JP6571393B2 - Optical encoder - Google Patents

Description

  The present application generally relates to precision measuring instruments, and more particularly to an optical displacement encoder.

  Various optical displacement encoders using a read head are known, and the read head has an optical arrangement for imaging the scale pattern onto the photodetector array of the read head. The image of the scale pattern is displaced together with the scale member, and the movement or position of the displaced scale pattern image is detected by the photodetector array. Conventional image processing, self-imaging (also referred to as Talbot imaging) and / or shadow imaging, can be used to provide scale pattern images in various configurations.

  The optical encoder may utilize an incremental position or absolute position scale structure. The incremental position scale structure allows the displacement of the read head relative to the scale to be determined by accumulating incremental units of displacement and to start from an initial point along the scale. Such an encoder is suitable for specific applications, particularly applications where line power is available. However, it is more desirable to use an absolute position scale structure in low power consumption applications (for example, battery-powered measuring instruments). The absolute position scale structure provides a unique output signal or combination of signals at each position along the scale. The absolute position scale structure does not require continuous accumulation of incremental displacements to determine position. Thus, the absolute position scale structure allows for various power saving schemes. Various absolute position encoders using various optical, capacitive or inductive sensing techniques are known. Patent Documents 1 to 11 disclose various encoder configurations and / or signal processing techniques relating to absolute position encoders, which are incorporated herein by reference.

  One type of configuration used in some optical encoders is a telecentric arrangement. Each of the patent documents 12-14 incorporated herein by reference discloses a one-sided or two-sided telecentric imaging system for imaging periodic patterns of light sources and sensing periodic pattern structure displacements. . Telecentric imaging systems provide several functions necessary in such optical encoders.

  One problem with the design of such optical encoders is that users generally prefer that the readhead and encoder scale be as compact as possible. Compact encoders are more convenient to introduce into various applications. High resolution is also required for certain precision measurement applications. However, the prior art provides a combination of high resolution, range / resolution ratio, robustness, compact size, and design characteristics that allow many encoder resolutions to be provided using shared manufacturing techniques and components. And does not teach a configuration that promotes cost reduction of the encoder as desired by the user. It would be desirable to improve the encoder configuration to provide such a combination.

United States Patent 3,882,482 United States Patent No. 5,965,879 United States Patent No. 5,279,044 United States Patent No. 5,886,519 United States Patent No. 5,237,391 United States Patent No. 5,442,166 United States Patent No. 4,964,727 United States Patent No. 4,414,754 United States Patent No. 4,109,389 United States Patent No. 5,773,820 United States Patent 5,010,655 United States Patent No. 7,186,969 United States Patent No. 7,307,789 United States Patent No. 7,435,945

  This summary is intended to simplify and introduce some of the concepts described later in the detailed description. This summary is not intended to identify key features of the inventive subject matter, nor is it intended to be used as an aid in determining the scope of the inventive subject matter.

  The principles disclosed herein are directed to improving an optical displacement encoder configuration to provide an improved combination of high resolution, range / resolution ratio, compact size, and robustness, and share many encoder resolutions. Allows to be provided using manufacturing techniques and components.

In various embodiments disclosed herein, an apparatus for measuring relative displacement between two members (ie, an optical encoder), a scale grating extending along the measurement axis direction and having a scale pitch P _SF , a wavelength, a light source that outputs light having λ, and an illumination fringe pattern along the measurement axis direction on a plane that is input with the light, is oriented in a direction transverse to the measurement axis direction, and coincides with the scale grating A structured illumination grating that outputs to the scale grating structured illumination, and usable spatially modulated image light output from the scale grating, and the scale grating from the illumination source An imaging unit installed to output a usable periodic imaging of the spatially modulated image light when illuminated by the structured illumination A detector unit including a series of photodetectors arranged to receive different phases of the usable periodic imaging, respectively, wherein the spatially modulated image light is formed from interference of two diffraction orders Includes fringes.

Such an apparatus can be configured as follows, for example. The imaging unit is installed to receive a detector unit installed at a distance Z from the imaging unit along the optical path, and the spatially modulated image light transmitted from the scale grating, and the own lens And a first lens having a focal length F that defines a focal point located between the first lens and the detector unit, and an aperture disposed substantially at the focal length F between the first lens and the detector unit. Part. The spatially modulated image light includes fringes formed from interference of two diffraction orders that differ by a value Δn. The opening has a width W that satisfies AW = Z * λ * (a * (Δn + 1) / ( _PMI P _SF / ((P _MI −P _SF ) * M)) along the measurement axis direction. M is a magnification value of the imaging unit, a value is greater than 0.5 and less than 4.0, and _PMI is a pitch of the illumination fringe pattern. The scale grating includes the spatial modulation including the structured illumination input by the structured illumination and modulated by an intensity modulation envelope having a spatial wavelength P _IMESF depending on the scale pitch P _SF and the illumination fringe pattern P _MI by outputting the image _{light, P SF} and _{P MI,} if the light source to output a non-coherent light, is _{ΔnP MI P SF / (ΔnP MI} -P SF) = P IMESF = m * P d / k Established, the light There when outputting coherent light, as _{ΔnP MI P SF / (2ΔnP MI} -P SF) = P IMESF = m * P d / k is satisfied, .m selected with the detector pitch _{P d} is The number of phase signals output from the detector unit, k is an odd integer, the spatial wavelength P _IMESF is larger than the scale pitch P _{SF, and the} detector pitch P _d is The pitch between the detector elements that are arranged to receive different phases of the periodic imaging that can be used and that correspond to a particular detector signal phase along the measuring axis direction.

In the first aspect, the scale grating includes a first scale grating part and a second scale grating part arranged in parallel along the measurement axis direction. The second scale grating portion, the first scale grating portion along the measuring axis direction with respect to having a spatial phase offset of 0.5 * P _SF. Both the first scale grating part and the second scale grating part contribute to the usable spatially modulated image light output from the scale grating and the usable periodic imaging.

  In the second aspect, the scale grating is installed at a distance less than the focal length F from the imaging unit.

  In a third aspect, the optical path of the imaging unit is at a roll angle with respect to the measurement axis such that the scale grating is at least 0.1 degrees in a plane perpendicular to the scale grating and parallel to the measurement axis. It arrange | positions with respect to an image formation part so that it may rotate.

  In a fourth aspect, the optical path of the imaging unit has a pitch angle with respect to the measurement axis such that the scale grating is at least 0.1 degree in a plane perpendicular to the scale grating and parallel to the measurement axis. It arrange | positions with respect to an image formation part so that it may rotate.

In the fifth aspect, the phase grating of the illumination unit has a roll angle between the plane of the phase grating and the plane of the scale grating (2 *) in a plane perpendicular to the scale grating and parallel to the measurement axis. B * M * P _PG ^ 2) / (H * λ). Here, B is a number between 0.75 to 1.25, M is the the magnification value of the imaging _{unit, P PG} is a pitch of said phase grating of said illumination portion, H Is the height of the field of view of the detector section perpendicular to the measurement axis direction.

In the sixth aspect, the phase grating of the illumination unit has a pitch angle between the plane of the phase grating and the plane of the scale grating of (2 *) in a plane perpendicular to the scale grating and parallel to the measurement axis. B * M * P _PG ^ 2) / (V * λ). Here, B is a number between 0.75 to 1.25, M is the the magnification value of the imaging _{unit, P PG} is a pitch of said phase grating of said illumination portion, V Is the length of the field of view of the detector section along the measurement axis direction.

FIG. 3 is a partial schematic exploded view of an encoder configuration that includes a telescopic arrangement on both sides and a scale having an absolute, origin, and incremental track pattern and that utilizes conventional image processing techniques. FIG. 2 is a diagram of an incremental scale track pattern, image intensity and detector arrangement for the encoder configuration of FIG. FIG. 2 is a diagram of an incremental scale track pattern, image intensity and detector arrangement for the encoder configuration of FIG. FIG. 2 is a diagram of an incremental scale track pattern, image intensity and detector arrangement for the encoder configuration of FIG. FIG. 4 is a partial schematic exploded view of an encoder configuration that includes a double-sided telecentric arrangement and a scale having an absolute, origin, and incremental track pattern and that utilizes spatial filtering and imaging principles according to the principles disclosed herein. FIG. 4 is a diagram of the illumination fringe pattern, incremental scale track pattern, resulting moiré image intensity, and detector placement for the encoder configuration of FIG. 3. FIG. 4 is a diagram of the illumination fringe pattern, incremental scale track pattern, resulting moiré image intensity, and detector placement for the encoder configuration of FIG. 3. FIG. 4 is a diagram of the illumination fringe pattern, incremental scale track pattern, resulting moiré image intensity, and detector placement for the encoder configuration of FIG. 3. FIG. 4 is a diagram of the illumination fringe pattern, incremental scale track pattern, resulting moiré image intensity, and detector placement for the encoder configuration of FIG. 3. It is a chart figure which shows the modulation transfer function corresponding to various design parameter sets. It is a chart figure which shows% DOF (dependence of depth of field), spatial harmony, and optical signal power on the width | variety of the opening part along a measurement-axis direction. FIG. 2 is a partial schematic exploded view of one embodiment of the encoder configuration of FIG. 1. FIG. 4 is a partial schematic exploded view of one embodiment of the encoder configuration of FIG. 3. It is a figure of the alternative structure of the phase grating part of embodiment of FIG. It is a figure of the scale track pattern arrangement | positioning of the encoder structure of FIG. FIG. 4 is a diagram of scale track pattern arrangement of the encoder configuration of FIG. 3. FIG. 4 is a table showing parameters for various scale and detector track combinations for the encoder configuration of FIG. FIG. 6 is a schematic cross-sectional view showing different optical paths through a bilateral telecentric arrangement. The structure which is another embodiment of practical implementation of the encoder structure based on the principle disclosed here is shown. The structure which is another embodiment of practical implementation of the encoder structure based on the principle disclosed here is shown. FIG. 13 shows an analysis of the configuration shown in FIG. 13 and shows how the phase grating provides a usable diffraction order that provides a light intensity signal on the detector. FIG. 3 is a partial schematic exploded view of an encoder configuration including a first alternative embodiment of an illumination unit. FIG. 16 is a partial schematic exploded view of an encoder configuration including a second alternative embodiment of an illumination section that includes components in addition to the components of FIG. 15 and may be used in a reflective encoder configuration. It is a figure of the illumination part which can be used in the encoder structure based on the principle disclosed here. It is a figure of the illumination part which can be used in the encoder structure based on the principle disclosed here. It is a figure of the illumination part which can be used in the encoder structure based on the principle disclosed here. It is a figure of the illumination part which can be used in the encoder structure based on the principle disclosed here. It is a figure of the illumination part which can be used in the encoder structure based on the principle disclosed here. It is a figure of the illumination part which can be used in the encoder structure based on the principle disclosed here. FIG. 6 illustrates an embodiment of a scale grating pattern that includes an offset grating portion that can be used in an encoder configuration. It is the figure which showed roughly the alignment (alignment) of the composite strength contribution of each scale grating | lattice part of FIG. 23A in a scale image. It is the figure which showed the scale image containing the composite strength contribution of each scale image part of FIG. 23B. FIG. 2 is a schematic diagram of a first encoder configuration configured to use an enlarged scale grating region in accordance with the principles disclosed herein. FIG. 3 is a schematic diagram of a second encoder configured to use an enlarged scale grating region in accordance with the principles disclosed herein. FIG. 3 is a schematic diagram illustrating an encoder configuration including a scale element arranged at a roll angle to reduce the influence of a potential self-image. It is the schematic which showed the encoder structure containing the scale element arrange | positioned with the roll angle for reducing the influence of a potential self-image, and the phase grating of an illumination part. It is the schematic which showed the encoder structure containing the phase grating of the illumination part arrange | positioned with the roll angle for reducing the influence of a potential self-image.

  Many of the aspects described above and their attendant advantages will be more readily understood as equivalent to those better understood with reference to the following detailed description taken in conjunction with the drawings in which:

  FIG. 1 is a partial schematic exploded view of an optical displacement encoder arrangement 100 that employs conventional image processing techniques with a double-sided telecentric arrangement and a scale having an absolute, origin, and incremental track pattern. Some aspects of encoder configuration 100 are described in co-pending and commonly assigned US patent application 12 / 535,561, filed August 4, 2009, now US Pat. No. 8,492,703, And the encoder configuration described in United States Patent Application No. 12 / 273,400 (hereinafter, the '400 application) filed November 18, 2008, now US Pat. No. 7,608,813. These are incorporated herein by reference. The encoder configuration 100 can operate accurately and effectively on an incremental scale track having a relatively coarse pitch (eg, 20 μm). On the other hand, as described in more detail with reference to FIG. 3, the method disclosed herein may be used so that an incremental scale track having a very fine pitch (eg, 4 μm) is available in a similar configuration. good.

As shown in FIG. 1, encoder configuration 100 includes a scale element 110, a lens 140 for guiding visible or invisible wavelengths of light from a light source (not shown), and a bilateral telecentric imaging configuration 180. The bilateral telecentric imaging configuration 180 includes a first lens 181 in the first lens plane FLP, an opening 182 in the aperture component 182 ′ in the aperture plane AP, a second lens 183 in the second lens plane SLP, and a detection plane DP. Detector electronics 120. In at least one embodiment, the scale element 110 is spaced apart by a distance _{d 0} from the first lens plane FLP. The first lens plane FLP is separated from the aperture plane AP by a focal length f. The aperture plane AP is separated from the second lens plane SLP by the focal length f ′. The second lens plane SLP is separated from the detection plane DP by a distance d ₀ ′. The detector electronics 120 may be connected to a signal generation / processing circuit 190. The light source may also be connected to the signal generation / processing circuit 190 by power and signal connections (not shown).

  In the embodiment shown in FIG. 1, the scale element 110 includes a scale pattern 115 comprising three scale track patterns, an absolute scale track pattern TABS1, an origin scale track pattern TREF1, and an incremental scale track pattern TINC1. The track pattern TABS1 is referred to as an absolute scale track pattern because it provides a signal that can be used to determine an absolute scale over an absolute measurement range. In at least one embodiment, any conventional absolute scale pattern may be utilized as the absolute scale track pattern TABS1. In at least one embodiment, the absolute scale track pattern TABS1 may have a very “coarse” ABS resolution over a detection width approximately along the X axis.

  For the incremental scale track pattern TINC1, in at least one embodiment, its incremental pitch will be relatively coarse (eg, 20 μm). As will be described in more detail below with reference to FIG. 3, a fine pitch (eg, 4 μm) may be enabled in similarly sized encoder configurations that utilize the method disclosed herein. The origin scale track pattern TREF1 is formed so that it can be decomposed to a level capable of exhibiting a specific incremental wavelength, so that the incremental wavelength (eg, from the incremental scale track pattern TINC1) is changed (eg, the absolute scale track pattern). Clarify against absolute marks (from TABS1). As will be described in more detail below with reference to FIG. 10A, in at least one embodiment, the origin scale track pattern TREF1 may consist of a series of origin marks. In at least one embodiment, the origin mark may be formed as a series of baker patterns, function as a vernier origin mark, or may be formed according to various known techniques.

  FIG. 1 shows orthogonal X, Y and Z directions according to convention. The X and Y directions are parallel to the plane of the scale pattern 115, and the X direction is parallel to the intended measurement axis direction MA 82 (eg, perpendicular to the elongated pattern elements that can be included in the incremental scale track pattern TINC1). . The Z direction is perpendicular to the plane of the scale pattern 115.

  The detector electronics 120 includes a detector arrangement 124 consisting of three detector tracks DETABS1, DETREF1 and DETINC1, arranged to receive light from each of the three scale track patterns TABS1, TREF1 and TINC1. Detector electronics 120 may include signal processing circuitry 136 (eg, signal offset and / or gain adjustment, signal amplification, and coupling circuitry). In at least one embodiment, the detector electronics 120 may be manufactured as a single CMOS IC.

  In operation, illustrated with an image channel for incremental scale track pattern TINC 1, light from the illumination source is directed by lens 140 to illuminate incremental scale track pattern TINC 1 with source light 131. In some embodiments, the source light 131 is coherent light. Then, the incremental scale track pattern TINC1 outputs scale light 132. Of course, a critical aperture 182 having an aperture width AW along the X direction selects or passes rays that pass through the image channel for the incremental scale track pattern TINC1 (as will be described in more detail below with reference to FIG. 2). Serves as a limiting spatial filter. FIG. 1 shows three such rays, two edge rays and one central ray. As shown in FIG. 1, the lens 181 transmits the light beam to the critical aperture 182. The limiting aperture 182 transmits the light to the second lens 183 as spatially filtered image light 133. The second lens 183 transmits and collects spatially filtered image light, and forms an image of the scale track pattern TINC1 on the detector track DETINC1.

Thus, when the incremental scale track pattern TINC1 is illuminated, it outputs a light pattern that is spatially modulated specific to the track to the detector track DETINC1 of the detector electronics 120. The image of the spatially modulated light pattern is formed in an image plane IMGP which can be coplanar with the detector track DETINC1 (in FIG. 1, the image plane IMGP is shown independently for the sake of illustration). As shown in the image plane IMGP, the pattern of the scale image SI has a modulated scale image pitch _PSI . In one specific embodiment, the pitch _PSI may be relatively coarse (eg, 20 μm).

  Similar to the imaging of the spatially modulated light pattern from the incremental scale track pattern TINC1 on the detector track DETINC1, when the scale track patterns TREF1 and TABS1 are illuminated by light from the lens 140, these patterns TREF1 and TABS1 are Light patterns spatially modulated unique to the tracks (for example, pattern lights corresponding to these patterns) are output to the track-specific detector tracks DETREF1 and DETABS1 of the detector electronics 120, respectively. As described above, the origin scale track pattern TREF1 (for example, having a Baker pattern) indicates a specific incremental wavelength, so that the wavelength from the incremental scale track pattern TINC1 is clearly defined with respect to the absolute mark from the absolute track pattern TABS1. To do. Of course, all of the spatially modulated light pattern moves with the scale 110.

  As will be described in more detail below with reference to FIG. 11, in each of the detector tracks DTEINC1, DETABS1, and DETREF1, a separate photodetector area spatially filters the received spatially modulated light pattern to provide a signal (eg , An incremental detector track DETINC1 that produces quadrature signals, or other periodic signals having a spatial phase relationship that results in signal interpolation. In some embodiments, a spatial filter mask having individual apertures rather than individual photodetector areas masks relatively large photodetectors to provide a light receiving area similar to the individual photodetector areas, which is well known. A similar overall signal effect according to the technique may be provided.

  In various applications, the detector electronics and light source are mounted in a fixed relationship to each other, for example, in a read header or gauge housing (not shown), and in accordance with well-known techniques, to a measurement axis associated with the scale 110 by a bearing system. Guided along. In various applications, the scale may be attached to a moving stage or gauge spindle or the like. Of course, the configuration shown in FIG. 1 is a transmissive configuration. That is, the scale pattern 115 includes a light-shielding portion and a light transmission portion (for example, assembled on a transparent substrate using a well-known thin film patterning technique) that outputs a spatially modulated light pattern to the detector track by transmission. Of course, similar components can be arranged in a reflective embodiment, and the light source and detector electronics are placed on the same side of the scale 110 as required according to well-known techniques to provide angular illumination and reflection. Installed for.

  In either the transparent scale pattern or the reflective scale pattern, the portion of the scale pattern that provides the light detected in the detector track (eg, DETABS1, DETREF1, or DETINC1) is a signal that produces the portion of the scale pattern. Of course, other portions of the scale pattern generally provide as little light as possible and can be patterned according to the teachings herein in various applications. In other words, scale patterns that are “negative” with respect to each other produce signals that can be used together, and the signal changes are also approximately “negative” with respect to each other due to certain reflective or transmissive arrangements. Therefore, the scale pattern may be described from the viewpoint of the “signal variation unit”. As a matter of course, the signal variation unit includes a signal generation unit or a scale pattern signal reduction unit in various applications.

2A-2C show various aspects relating to the optical signal channel corresponding to the incremental scale track pattern TINC1 of FIG. More specifically, FIG. 2A shows the incremental scale track pattern TINC1 with the scale pitch _{P SL.} FIG. 2B is a graphical representation of the image intensity signal IMG1 produced by light from the incremental scale track pattern TINC1 in the detection plane DP. As shown in FIG. 2B, the resulting image intensity produces an approximately sinusoidal signal (eg, as opposed to a square wave as may be generated from an unfiltered signal from incremental scale track pattern TINC1). (Eg, by opening 182) and is spatially filtered and has a signal period _PISC . FIG. 2C is a diagram of the incremental detector track DETINC1, and for illustration purposes, the image of the image intensity signal IMG1 of FIG. 2B is superimposed on the detector track DETINC1. As shown in Figure 2C, the detector track DETINC1 is to output a quadrature signal, are connected to four detectors elements located within one cycle of the detector tracks the wavelength lambda _d. 1 cycle detector tracks the wavelength lambda _d also corresponds to one period _{P ISC} image intensity signal IMG1.

  FIG. 3 is a partial schematic exploded view of an encoder arrangement 300 that includes a two-sided telecentric arrangement and a scale having an absolute, origin, and incremental track pattern, and that utilizes spatial filtering and imaging techniques in accordance with the principles disclosed herein. It is. Some components and operating principles of the encoder configuration 300 are substantially similar to the encoder configuration 100 of FIG. 1 and can be generally understood by analogy. For example, in FIG. 3, a series of numbers 3XX having the same suffix “XX” as a series of numbers 1XX in FIG. 1 may designate similar or identical components, which are described in particular below. Or, if there is no suggestion, it can work in the same way.

  As shown in FIG. 3, the encoder configuration 300 includes a scale element 310, an illumination system / part 360, and a two-sided telecentric imaging configuration 380. The illumination system / part 360 includes a light source 330 (eg, an LED) that emits visible or invisible wavelengths of light, a lens 340, and a phase grating 350. As will be described in more detail below, in at least one embodiment, the phase grating 350 can be used to generate a structured light pattern, although for the incremental scale track pattern TINC2 and the origin scale track pattern TREF2. , May be located in an optical signal path channel that is not for the absolute scale track pattern TABS2. The bilateral telecentric imaging arrangement 380 includes a first lens 381 in the first lens plane FLP, an opening 382 in the aperture component 382 ′ in the aperture plane AP, a second lens 383 in the second lens plane SLP, and a detection plane DP. Detector electronics 320. The detector electronics 320 may be connected to a signal generation / processing circuit 390. The light source 330 may also be connected to the signal generation / processing circuit 390 by power and signal connections (not shown).

  In the embodiment shown in FIG. 3, the scale element 310 includes a scale pattern 315 comprising three scale track patterns, an absolute scale track pattern TABS2, an origin scale track pattern TREF2, and an incremental scale track pattern TINC2. In at least one embodiment, a conventional absolute scale track pattern may be used as the absolute scale track pattern TABS2. In at least one embodiment, the absolute scale track pattern TABS2 may have a relatively “coarse” ABS resolution over a detection width approximately along the X axis.

  As will be described in more detail below, the encoder configuration 300 provides several spatial filtering and concatenations that allow a fine pitch scale to provide a larger pitch fringe corresponding to the detection pitch or element pitch of an inexpensive detector that senses scale displacement. Designed to take advantage of the image principle. In order to produce the desired fringes, the phase grating 350 is compared to the pitches of the incremental scale track pattern TINC2 and the origin scale track pattern TREF2 (eg, compared to an incremental scale track pitch of 4 μm and an origin scale track pitch of 4.1 μm). And an illumination grating designed to have a phase grating pitch of 5 μm. The resulting fringe period from phase grating 350 and incremental scale track pattern TINC2 is relatively coarse (eg, 20 μm), and the fringe period generated by phase grating 350 and incremental scale track pattern TINC2 (eg, 22.77 μm) It can be slightly different.

  As described in more detail below, the detection pattern is spatially defined by a bilateral telecentric imaging arrangement 380 that includes an opening 382 that blurs or eliminates high spatial frequencies corresponding to the incremental scale track pattern TINC2 and the origin scale track pattern TREF2. The image is formed in a filtered state. In some embodiments, the parameters are selected so that the modulated image pitch of the spatially filtered pattern is equal to the pitch of a given detector (eg, a detector designed for a 20 μm incremental scale track pitch). Match. Appropriate aperture widths can be selected to achieve the desired spatial filtering effects, such as removing high spatial frequencies and providing the desired pattern fringe period. Some teachings regarding aperture width, etc. to achieve the desired spatial wavelength filtering are described in more detail in commonly assigned US Pat.

  As described in more detail below with reference to FIG. 10B, in at least one embodiment, the origin scale track pattern TREF2 may include a series of origin marks that may be formed as a Baker pattern. The origin mark may function as a vernier origin mark. The origin scale track pattern TREF2 is formed so that it can be decomposed into a level capable of indicating a specific incremental wavelength for the incremental scale track pattern TINC2, and thus the incremental wavelength is set to the absolute mark from the absolute scale track pattern TABS2. And clarify. In at least one embodiment, the combination of the origin track pattern TREF2 (eg, Baker pattern) and the incremental track pattern TINC2 can create a composite wavelength, and these measured composite phases indicate the correct incremental scale track pattern cycle. (For example, a measured zero composite phase may indicate the correct incremental cycle corresponding to that phase).

  As a specific example, the origin scale track pattern TREF2 is slightly smaller than the pitch of the incremental scale track pattern TINC2 (eg, 4.0 μm that generates a modulated and spatially filtered fringe pattern with a period of 20 μm). Can have different pitches (eg, 4.1 μm that produces a modulated and spatially filtered fringe pattern with a period of 22.77 μm), so that the phase of the origin scale track pattern can be Only one specific point along the length matches the phase of the incremental scale track pattern (eg, only one point along the baker pattern length in the origin scale track pattern). The position where the phases match defines a specific incremental wavelength for the incremental scale track pattern TINC2.

  In one specific embodiment, in the origin scale track pattern TREF2, a baker pattern may be provided at selected intervals (eg, 0.6 millimeters). The phase of each baker pattern (e.g. at the pattern center) coincides with the phase of the incremental scale track pattern TINC1 at a specific distance (e.g., 0.6 millimeter) (or is constant from the phase). With phase offset). The combined wavelength of the incremental scale track pattern TINC2 and the origin scale track pattern TREF2 is larger than the Baker pattern length. In at least one embodiment, this relationship indicates that the combined wavelength of the incremental scale track pattern and the origin (eg, Baker) scale track pattern is greater than the Baker pattern length L and L <pp ′ / (p′−p) It can be expressed by writing. Here, p is the pitch of the incremental scale track pattern TINC2, and p 'is the pitch of the Baker pattern in the origin scale track pattern TREF2.

  As shown in FIG. 3, the detector electronics 320 includes a detector arrangement 325 consisting of three detector tracks DETABS2, DETREF2 and DETINC2, arranged to receive light from the three scale track patterns TABS2, TREF2 and TINC2, respectively. Detector electronics 320 may include signal processing circuitry 326 (eg, signal offset and / or gain adjustment, signal amplification, and coupling circuitry). In at least one embodiment, the detector electronics 320 may be manufactured as a single CMOS IC.

  In operation, light 331 (primary light) emitted from light source 330 is partially or fully collimated by lens 340 in a beam area sufficient to illuminate the three scale track patterns TABS2, TREF2, and TINC2. . The phase grating 350 diffracts the source light to produce the diffracted structured light 331 ′ (not the absolute scale track pattern TABS 2) to achieve the modulated and spatially filtered imaging effect described above. It is formed so as to be given to the scale track pattern TREF2 and the incremental scale track pattern TINC2. As an example of an image channel for the incremental scale track pattern TINC 2, the incremental scale track pattern TINC 2 supplies the scale light 332 to the lens 381. Of course, the limiting aperture 382 having an aperture width AW along the X-axis direction is a spatial filter that selects or limits rays that pass through the image channel (as will be described in more detail below with reference to FIGS. 4-12). Function as. FIG. 3 shows three such rays, two edge rays and one central ray. As shown in FIG. 3, the lens 381 transmits the light beam to the limit aperture 382. The limit aperture 382 transmits the light to the second lens 383 as spatially filtered image light 333. The second lens 383 transmits and condenses the spatially filtered image light and forms a spatially modulated light pattern on the detector track DETINC2. As described above and as described in detail below with reference to FIG. 4, in accordance with the principles disclosed herein, the spatially modulated light pattern in the detector track DETINC comprises a modulated and spatially filtered fringe pattern. .

  Similarly, when scale track patterns TREF2 and TABS2 are illuminated, track-specific spatially modulated light patterns (eg, patterned light corresponding to each pattern) are converted to track-specific detector tracks DETREF2 of detector electronics 320. And DETABS2 respectively. As described above, the spatially modulated light pattern in the detector track DETREF2 comprises a modulated and spatially filtered fringe pattern. Of course, all of the spatially modulated light pattern moves with the scale 310. In the optical signal channel corresponding to each of the detector tracks DETINC2, DETABS2, and DETREF2, a separate photodetector area spatially filters the received spatially modulated optical pattern to produce a signal (eg, an incremental detector track that generates an orthogonal signal). DETINC2, or other periodic signal having a spatial phase relationship that results in signal interpolation) is arranged to provide a desired position. In some embodiments, rather than individual photodetector regions, spatial filter masks with individual apertures mask relatively large photodetectors to provide a similar overall signal effect according to known techniques. For this reason, an optical receiving area similar to the individual photodetector area described above may be provided.

  In various applications, the detector electronics 320 and the light source 330 are implemented in a fixed relationship with each other, for example in a read header or gauge housing (not shown), and in accordance with well-known techniques, measurements related to the scale 310 by a bearing system. Guided along the axis. In various applications, the scale may be attached to a moving stage or gauge spindle or the like.

4A-4D illustrate various aspects relating to the optical signal channel corresponding to the incremental scale track pattern TINC2 of FIG. More specifically, FIG. 4A shows an illumination fringe pattern IFP generated by the phase grating 350. The illumination fringe pattern IFP is shown as having a pitch _PMI (eg, 5 μm). FIG. 4B shows an incremental scale track pattern TINC2 having a scale pitch P _SF (eg, 4 μm). FIG. 4C is a graphical representation of the image intensity signal IMG2 provided by light from the combination of the phase grating 350 and the incremental scale track TINC2 in the detection plane DP. As shown in FIG. 4C, the resulting image intensity includes moiré fringes with beat frequency along with an overall sinusoidal envelope pattern with a modulated image pitch P _IMESF (eg, 20 μm). As described above, the image intensity removes the high-frequency signal HFS from the incremental scale track pattern TINC2 in order to generate an approximately sinusoidal envelope signal for moire imaging fringes with a modulated image pitch P _IMESF ( It is spatially filtered (for example, by opening 182).

In various embodiments, the aperture 350 is configured to have an aperture width AW = F * λ * (a / (P _MI P _SF / ((P _MI −P _SF ))), where a Is greater than 2.0 and less than 6.0 The spatially modulated image light has a fringe (shown in detail in FIG. 4C) formed from interference of two diffraction orders that differ by a value Δn. In some embodiments, for example, if the moire image intensity signal IMG2 is derived from an overlap of the a + 1 and a-1 diffraction order elements of the scale light 332, Δn = 2. In embodiments, Δn can be 1 or 4.

  Of course, in an encoder configuration that includes a light source that outputs coherent light, the variable a should have a value greater than 0.5. In embodiments utilizing coherent light, the value of a may be greater than 0.5 and less than 1.5. In one embodiment using coherent light, the value of a is 1. In embodiments utilizing non-coherent light, the value of a may be greater than 1 and less than 4. In one embodiment utilizing non-coherent light, the value of a is 2.

The image intensity signal IMG2 is modulated by an intensity modulation envelope having a spatial wavelength P _IMESF that depends on the scale pitch P _SF and the illumination fringe pitch P _MI . P _SF and P _MI are selected in cooperation with the detector pitch Pd of the detector track DETINC2, and thus when the light source outputs non-coherent light, ΔnP _MI P _SF / (ΔnP _MI −P _SF ) = P _IMESF = When m * Pd / k is satisfied and the light source outputs coherent light, ΔnP _MI P _SF / (2ΔnP _MI −P _SF ) = P _IMESF = m * Pd / k is satisfied. Here, m is the number of phase signals output from the detector unit, and k is an odd integer. The spatial wavelength P _IMESF is larger than the scale pitch P _SF .

A series of vertical reference lines VRL drawn between FIGS. 4A, 4B, and 4C provides an indication of the signal level from the illumination fringe pattern of FIG. 4A that passes through the incremental scale track pattern TINC2 of FIG. It seems to correspond to the signal intensity in the moiré image intensity of FIG. FIG. 4D is a diagram of the incremental detector track DETINC2, for illustrative purposes, an image of the beat frequency envelope of the moiré image intensity signal IMG2 of FIG. 4C is superimposed on the detector track DETINC2. As shown in FIG. 4D, the detector track DETINC2 is connected to four detector elements existing within one period of the detection or pitch Pd so as to output a quadrature signal. One period of detection or pitch Pd also corresponds to one period P _IMESF of the moire image intensity signal IMG2.

  5 and 6 show basic design reference information included in FIGS. 26 and 27 previously incorporated in Patent Document 12. FIG. The use of FIGS. 5 and 6 for the selection of aperture sizes in various embodiments may be understood based on the disclosure of the '969 patent and will not be described in detail here. However, relevant teachings may be used in light of this disclosure. Most of the disclosure of the '969 patent is from the perspective of non-coherent illumination. Those skilled in the art will appropriately adapt to the teachings based on well-known considerations regarding the difference between non-coherent and coherent illumination in an imaging system.

  FIG. 7 is a partial schematic exploded view of an encoder configuration 700 that is one embodiment of a practical implementation of the encoder configuration 100 of FIG. Some components and operating principles of the encoder configuration 700 are substantially similar to the encoder configuration 100 of FIG. 1 and can be generally understood by analogy. For example, in FIG. 7, a series of numbers 7XX having the same suffix “XX” as a series of numbers 1XX in FIG. 1 may designate similar or identical components, which are described in particular below. Or, if there is no suggestion, it can work in the same way.

  As shown in FIG. 7, the encoder configuration 700 includes a scale element 710, an illumination system / part 760, and a two-sided telecentric imaging configuration 780. The illumination system / unit 760 includes a light source 730 (eg, an LED) that emits visible or invisible wavelengths of light, a lens 740, and a beam splitter 755. The bilateral telecentric imaging configuration 780 includes a first lens array 781 in the first lens plane FLP, an aperture array 782 in the aperture component 782 ′ in the aperture plane AP, a second lens array 783 in the second lens plane SLP, and detection. Detector electronics 720 in the plane DP. The detector electronics 720 may be connected to a signal generation / processing circuit (not shown). The light source 730 may also be connected to the signal generation and processing circuit by power and signal connections (not shown).

  Regarding the lens arrays 781 and 783 and the aperture array 782, it will be appreciated that these include individual elements similar to the first lens 181, aperture 182 and second lens 183 of the encoder configuration 100 of FIG. In FIG. 7, in each array, each individual element cooperates similarly to provide a separate image path or channel that can be referred to as an image channel or image channel configuration. Each image channel functions similarly for a single lens and aperture of encoder configuration 100 described above with respect to FIG. In the embodiment of FIG. 7, multiple image channels are contaminated in that, if the quality of a single image channel is degraded or inhibited, the remaining image channels can still provide accurate scale pattern imaging. It is used to provide an additional level for system robustness with respect to defects, scale waveforms, etc.

  In the embodiment of FIG. 7, the scale element 710 includes a scale pattern 715 composed of three scale track patterns including the absolute scale track pattern TABS1, the origin scale track pattern TREF1, and the incremental scale track pattern TINC1, as described above with respect to FIG. In at least one embodiment, the absolute scale track pattern TABS1 may have a very “coarse” ABS resolution over a detection width approximately along the X axis.

  For the incremental scale track pattern TINC1, in at least one embodiment, the incremental pitch may be relatively coarse (eg, 20 μm). As will be described in more detail below with reference to FIG. 8, a fine pitch (eg, 4 μm) can be realized in a similarly sized encoder configuration according to the method disclosed herein. As will be described in more detail below with reference to FIG. 10A, in at least one embodiment, the origin scale track pattern TREF1 is formed as a series of Baker patterns and also functions as a vernier origin mark, or is formed according to various known techniques. A series of origin marks may be provided.

  The detector electronics 720 includes a detector arrangement 725 consisting of three detector tracks DETABS1, DETREF1 and DETINC1, arranged to receive light from each of the three scale track patterns TABS1, TREF1 and TINC1. Detector electronics 720 may include signal processing circuitry (eg, signal offset and / or gain adjustment, signal amplification, and coupling circuitry). In at least one embodiment, the detector electronics 720 may be manufactured as a single CMOS IC.

  In operation, light 731 (primary light) emitted from light source 730 can be partially or fully collimated by lens 740 and illuminates three scale track patterns TABS1, TREF1, and TINC1 via beam splitter 755. To a sufficient beam area. Then, taking the image channel for the incremental scale track pattern TINC1 as an example, the incremental scale track pattern TINC1 provides scale light 732 that is redirected to the lens array 781 by the beam splitter 755. Of course, each critical aperture of aperture array 782 has an aperture width AW along the X direction and passes through a predetermined image channel for incremental scale track pattern TINC1 (as described above with respect to FIG. 2). It functions as a spatial filter that selects or restricts. As shown in FIG. 7, for each image channel, a corresponding lens in lens array 781 transmits the light beam to a corresponding aperture in critical aperture array 782. The corresponding apertures in the critical aperture array 782 then transmit the light rays to the respective lenses of the second lens array 783 as spatially filtered image light 733. Each lens of the second lens array 783 transmits and collects spatially filtered image light, and each spatially modulated light pattern corresponding to each position of the incremental scale track pattern TINC1 is detected by the detector track DETINC1. Form at each position.

  Thus, when illuminated, the incremental scale track pattern TINC1 outputs a series of track-specific spatially modulated light patterns to each position of the detector track DETINC1 of the detector electronics 720 corresponding to each image channel. The image of the spatially modulated light pattern is formed on an image plane IMGP which can be coplanar with the detector track DETINC1.

  Similar to the imaging of the spatially modulated light pattern from the incremental scale track pattern TINC1 on the detector track DETINC1, the scale track patterns TREF1 and TABS1 are spatially modulated in a track-specific manner when illuminated with light from the lens 740. Are output to the track-specific detector tracks DETREF1 and DETABS1 of the detector electronics 720, respectively. As described above, the origin scale track pattern TREF1 (for example, having a Baker pattern) can be decomposed to show a specific incremental wavelength, so that the wavelength from the incremental scale track pattern TINC1 is changed to the absolute mark from the absolute scale track pattern TABS1. To clarify. In each of the detector tracks DETINC1, DETABS1, and DETREF1, a separate photodetector region spatially filters each received spatially modulated light pattern to produce a signal (eg, an incremental detector track DETINC1 that produces an orthogonal signal, or Arranged to provide a desired position indicating other periodic signals having a spatial phase relationship that results in signal interpolation.

  In various applications, the detector electronics and light source are mounted in a fixed relationship to each other, for example, in a read header or gauge housing (not shown), and in accordance with well-known techniques, to a measurement axis associated with the scale 710 by a bearing system. Guided along. In various applications, the scale may be attached to a moving stage or gauge spindle or the like. The configuration shown in FIG. 7 is a reflective configuration. That is, the light source and detector electronics are located on the same side as the scale 710 and are installed for angled illumination and reflection according to well-known techniques. Therefore, the scale pattern 715 includes a light absorption unit and a light reflection unit (for example, assembled on a substrate using a known reflection technique) that outputs the spatially modulated light pattern to the detector track by reflection. Of course, similar components may be arranged in a transparent embodiment (see, eg, FIG. 1).

  FIG. 8 is a partial schematic exploded view of an encoder configuration 800 that is one embodiment of a practical implementation of the encoder configuration 300 of FIG. Some components and operating principles of the encoder configuration 800 are generally similar to the encoder configuration 300 of FIG. 3 and can be generally understood by analogy. For example, in FIG. 8, a series of numbers 8XX having the same suffix “XX” as a series of numbers 3XX in FIG. 3 may designate similar or identical components, which are described in particular below. Or, if there is no implied, it can work as well.

  As shown in FIG. 8, the encoder configuration 800 includes a scale element 810, an illumination system / part 860, and a two-sided telecentric imaging configuration 880. The illumination system / unit 860 includes a light source 830 (eg, LED) that emits visible or invisible wavelengths of light, a lens 840, a phase grating 850, and a beam splitter 855. As will be described in more detail below, in at least one embodiment, the phase grating 850 is for an incremental scale track pattern TINC2 and an origin scale track pattern TREF2, but is located and arranged in an optical channel that is not for the absolute scale track pattern TABS2. You may do it. The double telecentric imaging configuration 880 includes a first lens array 881 in the first lens plane FLP, an aperture array 882 in the aperture plane AP, a second lens array 883 in the second lens plane SLP, and detector electronics 820 in the detection plane DP. With. Of course, the lens arrays 881 and 883 and the aperture array 882 function in the same manner as the lens arrays 781 and 783 and the aperture array 782 described above with reference to FIG. The detector electronics 820 may be connected to a signal generation / processing circuit (not shown). The light source 830 may also be connected to the signal generation and processing circuit by power and signal connections (not shown).

  In the embodiment of FIG. 8, the scale element 810 includes a scale pattern 815 consisting of three scale track patterns, including the absolute scale track pattern TABS2, the origin scale track pattern TREF2, and the incremental scale track pattern TINC2, described above with respect to FIG. In at least one embodiment, the absolute scale track pattern TABS2 may have a relatively “coarse” ABS resolution over a detection width approximately along the X axis. As described above with respect to FIG. 3, the origin scale track pattern TREF2 and the incremental scale track pattern TINC2 are utilized and imaged according to the spatial filtering and imaging principles disclosed herein.

  As shown in FIG. 8, the detector electronics 820 includes a detector arrangement 825 consisting of three detector tracks DETABS2, DETREF2 and DETINC2, arranged to receive light from three scale track patterns TABS2, TREF2, and TINC2, respectively. Detector electronics 820 may include signal processing circuitry (eg, signal offset and / or gain adjustment, signal amplification, and coupling circuitry). In one embodiment, the detector electronics 820 may be manufactured as a single CMOS IC.

  In operation, light 831 (primary light) emitted from light source 830 can be partially or fully collimated by lens 840 and illuminates three scale track patterns TABS2, TREF2, and TINC2 via beam splitter 855. Can be guided over a sufficient beam area. Phase grating 850 is formed to diffract source light and provide diffracted structured light 831 'to origin scale track pattern TREF2 and incremental scale track pattern TINC2 (not to absolute scale track pattern TABS2). As an example of the image channel for the incremental scale track pattern TINC2, the incremental scale track pattern TINC2 outputs the scale light 832 whose direction is changed by the beam splitter 855 to the lens array 881. Of course, each critical aperture in the aperture array 882 has an aperture width AW along the X direction and a spatial filter that selects or limits rays that pass through a given image channel (as described above with respect to FIG. 4). Function as. In other words, as described above, spatial filtering effectively blurs the high-frequency portion of the image produced by the phase grating and incremental scale track pattern, so that the remaining signal is primarily a fringe of structured illumination. It consists of a modulation that can be considered as a beat frequency between the pitch and the pitch of the scale grating. The resulting modulated image pitch is a measure of the period of the beat frequency envelope.

  As shown in FIG. 8, for each image channel, a corresponding lens in lens array 881 transmits a light beam to a corresponding aperture in critical aperture array 882. Corresponding apertures in the critical aperture array 882 transmit light rays to each lens of the second lens array 883 as spatially filtered image light 833. Each lens of the second lens array 883 transmits and collects spatially filtered image light, and each spatially modulated light pattern corresponding to each position of the incremental scale track pattern TINC2 is detected by the detector track DETINC2. Form at each position. As described above with respect to FIG. 4, in accordance with the principles disclosed herein, the spatially modulated light pattern in the detector track DETINC2 comprises a modulated and spatially filtered imaging fringe pattern.

  Similarly, when scale track patterns TREF2 and TABS2 are illuminated, they output a track specific spatially modulated light pattern to the track specific detector tracks DETREF2 and DETABS2 of detector electronics 820, respectively. As described above, the spatially modulated light pattern in the detector track DETREF2 also includes a modulated and spatially filtered imaging fringe pattern. Of course, all of the spatially modulated light pattern moves with the scale 810. In the optical signal channel corresponding to each of the detector tracks DETINC2, DETABS2, and DETREF2, individual photodetector regions spatially filter each received spatially modulated optical pattern to produce a signal (eg, an incremental signal that generates an orthogonal signal). The detector track DETINC2, or other periodic signal having a spatial phase relationship that results in signal interpolation, is arranged to provide a desired position.

  In various applications, the detector electronics 820 and the light source 830 are mounted in a fixed relationship, for example, in a read header or gauge housing (not shown) and measured in relation to the scale 810 by a bearing system according to well-known techniques. Guided along the axis. In various applications, the scale may be attached to a moving stage or gauge spindle or the like. The configuration shown in FIG. 8 is a reflective configuration. That is, the light source 830 and the detector electronics 820 are disposed on the same side as the scale 810 and are installed for angled illumination and reflection according to known techniques. Therefore, the scale pattern 815 includes a light absorption unit and a light reflection unit (for example, assembled on a substrate using a known technique) that outputs a spatially modulated light pattern to the detector track by reflection. Of course, similar components may be arranged in a transparent embodiment (see, eg, FIG. 3).

  FIG. 9 is a diagram of an encoder configuration 900 illustrating an alternative embodiment of the phase grating portion of the encoder configuration 800 of FIG. As shown in FIG. 9, the encoder configuration 900 includes a scale element 910, a light source 930, a lens 940, two phase gratings 950 </ b> A and 950 </ b> B, and a beam splitter 955. The main difference from the encoder configuration 800 of FIG. 8 is that the encoder configuration 900 uses two phase gratings 950A and 950B rather than using a single phase grating 850. In one embodiment, phase grating 950A may be a 0.92 μm phase grating, while phase grating 950B may be a 0.84 μm phase grating with air gaps (uncoupled). This configuration allows for a compact design in that the phase grating 950B does not need to completely split the beam output by the phase grating 950A. In one specific embodiment, after optical transmission through phase gratings 950A and 950B, optical fringes are generated with a specific period (eg, 5 μm) and the pitch of incremental scale track pattern TINC (eg, 4 μm). ) To produce a fringe that is modulated and spatially filtered with a specific period (eg, 20 μm).

  10A and 10B are diagrams of scale track pattern arrangement of the encoder configuration of FIGS. 1 and 3, respectively. As shown in FIG. 10A, the scale track pattern arrangement 1000A includes an absolute scale track pattern TABS1, an origin scale track pattern TREF1, and an incremental scale track pattern TINC1. As described above, the absolute scale track pattern TABS1 provides a signal that can be used to determine the absolute position over the absolute measurement range, and in the embodiment of FIG. 10A, follows the scale track pattern. It is shown to include a coded signal portion indicating the absolute position.

  Because of the incremental scale track pattern TINC1, its incremental pitch is shown relatively coarse (eg, 20 μm). In the portion of the origin scale track pattern TREF1 shown in FIG. 10A, four origin mark patterns RM1A to RM1D are shown to occur at specific intervals. In one embodiment, the origin mark is formed as a Baker pattern and can be formed according to various well-known techniques. The origin mark can also function as a vernier origin mark. As described above, the origin scale track pattern TREF1 can be decomposed to a level capable of exhibiting a specific incremental wavelength, so that the incremental wavelength (eg, from the incremental scale track pattern TINC1) is changed (eg, the absolute scale track pattern). Clarify against absolute marks (from TABS1). As shown in FIG. 10A, the scale has an overall width dimension X1, while the area covered by the scale track patterns TABS1, TREF1, and TINC1 has a width dimension X2. In a specific embodiment, dimension X1 is equal to 13 millimeters while dimension X2 is equal to 3.9 millimeters.

  As shown in FIG. 10B, the scale track pattern arrangement 1000B includes an absolute scale track pattern TABS2, an origin scale track pattern TREF2, and an incremental scale track pattern TINC2. Various possible dimensions and configurations for the scale track pattern are described in more detail below with respect to FIG. In general, the scale track pattern arrangement 1000B is designed to be approximately the same size as the scale track pattern arrangement 1000A of FIG. 10A so that the encoder configuration designed for the scale track pattern arrangement 1000A can be substituted. Is done. As shown in FIG. 10B, the absolute scale track pattern TABS2 provides a signal that can be used to determine the absolute position over the absolute measurement range and is encoded similar to the absolute scale track pattern TABS1 of FIG. 10A. Can be provided. In at least one embodiment, the absolute scale track pattern TABS2 may have a very coarse ABS resolution over a detection width approximately along the X axis.

  As shown in FIG. 10B, the incremental scale track pattern TINC2 is shown to have a very fine pitch (eg, 4 μm) compared to the pitch (eg, 20 μm) of the incremental scale track pattern TINC1 of FIG. 10A. Yes. The portion of the origin scale track pattern TREF2 shown in FIG. 10B is shown to include a series of four origin mark patterns RM2A to RM2D. Origin mark patterns RM2A to RM2D can be formed as a baker pattern according to various well-known techniques. The origin mark pattern can also function as a vernier origin mark. The origin scale track pattern TREF2 is designed such that it can be decomposed to a level capable of indicating a specific incremental wavelength for the incremental scale track pattern TINC2, so that the incremental wavelength is relative to the absolute mark from the absolute scale track pattern TABS2. To clarify. In one embodiment, a combination of a modulated and spatially filtered image of the origin track pattern TREF2 and incremental track pattern TINC2 indicates an incremental scale track pattern cycle in which the measured composite phase is correct (e.g., measured A composite phase of zero creates a composite wavelength (which may indicate the correct incremental cycle corresponding to that phase).

  As an example, in the embodiment of FIG. 10B, each of the origin mark patterns RM2A to RM2D is shown to have a corresponding phase marker PHS2A to PHS2D. Each of the phase markers PHS2A to PHS2D indicates a point where a phase that is perfectly aligned for each position occurs. In other words, in the origin track pattern TREF2, origin mark patterns (for example, RM2A to RM2D) are provided at selected intervals (for example, 6 millimeters). The phase of each origin mark pattern (at the center of each pattern generated by the phase markers PHS2A to PHS2D) matches the phase of the incremental scale track pattern TINC2 at a position separated by a specific distance (for example, 6 millimeters) (or Has a constant phase offset from that phase). The combined phase of the incremental scale track pattern TINC2 and the origin scale track pattern TREF2 is greater than the origin mark pattern length (ie, greater than the length of each individual baker pattern).

  As described above, the origin scale track pattern TREF2 (having the origin mark pattern) is designed to generate a modulated and spatially filtered image of the same type as the incremental scale track pattern TINC2. In order to produce a modulated and spatially filtered image, a pitch close to the pitch of the incremental scale track pattern TINC2 and the origin scale track pattern TREF2 (eg, an incremental scale track pitch of 4 μm and an origin scale track pitch of 4.1 μm and In comparison, a phase grating having a phase grating pitch of 5 μm is used. The fringe period of the modulated and spatially filtered image from the resulting phase grating and incremental scale track pattern TINC2 is relatively coarse (eg, 20 μm), and the modulation generated by the phase grating and incremental scale track pattern TINC2 and It can be slightly different from the fringe period (eg, 22.77 μm) of the spatially filtered image.

  By causing the origin scale track pattern TREF2 to have a slightly different pitch (for example, 4.1 μm) compared to the pitch of the incremental scale track pattern TINC2 (for example, 4.0 μm), the phase of the origin scale track pattern can be Only one specific point along a specific length will match the phase of the incremental scale track pattern (eg, along the length of the Baker pattern in the origin scale track pattern TREF2, as shown by phase markers PHS2A-PHS2D). Only match at one point). The position where the phases match defines a specific incremental wavelength for the incremental scale track pattern TINC2.

  Utilizing an incremental scale track pattern imaged by structured light generated with a phase grating having a relatively fine pitch (eg, 4 μm) and a selected pitch (eg, 5 μm) as described above Can produce a modulated and spatially filtered pattern having a relatively coarsely modulated image pitch (eg, 20 μm). Of course, in such embodiments, a selection ratio (eg, 5 to 1) exists between the modulated image pitch (eg, 20 μm) and the pitch of the incremental scale track pattern (eg, 4 μm). To do. In selected embodiments, a ratio of approximately 5 to 1 or higher to make high resolution for incremental scale track patterns available in encoder configurations that were previously designed for coarser incremental scale track pitches. (Eg, 10: 1, 20: 1, etc.) may be desired.

  FIG. 11 is a table 1100 showing parameters for various scale and detector track combinations for the encoder configuration of FIG. As shown in FIG. 11, for the first implementation, the incremental scale track pattern TINC2 is shown to have a pitch of p = 4 μm and the corresponding phase grating is structured light with a fringe period S = 5 μm. Create The imaging fringe period resulting from the modulated and spatially filtered image is f = 20 μm. The interpolation coefficient (indicating the necessary level of interpolation) is K = 40. The detector element is designed to have a pitch d = 15 μm. Of course, in some embodiments, the detector element pitch may be designed to be 1/4, 1/3, 2/3, or 3/4 of the fringe period f. In one embodiment, the detector element pitch may be 3/4 of a 20 μm fringe (in this example, the detector element pitch d = 15 μm).

  For the origin scale track pattern TREF2 in the first implementation, the pitch of the elements in each baker pattern is p ′ = 4.1 μm, while the corresponding phase grating is a fringe (similar to an incremental scale track pattern). Create structured light with period S = 5 μm. The imaging fringe period generated by the combination of structured light from the phase grating via the origin scale track pattern produces a modulated and spatially filtered imaging fringe period f '= 22.77 μm. The interpolation coefficient is K = 40. The pitch of the detector elements is d ′ = 17 μm. Due to the combined use of the incremental scale track pattern and the origin scale track pattern, the vernier synthesis wavelength (ff ′ / (f−f ′)) is equal to 164 μm. The length of each baker pattern of the origin scale track pattern is L = 136 μm (having 33 lines at a pitch p ′ = 4.1 μm). Of course, in some embodiments, the number of lines in the baker pattern may need to form a sufficient visible fringe (i.e., a very sufficient amount of swell frequency envelope portion), at the detector track. It can be properly detected as part of the generated modulated and spatially filtered image. Regarding the number of detector elements in the image array per track and area, and their total length, there are 8 elements (120 μm total length) per set for the incremental detector track DETINC1. For the origin detector track DETREF1, there are 8 elements (total length of 136 μm) for each set. The number of incremental cycles between Baker patterns is 150.

  As shown in FIG. 11, for the second implementation, the incremental scale track pattern TINC2 is shown to have a pitch of p = 8 μm and the corresponding phase grating is structured light with a fringe period S = 10 μm. Create The imaging fringe period resulting from the modulated and spatially filtered image is f = 40 μm. The interpolation coefficient is K = 27.6. The detector element is designed to have a pitch d = 10 μm. In at least one embodiment, the detector element pitch may be 1/4 of a 40 μm fringe (in this example, the detector element pitch d = 10 μm).

  For the origin scale track pattern TREF2 in the second implementation, the pitch of the elements in each baker pattern is p ′ = 8.3 μm, while the corresponding phase grating is a fringe (similar to an incremental scale track pattern). Structured light is created with a period S = 10 μm. The imaging fringe period generated by the combination of structured light from the phase grating via the origin scale track pattern produces a modulated and spatially filtered imaging fringe period f '= 48.8 μm. The interpolation coefficient is K = 27.6. The pitch of the detector elements is d ′ = 12.2 μm. Due to the combined use of the incremental scale track pattern and the origin scale track pattern, the vernier synthesis wavelength (ff ′ / (f−f ′)) is equal to 221.3 μm. The length of each baker pattern of the origin scale track pattern is L = approximately 195 μm (having 23 lines at a pitch p ′ = 4.1 μm). Regarding the number of detector elements in the image array per track and area, and their total length, there are 16 elements (160 μm total length) per set for the incremental detector track DETINC2. For the origin detector track DETREF2, there are 16 elements (total length of 195 μm) for each set. The number of incremental cycles between Baker patterns is 75.

  FIG. 12 is a substantial copy of a drawing contained in United States Patent Application 12 / 535,561 ('561 application) published as United States Pre-Grant Patent Publication 2011/0031383 (published' 383), which is incorporated herein by reference. Incorporated into the description. FIG. 12 may be understood based on the disclosure of the '561 application and will not be described in detail here. However, relevant teachings may be used in light of the principles disclosed herein.

  Briefly, FIG. 12 is a schematic cross-sectional view 700 showing different optical paths through the image channel 1280-1 of the double-sided telecentric encoder imaging arrangement 1270-1. Arrangement 770-1 is similar to the two-sided telecentric imaging arrangement 380, 880 and 1380 shown here. Patent Document 13 (the '789 application), which is incorporated herein by reference, is similar in form to the first lens (or lens array), and is a second lens that is inverted with respect to the first lens along the optical axis ( Various embodiments of a double-sided telecentric encoder arrangement that utilizes a lens array) to substantially correct lens aberrations of two similar lenses with each other to reduce aberrations in the resulting image. Of course, the teachings of the '789 patent address only the correction of lens aberrations that cause spatial distortion in the image of the scale pattern, i.e., distortion of the position of the pattern characteristic in the image. The embodiment shown in FIG. 12 provides the same type of correction of spatial distortion in the image when the first lens 1210-1 and the second lens 1210-1 'have similar aberrations. However, more difficult problems can arise in connection with interference effects that can appear in the image due to lens aberrations. The '789 patent does not address this issue. The '561 application does not address this issue, and its teaching is applicable to various embodiments. In particular, these teachings regarding shading and aperture dimensions may be applied in some embodiments according to the principles disclosed herein with appropriate adaptation.

  13A and 13B show a configuration 1300 that is another embodiment of a practical implementation of an encoder configuration according to the principles disclosed herein. Some components and operating principles of the encoder configuration 1300 are substantially similar to the encoder configuration 300 of FIG. 3 and / or the encoder configuration 800 of FIG. 8, and can be generally understood by analogy. For example, in FIG. 13, a series of numbers 13XX having the same suffix “XX” as a series of numbers 3XX in FIG. 3 may designate similar or identical components, which may be If there is no specific explanation or suggestion in 13B, it can function in the same way. In at least one embodiment, the dimensional relationships of the layouts shown in FIGS. 13A and 13B are shown in actual exemplary ratios to one another, but such relationships can be varied in various other embodiments. . In at least one embodiment, for reference, the dimension DIMM can be approximately 26.4 mm and the dimension DIMY can be approximately 48 mm. The dimension GAP can be approximately 1 mm. In one embodiment, other approximate dimensions can be measured based on these dimensions. Of course, this embodiment is merely illustrative and not limiting.

  As shown in FIG. 13, encoder configuration 1300 includes a scale element 1300, an illumination system / part 1360, and a two-sided telecentric imaging configuration 1380. The illumination system / unit 1360 includes a light source 1330 (e.g., a semiconductor laser or LED) that emits a visible or invisible wavelength of light 1331 (e.g., a wavelength of 655 [mu] m for a laser in one embodiment), and an opening 1335 , Collimating lens 1340 (or at least substantially collimating in the XY plane), polarizing beam splitter 1390, beam dump 1392, reflecting plate 1342, aperture element 1345, reflecting plate 1344, phase grating 1350, beam A splitter 1355 is included. A double-sided telecentric imaging configuration 1380 includes a first lens 1381 in the first lens plane, an opening 1382 in the aperture component 1382 ′ in the aperture plane, a second lens 1383 in the second lens plane, and detector electronics 1320 in the detection plane. With. The detector electronics 1320 may be connected to a signal generation / processing circuit (not shown). The light source 1330 may also be connected to the signal generation and processing circuit by power and signal connections (not shown).

  In operation, light 1331 (eg, primary light) emitted from the light source 1330 is transmitted through an opening 1335 that can block the stray portion of the light 1331. In at least one embodiment, the opening 1335 may have a diameter of 4 mm. The transmitted light can be substantially or completely collimated by lens 1340 and guided by beam splitter 1390. Z-polarized light passes through the polarization beam splitter 1390 as light 1331Z. Polarization beam splitter 1390 is configured to prevent the stray light from reflecting back to light source 1330. Such stray light is reflected as a beam 1391 toward the beam dump 1392 by the polarization beam splitter 1390.

  The light 1331Z passes through a quarter-wave plate 1393 that converts Z-polarized incident light into R circularly polarized light 1331C. The light that can be reflected by the subsequent element along the optical path is returned as L circularly polarized light and becomes X polarized light that returns through the quarter-wave plate 1393. Such X-polarized reflected light is blocked by the polarizing beam splitter 1390 and guided to the beam dump 1392 so that it does not return to interfere with the light source 1330 and does not create other unrelated rays. .

  The light 1331 </ b> C is reflected by the reflector 1342 and guided through the aperture element 1345. The aperture element 1345 shapes the light beam 1331C so that the light beam 1331C is reflected by the reflector 1344 and passes through the phase grating 1350 to become diffracted structured light 1331 ′ before the scale 1310 desired Illuminate a position (for example, a desired track position). In one embodiment, the opening 1345 may have an X width of 6 mm and a Y width of 1.5 mm.

  In at least one embodiment where the light source 1330 is a semiconductor laser that emits light of 655 μm wavelength, the scale element can have a grating pitch of 4.00 μm and the phase grating 1350 has a grating pitch of 4.44 μm. Can be configured to block zero-order light. The resulting amplitude modulation can have a period of approximately 20 μm.

  The scale element 1310 then reflects the diffracted structured light from the scale grating element to provide scale light 1332. Scale light 1332 includes the above-described modulation and is directed through beam splitter 1355 to be imaged on detector 1320 by double-sided telecentric imaging arrangement 1380. The double-sided telecentric imaging configuration 1380 functions to spatially filter the scale light 1332 according to the principles described above. As a result, the amplitude modulation period substantially coincident with the spatial filter period of the detector element of the detector 1320 is the primary intensity modulation of the scale light 1332 that ultimately causes signal fluctuations in the signal of the detector 1320. In at least one embodiment, the opening 1382 of the bilateral telecentric imaging arrangement 1380 has a diameter of approximately 1 mm and has a higher spatial frequency than the amplitude modulation element to block the zero order element of the scaled light 1332. Desired filtering of the spatial frequency elements of scale light 1332 may be provided. Another way of describing this is that the aperture 1382 is configured to prevent imaging of the phase grating and / or the scale grating.

  FIG. 14 shows a reference view of various beam paths in an embodiment of an encoder configuration 1400 that includes a coherent light source. Some components and operating principles of the encoder configuration 1400 are substantially similar to the encoder configuration 300 of FIG. 3 and / or the encoder configuration 800 of FIG. 8, and can be generally understood by analogy. For example, in FIG. 14, a series of numbers 14XX having the same suffix “XX” as a series of numbers 3XX in FIG. 3 may designate similar or identical components, which may be described below or in FIG. If there is no specific explanation or suggestion, it can function similarly. As shown in FIG. 14, the light source emits source light 1431. The phase grating 1450 divides the source light into structured illumination 1431 'composed of beam bundles of various diffraction orders. FIG. 14 shows a + 1st order beam bundle 1431p and a −1st order beam bundle 1431p that interfere to provide an illumination fringe pitch Pi. Of course, additional orders of ray bundles are present in the structured illumination 1431 '. However, for simplicity, only the + 1st order and the -1st order are shown in FIG. Scale 1410 receives structured illumination 1431 'and outputs scale light 1432 with a fringe having an envelope of period Pe. The period Pe can be derived as Pe = PgPi / (2Pi−Pg) from the viewpoint of the scale fringe pitch Pi and the scale pitch Pg. Of course, the width includes the phrase 2Pi, which is Pi in the case of non-coherent light.

  FIG. 15 is a partial schematic exploded view of an encoder configuration 1500 that includes an alternative embodiment of an illuminator 1560. Except for the illumination unit 1560, the components and operating principles of the encoder configuration 1500 are substantially similar to the encoder configuration 300 of FIG. 3, and can be generally understood by analogy. For example, in FIG. 15, a series of numbers 15XX having the same suffix “XX” as a series of numbers 3XX in FIG. 3 may designate similar or identical components, which are described in particular below. Or, if there is no suggestion, it can work in the same way. In the embodiment shown in FIG. 15, the encoder configuration 1500 suppresses or eliminates the illumination unit 1560 (more specifically, the aperture configuration 1572) from transmitting unwanted orders of light to the scale grating 1510, and the desired configuration. It is configured to allow only orders (eg, ± 1st order only). Thereby, the signal quality of the encoder configuration 1500 is improved compared to the configuration described above. The inventors have found that for the encoder arrangement disclosed herein, the residual next order light causes periodic fluctuations in the resulting signal at the detector. It has been found that such fluctuations can appear in alternate periods of the signal rather than appearing every period of the signal at the detector, reducing the ability to compensate and / or interpolate the resulting signal. For this reason, the illumination configurations disclosed below are particularly useful in combination with the encoder configurations taught herein, although their usefulness is not limited to such configurations.

  In addition to components 1530, 1540 and 1550 whose operation can be understood based on the similar components described above, the illuminator 1560 includes a first filter lens 1571, a spatial filter aperture configuration 1572, and a second filter lens 1573. Is further included. Spatial filter aperture configuration 1572 is generally installed at the focal plane of first filter lens 1571. The second filter lens 1573 is installed on a plane located substantially at a distance corresponding to the focal length from the spatial filter aperture configuration 1572. In operation, illumination grating 1550 outputs diffracted structured light 1531 'in the same manner as in FIG. The diffracted structured light 1531 ′ is focused on the plane of the spatial filter aperture configuration 1572 by the first illumination lens 1571. The spatial filter aperture configuration 1572 is configured to block zero-order diffracted light from the diffracted structured light 1531 ′ and to block higher-order diffracted light at both ends of the spatial filter aperture configuration 1572, and the aperture 1572op. Is used to transmit a spatially filtered structured illumination 1531 '' containing only + 1st and -1st order diffracted light elements. In the embodiment shown in FIG. 15, the spatial filter aperture configuration 1572 is configured with a central portion 1572c surrounded by an aperture 1572op that includes symmetrically positioned slits. In some alternative embodiments, the spatial filter aperture configuration may include a central circular aperture surrounded by an annular aperture. Second illumination lens 1573 receives spatially filtered structured light 1531, and spatially filtered structured illumination 1531 ″ comprising + 1st and −1st order diffracted light elements into scale grating 1510. Is output for the scale pattern 1515 in the plane that coincides with. The widths of the central portion 1572c and the opening portion 1572op along the measurement axis direction can be determined by analysis or experiment. In general, as described above, the zero-order light is blocked and +/− 1 in this specific example. It is selected to transmit the next diffracted light.

As a matter of course, the zero-order light output from the scale grating 1510 can be suppressed or removed by the imaging unit 1580. Alternatively, and more specifically, the aperture configuration, critical aperture 1580, can be configured to spatially filter zero order light. However, in some embodiments, the first filter lens 1571 has an angle of focus (eg, 1 °) that is approximately 10 times larger than the angle (eg, 0.1 °) at the critical aperture 1582. May be matched to the spatial filter aperture configuration 1572. In such an embodiment, the critical aperture 1582 is much more sensitive to misalignment than the spatial filter aperture configuration 1572. For this reason, it is more beneficial to block the zero-order light in the illumination unit 1560 than to block it in the imaging unit 1580. Further, in the embodiment shown in FIG. 15, the illumination grating 1550 may be an amplitude grating (as opposed to the phase grating 350). This reduces the manufacturing cost of encoder configuration 1500. In the embodiment shown in FIG. 3, the encoder arrangement 300 has practical limitations with respect to how far the scale pattern 315 can be placed from the phase grating 350. If the scale pattern 315 is placed too far away from the phase grating 350, the two diffraction orders (eg, + 1st order and −1st order) do not overlap and provide diffracted structured light 331 ′. For that it will not interfere. However, the illumination unit 1560 is configured to image the diffracted structured light 1531 ′ from a plane that substantially matches the illumination grating 1550. This allows for a larger opening gap than the encoder configuration 300. In addition, the illumination unit 1560 can provide the source light more efficiently. This is because the interfering orders most overlap in the plane of the illumination grating 1550. If necessary, the modulated image pitch _{P IMESF} the desired first suitable combination of filters lens 1571 and the second filter lens 1573 having a selected focal length so as to provide a pitch _{P MI} illumination fringe pitch pattern IFP You may adjust by selecting. Compared to the configuration disclosed in the earlier US patent application 13 / 717,586, the present application provides additional design freedom for configuring the encoder 1500, resulting in modulation of the spatially filtered pattern. Match the image pitch to the pitch of a given detector. Modified image pitch _{P MI} is, for example, in accordance with the principles outlined in FIG 4A~ Figure 4D, may be selected to provide a desired relationship between the scale pitch _{P SF} and modulation image pitch _{P IMESF.}

  FIG. 16 is a partial schematic exploded view of an illuminator 1660 that may be used in a reflective encoder configuration 1600 according to the principles disclosed herein. The components and operating principles of the encoder configuration 1600 are substantially similar to the encoder configuration 1500 of FIG. 15 and can be generally understood by analogy. For example, in FIG. 16, a series of numbers 16XX having the same suffix “XX” as a series of numbers 15XX in FIG. 15 may designate the same or the same constituent elements, and the constituent elements are described below in particular. Or, if there is no suggestion, it can work in the same way. In the embodiment shown in FIG. 16, illumination unit 1660 further includes a polarizer 1676, a polarization beam splitter 1677, and a quarter wave plate 1678. In contrast to encoder configuration 1500, which is a transparent configuration, encoder configuration 1600 is a reflective configuration. The transmissive configuration 1500 can be readily employed in a reflective configuration similar to that described with reference to FIG. 16 or by analogy with other reflective configurations disclosed herein. However, the addition of a polarizer according to the principle taught with reference to FIG. 16 provides a more efficient use of light, as will be described in more detail below. Use of such a polarizer may be suitable for use with the compatible embodiments described herein.

  In operation, the polarizer 1676 receives coherent collimated light 1631 from the lens 1640 and outputs linearly polarized collimated light. The polarizing beam splitter 1677 reflects the spatially filtered structured illumination 1631 ″ from the second filter lens 1673 to the quarter wave plate 1678. The quarter wave plate 1678 circularly polarizes the spatially filtered structured illumination 1631 ″ from the second filter lens 1673 and outputs it to the scale pattern 1615. Scale pattern 1615 reflects spatially modulated image light 1632 with circular polarization to quarter-wave plate 1678. The quarter-wave plate 1678 receives the spatially modulated image light 1632 accompanied by circularly polarized light, and the structured illumination that receives the spatially modulated image light 1632 from the second filter lens 1673. Output to polarization beam splitter 1677 with linearly polarized light rotated 90 ° relative to 1631 ″. Polarization beam splitter 1677 transmits spatially modulated image light 1632 accompanied by linearly polarized light to imaging unit 1680. Quarter wave plate 1678 returns spatially modulated image light 1632 back to polarizing beam splitter 1677 with polarization rotated by 90 ° (and thus to match the polarization direction transmitted through beam splitter 1677). ) The amount of light output to the imaging unit 1680 increases due to four factors compared to the configuration lacking the quarter-wave plate 1678.

  FIG. 17 is a diagram of an illumination unit 1760 that may be used in an encoder configuration 1700 according to the principles disclosed herein. The components and operating principles of the encoder configuration 1700 are substantially similar to the encoder configuration 300 of FIG. 3 and can be generally understood by analogy. For example, in FIG. 17, a series of numbers 17XX having the same suffix “XX” as a series of numbers 3XX in FIG. 3 may designate similar or identical components, which are described in particular below. Or, if there is no suggestion, it can work in the same way.

  In the embodiment shown in FIG. 17, the encoder configuration 1700 includes a scale track 1715 in which the illuminator 1760 images only the desired order (eg, ± 1st order only) onto the detector configuration 1725 by the imaging configuration 1780. Configured to transmit to a part. As shown in FIG. 17, the light source 1730 is configured to output source light 1731 having a wavelength λ. In some embodiments, the light source 1730 is a semiconductor laser, a spatially coherent LED, and one of a series of independent sources arranged perpendicular to the measurement axis direction 82 (e.g., slits or equidistant or periodic). LED point source providing a spatially coherent source light 1731 line source that is masked with a typical grating and cumulatively contributes to the interference fringe pattern IFP. The collimation unit 1740 (for example, a collimating lens) is arranged so as to collimate the source light 1731. Structured illumination generator 1770 is configured to receive source light 1731 and provide structured illumination 1731 '. Here, the structured illumination 1731 ′ includes an illumination fringe pattern IFP that is oriented transversely to the measurement axis direction 82 and input to the scale track 1715. The scale track 1715 is configured to spatially modulate the input illumination fringe pattern IFP and output scale light including spatially modulated image light. Detector arrangement 1725 and imaging arrangement 1780 are configured such that only scale light originating from the imaging area IR of scale track 1715 is imaged onto detector arrangement 1780. The operation of imaging configuration 1780 and detector configuration 1725 is similar to the operation of imaging configuration 380 and detector configuration 325 and can be understood by analogy to the description. The structured illumination generation unit 1770 includes a beam separation unit 1771 and an illumination grating 1750. The beam separation unit includes a beam splitter 1777 and a reflection plate 1778. In the specific embodiment shown in FIG. 17, a collimation unit 1740 is installed between the light source 1730 and the beam separation unit 1771, but in other embodiments, the collimation unit is located between the light source and the illumination grating. It can be installed in the position. For example, in an alternative embodiment, the collimation unit 1740 may be installed between the beam separation unit 1771 and the illumination grating 1750. In some embodiments, the collimation portion may be arranged to collimate the first source light portion and the second source light portion that are output to the illumination grating. The beam separation unit 1771 is arranged to input the source light 1731 and is configured to output the first source light portion 1731A and the second source light portion 1731B to the illumination grating 1750, and thus the first The source light portion 1731A and the second source light portion 1731B form beams spaced apart from each other along the measurement axis direction 82. More specifically, the beam splitting surface 1775 of the beam splitter 1777 receives the source light 1731, reflects the first source light portion 1731A along the first beam path, and directs the second source light portion 1731B toward the reflector 1778. Configured to transmit. The reflector 1778 is configured to reflect the second source light portion 1731B along a second beam path that is spaced apart from the first beam path. In the embodiment shown in FIG. 17, beam splitting surface 1775 and reflector 1778 are parallel and independent element surfaces. Since the beam splitting surface 1775 and the reflector 1778 are parallel, the first source light portion 1731A and the second source light portion 1731B are parallel in the plane closest to the illumination grating 1750. In some embodiments (eg, the embodiment shown in FIG. 19), beam splitting surface 1775 and reflector 1778 may be the same beam splitting element surface. In the embodiment shown in FIG. 17, the first and second beam paths are substantially perpendicular to the illumination grating. The illumination grating 1750 is configured to diffract the first and second source light portions 1731A and 1731B into the scale track 1715 over the operating gap, so that only two orders of diffracted light (ie, as shown in FIG. 17). In the embodiment, a plane in which the + 1st order diffracted light portion 1731A ′ from the first source light portion 1731A and the −1st order diffracted light portion 1731B ′) from the second source light portion 1731B coincide with the scale track 1715. And the illumination fringe pattern IFP is provided in the imaging region IR. In contrast to the embodiment shown in FIGS. 15 and 16, the illuminator 1760 outputs zero order light portions 1731ZA ′ and 1731ZB ′ reaching the scale track 1715. However, the zero order light portions 1731ZA 'and 1731ZB' are completely outside the imaging region IR that is imaged onto the detector arrangement 1725. Thus, the operations associated with the illumination fringe pattern IFP in the imaging region of the scale track 1715 that is imaged by the imaging arrangement 1780 to the detector arrangement 1725 even though the zero order light portions 1731ZA ′ and 1731ZB ′ are not blocked. It does not contribute to unnecessary zero order light for the signal.

  In the embodiment shown in FIG. 17, the beam separator 1771 may further include an optional dual beam aperture element 1772. The dual beam aperture element 1772 includes two apertures configured to transmit the first source light portion 1731A and the second source light portion 1731B while reducing unnecessary stray light. Also, the dual beam aperture element 1772 can refine the position and spacing of the first source light portion 1731A and the second source light portion 1731B reaching the scale track 1715.

  As shown in FIG. 17, the imaging region IR has a width D along the measurement axis direction. The first source light portion 1731A and the second source light portion 1731B are spaced apart from each other along the measurement axis direction 82 by a separation distance B in the plane immediately adjacent to the illumination grating 1750. The separation distance B is not less than the width D of the imaging region. In the immediate plane of the illumination grating 1750, the first source light portion 1731A has a width W1, and the second source light portion 1731B has a width W2. Both W1 and W2 are larger than the width D of the imaging region. This separates the zero-order light portions 1731ZA ′ and 1731ZB ′ by a sufficient distance in the immediate plane of the illumination grating 1750, while the imaging region is spatially modulated illumination fringes according to the principle described above. Can be filled with patterns. Thus, the zero order light portions 1731ZA 'and 1731ZB' will not overlap the + 1st order portion 1731A 'and the -1st order portion 1731B' and, more importantly, are outside the range of the imaging region.

  In the embodiment shown in FIG. 17, the first source light portion 1731A and the second source light portion 1731B are parallel in the plane closest to the illumination grating. Of course, in some embodiments, the two source light portions are not parallel, the gap distance between the illumination grating 1750 and the scale track 1715, and / or the period of the illumination grating 1750 or the scale track 1715. May be adjusted, resulting in a desired fringe period of the interference fringe pattern IFP imaged onto the detector arrangement 1725.

  FIG. 18 is a diagram of an illuminator 1860 that may be used in an encoder configuration 1800 according to the principles disclosed herein. The components and operating principles of encoder configuration 1800 are substantially similar to encoder configuration 1700 of FIG. 17 and can be generally understood by analogy. For example, in FIG. 18, a series of numbers 18XX having the same suffix “XX” as a series of numbers 17XX in FIG. 17 may designate the same or the same constituent elements, and the constituent elements are described below in particular. Or, if there is no suggestion, it can work in the same way.

  In the embodiment shown in FIG. 18, the light source 1830 is configured to output the source light 1831 to a collimating lens 1840 configured to collimate it. The illuminator 1860 includes a beam separator 1871 comprising an aperture element 1872 that includes a dual aperture 1872op. The aperture element 1872 is configured to separate the first source light portion 1831A and the second source light portion 1831B of the source light 1831 and output them to the illumination grating 1850, so that these source light portions are the principle described above. Accordingly, beams spaced apart from each other along the measurement axis direction 82 are formed. In particular, they are such that only two orders of diffracted light (ie, the + 1st order portion 1831A ′ and the −1st order portion 1831B ′) overlap within the imaging region IR in a plane that coincides with the scale track 1815. Composed. The zero order light portions 1831ZA 'and 1831ZB' do not contribute to unwanted zero order light for the operating signal associated with the illumination fringe pattern IFP in the image area of the scale track 1815.

  FIG. 19 is a diagram of an illuminator 1960 that may be used in an encoder configuration 1900 according to the principles disclosed herein. The components and operating principles of encoder configuration 1900 are substantially similar to encoder configuration 1700 of FIG. 17 and can be generally understood by analogy. For example, in FIG. 19, a series of numbers 19XX having the same suffix “XX” as a series of numbers 17XX in FIG. 17 may designate the same or the same components, and the components will be described in particular below. Or, if there is no suggestion, it can work in the same way.

  In the embodiment shown in FIG. 19, the structured illumination generator 1970 includes a beam separator 1971 having a shearing / shear plate 1977. The shearing plate 1977 reflects the first source light portion 1931A in the first region of the first surface 1977A and transmits the second source light portion 1931B reflected from the second surface 1977B to transmit the first source light portion 1931A. It is configured to output in the second area. The illumination grating 1950 is configured to input the first source light portion 1931A and the second source light portion 1931B, so that the first source light portion 1931A and the second source light portion 1931B are measured in accordance with the principle described above. Form spaced beams spaced apart from each other along direction 82. The reflectivity values of the first surface 1977A and the second surface 1977B can be adjusted to give substantially the same intensity to the first source light portion 1931A and the second source light portion 1931B. For example, the first surface 1977A can have a reflectivity of about 25% and the second surface 1977B can have a reflectivity of about 100%. In other embodiments, the first surface 1977A can have a reflectivity of about 50% and the second surface 1977B can have a reflectivity of about 100%. Also, the front surface 1977C may have a reflectance of 0%, and the second source light portion 1931B exits the shearing plate 1977. The beam separation unit 1971 allows only two orders of diffracted light (ie, the + 1st order portion 1931A ′ and the −1st order portion 1931B ′) to overlap within the imaging region IR in a plane that coincides with the scale track 1915. Configured. The zero order light portions 1931ZA 'and 1931ZB' do not contribute to unwanted zero order light for the operating signal associated with the illumination fringe pattern IFP in the image area of the scale track 1915.

  FIG. 20 is a diagram of an illumination unit 2060 that may be used in an encoder configuration 2000 according to the principles disclosed herein. The components and operating principles of encoder configuration 2000 are substantially similar to encoder configuration 1900 of FIG. 19 and can be generally understood by analogy. For example, in FIG. 20, a series of numbers 20XX having the same suffix “XX” as a series of numbers 19XX in FIG. 19 may designate the same or the same components, and the components will be described below in particular. Or, if there is no suggestion, it can work in the same way.

  In the embodiment shown in FIG. 20, the illumination unit 2060 includes a beam separation unit 2071. The beam separation unit 2071 includes a first beam conducting element 2077 and a second beam conducting element 2078. The first beam conducting element 2077 reflects the first source light portion 2031A from the first surface 2077A and transmits the second source light portion 2031B reflected from the second surface 2077B to the second beam conducting element 2078. Configured to output. The second beam conducting element 2078 is configured to reflect the second source light portion 2031B from the surface 2078A to the illumination grating 2050 and reflect the first source light portion 2031A from the surface 2078C to the illumination grating 2050. In some embodiments, the first beam conducting element 2077 is a shearing plate. In some embodiments, the second beam conducting element 2078 is a shearing plate. In some embodiments, the surface 2078A includes a reflective coating useful in embodiments where the first beam conducting element 2077 is a shearing plate. This is to prevent the additional source light portion from being transmitted through the surface 2078A, thereby preventing the second source light portion 2031B from being split into two source light portions. In some embodiments, the second beam conducting element 2078 is configured to transmit the first source light portion 2031A via the anti-reflection surface 2078B. In some embodiments, surface 2078A and antireflection surface 2078B may be configured according to a combination of reflectance values similar to those described for first surface 1977A and second surface 1977B in FIG. Anti-reflective surface 2078B is useful when beam conducting element 2078 is a shearing plate. This is to prevent the additional source light portion from being reflected from the beam conducting element 2078, thereby preventing the first source light portion 2031A from being split into two source light portions. Instead of a 100% reflective coating on the antireflective surface 2078B, an aperture similar to the dual beam aperture element 1772 of FIG. 17 may be used to block unwanted light from the split light portion. The illumination unit 2060 is advantageous in that the first source light portion 2031A and the second source light portion 2031B have the same optical path length and wavelength dependency.

  In some embodiments, the second beam conducting element 2078 includes a reflective surface 2078A and a compensation prism 2078D (shown in dotted lines). In such an embodiment, the reflective surface 2078A may be a mirror and the compensating prism 2078D is configured so that the first source light portion 2031A and the second source light portion 2031B have equivalent optical path length and wavelength dependence. It may be configured.

  FIG. 21 is a diagram of an illuminator 2160 that may be used in an encoder configuration 2100 according to the principles disclosed herein. The components and operating principles of the encoder configuration 2100 are substantially similar to the encoder configuration 1700 of FIG. 17 and can be generally understood by analogy. For example, in FIG. 21, a series of numbers 21XX having the same suffix “XX” as a series of numbers 17XX in FIG. 17 may designate the same or the same components, and the components will be described in particular below. Or, if there is no suggestion, it can work in the same way.

  In the embodiment shown in FIG. 21, the illumination unit 2160 includes a beam separation unit 2171. The beam separation unit 2171 includes a first grating 2190, a second grating 2191, a blocking element 2192, and an opening element 2193. The first grating 2190 includes the first source light portion 2131A and the second source, which are the + 1st order and −1st order (or higher order symmetrically matched) light diffracted from the first grating 2190. The optical portion 2131B is configured to be divided. The second grating 2191 (which in some embodiments has the same period as the first grating 2190) receives the first source light portion 2131A and the second source light portion 2131B and is parallel to each other. The portion 2131AP and the second parallel collimated light portion 2131BP are configured to be output. The aperture element 2193 receives the first parallel collimated light portion 2131AP and the second parallel collimated light portion 2131BP, and removes the other additional orders of light diffracted from the second grating 2191, while removing the first parallel collimated light portion 2131BP. The light portion 2131A ′ and the second parallel collimated light portion 2131B ′ are configured to be transmitted to the illumination grating 2150. In some embodiments, the first grating 2190 and the second grating 2191 may be phase gratings for highest efficiency.

  FIG. 22 is a diagram of an illuminator 2260 that may be used in an encoder configuration 2200 according to the principles disclosed herein. The components and operating principles of the encoder configuration 2200 are substantially similar to the encoder configuration 2100 of FIG. 21, and can be generally understood by analogy. For example, in FIG. 22, a series of numbers 22XX having the same suffix “XX” as a series of numbers 21XX in FIG. 21 may designate the same or the same constituent elements, and the constituent elements are described below in particular. Or, if there is no suggestion, it can work in the same way.

  The illuminator 2260 incorporates many of the same components of the illuminator 2160 shown in FIG. 21 into a compact optical arrangement that utilizes a reflective grating element rather than a transmissive grating element.

  In the embodiment shown in FIG. 22, the illumination unit 2260 includes a light source 2230, a collimator lens 2240, and a structured illumination generation unit 2270. The structured illumination generation unit 2270 includes a beam separation unit 2271. The beam separation unit 2271 includes a first grating 2290, a second grating 2291, a blocking element 2292, an opening element 2293, and a reflection plate 2241. The light source 2230 is configured to output the source light 2231 to the collimating lens 2240. The collimating lens 2240 is configured to collimate the sole light 2231 and output it to the reflection plate 2241. The reflection plate 2241 is configured to reflect the source light 2231 to the first grating 2290. The first grating 2290 includes the first source light portion 2231 </ b> A and the second source that are the + 1st order and −1st order (or higher order symmetrically matched) light diffracted from the first grating 2290. It is comprised so that it may divide | segment into the optical part 2231B. The blocking element 2292 is configured to block the zero-order element from the first grating 2290. The second grating 2291 is configured to receive the first source light portion 2231A and the second source light portion 2231B and to output a first parallel collimated light portion 2231AP and a second parallel collimated light portion 2231BP that are parallel to each other. The aperture element 2293 receives the first parallel collimated light portion 2231AP and the second parallel collimated light portion 2231BP, and removes the other additional orders of light diffracted from the second grating 2291, while the first parallel collimated light portion 2293BP. The light portion 2231AP and the second parallel collimated light portion 2231BP are configured to be transmitted to the illumination grating 2250.

  The imaging configuration 2280 includes a first lens 2281, an opening 2282, a second lens 2283, and a reflector 2284. The reflector 2284 is configured to reflect the scale light 2232 to the imaging configuration 2280.

FIG. 23A illustrates an embodiment of a scale pattern 2315 that includes an offset grating portion that may be used in an encoder configuration according to the principles disclosed herein. It has been found that non-ideal manufacturing and / or alignment of optical components in the various embodiments disclosed herein can result in non-uniform amplitudes of AC fringes on the detector. Scale pattern 2315 alleviates this problem as outlined below with reference to FIGS. 23B and 23C. The scale pattern 2315 includes a scale grid 2310. The scale grating 2310 includes a first scale grating part 2310A and a second scale grating part 2310B arranged in parallel with each other along the measurement axis direction MA. First scale grating portion 2310A and the second scale grating portion 2310B has a scale pitch _{P SF,} respectively. Second scale grating portion 2310B, to the first scale grating portion has a spatial phase offset of 0.5 _{* P SF.} The scale lattice 2310 also includes a third scale lattice portion 2310C and a fourth scale lattice portion 2310D. The third scale grating portion 2310C and the fourth scale grating portion 2310D each have a scale pitch P _SF and are arranged with a spatial phase offset of 0.5 * P _SF . Third scale grating portion 2310C has the same phase as first scale grating portion 2310A along measurement axis direction MA. Each of the scale grating portions 2310A to 2310D may be illuminated and imaged simultaneously for a single position measurement, for example, in a manner similar to the incremental track pattern TINC2 shown in FIG.

  FIG. 23B schematically shows the alignment of the composite strength contribution of each scale grid portion of FIG. 23A to the scale image SI. As described above, the scale lattice portions 2310A to 2310D (or any single-phase lattice) can individually contribute to the irregular scale image intensity contributing portions SI-A to SI-D, and used alone for displacement measurement. In some cases, this can lead to displacement measurement errors. FIG. 23C shows the intensity in the scale image SI including the composite intensity contribution of each of the scale image portions SI-A to SI-D. As shown in FIG. 23C, the alignment of the contributions of the scale image portions SI-A to SI-D produces a consistent intensity amplitude within the scale image SI, despite the various contribution irregularities.

Of course, a most basic embodiment, the same scale grating with an offset portion, the first and second scales having a phase offset of 0.5 * P _SF each other according to the principles described with respect to FIG. 23A Only the lattice portion (or in addition, the third scale lattice portion) may be included. Alternatively, a similar scale grating has a phase offset of 0.5 * P _SF each pair with each other (e.g., narrower and more along the Y-direction) may include scale grating portion of three or more pairs. In each case, the width of the scale grating portion in the Y direction is such that the offset intensity contribution from the imaging region of the offset grating portion contributes to substantially the same amount to generate a signal having a substantially constant amplitude shown in FIG. 23C. Should be adjusted.

  FIGS. 24A and 24B show schematic diagrams of first and second encoder configurations 2400A and 2400B configured to use enlarged scale grating regions to mitigate potential error sources. Except as described below, the embodiment shown in FIGS. 24A and 24B may include elements and sides similar to those shown in the previous drawings.

Fine dispersion of the scale pitch P _SF may be due to the manufacturing process errors. This variation can cause medium distance errors in displacement measurements along scale elements such as scale element 2410A (or 2410B). One solution to reduce this mode error is, like the first and second encoder configurations 2400A and 2400B, the area of the scale grating that contributes to the signal generation image of the imaging configuration to average out such errors. Is to expand. Incidentally, in the embodiment shown in FIG. 3, the scale element 110 is separated from the first lens plane FLP by a distance d _{0 that} is nominally equal to the focal length f of the first lens 181, and the scale light beam corresponding to the width FR is generated. 3 is included in the signal generation image of the encoder configuration of FIG. In contrast, imaging configuration 2480A (or 2480B), the scale element 2410A (or 2410b) is only spaced apart a distance _{d 0} from the first lens plane FLP, the focal length f of the first lens 2481A (or 2481B) It is configured to come off. More specifically, the scale element 2410A (or 2410B) is installed at a position below the focal length f of the imaging configuration 2480A (2480B) along the optical axis of the imaging configuration 2480A (or 2480B). Compared to the configuration shown in FIG. 3, additional scale rays corresponding to the width ER may be included in the signal generation image of the encoder configuration 2400A (2400B).

  While an embodiment such as that shown in FIG. 3 can obtain an image of the effective field on a 4 mm scale, an embodiment such as that shown in FIG. 24A (FIG. 24B) can obtain an image of the effective field on a 5 mm scale. Can get. In addition, reducing the distance between imaging configuration 2480A (2480B) and scale element 2410A (2410B) allows for a more compact encoder configuration.

FIG. 24A shows a transparent scale configuration. In various embodiments employing a transparent scale configuration, the scale element 2410A is positioned at a distance d _{1 of} at most 2 mm from the phase grating 2450A. In an alternative configuration using a reflective scale, the scale element may be arranged at a distance d _{1 of} at most 6 mm from the phase grating of the illuminator along the optical path of the imaging configuration. In some embodiments of the configuration shown in FIG. 24A, scale element 2410A may have a scale pitch of 4 μm and phase grating 2450A may have a pitch of 4.444 μm. In some embodiments of the configuration shown in FIG. 24B, the scale elements 2410B may have a scale pitch of 4 μm, and the phase grating 2450B of the illumination unit 2460B may have a pitch of 3.635 μm. Making the pitch of phase grating 2450B smaller than phase grating 2450A allows for a shorter distance d ₁ between phase grating 2450B and scale grating 2410B for a given value of image pitch P _IMESF .

FIGS. 25A-25C show schematic diagrams of embodiments of encoder configurations 2500A, 2500B, and 2500C. Conceptually, in each of encoder configurations 2500A, 2500B, and 2500C, a scale element is disposed at a roll angle α with respect to the measurement axis with respect to a plane parallel to the measurement axis and perpendicular to the optical axis of the imaging unit, and the illumination unit Phase gratings are arranged with a roll angle β about the measurement axis. In various embodiments, as discussed with respect to the previous drawings, unwanted residual zero order light received by the imaging unit can cause effects that interfere with the desired position signal, resulting in short range errors. One state in which this may appear is through a blurred self-image plane that carries an image of the scale grating incident on the detector section. One means to alleviate this is to place a scale element or illuminator phase grating with a small roll or pitch relative to the measurement axis. This means can cause a plurality of self-image planes to enter the detector section so as to have a phase offset with respect to each other, thereby averaging short-range errors. For this purpose, in some embodiments, a non-zero roll or pitch angle is introduced so that at least the self-image plane and the inverse image plane are incident on the detector section, as described below. Is desirable. In an embodiment, the optical path of the imaging unit is rotated at a roll angle or pitch angle about the measurement axis such that the scale grating is at least 0.1 degrees in a plane perpendicular to the scale grating and parallel to the measurement axis. As described above, the image forming unit may be arranged. In some embodiments, the phase grating of the illuminator has a roll angle between the phase grating plane and the scale grating plane (2 * B * M * P) in a plane perpendicular to the scale grating and parallel to the measurement axis. You may install with respect to a scale grating | lattice so that it may become equal to _PG ^ 2) / (H * (lambda)). Here, B is a number between 0.75 and 1.25, M is the magnification of the imaging unit, P _PG is the pitch of the phase grating of the illumination unit, and H is the measurement axis. Is the height of the field of view of the detector section that is perpendicular to λ, and λ is the wavelength of the illumination. In one embodiment, the encoder configuration is obtained with a phase grating pitch P _PG that is 4.444 μm, a magnification M that is 1 ×, and a height H that is 1000 μm, so that the roll angle is 3.5 degrees. possible. In some embodiments, the phase grating of the illuminator has a pitch angle between the phase grating plane and the scale grating plane (2 * B * M * P) in a plane perpendicular to the scale grating and parallel to the measurement axis. You may install with respect to a scale grating | lattice so that it may become equal to _PG ^ 2) / (V * (lambda)). Here, V is the length of the field of view of the detector section along the measurement axis, and B is a number between 0.75 and 1.25.

  For example, FIGS. 25A-25C illustrate three embodiments with a roll angle of 3.5 degrees between the phase grating and the scale element. The encoder configurations 2500A, 2500B, and 2500C are scales that are arranged at a roll angle α with respect to the measurement axis with respect to a plane that is parallel to the measurement axis MA (ie, the X direction) and perpendicular to the optical axis of each of the imaging units 2580A, 2580B, and 2580C. Elements 2510A, 2510B and 2510C are included, respectively. The illumination units 2560A, 2560B, and 2560C are arranged at a roll angle β with respect to the measurement axis with respect to a plane parallel to the measurement axis MA (that is, the X direction) and perpendicular to the optical axis of each of the imaging units 2580A, 2580B, and 2580C. Includes gratings 2550A, 2550B and 2550C. In encoder configuration 2500A, α is 3.5 degrees and β is 0 degrees. In encoder configuration 2500B, α is 1.75 degrees and β is −1.75 degrees. In encoder configuration 2500C, α is 0 degrees and β is 3.5 degrees. In each case, the net roll angle between the elements is 3.5 degrees, so that the self-image plane SIMG and the reverse (reverse phase) image plane IIMG are incident on the detector portion indicated by the detection plane DP, and are unnecessary. Substantially cancels the influence of self-image caused by residual zero-order light. Each of encoder configurations 2500A, 2500B, and 2500C has a field of view having a height H perpendicular to the measurement axis direction and a length V along the measurement axis direction that determines the optimum roll angle or pitch angle as described above. I have. The length V is not shown because the direction is the page, that is, the X-axis direction.

  The embodiment shown in FIGS. 25A-25C shows the roll angle between the scale element and the phase grating of the illuminator, but it should be understood that (an axis perpendicular to the measurement axis and parallel to the scale grating, eg The pitch angle (with respect to the Y axis) also has the desired effect. In various embodiments, the scale grating or the phase grating of the illumination section, or both, are arranged at a pitch angle with respect to a plane parallel to the measurement axis and perpendicular to the optical axis of the imaging section, and approximately 0. Provide a relative pitch of 1 degree or more. In each case, the relative pitch angle is determined by the influence of the self-image caused by unnecessary residual zero-order light when at least one self-image plane SIMG and the opposite (anti-phase) image plane IIMG are incident on the detector unit at the detection plane DP. Is selected to substantially cancel.

  While various embodiments of the present invention have been shown and described, numerous variations in the structure and operation sequence of the features shown and described will be apparent to those skilled in the art based on this disclosure. Thus, it will be appreciated that various modifications can be made without departing from the spirit and scope of the invention.

  This application claims priority based on United States patent application 14 / 290,846 filed May 29, 2014, the entire disclosure of which is incorporated herein.

100, 300, 700, 800, 900, 1300, 1500, 1600, 1700, 1800, 1900, 2000, 2100, 2200, 2400A, 2400B, 2500A, 2500B, 2500C Encoder configuration 110, 310, 710, 810, 910, 1310 , 2410A, 2410B, 2510A, 2510B, 2510C Scale element 115, 315, 1515, 1615, 2315 Scale pattern 120, 320, 720, 820, 1320, 1520, 2220 Detector electronics 125, 325, 725, 825, 2525 1825, 1925, 2025, 2125 Detector configuration 126, 326, 1526 Signal processing circuit 131, 331, 731, 831, 1331, 1431 Light 132, 332, 732, 83 , 1432, 1532, 2232 scale light 133, 333, 733, 833, 1533 spatially filtered image light 140, 340, 740, 840, 940, 1540, 1640 lenses 180, 380, 780, 880, 1380 bilateral telecentric Image formation 181, 381, 1581, 2481 A, 2481 B First lens 182, 382, 1335, 1572 op, 1672 op Aperture 183, 383, 1583 Second lens 190, 390, 1590 Signal generation / processing circuit 930, 1330, 1530, 1630, 1730, 1830, 1930, 2030, 2130, 2230 Light source 350, 850, 950A, 950B, 1350, 1450, 2450A, 2450B, 2550A, 2550B, 2550C Phase grating 36 , 760, 860, 1360, 1560, 1660, 1760, 1860, 1960, 2060, 2160, 2260 Illumination system / part 755, 855, 955, 1355, 1390, 1777 Beam splitter 770 Double telecentric encoder imaging arrangement 781, 881 1381 1st lens array 782, 882, 1382 Aperture array 783, 883, 1383 Second lens array 1100 Table 1340 Collimating lens 1342, 1344, 1778, 2241, 2240, 2284 Reflector 1391 Beam 1392 Beam dump 1393, 1678 1 wave plate 1410 scale 1510, 1610, 2310 scale grating 1531 structured light 1550, 1650, 1750, 1850, 1950, 2050, 2150, 2250 Bright grating 1571, 1671 First filter lens 1572, 1672 Spatial filter aperture configuration 1572c, 1672c Central portion 1573, 1673 Second filter lens 1580, 1680, 2580A, 2580B, 2580C Imaging portion 1582 Limit aperture 1631 Collimated light 1632 Spatially Modulated image light 1676 Polarizer 1677 Polarization beam splitter 1715, 1815, 1915, 2015, 2115, 2215 Scale track 1731, 1831, 1931, 2031, 2131, 2231 Source light 1731A, 1831A, 1931A, 2031A, 2131A, 2131A 1 source light portion 1731B, 1831B, 1931B, 2031B, 2131B, 2231B second source light portion 1740 collimation unit 1770, 870, 1970, 2070, 2170, 2270 Structured illumination generator 1771, 1871, 1971, 2071, 2171, 2271 Beam separator 1772 Dual beam aperture element 1775 Beam splitting surface 1780, 1880, 1980, 2080, 2180, 2280, 2480A , 2480B Imaging configuration 1840, 1940, 2040, 2140, 2240 Collimating lens 1872, 2193, 2293 Aperture element 1872op Dual aperture 1977 Shearing plate 1977A, 2077A First surface 1977B, 2077B Second surface 1977C Front surface 2077 First beam conduction Element 2078 Second beam conducting element 2078A, 2078C Surface 2078B Anti-reflection Fes 2078D compensation prism 2190, 2290 first grating 2191, 2291 second grating 2192, 2292 cut-off element 2281 first lens 2282 opening 2283 second lens 2310A, 2310B, 2310D scale grating section 2460A, 2460B, 2560A, 2560B, 2560C lighting unit

Claims (6)

A scale grating extending along the measurement axis direction and having a scale pitch P _SF ;
A light source that outputs light having a wavelength λ;
Structured illumination that includes an illumination fringe pattern along the measurement axis direction in a plane that is oriented transversely to the measurement axis direction and coincides with the scale grating as the light is input. A structured lighting grid that outputs to
Wherein with the output from the scale grating the available spatially modulated image light is input, wherein when the scale grating is illuminated by a pre-Symbol structured illumination, which can be used in the spatially modulated image light An imaging unit installed to output periodic imaging;
A detector section including a series of photodetectors each installed to receive different phases of the usable periodic imaging,
In the optical encoder configured such that the spatially modulated image light includes moire fringes formed from interference of two diffraction orders,
The scale grating includes a first scale grating part and a second scale grating part arranged in parallel along the measurement axis direction, and the second scale grating part includes the first scale grating part along the measurement axis direction. has a spatial phase offset of 0.5 * P _SF for one of the scale grating portion, the first scale grating portion and both the second scale grating section, the available output from the scale grating Contributing to spatially modulated image light and the usable periodic imaging;
Optical encoder. A scale grating extending along the measurement axis direction and having a scale pitch P _SF ;
A light source that outputs light having a wavelength λ;
Structured illumination that includes an illumination fringe pattern along the measurement axis direction in a plane that is oriented transversely to the measurement axis direction and coincides with the scale grating as the light is input. A structured lighting grid that outputs to
Both when the scale grating usable output from a spatially modulated image light is input, when the scale grating is illuminated by a pre-Symbol structured illumination, the spatially modulated image light available An imaging unit installed to output periodic imaging,
A detector section including a series of photodetectors each installed to receive different phases of the usable periodic imaging,
In the optical encoder configured such that the spatially modulated image light includes moire fringes formed from interference of two diffraction orders,
The imaging unit is
A first lens installed to receive the spatially modulated image light transmitted from the scale grating and having a focal length F defining a focal point located between the own lens and the detector unit;
An opening disposed at the focal length F between the first lens and the detector unit;
The scale grating is installed at a distance less than the focal length F from the imaging unit.
Optical encoder. A scale grating extending along the measurement axis direction and having a scale pitch P _SF ;
A light source that outputs light having a wavelength λ;
Structured illumination that includes an illumination fringe pattern along the measurement axis direction in a plane that is oriented transversely to the measurement axis direction and coincides with the scale grating as the light is input. A structured lighting grid that outputs to
Wherein with the output from the scale grating the available spatially modulated image light is input, wherein when the scale grating is illuminated by a pre-Symbol structured illumination, which can be used in the spatially modulated image light An imaging unit installed to output periodic imaging;
A detector section including a series of photodetectors each installed to receive different phases of the usable periodic imaging,
In the optical encoder configured such that the spatially modulated image light includes moire fringes formed from interference of two diffraction orders,
The scale grating is connected so that the optical path of the imaging unit rotates at a roll angle with respect to the measurement axis such that the scale grating is at least 0.1 degree in a plane perpendicular to the scale grating and parallel to the measurement axis. Arranged against the image part,
Optical encoder. A scale grating extending along the measurement axis direction and having a scale pitch P _SF ;
A light source that outputs light having a wavelength λ;
Structured illumination that includes an illumination fringe pattern along the measurement axis direction in a plane that is oriented transversely to the measurement axis direction and coincides with the scale grating as the light is input. A structured lighting grid that outputs to
Wherein with the output from the scale grating the available spatially modulated image light is input, wherein when the scale grating is illuminated by a pre-Symbol structured illumination, which can be used in the spatially modulated image light An imaging unit installed to output periodic imaging;
A detector section including a series of photodetectors each installed to receive different phases of the usable periodic imaging,
In the optical encoder configured such that the spatially modulated image light includes moire fringes formed from interference of two diffraction orders,
The scale grating is connected so that the optical path of the imaging unit rotates at a pitch angle with respect to the measurement axis such that the scale grating is at least 0.1 degree in a plane perpendicular to the scale grating and parallel to the measurement axis. Arranged against the image part,
Optical encoder. A scale grating extending along the measurement axis direction and having a scale pitch P _SF ;
A light source that outputs light having a wavelength λ;
Structured illumination that includes an illumination fringe pattern along the measurement axis direction in a plane that is oriented transversely to the measurement axis direction and coincides with the scale grating as the light is input. A structured lighting grid that outputs to
Wherein with the output from the scale grating the available spatially modulated image light is input, wherein when the scale grating is illuminated by a pre-Symbol structured illumination, which can be used in the spatially modulated image light An imaging unit installed to output periodic imaging;
A detector section including a series of photodetectors each installed to receive different phases of the usable periodic imaging,
In the optical encoder configured such that the spatially modulated image light includes moire fringes formed from interference of two diffraction orders,
The structured illumination grating has a roll angle (2 * B * M *) between the plane of the structured illumination grating and the plane of the scale grating in a plane perpendicular to the scale grating and parallel to the measurement axis. P _PG ^ 2) / (H * λ), B is a number between 0.75 and 1.25, M is a magnification value of the imaging unit, P _PG is the pitch of the structured illumination grating, and H is the height of the field of view of the detector section that is perpendicular to the measurement axis direction.
Optical encoder. A scale grating extending along the measurement axis direction and having a scale pitch P _SF ;
A light source that outputs light having a wavelength λ;
Structured illumination that includes an illumination fringe pattern along the measurement axis direction in a plane that is oriented transversely to the measurement axis direction and coincides with the scale grating as the light is input. A structured lighting grid that outputs to
Wherein with the output from the scale grating the available spatially modulated image light is input, wherein when the scale grating is illuminated by a pre-Symbol structured illumination, which can be used in the spatially modulated image light An imaging unit installed to output periodic imaging;
A detector section including a series of photodetectors each installed to receive different phases of the usable periodic imaging,
In the optical encoder configured such that the spatially modulated image light includes moire fringes formed from interference of two diffraction orders,
Said structured illumination grid, the at scale grating and a plane parallel to the measurement axis vertical, pitch angle (2 * B * M between the plane of the front Ki構 Zoka illumination grating and the plane of the scale grating * P _PG ^ 2) / (V * λ), B is a number between 0.75 and 1.25, M is a magnification value of the imaging unit, P _PG is a pitch of the pre Ki構 Zoka lighting grating, V is the length of the field of view of the detector portion along the measuring axis direction,
Optical encoder.