JP7511979B2 - キャリア板の除去方法 - Google Patents
キャリア板の除去方法 Download PDFInfo
- Publication number
- JP7511979B2 JP7511979B2 JP2020123764A JP2020123764A JP7511979B2 JP 7511979 B2 JP7511979 B2 JP 7511979B2 JP 2020123764 A JP2020123764 A JP 2020123764A JP 2020123764 A JP2020123764 A JP 2020123764A JP 7511979 B2 JP7511979 B2 JP 7511979B2
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- Prior art keywords
- carrier plate
- workpiece
- step portion
- holding
- adhesive tape
- Prior art date
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- 238000000034 method Methods 0.000 claims description 59
- 239000002390 adhesive tape Substances 0.000 claims description 39
- 239000012790 adhesive layer Substances 0.000 claims description 25
- 239000007788 liquid Substances 0.000 claims description 24
- 239000012530 fluid Substances 0.000 claims description 14
- 238000005507 spraying Methods 0.000 claims description 8
- 239000004094 surface-active agent Substances 0.000 claims description 6
- 238000005520 cutting process Methods 0.000 description 29
- 239000000758 substrate Substances 0.000 description 24
- 239000002131 composite material Substances 0.000 description 20
- 239000010410 layer Substances 0.000 description 10
- 239000011347 resin Substances 0.000 description 8
- 229920005989 resin Polymers 0.000 description 8
- 239000000463 material Substances 0.000 description 7
- 230000015572 biosynthetic process Effects 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 238000000465 moulding Methods 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 239000005388 borosilicate glass Substances 0.000 description 2
- 230000005484 gravity Effects 0.000 description 2
- 239000011810 insulating material Substances 0.000 description 2
- 230000001678 irradiating effect Effects 0.000 description 2
- 238000003754 machining Methods 0.000 description 2
- 238000012536 packaging technology Methods 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 1
- 239000006061 abrasive grain Substances 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 239000003945 anionic surfactant Substances 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 239000003093 cationic surfactant Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000003292 glue Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- -1 polyethylene terephthalate Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
- H01L21/56—Encapsulations, e.g. encapsulation layers, coatings
- H01L21/568—Temporary substrate used as encapsulation process aid
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L21/6836—Wafer tapes, e.g. grinding or dicing support tapes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68327—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used during dicing or grinding
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68381—Details of chemical or physical process used for separating the auxiliary support from a device or wafer
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68381—Details of chemical or physical process used for separating the auxiliary support from a device or wafer
- H01L2221/68386—Separation by peeling
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Dicing (AREA)
Description
3 キャリア板
3a 第1面(表面)
3b 第2面(裏面)
3c 段差部
5 仮接着層
7 ワークピース
7a 第1面(表面)
9 デバイスチップ
11 モールド樹脂層
21 粘着テープ
21a 貫通穴
23 フレーム
2 切削装置
4 チャックテーブル
6 枠体
6a 流路
8 保持板
8a 保持面
10 バルブ
12 吸引源
14 切削ユニット
16 スピンドル
18 切削ブレード
22 剥離装置
24 保持ユニット
24a 保持面
26 プッシュ部材
32 ノズル
34 流体
42 槽
44 液体
Claims (6)
- キャリア板の表面に仮接着層を介して設けられたワークピースから該キャリア板を除去するキャリア板の除去方法であって、
該ワークピースが設けられた該表面側から該キャリア板の外周縁に沿って該キャリア板の外周部を加工し、該キャリア板の該表面側に比べて該キャリア板の裏面側が側方に突出した段差部を形成する段差部形成工程と、
該段差部形成工程を実施した後、該ワークピースの該キャリア板とは反対側で露出する表面に粘着テープを貼付するとともに、該粘着テープの外周部を環状のフレームに貼付する貼付工程と、
該貼付工程を実施した後、該キャリア板の上方に該ワークピースが位置付けられた状態で該粘着テープを介して該ワークピースを上方から保持ユニットで保持する保持工程と、
該保持工程を実施した後、プッシュ部材で該段差部に下向きの力を加えて該キャリア板を該ワークピースから離れる方向に移動させることで該ワークピースから該キャリア板を除去するキャリア板除去工程と、を含み、
該粘着テープには、該プッシュ部材を通す貫通穴が設けられており、
該キャリア板除去工程では、該貫通穴に挿入された該プッシュ部材で該段差部に下向きの力を加えて該ワークピースから該キャリア板を除去することを特徴とするキャリア板の除去方法。 - 該キャリア板除去工程では、該ワークピースと該キャリア板との間に流体を吹き付けた後に、又は該ワークピースと該キャリア板との間に流体を吹き付けながら、該段差部に下向きの力を加えて該ワークピースから該キャリア板を除去することを特徴とする請求項1に記載のキャリア板の除去方法。
- 該キャリア板除去工程では、該ワークピースと該キャリア板とを液体に沈めた状態で、該段差部に下向きの力を加えることを特徴とする請求項1又は請求項2に記載のキャリア板の除去方法。
- 該液体には、界面活性剤を含ませたことを特徴とする請求項3に記載のキャリア板の除去方法。
- 該キャリア板除去工程では、該ワークピースと該キャリア板とを該液体に沈めた状態で、該プッシュ部材に振動を付与しながら該段差部に下向きの力を加えることを特徴とする請求項3又は請求項4に記載のキャリア板の除去方法。
- 該キャリア板除去工程では、該ワークピースと該キャリア板とを該液体に沈めた状態で、該液体に振動を付与しながら該段差部に下向きの力を加えることを特徴とする請求項3又は請求項4に記載のキャリア板の除去方法。
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2020123764A JP7511979B2 (ja) | 2020-07-20 | 2020-07-20 | キャリア板の除去方法 |
KR1020210077763A KR20220011075A (ko) | 2020-07-20 | 2021-06-16 | 캐리어 판의 제거 방법 |
TW110126127A TW202205462A (zh) | 2020-07-20 | 2021-07-15 | 載板之除去方法 |
CN202110812287.8A CN113964074A (zh) | 2020-07-20 | 2021-07-19 | 载体板的去除方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2020123764A JP7511979B2 (ja) | 2020-07-20 | 2020-07-20 | キャリア板の除去方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2022020332A JP2022020332A (ja) | 2022-02-01 |
JP7511979B2 true JP7511979B2 (ja) | 2024-07-08 |
Family
ID=79460393
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2020123764A Active JP7511979B2 (ja) | 2020-07-20 | 2020-07-20 | キャリア板の除去方法 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP7511979B2 (ja) |
KR (1) | KR20220011075A (ja) |
CN (1) | CN113964074A (ja) |
TW (1) | TW202205462A (ja) |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010199184A (ja) | 2009-02-24 | 2010-09-09 | Lintec Corp | 剥離装置及び剥離方法 |
JP2011228337A (ja) | 2010-04-15 | 2011-11-10 | Mitsubishi Electric Corp | ウエハ剥がし方法およびウエハ剥がし装置 |
JP2013503366A (ja) | 2009-08-27 | 2013-01-31 | コーニング インコーポレイテッド | 超音波を利用した担体からのガラス基板の剥離 |
JP2020027888A (ja) | 2018-08-13 | 2020-02-20 | 株式会社ディスコ | キャリア板の除去方法 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6529321B2 (ja) | 2015-04-14 | 2019-06-12 | 株式会社ディスコ | デバイスパッケージの製造方法 |
-
2020
- 2020-07-20 JP JP2020123764A patent/JP7511979B2/ja active Active
-
2021
- 2021-06-16 KR KR1020210077763A patent/KR20220011075A/ko active Search and Examination
- 2021-07-15 TW TW110126127A patent/TW202205462A/zh unknown
- 2021-07-19 CN CN202110812287.8A patent/CN113964074A/zh active Pending
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010199184A (ja) | 2009-02-24 | 2010-09-09 | Lintec Corp | 剥離装置及び剥離方法 |
JP2013503366A (ja) | 2009-08-27 | 2013-01-31 | コーニング インコーポレイテッド | 超音波を利用した担体からのガラス基板の剥離 |
JP2011228337A (ja) | 2010-04-15 | 2011-11-10 | Mitsubishi Electric Corp | ウエハ剥がし方法およびウエハ剥がし装置 |
JP2020027888A (ja) | 2018-08-13 | 2020-02-20 | 株式会社ディスコ | キャリア板の除去方法 |
Also Published As
Publication number | Publication date |
---|---|
KR20220011075A (ko) | 2022-01-27 |
JP2022020332A (ja) | 2022-02-01 |
TW202205462A (zh) | 2022-02-01 |
CN113964074A (zh) | 2022-01-21 |
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