JP7308630B2 - Touch screens, touch panels, displays and electronics - Google Patents

Description

The present invention relates to touch screens, touch panels, display devices, and electronic devices.

A touch panel is a device that detects a touch by an indicator such as a finger and identifies the coordinates of a touched position on the touch panel, and is attracting attention as one of excellent user interface means. At present, touch panels of various types such as resistive type and capacitive type are being commercialized. In general, a touch panel includes a touch screen with a built-in touch sensor that detects a touch by a pointer, and a detection device that identifies coordinates of a touched position based on a signal input from the touch screen. there is

As one of capacitive touch panels, there is a projected capacitive touch panel (see, for example, Patent Document 1). In the projected capacitive touch panel as disclosed in Patent Document 1, even if the front side of the touch screen in which the touch sensor is built is covered with a protective plate such as a glass plate having a thickness of several millimeters, the touch panel is can be detected. A projected capacitive touch panel is excellent in robustness because the protective plate can be arranged on the front side of the touch screen. Further, even when the user touches while wearing gloves, it is possible to detect the touch. Furthermore, since it has no moving parts, it has a long life.

A projected capacitive touch panel includes, for example, a first series of conductor elements formed on a thin dielectric film as detection wiring for detecting capacitance, and an insulation on the first series of conductor elements. and a second series of conductor elements formed with a membrane therebetween (see, for example, Patent Document 2). Each conductor element forms a plurality of cross points without being in electrical contact with each other. In the configuration disclosed in Patent Document 2, a detection circuit detects the capacitance formed between an indicator such as a finger and the first series of conductor elements and the second series of conductor elements, which are detection wiring. By doing so, the position coordinates of the position touched by the pointer are specified. Such a position coordinate detection method is generally called a self-capacitance detection method.

Further, for example, a change in the electric field between a plurality of row wirings extending in the row direction and forming the first electrodes and a plurality of column wirings extending in the column direction and forming the second electrodes, that is, a change in mutual capacitance. There is a detection method that identifies the position coordinates of the touched position by detecting the position (see, for example, Patent Document 3). This detection method is generally called a mutual capacitance detection method.

In both the self-capacitance method and the mutual-capacitance method, when an indicator such as a finger touches a planar area (detection cell) partitioned in a grid pattern by row wirings and column wirings, the touched area is detected. A method of specifying the position coordinates of the touched position based on the balance between the detected value in the detected cell (sensor block) and the detected value in the detection cell near the sensor block is generally adopted.

The row wiring and column wiring in the sensor area of the touch sensor have a wiring pattern in which a plurality of square blocks are connected in a row (for example, see Patent Document 4). Such a wiring pattern is generally called a diamond shape.

JP 2012-103761 A Japanese Patent Publication No. 9-511086 JP-A-2003-526831 JP 2015-148942 A

When the touch screen is charged with static electricity during the manufacturing process of the touch screen or the manufacturing process of the display device having the touch screen, dielectric breakdown occurs between the wiring in the row direction and the wiring in the column direction or at the intersection of those wirings. more likely to occur.

SUMMARY OF THE INVENTION The present invention has been made to solve such problems, and an object of the present invention is to provide a touch screen capable of alleviating potential fluctuations caused by static electricity.

A touch screen according to the present invention includes a base substrate, a touch sensing area, and a capacitance forming portion. The touch detection area is provided on the main surface of the base substrate and receives touch operations input from the outside. The capacitance forming portion is provided along the outer periphery of the touch detection area and is insulated from the touch detection area. The capacitance forming portion includes, on the main surface of the base substrate, a first conductive pattern having conductivity, a second conductive pattern having conductivity, at least a portion of which overlaps with the first conductive pattern in plan view, and a second conductive pattern. an insulating film provided between the first conductive pattern and at least a portion of the second conductive pattern. The capacitance forming portion further includes a shield wiring connected to the second conductive pattern, and the second conductive pattern is configured such that a voltage can be applied via the shield wiring.

According to the present invention, it is possible to provide a touch screen that mitigates potential fluctuations due to static electricity.

Objects, features, aspects and advantages of the present invention will become more apparent with the following detailed description and accompanying drawings.

2 is a plan view showing an example of the configuration of the touch screen according to Embodiment 1. FIG. 2 is an enlarged view of region P shown in FIG. 1; FIG. FIG. 3 is a cross-sectional view along AB shown in FIG. 2; FIG. 3 is a cross-sectional view along CD shown in FIG. 2; FIG. 3 is a cross-sectional view along EF shown in FIG. 2; FIG. 4 is a cross-sectional view showing a transparent substrate on which a first conductive film is formed; 3 is a cross-sectional view showing a transparent substrate on which dummy electrodes and Y electrodes are formed; FIG. FIG. 4 is a cross-sectional view showing a transparent substrate having an insulating film formed on a dummy electrode; FIG. 3 is a cross-sectional view showing a transparent substrate on which shield electrodes, shield wirings and lead wirings are formed; FIG. 4 is a cross-sectional view showing a transparent substrate on which a protective film is formed; FIG. 8 is a cross-sectional view showing the configuration of a touch screen according to Embodiment 2; FIG. 8 is a cross-sectional view showing the configuration of a touch screen according to Embodiment 2; FIG. 10 is a cross-sectional view showing the configuration of a touch screen according to Embodiment 3;

<Embodiment 1>
FIG. 1 is a plan view showing an example of the configuration of a touch screen 1 according to Embodiment 1. FIG. FIG. 2 is an enlarged view of region P shown in FIG. Here, the touch screen 1 is a projected capacitive touch screen 1 . The touch screen 1 has a function of receiving touch operations input from the outside.

The touch screen 1 includes a transparent substrate 2 , a touch detection area 20 , a capacitance forming portion 30 , a plurality of lead wirings 6 and a plurality of detection mounting terminals 7 .

The transparent substrate 2 is a flat plate having a main surface. The transparent substrate 2 is made of, for example, glass material or resin. Note that the transparent substrate 2 is an example, and the touch screen 1 may include a base substrate having a main surface instead of the transparent substrate 2 .

A touch detection area 20 is provided on the main surface of the transparent substrate 2 . The touch detection area 20 is provided with a plurality of row wirings extending in one direction and a plurality of column wirings extending in the other direction. In Embodiment 1, a plurality of X electrodes 3 extending in the X direction are provided as a plurality of row wirings, and a plurality of Y electrodes 4 extending in the Y direction are provided as a plurality of column wirings. ing. The X electrodes 3 and the Y electrodes 4 have a pattern in which a plurality of squares are connected in a row. In the touch detection area 20, the X electrodes 3 and the Y electrodes 4 three-dimensionally intersect via an interlayer insulating film (not shown in FIG. 1). Thus, the touch detection area 20 is a matrix area including multiple X electrodes 3 and multiple Y electrodes 4 extending in different directions. The X electrodes 3 and Y electrodes 4 are made of, for example, a transparent conductive material. The interlayer insulating film is, for example, a silicon nitride film, a silicon oxide film, an organic film, or the like.

The touch detection area 20 has a function of receiving a touch operation input from the outside. A touch operation is, for example, an operation in which an indicator such as a finger of a person touches the touch detection area 20 . During operation of the touch screen 1, capacitance is formed in the touch detection area 20 according to the position touched by the pointer. More specifically, capacitance is formed between the multiple X electrodes 3 and the multiple Y electrodes 4 .

A plurality of lead wires 6 are provided outside the touch detection area 20 . One end of each of the plurality of lead wirings 6 is connected to one X electrode 3, that is, one end of one row wiring, or one Y electrode 4, that is, one end of one column wiring.

The multiple detection mounting terminals 7 are provided outside the touch detection area 20 . Each of the multiple detection mounting terminals 7 is connected to the other end of each of the multiple lead wires 6 . That is, the detection mounting terminal 7 is connected to the X electrode 3 and the Y electrode 4 via the lead wire 6 . The multiple detection mounting terminals 7 are configured to be connectable to an external circuit. When the plurality of mounting terminals for detection 7 are connected to an external circuit, the X electrodes 3 and the Y electrodes 4 are connected to the external circuit through lead wirings 6 .

The capacitance forming section 30 is provided along the outer circumference of the touch detection area 20 . Capacitance forming portion 30 includes conductive dummy pattern 9 , conductive shield electrode pattern 10 , an insulating film (not shown in FIGS. 1 and 2 ), and shield wiring 8 . At least part of the shield electrode pattern 10 overlaps the dummy pattern 9 in plan view. An insulating film is provided between at least part of the shield electrode pattern 10 overlapping the dummy pattern 9 and the dummy pattern 9 . In the capacitance forming portion 30, the dummy pattern 9, the shield electrode pattern 10 and the insulating film form a capacitance element 30A. The capacitance forming portion 30 in the first embodiment includes a plurality of capacitive elements 30A. Each of the plurality of capacitive elements 30A includes a dummy electrode 9A forming a dummy pattern 9 and a shield electrode 10A forming a shield electrode pattern 10. FIG. That is, the dummy pattern 9 is composed of a plurality of dummy electrodes 9A, and the shield electrode pattern 10 is composed of a plurality of shield electrodes 10A. In the first embodiment, dummy electrode 9A has a triangular planar shape, and shield electrode 10A has a rectangular planar shape. One capacitive element 30A forms a capacity with a dummy electrode 9A, a shield electrode 10A and an insulating film.

Also, the capacitance forming section 30 is insulated from the touch detection area 20 . More specifically, dummy pattern 9 and shield electrode pattern 10 of capacitance forming portion 30 in the first embodiment are insulated from X electrode 3 and Y electrode 4 that constitute touch detection area 20 .

The shield wiring 8 is provided so as to surround the touch detection area 20 . One end of the shield wiring 8 is connected to each of the plurality of shield electrodes 10A forming the shield electrode pattern 10 in the first embodiment. In other words, the plurality of capacitive elements 30A are connected in parallel by the shield wiring 8 . The other end of the shield wiring 8 is connected to a mounting terminal 14 for potential relaxation. The potential relaxation mounting terminal 14 to which the shield wiring 8 is connected is different from the detection mounting terminal 7 to which the lead wiring 6 is connected. The shield wiring 8 and the lead wiring 6 are insulated.

The plurality of capacitive elements 30A are arranged between the shield wiring 8 and the touch detection area 20 so as to surround the touch detection area 20 . FIG. 3 is a cross-sectional view along AB shown in FIG. FIG. 3 shows a cross section of one capacitive element 30A and two Y electrodes 4. As shown in FIG. 4 is a cross-sectional view along CD shown in FIG. 2. FIG. FIG. 4 shows a cross section of one capacitive element 30A and two X electrodes 3. As shown in FIG. 5 is a cross-sectional view taken along line EF shown in FIG. 2. FIG. FIG. 5 shows a cross section of the intersection of the X electrodes 3 and the Y electrodes 4 .

As shown in FIGS. 3 and 4, the main surface 2A of the transparent substrate 2 is provided with X electrodes 3 as row wirings and Y electrodes 4 as column wirings. As shown in FIG. 5, two Y electrodes 4 separated by an X electrode 3 provided in the same layer are electrically connected to each other via a bridge wiring 12 . An interlayer insulating film 13 is provided between the bridge wiring 12 and the X electrode 3 to electrically insulate them. These X electrodes 3, Y electrodes 4 and bridge wiring 12 are made of, for example, a transparent conductive material. The interlayer insulating film 13 is, for example, a silicon nitride film, a silicon oxide film, an organic film, or the like.

As shown in FIGS. 3 and 4, a capacitive element 30A is provided outside the region in which the X electrodes 3 and the Y electrodes 4 are provided. The capacitive element 30A includes a first conductive film forming the dummy electrode 9A, a second conductive film forming the shield electrode 10A, and an insulating film provided between the first conductive film and the second conductive film. 11A. The first conductive film is made of, for example, a transparent conductive material. The material of the first conductive film in Embodiment 1 has the same composition as the material of the X electrodes 3 and the Y electrodes 4 . The second conductive film contains, for example, Ag or Cu as a material. The insulating film 11A is, for example, a silicon nitride film, a silicon oxide film, an organic film, or the like. The insulating film 11A forming the capacitive element 30A has the same composition as the interlayer insulating film 13 at the intersections of the X electrodes 3 and the Y electrodes 4. As shown in FIG.

Dummy electrode 9A in Embodiment 1 is formed on main surface 2A of transparent substrate 2 . That is, the dummy electrodes 9A are formed in the same layer as the X electrodes 3 and the Y electrodes 4. As shown in FIG. An insulating film 11A and a shield electrode 10A are laminated in this order on the dummy electrode 9A. The capacitive element 30A forms a capacitance with the insulating film 11A sandwiched between the dummy electrode 9A and the shield electrode 10A.

Shield wiring 8 and lead wiring 6 are formed on main surface 2A of transparent substrate 2 in the same manner as X electrodes 3 and Y electrodes 4 . The shield wiring 8 is made of a metal material that does not transmit light. The shield wiring 8 and the lead wiring 6 contain, for example, Ag, Cu, or the like as a material.

A protective layer 5 is formed so as to cover the X electrodes 3 , the Y electrodes 4 , the capacitive element 30A, the shield wiring 8 and the lead wiring 6 . The protective layer 5 is a film having translucency and insulation, such as a silicon nitride film or a silicon oxide film.

Next, a method of manufacturing the capacitance forming portion 30, the X electrodes 3 and the Y electrodes 4 of the touch screen 1 according to Embodiment 1 will be described.

FIG. 6 is a cross-sectional view showing the transparent substrate 2 on which the first conductive film 15 is formed. It should be noted that FIG. 6 corresponds to the cross section along AB shown in FIG. The same applies to FIGS. 7 to 10 shown below. A first conductive film 15 is formed on the main surface 2A of the transparent substrate 2 . The first conductive film 15 is formed by sputtering, for example. The first conductive film 15 is, for example, ITO (Indium Tin Oxide), which is a transparent conductive material.

FIG. 7 is a sectional view showing the transparent substrate 2 on which the dummy electrodes 9A and the Y electrodes 4 are formed. The first conductive film 15 is patterned by lithography technology (photoengraving technology) or laser irradiation. Thereby, dummy electrodes 9A, X electrodes 3 and Y electrodes 4 are formed.

FIG. 8 is a cross-sectional view showing a transparent substrate 2 having an insulating film 11A formed on dummy electrodes 9A. An insulating film 11A is laminated on the patterned dummy electrode 9A. The insulating film 11A is, for example, a silicon nitride film, a silicon oxide film, an organic film, or the like. The interlayer insulating film 13 shown in FIG. 5 is also formed in the same process as the insulating film 11A. Therefore, the interlayer insulating film 13 and the insulating film 11A have the same composition.

FIG. 9 is a cross-sectional view showing the transparent substrate 2 on which the shield electrode 10A, the shield wiring 8 and the lead wiring 6 are formed. The shield electrode 10A, the shield wiring 8 and the lead wiring 6 are formed, for example, by patterning a second conductive film formed by printing. The second conductive film contains Ag, Cu, or the like as a material, for example. At this time, part of the shield electrode 10A is laminated so as to overlap the dummy electrode 9A in plan view. A capacitance is formed by arranging the insulating film 11A between the dummy electrode 9A and the shield electrode 10A. The bridge wiring 12 shown in FIG. 5 is also formed in the same process as the lead wiring 6, the shield wiring 8 and the shield electrode pattern 10. As shown in FIG.

FIG. 10 is a cross-sectional view showing the transparent substrate 2 on which the protective layer 5 is formed. A protective layer 5 is formed so as to cover the X electrode 3 , the Y electrode 4 , the capacitive element 30A, the shield wiring 8 and the lead wiring 6 . The protective layer 5 is a film having translucency and insulation, such as a silicon nitride film or a silicon oxide film.

Thus, the method of manufacturing the capacitance forming portion 30, the X electrodes 3, and the Y electrodes 4 of the touch screen 1 is completed.

In the manufacturing process of the touch screen 1 after the formation of the capacitance forming portion 30 or the display device in which the touch screen 1 is mounted, a protective film (protective sheet) is used to protect the pattern of the touch detection area 20. It may be attached to the screen 1. When the protective film is attached or replaced, the touch screen 1 is charged with static electricity due to the friction between the touch screen 1 and the protective film.

Attachment or replacement of the protective film is performed by a protective film attaching device. In the process, the protective film attaching apparatus lifts up the touch screen 1 placed on the stage to separate the touch screen 1 from the stage. At this time, the touch screen 1 is charged with static electricity due to the friction between the touch screen 1 and the stage.

Alternatively, in the process of manufacturing a curved liquid crystal panel, the substrate of the touch screen 1 is slimmed down. Also in this process, static electricity is generated on the touch screen 1 due to friction.

The potential relaxation mounting terminals 14 of the touch screen 1 according to Embodiment 1 are connected to, for example, a power supply in the manufacturing process thereof, and a voltage is applied from the power supply. That is, a voltage is applied to the shield electrode pattern 10 of the capacitance forming portion 30 via the potential relaxation mounting terminal 14 and the shield wiring 8 . Thereby, a large capacitance of about several pF is formed in the capacitance forming portion 30 . As a result, potential fluctuations in the substrate of the touch screen 1 due to electrostatic charging are alleviated.

Alternatively, the potential relaxation mounting terminal 14 is connected to the ground potential during the manufacturing process. That is, the shield electrode pattern 10 is connected to the ground potential via the potential relaxation mounting terminal 14 and the shield wiring 8 . As a result, static electricity charged on the touch screen 1 can be removed, and potential fluctuations on the substrate of the touch screen 1 can be mitigated.

In summary, the touch screen 1 according to the first embodiment includes a base substrate (transparent substrate 2), a touch detection area 20, and a capacitance forming section 30. As shown in FIG. The touch detection area 20 is provided on the main surface 2A of the base substrate and receives touch operations input from the outside. The capacitance forming section 30 is provided along the outer periphery of the touch detection area 20 and is insulated from the touch detection area 20 . The capacitance forming portion 30 has a conductive first conductive pattern (dummy pattern 9) and a conductive first conductive pattern (dummy pattern 9) on the main surface 2A of the base substrate. It includes a second conductive pattern (shield electrode pattern 10) and an insulating film 11A provided between the first conductive pattern and at least part of the second conductive pattern.

Such a touch screen 1 mitigates potential fluctuations due to static electricity. Further, the touch screen 1 suppresses the occurrence of dielectric breakdown and pattern abnormality in the wiring pattern in and around the touch detection area 20 due to the discharge of charged static electricity. For example, in the manufacturing process of the touch screen 1 , the potential of the capacitance forming portion 30 is adjusted to reduce potential fluctuations in the transparent substrate 2 of the touch screen 1 due to static electricity.

Further, the touch detection area 20 of the touch screen 1 in Embodiment 1 includes a plurality of row wirings (a plurality of X electrodes 3) extending in one direction and a plurality of row wirings extending in the other direction and intersecting with the row wirings. It includes a plurality of column wirings (a plurality of Y electrodes 4) and interlayer insulating films 13 provided at intersections where each of the plurality of row wirings and each of the plurality of column wirings intersect. Each of the plurality of row wirings and each of the plurality of column wirings three-dimensionally intersect with interlayer insulating film 13 interposed therebetween.

By arranging the row wirings and the column wirings in a diamond shape, even if the touch screen 1 has a wide touch detection area 20, potential fluctuations of the touch screen 1 due to static electricity are alleviated. Further, the touch screen 1 suppresses the occurrence of dielectric breakdown and pattern abnormality in the row wiring or column wiring due to discharge of charged static electricity. In the first embodiment, insulating film 11A and interlayer insulating film 13 have the same composition. In the manufacturing process of the touch screen 1, the insulating film 11A of the capacitance forming portion 30 and the inter-layer insulating film 13 of the crossing portion can be collectively formed.

Further, the capacitance forming portion 30 of the touch screen 1 according to Embodiment 1 includes a plurality of capacitance elements 30A. Each of the plurality of capacitive elements 30A includes a first conductive film forming a first conductive pattern (dummy pattern 9), a second conductive film forming a second conductive pattern (shield electrode pattern 10), and an insulating film 11A provided between the first conductive film and the second conductive film.

Such a touch screen 1 mitigates potential fluctuations of the touch screen 1 due to static electricity that is partially generated.

Capacitance forming portion 30 of touch screen 1 in Embodiment 1 further includes shield wiring 8 connected to the second conductive pattern (shield electrode pattern 10). The second conductive pattern is configured such that a voltage can be applied through the shield wiring 8 .

A voltage is applied to the capacitance forming portion 30 of the touch screen 1 in the manufacturing process of the touch screen 1 and the like. A large capacitance of about several pF is formed in the capacitance forming portion 30 . This reduces potential fluctuations of the touch screen 1 due to static electricity. In addition, since the shield wiring 8 surrounds the touch detection area 20 in plan view, the touch screen 1 can avoid short-circuiting between the peripheral pattern and the touch detection area 20 due to static electricity.

Capacitance forming portion 30 of touch screen 1 in Embodiment 1 further includes shield wiring 8 connected to the second conductive pattern (shield electrode pattern 10). The second conductive pattern is configured to be connectable to the ground potential via the shield wiring 8 .

The capacitance forming portion 30 of such a touch screen 1 is connected to the ground potential in the manufacturing process of the touch screen 1 and the like. As a result, static electricity charged on the touch screen 1 can be eliminated. Further, as will be described later, the capacitance forming portion 30 may be maintained at the ground potential even after the touch screen 1 is manufactured. Such a touch screen 1 suppresses the problem of dielectric breakdown due to static electricity even after the completion of manufacturing.

<Embodiment 2>
A touch screen according to Embodiment 2 will be described. Note that description of the same configuration and operation as those of the first embodiment will be omitted.

11 and 12 are cross-sectional views showing the configuration of the touch screen according to the second embodiment. FIG. 11 shows a cross section along AB shown in FIG. FIG. 12 shows a cross section at EF shown in FIG.

In the second embodiment, insulating film 11A and interlayer insulating film 13 have the same composition. The insulating film having the same composition is provided on the main surface 2A of the transparent substrate 2 in regions other than the intersections of the X electrodes 3 and the Y electrodes 4. As shown in FIG. That is, the X electrodes 3 and the Y electrodes 4 are provided on the interlayer insulating film 13 (insulating film 11A) in regions other than the mutual intersections.

In the region where the capacitive element 30A is formed, the shield electrode 10A is formed on the main surface 2A of the transparent substrate 2, and the insulating film 11A is provided on the shield electrode 10A. The dummy electrode 9A is provided on the insulating film 11A. However, part of the shield electrode 10A overlaps the dummy electrode 9A in plan view. An insulating film 11A is provided between the dummy electrode 9A and part of the shield electrode 10A. Thus, the capacitance forming portion 30 forms a capacitance with the dummy pattern 9, part of the shield electrode pattern 10, and the insulating film 11A.

In such a touch screen, the X electrodes 3 and the Y electrodes 4 are formed on the insulating film 11A. can be applied to the insulating film 11A. As a result, the visibility of the patterns of the X electrodes 3 and the Y electrodes 4 is suppressed.

<Embodiment 3>
A touch screen according to Embodiment 3 will be described. Descriptions of the same configurations and operations as in the first or second embodiment will be omitted.

13 is a cross-sectional view showing the configuration of the touch screen according to Embodiment 3. FIG. FIG. 13 shows a cross section along AB shown in FIG.

A shield electrode 10A and a shield wiring 8 are provided on the main surface 2A of the transparent substrate 2 in a region where the capacitive element 30A is formed, and an insulating film 11A is provided thereon. Further, the lead wiring 6 and the dummy electrode 9A are provided on the insulating film 11A. That is, the shield electrode 10A and the shield wiring 8 are provided in the lower layer of the lead wiring 6. As shown in FIG. A portion of the shield electrode 10A overlaps the dummy electrode 9A in plan view. An insulating film 11A is provided between the dummy electrode 9A and part of the shield electrode 10A. Thus, the capacitance forming portion 30 forms a capacitance with the dummy pattern 9, part of the shield electrode pattern 10, and the insulating film 11A.

When such a touch screen is attached to a liquid crystal display device, the shield wiring 8 reduces the influence of noise exerted on the lead wiring 6 from the liquid crystal display device. As a result, touch detection performance is improved. In addition, since the shield wiring 8 and the lead wiring 6 overlap in plan view, it is possible to narrow the area of the outer peripheral portion of the touch detection area 20 . It is possible to mount the capacitance forming portion 30 on a liquid crystal display device having a narrow frame.

<Embodiment 4>
A touch panel and a display device according to Embodiment 4 will be described. The touch panel and display device according to the fourth embodiment include the configuration of the touch screen shown in any one of the first to third embodiments. Descriptions of the same configurations and operations as those of any one of the first to third embodiments will be omitted.

A display device according to Embodiment 4 includes a touch panel and a display panel. The touch panel includes the touch screen shown in any one of the first to third embodiments and a touch position detection circuit.

A plurality of detection mounting terminals 7 on the touch screen are connected to a touch position detection circuit. That is, the plurality of X electrodes 3 and the plurality of Y electrodes 4 are connected to the touch position detection circuit via the plurality of lead wirings 6 and the plurality of mounting terminals 7 for detection. The touch position detection circuit is also connected to the potential relaxation mounting terminal 14 and supplies the ground voltage to the shield wiring 8 . Thereby, the capacitance forming portion 30 is maintained at the ground potential. Therefore, the occurrence of dielectric breakdown and pattern abnormality in the wiring pattern in and around the touch detection area 20 is suppressed.

Capacitance is formed in the touch detection area 20 by a touch operation. More specifically, capacitance is formed between the multiple X electrodes 3 and the multiple Y electrodes 4 in the touch detection area 20 . The touch position detection circuit detects a position within the touch detection area 20 at which the touch operation is received, based on the capacitance.

The display panel is provided on the opposite side of the main surface 2A of the transparent substrate 2 that constitutes the touch screen. The display panel has a function of displaying information.

<Embodiment 5>
A touch panel and an electronic device according to Embodiment 5 will be described. The touch panel and the electronic device according to the fifth embodiment include each configuration of the touch screen shown in any one of the first to fourth embodiments. Descriptions of the same configurations and operations as those of any one of the first to fourth embodiments are omitted.

An electronic device according to Embodiment 5 includes a touch panel and an electronic processing unit. The touch panel has the same configuration as the touch panel of the fourth embodiment.

The electronic processing unit electronically performs a predetermined process based on position information detected by the touch position detection circuit of the touch panel.

In addition, within the scope of the invention, each embodiment can be freely combined, and each embodiment can be appropriately modified or omitted.

While the invention has been described in detail, the foregoing description is, in all its aspects, illustrative and not intended to limit the invention. It is understood that numerous variations not illustrated can be envisioned without departing from the scope of the invention.

REFERENCE SIGNS LIST 1 touch screen, 2 transparent substrate, 2A main surface, 3 X electrode, 4 Y electrode, 5 protective layer, 6 extraction wiring, 7 mounting terminal for detection, 8 shield wiring, 9 dummy pattern, 9A dummy electrode, 10 shield electrode pattern , 10A shield electrode, 11 insulating film, 12 bridge wiring, 13 interlayer insulating film, 14 mounting terminal for potential relaxation, 15 first conductive film, 20 touch detection area, 30 capacitance forming portion, 30A capacitance element.

Claims (11)

a base substrate;
a touch detection area provided on the main surface of the base substrate for receiving a touch operation input from the outside;
a capacitance forming portion provided along the outer periphery of the touch detection area and insulated from the touch detection area;
The capacitance forming portion is provided on the main surface of the base substrate,
a conductive first conductive pattern;
a second conductive pattern that is conductive and at least partially overlaps with the first conductive pattern in plan view;
an insulating film provided between the first conductive pattern and the at least part of the second conductive pattern;
The capacitance forming section is
Further comprising a shield wiring connected to the second conductive pattern,
The touch screen , wherein the second conductive pattern is configured to be able to apply a voltage through the shield wiring . a base substrate;
a touch detection area provided on the main surface of the base substrate for receiving a touch operation input from the outside;
a capacitance forming portion provided along the outer periphery of the touch detection area and insulated from the touch detection area;
The capacitance forming portion is provided on the main surface of the base substrate,
a conductive first conductive pattern;
a second conductive pattern that is conductive and at least partially overlaps with the first conductive pattern in plan view;
an insulating film provided between the first conductive pattern and the at least part of the second conductive pattern;
The capacitance forming section is
Further comprising a shield wiring connected to the second conductive pattern,
The touch screen , wherein the second conductive pattern is configured to be connectable to a ground potential via the shield wiring . a base substrate;
a touch detection area provided on the main surface of the base substrate for receiving a touch operation input from the outside;
a capacitance forming portion provided along the outer periphery of the touch detection area and insulated from the touch detection area;
The capacitance forming portion is provided on the main surface of the base substrate,
a conductive first conductive pattern;
a second conductive pattern that is conductive and at least partially overlaps with the first conductive pattern in plan view;
an insulating film provided between the first conductive pattern and the at least part of the second conductive pattern;
The touch detection area is
a plurality of row wirings extending in one direction;
a plurality of column wirings extending in the other direction and crossing the plurality of row wirings;
an interlayer insulating film provided at an intersection where each of the plurality of row wirings and each of the plurality of column wirings intersect;
each of the plurality of row wirings and each of the plurality of column wirings three-dimensionally intersect via the interlayer insulating film;
further comprising a plurality of lead wires provided outside the touch detection area;
One end of the plurality of lead wirings is connected to the plurality of row wirings or the plurality of column wirings, and the other end is connected to a plurality of terminals provided on the base substrate so as to be connectable to an external circuit. ,
the capacitance forming section further includes a shield wiring connected to the second conductive pattern;
The touch screen , wherein the second conductive pattern and the shield wiring are provided in a layer below the plurality of lead wirings . The touch detection area is
a plurality of row wirings extending in one direction;
a plurality of column wirings extending in the other direction and crossing the plurality of row wirings;
an interlayer insulating film provided at an intersection where each of the plurality of row wirings and each of the plurality of column wirings intersect;
3. The touch screen according to claim 1 , wherein each of said plurality of row wirings and each of said plurality of column wirings three-dimensionally intersect via said interlayer insulating film. the interlayer insulating film is provided on the main surface of the base substrate in a region other than the intersection;
5. The touch screen according to claim 3 , wherein said plurality of row wirings and said plurality of column wirings are provided on said interlayer insulating film in said regions other than said intersections. The capacitance forming unit includes a plurality of capacitive elements,
each of the plurality of capacitive elements,
a first conductive film forming the first conductive pattern;
a second conductive film forming the second conductive pattern;
The touch screen according to any one of claims 1 to 3, comprising: the insulating film provided between the first conductive film and the second conductive film. The touch screen according to any one of claims 1 to 6 , wherein the shield wiring is made of a metal material that does not transmit light. A touch screen according to any one of claims 1 to 7 ;
a touch position detection circuit that detects a position at which the touch operation is received in the touch detection area, based on a capacitance formed in the touch detection area by the touch operation. A touch screen according to claim 3 or claim 4 ;
a touch position detection circuit connected to the plurality of row wirings and the plurality of column wirings;
The touch position detection circuit is
A touch panel that detects a position where the touch operation is received in the touch detection area based on capacitance formed between the plurality of row wirings and the plurality of column wirings by the touch operation. The touch panel according to claim 8 or claim 9 ,
a display panel provided on a surface opposite to the main surface of the base substrate provided with the touch detection area and displaying information. The touch panel according to claim 8 or claim 9 ,
An electronic device comprising: an electronic processing unit that electronically performs a predetermined process based on the position information detected by the touch position detection circuit of the touch panel.

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