JP6857745B2 - 変性共役ジエン系重合体の製造方法 - Google Patents
変性共役ジエン系重合体の製造方法 Download PDFInfo
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- JP6857745B2 JP6857745B2 JP2019552878A JP2019552878A JP6857745B2 JP 6857745 B2 JP6857745 B2 JP 6857745B2 JP 2019552878 A JP2019552878 A JP 2019552878A JP 2019552878 A JP2019552878 A JP 2019552878A JP 6857745 B2 JP6857745 B2 JP 6857745B2
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- conjugated diene
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- modified conjugated
- carbon atoms
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- 229920000642 polymer Polymers 0.000 title claims description 114
- 150000001993 dienes Chemical class 0.000 title claims description 74
- 238000004519 manufacturing process Methods 0.000 title claims description 36
- 239000000203 mixture Substances 0.000 claims description 94
- 125000004432 carbon atom Chemical group C* 0.000 claims description 80
- 150000001875 compounds Chemical class 0.000 claims description 56
- 238000006116 polymerization reaction Methods 0.000 claims description 41
- 239000000126 substance Substances 0.000 claims description 38
- -1 sulfur halide Chemical class 0.000 claims description 38
- 239000003054 catalyst Substances 0.000 claims description 37
- 229910052761 rare earth metal Inorganic materials 0.000 claims description 30
- 125000000217 alkyl group Chemical group 0.000 claims description 28
- 239000002904 solvent Substances 0.000 claims description 24
- 239000000178 monomer Substances 0.000 claims description 22
- 239000002168 alkylating agent Substances 0.000 claims description 17
- 229940100198 alkylating agent Drugs 0.000 claims description 17
- 150000004820 halides Chemical class 0.000 claims description 17
- 229910052717 sulfur Inorganic materials 0.000 claims description 17
- 239000011593 sulfur Substances 0.000 claims description 17
- 150000002603 lanthanum Chemical class 0.000 claims description 16
- 239000003795 chemical substances by application Substances 0.000 claims description 12
- 238000002156 mixing Methods 0.000 claims description 12
- 239000003607 modifier Substances 0.000 claims description 10
- PXJJSXABGXMUSU-UHFFFAOYSA-N disulfur dichloride Chemical compound ClSSCl PXJJSXABGXMUSU-UHFFFAOYSA-N 0.000 claims description 9
- 150000002430 hydrocarbons Chemical class 0.000 claims description 7
- 150000002798 neodymium compounds Chemical class 0.000 claims description 7
- 239000004215 Carbon black (E152) Substances 0.000 claims description 5
- 229930195733 hydrocarbon Natural products 0.000 claims description 5
- JUQQBXJTNZRORL-UHFFFAOYSA-N 2,2-dibutyldecanoic acid Chemical compound CCCCCCCCC(CCCC)(CCCC)C(O)=O JUQQBXJTNZRORL-UHFFFAOYSA-N 0.000 claims description 4
- GGTYKQPULPMHEN-UHFFFAOYSA-N 2,2-diethyldecanoic acid Chemical compound CCCCCCCCC(CC)(CC)C(O)=O GGTYKQPULPMHEN-UHFFFAOYSA-N 0.000 claims description 4
- MGNNZJZKKFHIOL-UHFFFAOYSA-N 2,2-dihexyldecanoic acid Chemical compound CCCCCCCCC(CCCCCC)(CCCCCC)C(O)=O MGNNZJZKKFHIOL-UHFFFAOYSA-N 0.000 claims description 4
- PCXUJDQRRWWDAI-UHFFFAOYSA-N 2,2-dioctyldecanoic acid Chemical compound CCCCCCCCC(CCCCCCCC)(CCCCCCCC)C(O)=O PCXUJDQRRWWDAI-UHFFFAOYSA-N 0.000 claims description 4
- 230000000379 polymerizing effect Effects 0.000 claims description 4
- BBTFKEBGGQPYOT-UHFFFAOYSA-N 2,2-dihexylnonanoic acid Chemical compound C(CCCCC)C(C(=O)O)(CCCCCCC)CCCCCC BBTFKEBGGQPYOT-UHFFFAOYSA-N 0.000 claims description 3
- OBETXYAYXDNJHR-UHFFFAOYSA-N 2-Ethylhexanoic acid Chemical compound CCCCC(CC)C(O)=O OBETXYAYXDNJHR-UHFFFAOYSA-N 0.000 claims description 3
- ZMLHDQDNVVPPRP-UHFFFAOYSA-N 2-ethyl-2-butyl-decanoic acid Chemical compound CCCCCCCCC(CC)(C(O)=O)CCCC ZMLHDQDNVVPPRP-UHFFFAOYSA-N 0.000 claims description 3
- ZHKYMQVGCPQGJS-UHFFFAOYSA-N 2-ethyl-2-hexylnonanoic acid Chemical compound CCCCCCCC(CC)(C(O)=O)CCCCCC ZHKYMQVGCPQGJS-UHFFFAOYSA-N 0.000 claims description 3
- OZMIDHIEAHUHSY-UHFFFAOYSA-N 3-methylheptan-3-yl octanoate Chemical compound C(CCCCCCC)(=O)OC(C)(CCCC)CC OZMIDHIEAHUHSY-UHFFFAOYSA-N 0.000 claims description 3
- SHZIWNPUGXLXDT-UHFFFAOYSA-N caproic acid ethyl ester Natural products CCCCCC(=O)OCC SHZIWNPUGXLXDT-UHFFFAOYSA-N 0.000 claims description 3
- FYSNRJHAOHDILO-UHFFFAOYSA-N thionyl chloride Chemical compound ClS(Cl)=O FYSNRJHAOHDILO-UHFFFAOYSA-N 0.000 claims description 3
- UIWCRBZGFSZBBP-UHFFFAOYSA-N 2,2-dibutylnonanoic acid Chemical compound CCCCCCCC(CCCC)(CCCC)C(O)=O UIWCRBZGFSZBBP-UHFFFAOYSA-N 0.000 claims description 2
- MOTGYRRBAXQEOK-UHFFFAOYSA-N 2,2-dibutyloctanoic acid Chemical compound CCCCCCC(CCCC)(CCCC)C(O)=O MOTGYRRBAXQEOK-UHFFFAOYSA-N 0.000 claims description 2
- ZNZVPWFZYLKUIV-UHFFFAOYSA-N 2,2-diethylnonanoic acid Chemical compound CCCCCCCC(CC)(CC)C(O)=O ZNZVPWFZYLKUIV-UHFFFAOYSA-N 0.000 claims description 2
- GCXPWMYZEFIFNC-UHFFFAOYSA-N 2,2-diethyloctanoic acid Chemical compound CCCCCCC(CC)(CC)C(O)=O GCXPWMYZEFIFNC-UHFFFAOYSA-N 0.000 claims description 2
- QTZDCGSNJUZNBJ-UHFFFAOYSA-N 2,2-dimethyldecanoic acid Chemical compound CCCCCCCCC(C)(C)C(O)=O QTZDCGSNJUZNBJ-UHFFFAOYSA-N 0.000 claims description 2
- XKHIVSSICYSDFA-UHFFFAOYSA-N 2,2-dipropylnonanoic acid Chemical compound CCCCCCCC(CCC)(CCC)C(O)=O XKHIVSSICYSDFA-UHFFFAOYSA-N 0.000 claims description 2
- DOHKJHKZWHAXES-UHFFFAOYSA-N 2-hexyl-2-octyldecanoic acid Chemical compound C(CCCCCCC)C(C(=O)O)(CCCCCC)CCCCCCCC DOHKJHKZWHAXES-UHFFFAOYSA-N 0.000 claims description 2
- KQTWKNFPNRPNAV-UHFFFAOYSA-N 2-methylbutan-2-yl octanoate Chemical compound CCCCCCCC(=O)OC(C)(C)CC KQTWKNFPNRPNAV-UHFFFAOYSA-N 0.000 claims description 2
- NBYDAOVHYCXTJL-UHFFFAOYSA-N 4-methyloctan-4-yl decanoate Chemical compound C(CCCCCCCCC)(=O)OC(C)(CCCC)CCC NBYDAOVHYCXTJL-UHFFFAOYSA-N 0.000 claims description 2
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 claims description 2
- 238000003756 stirring Methods 0.000 claims description 2
- FWMUJAIKEJWSSY-UHFFFAOYSA-N sulfur dichloride Chemical compound ClSCl FWMUJAIKEJWSSY-UHFFFAOYSA-N 0.000 claims description 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims 2
- KUTCZKWCZNAIJY-UHFFFAOYSA-N 2,2-dipropyloctanoic acid Chemical compound CCCCCCC(CCC)(CCC)C(O)=O KUTCZKWCZNAIJY-UHFFFAOYSA-N 0.000 claims 1
- UNZLNIKQUNSBNH-UHFFFAOYSA-N 3-methylheptan-3-yl decanoate Chemical compound CCCCCCCCCC(=O)OC(C)(CC)CCCC UNZLNIKQUNSBNH-UHFFFAOYSA-N 0.000 claims 1
- FOIRETPRAFRAST-UHFFFAOYSA-N 5-methylnonan-5-yl decanoate Chemical compound C(CCCCCCCCC)(=O)OC(C)(CCCC)CCCC FOIRETPRAFRAST-UHFFFAOYSA-N 0.000 claims 1
- GHVNFZFCNZKVNT-UHFFFAOYSA-N decanoic acid Chemical compound CCCCCCCCCC(O)=O GHVNFZFCNZKVNT-UHFFFAOYSA-N 0.000 claims 1
- 229920001971 elastomer Polymers 0.000 description 63
- 239000005060 rubber Substances 0.000 description 63
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 40
- 125000001183 hydrocarbyl group Chemical group 0.000 description 27
- QEFYFXOXNSNQGX-UHFFFAOYSA-N neodymium atom Chemical compound [Nd] QEFYFXOXNSNQGX-UHFFFAOYSA-N 0.000 description 22
- 238000013329 compounding Methods 0.000 description 21
- 229910052779 Neodymium Inorganic materials 0.000 description 20
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 19
- 239000000945 filler Substances 0.000 description 19
- 238000000034 method Methods 0.000 description 19
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 19
- 239000000377 silicon dioxide Substances 0.000 description 19
- 230000000052 comparative effect Effects 0.000 description 16
- 230000000694 effects Effects 0.000 description 14
- 239000006229 carbon black Substances 0.000 description 12
- CPOFMOWDMVWCLF-UHFFFAOYSA-N methyl(oxo)alumane Chemical compound C[Al]=O CPOFMOWDMVWCLF-UHFFFAOYSA-N 0.000 description 12
- 150000001450 anions Chemical class 0.000 description 11
- 125000003118 aryl group Chemical group 0.000 description 11
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 10
- SIPUZPBQZHNSDW-UHFFFAOYSA-N bis(2-methylpropyl)aluminum Chemical compound CC(C)C[Al]CC(C)C SIPUZPBQZHNSDW-UHFFFAOYSA-N 0.000 description 10
- 238000006243 chemical reaction Methods 0.000 description 10
- 244000043261 Hevea brasiliensis Species 0.000 description 9
- 229910052739 hydrogen Inorganic materials 0.000 description 9
- 239000001257 hydrogen Substances 0.000 description 9
- 229920003052 natural elastomer Polymers 0.000 description 9
- 229920001194 natural rubber Polymers 0.000 description 9
- 229920002587 poly(1,3-butadiene) polymer Polymers 0.000 description 9
- 229920003048 styrene butadiene rubber Polymers 0.000 description 9
- 238000004073 vulcanization Methods 0.000 description 9
- 239000005062 Polybutadiene Substances 0.000 description 8
- 238000009826 distribution Methods 0.000 description 8
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 7
- 230000003197 catalytic effect Effects 0.000 description 7
- 125000000753 cycloalkyl group Chemical group 0.000 description 7
- YNLAOSYQHBDIKW-UHFFFAOYSA-M diethylaluminium chloride Chemical compound CC[Al](Cl)CC YNLAOSYQHBDIKW-UHFFFAOYSA-M 0.000 description 7
- 150000005309 metal halides Chemical class 0.000 description 7
- 125000001424 substituent group Chemical group 0.000 description 7
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 6
- QGJOPFRUJISHPQ-UHFFFAOYSA-N Carbon disulfide Chemical compound S=C=S QGJOPFRUJISHPQ-UHFFFAOYSA-N 0.000 description 6
- 238000005033 Fourier transform infrared spectroscopy Methods 0.000 description 6
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 6
- 229910019142 PO4 Inorganic materials 0.000 description 6
- 239000002174 Styrene-butadiene Substances 0.000 description 6
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 6
- 238000005299 abrasion Methods 0.000 description 6
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 6
- 238000005227 gel permeation chromatography Methods 0.000 description 6
- 230000001965 increasing effect Effects 0.000 description 6
- 229910052757 nitrogen Inorganic materials 0.000 description 6
- 235000021317 phosphate Nutrition 0.000 description 6
- 239000010734 process oil Substances 0.000 description 6
- 239000000047 product Substances 0.000 description 6
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- 125000003808 silyl group Chemical group [H][Si]([H])([H])[*] 0.000 description 6
- 238000001179 sorption measurement Methods 0.000 description 6
- 229920002554 vinyl polymer Polymers 0.000 description 6
- OKJPEAGHQZHRQV-UHFFFAOYSA-N Triiodomethane Natural products IC(I)I OKJPEAGHQZHRQV-UHFFFAOYSA-N 0.000 description 5
- 125000002947 alkylene group Chemical group 0.000 description 5
- 229910052799 carbon Inorganic materials 0.000 description 5
- 239000000460 chlorine Substances 0.000 description 5
- IJOOHPMOJXWVHK-UHFFFAOYSA-N chlorotrimethylsilane Chemical compound C[Si](C)(C)Cl IJOOHPMOJXWVHK-UHFFFAOYSA-N 0.000 description 5
- 239000000446 fuel Substances 0.000 description 5
- 229910052736 halogen Inorganic materials 0.000 description 5
- 150000002367 halogens Chemical class 0.000 description 5
- 230000020169 heat generation Effects 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 229910001507 metal halide Inorganic materials 0.000 description 5
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 5
- 239000010452 phosphate Substances 0.000 description 5
- LQIIEHBULBHJKX-UHFFFAOYSA-N 2-methylpropylalumane Chemical compound CC(C)C[AlH2] LQIIEHBULBHJKX-UHFFFAOYSA-N 0.000 description 4
- 239000002879 Lewis base Substances 0.000 description 4
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 4
- 230000003712 anti-aging effect Effects 0.000 description 4
- 125000002993 cycloalkylene group Chemical group 0.000 description 4
- DOIRQSBPFJWKBE-UHFFFAOYSA-N dibutyl phthalate Chemical compound CCCCOC(=O)C1=CC=CC=C1C(=O)OCCCC DOIRQSBPFJWKBE-UHFFFAOYSA-N 0.000 description 4
- 238000010528 free radical solution polymerization reaction Methods 0.000 description 4
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical compound I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 4
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- NFHFRUOZVGFOOS-UHFFFAOYSA-N palladium;triphenylphosphane Chemical compound [Pd].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 NFHFRUOZVGFOOS-UHFFFAOYSA-N 0.000 description 4
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- JLTRXTDYQLMHGR-UHFFFAOYSA-N trimethylaluminium Chemical compound C[Al](C)C JLTRXTDYQLMHGR-UHFFFAOYSA-N 0.000 description 4
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- 125000005843 halogen group Chemical group 0.000 description 3
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- ZDEAPTVBZFDKOD-UHFFFAOYSA-L ditert-butyl(diiodo)stannane Chemical compound CC(C)(C)[Sn](I)(I)C(C)(C)C ZDEAPTVBZFDKOD-UHFFFAOYSA-L 0.000 description 1
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- DWRNSCDYNYYYHT-UHFFFAOYSA-K gallium(iii) iodide Chemical compound I[Ga](I)I DWRNSCDYNYYYHT-UHFFFAOYSA-K 0.000 description 1
- 229940050410 gluconate Drugs 0.000 description 1
- 150000002366 halogen compounds Chemical class 0.000 description 1
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- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
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- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 1
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- 239000003446 ligand Substances 0.000 description 1
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- HBVCQKOZPHBDAR-UHFFFAOYSA-N triiodo(phenyl)silane Chemical compound I[Si](I)(I)C1=CC=CC=C1 HBVCQKOZPHBDAR-UHFFFAOYSA-N 0.000 description 1
- RMUKCGUDVKEQPL-UHFFFAOYSA-K triiodoindigane Chemical compound I[In](I)I RMUKCGUDVKEQPL-UHFFFAOYSA-K 0.000 description 1
- JSXKIRYGYMKWSK-UHFFFAOYSA-N trimethoxy-[2-(2-trimethoxysilylethyltetrasulfanyl)ethyl]silane Chemical compound CO[Si](OC)(OC)CCSSSSCC[Si](OC)(OC)OC JSXKIRYGYMKWSK-UHFFFAOYSA-N 0.000 description 1
- JTTSZDBCLAKKAY-UHFFFAOYSA-N trimethoxy-[3-(3-trimethoxysilylpropyltetrasulfanyl)propyl]silane Chemical compound CO[Si](OC)(OC)CCCSSSSCCC[Si](OC)(OC)OC JTTSZDBCLAKKAY-UHFFFAOYSA-N 0.000 description 1
- 239000005051 trimethylchlorosilane Substances 0.000 description 1
- MZGUIAFRJWSYJJ-UHFFFAOYSA-M trimethylstannanylium;bromide Chemical compound C[Sn](C)(C)Br MZGUIAFRJWSYJJ-UHFFFAOYSA-M 0.000 description 1
- XGRPNCOKLIMKBN-UHFFFAOYSA-M trimethylstannanylium;iodide Chemical compound C[Sn](C)(C)I XGRPNCOKLIMKBN-UHFFFAOYSA-M 0.000 description 1
- JOJQVUCWSDRWJE-UHFFFAOYSA-N tripentylalumane Chemical compound CCCCC[Al](CCCCC)CCCCC JOJQVUCWSDRWJE-UHFFFAOYSA-N 0.000 description 1
- CNWZYDSEVLFSMS-UHFFFAOYSA-N tripropylalumane Chemical compound CCC[Al](CCC)CCC CNWZYDSEVLFSMS-UHFFFAOYSA-N 0.000 description 1
- RTAKQLTYPVIOBZ-UHFFFAOYSA-N tritert-butylalumane Chemical compound CC(C)(C)[Al](C(C)(C)C)C(C)(C)C RTAKQLTYPVIOBZ-UHFFFAOYSA-N 0.000 description 1
- 238000001291 vacuum drying Methods 0.000 description 1
- 239000011592 zinc chloride Substances 0.000 description 1
- 235000005074 zinc chloride Nutrition 0.000 description 1
- UAYWVJHJZHQCIE-UHFFFAOYSA-L zinc iodide Chemical compound I[Zn]I UAYWVJHJZHQCIE-UHFFFAOYSA-L 0.000 description 1
- 235000014692 zinc oxide Nutrition 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
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Description
本出願は、2017年10月18日付韓国特許出願第10−2017−0135175号に基づた優先権の利益を主張し、当該韓国特許出願の文献に開示された全ての内容は本明細書の一部として含まれる。
R1からR3は、それぞれ独立してハロゲン基、炭素数1から20のアルキル基、炭素数3から20のシクロアルキル基、炭素数6から30のアリール基及び−R6COOR7からなる群から選択された1種以上の置換基で置換された三価炭化水素基;又は非置換の炭素数1から10の二価炭化水素基であり、
但し、R1からR3が全て同時に三価炭化水素基;又は二価炭化水素基ではなく、
R4は、単結合、炭素数1から20のアルキレン基、又は炭素数3から20のシクロアルキレン基であり、
R5は、炭素数1から20のアルキル基で置換されるか又は非置換のシリル基;ハロゲン;シアノ基;又は−COR8であり、
R6は、単結合、炭素数1から20のアルキレン基、又は炭素数3から20のシクロアルキレン基であり、
R7は、炭素数1から20のアルキル基、又は炭素数3から20のシクロアルキル基であり、
R8は、炭素数1から10のアルコキシ基、炭素数6から30のアリール基、炭素数2から30のヘテロアリール基、炭素数2から10のヘテロシクロアルキル基、炭素数2から10のヘテロアミン基及び炭素数3から10のジシリルアミノ基からなる群から選択された1種である。
R1からR3は、それぞれ独立してハロゲン基、炭素数1から20のアルキル基、炭素数3から20のシクロアルキル基、炭素数6から30のアリール基及び−R6COOR7からなる群から選択された1種以上の置換基で置換された三価炭化水素基;又は非置換の炭素数1から10の二価炭化水素基であり、
但し、R1からR3が全て同時に三価炭化水素基;又は二価炭化水素基ではなく、
R4は、単結合、炭素数1から20のアルキレン基、又は炭素数3から20のシクロアルキレン基であり、
R5は、炭素数1から20のアルキル基で置換されるか又は非置換のシリル基;ハロゲン;シアノ基;又は−COR8であり、
R6は、単結合、炭素数1から20のアルキレン基、又は炭素数3から20のシクロアルキレン基であり、
R7は、炭素数1から20のアルキル基、又は炭素数3から20のシクロアルキル基であり、
R8は、炭素数1から10のアルコキシ基、炭素数6から30のアリール基、炭素数2から30のヘテロアリール基、炭素数2から10のヘテロシクロアルキル基、炭素数2から10のヘテロアミン基及び炭素数3から10のジシリルアミノ基からなる群から選択された1種である。
前記アルキル化剤は、ヒドロカルビル基を他の金属に転移できる有機金属化合物であって、助触媒の役割をするものであってよい。前記アルキル化剤は、通常ジエン系重合体の製造時アルキル化剤として用いられるものであれば、特別な制限なく用いることができ、例えば、有機アルミニウム化合物、有機マグネシウム化合物、又は有機リチウム化合物等のように、重合溶媒に可溶性であり、金属−炭素結合を含有する有機金属化合物であってよい。
前記ハロゲン化物は、特別に制限するものではないが、例えば、ハロゲン単体、ハロゲン間化合物(interhalogen compound)、ハロゲン化水素、有機ハライド、非金属ハライド、金属ハライド又は有機金属ハライド等を挙げられ、これらのうち何れか一つ又は二つ以上の混合物が用いられてよい。この中でも、触媒活性向上及びこれによる優れた反応性改善効果を考慮する際、前記ハロゲン化合物としては、有機ハライド、金属ハライド及び有機金属ハライドからなる群から選択された何れか一つ又は二つ以上の混合物が用いられてよい。
また、前記触媒組成物は、共役ジエン系単量体をさらに含んでよく、重合反応に用いられる共役ジエン系単量体の一部を重合用触媒組成物と予め混合し、前(pre)重合した予備重合(preforming)又は予備混合(premix)触媒組成物の形態で用いることで、触媒組成物活性を向上させることができるだけでなく、製造される共役ジエン系重合体を安定化させることができる。
ジクロロメタン(CH2Cl2)中エチルピペリジン−4−カルボキシレート(ethyl piperidine−3−carboxylate)2gが溶解された溶液に、0℃でトリエチルアミン(Et3N)1.77ml及び塩化トリメチルシリル(TMSCl)1.62mlを添加し、この反応混合物を0℃で5時間の間撹拌した。次いで、生成された溶液中の溶媒を減圧下で蒸発させ、ヘキサンに再溶解させた後、濾過して下記のような構造の化合物を収得し、1Hの核磁気共鳴の分光学的スペクトラムを観察した。
20Lのオートクレーブ反応器に、1,3−ブタジエン550g及びn−ヘキサン3681gを入れた後、 反応器内部温度を70℃に昇温した。ここに触媒組成物を添加した後、60分間重合を進行した。このとき、前記触媒組成物は、n−ヘキサン溶媒中にネオジムバーサテート(Neodymium versatate(Nd(2−エチルヘキサノエート)3)、Solvay社)0.715mmolを添加し、ジイソブチルアルミニウムヒドリド(DIBAH)及び塩化ジエチルアルミニウム(DEAC)を前記ネオジムバーサテート:DIBAH:DEAC=1:9.5:2.4のモル比になるように順次投入した後、混合して製造した。前記製造例で製造された化学式(i)の化合物を添加した後、30分間変性反応を進行させた(変性剤:Nd=5:1当量)。以後、重合停止剤としてHPSS(HPSS−81、ICケミカル)と酸化防止剤としてWingstay−Kを単量体100重量部対比それぞれ0.15重量部及び0.4重量部で添加し、第1重合体を製造した。以後、反応器内部温度を 80℃に昇温させて二塩化二硫黄(S2Cl2)を添加し、15分間撹拌して前記第1重合体と混合した。このとき、二塩化二硫黄は、第1重合体100重量部対比0.1重量部で添加した。以後、スチームストリッピングを介して溶媒を除去し、6インチHot Roll(110℃)を用いて4分間乾燥し変性ブタジエン重合体を製造した。
実施例1において、二塩化二硫黄を添加し60分間撹拌して第1重合体と混合させたことを除いては、実施例1と同一の方法を介して変性ブタジエン重合体を製造した。
実施例1において、二塩化二硫黄を添加し80分間撹拌して第1重合体と混合させたことを除いては、実施例1と同一の方法を介して変性ブタジエン重合体を製造した。
実施例1において、触媒組成物製造時にネオジムバーサテートを0.769mmolで添加し、二塩化二硫黄を単量体100重量部対比0.30重量部で添加したことを除いては、実施例1と同一の方法を介して変性ブタジエン重合体を製造した。
実施例4において、二塩化二硫黄を単量体100重量部対比0.32重量部に添加したこと除いては、実施例4と同一の方法を介して変性ブタジエン重合体を製造した。
未変性ブタジエン重合体として、BR1208(LG化学)を比較例として用いた。
未変性ブタジエン重合体として、CB25(Lanxess社)を比較例として用いた。
20Lのオートクレーブ反応器に、1,3−ブタジエン550g及びn−ヘキサン3681gを入れた後、 反応器内部温度を70℃に昇温した。ここに触媒組成物を添加した後、60分間重合を進行した。このとき、前記触媒組成物は、n−ヘキサン溶媒中にネオジムバーサテート(Neodymium versatate、Solvay社)0.715mmolを添加し、ジイソブチルアルミニウムヒドリド(DIBAH)及び塩化ジエチルアルミニウム(DEAC)を前記ネオジムバーサテート:DIBAH:DEAC=1:9.5:2.4のモル比になるように順次投入した後、混合して製造した。前記製造例で製造された化学式(i)の化合物を添加した後、30分間変性反応を進行させた(変性剤:Nd=5:1当量)。以後、重合停止剤としてHPSSと酸化防止剤としてWingstay−Kを単量体100重量部対比それぞれ0.15重量部及び0.4重量部で添加した。以後、スチームストリッピングを介して溶媒を除去し、6インチHot Roll(110℃)を用いて4分間乾燥し変性ブタジエン重合体を製造した。
実施例1において、二塩化二硫黄を添加し5分間撹拌して第1重合体と混合させたことを除きいては、実施例1と同一の方法を介して変性ブタジエン重合体を製造した。
前記実施例及び比較例の重合体に対して下記のような方法でそれぞれの物性を測定し、その結果を下記表1で表した。
Varian VNMRS 500 Mhz NMRを用いて各重合体内のシス、トランス及びビニル結合含量を測定しており、溶媒としては1,1,2,2−テトラクロロエタンD2(Cambridge Isotope社)を用いた。
各重合体を40℃条件下でテトラヒドロフラン(THF)に30分間溶かした後、ゲル浸透クロマトグラフィー(GPC:gel permeation chromatography)に積載し流した。このとき、カラムはポリマーラボラトリーズ社(Polymer Laboratories)の商品名PLgel Olexisカラム二本とPLgel mixed−Cカラム一本を組み合わせて用いた。また、新たに入れ替えたカラムは、全て混床(mixed bed)タイプのカラムを用い、ゲル浸透クロマトグラフィー標準物質(GPC Standard material)としてポリスチレン(Polystyrene)を用いた。
各重合体に対して、Monsanto社MV2000EのLarge Rotorを用い、100℃でRotor Speed2±0.02rpmの条件でムーニー粘度(ML1+4、@100℃)(MU)を測定した。このとき用いられた試料は、室温(23±3℃)で30分以上放置した後、27±3gを採取しダイキャビティ内部に入れておき、プラテン(Platen)を作動させてトルクを印加しつつムーニー粘度を測定した。また、ムーニー粘度の測定後、トルクが緩みながら表れるムーニー粘度の変化を1分間観察し、その傾き値から−S/R値を決定した。
前記実施例1から実施例5及び比較例1から比較例4で製造した各重合体を用いて、ゴム組成物及びゴム試料を製造した後、下記のような方法で引張強度、300%モデュラス、伸率、そして、粘弾性特性(回転抵抗性)をそれぞれ測定した。その結果を下記表2で表した。
ムーニー粘度(ML1+4、@100℃)(MU)は、前記製造された各加硫配合物を用いて測定した。具体的に、Monsanto社MV2000EでLarge Rotorを用い、100℃でRotor Speed2±0.02rpmの条件でムーニー粘度(MV)を測定した。このとき用いられた試料は、室温(23±3℃)で30分以上放置した後、27±3gを27±3gを採取しダイキャビティ内部に入れておき、プラテン(Platen)を作動させてトルクを印加しつつムーニー粘度を測定した。
前記各ゴム組成物を150℃でt90分加硫した後、ASTM D412に準じて加硫物の引張強度、300%伸張時のモデュラス(M−300%)及び破断時加硫物の伸率を測定した。測定値は、比較例2の結果値を100とし、下記数学式1を介して計算し指数化(Index)した。
低燃費特性に最も重要なTanδ物性は、ドイツGabo社DMTS 500Nを用い、周波数10Hz、Prestrain3%、Dynamic Strain3%で60℃での粘弾性係数(Tanδ)を測定した。このとき、60℃でのTanδ値は、回転抵抗性特性の燃費性を示すものである。測定値は、比較例2の結果値を100とし、下記数学式2を介して計算し指数化(Index)した。
Claims (11)
- 1)炭化水素溶媒中で、触媒組成物の存在下で共役ジエン系単量体を重合し活性重合体を製造する段階と、
2)前記活性重合体と化学式2で表される変性剤を反応させ第1重合体を製造する段階と、
3)前記第1重合体にハロゲン化硫黄を添加し15分以上混合する段階とを含む変性共役ジエン系重合体の製造方法。
前記化学式2において、
R 1 及びR 3 は、それぞれ独立して、非置換の炭素数1から10の二価炭化水素基であり、
R 2 は、−R 6 COOR 7 で置換された三価炭化水素基であり、
R 4 及びR 6 は単結合であり、
R 7 は、炭素数1から20のアルキル基であり、
R 9 からR 11 は、それぞれ独立して、炭素数1から20のアルキル基である。 - 前記ハロゲン化硫黄は、前記第1重合体100重量部に対して0.1重量部から0.3重量部で用いられる、請求項1に記載の変性共役ジエン系重合体の製造方法。
- 前記段階3)の混合は、前記ハロゲン化硫黄を前記第1重合体に添加し、次いで、15分以上60分以下で撹拌することにより行われる、請求項1または2に記載の変性共役ジエン系重合体の製造方法.
- 前記ハロゲン化硫黄は、二塩化二硫黄、二塩化硫黄及び塩化チオニルからなる群から選択された1つ以上である、請求項1〜3のいずれか一項に記載の変性共役ジエン系重合体の製造方法。
- 前記段階3)の混合は、段階1)の重合温度に対して5℃から20℃上昇された温度条件で行われる、請求項1〜4のいずれか一項に記載の変性共役ジエン系重合体の製造方法。
- 前記段階1)の重合は、50℃以上150℃以下の温度で行われる、請求項1〜5のいずれか一項に記載の変性共役ジエン系重合体の製造方法。
- 前記触媒組成物は、ランタン系列の希土類元素含有化合物を含む、請求項1〜7のいずれか一項に記載の変性共役ジエン系重合体の製造方法。
- 前記ネオジム化合物は、Nd(2−エチルヘキサノエート)3、Nd(2,2−ジメチルデカノエート)3、Nd(2,2−ジエチルデカノエート)3、Nd(2,2−ジプロピルデカノエート)3、Nd(2,2−ジブチルデカノエート)3、Nd(2,2−ジヘキシルデカノエート)3、Nd(2,2−ジオクチルデカノエート)3、Nd(2−エチル−2−プロピルデカノエート)3、Nd(2−エチル−2−ブチルデカノエート)3、Nd(2−エチル−2−ヘキシルデカノエート)3、Nd(2−プロピル−2−ブチルデカノエート)3、Nd(2−プロピル−2−ヘキシルデカノエート)3、Nd(2−プロピル−2−イソプロピルデカノエート)3、Nd(2−ブチル−2−ヘキシルデカノエート)3、Nd(2−ヘキシル−2−オクチルデカノエート)3、Nd(2,2−ジエチルオクタノエート)3、Nd(2,2−ジプロピルオクタノエート)3、Nd(2,2−ジブチルオクタノエート)3、Nd(2,2−ジヘキシルオクタノエート)3、Nd(2−エチル−2−プロピルオクタノエート)3、Nd(2−エチル−2−ヘキシルオクタノエート)3、Nd(2,2−ジエチルノナノエート)3、Nd(2,2−ジプロピルノナノエート)3、Nd(2,2−ジブチルノナノエート)3、Nd(2,2−ジヘキシルノナノエート)3、Nd(2−エチル−2−プロピルノナノエート)3及びNd(2−エチル−2−ヘキシルノナノエート)3からなる群から選択された1つ以上である、請求項9に記載の変性共役ジエン系重合体の製造方法。
- 前記触媒組成物は、アルキル化剤、ハロゲン化物及び共役ジエン系単量体のうち少なくとも一つを含む、請求項1〜10のいずれか一項に記載の変性共役ジエン系重合体の製造方法。
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