JPH04300952A - Thermosetting resin composition and prepreg and copper-clad laminated board produced by using the same - Google Patents
Thermosetting resin composition and prepreg and copper-clad laminated board produced by using the sameInfo
- Publication number
- JPH04300952A JPH04300952A JP13366091A JP13366091A JPH04300952A JP H04300952 A JPH04300952 A JP H04300952A JP 13366091 A JP13366091 A JP 13366091A JP 13366091 A JP13366091 A JP 13366091A JP H04300952 A JPH04300952 A JP H04300952A
- Authority
- JP
- Japan
- Prior art keywords
- formula
- copper
- cyanate ester
- group
- resin composition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000011342 resin composition Substances 0.000 title claims description 10
- 229920001187 thermosetting polymer Polymers 0.000 title claims description 9
- 229920005989 resin Polymers 0.000 claims abstract description 40
- 239000011347 resin Substances 0.000 claims abstract description 40
- 239000004643 cyanate ester Substances 0.000 claims abstract description 26
- 229920000642 polymer Polymers 0.000 claims abstract description 22
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims abstract description 17
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims abstract description 14
- 125000003118 aryl group Chemical group 0.000 claims abstract description 10
- 125000001424 substituent group Chemical group 0.000 claims abstract description 7
- 239000000835 fiber Substances 0.000 claims description 13
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 10
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 10
- 239000011889 copper foil Substances 0.000 claims description 8
- 239000004745 nonwoven fabric Substances 0.000 claims description 6
- 239000002759 woven fabric Substances 0.000 claims description 6
- 239000012784 inorganic fiber Substances 0.000 claims description 5
- 238000010030 laminating Methods 0.000 claims description 2
- JESXATFQYMPTNL-UHFFFAOYSA-N 2-ethenylphenol Chemical compound OC1=CC=CC=C1C=C JESXATFQYMPTNL-UHFFFAOYSA-N 0.000 abstract description 16
- 239000000463 material Substances 0.000 abstract description 16
- 150000001875 compounds Chemical class 0.000 abstract description 7
- 239000000203 mixture Substances 0.000 abstract description 4
- 238000007747 plating Methods 0.000 abstract description 4
- 238000010521 absorption reaction Methods 0.000 abstract description 3
- 238000004891 communication Methods 0.000 abstract description 3
- 238000013329 compounding Methods 0.000 abstract 1
- LMBFAGIMSUYTBN-MPZNNTNKSA-N teixobactin Chemical compound C([C@H](C(=O)N[C@@H]([C@@H](C)CC)C(=O)N[C@@H](CO)C(=O)N[C@H](CCC(N)=O)C(=O)N[C@H]([C@@H](C)CC)C(=O)N[C@@H]([C@@H](C)CC)C(=O)N[C@@H](CO)C(=O)N[C@H]1C(N[C@@H](C)C(=O)N[C@@H](C[C@@H]2NC(=N)NC2)C(=O)N[C@H](C(=O)O[C@H]1C)[C@@H](C)CC)=O)NC)C1=CC=CC=C1 LMBFAGIMSUYTBN-MPZNNTNKSA-N 0.000 abstract 1
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 18
- 239000004744 fabric Substances 0.000 description 18
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 15
- 239000011521 glass Substances 0.000 description 12
- 238000000465 moulding Methods 0.000 description 11
- 238000010438 heat treatment Methods 0.000 description 10
- 239000000126 substance Substances 0.000 description 10
- 239000003063 flame retardant Substances 0.000 description 8
- 239000002966 varnish Substances 0.000 description 8
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 7
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 7
- 239000002585 base Substances 0.000 description 7
- 238000000034 method Methods 0.000 description 7
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 6
- 239000007809 chemical reaction catalyst Substances 0.000 description 6
- 238000001035 drying Methods 0.000 description 5
- 238000002156 mixing Methods 0.000 description 5
- VEORPZCZECFIRK-UHFFFAOYSA-N 3,3',5,5'-tetrabromobisphenol A Chemical compound C=1C(Br)=C(O)C(Br)=CC=1C(C)(C)C1=CC(Br)=C(O)C(Br)=C1 VEORPZCZECFIRK-UHFFFAOYSA-N 0.000 description 4
- 229920001577 copolymer Polymers 0.000 description 4
- 239000003960 organic solvent Substances 0.000 description 4
- -1 polytetrafluoroethylene Polymers 0.000 description 4
- 235000012239 silicon dioxide Nutrition 0.000 description 4
- YCIHPQHVWDULOY-FMZCEJRJSA-N (4s,4as,5as,6s,12ar)-4-(dimethylamino)-1,6,10,11,12a-pentahydroxy-6-methyl-3,12-dioxo-4,4a,5,5a-tetrahydrotetracene-2-carboxamide;hydrochloride Chemical compound Cl.C1=CC=C2[C@](O)(C)[C@H]3C[C@H]4[C@H](N(C)C)C(=O)C(C(N)=O)=C(O)[C@@]4(O)C(=O)C3=C(O)C2=C1O YCIHPQHVWDULOY-FMZCEJRJSA-N 0.000 description 3
- VPEBIPGRUPBXBZ-UHFFFAOYSA-N 2-bromo-3-ethenylphenol Chemical compound OC1=CC=CC(C=C)=C1Br VPEBIPGRUPBXBZ-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- 239000004721 Polyphenylene oxide Substances 0.000 description 3
- 239000006087 Silane Coupling Agent Substances 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 125000002723 alicyclic group Chemical group 0.000 description 3
- 239000004760 aramid Substances 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- 229910017052 cobalt Inorganic materials 0.000 description 3
- 239000010941 cobalt Substances 0.000 description 3
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 3
- 229910052681 coesite Inorganic materials 0.000 description 3
- 229910052906 cristobalite Inorganic materials 0.000 description 3
- 239000003365 glass fiber Substances 0.000 description 3
- 125000005843 halogen group Chemical group 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 150000007524 organic acids Chemical class 0.000 description 3
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 description 3
- 229920006380 polyphenylene oxide Polymers 0.000 description 3
- 239000000377 silicon dioxide Substances 0.000 description 3
- 238000004513 sizing Methods 0.000 description 3
- 229910000679 solder Inorganic materials 0.000 description 3
- 229910052682 stishovite Inorganic materials 0.000 description 3
- 229910052905 tridymite Inorganic materials 0.000 description 3
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 2
- 239000005062 Polybutadiene Substances 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Natural products C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- 230000005856 abnormality Effects 0.000 description 2
- 125000000217 alkyl group Chemical group 0.000 description 2
- 229920006231 aramid fiber Polymers 0.000 description 2
- 229920003235 aromatic polyamide Polymers 0.000 description 2
- HUMNYLRZRPPJDN-UHFFFAOYSA-N benzaldehyde Chemical compound O=CC1=CC=CC=C1 HUMNYLRZRPPJDN-UHFFFAOYSA-N 0.000 description 2
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 229930003836 cresol Natural products 0.000 description 2
- 238000004132 cross linking Methods 0.000 description 2
- 238000005553 drilling Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- 150000002576 ketones Chemical class 0.000 description 2
- 239000012046 mixed solvent Substances 0.000 description 2
- GEMHFKXPOCTAIP-UHFFFAOYSA-N n,n-dimethyl-n'-phenylcarbamimidoyl chloride Chemical compound CN(C)C(Cl)=NC1=CC=CC=C1 GEMHFKXPOCTAIP-UHFFFAOYSA-N 0.000 description 2
- 125000004957 naphthylene group Chemical group 0.000 description 2
- 229920003986 novolac Polymers 0.000 description 2
- WWZKQHOCKIZLMA-UHFFFAOYSA-M octanoate Chemical compound CCCCCCCC([O-])=O WWZKQHOCKIZLMA-UHFFFAOYSA-M 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 150000002989 phenols Chemical class 0.000 description 2
- 229920002857 polybutadiene Polymers 0.000 description 2
- 125000003367 polycyclic group Chemical group 0.000 description 2
- 229920000098 polyolefin Polymers 0.000 description 2
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 2
- 239000004810 polytetrafluoroethylene Substances 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- WQGWDDDVZFFDIG-UHFFFAOYSA-N pyrogallol Chemical compound OC1=CC=CC(O)=C1O WQGWDDDVZFFDIG-UHFFFAOYSA-N 0.000 description 2
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 229910052717 sulfur Inorganic materials 0.000 description 2
- 238000004154 testing of material Methods 0.000 description 2
- 230000000007 visual effect Effects 0.000 description 2
- 230000002087 whitening effect Effects 0.000 description 2
- 125000000008 (C1-C10) alkyl group Chemical group 0.000 description 1
- 125000006273 (C1-C3) alkyl group Chemical group 0.000 description 1
- 125000006527 (C1-C5) alkyl group Chemical group 0.000 description 1
- 229920002818 (Hydroxyethyl)methacrylate Polymers 0.000 description 1
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical group C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 description 1
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 1
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- 125000006725 C1-C10 alkenyl group Chemical group 0.000 description 1
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical group [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- 229920000561 Twaron Polymers 0.000 description 1
- IKHGUXGNUITLKF-XPULMUKRSA-N acetaldehyde Chemical compound [14CH]([14CH3])=O IKHGUXGNUITLKF-XPULMUKRSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 150000001299 aldehydes Chemical class 0.000 description 1
- 150000001334 alicyclic compounds Chemical class 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 125000002947 alkylene group Chemical group 0.000 description 1
- 125000000304 alkynyl group Chemical group 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 125000004653 anthracenylene group Chemical group 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 150000001491 aromatic compounds Chemical class 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 125000002529 biphenylenyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3C12)* 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 239000007822 coupling agent Substances 0.000 description 1
- WHHGLZMJPXIBIX-UHFFFAOYSA-N decabromodiphenyl ether Chemical compound BrC1=C(Br)C(Br)=C(Br)C(Br)=C1OC1=C(Br)C(Br)=C(Br)C(Br)=C1Br WHHGLZMJPXIBIX-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000007772 electroless plating Methods 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 230000009477 glass transition Effects 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 230000003301 hydrolyzing effect Effects 0.000 description 1
- 150000002460 imidazoles Chemical class 0.000 description 1
- 239000002648 laminated material Substances 0.000 description 1
- SGLXWMAOOWXVAM-UHFFFAOYSA-L manganese(2+);octanoate Chemical compound [Mn+2].CCCCCCCC([O-])=O.CCCCCCCC([O-])=O SGLXWMAOOWXVAM-UHFFFAOYSA-L 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 description 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 1
- 229910052757 nitrogen Chemical group 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- QNGNSVIICDLXHT-UHFFFAOYSA-N para-ethylbenzaldehyde Natural products CCC1=CC=C(C=O)C=C1 QNGNSVIICDLXHT-UHFFFAOYSA-N 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- KRIOVPPHQSLHCZ-UHFFFAOYSA-N phenyl propionaldehyde Natural products CCC(=O)C1=CC=CC=C1 KRIOVPPHQSLHCZ-UHFFFAOYSA-N 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 238000009832 plasma treatment Methods 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 235000019353 potassium silicate Nutrition 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 229940079877 pyrogallol Drugs 0.000 description 1
- 230000002040 relaxant effect Effects 0.000 description 1
- FZHAPNGMFPVSLP-UHFFFAOYSA-N silanamine Chemical compound [SiH3]N FZHAPNGMFPVSLP-UHFFFAOYSA-N 0.000 description 1
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 1
- 235000011121 sodium hydroxide Nutrition 0.000 description 1
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000009987 spinning Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 239000011593 sulfur Chemical group 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 239000004762 twaron Substances 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 238000009941 weaving Methods 0.000 description 1
- 125000002256 xylenyl group Chemical class C1(C(C=CC=C1)C)(C)* 0.000 description 1
Landscapes
- Compositions Of Macromolecular Compounds (AREA)
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
- Production Of Multi-Layered Print Wiring Board (AREA)
Abstract
Description
【0001】0001
【産業上の利用分野】本発明は、コンピュータ、衛星通
信、移動無線通信機器、計測機器等に使用される両面も
しくは多層プリント配線板材料としての熱硬化性樹脂組
成物並びに該樹脂組成物を用いたプリント回路板用プレ
プリーグおよび銅張積層板に関するものである。[Industrial Application Field] The present invention relates to a thermosetting resin composition as a double-sided or multilayer printed wiring board material used in computers, satellite communications, mobile radio communication equipment, measuring equipment, etc., and the use of the resin composition. The present invention relates to prepregs and copper-clad laminates for printed circuit boards.
【0002】0002
【従来の技術】従来より、コンピュータ、計測機器等に
使用される両面もしくは多層プリント配線板用の樹脂材
料としては、エポキシ樹脂、ポリイミド樹脂等が用いら
れてきた。しかしながら、近年、高度情報化社会への移
行により、処理される情報量が飛躍的に増大し、多量の
情報をより高速で演算処理することが要求されている。2. Description of the Related Art Hitherto, epoxy resins, polyimide resins, and the like have been used as resin materials for double-sided or multilayer printed wiring boards used in computers, measuring instruments, and the like. However, in recent years, with the transition to a highly information-oriented society, the amount of information to be processed has increased dramatically, and it is now required to process large amounts of information at higher speeds.
【0003】一般に、信号伝播速度Vは次式で示され、
Generally, the signal propagation velocity V is expressed by the following formula:
【数1】
(C:光速,ε:誘電率,K:定数)誘電率の小さいも
のほど、高速演算処理が可能となる。従って、この信号
伝播速度を向上させる目的で、プリント配線板の低誘電
率化が試みられている。[Formula 1] (C: speed of light, ε: dielectric constant, K: constant) The smaller the dielectric constant, the faster calculation processing becomes possible. Therefore, attempts have been made to reduce the dielectric constant of printed wiring boards in order to improve the signal propagation speed.
【0004】従来より、低誘電率樹脂材料としては、ポ
リテトラフルオロエチレン(PTFE)、熱硬化型ポリ
フエニレンオキサイド(PPO)、ポリオレフイン、ポ
リブタジエン等が知られている。また、上記の他に、低
誘電率樹脂材料としては、主鎖に芳香族や脂環式化合物
を含むシアネートエステル樹脂がある(特表昭61−5
00434号)。Conventionally, polytetrafluoroethylene (PTFE), thermosetting polyphenylene oxide (PPO), polyolefin, polybutadiene, and the like have been known as low dielectric constant resin materials. In addition to the above, low dielectric constant resin materials include cyanate ester resins containing aromatic or alicyclic compounds in the main chain (Japanese Patent Publication No. 1986-5
No. 00434).
【0005】[0005]
【発明が解決しようとする課題】しかしながら、PTF
Eは、熱可塑性樹脂であるがためにZ軸方向の熱膨張係
数が大きく、これらを多層プリント配線板材料として用
いた場合、寸法安定性、スルーホール信頼性が劣るとい
う問題点があった。さらに、その溶融温度が250〜3
50℃と高いため加工性に劣ること、また銅スルーホー
ルメッキ時においても、テトラエッチ処理という複雑な
処理プロセスを必要とするなどの問題点があった。また
、PPOは、塩化メチレン等に対する耐有機溶剤性、ハ
ンダ耐熱性に劣り、かつ耐難燃性にも劣り、UL−94
VOグレードのものが得られにくいといった問題点があ
り、多層プリント配線板用材料としては不適であった。
さらに、ポリオレフィン、ポリブタジエンについては、
本質的に耐熱性に欠け、使用温度が120℃以下に限定
されるので、高速コンピュータ用としては明らかに不向
きである。[Problem to be solved by the invention] However, PTF
Since E is a thermoplastic resin, it has a large coefficient of thermal expansion in the Z-axis direction, and when it is used as a multilayer printed wiring board material, there is a problem that dimensional stability and through-hole reliability are poor. Furthermore, its melting temperature is 250-3
There were problems such as poor workability due to the high temperature of 50° C., and the need for a complicated treatment process called tetra-etching even when plating copper through-holes. In addition, PPO has poor resistance to organic solvents such as methylene chloride, poor solder heat resistance, and poor flame retardancy, and is UL-944
There was a problem that it was difficult to obtain a VO grade material, and it was unsuitable as a material for multilayer printed wiring boards. Furthermore, regarding polyolefin and polybutadiene,
Since it inherently lacks heat resistance and its use temperature is limited to 120° C. or lower, it is clearly unsuitable for use in high-speed computers.
【0006】さらに、前記シアネートエステル樹脂は、
有機酸コバルトなどの触媒の存在下で加熱処理すると、
トリアジン環構造をとり、架橋密度の高い硬化物を得る
ことができ、得られる硬化物は、低吸湿性で誘電率が低
く、かつ耐熱性、寸法安定性にも優れているが、化学構
造上、可撓性に劣り、積層板のドリル加工の際にクラツ
クが生じてスルーホールの信頼性が低下するという問題
点が指摘されていた。これを解決するために、特開平2
−88673号には、多価フェノール類の添加が記載さ
れているが、これらを加えた場合では、可撓性、耐衝撃
性の改良効果は認められるものの、無添加の場合に比べ
て誘電特性、耐薬品性に劣るという欠点があった。Furthermore, the cyanate ester resin is
When heat treated in the presence of a catalyst such as organic acid cobalt,
It is possible to obtain a cured product with a triazine ring structure and a high crosslinking density.The obtained cured product has low hygroscopicity, low dielectric constant, and excellent heat resistance and dimensional stability. However, it has been pointed out that the flexibility is poor, and cracks occur during drilling of the laminate, reducing the reliability of through-holes. In order to solve this problem,
-88673 describes the addition of polyhydric phenols, but when these are added, the flexibility and impact resistance are improved, but the dielectric properties are lower than when no additives are added. However, it had the disadvantage of poor chemical resistance.
【0007】本発明は、上記の点に鑑みてなされたもの
であり、シアネートエステル樹脂の低誘電率および低誘
電正接、さらに高耐熱性、耐薬品性を保持することがで
き、加えて可撓性、耐衝撃性を改良して積層板のドリル
加工時のスルーホールメッキの信頼性を高めた熱硬化性
樹脂組成物の提供を目的とするものである。The present invention has been made in view of the above points, and is capable of maintaining the low dielectric constant and low dielectric loss tangent of cyanate ester resin, as well as high heat resistance and chemical resistance. The object of the present invention is to provide a thermosetting resin composition that has improved properties and impact resistance, thereby increasing the reliability of through-hole plating during drilling of laminates.
【0008】[0008]
【課題を解決するための手段】本発明は、(1)一般式
〔1〕[Means for Solving the Problems] The present invention provides (1) general formula [1]
【化2】
(式中、Aは芳香環または芳香環を含む基、BはC7〜
C20の多環脂環基、Dは各々独立に活性水素基を含ま
ない置換基、p,q,rは各々独立に0〜3の整数であ
り、ただし,p,q,rの合計は2以上である。さらに
、sは各々独立に0〜4までの整数であり、xは0〜5
までの整数である。)で示されるシアネートエステル樹
脂に、フェノール性水酸基を有する重合体が配合されて
なることを特徴とする熱硬化性樹脂組成物、(2)無機
繊維、有機繊維の織布あるいは不織布に、請求項1記載
の熱硬化性樹脂組成物を30〜70重量%含浸させてな
ることを特徴とするプレプリーグ、(3)無機繊維、有
機繊維の織布あるいは不織布に、請求項1記載の熱硬化
性樹脂組成物を30〜70重量%含浸させて得られたプ
レプリーグを積層して、表面に銅箔を貼り合わせてなる
ことを特徴とする銅張積層板である。[Formula 2] (wherein A is an aromatic ring or a group containing an aromatic ring, B is a C7-
C20 polycyclic alicyclic group, D is each independently a substituent containing no active hydrogen group, p, q, r are each independently an integer of 0 to 3, provided that the total of p, q, r is 2 That's all. Furthermore, each s is an integer from 0 to 4, and x is an integer from 0 to 5.
is an integer up to . ) A thermosetting resin composition characterized by blending a polymer having a phenolic hydroxyl group with a cyanate ester resin represented by (2) a woven or nonwoven fabric of inorganic fibers or organic fibers; A prepreg characterized by impregnating 30 to 70% by weight of the thermosetting resin composition according to claim 1; This is a copper-clad laminate characterized in that prepregs obtained by impregnating 30 to 70% by weight of a composition are laminated and copper foil is bonded to the surface.
【0009】以下、本発明について詳細に説明する。The present invention will be explained in detail below.
【0010】本発明に用いられる一般式〔1〕で示され
るシアネートエステル樹脂としては、特表昭61−50
0434号によって開示されているものを用いることが
できる。すなわち、この特殊シアネートエステル樹脂は
、従来のビスフェノールA型シアネートエステル樹脂よ
り誘導されるポリトリアジンよりも吸湿性が低く、加水
分解作用に対して著しく安定で、かつ耐熱性に優れたポ
リトリアジンを与えるものである。[0010] As the cyanate ester resin represented by the general formula [1] used in the present invention,
0434 can be used. That is, this special cyanate ester resin provides a polytriazine that has lower hygroscopicity than polytriazine derived from conventional bisphenol A type cyanate ester resin, is extremely stable against hydrolytic action, and has excellent heat resistance. It is something.
【0011】一般式〔1〕において、Aは芳香環を含む
すべての基を意味するものであり、具体的には、フェニ
レン基、ナフチレン基、アンスリレン基、ビフェニレン
基、ビナフチレン基、もしくはアルキレン基によって結
合された2個以上の芳香環を含む基などであり、その中
でもフェニレン基、ナフチレン基が好ましく、フェニレ
ン基が特に好ましい。In the general formula [1], A means any group containing an aromatic ring, specifically, a phenylene group, a naphthylene group, anthrylene group, a biphenylene group, a binaphthylene group, or an alkylene group. It is a group containing two or more bonded aromatic rings, and among them, a phenylene group and a naphthylene group are preferable, and a phenylene group is particularly preferable.
【0012】また、式〔1〕において、BはC7〜C2
0の多環脂環基を表し、これは2個以上の環を含む脂環
基を意味するものであり、多環脂環基には1つ以上の二
重結合または三重結合が含まれていてもよい。その具体
例を列記すれば次のものがあり、中でも(a),(b)
,(c),(d),(e)が好ましく、特に(a)が好
ましい。[0012] Furthermore, in formula [1], B is C7 to C2
0 represents a polycyclic alicyclic group, which means an alicyclic group containing two or more rings, and a polycyclic alicyclic group contains one or more double bonds or triple bonds. It's okay. Specific examples include the following, among which (a) and (b)
, (c), (d), and (e) are preferred, and (a) is particularly preferred.
【化3】
(式中、YはCH2,S,S=O,O=S=Oであり、
D′はC1〜C5のアルキル基である。)[Formula 3] (wherein, Y is CH2, S, S=O, O=S=O,
D' is a C1-C5 alkyl group. )
【0013】
式〔1〕において、Dは各々独立に活性水素基を含まな
い置換基であり、活性水素原子を含む置換基は除外され
る。ここで活性水素原子とは、酸素、硫黄、窒素原子に
結合する水素原子を意味する。その具体例としては、水
素原子、C1〜C10のアルキル基、C1〜C10のア
ルケニル基、C1〜C5アルキニル基、C1〜C5のア
ルコキシ基、ニトロ基、カルボキシル基、ハロゲン原子
等であり、その中でも水素原子、C1〜C3のアルキル
基、ハロゲン原子が好ましく、水素原子、ブロム原子が
特に好ましい。[0013]
In formula [1], each D is independently a substituent containing no active hydrogen group, and substituents containing active hydrogen atoms are excluded. The active hydrogen atom herein means a hydrogen atom bonded to an oxygen, sulfur, or nitrogen atom. Specific examples include hydrogen atoms, C1-C10 alkyl groups, C1-C10 alkenyl groups, C1-C5 alkynyl groups, C1-C5 alkoxy groups, nitro groups, carboxyl groups, halogen atoms, etc. A hydrogen atom, a C1-C3 alkyl group, and a halogen atom are preferred, and a hydrogen atom and a bromine atom are particularly preferred.
【0014】式〔1〕において、sは0〜4までの整数
であり、その中でも0〜1の整数が好ましく、0が特に
好ましい。また,p,q,rは各々独立に0〜3の整数
であり、その中でも1が特に好ましい。ただし、p,q
,rの合計は2以上になるように設定される。さらに、
xは0〜5までの整数であるが、式〔1〕のシアネート
エステル樹脂はxが0〜5までの化合物の混合物として
見出されるものである。In formula [1], s is an integer from 0 to 4, preferably an integer from 0 to 1, and particularly preferably 0. Moreover, p, q, and r are each independently an integer of 0 to 3, and 1 is particularly preferable among them. However, p, q
, r is set to be 2 or more. moreover,
x is an integer from 0 to 5, and the cyanate ester resin of formula [1] is found as a mixture of compounds where x is from 0 to 5.
【0015】式〔1〕で示されるシアネートエステル樹
脂の好ましい具体例としては、次の式で示されるもので
あり、これはQUATREX 7187(ダウケミカ
ル社製)として入手しうるものである。A preferred specific example of the cyanate ester resin represented by formula [1] is represented by the following formula, which is available as QUATREX 7187 (manufactured by Dow Chemical Company).
【化4】[C4]
【0016】しかるに、式〔1〕のシアネートエステル
樹脂を触媒存在下で加熱して得られるポリトリアジンは
、低吸湿性(吸水率0.5%以下)、低い誘電率(ε2
.8前後)、低い誘電正接(tanδ0.003前後)
および高耐熱性(Tg250℃以上)を有するプリント
配線基板を構成する樹脂として優れた特性を有するもの
である。However, the polytriazine obtained by heating the cyanate ester resin of formula [1] in the presence of a catalyst has low hygroscopicity (water absorption rate of 0.5% or less) and low dielectric constant (ε2
.. (around 8), low dielectric loss tangent (tan δ around 0.003)
It also has excellent properties as a resin constituting a printed wiring board having high heat resistance (Tg 250° C. or higher).
【0017】本発明に用いられるフェノール性水酸基を
有する重合体は、前記シアネートエステル樹脂を硬化さ
せる際に、誘電特性、耐薬品性を損なうことなく耐衝撃
性を改善するために用いられるものであり、繰り返し単
位が一般式〔2〕で示される平均分子量500〜50,
000の化合物が挙げられる。The polymer having a phenolic hydroxyl group used in the present invention is used to improve impact resistance without impairing dielectric properties and chemical resistance when curing the cyanate ester resin. , an average molecular weight of 500 to 50, in which the repeating unit is represented by the general formula [2],
000 compounds are mentioned.
【化5】
(式中、X,Yは水素原子、置換基を有していてもよい
アルキル基もしくはアリール基を表し、Zはハロゲン原
子、置換基を有していてもよいアルキル基もしくはアリ
ール基を表し、nは1〜3の整数、mは0または1〜3
の整数を表す。)[Formula 5] (wherein, X and Y represent a hydrogen atom, an alkyl group or an aryl group which may have a substituent, and Z represents a halogen atom, an alkyl group or an aryl group which may have a substituent) represents a group, n is an integer of 1 to 3, m is 0 or 1 to 3
represents an integer. )
【0018】その具体例としては、■ビニルフェノール
重合体、ビニルブロモフェノール重合体、ビニルt−ブ
チルフェノール重合体、ビニルフェノール・メタクリル
酸メチル共重合体、ビニルフェノール・スチレン共重合
体、ビニルフェノール・2−ヒドロキシエチルメタクリ
レート共重合体、ビニルフェノール・フェニルマレイミ
ド共重合体などのビニルフェノールから誘導される重合
体、■フェノール、クレゾール、キシレノール、レゾル
シン、ピロガロール等のフェノール類とホルムアルデヒ
ド、アセトアルデヒド、ベンズアルデヒド、アセトン、
メチルエチルケトン、アセトフェノン等のアルデヒド類
またはケトン類との反応で得られる化合物が挙げられる
。Specific examples thereof include (1) vinylphenol polymer, vinylbromophenol polymer, vinyl t-butylphenol polymer, vinylphenol/methyl methacrylate copolymer, vinylphenol/styrene copolymer, vinylphenol/2 - Polymers derived from vinylphenol such as hydroxyethyl methacrylate copolymer and vinylphenol-phenylmaleimide copolymer, ■ Phenols such as phenol, cresol, xylenol, resorcinol, and pyrogallol, and formaldehyde, acetaldehyde, benzaldehyde, acetone,
Examples include compounds obtained by reaction with aldehydes or ketones such as methyl ethyl ketone and acetophenone.
【0019】上記化合物〔1〕とフェノール性水酸基を
有する重合体の配合比は、重量比で95:5〜50:5
0の範囲であればよい。この配合比が95:5より大き
いと、硬化物にしたときの可撓性に欠け、吸湿処理後の
ハンダ耐熱性、耐薬品性に劣る。また、この配合比が5
0:50より小さいと、吸湿性が大きくなり、低誘電率
材料としての特長が十分に現れないので好ましくない。The blending ratio of the above compound [1] and the polymer having a phenolic hydroxyl group is 95:5 to 50:5 by weight.
It may be within the range of 0. If this blending ratio is greater than 95:5, the cured product will lack flexibility and will have poor solder heat resistance and chemical resistance after moisture absorption treatment. Also, this blending ratio is 5
If the ratio is less than 0:50, hygroscopicity becomes large and the characteristics as a low dielectric constant material are not fully exhibited, which is not preferable.
【0020】次に、本発明の樹脂組成物を用いたプリン
ト配線板用のプレプリーグおよび銅張積層板の製法につ
いて説明する。Next, a method for manufacturing a prepreg for printed wiring boards and a copper-clad laminate using the resin composition of the present invention will be explained.
【0021】プレプリーグをつくるに際しては、まずは
じめに、前記式〔1〕のシアネートエステル樹脂と式〔
2〕で示されるフェノール性水酸基を有する重合体、難
燃剤および反応触媒等を有機溶剤に溶解することによっ
てワニスを調製する。次いで、通常のプリント配線基板
用の繊維基材として用いられている無機繊維、有機繊維
の織布あるいは不織布にこのワニスを含浸させたのち加
熱乾燥する。この際、繊維基材へのワニスの含浸量は、
乾燥後の全重量に対する樹脂固形分(式〔1〕の樹脂と
フェノール性水酸基を有する重合体と難燃剤とを合わせ
たもの)の比率が30〜70重量%になるように設定す
るのが好ましい。プレプリーグを製造する際の加熱乾燥
条件は、反応触媒の添加量によって影響されるが、例え
ば、加熱温度が150℃の場合には、加熱時間を3〜1
0分程度に設定することにより、所望のプレプリーグの
ストロークゲルタイムを得るようにすることができる。[0021] When making prepreg, first of all, the cyanate ester resin of the above formula [1] and the formula [
A varnish is prepared by dissolving the polymer having a phenolic hydroxyl group shown in 2], a flame retardant, a reaction catalyst, etc. in an organic solvent. Next, this varnish is impregnated into a woven or nonwoven fabric of inorganic fibers or organic fibers, which is commonly used as a fiber base material for printed wiring boards, and then heated and dried. At this time, the amount of varnish impregnated into the fiber base material is
It is preferable to set the ratio of resin solid content (combined resin of formula [1], polymer having a phenolic hydroxyl group, and flame retardant) to the total weight after drying to be 30 to 70% by weight. . The heating drying conditions when producing prepreg are influenced by the amount of reaction catalyst added, but for example, when the heating temperature is 150°C, the heating time is 3 to 1
By setting the time to about 0 minutes, it is possible to obtain a desired prepreg stroke gel time.
【0022】本プレプリーグを製造する際に用いられる
難燃剤としては、ハロゲンを含む化合物であれば、いず
れでもよいが、具体的には、テトラブロモビスフェノー
ルA、デカブロモジフェニルオキシド、ハロゲン置換さ
れた芳香族ポリカーボネートオリゴマー、例えば、式〔
3〕で示されるトリブロモフェノキシ末端テトラブロモ
ビスフェノールAカーボネートオリゴマーを用いること
ができる。[0022] The flame retardant used in producing the present prepreg may be any compound containing halogen, but specifically, tetrabromobisphenol A, decabromodiphenyl oxide, halogen-substituted aromatic Group polycarbonate oligomers, e.g.
A tribromophenoxy-terminated tetrabromobisphenol A carbonate oligomer shown in [3] can be used.
【化6】 (式中、nは1〜20の整数である。)[C6] (In the formula, n is an integer from 1 to 20.)
【0023】こ
れらの難燃剤は、単独あるいは混合して用いることがで
きるが、式〔1〕のシアネートエステル樹脂と式〔2〕
の重合体と難燃剤との合計量に対してBrの含有量が1
0〜15重量%になるように調整するのが好ましい。These flame retardants can be used alone or in combination, but the cyanate ester resin of formula [1] and the cyanate ester resin of formula [2]
The content of Br is 1 for the total amount of polymer and flame retardant.
It is preferable to adjust the content to 0 to 15% by weight.
【0024】また、反応触媒としては、イミダゾール類
、アミン類、有機酸金属塩類等を用いることができるが
、特にナフテン酸コバルトやオクチル酸コバルト、オク
チル酸マンガン等の有機酸金属塩類が好ましい。反応触
媒の添加量は特に限定されるものではないが、例えば、
有機酸コバルト塩類を用いる場合には、所望するプレプ
リーグのゲルタイムに応じて、式〔1〕で示されるシア
ネートエステル樹脂の重量に対して金属の重量比で20
〜500ppmの範囲で配合される。As the reaction catalyst, imidazoles, amines, organic acid metal salts, etc. can be used, and organic acid metal salts such as cobalt naphthenate, cobalt octylate, and manganese octylate are particularly preferred. The amount of reaction catalyst added is not particularly limited, but for example,
When using organic acid cobalt salts, the weight ratio of the metal to the weight of the cyanate ester resin represented by formula [1] is 20 depending on the desired gel time of the prepreg.
It is blended in a range of ~500 ppm.
【0025】さらに、有機溶剤としては、式〔1〕で示
されるシアネートエステル樹脂や難燃剤を溶解し、反応
に悪影響を与えないものであれば、特に制限はないが、
例えば、アセトン、メチルエチルケトン等のケトン類、
ジメチルホルムアミド、ジメチルアセトアミド、N−メ
チルピロリドン等の極性アミド溶媒が用いられ、これら
は単独あるいは混合して用いることができる。添加する
有機溶剤の量は、ワニス中の固形分濃度が50〜70重
量%になるように調合するのが一般的である。Furthermore, the organic solvent is not particularly limited as long as it dissolves the cyanate ester resin represented by formula [1] and the flame retardant and does not adversely affect the reaction.
For example, ketones such as acetone and methyl ethyl ketone,
Polar amide solvents such as dimethylformamide, dimethylacetamide, and N-methylpyrrolidone are used, and these can be used alone or in combination. The amount of organic solvent added is generally adjusted so that the solid content concentration in the varnish is 50 to 70% by weight.
【0026】また、上記繊維基材としては、一般にプリ
ント回路板の積層材料として使用されているものが利用
でき、例えば無機繊維基材としては、SiO2やAl2
O3等を主成分とするE−ガラス、D−ガラス、C−ガ
ラス、S−ガラス等があり、またSiO2を主成分とす
るシリカガラス等のガラス繊維の織布、不織布がある。
また、有機繊維基材としては、芳香族ポリアミドを主成
分とするアラミド繊維の織布あるいは不織布等がある。[0026] As the above-mentioned fiber base material, those generally used as laminated materials for printed circuit boards can be used. For example, as the inorganic fiber base material, SiO2 or Al2
There are E-glass, D-glass, C-glass, S-glass, etc. whose main component is O3 etc., and there are also woven fabrics and non-woven fabrics of glass fibers such as silica glass whose main component is SiO2. In addition, examples of the organic fiber base material include woven fabrics or nonwoven fabrics of aramid fibers containing aromatic polyamide as a main component.
【0027】そして、このようにして調製したプレプリ
ーグを複数枚重ね、さらに、上下の両面に銅箔を重ねて
これを加熱加圧成型することにより、プレプリーグ中の
シアネートエステル樹脂と式〔2〕の化合物が重合硬化
して構成される絶縁基板の両面に銅箔を積層接着した銅
張積層板を作製することができる。この際の成型条件は
、加熱温度を170〜230℃、圧力を25〜50kg
/cm2、時間を1〜2時間程度に設定するのが一般的
である。また、成型後に220〜230℃でアフターキ
ユアする場合には、成型温度は170〜180℃で十分
である。[0027] Then, by stacking a plurality of sheets of the prepreg prepared in this manner, and further layering copper foil on both the upper and lower surfaces and molding them under heat and pressure, the cyanate ester resin in the prepreg and the formula [2] are combined. A copper-clad laminate can be produced by laminating and bonding copper foil on both sides of an insulating substrate formed by polymerizing and curing a compound. The molding conditions at this time are a heating temperature of 170-230℃ and a pressure of 25-50kg.
/cm2 and the time is generally set to about 1 to 2 hours. Moreover, when after-curing at 220 to 230°C after molding, a molding temperature of 170 to 180°C is sufficient.
【0028】また、多層のプリント配線板を作製するに
は、前記の方法によって作製した銅張積層板の銅箔をエ
ツチング加工等して回路形成することにより内層板を作
製し、次いで、この内層板を複数枚の上記プレプリーグ
を介して重ねるとともに、最外層に銅箔を重ね、これを
加熱成形することにより多層のプリント基板であるシー
ルド板を作製することができる。このようにして得られ
た両面銅張積層板、シールド板については、以下公知の
方法を用いてプリント配線板にすることができる。In order to produce a multilayer printed wiring board, an inner layer board is produced by etching the copper foil of the copper clad laminate produced by the method described above to form a circuit, and then this inner layer A shield plate, which is a multilayer printed circuit board, can be produced by stacking the plates via a plurality of the prepregs, stacking copper foil on the outermost layer, and heat-forming this. The double-sided copper-clad laminate and shield board thus obtained can be made into printed wiring boards using the following known methods.
【0029】[0029]
【実施例】以下、本発明を実施例によって詳述する。EXAMPLES The present invention will now be explained in detail by way of examples.
【0030】参考例1
珪酸繊維としてAKZO社の水ガラス由来の繊維を用い
てクロスを製織した。用いたヤーンの単糸本数は120
本、単糸径は9.0μm、番手は17テツクスであった
。このヤーンの物性は、SiO2含有率99.5%、比
重2.0、引張強度70kg/mm2、弾性率5,20
0kg/mm2であった。Reference Example 1 A cloth was woven using waterglass-derived fibers manufactured by AKZO as silicic acid fibers. The number of single yarns used was 120.
The diameter of the single yarn was 9.0 μm, and the count was 17 tex. The physical properties of this yarn are: SiO2 content 99.5%, specific gravity 2.0, tensile strength 70kg/mm2, elastic modulus 5.20.
It was 0 kg/mm2.
【0031】次いで、ポリビニルアルコール系の糊剤を
ヤーンに付着し、乾燥後、糊剤付ヤーンをレピア織機に
て製織した。得られたクロスをバツチ式焼却炉中で40
0℃で熱処理し、繊維表面の紡糸バインダーや糊剤を焼
却除去した後、アミノシランカツプリング剤(SZ−6
032,東レシリコーン社製)溶液中に浸漬し、140
℃で加熱乾燥することにより、シランカツプリング剤で
処理したガラスクロスを得た。このクロスの密度は、経
62本/25mm、緯64本/25mm、厚さは96μ
mであった。Next, a polyvinyl alcohol-based sizing agent was applied to the yarn, and after drying, the sizing agent-coated yarn was woven using a rapier loom. The resulting cloth was placed in a batch incinerator for 40 minutes.
After heat treatment at 0°C and incineration to remove the spinning binder and sizing agent on the fiber surface, aminosilane coupling agent (SZ-6
032, manufactured by Toray Silicone Co., Ltd.) immersed in a solution of 140
A glass cloth treated with a silane coupling agent was obtained by heating and drying at °C. The density of this cloth is 62 warps/25mm, 64 latitudes/25mm, and the thickness is 96μ.
It was m.
【0032】参考例2
D−ガラス繊維DCE 270 1/0日本電気硝
子社製、単糸本数160本、単糸径8.7μm、番手2
0.6テックス)を用いて、E−ガラスクロスを製織し
た。
以下、参考例1と同様にしてシランカップリング剤で処
理したガラスクロスを得た。得られたクロスの密度は径
64本/25mm、緯58本/25mm、厚さは100
μmであった。Reference Example 2 D-glass fiber DCE 270 1/0 manufactured by Nippon Electric Glass Co., Ltd., number of single yarns: 160, single yarn diameter: 8.7 μm, count: 2
E-glass cloth was woven using E-glass cloth (0.6 tex). Hereinafter, a glass cloth treated with a silane coupling agent was obtained in the same manner as in Reference Example 1. The density of the obtained cloth is 64 pieces/25 mm in diameter, 58 pieces/25 mm in latitude, and 100 pieces thick.
It was μm.
【0033】参考例3
プリント配線基板用に一般に用いられているE−ガラス
繊維225 1/0(日本電気硝子社製、単糸本数2
00本、単糸径7.0μm、番手22.4テツクス)を
用いてクロスを製織した。以下、参考例1と同様にして
シランカツプリング剤で処理したガラスクロスを得た。
このクロスの密度は、経61本/25mm、緯58本/
25mm、厚さ97μmであった。Reference Example 3 E-glass fiber 225 1/0 (manufactured by Nippon Electric Glass Co., Ltd., number of single threads: 2) commonly used for printed wiring boards
00 pieces, single yarn diameter 7.0 μm, count 22.4 tex) were used to weave a cloth. Hereinafter, a glass cloth treated with a silane coupling agent was obtained in the same manner as in Reference Example 1. The density of this cloth is 61 warp/25mm, 58 latitude/
It was 25 mm and 97 μm thick.
【0034】参考例4
アラミド繊維Twaron(ENKA社製、単糸本数2
50本、単糸径20μm、単糸デニール1.5)を用い
てクロスを製織したのち、低温プラズマ処理することに
よりクロスを得た。得られたクロスの密度は経41本/
25mm、緯31本/25mm、厚さは180μmであ
った。Reference Example 4 Aramid fiber Twaron (manufactured by ENKA, number of single yarns: 2)
After weaving a cloth using 50 pieces, a single yarn diameter of 20 μm, and a single yarn denier of 1.5), a cloth was obtained by subjecting it to low-temperature plasma treatment. The density of the obtained cloth is 41 warps/
The length was 25 mm, the latitude was 31/25 mm, and the thickness was 180 μm.
【0035】実施例1
一般式〔1〕で示されるシアネートエステル樹脂として
、QUATREX7187(ダウケミカル社製)85g
、フェノール性水酸基を有する重合体としてビニルフェ
ノール重合体(マルカリンカ−M、丸善石油化学社製、
分子量2000〜2500)15gとをメチルエチルケ
トン(MEK)とジメチルホルムアミド(DMF)の1
:1混合溶媒67gに溶解することにより樹脂液を得た
。Example 1 As the cyanate ester resin represented by the general formula [1], 85 g of QUATREX 7187 (manufactured by Dow Chemical Company) was used.
, vinyl phenol polymer (Maruka Linker-M, manufactured by Maruzen Petrochemical Co., Ltd.,
15g of molecular weight 2000-2500) and 1 of methyl ethyl ketone (MEK) and dimethylformamide (DMF)
A resin liquid was obtained by dissolving in 67 g of a :1 mixed solvent.
【0036】次いで、これに難燃剤としてのトリブロモ
フェノキシ末端テトラブロモビスフエノールAカーボネ
ートオリゴマー(PO−64P、グレート・レイク社製
)25gと、反応触媒としてのオクチル酸コバルトをシ
アネートエステル樹脂に対してCoが重量比で100p
pmになるように添加して樹脂分濃度65重量%のワニ
スを調製した。このワニスを参考例1で作製したガラス
クロスに樹脂分含有率が50重量%になるように含浸し
、150℃で4分間加熱乾燥することによりプレプリー
グを調製した。次に、このプレプリーグを8枚重ねると
ともに、その両面に35μm厚の銅箔を重ね、成型温度
177℃、成型圧力30kg/cm2、成型時間60分
の条件で成型したのち、さらに225℃で1時間アフタ
ーキュアすることにより両面銅張積層板を得た。Next, 25 g of tribromophenoxy-terminated tetrabromobisphenol A carbonate oligomer (PO-64P, manufactured by Great Lakes) as a flame retardant and cobalt octylate as a reaction catalyst were added to the cyanate ester resin. Co is 100p by weight
pm to prepare a varnish with a resin concentration of 65% by weight. A prepreg was prepared by impregnating the glass cloth prepared in Reference Example 1 with this varnish so that the resin content was 50% by weight, and heating and drying it at 150° C. for 4 minutes. Next, 8 sheets of this prepreg were stacked, and 35 μm thick copper foil was layered on both sides, and molded at a molding temperature of 177°C, a molding pressure of 30 kg/cm2, and a molding time of 60 minutes, and then at 225°C for another 1 hour. A double-sided copper-clad laminate was obtained by after-curing.
【0037】実施例2
フェノール性水酸基を有する重合体として、ビニルブロ
ムフェノール重合体(マルカリンカーMB、丸善石油化
学社製、分子量6,000〜7,000)15gを用い
ること以外は、実施例1と同様にして銅張積層板を得た
。Example 2 Example 1 except that 15 g of vinyl bromophenol polymer (Maruka Linker MB, manufactured by Maruzen Petrochemical Co., Ltd., molecular weight 6,000-7,000) was used as the polymer having a phenolic hydroxyl group. A copper-clad laminate was obtained in the same manner.
【0038】実施例3
フェノール性水酸基を有する重合体として、ビニルフェ
ノール・スチレン共重合体(分子量5,000〜6,0
00)を用いること以外は、実施例1と同様にして銅張
積層板を得た。Example 3 As a polymer having a phenolic hydroxyl group, a vinylphenol/styrene copolymer (molecular weight 5,000 to 6,0
A copper-clad laminate was obtained in the same manner as in Example 1 except that 00) was used.
【0039】実施例4
一般式〔I〕で示されるシアネートエステル樹脂として
、QUATREX 7187(ダウケミカル社製)8
0g、フェノール性水酸基を有する重合体として、θ−
クレゾールノボラック樹脂(プライオーフェンZA−1
165、大日本インキ化学工業社製)10gとをメチル
エチルケトン(MEK)とジメチルホルムアミド(DM
F)の1:1混合溶媒82gに溶解することにより樹脂
液を得た。次いで、これに難燃剤としてのテトラブロム
ビスフェノールA(BA−59P、グレートレイク社製
)10gと、反応触媒としてのナフテン酸コバルトをシ
アネートエステル樹脂に対してCoが重量比で50pp
mになるように添加して樹脂分濃度55重量%のワニス
を調製した。このワニスを参考例3で作製したガラスク
ロスに樹脂分含有率が45重量%になるように含浸し、
140℃で5分間加熱することによりプレプリーグを調
製した。次いで、このプレプリーグを8枚重ねるととも
に、その両面に18μm厚の銅箔を重ね、成型温度18
0℃、成型圧力35kg/cm2、成型時間60分の条
件で成型したのち、さらに215℃で1時間アフターキ
ュアすることにより両面銅張積層板を得た。Example 4 As the cyanate ester resin represented by the general formula [I], QUATREX 7187 (manufactured by Dow Chemical Company) 8
0g, as a polymer having a phenolic hydroxyl group, θ-
Cresol novolac resin (Pryophen ZA-1
165 (manufactured by Dainippon Ink and Chemicals) and 10 g of methyl ethyl ketone (MEK) and dimethyl formamide (DM).
A resin liquid was obtained by dissolving in 82 g of a 1:1 mixed solvent of F). Next, 10 g of tetrabromobisphenol A (BA-59P, manufactured by Great Lakes) as a flame retardant and cobalt naphthenate as a reaction catalyst were added to this in a weight ratio of 50 pp by weight to the cyanate ester resin.
A varnish with a resin concentration of 55% by weight was prepared by adding the resin in an amount of 55% by weight. This varnish was impregnated into the glass cloth prepared in Reference Example 3 so that the resin content was 45% by weight,
A prepreg was prepared by heating at 140°C for 5 minutes. Next, 8 sheets of this prepreg were stacked, and 18 μm thick copper foil was stacked on both sides, and the molding temperature was 18 μm.
After molding under the conditions of 0°C, molding pressure of 35 kg/cm2, and molding time of 60 minutes, a double-sided copper-clad laminate was obtained by further after-curing at 215°C for 1 hour.
【0040】実施例5
フェノール性水酸基を有する重合体として、フェノール
ノボラック樹脂(バーカム、TD−2093 大日本
インキ化学工業社製)10gを用いること以外は、実施
例4と同様にして銅張積層板を得た。Example 5 A copper-clad laminate was prepared in the same manner as in Example 4, except that 10 g of phenol novolak resin (Barcam, TD-2093, manufactured by Dainippon Ink & Chemicals) was used as the polymer having a phenolic hydroxyl group. I got it.
【0041】実施例6
フェノール性水酸基を有する重合体として、ビニルブロ
ムフェノール重合体(マルカリンカーMB、丸善石油化
学社製)を用いること以外は、実施例4に同様にして銅
張積層板を得た。Example 6 A copper-clad laminate was obtained in the same manner as in Example 4, except that a vinylbromophenol polymer (Maruka Linker MB, manufactured by Maruzen Petrochemical Co., Ltd.) was used as the polymer having phenolic hydroxyl groups. Ta.
【0042】実施例7
繊維基材として参考例2で作製したガラスクロスを用い
ること以外は、実施例1と同様にして銅張積層板を得た
。Example 7 A copper-clad laminate was obtained in the same manner as in Example 1, except that the glass cloth produced in Reference Example 2 was used as the fiber base material.
【0043】実施例8
繊維基材として参考例4で作製したアラミドクロスを用
いること以外は、実施例1と同様にして銅張積層板を得
た。Example 8 A copper-clad laminate was obtained in the same manner as in Example 1, except that the aramid cloth produced in Reference Example 4 was used as the fiber base material.
【0044】比較例1
フェノール性水酸基を有する重合体を使用しないで、Q
UATREX 7187100gを用いること以外は
、実施例1と同様にして銅張積層板を得た。Comparative Example 1 Q
A copper-clad laminate was obtained in the same manner as in Example 1, except that 100 g of UATREX 7187 was used.
【0045】比較例2
フェノール性水酸基を有する重合体を使用しないで、Q
UATREX 7187100gを用いること以外は
、実施例4と同様にして銅張積層板を得た。Comparative Example 2 Q
A copper-clad laminate was obtained in the same manner as in Example 4, except that 100 g of UATREX 7187 was used.
【0046】以上、得られた積層板につき次に記述した
方法により積層板としての評価を行った。The obtained laminate was evaluated as a laminate by the method described below.
【0047】(1) 誘電率および誘電正接JIS
C−6481に従い、LPインピーダンスアナライザ
ー4194A(横河ヒユーレツトパツカード社製)を用
いて1MHzにおける値を測定した。(1) Dielectric constant and dielectric loss tangent JIS
According to C-6481, the value at 1 MHz was measured using LP Impedance Analyzer 4194A (manufactured by Yokogawa Heuretsu Packard Co., Ltd.).
【0048】(2) 曲げ強度
JIS C−6481に従い、所定サイズの試料を作
製し,精密万能材料試験機2020型(インテスコ社製
)を用いて支点間50mmで測定した。(2) Bending strength A sample of a predetermined size was prepared according to JIS C-6481, and measured using a precision universal material testing machine model 2020 (manufactured by Intesco) at a distance of 50 mm between fulcrums.
【0049】(3) ピール強度
JIS C−6481に従い、所定サイズの試料を作
製し、精密万能材料試験機2020型(インテスコ社製
)を用いて測定した。(3) Peel strength A sample of a predetermined size was prepared according to JIS C-6481, and measured using a precision universal material testing machine model 2020 (manufactured by Intesco).
【0050】(4) 絶縁抵抗
IPC−B25に従い、375μm幅のくし型電極を作
製し、バイブレイテイングリードエレクトロメーターT
R−84M(タケダ理研社製)を用いてDC500V印
加時の絶縁抵抗を測定した。(4) Insulation resistance A comb-shaped electrode with a width of 375 μm was prepared according to IPC-B25, and a vibrating lead electrometer T was prepared.
Insulation resistance was measured using R-84M (manufactured by Takeda Riken Co., Ltd.) when 500 V DC was applied.
【0051】(5) ガラス転移温度(Tg)粉末状
の試料15mgを採取し、DSC−2C(パーキンエル
マー社製)を用いて昇温速度20℃/分で測定した。(5) Glass transition temperature (Tg) 15 mg of a powder sample was taken and measured using DSC-2C (manufactured by PerkinElmer) at a heating rate of 20° C./min.
【0052】(6) 難燃性 UL−94規格に従い、垂直法により評価した。(6) Flame retardancy Evaluation was performed by the vertical method according to the UL-94 standard.
【0053】(7) スルーホール面の内壁粗さとス
ルーホールの信頼性
スルーホールのドリル加工は、0.9mmφのドリルビ
ツトを用い、40,000rpmの回転数、1回転あた
りの送り速度50μm/revの条件で行い、次いで、
無電解メツキと電解メツキを行った。(7) Inner wall roughness of the through-hole surface and reliability of the through-hole The through-hole was drilled using a 0.9 mmφ drill bit at a rotation speed of 40,000 rpm and a feed rate of 50 μm/rev per rotation. condition, then
Electroless plating and electrolytic plating were performed.
【0054】得られたスルーホールについて、その内壁
粗さは、スルーホールの断面を顕微鏡で観察することに
より測定し、スルーホールの信頼性については、スルー
ホールの断面を顕微鏡で観察して、メツキ液の染み込み
の深さを測定することにより評価した。The inner wall roughness of the obtained through-hole was measured by observing the cross-section of the through-hole with a microscope, and the reliability of the through-hole was determined by observing the cross-section of the through-hole with a microscope. Evaluation was made by measuring the depth of penetration of the liquid.
【0055】(8) 熱膨張率
6mm×6mmの試料を用いて、TMA−50(島津製
作所製)により、2℃/minで昇温し、50〜250
℃の範囲の熱膨張曲線よりZ軸方向の熱膨張率を求めた
。(8) Using a sample with a thermal expansion coefficient of 6 mm x 6 mm, the temperature was raised at 2° C./min using TMA-50 (manufactured by Shimadzu Corporation) to a temperature of 50 to 250° C.
The coefficient of thermal expansion in the Z-axis direction was determined from the thermal expansion curve in the range of °C.
【0056】(9) 耐熱性
積層板をプレッシャー処理(121℃、2atm下で3
時間)したのち、260℃のハンダ浴に60秒浸漬し、
外観性状を目視観察することにより評価した。
…異常なし、 ×…白化現象が生じたもの(9) Pressure treatment of the heat-resistant laminate (121° C., 3 atm under 2 atm)
time), then immersed in a 260℃ solder bath for 60 seconds,
The appearance and properties were evaluated by visual observation. …No abnormality ×…Whitening phenomenon occurred
【0057
】(10) 耐アルカリ性積層板をカセイソーダ10
重量%の水溶液に80℃で10分間浸漬したのちに、外
観性状を目視観察することにより評価した。
…異常なし、 ×…白化現象が生じたもの得られた結
果を表1に示した。0057
] (10) Add caustic soda 10 to the alkali-resistant laminate
After being immersed in a wt% aqueous solution at 80° C. for 10 minutes, the appearance and properties were evaluated by visual observation. ...No abnormality, ×...Whitening phenomenon occurred The results obtained are shown in Table 1.
【表1】[Table 1]
【0058】[0058]
【発明の効果】以上のように、本発明によれば、式〔1
〕のシアネートエステル樹脂にフェノール性水酸基を有
する重合体を配合することにより、シアネートエステル
樹脂の長所である低吸湿性で誘電率、誘電正接が低く、
かつ耐熱性、耐薬品性、寸法安定性の良好な積層板をつ
くることができ、高速コンピュータのプリント回路用と
して使用することができるとともに、硬化時の架橋密度
を緩和して、重合硬化体の可撓性、耐衝撃性を改善する
ことができ、スルーホールを加工する際のクラックの発
生を防止して、スルーホールメッキの信頼性を高めるこ
とができる。[Effects of the Invention] As described above, according to the present invention, the formula [1
] By blending the cyanate ester resin with a polymer having phenolic hydroxyl groups, it has low hygroscopicity, low dielectric constant, and low dielectric loss tangent, which are the advantages of cyanate ester resin.
In addition, it is possible to produce laminates with good heat resistance, chemical resistance, and dimensional stability, and they can be used for printed circuits of high-speed computers. At the same time, by relaxing the crosslinking density during curing, Flexibility and impact resistance can be improved, cracks can be prevented from occurring during through-hole processing, and the reliability of through-hole plating can be increased.
Claims (3)
C20の多環脂環基、Dは各々独立に活性水素基を含ま
ない置換基、p,q,rは各々独立に0〜3の整数であ
り、ただし、p,q,rの合計は2以上である。さらに
、sは各々独立に0〜4までの整数であり、xは0〜5
までの整数である。)で示されるシアネートエステル樹
脂に、フェノール性水酸基を有する重合体が配合されて
なることを特徴とする熱硬化性樹脂組成物。Claim 1 General formula [1] [Formula 1] (wherein A is an aromatic ring or a group containing an aromatic ring, B is a C7-
C20 polycyclic alicyclic group, D is each independently a substituent containing no active hydrogen group, p, q, r are each independently an integer of 0 to 3, provided that the total of p, q, r is 2 That's all. Furthermore, each s is an integer from 0 to 4, and x is an integer from 0 to 5.
is an integer up to . 1. A thermosetting resin composition characterized in that a cyanate ester resin represented by the following formula is blended with a polymer having a phenolic hydroxyl group.
織布に、請求項1記載の熱硬化性樹脂組成物を30〜7
0重量%含浸させてなることを特徴とするプレプリーグ
。2. The thermosetting resin composition according to claim 1 is applied to a woven or non-woven fabric made of inorganic fibers or organic fibers.
A prepurig characterized by being impregnated with 0% by weight.
織布に、請求項1記載の熱硬化性樹脂組成物を30〜7
0重量%含浸させて得られたプレプリーグを積層して、
表面に銅箔を貼り合わせてなることを特徴とする銅張積
層板。3. The thermosetting resin composition according to claim 1 is applied to a woven or nonwoven fabric of inorganic fibers or organic fibers in an amount of 30 to 70%.
By laminating the prepregs obtained by impregnating 0% by weight,
Copper-clad laminates are characterized by having copper foil laminated on the surface.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13366091A JPH04300952A (en) | 1991-03-28 | 1991-03-28 | Thermosetting resin composition and prepreg and copper-clad laminated board produced by using the same |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13366091A JPH04300952A (en) | 1991-03-28 | 1991-03-28 | Thermosetting resin composition and prepreg and copper-clad laminated board produced by using the same |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH04300952A true JPH04300952A (en) | 1992-10-23 |
Family
ID=15109959
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13366091A Pending JPH04300952A (en) | 1991-03-28 | 1991-03-28 | Thermosetting resin composition and prepreg and copper-clad laminated board produced by using the same |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH04300952A (en) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06177547A (en) * | 1992-12-09 | 1994-06-24 | Nec Corp | Multilayer interconnection board |
US5955543A (en) * | 1996-01-11 | 1999-09-21 | International Business Machines Corporation | Aryl cyanate and/or diepoxide and hydroxymethylated phenolic or hydroxystyrene resin |
JP2015082661A (en) * | 2013-10-22 | 2015-04-27 | サムソン エレクトロ−メカニックス カンパニーリミテッド. | Insulating substrate for printed circuit board and printed circuit board |
JP2016011410A (en) * | 2014-06-05 | 2016-01-21 | 信越化学工業株式会社 | Thermosetting resin composition |
CN105899626A (en) * | 2014-02-27 | 2016-08-24 | 株式会社日立产机系统 | ink for ink-jet printing |
CN111440364A (en) * | 2020-03-27 | 2020-07-24 | 浙江华正新材料股份有限公司 | Resin composition, prepreg, circuit board and printed circuit board |
-
1991
- 1991-03-28 JP JP13366091A patent/JPH04300952A/en active Pending
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06177547A (en) * | 1992-12-09 | 1994-06-24 | Nec Corp | Multilayer interconnection board |
US5955543A (en) * | 1996-01-11 | 1999-09-21 | International Business Machines Corporation | Aryl cyanate and/or diepoxide and hydroxymethylated phenolic or hydroxystyrene resin |
US6114450A (en) * | 1996-01-11 | 2000-09-05 | International Business Corporation | Aryl Cyanate and/or diepoxide and tetrahydropyranyl-protected hydroxymethylated phenolic or hydroxystyrene resin |
JP2015082661A (en) * | 2013-10-22 | 2015-04-27 | サムソン エレクトロ−メカニックス カンパニーリミテッド. | Insulating substrate for printed circuit board and printed circuit board |
CN105899626A (en) * | 2014-02-27 | 2016-08-24 | 株式会社日立产机系统 | ink for ink-jet printing |
JP2016011410A (en) * | 2014-06-05 | 2016-01-21 | 信越化学工業株式会社 | Thermosetting resin composition |
CN111440364A (en) * | 2020-03-27 | 2020-07-24 | 浙江华正新材料股份有限公司 | Resin composition, prepreg, circuit board and printed circuit board |
CN111440364B (en) * | 2020-03-27 | 2022-12-27 | 浙江华正新材料股份有限公司 | Resin composition, prepreg, circuit board and printed circuit board |
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