JP6760984B2 - セレン化13族ナノ粒子 - Google Patents
セレン化13族ナノ粒子 Download PDFInfo
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- JP6760984B2 JP6760984B2 JP2018028358A JP2018028358A JP6760984B2 JP 6760984 B2 JP6760984 B2 JP 6760984B2 JP 2018028358 A JP2018028358 A JP 2018028358A JP 2018028358 A JP2018028358 A JP 2018028358A JP 6760984 B2 JP6760984 B2 JP 6760984B2
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- 239000002105 nanoparticle Substances 0.000 title claims description 146
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 title claims description 26
- 239000011669 selenium Substances 0.000 claims description 81
- 238000000034 method Methods 0.000 claims description 37
- 229910052711 selenium Inorganic materials 0.000 claims description 28
- 239000003446 ligand Substances 0.000 claims description 20
- 239000000203 mixture Substances 0.000 claims description 17
- 239000002904 solvent Substances 0.000 claims description 17
- 239000000758 substrate Substances 0.000 claims description 15
- 229910052733 gallium Inorganic materials 0.000 claims description 12
- 229910052738 indium Inorganic materials 0.000 claims description 12
- 238000002360 preparation method Methods 0.000 claims description 11
- 239000012298 atmosphere Substances 0.000 claims description 7
- 125000004432 carbon atom Chemical group C* 0.000 claims description 7
- 238000010438 heat treatment Methods 0.000 claims description 6
- 238000005507 spraying Methods 0.000 claims description 5
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 claims description 4
- 125000003118 aryl group Chemical group 0.000 claims description 4
- 229910052799 carbon Inorganic materials 0.000 claims description 4
- DVRDHUBQLOKMHZ-UHFFFAOYSA-N chalcopyrite Chemical compound [S-2].[S-2].[Fe+2].[Cu+2] DVRDHUBQLOKMHZ-UHFFFAOYSA-N 0.000 claims description 4
- 229910052951 chalcopyrite Inorganic materials 0.000 claims description 4
- RKTYLMNFRDHKIL-UHFFFAOYSA-N copper;5,10,15,20-tetraphenylporphyrin-22,24-diide Chemical group [Cu+2].C1=CC(C(=C2C=CC([N-]2)=C(C=2C=CC=CC=2)C=2C=CC(N=2)=C(C=2C=CC=CC=2)C2=CC=C3[N-]2)C=2C=CC=CC=2)=NC1=C3C1=CC=CC=C1 RKTYLMNFRDHKIL-UHFFFAOYSA-N 0.000 claims description 4
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 claims description 4
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- 239000000443 aerosol Substances 0.000 claims description 3
- 125000003342 alkenyl group Chemical group 0.000 claims description 3
- 125000000217 alkyl group Chemical group 0.000 claims description 3
- 125000000304 alkynyl group Chemical group 0.000 claims description 3
- 239000013078 crystal Substances 0.000 claims description 3
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- RMZAYIKUYWXQPB-UHFFFAOYSA-N trioctylphosphane Chemical compound CCCCCCCCP(CCCCCCCC)CCCCCCCC RMZAYIKUYWXQPB-UHFFFAOYSA-N 0.000 description 21
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- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 12
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- QGLWBTPVKHMVHM-KTKRTIGZSA-N (z)-octadec-9-en-1-amine Chemical compound CCCCCCCC\C=C/CCCCCCCCN QGLWBTPVKHMVHM-KTKRTIGZSA-N 0.000 description 11
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- 239000005642 Oleic acid Substances 0.000 description 10
- QXJSBBXBKPUZAA-UHFFFAOYSA-N isooleic acid Natural products CCCCCCCC=CCCCCCCCCC(O)=O QXJSBBXBKPUZAA-UHFFFAOYSA-N 0.000 description 10
- ZQPPMHVWECSIRJ-KTKRTIGZSA-N oleic acid Chemical compound CCCCCCCC\C=C/CCCCCCCC(O)=O ZQPPMHVWECSIRJ-KTKRTIGZSA-N 0.000 description 10
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 9
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- 239000010409 thin film Substances 0.000 description 9
- ZMBHCYHQLYEYDV-UHFFFAOYSA-N trioctylphosphine oxide Chemical compound CCCCCCCCP(=O)(CCCCCCCC)CCCCCCCC ZMBHCYHQLYEYDV-UHFFFAOYSA-N 0.000 description 9
- 238000004458 analytical method Methods 0.000 description 8
- 238000000151 deposition Methods 0.000 description 8
- DONSDNATLFRYPO-UHFFFAOYSA-H indium(3+);triselenate Chemical compound [In+3].[In+3].[O-][Se]([O-])(=O)=O.[O-][Se]([O-])(=O)=O.[O-][Se]([O-])(=O)=O DONSDNATLFRYPO-UHFFFAOYSA-H 0.000 description 8
- 150000002500 ions Chemical class 0.000 description 8
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- 229910052757 nitrogen Inorganic materials 0.000 description 8
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- 230000008901 benefit Effects 0.000 description 6
- QNWMNMIVDYETIG-UHFFFAOYSA-N gallium(ii) selenide Chemical compound [Se]=[Ga] QNWMNMIVDYETIG-UHFFFAOYSA-N 0.000 description 6
- 239000013110 organic ligand Substances 0.000 description 6
- 150000003958 selenols Chemical class 0.000 description 6
- 239000006228 supernatant Substances 0.000 description 6
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 5
- 238000000137 annealing Methods 0.000 description 5
- 238000005229 chemical vapour deposition Methods 0.000 description 5
- 239000011162 core material Substances 0.000 description 5
- ZZEMEJKDTZOXOI-UHFFFAOYSA-N digallium;selenium(2-) Chemical compound [Ga+3].[Ga+3].[Se-2].[Se-2].[Se-2] ZZEMEJKDTZOXOI-UHFFFAOYSA-N 0.000 description 5
- 238000000921 elemental analysis Methods 0.000 description 5
- ZVYYAYJIGYODSD-LNTINUHCSA-K (z)-4-bis[[(z)-4-oxopent-2-en-2-yl]oxy]gallanyloxypent-3-en-2-one Chemical compound [Ga+3].C\C([O-])=C\C(C)=O.C\C([O-])=C\C(C)=O.C\C([O-])=C\C(C)=O ZVYYAYJIGYODSD-LNTINUHCSA-K 0.000 description 4
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- 150000004770 chalcogenides Chemical class 0.000 description 4
- 239000000976 ink Substances 0.000 description 4
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- 238000005649 metathesis reaction Methods 0.000 description 4
- 230000003287 optical effect Effects 0.000 description 4
- IRPLSAGFWHCJIQ-UHFFFAOYSA-N selanylidenecopper Chemical compound [Se]=[Cu] IRPLSAGFWHCJIQ-UHFFFAOYSA-N 0.000 description 4
- 238000002207 thermal evaporation Methods 0.000 description 4
- VJXRKZJMGVSXPX-UHFFFAOYSA-N 4-ethylpyridine Chemical compound CCC1=CC=NC=C1 VJXRKZJMGVSXPX-UHFFFAOYSA-N 0.000 description 3
- 238000003917 TEM image Methods 0.000 description 3
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- 150000001412 amines Chemical class 0.000 description 3
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- 239000010949 copper Substances 0.000 description 3
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- ZTPZXOVJDMQVIK-UHFFFAOYSA-N dodecane-1-selenol Chemical compound CCCCCCCCCCCC[SeH] ZTPZXOVJDMQVIK-UHFFFAOYSA-N 0.000 description 3
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- 239000002070 nanowire Substances 0.000 description 3
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- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 2
- KTSFMFGEAAANTF-UHFFFAOYSA-N [Cu].[Se].[Se].[In] Chemical compound [Cu].[Se].[Se].[In] KTSFMFGEAAANTF-UHFFFAOYSA-N 0.000 description 2
- CUJRVFIICFDLGR-UHFFFAOYSA-N acetylacetonate Chemical class CC(=O)[CH-]C(C)=O CUJRVFIICFDLGR-UHFFFAOYSA-N 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 239000013590 bulk material Substances 0.000 description 2
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- 235000014113 dietary fatty acids Nutrition 0.000 description 2
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- AKUCEXGLFUSJCD-UHFFFAOYSA-N indium(3+);selenium(2-) Chemical compound [Se-2].[Se-2].[Se-2].[In+3].[In+3] AKUCEXGLFUSJCD-UHFFFAOYSA-N 0.000 description 2
- 239000002071 nanotube Substances 0.000 description 2
- 238000005424 photoluminescence Methods 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
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- 229920006395 saturated elastomer Polymers 0.000 description 2
- 229940065287 selenium compound Drugs 0.000 description 2
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- 238000000527 sonication Methods 0.000 description 2
- 238000001228 spectrum Methods 0.000 description 2
- 239000007858 starting material Substances 0.000 description 2
- 229910052717 sulfur Inorganic materials 0.000 description 2
- 239000011593 sulfur Substances 0.000 description 2
- XCZXGTMEAKBVPV-UHFFFAOYSA-N trimethylgallium Chemical compound C[Ga](C)C XCZXGTMEAKBVPV-UHFFFAOYSA-N 0.000 description 2
- IBEFSUTVZWZJEL-UHFFFAOYSA-N trimethylindium Chemical compound C[In](C)C IBEFSUTVZWZJEL-UHFFFAOYSA-N 0.000 description 2
- POILWHVDKZOXJZ-ARJAWSKDSA-M (z)-4-oxopent-2-en-2-olate Chemical compound C\C([O-])=C\C(C)=O POILWHVDKZOXJZ-ARJAWSKDSA-M 0.000 description 1
- YJTKZCDBKVTVBY-UHFFFAOYSA-N 1,3-Diphenylbenzene Chemical group C1=CC=CC=C1C1=CC=CC(C=2C=CC=CC=2)=C1 YJTKZCDBKVTVBY-UHFFFAOYSA-N 0.000 description 1
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- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229910021617 Indium monochloride Inorganic materials 0.000 description 1
- ABLZXFCXXLZCGV-UHFFFAOYSA-N Phosphorous acid Chemical compound OP(O)=O ABLZXFCXXLZCGV-UHFFFAOYSA-N 0.000 description 1
- 239000004783 Serene Substances 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 239000007983 Tris buffer Substances 0.000 description 1
- 238000000862 absorption spectrum Methods 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
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- 150000001335 aliphatic alkanes Chemical class 0.000 description 1
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- 229910052782 aluminium Inorganic materials 0.000 description 1
- AINNHYSCPOKHAO-UHFFFAOYSA-N aluminum;selenium Chemical compound [Se]=[Al] AINNHYSCPOKHAO-UHFFFAOYSA-N 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
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- 150000003841 chloride salts Chemical class 0.000 description 1
- XOYLJNJLGBYDTH-UHFFFAOYSA-M chlorogallium Chemical compound [Ga]Cl XOYLJNJLGBYDTH-UHFFFAOYSA-M 0.000 description 1
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- 125000004177 diethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- ABFDJEJZFDLFAD-UHFFFAOYSA-H digallium;triselenate Chemical compound [Ga+3].[Ga+3].[O-][Se]([O-])(=O)=O.[O-][Se]([O-])(=O)=O.[O-][Se]([O-])(=O)=O ABFDJEJZFDLFAD-UHFFFAOYSA-H 0.000 description 1
- QYHNIMDZIYANJH-UHFFFAOYSA-N diindium Chemical compound [In]#[In] QYHNIMDZIYANJH-UHFFFAOYSA-N 0.000 description 1
- XIMIGUBYDJDCKI-UHFFFAOYSA-N diselenium Chemical compound [Se]=[Se] XIMIGUBYDJDCKI-UHFFFAOYSA-N 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
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- 239000002803 fossil fuel Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 229910021482 group 13 metal Inorganic materials 0.000 description 1
- 125000000623 heterocyclic group Chemical group 0.000 description 1
- GJWAEWLHSDGBGG-UHFFFAOYSA-N hexylphosphonic acid Chemical compound CCCCCCP(O)(O)=O GJWAEWLHSDGBGG-UHFFFAOYSA-N 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- APHGZSBLRQFRCA-UHFFFAOYSA-M indium(1+);chloride Chemical compound [In]Cl APHGZSBLRQFRCA-UHFFFAOYSA-M 0.000 description 1
- RJMMFJHMVBOLGY-UHFFFAOYSA-N indium(3+) Chemical compound [In+3] RJMMFJHMVBOLGY-UHFFFAOYSA-N 0.000 description 1
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- 238000002347 injection Methods 0.000 description 1
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- 230000001404 mediated effect Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
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- 239000011858 nanopowder Substances 0.000 description 1
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- 125000002524 organometallic group Chemical group 0.000 description 1
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- 239000011049 pearl Substances 0.000 description 1
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- MTCFGRXMJLQNBG-UHFFFAOYSA-N serine Chemical compound OCC(N)C(O)=O MTCFGRXMJLQNBG-UHFFFAOYSA-N 0.000 description 1
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- 239000011734 sodium Substances 0.000 description 1
- GROMGGTZECPEKN-UHFFFAOYSA-N sodium metatitanate Chemical compound [Na+].[Na+].[O-][Ti](=O)O[Ti](=O)O[Ti]([O-])=O GROMGGTZECPEKN-UHFFFAOYSA-N 0.000 description 1
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B19/00—Selenium; Tellurium; Compounds thereof
- C01B19/007—Tellurides or selenides of metals
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/186—Particular post-treatment for the devices, e.g. annealing, impurity gettering, short-circuit elimination, recrystallisation
- H01L31/1864—Annealing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D11/00—Inks
- C09D11/52—Electrically conductive inks
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02518—Deposited layers
- H01L21/02521—Materials
- H01L21/02568—Chalcogenide semiconducting materials not being oxides, e.g. ternary compounds
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
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Description
Claims (10)
- 炭素−セレン共有結合によって結合している有機キャッピングリガンドを含むセレン化13族ナノ粒子であって、式M x Se y を有しており、MはGa又はInであり、0<x及び0<yである、セレン化13族ナノ粒子と、
CuSeナノ粒子と、
溶媒と、
を備えるインク調整物。 - 前記有機キャッピングリガンドは、アルキル、アルケニル、アルキニル、又は、アリール基を含む、請求項1に記載のインク調整物。
- 前記有機キャッピングリガンドは、8乃至12個の炭素原子を含む、請求項1に記載のインク調整物。
- 前記セレン化13族ナノ粒子はインジウムを含む、請求項1に記載のインク調整物。
- 前記セレン化13族ナノ粒子はガリウムを含む、請求項1に記載のインク調整物。
- 前記セレン化13族ナノ粒子の直径は、2乃至5nmである、請求項1に記載のインク調整物。
- 光起電デバイスを作る方法であって、
請求項1乃至6の何れかに記載のインク調製物を基板上に堆積させて、前記インク調製物を加熱してCu(In,Ga)Se 2 膜を形成する工程を含む、方法。 - 前記インクは、スクリーン印刷、インクジェット印刷、密着印刷、グラビア印刷、ドクターブレードコーティング、スピンコーティング、アシステッドエアロゾルスプレーコーティング、及びスプレーコーティングの何れかによって前記基板に堆積されている、請求項7に記載の方法。
- 前記インク調製物がセレンリッチな雰囲気の存在下で加熱されることで、前記膜が形成される、請求項7に記載の方法。
- 前記Cu(In,Ga)Se 2 膜は、正方晶構造及び黄銅鉱型結晶構造の何れかを示すCuInSe2を含む、請求項7に記載の方法。
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US201261669339P | 2012-07-09 | 2012-07-09 | |
US61/669,339 | 2012-07-09 |
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JP2016110756A Active JP6531071B2 (ja) | 2012-07-09 | 2016-06-02 | セレン化13族ナノ粒子 |
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JP (3) | JP6371764B2 (ja) |
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KR102164628B1 (ko) * | 2013-08-05 | 2020-10-13 | 삼성전자주식회사 | 나노 결정 합성 방법 |
NL2011422C2 (en) * | 2013-09-11 | 2015-03-16 | Exergy Holding B V | Electrolytic seperator, manufacturing method and system. |
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US20160079639A1 (en) * | 2014-09-15 | 2016-03-17 | James O. Pinon | Cooling fin for a battery cell |
TWI502762B (zh) * | 2014-12-22 | 2015-10-01 | Ind Tech Res Inst | 化合物太陽能電池與硫化物單晶奈米粒子薄膜的製造方法 |
US10889887B2 (en) | 2016-08-22 | 2021-01-12 | Honeywell International Inc. | Chalcogenide sputtering target and method of making the same |
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JP7006296B2 (ja) * | 2018-01-19 | 2022-01-24 | 富士通株式会社 | 学習プログラム、学習方法および学習装置 |
CN111211041B (zh) * | 2020-01-10 | 2023-05-26 | 电子科技大学 | 一种制备大面积β相硒化铟单晶薄膜的方法 |
KR102484464B1 (ko) * | 2020-02-13 | 2023-01-02 | 고려대학교 산학협력단 | 무기 나노입자 박막을 포함하는 전자 부재의 제조 방법 및 이에 의해 제조된 전자 부재 |
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KR100909179B1 (ko) * | 2006-07-24 | 2009-07-22 | 주식회사 엘지화학 | Cis계 태양전지 흡수층의 제조방법 |
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GB0723539D0 (en) * | 2007-12-01 | 2008-01-09 | Nanoco Technologies Ltd | Preparation of nonoparticle material |
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KR101724648B1 (ko) | 2007-11-30 | 2017-04-07 | 나노코 테크놀로지스 리미티드 | 나노입자 물질의 조제 |
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WO2014009815A3 (en) | 2014-03-27 |
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