JP7569155B2 - Resin composition for low-reflection light-shielding layer, and low-reflection light-shielding layer and low-reflection light-shielding layer laminate using the same - Google Patents
Resin composition for low-reflection light-shielding layer, and low-reflection light-shielding layer and low-reflection light-shielding layer laminate using the same Download PDFInfo
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- JP7569155B2 JP7569155B2 JP2020038893A JP2020038893A JP7569155B2 JP 7569155 B2 JP7569155 B2 JP 7569155B2 JP 2020038893 A JP2020038893 A JP 2020038893A JP 2020038893 A JP2020038893 A JP 2020038893A JP 7569155 B2 JP7569155 B2 JP 7569155B2
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- low
- shielding layer
- reflection light
- light
- resin particles
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- 239000003063 flame retardant Substances 0.000 description 1
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- QDLAGTHXVHQKRE-UHFFFAOYSA-N lichenxanthone Natural products COC1=CC(O)=C2C(=O)C3=C(C)C=C(OC)C=C3OC2=C1 QDLAGTHXVHQKRE-UHFFFAOYSA-N 0.000 description 1
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- ZLNQQNXFFQJAID-UHFFFAOYSA-L magnesium carbonate Chemical compound [Mg+2].[O-]C([O-])=O ZLNQQNXFFQJAID-UHFFFAOYSA-L 0.000 description 1
- 239000001095 magnesium carbonate Substances 0.000 description 1
- 229910000021 magnesium carbonate Inorganic materials 0.000 description 1
- 150000002681 magnesium compounds Chemical class 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
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- DZVCFNFOPIZQKX-LTHRDKTGSA-M merocyanine Chemical compound [Na+].O=C1N(CCCC)C(=O)N(CCCC)C(=O)C1=C\C=C\C=C/1N(CCCS([O-])(=O)=O)C2=CC=CC=C2O\1 DZVCFNFOPIZQKX-LTHRDKTGSA-M 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 125000005395 methacrylic acid group Chemical group 0.000 description 1
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 1
- 125000001434 methanylylidene group Chemical group [H]C#[*] 0.000 description 1
- 239000010445 mica Substances 0.000 description 1
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- 238000012986 modification Methods 0.000 description 1
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- 239000005078 molybdenum compound Substances 0.000 description 1
- 150000002752 molybdenum compounds Chemical class 0.000 description 1
- CWQXQMHSOZUFJS-UHFFFAOYSA-N molybdenum disulfide Chemical compound S=[Mo]=S CWQXQMHSOZUFJS-UHFFFAOYSA-N 0.000 description 1
- 229910052982 molybdenum disulfide Inorganic materials 0.000 description 1
- 229910000476 molybdenum oxide Inorganic materials 0.000 description 1
- 150000002791 naphthoquinones Chemical class 0.000 description 1
- 150000002848 norbornenes Chemical class 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
- LYRFLYHAGKPMFH-UHFFFAOYSA-N octadecanamide Chemical compound CCCCCCCCCCCCCCCCCC(N)=O LYRFLYHAGKPMFH-UHFFFAOYSA-N 0.000 description 1
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 1
- OQCDKBAXFALNLD-UHFFFAOYSA-N octadecanoic acid Natural products CCCCCCCC(C)CCCCCCCCC(O)=O OQCDKBAXFALNLD-UHFFFAOYSA-N 0.000 description 1
- FATBGEAMYMYZAF-KTKRTIGZSA-N oleamide Chemical compound CCCCCCCC\C=C/CCCCCCCC(N)=O FATBGEAMYMYZAF-KTKRTIGZSA-N 0.000 description 1
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 1
- 239000012860 organic pigment Substances 0.000 description 1
- JMANVNJQNLATNU-UHFFFAOYSA-N oxalonitrile Chemical compound N#CC#N JMANVNJQNLATNU-UHFFFAOYSA-N 0.000 description 1
- PQQKPALAQIIWST-UHFFFAOYSA-N oxomolybdenum Chemical compound [Mo]=O PQQKPALAQIIWST-UHFFFAOYSA-N 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 239000012188 paraffin wax Substances 0.000 description 1
- RGSFGYAAUTVSQA-UHFFFAOYSA-N pentamethylene Natural products C1CCCC1 RGSFGYAAUTVSQA-UHFFFAOYSA-N 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920002492 poly(sulfone) Polymers 0.000 description 1
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 1
- 229920002857 polybutadiene Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229920006289 polycarbonate film Polymers 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 229920006393 polyether sulfone Polymers 0.000 description 1
- 229920002530 polyetherether ketone Polymers 0.000 description 1
- 229920001228 polyisocyanate Polymers 0.000 description 1
- 239000005056 polyisocyanate Substances 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 229920000069 polyphenylene sulfide Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 1
- 239000004810 polytetrafluoroethylene Substances 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229920005749 polyurethane resin Polymers 0.000 description 1
- 239000011118 polyvinyl acetate Substances 0.000 description 1
- 229920002689 polyvinyl acetate Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 229920002981 polyvinylidene fluoride Polymers 0.000 description 1
- KCTAWXVAICEBSD-UHFFFAOYSA-N prop-2-enoyloxy prop-2-eneperoxoate Chemical compound C=CC(=O)OOOC(=O)C=C KCTAWXVAICEBSD-UHFFFAOYSA-N 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- IZMJMCDDWKSTTK-UHFFFAOYSA-N quinoline yellow Chemical compound C1=CC=CC2=NC(C3C(C4=CC=CC=C4C3=O)=O)=CC=C21 IZMJMCDDWKSTTK-UHFFFAOYSA-N 0.000 description 1
- 239000001062 red colorant Substances 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000007152 ring opening metathesis polymerisation reaction Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 239000000344 soap Substances 0.000 description 1
- 235000010339 sodium tetraborate Nutrition 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 229940071182 stannate Drugs 0.000 description 1
- 125000005402 stannate group Chemical group 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 239000008117 stearic acid Substances 0.000 description 1
- VEALVRVVWBQVSL-UHFFFAOYSA-N strontium titanate Chemical compound [Sr+2].[O-][Ti]([O-])=O VEALVRVVWBQVSL-UHFFFAOYSA-N 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000006234 thermal black Substances 0.000 description 1
- 229920002725 thermoplastic elastomer Polymers 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 229930192474 thiophene Natural products 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- TUQOTMZNTHZOKS-UHFFFAOYSA-N tributylphosphine Chemical compound CCCCP(CCCC)CCCC TUQOTMZNTHZOKS-UHFFFAOYSA-N 0.000 description 1
- VLCLHFYFMCKBRP-UHFFFAOYSA-N tricalcium;diborate Chemical compound [Ca+2].[Ca+2].[Ca+2].[O-]B([O-])[O-].[O-]B([O-])[O-] VLCLHFYFMCKBRP-UHFFFAOYSA-N 0.000 description 1
- BSVBQGMMJUBVOD-UHFFFAOYSA-N trisodium borate Chemical compound [Na+].[Na+].[Na+].[O-]B([O-])[O-] BSVBQGMMJUBVOD-UHFFFAOYSA-N 0.000 description 1
- BIKXLKXABVUSMH-UHFFFAOYSA-N trizinc;diborate Chemical compound [Zn+2].[Zn+2].[Zn+2].[O-]B([O-])[O-].[O-]B([O-])[O-] BIKXLKXABVUSMH-UHFFFAOYSA-N 0.000 description 1
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 1
- 229920006337 unsaturated polyester resin Polymers 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 239000001060 yellow colorant Substances 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
- XAEWLETZEZXLHR-UHFFFAOYSA-N zinc;dioxido(dioxo)molybdenum Chemical compound [Zn+2].[O-][Mo]([O-])(=O)=O XAEWLETZEZXLHR-UHFFFAOYSA-N 0.000 description 1
- BNEMLSQAJOPTGK-UHFFFAOYSA-N zinc;dioxido(oxo)tin Chemical compound [Zn+2].[O-][Sn]([O-])=O BNEMLSQAJOPTGK-UHFFFAOYSA-N 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
- 239000004711 α-olefin Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/02—Diffusing elements; Afocal elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
- G03B17/00—Details of cameras or camera bodies; Accessories therefor
- G03B17/02—Bodies
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Laminated Bodies (AREA)
- Optical Elements Other Than Lenses (AREA)
- Camera Bodies And Camera Details Or Accessories (AREA)
Description
本発明は、新規組成の低反射遮光層用樹脂組成物、並びに、これを用いた低反射遮光層及び低反射遮光層積層体等に関する。 The present invention relates to a novel resin composition for low-reflection light-shielding layers, as well as low-reflection light-shielding layers and low-reflection light-shielding layer laminates using the same.
一眼レフカメラ、コンパクトカメラ、ビデオカメラ、スマートフォン等の各種光学機器においては、不要な入射光や反射光を除去し、ハレーション、レンズフレア、ゴースト等の発生を抑制する等の観点から、遮光性が高く低光沢な遮光部材が用いられている。例えば、不要光をカットするための遮光板や遮光リング等をレンズ間に介在させたレンズユニットやカメラモジュール等が各種光学機器に搭載されている。また、一眼レフカメラ、コンパクトカメラ、ビデオカメラ等の各種光学機器のシャッターや絞り部材等においては、外光によるハレーションやゴーストの発生等を防止する等の観点から、遮光性のある部材が使用されている。 In various optical devices such as single-lens reflex cameras, compact cameras, video cameras, and smartphones, light-shielding materials with high light-shielding properties and low gloss are used from the viewpoint of removing unnecessary incident light and reflected light and suppressing the occurrence of halation, lens flare, ghosting, and the like. For example, various optical devices are equipped with lens units and camera modules in which light-shielding plates or light-shielding rings for cutting out unnecessary light are interposed between lenses. In addition, light-shielding materials are used in the shutters and aperture components of various optical devices such as single-lens reflex cameras, compact cameras, and video cameras from the viewpoint of preventing the occurrence of halation and ghosting due to external light, and the like.
一方、近年のセンシング技術の目覚ましい進歩により、自動車、列車、汽車、電車、船舶、貨物船、航空機、宇宙機、ロケット、輸送機器、乗り物等の各種の移動体(以下、「移動ビークル」と称する場合がある。)においては、高度なセンシング技術の導入が検討されている。一例を挙げると、自車両の前方に存在する障害物(例えば他車両、歩行者、ガードレール、家屋等)を検出するために、撮像素子を備えたレンズユニット(カメラモジュール)や赤外線センサ等の光学センサを車室内に設置した自動車の開発が進展している。 On the other hand, due to the remarkable progress in sensing technology in recent years, the introduction of advanced sensing technology is being considered for various moving bodies (hereinafter sometimes referred to as "mobile vehicles") such as automobiles, trains, steam trains, ships, cargo ships, aircraft, spacecraft, rockets, transportation equipment, and vehicles. As one example, there is progress in the development of automobiles that are equipped with optical sensors such as lens units (camera modules) with image sensors and infrared sensors in the passenger compartment to detect obstacles (e.g. other vehicles, pedestrians, guardrails, houses, etc.) that exist in front of the vehicle.
従来、各種光学機器の遮光部材としては、金属薄膜に黒色塗料を塗布したものが用いられてきた。しかしながら、近年では、軽量なプラスチック材料への代替が検討されている。 Traditionally, thin metal films coated with black paint have been used as light-shielding materials in various optical devices. However, in recent years, there has been interest in using lightweight plastic materials as an alternative.
このような非金属製の遮光部材として、本出願人は、フィルム基材と、前記基材の少なくとも片面に形成された遮光膜とを有する光学機器用遮光部材であって、前記遮光膜は、バインダー樹脂、カーボンブラック、粒子状の滑剤、及び微粒子を含有し、前記バインダー樹脂及び前記滑剤の含有率が、それぞれ70重量%以上、5~15重量%であり、前記滑剤は、密度が前記微粒子よりも大きいことを特徴とする光学機器用遮光部材を提案している(特許文献1参照)。 As such a non-metallic light-shielding member, the applicant has proposed a light-shielding member for optical devices having a film substrate and a light-shielding film formed on at least one side of the substrate, the light-shielding film containing a binder resin, carbon black, a particulate lubricant, and fine particles, the binder resin and lubricant contents being 70% by weight or more and 5-15% by weight, respectively, and the lubricant having a density greater than that of the fine particles (see Patent Document 1).
特許文献1の技術では、遮光膜中に70重量%以上のバインダー樹脂及び2~5重量%程度のシリカ等の微粒子を含有させるとともに、密度が疎な特定の滑剤5~15重量%をさらに含有させた処方としている。しかしながら、この処方では、遮光膜の、正反射を含む拡散反射率(550nm)及び正反射を含む拡散反射率(905nm)がともに5%以上と大きく、表面反射率の点で改善の余地があった。また近年においては、デザイン性の観点などから、高級感のある低光沢で黒々しいデザインに人気が高まりつつあり、それとの調和が求められてきている。しかしながら、特許文献1の技術では、例えばCIE 1976 L*a*b*表色系におけるL*値が25以上であり、黒色度の点でも、改善の余地があった。 In the technology of Patent Document 1, the light-shielding film contains 70% by weight or more of binder resin and 2-5% by weight of fine particles such as silica, and further contains 5-15% by weight of a specific lubricant with a low density. However, in this formulation, the diffuse reflectance (550 nm) including regular reflection and the diffuse reflectance (905 nm) including regular reflection of the light-shielding film are both large at 5% or more, and there is room for improvement in terms of surface reflectance. In addition, in recent years, from the viewpoint of design, low gloss and black designs with a high-class feel are becoming increasingly popular, and there is a demand for harmony with them. However, in the technology of Patent Document 1, for example, the L * value in the CIE 1976 L * a * b * color system is 25 or more, and there is also room for improvement in terms of blackness.
また、遮光膜の表面反射率は、一般的には遮光膜の表面粗さ(RaやRz等)が大きくなるほど小さくなる傾向にある。一方、遮光膜の表面粗さ(RaやRz等)が大きくなるほど、CIE 1976 L*a*b*表色系におけるL*値が大きくなる傾向にある。すなわち、特許文献1に記載の設計指針では、遮光膜の表面反射率を小さくするために遮光膜の表面粗さ(RaやRz等)を大きくすると、それとともにL*値が大きくなってしまい、低い表面反射率、低いL*値、低い表面粗さの3者を同時に達成することができていない。そのため、これら3者を同時に達成することが可能な、新たな設計指針が求められる。 In addition, the surface reflectance of the light-shielding film generally tends to decrease as the surface roughness (Ra, Rz, etc.) of the light-shielding film increases. On the other hand, the L * value in the CIE 1976 L * a * b * color system tends to increase as the surface roughness (Ra, Rz, etc.) of the light-shielding film increases. That is, in the design guideline described in Patent Document 1, when the surface roughness (Ra, Rz, etc.) of the light-shielding film is increased to reduce the surface reflectance of the light-shielding film, the L * value increases accordingly, and it is not possible to simultaneously achieve the three of low surface reflectance, low L * value, and low surface roughness. Therefore, a new design guideline capable of simultaneously achieving these three is required.
本発明は、上記課題に鑑みてなされたものである。すなわち本発明は、表面反射率及びL*値が小さな低反射遮光層を実現可能な、新規組成の樹脂組成物等を提供することを目的とする。また、本発明の別の目的は、表面反射率、L*値、及び表面粗さが小さな低反射遮光層を実現可能な、新規組成の樹脂組成物等を提供することにある。 The present invention has been made in view of the above problems. That is, the present invention aims to provide a resin composition having a new composition capable of realizing a low-reflection light-shielding layer having a small surface reflectance and L * value. Another object of the present invention is to provide a resin composition having a new composition capable of realizing a low-reflection light-shielding layer having a small surface reflectance, L * value, and surface roughness.
そして、本発明の他の目的は、表面反射率及びL*値が小さな低反射遮光層並びに低反射遮光層積層体等を提供することにある。また、本発明の別の目的は、表面反射率、L*値、及び表面粗さが小さな低反射遮光層並びに低反射遮光層積層体を提供することにある。そしてさらに、本発明は、これらの低反射遮光層並びに低反射遮光層積層体等を用いた、高性能な低反射部材、光学機器用低反射部材、及び光学機器用遮光低反射部材等を提供することをより好ましい目的として有する。 Another object of the present invention is to provide a low-reflection light-shielding layer and a low-reflection light-shielding layer laminate having a small surface reflectance and L * value. Another object of the present invention is to provide a low-reflection light-shielding layer and a low-reflection light-shielding layer laminate having a small surface reflectance, L * value, and surface roughness. Furthermore, the present invention has a more preferred object of providing a high-performance low-reflection member, a low-reflection member for optical equipment, and a light-shielding low-reflection member for optical equipment using the low-reflection light-shielding layer and the low-reflection light-shielding layer laminate.
本発明者らは、上記課題を解決するためにフィルム表面形状や光学特性等を鋭意検討した結果、従来技術とは別異の樹脂組成を見出し、この新規な樹脂組成によれば、上記課題を解決し得ることを見出し、本発明を完成するに至った。 The inventors conducted extensive research into the film surface shape and optical properties in order to solve the above problems, and discovered a resin composition that is different from that of conventional techniques. They discovered that this new resin composition can solve the above problems, and thus completed the present invention.
〔1〕バインダー樹脂、着色材、樹脂粒子、及び分散媒を少なくとも含有し、前記バインダー樹脂の含有割合が、固形分総量に対する固形分換算で、合計で1~30質量%であり、前記着色材の含有割合が、固形分総量に対する固形分換算で、合計で0.1~35質量%であり、前記樹脂粒子の含有割合が、固形分総量に対する固形分換算で、合計で50~95質量%である、低反射遮光層用樹脂組成物。 [1] A resin composition for a low-reflection light-shielding layer, which contains at least a binder resin, a colorant, resin particles, and a dispersion medium, and in which the binder resin has a total content of 1 to 30 mass% in terms of solid content relative to the total solid content, the colorant has a total content of 0.1 to 35 mass% in terms of solid content relative to the total solid content, and the resin particles have a total content of 50 to 95 mass% in terms of solid content relative to the total solid content.
〔2〕前記樹脂粒子が、3~20μmの平均粒子径D50を有する上記〔1〕に記載の低反射遮光層用樹脂組成物。
〔3〕前記樹脂粒子が、着色樹脂粒子を含有する〔1〕又は〔2〕に記載の低反射遮光層用樹脂組成物。
[2] The resin composition for a low reflection light-shielding layer according to the above [1], wherein the resin particles have an average particle diameter D 50 of 3 to 20 μm.
[3] The resin composition for a low reflection light-shielding layer according to [1] or [2], wherein the resin particles contain colored resin particles.
〔4〕バインダー樹脂、前記バインダー樹脂中に分散した着色材、及び前記バインダー樹脂中に分散した樹脂粒子を少なくとも含有し、前記バインダー樹脂の含有割合が、固形分換算で総量に対して合計で1~30質量%であり、前記着色材の含有割合が、固形分換算で総量に対して合計で0.1~35質量%であり、前記樹脂粒子の含有割合が、固形分換算で総量に対して合計で50~95質量%である、低反射遮光層。 [4] A low-reflection light-shielding layer that contains at least a binder resin, a colorant dispersed in the binder resin, and resin particles dispersed in the binder resin, the binder resin content is 1 to 30% by mass in total relative to the total amount in solid content conversion, the colorant content is 0.1 to 35% by mass in total relative to the total amount in solid content conversion, and the resin particles content is 50 to 95% by mass in total relative to the total amount in solid content conversion.
〔5〕前記樹脂粒子が、着色樹脂粒子を含有する上記〔4〕に記載の低反射遮光層。
〔6〕前記樹脂粒子が、3~20μmの平均粒子径D50を有する上記〔4〕又は〔5〕に記載の低反射遮光層。
[5] The low reflection light-shielding layer according to the above [4], wherein the resin particles contain colored resin particles.
[6] The low reflection light-shielding layer according to the above [4] or [5], wherein the resin particles have an average particle diameter D 50 of 3 to 20 μm.
〔7〕一方の表面側の表面粗さRaが0.2~0.7μmである上記〔4〕~〔6〕のいずれか一項に記載の低反射遮光層。
〔8〕一方の表面側の表面粗さRzが2.0~5.0μmである上記〔4〕~〔7〕のいずれか一項に記載の低反射遮光層。
〔9〕一方の表面側の550nm拡散反射率(正反射を含む)が0.0%以上3.0%未満である上記〔4〕~〔8〕のいずれか一項に記載の低反射遮光層。
〔10〕一方の表面側の905nm拡散反射率(正反射を含む)が、0.0%以上3.0%未満である上記〔4〕~〔9〕のいずれか一項に記載の低反射遮光層。
〔11〕一方の表面側のCIE 1976 L*a*b*表色系におけるL*値が0~18である上記〔4〕~〔10〕のいずれか一項に記載の低反射遮光層。
[7] The low reflection light-shielding layer according to any one of the above [4] to [6], wherein the surface roughness Ra of one surface side is 0.2 to 0.7 μm.
[8] The low reflection light-shielding layer according to any one of the above [4] to [7], wherein the surface roughness Rz of one surface side is 2.0 to 5.0 μm.
[9] The low reflection light-shielding layer according to any one of the above [4] to [8], wherein the diffuse reflectance (including regular reflection) at 550 nm on one surface side is 0.0% or more and less than 3.0%.
[10] The low reflection light-shielding layer according to any one of the above [4] to [9], wherein the 905 nm diffuse reflectance (including regular reflection) on one surface side is 0.0% or more and less than 3.0%.
[11] The low reflection light-shielding layer according to any one of [4] to [10], wherein one surface side has an L * value of 0 to 18 in the CIE 1976 L * a * b * color system.
〔12〕0.5以上の光学濃度ODを有する上記〔4〕~〔11〕のいずれか一項に記載の低反射遮光層。
〔13〕1~30μmの厚みを有する上記〔4〕~〔12〕のいずれか一項に記載の低反射遮光層。
[12] The low-reflection light-shielding layer according to any one of [4] to [11] above, which has an optical density OD of 0.5 or more.
[13] The low reflection light-shielding layer according to any one of [4] to [12] above, having a thickness of 1 to 30 μm.
〔14〕基材と、前記基材の少なくとも一方の主面側に設けられた上記〔4〕~〔13〕のいずれか一項に記載の低反射遮光層とを備えることを特徴とする、低反射遮光層積層体。
〔15〕基材フィルムと、前記基材フィルムの一方の主面側に設けられた〔4〕~〔13〕のいずれか一項に記載の低反射遮光層と、前記基材フィルムの他方の主面側に設けられた〔4〕~〔13〕のいずれか一項に記載の低反射遮光層と、を備えることを特徴とする、低反射遮光層積層体。
[14] A low-reflection light-shielding layer laminate comprising a substrate and the low-reflection light-shielding layer according to any one of [4] to [13] above, provided on at least one main surface side of the substrate.
[15] A low-reflection light-shielding layer laminate comprising a base film, a low-reflection light-shielding layer according to any one of [4] to [13] provided on one main surface side of the base film, and a low-reflection light-shielding layer according to any one of [4] to [13] provided on the other main surface side of the base film.
本発明によれば、表面反射率及び表面光沢度が小さな低反射遮光層を実現可能な、新規組成の樹脂組成物等を提供することができる。また、本発明の好ましい態様によれば、表面反射率、L*値、及び表面粗さが小さな低反射遮光層を実現可能な、新規組成の樹脂組成物等を提供することができる。そして、本発明によれば、表面反射率及び表面光沢度が小さな低反射遮光層並びに低反射遮光層積層体等を提供することができ、本発明の好ましい態様によれば、表面反射率、L*値、及び表面粗さが小さな低反射遮光層並びに低反射遮光層積層体を提供することができる。そのため、例えば光学センサ類の撮像画像や検出精度の劣化ないしは低下を抑制することができ、撮像画像や検出精度をより一層高めることが可能になる。また、より黒々しい外観を有する低反射遮光層等を実現できるため、これを搭載する各種光学機器のデザイン性を向上することもできる。そして、本発明によれば、従来には存在しなかった新規な設計の高性能な低反射部材、光学機器用低反射部材、及び光学機器用遮光低反射部材等を実現することもできる。 According to the present invention, a resin composition having a new composition can be provided that can realize a low-reflection light-shielding layer having a small surface reflectance and surface glossiness. In addition, according to a preferred embodiment of the present invention, a resin composition having a new composition can be provided that can realize a low-reflection light-shielding layer having a small surface reflectance, L * value, and surface roughness. According to the present invention, a low-reflection light-shielding layer and a low-reflection light-shielding layer laminate having a small surface reflectance and surface glossiness can be provided, and according to a preferred embodiment of the present invention, a low-reflection light-shielding layer and a low-reflection light-shielding layer laminate having a small surface reflectance, L * value, and surface roughness can be provided. Therefore, for example, deterioration or a decrease in the captured image and detection accuracy of optical sensors can be suppressed, and it is possible to further improve the captured image and detection accuracy. In addition, since a low-reflection light-shielding layer having a darker appearance can be realized, the design of various optical devices equipped with this can be improved. According to the present invention, a high-performance low-reflection member, a low-reflection member for optical devices, and a light-shielding low-reflection member for optical devices having a novel design that did not exist in the past can also be realized.
以下、本発明の実施の形態について、図面を参照して詳細に説明する。なお、上下左右等の位置関係は、特に断らない限り、図面に示す位置関係に基づくものとする。また、図面の寸法比率は、図示の比率に限定されるものではない。但し、以下の実施の形態は、本発明を説明するための例示であり、本発明はこれらに限定されるものではない。なお、本明細書において、例えば「1~100」との数値範囲の表記は、その上限値「100」及び下限値「1」の双方を包含するものとする。また、他の数値範囲の表記も同様である。 The following describes in detail the embodiments of the present invention with reference to the drawings. Unless otherwise specified, the positional relationships, such as up, down, left, and right, are based on the positional relationships shown in the drawings. Furthermore, the dimensional ratios of the drawings are not limited to those shown. However, the following embodiments are merely examples for explaining the present invention, and the present invention is not limited to these. In this specification, for example, the notation of a numerical range such as "1 to 100" includes both the upper limit value "100" and the lower limit value "1". The same applies to the notation of other numerical ranges.
本発明の第一実施形態の低反射遮光層用樹脂組成物(以下、単に「樹脂組成物」と称する場合がある。)は、バインダー樹脂、着色材、樹脂粒子、及び分散媒を少なくとも含有する。バインダー樹脂、着色材、及び樹脂粒子は、分散媒中で分散されていればよいが、これらの一部が分散媒に溶解していてもよい。 The resin composition for a low-reflection light-shielding layer according to the first embodiment of the present invention (hereinafter, sometimes simply referred to as the "resin composition") contains at least a binder resin, a colorant, resin particles, and a dispersion medium. The binder resin, colorant, and resin particles may be dispersed in the dispersion medium, but a portion of these may also be dissolved in the dispersion medium.
バインダー樹脂としては、当業界で公知のものを用いることができ、その種類は特に限定されない。具体的には、ポリ(メタ)アクリル酸系樹脂、ポリエステル系樹脂、ポリ酢酸ビニル系樹脂、ポリ塩化ビニル系樹脂、ポリビニルブチラール系樹脂、セルロース系樹脂、ポリスチレン/ポリブタジエン樹脂、ポリウレタン系樹脂、アルキド樹脂、アクリル系樹脂、不飽和ポリエステル系樹脂、エポキシエステル系樹脂、エポキシ系樹脂、エポキシアクリレート系樹脂、ウレタンアクリレート系樹脂、ポリエステルアクリレート系樹脂、ポリエーテルアクリレート系樹脂、フェノール系樹脂、メラミン系樹脂、尿素系樹脂、ジアリルフタレート系樹脂等の熱可塑性樹脂又は熱硬化性樹脂が挙げられるが、これらに特に限定されない。また、熱可塑性エラストマー、熱硬化性エラストマー、紫外線硬化型樹脂、電子線硬化型樹脂等も用いることができる。これらは1種を単独で用いることができ、また2種以上を組み合わせて用いることもできる。なお、バインダー樹脂は、要求性能及び用途に応じて、適宜選択して用いることができる。例えば、耐熱性が求められる用途においては、熱硬化性樹脂が好ましい。 As the binder resin, those known in the art can be used, and the type is not particularly limited. Specific examples include thermoplastic resins or thermosetting resins such as poly(meth)acrylic acid resins, polyester resins, polyvinyl acetate resins, polyvinyl chloride resins, polyvinyl butyral resins, cellulose resins, polystyrene/polybutadiene resins, polyurethane resins, alkyd resins, acrylic resins, unsaturated polyester resins, epoxy ester resins, epoxy resins, epoxy acrylate resins, urethane acrylate resins, polyester acrylate resins, polyether acrylate resins, phenol resins, melamine resins, urea resins, and diallyl phthalate resins, but are not particularly limited thereto. Thermoplastic elastomers, thermosetting elastomers, ultraviolet curable resins, and electron beam curable resins can also be used. These can be used alone or in combination of two or more. The binder resin can be appropriately selected and used depending on the required performance and application. For example, in applications where heat resistance is required, thermosetting resins are preferred.
樹脂組成物中のバインダー樹脂の含有量(総量)は、膜形成に必要な程度で適宜設定することができ、特に限定されない。他の必須成分及び任意成分との配合バランスを考慮し、より優れた表面反射率及びL*値を、さらには必要に応じてより低い表面粗さを有する低反射遮光層を実現する観点から、バインダー樹脂の含有量(総量)は、樹脂組成物の固形分総量に対する固形分換算で、合計で1~30質量%が好ましく、より好ましくは合計で2~25質量%、さらに好ましくは合計で3~20質量%であり、特に好ましくは合計で5~15質量%である。なお、着色材や樹脂粒子がバインダー樹脂成分を含む場合、これらのバインダー樹脂成分も、ここでいう含有割合において、バインダー樹脂の合計量に組み込むものとする。 The content (total amount) of the binder resin in the resin composition can be appropriately set to a level necessary for film formation, and is not particularly limited. In consideration of the blending balance with other essential components and optional components, from the viewpoint of realizing a low-reflection light-shielding layer having a better surface reflectance and L * value, and furthermore a lower surface roughness as necessary, the content (total amount) of the binder resin is preferably 1 to 30 mass% in total, more preferably 2 to 25 mass% in total, even more preferably 3 to 20 mass% in total, and particularly preferably 5 to 15 mass% in total, in terms of solid content relative to the total solid content of the resin composition. In addition, when the colorant or resin particles contain binder resin components, these binder resin components are also incorporated into the total amount of the binder resin in the content ratio referred to here.
着色材としては、当業界で公知の顔料や染料を用いることができ、その種類は特に限定されない。着色材の種類、粒子サイズ、使用量を適宜選択することで、遮光性や光透過性を調整することができる。具体的には、マグネタイト系ブラック、銅・鉄・マンガン系ブラック、チタンブラック、カーボンブラック、アニリンブラック等が挙げられるが、これらに特に限定されない。着色材としては、遮光性、光透過性、色調等の調整の容易性等の観点から、黒色の無機顔料、黒色の有機顔料が好ましく用いられる。これらは1種を単独で用いることができ、また2種以上を組み合わせて用いることもできる。これらの中でも、着色材としては、無機顔料が望ましく、具体的には、チタンブラック、カーボンブラック、アニリンブラックが好ましく、より好ましくはカーボンブラック、アニリンブラックである。カーボンブラックとしては、オイルファーネスブラック、ランプブラック、チャンネルブラック、ガスファーネスブラック、アセチレンブラック、サーマルブラック、ケッチェンブラック等、各種公知の製法で作製されたものが知られているが、その種類は特に制限されない。導電性を付与し静電気による帯電を防止する観点から、着色材としては導電性カーボンブラックが特に好ましく用いられる。カーボンブラックの歴史は古く、例えば三菱化学株式会社、旭カーボン株式会社、御国色素株式会社、レジノカラー工業株式会社、Cabot社、DEGUSSA社等から、各種グレードのカーボンブラック単体及びカーボンブラック分散液が市販されており、要求性能や用途に応じて、これらの中から適宜選択すればよい。これらは、1種を単独で用いることができ、また2種以上を組み合わせて用いることもできる。 As the coloring material, pigments and dyes known in the art can be used, and the type is not particularly limited. By appropriately selecting the type, particle size, and amount of the coloring material, the light blocking property and light transmittance can be adjusted. Specifically, magnetite black, copper-iron-manganese black, titanium black, carbon black, aniline black, etc. can be mentioned, but are not particularly limited to these. As the coloring material, black inorganic pigments and black organic pigments are preferably used from the viewpoint of light blocking property, light transmittance, ease of adjustment of color tone, etc. These can be used alone, or two or more types can be used in combination. Among these, inorganic pigments are preferable as the coloring material, and specifically, titanium black, carbon black, and aniline black are preferable, and carbon black and aniline black are more preferable. As carbon black, oil furnace black, lamp black, channel black, gas furnace black, acetylene black, thermal black, ketjen black, etc., which are produced by various known manufacturing methods, are known, but the type is not particularly limited. From the viewpoint of imparting conductivity and preventing static electricity buildup, conductive carbon black is particularly preferably used as a colorant. Carbon black has a long history, and various grades of carbon black and carbon black dispersions are commercially available from, for example, Mitsubishi Chemical Corporation, Asahi Carbon Co., Ltd., Mikuni Color Co., Ltd., Resino Color Co., Ltd., Cabot Corporation, DEGUSSA Corporation, etc., and an appropriate selection may be made from these depending on the required performance and application. These may be used alone or in combination of two or more types.
なお、着色材の粒子サイズは、使用する着色材の種類や要求性能等に応じて適宜設定でき、特に限定されない。例えば着色材がカーボンブラックである場合、平均粒子径D50は0.01~2.0μmであることが好ましく、より好ましくは0.05~1.0μm、さらに好ましくは0.08~0.5μmである。なお、本明細書における平均粒子径D50とは、レーザー回折式粒度分布測定装置(例えば、島津製作所社:SALD-7000等)で測定される、体積基準のメジアン径(D50)を意味する。 The particle size of the colorant is not particularly limited and can be appropriately set depending on the type of colorant used, the required performance, etc. For example, when the colorant is carbon black, the average particle diameter D50 is preferably 0.01 to 2.0 μm, more preferably 0.05 to 1.0 μm, and even more preferably 0.08 to 0.5 μm. In this specification, the average particle diameter D50 means the volume-based median diameter ( D50 ) measured by a laser diffraction particle size distribution measuring device (for example, Shimadzu Corporation: SALD-7000, etc.).
樹脂組成物中の着色材の含有量(総量)は、遮光性や低光沢性等の要求性能に応じて適宜設定することができ、特に限定されない。他の必須成分及び任意成分との配合バランスを考慮し、より優れた表面反射率及びL*値を、さらには必要に応じてより低い表面粗さを有する低反射遮光層を実現する観点から、着色材の含有量(総量)は、樹脂組成物の固形分総量に対する固形分換算で、合計で0.1~35質量%が好ましく、より好ましくは合計で1~30質量%、さらに好ましくは合計で3~20質量%であり、特に好ましくは合計で5~15質量%である。なお、樹脂粒子として着色された樹脂粒子を用いた場合の着色材の含有量は、上述した着色材の質量と樹脂粒子に含まれる着色材の質量との合計(組成物中の着色材総量)とする。 The content (total amount) of the coloring material in the resin composition can be appropriately set according to the required performance such as light shielding property and low gloss, and is not particularly limited. In consideration of the blending balance with other essential components and optional components, from the viewpoint of realizing a low-reflection light-shielding layer having a better surface reflectance and L * value, and furthermore a lower surface roughness as necessary, the content (total amount) of the coloring material is preferably 0.1 to 35 mass% in total, more preferably 1 to 30 mass% in total, even more preferably 3 to 20 mass% in total, and particularly preferably 5 to 15 mass% in total, in terms of solid content relative to the total solid content of the resin composition. Note that the content of the coloring material when colored resin particles are used as the resin particles is the sum of the mass of the above-mentioned coloring material and the mass of the coloring material contained in the resin particles (total amount of coloring material in the composition).
樹脂粒子としては、当業界で公知のものを用いることができ、その種類は特に限定されない。具体的には、ポリメチルメタクリレート系、ポリスチレン系、ポリエステル系、ポリウレタン系、シリコーン樹脂系、ポリフッ化ビニリデン等のフッ素樹脂系、ゴム系等の樹脂粒子が挙げられるが、これらに特に限定されない。これらは1種を単独で用いることができ、また2種以上を組み合わせて用いることもできる。また、樹脂粒子の外観は、透明、半透明、不透明のいずれであってもよく、特に限定されない。また、樹脂粒子は、無色でもよいが、着色されていてもよい。例えば、黒色、灰色、紫色、青色、茶色、赤色、緑色等に着色された樹脂粒子(着色樹脂粒子)を用いることにより、着色材の使用量が比較的に少なくても光学濃度や色彩度の高い低反射遮光層を実現することができる。また、着色樹脂粒子を用いることにより、とりわけシリカ等の無機粒子を用いた場合に比して、L*値を大幅に低減させることができる。 As the resin particles, those known in the art can be used, and the type is not particularly limited. Specific examples include polymethyl methacrylate-based, polystyrene-based, polyester-based, polyurethane-based, silicone resin-based, fluororesin-based such as polyvinylidene fluoride, and rubber-based resin particles, but are not particularly limited thereto. These can be used alone, or two or more types can be used in combination. In addition, the appearance of the resin particles may be transparent, semi-transparent, or opaque, and is not particularly limited. In addition, the resin particles may be colorless, or may be colored. For example, by using resin particles (colored resin particles) colored in black, gray, purple, blue, brown, red, green, or the like, a low-reflection light-shielding layer with high optical density and color saturation can be realized even if the amount of colorant used is relatively small. In addition, by using colored resin particles, the L * value can be significantly reduced, especially compared to the case of using inorganic particles such as silica.
上述した表面反射率及びL*値を得る観点から、樹脂粒子は比較的に粗大な粒径を有することが好ましい。具体的には、樹脂粒子の平均粒子径D50は、下限が1μm以上であることが好ましく、より好ましくは2μm以上であり、さらに好ましくは4μm以上であり、特に好ましくは5μm以上である。また、上限としては、30μm以下、より好ましくは20μm以下、特に好ましくは15μm以下である。なお、塗工時において樹脂粒子の凝集を抑制し、或いは、仮に樹脂粒子が凝集した場合であっても凝集物の粒子径が過度に大きくならない程度の平均粒子径D50を有する樹脂粒子を用いることが、生産性や取扱性等の観点から求められることがある。 From the viewpoint of obtaining the above-mentioned surface reflectance and L * value, it is preferable that the resin particles have a relatively coarse particle size. Specifically, the average particle size D50 of the resin particles is preferably 1 μm or more, more preferably 2 μm or more, even more preferably 4 μm or more, and particularly preferably 5 μm or more. The upper limit is 30 μm or less, more preferably 20 μm or less, and particularly preferably 15 μm or less. In addition, it may be required from the viewpoint of productivity, handling, etc. to use resin particles having an average particle size D50 that suppresses the aggregation of resin particles during coating, or that does not make the particle size of the aggregates excessively large even if the resin particles are aggregated.
樹脂組成物中の樹脂粒子の含有量(総量)は、遮光性や低光沢性等の要求性能に応じて適宜設定することができ、特に限定されない。他の必須成分及び任意成分との配合バランスを考慮し、より優れた表面反射率及びL*値を、さらには必要に応じてより低い表面粗さを有する低反射遮光層を実現する観点から、樹脂粒子の含有量(総量)は、樹脂組成物の固形分総量に対する固形分換算で、合計で50~95質量%が好ましく、より好ましくは合計で55~90質量%、さらに好ましくは合計で60~85質量%である。なお、樹脂粒子として着色された樹脂粒子を用いた場合の樹脂粒子の含有量は、樹脂粒子に含まれる着色材を含む樹脂粒子の質量を基準とする。 The content (total amount) of the resin particles in the resin composition can be appropriately set according to the required performance such as light shielding property and low gloss, and is not particularly limited. In consideration of the blending balance with other essential components and optional components, from the viewpoint of realizing a low-reflection light-shielding layer having a better surface reflectance and L * value, and furthermore a lower surface roughness as required, the content (total amount) of the resin particles is preferably 50 to 95 mass% in total, more preferably 55 to 90 mass% in total, and even more preferably 60 to 85 mass% in total, in terms of solid content relative to the total solid content of the resin composition. Note that the content of the resin particles when colored resin particles are used as the resin particles is based on the mass of the resin particles including the colorant contained in the resin particles.
なお、本実施形態の樹脂組成物は、色調をコントロールするために、上述した着色材や樹脂粒子以外に、公知の色材を含有していてもよい。この色材としては、ジアリールメタン系;トリアリールメタン系;チアゾール系;メロシアニン、ピラゾロンメチン等のメチン系;インドアニリン、アセトフェノンアゾメチン、ピラゾロアゾメチン、イミダゾルアゾメチン、イミダゾアゾメチン等のアゾメチン系;キサンテン系;オキサジン系;ジシアノスチレン、トリシアノスチレン等のシアノメチレン系;チアジン系;アジン系;アクリジン系;ベンゼンアゾ系;ピリドンアゾ、チオフェンアゾ、イソチアゾールアゾ、ピロールアゾ、イミダゾールアゾ、チアジアゾールアゾ、トリアゾールアゾ、ジズアゾ等のアゾ系;スピロピラン系;インドリノスピロピラン系;フルオラン系;ナフトキノン系;アントラキノン系;キノフタロン系等が挙げられるが、これらに特に限定されない。例えば黒色系、青色系、緑色系、黄色系、赤色系の公知の色材を1種単独で用いることができ、また2種以上を組み合わせて用いることもできる。色材を用いる場合、色材の含有量(総量)は、要求性能に応じて適宜設定でき、特に限定されないが、他の必須成分及び任意成分との配合バランスを考慮し、樹脂組成物の固形分総量に対する固形分換算で、合計で0.1~10質量%が好ましく、より好ましくは合計で0.5~5質量%、さらに好ましくは合計で1~3質量%である。 In addition, the resin composition of this embodiment may contain known coloring materials in addition to the coloring materials and resin particles described above in order to control the color tone. Examples of the coloring material include, but are not limited to, diarylmethane-based materials; triarylmethane-based materials; thiazole-based materials; methine-based materials such as merocyanine and pyrazolone methine; azomethine-based materials such as indoaniline, acetophenone azomethine, pyrazoloazomethine, imidazole azomethine, and imidazoazomethine; xanthene-based materials; oxazine-based materials; cyanomethylene-based materials such as dicyanostyrene and tricyanostyrene; thiazine-based materials; azine-based materials; acridine-based materials; benzene azo-based materials; azo-based materials such as pyridone azo, thiophene azo, isothiazole azo, pyrrole azo, imidazole azo, thiadiazole azo, triazole azo, and diaz azo; spiropyran-based materials; indolinospiropyran-based materials; fluoran-based materials; naphthoquinone-based materials; anthraquinone-based materials; and quinophthalone-based materials. For example, known black, blue, green, yellow, and red colorants can be used alone or in combination of two or more. When colorants are used, the content (total amount) of the colorants can be appropriately set according to the required performance and is not particularly limited, but taking into consideration the blending balance with other essential and optional components, the total solid content of the resin composition is preferably 0.1 to 10 mass%, more preferably 0.5 to 5 mass%, and even more preferably 1 to 3 mass%.
また、樹脂組成物は、樹脂組成物の光沢度や色調等を調整するために、公知のマット剤(艶消し剤)を含有していてもよい。マット剤としては、例えばカオリン、焼成カオリン、焼成クレー、未焼成クレー、シリカ(例えば天然シリカ、溶融シリカ、アモルファスシリカ、中空シリカ、湿式シリカ、合成シリカ、アエロジル等)、アルミニウム化合物(例えばベーマイト、水酸化アルミニウム、アルミナ、ハイドロタルサイト、ホウ酸アルミニウム、窒化アルミニウム等)、マグネシウム化合物(例えば、メタケイ酸アルミン酸マグネシウム、炭酸マグネシウム、酸化マグネシウム、水酸化マグネシウム等)、カルシウム化合物(例えば炭酸カルシウム、水酸化カルシウム、硫酸カルシウム、亜硫酸カルシウム、ホウ酸カルシウム等)、モリブデン化合物(例えば酸化モリブデン、モリブデン酸亜鉛等)、タルク(例えば天然タルク、焼成タルク等)、マイカ(雲母)、酸化チタン、酸化亜鉛、酸化ジルコニウム、硫酸バリウム、ホウ酸亜鉛、メタホウ酸バリウム、ホウ酸ナトリウム、窒化ホウ素、凝集窒化ホウ素、窒化ケイ素、窒化炭素、チタン酸ストロンチウム、チタン酸バリウム、錫酸亜鉛等の錫酸塩等が挙げられるが、これらに特に限定されない。これらは1種を単独で用いることができ、また2種以上を組み合わせて用いることもできる。マット剤を用いる場合、マット剤の含有量(総量)は、要求性能に応じて適宜設定でき、特に限定されないが、他の必須成分及び任意成分との配合バランスを考慮し、より優れた表面反射率及び表面光沢度を有する低反射遮光層を実現する観点から、樹脂組成物の固形分総量に対する固形分換算で、合計で0.1~10質量%が好ましく、より好ましくは合計で0.5~5質量%、さらに好ましくは合計で1~3質量%である。 The resin composition may also contain a known matting agent (flatting agent) to adjust the gloss, color tone, etc., of the resin composition. Examples of matting agents include kaolin, calcined kaolin, calcined clay, uncalcined clay, silica (e.g., natural silica, fused silica, amorphous silica, hollow silica, wet silica, synthetic silica, aerosil, etc.), aluminum compounds (e.g., boehmite, aluminum hydroxide, alumina, hydrotalcite, aluminum borate, aluminum nitride, etc.), magnesium compounds (e.g., magnesium aluminometasilicate, magnesium carbonate, magnesium oxide, magnesium hydroxide, etc.), calcium compounds (e.g., carbonate, magnesium oxide, magnesium hydroxide, etc.), calcium compounds (e.g., calcium carbonate, magnesium oxide, magnesium hydroxide, etc.), calcium carbonate, magnesium oxide, magnesium hydroxide, magnesium oxide, magnesium hydroxide, magnesium oxide, magnesium hydroxide, magnesium oxide, magnesium oxide, magnesium oxide, magnesium oxide, magnesium oxide, magnesium oxide, magnesium oxide, magnesium oxide, magnesium oxide, magnesium oxide, magnesium oxide, calcium carbonate ... Examples of the stannate include calcium, calcium hydroxide, calcium sulfate, calcium sulfite, calcium borate, etc.), molybdenum compounds (e.g., molybdenum oxide, zinc molybdate, etc.), talc (e.g., natural talc, calcined talc, etc.), mica, titanium oxide, zinc oxide, zirconium oxide, barium sulfate, zinc borate, barium metaborate, sodium borate, boron nitride, aggregated boron nitride, silicon nitride, carbon nitride, strontium titanate, barium titanate, and zinc stannate, but are not particularly limited thereto. These may be used alone or in combination of two or more. When a matting agent is used, the content (total amount) of the matting agent can be set appropriately according to the required performance and is not particularly limited, but from the viewpoint of realizing a low-reflection light-shielding layer with better surface reflectance and surface glossiness, taking into consideration the blending balance with other essential and optional components, the content is preferably 0.1 to 10 mass% in total, more preferably 0.5 to 5 mass% in total, and even more preferably 1 to 3 mass% in total, calculated as solid content relative to the total solid content of the resin composition.
さらに、樹脂組成物は、当業界で公知の各種添加剤を含有していてもよい。その具体例としては、滑剤、導電剤、難燃剤、抗菌剤、防カビ剤、酸化防止剤、可塑剤、樹脂硬化剤、硬化剤、硬化促進剤、レベリング剤、流動調整剤、消泡剤、分散剤等が挙げられるが、これらに特に限定されない。滑剤としては、ポリエチレン、パラフィン、ワックス等の炭化水素系滑剤;ステアリン酸、12-ヒドロキシステアリン酸等の脂肪酸系滑剤;ステアリン酸アミド、オレイン酸アミド、エルカ酸アミド等のアミド系滑剤;ステアリン酸ブチル、ステアリン酸モノグリセリド等のエステル系滑剤;アルコール系滑剤;金属石鹸、滑石、二硫化モリブデン等の固体潤滑剤;ポリテトラフッ化エチレンワックス等が挙げられるが、これらに特に限定されない。これらの中でも、特に有機系滑剤が好ましく用いられる。また、バインダー樹脂として紫外線硬化型樹脂や電子線硬化型樹脂を用いる場合には、例えばn-ブチルアミン、トリエチルアミン、トリ-n-ブチルホスフィン等の増感剤や紫外線吸収剤等を用いてもよい。これらは1種を単独で用いることができ、また2種以上を組み合わせて用いることもできる。これらの含有割合は、特に限定されないが、樹脂組成物の固形分総量に対する固形分換算で、一般的にはそれぞれ0.01~5質量%であることが好ましい。 Furthermore, the resin composition may contain various additives known in the art. Specific examples include, but are not limited to, lubricants, conductive agents, flame retardants, antibacterial agents, antifungal agents, antioxidants, plasticizers, resin curing agents, curing agents, curing accelerators, leveling agents, flow control agents, defoamers, dispersants, etc. Lubricants include, but are not limited to, hydrocarbon-based lubricants such as polyethylene, paraffin, and wax; fatty acid-based lubricants such as stearic acid and 12-hydroxystearic acid; amide-based lubricants such as stearic acid amide, oleic acid amide, and erucic acid amide; ester-based lubricants such as butyl stearate and stearic acid monoglyceride; alcohol-based lubricants; solid lubricants such as metal soap, talc, and molybdenum disulfide; and polytetrafluoroethylene wax. Among these, organic lubricants are particularly preferred. In addition, when an ultraviolet-curable resin or an electron beam-curable resin is used as the binder resin, a sensitizer or an ultraviolet absorber, such as n-butylamine, triethylamine, or tri-n-butylphosphine, may be used. These may be used alone or in combination of two or more. The content ratio of these is not particularly limited, but is generally preferably 0.01 to 5 mass% each in terms of solid content relative to the total solid content of the resin composition.
分散媒としては、特に限定されないが、水;メチルエチルケトン、メチルイソブチルケトン、シクロヘキサノン等のケトン系溶剤;酢酸メチル、酢酸エチル、酢酸ブチル等のエステル系溶剤;メチルセロソルブ、エチルセロソルブ等のエーテル系溶剤;メチルアルコール、エチルアルコール、イソプロピルアルコール等のアルコール系溶剤、並びにこれらの混合溶媒等が挙げられるが、これらに特に限定されない。分散媒の使用量は、低反射遮光層の膜形成が可能な程度であればよく、特に限定されないが、取扱性や作業性等の観点から、一般的には、樹脂組成物の固形分総量が10~90質量%、好ましくは20~80質量、さらに好ましくは25~70質量%となるように調整すればよい。 The dispersion medium is not particularly limited, but includes water; ketone-based solvents such as methyl ethyl ketone, methyl isobutyl ketone, and cyclohexanone; ester-based solvents such as methyl acetate, ethyl acetate, and butyl acetate; ether-based solvents such as methyl cellosolve and ethyl cellosolve; alcohol-based solvents such as methyl alcohol, ethyl alcohol, and isopropyl alcohol, as well as mixed solvents thereof. The amount of the dispersion medium used is not particularly limited as long as it is sufficient to form a low-reflection light-shielding layer, but from the viewpoint of handleability and workability, it is generally adjusted so that the total solid content of the resin composition is 10 to 90% by mass, preferably 20 to 80% by mass, and more preferably 25 to 70% by mass.
上述した樹脂組成物を所定形状に塗工することにより、低反射遮光層21を得ることができる。図1は、この低反射遮光層21を備える低反射遮光層積層体100の要部を示す断面図である。この低反射遮光層積層体100は、基材11と、この基材11の一方の主面11a側に設けられた低反射遮光層21と、基材11の他方の面11b側に設けられた粘着層31と、を備えている。すなわち、本実施形態の低反射遮光層積層体100は、低反射遮光層21、基材11、及び粘着層31が、少なくともこの順に配列された積層構造(3層構造)を有する。なお、この積層構造において、低反射遮光層21は表側の最表面に配置されるとともに粘着層31は裏側の最表面に配置されており、低反射遮光層21及び粘着層31は、表側及び裏側の最表面にそれぞれ露出した状態で配置されている。なお、低反射遮光層21の表面21aには、本発明の趣旨を逸脱しない範囲において、必要に応じて、帯電防止層や保護層や防汚層や抗菌層や反射防止膜や印刷層等の任意の層が設けられていてもよい。また、低反射遮光層21の表面21aは、本発明の趣旨を逸脱しない範囲において、必要に応じて、帯電防止処理や防汚処理や抗菌処理や反射防止処理等の任意の表面処理が施されていてもよい。 The low-reflection light-shielding layer 21 can be obtained by applying the above-mentioned resin composition to a predetermined shape. FIG. 1 is a cross-sectional view showing a main part of a low-reflection light-shielding layer laminate 100 including the low-reflection light-shielding layer 21. The low-reflection light-shielding layer laminate 100 includes a substrate 11, a low-reflection light-shielding layer 21 provided on one main surface 11a of the substrate 11, and an adhesive layer 31 provided on the other surface 11b of the substrate 11. That is, the low-reflection light-shielding layer laminate 100 of this embodiment has a laminated structure (three-layer structure) in which the low-reflection light-shielding layer 21, the substrate 11, and the adhesive layer 31 are arranged at least in this order. In this laminated structure, the low-reflection light-shielding layer 21 is disposed on the outermost surface of the front side, and the adhesive layer 31 is disposed on the outermost surface of the back side, and the low-reflection light-shielding layer 21 and the adhesive layer 31 are disposed in a state of being exposed on the outermost surfaces of the front side and the back side, respectively. In addition, the surface 21a of the low-reflection light-shielding layer 21 may be provided with any layer, such as an antistatic layer, a protective layer, an antifouling layer, an antibacterial layer, an antireflection film, or a printed layer, as necessary, within the scope of the present invention. In addition, the surface 21a of the low-reflection light-shielding layer 21 may be subjected to any surface treatment, such as an antistatic treatment, an antifouling treatment, an antibacterial treatment, or an antireflection treatment, as necessary, within the scope of the present invention.
ここで本明細書において、「~の一方(他方)の面側に設けられた」とは、本実施形態のように基材11の表面(例えば主面11aや主面11b)に低反射遮光層21や粘着層31が直接載置された態様のみならず、基材11の面11aと低反射遮光層21との間や基材11の面11bと粘着層31との間に図示しない任意の層(例えばプライマー層、接着層、導電層等)が介在して、低反射遮光層21や粘着層31が基材11から離間して配置された態様を包含する意味である。また、低反射遮光層21及び粘着層31を少なくとも備える積層構造とは、低反射遮光層21及び粘着層31のみが基材11上に直接積層した構造のみならず、3層構造の層間に上述したような任意の層をさらに設けた構造を包含する意味である。 In this specification, "provided on one (other) surface side of" means not only the embodiment in which the low-reflection light-shielding layer 21 or the adhesive layer 31 is directly placed on the surface of the substrate 11 (for example, the main surface 11a or the main surface 11b) as in this embodiment, but also the embodiment in which the low-reflection light-shielding layer 21 or the adhesive layer 31 is disposed apart from the substrate 11 with an optional layer (for example, a primer layer, an adhesive layer, a conductive layer, etc.) not shown being interposed between the surface 11a of the substrate 11 and the low-reflection light-shielding layer 21 or between the surface 11b of the substrate 11 and the adhesive layer 31. In addition, a laminated structure having at least the low-reflection light-shielding layer 21 and the adhesive layer 31 means not only the structure in which only the low-reflection light-shielding layer 21 and the adhesive layer 31 are directly laminated on the substrate 11, but also the structure in which any layer as described above is further provided between the layers of the three-layer structure.
基材11は、低反射遮光層21及び粘着層31を支持可能なものである限り、その種類は特に限定されない。基材11の具体例としては、例えば、金属、合金、樹脂成形体、樹脂フィルム、不織布、及びガラス等が挙げられるが、これらに特に限定されない。金属や合金としては、アルミニウム、マグネシウム、鉄、及びこれらの合金を含む金属材料が好ましく用いられる。また、寸法安定性、機械的強度及び軽量化等のw観点からは、基材11としては、合成樹脂が好ましく用いられる。合成樹脂の具体例としては、ポリエステル;ABS(アクリロニトリル-ブタジエン-スチレン);ポリイミド;ポリアミド;ポリアミドイミド;ポリスチレン;ポリカーボネート;(メタ)アクリル系;ナイロン系;ポリエチレンやポリプロピレン等のポリオレフィン系;カレボルネン類とα-オレフィンとの付加共重合体、ノルボルネン類の水素化開環メタセシス重合体、シクロペンテン、シクロヘキセン、3-メチルシクロヘキセン、シクロオクテン等のシクロオレフィン系;セルロース系;ポリスルホン系;ポリフェニレンスルフィド系;ポリエーテルスルホン系;ポリエーテルエーテルケトン系の樹脂が挙げられるが、これらに特に限定されない。なお、本明細書において、「(メタ)アクリル」は、アクリル、メタクリルの双方を含む概念である。これらは1種を単独で用いることができ、また2種以上の任意の組み合わせで用いることもできる。また、これらを任意の組み合わせで用いた多層成形体(多色成形体)や積層フィルムも好適に用いることができる。これらの中でも、基材11としては、寸法安定性、機械的強度及び軽量化等の観点から、合成樹脂の基材フィルムが好ましく、ポリエステルフィルム、ポリイミドフィルム、ポリカーボネートフィルム、(メタ)アクリル系フィルム、及びこれらを任意に組み合わせた積層フィルムがより好適に用いられる。とりわけ、一軸又は二軸延伸フィルム、特に二軸延伸ポリエステルフィルムは、機械的強度及び寸法安定性に優れるため、特に好ましい。また、耐熱用途には、ポリイミドフィルム、ポリアミドイミドフィルム、ポリアミドフィルムが特に好ましく、ポリイミドフィルム、ポリアミドイミドフィルムが最も好ましい。 The type of the substrate 11 is not particularly limited as long as it is capable of supporting the low-reflection light-shielding layer 21 and the adhesive layer 31. Specific examples of the substrate 11 include, but are not limited to, metals, alloys, resin molded bodies, resin films, nonwoven fabrics, and glass. As metals and alloys, metal materials including aluminum, magnesium, iron, and alloys thereof are preferably used. In addition, from the standpoints of dimensional stability, mechanical strength, and weight reduction, synthetic resins are preferably used as the substrate 11. Specific examples of synthetic resins include polyester; ABS (acrylonitrile-butadiene-styrene); polyimide; polyamide; polyamideimide; polystyrene; polycarbonate; (meth)acrylic; nylon; polyolefins such as polyethylene and polypropylene; addition copolymers of calebornenes and α-olefins, hydrogenated ring-opening metathesis polymers of norbornenes, cycloolefins such as cyclopentene, cyclohexene, 3-methylcyclohexene, and cyclooctene; cellulose; polysulfone; polyphenylene sulfide; polyethersulfone; and polyetheretherketone resins, but are not limited thereto. In this specification, the term "(meth)acrylic" refers to a concept including both acrylic and methacrylic. These may be used alone or in any combination of two or more. In addition, multilayer molded bodies (multicolor molded bodies) and laminated films using any combination of these may also be suitably used. Among these, as the substrate 11, from the viewpoints of dimensional stability, mechanical strength, and weight reduction, a substrate film of a synthetic resin is preferred, and polyester film, polyimide film, polycarbonate film, (meth)acrylic film, and laminated film of any combination thereof are more preferably used. In particular, uniaxially or biaxially stretched films, especially biaxially stretched polyester films, are particularly preferred because of their excellent mechanical strength and dimensional stability. In addition, for heat-resistant applications, polyimide films, polyamideimide films, and polyamide films are particularly preferred, and polyimide films and polyamideimide films are most preferred.
基材11の厚みは、要求性能及び用途に応じて適宜設定でき、特に限定されない。基材11上に低反射遮光層21を設けることで、例えば成形体である基材11に、又はフィルム状の基材11である基材フィルムに、又は、膜状或いは層状の基材11に、表面反射率及び表面光沢度が小さな表面を付与することができる。なお、フィルム状の基材11である基材フィルムを用いる場合、軽量化及び薄膜化の観点からは、基材11の厚みは、0.5μm以上、250μm未満が目安とされる。強度や剛性等の観点からは、基材11の厚みは、36μm以上、250μm未満が好ましい。一方、さらなる軽量化及び薄膜化の観点からは、基材11の厚みは、1μm以上、50μm以下が好ましく、より好ましくは1μm以上、25μm以下、さらに好ましくは4μm以上、10μm以下、特に好ましくは5μm以上、7μm以下である。なお、低反射遮光層21や粘着層31との接着性を向上させる観点から、必要に応じて、基材11表面にアンカー処理やコロナ処理、帯電防止等の各種公知の表面処理を行うこともできる。 The thickness of the substrate 11 can be appropriately set according to the required performance and the application, and is not particularly limited. By providing the low-reflection light-shielding layer 21 on the substrate 11, for example, the substrate 11 which is a molded body, or the substrate film which is the film-like substrate 11, or the substrate 11 which is a film-like or layer-like substrate, can be given a surface with low surface reflectance and surface gloss. When using a substrate film which is the film-like substrate 11, the thickness of the substrate 11 is set as a guideline from the viewpoint of weight reduction and thinning. From the viewpoint of strength, rigidity, etc., the thickness of the substrate 11 is preferably 36 μm or more and less than 250 μm. On the other hand, from the viewpoint of further weight reduction and thinning, the thickness of the substrate 11 is preferably 1 μm or more and 50 μm or less, more preferably 1 μm or more and 25 μm or less, even more preferably 4 μm or more and 10 μm or less, and particularly preferably 5 μm or more and 7 μm or less. In addition, in order to improve adhesion to the low-reflection light-shielding layer 21 and the adhesive layer 31, various known surface treatments such as anchor treatment, corona treatment, and antistatic treatment can be performed on the surface of the substrate 11 as necessary.
なお、基材11の外観は、透明、半透明、不透明のいずれであってもよく、特に限定されない。例えば発泡ポリエステルフィルム等の発泡した合成樹脂フィルムや、各種顔料を含有させた合成樹脂フィルムを用いることもできる。例えば、黒色、灰色、紫色、青色、茶色、赤色、緑色等の暗色系の顔料又は染料を1種以上含有する合成樹脂フィルムを用いることにより、光学濃度の高い膜とすることができる。ここで用いる顔料や染料としては、当業界で公知のものから適宜選択して用いることができ、その種類は特に限定されない。例えば黒色系の顔料としては、黒色樹脂粒子、マグネタイト系ブラック、銅・鉄・マンガン系ブラック、チタンブラック、カーボンブラック等が挙げられる。これらの中でも、隠蔽性に優れることから、黒色樹脂粒子、チタンブラック、カーボンブラックが好ましい。これらは1種を単独で用いることができ、また2種以上を組み合わせて用いることもできる。基材11が顔料又は染料を含有する場合、その含有割合は、要求性能及び用途に応じて適宜設定でき、特に限定されない。寸法安定性、機械的強度、軽量化等の観点から、顔料及び染料の合計の含有割合は、基材11の総量に対して、0.3~15質量%であることが好ましく、より好ましくは0.4~12質量%、さらに好ましくは0.5~10質量%である。 The appearance of the substrate 11 may be transparent, semi-transparent, or opaque, and is not particularly limited. For example, a foamed synthetic resin film such as a foamed polyester film or a synthetic resin film containing various pigments can be used. For example, a synthetic resin film containing one or more dark pigments or dyes such as black, gray, purple, blue, brown, red, and green can be used to form a film with high optical density. The pigments and dyes used here can be appropriately selected from those known in the industry, and the type is not particularly limited. For example, black pigments include black resin particles, magnetite black, copper-iron-manganese black, titanium black, carbon black, and the like. Among these, black resin particles, titanium black, and carbon black are preferred because of their excellent hiding properties. These can be used alone or in combination of two or more. When the substrate 11 contains a pigment or dye, the content ratio can be appropriately set according to the required performance and application, and is not particularly limited. From the viewpoints of dimensional stability, mechanical strength, weight reduction, etc., the total content of the pigment and dye is preferably 0.3 to 15 mass % relative to the total amount of the base material 11, more preferably 0.4 to 12 mass %, and even more preferably 0.5 to 10 mass %.
低反射遮光層21の形成方法としては、公知の製法を適宜適用することができ、特に限定されない。基材11上に上述した樹脂組成物を所定の厚みとなるように塗工し、乾燥し、必要に応じて電離放射線処理、熱処理、及び/または加圧処理等することにより、低反射遮光層21を得ることができる。基材11上に高性能な低反射遮光層21を再現性よく簡易且つ低コストで製造する観点からは、ドクターコート、ディップコート、ロールコート、バーコート、ダイコート、ブレードコート、エアナイフコート、キスコート、スプレーコート、スピンコート等の塗布方法が好適に用いられる。 The method for forming the low-reflection light-shielding layer 21 can be any known method, and is not particularly limited. The above-mentioned resin composition is applied to the substrate 11 to a predetermined thickness, dried, and, if necessary, subjected to ionizing radiation treatment, heat treatment, and/or pressure treatment, etc., to obtain the low-reflection light-shielding layer 21. From the viewpoint of easily and inexpensively producing a high-performance low-reflection light-shielding layer 21 on the substrate 11 with good reproducibility, coating methods such as doctor coating, dip coating, roll coating, bar coating, die coating, blade coating, air knife coating, kiss coating, spray coating, and spin coating are preferably used.
低反射遮光層21の厚みは、要求性能及び用途に応じて適宜設定でき、特に限定されないが、高い光学濃度、軽量化及び薄膜化のバランスの観点からは、1μm以上が好ましく、より好ましくは2μm以上、さらに好ましくは3μm以上、特に好ましくは4μm以上であり、上限側は30μm以下が好ましく、より好ましくは25μm以下、さらに好ましくは20μm以下、特に好ましくは15μm以下である。 The thickness of the low-reflection light-shielding layer 21 can be set appropriately depending on the required performance and application, and is not particularly limited. From the viewpoint of a balance between high optical density, light weight, and thin film, the thickness is preferably 1 μm or more, more preferably 2 μm or more, even more preferably 3 μm or more, and particularly preferably 4 μm or more, and the upper limit is preferably 30 μm or less, more preferably 25 μm or less, even more preferably 20 μm or less, and particularly preferably 15 μm or less.
また、本実施形態の低反射遮光層21の遮光性は、要求性能に応じて適宜設定すればよく、特に限定されない。より高い遮光性を具備する観点から、低反射遮光層21は、0.5以上の光学濃度ODを有することが好ましく、1.0以上の光学濃度ODを有することがより好ましく、1.7以上の光学濃度ODを有することがさらに好ましく、2.0以上の光学濃度ODを有することが特に好ましい。なお、本明細書において、光学濃度(OD)は、ISO 5-2に準拠し、光学濃度計(X-Rite361T:エックスライト社)及びオルソフィルタを用いて測定して得られた値とする。 The light-shielding property of the low-reflection light-shielding layer 21 of this embodiment may be appropriately set according to the required performance, and is not particularly limited. From the viewpoint of having higher light-shielding property, the low-reflection light-shielding layer 21 preferably has an optical density OD of 0.5 or more, more preferably an optical density OD of 1.0 or more, even more preferably an optical density OD of 1.7 or more, and particularly preferably an optical density OD of 2.0 or more. In this specification, the optical density (OD) is a value obtained by measurement using an optical densitometer (X-Rite 361T: X-Rite, Inc.) and an orthofilter in accordance with ISO 5-2.
粘着層31は、上述した基材11の面11b側に設けられ、図示しない被着品と粘着接合する層である。このように粘着層31側を被着品に粘着接合することにより、被着品に低反射率且つ低光沢な表面を付与することができる。粘着層31を構成する素材は、当業界で公知のものを用いることができ、また、被着品の表面素材(樹脂成形体、この樹脂成形体を用いた多層積層体、不織布、及び表皮材等、金属、合金等)に応じて適宜選択すればよく、その種類は特に限定されない。例えば、ゴム系粘着剤、アクリル系粘着剤、オレフィン系粘着剤、シリコーン系粘着剤、ウレタン系粘着剤が好ましく用いられる。 The adhesive layer 31 is provided on the surface 11b of the substrate 11 described above, and is a layer that adhesively bonds to an adherend (not shown). By adhesively bonding the adhesive layer 31 to the adherend in this manner, it is possible to impart a surface with low reflectivity and low gloss to the adherend. The material constituting the adhesive layer 31 may be any material known in the industry, and may be appropriately selected according to the surface material of the adherend (resin molded body, multilayer laminate using this resin molded body, nonwoven fabric, skin material, metal, alloy, etc.), and the type is not particularly limited. For example, rubber-based adhesives, acrylic-based adhesives, olefin-based adhesives, silicone-based adhesives, and urethane-based adhesives are preferably used.
粘着層31の厚みは、要求性能及び用途に応じて適宜設定でき、特に限定されないが、軽量化及び薄膜化のバランスの観点からは、0.1μm以上が好ましく、より好ましくは0.2μm以上、さらに好ましくは0.5μm以上、特に好ましくは1.0μm以上、最も好ましくは3.0μm以上であり、上限側は40μm以下が好ましく、より好ましくは30μm以下、さらに好ましくは25μm以下、特に好ましくは20μm以下、最も好ましくは10μm以下である。 The thickness of the adhesive layer 31 can be set appropriately depending on the required performance and application, and is not particularly limited, but from the viewpoint of a balance between weight reduction and thinning, it is preferably 0.1 μm or more, more preferably 0.2 μm or more, even more preferably 0.5 μm or more, particularly preferably 1.0 μm or more, and most preferably 3.0 μm or more, and the upper limit is preferably 40 μm or less, more preferably 30 μm or less, even more preferably 25 μm or less, particularly preferably 20 μm or less, and most preferably 10 μm or less.
以上詳述したとおり、本実施形態の低反射遮光層積層体100は、上述した特定の樹脂組成物から製膜した低反射遮光層21を備えることで、表面反射率及びL*値が小さな積層フィルムとして機能し、より好ましい態様では、表面反射率、L*値、及び表面粗さのいずれもが小さな積層フィルムとして機能する。そのため、本実施形態の低反射遮光層積層体100を低反射部材、光学機器用低反射部材、及び光学機器用遮光部材等として用いることで、例えば光学センサ類の撮像画像や検出精度の劣化ないしは低下を抑制することができる。 As described above in detail, the low-reflection light-shielding layer laminate 100 of the present embodiment includes the low-reflection light-shielding layer 21 formed from the specific resin composition described above, and functions as a laminate film having a small surface reflectance and L * value, and in a more preferred embodiment, functions as a laminate film having a small surface reflectance, L * value, and surface roughness. Therefore, by using the low-reflection light-shielding layer laminate 100 of the present embodiment as a low-reflection member, a low-reflection member for optical equipment, a light-shielding member for optical equipment, or the like, it is possible to suppress deterioration or a decrease in the captured image and detection accuracy of, for example, optical sensors.
ここで、本実施形態の低反射遮光層積層体100(低反射遮光層21)の表面21a側の表面反射率は、要求性能に応じて適宜設定でき、特に限定されない。表面反射率及びL*値を小さくし、また、鏡面光沢度を小さくする観点から、低反射遮光層積層体100(低反射遮光層21)の表面21a側の550nm拡散反射率(正反射を含む)は、3.0%未満が好ましく、2.8%未満がより好ましく、2.6%未満がさらに好ましく、2.4%未満が特に好ましい。ここで、同550nm拡散反射率の下限側は、特に限定されないが、低ければ低いほどよく、よって0.0%以上であればよい。また同様に、低反射遮光層積層体100(低反射遮光層21)の表面21a側の905nm拡散反射率(正反射を含む)は、3.0%未満が好ましく、2.8%未満がより好ましく、2.6%未満がさらに好ましく、2.4%未満が特に好ましい。ここで、同905nm拡散反射率の下限側は、特に限定されないが、低ければ低いほどよく、よって0.0%以上であればよい。なお、本明細書において、550nm拡散反射率や905nm拡散反射率(正反射を含む)は、分光光度計(例えばSolidSpec-3700(島津製作所社製))を用い、それぞれの波長の光を入射したときにおける拡散反射率(正反射を含む)(%)を測定して得られる値を意味する。 Here, the surface reflectance of the surface 21a side of the low reflection light-shielding layer laminate 100 (low reflection light-shielding layer 21) of this embodiment can be appropriately set according to the required performance, and is not particularly limited. From the viewpoint of reducing the surface reflectance and L * value and reducing the specular gloss, the 550 nm diffuse reflectance (including regular reflection) of the surface 21a side of the low reflection light-shielding layer laminate 100 (low reflection light-shielding layer 21) is preferably less than 3.0%, more preferably less than 2.8%, even more preferably less than 2.6%, and particularly preferably less than 2.4%. Here, the lower limit of the 550 nm diffuse reflectance is not particularly limited, but the lower the better, and therefore, it is sufficient if it is 0.0% or more. Similarly, the 905 nm diffuse reflectance (including regular reflection) of the surface 21a side of the low reflection light-shielding layer laminate 100 (low reflection light-shielding layer 21) is preferably less than 3.0%, more preferably less than 2.8%, even more preferably less than 2.6%, and particularly preferably less than 2.4%. Here, the lower limit of the 905 nm diffuse reflectance is not particularly limited, but the lower the better, so it is sufficient that it is 0.0% or more. In this specification, the 550 nm diffuse reflectance and the 905 nm diffuse reflectance (including specular reflection) refer to values obtained by measuring the diffuse reflectance (including specular reflection) (%) when light of each wavelength is incident using a spectrophotometer (e.g., SolidSpec-3700 (manufactured by Shimadzu Corporation)).
また、本実施形態の低反射遮光層積層体100(低反射遮光層21)の表面21a側のCIE 1976 L*a*b*表色系におけるL*値は、要求性能に応じて適宜設定すればよく、特に限定されない。より黒々しい外観を求める観点から、また、低光沢、低反射性、光吸収性等のバランスの観点から、低反射遮光層積層体100(低反射遮光層21)の表面21a側のL*値は、0~18が好ましく、より好ましくは16以下、さらに好ましくは14以下、特に好ましくは13以下である。ここで、低反射遮光層積層体100(低反射遮光層21)の表面21a側のL*値は、従来技術の低反射フィルムや遮光フィルムのL*値と同程度(例えば19~30)であってもよいが、上述した特定の樹脂組成物から製膜することで、比較的に小さな値に調整することができることは、従来技術にない特徴の1つと言える。なお、本明細書において、L*a*b*表色系におけるL*値は、JIS Z 8720:2012に準拠し、CIE標準イルミナントD65を使用し、分光測色計(例えばZE6000(日本電色社製))で測定される値を意味する。 In addition, the L * value in the CIE 1976 L * a * b * color system on the surface 21a side of the low-reflection light-shielding layer laminate 100 (low-reflection light-shielding layer 21) of this embodiment may be appropriately set according to the required performance, and is not particularly limited. From the viewpoint of obtaining a blacker appearance and from the viewpoint of a balance between low gloss, low reflectivity, light absorption, etc., the L * value on the surface 21a side of the low-reflection light-shielding layer laminate 100 (low-reflection light-shielding layer 21) is preferably 0 to 18, more preferably 16 or less, even more preferably 14 or less, and particularly preferably 13 or less. Here, the L * value on the surface 21a side of the low-reflection light-shielding layer laminate 100 (low-reflection light-shielding layer 21) may be the same as the L * value of the low-reflection film or light-shielding film of the conventional technology (for example, 19 to 30), but it can be adjusted to a relatively small value by forming a film from the above-mentioned specific resin composition, which is one of the features not found in the conventional technology. In this specification, the L * value in the L * a * b * color system refers to a value measured in accordance with JIS Z 8720:2012 using CIE standard illuminant D 65 with a spectrophotometer (e.g., ZE6000 (manufactured by Nippon Denshoku Industries Co., Ltd.)).
一方、本実施形態の低反射遮光層積層体100(低反射遮光層21)の表面21a側の表面粗さRa(算術平均粗さ)は、要求性能に応じて適宜設定でき、特に限定されないが、表面反射率及びL*値を小さくし、また、鏡面光沢度を小さくする観点から、0.2~0.7μmが好ましく、0.2~0.6μmがより好ましく、0.2~0.5μmがさらに好ましく、0.3~0.5μmが特に好ましい。なお、表面粗さRaは、当業界で周知のとおり、表面凹凸の高さ方向のパラメータであり、基準長さにおいて粗さ曲線の高さZxの絶対値の平均を表す。ここで、低反射遮光層積層体100(低反射遮光層21)の表面21a側の表面粗さRaは、従来技術の低反射フィルムや遮光フィルムの表面粗さRaと同程度(例えば1.0~2.0μm)であってもよいが、上述した特定の樹脂組成物から製膜することで、比較的に小さな値に調整することができることは、従来技術にない特徴の1つと言える。 On the other hand, the surface roughness Ra (arithmetic mean roughness) of the surface 21a side of the low-reflection light-shielding layer laminate 100 (low-reflection light-shielding layer 21) of this embodiment can be appropriately set according to the required performance and is not particularly limited, but from the viewpoint of reducing the surface reflectance and L * value and reducing the specular gloss, it is preferably 0.2 to 0.7 μm, more preferably 0.2 to 0.6 μm, even more preferably 0.2 to 0.5 μm, and particularly preferably 0.3 to 0.5 μm. Note that, as is well known in the art, the surface roughness Ra is a parameter in the height direction of the surface unevenness and represents the average absolute value of the height Zx of the roughness curve over the reference length. Here, the surface roughness Ra of the surface 21a side of the low-reflection light-shielding layer laminate 100 (low-reflection light-shielding layer 21) may be similar to the surface roughness Ra of the low-reflection films and light-shielding films of the prior art (e.g., 1.0 to 2.0 μm); however, by forming the film from the specific resin composition described above, it can be adjusted to a relatively small value, which is one of the features not found in the prior art.
また、本実施形態の低反射遮光層積層体100(低反射遮光層21)の表面21a側の表面粗さRz(最大高さ)は、要求性能に応じて適宜設定でき、特に限定されないが、表面反射率及びL*値を小さくし、また、鏡面光沢度を小さくする観点から、2.0~5.0μmが好ましく、2.1~4.8μmがより好ましく、2.2~4.6μmがさらに好ましく、2.5~4.5μmが特に好ましい。なお、低反射遮光層21の表面粗さRzは、当業界で周知のとおり、表面凹凸の高さ方向のパラメータであり、基準長さにおいて粗さ曲線の凸部高さZpと凹部深さZvの最大値の和を表す。ここで、低反射遮光層積層体100(低反射遮光層21)の表面21a側の表面粗さRzは、従来技術の低反射フィルムや遮光フィルムの表面粗さRzと同程度(例えば6~12μm)であってもよいが、上述した特定の樹脂組成物から製膜することで、比較的に小さな値に調整することができることは、従来技術にない特徴の1つと言える。 The surface roughness Rz (maximum height) of the surface 21a side of the low-reflection light-shielding layer laminate 100 (low-reflection light-shielding layer 21) of this embodiment can be appropriately set according to the required performance and is not particularly limited, but from the viewpoint of reducing the surface reflectance and L * value and reducing the specular gloss, it is preferably 2.0 to 5.0 μm, more preferably 2.1 to 4.8 μm, even more preferably 2.2 to 4.6 μm, and particularly preferably 2.5 to 4.5 μm. Note that, as is well known in the art, the surface roughness Rz of the low-reflection light-shielding layer 21 is a parameter in the height direction of the surface unevenness, and represents the sum of the maximum values of the convexity height Zp and the concaveity depth Zv of the roughness curve in the reference length. Here, the surface roughness Rz of the surface 21a side of the low-reflection light-shielding layer laminate 100 (low-reflection light-shielding layer 21) may be similar to the surface roughness Rz of the low-reflection films and light-shielding films of the conventional technology (e.g., 6 to 12 μm), but by forming the film from the specific resin composition described above, it can be adjusted to a relatively small value, which is one of the features not found in the conventional technology.
他方、本実施形態の低反射遮光層積層体100(低反射遮光層21)の表面21a側の表面粗さRSmは、要求性能に応じて適宜設定でき、特に限定されないが、表面反射率及びL*値を小さくする観点から、20~70μmが好ましく、より好ましくは30~65μmであり、さらに好ましくは35~60μmである。ここで、表面粗さRSmは、表面凹凸の長さ方向(横方向)のパラメータであり、基準長さにおいて粗さ曲線要素の長さXsの平均を表す。これはすなわち、表面凹凸の平均波長として把握することができる。表面粗さRSmが大きいほど、表面反射率及び表面光沢度が小さくなり、また、広角度側の鏡面光沢度が小さくなる傾向にある。なお、表面凹凸の長さ方向は、表面粗さRSmの測定時に確定される低反射遮光層21の面内の一方向を意味しており、例えば平面視で矩形状の低反射遮光層21の場合は縦方向や面内の横方向のいずれであってもよく、その方向は特に限定されない。 On the other hand, the surface roughness RSm of the surface 21a side of the low reflection light-shielding layer laminate 100 (low reflection light-shielding layer 21) of this embodiment can be appropriately set according to the required performance and is not particularly limited, but from the viewpoint of reducing the surface reflectance and L * value, it is preferably 20 to 70 μm, more preferably 30 to 65 μm, and even more preferably 35 to 60 μm. Here, the surface roughness RSm is a parameter in the length direction (horizontal direction) of the surface unevenness, and represents the average of the length Xs of the roughness curve element in the reference length. In other words, it can be understood as the average wavelength of the surface unevenness. The larger the surface roughness RSm, the smaller the surface reflectance and surface glossiness, and the smaller the specular glossiness on the wide angle side tends to be. Note that the length direction of the surface unevenness means one direction in the plane of the low reflection light-shielding layer 21 determined when measuring the surface roughness RSm. For example, in the case of a low reflection light-shielding layer 21 that is rectangular in plan view, it may be either the vertical direction or the horizontal direction in the plane, and the direction is not particularly limited.
また、本実施形態の低反射遮光層積層体100(低反射遮光層21)の表面21a側の表面粗さ表面粗さRskは、要求性能に応じて適宜設定でき、特に限定されないが、表面反射率及びL*値を小さくする観点から、0.1~3.0μmが好ましく、より好ましくは0.2~2.0μm、さらに好ましくは0.3~1.0μmである。ここで、表面粗さRskは、表面凹凸の高さ方向(深さ方向)のパラメータであり、基準長さにおいて粗さ曲線のスキューネス(歪度)を表す。これはすなわち、平均線を中心としたときの凸部と凹部の対称性を表すものとして把握することができる。表面粗さRskの絶対値が大きいほど、表面反射率及び表面光沢度が小さくなり、また、広角度側の鏡面光沢度が小さくなる傾向にある。 In addition, the surface roughness Rsk of the surface 21a side of the low reflection light-shielding layer laminate 100 (low reflection light-shielding layer 21) of this embodiment can be appropriately set according to the required performance, and is not particularly limited, but from the viewpoint of reducing the surface reflectance and L * value, it is preferably 0.1 to 3.0 μm, more preferably 0.2 to 2.0 μm, and even more preferably 0.3 to 1.0 μm. Here, the surface roughness Rsk is a parameter in the height direction (depth direction) of the surface unevenness, and represents the skewness of the roughness curve in the reference length. In other words, this can be understood as representing the symmetry of the convex and concave parts when the average line is the center. The larger the absolute value of the surface roughness Rsk, the smaller the surface reflectance and surface glossiness, and the smaller the specular glossiness on the wide angle side tends to be.
なお、上述した表面粗さRa,Rz,RSm,及びRskは、JIS規格(JIS B 0601-2001、及びJIS B 0651-2001)に準拠して測定される値及び算出される値を意味する。具体的には、「製品の幾何学特性仕様(GPS)-表面性状:輪郭曲線方式-用語,定義及び表面性状パラメータ,JIS B 0601:2001」に基づき、例えば触針式表面粗さ測定機(SURFCOM 1500SD2-3DF:東京精密社)等の3次元表面粗さ計を用いて測定することができ、また、表面粗さRSm等は必要に応じて付属の解析ソフトウェアや汎用の解析ソフトウェアを用いて算出することができる。より詳細な測定条件は、以下のとおりである。
測定長さ:4.0mm
カットオフ波長:0.8mm
測定速度:0.6mm/s
触針:先端半径2μm、頂角60°円錐型の単結晶ダイヤモンド製
The above-mentioned surface roughnesses Ra, Rz, RSm, and Rsk refer to values measured and calculated in accordance with JIS standards (JIS B 0601-2001 and JIS B 0651-2001). Specifically, they can be measured using a three-dimensional surface roughness meter such as a stylus-type surface roughness measuring instrument (SURFCOM 1500SD2-3DF: Tokyo Seimitsu Co., Ltd.) based on "Geometric Properties of Products Specifications (GPS)-Surface Texture: Profile Curve Method-Terminology, Definitions, and Surface Texture Parameters, JIS B 0601:2001", and the surface roughness RSm, etc. can be calculated using the attached analysis software or general-purpose analysis software as necessary. More detailed measurement conditions are as follows.
Measurement length: 4.0 mm
Cutoff wavelength: 0.8 mm
Measurement speed: 0.6mm/s
Stylus: Single crystal diamond cone-shaped tip with a 2 μm radius and 60° apex angle
なお、本実施形態の低反射遮光層積層体100(低反射遮光層21)の表面21a側の表面光沢度は、要求性能に応じて適宜設定でき、特に限定されない。より高い艶消し性及び低い表面光沢性等を実現する観点からは、低反射遮光層積層体100(低反射遮光層21)の表面21a側の60度鏡面光沢度(JIS-Z8741:1997)は、0.0%以上1.0%未満が好ましく、0.0%以上0.5%未満がより好ましく、0.0%以上0.4%未満がさらに好ましく、0.0%以上0.3%未満が特に好ましい。同様に、低反射遮光層積層体100(低反射遮光層21)の表面21a側の45度鏡面光沢度(JIS-Z8741:1997)は、0.0%以上1.0%未満が好ましく、0.0%以上0.5%未満がより好ましく、0.0%以上0.4%未満がさらに好ましく、0.0%以上0.3%未満が特に好ましい。また同様に、低反射遮光層積層体100(低反射遮光層21)の表面21a側の20度鏡面光沢度(JIS-Z8741:1997)は、0.0%以上0.5%未満が好ましく、0.0%以上0.3%未満がより好ましく、0.0%以上0.2%未満がさらに好ましく、0.0%以上0.1%未満が特に好ましい。なお、本明細書において、鏡面光沢度は、JIS-Z8741:1997に準拠し、デジタル変角光沢計(Gloss Meter VG7000:日本電色社)を用い、それぞれ規定の入射受光角(45°,60°)における低反射遮光層積層体100(低反射遮光層21)の表面21a側の光沢度(鏡面光沢度)(%)を測定して得られる値を意味する。 In addition, the surface glossiness of the surface 21a side of the low-reflection light-shielding layer laminate 100 (low-reflection light-shielding layer 21) of this embodiment can be appropriately set according to the required performance and is not particularly limited. From the viewpoint of achieving higher matteness and low surface glossiness, the 60-degree specular glossiness (JIS-Z8741:1997) of the surface 21a side of the low-reflection light-shielding layer laminate 100 (low-reflection light-shielding layer 21) is preferably 0.0% or more and less than 1.0%, more preferably 0.0% or more and less than 0.5%, even more preferably 0.0% or more and less than 0.4%, and particularly preferably 0.0% or more and less than 0.3%. Similarly, the 45 degree specular gloss (JIS-Z8741:1997) of the surface 21a side of the low reflection light-shielding layer laminate 100 (low reflection light-shielding layer 21) is preferably 0.0% or more and less than 1.0%, more preferably 0.0% or more and less than 0.5%, even more preferably 0.0% or more and less than 0.4%, and particularly preferably 0.0% or more and less than 0.3%. Similarly, the 20 degree specular gloss (JIS-Z8741:1997) of the surface 21a side of the low reflection light-shielding layer laminate 100 (low reflection light-shielding layer 21) is preferably 0.0% or more and less than 0.5%, more preferably 0.0% or more and less than 0.3%, even more preferably 0.0% or more and less than 0.2%, and particularly preferably 0.0% or more and less than 0.1%. In this specification, specular gloss refers to the value obtained by measuring the gloss (specular gloss) (%) of the surface 21a side of the low-reflection light-shielding layer laminate 100 (low-reflection light-shielding layer 21) at the specified incident and receiving angles (45°, 60°) using a digital variable-angle glossmeter (Gloss Meter VG7000: Nippon Denshoku Co., Ltd.) in accordance with JIS-Z8741:1997.
遮光部材としての高い遮光性を具備する観点から、低反射遮光層積層体100全体の光学濃度(OD)は、1.5以上であることが好ましく、より好ましくは2.0以上、さらに好ましくは2.5以上、特に好ましくは3.0以上、最も好ましくは4.0以上である。なお、光学濃度(OD)の上限値は、言うまでもないが6.0である。 From the viewpoint of providing high light-shielding properties as a light-shielding member, the optical density (OD) of the entire low-reflection light-shielding layer laminate 100 is preferably 1.5 or more, more preferably 2.0 or more, even more preferably 2.5 or more, particularly preferably 3.0 or more, and most preferably 4.0 or more. Needless to say, the upper limit of the optical density (OD) is 6.0.
(変形例)
なお、本発明は、その要旨を逸脱しない範囲内で、任意に変更して実施することができる。上記第一実施形態では、基材11上に低反射遮光層21を設けた積層構造の低反射遮光層積層体100を示したが、本発明は、基材11や粘着層31を省略した態様でも実施可能である。例えば、上述した基材11から低反射遮光層21を剥離させて、低反射遮光層21のみからなる単層構造の低反射遮光層として実施可能である。また同様に、粘着層31を設けずに、基材11上に低反射遮光層21を設けた2層積層構造の低反射遮光層積層体として実施可能である。さらに、上記第一実施形態では、基材11上に低反射遮光層21を1層のみ設けた態様を示したが、基材11の一方の主面11a側及び他方の面11b側に低反射遮光層21をそれぞれ設けた態様でも実施可能である。また、基材11と低反射遮光層21との間に導電層を設けてもよい。
(Modification)
The present invention can be modified as desired within the scope of the present invention. In the first embodiment, the low-reflection light-shielding layer laminate 100 having a laminated structure in which the low-reflection light-shielding layer 21 is provided on the substrate 11 is shown, but the present invention can also be implemented in an embodiment in which the substrate 11 and the adhesive layer 31 are omitted. For example, the low-reflection light-shielding layer 21 can be peeled off from the substrate 11 described above to form a low-reflection light-shielding layer having a single-layer structure consisting of only the low-reflection light-shielding layer 21. Similarly, the present invention can be implemented as a low-reflection light-shielding layer laminate having a two-layer laminated structure in which the low-reflection light-shielding layer 21 is provided on the substrate 11 without providing the adhesive layer 31. Furthermore, in the first embodiment, the embodiment in which only one low-reflection light-shielding layer 21 is provided on the substrate 11 is shown, but the present invention can also be implemented in an embodiment in which the low-reflection light-shielding layer 21 is provided on one main surface 11a side and the other surface 11b side of the substrate 11. A conductive layer may be provided between the substrate 11 and the low-reflection light-shielding layer 21.
以下、実施例及び比較例を挙げて、本発明を詳細に説明するが、本発明はこれらの実施
例によりなんら限定されるものではない。本発明は、本発明の要旨を逸脱せず、本発明の
目的を達成する限りにおいて、種々の条件を採用し得るものである。なお、以下において
特に断りのない限り、「部」は「質量部」を表す。
The present invention will be described in detail below with reference to examples and comparative examples, but the present invention is not limited to these examples. The present invention can adopt various conditions as long as the object of the present invention is achieved without departing from the gist of the present invention. In the following, "parts" refers to "parts by mass" unless otherwise specified.
(実施例1)
基材として厚み50μmの二軸延伸PETフィルム(全光線透過率(550nm):89.1%)の片面に、表1に記載の質量割合で調製した下記の樹脂組成物をバーコート法により塗布し乾燥させ、基材上に表2に記載の低反射遮光層を形成することで、実施例1の低反射遮光層及び低反射遮光層積層体を作製した。
Example 1
The following resin composition prepared in the mass ratio shown in Table 1 was applied by a bar coating method to one side of a 50 μm-thick biaxially stretched PET film (total light transmittance (550 nm): 89.1%) used as a substrate, and dried to form a low-reflection light-shielding layer shown in Table 2 on the substrate, thereby producing the low-reflection light-shielding layer and low-reflection light-shielding layer laminate of Example 1.
<樹脂層用塗布液>
・バインダー樹脂
(イソシアネート硬化型アクリル樹脂、樹脂固形分:25質量%)
・着色材
(カーボンブラック樹脂分散液、平均粒子径D50:25nm)
・樹脂粒子
(黒色アクリルビーズ、平均粒子径D50:4.0μm)
・樹脂硬化剤
(ポリイソシアネート系硬化剤、固形分:60質量%)
・レベリング剤
(シリコーン系、固形分:10質量%)
・分散媒100質量部
(MEK:トルエン=50:50の混合溶媒)
<Coating solution for resin layer>
Binder resin (isocyanate-curing acrylic resin, resin solid content: 25% by mass)
Coloring material (carbon black resin dispersion, average particle diameter D50 : 25 nm)
Resin particles (black acrylic beads, average particle diameter D50 : 4.0 μm)
Resin hardener (polyisocyanate hardener, solid content: 60% by mass)
Leveling agent (silicone-based, solid content: 10% by weight)
Dispersion medium 100 parts by mass (MEK: toluene = 50: 50 mixed solvent)
(実施例2~3)
表1に示すように、各成分の質量割合を変更する以外は、実施例1と同様に行って、基材上に表2に記載の低反射遮光層を形成することで、実施例2及び3の低反射遮光層及び低反射遮光層積層体を作製した。
(Examples 2 to 3)
The low-reflection light-shielding layer and low-reflection light-shielding layer laminate of Examples 2 and 3 were prepared by forming a low-reflection light-shielding layer described in Table 2 on a substrate in the same manner as in Example 1, except for changing the mass ratio of each component as shown in Table 1.
(比較例1)
表1に示すように、樹脂粒子の使用量を変更する以外は、実施例1と同様に行って、比較例1の低反射遮光層及び低反射遮光層積層体を作製した。
(Comparative Example 1)
As shown in Table 1, a low-reflection light-shielding layer and a low-reflection light-shielding layer laminate of Comparative Example 1 were produced in the same manner as in Example 1, except that the amount of the resin particles used was changed.
(比較例2)
表1に示すように、樹脂粒子に代えて平均粒子径D50が9.5μmの不定形シリカを用い、各成分の質量割合を変更する以外は、実施例1と同様に行って、比較例2の低反射遮光層及び低反射遮光層積層体を作製した。
(Comparative Example 2)
As shown in Table 1, a low-reflection light-shielding layer and a low-reflection light-shielding layer laminate of Comparative Example 2 were prepared in the same manner as in Example 1, except that amorphous silica having an average particle diameter D50 of 9.5 μm was used instead of the resin particles and the mass ratio of each component was changed.
得られた実施例1~3及び比較例1~2の低反射遮光層積層体(低反射遮光層)について、以下の条件で各物性の測定及び評価を行った。評価結果を、表1に併せて示す。 The physical properties of the low-reflection light-shielding layer laminates (low-reflection light-shielding layers) obtained in Examples 1 to 3 and Comparative Examples 1 and 2 were measured and evaluated under the following conditions. The evaluation results are also shown in Table 1.
(1)表面粗さRa,Rz,RSm,及びRsk
JIS-B0601(2001)の算術平均粗さ(Ra)の測定方法に準じ、触針式表面粗さ測定機(SURFCOM 1500SD2-3DF:東京精密社)を用いて、遮光層の表面の表面粗さRa,Rz,RSm,Rsk(単位:μm)をそれぞれ測定した。
(1) Surface roughness Ra, Rz, RSm, and Rsk
According to the measurement method of arithmetic mean roughness (Ra) of JIS-B0601 (2001), the surface roughnesses Ra, Rz, RSm, and Rsk (unit: μm) of the surface of the light-shielding layer were measured using a stylus surface roughness measuring instrument (SURFCOM 1500SD2-3DF: Tokyo Seimitsu Co., Ltd.).
(2)550nm反射率及び905nm反射率
分光光度計(例えばSolidSpec-3700(島津製作所社製))を用い、波長550nm及び波長905nmの光をそれぞれの波長の光を入射したときにおける、遮光層の表面の拡散反射率(正反射を含む)(%)を測定した。
(2) 550 nm Reflectance and 905 nm Reflectance Using a spectrophotometer (e.g., SolidSpec-3700 (manufactured by Shimadzu Corporation)), the diffuse reflectance (including regular reflection) (%) of the surface of the light-shielding layer was measured when light of wavelengths of 550 nm and 905 nm was incident on the surface.
(3)L*
分光測色計(例えばZE6000(日本電色社製))を用い、JIS Z 8720:2012に準拠し、CIE標準イルミナントD65を使用して、遮光層の表面のL*を測定した。
(3) L *
Using a spectrophotometer (for example, ZE6000 (manufactured by Nippon Denshoku Industries Co., Ltd.)), L * of the surface of the light-shielding layer was measured in accordance with JIS Z 8720:2012 using CIE standard illuminant D 65 .
(4)鏡面光沢度
JIS-Z8741:1997に準拠し、デジタル変角光沢計(Gloss Meter VG7000:日本電色社)を用い、それぞれ規定の入射受光角(20°,45°,60°)における遮光層の表面の表面光沢度(鏡面光沢度)(%)を測定した。
(4) Specular Gloss In accordance with JIS-Z8741:1997, the surface gloss (specular gloss) (%) of the surface of the light-shielding layer was measured at each of the specified incident and receiving angles (20°, 45°, 60°) using a digital variable angle glossmeter (Gloss Meter VG7000: Nippon Denshoku Industries Co., Ltd.).
(5)光学濃度OD
ISO 5-2に基づき光学濃度計(X-Rite361T:エックスライト社)を用い、第一樹脂層21の光学濃度を測定した。なお、測定時にはオルソフィルタを用いた。
(5) Optical density OD
The optical density of the first resin layer 21 was measured using an optical densitometer (X-Rite 361T: X-Rite Corporation) based on ISO 5-2. An ortho filter was used during the measurement.
本発明は、例えば精密機械分野、半導体分野、光学機器分野、車載用途、シアタールーム用途等の、低表面反射率で及び黒々しい外観が要求される用途において、低反射遮光部材として広く且つ有効に利用可能である。とりわけ、高性能一眼レフカメラ、コンパクトカメラ、ビデオカメラ、携帯電話、スマートフォン、PDA情報端末、プロジェクタ等の各種光学機器の遮光部材(例えば遮光板や遮光リング等)や摺動部材(例えばシャッターや絞り部材等)として、殊に有効に利用可能である。 The present invention can be widely and effectively used as a low-reflection light-shielding member in applications that require low surface reflectance and a dark appearance, such as in the fields of precision machinery, semiconductors, optical equipment, in-vehicle applications, and theater rooms. In particular, the present invention can be effectively used as a light-shielding member (e.g., light-shielding plate or light-shielding ring) or a sliding member (e.g., shutter or aperture member) for various optical devices such as high-performance single-lens reflex cameras, compact cameras, video cameras, mobile phones, smartphones, PDA information terminals, and projectors.
100 ・・・低反射遮光層積層体
11 ・・・基材
11a・・・面(主面)
11b・・・面(主面)
21 ・・・低反射遮光層
21a・・・表面
31 ・・・粘着層
100: Low-reflection light-shielding layer laminate 11: Substrate 11a: Surface (main surface)
11b... surface (principal surface)
21...Low reflection light shielding layer 21a...Surface 31...Adhesive layer
Claims (14)
前記バインダー樹脂の含有割合が、固形分換算で総量に対して合計で1~30質量%であり、
前記着色材の含有割合が、固形分換算で総量に対して合計で3~35質量%であり、
前記樹脂粒子の含有割合が、固形分換算で総量に対して合計で85~95質量%である、
低反射遮光層用樹脂組成物。 Contains at least a binder resin, a colorant, resin particles, and a dispersion medium;
The content of the binder resin is 1 to 30 mass% in total based on the total amount of the binder resin in terms of solid content,
The content of the coloring material is 3 to 35% by mass in total based on the total amount of the solid content,
The content of the resin particles is 85 to 95% by mass in total based on the total amount of the solid content.
Resin composition for low reflection light shielding layer.
請求項1に記載の低反射遮光層用樹脂組成物。 2. The resin composition for a low reflection light-shielding layer according to claim 1, wherein the resin particles have an average particle diameter D 50 of 3 to 20 μm.
請求項1又は2に記載の低反射遮光層用樹脂組成物。 3. The resin composition for a low reflection light-shielding layer according to claim 1, wherein the resin particles contain colored resin particles.
前記バインダー樹脂の含有割合が、固形分総量に対する固形分換算で、合計で1~30質量%であり、
前記着色材の含有割合が、固形分総量に対する固形分換算で、合計で0.1~35質量%であり、
前記樹脂粒子の含有割合が、固形分総量に対する固形分換算で、合計で85~95質量%であり、
一方の表面側の表面粗さRaが0.2~0.7μmである、
低反射遮光層。 The ink-jet printhead comprises at least a binder resin, a colorant dispersed in the binder resin, and resin particles dispersed in the binder resin;
The content of the binder resin is 1 to 30 mass% in total in terms of solid content relative to the total amount of solid content,
The content of the coloring agent is 0.1 to 35 mass% in total in terms of solid content relative to the total amount of solid content,
The content of the resin particles is 85 to 95 mass% in total in terms of solid content with respect to the total amount of solid content,
The surface roughness Ra of one surface side is 0.2 to 0.7 μm.
Low-reflective light-shielding layer.
請求項4に記載の低反射遮光層。 The low reflection light-shielding layer according to claim 4 , wherein the resin particles contain colored resin particles.
請求項4又は5に記載の低反射遮光層。 6. The low reflection light-shielding layer according to claim 4, wherein the resin particles have an average particle size D 50 of 3 to 20 μm.
請求項4~6のいずれか一項に記載の低反射遮光層。 7. The low reflection light-shielding layer according to claim 4, wherein one surface side has a surface roughness Rz of 2.0 to 5.0 μm.
請求項4~7のいずれか一項に記載の低反射遮光層。 8. The low reflection light-shielding layer according to claim 4, wherein the diffuse reflectance (including regular reflection) at 550 nm on one surface side is 0.0% or more and less than 3.0%.
請求項4~8のいずれか一項に記載の低反射遮光層。 9. The low reflection light-shielding layer according to claim 4, wherein the diffuse reflectance (including regular reflection) at 905 nm on one surface side is 0.0% or more and less than 3.0%.
請求項4~9のいずれか一項に記載の低反射遮光層。 10. The low reflection light-shielding layer according to claim 4, wherein one surface side of the low reflection light-shielding layer has an L * value of 0 to 18 in the CIE 1976 L * a * b * color system.
請求項4~10のいずれか一項に記載の低反射遮光層。 The low-reflection light-shielding layer according to any one of claims 4 to 10, having an optical density OD of 0.5 or more.
請求項4~11のいずれか一項に記載の低反射遮光層。 The low-reflection light-shielding layer according to any one of claims 4 to 11, having a thickness of 1 to 30 µm.
前記基材の少なくとも一方の主面側に設けられた請求項4~12のいずれか一項に記載の低反射遮光層と
を備えることを特徴とする、低反射遮光層積層体。 A substrate;
A low-reflection light-shielding layer laminate comprising the low-reflection light-shielding layer according to any one of claims 4 to 12 provided on at least one main surface side of the substrate.
前記基材フィルムの一方の主面側に設けられた請求項4~12のいずれか一項に記載の低反射遮光層と、
前記基材フィルムの他方の主面側に設けられた請求項4~12のいずれか一項に記載の低反射遮光層と、
を備えることを特徴とする、低反射遮光層積層体。 A base film;
The low-reflection light-shielding layer according to any one of claims 4 to 12, which is provided on one main surface side of the base film;
The low-reflection light-shielding layer according to any one of claims 4 to 12, which is provided on the other main surface side of the base film;
A low-reflection light-shielding layer laminate comprising:
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KR1020227033929A KR20220144872A (en) | 2020-03-06 | 2021-02-09 | Resin composition for low reflection light blocking layer, and low reflection light blocking layer and low reflection light blocking layer laminate using same |
CN202180007778.3A CN114902085B (en) | 2020-03-06 | 2021-02-09 | Resin composition for low-reflection light-shielding layer, low-reflection light-shielding layer and low-reflection light-shielding layer laminate using the same |
PCT/JP2021/004698 WO2021176967A1 (en) | 2020-03-06 | 2021-02-09 | Resin composition for low-reflection light-shielding layer, and low-reflection light-shielding layer and low-reflection light-shielding laminate using same |
TW110106290A TW202200723A (en) | 2020-03-06 | 2021-02-23 | Resin composition for low-reflection light-shielding layer, and low-reflection light-shielding layer and low-reflection light-shielding laminated body using the same |
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