JPH04101139A - Photosensitive material processor - Google Patents

Abstract

PURPOSE:To improve processing efficiency and to improve carrying performance by attaching one end part of a film to a leading member provided with plural locking holes and carrying the leading member in a state where the locking holes are locked with a rotating sprocket. CONSTITUTION:The square locking holes 26 are formed at equal intervals along the longitudinal direction of a leader 25 near the center part of the leader 25 in a width direction, and the teeth of the sprocket 8 are inserted in the hole 26. Two films F are connected to the trailing edge of the leader 25 in parallel and inclined notched parts 28 are formed on both side ends of the leading edge part of the leader 25 in order to facilitate the passage of the leader 25. In such a case, the film F is not directly carried but it is hauled and carried by the leader 25 which is allowed to precede. Thus, processing efficiency is improved, the carrying performance of the film is improved, and the trouble of jamming is drastically decreased.

Description

DETAILED DESCRIPTION OF THE INVENTION <Industrial Application Field> The present invention relates to a photosensitive material processing apparatus for processing films such as color negative films, for example.

<Prior art> Black and white photosensitive materials are processed through steps such as black and white development, fixing, and water washing after exposure, while color photosensitive materials are processed through steps such as color development and water washing after exposure.
It is processed through processes such as desilvering, water washing, and stabilization.

Black and white developer for black and white development, fixer for fixing, color developer for color development, bleach l&, bleach-fix solution, fixer for desilvering, tap water or ion exchange water for washing,
Stabilizing solutions are used in each stabilization process.

The temperature of each processing solution is usually adjusted to 30 to 40°C, and the photosensitive material is immersed in these processing solutions to be processed.

Such processing is usually performed by a processing device such as an automatic processor.

In such cases, in recent years there has been a demand for environmental conservation and resource saving, and it is desired to reduce the amount of each processing liquid used.

On the other hand, with the development of small-scale processing systems called minilabs, photosensitive materials are now being processed at stores such as photo shops, and there is a desire for smaller devices.

In view of the above-mentioned circumstances, the present applicant first proposed a method that includes a plurality of processing chambers connected by narrow passages, and allows the photosensitive material to pass sequentially through each processing chamber and come into contact with the processing liquid in each processing chamber. We have proposed a photosensitive material processing apparatus that processes photosensitive materials (Patent Application No. 1-251).
No. 32, No. 1-27034, No. 1-90422, No. 1-248930, No. 2-54641, No. 2-15
5667 etc.).

These devices have the advantage that the apparatus can be made smaller and the processing efficiency is improved, so that the amount of processing liquid used can be reduced.

In this way, processing efficiency is improved because each processing chamber is connected by a narrow passage, so there is almost no mixing of processing liquids between each processing chamber, and each processing A gradient is formed in the liquid composition or concentration of the processing liquid in the room,
This is because this is maintained.

For example, in the case of washing water, washing water (washing water) is used between each processing room.
The degree of contamination of the washing water changes according to the direction in which the washing water is supplied, and by conveying the photosensitive material in the opposite direction to the direction in which the washing water is supplied,
The photosensitive material is sequentially treated with clean washing water, improving the washing efficiency.

By the way, in such photosensitive material processing equipment, rollers are used to sandwich the photosensitive material (hereinafter referred to as roller conveyance) in order to convey the photosensitive material into each processing chamber, but when the photosensitive material is a film, the rollers Conveyance is undesirable because it tends to cause jamming (and also causes sensory defects such as scratches, transfer marks, and stains on the film emulsion surface due to contact with rollers).

<Problems to be Solved by the Invention> An object of the present invention is to provide a photosensitive material processing apparatus that can improve processing efficiency and transportability.

<Means for Solving the Problems> Such objects are achieved by the following inventions (1) to (6).

(1) A processing tank, a plurality of processing chambers formed in the processing tank and sequentially connected by narrow passages, a blade installed to shield the passage, and a transport means for transporting the film. A photosensitive material processing apparatus that processes the film by sequentially passing the film through each processing chamber with each processing chamber filled with a processing liquid, wherein the film is conveyed by passing one end of the film. A photosensitive material processing apparatus characterized in that the processing is carried out by attaching to a leading member having a plurality of locking holes, locking the locking holes to a rotating sprocket, and transporting the leading member.

(2) A rack having a plurality of processing chambers sequentially connected by narrow passages, a blade installed to shield the passages, and a conveying means for conveying the film is removably loaded into the processing tank. A partition member is installed on the rack side to partition a first region including a processing chamber through which the film passes first and a second region including a processing chamber through which the film passes last, and an end of the partition member is installed on the rack side. The above (1) is configured such that the portion engages with the inner surface of the processing tank to substantially block the flow of the processing liquid between the first and second regions.
1) The photosensitive material processing apparatus according to item 1).

(3) The above (1) having a processing liquid supply means for supplying two or more types of processing liquids with different functions from different processing chambers.
Or the photosensitive material processing apparatus according to (2).

(4) The photosensitive material processing apparatus according to any one of (1) to 3) above, wherein a drain port is connected to the processing chambers other than the first processing chamber and the last processing chamber through which the film passes.

(5) The photosensitive material processing apparatus according to any one of (1) to 4), further comprising a processing liquid circulation means for circulating and stirring the processing liquid in the processing chamber.

(6) The processing liquid circulation means has a nozzle that spouts the processing liquid toward the emulsion surface of the film.
).

Effect> In the photosensitive material processing apparatus of the present invention, since the plurality of processing chambers are sequentially connected by wide passages,
The liquid composition gradient (concentration gradient) of the processing liquid is maintained according to the supply direction of the processing liquid, thereby improving the processing efficiency of the film.

In particular, by installing blades, preferably at least a pair of opposing blades, in the passageway, the liquid composition gradient of the processing liquid in each processing chamber can be dramatically maintained over a long period of time.

That is, when the leading member and the film pass through, the blade comes into contact with both sides of the leading member and the film, creating an effect of wiping off the liquid adhering to these (hereinafter referred to as a squeeze effect), and causing the leading member and the film to evaporate into the previous processing chamber. The amount of liquid brought into the subsequent processing chamber is reduced.

Furthermore, even when the leading member and film are passing through, the liquid flow only occurs through a minute gap (approximately the thickness of the leading member and film) between the blades that occurs at the side edges of the leading member and film. The blocking property of liquid flow is sufficient, and no more liquid flow than necessary exceeds the replenishment amount of processing liquid.

Then, when the leading member and the film do not pass, the opposing blades are in close contact with each other.

There is almost no liquid flow in the passage.

For example, bleach and fixer
This is particularly advantageous when two or more types of processing liquids having different functions are supplied from different processing chambers, since unnecessary mixing of both processing liquids can be prevented.

For this reason, it is possible to reduce the volume of each processing chamber and to reduce the amount of replenishment and circulation of processing liquid, thereby making it possible to downsize the apparatus.

Further, the film is conveyed by attaching one end of the film to a leading member having a plurality of locking holes, locking the locking holes of the leading member to a rotating sprocket, and transporting the leading member. Accordingly, the film is not directly transported but is transported while being towed by the leading member, thereby preventing jamming accidents and the above-mentioned sensory defects.

In addition, when a processing liquid circulation means is provided, the composition and temperature of the processing liquid are made uniform in each processing chamber, and proper processing without unevenness is possible. In particular, when a nozzle is provided to eject a processing liquid toward the emulsion surface of the film, processing efficiency is increased and the photographic properties of the film are improved.

<Example> Hereinafter, the photosensitive material processing apparatus of the present invention will be described in detail based on a preferred example shown in the accompanying drawings.

FIG. 1 is a sectional side view showing a configuration example when the photosensitive material processing apparatus of the present invention is applied to an apparatus that performs desilvering processing, and FIG. 2 is a sectional view taken along the line II-II in FIG. 1. , FIG. 3 is a perspective view showing the structure near the passage in the photosensitive material processing apparatus of FIG. 1. Photosensitive material processing apparatus 1 shown in these figures
is an apparatus that can perform bleaching, bleach-fixing, and fixing in one processing tank.

As shown in FIG. 1, the photosensitive material processing apparatus 1 of the present invention includes:
It has a vertically long processing tank 2 having a predetermined volume. A rack 3 is removably loaded into the processing tank 2. This rack 3 has a pair of side plates 31 and 32, and several block-shaped members (hereinafter referred to as block bodies) 4a to 4o are fixedly installed between these side plates.

Five processing chambers 6A, 6B, 6, which are spaces for processing the film F, are formed by such block bodies 4a to 4o.
C16D and 6E are formed.

In addition, the processing chambers 6A and 6B, 6B and 6C, which are vertically adjacent to each other,
Narrow passages 71, 72, 73 and 74 connecting the image processing chambers are formed between 6C and 6D and 6D and 6E, and the film F is placed in the upper part of the processing chambers 6A and 6E. Similar passageways 75 and 76 are formed for loading and unloading.

The block bodies 4a and 4b are connected to a partition member 170, which will be described later.
It is a vertically long member installed on both sides.

Block bodies 4c and 4d are block bodies 4, respectively.
passages 75 and 76 are formed between the upper parts of a and 4b, and a gluer 25 to the sprocket 8, which will be described later.
This is a member for regulating the position of the leader 25 so as to maintain the engagement.

Block bodies 4g and 4 each include block body 4.
This is a member that is removably fitted into a recess 42 formed in a, and passages 71 and 72 are formed inside the recess 42, respectively.

Further, the block bodies 4h and 44 are also members that are removably fitted into the recesses 42 formed in the block body 4b, and have passages 74 and 73 formed therein, respectively.

A sealing member 11 made of the same material as the blade 15, which will be described later, is fixed to the portions of the blocks 4g, 4k, 4h, and 4 that contact the inner wall of the processing tank 2.

In the block body 4e, the reader 25 is connected to the passage 7 from the processing chamber 6A.
This member serves as a guide to guide the reader 25 to the entrance of the passage 71 when the reader 25 moves into the passage 71 .

The block body 4f is a member that guides the reader 25 that has exited the passage 74 between a guide 9 and a nozzle 54, which will be described later, in the processing chamber 6E.

Block bodies 41 and 4j are members for regulating the position of leader 25 so as to maintain engagement of leader 25 with sprocket 8, respectively.

The block bodies 4m, 4n, and 4o form a processing chamber 6c with the lower ends of the block bodies 4c and 4d, and also serve as a guide to regulate the U-shaped transport path of the leader 25 within the processing chamber 6c. It is a member. Among these, the block body 40 has a curved surface 44 that allows the leader 25 to be reversed. This curved surface 44 also plays the role of regulating the position of the leader 25 so as to maintain engagement of the leader 25 with the sprocket 8.

These block bodies 4a to 40 are made of, for example, plastics such as polyethylene, polypropylene, polyvinyl chloride, polycarbonate, polyphenylene oxide (PPO), ABS resin, phenol resin, polyester resin, polyurethane resin, ceramics such as alumina, stainless steel, titanium, etc. It is made of hard materials such as various metals. In particular, polypropylene, PP01A, has excellent moldability, is lightweight, and has sufficient strength.
It is preferably made of plastic such as BS resin.

In the illustrated example, each of the block bodies 4a to 4o is a solid member, but may be configured as a hollow member (manufactured by blow molding, for example).

Each of the processing chambers 6A to 6E is filled with a predetermined processing liquid, which will be described later.

In the illustrated configuration, the volume per processing chamber is 20~
The capacity may be approximately 3000 mj (or a small capacity of approximately 20 to 500 m1).

The width of the passages 71 to 76 (effective slit width) is
The thickness is preferably about 5 to 50 times the thickness of .

With such a width, the leader 25 and the film F can be transported without any trouble.

In addition, in the illustrated configuration, passages 71 to 74 between the processing chambers
The length is 10-200mm, preferably 20-60mm
It is better to set it as a degree.

A pair of blades 15 are installed in each of the passages 71 to 74, as shown.

The pair of blades 15 are attached to the block bodies 4g, 4k, 4h, and 41 so that their tips are in close contact with each other when the leader 25 and film F are not passing through. Then, when the leader 25 and the film F pass through, the leading end portion is pushed and spread out by the advance of the leader 25.

FIG. 4a shows an enlarged view of the passage 71 portion in FIG. 1.

As shown in FIG. 4a, the blade 15 is connected to the block body 4.
It consists of a base part that is attached to the g, and a tip part (thin part) whose thickness gradually decreases toward the tip, and is used in combination of the two pieces. Further, the blade 15 may have substantially the same thickness from the base to the tip, as shown in FIG. 4b.

At this time, the average inclination angle of the blade 15 with respect to the surface of the film F is generally about 10 to 70 degrees.
In particular, it is preferably about 20 to 45 degrees.

The length from the base to the tip of the blade 15 may be greater than or equal to the effective slit width (W) of the passageway, but it is generally preferable to set it to 10 to 50 mm, which is 2 to 20 times this width, and particularly preferably. is preferably 3 to 10 times as large as 15 to 25 mm.

Then, the leader 25 in a pair of blades 15 installed facing each other and the blade 1 when the film F is not passing through.
It is preferable that the length of the overlapping portion between the tip portions of No. 5 is about 1 to 10 mm, particularly about 2 to 5 mm.

Further, the thickness of the tip of the blade 15 may be 1/100 or more of the length of the blade 15 or 0.-5 mm or more, and in particular, it may be IA-1,5111 m.

The contact surface pressure between the blades 15 is 0.001 to 0,
1 kg/cm”, especially 0.005 to 0.02
It is preferable to set it to about "kg/cm".

With the above conditions, it is possible to ensure close contact between the tips of the blades 15 when the leader 25 and the film F do not pass through, and to effectively block the flow of the processing liquid.

Further, the flow of the processing liquid when passing through the leader 25 and the film F can be made very small.

The material of the blade 15 may be any material as long as it does not adversely affect the processing liquid, such as natural rubber, chloroprene rubber,
Various rubbers such as nitrile rubber, butyl rubber, fluorine rubber, isoprene rubber, butadiene rubber, styrene butadiene rubber, ethylene propylene rubber, silicone rubber, soft resins such as soft polyvinyl chloride, polyethylene, polypropylene, ionomer resin, fluororesin, silicone resin, etc. In addition, elastomers such as Lavalon, Thermolan, Elastolan, Hytrel, and Sunbrain can also be used.

Normally, the adhesion force between the blades 15 is given by the elastic force of the blades, but if a magnetic material is mixed into the tip of the blade 15 (for example, a rubber magnet), the tip can be bonded together by magnetic force. Provides adhesion through suction,
Or it is possible to increase it.

Furthermore, even if the film F slides on the blade 15, there will hardly be any adverse effects such as scratches on the emulsion surface, but if this cannot be ignored, or if the sliding resistance is to be reduced, This can be achieved by performing a surface treatment such as smoothing the side surface or coating the inner surface with a lubricant such as silicone or Teflon.

In addition, in the illustrated example, the blade 15 is connected to each of the passages 71 to 7.
One pair is installed in each aisle, but two pairs are installed for each aisle.
More than one pair of blades 15 may be installed. In this case, the shielding effect and squeezing effect of the passages 71 to 74 become greater, and the amount of replenishment can be further reduced.

Further, the blades 15 are not limited to those forming a pair, and the blades 15 are not limited to those forming a pair.
As shown in the figure, the base of the blade 15 may be fixed to one wall in the passage 71, and the tip of the blade 15 may be in close contact with the other wall in the passage 71. .

Alternatively, as shown in FIG. 4d, the inner wall surface of the passage on the side opposite to the blade fixing side may protrude into the passage 71, and the tip of the blade 15 may be in close contact with this protrusion 45. In this configuration, the sliding resistance of the leader 25 and the film F is smaller than that shown in FIG. 4c.

In the configurations shown in FIGS. 4c and 4d, it is preferable to transport the film F so that the emulsion layer of the film F comes into contact with the blade 15.

Such a photosensitive material processing apparatus 1 is provided with a conveying means for conveying the film F so as to sequentially pass through each of the processing chambers 6A to 6E.

As shown in FIGS. 1 and 3, sprockets 8 are installed in each of the processing chambers 6A to 6E.

Each of these sprockets 8 is supported by a side plate 31, 32 at its rotating shaft 81, and is located approximately at the center of each processing chamber in the film width direction.

Incidentally, the sprockets 8 installed in the processing chambers 6A, 6B, 6D and 6E are housed in notch grooves 43 formed in the block bodies 4a and 4b, and a part thereof is located in the processing chamber 6A.
, 6B, 6D and 6E.

Drive Il of sprocket 8! As shown in FIG. 2, the bridge is constructed by meshing a bevel gear 83 fixed at a predetermined location on a main shaft 82 extending vertically in the figure with a bevel gear 84 fixed at one end of the rotating shaft 81 of the sprocket 8. However, the sprocket 8 is rotated by rotating the main shaft 82 in a predetermined direction by the operation of a drive source (not shown) such as a motor.

The constituent material of the sprocket 8 is preferably one having durability and chemical resistance to processing liquids, such as hard polyvinyl chloride, polypropylene, polyethylene, A
B] lt fat, ppo, nylon, boria (= tar (P
OM), phenolic resin, polyphenylene sulfide (
PPS), polyether sulfone (PES), polyether ether ketone (PEEK), various resins such as Teflon, ceramics such as alumina, metals with corrosion resistance such as stainless steel, titanium, and Hastelloy, or combinations of these. be able to.

As shown in FIG. 5, rollers 85 that freely rotate with respect to the rotating shaft 81 are installed at both ends of the sprocket 8 of the rotating shaft 81. As shown in FIG.

This roller 85 is for guiding the film connected to the leader 25, and the center portion in the film width direction has a concave shape.

Further, rollers 10 similar to the roller 85 described above, which freely rotate in contact with the back surface of the film F, are installed near the block bodies 4m and 4n, respectively.

By providing such rollers 85 and 10,
The transportability of the film F is improved.

Note that the rollers 85 and 10 are installed as necessary, and installation of all or part of them may be omitted.

Sprockets 8 in processing chambers 6A, 6B, 6D and 6E
A guide 9 that guides the reader 25 and regulates the conveyance path of the film F is installed between the passages 71 to 74.

This guide 9 is a plate-shaped member made of the same material as the block body, and openings 91 passing through the guide are formed substantially uniformly.

This enables the processing liquid to flow and promotes circulation of the liquid within the processing chamber, thereby improving processing efficiency.

Note that the guide 9 may be provided partially along the transport route, or may not be provided, as long as it does not impede the transportability of the leader 25.

Further, a guide 92 for introducing the reader 25 into the passage 75 is installed above the passage 75, and a guide 92 is installed above the passage 76.
Guides 93 are installed to send out the leader 2″5 that has passed through the passage 76 to the outside of the processing tank 2. These guides 92
and 93 are formed with curved surfaces 94 and 95 so as to allow smooth crossover between the processing tank 2 and an adjacent processing tank or the like.

The guides 9, 92 and 93, the sprocket 8 and its drive system, and the rollers 85 and 10 constitute a means for transporting the film F.

The leader 25 is made of, for example, polyethylene, polypropylene,
It is a plate-shaped member made of polyester, polyvinyl chloride, polyacetal, etc. Since this leader 25 is conveyed along the curved portion (curved surface 94, 44, 95) in the processing tank 2, it is preferable that it has some degree of flexibility.

A rectangular locking hole 2 is provided near the center of the leader 25 in the width direction.
6 are formed at regular intervals along the longitudinal direction of the leader 25. This locking hole 26 is for inserting the teeth of the sprocket 8.

Two films F are connected in parallel to the rear end of the leader 25. To connect the rear end of the leader 25 to the film F, for example, use adhesive tape (splice tape).
This is done by pasting at 27. In this case, in order to prevent the film F from falling off, the adhesive tape 27 is preferably attached to both sides of the film F.

Further, sloped notches 28 are formed at both ends of the tip of the leader 25 to facilitate passage of the leader 25.

Note that the number of films F connected to the rear end of the leader 25 is not particularly limited, and one film F may be connected and transported.

Such a leader 25 needs to have its locking hole 26 locked with one of the sprockets 8 while passing through the processing tank 2 . Therefore, the total length of the leader 25 is made longer than the maximum value of the installation interval between adjacent sprockets 8 along the conveyance path.

In this way, in the present invention, the film F is not directly transported, but the leader 25 is placed in front, and the film F is pulled and transported by the leader 25, so that jamming of the film F is less likely to occur, and the rollers and This prevents sensory defects such as scratches, transfer marks, and stains on the film emulsion surface due to contact with the film.

In such a photosensitive material processing apparatus 1, processing liquid supply means as described below is installed.

This processing liquid supply means supplies two or more types of processing liquids having different functions to different processing chambers for processing.

The block body 4a above the processing chamber 6A has a passage 75 at its end.
A liquid supply path 12 communicating with is formed.

Further, a liquid supply path 13 whose one end communicates with 76 is also formed in the block body 4b above the processing chamber 6E.

These liquid supply paths 12 and 13 connect the rack 3 to the processing tank 2.
When loaded in the tank, they are connected to two liquid supply pipes (not shown) penetrating the side wall 21 of the processing tank 2, respectively.

Further, one end of a drain pipe 14 that penetrates the side wall 21 of the processing tank 2 is installed in a processing chamber other than the processing chamber 6A through which the film F passes first and the processing chamber 6E through which it passes last, that is, the processing chamber 6C. .

The other end of this drain pipe 14 is installed at a height position that sets the liquid level in the processing tank 2 .

A bleaching solution (replenisher) R1 is supplied from the liquid supply path 12, and a fixing solution (replenisher) R3 is supplied from the liquid supply path 13.

The bleaching liquid R1 supplied from the liquid supply path 12 is supplied to the processing chamber 6A, the passage 71. It sequentially passes through the processing chamber 6B and the passage 72 and flows into the processing chamber 6C. On the other hand, the fixer R2 supplied from the liquid supply path 13 is transferred to the processing chamber 6E and the path 7 during processing.
4. It passes through the processing chamber 6D and the passage 73 in order and flows into the processing chamber 6C.

The bleaching solution R1 and the fixing solution R2 that have flowed into the processing chamber 6C in this way are mixed and stirred in the processing chamber 6C to become a bleach-fixing solution R3, and the exhausted bleach-fixing solution R1 is drained into the drain pipe 1.
The overflow is discharged to the outside.

In this case, during processing, the bleaching solution R3 flows in the same direction as the transport direction of the film F (parallel flow), and the fixing solution R3 flows in the same direction as the transport direction of the film F (parallel flow).
2 is a flow in the direction opposite to the transport direction of the film F (counter flow).

Further, in the photosensitive material processing apparatus 1, a processing liquid circulation means 5 as described below is installed.

As shown in FIG. 7, each of the processing chambers 6A to 6E includes a pipe 5 whose both ends penetrate the side wall 21 of the processing tank 2 and communicate with the processing chamber.
A to 5E are connected.

Further, in the middle of the pipes 5A to 5E, pumps 51A to 51E for liquid feeding and heaters 5 for heating the processing liquid are provided, respectively.
2A to 52E are installed.

As shown in FIGS. 1 and 2, a suction pipe 53 is connected to one end of each of the conduits 5A to 5E, and a nozzle 54 is connected to the other end.

For example, in the processing chamber 6A, the suction pipe 53
1 and protrudes into the processing chamber 6A, and its base end is connected to one end of the pipe line 5A when the rack 3 is loaded into the processing tank 2. ing.

On the other hand, the nozzle 54 is fixed to the rack 3 so as to penetrate through the side plate 31 and protrude into the processing chamber 6A.
5 is extended to the vicinity of the other side plate 32, and its base end 56 is connected to the other end of the conduit 5A when the rack 3 is loaded into the processing tank 2. And nozzle 54
A plurality of spout ports 57 that spout processing liquid are formed at positions facing the transport path of the film F.

Note that such a configuration is applicable to the processing chambers 6B, 6D, and 6E.
The same applies to the processing chamber 6C, except that the nozzle 54 is embedded in the block body 40.

Such pipe lines 5A to 5E and the corresponding pump 51
A to 51E, a suction pipe 53 and a nozzle 54 installed in the processing tank 2 constitute a processing liquid circulation means (circulation system) 5 that circulates the processing liquid to each of the processing chambers 6A to 6E.

In addition, various connectors, valves, etc. (not shown) may be installed in the middle of the pipes 5A to 5E.

In this processing liquid circulation means 5, when the pumps 51A to 51E and the heaters 52A to 52E are operated, the suction pipes 51A to 51E are activated.
The processing liquid sucked from 51E passes through the pipes 5A to 5E through one end of the pipes 5A to 5E, and then passes through the heaters 52A to 52E.
It is heated to a temperature as shown in Table 1 below, further reaches the other end of the pipes 5A to 5E, flows into the nozzle 54 from the base end 56 of the nozzle 54, and enters the respective processing chambers 6A to 5E from the spout 57. It is ejected into 6E. When the film F passes, the processing liquid jet from the jet port 57 is ejected toward the emulsion surface of the film F.

By providing such a processing liquid circulation means 5, the processing liquid in each of the processing chambers 6A to 6E is circulated and stirred, and the composition and temperature of the processing liquid are made uniform, so that good processing without uneven processing can be achieved. becomes possible. In particular, the processing solution is applied to the film F.
Since it is ejected towards the emulsion surface, stirring efficiency is improved.
Photographic properties can be improved.

The circulation rate of the processing liquid (flow rate in the pipe line) is not particularly limited, but is approximately 0.1 to 511 minutes per processing chamber, particularly 0.1 to 511 minutes per processing chamber.
It is preferable to set it as about 5-21/min. In this case, the circulation amount in each of the processing chambers 6A to 6E may be the same or different.

In the present invention, the processing liquid circulation means 5 may be provided only in some of the processing chambers 6A to 6E, or no processing liquid circulation means may be provided at all.

For example, when processing a color negative film, the temperature of the processing liquid is preferably within the range shown in Table 1 below.

Table 1 Developer Bleach Bleach Fixer Fixer Wash Water Stabilizer Processing Solution Temperature 35 to 40°C 30 to 45°C 30 to 45°C 30 to 45°C 25 to 50°C 25 to 50°C Also, in the photosensitive material processing apparatus l , each processing chamber 6A-6
Processing within E/(!(Bleach, bleach-fix and fix/(
It is also possible to use different temperatures. As an example, Table 2 below shows processing solution temperatures when processing color negative films.

Table 2 Processing chamber 6A Processing chamber 6B Processing chamber 6C Processing chamber 6D Processing chamber 6E Processing liquid temperature 30-45°C 30-45°C 30-40°C 30-40°C 30-40°C In this way, bleaching in the processing chamber 6A Adjust the temperature of the liquid to processing chamber 6E.
Bleaching and fixing can be improved by setting the temperature to be higher than that of the fixing solution in the container.

As a means for keeping the liquid 1 in each of the processing chambers 6A to 6E constant, for example, as shown in FIG. 1, a temperature sensor 16 that detects the temperature of the processing liquid is typically installed in the processing chamber 6C. The temperature sensor 16 detects the temperature of the processing liquid at any time or in a timely manner, and based on the detected value, a control means (not shown) such as a microcomputer turns on or off the heaters 52A to 52E or controls the amount of heat generated. can be controlled.

A plate-shaped partition member 17 is installed in the rack 3 and is perpendicular to the side plates 31 and 32. As shown in FIG. 6, this partition member 17 partitions a first area 18 indicated by diagonal lines on the left side of the figure and a second area 19 indicated by crossed diagonal lines on the right side of the figure, and prevents the flow of the processing liquid in both areas. It is for blocking.

The first region 18 is a processing chamber 6 through which the film F first passes.
This area includes A, and in the illustrated example, also includes process 6B, which is passed through second.

The second region 19 is the processing chamber 6 through which the film F passes last.
E, and in the illustrated example, it also includes the process 6D that is passed through second to last.

Both ends 171, ]72 of the partition member 17 are tapered (first
It is preferable that the width gradually decreases toward the bottom in the figure), and that the corresponding side walls 21 and 22 of the processing tank 2 also have a tapered shape with the same angle. As a result, when the rack 3 is inserted into the processing tank 2, the ends 171 and 172 of the partition member 17 engage with the inner surfaces of the side walls 21 and 22 of the processing tank 2, respectively, and the first region 18 and the second region 19 and partition. At this time, the engaging portion comes into close contact with the rack 3 due to its own weight, substantially blocking the flow of the processing liquid.

Note that it is preferable to install a seal member (not shown) similar to the seal member 11 at this engaging portion, for example, the end portions 171 and 172, since this further improves the blocking performance of the processing liquid.

The taper angles of the ends 171, 172 of the partition member 17 and the side walls 21, 22 of the processing tank 2 are not particularly limited, but are preferably about 1 to 10 degrees with respect to the vertical direction.

Note that the constituent material of the partition member 17 is also the same as that of the block body 4a.
-40 can be used, and partition member 1
7, each of the block bodies 4a to 4o, the side plates 31, 32, etc. may be joined to separate members or may be integrally formed.

Further, at predetermined positions in the height direction of the rack 3 on the outside of the side plates 31 and 32, flat plates 20 are installed which are perpendicular to the side plates 31 and 32 and the partition member 17, respectively.

The main shaft 82 passes through this flat plate 20 and is supported.

The installation position of the flat plate 20 is preferably at or near a certain height of the passages 71 to 74.

This flat plate 20 prevents the processing liquid from flowing in the vertical direction between the side plate 31 and the side wall 21 and between the side plate 32 and the side wall 22. Thereby, it is possible to prevent the processing liquids in each of the processing chambers 6A to 6E from mixing through the outside of the side plates 31 and 32.

Next, the usage and operation of the photosensitive material processing apparatus I will be explained.

When starting the processing of the film F, the bleaching solution R1 and the fixing solution R2 are supplied from the introduction channels 12 and 13, respectively, and a processing solution of a predetermined composition is placed in each of the processing chambers 6A to 6E and each of the passages 71 to 74. will be satisfied.

At this time, as described above, since the blade 15 is configured to block the flow of the processing liquid when the leader 25 and the film F do not pass, when supplying the processing liquid,
For example, it is preferable to convey the empty leader 25 to which the film F is not connected to smoothly supply the film. Further, each of the processing chambers 6A to 6E may be provided with a liquid supply port (not shown) and filled with the processing liquid.

Next, the pumps 51A to 51E and the heaters 52A to 52E of each processing liquid circulation means 5 are operated to make each processing chamber 6A to 6E
Controls the temperature, circulates, and stirs the processing liquid inside. That is, pumps 51A to 51E and heaters 52A to 52E
When activated, the processing liquid sucked through the suction pipes 51A to 51E passes through the pipes 5A to 5E through one end of the pipes 5A to 5E, and is heated to a temperature as shown in Table 1 below by the heaters 52A to 52E. It is heated, further reaches the other ends of the pipes 5A to 5E, and flows into the nozzle 54 from the base end 56 of the nozzle 54,
It is ejected from the ejection port 57 into each of the processing chambers 6A to 6E. .

Incidentally, such circulation of the processing liquid and temperature control are continued at least while the film F is being processed, and preferably continue even when the film F is not being processed.

In this state, when the leader 25 to which the film F is connected approaches the processing tank 2, replenishment of processing liquid from the liquid supply paths 12 and 13 is started.

The reason why replenishment of the processing liquid is started almost simultaneously with the start of processing of the film F as described above is because the blade 15 has a great blocking effect on the processing liquid. This is because the liquid substantially flows.

During the treatment period, this replenishment continues and the drain pipe 14
Approximately the same amount of processing solution as the total replenishment amount (bleach-fix solution R,)
is discharged.

On the other hand, when the conveying means is operated and the leader 25 is carried into the passage 75 along the curved surface 94 of the guide 92 with each sprocket 8 rotated, the locking hole 26 of the leader 25
The teeth of the sprocket 8 engage, moving the leader 25 into the processing chamber 6.
Then, as shown by the arrow in the figure, the processing chamber 6A, passage 71, processing chamber 6B, passage 72, processing v6C
1 passage 73, processing i6D, passage 74, and processing chamber 6E, and after passing through passage 76, guide 93
is carried out of the processing tank 2 along the curved surface 95 of the processing tank 2.

The film F is then pulled by the leader 25 and conveyed along the same route.

In this way, while the film F is transported through each of the processing chambers 6A to 6E, the film F comes into contact with the processing liquid and undergoes desilvering processing. In this case, when the film F passes through the nozzle 54, the processing liquid jet ejected from the ejection port 57 collides with the emulsion surface of the film F, so that processing is accelerated.

Note that in the processing chamber 6C, the leader 25 is conveyed along the curved surface 44 of the block body 40 (see the dashed line in FIG. By being pressed by the treatment liquid jet from the nozzle 54, the edge portion of the film F passes through the roller 85 while being in contact with the roller 85 (see the two-dot chain line in FIG. 1).

When the processing is completed and the rear end of the film F is carried out of the processing tank 2, replenishment of the processing liquid is stopped at the same time.

In such processing, the liquid composition gradient in each processing chamber 6A to 6E is maintained well due to the shielding effect of the blade 15, and the squeezing effect of the blade 15 also prevents the liquid from flowing from the previous processing chamber to the subsequent processing chamber. Since the amount brought in is extremely small, processing efficiency is greatly improved, and bleaching (5R) is greatly improved.
+ and the amount of replenishment of fixer R2 can be significantly reduced.

The amount of replenishment may be approximately the amount of circulation determined by the gap created when the leader 25 and the film F pass through the blade 15.

Such replenishment amount mainly depends on the width, thickness, conveyance speed, etc. of the film F. Taking the processing of 135 color negative film as an example, the results are as shown in Table 3 below.

Note that the replenishment amount in Table 3 is the replenishment amount per 1 m of film.

Table replenishment amount (mj/m) Bleach 7 nights 3-7 Fixer 15-20 The replenishment amount illustrated in Table 3 is 50-80% compared to conventional
Even with such a small replenishment amount, there is no occurrence of defective desilvering.

In this way, since the replenishment amount is reduced, each processing chamber 6
It is possible to reduce the amount of processing liquid circulated within each processing chamber 6A to 6E, and to maintain uniformity of liquid composition and temperature within each processing chamber 6A to 6E without complicated and strict temperature control. It is possible to perform good processing.

In addition, as a result of being able to improve processing efficiency, the volume of each processing chamber 6A to 6E can be reduced, and the pumps 51A to 51E and heaters 52A to 52E can be made lower in output and smaller in size. Contributes to downsizing of photosensitive material processing equipment.

Further, when the leader 25 and the film F are not passing through (non-processing), the blade 15 blocks the flow of processing liquid between adjacent processing chambers, so mixing of processing liquids hardly occurs. As a result, even when processing is suspended for a long period of time and then restarted, efficient processing can be performed immediately.

The above-mentioned control of replenishment timing and replenishment amount, adjustment of circulation amount, temperature control of the processing liquid, etc. may be performed using known control methods and means.

In the above description, it is assumed that the processing liquid is replenished at the same time as the film F is processed, but the processing liquid may be replenished when the film F is not processed.

In such a case, a bypass may be provided to connect adjacent processing chambers, so that an amount of liquid corresponding to the amount of replenishment in the preceding processing chamber flows into the subsequent processing chamber.

Although the above description has been given of an example in which the photosensitive material processing apparatus of the present invention is applied to desilvering processing, the present invention is not limited to this (but can be applied to various processing).

In addition to the desilvering process described above, the photosensitive material processing apparatus of the present invention is preferably applied to processes that have the function of washing out unnecessary substances in the film F (for example, water washing, stabilization, fixing, adjustment 1 reversal, etc.). Among these, it is particularly preferable to apply the method to washing with water. In this case, the washing water is replenished from the processing chamber E, the liquid is drained from the processing chamber 6A, and the washing water flows in the direction opposite to the transport direction of the film F (counter flow).
It is preferable to improve the water washing efficiency.

For example, when the photosensitive material processing apparatus of the present invention is applied to water washing processing, the degree of contamination of the washing water in each of the processing chambers 6A to 6E due to chemicals adhering to the reader 25 and film F brought in from the pre-bath, etc. Due to the squeezing effect of the blade 15, the amount of liquid carried from the previous processing chamber to the subsequent processing chamber is extremely small.Also, since the blade 15 has an extremely high ability to block liquid, furthermore, as mentioned above, counterflow is reduced. Since the processing liquid is supplied in the processing chamber 6A, the processing chamber 6A is large, and the processing chambers 6B, 6C, 16D, and 6E are gradually smaller (and then each processing chamber 6A to 6F is
The liquid composition gradient at is maintained very well.

Therefore, the water washing efficiency is significantly improved and the amount of replenishment can be significantly reduced.

In addition, in such water washing treatment, compared to the above-mentioned desilvering treatment,
Since there is little need for circulation, stirring, or strict temperature control of the processing liquid, installation of processing liquid circulation means and temperature control means can be omitted.

In addition to the above, the photosensitive material processing apparatus of the present invention can also perform development processing,
It can be applied to various treatments such as bleaching, fixing, and bleach-fixing alone, and at this time, the flow of the treatment liquid can be changed by appropriately selecting the liquid supply/drainage pipe and the like.

In general, in processing solutions containing compounds that react with silver halide, etc. in film F, such as developing solutions, bleach solutions, bleach-fix solutions, and fixing solutions, the flow of the processing solution is different from the washing water described above. It is preferable to flow in the same direction as the transport direction (parallel flow) in order to improve processing efficiency. As for the processing liquid having a fixing function, counter flow may be used since it also has the effect of washing out unnecessary substances in the sensitive material, as described above.

Even when these various treatments are applied, the squeezing effect and liquid blocking effect by the blade can be obtained in the same way as described above, and in both cases, treatment efficiency is improved, and it is possible to reduce the amount of replenishment and downsize the device. can.

The various processing solutions used in the present invention, such as a black and white developer, a color developer, a bleach solution, a fixer, a bleach-fixer, a washing water, a stabilizer, a stop solution, an adjustment solution, and a reversal solution, may be any of the known ones. For details on these processing solutions, please refer to "Fundamentals of Photographic Engineering" edited by the Photographic Society of Japan, published by Corona Publishing (1978).
P299 r 4th Child Development Process" etc. can be referred to.

In the photosensitive material processing apparatus of the present invention, the type of film to be processed is not particularly limited, and may be either color or black and white. For example, color negative film,
Examples include color reversal film, color positive film, black and white negative film, micro film, etc., and the size thereof is not particularly limited.

The photosensitive material processing apparatus of the present invention can process various types of photosensitive materials, such as a large automatic developing machine, a small automatic developing machine (mini lab), a photo print making coin machine, a portable color negative developing machine, and a color negative/color paper integrated developing machine. It can be applied to the device.

Although the configuration examples of the present invention have been described above, the present invention is not limited to these.

<Effects of the Invention> According to the photosensitive material processing apparatus of the present invention, a liquid composition gradient of the processing liquid is formed between each processing chamber, and this liquid composition gradient is maintained.

Therefore, processing efficiency is improved, and the amount of replenishment and circulation of processing liquid can be reduced, as well as the amount of processing liquid in the processing chamber.As a result, the pumps installed in the processing liquid replenishment system and circulation system The power of the heater can be reduced, and the photosensitive material processing apparatus can be downsized.

Furthermore, in the present invention, the film transportability is improved compared to roller transport, and jamming accidents can be significantly reduced, and the occurrence of sensory defects can be prevented.

[Brief explanation of the drawing]

FIG. 1 is a cross-sectional side view showing an example of the configuration of a photosensitive material processing apparatus according to the present invention. FIG. 2 is a sectional view taken along line H-II in FIG. 1. FIG. 3 is a partially cutaway perspective view showing the structure near the passage in FIG. 1. FIGS. 4a, 4b, 4c, and 4d are sectional side views showing enlarged examples of the configuration of the blade, respectively. FIG. 5 is a cross-sectional front view showing the structure of the lower end of the photosensitive material processing apparatus shown in FIG. 1. FIG. 6 is a schematic diagram showing the first region and the second region in the photosensitive material processing apparatus of the present invention. FIG. 7 is a circuit configuration diagram schematically showing an example of the configuration of processing liquid circulation means in the photosensitive material processing apparatus of the present invention. Explanation of symbols 1...Photosensitive material processing device 2...Processing tank 21.22...Side wall 3...Rack 31.32...Side plates 4a to 40...Block body 42...Concave portion 43 . . . Notch groove 44 .・Suction pipe 54...Nozzle 55...Tip 56...Base end 57...Ejection ports 6A to 6E...Processing chambers 71 to 76...Passage 8...Sprocket 8I...Rotation Shaft 82...Main shaft 83.84...Bevel gear F...Film R1...Fixer R2...Fixer R3...Bleaching window @ Liquid application Rido Fuji Photo Film Co., Ltd.

Claims (6)

[Claims] (1) A processing tank, a plurality of processing chambers formed in the processing tank and sequentially connected by narrow passages, a blade installed to shield the passage, and a transport means for transporting the film. A photosensitive material processing apparatus that processes the film by sequentially passing the film through each processing chamber with each processing chamber filled with a processing liquid, wherein the film is conveyed by passing one end of the film. A photosensitive material processing apparatus characterized in that the processing is carried out by attaching to a leading member having a plurality of locking holes, locking the locking holes to a rotating sprocket, and transporting the leading member. (2) A rack having a plurality of processing chambers sequentially connected by narrow passages, a blade installed to shield the passages, and a conveying means for conveying the film is removably loaded into the processing tank. A partition member is installed on the rack side to partition a first region including a processing chamber through which the film passes first and a second region including a processing chamber through which the film passes last, and an end of the partition member is installed on the rack side. 2. The photosensitive material processing apparatus according to claim 1, wherein the portion engages with the inner surface of the processing tank to substantially block flow of processing liquid between the first and second regions. (3) The photosensitive material processing apparatus according to claim 1 or 2, further comprising processing liquid supply means for supplying two or more processing liquids having different functions from different processing chambers. (4) Claims 1 to 3, wherein the drain port is connected to a processing chamber other than the first processing chamber and the last processing chamber through which the film passes.
The photosensitive material processing device according to any one of the above. (5) The photosensitive material processing apparatus according to any one of claims 1 to 4, further comprising processing liquid circulation means for circulating and stirring the processing liquid in the processing chamber. (6) The processing liquid circulating means has a nozzle that spouts the processing liquid toward the emulsion surface of the film.
The photosensitive material processing apparatus described in .