JPH0412885A - Optical recording medium - Google Patents
Optical recording mediumInfo
- Publication number
- JPH0412885A JPH0412885A JP2111701A JP11170190A JPH0412885A JP H0412885 A JPH0412885 A JP H0412885A JP 2111701 A JP2111701 A JP 2111701A JP 11170190 A JP11170190 A JP 11170190A JP H0412885 A JPH0412885 A JP H0412885A
- Authority
- JP
- Japan
- Prior art keywords
- recording
- state
- reflectance
- optical recording
- inorganic compound
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000003287 optical effect Effects 0.000 title claims abstract description 41
- 229910010272 inorganic material Inorganic materials 0.000 claims abstract description 25
- 150000002484 inorganic compounds Chemical class 0.000 claims abstract description 24
- 150000002894 organic compounds Chemical class 0.000 claims abstract description 18
- 238000000034 method Methods 0.000 claims abstract description 17
- 239000000758 substrate Substances 0.000 claims abstract description 16
- QGKMIGUHVLGJBR-UHFFFAOYSA-M (4z)-1-(3-methylbutyl)-4-[[1-(3-methylbutyl)quinolin-1-ium-4-yl]methylidene]quinoline;iodide Chemical compound [I-].C12=CC=CC=C2N(CCC(C)C)C=CC1=CC1=CC=[N+](CCC(C)C)C2=CC=CC=C12 QGKMIGUHVLGJBR-UHFFFAOYSA-M 0.000 claims abstract description 8
- 229910052736 halogen Inorganic materials 0.000 claims abstract description 7
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 6
- 229910052717 sulfur Inorganic materials 0.000 claims abstract description 6
- 230000001678 irradiating effect Effects 0.000 claims abstract description 5
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims abstract description 4
- 125000001624 naphthyl group Chemical group 0.000 claims abstract description 4
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims abstract description 4
- 239000011593 sulfur Substances 0.000 claims abstract description 4
- 125000005843 halogen group Chemical group 0.000 claims abstract 2
- -1 alkyl sulfuric acid Chemical compound 0.000 claims description 5
- 150000002367 halogens Chemical class 0.000 claims description 5
- LBLYYCQCTBFVLH-UHFFFAOYSA-N 2-Methylbenzenesulfonic acid Chemical compound CC1=CC=CC=C1S(O)(=O)=O LBLYYCQCTBFVLH-UHFFFAOYSA-N 0.000 claims description 3
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 claims description 3
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims description 3
- 239000002253 acid Substances 0.000 claims description 3
- 125000003545 alkoxy group Chemical group 0.000 claims description 3
- 125000005157 alkyl carboxy group Chemical group 0.000 claims description 3
- 229910052796 boron Inorganic materials 0.000 claims description 3
- 125000001424 substituent group Chemical group 0.000 claims description 3
- QAOWNCQODCNURD-UHFFFAOYSA-N sulfuric acid Substances OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 2
- 239000000126 substance Substances 0.000 claims 1
- 239000010410 layer Substances 0.000 description 59
- 239000000463 material Substances 0.000 description 16
- 239000000975 dye Substances 0.000 description 13
- 238000000576 coating method Methods 0.000 description 5
- 238000010586 diagram Methods 0.000 description 5
- 239000011241 protective layer Substances 0.000 description 5
- 230000035945 sensitivity Effects 0.000 description 5
- 239000004925 Acrylic resin Substances 0.000 description 3
- 229920000178 Acrylic resin Polymers 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000003475 lamination Methods 0.000 description 3
- 230000031700 light absorption Effects 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 229920005668 polycarbonate resin Polymers 0.000 description 3
- 239000004431 polycarbonate resin Substances 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 229920006271 aliphatic hydrocarbon resin Polymers 0.000 description 2
- 238000003618 dip coating Methods 0.000 description 2
- 239000003822 epoxy resin Substances 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- 229920005992 thermoplastic resin Polymers 0.000 description 2
- WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical compound ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- 229910005900 GeTe Inorganic materials 0.000 description 1
- 229930192627 Naphthoquinone Natural products 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 150000008051 alkyl sulfates Chemical class 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- QHIWVLPBUQWDMQ-UHFFFAOYSA-N butyl prop-2-enoate;methyl 2-methylprop-2-enoate;prop-2-enoic acid Chemical compound OC(=O)C=C.COC(=O)C(C)=C.CCCCOC(=O)C=C QHIWVLPBUQWDMQ-UHFFFAOYSA-N 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 238000010549 co-Evaporation Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- WPYVAWXEWQSOGY-UHFFFAOYSA-N indium antimonide Chemical compound [Sb]#[In] WPYVAWXEWQSOGY-UHFFFAOYSA-N 0.000 description 1
- 238000001746 injection moulding Methods 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- LKKPNUDVOYAOBB-UHFFFAOYSA-N naphthalocyanine Chemical compound N1C(N=C2C3=CC4=CC=CC=C4C=C3C(N=C3C4=CC5=CC=CC=C5C=C4C(=N4)N3)=N2)=C(C=C2C(C=CC=C2)=C2)C2=C1N=C1C2=CC3=CC=CC=C3C=C2C4=N1 LKKPNUDVOYAOBB-UHFFFAOYSA-N 0.000 description 1
- 150000002791 naphthoquinones Chemical class 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 239000001007 phthalocyanine dye Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 229920006122 polyamide resin Polymers 0.000 description 1
- 229920013716 polyethylene resin Polymers 0.000 description 1
- 239000002861 polymer material Substances 0.000 description 1
- 229920005672 polyolefin resin Polymers 0.000 description 1
- 229920005990 polystyrene resin Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 238000005546 reactive sputtering Methods 0.000 description 1
- 229910052711 selenium Inorganic materials 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 229910052959 stibnite Inorganic materials 0.000 description 1
- 229920001169 thermoplastic Polymers 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 239000004416 thermosoftening plastic Substances 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Thermal Transfer Or Thermal Recording In General (AREA)
- Optical Record Carriers And Manufacture Thereof (AREA)
Abstract
Description
【発明の詳細な説明】 [産業上の利用分野コ 本発明は光記録媒体に関する。[Detailed description of the invention] [Industrial application fields] The present invention relates to optical recording media.
[従来の技術]
従来の光記録媒体は記録膜の記録状態と未記録状態の二
状態に対応した2値の信号により情報の記録を行ってい
た。[Prior Art] Conventional optical recording media record information using binary signals corresponding to two states of a recording film: a recorded state and an unrecorded state.
記録密度を向上する方法の1つとして記録膜に反射率の
異なる2種類の記録状態を形成することにより、3値の
信号記録を行うことが提案されている(特開平1−24
3237、特開平l−173432)。As one method to improve recording density, it has been proposed to perform ternary signal recording by forming two types of recording states with different reflectances on the recording film (Japanese Patent Laid-Open No. 1-24
3237, JP-A-1-173432).
前記提案の光記録媒体及び光記録方法は基板上に2種類
の記録層を積層し、各記録層の光吸収量を調節すること
により、光照射側の記録層のみにピットを形成した記録
状態と2つの記録層ともにピットを形成した記録状態の
2種類の記録状態を形成するものである。The proposed optical recording medium and optical recording method layer two types of recording layers on a substrate and adjust the amount of light absorption of each recording layer to create a recording state in which pits are formed only in the recording layer on the light irradiation side. Two types of recording states are formed: and a recording state in which pits are formed in both recording layers.
特開平1−243237に示される従来技術を第1.2
図に示す。図中、1は基板、2は第1の記録層、3は第
2の記録層を表わす。この方式では光照射により、第1
の記録層2のみを除去し、ピットを形成した第1の記録
状態と、第1及び第2の記録層2,3の両方を除去して
ピットを形成した第2の記録状態を記録層2.3の光吸
収量を調節することにより選択的に形成する。1.2 of the prior art shown in Japanese Patent Application Laid-open No. 1-243237.
As shown in the figure. In the figure, 1 represents a substrate, 2 represents a first recording layer, and 3 represents a second recording layer. In this method, the first
A first recording state in which only the recording layer 2 of the recording layer 2 is removed and pits are formed, and a second recording state in which pits are formed by removing both the first and second recording layers 2 and 3 are recorded in the recording layer 2. .3 is selectively formed by adjusting the amount of light absorption.
しかし、第1の記録層2のみを除去し、ピットを形成す
るときに第2の記録層3の特性(反射率、平面度)が変
化しやすく、第1の記録状態と第2の記録状態の反射率
差が安定して得られないという欠点を有していた。However, when only the first recording layer 2 is removed and pits are formed, the characteristics (reflectance, flatness) of the second recording layer 3 tend to change, and the characteristics of the second recording layer 3 tend to change between the first recording state and the second recording state. It had the disadvantage that a stable reflectance difference could not be obtained.
又、記録感度においても、記録層を除去し、ピットを形
成する2種類の記録層を積層した場合、上下の層(ある
いは基板)にはさまれた記録層が変形、除去されに<<
、記録感度が低下するという欠点を有していた。Also, regarding recording sensitivity, when a recording layer is removed and two types of recording layers that form pits are stacked, the recording layer sandwiched between the upper and lower layers (or substrate) is deformed and removed.
However, it had the disadvantage that recording sensitivity decreased.
[発明が解決しようとする課題]
本発明は、こうした実状の下により信頼性の高い三値記
録を可能とする光記録媒体及び光記録方法を提供するこ
とを目的とするものである。[Problems to be Solved by the Invention] An object of the present invention is to provide an optical recording medium and an optical recording method that enable more reliable ternary recording under these circumstances.
[課題を解決するための手段]
すなわち、本発明は、
(1)基体上に設けた記録層に光照射することにより、
記録膜の形状変化を伴わずに反射率を変化させた第1の
記録状態と記録膜の形状変化により反射率を変化させた
第2の記録状態を形成し、前記第1、第2の記録状態及
び未記録状態の反射率の差を用いることにより情報信号
の記録を行う光記録媒体において、前記記録層が有機化
合物と無機化合物により構成され、前記第1の記録状態
は無機化合物が相変化することにより形成され、前記第
2の記録状態は記録層が凸又は凹に変形することにより
形成されることを特徴とする光記録媒体、
(2)請求項(1)における記録状態を記録光照射時間
又は記録光強度を変化させることにより選択的に形成す
ることを特徴とする光記録方法、
(3)有機化合物が下記一般式で表わされるシアニン色
素を含むことを特徴とする請求項(1)記載の光記録媒
体、
RI R2
RI R2
(式中、RI 、 R2及びR3は同じか又は異なって
いてもよくそれぞれは01〜C6アルキルを表わし、X
はハロゲン、過ハロゲン酸、四フッ化ホウ素、トルエン
スルホン酸又はアルキル硫酸を表わし、Aはベンゼン環
又はナフチル環を表わしそしてそれぞれの環上には置換
基としてアルキル、アルコキシ、ヒドロキシ、カルボキ
シル、ハロゲン、アリル又はアルキルカルボキシルがあ
ってもあるいはなくてもよく、そしてnは0又は1〜3
の整数を表わす)
(4)無機化合物かSbを50 atm%以上含有し、
かつ他の成分元素として硫黄を含むことを特徴とする請
求項(1)記載の光記録媒体である。[Means for Solving the Problems] That is, the present invention provides: (1) By irradiating a recording layer provided on a substrate with light,
forming a first recording state in which the reflectance is changed without changing the shape of the recording film and a second recording state in which the reflectance is changed due to a change in the shape of the recording film; In an optical recording medium that records information signals by using a difference in reflectance between a state and an unrecorded state, the recording layer is composed of an organic compound and an inorganic compound, and the first recording state is such that the inorganic compound undergoes a phase change. (2) An optical recording medium characterized in that the second recording state is formed by deforming the recording layer into a convex or concave shape, (2) the recording state according to claim (1) is formed by recording light (3) An optical recording method characterized in that formation is selectively performed by changing irradiation time or recording light intensity; (3) Claim (1) characterized in that the organic compound contains a cyanine dye represented by the following general formula. ), RI R2 RI R2 (wherein RI, R2 and R3 may be the same or different and each represents 01-C6 alkyl,
represents halogen, perhalogen acid, boron tetrafluoride, toluenesulfonic acid, or alkyl sulfuric acid, A represents a benzene ring or naphthyl ring, and on each ring, as a substituent, alkyl, alkoxy, hydroxy, carboxyl, halogen, Allyl or alkyl carboxyl may or may not be present and n is 0 or 1-3
(4) contains an inorganic compound or Sb of 50 atm% or more,
The optical recording medium according to claim 1, further comprising sulfur as another component element.
本発明の光記録媒体の代表的な構成を第3図及び第4図
に示す。A typical structure of the optical recording medium of the present invention is shown in FIGS. 3 and 4.
本発明の光記録媒体の最も簡単な構成のものでは、第3
図に示すように基板11上に記録層22が形成されてい
ればよいが、第4図に示すように必要に応じ、て基板1
1と記録層22との間に上弓き層44が記録層22上に
保護層33か形成されてもよい。In the simplest configuration of the optical recording medium of the present invention, the third
As shown in the figure, it is sufficient if the recording layer 22 is formed on the substrate 11, but as shown in FIG.
An overcoat layer 44 may be formed between the recording layer 1 and the recording layer 22, and the protective layer 33 may be formed on the recording layer 22.
又、記録光の入射方向は基板側からでも記録層側からで
もかまわない。Further, the direction of incidence of the recording light may be from the substrate side or from the recording layer side.
基板11の材料としては、透明プラスチック基板、ガラ
ス基板等を用いることができ、具体的には、例えばポリ
カーボネート樹脂、ポリオレフィン樹脂、アクリル樹脂
、エポキシ樹脂、石英ガラス、強化ガラス等を挙げるこ
とができる。As the material of the substrate 11, a transparent plastic substrate, a glass substrate, etc. can be used, and specific examples thereof include polycarbonate resin, polyolefin resin, acrylic resin, epoxy resin, quartz glass, and reinforced glass.
なお、基板の表面には、トラッキング用案内浦や案内ピ
ット、更にはアドレス信号などのプリフォーマットが形
成されていてもよい。Note that a tracking guide hole, a guide pit, and a preformat such as an address signal may be formed on the surface of the substrate.
記録層22は無機化合物と有機化合物で構成され、無機
化合物が相変化することにより、第1の記録状態が形成
され、無機化合物と有機化合物がともに凸又は凹に変形
することにより、第2の記録状態が形成される。前記無
機化合物と有機化合物は記録層22中で接する状態で保
持されていればよく、無機化合物層と有機化合物の積層
又は無機化合物と有機化合物の混合層でもよい。又、積
層の場合、積層のくり返し数、積層順序は、記録層の特
性を低下させない範囲でれば任意に設定してよい。The recording layer 22 is composed of an inorganic compound and an organic compound, and a first recording state is formed when the inorganic compound undergoes a phase change, and a second recording state is formed when both the inorganic compound and the organic compound deform into a convex or concave shape. A recording state is formed. The inorganic compound and the organic compound need only be held in contact with each other in the recording layer 22, and may be a laminated layer of an inorganic compound layer and an organic compound or a mixed layer of an inorganic compound and an organic compound. In the case of lamination, the number of repetitions of lamination and the order of lamination may be arbitrarily set as long as the characteristics of the recording layer are not deteriorated.
本発明に使用する無機化合物の材料としては、第1の光
照射量の記録光(第1の記録状態を形成する記録光)の
照射により相変化可能であり、かつ第1の光照射量の記
録光よりも光照射量の高い第2の光照射量の記録光(第
2の記録状態を形成する記録光)の照射により、有機化
合物とともに凸又は凹に変形可能なものを用いることが
てきる。具体的な材料としては5bTe。The inorganic compound material used in the present invention is capable of undergoing a phase change upon irradiation with a first amount of recording light (recording light that forms a first recorded state), and which has a first amount of light irradiation. It is possible to use a material that can be deformed into a convex or concave shape together with an organic compound by irradiation with a second light irradiation amount of recording light (recording light that forms a second recording state) that is higher in light irradiation amount than that of the recording light. Ru. A specific material is 5bTe.
5bTeGe、5bSnS、Sb InS。5bTeGe, 5bSnS, SbInS.
GeTe、InSb等を挙げることができ、好ましくは
第2の光照射量の記録先の照射により有機化合物との変
形が容易なSbを50atm%以上含有し、かつ他の成
分元素として硫黄を含むS b 70S n +sS
+s、S b 701 n +sS +s等の材料がよ
い。Examples include GeTe, InSb, etc., and preferably Sb containing 50 atm% or more of Sb, which is easily transformed into an organic compound by irradiation of the recording destination with the second light irradiation amount, and containing sulfur as another component element. b 70S n +sS
+s, S b 701 n +sS +s, etc. are preferable.
本発明に使用する有機化合物の材料としては、第2の光
照射量の記録光の照射により無機化合物とともに凸又は
凹に変形可能なものを用いることができる。具体的な材
料としては、脂肪族系炭化水素樹脂、ポリエチレン樹脂
、ポリスチレン樹脂、ポリ塩化ビニル樹脂、アクリル樹
脂、ポリカーボネート樹脂、ポリアミド樹脂等の熱可塑
性樹脂やシアニン色素、フタロシアニン色素、ナフタロ
シアニン色素、スクアリリウム色素、ナフトキノン色素
、金属インドアニリン色素、アズレニウム色素等の光吸
収性色素、及びこれらの材料の混合物等を挙げることが
できる。As the organic compound material used in the present invention, a material that can be deformed into a convex or concave shape together with an inorganic compound by irradiation with the recording light of the second light irradiation amount can be used. Specific materials include thermoplastic resins such as aliphatic hydrocarbon resins, polyethylene resins, polystyrene resins, polyvinyl chloride resins, acrylic resins, polycarbonate resins, and polyamide resins, cyanine dyes, phthalocyanine dyes, naphthalocyanine dyes, and squarylium. Examples include light-absorbing dyes such as dyes, naphthoquinone dyes, metal indoaniline dyes, and azulenium dyes, and mixtures of these materials.
特に好ましい材料としては塗布による成膜が容易であり
、高感度で光吸収による分解変形が可能な下記一般式の
シアニン色素を含む材料がよい。A particularly preferred material is a material containing a cyanine dye of the following general formula, which can be easily formed into a film by coating, has high sensitivity, and can be decomposed and deformed by light absorption.
RI R2
RI R2
(式中、R1,R2及びR3は同しか又は異なっていて
もよくそれぞれは01〜C5アルキルを表わし、Xはハ
ロゲン、過ハロケン酸、四フッ化ホウ素、トルエンスル
ホン酸又はアルキル硫酸を表わし、Aはベンゼン環又は
ナフチル環を表わしそしてそれぞれの環上には置換基と
してアルキル、アルコキシ、ヒドロキシ、カルボキシル
、ハロゲン、アリル又はアルキルカルボキシルがあって
もあるいはなくてもよく、そしてnはO又は1〜3の整
数を表わす)
記録層22の膜厚は材料により異るが100〜3000
人が好ましい。RI R2 RI R2 (wherein R1, R2 and R3 may be the same or different and each represents 01-C5 alkyl, X is halogen, perhalokenic acid, boron tetrafluoride, toluenesulfonic acid or alkyl sulfate) , A represents a benzene ring or a naphthyl ring, and each ring may or may not have an alkyl, alkoxy, hydroxy, carboxyl, halogen, allyl or alkyl carboxyl as a substituent, and n is O or an integer from 1 to 3) The thickness of the recording layer 22 varies depending on the material, but is 100 to 3000.
People are preferred.
記録層22を基板11又は下引き層44上に形成するに
は、記録層を無機化合物層と有機化合物層の積層で構成
する場合には、無機化合物は真空成膜方法(蒸着法、ス
パッタ法など)、有機化合物は塗液塗工法(スピナーコ
ーティング、スプレーコーティング、浸漬コーティング
など)等の従来より知られている方法が採用できる。To form the recording layer 22 on the substrate 11 or the undercoat layer 44, when the recording layer is composed of a laminated layer of an inorganic compound layer and an organic compound layer, the inorganic compound is formed by a vacuum film forming method (evaporation method, sputtering method). etc.), and for the organic compound, conventionally known methods such as liquid coating methods (spinner coating, spray coating, dip coating, etc.) can be adopted.
記録層を無機化合物と有機化合物の混合層で構成する場
合には有機化合物ガスを用いた無機化合物の反応性スパ
ッタリングで形成することができる。When the recording layer is composed of a mixed layer of an inorganic compound and an organic compound, it can be formed by reactive sputtering of the inorganic compound using an organic compound gas.
下引き層44は、(1)水又はガスなどのバリヤー層、
(2)記録層の保存安定性の確保、(3)反射率の向上
、(4)プレグルーブの形成などの機能を光記録媒体に
付与するために設けられる。The undercoat layer 44 includes (1) a barrier layer such as water or gas;
It is provided to provide the optical recording medium with functions such as (2) ensuring storage stability of the recording layer, (3) improving reflectance, and (4) forming a pregroove.
そして下引き層44の材料としては、前記(1) 、
(2)を重視すれば高分子材料(アクリル樹脂、エポキ
シ樹脂など)、無機化合物(Si02.ZnS、TiN
、SiN、AN 203など)及び金属や半金属(Au
、Ni、Cr、Seなど)が使用でき、前記(3)を重
視すれば無機化合物(ZnS、Sb2S3.SnS、I
nSなど)及び金属(AR,Ag、Auなど)か使用で
き、前記(4)を重視すれば各種の紫外線硬化樹脂、熱
硬化性樹脂及び熱可塑性樹脂か使用できる。The materials for the undercoat layer 44 include the above (1),
If (2) is emphasized, polymer materials (acrylic resin, epoxy resin, etc.), inorganic compounds (Si02.ZnS, TiN
, SiN, AN 203, etc.) and metals and semimetals (Au
, Ni, Cr, Se, etc.), and if (3) is emphasized, inorganic compounds (ZnS, Sb2S3.SnS, I
nS, etc.) and metals (AR, Ag, Au, etc.) can be used, and if (4) is emphasized, various ultraviolet curable resins, thermosetting resins, and thermoplastic resins can be used.
下引き層44の厚さは、材料の種類により異なるが、0
.1〜30μ印くらいが適当である。The thickness of the undercoat layer 44 varies depending on the type of material, but is 0.
.. Approximately 1 to 30μ mark is appropriate.
保護層33は(1)記録層2をキズ、ホコリ、汚れなど
から保護し、(2)記録層2の保存安定性を向上させ、
(3)反射率を向上せしめる、などのために形成される
ものである。保護層33の形成材料としては、下引き層
44であげた材料をそのまま使用することができる。保
護層33の厚さは、下引き層44の場合と同様、材料の
種類により異なるが、0.1〜100μmくらいが適当
である。なお、保護層33、下引き層44の形成手段と
しては、無機材料を形成させる場合には真空成膜方法(
蒸着法、スパッタ法など)、有機材料を形成させる場合
には溶液塗工法(スピンナーコーティング、スプレーコ
ーティング、浸漬コーティングなど)等の従来より知ら
れている方法が採用し得る。The protective layer 33 (1) protects the recording layer 2 from scratches, dust, dirt, etc., (2) improves the storage stability of the recording layer 2,
(3) It is formed for purposes such as improving reflectance. As the material for forming the protective layer 33, the materials listed for the undercoat layer 44 can be used as they are. The thickness of the protective layer 33 varies depending on the type of material, as in the case of the undercoat layer 44, but is suitably about 0.1 to 100 μm. In addition, as a means for forming the protective layer 33 and the undercoat layer 44, when forming an inorganic material, a vacuum film forming method (
Conventionally known methods such as a solution coating method (spinner coating, spray coating, dip coating, etc.) can be employed when forming an organic material.
次に本発明に係る光記録媒体に記録を行う光記録方法に
ついて説明する。第5図a及び第5図すに本発明に係る
光記録媒体に照射する記録光パターンと、形成される記
録状態の例を示す。Next, an optical recording method for recording on an optical recording medium according to the present invention will be explained. FIGS. 5A and 5S show examples of the recording light pattern irradiated onto the optical recording medium according to the present invention and the recorded state formed.
第5図aは光照射強度により光照射量を変化させた例を
模式的に説明する図で、C1は第1の光照射量の記録光
、C2は第2の光照射量の記録光、aは第1の記録状態
、bは第2の記録状態を表わしている。第5図すは光照
射時間により光照射量を変化させた例を模式的に説明す
る図である。FIG. 5a is a diagram schematically explaining an example in which the amount of light irradiation is changed depending on the intensity of light irradiation, where C1 is the recording light of the first amount of light irradiation, C2 is the recording light of the second amount of light irradiation, a represents the first recording state, and b represents the second recording state. FIG. 5 is a diagram schematically explaining an example in which the amount of light irradiation is changed depending on the time of light irradiation.
本発明の光情報記録方法において、第5図aの方式によ
る場合には記録用の光強度と再生用の光強度とは、再生
用光強度をP。、第1の記録用光強度をP I 、第2
の記録用光強度をP2とするとき、Po<PI<P2の
関係にある。In the optical information recording method of the present invention, in the case of the method shown in FIG. , the first recording light intensity is P I , the second
When the recording light intensity of is P2, there is a relationship of Po<PI<P2.
このように本発明に係る光記録媒体に記録を行うには光
照射量の異なる2種類の記録光(第1及び第2の光照射
量の記録光)を記録層に照射し、第1の光照射量の記録
光(C+)により第1の記録状態(a)を、第2の光照
射量の記録光(C2)を照射することにより第2の記録
状態(b)を選択的に形成すればよい。In this way, in order to perform recording on the optical recording medium according to the present invention, two types of recording light with different light irradiation amounts (recording light with a first and second light irradiation amount) are irradiated onto the recording layer, and the first Selectively form a first recording state (a) by irradiating recording light (C+) with an amount of light irradiation, and selectively form a second recording state (b) by irradiating recording light (C2) with a second amount of light irradiation. do it.
光照射量は記録光の照射時間又は記録光の照射強度を変
化することにより適当な量に制御することができる。The amount of light irradiation can be controlled to an appropriate amount by changing the irradiation time of the recording light or the irradiation intensity of the recording light.
本発明の光記録媒体及び光記録方法は反射率の異なる2
種類の記録状態を異なる記録メカニズム(相変化及び変
形)で形成し、第1の記録状態を相変化記録状態とする
ので、第1の記録状態を形成する際に記録層が変形又は
除去されることがなく、確実に第1の記録状態と第2の
記録状態を形成することができるので、第1の記録状態
と第2の記録状態の反射率差が安定に得られる。The optical recording medium and optical recording method of the present invention have two different reflectances.
Since different recording states are formed by different recording mechanisms (phase change and deformation), and the first recording state is a phase change recording state, the recording layer is deformed or removed when forming the first recording state. Since the first recorded state and the second recorded state can be reliably formed without any problems, the reflectance difference between the first recorded state and the second recorded state can be stably obtained.
又、相変化記録による第1の記録状態を反射率の高くな
る記録状態、変形記録による第2の記録状態を反射率の
低くなる記録状態にすることができるので、2種類の記
録状態から大きな反射率差を得ることかできる。In addition, since the first recording state by phase change recording can be a recording state with a high reflectance, and the second recording state by deformation recording can be a recording state with a low reflectance, it is possible to make a large difference between the two recording states. It is possible to obtain the reflectance difference.
更に従来技術のように記録層を除去しビットを形成する
2種類の記録層を積層した構成の場合、上下の層(ある
いは基板)にはさまれた記録層が変形、除去されに<<
、大きく記録感度が低下するが、本発明の光記録媒体で
は、従来技術のような構成ではないので大きな記録感度
の低下がない。Furthermore, in the case of a structure in which two types of recording layers are laminated to form a bit by removing the recording layer as in the conventional technology, the recording layer sandwiched between the upper and lower layers (or substrate) is deformed and removed.
However, the optical recording medium of the present invention does not have a structure like that of the prior art, so there is no large decrease in recording sensitivity.
[実施例] 以下に実施例を挙げ、本発明を更に詳細に説明する。[Example] The present invention will be explained in more detail with reference to Examples below.
実施例1〜3
厚さ1.2II1m 、直径130φmmでありトラッ
キング用のラセン状案内溝を射出成形時に成形したポリ
カーボネート樹脂基板に、下記一般式で示されるシアニ
ン色素をメタノールと 1.2−ジクロルエタンの混合
溶媒に溶解してスピンコードすることにより、厚さ約3
00人のシアニン色素膜を形成した。Examples 1 to 3 A cyanine dye represented by the following general formula was mixed with methanol and 1,2-dichloroethane onto a polycarbonate resin substrate having a thickness of 1.2II1m and a diameter of 130φmm, on which a spiral guide groove for tracking was molded during injection molding. By dissolving in a mixed solvent and spin-coding, the thickness of approximately 3
00 cyanine dye films were formed.
次にこの色素膜上に抵抗加熱方式の真空蒸着装置を用い
て、I naoS b6oSS b7o1 n +58
15、S b 70S n +sS +、の組成の無機
化合物薄膜をSbとIn及びSbとInS及びSbとS
nSの二源共蒸着により約700人の膜厚で形成し、N
o、1〜No、3の本発明に係る光記録媒体を作成した
。Next, using a resistance heating type vacuum evaporation device on this dye film, I naoS b6oSS b7o1 n +58
15, Sb and In, Sb and InS, and Sb and S
Formed with a thickness of about 700 nm by dual source co-evaporation of nS,
Optical recording media according to the present invention of No. 1 to No. 3 were created.
実施例4〜6
実施例1〜3においてシアニン色素膜のかわりに熱可塑
性脂肪族炭化水素樹脂(商品名ハイレッツC−110X
三井石油化学工業)膜をシクロヘキサンを溶媒として約
1000人の膜厚にスピンコード形成し、No、4〜6
の本発明に係る光記録媒体を作成した。Examples 4 to 6 In Examples 1 to 3, thermoplastic aliphatic hydrocarbon resin (trade name Hiretz C-110X) was used instead of the cyanine dye film.
Mitsui Petrochemical Industries) films were spin-coded using cyclohexane as a solvent to a film thickness of approximately 1000 mm, and Nos. 4 to 6 were formed.
An optical recording medium according to the present invention was prepared.
これらNo、1〜6の本発明に係る光記録媒体をレーザ
ー光波長780nm 、 N、A、 (レンズの開口数
)0,5、線速度5.[im/S%記録信号記録信号周
波数2再Hz強度P。−0,5mWの条件において、第
5図(a)における記録光照射強度をPI−2mW。These optical recording media according to the present invention of Nos. 1 to 6 have a laser beam wavelength of 780 nm, N, A, (numerical aperture of the lens) 0.5, and a linear velocity of 5. [im/S% Recording Signal Recording Signal Frequency 2 Re Hz Intensity P. Under the condition of -0.5 mW, the recording light irradiation intensity in FIG. 5(a) was set to PI-2 mW.
Pz=7mWとして、光照射強度により光照射量を変化
させて基板側より記録を行い、その再生信号強度から各
記録状態の反射率を求めた。With Pz=7 mW, recording was performed from the substrate side while changing the amount of light irradiation depending on the light irradiation intensity, and the reflectance of each recording state was determined from the reproduced signal intensity.
結果は表−1のとおりてあり、本発明の光記録媒体はい
ずれも多数の測定点すべてにおいて、第1及び第2の記
録状態及び未記録状態間で10%以上の大きな反射率差
が安定に得ることかできた。The results are shown in Table 1, and the optical recording medium of the present invention has a stable large reflectance difference of 10% or more between the first and second recorded states and the unrecorded state at all of the many measurement points. I was able to get it.
表−1
又、No、2の光記録媒体を第5図(b)における照射
時間C1をC2の1/4として、光照射時間により光照
射量を変化させて記録を行ったところ、表−1と同様の
結果が得られた。Table 1 In addition, when recording was performed on the optical recording medium No. 2 by setting the irradiation time C1 to 1/4 of C2 in FIG. 5(b) and changing the light irradiation amount depending on the light irradiation time, Table The same results as in Example 1 were obtained.
更にこれら本発明の光記録媒体の各記録状態をSEMに
より観察したところ、第1の記録状態(a)は変形がな
く相変化による記録状態であり、又、第2の記録状態(
b)は記録層の変形が観察され、変形による記録状態で
あることが確認された。Furthermore, when the respective recording states of the optical recording medium of the present invention were observed by SEM, the first recording state (a) was a recording state due to phase change without deformation, and the second recording state (a) was a recording state due to phase change.
In b), deformation of the recording layer was observed, and it was confirmed that the recording state was caused by deformation.
[発明の効果コ
以上説明したように、本発明の光記録媒体及び光記録方
法を用いることにより、従来提案されている三値記録の
光記録媒体及び光記録方法に比べ各記録状態か確実に形
成できる。又、記録感度においても従来方法に比べ有利
な構成である。以上の結果からより信頼性の高い三値記
録による高密度化が可能となる。[Effects of the Invention] As explained above, by using the optical recording medium and optical recording method of the present invention, each recording state can be reliably recorded compared to conventionally proposed ternary recording optical recording media and optical recording methods. Can be formed. Furthermore, the configuration is advantageous compared to conventional methods in terms of recording sensitivity. From the above results, it becomes possible to increase the density by more reliable three-level recording.
第1.2図は従来の光記録媒体の説明図、第3.4図は
本発明の光記録媒体の説明図、第5図(a) 、(b)
は本発明の光記録媒体に照射する記録光パターンと、形
成される記録状態の例を模式的に説明する図で、第5図
(a)は光照射強度により光照射量を変化させた例を示
すもので、第5図(b)は光照射時間により光照射量を
変化させた例を示すものである。Figure 1.2 is an explanatory diagram of a conventional optical recording medium, Figure 3.4 is an explanatory diagram of an optical recording medium of the present invention, and Figures 5 (a) and (b).
FIG. 5(a) is a diagram schematically explaining an example of the recording light pattern irradiated onto the optical recording medium of the present invention and the recording state formed, and FIG. FIG. 5(b) shows an example in which the amount of light irradiation is changed depending on the time of light irradiation.
Claims (4)
記録膜の形状変化を伴わずに反射率を変化させた第1の
記録状態と記録膜の形状変化により反射率を変化させた
第2の記録状態を形成し、前記第1、第2の記録状態及
び未記録状態の反射率の差を用いることにより情報信号
の記録を行う光記録媒体において、前記記録層が有機化
合物と無機化合物により構成され、前記第1の記録状態
は無機化合物が相変化することにより形成され、前記第
2の記録状態は記録層が凸又は凹に変形することにより
形成されることを特徴とする光記録媒体。(1) By irradiating the recording layer provided on the substrate with light,
forming a first recording state in which the reflectance is changed without changing the shape of the recording film and a second recording state in which the reflectance is changed due to a change in the shape of the recording film; In an optical recording medium that records information signals by using a difference in reflectance between a state and an unrecorded state, the recording layer is composed of an organic compound and an inorganic compound, and the first recording state is such that the inorganic compound undergoes a phase change. An optical recording medium, characterized in that the second recording state is formed by deforming the recording layer into a convex or concave shape.
又は記録光強度を変化させることにより選択的に形成す
ることを特徴とする光記録方法。(2) An optical recording method characterized in that the recording state according to claim (1) is selectively formed by changing the recording light irradiation time or the recording light intensity.
素を含むことを特徴とする請求項(1)記載の光記録媒
体。 ▲数式、化学式、表等があります▼ (式中、R_1、R_2及びR_3は同じか又は異なっ
ていてもよくそれぞれはC_1〜C_6アルキルを表わ
し、Xはハロゲン、過ハロゲン酸、四フッ化ホウ素、ト
ルエンスルホン酸又はアルキル硫酸を表わし、Aはベン
ゼン環又はナフチル環を表わしそしてそれぞれの環上に
は置換基としてアルキル、アルコキシ、ヒドロキシ、カ
ルボキシル、ハロゲン、アリル又はアルキルカルボキシ
ルがあってもあるいはなくてもよく、そしてnは0又は
1〜3の整数を表わす)(3) The optical recording medium according to claim (1), wherein the organic compound contains a cyanine dye represented by the following general formula. ▲There are mathematical formulas, chemical formulas, tables, etc.▼ (In the formula, R_1, R_2 and R_3 may be the same or different and each represents C_1 to C_6 alkyl, and X is halogen, perhalogen acid, boron tetrafluoride, represents toluenesulfonic acid or alkyl sulfuric acid, A represents a benzene ring or a naphthyl ring, and each ring may or may not have alkyl, alkoxy, hydroxy, carboxyl, halogen, allyl or alkyl carboxyl as a substituent. well, and n represents 0 or an integer from 1 to 3)
つ他の成分元素として硫黄を含むことを特徴とする請求
項(1)記載の光記録媒体。(4) The optical recording medium according to claim (1), wherein the inorganic compound contains 50 atm % or more of Sb and also contains sulfur as another component element.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2111701A JPH0412885A (en) | 1990-05-01 | 1990-05-01 | Optical recording medium |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2111701A JPH0412885A (en) | 1990-05-01 | 1990-05-01 | Optical recording medium |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0412885A true JPH0412885A (en) | 1992-01-17 |
Family
ID=14567966
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2111701A Pending JPH0412885A (en) | 1990-05-01 | 1990-05-01 | Optical recording medium |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0412885A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1197961A1 (en) * | 2000-10-10 | 2002-04-17 | TDK Corporation | Optical recording medium and method |
-
1990
- 1990-05-01 JP JP2111701A patent/JPH0412885A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1197961A1 (en) * | 2000-10-10 | 2002-04-17 | TDK Corporation | Optical recording medium and method |
US6956804B2 (en) | 2000-10-10 | 2005-10-18 | Tdk Corporation | Optical recording medium with recording marks having different states, and method of recording using the optical recording medium |
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