるとい
う不都合がある。The resin concentration at the time of dissolution and dilution in an organic solvent is 5 to 75% by weight, preferably 15 to 75% by weight from the relationship with the resin concentration at the time of prepreg.
It is desirable to use it in an amount of 65% by weight, more preferably in a range of 35 to 65% by weight. The concentration of residual solvent in the prepreg is 1 to 20% by weight, preferably 1 to 1% by weight based on residual solvent/resin ratio calculation.
It is desirable to adjust the amount to 0% by weight, more preferably from 1 to 5% by weight. If it is larger than the above range, a problem arises in that the mechanical properties of the laminate after prepreg molding are low. Moreover, if it is smaller than the above range, the residual solvent will volatilize during prepreg molding, resulting in the inconvenience that voids will occur.
次に、上記のようにして得られた耐熱性プリプレグを用
いて両面銅張積層板を作成する方法について説明する。Next, a method for producing a double-sided copper-clad laminate using the heat-resistant prepreg obtained as described above will be described.
希望する厚みになるように、銅箔及びプリプレグの枚数
を調整する。表面を鏡面仕上げした2枚のステンレスプ
レートの間に、所定の銅箔、プリプレグを挿入したのち
所定の時間・圧力下で加熱・加圧すれば両面銅張積層板
を作成することが出来る。また、機械的強度を向上する
ためにアフターキュアを併用することも効果的である。Adjust the number of copper foils and prepregs to achieve the desired thickness. A double-sided copper-clad laminate can be created by inserting a specified amount of copper foil or prepreg between two stainless steel plates with mirror-finished surfaces, and then heating and pressurizing the material for a specified period of time and under pressure. Further, it is also effective to use after-cure in combination to improve mechanical strength.
以下、実施例により、本発明を具体的に説明するが、本
発明はこれらの実施例になんら限定されるものではない
。EXAMPLES Hereinafter, the present invention will be specifically explained with reference to Examples, but the present invention is not limited to these Examples in any way.
実施例1
1リツトルの40フラスコに、三方コック、デインスタ
ーク蒸留器、ジムロート還流冷却器、シラムキャップを
取り付けた。反応器を減圧下に乾燥した。14.9g(
78ミリモル)のTsClを反応系に加えたのち、充分
にアルゴン置換した。反応系を氷冷し、30ミリリツト
ルの乾燥ピリジンを発熱に注意して加えた。15g (
78ミリモル)のTMAを110ミリリツトルの乾燥D
MFに完全に溶解したのち30分間で加えた。その温度
で引続き反応させたのち、30ミリリツトルの乾燥DM
Fに溶解した13.1g(39ミリモル)の芳香族ジオ
ール
を水冷下に滴下した。30分後アイスバスをはずし、室
温下で引続き1時間反応させた。そののち再び反応系を
氷冷したのち、50ミリリンドルの乾燥DMFに26.
1g(78,0ミリモル)の芳香族ジアミン
を加えた。30分後アイスハスをはずしたのち、オイル
バスで60°Cに反応系を加熱したのち、引続き30分
間反応を続けた。10ミリリツトルの乾燥DMFに13
.4g(78,0ミリモル)の芳香族酸無水物
を加えて2.6時間反応させた。そののち、200ミリ
リツトルの乾燥ベンゼンを加えた後145℃(バス塩)
で共沸下に1.4ミリリツトル(理論量;1.4ミリリ
ツトル)の反応水を留去した。反応後はメタノール10
00d!中に反応溶液を投入し、エステルイミドオリゴ
マーを沈澱させた。沈澱したエステルイミドオリゴマー
は、減圧下に濾過し真空中・80°Cで48時間乾燥し
たところ、56.0g(収率: 97.1%)の淡黄色
のパウダーとして得た。Example 1 A 1 liter 40 flask was equipped with a three-way stopcock, a Dane-Stark distiller, a Dimroth reflux condenser, and a syram cap. The reactor was dried under reduced pressure. 14.9g (
After adding 78 mmol of TsCl to the reaction system, the reaction system was sufficiently purged with argon. The reaction system was ice-cooled, and 30 milliliters of dry pyridine was added, being careful not to generate heat. 15g (
78 mmol) of TMA and 110 ml of dry D
After completely dissolving in MF, it was added for 30 minutes. After continued reaction at that temperature, 30 ml of dry DM
13.1 g (39 mmol) of aromatic diol dissolved in F was added dropwise while cooling with water. After 30 minutes, the ice bath was removed, and the reaction was continued at room temperature for 1 hour. After that, the reaction system was cooled on ice again, and then added to 50 milliliters of dry DMF for 26.
1 g (78.0 mmol) of aromatic diamine was added. After 30 minutes, the ice bath was removed, the reaction system was heated to 60°C in an oil bath, and the reaction was continued for another 30 minutes. 13 in 10ml dry DMF
.. 4 g (78.0 mmol) of aromatic acid anhydride was added and reacted for 2.6 hours. After that, add 200ml of dry benzene to 145℃ (bath salt).
1.4 milliliters (theoretical amount; 1.4 milliliters) of reaction water was distilled off azeotropically. After the reaction, methanol 10
00d! The reaction solution was poured into the container to precipitate the ester imide oligomer. The precipitated ester imide oligomer was filtered under reduced pressure and dried in vacuo at 80°C for 48 hours to obtain 56.0 g (yield: 97.1%) of a pale yellow powder.
得られたエステルイミドオリゴマー165gを、DMF
200gに溶解(樹脂濃度;45重置%/DMF)した
。20×20CI11のガラス布(WEA−18に10
5F117i■日東紡製)16枚に含浸させた。熱風循
環乾燥炉内で、120°C・85分乾燥させ、樹脂濃度
38.9重量%(ガラス布1枚当たり)、残溶剤濃度4
.2%のプリプレグを作成した。165 g of the obtained ester imide oligomer was added to DMF.
It was dissolved in 200 g (resin concentration: 45% by weight/DMF). 20 x 20 CI11 glass cloth (10 to WEA-18
5F117i (manufactured by Nittobo) were impregnated with 16 sheets. Dry in a hot air circulation drying oven at 120°C for 85 minutes to achieve a resin concentration of 38.9% by weight (per glass cloth) and a residual solvent concentration of 4.
.. A 2% prepreg was prepared.
こうして作成したプリプレグ8枚を電解銅箔(35μm
、3EC,■三井金属工業製)2枚に挟みこみ180℃
・2時間・25kg/dの条件下で加熱・加圧一体成形
して板厚121mの両面銅張積層板を得た。Electrolytic copper foil (35 μm
, 3EC, ■Made by Mitsui Kinzoku Kogyo) sandwiched between two sheets and heated to 180℃
- A double-sided copper-clad laminate with a thickness of 121 m was obtained by integral molding under heating and pressure under conditions of 2 hours and 25 kg/d.
実施例2
芳香族ジオール13.1g(39ミリモル)芳香族ジア
ミン22.9g(78ミリモル)酸無水物12.8g(
78ミリモル)
を用いて、60″Cで3.5時間反応させるはがば実施
例1と同様の条件で反応を行い、エステルイミドオリゴ
マー42.1g(収率:94.4%)得た。Example 2 Aromatic diol 13.1 g (39 mmol) Aromatic diamine 22.9 g (78 mmol) Acid anhydride 12.8 g (
Using 78 mmol), the reaction was carried out under the same conditions as in Example 1, in which the reaction was carried out at 60''C for 3.5 hours, to obtain 42.1 g (yield: 94.4%) of ester imide oligomer.
更に上記エステルイミドオリゴマー165gを用いて実
施例1と同様の条件で板厚911I11の両面銅張積層
板を得た。Furthermore, a double-sided copper-clad laminate having a thickness of 911I11 was obtained using 165 g of the above esterimide oligomer under the same conditions as in Example 1.
実施例3
芳香族ジオール9.75g(39ミリモル)を用いて、
60°Cで3.5時間反応させるほかは実施例1と同様
の条件で反応を行い、エステルイミドオリゴマーを51
.2g(収率:91.3%)得た。Example 3 Using 9.75 g (39 mmol) of aromatic diol,
The reaction was carried out under the same conditions as in Example 1 except that the reaction was carried out at 60°C for 3.5 hours, and the ester imide oligomer was
.. 2g (yield: 91.3%) was obtained.
更に上記エステルイミドオリゴマー165gを用いて実
施例1と同様の条件で板厚13髄の両面銅張積層板を得
た。Furthermore, a double-sided copper-clad laminate having a thickness of 13 mm was obtained using 165 g of the above ester imide oligomer under the same conditions as in Example 1.
実施例4
芳香族ジオール6.16g(39ミリモル)HOズ【「
OH
芳香族ジアミン37.6g(78ミリモル)芳香族ジア
ミン19.3g (78ミ+J−r−ル)酸無水物13
.4g(78ミリモル)
酸無水物13.4g(78ミリモル)
を用いて、60°Cで3.5時間反応させるほかは実施
例1と同様の条件で反応を行い、エステルイミドオリゴ
マーを65.2g(収率:92.9%)得た。Example 4 6.16 g (39 mmol) of aromatic diol
OH Aromatic diamine 37.6 g (78 mmol) Aromatic diamine 19.3 g (78 m+J-r-l) Acid anhydride 13
.. The reaction was carried out under the same conditions as in Example 1, except that 4 g (78 mmol) of acid anhydride and 13.4 g (78 mmol) of acid anhydride were reacted at 60°C for 3.5 hours, and 65.2 g of ester imide oligomer was used. (Yield: 92.9%).
更に上記エステルイミドオリゴマー165gを用いて実
施例1と同様の条件で板厚12+nmの両面銅張積層板
を得た。Furthermore, a double-sided copper-clad laminate having a thickness of 12+ nm was obtained using 165 g of the above ester imide oligomer under the same conditions as in Example 1.
比較例1
市販のイミドオリゴマー165gを、DMF200gに
溶解(樹脂濃度;45重量%/DMF)した。20X2
0c+nのガラス布(WEA−I B K105F11
7;■日東紡製)16枚に含浸させた。熱風循環乾燥炉
内で、120°C・85分乾燥させ、樹脂濃度31.2
重量%(ガラス布1枚当たり)、残溶剤濃度9.4%の
プリプレグを作成した。Comparative Example 1 165 g of a commercially available imide oligomer was dissolved in 200 g of DMF (resin concentration: 45% by weight/DMF). 20X2
0c+n glass cloth (WEA-I B K105F11
7; ■Nittobo Co., Ltd.) 16 sheets were impregnated. Dry in a hot air circulation drying oven at 120°C for 85 minutes to a resin concentration of 31.2.
A prepreg with a residual solvent concentration of 9.4% by weight (per glass cloth) was produced.
こうして作成したプリプレグ8枚を電解銅箔(35μm
、3EC,■三井金属工業製)2枚に挾みこみ220°
C・2時間・25kg/c+11の条件下で加熱・加圧
一体成形して板厚10mmの両面銅張積層板を得た。Electrolytic copper foil (35 μm
, 3EC, ■Mitsui Kinzoku Kogyo) sandwiched between two pieces 220°
A double-sided copper-clad laminate having a thickness of 10 mm was obtained by integral molding under heating and pressure under the conditions of C, 2 hours, and 25 kg/c+11.
上記実施例1〜4及び比較例1で得られた銅張積層板の
物性を第1表に示した。Table 1 shows the physical properties of the copper-clad laminates obtained in Examples 1 to 4 and Comparative Example 1.
第 1 表
〔発明の効果〕
本発明の耐熱製積層材用化合物は、耐湿性が高く且つ保
存安定性に優れた耐熱性積層板用プリプレグの製造を可
能とし、更に該プリプレグを用いて工業的価値の高い、
耐湿性及び耐熱性に優れた両面銅張積層板等の積層板の
製造を可能とするもので、その有用性は極めて大である
。Table 1 [Effects of the Invention] The compound for heat-resistant laminates of the present invention enables the production of heat-resistant laminate prepregs with high moisture resistance and excellent storage stability, and furthermore, the prepregs can be used industrially. high value,
It enables the production of laminates such as double-sided copper-clad laminates with excellent moisture resistance and heat resistance, and is extremely useful.
[注]ml JI3−6481
率2 ■東洋精機型レオログラフソリンド(DTMA)
で測定率5JIS法
−半田浴(260°C130秒)後のフクレを観察した
。[Note] ml JI3-6481 Rate 2 ■Toyo Seiki type Rheolograph Solindo (DTMA)
Measurement rate 5 JIS method - blistering after soldering bath (260°C, 130 seconds) was observed.
○:良好(フクレなし)、×:不良(フクレあり)寧5
プレッシャークンカーテス):121°C12気圧、
5時間処理後、半田浴(260°C130秒)後のフク
レを観察した。○: Good (no blister), ×: Bad (with blister) 5
Pressure (Cuncates): 121°C 12 atm,
After 5 hours of treatment, blisters were observed after a solder bath (260°C, 130 seconds).
○:良好(フクレなし)、×:不良(フクレあり)特許
出願人 鐘淵化学工業株式会社○: Good (no blisters), ×: Bad (with blisters) Patent applicant Kanebuchi Chemical Industry Co., Ltd.
Claims (1)
であり、Ar_1、Ar_2、Ar_3はそれぞれ同種
であってもよく、異種であってもよい。mは1〜30の
整数である。 )で示される化合物を主成分とすることを特徴とする耐
熱性積層材用化合物。 2、Ar_1が下記の基から選択される請求項1記載の
耐熱性積層材用化合物; ▲数式、化学式、表等があります▼ 3、Ar_2が下記の基から選択される請求項1記載の
耐熱性積層材用化合物; ▲数式、化学式、表等があります▼ 4、Ar_3が下記の基から選択される請求項1記載の
耐熱性積層材用化合物; ▲数式、化学式、表等があります▼ 5、第1項乃至第4項に記載の化合物を有機溶剤に溶解
してワニス状樹脂組成物を調製し、次いで補強材を該ワ
ニス樹脂組成分で塗布・含浸させたのち所定の残溶剤濃
度となるように乾燥してプリプレグを作成し、該プリプ
レグの1枚又は2枚以上を2枚の銅箔の間に挟み込み、
加熱加圧して一体成形することを特徴とする両面銅箔積
層板の製造方法。 6、ワニス状樹脂組成物の濃度が5〜75重量%である
請求項5記載の製造方法。 7、プリプレグの残溶剤濃度が樹脂に対して1〜20重
量%である請求項5又は6記載の製造方法。[Claims] 1. General formula (I) ▲Mathematical formula, chemical formula, table, etc.▼(I) (In the formula, Ar_1, Ar_2, Ar_3 are divalent organic groups, and Ar_1, Ar_2, Ar_3 are Each compound may be of the same kind or different kinds. m is an integer of 1 to 30. 2. The heat-resistant laminate compound according to claim 1, wherein Ar_1 is selected from the following groups; Compound for heat-resistant laminate materials; ▲ Includes mathematical formulas, chemical formulas, tables, etc. ▼ 4. Compound for heat-resistant laminate materials according to claim 1, in which Ar_3 is selected from the following groups; ▲ Includes mathematical formulas, chemical formulas, tables, etc. ▼ 5 , a varnish-like resin composition is prepared by dissolving the compounds described in items 1 to 4 in an organic solvent, and then a reinforcing material is coated and impregnated with the varnish resin composition, and then a predetermined residual solvent concentration is applied. Dry to create a prepreg, sandwich one or more sheets of the prepreg between two sheets of copper foil,
A method for manufacturing a double-sided copper foil laminate, which is characterized by integral molding by heating and pressing. 6. The manufacturing method according to claim 5, wherein the concentration of the varnish-like resin composition is 5 to 75% by weight. 7. The manufacturing method according to claim 5 or 6, wherein the residual solvent concentration of the prepreg is 1 to 20% by weight based on the resin.
Priority Applications (1)
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JP20090790A JP3026587B2 (en) | 1990-07-27 | 1990-07-27 | Heat-resistant laminated material and method for producing the laminated material |
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Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP20090790A JP3026587B2 (en) | 1990-07-27 | 1990-07-27 | Heat-resistant laminated material and method for producing the laminated material |
Publications (2)
Publication Number | Publication Date |
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JPH0485331A true JPH0485331A (en) | 1992-03-18 |
JP3026587B2 JP3026587B2 (en) | 2000-03-27 |
Family
ID=16432251
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009521560A (en) * | 2005-12-23 | 2009-06-04 | アイ.エス.ティー.(エムエー)コーポレーション | Two-stage curing polyimide oligomer |
-
1990
- 1990-07-27 JP JP20090790A patent/JP3026587B2/en not_active Expired - Fee Related
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7994274B2 (en) | 2003-09-02 | 2011-08-09 | I.S.T. (Ma) Corporation | Two-stage cure polyimide oligomers |
US9631090B2 (en) | 2003-09-02 | 2017-04-25 | I.S.T. (Ma) Corporation | Two-stage cure polyimide oligomers |
US10125224B2 (en) | 2003-09-02 | 2018-11-13 | I.S.T Corporation | Two-stage cure polyimide oligomers |
JP2009521560A (en) * | 2005-12-23 | 2009-06-04 | アイ.エス.ティー.(エムエー)コーポレーション | Two-stage curing polyimide oligomer |
JP2012046753A (en) * | 2005-12-23 | 2012-03-08 | Ist (Ma) Corp | Two-stage cure polyimide oligomer |
JP4918557B2 (en) * | 2005-12-23 | 2012-04-18 | アイ.エス.ティー.(エムエー)コーポレーション | Two-stage curing polyimide oligomer |
Also Published As
Publication number | Publication date |
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JP3026587B2 (en) | 2000-03-27 |
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