JPH04223466A - Photosensitive planographic printing plate - Google Patents
Photosensitive planographic printing plateInfo
- Publication number
- JPH04223466A JPH04223466A JP41373290A JP41373290A JPH04223466A JP H04223466 A JPH04223466 A JP H04223466A JP 41373290 A JP41373290 A JP 41373290A JP 41373290 A JP41373290 A JP 41373290A JP H04223466 A JPH04223466 A JP H04223466A
- Authority
- JP
- Japan
- Prior art keywords
- printing plate
- photosensitive
- acid
- ether
- present
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 claims abstract description 15
- 235000014113 dietary fatty acids Nutrition 0.000 claims abstract description 11
- 239000000194 fatty acid Substances 0.000 claims abstract description 11
- 229930195729 fatty acid Natural products 0.000 claims abstract description 11
- 150000004665 fatty acids Chemical class 0.000 claims abstract description 11
- JVICFMRAVNKDOE-UHFFFAOYSA-M ethyl violet Chemical compound [Cl-].C1=CC(N(CC)CC)=CC=C1C(C=1C=CC(=CC=1)N(CC)CC)=C1C=CC(=[N+](CC)CC)C=C1 JVICFMRAVNKDOE-UHFFFAOYSA-M 0.000 claims abstract description 5
- 150000001983 dialkylethers Chemical class 0.000 claims abstract description 4
- 150000001346 alkyl aryl ethers Chemical class 0.000 claims abstract 2
- -1 quinonediazide compound Chemical class 0.000 claims description 36
- 238000000576 coating method Methods 0.000 claims description 18
- 239000011248 coating agent Substances 0.000 claims description 17
- 125000004432 carbon atom Chemical group C* 0.000 claims description 4
- 239000007788 liquid Substances 0.000 claims description 4
- 239000000463 material Substances 0.000 claims description 4
- 230000035945 sensitivity Effects 0.000 abstract description 8
- 238000004519 manufacturing process Methods 0.000 abstract description 4
- 238000004040 coloring Methods 0.000 abstract 2
- 230000001473 noxious effect Effects 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
- 229920005989 resin Polymers 0.000 description 22
- 239000011347 resin Substances 0.000 description 22
- 239000000975 dye Substances 0.000 description 19
- 238000000034 method Methods 0.000 description 17
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 15
- 150000001875 compounds Chemical class 0.000 description 14
- 238000011282 treatment Methods 0.000 description 14
- 239000000243 solution Substances 0.000 description 13
- 239000000126 substance Substances 0.000 description 13
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 12
- 229910052782 aluminium Inorganic materials 0.000 description 12
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 12
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 9
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 9
- 238000011161 development Methods 0.000 description 9
- 239000000203 mixture Substances 0.000 description 9
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 6
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 6
- HUMNYLRZRPPJDN-UHFFFAOYSA-N benzaldehyde Chemical compound O=CC1=CC=CC=C1 HUMNYLRZRPPJDN-UHFFFAOYSA-N 0.000 description 6
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 6
- RLSSMJSEOOYNOY-UHFFFAOYSA-N m-cresol Chemical compound CC1=CC=CC(O)=C1 RLSSMJSEOOYNOY-UHFFFAOYSA-N 0.000 description 6
- 150000002989 phenols Chemical class 0.000 description 6
- WQGWDDDVZFFDIG-UHFFFAOYSA-N pyrogallol Chemical compound OC1=CC=CC(O)=C1O WQGWDDDVZFFDIG-UHFFFAOYSA-N 0.000 description 6
- 239000002904 solvent Substances 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- 239000002253 acid Substances 0.000 description 5
- 239000007864 aqueous solution Substances 0.000 description 5
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 5
- 229920000642 polymer Polymers 0.000 description 5
- 229920002554 vinyl polymer Polymers 0.000 description 5
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- 150000001299 aldehydes Chemical class 0.000 description 4
- 125000000217 alkyl group Chemical group 0.000 description 4
- 238000009833 condensation Methods 0.000 description 4
- 230000005494 condensation Effects 0.000 description 4
- 239000013078 crystal Substances 0.000 description 4
- 238000000866 electrolytic etching Methods 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 4
- 239000000178 monomer Substances 0.000 description 4
- IWDCLRJOBJJRNH-UHFFFAOYSA-N p-cresol Chemical compound CC1=CC=C(O)C=C1 IWDCLRJOBJJRNH-UHFFFAOYSA-N 0.000 description 4
- KJFMBFZCATUALV-UHFFFAOYSA-N phenolphthalein Chemical compound C1=CC(O)=CC=C1C1(C=2C=CC(O)=CC=2)C2=CC=CC=C2C(=O)O1 KJFMBFZCATUALV-UHFFFAOYSA-N 0.000 description 4
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 4
- 238000007789 sealing Methods 0.000 description 4
- 125000001424 substituent group Chemical group 0.000 description 4
- 230000001988 toxicity Effects 0.000 description 4
- 231100000419 toxicity Toxicity 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- WTQZSMDDRMKJRI-UHFFFAOYSA-N 4-diazoniophenolate Chemical compound [O-]C1=CC=C([N+]#N)C=C1 WTQZSMDDRMKJRI-UHFFFAOYSA-N 0.000 description 3
- 229930192627 Naphthoquinone Natural products 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 3
- 239000004115 Sodium Silicate Substances 0.000 description 3
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 3
- 238000007743 anodising Methods 0.000 description 3
- 239000011230 binding agent Substances 0.000 description 3
- 229940118056 cresol / formaldehyde Drugs 0.000 description 3
- ZXJXZNDDNMQXFV-UHFFFAOYSA-M crystal violet Chemical compound [Cl-].C1=CC(N(C)C)=CC=C1[C+](C=1C=CC(=CC=1)N(C)C)C1=CC=C(N(C)C)C=C1 ZXJXZNDDNMQXFV-UHFFFAOYSA-M 0.000 description 3
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 description 3
- 150000002576 ketones Chemical class 0.000 description 3
- 150000002791 naphthoquinones Chemical class 0.000 description 3
- QNGNSVIICDLXHT-UHFFFAOYSA-N para-ethylbenzaldehyde Natural products CCC1=CC=C(C=O)C=C1 QNGNSVIICDLXHT-UHFFFAOYSA-N 0.000 description 3
- 238000005498 polishing Methods 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- 229940079877 pyrogallol Drugs 0.000 description 3
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 3
- 229910052911 sodium silicate Inorganic materials 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- PRZSXZWFJHEZBJ-UHFFFAOYSA-N thymol blue Chemical compound C1=C(O)C(C(C)C)=CC(C2(C3=CC=CC=C3S(=O)(=O)O2)C=2C(=CC(O)=C(C(C)C)C=2)C)=C1C PRZSXZWFJHEZBJ-UHFFFAOYSA-N 0.000 description 3
- ROVRRJSRRSGUOL-UHFFFAOYSA-N victoria blue bo Chemical compound [Cl-].C12=CC=CC=C2C(NCC)=CC=C1C(C=1C=CC(=CC=1)N(CC)CC)=C1C=CC(=[N+](CC)CC)C=C1 ROVRRJSRRSGUOL-UHFFFAOYSA-N 0.000 description 3
- HTQNYBBTZSBWKL-UHFFFAOYSA-N 2,3,4-trihydroxbenzophenone Chemical compound OC1=C(O)C(O)=CC=C1C(=O)C1=CC=CC=C1 HTQNYBBTZSBWKL-UHFFFAOYSA-N 0.000 description 2
- SBASXUCJHJRPEV-UHFFFAOYSA-N 2-(2-methoxyethoxy)ethanol Chemical compound COCCOCCO SBASXUCJHJRPEV-UHFFFAOYSA-N 0.000 description 2
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 2
- TUAMRELNJMMDMT-UHFFFAOYSA-N 3,5-xylenol Chemical compound CC1=CC(C)=CC(O)=C1 TUAMRELNJMMDMT-UHFFFAOYSA-N 0.000 description 2
- AXDJCCTWPBKUKL-UHFFFAOYSA-N 4-[(4-aminophenyl)-(4-imino-3-methylcyclohexa-2,5-dien-1-ylidene)methyl]aniline;hydron;chloride Chemical compound Cl.C1=CC(=N)C(C)=CC1=C(C=1C=CC(N)=CC=1)C1=CC=C(N)C=C1 AXDJCCTWPBKUKL-UHFFFAOYSA-N 0.000 description 2
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 2
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- RRHGJUQNOFWUDK-UHFFFAOYSA-N Isoprene Chemical compound CC(=C)C=C RRHGJUQNOFWUDK-UHFFFAOYSA-N 0.000 description 2
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- BELBBZDIHDAJOR-UHFFFAOYSA-N Phenolsulfonephthalein Chemical compound C1=CC(O)=CC=C1C1(C=2C=CC(O)=CC=2)C2=CC=CC=C2S(=O)(=O)O1 BELBBZDIHDAJOR-UHFFFAOYSA-N 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 2
- GRPFBMKYXAYEJM-UHFFFAOYSA-M [4-[(2-chlorophenyl)-[4-(dimethylamino)phenyl]methylidene]cyclohexa-2,5-dien-1-ylidene]-dimethylazanium;chloride Chemical compound [Cl-].C1=CC(N(C)C)=CC=C1C(C=1C(=CC=CC=1)Cl)=C1C=CC(=[N+](C)C)C=C1 GRPFBMKYXAYEJM-UHFFFAOYSA-M 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- 229910052783 alkali metal Inorganic materials 0.000 description 2
- 229960001506 brilliant green Drugs 0.000 description 2
- HXCILVUBKWANLN-UHFFFAOYSA-N brilliant green cation Chemical compound C1=CC(N(CC)CC)=CC=C1C(C=1C=CC=CC=1)=C1C=CC(=[N+](CC)CC)C=C1 HXCILVUBKWANLN-UHFFFAOYSA-N 0.000 description 2
- UDSAIICHUKSCKT-UHFFFAOYSA-N bromophenol blue Chemical compound C1=C(Br)C(O)=C(Br)C=C1C1(C=2C=C(Br)C(O)=C(Br)C=2)C2=CC=CC=C2S(=O)(=O)O1 UDSAIICHUKSCKT-UHFFFAOYSA-N 0.000 description 2
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- FJKIXWOMBXYWOQ-UHFFFAOYSA-N ethenoxyethane Chemical compound CCOC=C FJKIXWOMBXYWOQ-UHFFFAOYSA-N 0.000 description 2
- XJRPTMORGOIMMI-UHFFFAOYSA-N ethyl 2-amino-4-(trifluoromethyl)-1,3-thiazole-5-carboxylate Chemical compound CCOC(=O)C=1SC(N)=NC=1C(F)(F)F XJRPTMORGOIMMI-UHFFFAOYSA-N 0.000 description 2
- HYBBIBNJHNGZAN-UHFFFAOYSA-N furfural Chemical compound O=CC1=CC=CO1 HYBBIBNJHNGZAN-UHFFFAOYSA-N 0.000 description 2
- 229940107698 malachite green Drugs 0.000 description 2
- FDZZZRQASAIRJF-UHFFFAOYSA-M malachite green Chemical compound [Cl-].C1=CC(N(C)C)=CC=C1C(C=1C=CC=CC=1)=C1C=CC(=[N+](C)C)C=C1 FDZZZRQASAIRJF-UHFFFAOYSA-M 0.000 description 2
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 2
- 238000010297 mechanical methods and process Methods 0.000 description 2
- 229910001507 metal halide Inorganic materials 0.000 description 2
- DWCZIOOZPIDHAB-UHFFFAOYSA-L methyl green Chemical compound [Cl-].[Cl-].C1=CC(N(C)C)=CC=C1C(C=1C=CC(=CC=1)[N+](C)(C)C)=C1C=CC(=[N+](C)C)C=C1 DWCZIOOZPIDHAB-UHFFFAOYSA-L 0.000 description 2
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 2
- SHXOKQKTZJXHHR-UHFFFAOYSA-N n,n-diethyl-5-iminobenzo[a]phenoxazin-9-amine;hydrochloride Chemical compound [Cl-].C1=CC=C2C3=NC4=CC=C(N(CC)CC)C=C4OC3=CC(=[NH2+])C2=C1 SHXOKQKTZJXHHR-UHFFFAOYSA-N 0.000 description 2
- 150000002825 nitriles Chemical class 0.000 description 2
- 229920003986 novolac Polymers 0.000 description 2
- QWVGKYWNOKOFNN-UHFFFAOYSA-N o-cresol Chemical compound CC1=CC=CC=C1O QWVGKYWNOKOFNN-UHFFFAOYSA-N 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 229960003531 phenolsulfonphthalein Drugs 0.000 description 2
- 239000002985 plastic film Substances 0.000 description 2
- 229920006255 plastic film Polymers 0.000 description 2
- 238000006068 polycondensation reaction Methods 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 235000019795 sodium metasilicate Nutrition 0.000 description 2
- 239000004094 surface-active agent Substances 0.000 description 2
- MGSRCZKZVOBKFT-UHFFFAOYSA-N thymol Chemical compound CC(C)C1=CC=C(C)C=C1O MGSRCZKZVOBKFT-UHFFFAOYSA-N 0.000 description 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 2
- 229910052725 zinc Inorganic materials 0.000 description 2
- 239000011701 zinc Substances 0.000 description 2
- GBQZZLQKUYLGFT-UHFFFAOYSA-N (2,4-dihydroxyphenyl)-(2,3,4-trihydroxyphenyl)methanone Chemical compound OC1=CC(O)=CC=C1C(=O)C1=CC=C(O)C(O)=C1O GBQZZLQKUYLGFT-UHFFFAOYSA-N 0.000 description 1
- MUTGBJKUEZFXGO-OLQVQODUSA-N (3as,7ar)-3a,4,5,6,7,7a-hexahydro-2-benzofuran-1,3-dione Chemical compound C1CCC[C@@H]2C(=O)OC(=O)[C@@H]21 MUTGBJKUEZFXGO-OLQVQODUSA-N 0.000 description 1
- KMOUUZVZFBCRAM-OLQVQODUSA-N (3as,7ar)-3a,4,7,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1C=CC[C@@H]2C(=O)OC(=O)[C@@H]21 KMOUUZVZFBCRAM-OLQVQODUSA-N 0.000 description 1
- QJZZHNDRXWSQMZ-UHFFFAOYSA-N 1,3-diphenyl-2,4-dihydrotriazine Chemical compound C1C=CN(C=2C=CC=CC=2)NN1C1=CC=CC=C1 QJZZHNDRXWSQMZ-UHFFFAOYSA-N 0.000 description 1
- UOFGSWVZMUXXIY-UHFFFAOYSA-N 1,5-Diphenyl-3-thiocarbazone Chemical compound C=1C=CC=CC=1N=NC(=S)NNC1=CC=CC=C1 UOFGSWVZMUXXIY-UHFFFAOYSA-N 0.000 description 1
- DNJRKFKAFWSXSE-UHFFFAOYSA-N 1-chloro-2-ethenoxyethane Chemical compound ClCCOC=C DNJRKFKAFWSXSE-UHFFFAOYSA-N 0.000 description 1
- KTZVZZJJVJQZHV-UHFFFAOYSA-N 1-chloro-4-ethenylbenzene Chemical compound ClC1=CC=C(C=C)C=C1 KTZVZZJJVJQZHV-UHFFFAOYSA-N 0.000 description 1
- OZCMOJQQLBXBKI-UHFFFAOYSA-N 1-ethenoxy-2-methylpropane Chemical compound CC(C)COC=C OZCMOJQQLBXBKI-UHFFFAOYSA-N 0.000 description 1
- RCSKFKICHQAKEZ-UHFFFAOYSA-N 1-ethenylindole Chemical compound C1=CC=C2N(C=C)C=CC2=C1 RCSKFKICHQAKEZ-UHFFFAOYSA-N 0.000 description 1
- RRQYJINTUHWNHW-UHFFFAOYSA-N 1-ethoxy-2-(2-ethoxyethoxy)ethane Chemical compound CCOCCOCCOCC RRQYJINTUHWNHW-UHFFFAOYSA-N 0.000 description 1
- VFNKZQNIXUFLBC-UHFFFAOYSA-N 2',7'-dichlorofluorescein Chemical compound O1C(=O)C2=CC=CC=C2C21C1=CC(Cl)=C(O)C=C1OC1=C2C=C(Cl)C(O)=C1 VFNKZQNIXUFLBC-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- OEPOKWHJYJXUGD-UHFFFAOYSA-N 2-(3-phenylmethoxyphenyl)-1,3-thiazole-4-carbaldehyde Chemical compound O=CC1=CSC(C=2C=C(OCC=3C=CC=CC=3)C=CC=2)=N1 OEPOKWHJYJXUGD-UHFFFAOYSA-N 0.000 description 1
- FALRKNHUBBKYCC-UHFFFAOYSA-N 2-(chloromethyl)pyridine-3-carbonitrile Chemical compound ClCC1=NC=CC=C1C#N FALRKNHUBBKYCC-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- DKBZDWDOSPZINT-UHFFFAOYSA-N 2-[4-(diethylamino)anilino]-2-oxo-n-phenylethanimidoyl cyanide Chemical compound C1=CC(N(CC)CC)=CC=C1NC(=O)C(C#N)=NC1=CC=CC=C1 DKBZDWDOSPZINT-UHFFFAOYSA-N 0.000 description 1
- IOOMXAQUNPWDLL-UHFFFAOYSA-N 2-[6-(diethylamino)-3-(diethyliminiumyl)-3h-xanthen-9-yl]-5-sulfobenzene-1-sulfonate Chemical compound C=12C=CC(=[N+](CC)CC)C=C2OC2=CC(N(CC)CC)=CC=C2C=1C1=CC=C(S(O)(=O)=O)C=C1S([O-])(=O)=O IOOMXAQUNPWDLL-UHFFFAOYSA-N 0.000 description 1
- WHBAYNMEIXUTJV-UHFFFAOYSA-N 2-chloroethyl prop-2-enoate Chemical compound ClCCOC(=O)C=C WHBAYNMEIXUTJV-UHFFFAOYSA-N 0.000 description 1
- MZNSQRLUUXWLSB-UHFFFAOYSA-N 2-ethenyl-1h-pyrrole Chemical compound C=CC1=CC=CN1 MZNSQRLUUXWLSB-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- CWBAMDVCIHSKNW-UHFFFAOYSA-N 2-iminonaphthalene-1,4-dione Chemical compound C1=CC=C2C(=O)C(=N)CC(=O)C2=C1 CWBAMDVCIHSKNW-UHFFFAOYSA-N 0.000 description 1
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 description 1
- FCYVWWWTHPPJII-UHFFFAOYSA-N 2-methylidenepropanedinitrile Chemical compound N#CC(=C)C#N FCYVWWWTHPPJII-UHFFFAOYSA-N 0.000 description 1
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 1
- CFVWNXQPGQOHRJ-UHFFFAOYSA-N 2-methylpropyl prop-2-enoate Chemical compound CC(C)COC(=O)C=C CFVWNXQPGQOHRJ-UHFFFAOYSA-N 0.000 description 1
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- 238000003860 storage Methods 0.000 description 1
- 150000003440 styrenes Chemical class 0.000 description 1
- 229940014800 succinic anhydride Drugs 0.000 description 1
- YBBRCQOCSYXUOC-UHFFFAOYSA-N sulfuryl dichloride Chemical compound ClS(Cl)(=O)=O YBBRCQOCSYXUOC-UHFFFAOYSA-N 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 229960000790 thymol Drugs 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- 229940001496 tribasic sodium phosphate Drugs 0.000 description 1
- 125000004385 trihaloalkyl group Chemical group 0.000 description 1
- XZZNDPSIHUTMOC-UHFFFAOYSA-N triphenyl phosphate Chemical class C=1C=CC=CC=1OP(OC=1C=CC=CC=1)(=O)OC1=CC=CC=C1 XZZNDPSIHUTMOC-UHFFFAOYSA-N 0.000 description 1
- AAAQKTZKLRYKHR-UHFFFAOYSA-N triphenylmethane Chemical compound C1=CC=CC=C1C(C=1C=CC=CC=1)C1=CC=CC=C1 AAAQKTZKLRYKHR-UHFFFAOYSA-N 0.000 description 1
- RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 description 1
- 125000002221 trityl group Chemical group [H]C1=C([H])C([H])=C([H])C([H])=C1C([*])(C1=C(C(=C(C(=C1[H])[H])[H])[H])[H])C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- KOZCZZVUFDCZGG-UHFFFAOYSA-N vinyl benzoate Chemical compound C=COC(=O)C1=CC=CC=C1 KOZCZZVUFDCZGG-UHFFFAOYSA-N 0.000 description 1
- 229920001567 vinyl ester resin Polymers 0.000 description 1
- 229920003169 water-soluble polymer Polymers 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
Description
【0001】0001
【産業上の利用分野】本発明は感光性平版印刷版に関し
、更に詳しくは臭気、毒性の少ない新規な塗布溶剤を用
いて製造される感光性平版印刷版に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a photosensitive lithographic printing plate, and more particularly to a photosensitive lithographic printing plate manufactured using a novel coating solvent with low odor and toxicity.
【0002】0002
【従来の技術】ポジ型感光性平版印刷版とは、一般に親
水性支持体上に露光により可溶化するインキ受容性感光
層を形成したものである。この感光層に画像露光を行い
現像すると、画像部を残して非画線部は除去されるので
、画像が形成される。印刷においては、画像部が親油性
で非画像部が親水性であるという性質上の差が利用され
る。2. Description of the Related Art Positive-working photosensitive lithographic printing plates generally have an ink-receptive photosensitive layer formed on a hydrophilic support, which becomes solubilized by exposure to light. When this photosensitive layer is subjected to imagewise exposure and development, the non-image areas are removed while leaving the image areas, thereby forming an image. In printing, the difference in properties of image areas being lipophilic and non-image areas being hydrophilic is utilized.
【0003】このようなポジ型の感光性平版印刷版の感
光層には、通常感光性物質としてのキノンジアジド化合
物、また皮膜強度とアルカリ溶解性とを高めるための成
分としてのアルカリ可溶性樹脂に加えて、露光可視画性
等を高めるために色素を含有している。The photosensitive layer of such a positive photosensitive lithographic printing plate usually contains a quinonediazide compound as a photosensitive substance, and an alkali-soluble resin as a component for increasing film strength and alkali solubility. , Contains a dye to improve visible image quality upon exposure.
【0004】上記のような感光層は、通常キノンジアジ
ド化合物、アルカリ可溶性樹脂、色素等を含有する組成
物を、エチレングリコールモノメチルエーテル、エチレ
ングリコールモノエチルエーテル等の塗布溶剤に溶解し
た塗布液を支持体上に塗布することによって得られる。[0004] The above-mentioned photosensitive layer is usually prepared by using a coating solution prepared by dissolving a composition containing a quinonediazide compound, an alkali-soluble resin, a dye, etc. in a coating solvent such as ethylene glycol monomethyl ether or ethylene glycol monoethyl ether on a support. Obtained by applying on top.
【0005】[0005]
【発明が解決しようとする課題】上記のように得られた
感光性平版印刷版を、露光、現像処理して平版印刷版が
得られるが、この際、非画像部の除去が完全でなく、現
像後も感光膜が残存する、いわゆる残膜という現象が生
じ、更に現像後の色素残りも大きいという問題があった
。[Problems to be Solved by the Invention] The photosensitive planographic printing plate obtained as described above is exposed and developed to obtain a planographic printing plate, but at this time, the non-image areas are not completely removed; There is a problem in that a photoresist film remains even after development, a so-called residual film phenomenon, and a large amount of dye remains after development.
【0006】このような問題に対し、特開平2−967
61号公報においては、特定の高級脂肪酸を用いる方法
が開示されており、これにより、前記残膜及び色素残り
は改良されたが、一方で感度及び以下の如き、いわゆる
アンダー現像性が劣化することが明らかとなった。[0006] To address this problem, Japanese Patent Application Laid-Open No. 2-967
No. 61 discloses a method using a specific higher fatty acid, which improves the residual film and dye residue, but on the other hand, the sensitivity and the so-called under-developability as described below deteriorate. became clear.
【0007】すなわち、ポジ型の感光性平版印刷版の現
像処理は通常アルカリ水溶液から成る現像液中で行なわ
れるが、現像液の現像能力は種々の条件で変動を受けや
すく、例えば大量処理による疲労や空気酸化による劣化
で現像能力が低下し、処理しても印刷版の非画像部の感
光層が完全に溶解されなくなる場合がある。このような
適正な現像結果が得られる現像能力低下の許容範囲を「
アンダー現像性」と称す。In other words, the development of positive photosensitive lithographic printing plates is normally carried out in a developer consisting of an alkaline aqueous solution, but the developing ability of the developer is subject to fluctuations under various conditions, such as fatigue caused by large-scale processing. The developing ability decreases due to deterioration due to oxidation and air oxidation, and the photosensitive layer in the non-image area of the printing plate may not be completely dissolved even after processing. The allowable range of developing ability reduction that allows for proper developing results to be obtained is defined as "
This is called "under-developability."
【0008】更に前記の如き塗布溶剤は、臭気、毒性が
強いため、製造時及び製造後における作業環境上の大き
な問題点となっていた。Furthermore, the above-mentioned coating solvent has a strong odor and toxicity, which poses a major problem in terms of the working environment during and after production.
【0009】従って、本発明の目的は、製造時又は製造
後における臭気及び毒性が極めて少なく、残膜及び色素
残りが改良され、尚かつアンダー現像性に優れ、高い感
度を有する感光性平版印刷版を提供することにある。Therefore, an object of the present invention is to provide a photosensitive lithographic printing plate that has extremely low odor and toxicity during or after production, has improved residual film and dye residue, has excellent under-developability, and has high sensitivity. Our goal is to provide the following.
【0010】0010
【課題を解決するための手段】本発明者等は前記課題に
鑑みて鋭意研究の結果、本発明の上記目的は、支持体上
に、少なくとも(a)キノンジアジド化合物、(b)ジ
エチレングリコールのモノアルキルエーテル又はジアル
キルエーテル、(c)炭素原子数10〜25の脂肪酸、
及び(d)色素を含有する感光性塗布液を塗布してなる
感光性平版印刷版を提供することにより達成されること
を見出した。[Means for Solving the Problems] In view of the above-mentioned problems, the present inventors have conducted extensive research and found that the above-mentioned object of the present invention is to provide at least (a) a quinonediazide compound, (b) a monoalkyl diethylene glycol compound on a support. ether or dialkyl ether, (c) fatty acid having 10 to 25 carbon atoms,
and (d) it has been found that the present invention can be achieved by providing a photosensitive lithographic printing plate coated with a photosensitive coating solution containing a dye.
【0011】以下に本発明を更に詳細に説明する。The present invention will be explained in more detail below.
【0012】本発明においてはジエチレングリコールの
モノアルキルエーテル又はジアルキルエーテルが用いら
れるが、このような化合物として特に好ましくは、ジエ
チレングリコールモノメチルエーテル、ジエチレングリ
コールモノエチルエーテル、ジエチレングリコールジメ
チルエーテル又はジエチレングリコールジエチルエーテ
ルが用いられる。[0012] In the present invention, diethylene glycol monoalkyl ether or dialkyl ether is used, and particularly preferred as such a compound are diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol dimethyl ether, or diethylene glycol diethyl ether.
【0013】上記ジエチレングリコールアルキルエーテ
ルは用いられる塗布溶剤中40重量%含有される。The diethylene glycol alkyl ether is contained in an amount of 40% by weight in the coating solvent used.
【0014】本発明の感光性平版印刷版には、炭素原子
数10〜25の脂肪酸が含有されるが、このような脂肪
酸として、好ましくは脂肪族モノカルボン酸が用いられ
る。
炭素原子数が10より少ないと残膜、色素残り、アンダ
ー現像性の改良がわずかであり、また25より多い場合
には溶剤への溶解性が劣るために塗布性を悪化させる場
合がある。The photosensitive lithographic printing plate of the present invention contains a fatty acid having 10 to 25 carbon atoms, and preferably an aliphatic monocarboxylic acid is used as such fatty acid. If the number of carbon atoms is less than 10, there will be little improvement in residual film, dye residue, and under-developability, and if it is more than 25, the solubility in solvents may be poor, resulting in poor coating properties.
【0015】具体的には以下の化合物が用いられる。Specifically, the following compounds are used.
【0016】[0016]
【化1】[Chemical formula 1]
【0017】[0017]
【化2】
上記脂肪酸は感光性平版印刷版中、好ましくは0.2〜
8重量%含有される。[Chemical formula 2] The above fatty acid is preferably 0.2 to
Contains 8% by weight.
【0018】本発明において用いられるキノンジアジド
化合物としては、例えば、オルトナフトキノンジアジド
スルホン酸と、フェノール類及びアルデヒド又はケトン
の重縮合樹脂とのエステル化合物が挙げられる。Examples of the quinonediazide compound used in the present invention include ester compounds of orthonaphthoquinonediazide sulfonic acid and polycondensation resins of phenols and aldehydes or ketones.
【0019】前記のフェノール類としては、例えば、フ
ェノール、o−クレゾール、m−クレゾール、p−クレ
ゾール、3,5−キシレノール、カルバクロール、チモ
ール等の一価フェノール、カテコール、レゾルシン、ヒ
ドロキノン等の二価フェノール、ピロガロール、フロロ
グルシン等の三価フェノール等が挙げられる。Examples of the above-mentioned phenols include monohydric phenols such as phenol, o-cresol, m-cresol, p-cresol, 3,5-xylenol, carvacrol, and thymol, and dihydric phenols such as catechol, resorcinol, and hydroquinone. Examples include trihydric phenols such as phenols, pyrogallol, and phloroglucin.
【0020】前記のアルデヒドとしては、ホルムアルデ
ヒド、ベンズアルデヒド、アセトアルデヒド、クロトン
アルデヒド、フルフラール等が挙げられる。これらのア
ルデヒドのうち好ましいものは、ホルムアルデヒド及び
ベンズアルデヒドである。[0020] Examples of the aldehyde include formaldehyde, benzaldehyde, acetaldehyde, crotonaldehyde, and furfural. Preferred among these aldehydes are formaldehyde and benzaldehyde.
【0021】更に前記のケトンとしては、アセトン、メ
チルエチルケトン等が挙げられる。[0021] Further, examples of the above-mentioned ketones include acetone and methyl ethyl ketone.
【0022】前記重縮合樹脂の具体的な例としては、フ
ェノール・ホルムアルデヒド樹脂、m−クレゾール・ホ
ルムアルデヒド樹脂、m−,p−混合クレゾール・ホル
ムアルデヒド樹脂、レゾルシン・ベンズアルデヒド樹脂
、ピロガロール・アセトン樹脂等が挙げられる。Specific examples of the polycondensation resin include phenol/formaldehyde resin, m-cresol/formaldehyde resin, m-, p-mixed cresol/formaldehyde resin, resorcinol/benzaldehyde resin, pyrogallol/acetone resin, etc. It will be done.
【0023】前記オルトナフトキノンジアジド化合物の
フェノール類のOH基に対するo−ナフトキノンジアジ
ドスルホン酸の縮合率(OH基1個に対する反応率)は
、15〜80%が好ましく、より好ましくは20〜45
%である。The condensation rate of o-naphthoquinonediazide sulfonic acid with respect to the OH group of the phenol in the orthonaphthoquinonediazide compound (reaction rate with respect to one OH group) is preferably 15 to 80%, more preferably 20 to 45%.
%.
【0024】本発明に用いられる上記キノンジアジドを
含む高分子化合物は、塗布性を考慮すると、重量平均分
子量が1,000以上のものが好ましく、更に好ましく
は、1,500以上の分子量を有するものである。The quinonediazide-containing polymer compound used in the present invention preferably has a weight average molecular weight of 1,000 or more, more preferably 1,500 or more, in view of coating properties. be.
【0025】更に本発明に用いられるキノンジアジド化
合物としては、特開昭58−43451号公報に記載さ
れた化合物が挙げられる。また、2,3,4−トリヒド
ロキシベンゾフェノン、2,3,4,4−テトラヒドロ
キシベンゾフェノン、2,3,4,2′,4′−ペンタ
ヒドロキシベンゾフェノン、2,3,4,3′,4′,
5′−ヘキサヒドロキシベンゾフェノン等とオルトキノ
ンジアジド基との縮合化合物も使用することができる。Further, examples of the quinonediazide compound used in the present invention include those described in JP-A-58-43451. Also, 2,3,4-trihydroxybenzophenone, 2,3,4,4-tetrahydroxybenzophenone, 2,3,4,2',4'-pentahydroxybenzophenone, 2,3,4,3',4 ′、
Condensation compounds of 5'-hexahydroxybenzophenone and the like and orthoquinonediazide groups can also be used.
【0026】上記キノンジアジド化合物のうち、1,2
−ベンゾキノンジアジドスルホニルクロリド又は1,2
−ナフトキノンジアジドスルホニルクロリドとピロガロ
ール・アセトン縮合樹脂又は2,3,4−トリヒドロキ
シベンゾフェノンを反応させて得られるオルトキノンジ
アジドエステル化合物が最も好ましい。Among the above quinonediazide compounds, 1 and 2
-benzoquinonediazide sulfonyl chloride or 1,2
Most preferred is an orthoquinonediazide ester compound obtained by reacting -naphthoquinonediazide sulfonyl chloride with a pyrogallol/acetone condensation resin or 2,3,4-trihydroxybenzophenone.
【0027】本発明に用いられるキノンジアジド化合物
としては、上記化合物を各々単独で用いてもよいし、2
種以上の化合物を組合せて用いてもよい。As the quinonediazide compound used in the present invention, each of the above compounds may be used alone, or two
A combination of two or more kinds of compounds may be used.
【0028】キノンジアジド化合物の好ましい使用量は
、感光性平版印刷版中の10〜40重量%である。The preferred amount of the quinonediazide compound used is 10 to 40% by weight in the photosensitive planographic printing plate.
【0029】また、キノンジアジド基として特に好まし
いものは1,2−キノンジアジドの4−又は5−スルホ
ン酸基もしくは1,2−キノンジアジドの4又は5−カ
ルボキシル基である。Particularly preferred as the quinonediazide group are the 4- or 5-sulfonic acid group of 1,2-quinonediazide or the 4- or 5-carboxyl group of 1,2-quinonediazide.
【0030】また、本発明の感光性平版印刷版には色素
を含有するが、このような色素には染料とともに顔料も
含まれ、無機の顔料も用いることができるが、特に酸に
よって色調を変化させる有機染料を用いることが好まし
い。The photosensitive lithographic printing plate of the present invention contains a dye, and such a dye includes a pigment as well as a dye, and inorganic pigments can also be used, but in particular, the color tone cannot be changed by acid. It is preferable to use organic dyes that cause
【0031】用いられる有機染料としては、例えばジフ
ェニルメタン系、トリフェニルメタン系、チアジン系、
オキサジン系、キサンテン系、アントラキノン系、イミ
ノナフトキノン系、アゾメチン系のものを挙げることが
できる。Examples of the organic dyes used include diphenylmethane, triphenylmethane, thiazine,
Examples include oxazine-based, xanthene-based, anthraquinone-based, iminonaphthoquinone-based, and azomethine-based.
【0032】これら有機染料としては、例えばアイゼン
ブリリアントベーシックシアニン6GH[保土ヶ谷化学
工業(株)製]、アストラニューフクシン、アリザリン
レッドS、エオシン、エチルバイオレット、エリスロシ
ンB、オーラミン、オイルグリーン#502[オリエン
ト化学工業(株)製]、オイルスカーレット#308[
オリエント化学工業(株)製]、オイルピンク#312
[オリエント化学工業(株)製]、オイルブルー#60
3[オリエント化学工業(株)製]、オイルレッド5B
[オリエント化学工業(株)製]、オイルレッドOG[
オリエント化学工業(株)製]、オイルレッドRR[オ
リエント化学工業(株)製]、オレンジIV、2−カル
ボキシアニリノ−4−p−ジエチルアミノフェニルイミ
ノナフトキノン、2−カルボステアリルアミノ−4−p
−ジヒドロキシエチルアミノフェニルイミノナフトキノ
ン、キシレノールブルー、キナルジンレッド、クリスタ
ルバイオレット、クリスタルバイオレットF10B、m
−クレゾールパープル、クレゾールレッド、コンゴーレ
ッド、シアノ−p−ジエチルアミノフェニルイミノアセ
トアニリド、4−p−ジエチルアミノフェニルイミノナ
フトキノン、2,7−ジクロロフルオレセイン、ジフェ
ニルチオカルバゾン、1,3−ジフェニルトリアジン、
スピンレッドBEHスペシャル[保土ヶ谷化学工業(株
)製]、スルホローダミンB、チモールスルホフタレイ
ン、チモールフタレイン、チモールブルー、ナイルブル
ー2B、ナイルブルーA、1−β−ナフチル−4−p−
ジエチルアミノフェニルイミノ−5−ピラゾロン、α−
ナフチルレッド、パラフタシン、パラメチルレッド、ビ
クトリアピュアブルーBOH、ファーストアシッドバイ
オレットR、フェナセタリン、1−フェニル−3−メチ
ル−4−p−ジエチルアミノフェニルイミノ−5−ピラ
ゾロン、フェノールフタレイン、フェノールレッド、フ
クシン、ブリリアントグリーン、ブロモクレゾールパー
プル、ブロモフェノールブルー、ベイシックフクシン、
ベンゾプルプリン4B、マゼンタ、マラカイトグリーン
、メタニルイエロー、メチルオレンジ、メチルグリーン
、メチルバイオレット2B、メチルバイオレット、p−
メトキシベンゾイル−p′−ジエチルアミノ−o′−メ
チルフェニルイミノアセトアニリド、ローズベンガル、
ローダミン6G、ローダミンBを具体的に挙げることが
できる。Examples of these organic dyes include Eisen Brilliant Basic Cyanine 6GH [manufactured by Hodogaya Chemical Co., Ltd.], Astra New Fuchsin, Alizarin Red S, Eosin, Ethyl Violet, Erythrosin B, Auramine, Oil Green #502 [Orient Chemical Co., Ltd.] Made by Kogyo Co., Ltd.], Oil Scarlet #308 [
Orient Chemical Industry Co., Ltd.], Oil Pink #312
[Manufactured by Orient Chemical Industry Co., Ltd.], Oil Blue #60
3 [Orient Chemical Industry Co., Ltd.], Oil Red 5B
[Orient Chemical Industry Co., Ltd.], Oil Red OG [
Orient Chemical Industry Co., Ltd.], Oil Red RR [Orient Chemical Industry Co., Ltd.], Orange IV, 2-carboxyanilino-4-p-diethylaminophenylimino naphthoquinone, 2-carbostearylamino-4-p
-dihydroxyethylaminophenylimino naphthoquinone, xylenol blue, quinaldine red, crystal violet, crystal violet F10B, m
-Cresol purple, cresol red, Congo red, cyano-p-diethylaminophenyliminoacetanilide, 4-p-diethylaminophenylimino naphthoquinone, 2,7-dichlorofluorescein, diphenylthiocarbazone, 1,3-diphenyltriazine,
Spin Red BEH Special [manufactured by Hodogaya Chemical Industry Co., Ltd.], sulforhodamine B, thymol sulfophthalein, thymol phthalein, thymol blue, Nile blue 2B, Nile blue A, 1-β-naphthyl-4-p-
Diethylaminophenylimino-5-pyrazolone, α-
Naphthyl red, paraphthacine, paramethyl red, Victoria Pure Blue BOH, Fast Acid Violet R, phenacetaline, 1-phenyl-3-methyl-4-p-diethylaminophenylimino-5-pyrazolone, phenolphthalein, phenol red, fuchsin, Brilliant green, bromocresol purple, bromophenol blue, basic fuchsin,
Benzopurpurin 4B, magenta, malachite green, methanyl yellow, methyl orange, methyl green, methyl violet 2B, methyl violet, p-
Methoxybenzoyl-p'-diethylamino-o'-methylphenyliminoacetanilide, Rose Bengal,
Rhodamine 6G and Rhodamine B can be specifically mentioned.
【0033】これらの化合物の内でトリフェニルメチル
系の化合物が変色の大きさと保存安定性の点から好まし
い。Among these compounds, triphenylmethyl-based compounds are preferred from the viewpoint of the degree of discoloration and storage stability.
【0034】本発明において特に好ましく用いられる染
料としては、マラカイトグリーン(CI42000)、
メチルバイオレット(CI42535)、メチルグリー
ン(CI42585)、クリスタルバイオレット(CI
42555)、ブリリアントグリーン(CI42040
)、エチルバイオレット(CI42600)、フェノー
ルフタレイン、フェノールレッド、ブロモフェノールブ
ルー、チモールブルー、ブロモクレゾールパープル、ビ
クトリアピュアブルーBOH(CI42595)、アイ
ゼンブリリアントベーシックシアニン6GH[保土ヶ谷
化学工業(株)製](CI42025)、アストラニュ
ーフクシン(CI42520)、マゼンタ(CI425
10)、クリスタルバイオレットF10B(BASF社
製)(CI42557)、フクシン(CI42500)
を挙げることができ、特にエチルバイオレットが好まし
く用いられる。Dyes particularly preferably used in the present invention include malachite green (CI42000),
Methyl violet (CI42535), methyl green (CI42585), crystal violet (CI
42555), brilliant green (CI42040)
), ethyl violet (CI42600), phenolphthalein, phenol red, bromophenol blue, thymol blue, bromocresol purple, Victoria Pure Blue BOH (CI42595), Eisen Brilliant Basic Cyanine 6GH [manufactured by Hodogaya Chemical Co., Ltd.] (CI42025) ), astraneufuchsin (CI42520), magenta (CI425
10), Crystal Violet F10B (manufactured by BASF) (CI42557), Fuchsin (CI42500)
Among them, ethyl violet is particularly preferably used.
【0035】これら染料の感光性平版印刷版の感光層中
に占める割合は、0.1〜10重量%が好ましく、0.
3〜5重量%であることが特に好ましい。The proportion of these dyes in the photosensitive layer of the photosensitive lithographic printing plate is preferably 0.1 to 10% by weight, and 0.1 to 10% by weight.
Particularly preferred is 3 to 5% by weight.
【0036】本発明においては本発明の効果を損なわな
い範囲内において、上記色素と併用して活性光線の照射
により酸又は遊離基を発生する化合物を用いることがで
き、このようなものとしてトリハロアルキル化合物又は
ジアゾニウム塩化合物を用いることができる。In the present invention, compounds that generate acids or free radicals upon irradiation with actinic rays can be used in combination with the above-mentioned dyes within a range that does not impair the effects of the present invention. Such compounds include trihaloalkyl compounds or diazonium salt compounds can be used.
【0037】前記のキノンジアジド化合物は、アルカリ
可溶性樹脂と混合して用いることが好ましい。アルカリ
可溶性樹脂としては、ノボラック樹脂、フェノール性水
酸基を有するビニル系重合体、特開昭55−57841
号公報に記載されている多価フェノールとアルデヒド又
はケトンとの縮合樹脂等が挙げられる。ノボラック樹脂
としては、例えばフェノール・ホルムアルデヒド樹脂、
クレゾール・ホルムアルデヒド樹脂、特開昭55−57
841号公報に記載されているようなフェノール・クレ
ゾール・ホルムアルデヒド共重縮合樹脂、特開昭55−
127553号公報に記載されているようなp−置換フ
ェノールとフェノールもしくは、クレゾールとホルムア
ルデヒドとの共重縮合樹脂等が挙げられる。The above-mentioned quinonediazide compound is preferably used in combination with an alkali-soluble resin. Examples of the alkali-soluble resin include novolac resin, vinyl polymer having a phenolic hydroxyl group, and JP-A-55-57841.
Examples include condensation resins of polyhydric phenols and aldehydes or ketones, which are described in Japanese Patent Publication No. Examples of novolak resin include phenol formaldehyde resin,
Cresol formaldehyde resin, JP-A-55-57
Phenol/cresol/formaldehyde copolycondensation resin as described in JP-A No. 841, JP-A-55-
Examples include copolycondensation resins of p-substituted phenol and phenol or cresol and formaldehyde as described in Japanese Patent No. 127553.
【0038】また、フェノール性水酸基を有するビニル
系重合体としては、該フェノール性水酸基を有する単位
を分子構造中に有する重合体であり、下記の一般式(I
)〜一般式(V)の少なくとも1つの構造単位を含む重
合体が好ましい。The vinyl polymer having a phenolic hydroxyl group is a polymer having a unit having a phenolic hydroxyl group in its molecular structure, and has the following general formula (I
) to a polymer containing at least one structural unit of general formula (V) is preferred.
【0039】[0039]
【化3】
[式中R1およびR2はそれぞれ水素原子、アルキル基
又はカルボキシル基を表し、好ましくは水素原子である
。
R3は水素原子、ハロゲン原子又はアルキル基を表わし
、好ましくは水素原子又はメチル基、エチル基等のアル
キル基である。R4は水素原子、アルキル基、アリール
基又はアラルキル基を表わし、好ましくは水素原子であ
る。Aは窒素原子又は酸素原子と芳香族炭素原子とを連
結する、置換基を有していてもよいアルキレン基を表わ
し、mは0〜10の整数を表わし、Bは置換基を有して
いてもよいフェニレン基又は置換基を有してもよいナフ
チレン基を表わす。]本発明の感光性平版印刷版に用い
られる重合体としては共重合体型の構造を有するものが
好ましく、前記一般式(I)〜(V)でそれぞれ示され
る構造単位と組合せて用いることができる単量体単位と
しては、例えばエチレン、プロピレン、イソブチレン、
ブタジエン、イソプレン等のエチレン系不飽和オレフィ
ン類、例えばスチレン、α−メチルスチレン、p−メチ
ルスチレン、p−クロロスチレン等のスチレン類、例え
ばアクリル酸、メタクリル酸等のアクリル酸類、例えば
イタコン酸、マレイン酸、無水マレイン酸等の不飽和脂
肪族ジカルボン酸類、例えばアクリル酸メチル、アクリ
ル酸エチル、アクリル酸−n−ブチル、アクリル酸イソ
ブチル、アクリル酸ドデシル、アクリル酸−2−クロロ
エチル、アクリル酸フェニル、α−クロロアクリル酸メ
チル、メタクリル酸メチル、メタクリル酸エチル、エタ
クリル酸エチル等のα−メチレン脂肪族モノカルボン酸
のエステル類、例えばアクリロニトリル、メタアクリロ
ニトリル等のニトリル類、例えばアクリルアミド等のア
ミド類、例えばアクリルアニリド、p−クロロアクリル
アニリド、m−ニトロアクリルアニリド、m−メトキシ
アクリルアニリド等のアニリド類、例えば酢酸ビニル、
プロピオン酸ビニル、ベンゾエ酸ビニル、酪酸ビニル等
のビニルエステル類、例えばメチルビニルエーテル、エ
チルビニルエーテル、イソブチルビニルエーテル、β−
クロロエチルビニルエーテル等のビニルエーテル類、塩
化ビニル、ビニリデンクロライド、ビニリデンシアナイ
ド、例えば1−メチル−1−メトキシエチレン、1,1
−ジメトキシエチレン、1,2−ジメトキシエチレン、
1,1−ジメトキシカルボニルエチレン、1−メチル−
1−ニトロエチレン等のエチレン誘導体類、例えばN−
ビニルピロール、N−ビニルカルバゾール、N−ビニル
インドール、N−ビニルピロリデン、N−ビニルピロリ
ドン等のN−ビニル系単量体がある。これらのビニル系
単量体は、不飽和二重結合が開裂した構造で高分子化合
物中に存在する。embedded image [In the formula, R1 and R2 each represent a hydrogen atom, an alkyl group, or a carboxyl group, and preferably a hydrogen atom. R3 represents a hydrogen atom, a halogen atom, or an alkyl group, preferably a hydrogen atom or an alkyl group such as a methyl group or an ethyl group. R4 represents a hydrogen atom, an alkyl group, an aryl group or an aralkyl group, preferably a hydrogen atom. A represents an alkylene group optionally having a substituent that connects a nitrogen atom or an oxygen atom and an aromatic carbon atom, m represents an integer of 0 to 10, and B has a substituent. represents a phenylene group that may have a substituent or a naphthylene group that may have a substituent. ] The polymer used in the photosensitive lithographic printing plate of the present invention preferably has a copolymer-type structure, and can be used in combination with the structural units represented by the above general formulas (I) to (V), respectively. Examples of monomer units include ethylene, propylene, isobutylene,
Ethylenically unsaturated olefins such as butadiene and isoprene; styrenes such as styrene, α-methylstyrene, p-methylstyrene, p-chlorostyrene; acrylic acids such as acrylic acid and methacrylic acid; e.g. itaconic acid and maleic acid. acids, unsaturated aliphatic dicarboxylic acids such as maleic anhydride, such as methyl acrylate, ethyl acrylate, n-butyl acrylate, isobutyl acrylate, dodecyl acrylate, 2-chloroethyl acrylate, phenyl acrylate, α - Esters of α-methylene aliphatic monocarboxylic acids such as methyl chloroacrylate, methyl methacrylate, ethyl methacrylate, ethyl ethacrylate, nitriles such as acrylonitrile, methacrylonitrile, amides such as acrylamide, e.g. acrylic Anilides such as anilide, p-chloroacrylanilide, m-nitroacrylanilide, m-methoxyacrylanilide, e.g. vinyl acetate,
Vinyl esters such as vinyl propionate, vinyl benzoate, vinyl butyrate, etc., such as methyl vinyl ether, ethyl vinyl ether, isobutyl vinyl ether, β-
Vinyl ethers such as chloroethyl vinyl ether, vinyl chloride, vinylidene chloride, vinylidene cyanide, such as 1-methyl-1-methoxyethylene, 1,1
-dimethoxyethylene, 1,2-dimethoxyethylene,
1,1-dimethoxycarbonylethylene, 1-methyl-
Ethylene derivatives such as 1-nitroethylene, e.g.
There are N-vinyl monomers such as vinylpyrrole, N-vinylcarbazole, N-vinylindole, N-vinylpyrrolidene, and N-vinylpyrrolidone. These vinyl monomers exist in polymer compounds with a structure in which unsaturated double bonds are cleaved.
【0040】上記の単量体のうち脂肪族モノカルボン酸
のエステル類、ニトリル類が本発明の目的に対して優れ
た性能を示し、好ましい。Among the above-mentioned monomers, esters of aliphatic monocarboxylic acids and nitriles are preferred because they exhibit excellent performance for the purpose of the present invention.
【0041】これらのアルカリ可溶性樹脂は、1,50
0以上の分子量を有するものが好ましく、更に好ましく
は、2,500以上の分子量を有するものがよい。These alkali-soluble resins have 1,50
Those having a molecular weight of 0 or more are preferable, and those having a molecular weight of 2,500 or more are more preferable.
【0042】これらのアルカリ可溶性樹脂は、本発明の
感光性平版印刷版中に、50〜90重量%含ませること
が好ましい。These alkali-soluble resins are preferably contained in the photosensitive planographic printing plate of the present invention in an amount of 50 to 90% by weight.
【0043】本発明の感光性平版印刷版には、以上の説
明した各素材のほか、必要に応じて他の添加剤を含むこ
とができる。例えば、可塑剤としてフタル酸エステル類
、トリフェニルホスフェート類、マレイン酸エステル類
等の各種低分子化合物類、塗布性向上剤としてフッ素系
界面活性剤、エチルセルロースポリアルキレンエーテル
等に代表されるノニオン活性剤等の界面活性剤が挙げら
れる。The photosensitive lithographic printing plate of the present invention may contain other additives, if necessary, in addition to the above-mentioned materials. For example, various low-molecular compounds such as phthalate esters, triphenyl phosphates, and maleate esters are used as plasticizers, and fluorine-based surfactants and nonionic surfactants such as ethyl cellulose polyalkylene ether are used as coating properties improvers. Examples include surfactants such as.
【0044】又、感度を向上させるための増感剤も本発
明の感光性組成物に添加することができる。増感剤とし
ては、特開昭57−118237号公報に記載されてい
る没食子酸誘導体、特開昭52−80022号公報に記
載されているような、例えば、無水フタル酸、テトラヒ
ドロ無水フタル酸、ヘキサヒドロ無水フタル酸、無水マ
レイン酸、無水コハク酸、ピロメット酸、イタコン酸等
の5員環状酸無水物、及び特開昭58−11932号公
報に記載されているような、例えば、無水グルタル酸及
びその誘導体等の6員環状酸無水物等が挙げられる。こ
れらのうち、好ましいのは環状酸無水物であり、特に6
員環状酸無水物が好ましい。A sensitizer for improving sensitivity can also be added to the photosensitive composition of the present invention. Examples of the sensitizer include gallic acid derivatives as described in JP-A-57-118237, phthalic anhydride, tetrahydrophthalic anhydride, as described in JP-A-52-80022, 5-membered cyclic acid anhydrides such as hexahydrophthalic anhydride, maleic anhydride, succinic anhydride, pyrometic acid, itaconic acid, etc., and glutaric anhydride and Examples include 6-membered cyclic acid anhydrides such as derivatives thereof. Among these, preferred are cyclic acid anhydrides, especially 6
Member cyclic acid anhydrides are preferred.
【0045】本発明において支持体に感光性塗布液を塗
布する塗布方法としては、従来公知の方法、例えば、回
転塗布、ワイヤーバー塗布、ディップ塗布、エアーナイ
フ塗布、ロール塗布、ブレード塗布及びカーテン塗布等
が可能である。In the present invention, the coating method for applying the photosensitive coating liquid to the support includes conventionally known methods, such as spin coating, wire bar coating, dip coating, air knife coating, roll coating, blade coating, and curtain coating. etc. are possible.
【0046】また、感光層を設ける支持体としては、ア
ルミニウム、亜鉛、銅、鋼等の金属板;及びクロム、亜
鉛、銅、ニッケル、アルミニウム及び鉄等がめっき又は
蒸着された金属板;紙;プラスチックフィルム;樹脂が
塗布された紙;アルミニウム等の金属箔が張られた紙;
親水化処理したプラスチックフィルム等が挙げられる。
このうち好ましいのはアルミニウム板である。Supports on which the photosensitive layer is provided include metal plates such as aluminum, zinc, copper, and steel; metal plates plated or vapor-deposited with chromium, zinc, copper, nickel, aluminum, and iron; paper; Plastic film; paper coated with resin; paper covered with metal foil such as aluminum;
Examples include plastic films treated to make them hydrophilic. Among these, aluminum plates are preferred.
【0047】支持体としてアルミニウム板を使用する場
合、砂目立て処理、陽極酸化処理及び必要に応じて封孔
処理等の表面処理が施されていることが好ましい。When an aluminum plate is used as a support, it is preferably subjected to surface treatments such as graining, anodizing, and, if necessary, sealing.
【0048】砂目立て処理の方法としては、例えば、機
械的方法、電解によりエッチングする方法が挙げられる
。機械的方法としては、例えば、ボール研磨法、ブラシ
研磨法、液体ホーニングによる研磨法、バフ研磨法等が
挙げられる。アルミニウム材の組成等に応じて上述の各
種方法を単独あるいは組み合わせて用いることができる
。好ましいのは電解エッチングする方法である。[0048] Examples of the graining treatment include a mechanical method and an electrolytic etching method. Examples of the mechanical method include a ball polishing method, a brush polishing method, a polishing method using liquid honing, and a buffing method. The various methods described above can be used alone or in combination depending on the composition of the aluminum material. A preferred method is electrolytic etching.
【0049】電解エッチングは、りん酸、硫酸、塩酸、
硝酸等の無機の酸を単独ないし2種以上混合した浴で行
われる。砂目立て処理の後、必要に応じてアルカリある
いは酸の水溶液によってデスマット処理を行い、中和し
て水洗する。[0049] Electrolytic etching can be performed using phosphoric acid, sulfuric acid, hydrochloric acid,
It is carried out in a bath containing one or more inorganic acids such as nitric acid. After the graining treatment, if necessary, desmut treatment is performed with an aqueous alkali or acid solution, neutralized, and washed with water.
【0050】陽極酸化処理は、電解液として、硫酸、ク
ロム酸、シュウ酸、リン酸、マロン酸等を1種または2
種以上含む溶液を用い、アルミニウム板を陽極として電
解して行なわれる。形成された陽極酸化皮膜量は1〜5
0mg/dm2が適当であり、好ましくは10〜40m
g/dm2である。陽極酸化皮膜量は、例えば、アルミ
ニウム板をリン酸クロム酸溶液(リン酸85%液:35
ミリリットル、酸化クロム(VI):20gを1リット
ルの水に溶解して作製)に浸漬し、酸化皮膜を溶解し、
板の皮膜溶解前後の重量変化測定等から求められる。[0050] In the anodizing process, one or two types of sulfuric acid, chromic acid, oxalic acid, phosphoric acid, malonic acid, etc. are used as the electrolyte.
Electrolysis is carried out using a solution containing at least one species, with an aluminum plate used as an anode. The amount of anodic oxide film formed is 1 to 5
0mg/dm2 is suitable, preferably 10-40m
g/dm2. The amount of anodized film can be determined by, for example, applying an aluminum plate to a phosphoric acid chromic acid solution (85% phosphoric acid solution: 35%
milliliter, chromium oxide (VI): prepared by dissolving 20 g in 1 liter of water) to dissolve the oxide film,
It is determined by measuring changes in weight before and after dissolving the film on the plate.
【0051】封孔処理は、熱水処理、水蒸気処理、ケイ
酸ソーダ処理、重クロム酸塩水溶液処理等が具体例とし
て挙げられる。この他にアルミニウム板支持体に対して
、水溶性高分子化合物や、フッ化ジルコン酸等の金属塩
の水溶液による下引き処理を施すこともできる。Specific examples of the sealing treatment include hot water treatment, steam treatment, sodium silicate treatment, and dichromate aqueous solution treatment. In addition, the aluminum plate support may be subjected to subbing treatment using an aqueous solution of a water-soluble polymer compound or a metal salt such as fluorinated zirconate.
【0052】その他、一般に感光性平版印刷版にフィル
ム原稿を密着焼付する際、焼枠を真空にして行なうが、
この真空密着性を改良する方法も本発明の感光性平版印
刷版に適用することができる。真空密着性を改良する方
法としては、感光層表面に機械的に凹凸を施す方法、感
光層表面に固体粉末を散布させる方法、特開昭50−1
25805号公報に記載されているような感光層表面に
マット層を設ける方法、及び特開昭55−12974号
公報に記載されているような感光層表面に固体粉末を熱
融着させる方法等が挙げられる。In addition, when contact printing a film original onto a photosensitive lithographic printing plate, the printing frame is generally vacuumed.
This method of improving vacuum adhesion can also be applied to the photosensitive lithographic printing plate of the present invention. Methods for improving vacuum adhesion include a method of mechanically making unevenness on the surface of the photosensitive layer, a method of scattering solid powder on the surface of the photosensitive layer, and a method of spreading solid powder on the surface of the photosensitive layer.
A method of providing a matte layer on the surface of a photosensitive layer as described in Japanese Patent Application Laid-open No. 25805, and a method of heat-sealing a solid powder on the surface of a photosensitive layer as described in Japanese Patent Application Laid-open No. 12974/1984, etc. Can be mentioned.
【0053】本発明の感光性平版印刷版は、従来慣用の
ものと同じ方法で使用することができる。例えば、透明
陽画フィルムを通して超高圧水銀灯、メタルハライドラ
ンプ、キセノンランプ、タングステンランプ等の光源に
より露光し、次いで、アルカリ現像液にて現像すること
により、未露光部分のみが支持体表面に残り、ポジ−ポ
ジ型のレリーフ像ができる。The photosensitive lithographic printing plate of the present invention can be used in the same manner as those conventionally used. For example, by exposing a transparent positive film to a light source such as an ultra-high pressure mercury lamp, metal halide lamp, xenon lamp, or tungsten lamp, and then developing it with an alkaline developer, only the unexposed areas remain on the surface of the support, leaving a positive image. A positive relief image is created.
【0054】用いられるアルカリ現像液としては、例え
ば、水酸化ナトリウム、水酸化カリウム、炭酸ナトリウ
ム、炭酸カリウム、メタケイ酸ナトリウム、メタケイ酸
カリウム、第二リン酸ナトリウム、第三リン酸ナトリウ
ム等のアルカリ金属塩の水溶液が挙げられる。アルカリ
金属塩の濃度は0.1〜10重量%が好ましい。又、該
現像液中に必要に応じアニオン性界面活性剤、両性界面
活性剤やアルコール等の有機溶媒を加えることができる
。Examples of the alkaline developer used include alkali metal developers such as sodium hydroxide, potassium hydroxide, sodium carbonate, potassium carbonate, sodium metasilicate, potassium metasilicate, dibasic sodium phosphate, and tribasic sodium phosphate. Examples include aqueous solutions of salts. The concentration of the alkali metal salt is preferably 0.1 to 10% by weight. Furthermore, an anionic surfactant, an amphoteric surfactant, and an organic solvent such as alcohol can be added to the developer as required.
【0055】[0055]
【実施例】以下、本発明を実施例により説明するが、本
発明はこれらに限定されるものではない。[Examples] The present invention will be explained below with reference to Examples, but the present invention is not limited thereto.
【0056】実施例1(感光性平版印刷版試料の作成)
厚さ0.24mmのアルミニウム板を5重量%の水酸化
ナトリウム水溶液中で60℃で1分間脱脂処理を行った
後、1リットルの0.5モル塩酸水溶液中において温度
25℃、電流密度60A/dm2、処理時間30秒の条
件で電解エッチング処理を行った。次いで5重量%水酸
化ナトリウム水溶液中で60℃、10秒間のデスマット
処理を施した後、20重量%硫酸溶液中で温度20℃、
電流密度3A/dm2、処理時間1分間の条件で陽極酸
化処理を行った。更に30℃の熱水で20秒間、熱水封
孔処理を行い、平版印刷版材料用支持体として使用する
アルミニウム板を作製した。Example 1 (Preparation of photosensitive lithographic printing plate sample)
After degreasing an aluminum plate with a thickness of 0.24 mm at 60°C for 1 minute in a 5% by weight aqueous sodium hydroxide solution, it was degreased in 1 liter of a 0.5 molar hydrochloric acid solution at a temperature of 25°C and a current density of 60 A/ Electrolytic etching treatment was performed under the conditions of dm2 and treatment time of 30 seconds. Then, after desmutting in a 5% by weight aqueous sodium hydroxide solution at 60°C for 10 seconds, desmutting was performed in a 20% by weight sulfuric acid solution at a temperature of 20°C.
The anodizing treatment was performed at a current density of 3 A/dm2 and a treatment time of 1 minute. Further, a hot water sealing treatment was performed with hot water at 30° C. for 20 seconds to produce an aluminum plate to be used as a support for lithographic printing plate material.
【0057】上記のように作成したアルミニウム板に下
記組成の感光性組成物塗布液をロールコーターを用いて
塗布し、90℃で4分間乾燥してポジ型感光性平版印刷
版試料No.1を得た。感光性組成物の塗布量は24m
g/dm2であった。
(感光性塗布液組成)
バインダー樹脂(BD−1)
7.0 g
キノンジアジド化合物(QD−1)
1.6 g 2
−トリクロロメチル−5−(β−ベンゾフリルビニル)
−1,3,4−オキサジアゾール
0.02g
ビクトリアピュアブルーBOH
(保土ヶ谷化
学製)
0.06g 本発
明の脂肪酸(A)
0.17g
ジエチレングリコールジメチルエーテル
60 g 3−メト
キシ−1−ブタノール
40 g上記感光性組成
物の塗布液組成において、バインダー樹脂、キノンジア
ジド化合物、本発明の脂肪酸および溶剤を表1に示すよ
うにして、試料2〜13をそれぞれ得た。A photosensitive composition coating solution having the following composition was applied to the aluminum plate prepared above using a roll coater, and dried at 90° C. for 4 minutes to obtain positive photosensitive lithographic printing plate sample No. I got 1. The amount of photosensitive composition applied was 24 m.
g/dm2. (Photosensitive coating liquid composition) Binder resin (BD-1)
7.0g
Quinonediazide compound (QD-1)
1.6 g 2
-Trichloromethyl-5-(β-benzofuryl vinyl)
-1,3,4-oxadiazole
0.02g
Victoria Pure Blue BOH
(Manufactured by Hodogaya Chemical)
0.06g Fatty acid (A) of the present invention
0.17g
diethylene glycol dimethyl ether
60 g 3-methoxy-1-butanol
40 g Samples 2 to 13 were obtained by using the coating solution composition of the above photosensitive composition, including the binder resin, quinonediazide compound, fatty acid of the present invention, and solvent as shown in Table 1.
【0058】この感光性平版印刷版試料1〜13の各々
に2KWメタルハライドランプ(岩崎電気社製アイドル
フィン2000)を光源として90cmの距離からフィ
ルム原稿を露光した。次いでこの試料の各々を下記現像
条件及び現像液によって現像処理した。A film original was exposed to each of the photosensitive lithographic printing plate samples 1 to 13 from a distance of 90 cm using a 2KW metal halide lamp (Idolfin 2000 manufactured by Iwasaki Electric Co., Ltd.) as a light source. Each of the samples was then developed using the following developing conditions and developer.
【0059】[0059]
【表1】
(現像条件)
現像液 : メタケイ酸ナトリウム4%水溶液
にベンゼンスルホン酸ナトリウムを0.1%添加したも
の(有機溶剤を含まない)
自動現像機: コニカPS版自動現像機「PSK−9
10」(コニカ(株)製)
現像温度 : 27℃
現像時間 : 20秒
上記現像条件の現像液を標準とし、下記のように希釈し
て各現像液で各々の試料を現像し、現像後の試料を下記
条件にて印刷して版面汚れを評価した。[Table 1] (Development conditions) Developer: 4% sodium metasilicate aqueous solution with 0.1% sodium benzenesulfonate added (contains no organic solvent) Automatic developer: Konica PS plate automatic developer "PSK-" 9
10'' (manufactured by Konica Corporation) Development temperature: 27°C Development time: 20 seconds Using the developer under the above development conditions as a standard, dilute as shown below and develop each sample with each developer. Samples were printed under the following conditions and plate surface stains were evaluated.
【0060】現像液No. 標準現像液
水1 2
: 12 2
: 23 2
: 3(印刷条件)
印刷機 : ハイデルGTO
印刷インキ: 東洋キングニューブライト紅(東洋イ
ンキ社製 油性インキ)
印刷紙 : 上質紙
印刷速度 : 8000枚/時Developing solution No. standard developer
water 1 2
: 12 2
: 23 2
: 3 (Printing conditions) Printing machine: Heidel GTO Printing ink: Toyo King New Bright Red (oil-based ink manufactured by Toyo Ink Co., Ltd.) Printing paper: High quality paper Printing speed: 8000 sheets/hour
【0061】[0061]
【表2】
表2より明らかなように、本発明の構成を有する本発明
の試料1〜10はいずれも、脂肪酸及びジエチレングリ
コールを少なくとも1つ含まない比較試料11〜13に
比較して、版面汚れ、色素残り及び残膜、及び感度のい
ずれにおいても優れている。*1 キノンジアジド化
合物[Table 2] As is clear from Table 2, Samples 1 to 10 of the present invention having the structure of the present invention all had higher plate surface stains than Comparative Samples 11 to 13, which did not contain at least one fatty acid and diethylene glycol. It is excellent in terms of dye residue, residual film, and sensitivity. *1 Quinonediazide compound
【0062】[0062]
【化4】[C4]
【0063】[0063]
【化5】
*2 バインダー樹脂
BD−1
フェノール、m−クレゾール及びp−クレゾール(モル
比48:32:20)とホルムアルデヒドとの共重合樹
脂[Chemical formula 5] *2 Binder resin BD-1 Copolymer resin of phenol, m-cresol, p-cresol (molar ratio 48:32:20) and formaldehyde
【0064】[0064]
【化6】
*3 脂肪酸
A cis CH3(CH2)5CH=CH(C
H2)7COOHB cis CH3(CH2)
10CH=CH(CH2)4COOHC cis
CH3(CH2)7CH=CH(CH2)11COO
HD n C10H21COOH
E n C11H23COOH
*4 DEDM:ジエチレングリコールジメチルエー
テルDEMM:ジエチレングリコールモノメチルエーテ
ル*5 版面汚れ
A:版面汚れなし
B:版面汚れがわずかに認められるが、実用上使用に耐
えられる程度
C:版面汚れが発生、実用上やや影響有D:版面汚れが
顕著に発生
*6 感度(クリア段相当の露光時間):標準条件で
現像した各試料に感度測定用ステップタブレット(イー
ストマンコダック社製No.2:濃度差0.15ずつで
21段階のグレースケール)を密着して前述の装置によ
り露光時間を変えながらステップタブレットの画像を露
光し、現像後クリア3段相当の露光量を求めた。
*7 反射率:前記標準現像液で現像した試料の非画
線部の反射率を波長280nmの反射光強度から求め、
色素残りおよび残膜量を評価した。[Chemical 6] *3 Fatty acid A cis CH3(CH2)5CH=CH(C
H2)7COOHB cis CH3(CH2)
10CH=CH(CH2)4COOHC cis
CH3(CH2)7CH=CH(CH2)11COO
HD n C10H21COOH E n C11H23COOH *4 DEDM: diethylene glycol dimethyl ether DEMM: diethylene glycol monomethyl ether *5 Plate surface stain A: No plate surface stain B: Plate surface stain is slightly observed, but to the extent that it can withstand practical use C: Plate surface stain occurs , Slightly affected in practical use D: Significant plate surface staining *6 Sensitivity (exposure time equivalent to clear stage): Step tablet for sensitivity measurement (No. 2 manufactured by Eastman Kodak Company: Density The image on the step tablet was exposed using the above-mentioned apparatus while changing the exposure time, and the exposure amount equivalent to 3 clear steps was determined after development. *7 Reflectance: The reflectance of the non-image area of the sample developed with the standard developer was determined from the intensity of reflected light at a wavelength of 280 nm.
The remaining dye and amount of film remaining were evaluated.
【0065】[0065]
【発明の効果】以上詳細に説明したように、本発明によ
り、製造時又は製造後における臭気及び毒性が極めて少
なく、残膜及び色素残りが改良され、尚かつアンダー現
像性に優れ、高い感度を有する感光性平版印刷版を提供
することができる。Effects of the Invention As explained in detail above, the present invention has extremely low odor and toxicity during or after production, improves residual film and dye residue, has excellent under-developability, and has high sensitivity. A photosensitive lithographic printing plate can be provided.
Claims (2)
ジアジド化合物、(b)ジエチレングリコールのモノア
ルキルエーテル又はジアルキルエーテル、(c)炭素原
子数10〜25の脂肪酸、及び(d)色素を含有する感
光性塗布液を塗布してなる感光性平版印刷版。1. A photosensitive material containing at least (a) a quinonediazide compound, (b) monoalkyl ether or dialkyl ether of diethylene glycol, (c) a fatty acid having 10 to 25 carbon atoms, and (d) a dye on a support. A photosensitive planographic printing plate coated with a transparent coating liquid.
る請求項1記載の感光性平版印刷版。2. The photosensitive lithographic printing plate according to claim 1, wherein the dye (d) is ethyl violet.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP41373290A JPH04223466A (en) | 1990-12-25 | 1990-12-25 | Photosensitive planographic printing plate |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP41373290A JPH04223466A (en) | 1990-12-25 | 1990-12-25 | Photosensitive planographic printing plate |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH04223466A true JPH04223466A (en) | 1992-08-13 |
Family
ID=18522309
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP41373290A Pending JPH04223466A (en) | 1990-12-25 | 1990-12-25 | Photosensitive planographic printing plate |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH04223466A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007045956A (en) * | 2005-08-11 | 2007-02-22 | Tokyo Ohka Kogyo Co Ltd | Coloring agent dispersion and photosensitive composition using the same |
-
1990
- 1990-12-25 JP JP41373290A patent/JPH04223466A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007045956A (en) * | 2005-08-11 | 2007-02-22 | Tokyo Ohka Kogyo Co Ltd | Coloring agent dispersion and photosensitive composition using the same |
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