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JP6627243B2 - Substrate processing method and substrate film forming method - Google Patents

Substrate processing method and substrate film forming method Download PDF

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JP6627243B2
JP6627243B2 JP2015075847A JP2015075847A JP6627243B2 JP 6627243 B2 JP6627243 B2 JP 6627243B2 JP 2015075847 A JP2015075847 A JP 2015075847A JP 2015075847 A JP2015075847 A JP 2015075847A JP 6627243 B2 JP6627243 B2 JP 6627243B2
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substrate
suction
glass substrate
space
jig
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JP2016197623A (en
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泰崇 田邉
泰崇 田邉
悦二 福井
悦二 福井
利之 梶岡
利之 梶岡
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Nippon Electric Glass Co Ltd
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Description

本発明は、基板の処理方法、及び基板の成膜方法に関し、特に吸着保持用治具を用いた基板の処理方法、及び基板の成膜方法に関する。 The present invention, the processing method of the board, and then related to the film forming method of a substrate, concerning in particular the processing method of a substrate using a suction holding jig, and the method for forming the substrate.

ガラス基板の表面にスパッタリングなどの成膜処理を施す際、当該ガラス基板は、成膜手段に応じた適正な姿勢に保持される。例えばガラス基板を立てて成膜処理を施す場合、セッターと呼ばれる治具でガラス基板の周縁を挟持することがある。あるいは、ガラス基板を水平にした状態で成膜処理を施す場合、水平な載置台上にガラス基板を載置することがある。   When a film formation process such as sputtering is performed on the surface of a glass substrate, the glass substrate is held in an appropriate posture according to a film formation unit. For example, in a case where a film is formed on a glass substrate, the periphery of the glass substrate may be held by a jig called a setter. Alternatively, when performing a film formation process in a state where the glass substrate is horizontal, the glass substrate may be mounted on a horizontal mounting table.

しかしながら、ガラス基板を挟持して保持する手法を採る場合、成膜対象となる側の表面の全域にわたって成膜処理を施すことができない。挟持することで成膜対象となる側の表面が挟持用の治具により部分的に隠れてしまうためである。   However, when a method of holding and holding a glass substrate is employed, a film formation process cannot be performed over the entire surface on the side on which a film is to be formed. This is because the surface on the side on which the film is to be formed is partially hidden by the holding jig.

ガラス基板を水平な載置台上に載置する場合であれば、治具により成膜対象となる側の表面が隠れるおそれはないものの、成膜材料がガラス基板の成膜対象ではない側の表面(裏面)に回り込み、不要な領域にまで成膜処理が施される事態が懸念される。成膜手段によっては、気圧でガラス基板の周縁部が浮き上がるおそれがあるからである。あるいはガラス基板のサイズによっては、その製造時に生じる準不可避的な反り等の変形によって、ガラス基板の周縁部が浮き上がるおそれがあるからである。   If the glass substrate is placed on a horizontal mounting table, there is no possibility that the jig will hide the surface on which the film is to be formed, but the surface of the glass substrate on which the film is not formed (Rear surface), there is a concern that a film forming process may be performed on an unnecessary area. This is because the peripheral portion of the glass substrate may be lifted by the atmospheric pressure depending on the film forming means. Alternatively, depending on the size of the glass substrate, the periphery of the glass substrate may be lifted by deformation such as quasi-unavoidable warpage that occurs during manufacturing.

ここで、例えば特許文献1には、複数個の真空吸着パッドを備えた基板の保持機構が開示されている。この保持機構は、ガラス基板の成膜対象ではない側の表面(裏面)の周縁部を複数個の真空吸着パッドで吸着保持すると共に、当該裏面のうち真空吸着パッドが接する部分以外の領域全体に加熱プレートを密着支持可能としたものである(段落0037〜0038、図4)。   Here, for example, Patent Document 1 discloses a substrate holding mechanism provided with a plurality of vacuum suction pads. This holding mechanism suctions and holds the peripheral portion of the front surface (rear surface) of the glass substrate on the side that is not the film formation target with a plurality of vacuum suction pads, and covers the entire area of the rear surface other than the portion where the vacuum suction pads are in contact with. The heating plate can be tightly supported (paragraphs 0037 to 0038, FIG. 4).

特開平8−232065号公報JP-A-8-23265

しかしながら、特許文献1に記載のように、真空吸着パッドを用いてガラス基板の裏面を吸着保持したのでは、当該裏面のうち真空吸着パッドにより直接的に真空吸着される領域(当該パッドとガラス基板とで囲まれる空間に接する領域)のみが強く吸着され、その周辺領域に対しては吸着力がほとんど及ばない。そのため、たとえ特許文献1に記載のようにガラス基板の周縁部に複数個の真空吸着パッドを配置したとしても、ガラス基板の周縁部には、何れの真空吸着パッドからも十分な吸着力を受けることのない領域が生じることになる。これでは、当該領域が吸着力不足により浮き上がる可能性がある。特に、吸着対象となるガラス基板が相対的に大型化すると(厚み寸法に対して面寸法が大きくなると)、ガラス基板が自重もしくは外力の作用により変形し易くなるため、真空吸着パッドで吸着された領域の周囲が吸着により変形して部分的に浮き上がるおそれも高まる。ガラス基板が部分的に浮き上がると、浮き上がりにより生じた隙間から成膜材料が入り込むことで、色むらや後工程のボンディングにおける接着不良、印刷における印刷不良などの不具合が懸念される。   However, as described in Patent Literature 1, when the back surface of the glass substrate is sucked and held by using the vacuum suction pad, an area of the back surface directly sucked by the vacuum suction pad (the pad and the glass substrate). Only the region that is in contact with the space surrounded by is strongly adsorbed, and the attraction force hardly reaches the peripheral region. Therefore, even if a plurality of vacuum suction pads are arranged on the peripheral portion of the glass substrate as described in Patent Document 1, the peripheral portion of the glass substrate receives a sufficient suction force from any of the vacuum suction pads. The result is a region that does not. In this case, the area may be lifted due to insufficient suction power. In particular, when the glass substrate to be suctioned becomes relatively large (when the surface dimension becomes larger than the thickness dimension), the glass substrate is easily deformed by the action of its own weight or an external force, and thus the glass substrate is sucked by the vacuum suction pad. The possibility that the periphery of the region is deformed by suction and is partially lifted increases. When the glass substrate is partially lifted, a film forming material enters from a gap generated by the lifting, and there is a concern about color unevenness, adhesion failure in bonding in a later process, and printing failure in printing.

また、ガラス基板の種類によっては、裏面の周縁部を除く大部分が有効面として用いられる場合もあるため、特許文献1の如く加熱プレートで基板の裏面全域を密着支持することが好ましくない場合もある。   In addition, depending on the type of the glass substrate, most of the rear surface except the peripheral portion may be used as an effective surface. Therefore, as in Patent Document 1, it is not preferable to closely support the entire rear surface of the substrate with a heating plate. is there.

加えて、スパッタリングなど真空環境下で成膜処理を施す場合には、真空吸着パッドとガラス基板との間の気圧とその周辺の気圧、言い換えると、ガラス基板の裏面に作用する負圧と、ガラス基板の表面に作用する負圧との差が縮まり、あるいは実質的に零になる事態が考えられる。これでは、ガラス基板に対する吸着保持力が低下し、あるいは消失するため、成膜時の姿勢が安定しないおそれが生じる。   In addition, when performing a film forming process in a vacuum environment such as sputtering, the pressure between the vacuum suction pad and the glass substrate and the pressure around it, in other words, the negative pressure acting on the back surface of the glass substrate, It is conceivable that the difference from the negative pressure acting on the surface of the substrate is reduced or substantially reduced to zero. In this case, the suction holding force on the glass substrate decreases or disappears, and thus the posture at the time of film formation may not be stable.

以上の事情に鑑み、本明細書では、成膜材料の回り込みを防ぎつつ、基板表面の広域に安定して成膜処理を施すことを解決すべき技術的課題とする。   In view of the above circumstances, in the present specification, it is a technical problem to be solved to stably perform a film forming process over a wide area of a substrate surface while preventing a film forming material from flowing around.

前記課題の解決は、本発明に係る吸着保持用治具により達成される。すなわち、この治具は、基板を吸着保持するための吸着保持用治具であって、基板の周縁部のみに付着可能な付着面と、付着面に開口する吸着用の長穴とを備えた点をもって特徴付けられる。   The above-mentioned object is achieved by a suction holding jig according to the present invention. That is, the jig is a suction holding jig for sucking and holding the substrate, and has an attachment surface that can be attached only to the peripheral edge portion of the substrate, and a long hole for suction that opens to the attachment surface. Characterized by a point.

このように、本発明では、吸着保持用の治具に、基板の周縁部のみを付着可能な付着面を設けると共に、この付着面に開口するように吸着用の長穴を形成した。このように構成した治具であれば、長穴の周囲に対応する領域、すなわち基板の周縁部をその全周にわたって極力漏れなく吸着することが可能となる。よって、長穴を介して基板を吸着した際に基板の周縁部に吸着力不足が生じる領域を極力なくして、当該周縁部の浮き上がりを回避することができる。従って、成膜材料の裏面への回り込みを防止して、成膜対象となる側の表面のみに正確に成膜処理を施すことが可能となる。もちろん、この治具によれば、基板の裏面のみを吸着及び付着して保持することができるので、成膜対象側の表面の全域にわたって成膜処理を施すことが可能となる。   As described above, in the present invention, the attachment surface to which only the peripheral portion of the substrate can be attached is provided in the jig for holding and holding, and the long hole for adsorption is formed so as to open to the attachment surface. With the jig configured as described above, it is possible to suck the region corresponding to the periphery of the elongated hole, that is, the peripheral portion of the substrate as much as possible over the entire periphery thereof. Therefore, when the substrate is sucked through the elongated hole, a region where the suction force is insufficient at the peripheral portion of the substrate is minimized, and the peripheral portion can be prevented from being lifted. Therefore, it is possible to prevent the film-forming material from wrapping around to the back surface, and to accurately perform the film-forming process only on the surface on the side on which the film is to be formed. Of course, according to this jig, only the back surface of the substrate can be sucked and adhered and held, so that the film forming process can be performed over the entire surface on the film forming target side.

また、本発明では、付着面に開口して吸着用の長穴を設けたので、長穴の幅方向(長手方向に直交する向きをいうものとする。以下、本明細書において同じ。)両側には常に付着面が配設された状態となる。そのため、この治具を用いて基板を吸着した場合には、基板の裏面が長穴の幅方向両側で付着面に付着支持された状態となるので、枠状部の内側の空間、すなわち、基板の平面中央側の領域を付着支持しなくとも、基板を安定して保持することが可能となる。よって、基板の裏面(成膜対象ではない側の表面)の大部分が有効面となる種類の基板であっても、その表面品質に影響を及ぼすことなく安定して保持することが可能となる。   Further, in the present invention, since the long hole for suction is provided by being opened on the adhering surface, both sides in the width direction of the long hole (refer to a direction orthogonal to the longitudinal direction; hereinafter the same in this specification). Is always in a state where the attachment surface is provided. Therefore, when the substrate is sucked using this jig, the back surface of the substrate is attached to and supported by the attachment surface on both sides in the width direction of the elongated hole, so that the space inside the frame portion, that is, the substrate, It is possible to stably hold the substrate without adhering and supporting the area on the center side of the plane. Therefore, even if the back surface of the substrate (the surface on the side that is not a film formation target) is the effective surface, the substrate can be stably held without affecting the surface quality. .

また、本発明では、治具に設けた長穴の周囲において吸着支持すべき面を付着面としたので、長穴を介して基板の周縁部を吸着保持した際、基板の周縁部は長穴の周囲に設けられた付着面に押付けられ、新たに生じた付着力によって固定される。そのため、例えば真空蒸着やスパッタリングなどの成膜処理を施す場合に、基板を治具と共に真空環境下においた場合であっても、付着力により十分な保持力を維持することが可能となる。   Further, in the present invention, since the surface to be suction-supported around the elongated hole provided in the jig is used as the attachment surface, when the peripheral portion of the substrate is sucked and held via the elongated hole, the peripheral edge of the substrate is elongated. Is pressed against an adhering surface provided around and is fixed by newly generated adhering force. For this reason, for example, when performing a film forming process such as vacuum deposition or sputtering, even when the substrate is placed in a vacuum environment together with the jig, it is possible to maintain a sufficient holding force due to the adhesive force.

また、上記構成に係る治具は、例えばこの治具と、基板が付着面の上に載置された状態で長穴と基板とで囲まれる空間を減圧可能とする減圧装置とを備えた吸着保持装置として提供することも可能である。   Further, the jig according to the above configuration has, for example, a suction device including the jig and a decompression device that can depressurize a space surrounded by the elongated hole and the substrate in a state where the substrate is placed on the adhesion surface. It can also be provided as a holding device.

このように、上述した治具と、この治具の長穴と基板とで囲まれる空間を減圧可能な減圧装置とを備えた吸着保持装置であれば、付着面(長穴)の上に載置した状態の基板を減圧装置により付着面に吸着させて、吸着力と付着力とで基板を治具に保持することができる。よって、例えば治具を、減圧装置を有する装置本体に対して脱着可能に構成することで、吸着後に基板と治具のみを次工程(例えば成膜処理工程)に搬送することができ、取扱い性の面でも良好である。   As described above, if the suction holding device is provided with the above-described jig and the decompression device capable of decompressing the space surrounded by the elongate hole of the jig and the substrate, it is mounted on the attachment surface (elongated hole). The substrate in the placed state is adsorbed on the adhesion surface by the decompression device, and the substrate can be held on the jig by the adsorption force and the adhesion force. Therefore, for example, by configuring the jig so that it can be attached to and detached from the apparatus main body having the decompression device, only the substrate and the jig can be transported to the next step (for example, a film forming process) after adsorption, and The surface is also good.

また、本発明に係る吸着保持装置は、吸着保持用治具が、付着面が設けられる枠状部をさらに有するものであってもよい。また、その場合に、減圧装置が、基板が付着面の上に載置された状態で枠状部の内側の空間を減圧することなく、長穴と基板とで囲まれる空間のみを減圧可能としたものであってもよい。   In the suction holding device according to the present invention, the suction holding jig may further include a frame-shaped portion provided with an attachment surface. Further, in that case, the pressure reducing device can reduce the pressure only in the space surrounded by the elongated hole and the substrate without depressurizing the space inside the frame-shaped portion in a state where the substrate is placed on the adhesion surface. May be done.

このように、付着面が枠状部に設けられる場合に、減圧すべき空間を長穴に係る空間のみに限定することで、基板の周縁部のみを確実に吸着保持することができる。また、枠状部の内側の空間を減圧せずにおくことで、基板がその平面中央側を治具側に窪ませる向きに過度に変形する事態を極力避けて、基板が付着面以外の部位と接触したり、過度な変形(曲げ変形)に起因した割れを生じる事態を可及的に回避することが可能となる。   As described above, when the attachment surface is provided in the frame-shaped portion, by limiting the space to be decompressed to only the space related to the elongated hole, it is possible to reliably hold and hold only the peripheral portion of the substrate. In addition, by keeping the space inside the frame-shaped portion without decompression, the situation where the substrate is excessively deformed in a direction in which the center of the plane is depressed toward the jig side is avoided as much as possible, and the portion of the substrate other than the adhesion surface is prevented. And the occurrence of cracks due to excessive deformation (bending deformation) can be avoided as much as possible.

また、本発明に係る吸着保持装置は、長穴の長手方向端部が角状をなすものであってもよい。   Further, in the suction holding device according to the present invention, a longitudinal end portion of the long hole may have a square shape.

すなわち、長穴を例えば長角穴とすることで、付着面の長穴(長角穴)からの距離をなるべく均等にすることができる。具体的には、長角穴の幅方向両側に位置する付着面の幅方向寸法、及び、長手方向で隣り合う長角穴間の距離、すなわち長角穴間に位置する付着面の長手方向寸法を何れも等しく設計することができる。これにより、長穴を介して基板に作用する吸着力をより均等に周縁部に及ぼすことができ、部分的な浮き上がりのない安定した吸着保持を実現することが可能となる。   That is, by making the oblong hole, for example, an oblong hole, the distance from the oblong hole (oblong hole) of the attachment surface can be made as uniform as possible. Specifically, the width dimension of the attachment surface located on both sides in the width direction of the rectangular hole, and the distance between the adjacent rectangular holes in the longitudinal direction, that is, the longitudinal dimension of the attachment surface located between the rectangular holes Can be equally designed. As a result, the suction force acting on the substrate via the elongated holes can be more uniformly applied to the peripheral portion, and stable suction holding without partial lifting can be realized.

また、本発明に係る吸着保持装置は、付着面のうち長穴とその幅方向で隣接する領域の幅方向寸法が、長穴の幅方向寸法よりも小さく設定されているものであってもよい。   Further, in the suction holding device according to the present invention, the width dimension of a region adjacent to the elongated hole in the width direction of the attachment surface may be set to be smaller than the width dimension of the elongated hole. .

本発明者らが、吸着用の長穴とその幅方向で隣接する付着面との寸法関係について検証したところ、上述のように長穴とその幅方向で隣接する付着面それぞれの幅方向寸法を規定することで、当該長穴を介した減圧による吸着作用を有効に基板に及ぼすことができることが判明した。よって、例えば基板の端部において吸着力不足に陥る事態を可及的に回避して、安定した吸着保持を実現することが可能となる。   The present inventors have verified the dimensional relationship between the long hole for suction and the adhering surface adjacent in the width direction thereof. It has been found that the regulation allows the substrate to effectively exert the suction effect by the reduced pressure through the elongated hole. Therefore, for example, a situation in which the suction force is insufficient at the end of the substrate can be avoided as much as possible, and stable suction holding can be realized.

また、本発明に係る吸着保持装置は、枠状部の内側の空間と、長穴と基板とで囲まれる空間の少なくとも一方を加圧可能とする加圧装置をさらに備えたものであってもよい。   Further, the suction holding device according to the present invention may further include a pressurizing device capable of pressurizing at least one of a space inside the frame portion and a space surrounded by the elongated hole and the substrate. Good.

このように、減圧装置に加えて、枠状部の内側の空間と、長穴と基板とで囲まれる空間の少なくとも一方を加圧可能とする加圧装置を設けることで、減圧装置により付着面に吸着保持された状態の基板裏面の周縁部、又は平面中央側の領域を枠状部(付着面)から引き離す向きに押圧することができる。よって、この押圧力(加圧力)を調整することで、ガラス板を直接触れることなく付着面から引き剥がすことが可能となる。また、この際、効果的に基板の付着面からの引き剥がしを行うことを考慮した場合には、枠状部の内側の空間を加圧可能なように加圧装置を構成するのがよい。上述した空間の加圧は、例えば上述した何れかの空間に加圧装置となるブロー装置から所定圧のエアーを送り込むことで行われるが、この際、加圧される空間と基板の裏面とが接する面積が小さいとその分高圧のエアーを送り込まねばならず、出力の大きな加圧装置が必要となるため経済的ではない。また、あまりに高圧のエアーを用いると、発塵性が問題となるおそれもある。その点、枠状部の内側の空間であれば、長穴に比べて基板の裏面に接する面積を容易に大きく取ることができるので、それほど高出力の加圧装置を用いずとも付着面からの剥離に十分な大きさの加圧力を基板に付与することが可能となる。もちろん、構成上問題とならないのであれば、枠状部の内側の空間だけでなく、長穴と基板とで囲まれる空間についても加圧可能に加圧装置を構成するのがよい。   As described above, in addition to the decompression device, by providing the pressurization device capable of pressurizing at least one of the space inside the frame-shaped portion and the space surrounded by the elongated hole and the substrate, the adhesion surface by the decompression device is provided. Can be pressed in a direction in which the peripheral portion of the substrate rear surface or the area on the center side of the plane in a state where the substrate is sucked and held away from the frame-shaped portion (adhering surface). Therefore, by adjusting the pressing force (pressing force), the glass plate can be peeled off from the attachment surface without directly touching the glass plate. At this time, in consideration of effective peeling from the adhesion surface of the substrate, it is preferable that the pressurizing device be configured so as to pressurize the space inside the frame portion. The above-described pressurization of the space is performed, for example, by sending air of a predetermined pressure from a blow device serving as a pressurizing device to any of the above-described spaces. If the contact area is small, high-pressure air must be sent to that extent, and a pressurizing device with a large output is required, which is not economical. If too high pressure air is used, dust generation may become a problem. On the other hand, if the space is inside the frame-shaped part, the area in contact with the back surface of the substrate can be easily increased as compared with the elongated hole. It is possible to apply a sufficient pressure to the substrate for peeling. Of course, if there is no problem in the configuration, it is preferable that the pressurizing device be configured to be able to pressurize not only the space inside the frame-shaped portion but also the space surrounded by the elongated hole and the substrate.

また、前記課題の解決は、本発明に係る吸着保持方法によっても達成される。すなわち、この吸着保持方法は、基板を吸着保持するための方法であって、基板の周縁部のみに付着可能な付着面と、付着面に開口する吸着用の長穴とを備えた吸着保持用治具の上に基板を載置し、然る後、長穴と基板とで囲まれる空間を減圧する点をもって特徴付けられる。   Further, the above object can be achieved by a suction holding method according to the present invention. That is, this suction holding method is a method for holding the substrate by suction, and has a sticking surface that can be stuck only to the peripheral portion of the substrate, and a suction hole that is opened in the sticking surface. The method is characterized in that a substrate is placed on a jig, and thereafter, a space surrounded by the elongated hole and the substrate is decompressed.

上述のように、本発明に係る吸着保持方法によれば、本発明に係る吸着保持用治具及びこの治具を備えた吸着保持装置と同様に、長穴の周囲に対応する領域、すなわち基板の周縁部をその全周にわたって極力漏れなく吸着することが可能となる。よって、長穴を介して基板を吸着した際に基板の周縁部が浮き上がる事態を回避することでき、これにより成膜材料の裏面への回り込みを防止して、成膜対象となる側の表面のみに正確に成膜処理を施すことが可能となる。また、上述した治具を用いて基板を吸着した場合には、基板の裏面が長穴の幅方向両側で付着面に付着支持された状態となるので、基板の平面中央側の領域を付着支持しなくとも、基板を安定して保持することが可能となる。よって、基板の裏面(成膜対象ではない側の表面)の大部分が有効面となる種類の基板であっても、その表面品質に影響を及ぼすことなく安定して保持することが可能となる。さらに、本発明に係る吸着保持方法によれば、長穴を介して基板の周縁部を吸着保持した際、基板の周縁部は長穴の周囲に設けられた付着面に押付けられ、新たに生じた付着力によって固定される。そのため、例えば真空蒸着やスパッタリングなどの成膜処理を施す場合に、基板を治具と共に真空環境下においた場合であっても十分な保持力を維持することが可能となる。   As described above, according to the suction holding method according to the present invention, similarly to the suction holding jig according to the present invention and the suction holding device including the jig, the area corresponding to the periphery of the long hole, that is, the substrate Can be sucked as much as possible over the entire periphery without leakage. Therefore, it is possible to avoid a situation where the peripheral edge of the substrate is lifted when the substrate is sucked through the elongated hole, thereby preventing the film-forming material from wrapping around to the back surface, and preventing only the front surface on the side to be film-formed. It is possible to accurately perform a film forming process. In addition, when the substrate is sucked using the above-described jig, the back surface of the substrate is attached to and supported by the attaching surface on both sides in the width direction of the elongated hole. Without doing so, the substrate can be stably held. Therefore, even if the back surface of the substrate (the surface on the side that is not a film formation target) is the effective surface, the substrate can be stably held without affecting the surface quality. . Furthermore, according to the suction holding method according to the present invention, when the peripheral portion of the substrate is suction-held through the long hole, the peripheral portion of the substrate is pressed against the adhesion surface provided around the long hole, and the newly generated edge is formed. Is fixed by the adhesive force. Therefore, for example, when performing a film forming process such as vacuum deposition or sputtering, a sufficient holding force can be maintained even when the substrate is placed in a vacuum environment together with the jig.

また、本発明に係る吸着保持方法は、付着面が設けられる枠状部をさらに有する吸着保持用治具を用いて基板の吸着保持を行うものであってもよい。また、この場合、基板が付着面の上に載置された状態で、枠状部の内側の空間を減圧することなく、長穴と基板とで囲まれる空間のみを減圧するものであってもよい。   Further, the suction holding method according to the present invention may be such that the suction holding of the substrate is performed using a suction holding jig further having a frame portion provided with an attachment surface. Further, in this case, without depressurizing the space inside the frame-shaped portion in a state where the substrate is placed on the adhesion surface, even if only the space surrounded by the elongated hole and the substrate is depressurized. Good.

この場合も、上述した吸着保持装置と同様に、減圧すべき空間を長穴に係る空間のみに限定することで、基板の周縁部のみを確実に吸着保持することができる。また、枠状部の内側の空間を減圧せずにおくことで、基板がその平面中央側を治具側に窪ませる向きに過度に変形する事態を極力避けて、基板が付着面以外の部位と接触したり、過度な変形(曲げ変形)に起因した割れを生じる事態を可及的に回避することが可能となる。   Also in this case, similarly to the suction holding device described above, by limiting the space to be depressurized to only the space related to the elongated hole, only the peripheral portion of the substrate can be reliably held by suction. In addition, by keeping the space inside the frame-shaped portion without decompression, the situation where the substrate is excessively deformed in a direction in which the center of the plane is depressed toward the jig side is avoided as much as possible, and the portion of the substrate other than the adhesion surface is prevented. And the occurrence of cracks due to excessive deformation (bending deformation) can be avoided as much as possible.

また、上記構成に係る吸着保持方法は、例えばこの吸着保持方法で基板の周縁部を付着面に付着させた後、基板に所定の処理を施し、然る後、長穴と基板とで囲まれる空間と、枠状部の内側の空間の少なくとも一方を加圧することで基板を吸着保持用治具から剥がす、基板の処理方法として提供することも可能である。あるいは、上記吸着方法で基板の周縁部を付着面に付着させた後、基板に成膜処理を施し、然る後、長穴と基板とで囲まれる空間と、枠状部の内側の空間の少なくとも一方を加圧することで基板を吸着保持用治具から剥がす、基板の成膜方法として提供することも可能である。このようにすれば、基板に所定の処理、あるいは成膜処理を施すに際して、作業者が基板に外力を加えることなく当該基板を治具に保持し、かつ治具から引き剥がすことが可能となる。従って、上述の処理を基板に対して上述の処理を安全かつ簡便に実施することができる。また、その際の取扱い性も向上する。   Further, in the suction holding method according to the above configuration, for example, after the peripheral portion of the substrate is attached to the attachment surface by the suction holding method, a predetermined process is performed on the substrate, and thereafter, the substrate is surrounded by the elongated hole and the substrate. It is also possible to provide a method for treating a substrate, in which at least one of the space and the space inside the frame-shaped portion is pressurized to peel off the substrate from the suction holding jig. Alternatively, after the peripheral portion of the substrate is attached to the attachment surface by the above-described suction method, a film is formed on the substrate, and thereafter, the space surrounded by the elongated hole and the substrate and the space inside the frame-shaped portion are formed. It is also possible to provide a method for forming a substrate, in which at least one of the substrates is pressed to separate the substrate from the suction holding jig. With this configuration, when performing a predetermined process or a film forming process on the substrate, the operator can hold the substrate on the jig without applying an external force to the substrate and can peel the substrate off the jig. . Therefore, the above-mentioned processing can be performed safely and simply on the substrate. In addition, the handling at that time is also improved.

以上に述べたように、本発明によれば、成膜材料の回り込みを防ぎつつ、基板表面の広域に安定して成膜処理を施すことが可能となる。   As described above, according to the present invention, a film formation process can be stably performed over a wide area of a substrate surface while preventing a film formation material from flowing around.

本発明の第一実施形態に係る吸着保持用治具の平面図である。FIG. 2 is a plan view of the suction holding jig according to the first embodiment of the present invention. 図1に示す治具のA−A断面図である。It is AA sectional drawing of the jig shown in FIG. 図1に示す治具を備えた吸着保持装置の断面図である。FIG. 2 is a sectional view of a suction holding device provided with the jig shown in FIG. 1. ガラス基板を載置した状態における吸着保持装置の(a)断面図と、(b)要部を矢印Bの方向からみた平面図である。FIG. 3A is a cross-sectional view of the suction holding device in a state where a glass substrate is placed, and FIG. ガラス基板を吸着保持した後、吸着保持装置本体から取り外した状態の吸着保持用治具の断面図である。FIG. 4 is a cross-sectional view of the suction holding jig in a state where the glass substrate is suction-held and then removed from the suction holding device main body. 成膜処理を施したガラス基板を一体に保持した治具を取付けた状態の吸着保持装置の断面図である。FIG. 3 is a cross-sectional view of the suction holding device in a state where a jig that integrally holds a glass substrate on which a film forming process has been performed is attached. 本発明の第二実施形態に係る吸着保持用治具の平面図である。It is a top view of the jig for adsorption holding concerning a second embodiment of the present invention. 本発明の第三実施形態に係る吸着保持用治具の平面図である。It is a top view of the jig for adsorption holding concerning a third embodiment of the present invention. 本発明の第四実施形態に係る吸着保持用治具の要部拡大平面図である。It is a principal part enlarged plan view of the jig | tool for suction holding which concerns on 4th Embodiment of this invention. 本発明の第五実施形態に係る吸着保持用治具の要部拡大平面図である。It is a principal part enlarged plan view of the jig | tool for suction holding which concerns on 5th Embodiment of this invention. 本発明の第六実施形態に係る吸着保持用治具の断面図である。It is sectional drawing of the jig | tool for adsorption holding which concerns on 6th Embodiment of this invention. 本発明の第七実施形態に係る吸着保持装置の断面図である。It is a sectional view of a suction holding device concerning a 7th embodiment of the present invention. 本発明の第八実施形態に係る吸着保持装置の断面図である。It is a sectional view of a suction holding device concerning an 8th embodiment of the present invention.

以下、本発明の第一実施形態を、図1〜図6を参照して説明する。なお、以下の説明中、上方向は、吸着保持用治具に基板としてのガラス基板を保持した状態において、当該治具からみてその厚み方向のガラス基板側を上方向、ガラス基板からみてその厚み方向の上記治具側を下方向と規定するものとする。もちろん、これらの方向の規定は、上記治具及びこの治具を備えた吸着保持装置の設置態様や使用態様を制限するものではない。   Hereinafter, a first embodiment of the present invention will be described with reference to FIGS. In the following description, in the upward direction, in a state where the glass substrate as the substrate is held by the suction holding jig, the glass substrate side in the thickness direction when viewed from the jig is upward, and when viewed from the glass substrate, the thickness is The jig side in the direction is defined as a downward direction. Of course, the definition of these directions does not limit the installation mode or usage mode of the jig and the suction holding device provided with the jig.

図1及び図2に示すように、本発明の一実施形態に係る吸着保持用治具10は、略矩形状の枠状部11と、枠状部11の上側、すなわち吸着保持対象としてのガラス基板1(図4等を参照)を付着する側に設けられた付着部12と、枠状部11の下側に設けられた底板部13とを備える。   As shown in FIGS. 1 and 2, a suction holding jig 10 according to an embodiment of the present invention includes a substantially rectangular frame portion 11 and a glass upper portion of the frame portion 11, that is, a glass as a suction holding target. An attachment portion 12 is provided on the side to which the substrate 1 (see FIG. 4 and the like) is attached, and a bottom plate portion 13 is provided below the frame portion 11.

枠状部11は、本実施形態では、ガラス基板1の外縁に準じた形状をなしており、例えば矩形状のガラス基板1を吸着保持対象とする場合、枠状部11は、略矩形状(額縁形状)をなす。この場合、枠状部11の内縁形状と外縁形状は共に矩形である。   In the present embodiment, the frame-shaped portion 11 has a shape similar to the outer edge of the glass substrate 1. For example, when the rectangular glass substrate 1 is to be suction-held, the frame-shaped portion 11 has a substantially rectangular shape ( (Frame shape). In this case, both the inner edge shape and the outer edge shape of the frame portion 11 are rectangular.

付着部12は、ガラス基板1の成膜対象ではない側の表面、すなわち裏面2に付着可能な付着面14を有するもので、本実施形態では、層状をなす。また、この付着面14は、付着対象となるガラス基板1の裏面2の周縁部2aに準じた形状をなし、例えば本実施形態ではガラス基板1の外縁形状に倣って略矩形の外縁形状及び内縁形状(額縁形状)をなす。この際、付着面14の外縁をなす一方の長辺縁14a1から他方の長辺縁14a2までの幅寸法(第一幅寸法W1)は、ガラス基板1の短辺の長さ寸法以上に設定される。同様に、付着面14の外縁をなす一方の短辺縁14b1から他方の短辺縁14b2までの幅寸法(第二幅寸法W2)は、ガラス基板1の長辺の長さ寸法以上に設定される。本実施形態では、付着面14の第一幅寸法W1及び第二幅寸法W2は共に、ガラス基板1の短辺及び長辺の長さ寸法と一致する大きさに設定される(後述する図5を参照)。   The attachment portion 12 has an attachment surface 14 that can be attached to the front surface of the glass substrate 1 on the side that is not a film formation target, that is, the back surface 2, and has a layered shape in the present embodiment. The attachment surface 14 has a shape corresponding to the peripheral portion 2a of the back surface 2 of the glass substrate 1 to be attached. For example, in the present embodiment, a substantially rectangular outer edge shape and inner edge shape follow the outer edge shape of the glass substrate 1. It has a shape (frame shape). At this time, the width dimension (first width dimension W1) from one long side edge 14a1 forming the outer edge of the attachment surface 14 to the other long side edge 14a2 is set to be equal to or longer than the length dimension of the short side of the glass substrate 1. You. Similarly, the width dimension (second width dimension W2) from one short side edge 14b1 forming the outer edge of the attachment surface 14 to the other short side edge 14b2 is set to be equal to or longer than the length dimension of the long side of the glass substrate 1. You. In the present embodiment, both the first width dimension W1 and the second width dimension W2 of the adhesion surface 14 are set to the sizes that match the length dimensions of the short side and the long side of the glass substrate 1 (see FIG. See).

なお、付着面14に付着力を付与するための手段は特に限定されない。例えば熱硬化性樹脂を用いた接着など不可逆的な(破壊により付着状態を解消する類の)付着手段でない限りにおいて、任意の付着手段で付着面14及び付着部12を構成することが可能である。例えば、本実施形態では、付着部12を両面粘着テープで構成し、その一方の表面を枠状部11の上面11aに貼付け、他方の表面を付着面14としている。この場合、両面粘着テープのガラス基板1に対する付着力よりも、枠状部11に対する付着力のほうが大きいことが好ましい。使用可能な両面粘着テープの例として、紫外線の照射により粘着力が大幅に低下するUVテープや、粘着フッ素ゴム製の両面粘着テープを挙げることができる。また、その厚み寸法についても特に問わない。あるいは、図示は省略するが、付着部12にガラス板を用い、かつ付着面14となる表面を、付着対象となるガラス基板1の裏面2と直接密着(いわゆるガラス板同士のオプティカルコンタクト)で剥離可能に付着するようにしても構わない。この場合、付着面14となるガラス板の表面と、ガラス基板1の裏面2の双方を、適正な表面粗さに仕上げておくことが肝要である。   The means for imparting the adhesive force to the adhesive surface 14 is not particularly limited. For example, the attachment surface 14 and the attachment portion 12 can be configured by any attachment means, as long as the attachment means is not irreversible (such as an adhesive state is eliminated by destruction) such as adhesion using a thermosetting resin. . For example, in the present embodiment, the attachment portion 12 is formed of a double-sided adhesive tape, one surface of which is attached to the upper surface 11 a of the frame portion 11, and the other surface is the attachment surface 14. In this case, it is preferable that the adhesive force of the double-sided adhesive tape to the glass substrate 1 is larger than the adhesive force to the glass substrate 1. Examples of usable double-sided pressure-sensitive adhesive tapes include UV tapes whose adhesive strength is greatly reduced by irradiation with ultraviolet rays, and double-sided pressure-sensitive adhesive tapes made of pressure-sensitive adhesive fluororubber. The thickness dimension is not particularly limited. Alternatively, although not shown, a glass plate is used for the attachment portion 12, and the surface serving as the attachment surface 14 is peeled off by direct contact with the back surface 2 of the glass substrate 1 to be attached (so-called optical contact between the glass plates). They may be attached as much as possible. In this case, it is important that both the front surface of the glass plate serving as the attachment surface 14 and the back surface 2 of the glass substrate 1 be finished to an appropriate surface roughness.

底板部13は、全体として略矩形状をなすもので、本実施形態では枠状部11と一体的に設けられている。枠状部11の内側の空間15は、枠状部11の内側面11bと、底板部13の上面13aとで区画形成され、上方のみを開放した形態をなす。よって、ガラス基板1を付着面14の上に載置した状態では、枠状部11の内側の空間15は、ガラス基板1の裏面2と、枠状部11の内側面11b、及び底板部13の上面13aとで区画形成され、密閉された状態となる(後述する図4(a)を参照)。なお、底板部13は、本実施形態では、平面視した状態で、その周縁部を枠状部11から食み出させた形態をなしているが、必ずしもこの形態には限られない。後述する長穴16を貫通形成可能な限りにおいて、任意の形態を採ることが可能である。   The bottom plate portion 13 has a substantially rectangular shape as a whole, and is provided integrally with the frame portion 11 in the present embodiment. The space 15 inside the frame portion 11 is defined by the inner side surface 11b of the frame portion 11 and the upper surface 13a of the bottom plate portion 13, and has a form in which only the upper portion is opened. Therefore, when the glass substrate 1 is placed on the attachment surface 14, the space 15 inside the frame-shaped portion 11 is formed by the back surface 2 of the glass substrate 1, the inner side surface 11 b of the frame-shaped portion 11, and the bottom plate portion 13. And the upper surface 13a of the first member 13a, thereby forming a sealed state (see FIG. 4A described later). In the present embodiment, the bottom plate portion 13 has a configuration in which a peripheral portion protrudes from the frame-shaped portion 11 in a plan view, but is not necessarily limited to this configuration. An arbitrary form can be adopted as long as a long hole 16 to be described later can be formed through.

付着面14には、一又は複数の長穴16が開口して形成される(図1)。これら長穴16は何れも、付着面14の長手方向、すなわち吸着対象となるガラス基板1を付着面14の上に載置した状態でガラス基板1の周縁部2aに沿った向きに伸びる形状をなすもので、付着面14を有する付着部12と枠状部11、及び底板部13を貫通して形成される(図2)。本実施形態では、各長穴16は何れもその全周を付着面14で囲まれた形態をなしている。また、各長穴16は、その長手方向端部を半円状とした形状をなしている。   One or a plurality of long holes 16 are formed in the attachment surface 14 so as to open (FIG. 1). Each of these elongated holes 16 has a shape extending in the longitudinal direction of the attachment surface 14, that is, in a direction along the peripheral edge 2 a of the glass substrate 1 with the glass substrate 1 to be sucked placed on the attachment surface 14. It is formed so as to penetrate the attachment portion 12 having the attachment surface 14, the frame portion 11, and the bottom plate portion 13 (FIG. 2). In the present embodiment, each of the long holes 16 has a form in which the entire circumference is surrounded by the attachment surface 14. Each of the long holes 16 has a shape in which a longitudinal end portion is formed in a semicircular shape.

次に、上述の吸着保持用治具10を備えた吸着保持装置20の構成を図3に基づいて説明する。この吸着保持装置20は、上記構成の吸着保持用治具10と、吸着保持用治具10が設置される吸着保持装置本体21とで構成される。ここで、吸着保持装置本体21は、吸着保持用治具10が載置される基体部22と、接続部23を介して基体部22に接続される変圧装置24とを備える。   Next, a configuration of the suction holding device 20 including the suction holding jig 10 will be described with reference to FIG. The suction holding device 20 includes the suction holding jig 10 configured as described above, and a suction holding device main body 21 on which the suction holding jig 10 is installed. Here, the suction holding device main body 21 includes a base portion 22 on which the suction holding jig 10 is placed, and a voltage transforming device 24 connected to the base portion 22 via a connection portion 23.

また、基体部22の内側には凹部22aが設けられている。この凹部22aの内部空間は、基体部22の上に吸着保持用治具10を載置し、かつ吸着保持用治具10の付着面14の上にガラス基板1を載置した状態では、変圧装置24により変圧可能な変圧空間25として機能する(後述する図4(a)を参照)。この際、変圧空間25は、吸着保持用治具10に設けた長穴16と連通しており、かつ長穴16はガラス基板1によって塞がれているため、変圧装置24により変圧空間25内を変圧することで、この変圧空間25と連通する長穴16の内部空間、すなわち長穴16の内側面とガラス基板1の裏面2とで囲まれる空間も変圧空間25と同じように変圧される。   Further, a concave portion 22 a is provided inside the base portion 22. When the suction holding jig 10 is placed on the base portion 22 and the glass substrate 1 is placed on the attachment surface 14 of the suction holding jig 10, It functions as a transforming space 25 that can be transformed by the device 24 (see FIG. 4A described later). At this time, the variable pressure space 25 communicates with the long hole 16 provided in the suction holding jig 10, and the long hole 16 is closed by the glass substrate 1. , The internal space of the elongated hole 16 communicating with the transformed space 25, that is, the space surrounded by the inner surface of the elongated hole 16 and the back surface 2 of the glass substrate 1 is also transformed in the same manner as the transformed space 25. .

ここで、変圧装置24は、少なくとも変圧空間25を減圧可能とするもので、例えば真空減圧ポンプなど公知の減圧機構を採用することができる。また、本実施形態では、変圧装置24は、減圧及び加圧を切替え可能とするもので、後述するようにガラス基板1の吸着保持時には減圧装置として作動し、ガラス基板1の吸着解除(剥離)時には加圧装置として作動するようになっている。   Here, the transformer 24 is capable of reducing the pressure of at least the transforming space 25, and may employ a known decompression mechanism such as a vacuum decompression pump. Further, in the present embodiment, the pressure changing device 24 is capable of switching between decompression and pressurization, and operates as a decompression device when adsorbing and holding the glass substrate 1, as described later, and releases adsorption (peeling) of the glass substrate 1. Sometimes it operates as a pressurizing device.

次に、上記構成の吸着保持装置20を用いたガラス基板1の吸着保持態様の一例を主に図4〜図6に基づき説明する。   Next, an example of a suction holding mode of the glass substrate 1 using the suction holding device 20 having the above configuration will be described mainly with reference to FIGS.

まず、図3に示すように、吸着保持装置本体21の上に吸着保持用治具10を設置する。この際、変圧装置24による変圧(減圧あるいは後述する加圧)が可能な程度に、吸着保持用治具10の底板部13を基体部22の鍔部22bに図示しないねじ止め又はクランプ等の脱着可能な手段で固定しておく。然る後、図4(a)に示すように、吸着保持対象としてのガラス基板1を吸着保持用治具10の付着面14の上に載置する。この際、ガラス基板1の外縁が全て付着面14上にあるよう、その載置位置を設定する。本実施形態では、ガラス基板1の端部1aと、付着面14の外端部(ここでは四辺をなす長辺縁14a1,14a2、及び短辺縁14b1,14b2)とが全周で一致するよう、ガラス基板1を載置する。   First, as shown in FIG. 3, the suction holding jig 10 is set on the suction holding device main body 21. At this time, the bottom plate 13 of the suction holding jig 10 is attached to and detached from the flange 22b of the base 22 by a screw or a clamp (not shown) to such an extent that the pressure can be changed (reduced pressure or pressurized described later) by the pressure changing device 24. It is fixed by possible means. Thereafter, as shown in FIG. 4A, the glass substrate 1 to be suction-held is placed on the attachment surface 14 of the suction-holding jig 10. At this time, the mounting position is set such that the entire outer edge of the glass substrate 1 is on the attachment surface 14. In the present embodiment, the end 1a of the glass substrate 1 and the outer ends (here, the long sides 14a1 and 14a2 and the short sides 14b1 and 14b2, which form four sides) of the adhesion surface 14 are aligned over the entire circumference. Then, the glass substrate 1 is placed.

ここで、図4(b)に示すように、長穴16の幅方向寸法W3は、ガラス基板1に対する十分な吸着力を確保する観点と、ガラス基板1の裏面2の有効面積をできる限り大きくとる観点とを双方勘案して、例えば0.2mm以上でかつ10.0mm以下の範囲に設定され、好ましくは1.0mm以上でかつ5.0mm以下の範囲に設定される。   Here, as shown in FIG. 4 (b), the width dimension W3 of the elongated hole 16 is set such that the effective area of the back surface 2 of the glass substrate 1 is made as large as possible from the viewpoint of securing a sufficient suction force to the glass substrate 1. Taking both aspects into consideration, the distance is set, for example, in the range of 0.2 mm or more and 10.0 mm or less, preferably in the range of 1.0 mm or more and 5.0 mm or less.

また、長穴16の幅方向外側でガラス基板1の裏面2と付着可能な付着面14の幅方向寸法W41は、大きいほどガラス基板1に対する付着力の増加につながる。その一方で、長穴16を介して減圧することで生じる吸着力がガラス基板1に及ぶ範囲(長穴16の端部からの距離)にはある程度限界がある。以上の点を勘案して付着面14の幅方向寸法W41を設定するのがよく、例えば上限値を5.0mm以下、好ましくは3.0mm以下に設定するのがよい。また、下限値を1.0mm以上、好ましくは2.0mm以上に設定するのがよい。長穴16の幅方向寸法W3との大小関係でいえば、この長穴16の幅方向寸法W3よりも小さくなるよう、付着面14の幅方向寸法W41を設定するのがよい。長穴16の幅方向内側でガラス基板1の裏面2と付着可能な付着面14の幅方向寸法W42、及び長手方向で隣り合う長穴16,16間の付着面14の長手方向寸法W43についても、同レベルの範囲に設定するのがよい。   Further, the larger the width dimension W41 of the adhering surface 14 that can adhere to the back surface 2 of the glass substrate 1 outside the elongate hole 16 in the width direction, the larger the adhering force to the glass substrate 1 is. On the other hand, the range (distance from the end of the long hole 16) of the suction force generated by reducing the pressure through the long hole 16 has a certain limit. In consideration of the above points, it is preferable to set the width direction dimension W41 of the attachment surface 14, for example, the upper limit is set to 5.0 mm or less, preferably 3.0 mm or less. The lower limit is set to 1.0 mm or more, preferably 2.0 mm or more. In terms of the magnitude relationship with the width dimension W3 of the elongated hole 16, it is preferable to set the width dimension W41 of the attachment surface 14 so as to be smaller than the width dimension W3 of the elongated hole 16. The widthwise dimension W42 of the attachment surface 14 that can attach to the back surface 2 of the glass substrate 1 inside the slot 16 in the width direction and the longitudinal dimension W43 of the attachment surface 14 between the slots 16 adjacent in the longitudinal direction are also described. Should be set in the same level range.

以上のようにガラス基板1を付着面14の上に載置した状態で、変圧装置24を作動させ、基体部22の内側に形成される変圧空間25を減圧する。これにより、変圧空間25と連通する長穴16の内部空間、すなわち長穴16の内側面とガラス基板1の裏面2とに囲まれた空間が同様に減圧され、ガラス基板1の裏面2のうち長穴16を塞ぐ部位及びその周辺領域が所定の吸着力で吸着される。また、この吸着作用により、ガラス基板1の裏面2の周縁部2aが付着面14に押付けられて付着する。   With the glass substrate 1 placed on the attachment surface 14 as described above, the transformer 24 is operated to reduce the pressure in the transformer space 25 formed inside the base 22. As a result, the internal space of the elongated hole 16 communicating with the variable pressure space 25, that is, the space surrounded by the inner side surface of the elongated hole 16 and the back surface 2 of the glass substrate 1 is similarly depressurized. The part that blocks the long hole 16 and the surrounding area are sucked with a predetermined suction force. Further, the peripheral portion 2 a of the back surface 2 of the glass substrate 1 is pressed against and adheres to the adhesion surface 14 by the suction action.

このようにしてガラス基板1が付着面14に吸着及び付着することで吸着保持用治具10に保持された後、当該ガラス基板1を次工程となる成膜処理工程に搬送する。この際、ガラス基板1は吸着保持装置20と一体的に搬送してもよい。また、後述するスパッタリングなど減圧を必要とする成膜処理を施す場合には、吸着保持装置20ごと成膜装置のチャンバー内に入れることができないため、図5に示すように、ガラス基板1を吸着保持用治具10とのみ一体的に搬送することが好ましい。ガラス基板1の裏面2は付着面14に付着した状態にあるため、吸着保持装置20の変圧空間25の圧力を常圧に戻し、吸着保持用治具10を吸着保持装置本体21から取り外した状態にあっても、ガラス基板1は付着力で吸着保持用治具10と一体化された状態を維持し得る。よって、ガラス基板1を直接触れることなく容易に次工程に搬送し得る。   After the glass substrate 1 is held by the suction holding jig 10 by adsorbing and adhering to the adhering surface 14 in this manner, the glass substrate 1 is transported to the next film forming process. At this time, the glass substrate 1 may be transferred integrally with the suction holding device 20. In addition, when performing a film formation process that requires a reduced pressure such as sputtering, which will be described later, the suction and holding device 20 cannot be put into the chamber of the film formation device. Therefore, as shown in FIG. It is preferable to convey only the holding jig 10 integrally. Since the back surface 2 of the glass substrate 1 is attached to the attachment surface 14, the pressure in the variable pressure space 25 of the suction holding device 20 is returned to normal pressure, and the suction holding jig 10 is removed from the suction holding device main body 21. In this case, the glass substrate 1 can maintain a state of being integrated with the suction holding jig 10 by the adhesive force. Therefore, the glass substrate 1 can be easily transferred to the next step without directly touching the glass substrate.

次工程では、ガラス基板1の表面に例えばスパッタリングにより所定の成膜処理を施す。この後、吸着保持用治具10からガラス基板1を離脱する。本実施形態では、例えば図6に示すように、一方の表面3に薄膜4を成形したガラス基板1を一体に有する吸着保持用治具10を再び吸着保持装置本体21の上に載置し、上述した手段で固定する。然る後、変圧装置24を作動させ、基体部22の内側に形成される変圧空間25に高圧エアを送り込むことで、変圧空間25を加圧する。これにより、変圧空間25と連通する長穴16の内部空間、すなわち長穴16の内側面とガラス基板1の裏面2とに囲まれた空間が同様に加圧され、この加圧力によりガラス基板1が吸着保持用治具10の付着面14から離間する向きに押圧される。この加圧力(押圧力)が付着面14との付着力を上回ることで、ガラス基板1が付着面14から引き剥がされ、離脱が可能となる。   In the next step, a predetermined film forming process is performed on the surface of the glass substrate 1 by, for example, sputtering. Thereafter, the glass substrate 1 is separated from the suction holding jig 10. In the present embodiment, for example, as shown in FIG. 6, the suction holding jig 10 integrally including the glass substrate 1 having the thin film 4 formed on one surface 3 is placed on the suction holding device main body 21 again. It is fixed by the above-mentioned means. Thereafter, the variable pressure device 24 is operated, and high-pressure air is sent into a variable pressure space 25 formed inside the base portion 22 to pressurize the variable pressure space 25. Accordingly, the internal space of the elongated hole 16 communicating with the variable pressure space 25, that is, the space surrounded by the inner side surface of the elongated hole 16 and the back surface 2 of the glass substrate 1 is similarly pressurized. Is pressed away from the attachment surface 14 of the suction holding jig 10. When this pressing force (pressing force) exceeds the adhesive force with the adhering surface 14, the glass substrate 1 is peeled off from the adhering surface 14 and can be separated.

このように、本発明では、吸着保持用治具10に、ガラス基板1の裏面2の周縁部2aのみを付着可能な付着面14を設けると共に、この付着面14に開口するように吸着用の長穴16を形成した。このように構成した治具10であれば、長穴16の周囲に対応したガラス基板1の裏面2の周縁部2aのみをその全周にわたって極力漏れなく吸着することが可能となる。よって、長穴16を介してガラス基板1を吸着した際にその裏面2の周縁部2aに吸着力不足が生じる領域を極力なくして、周縁部2aの浮き上がりを回避することができる。従って、成膜材料の裏面2への回り込みを防止して、成膜対象となる側の表面3のみに正確に成膜処理を施すことが可能となる。もちろん、この治具10によれば、ガラス基板1の表面3に一切接触することなく裏面2のみを吸着及び付着して保持することができるので、成膜対象側の表面3の全域にわたって薄膜4を形成することが可能となる。   As described above, in the present invention, the attachment / holding jig 10 is provided with the attachment surface 14 to which only the peripheral portion 2 a of the back surface 2 of the glass substrate 1 can be attached, and the suction / holding jig 10 is opened to the attachment surface 14. A long hole 16 was formed. With the jig 10 configured as described above, it is possible to adsorb only the peripheral portion 2a of the back surface 2 of the glass substrate 1 corresponding to the periphery of the long hole 16 as much as possible over the entire circumference. Therefore, when the glass substrate 1 is sucked through the elongated hole 16, an area where the suction force is insufficient on the peripheral portion 2 a of the rear surface 2 is minimized, and the rising of the peripheral portion 2 a can be avoided. Therefore, it is possible to prevent the film-forming material from sneaking into the back surface 2 and accurately perform the film-forming process only on the front surface 3 on the side to be formed. Of course, according to this jig 10, only the back surface 2 can be attracted and adhered and held without any contact with the front surface 3 of the glass substrate 1, so that the thin film 4 Can be formed.

特に、本実施形態では、長穴16の全周を囲うように付着面14を設けるようにしたので、減圧による吸着力が漏れなく長穴の周囲においてガラス基板1の裏面2に作用する、よって、長穴16に対応するガラス基板1の裏面2の周縁部2aをその全域にわたってより一層強固に付着面14に付着させることが可能となる。   In particular, in the present embodiment, since the attachment surface 14 is provided so as to surround the entire circumference of the long hole 16, the suction force due to the reduced pressure acts on the back surface 2 of the glass substrate 1 around the long hole without leakage. The peripheral portion 2a of the back surface 2 of the glass substrate 1 corresponding to the elongated hole 16 can be more firmly attached to the attachment surface 14 over the entire area.

また、本発明では、付着面14に開口して吸着用の長穴16を設けたので、長穴16の幅方向両側には常に付着面14が配設された状態となる。そのため、この吸着保持用治具10を用いてガラス基板1を吸着した場合には、ガラス基板1の裏面2が長穴16の幅方向両側で付着面14に付着支持された状態となるので、枠状部11の内側の空間、すなわち、ガラス基板1の平面中央側の領域を付着支持しなくとも、ガラス基板1を安定して保持することが可能となる。よって、ガラス基板1の裏面2の大部分が有効面となる種類のガラス基板1であっても、その表面品質に影響を及ぼすことなく安定して保持することが可能となる。   Further, in the present invention, since the long holes 16 for suction are provided in the opening on the adhering surface 14, the adhering surfaces 14 are always provided on both sides in the width direction of the long hole 16. Therefore, when the glass substrate 1 is sucked using the suction holding jig 10, the back surface 2 of the glass substrate 1 is attached and supported on the attaching surface 14 on both sides in the width direction of the elongated hole 16. The glass substrate 1 can be stably held without adhering and supporting the space inside the frame-shaped portion 11, that is, the region on the center side of the plane of the glass substrate 1. Therefore, even if the glass substrate 1 is of a type in which most of the back surface 2 of the glass substrate 1 is an effective surface, the glass substrate 1 can be stably held without affecting the surface quality.

また、上記実施形態に係る吸着保持装置20によれば、ガラス基板1の平面中央側の領域を吸着することなく、その周縁部2aのみを吸着保持できる。そのため、例えばガラス基板1の平面中央側に穴などが設けられている場合でも、穴に関係のない箇所(周縁部2a)のみでガラス基板1を正規の位置にかつ端部の浮き上がりなく保持することができる。よって、汎用性にも優れている。   Further, according to the suction holding device 20 according to the above-described embodiment, only the peripheral edge portion 2a can be sucked and held without sucking the area on the center side of the plane of the glass substrate 1. Therefore, for example, even when a hole or the like is provided in the center of the plane of the glass substrate 1, the glass substrate 1 is held at a regular position only at a portion (peripheral portion 2 a) irrelevant to the hole and the end portion is not lifted. be able to. Therefore, it is excellent in versatility.

また、本発明では、吸着保持用治具10に設けた長穴16の周囲において吸着支持すべき面を付着面14としたので、長穴16を介してガラス基板1の周縁部2aを吸着保持した際、ガラス基板1の周縁部2aは長穴16の周囲に設けられた付着面14に押付けられ、新たに生じた付着力によって固定される。そのため、上述のようにスパッタリングで成膜処理を施す場合に、ガラス基板1を吸着保持用治具10と共に真空環境下においた場合であっても十分な保持力を維持することが可能となる。   In the present invention, the surface to be suction-supported around the long hole 16 provided in the suction holding jig 10 is the attachment surface 14, so that the peripheral portion 2 a of the glass substrate 1 is suction-held through the long hole 16. At this time, the peripheral portion 2a of the glass substrate 1 is pressed against the attachment surface 14 provided around the elongated hole 16 and is fixed by the newly generated attachment force. Therefore, when the film formation process is performed by sputtering as described above, a sufficient holding force can be maintained even when the glass substrate 1 is placed in a vacuum environment together with the suction holding jig 10.

また、本実施形態のように、吸着保持用治具10を吸着保持装置本体21に対して脱着自在に構成することで、ガラス基板1を吸着保持した後、ガラス基板1を吸着保持用治具10とのみ一体化させた状態で、成膜処理工程に搬送し、搬出することができる。よって、成膜処理の前後にわたるガラス基板1の取扱い性を向上させることが可能となる。また、ガラス基板1のサイズが変わっても、吸着保持用治具10を当該ガラス基板1の変更後のサイズに対応したものに変更するだけで、吸着保持装置本体21を使い回すことができる(汎用性をもたせることができるため)好適である。   Further, as in the present embodiment, the suction holding jig 10 is configured to be detachable from the suction holding device main body 21 so that the glass substrate 1 is sucked and held, and then the glass substrate 1 is sucked and held. In a state of being integrated with only 10, it can be transported to the film forming process and carried out. Therefore, it is possible to improve the handleability of the glass substrate 1 before and after the film forming process. Further, even if the size of the glass substrate 1 changes, the suction holding device main body 21 can be reused only by changing the suction holding jig 10 to one corresponding to the changed size of the glass substrate 1 ( This is preferable because it can have versatility).

以上、本発明の第一実施形態を説明したが、本発明に係る吸着保持用治具10とこの治具10を備えた吸着保持装置20、この治具10を用いた吸着保持方法、基板の処理方法、及び基板の成膜方法は、当然に本発明の範囲内において任意の形態を採ることができる。   Although the first embodiment of the present invention has been described above, the suction holding jig 10 according to the present invention, the suction holding device 20 including the jig 10, the suction holding method using the jig 10, the The processing method and the substrate film formation method can of course take any form within the scope of the present invention.

例えば、上記実施形態(第一実施形態)では、枠状部11及び付着面14として、ガラス基板1の周縁部2aをその全周にわたって付着可能な構成としたが、もちろんこの構成には限られない。図7はその一例(本発明の第二実施形態)を示すもので、本実施形態に係る枠状部11及び付着面14は、完全に閉じた枠状(環状につながった形状)をなすものではなく、その一部を開いた枠状をなす。このように構成することで、例えば図示は省略するが、周縁部2aに穴などを有するガラス基板1であっても、本発明に係る吸着保持用治具10及び吸着保持方法を適用することができる。また、この際、枠状部11及び付着面14の開放部17は、例えば図示のように底板部13の上面13aに設けたブロック18により塞ぐのがよい。このようにすることで、図示は省略するが、ガラス基板1を付着面14上に載置した状態で、枠状部11の内側の空間15をブロック18により塞ぐことができ、開放部17を介した成膜材料の裏面2への回り込みを防止することができる。   For example, in the above-described embodiment (first embodiment), the frame portion 11 and the attachment surface 14 are configured such that the peripheral portion 2a of the glass substrate 1 can be attached over the entire circumference. Absent. FIG. 7 shows an example (a second embodiment of the present invention), in which the frame-shaped portion 11 and the attachment surface 14 according to the present embodiment form a completely closed frame-like (ring-shaped connected shape). Instead, it forms a frame with an open part. With this configuration, for example, although not shown, the suction holding jig 10 and the suction holding method according to the present invention can be applied to the glass substrate 1 having a hole or the like in the peripheral portion 2a. it can. At this time, the open portion 17 of the frame portion 11 and the attachment surface 14 is preferably closed by a block 18 provided on the upper surface 13a of the bottom plate portion 13 as shown in the drawing. By doing so, although not shown, the space 15 inside the frame-shaped portion 11 can be closed by the block 18 while the glass substrate 1 is placed on the attachment surface 14, and the open portion 17 can be closed. It is possible to prevent the film-forming material from wrapping around to the back surface 2.

また、長穴16の寸法(幅方向寸法、長手方向寸法)に関し、上記実施形態では、全ての長穴16が同一の寸法である場合を例示したが、もちろん、互いに寸法の異なる複数の長穴を付着面14に開口して形成することも可能である。図8はその一例(本発明の第三実施形態)を示すもので、同図に示す吸着保持用治具10は、図1に示す長手方向寸法の長穴16と、これら複数の長穴16を連結した形状をなし、長穴16よりも長手方向寸法の大きい第一連結長穴16aと、第二連結長穴16bとを備える。このように、長穴の形成態様を工夫することで、ガラス基板1をその種類に応じて好適に吸着保持することが可能となる。   Further, with respect to the dimensions of the elongated holes 16 (the width direction dimensions and the longitudinal dimension dimensions), in the above-described embodiment, the case where all the elongated holes 16 have the same dimensions has been exemplified. It is also possible to form an opening on the attachment surface 14. FIG. 8 shows an example (third embodiment of the present invention). A suction holding jig 10 shown in FIG. 8 includes a long hole 16 shown in FIG. And has a first connection long hole 16a and a second connection long hole 16b whose longitudinal dimension is larger than the long hole 16. In this way, by devising the manner of forming the long holes, it becomes possible to appropriately hold the glass substrate 1 by suction in accordance with the type thereof.

また、長穴16の形状に関し、上記実施形態ではその幅方向寸法を一定にしたものを例示したが、もちろんこれ以外の構成を採ることも可能である。図9はその一例(本発明の第四実施形態)を示すもので、同図に示す長穴16,16aは、そのコーナー部において幅方向寸法を広げた(図示例では円孤状の膨出部16cを設けた)形状をなしている。これにより、他の部分に比べて長穴16,16a,16bからの距離が大きくなりやすい付着面14のコーナー部においても十分な吸着性をもたせることが可能となる。   Further, with respect to the shape of the elongated hole 16, in the above-described embodiment, an example in which the dimension in the width direction is fixed has been exemplified, but it is needless to say that other configurations can be adopted. FIG. 9 shows an example (fourth embodiment of the present invention). The elongated holes 16 and 16a shown in FIG. (The portion 16c is provided). Thus, it is possible to provide a sufficient adsorbing property even at the corner portion of the attachment surface 14 where the distance from the elongated holes 16, 16a, 16b tends to be larger than other portions.

また、長穴16の端部形状に関し、上記実施形態では、長穴16の長手方向端部が半円状をなすものを例示したが、もちろんこれ以外の端部形状をなす長穴16を付着面14に開口して形成しても構わない。図10はその一例(本発明の第五実施形態)を示すもので、同図に示す長穴16は、その長手方向端部16dを角状としている。   Further, with respect to the end shape of the long hole 16, in the above-described embodiment, the long end of the long hole 16 is illustrated as having a semicircular shape. The opening may be formed on the surface 14. FIG. 10 shows an example (fifth embodiment of the present invention). The long hole 16 shown in FIG. 10 has a rectangular end 16d in the longitudinal direction.

また、長穴16の数に関しても任意であり、1個又は複数個の長穴16を付着面14に開口して形成しても構わない。なお、長穴16を1個設ける場合、図示は省略するが、略矩形の枠状に形成された付着面14の全周にわたって当該長穴16を設けると共に、底板部13にはその一部が途切れた(要は長穴16の幅方向外側と内側とで底板部13が少なくとも一部でつながった)長穴16を貫通形成する構成が可能である。   Further, the number of the long holes 16 is arbitrary, and one or a plurality of long holes 16 may be formed in the attachment surface 14 by opening. In the case where one long hole 16 is provided, although not shown, the long hole 16 is provided over the entire circumference of the attachment surface 14 formed in a substantially rectangular frame shape, and a part of the long hole 16 is formed in the bottom plate portion 13. A configuration in which the elongated hole 16 that is interrupted (that is, the bottom plate portion 13 is connected at least partially at the outer side and the inner side in the width direction of the elongated hole 16) is possible.

また、上記実施形態では、吸着保持用治具10として、枠状部11と、付着部12(付着面14)と、底板部13とを一体的に有するものを例示したが、もちろん、これ以外の構成をとることも可能である。図11はその一例(本発明の第六実施形態)を示すもので、同図に示す吸着保持用治具10は、枠状部11と、付着部12と、底板部13とに加えて、スペーサ19をさらに有する。スペーサ19は第一実施形態に示す形態よりも幅方向外側に延長した付着面14に付着されており、付着面14上に載置したガラス基板1の外周を囲うような形状及び寸法をなしている。この構成によれば、ガラス基板1を確実に付着面14上の所定位置に載置することができるので、所期の吸着作用をガラス基板1の周縁部2aに及ぼして、ガラス基板1を確実に吸着保持することが可能となる。   In the above-described embodiment, the suction holding jig 10 has a frame-shaped portion 11, an attachment portion 12 (attachment surface 14), and a bottom plate portion 13, which are integrated. It is also possible to take the configuration of FIG. 11 shows an example (sixth embodiment of the present invention). The suction holding jig 10 shown in FIG. 11 includes a frame-shaped portion 11, an attachment portion 12, and a bottom plate portion 13, It further has a spacer 19. The spacer 19 is attached to the attachment surface 14 extending outward in the width direction from the form shown in the first embodiment, and has a shape and dimensions surrounding the outer periphery of the glass substrate 1 placed on the attachment surface 14. I have. According to this configuration, the glass substrate 1 can be reliably placed at a predetermined position on the attachment surface 14, so that the desired suction action is exerted on the peripheral portion 2a of the glass substrate 1 and the glass substrate 1 is securely held. Can be held by suction.

また、底板部13は必ずしも枠状部11と一体的に設ける必要はなく、例えば吸着保持装置本体21の上部に取付けるようにしてもよく、あるいは枠状部11を直接、吸着保持装置本体21(の基体部22)に取付け可能であるならば、底板部13自体を省略することも可能である。   Further, the bottom plate portion 13 does not necessarily need to be provided integrally with the frame-shaped portion 11, and may be attached to, for example, the upper portion of the suction-holding device main body 21, or the frame-shaped portion 11 may be directly attached to the suction-holding device main body 21 ( If it can be attached to the base portion 22), the bottom plate portion 13 itself can be omitted.

また、上記実施形態では、吸着保持用治具10が、枠状部11と、枠状部11に設けられた付着面14と、付着面14に開口して形成された長穴16とを有するものを例示したが、枠状部11は必須の構成要素ではない。付着面14が設けられる限りにおいて上記治具10のベースをなす部分(ベース部)の形状は枠状には限定されず、種々の形態を採ることが可能である。   Further, in the above embodiment, the suction holding jig 10 has the frame portion 11, the attachment surface 14 provided on the frame portion 11, and the elongated hole 16 formed in the attachment surface 14. However, the frame 11 is not an essential component. As long as the attachment surface 14 is provided, the shape of the base (base portion) of the jig 10 is not limited to a frame shape, and can take various forms.

また、上記実施形態では、ガラス基板1の裏面2の平面中央側の領域に、何らの部材も接触しない構成を例示したが、ガラス基板1のサイズ(厚み寸法、辺寸法など)によっては、自重によるたわみを抑える目的で、裏面2の平面中央側の領域を局所的に支持する構成を追加しても構わない。例えば図示は省略するが、底板部13から立設した支持部で裏面2の平面中央側の領域を局所的に支持することも可能である。ただし、ガラス基板1の平面中央側の領域は表面3と裏面2とに関わらず有効面として機能する場合が多いため、裏面2との接触面(支持部の端面)には付着面14を設けずにおくのが好ましい。   Further, in the above-described embodiment, a configuration in which no member is in contact with the area on the center side of the back surface 2 of the glass substrate 1 in the plane is illustrated. However, depending on the size (thickness dimension, side dimension, and the like) of the glass substrate 1, its own weight is reduced. A configuration may be added to locally support the region on the center side of the rear surface 2 in the plane for the purpose of suppressing the bending due to the above. For example, although not shown, it is also possible to locally support the region on the center side of the rear surface 2 in the plane with the support portion erected from the bottom plate portion 13. However, the region on the center side of the plane of the glass substrate 1 often functions as an effective surface irrespective of the front surface 3 and the back surface 2. Therefore, the adhesion surface 14 is provided on the contact surface with the back surface 2 (end surface of the support portion). It is preferable to keep it.

また、上記実施形態では、吸着保持用治具10と共に吸着保持装置20を構成する吸着保持装置本体21として、1個の変圧装置24と1個の変圧空間25を設けて、保持時と離脱時とで変圧空間25の減圧と加圧とを使い分ける場合を例示したが、もちろんこれ以外の脱着態様をとることも可能である。図12はその一例(本発明の第七実施形態)を示すもので、同図に示す吸着保持装置20は、変圧装置24とこれに対応する変圧空間25に加えて、加圧装置28とこれに対応する加圧空間29とをさらに備える。詳述すると、基体部22の凹部22aには、凹部22aの内部空間を減圧用と加圧用とに仕切るための仕切り壁26が設けられており、仕切り壁26で仕切られた内側の空間に接続部27を介して加圧装置28が接続されている。そのため、図11に示すように、基体部22の上に吸着保持用治具10を載置し、かつ吸着保持用治具10の付着面14の上にガラス基板1を載置した状態では、仕切り壁26で仕切られた凹部22aの内側の空間は、加圧装置28により加圧可能な加圧空間29として機能する。   Further, in the above embodiment, as the suction holding device main body 21 constituting the suction holding device 20 together with the suction holding jig 10, one pressure transforming device 24 and one pressure transforming space 25 are provided, Although the case where pressure reduction and pressurization of the variable pressure space 25 are selectively used is described above, it is needless to say that other desorption modes can be adopted. FIG. 12 shows an example (seventh embodiment of the present invention). The suction holding device 20 shown in FIG. 12 includes a pressure device 28 and a pressure device 28 in addition to a pressure device 24 and a corresponding pressure space 25. And a pressurized space 29 corresponding to. More specifically, in the concave portion 22a of the base portion 22, a partition wall 26 is provided for partitioning the internal space of the concave portion 22a for pressure reduction and pressure application, and is connected to the inner space partitioned by the partition wall 26. A pressurizing device 28 is connected via the section 27. Therefore, as shown in FIG. 11, in a state where the suction holding jig 10 is mounted on the base portion 22 and the glass substrate 1 is mounted on the attachment surface 14 of the suction holding jig 10, The space inside the concave portion 22 a partitioned by the partition wall 26 functions as a pressurizing space 29 that can be pressurized by the pressurizing device 28.

また、底板部13には、枠状部11の内側の空間15と、仕切り壁26で仕切られた凹部22aの内側の空間とを連通するための連通穴30が設けられている。これにより、図12に示す状態で加圧装置28を作動させ、加圧空間29を加圧することで、この加圧空間29と連通する枠状部11の内側の空間15も加圧空間29と同じように加圧される。ここで、枠状部11の内側の空間15は、ガラス基板1の裏面2の周縁部2aを除く平面中央側の領域で塞がれているため、この空間15を加圧することにより、ガラス基板1の平面中央側の領域を押し上げる向きに押圧することができる。このように、枠状部11の内側の空間15であれば、長穴16に比べてガラス基板1の裏面2に接する面積(押圧する面積)を容易に大きく取ることができるので、それほど高出力の加圧装置28を用いずとも付着面14からの剥離に十分な大きさの加圧力をガラス基板1に付与することが可能となる。もちろん、本実施形態でいえば、加圧装置28に加えて、変圧装置24を加圧用に用いることで、ガラス基板1をその周縁部2a(長穴16に臨む領域)と、付着面14に付着していない平面中央側の領域(枠状部11の内側の空間15に臨む領域)とを双方押し上げることができるため、好適である。   The bottom plate portion 13 is provided with a communication hole 30 for communicating the space 15 inside the frame-shaped portion 11 and the space inside the concave portion 22a partitioned by the partition wall 26. By operating the pressurizing device 28 in the state shown in FIG. 12 to pressurize the pressurizing space 29, the space 15 inside the frame-shaped portion 11 communicating with the pressurizing space 29 is also connected to the pressurizing space 29. Pressurized in the same way. Here, since the space 15 inside the frame-shaped portion 11 is closed by a region on the center side of the plane except for the peripheral portion 2 a of the back surface 2 of the glass substrate 1, by pressing this space 15, 1 can be pressed in a direction to push up the area on the center side of the plane. As described above, in the space 15 inside the frame-shaped portion 11, the area in contact with the back surface 2 of the glass substrate 1 (the area to be pressed) can be easily increased as compared with the long hole 16, so that the output is so high. Without using the pressurizing device 28, it is possible to apply a pressing force to the glass substrate 1 that is large enough to separate from the adhesion surface 14. Of course, in the present embodiment, in addition to the pressurizing device 28, by using the transformer 24 for pressurizing, the glass substrate 1 is attached to the peripheral portion 2 a (the region facing the elongated hole 16) and the adhering surface 14. This is preferable because both the region on the center side of the plane (the region facing the space 15 inside the frame-shaped portion 11) that is not attached can be pushed up.

もちろん、1個の変圧装置24と変圧空間25のみでガラス基板1の吸着及びその剥離を行う場合にあっては、例えば以下の如き弁構造を採ることも可能である。図13はその一例(本発明の第八実施形態)に係る吸着保持装置20を示している。この吸着保持装置20は、変圧空間25内に、変圧装置24の変圧作用に伴い閉弁動作と開弁動作とを切り替える弁装置31を有するもので、この弁装置31は、例えば球状をなす弁体32と、この弁体32と当接することで、弁装置31の内部空間33と変圧空間25とを遮断する座面34と、弁体32の上方(内部空間33外)への移動を規制する規制面35と、内部空間33と枠状部11の内側の空間15とを連通する連通口36とを有する。   Of course, when the glass substrate 1 is adsorbed and peeled off only by the single transformer 24 and the transformer space 25, for example, the following valve structure can be adopted. FIG. 13 shows a suction holding device 20 according to an example (eighth embodiment of the present invention). The suction holding device 20 has a valve device 31 in a variable pressure space 25 for switching between a valve closing operation and a valve opening operation in accordance with a pressure changing operation of the variable pressure device 24. The valve device 31 is, for example, a spherical valve. By contacting the body 32 and the valve body 32, the seat surface 34 that blocks the internal space 33 of the valve device 31 and the variable pressure space 25 and the upward movement of the valve body 32 (outside the internal space 33) are restricted. And a communication port 36 that communicates the internal space 33 with the space 15 inside the frame-shaped portion 11.

上記構成の弁装置31を有する吸着保持装置20によれば、変圧装置24を作動させて、変圧空間25を減圧した際、変圧空間25とつながる弁装置31の内部空間33が減圧され、弁体32が吸引により座面34と当接する。これにより弁装置31の内部空間33が変圧空間25と遮断されるので、この内部空間33と連通する枠状部11の内側の空間15が減圧される事態を避けて、変圧空間25と連通する長穴16の内部空間、すなわち長穴16の内側面とガラス基板1の裏面2とに囲まれた空間のみを減圧することができる。一方で、変圧装置24を作動させて、変圧空間25を加圧した際には、この加圧が、座面34と当接した状態の弁体32を押し込む向きに作用する。よって、この押込み作用により弁体32が座面34から離れることで、変圧空間25とつながった内部空間33が加圧され、かつ内部空間33と連通する枠状部11の内側の空間15が加圧される。また、この際、変圧空間25と連通する長穴16の内部空間も同様に加圧されるので、ガラス基板1をその周縁部2a(長穴16に臨む領域)と、付着面14に付着していない平面中央側の領域(枠状部11の内側の空間15に臨む領域)とを双方押し上げることが可能となる。以上より、本実施形態に係る吸着保持装置20によれば、1個の変圧装置24のみでもって、ガラス基板1の裏面2の周縁部2aのみを吸着保持しつつも、裏面2を極力広範囲にわたって押し上げることが可能となる。   According to the suction holding device 20 having the valve device 31 having the above configuration, when the variable pressure device 24 is operated to reduce the pressure in the variable pressure space 25, the internal space 33 of the valve device 31 connected to the variable pressure space 25 is reduced in pressure, and 32 comes into contact with the seat surface 34 by suction. As a result, the internal space 33 of the valve device 31 is shut off from the variable pressure space 25, so that the space 15 inside the frame 11 communicating with the internal space 33 is prevented from being depressurized, and communicates with the variable pressure space 25. It is possible to reduce the pressure only in the internal space of the elongated hole 16, that is, the space surrounded by the inner side surface of the elongated hole 16 and the back surface 2 of the glass substrate 1. On the other hand, when the transformer 24 is operated to pressurize the transformer space 25, the pressurization acts in a direction to push the valve body 32 in contact with the seat surface 34. Therefore, the valve body 32 is separated from the seat surface 34 by the pushing action, so that the internal space 33 connected to the variable pressure space 25 is pressurized, and the space 15 inside the frame-shaped portion 11 communicating with the internal space 33 is added. Pressed. At this time, the internal space of the elongated hole 16 communicating with the variable pressure space 25 is also pressurized, so that the glass substrate 1 is attached to the peripheral portion 2 a (the area facing the elongated hole 16) and the attachment surface 14. It is possible to push up both the region on the center side of the plane (the region facing the space 15 inside the frame-shaped portion 11). As described above, according to the suction holding device 20 according to the present embodiment, the back surface 2 is spread over a wide range as much as possible while holding only the peripheral portion 2a of the back surface 2 of the glass substrate 1 with only one transformer 24. It becomes possible to push up.

なお、以上の説明では、ガラス基板1を吸着保持対象とした場合を例示したが、もちろんこれ以外の板状体であって、その一方の表面に成膜処理を施すもの(基板)であれば、ガラス基板1に限らず本発明を適用することが可能である。   In the above description, the case where the glass substrate 1 is set as the suction holding object is exemplified. However, it is needless to say that any other plate-like body (substrate) on which one surface is subjected to a film forming process may be used. The present invention is not limited to the glass substrate 1, and the present invention can be applied.

また、以上の説明では、ガラス基板1に成膜処理を施す場合を例示したが、もちろん成膜処理以外の処理を施す場合であっても、本発明に係る吸着保持用治具とこれを備えた吸着保持装置、吸着保持方法、基板の処理方法を適用することは可能である。   In the above description, the case where the glass substrate 1 is subjected to the film forming process is exemplified. However, even if the process other than the film forming process is performed, the suction holding jig according to the present invention and the It is possible to apply a suction holding device, a suction holding method, and a substrate processing method.

1 ガラス基板
2 裏面
2a 周縁部
3 表面
4 薄膜
10 吸着保持用治具
11 枠状部
12 付着部
13 底板部
14 付着面
15 枠状部の内側の空間
16 長穴
17 開放部
18 ブロック
19 スペーサ
20 吸着保持装置
21 吸着保持装置本体
22 基体部
22a 凹部
23,27 接続部
24 変圧装置
25 変圧空間
26 仕切り壁
28 加圧装置
29 加圧空間
30 連通穴
31 弁装置
32 弁体
33 内部空間
34 座面
REFERENCE SIGNS LIST 1 glass substrate 2 back surface 2a peripheral portion 3 front surface 4 thin film 10 suction holding jig 11 frame portion 12 attachment portion 13 bottom plate portion 14 attachment surface 15 space inside frame portion 16 elongated hole 17 opening portion 18 block 19 spacer 20 Suction and holding device 21 Suction and holding device main body 22 Base portions 22a Recesses 23 and 27 Connecting portion 24 Transformer 25 Transformation space 26 Partition wall 28 Pressurizing device 29 Pressurizing space 30 Communication hole 31 Valve device 32 Valve element 33 Internal space 34 Seat surface

Claims (2)

基板に吸着力を付与して前記基板を吸着保持し、前記基板に所定の処理を施す基板の処理方法であって、
前記基板との接触により前記基板の周縁部のみに付着力を付与する付着面と、前記付着面に開口する吸着用の長穴と、前記付着面が設けられる枠状部とを備えた吸着保持用治具の前記付着面の上に前記基板を載置した状態で
前記枠状部の内側の空間を減圧することなく前記長穴と前記基板とで囲まれる空間のみを減圧することによって前記基板の周縁部を前記付着面に付着させると共に前記基板に前記吸着力を付与して前記基板を吸着保持した後、
前記吸着保持用治具を備える吸着保持装置の本体から前記吸着保持用治具を取り外し、前記基板に所定の処理を施した後、
前記長穴と前記基板とで囲まれる空間と、前記枠状部の内側の空間の少なくとも一方を加圧することで前記基板を前記吸着保持用治具から剥がす基板の処理方法。
A substrate processing method for applying a suction force to a substrate, holding the substrate by suction , and performing a predetermined process on the substrate ,
And attachment surface for imparting a biasing adhesive force only to the periphery of the substrate by contact with the substrate, and long holes for suction opening to the attachment surface, suction holding of the attachment surface is provided with a frame portion provided In a state where the substrate is placed on the attachment surface of the jig,
By only space vacuo surrounded by the substrate and the slot without depressurizing the inside space of the frame-like portion, the suction force a peripheral portion of the substrate to the substrate with adhered to the attachment surface After applying and holding the substrate by suction,
After removing the suction holding jig from the main body of the suction holding device including the suction holding jig and performing a predetermined process on the substrate,
A method of processing a substrate, wherein at least one of a space surrounded by the elongated hole and the substrate and a space inside the frame-shaped portion is pressed to separate the substrate from the suction holding jig .
基板に吸着力を付与して前記基板を吸着保持し、前記基板に成膜処理を施す基板の成膜方法であって、
前記基板との接触により前記基板の周縁部のみに付着力を付与する付着面と、前記付着面に開口する吸着用の長穴と、前記付着面が設けられる枠状部とを備えた吸着保持用治具の前記付着面の上に前記基板を載置した状態で、
前記枠状部の内側の空間を減圧することなく前記長穴と前記基板とで囲まれる空間のみを減圧することによって、前記基板の周縁部を前記付着面に付着させると共に前記基板に前記吸着力を付与して前記基板を吸着保持した後、
前記吸着保持用治具を備えた吸着保持装置の本体から前記吸着保持用治具を取り外し、前記基板に成膜処理を施し後、
前記長穴と前記基板とで囲まれる空間と、前記枠状部の内側の空間の少なくとも一方を加圧することで前記基板を前記吸着保持用治具から剥がす、基板の成膜方法。
A method of forming a substrate by applying a suction force to the substrate, holding the substrate by suction, and performing a film forming process on the substrate,
Suction holding having an attachment surface that gives an adhesion force only to a peripheral portion of the substrate by contact with the substrate, a long slot for suction opening to the attachment surface, and a frame portion provided with the attachment surface In a state where the substrate is placed on the attachment surface of the jig,
By only space vacuo surrounded by the substrate and the slot without depressurizing the inside space of the frame-like portion, said suction a peripheral portion of the substrate to Rutotomoni the substrate is attached to the attachment surface After applying force to hold the substrate by suction ,
Remove the suction holding jig from the body of the suction holding device equipped with the suction holding jig, was subjected to film formation process on the substrate,
A substrate film forming method, wherein at least one of a space surrounded by the elongated hole and the substrate and a space inside the frame-shaped portion is pressed to peel the substrate from the suction holding jig.
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