JPH04328136A - Method for manufacturing chemisorption membrane - Google Patents
Method for manufacturing chemisorption membraneInfo
- Publication number
- JPH04328136A JPH04328136A JP3098902A JP9890291A JPH04328136A JP H04328136 A JPH04328136 A JP H04328136A JP 3098902 A JP3098902 A JP 3098902A JP 9890291 A JP9890291 A JP 9890291A JP H04328136 A JPH04328136 A JP H04328136A
- Authority
- JP
- Japan
- Prior art keywords
- film
- base material
- substrate
- chemically adsorbed
- pref
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Nanotechnology (AREA)
- Materials Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Composite Materials (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
- Treatments Of Macromolecular Shaped Articles (AREA)
- Laminated Bodies (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Abstract
Description
【0001】0001
【産業上の利用分野】本発明は、基材の表面にシロキサ
ン結合を介して化学吸着膜を形成する製造方法に関する
。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a manufacturing method for forming a chemically adsorbed film on the surface of a substrate through siloxane bonds.
【0002】0002
【従来の技術】プラスチック、金属、セラミックス、繊
維、木材、コンクリート、塗装面などの基材の表面を目
的に応じて改質することは、様々な分野で要請されてい
る。一例として高分子をあげると、高分子の表面を改質
する方法としては、例えば撥水性・撥油性を付与するた
めに例えば含フッ素シランカップリング剤等をコーティ
ングする方法、潤滑性を付与するためにはワックスをコ
ーティングする方法、親水性を付与するためにはポリビ
ニルアルコールをコーティングする方法、防汚性を付与
するためにフロロカーボン系ポリマーの懸濁液をコーテ
ィングする方法などのコーティング方法が一般によく知
られている。BACKGROUND OF THE INVENTION There is a need in various fields to modify the surface of base materials such as plastics, metals, ceramics, fibers, wood, concrete, painted surfaces, etc. according to purposes. Taking polymers as an example, methods for modifying the surface of polymers include, for example, coating them with a fluorine-containing silane coupling agent to impart water and oil repellency, and coating them with a fluorine-containing silane coupling agent to impart lubricity. Coating methods such as coating with wax, coating with polyvinyl alcohol to impart hydrophilic properties, and coating with a suspension of fluorocarbon polymer to impart antifouling properties are generally well known. It is being
【0003】0003
【発明が解決しようとする課題】しかしながら従来の方
法で得られるコーティング膜は、高分子を含む基体との
結合力が弱く、布で表面を拭いたり水での洗浄を繰り返
すと、コーティング膜が基体から剥離して表面処理効果
がなくなってしまうという課題があった。また、従来の
コーティング膜は分子がランダムな方向を向いているた
め、コーティング膜にピンホールが多く、十分な特性が
発揮されないという課題があった。さらに例えば透明性
が強く要求される透明プラスチック光学材料等には、フ
ロロカーボン系ポリマーのコーティング膜では透明性に
欠如するため使用できないという課題もあった。[Problems to be Solved by the Invention] However, the coating film obtained by the conventional method has a weak bonding force with the substrate containing polymers, and when the surface is repeatedly wiped with a cloth or washed with water, the coating film can become attached to the substrate. There was a problem that the surface treatment effect would be lost due to peeling off from the surface. In addition, because the molecules of conventional coating films are oriented in random directions, there are many pinholes in the coating film, resulting in insufficient properties. Furthermore, for example, there is a problem in that fluorocarbon polymer coating films cannot be used in transparent plastic optical materials that strongly require transparency because of their lack of transparency.
【0004】本発明は、前記従来技術の課題を解決する
ため、耐久性に優れた高機能性化学吸着膜の製造方法を
提供することを目的とする。SUMMARY OF THE INVENTION In order to solve the problems of the prior art described above, it is an object of the present invention to provide a method for producing a highly functional chemisorption membrane with excellent durability.
【0005】[0005]
【課題を解決するための手段】前記目的を達成するため
、本発明の化学吸着膜の製造方法は、基材の表面に化学
吸着膜を製造する方法において、クロロシラン系界面活
性剤と、前記クロロシラン系界面活性剤と反応する活性
水素を持たない含フッ素系非水溶液とを少なくとも含む
混合溶液を、前記基材表面に接触させ、前記基材表面に
シロキサン結合を有する化学吸着膜を形成することを特
徴とする。[Means for Solving the Problems] In order to achieve the above object, the method for producing a chemically adsorbed film of the present invention includes a method for producing a chemically adsorbed film on the surface of a base material. A mixed solution containing at least a fluorine-containing non-aqueous solution having no reactive active hydrogen and a surfactant is brought into contact with the surface of the substrate to form a chemisorption film having a siloxane bond on the surface of the substrate. Features.
【0006】前記構成においては、含フッ素系非水溶液
が、三級アミンもしくは環状エーテルの少なくとも一つ
を含有することが好ましい。また前記構成においては、
化学吸着膜を形成する反応工程前に、基材表面をあらか
じめジクロロシラン、トリクロロシラン、またはテトラ
クロロシランで処理することが好ましい。[0006] In the above configuration, it is preferable that the fluorine-containing nonaqueous solution contains at least one of a tertiary amine or a cyclic ether. Further, in the above configuration,
It is preferable to treat the surface of the base material in advance with dichlorosilane, trichlorosilane, or tetrachlorosilane before the reaction step of forming the chemically adsorbed film.
【0007】さらに前記構成においては、基材表面が高
分子化合物からなることが好ましい。Furthermore, in the above structure, it is preferable that the surface of the base material is made of a polymer compound.
【0008】[0008]
【作用】前記本発明方法の構成によれば、基材の表面に
シロキサン結合を介して化学吸着膜を設けるので、従来
のものに比べて耐久性に優れた高機能性化学吸着膜を製
造することができる。また、クロロシラン系界面活性剤
と反応する活性水素を持たない含フッ素系非水溶液を溶
媒として用いるので、ピンホールのない高密度な単分子
膜を製造することができる。[Operation] According to the structure of the method of the present invention, a chemically adsorbed film is provided on the surface of the base material through siloxane bonds, so a highly functional chemically adsorbed film with superior durability compared to conventional ones can be manufactured. be able to. Furthermore, since a fluorine-containing nonaqueous solution that does not have active hydrogen that reacts with the chlorosilane surfactant is used as a solvent, a high-density monomolecular film without pinholes can be produced.
【0009】また、含フッ素系非水溶液が三級アミンも
しくは環状エーテルの少なくとも一つを含有するという
本発明方法の好ましい構成によれば、基材が高分子、樹
脂、塗膜などであっても基材を溶解することなく前記の
高機能性化学吸着膜を製造することができる。また、化
学吸着膜を形成する反応工程前に基材表面をあらかじめ
ジクロロシラン、トリクロロシラン、またはテトラクロ
ロシランで処理するという本発明方法の好ましい構成に
よれば、基材の表面に高密度にシラノール結合を付与で
きる。Furthermore, according to the preferred configuration of the method of the present invention in which the fluorine-containing non-aqueous solution contains at least one of a tertiary amine or a cyclic ether, even if the base material is a polymer, resin, coating film, etc. The above-mentioned highly functional chemisorption membrane can be produced without dissolving the base material. In addition, according to a preferred configuration of the method of the present invention, in which the surface of the base material is treated in advance with dichlorosilane, trichlorosilane, or tetrachlorosilane before the reaction step for forming the chemisorption film, silanol bonds are formed on the surface of the base material at a high density. can be granted.
【0010】さらに、基材表面が高分子化合物からなる
という本発明方法の好ましい構成によれば、従来法では
比較的困難であった高分子化合物の表面にも好適に本発
明方法の高機能性化学吸着膜を形成することが可能にな
った。Furthermore, according to the preferred configuration of the method of the present invention in which the surface of the substrate is made of a polymer compound, the high functionality of the method of the present invention can be applied to the surface of a polymer compound, which has been relatively difficult to achieve with conventional methods. It has become possible to form chemisorption films.
【0011】[0011]
【実施例】以下本発明方法を実施例によりさらに具体的
に説明する。なお本発明方法はプラスチック、金属、セ
ラミックス、繊維、木材、コンクリート、塗装面などの
基材など、多くの基材に適用することができるが、以下
においては、基材として高分子材料を例にとって説明す
る。高分子組成物の一実施例は図1に示すように、高分
子を含む基体1の表面にシロキサン結合2を介して、化
学吸着膜3を形成したものである。[Examples] The method of the present invention will be explained in more detail below with reference to Examples. The method of the present invention can be applied to many base materials such as plastics, metals, ceramics, fibers, wood, concrete, painted surfaces, etc., but in the following, polymer materials will be used as an example of the base material. explain. As shown in FIG. 1, one embodiment of the polymer composition is one in which a chemisorption film 3 is formed on the surface of a substrate 1 containing a polymer through siloxane bonds 2.
【0012】本発明に使用できる基体の高分子材料とし
ては、例えばポリカーボネート樹脂、アクリル樹脂、塩
化ビニル樹脂、ポリスチレン樹脂、ポリエチレン樹脂、
ポリプロピレン樹脂、ポリアミド樹脂,アクリルブタジ
エンスチレン共重合体(ABS)樹脂、アセタール樹脂
、メチルペンテン樹脂等の熱可塑性樹脂、例えばエポキ
シ樹脂、尿素樹脂、メラミン樹脂、フェノール樹脂、ア
ルキド樹脂、ウレタン樹脂、不飽和ポリエステル硬化樹
脂、エボナイト等の熱硬化性樹脂、もしくは例えばブタ
ジエンースチレンゴム、ブチルゴム、ニトリルゴム、ク
ロロプレンゴム、ウレタンゴム、シリコーンゴム等のゴ
ムが挙げられ、一般の汎用プラスティック材料の何れで
もよい。また、上記のような高分子材料に例えば二酸化
珪素、炭酸カルシウム、酸化チタン等の所謂充填剤が混
入されていてもよく、フタル酸ジブチル等の所謂可塑剤
が混入されていてもよく、さらに染料又は顔料で染着し
ていてもよく、高分子材料を含有する基体に適用される
。[0012] Examples of the polymeric material of the substrate that can be used in the present invention include polycarbonate resin, acrylic resin, vinyl chloride resin, polystyrene resin, polyethylene resin,
Thermoplastic resins such as polypropylene resins, polyamide resins, acrylic butadiene styrene copolymer (ABS) resins, acetal resins, methylpentene resins, such as epoxy resins, urea resins, melamine resins, phenolic resins, alkyd resins, urethane resins, unsaturated resins Examples include thermosetting resins such as polyester curing resins and ebonite, and rubbers such as butadiene-styrene rubber, butyl rubber, nitrile rubber, chloroprene rubber, urethane rubber, and silicone rubber, and any general-purpose plastic material may be used. In addition, the above-mentioned polymeric materials may be mixed with so-called fillers such as silicon dioxide, calcium carbonate, and titanium oxide, and may also be mixed with so-called plasticizers such as dibutyl phthalate. Alternatively, it may be dyed with a pigment and is applied to a substrate containing a polymeric material.
【0013】本発明の方法で高分子組成物に撥水・撥油
性、防汚性もしくは滑性を付与する場合には、化学吸着
膜を構成する材料としてはフッ化アルキル基を有するク
ロロシラン系界面活性剤が用いられる。また、本発明の
高分子組成物に超親水性を付与する場合には、末端ビニ
ル基を持つアルキル基を有するクロロシラン系界面活性
剤を用い化学吸着膜形成後、例えば酸素雰囲気中で例え
ば電子線、X線、γ線、紫外線等の放射線照射により末
端を水酸基に変えるか、あるいはテトラクロロシランを
用い化学吸着膜を形成した後、水と反応させクロロシリ
ル結合をシラノール結合に変える。[0013] When imparting water repellency, oil repellency, stain resistance or slipperiness to the polymer composition by the method of the present invention, the material constituting the chemical adsorption film is a chlorosilane interface having a fluorinated alkyl group. An activator is used. In addition, when imparting superhydrophilicity to the polymer composition of the present invention, a chlorosilane surfactant having an alkyl group with a terminal vinyl group is used to form a chemically adsorbed film, and then, for example, an electron beam is applied to the polymer composition in an oxygen atmosphere. The terminals are changed into hydroxyl groups by irradiation with radiation such as X-rays, γ-rays, and ultraviolet rays, or after a chemically adsorbed film is formed using tetrachlorosilane, the chlorosilyl bonds are changed into silanol bonds by reacting with water.
【0014】フッ化アルキル基を有するクロロシラン系
界面活性剤としては、例えばCF3 (CF2 )7
(CH2 )2 SiCl3 ,CF3 CH2 O(
CH2 )15SiCl3 ,CF3 (CH2 )2
Si(CH3 )2 (CH2 )15SiCl3
,F(CF2 )4 (CH2 )2 Si(CH3
)2 (CH2 )9 SiCl3 ,F(CF2 )
8 (CH2 )2 Si(CH3 )2 (CH2
)9 SiCl3 ,CF3 COO(CH2 )15
SiCl3 ,CF3 (CF2 )5 (CH2 )
2 SiCl3 などのようなトリクロロシラン系界面
活性剤をはじめ、例えばCF3 (CF2 )7 (C
H2 )2 SiCln (CH3 )3−n ,CF
3 (CF2 )7 (CH2 )2 SiCln (
C2 H5 )3−n ,CF3 CH2O(CH2
)15SiCln (CH3 )3−n ,CF3 C
H2O(CH2 )15SiCln (C2 H5 )
3−n ,CF3 (CH2 )2 Si(CH3 )
2 (CH2 )15SiCln (CH3 )3−n
,F(CF2 )4 (CH2 )2 Si(CH3
)2 (CH2 )9 SiCln (C2 H5
)3−n ,F(CF2 )8 (CH2 )2 Si
(CH3 )2 (CH2 )9 SiCln (CH
3 )3−n ,CF3 COO(CH2 )15Si
Cln (CH3 )3−n ,CF3 (CF2 )
5 (CH2 )2 SiCln (CH3 )3−n
(但し式中のnは何れも1又は2)等のような低級ア
ルキル基置換のモノクロロシラン系あるいはジクロロシ
ラン系界面活性剤が挙げられる。これらの中でも特にト
リクロロシラン系界面活性剤の親水性基と結合したクロ
ロシリル結合以外のクロロシリル結合が、隣合うクロロ
シラン基とシロキサン結合で分子間結合を形成するため
、より強固な化学吸着膜となり好ましい。また、CF3
(CF2 )n CH2 CH2 SiCl3 (但
し式中のnは整数であり、3〜25程度が最も扱いやす
い)が、溶剤溶解性、化学吸着性と撥水・防汚性等の機
能性との釣合が取れているため好ましい。さらにまた、
フッ化アルキル鎖部分にエチレン基やアセチレン基を組
み込んでおけば、化学吸着膜形成後5メガラド程度の電
子線照射で架橋できるのでさらに化学吸着膜自体の硬度
を向上させることも可能である。Examples of the chlorosilane surfactant having a fluorinated alkyl group include CF3 (CF2)7
(CH2)2SiCl3,CF3CH2O(
CH2)15SiCl3,CF3(CH2)2
Si(CH3)2(CH2)15SiCl3
,F(CF2)4(CH2)2Si(CH3
)2 (CH2)9 SiCl3,F(CF2)
8 (CH2)2 Si(CH3)2 (CH2
)9 SiCl3, CF3 COO(CH2)15
SiCl3, CF3 (CF2)5 (CH2)
2 SiCl3, etc., as well as trichlorosilane surfactants such as CF3 (CF2)7 (C
H2)2SiCln(CH3)3-n,CF
3 (CF2)7 (CH2)2 SiCln (
C2 H5 )3-n , CF3 CH2O(CH2
)15SiCln (CH3)3-n, CF3C
H2O(CH2)15SiCln(C2H5)
3-n, CF3(CH2)2Si(CH3)
2 (CH2)15SiCln (CH3)3-n
,F(CF2)4(CH2)2Si(CH3
)2 (CH2 )9 SiCln (C2 H5
)3-n,F(CF2)8(CH2)2Si
(CH3 )2 (CH2 )9 SiCln (CH
3)3-n,CF3COO(CH2)15Si
Cln (CH3)3-n, CF3 (CF2)
5 (CH2)2 SiCln (CH3)3-n
Examples include lower alkyl group-substituted monochlorosilane or dichlorosilane surfactants such as (where n in the formula is either 1 or 2). Among these, chlorosilyl bonds other than the chlorosilyl bond bonded to the hydrophilic group of the trichlorosilane surfactant form intermolecular bonds with adjacent chlorosilane groups and siloxane bonds, resulting in a stronger chemisorption film, which is preferable. Also, CF3
(CF2)n CH2 CH2 SiCl3 (However, n in the formula is an integer, and 3 to 25 is easiest to handle) is a balance between solvent solubility, chemical adsorption, and functionality such as water repellency and stain resistance. This is preferable because the ratio is well matched. Furthermore,
If an ethylene group or an acetylene group is incorporated into the fluorinated alkyl chain portion, it is possible to further improve the hardness of the chemisorption film itself since it can be crosslinked by electron beam irradiation of about 5 megarads after formation of the chemisorption film.
【0015】アルキル基を有するクロロシラン系界面活
性剤としては、例えば、CH3 (CH2 )18Si
Cl3 ,CH3 (CH2 )15SiCl3 ,C
H3 (CH2 )10SiCl3 ,CH3 (CH
2 )25SiCl3 等のようなトリクロルシラン系
界面活性剤をはじめ、例えば,CH3 (CH2 )1
8SiCln (CH3 )3−n ,CH3 (CH
2 )18SiCln (C2 H5 )3−n ,C
H3 (CH2 )15SiCln (CH3 )3−
n ,CH3 (CH2 )10SiCln (CH3
)3−n ,CH3 (CH2 )25SiCln
(C2 H5 )3−n 等のような低級アルキル基置
換のモノクロルシラン系あるいはジクロルシラン系界面
活性剤が挙げられる。この中でもCH3 (CH2 )
n SiCl3 (但し式中のnは整数であり、3〜2
5程度が最も扱いやすい)が、溶剤溶解性の点で好まし
い。また、例えばCH2 =CH(CH2 )nSiC
l3 (但し式中のnは整数であり、3〜25程度が最
も扱いやすい)等のように、クロロシラン系界面活性剤
のアルキル基の末端にビニル基を有していてもよい。こ
のような炭化水素基を含むクロロシラン系界面活性剤は
、前述したように例えば酸素雰囲気中で例えば電子線、
X線、γ線、紫外線等の放射線照射により末端を水酸基
に変えることができ、高分子組成物を親水性化すること
ができる。本発明に供されるクロロシラン系界面活性剤
は、上述に例示したように直鎖状だけではなく、フッ化
アルキル基又は炭化水素基が分岐した形状でも、又は末
端の珪素にフッ化アルキル基もしくは炭化水素基が置換
した形状(すなわちR、R1 、R2 、R3 をフッ
化アルキル基又は炭化水素基として一般式R2 SiC
l2 、R3 SiCl、R1 R2 SiCl2 も
しくはR1 R2 R3 SiCl等)であってもよい
が、吸着密度を高めるためには一般には直鎖状が好まし
い。さらに、例えば、SiCl4 、SiHCl3 、
SiH2Cl2 、Cl−(SiCl2 O)n −S
iCl3 (但し式中nは自然数)、SiClm (C
H3)4−m 、SiClm (C2 H5 )4−m
(但し式中mは1〜3の整数)、HSiCll (C
H3 )3−l 、HSiCll (C2 H5 )3
−l (但し式中lは1又は2)等のようなクロロシリ
ル結合を複数個含む物質を化学吸着させた後水と反応す
ると、表面のクロロシリル結合が親水性のシラノール結
合に変わり、高分子組成物が親水性となる。なお、この
クロロシリル基を複数個含む物質の中でも、テトラクロ
ロシラン(SiCl4 )は反応性が高く分子量も小さ
いためより高密度にシラノール結合を付与できるため好
ましい。このようにして親水性化すると、高分子を含む
基体の酸化処理よりも親水性をより高くすることができ
る。このように超親水性にした高分子組成物はそのまま
だけでも使用できるが、この上に例えばフッ化アルキル
基を含むクロロシラン系界面活性剤を化学吸着でき、こ
のようにして得た化学吸着膜はより高密度化されるため
、溌水・溌油性及び防汚性等の機能がより高められる。As the chlorosilane surfactant having an alkyl group, for example, CH3 (CH2)18Si
Cl3,CH3(CH2)15SiCl3,C
H3 (CH2 )10SiCl3 ,CH3 (CH
2) Including trichlorosilane surfactants such as 25SiCl3, for example, CH3 (CH2)1
8SiCln (CH3)3-n, CH3 (CH
2) 18SiCln (C2H5)3-n,C
H3 (CH2)15SiCln (CH3)3-
n, CH3 (CH2)10SiCln (CH3
)3-n, CH3 (CH2)25SiCln
Examples include lower alkyl group-substituted monochlorosilane or dichlorosilane surfactants such as (C2H5)3-n. Among these, CH3 (CH2)
n SiCl3 (however, n in the formula is an integer, 3 to 2
5 is the easiest to handle) is preferable from the viewpoint of solvent solubility. Also, for example, CH2=CH(CH2)nSiC
The alkyl group of the chlorosilane surfactant may have a vinyl group at the end, as in 13 (where n in the formula is an integer and is most easily handled from about 3 to 25). As mentioned above, such a chlorosilane surfactant containing a hydrocarbon group can be treated with, for example, an electron beam or an electron beam in an oxygen atmosphere.
By irradiating with radiation such as X-rays, γ-rays, and ultraviolet rays, the terminals can be changed into hydroxyl groups, thereby making the polymer composition hydrophilic. The chlorosilane surfactant used in the present invention is not only linear as exemplified above, but also has a branched form with a fluorinated alkyl group or a hydrocarbon group, or a fluorinated alkyl group or a hydrocarbon group on the terminal silicon. A form in which a hydrocarbon group is substituted (i.e., a form with the general formula R2 SiC where R, R1, R2, and R3 are fluorinated alkyl groups or hydrocarbon groups)
12 , R3 SiCl, R1 R2 SiCl2 or R1 R2 R3 SiCl, etc.), but in order to increase the adsorption density, a linear shape is generally preferred. Furthermore, for example, SiCl4, SiHCl3,
SiH2Cl2, Cl-(SiCl2O)n-S
iCl3 (where n is a natural number in the formula), SiClm (C
H3)4-m, SiClm(C2H5)4-m
(However, in the formula, m is an integer of 1 to 3), HSiCll (C
H3)3-l, HSiCll (C2H5)3
-l (where l is 1 or 2 in the formula), etc., when a substance containing multiple chlorosilyl bonds is chemically adsorbed and then reacted with water, the chlorosilyl bonds on the surface change to hydrophilic silanol bonds, and the polymer composition Things become hydrophilic. Among these substances containing a plurality of chlorosilyl groups, tetrachlorosilane (SiCl4) is preferable because it has high reactivity and a small molecular weight, so that silanol bonds can be provided at a higher density. By making the substrate hydrophilic in this way, the hydrophilicity can be made higher than by oxidation treatment of a substrate containing a polymer. Although the polymer composition made superhydrophilic in this way can be used as it is, for example, a chlorosilane surfactant containing a fluorinated alkyl group can be chemically adsorbed onto it, and the chemically adsorbed film obtained in this way can be Since the density is higher, functions such as water repellency, oil repellency, and stain resistance are further enhanced.
【0016】本発明の高分子組成物の製造方法は、高分
子を含む基体表面を酸化処理して親水性にする工程と、
酸化処理した表面を含フッ素系非水溶液に浸漬して、こ
の表面にクロロシラン系界面活性剤を化学吸着させ、シ
ロキサン結合を有する化学吸着膜を形成する工程を含む
。高分子を含む基体を酸化処理する方法としては、例え
ば酸素プラズマ処理、コロナ処理、もしくは濃硫酸と重
クロム酸カリウムの混合溶液に浸漬する方法(クロム混
酸液処理)等通常の手法が適用される。The method for producing a polymer composition of the present invention includes the steps of oxidizing the surface of a substrate containing a polymer to make it hydrophilic;
The method includes a step of immersing the oxidized surface in a fluorine-containing non-aqueous solution to chemically adsorb a chlorosilane surfactant onto the surface to form a chemically adsorbed film having siloxane bonds. As a method for oxidizing a substrate containing a polymer, conventional methods such as oxygen plasma treatment, corona treatment, or immersion in a mixed solution of concentrated sulfuric acid and potassium dichromate (chromium mixed acid solution treatment) are applied. .
【0017】本発明の高分子組成物の製造方法に用いる
含フッ素系非水溶液は、化学吸着膜を形成する基体に含
まれる高分子を溶解せず、かつクロロシラン系界面活性
剤と反応する活性水素を持たない溶液であればよい。そ
の例としてフルオロアルキル基を有する三級アミンある
いはフルオロアルキル基を有する環状エーテルが好まし
い。三級アミンの例としてはN(Cn F2n+1)3
(n=2〜10、フルオロアルキル基は直鎖状でも、
分枝状でもよい)、環状エーテルの例としては下記(化
1)の構造を有するものがあげられる。The fluorine-containing nonaqueous solution used in the method for producing the polymer composition of the present invention does not dissolve the polymer contained in the substrate forming the chemisorption film, and contains active hydrogen that reacts with the chlorosilane surfactant. Any solution that does not have . For example, a tertiary amine having a fluoroalkyl group or a cyclic ether having a fluoroalkyl group is preferable. Examples of tertiary amines include N(Cn F2n+1)3
(n = 2 to 10, even if the fluoroalkyl group is linear,
Examples of cyclic ethers include those having the structure shown below (chemical formula 1).
【0018】[0018]
【化1】[Chemical formula 1]
【0019】また、本発明の高分子組成物表面に形成さ
れる化学吸着膜は、単分子化学吸着膜一層だけでも充分
に機能が発揮される。単分子化学吸着膜を一層だけ形成
するには、クロロシラン系界面活性剤又はクロロシリル
基を複数個含む物質を化学吸着した後、水分に接触させ
ないで非水系の溶剤で洗浄するだけでよく、特別な工程
を必要としない。また、化学吸着膜は単分子膜が累積し
ていても良いことは勿論である。このように、化学吸着
膜が累積膜を形成すると、付与された機能性を示す基が
配向し、密度も向上するためより高機能を発揮できる。Further, the chemically adsorbed film formed on the surface of the polymer composition of the present invention can sufficiently exhibit its function even with only one layer of monomolecular chemically adsorbed film. To form only one layer of monomolecular chemisorption film, all that is required is to chemically adsorb a chlorosilane surfactant or a substance containing multiple chlorosilyl groups and then wash it with a non-aqueous solvent without contacting it with water. No process required. Furthermore, it goes without saying that the chemically adsorbed film may be an accumulation of monomolecular films. In this way, when the chemisorption film forms a cumulative film, the groups exhibiting the imparted functionality are oriented and the density is also improved, so that higher functionality can be exhibited.
【0020】次に具体的実施例を用いて本発明を説明す
る。
実施例1
高分子を含む基体として縦横各5cmで厚み0.3cm
のポリカーボネート基板を用い、UVドライ・ストリッ
パー(UV−1、サムコインターナショナル製)中で酸
素流量1l/minの条件で酸素プラズマ処理を10分
間施して表面を酸化処理した後、フッ化アルキル基を含
むクロロシラン系界面活性剤としてヘプタデカフルオロ
デシルトリクロロシランを用い、濃度10−2mol
/lのトリ(n−ノナフルオロブチル)アミン溶液に窒
素雰囲気下室温で60分間浸漬し、引き続いて未反応の
ヘプタデカフルオロデシルトリクロロシランをトリ(n
−ノナフルオロブチル)アミン溶液で洗浄して、しかる
後純水で洗浄し、フッ化アルキル基を含むシロキサン結
合を介した化学吸着単分子膜をポリカーボネート基板表
面に形成した。Next, the present invention will be explained using specific examples. Example 1 A substrate containing a polymer, 5 cm in length and width and 0.3 cm in thickness.
Using a polycarbonate substrate of Heptadecafluorodecyltrichlorosilane was used as the chlorosilane surfactant, and the concentration was 10-2 mol.
/l of tri(n-nonafluorobutyl)amine solution for 60 minutes at room temperature under a nitrogen atmosphere.
-nonafluorobutyl) amine solution and then with pure water to form a chemically adsorbed monomolecular film via siloxane bonds containing fluorinated alkyl groups on the surface of the polycarbonate substrate.
【0021】実施例2
実施例1のポリカーボネート基板をアクリル樹脂基板に
変えて、実施例1と同様に実験をした。
実施例3
実施例1のポリカーボネート基板をポリプロピレン基板
に変えて、実施例1と同様の実験をした。Example 2 An experiment was conducted in the same manner as in Example 1, except that the polycarbonate substrate in Example 1 was replaced with an acrylic resin substrate. Example 3 An experiment similar to Example 1 was conducted except that the polycarbonate substrate in Example 1 was replaced with a polypropylene substrate.
【0022】実施例4
実施例1のポリカーボネート基板をABS樹脂基板に変
えて、実施例1と同様の実験をした。
実施例5
実施例1のポリカーボネート基板をPET基板をに変え
て、実施例1と同様の実験をした。Example 4 The same experiment as in Example 1 was conducted except that the polycarbonate substrate in Example 1 was replaced with an ABS resin substrate. Example 5 The same experiment as in Example 1 was conducted except that the polycarbonate substrate in Example 1 was replaced with a PET substrate.
【0023】実施例6
実施例1のトリ(n−ノナフルオロブチル)アミンをト
リ(ノナフルオロイソブチル)アミンに変えて、実施例
1と同様の実験をした。
実施例7
実施例2のトリ(n−ノナフルオロブチル)アミンをト
リ(ノナフルオロイソブチル)アミンに変えて、実施例
1と同様の実験をした。Example 6 The same experiment as in Example 1 was conducted except that tri(n-nonafluorobutyl)amine in Example 1 was replaced with tri(nonafluoroisobutyl)amine. Example 7 An experiment similar to Example 1 was conducted except that tri(n-nonafluorobutyl)amine in Example 2 was replaced with tri(nonafluoroisobutyl)amine.
【0024】実施例8
実施例3のトリ(n−ノナフルオロブチル)アミンをト
リ(ノナフルオロイソブチル)アミンに変えて、実施例
1と同様の実験をした。
実施例9
実施例4のトリ(n−ノナフルオロブチル)アミンをト
リ(ノナフルオロイソブチル)アミンに変えて、実施例
1と同様の実験をした。Example 8 An experiment similar to Example 1 was conducted except that tri(n-nonafluorobutyl)amine in Example 3 was replaced with tri(nonafluoroisobutyl)amine. Example 9 An experiment similar to Example 1 was conducted except that tri(n-nonafluorobutyl)amine in Example 4 was replaced with tri(nonafluoroisobutyl)amine.
【0025】実施例10
実施例5のトリ(n−ノナフルオロブチル)アミンをト
リ(ノナフルオロイソブチル)アミンに変えて、実施例
1と同様の実験をした。
実施例11
実施例1のトリ(n−ノナフルオロブチル)アミンを2
−(n−ノナフルオロブチル)パーフルオロフランに変
えて、実施例1と同様の実験をした。Example 10 An experiment similar to Example 1 was conducted except that tri(n-nonafluorobutyl)amine in Example 5 was replaced with tri(nonafluoroisobutyl)amine. Example 11 Tri(n-nonafluorobutyl)amine of Example 1 was converted into 2
An experiment similar to Example 1 was conducted except that -(n-nonafluorobutyl)perfluorofuran was used.
【0026】実施例12
実施例2のトリ(n−ノナフルオロブチル)アミンを2
−(n−ノナフルオロブチル)パーフルオロフランに変
えて、実施例1と同様の実験をした。
実施例13
実施例3のトリ(n−ノナフルオロブチル)アミンを2
−(n−ノナフルオロブチル)パーフルオロフランに変
えて、実施例1と同様の実験をした。Example 12 The tri(n-nonafluorobutyl)amine of Example 2 was
An experiment similar to Example 1 was conducted except that -(n-nonafluorobutyl)perfluorofuran was used. Example 13 The tri(n-nonafluorobutyl)amine of Example 3 was
An experiment similar to Example 1 was conducted except that -(n-nonafluorobutyl)perfluorofuran was used.
【0027】実施例14
実施例4のトリ(n−ノナフルオロブチル)アミンを2
−(n−ノナフルオロブチル)パーフルオロフランに変
えて、実施例1と同様の実験をした。
実施例15
実施例5のトリ(n−ノナフルオロブチル)アミンを2
−(n−ノナフルオロブチル)パーフルオロフランに変
えて、実施例1と同様の実験をした。Example 14 The tri(n-nonafluorobutyl)amine of Example 4 was
An experiment similar to Example 1 was conducted except that -(n-nonafluorobutyl)perfluorofuran was used. Example 15 The tri(n-nonafluorobutyl)amine of Example 5 was
An experiment similar to Example 1 was conducted except that -(n-nonafluorobutyl)perfluorofuran was used.
【0028】実施例16
実施例1のポリカーボネート基板をブタジエン−スチレ
ンゴム基板に変えて、実施例1と同様に実験をした。
実施例17
実施例1のポリカーボネート基板をブチルゴム基板に変
えて、実施例1と同様に実験をした。Example 16 An experiment was conducted in the same manner as in Example 1, except that the polycarbonate substrate in Example 1 was replaced with a butadiene-styrene rubber substrate. Example 17 An experiment was conducted in the same manner as in Example 1 except that the polycarbonate substrate in Example 1 was replaced with a butyl rubber substrate.
【0029】実施例18
実施例1のポリカーボネート基板をニトリルゴム基板に
変えて、実施例1と同様に実験をした。
実施例19
実施例1において、酸化処理する方法を10wt%の重
クロム酸カリを含有する濃硫酸に5分浸漬する方法に変
えて、実施例1と同様に実験をした。Example 18 An experiment was conducted in the same manner as in Example 1 except that the polycarbonate substrate in Example 1 was replaced with a nitrile rubber substrate. Example 19 An experiment was carried out in the same manner as in Example 1, except that the oxidation treatment method was changed to a method of immersion in concentrated sulfuric acid containing 10 wt % potassium dichromate for 5 minutes.
【0030】比較例1
ポリカーボネート基板の表面にシランカップリング剤(
ヘプタデカフルオロデシルトリメトキシシラン)の2w
t%メタノール溶液をスピンコートした後、120℃で
1時間乾燥した。
比較例2
実施例1のポリカーボネート基板を酸化処理せずに、ヘ
プタデカフルオロデシルトリクロロシランの化学吸着単
分子膜を形成した。Comparative Example 1 A silane coupling agent (
2w of heptadecafluorodecyltrimethoxysilane)
After spin-coating a t% methanol solution, it was dried at 120° C. for 1 hour. Comparative Example 2 A chemically adsorbed monomolecular film of heptadecafluorodecyltrichlorosilane was formed on the polycarbonate substrate of Example 1 without oxidation treatment.
【0031】比較例3
実施例1のポリカーボネート基板の表面にポリテトラフ
ルオロエチレンの懸濁液をスプレーコートし、120℃
で1時間加熱乾燥した。実施例1〜19および比較例1
〜2の試料の超純水および油(日清サラダ油)に対する
接触角を調べた。接触角の測定は化学吸着膜あるいはコ
ーティング膜を形成した直後と、および水でぬらした布
で表面を10000回摩擦した後と両方行った。その結
果を表1に示す。Comparative Example 3 A suspension of polytetrafluoroethylene was spray-coated on the surface of the polycarbonate substrate of Example 1, and then heated at 120°C.
It was heated and dried for 1 hour. Examples 1 to 19 and Comparative Example 1
The contact angles of samples ~2 to ultrapure water and oil (Nissin Salad Oil) were investigated. Contact angle measurements were made both immediately after forming the chemisorbed film or coating and after rubbing the surface 10,000 times with a cloth moistened with water. The results are shown in Table 1.
【0032】[0032]
【表1】[Table 1]
【0033】(表1)から明らかなように、本発明の方
法で得られる高分子組成物では表面を水を含んだ布で繰
り返し擦って洗浄した後でも、撥水・撥油性あるいは親
水性を保持していたが、比較例1では撥水・撥油性がな
くなっていた。また、高分子組成物の表面を酸化処理し
なかった比較例2の試料では、シロキサン結合を有する
化学吸着膜を形成することができなかった。[0033] As is clear from Table 1, the polymer composition obtained by the method of the present invention retains water- and oil-repellency or hydrophilicity even after washing the surface by repeatedly rubbing it with a water-soaked cloth. However, in Comparative Example 1, water and oil repellency were lost. Furthermore, in the sample of Comparative Example 2 in which the surface of the polymer composition was not subjected to oxidation treatment, a chemisorption film having siloxane bonds could not be formed.
【0034】本発明の方法で得られる高分子組成物で、
表面にフッ化アルキル基を含有する化学吸着単分子膜を
形成したものは防汚性が優れていた。摩擦試験後、実施
例1の試料をサラダ油に浸漬し、ティッシュペーパーで
拭き取ると、油分がきれいにふきとれたが、比較例の1
の試料では、ティッシュペーパーで数回拭き取った後で
も、表面に油膜ができべとついていた。[0034] In the polymer composition obtained by the method of the present invention,
The material on which a chemically adsorbed monomolecular film containing fluorinated alkyl groups was formed had excellent antifouling properties. After the friction test, when the sample of Example 1 was immersed in salad oil and wiped with tissue paper, the oil was completely wiped off, but the sample of Comparative Example 1
The sample remained sticky with an oil film on the surface even after wiping it several times with tissue paper.
【0035】本発明の方法で得られる高分子組成物では
、光学材料としても利用できる。実施例1のポリカーボ
ネート基板の可視光に対する透過率は92%で、化学吸
着単分子膜を形成する前と変化なかったが、比較例3の
ポリテトラフルオロエチレンをコーティングした試料で
は、透過率が50%以下に低下しかつ、すり硝子のよう
に透明度が悪くなっていた。The polymer composition obtained by the method of the present invention can also be used as an optical material. The visible light transmittance of the polycarbonate substrate of Example 1 was 92%, which was unchanged from before forming the chemically adsorbed monomolecular film, but in the sample coated with polytetrafluoroethylene of Comparative Example 3, the transmittance was 50%. % or less, and the transparency had deteriorated like that of frosted glass.
【0036】なお、上記実施例で述べた化学吸着膜は何
れも単分子膜一層だけの場合であるが、化学吸着単分子
膜を累積した高分子組成物でも、未反応のクロロシラン
系界面活性剤を洗浄せずに形成した化学吸着膜でも、そ
の機能は何等変わるところがなかった。さらに、上記実
施例では何れも高分子を含む基体として高分子単独基板
を用いた例を示したが、例えば充填剤、可塑剤又は着色
剤等を含有した高分子であっても、高分子組成物に付与
された機能には何等変化がなかった。Note that the chemically adsorbed films described in the above examples are cases where only a single layer of monomolecular film is used, but even if the polymer composition has an accumulation of chemically adsorbed monomolecular films, unreacted chlorosilane surfactant Even when the chemically adsorbed film was formed without washing, there was no change in its functionality. Furthermore, in each of the above examples, an example was shown in which a single polymer substrate was used as a substrate containing a polymer, but even if the polymer contains a filler, a plasticizer, a coloring agent, etc., the polymer composition There was no change in the function given to the object.
【0037】以上説明した通り、本発明の実施例によれ
ば、高分子を含む基体表面を酸化処理して例えば水酸基
等の親水性基を形成した後、この基体表面にクロロシラ
ン系界面活性剤を化学吸着させ、シロキサン結合を有す
る化学吸着膜を形成するので、繰り返し単位として例え
ば水酸基等の親水性の活性水素を持たない高分子であっ
ても、化学吸着膜を容易に形成することができる。また
、高分子を含む基体をクロロシラン系界面活性剤を含有
する含フッ素系非水溶液に浸漬するだけで、最密充填さ
れた化学吸着膜が形成できる。その結果、形成された化
学吸着膜は、クロロシラン系界面活性剤の機能に応じて
例えば高特性の撥水・撥油・防汚性、又は超親水性など
の機能を発揮する。As explained above, according to the embodiment of the present invention, after the surface of a substrate containing a polymer is oxidized to form a hydrophilic group such as a hydroxyl group, a chlorosilane surfactant is applied to the surface of the substrate. Since the polymer is chemically adsorbed to form a chemically adsorbed film having siloxane bonds, a chemically adsorbed film can be easily formed even if the polymer does not have a hydrophilic active hydrogen such as a hydroxyl group as a repeating unit. Moreover, a chemisorption film with close packing can be formed simply by immersing a substrate containing a polymer in a fluorine-containing non-aqueous solution containing a chlorosilane surfactant. As a result, the formed chemisorption film exhibits functions such as high water repellency, oil repellency, antifouling properties, or superhydrophilicity depending on the function of the chlorosilane surfactant.
【0038】以上のように本発明の方法で得られる高分
子組成物は、表面にシロキサン結合を有する化学吸着膜
が設けられているので、従来のものに比べて、繰り返し
洗浄に対する耐久性が優れ、化学吸着膜がフッ化アルキ
ル基を含む場合には高特性の撥水・撥油・防汚性をしめ
す。また、本発明の高分子組成物の製造方法では、高分
子組成物の表面をあらかじめ酸化処理することにより、
簡単に前記高分子組成物表面にクロロシラン系界面活性
剤を化学吸着させ、シロキサン結合を有する化学吸着膜
を形成することができる。このように本発明は工業的価
値の大なるものである。As described above, the polymer composition obtained by the method of the present invention has a chemically adsorbed film having siloxane bonds on the surface, so it has excellent durability against repeated washing compared to conventional compositions. When the chemisorption film contains a fluorinated alkyl group, it exhibits high water repellency, oil repellency, and stain resistance. In addition, in the method for producing a polymer composition of the present invention, by oxidizing the surface of the polymer composition in advance,
A chlorosilane surfactant can be easily chemically adsorbed onto the surface of the polymer composition to form a chemically adsorbed film having siloxane bonds. As described above, the present invention has great industrial value.
【0039】[0039]
【発明の効果】以上の通り本発明方法によれば、基材の
表面にシロキサン結合を介して化学吸着膜を設けるので
、従来のものに比べて耐久性に優れた高機能性化学吸着
膜を製造することができる。また、クロロシラン系界面
活性剤と反応する活性水素を持たない含フッ素系非水溶
液を溶媒として用いるので、ピンホールのない高密度な
高配向の単分子膜を製造することができる。[Effects of the Invention] As described above, according to the method of the present invention, a chemically adsorbed film is provided on the surface of a base material through siloxane bonds, so a highly functional chemically adsorbed film with superior durability compared to conventional methods can be obtained. can be manufactured. Furthermore, since a fluorine-containing nonaqueous solution that does not have active hydrogen that reacts with the chlorosilane surfactant is used as a solvent, a high-density, highly oriented monomolecular film without pinholes can be produced.
【図1】本発明の方法で得られる高分子組成物の一実施
例の断面図FIG. 1: Cross-sectional view of an example of a polymer composition obtained by the method of the present invention
1 高分子を含む基体 2 シロキサン結合 3 化学吸着膜 1 Substrate containing polymer 2 Siloxane bond 3. Chemical adsorption membrane
Claims (4)
法において、クロロシラン系界面活性剤と、前記クロロ
シラン系界面活性剤と反応する活性水素を持たない含フ
ッ素系非水溶液とを少なくとも含む混合溶液を、前記基
材表面に接触させ、前記基材表面にシロキサン結合を有
する化学吸着膜を形成することを特徴とする化学吸着膜
の製造方法。1. A method for producing a chemically adsorbed film on the surface of a substrate, comprising: a mixture comprising at least a chlorosilane surfactant and a fluorine-containing nonaqueous solution that does not have active hydrogen that reacts with the chlorosilane surfactant; A method for producing a chemically adsorbed film, comprising bringing a solution into contact with the surface of the base material to form a chemically adsorbed film having siloxane bonds on the surface of the base material.
しくは環状エーテルの少なくとも一つを含有する請求項
1に記載の化学吸着膜の製造方法。2. The method for producing a chemisorption membrane according to claim 1, wherein the fluorine-containing nonaqueous solution contains at least one of a tertiary amine and a cyclic ether.
基材表面をあらかじめジクロロシラン、トリクロロシラ
ン、またはテトラクロロシランで処理する請求項1に記
載の化学吸着膜の製造方法。[Claim 3] Before the reaction step of forming the chemisorption film,
2. The method for producing a chemisorption film according to claim 1, wherein the surface of the substrate is treated with dichlorosilane, trichlorosilane, or tetrachlorosilane in advance.
項1に記載の化学吸着膜の製造方法。4. The method for producing a chemisorption film according to claim 1, wherein the surface of the base material is made of a polymer compound.
Priority Applications (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3098902A JP2500816B2 (en) | 1991-04-30 | 1991-04-30 | Manufacturing method of chemisorption membrane |
CA 2060294 CA2060294C (en) | 1991-02-06 | 1992-01-29 | Chemically absorbed film and method of manufacturing the same |
KR1019920001610A KR950010641B1 (en) | 1991-02-06 | 1992-02-01 | Ornaments and method of manufacturing the same |
DE69205849T DE69205849T2 (en) | 1991-02-06 | 1992-02-03 | Object with an ornament and a monomolecular film on it. |
EP92101719A EP0498339B1 (en) | 1991-01-28 | 1992-02-03 | Object comprising an ornament and thereon a monomolecular film |
US07/831,486 US5372888A (en) | 1991-02-06 | 1992-02-05 | Chemically adsorbed film and method of manufacturing the same |
US08/511,912 US5500250A (en) | 1991-02-06 | 1995-08-07 | Chemically adsorbed film and method of manufacturing the same |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3098902A JP2500816B2 (en) | 1991-04-30 | 1991-04-30 | Manufacturing method of chemisorption membrane |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH04328136A true JPH04328136A (en) | 1992-11-17 |
JP2500816B2 JP2500816B2 (en) | 1996-05-29 |
Family
ID=14232064
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3098902A Expired - Fee Related JP2500816B2 (en) | 1991-01-28 | 1991-04-30 | Manufacturing method of chemisorption membrane |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2500816B2 (en) |
Cited By (2)
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---|---|---|---|---|
JP2016500398A (en) * | 2012-12-18 | 2016-01-12 | ランクセス・ブチル・ピーティーイー・リミテッド | Butyl rubber with high impermeability |
CN116517526A (en) * | 2023-04-12 | 2023-08-01 | 安徽中核桐源科技有限公司 | Radioisotope tracer and preparation method thereof |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1386951B1 (en) | 2001-04-02 | 2007-08-15 | Matsushita Electric Industrial Co., Ltd. | Water-repellent film and method for preparing the same, and ink-jet head and ink-jet type recording device using the same |
JP2011111527A (en) | 2009-11-26 | 2011-06-09 | Fujifilm Corp | Aqueous ink composition and image-forming method |
JP5666498B2 (en) | 2012-03-22 | 2015-02-12 | 富士フイルム株式会社 | Ink composition, ink set, and image forming method |
JP2015067802A (en) | 2013-09-30 | 2015-04-13 | 富士フイルム株式会社 | Ink jet recording ink, ink set, image forming method and maintenance method |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02248480A (en) * | 1989-03-22 | 1990-10-04 | Asahi Glass Co Ltd | Transparent substrate material with water-repellent and antistaining properties, and structure equipped therewith |
-
1991
- 1991-04-30 JP JP3098902A patent/JP2500816B2/en not_active Expired - Fee Related
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02248480A (en) * | 1989-03-22 | 1990-10-04 | Asahi Glass Co Ltd | Transparent substrate material with water-repellent and antistaining properties, and structure equipped therewith |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2016500398A (en) * | 2012-12-18 | 2016-01-12 | ランクセス・ブチル・ピーティーイー・リミテッド | Butyl rubber with high impermeability |
CN116517526A (en) * | 2023-04-12 | 2023-08-01 | 安徽中核桐源科技有限公司 | Radioisotope tracer and preparation method thereof |
Also Published As
Publication number | Publication date |
---|---|
JP2500816B2 (en) | 1996-05-29 |
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