JP6625044B2 - 半導体装置およびその製造方法 - Google Patents
半導体装置およびその製造方法 Download PDFInfo
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- 239000004065 semiconductor Substances 0.000 title claims description 69
- 238000004519 manufacturing process Methods 0.000 title claims description 19
- 238000003780 insertion Methods 0.000 claims description 24
- 230000037431 insertion Effects 0.000 claims description 24
- 229920005989 resin Polymers 0.000 claims description 24
- 239000011347 resin Substances 0.000 claims description 24
- 239000000758 substrate Substances 0.000 claims description 21
- 238000007789 sealing Methods 0.000 claims description 19
- 230000002093 peripheral effect Effects 0.000 claims description 12
- 238000000034 method Methods 0.000 claims description 11
- 239000000463 material Substances 0.000 claims description 8
- 239000004020 conductor Substances 0.000 description 10
- 229910000679 solder Inorganic materials 0.000 description 7
- 230000017525 heat dissipation Effects 0.000 description 6
- 239000002184 metal Substances 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 230000005855 radiation Effects 0.000 description 3
- 239000004734 Polyphenylene sulfide Substances 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 238000005304 joining Methods 0.000 description 2
- 229920000069 polyphenylene sulfide Polymers 0.000 description 2
- 229920001187 thermosetting polymer Polymers 0.000 description 2
- 239000003822 epoxy resin Substances 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 239000013464 silicone adhesive Substances 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
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- H01L23/495—Lead-frames or other flat leads
- H01L23/49541—Geometry of the lead-frame
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- H01L23/49551—Cross section geometry characterised by bent parts
- H01L23/49555—Cross section geometry characterised by bent parts the bent parts being the outer leads
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- H01L23/498—Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
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- H01R12/00—Structural associations of a plurality of mutually-insulated electrical connecting elements, specially adapted for printed circuits, e.g. printed circuit boards [PCB], flat or ribbon cables, or like generally planar structures, e.g. terminal strips, terminal blocks; Coupling devices specially adapted for printed circuits, flat or ribbon cables, or like generally planar structures; Terminals specially adapted for contact with, or insertion into, printed circuits, flat or ribbon cables, or like generally planar structures
- H01R12/50—Fixed connections
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- H01R12/00—Structural associations of a plurality of mutually-insulated electrical connecting elements, specially adapted for printed circuits, e.g. printed circuit boards [PCB], flat or ribbon cables, or like generally planar structures, e.g. terminal strips, terminal blocks; Coupling devices specially adapted for printed circuits, flat or ribbon cables, or like generally planar structures; Terminals specially adapted for contact with, or insertion into, printed circuits, flat or ribbon cables, or like generally planar structures
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- H01R12/50—Fixed connections
- H01R12/51—Fixed connections for rigid printed circuits or like structures
- H01R12/55—Fixed connections for rigid printed circuits or like structures characterised by the terminals
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Description
本発明の実施の形態1について、図面を用いて以下に説明する。図1は、実施の形態1に係る半導体装置100の断面図である。図2は、半導体装置100の内部構造を示す斜視図である。なお、図1の紙面に向かって左右方向を左右方向、上下方向を上下方向、手前側を前方、奥側を後方として説明する。
次に、実施の形態2に係る半導体装置100Aについて説明する。図4は、実施の形態2に係る半導体装置100Aの内部構造を示す斜視図である。なお、実施の形態2において、実施の形態1で説明したものと同一の構成要素については同一符号を付して説明は省略する。
次に、実施の形態3に係る半導体装置100Bについて説明する。図5は、実施の形態3に係る半導体装置100Bの内部構造を示す斜視図である。なお、実施の形態3において、実施の形態1,2で説明したものと同一の構成要素については同一符号を付して説明は省略する。
次に、実施の形態4に係る半導体装置100Cについて説明する。図6は、実施の形態4に係る半導体装置100Cの内部構造を示す斜視図である。なお、実施の形態4において、実施の形態1〜3で説明したものと同一の構成要素については同一符号を付して説明は省略する。
次に、実施の形態5に係る半導体装置100Dについて説明する。図7は、実施の形態5に係る半導体装置100Dの内部構造を示す斜視図である。なお、実施の形態5において、実施の形態1〜4で説明したものと同一の構成要素については同一符号を付して説明は省略する。
次に、実施の形態6に係る半導体装置100Eについて説明する。図8は、実施の形態6に係る半導体装置100Eの内部構造を示す斜視図である。なお、実施の形態6において、実施の形態1〜5で説明したものと同一の構成要素については同一符号を付して説明は省略する。
Claims (9)
- ベース板と、
前記ベース板の上面に設けられた絶縁基板と、
前記絶縁基板の上面に設けられた導電パターンと、
前記導電パターンの上面に配置された半導体チップと、
前記ベース板、前記絶縁基板、前記導電パターンおよび前記半導体チップを囲繞するケースと、
前記ケースの内部を封止する封止樹脂と、
前記ケースに配置された外部接続端子と、
を備え、
前記外部接続端子の一端部は、前記導電パターンに接続され、
前記ケースの周壁部に、前記外部接続端子の他端部が挿入可能な端子挿入部が設けられ、
前記外部接続端子の前記他端部は平面視にてL字形状に形成され、かつ、前記端子挿入部は平面視にてL字形状に形成され、
前記外部接続端子の前記他端部が前記端子挿入部に挿入された状態で、前記外部接続端子における前記他端部を除く部分は前記封止樹脂により封止された、半導体装置。 - 前記ベース板、前記絶縁基板および前記導電パターンは一体的に形成された、請求項1記載の半導体装置。
- 前記外部接続端子の前記他端部に、複数の外部接続部が設けられた、請求項1記載の半導体装置。
- 前記外部接続端子の前記他端部に、ねじの軸部が挿通可能な固定用穴が設けられた、請求項1記載の半導体装置。
- 前記外部接続端子は複数設けられ、
前記端子挿入部は、互いに隣接する位置に複数設けられ、
複数の前記外部接続端子の前記他端部が複数の前記端子挿入部にそれぞれ挿入された状態で、複数の前記外部接続端子における前記他端部を除く部分は前記封止樹脂により封止された、請求項1記載の半導体装置。 - 前記外部接続端子の前記他端部に、プレスフィット部が設けられた、請求項1記載の半導体装置。
- 前記外部接続端子の前記他端部に、コネクタ部が設けられた、請求項1記載の半導体装置。
- 請求項1から請求項7のいずれか1項に記載の半導体装置を製造する製造方法であって、
前記外部接続端子の前記一端部は、超音波接合を用いて前記導電パターンに接合された、半導体装置の製造方法。 - 請求項1から請求項7のいずれか1項に記載の半導体装置を製造する製造方法であって、
前記外部接続端子の前記一端部は、接合材を用いて前記導電パターンに接合された、半導体装置の製造方法。
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2016255989A JP6625044B2 (ja) | 2016-12-28 | 2016-12-28 | 半導体装置およびその製造方法 |
US15/660,994 US10366933B2 (en) | 2016-12-28 | 2017-07-27 | Case having terminal insertion portion for an external connection terminal |
DE102017220211.4A DE102017220211B4 (de) | 2016-12-28 | 2017-11-14 | Halbleitervorrichtung und verfahren zur fertigung derselben |
CN201711460237.8A CN108257940B (zh) | 2016-12-28 | 2017-12-28 | 半导体装置及其制造方法 |
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JP2016255989A JP6625044B2 (ja) | 2016-12-28 | 2016-12-28 | 半導体装置およびその製造方法 |
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JP2018107414A JP2018107414A (ja) | 2018-07-05 |
JP6625044B2 true JP6625044B2 (ja) | 2019-12-25 |
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US (1) | US10366933B2 (ja) |
JP (1) | JP6625044B2 (ja) |
CN (1) | CN108257940B (ja) |
DE (1) | DE102017220211B4 (ja) |
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JP6755197B2 (ja) | 2017-01-19 | 2020-09-16 | 三菱電機株式会社 | 半導体装置およびその製造方法 |
CN112086413B (zh) * | 2019-06-14 | 2024-04-23 | Jmj韩国株式会社 | 半导体封装 |
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CA1000528A (en) | 1972-03-08 | 1976-11-30 | Baynard R. Smith | Bonded gold article, composition and method of bonding gold to a ceramic substrate |
JP2720009B2 (ja) * | 1993-11-29 | 1998-02-25 | 株式会社三社電機製作所 | 電力用半導体モジュール |
JP2001189416A (ja) * | 1999-12-28 | 2001-07-10 | Mitsubishi Electric Corp | パワーモジュール |
JP2007134572A (ja) * | 2005-11-11 | 2007-05-31 | Hitachi Appliances Inc | パワーモジュール |
US7993687B2 (en) * | 2006-07-12 | 2011-08-09 | Julianne Marie Kawa | Compositions and methods for management of diabetes |
JP4890208B2 (ja) * | 2006-11-24 | 2012-03-07 | 三菱電機株式会社 | 半導体装置 |
JP5041798B2 (ja) * | 2006-12-15 | 2012-10-03 | 三菱電機株式会社 | 半導体装置 |
JP4985116B2 (ja) * | 2007-03-08 | 2012-07-25 | 富士電機株式会社 | 半導体装置およびその製造方法 |
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JP4858336B2 (ja) * | 2007-07-10 | 2012-01-18 | 三菱電機株式会社 | 電力用半導体装置 |
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JP6304974B2 (ja) * | 2013-08-27 | 2018-04-04 | 三菱電機株式会社 | 半導体装置 |
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JP6057016B2 (ja) * | 2014-03-19 | 2017-01-11 | 富士電機株式会社 | 半導体装置及びその製造方法 |
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JP6541593B2 (ja) * | 2015-05-15 | 2019-07-10 | 三菱電機株式会社 | 電力用半導体装置 |
US9979105B2 (en) * | 2015-05-15 | 2018-05-22 | Mitsubishi Electric Corporation | Power semiconductor device |
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