JP7400487B2 - 半導体装置 - Google Patents
半導体装置 Download PDFInfo
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- JP7400487B2 JP7400487B2 JP2020006090A JP2020006090A JP7400487B2 JP 7400487 B2 JP7400487 B2 JP 7400487B2 JP 2020006090 A JP2020006090 A JP 2020006090A JP 2020006090 A JP2020006090 A JP 2020006090A JP 7400487 B2 JP7400487 B2 JP 7400487B2
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- H01L29/739—Transistor-type devices, i.e. able to continuously respond to applied control signals controlled by field-effect, e.g. bipolar static induction transistors [BSIT]
- H01L29/7393—Insulated gate bipolar mode transistors, i.e. IGBT; IGT; COMFET
- H01L29/7395—Vertical transistors, e.g. vertical IGBT
- H01L29/7396—Vertical transistors, e.g. vertical IGBT with a non planar surface, e.g. with a non planar gate or with a trench or recess or pillar in the surface of the emitter, base or collector region for improving current density or short circuiting the emitter and base regions
- H01L29/7397—Vertical transistors, e.g. vertical IGBT with a non planar surface, e.g. with a non planar gate or with a trench or recess or pillar in the surface of the emitter, base or collector region for improving current density or short circuiting the emitter and base regions and a gate structure lying on a slanted or vertical surface or formed in a groove, e.g. trench gate IGBT
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Description
実施の形態1にかかる半導体装置は、シリコン(Si)よりもバンドギャップが広い半導体(ワイドバンドギャップ半導体とする)を用いて構成される。この実施の形態1にかかる半導体装置の構造について、ワイドバンドギャップ半導体として例えば炭化珪素(SiC)を用いた場合を例に説明する。図1は、実施の形態1にかかる炭化珪素半導体装置の構造を示す上面図である。図1には、半導体基板(半導体チップ)に配置された各素子の電極パッドおよび各領域のレイアウトを示す。
次に、実施の形態1にかかる炭化珪素半導体装置の製造方法について説明する。図6~図11は、実施の形態にかかる炭化珪素半導体装置の製造途中の状態を示す断面図である。
次に、実施の形態2にかかる炭化珪素半導体装置の構造について説明する。図13は、実施の形態2にかかる炭化珪素半導体装置の構造を示す上面図である。図14は、実施の形態2にかかる炭化珪素半導体装置の構造を示す図13のA-A’断面図である。図15は、実施の形態2にかかる炭化珪素半導体装置の構造を示す図13のB-B’断面図である。
2、1002 n型炭化珪素エピタキシャル層
2a 第1n型炭化珪素エピタキシャル層
2b 第2n型炭化珪素エピタキシャル層
3、1003 第1p+型ベース領域
3a 下部第1p+型ベース領域
3b 上部第1p+型ベース領域
4、1004 第2p+型ベース領域
5、1005 n型高濃度領域
5a 下部n型高濃度領域
5b 上部n型高濃度領域
6、1006 p型ベース層
6a 第1p型ベース層
6b 第2p型ベース層
6c 第3p型ベース層
6d 第4p型ベース層
7a 第1n+型ソース領域
7b 第2n+型ソース領域
8、1008 p++型コンタクト領域
8a 第1p++型コンタクト領域
8b 第2p++型コンタクト領域
8c 第3p++型コンタクト領域
8d 第4p++型コンタクト領域
9a 第1ゲート絶縁膜
9b 第2ゲート絶縁膜
9c 第3ゲート絶縁膜
10a 第1ゲート電極
10b 第2ゲート電極
10c 第3ゲート電極
11、1011 層間絶縁膜
13a 第1ソース電極
13b 第2ソース電極
13c 第3ソース電極
13d 第4ソース電極
14、1014 裏面電極
15、1015 ソース電極パッド
15a 第1ソース電極パッド
15b 第2ソース電極パッド
15c 第3ソース電極パッド
15d 第4ソース電極パッド
16、1016 めっき膜
17、1017 はんだ
18、1018 トレンチ
18a 第1トレンチ
18b 第2トレンチ
19、1019 外部端子電極
21、1021 第1保護膜
23、1023 第2保護膜
25、1025 第1TiN膜
26、1026 第1Ti膜
27、1027 第2TiN膜
28、1028 第2Ti膜
29、1029 Al合金膜
30、1030 ゲート配線電極
35a 温度センス部
37a 電流センス部
42 メイン半導体素子
80 フィールド絶縁膜
81 p型ポリシリコン層
82 n型ポリシリコン層
84 アノード電極
85 カソード電極
100、1100 ゲート電極パッド
150、1150 活性領域
150a 有効領域
160、1160 ゲートリング領域
161 ツェナーダイオード領域
163、1163 第1JTE領域
165、1165 第2JTE領域
167、1167 n+型ストッパー領域
168、1168 エッジ終端領域
170 メインソースリング領域
180 ツェナーダイオード
180a 第1ツェナーダイオード
180b 第2ツェナーダイオード
180c 第3ツェナーダイオード
180d 第4ツェナーダイオード
181 ツェナーダイオード配線電極
182 ツェナーダイオードのp型領域
183 ツェナーダイオードのn型領域
201A、1201A 温度センス部のアノード電極パッド
201B、1201B 温度センス部のカソード電極パッド
202、1202 電流センス部の電極パッド
230、1230 電流センス部の活性領域
250、501、502、503、504、601、602、603、604 短絡領域
232 電流センスソースリング領域
400、1400 高機能領域
500 短絡電極
530、1530 絶縁膜
600、1600 炭化珪素半導体装置
701、702 短絡電極
1007 n+型ソース領域
1009 ゲート絶縁膜
1010 ゲート電極
1013 ソース電極
Claims (7)
- 第1MOS構造部と、
第2MOS構造部と、
前記第1MOS構造部と前記第2MOS構造部から構成される活性領域の周囲を囲むゲートリング領域と、
前記ゲートリング領域の周囲を囲む第1リング領域と、
前記第1リング領域の周囲を囲む第2リング領域と、
前記第2リング領域の周囲を囲む終端領域と、
を備え、
前記第1MOS構造部は、
第1導電型の半導体基板と、
前記半導体基板のおもて面に設けられた、前記半導体基板より低不純物濃度の第1導電型の第1半導体層と、
前記第1半導体層の、前記半導体基板側に対して反対側の表面に設けられた第2導電型の第1の第2半導体層と、
前記第1の第2半導体層の、前記半導体基板側に対して反対側の表面層に選択的に設けられた第1導電型の第1の第1半導体領域と、
前記第1の第2半導体層に接触する第1のゲート絶縁膜と、
前記第1のゲート絶縁膜の前記第1の第2半導体層と接触する面と反対側の表面に設けられた第1のゲート電極と、
前記第1の第2半導体層および前記第1の第1半導体領域の表面に設けられた第1の第1電極と、
前記半導体基板の裏面に設けられた第2電極と、
を有し、
前記第2MOS構造部は、
前記半導体基板と、
前記第1半導体層と、
前記第1半導体層の、前記半導体基板側に対して反対側の表面に設けられた第2導電型の第2の第2半導体層と、
前記第2の第2半導体層の、前記半導体基板側に対して反対側の表面層に選択的に設けられた第1導電型の第2の第1半導体領域と、
前記第2の第2半導体層に接触する第2のゲート絶縁膜と、
前記第2のゲート絶縁膜の前記第2の第2半導体層と接触する面と反対側の表面に設けられた第2のゲート電極と、
前記第1の第2半導体層および前記第2の第1半導体領域の表面に設けられた第2の第1電極と、
前記半導体基板の裏面に設けられた前記第2電極と、
を有し、
前記ゲートリング領域は、
前記半導体基板と、
前記第1半導体層と、
前記第1の第2半導体層と、
前記第1の第2半導体層に接触する絶縁膜と、
前記絶縁膜の前記第1の第2半導体層と接触する面と反対側の表面に設けられた第3のゲート電極と、
前記第3のゲート電極上に設けられたゲート配線電極と、
を有し、
前記第1リング領域は、
前記半導体基板と、
前記第1半導体層と、
前記第1半導体層の、前記半導体基板側に対して反対側の表面に設けられた第2導電型の第3の第2半導体層と、
前記第3の第2半導体層の表面に設けられた第3の第1電極と、
を有し、
前記第2リング領域は、
前記半導体基板と、
前記第1半導体層と、
前記第1半導体層の、前記半導体基板側に対して反対側の表面に設けられた第2導電型の第4の第2半導体層と、
前記第4の第2半導体層の表面に設けられた第4の第1電極と、
を有し、
前記第3の第1電極は、前記第2の第1電極と同電位であり、前記第4の第1電極は、前記第1の第1電極と同電位であることを特徴とする半導体装置。 - 前記第2の第2半導体層と前記第3の第2半導体層とが接続され、前記第1の第2半導体層と前記第4の第2半導体層とが接続されることを特徴とする請求項1に記載の半導体装置。
- 前記第1の第1電極と前記第4の第1電極とを電気的に接続する第1の短絡電極と、
前記第2の第1電極と前記第3の第1電極とを電気的に接続する第2の短絡電極と、
を備えることを特徴とする請求項1に記載の半導体装置。 - 前記ゲートリング領域と前記第1リング領域との間に、ツェナーダイオード領域をさらに備え、
前記ツェナーダイオード領域は、
前記半導体基板と、
前記第1半導体層と、
前記第1の第2半導体層と、
前記第1の第2半導体層に接触する絶縁膜と、
前記絶縁膜の表面に設けられた、第2導電型の第2半導体領域と第1導電型の第3半導体領域とが交互に配列されたツェナーダイオードと、
を有し、
前記ツェナーダイオードには、一方が前記第2の第1電極に電気的に接続され、他方が第3の第1電極に電気的に接続される第1ツェナーダイオードが含まれることを特徴とする請求項1~3のいずれか一つに記載の半導体装置。 - 前記ツェナーダイオードには、一方が前記第1の第1電極に電気的に接続され、他方が第4の第1電極に電気的に接続される第2ツェナーダイオードが含まれることを特徴とする請求項4に記載の半導体装置。
- 前記第2MOS構造部は、前記第1MOS構造部に流れる過電流を検出することを特徴とする請求項1~5のいずれか一つに記載の半導体装置。
- 前記第1MOS構造部は、
前記第1の第1半導体領域および前記第1の第2半導体層を貫通し、前記第1半導体層に達する第1のトレンチをさらに有し、
前記第1のゲート電極は、前記第1のトレンチの内部に前記第1のゲート絶縁膜を介して設けられ、
前記第2MOS構造部は、
前記第2の第1半導体領域および前記第2の第2半導体層を貫通し、前記第1半導体層に達する第2のトレンチをさらに有し、
前記第2のゲート電極は、前記第2のトレンチの内部に前記第2のゲート絶縁膜を介して設けられることを特徴とする請求項1~6のいずれか一つに記載の半導体装置。
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