JP6780252B2 - 圧電素子、液体噴射ヘッド及び圧電素子デバイス - Google Patents
圧電素子、液体噴射ヘッド及び圧電素子デバイス Download PDFInfo
- Publication number
- JP6780252B2 JP6780252B2 JP2016019289A JP2016019289A JP6780252B2 JP 6780252 B2 JP6780252 B2 JP 6780252B2 JP 2016019289 A JP2016019289 A JP 2016019289A JP 2016019289 A JP2016019289 A JP 2016019289A JP 6780252 B2 JP6780252 B2 JP 6780252B2
- Authority
- JP
- Japan
- Prior art keywords
- piezoelectric element
- electrode
- element device
- layer
- piezoelectric
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 239000007788 liquid Substances 0.000 title claims description 32
- 238000002347 injection Methods 0.000 title claims description 27
- 239000007924 injection Substances 0.000 title claims description 27
- 239000000758 substrate Substances 0.000 claims description 41
- 239000012212 insulator Substances 0.000 description 26
- 239000000463 material Substances 0.000 description 20
- 238000006073 displacement reaction Methods 0.000 description 15
- 238000004519 manufacturing process Methods 0.000 description 14
- 238000000034 method Methods 0.000 description 13
- 230000001681 protective effect Effects 0.000 description 13
- 230000006378 damage Effects 0.000 description 11
- 239000007789 gas Substances 0.000 description 8
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 8
- 238000004891 communication Methods 0.000 description 7
- 238000005530 etching Methods 0.000 description 7
- 238000005240 physical vapour deposition Methods 0.000 description 6
- 238000001312 dry etching Methods 0.000 description 5
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 5
- 230000032258 transport Effects 0.000 description 5
- 229910001928 zirconium oxide Inorganic materials 0.000 description 5
- 238000013459 approach Methods 0.000 description 4
- 229910052451 lead zirconate titanate Inorganic materials 0.000 description 4
- 238000005192 partition Methods 0.000 description 4
- 238000007789 sealing Methods 0.000 description 4
- 238000004544 sputter deposition Methods 0.000 description 4
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 3
- 239000000853 adhesive Substances 0.000 description 3
- 230000001070 adhesive effect Effects 0.000 description 3
- 239000000460 chlorine Substances 0.000 description 3
- 229910052741 iridium Inorganic materials 0.000 description 3
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 3
- 238000000608 laser ablation Methods 0.000 description 3
- 239000007791 liquid phase Substances 0.000 description 3
- 229910052697 platinum Inorganic materials 0.000 description 3
- 238000003980 solgel method Methods 0.000 description 3
- 238000003860 storage Methods 0.000 description 3
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- KYKAJFCTULSVSH-UHFFFAOYSA-N chloro(fluoro)methane Chemical compound F[C]Cl KYKAJFCTULSVSH-UHFFFAOYSA-N 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 238000000354 decomposition reaction Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000001747 exhibiting effect Effects 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 238000009616 inductively coupled plasma Methods 0.000 description 2
- RVLXVXJAKUJOMY-UHFFFAOYSA-N lanthanum;oxonickel Chemical compound [La].[Ni]=O RVLXVXJAKUJOMY-UHFFFAOYSA-N 0.000 description 2
- HFGPZNIAWCZYJU-UHFFFAOYSA-N lead zirconate titanate Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ti+4].[Zr+4].[Pb+2] HFGPZNIAWCZYJU-UHFFFAOYSA-N 0.000 description 2
- 238000011068 loading method Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910044991 metal oxide Inorganic materials 0.000 description 2
- 150000004706 metal oxides Chemical class 0.000 description 2
- 229910000480 nickel oxide Inorganic materials 0.000 description 2
- GNRSAWUEBMWBQH-UHFFFAOYSA-N oxonickel Chemical compound [Ni]=O GNRSAWUEBMWBQH-UHFFFAOYSA-N 0.000 description 2
- 238000000059 patterning Methods 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 239000012808 vapor phase Substances 0.000 description 2
- 238000000018 DNA microarray Methods 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- 239000012670 alkaline solution Substances 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 239000003610 charcoal Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 150000004696 coordination complex Chemical class 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- HTXDPTMKBJXEOW-UHFFFAOYSA-N dioxoiridium Chemical compound O=[Ir]=O HTXDPTMKBJXEOW-UHFFFAOYSA-N 0.000 description 1
- 239000007772 electrode material Substances 0.000 description 1
- 229910002112 ferroelectric ceramic material Inorganic materials 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 229910000457 iridium oxide Inorganic materials 0.000 description 1
- 239000002648 laminated material Substances 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000000395 magnesium oxide Substances 0.000 description 1
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 1
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229910000484 niobium oxide Inorganic materials 0.000 description 1
- URLJKFSTXLNXLG-UHFFFAOYSA-N niobium(5+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Nb+5].[Nb+5] URLJKFSTXLNXLG-UHFFFAOYSA-N 0.000 description 1
- 229910000510 noble metal Inorganic materials 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 239000012071 phase Substances 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 239000010970 precious metal Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 238000009751 slip forming Methods 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
- 238000001039 wet etching Methods 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1607—Production of print heads with piezoelectric elements
- B41J2/161—Production of print heads with piezoelectric elements of film type, deformed by bending and disposed on a diaphragm
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/14—Structure thereof only for on-demand ink jet heads
- B41J2/14201—Structure of print heads with piezoelectric elements
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/14—Structure thereof only for on-demand ink jet heads
- B41J2/14201—Structure of print heads with piezoelectric elements
- B41J2/14233—Structure of print heads with piezoelectric elements of film type, deformed by bending and disposed on a diaphragm
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1623—Manufacturing processes bonding and adhesion
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1626—Manufacturing processes etching
- B41J2/1628—Manufacturing processes etching dry etching
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1626—Manufacturing processes etching
- B41J2/1629—Manufacturing processes etching wet etching
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1632—Manufacturing processes machining
- B41J2/1634—Manufacturing processes machining laser machining
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/164—Manufacturing processes thin film formation
- B41J2/1645—Manufacturing processes thin film formation thin film formation by spincoating
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/164—Manufacturing processes thin film formation
- B41J2/1646—Manufacturing processes thin film formation thin film formation by sputtering
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/14—Structure thereof only for on-demand ink jet heads
- B41J2/14201—Structure of print heads with piezoelectric elements
- B41J2/14233—Structure of print heads with piezoelectric elements of film type, deformed by bending and disposed on a diaphragm
- B41J2002/14241—Structure of print heads with piezoelectric elements of film type, deformed by bending and disposed on a diaphragm having a cover around the piezoelectric thin film element
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/14—Structure thereof only for on-demand ink jet heads
- B41J2/14201—Structure of print heads with piezoelectric elements
- B41J2/14233—Structure of print heads with piezoelectric elements of film type, deformed by bending and disposed on a diaphragm
- B41J2002/1425—Embedded thin film piezoelectric element
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/14—Structure thereof only for on-demand ink jet heads
- B41J2002/14419—Manifold
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Particle Formation And Scattering Control In Inkjet Printers (AREA)
Description
かかる態様では、非能動部の下方の振動板の第2振動部が第1振動部に向けて厚さが漸大している。すなわち応力が集中する圧電体層の端部近傍における振動板の厚さが厚くなるので、応力による振動板の破壊を抑制することができる。また、第2振動部の厚さは、第1振動部よりも薄くなっている。このため、圧電素子の変形にともなう振動板の変位を高くすることができる。このように本態様では、信頼性が向上し、かつ振動板の変位も良好な圧電素子が提供される。
図1は、本実施形態に係る液体噴射装置の一例であるインクジェット式記録装置の斜視図である。インクジェット式記録ヘッドは液体噴射ヘッドの一例であり、単に記録ヘッドともいう。
なお、本実施形態では、記録ヘッド1がインクを吐出する方向をZ方向、Z方向に直交する平面においてキャリッジ3が往復移動する方向をY方向、Y方向及びZ方向に直交する方向をX方向とする。
第1振動部53は、振動板50のうち圧電体層70の非能動部320の下方(圧電素子300からみて第1電極60側)の一部である。換言すれば、振動板50のうち圧電体層70の非能動部320が重なった部分である。本実施形態では、圧電体層70の下方にある弾性膜51及び絶縁体膜52の一部が第1振動部53に相当する。この第1振動部53においては、弾性膜51及び絶縁体膜52は厚さがほぼ均等となっている。なお、第1振動部53は、本実施形態のように、圧電体層70の下面側に接した場合に限らず、別部材を挟んで間接的に圧電体層70の下方に位置していてもよい。
非能動部320においては、圧電体層70の端部近傍で厚さが厚くなったテーパー部55を含み、圧電体層70から離れた部分では振動板50の厚さが薄くなった腕部59が形成され始める。
非能動部320においては、圧電体層70の端部近傍で厚さが厚くなったテーパー部55を含み、圧電体層70から離れた部分では絶縁体膜52が除去された腕部59を形成することができる。
以上、本発明の実施形態について説明したが、本発明の基本的な構成は上述したものに限定されるものではない。
Claims (11)
- 振動板と、
前記振動板の上方に設けられた第1電極と、
前記第1電極の上方に設けられた圧電体層と、
前記圧電体層の上方に設けられた第2電極と、を備えた圧電素子デバイスであって、
前記圧電素子デバイスは、前記第1電極が配置された能動部と、前記能動部よりも第1方向における前記圧電素子デバイスの端部側に位置し、前記第1電極が配置されない非能動部と、を含み、
前記非能動部における前記振動板は、前記非能動部の下方の第1振動部と、前記第1振動部よりも前記第1方向と交差する第2方向における前記圧電素子デバイスの端部側に位置する第2振動部とを備え、
前記第2振動部は、前記第2方向に沿って前記第1振動部側に向かうにしたがって厚さが漸大したテーパー部分を含む
ことを特徴とする圧電素子デバイス。 - 請求項1に記載する圧電素子デバイスにおいて、
前記テーパー部分上には、前記第2電極が設けられていないことを特徴とする圧電素子デバイス。 - 請求項1又は請求項2に記載する圧電素子デバイスにおいて、
前記テーパー部分の傾斜角は、前記圧電体層の側面の傾斜角よりも小さい
ことを特徴とする圧電素子デバイス。 - 請求項1から請求項3の何れか一項に記載する圧電素子デバイスにおいて、
前記非能動部における前記振動板は、前記第1電極側の第1層、前記第1層の前記第1電極とは反対側の第2層とを備え、
前記第1層は、前記第2方向に沿って前記第1振動部側に向かうにしたがって厚さが漸大した部分を含み、
前記第2層は、前記第2方向に沿って前記第1振動部側に向かうにしたがって厚さが漸大した部分を含まない
ことを特徴とする圧電素子デバイス。 - 請求項4に記載する圧電素子において、
前記第1振動部の上方には、前記第1層が形成され、
前記第2振動部の上方の少なくとも一部には、前記第1層が形成されていない
ことを特徴とする圧電素子。 - 請求項5に記載する圧電素子において、
前記第2振動部の上方の少なくとも一部の前記第1層が形成されていない領域のさらに上方には、前記第2電極が形成されていないことを特徴とする圧電素子。 - 請求項1から請求項5の何れか一項に記載する圧電素子デバイスにおいて、
前記第1電極は、前記能動部の下方の第1膜厚部と、前記第1膜厚部よりも外側の第2膜厚部とを備え、
前記第2膜厚部は、前記第1膜厚部に向かって厚さが漸大した部分を含む
ことを特徴とする圧電素子デバイス。 - 請求項1から6の何れか一項に記載する圧電素子デバイスにおいて、
前記非能動部における前記圧電体層は、前記能動部における前記圧電体層よりも厚いことを特徴とする圧電素子デバイス。 - 請求項1から請求項7の何れか一項に記載する圧電素子デバイスであって、
前記振動板の下方に設けられ、内部に複数の圧力発生室が形成された流路形成基板を更に備え、
前記複数の圧力発生室のそれぞれは、前記第1方向に延在し、
前記複数の圧力発生室は、前記第2方向に配列することを特徴とする圧電素子デバイス。 - 請求項9に記載する圧電素子デバイスであって、
前記複数の圧力発生室それぞれには、前記第1電極が共通に設けられ、且つ、複数の前記第2電極が個別に設けられることを特徴とする圧電素子デバイス。 - 請求項1から請求項9の何れか一項に記載する圧電素子デバイスを備えることを特徴とする液体噴射ヘッド。
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2016019289A JP6780252B2 (ja) | 2016-02-03 | 2016-02-03 | 圧電素子、液体噴射ヘッド及び圧電素子デバイス |
US15/416,316 US9950514B2 (en) | 2016-02-03 | 2017-01-26 | Piezoelectric element, liquid ejecting head, and piezoelectric element device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2016019289A JP6780252B2 (ja) | 2016-02-03 | 2016-02-03 | 圧電素子、液体噴射ヘッド及び圧電素子デバイス |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2017139331A JP2017139331A (ja) | 2017-08-10 |
JP6780252B2 true JP6780252B2 (ja) | 2020-11-04 |
Family
ID=59385967
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2016019289A Active JP6780252B2 (ja) | 2016-02-03 | 2016-02-03 | 圧電素子、液体噴射ヘッド及び圧電素子デバイス |
Country Status (2)
Country | Link |
---|---|
US (1) | US9950514B2 (ja) |
JP (1) | JP6780252B2 (ja) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10850515B2 (en) | 2018-09-20 | 2020-12-01 | Seiko Epson Corporation | Liquid ejecting head and liquid ejecting apparatus |
JP7571575B2 (ja) | 2021-01-29 | 2024-10-23 | セイコーエプソン株式会社 | 液体噴射ヘッド及び液体噴射装置 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3442299B2 (ja) * | 1997-11-25 | 2003-09-02 | セイコーエプソン株式会社 | インクジェット式記録ヘッド及びその製造方法 |
ATE303250T1 (de) * | 1998-06-08 | 2005-09-15 | Seiko Epson Corp | Tintenstrahlaufzeichnungskopf und tintenstrahlaufzeichnungsvorrichtung |
JP2000052550A (ja) | 1998-08-06 | 2000-02-22 | Seiko Epson Corp | インクジェット式記録ヘッド及びインクジェット式記録装置 |
JP2006256048A (ja) * | 2005-03-16 | 2006-09-28 | Fuji Xerox Co Ltd | 圧電素子基板、液滴吐出ヘッド、液滴吐出装置、及び圧電素子基板製造方法 |
JP2009252757A (ja) | 2008-04-01 | 2009-10-29 | Seiko Epson Corp | 圧電素子およびその製造方法、圧電アクチュエータ、並びに、液体噴射ヘッド |
JP5494953B2 (ja) * | 2010-03-26 | 2014-05-21 | セイコーエプソン株式会社 | 圧電アクチュエーターおよびその製造方法、液体噴射ヘッドおよび液体噴射装置 |
JP2015150713A (ja) * | 2014-02-12 | 2015-08-24 | セイコーエプソン株式会社 | 液体噴射ヘッド、及び、液体噴射装置 |
-
2016
- 2016-02-03 JP JP2016019289A patent/JP6780252B2/ja active Active
-
2017
- 2017-01-26 US US15/416,316 patent/US9950514B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
JP2017139331A (ja) | 2017-08-10 |
US9950514B2 (en) | 2018-04-24 |
US20170217180A1 (en) | 2017-08-03 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP4258668B2 (ja) | 液体噴射ヘッド及び液体噴射装置 | |
JP6186784B2 (ja) | 液体噴射ヘッド、液体噴射装置、圧電素子及び超音波センサー | |
JP7087413B2 (ja) | 圧電デバイス、液体噴射ヘッド、および、液体噴射装置 | |
JP4300431B2 (ja) | アクチュエータ装置及びそれを用いた液体噴射ヘッド | |
JP5999301B2 (ja) | 圧電素子、液体噴射ヘッド及び液体噴射装置 | |
JP2009214522A (ja) | 液体噴射ヘッド及び液体噴射ヘッドの製造方法並びに液体噴射装置 | |
JP6780252B2 (ja) | 圧電素子、液体噴射ヘッド及び圧電素子デバイス | |
JP7087309B2 (ja) | 液体噴射ヘッド、液体噴射装置、及び、圧電デバイス | |
JP2013162063A (ja) | 圧電素子、液体噴射ヘッド及び液体噴射装置 | |
JP2009051104A (ja) | 液体噴射ヘッド及び液体噴射装置 | |
JP2010143084A (ja) | 液体噴射ヘッド及び液体噴射装置並びにアクチュエータ装置 | |
JP2012240366A (ja) | 圧電素子、液体噴射ヘッド、および液体噴射装置 | |
JP2010120270A (ja) | 液体噴射ヘッド、液体噴射装置、アクチュエータ装置及び液体噴射ヘッドの製造方法 | |
JP5790919B2 (ja) | 液体噴射ヘッド及び液体噴射装置 | |
JP5447786B2 (ja) | 液体噴射ヘッド及び液体噴射装置並びにアクチュエーター装置 | |
JP2010173197A (ja) | 液体噴射ヘッド、液体噴射装置、アクチュエーター装置及び液体噴射ヘッドの製造方法 | |
JP2010228277A (ja) | 液体噴射ヘッド、液体噴射装置、アクチュエーター装置及び液体噴射ヘッドの製造方法 | |
JP2009061729A (ja) | 液体噴射ヘッド及び液体噴射装置 | |
JP6274423B2 (ja) | 圧電アクチュエーター、液体噴射ヘッド及び液体噴射装置 | |
JP2017139300A (ja) | 圧電素子、液体噴射ヘッド及び圧電デバイス | |
JP5686170B2 (ja) | 液体噴射ヘッド及び液体噴射装置 | |
JP2017152554A (ja) | 圧電デバイス及び液体噴射ヘッド | |
JP2018099821A (ja) | 液体噴射ヘッド、液体噴射装置及び圧電デバイス | |
JP6764126B2 (ja) | 圧電デバイスの製造方法 | |
JP2017050422A (ja) | 圧電素子の製造方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20181211 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20190828 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A821 Effective date: 20190902 |
|
RD03 | Notification of appointment of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7423 Effective date: 20190902 |
|
RD04 | Notification of resignation of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7424 Effective date: 20190902 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20190830 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20191018 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20200303 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20200415 |
|
RD07 | Notification of extinguishment of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7427 Effective date: 20200803 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20200915 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20200928 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 6780252 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |