JP6500018B2 - 金属酸化物固定グラフェンおよび炭素ナノチューブハイブリッド発泡体 - Google Patents
金属酸化物固定グラフェンおよび炭素ナノチューブハイブリッド発泡体 Download PDFInfo
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- JP6500018B2 JP6500018B2 JP2016526768A JP2016526768A JP6500018B2 JP 6500018 B2 JP6500018 B2 JP 6500018B2 JP 2016526768 A JP2016526768 A JP 2016526768A JP 2016526768 A JP2016526768 A JP 2016526768A JP 6500018 B2 JP6500018 B2 JP 6500018B2
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- metal substrate
- porous metal
- graphene layer
- carbon nanotubes
- hybrid foam
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- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 title claims description 214
- 239000006260 foam Substances 0.000 title claims description 156
- 229910021389 graphene Inorganic materials 0.000 title claims description 116
- 239000002041 carbon nanotube Substances 0.000 title claims description 87
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- 229910044991 metal oxide Inorganic materials 0.000 title claims description 35
- 150000004706 metal oxides Chemical class 0.000 title claims description 35
- 229910052751 metal Inorganic materials 0.000 claims description 116
- 239000002184 metal Substances 0.000 claims description 116
- 239000000758 substrate Substances 0.000 claims description 116
- 239000002070 nanowire Substances 0.000 claims description 72
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 59
- 238000000034 method Methods 0.000 claims description 39
- WOCIAKWEIIZHES-UHFFFAOYSA-N ruthenium(iv) oxide Chemical compound O=[Ru]=O WOCIAKWEIIZHES-UHFFFAOYSA-N 0.000 claims description 39
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- AMWRITDGCCNYAT-UHFFFAOYSA-L hydroxy(oxo)manganese;manganese Chemical compound [Mn].O[Mn]=O.O[Mn]=O AMWRITDGCCNYAT-UHFFFAOYSA-L 0.000 claims 4
- 230000000052 comparative effect Effects 0.000 description 45
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- XOJVVFBFDXDTEG-UHFFFAOYSA-N Norphytane Natural products CC(C)CCCC(C)CCCC(C)CCCC(C)C XOJVVFBFDXDTEG-UHFFFAOYSA-N 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 6
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- RBTVSNLYYIMMKS-UHFFFAOYSA-N tert-butyl 3-aminoazetidine-1-carboxylate;hydrochloride Chemical compound Cl.CC(C)(C)OC(=O)N1CC(N)C1 RBTVSNLYYIMMKS-UHFFFAOYSA-N 0.000 description 5
- 239000002033 PVDF binder Substances 0.000 description 4
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- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 3
- 239000005977 Ethylene Substances 0.000 description 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 3
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
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- 230000004913 activation Effects 0.000 description 3
- 238000013459 approach Methods 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
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- 229920002981 polyvinylidene fluoride Polymers 0.000 description 3
- 230000002829 reductive effect Effects 0.000 description 3
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- 230000002441 reversible effect Effects 0.000 description 3
- RADGOBKLTHEUQO-UHFFFAOYSA-N ruthenium(4+) Chemical compound [Ru+4] RADGOBKLTHEUQO-UHFFFAOYSA-N 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 2
- 239000004215 Carbon black (E152) Substances 0.000 description 2
- 229920001609 Poly(3,4-ethylenedioxythiophene) Polymers 0.000 description 2
- 239000004698 Polyethylene Substances 0.000 description 2
- 239000004743 Polypropylene Substances 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- 238000001505 atmospheric-pressure chemical vapour deposition Methods 0.000 description 2
- 229920001400 block copolymer Polymers 0.000 description 2
- 229910052791 calcium Inorganic materials 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 238000000354 decomposition reaction Methods 0.000 description 2
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- 238000010438 heat treatment Methods 0.000 description 2
- 238000002173 high-resolution transmission electron microscopy Methods 0.000 description 2
- 150000002431 hydrogen Chemical class 0.000 description 2
- 230000037427 ion transport Effects 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 230000002427 irreversible effect Effects 0.000 description 2
- 230000007774 longterm Effects 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- 239000011259 mixed solution Substances 0.000 description 2
- 239000002077 nanosphere Substances 0.000 description 2
- 239000002071 nanotube Substances 0.000 description 2
- 229920000767 polyaniline Polymers 0.000 description 2
- -1 polyethylene Polymers 0.000 description 2
- 229920000573 polyethylene Polymers 0.000 description 2
- 229920001155 polypropylene Polymers 0.000 description 2
- 229920000128 polypyrrole Polymers 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 230000035484 reaction time Effects 0.000 description 2
- 239000002109 single walled nanotube Substances 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
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- 238000010396 two-hybrid screening Methods 0.000 description 2
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- HBBGRARXTFLTSG-UHFFFAOYSA-N Lithium ion Chemical compound [Li+] HBBGRARXTFLTSG-UHFFFAOYSA-N 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 1
- 238000003917 TEM image Methods 0.000 description 1
- 239000004809 Teflon Substances 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
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- 239000013543 active substance Substances 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 239000013590 bulk material Substances 0.000 description 1
- 239000002717 carbon nanostructure Substances 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 229920001940 conductive polymer Polymers 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- RKTYLMNFRDHKIL-UHFFFAOYSA-N copper;5,10,15,20-tetraphenylporphyrin-22,24-diide Chemical compound [Cu+2].C1=CC(C(=C2C=CC([N-]2)=C(C=2C=CC=CC=2)C=2C=CC(N=2)=C(C=2C=CC=CC=2)C2=CC=C3[N-]2)C=2C=CC=CC=2)=NC1=C3C1=CC=CC=C1 RKTYLMNFRDHKIL-UHFFFAOYSA-N 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
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- 239000010439 graphite Substances 0.000 description 1
- 238000001453 impedance spectrum Methods 0.000 description 1
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- 229910001410 inorganic ion Inorganic materials 0.000 description 1
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- 238000009830 intercalation Methods 0.000 description 1
- 230000002687 intercalation Effects 0.000 description 1
- 229910001416 lithium ion Inorganic materials 0.000 description 1
- 238000003760 magnetic stirring Methods 0.000 description 1
- SQQMAOCOWKFBNP-UHFFFAOYSA-L manganese(II) sulfate Chemical compound [Mn+2].[O-]S([O-])(=O)=O SQQMAOCOWKFBNP-UHFFFAOYSA-L 0.000 description 1
- 229910000357 manganese(II) sulfate Inorganic materials 0.000 description 1
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- 239000011159 matrix material Substances 0.000 description 1
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- 238000001000 micrograph Methods 0.000 description 1
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- 229910021392 nanocarbon Inorganic materials 0.000 description 1
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- 239000011148 porous material Substances 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 235000011118 potassium hydroxide Nutrition 0.000 description 1
- 239000012286 potassium permanganate Substances 0.000 description 1
- OTYBMLCTZGSZBG-UHFFFAOYSA-L potassium sulfate Chemical compound [K+].[K+].[O-]S([O-])(=O)=O OTYBMLCTZGSZBG-UHFFFAOYSA-L 0.000 description 1
- 229910052939 potassium sulfate Inorganic materials 0.000 description 1
- 235000011151 potassium sulphates Nutrition 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 229910001925 ruthenium oxide Inorganic materials 0.000 description 1
- YBCAZPLXEGKKFM-UHFFFAOYSA-K ruthenium(iii) chloride Chemical compound [Cl-].[Cl-].[Cl-].[Ru+3] YBCAZPLXEGKKFM-UHFFFAOYSA-K 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 229910052938 sodium sulfate Inorganic materials 0.000 description 1
- 235000011152 sodium sulphate Nutrition 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000006104 solid solution Substances 0.000 description 1
- 238000000527 sonication Methods 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
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- 229910000314 transition metal oxide Inorganic materials 0.000 description 1
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G11/00—Hybrid capacitors, i.e. capacitors having different positive and negative electrodes; Electric double-layer [EDL] capacitors; Processes for the manufacture thereof or of parts thereof
- H01G11/22—Electrodes
- H01G11/30—Electrodes characterised by their material
- H01G11/32—Carbon-based
- H01G11/36—Nanostructures, e.g. nanofibres, nanotubes or fullerenes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G11/00—Hybrid capacitors, i.e. capacitors having different positive and negative electrodes; Electric double-layer [EDL] capacitors; Processes for the manufacture thereof or of parts thereof
- H01G11/22—Electrodes
- H01G11/24—Electrodes characterised by structural features of the materials making up or comprised in the electrodes, e.g. form, surface area or porosity; characterised by the structural features of powders or particles used therefor
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B32/00—Carbon; Compounds thereof
- C01B32/15—Nano-sized carbon materials
- C01B32/158—Carbon nanotubes
- C01B32/16—Preparation
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B32/00—Carbon; Compounds thereof
- C01B32/15—Nano-sized carbon materials
- C01B32/182—Graphene
- C01B32/184—Preparation
- C01B32/186—Preparation by chemical vapour deposition [CVD]
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G45/00—Compounds of manganese
- C01G45/02—Oxides; Hydroxides
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G55/00—Compounds of ruthenium, rhodium, palladium, osmium, iridium, or platinum
- C01G55/004—Oxides; Hydroxides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/26—Deposition of carbon only
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/56—After-treatment
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G11/00—Hybrid capacitors, i.e. capacitors having different positive and negative electrodes; Electric double-layer [EDL] capacitors; Processes for the manufacture thereof or of parts thereof
- H01G11/22—Electrodes
- H01G11/26—Electrodes characterised by their structure, e.g. multi-layered, porosity or surface features
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G11/00—Hybrid capacitors, i.e. capacitors having different positive and negative electrodes; Electric double-layer [EDL] capacitors; Processes for the manufacture thereof or of parts thereof
- H01G11/22—Electrodes
- H01G11/30—Electrodes characterised by their material
- H01G11/32—Carbon-based
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G11/00—Hybrid capacitors, i.e. capacitors having different positive and negative electrodes; Electric double-layer [EDL] capacitors; Processes for the manufacture thereof or of parts thereof
- H01G11/22—Electrodes
- H01G11/30—Electrodes characterised by their material
- H01G11/46—Metal oxides
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G11/00—Hybrid capacitors, i.e. capacitors having different positive and negative electrodes; Electric double-layer [EDL] capacitors; Processes for the manufacture thereof or of parts thereof
- H01G11/52—Separators
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G11/00—Hybrid capacitors, i.e. capacitors having different positive and negative electrodes; Electric double-layer [EDL] capacitors; Processes for the manufacture thereof or of parts thereof
- H01G11/84—Processes for the manufacture of hybrid or EDL capacitors, or components thereof
- H01G11/86—Processes for the manufacture of hybrid or EDL capacitors, or components thereof specially adapted for electrodes
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
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Description
以下の例は、本開示の範囲を限定することなく、例示するために与えられる。
要約すると、ハイブリッド発泡体が示され、ハイブリッド発泡体は、グラフェン/炭素ナノチューブ発泡体構造の大気圧化学蒸着およびRuO2ナノ粒子の一度の浴析出によって準備された。電極を準備するこの方法は、高いエネルギー密度のスーパーキャパシタの用途に対して、容易で、スケーラブルかつ低コストのアプローチを提供する。2ステッププロセスは、グラフェン/炭素ナノチューブバックボーンの上のRuO2ナノ粒子のコンフォーマルコーティングを成功させ、炭素ナノチューブとRuO2ナノ粒子との間の絡み合ったネットワークを形成する。このようなグラフェン/炭素ナノチューブを金属酸化物ナノ構造に組み込みんだ結果、優れた質量測定された容量および単位面積当たりの容量特性が同時に生じた(502.78F/gの比容量および1.11F/cm2の面積容量)。容量の増加および動作電圧ウインドウの1.5Vへの拡大は、エネルギー密度を157.12kWh/kg(面積当たりのエネルギー密度を0.173Wh/cm2)へと増加させることができ、電力密度を512kWh/kg(面積当たりの電力密度を0.563kWh/cm2)へと増加させることができる。さらに、ハイブリッド発泡体は、8100サイクルにわたって約106%のサイクリング安定性を提供することができる。電気化学的安定性、容量特性および準備の容易性は、ハイブリッド発泡体が従来のスーパーキャパシタよりも有利であり得ることを示す。
3MnSO4+2KMnO4+2H2O=5MnO2+K2SO4+2H2SO4
本明細書に開示された方法およびハイブリッド炭素ナノチューブおよびグラフェンナノ構造をさらに記述するために、限定しない例のリストをここに提供する。
Claims (18)
- 多孔質金属基板と、
前記多孔質金属基板の表面の上に堆積された少なくとも一つのグラフェン層と、
前記少なくとも一つのグラフェン層の表面の上に成長した複数の炭素ナノチューブと、
前記複数の炭素ナノチューブ上に堆積された複数の金属酸化物ナノワイヤと、
を含む、
エネルギーデバイス。 - 前記複数の金属酸化物ナノワイヤは、酸化ルテニウム(IV)および酸化マンガン(IV)のうちの少なくとも一つを含む、
請求項1に記載のエネルギーデバイス。 - 前記複数の金属酸化物ナノワイヤは、含水酸化ルテニウム(IV)ナノワイヤを含む、
請求項1に記載のエネルギーデバイス。 - 前記多孔質金属基板は、銅、アルミニウムおよびニッケルのうちの少なくとも一つを含む、
請求項1に記載のエネルギーデバイス。 - 前記エネルギーデバイスは、バインダーを含まない、
請求項1に記載のエネルギーデバイス。 - 前記少なくとも一つのグラフェン層は、20未満のグラフェン層である、
請求項1に記載のエネルギーデバイス。 - 前記エネルギーデバイスにおける前記少なくとも一つのグラフェン層および複数の炭素ナノチューブの充填量は、約0.0005グラムから約0.1グラムの範囲内にある、
請求項1に記載のエネルギーデバイス。 - 前記充填量は、充填後の多孔質金属基板の質量と充填前の多孔質金属基板の質量との間の差によって決定される、
請求項7に記載のエネルギーデバイス。 - 前記充填後の多孔質金属基板は、前記多孔質金属基板、前記少なくとも一つのグラフェン層、前記複数の炭素ナノチューブおよび前記複数の金属酸化物ナノワイヤを含み、前記充填前の多孔質金属基板は、前記多孔質金属基板を含む、
請求項8に記載のエネルギーデバイス。 - 第一の多孔質金属基板と、
前記第一の多孔質金属基板の表面の上に堆積された少なくとも一つのグラフェン層と、
前記少なくとも一つのグラフェン層の表面の上に成長した複数の炭素ナノチューブと、
前記複数の炭素ナノチューブ上に堆積された複数の金属酸化物ナノワイヤと、
を含む、第一の電極と、
第二の多孔質金属基板と、
前記第二の多孔質金属基板の表面の上に堆積された少なくとも一つのグラフェン層と、
前記少なくとも一つのグラフェン層の表面の少なくとも一つの上に成長した複数の炭素ナノチューブと、
前記複数の炭素ナノチューブ上に堆積された複数の金属酸化物ナノワイヤと、
を含む、第二の電極と、
電解質と、
前記第一の電極と前記第二の電極との間に配置されたセパレータと、
を含む、
スーパーキャパシタ。 - 前記第一の多孔質金属基板および前記第二の多孔質金属基板は、銅、アルミニウムおよびニッケルのうちの少なくとも一つを含む、
請求項10に記載のスーパーキャパシタ。 - 前記複数の金属酸化物ナノワイヤは、酸化ルテニウム(IV)および酸化マンガン(IV)のうちの少なくとも一つを含む、
請求項10に記載のスーパーキャパシタ。 - 前記少なくとも一つのグラフェン層は、20以下のグラフェン層である、
請求項10に記載のスーパーキャパシタ。 - 前記第一の電極および前記第二の電極は、バインダーを含まない、
請求項10に記載のスーパーキャパシタ。 - 化学蒸着を利用して、多孔質金属基板の表面の上に少なくとも一つのグラフェン層を成長させることと、
化学蒸着を利用して前記少なくとも一つのグラフェン層の表面の上に複数の炭素ナノチューブを成長させて、コーティングされた多孔質金属基板を形成することと、
前記複数の炭素ナノチューブの表面の上に複数の金属酸化物ナノワイヤを堆積させて、ハイブリッド発泡体を形成することと、
を含む、
ことを特徴とする方法。 - 前記少なくとも一つのグラフェン層および前記複数の炭素ナノチューブを成長させる前に、前記方法は、前記多孔質金属基板の表面に反応性イオンエッチングプラズマを適用することと、前記多孔質金属基板の前記表面の上に触媒粒子を堆積することと、を含む、
請求項15に記載の方法。 - ある期間、紫外線発生オゾンで、前記コーティングされた多孔質金属基板を処理することを含む、
請求項15に記載の方法。 - 第一の期間に第一の温度で前記ハイブリッド発泡体を乾燥させることと、第二の期間に第二の温度で前記ハイブリッド発泡体をアニールすることと、
を含む、
請求項15に記載の方法。
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US10580591B2 (en) | 2013-11-05 | 2020-03-03 | The Regents Of California, Riverside | Metal-oxide anchored graphene and carbon-nanotube hybrid foam |
WO2021085670A1 (ko) * | 2019-10-29 | 2021-05-06 | 한국전기연구원 | 2차 전지용 3차원 전극 구조체 및 이의 제조 방법 |
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US10580591B2 (en) | 2020-03-03 |
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