JP7054840B2 - ポリフェニレンエーテル樹脂組成物、並びに、それを用いたプリプレグ、金属張積層板及び配線基板 - Google Patents
ポリフェニレンエーテル樹脂組成物、並びに、それを用いたプリプレグ、金属張積層板及び配線基板 Download PDFInfo
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Description
・変性PPE-1:2官能ビニルベンジル変性PPE(Mw:1900)
まず、変性ポリフェニレンエーテル(変性PPE-1)を合成した。なお、ポリフェニレンエーテル1分子当たりの、分子末端のフェノール性水酸基の平均個数を、末端水酸基数と示す。
ここで、εは、吸光係数を示し、4700L/mol・cmである。また、OPLは、セル光路長であり、1cmである。
・DCP:ジシクロペンタジエン型メタクリレート(新中村化学工業株式会社製のDCPメタクリレート、重量平均分子量Mw332、末端二重結合数2個)
・DVB:ジビニルベンゼン(新日鐵住金株式会社製のDVB810、分子量130、末端二重結合数2個)
・ポリブタジエンオリゴマー:ポリブタジエンオリゴマー(日本曹達株式会社製のB-1000、重量平均分子量Mw1100、末端二重結合数15個)
(変性環状フェノキシホスファゼン化合物)
・「SPB-100L」(大塚化学株式会社製、メチル基変性環状ホスファゼン;リン濃度12.6質量%)
・「FP-300B」(株式会社伏見製薬所製、シアノ基変性環状ホスファゼン;リン濃度11.6質量%)
(その他の環状ホスファゼン化合物)
・「SPB-100」(大塚化学株式会社製、環状ホスファゼン化合物;リン濃度13.0質量%)
(非相溶性リン化合物)
・「エクソリットOP-935」(クラリアントジャパン株式会社製、ホスフィン酸塩化合物:トリスジエチルホスフィン酸アルミニウム;リン濃度23質量%)
・「PQ60」(晋一化工有限公司製、ホスフィンオキサイド化合物、キシリレンビスジフェニルホスフィンオキサイド;リン濃度12.0%)
・パーヘキシン(登録商標)25B(日本油脂株式会社製、過酸化物)
[調製方法]
(樹脂ワニス)
まず、各成分を表1および2に記載の配合割合で、固形分濃度が60質量%となるように、トルエンに添加し、混合させた。その混合物を、60分間攪拌することによって、ワニス状の樹脂組成物(ワニス)が得られた。
各実施例および比較例の樹脂ワニスをガラスクロス(旭化成株式会社製の♯1067タイプ、Eガラス)に含浸させた後、100~170℃で約3~6分間加熱乾燥することによりプリプレグを得た。その際、プリプレグの重量に対する樹脂組成物の含有量(レジンコンテント)が約74質量%となるように調整した。
各実施例および比較例の樹脂ワニスをガラスクロス(旭化成株式会社製、♯2116タイプ、Eガラス)に含浸させた後、100~170℃で約3~6分間加熱乾燥することによりプリプレグを得た。その際、プリプレグの重量に対する樹脂組成物の含有量(レジンコンテント)が約45質量%となるように調整した。
(樹脂流れ性)
それぞれの実施例および比較例の樹脂ワニスを用いて得たプリプレグIの樹脂流れ性は、IPC-TM-650に準拠して測定した。成形の条件は、温度170℃、圧力14.1kgf/cm2とし、プリプレグを15分間熱板プレスした。測定に使用するプリプレグの枚数は、前述のように作製したプリプレグIを4枚用いた。
前述のプリプレグIIの両側に厚さ35μmの銅箔(古河電気工業株式会社製の「GTHMP35」)を配置して被圧体とし、温度200℃、圧力40kg/cm2の条件で120分加熱・加圧して両面に銅箔が接着された、厚み0.1mmの銅張積層板を得た。
前記残銅率が50%となるようにパターン形成した以外は、前記回路充填性評価と同じ方法でボイドの有無を確認した。
前記残銅率が30%となるようにパターン形成した以外は、前記回路充填性評価と同じ方法でボイドの有無を確認した。
上述のプリプレグIを12枚重ね、成形の条件は、温度200℃、圧力40kgf/cm2とし、プリプレグを120分間熱板プレスした。得られたサンプルについて、誘電正接(Df)を空洞共振器摂動法で測定した。具体的には、ネットワーク・アナライザ(アジレント・テクノロジー株式会社製のN5230A)を用い、10GHzにおける評価基板の誘電正接を測定した。
前述のプリプレグI、1枚の両側に厚さ12μmの銅箔(古河電気工業株式会社製の「GTHMP12」)を配置して被圧体とし、温度200℃、圧力40kg/cm2の条件で120分加熱・加圧して両面に銅箔が接着された、厚み0.06mmの銅張積層板を得た。その後、外層銅箔を全面エッチングし、サンプルを得た。
前記プリプレグIIを4枚重ねて積層し、温度200℃、120分、圧力40kg/cm2の条件で加熱加圧することにより、厚み約0.4mmのサンプルを得た。
JIS C 6481 の規格に準じて耐熱性を評価した。サンプルは、前述のプリプレグI、1枚の両側に厚さ12μmの銅箔(古河電気工業株式会社製の「GTHMP12」)を配置して被圧体とし、温度200℃、圧力40kg/cm2の条件で120分加熱・加圧して両面に銅箔が接着された、厚み0.06mmの銅張積層板を得た。所定の大きさに切り出した銅張積層板を280℃および290℃に設定した恒温槽に1時間放置した後、所定の大きさに切り出した銅張積層板を所定の温度に設定した恒温槽に1時間放置した後、取り出した。そして熱処理された試験片を目視で観察し、290℃でフクレが発生しなかったときを◎、290℃でフクレが発生し280℃でフクレが発生しなかったときを○、280℃フクレが発生したときを×として評価した。
表1および2に示す結果から明らかなように、本発明により、優れた誘電特性と難燃性・耐熱性を有し、成形性やTgに優れる樹脂組成物を提供できることができることが示された。
各成分の配合割合を表3に記載の配合割合に変更した以外は、実施例1と同様にして、実施例15~16、比較例7~8の樹脂ワニスを得た。
表3に示す結果から明らかなように、実施例1~14とは異なる変性ポリフェニレンエーテルを使用した場合でも、当該変性ポリフェニレンエーテルと架橋型硬化剤と、従来の難燃剤(環状ホスファゼン化合物)とを含む比較例7~8の樹脂組成物と比べて、優れた誘電特性と難燃性・耐熱性を有し、成形性やTgに優れる樹脂組成物を提供できることができることが示された。
2 樹脂組成物又は樹脂組成物の半硬化物
3 繊維質基材
11 金属張積層板
12 絶縁層
13 金属箔
14 配線
21 配線板
Claims (8)
- (A)炭素-炭素不飽和二重結合を有する置換基により末端変性された変性ポリフェニレンエーテル化合物と、
(B)炭素-炭素不飽和二重結合を分子中に有する架橋型硬化剤と、
(C)難燃剤とを含有するポリフェニレンエーテル樹脂組成物であって、
前記(B)架橋型硬化剤が、トリアルケニルイソシアヌレート化合物、多官能メタクリレート化合物、多官能アクリレート化合物、多官能ビニル化合物、及びビニルベンジル化合物から選ばれる少なくとも1つであり、その含有量が、(A)変性ポリフェニレンエーテル化合物と(B)架橋型硬化剤との合計100質量部に対して10~70質量部であること、
前記(C)難燃剤は、下記式(I)で示される変性環状フェノキシホスファゼン化合物、及び、前記(A)変性ポリフェニレンエーテル化合物及び前記(B)架橋型硬化剤の混合物に相溶しない非相溶性リン化合物を少なくとも含有すること、並びに、
前記非相溶性リン化合物が、ホスフィン酸塩化合物、ホスフィンオキサイド化合物、ポリリン酸塩化合物、及びホスホニウム塩化合物からなる群から選ばれる少なくとも1種を含むことを特徴とする、ポリフェニレンエーテル樹脂組成物。
- 前記変性環状フェノキシホスファゼン化合物において、前記式(I)式のRのうち少なくとも1つが、炭素数が1以上10以下の脂肪族アルキル基を有することを特徴とする、請求項1に記載のポリフェニレンエーテル樹脂組成物。
- 前記変性環状フェノキシホスファゼン化合物と前記非相溶性リン化合物との含有比が、質量比で90:10~10:90である、請求項1または2に記載のポリフェニレンエーテル樹脂組成物。
- 前記ポリフェニレンエーテル樹脂組成物中のリン原子の含有量が、有機成分(前記(C)難燃剤を除く)と前記(C)難燃剤との合計100質量部に対して、1.0~5.1質量部である、請求項1~3のいずれかに記載のポリフェニレンエーテル樹脂組成物。
- 前記変性ポリフェニレンエーテル化合物の末端における前記置換基が、ビニルベンジル基、アクリレート基、及びメタクリレート基からなる群から選ばれる少なくとも1種を有する置換基である、請求項1~4のいずれかに記載の樹脂組成物。
- 請求項1~5のいずれかに記載の樹脂組成物又は前記樹脂組成物の半硬化物と繊維質基材とを有するプリプレグ。
- 請求項1~5のいずれかに記載の樹脂組成物の硬化物又は前記請求項6に記載のプリプレグの硬化物を含む絶縁層と、金属箔とを備える、金属張積層板。
- 請求項1~5のいずれかに記載の樹脂組成物の硬化物又は前記請求項6に記載のプリプレグの硬化物を含む絶縁層と、配線とを備えることを特徴とする、配線基板。
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US16/641,928 US20200181403A1 (en) | 2017-08-31 | 2018-06-29 | Poly(phenylene ether) resin composition, and prepreg, metal-clad laminate, and wiring board each obtained using same |
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