JP6571379B2 - Cutting equipment - Google Patents
Cutting equipment Download PDFInfo
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- JP6571379B2 JP6571379B2 JP2015092100A JP2015092100A JP6571379B2 JP 6571379 B2 JP6571379 B2 JP 6571379B2 JP 2015092100 A JP2015092100 A JP 2015092100A JP 2015092100 A JP2015092100 A JP 2015092100A JP 6571379 B2 JP6571379 B2 JP 6571379B2
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- 238000005520 cutting process Methods 0.000 title claims description 144
- 238000004140 cleaning Methods 0.000 claims description 41
- 238000003754 machining Methods 0.000 claims description 20
- 238000002347 injection Methods 0.000 claims description 12
- 239000007924 injection Substances 0.000 claims description 12
- 230000001105 regulatory effect Effects 0.000 claims description 11
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 11
- 239000007921 spray Substances 0.000 claims description 9
- 230000005484 gravity Effects 0.000 claims description 7
- 230000003028 elevating effect Effects 0.000 claims description 6
- 235000012431 wafers Nutrition 0.000 description 59
- 239000004065 semiconductor Substances 0.000 description 57
- 238000004519 manufacturing process Methods 0.000 description 7
- 125000004122 cyclic group Chemical group 0.000 description 4
- 238000012423 maintenance Methods 0.000 description 3
- 238000005406 washing Methods 0.000 description 3
- 239000000919 ceramic Substances 0.000 description 2
- 238000005304 joining Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000003825 pressing Methods 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/02—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by rotary tools, e.g. drills
- B28D5/022—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by rotary tools, e.g. drills by cutting with discs or wheels
- B28D5/023—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by rotary tools, e.g. drills by cutting with discs or wheels with a cutting blade mounted on a carriage
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/0058—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/0058—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
- B28D5/0076—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material for removing dust, e.g. by spraying liquids; for lubricating, cooling or cleaning tool or work
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/0058—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
- B28D5/0082—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material for supporting, holding, feeding, conveying or discharging work
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/67706—Mechanical details, e.g. roller, belt
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/67715—Changing the direction of the conveying path
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/6773—Conveying cassettes, containers or carriers
Landscapes
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Mechanical Engineering (AREA)
- Dicing (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Processing Of Stones Or Stones Resemblance Materials (AREA)
- Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Description
本発明は、半導体ウエーハ等の被加工物を切削するための切削装置に関する。 The present invention relates to a cutting apparatus for cutting a workpiece such as a semiconductor wafer.
半導体デバイス製造工程においては、略円板形状である半導体ウエーハの表面に格子状に配列された分割予定ラインによって複数の領域が区画され、この区画された領域にIC、LSI等のデバイスを形成する。そして、半導体ウエーハを分割予定ラインに沿って切断することによりデバイスが形成された領域を分割して個々の半導体デバイスを製造している。 In the semiconductor device manufacturing process, a plurality of regions are partitioned by division lines arranged in a lattice pattern on the surface of a substantially disc-shaped semiconductor wafer, and devices such as ICs and LSIs are formed in the partitioned regions. . Then, the semiconductor wafer is cut along the planned division line to divide the region where the device is formed to manufacture individual semiconductor devices.
半導体ウエーハ等の被加工物を分割予定ラインに沿って切断する切削装置は、複数の被加工物を収容したカセットが載置されるカセット載置手段と、該カセット載置手段に載置されたカセットから被加工物を搬出および搬入する搬出・搬入手段と、該搬出・搬入手段によって搬出された被加工物を仮置きする仮置き手段と、該仮置き手段に仮置きされた被加工物を保持する保持テーブルと、該保持テーブルに保持された被加工物に切削加工を施す第1の切削手段および第2の切削手段と、保持テーブルを加工送り方向に加工送りする加工送り手段と、第1の切削手段および第2の切削手段を加工送り方向と直交する割り出し送り方向に割り出し送りする第1の割り出し送り手段および第2の割り出し送り手段と、を具備し、半導体ウエーハ等の被加工物を分割予定ラインに沿って効率よく切断して個々のデバイスに分割することができる(例えば、特許文献1参照)。 A cutting apparatus for cutting a workpiece such as a semiconductor wafer along a division line, a cassette placing means for placing a cassette containing a plurality of workpieces, and placed on the cassette placing means An unloading / loading means for unloading and loading the workpiece from the cassette, a temporary placing means for temporarily placing the workpiece unloaded by the unloading / loading means, and a workpiece temporarily placed on the temporary placing means. A holding table for holding, a first cutting means and a second cutting means for cutting a workpiece held on the holding table, a processing feeding means for processing and feeding the holding table in the processing feed direction, A first indexing means and a second indexing means for indexing and feeding the first cutting means and the second cutting means in an indexing feed direction perpendicular to the machining feed direction, such as a semiconductor wafer Cut efficiently along the dividing lines a workpiece can be divided into individual devices (e.g., see Patent Document 1).
しかるに、上述した切削装置は、特に第1の切削手段および第2の切削手段を加工送り方向に加工送りするための第1の割り出し送り手段および第2の割り出し送り手段は、ボールねじ機構によって構成されているために部品点数が多く製造コストが高くなるとともに装置全体の構成が複雑で大型化するという問題がある。 However, in the cutting apparatus described above, the first indexing feeding means and the second indexing feeding means for processing and feeding the first cutting means and the second cutting means in the machining feeding direction are constituted by a ball screw mechanism. Therefore, there are problems that the number of parts is large and the manufacturing cost is high, and the configuration of the entire apparatus is complicated and large.
本発明は上記事実に鑑みてなされたものであり、その主たる技術的課題は、第1の切削手段および第2の切削手段を加工送り方向に加工送りするための第1の割り出し送り手段および第2の割り出し送り手段の構成を単純化して小型化するとともに、部品点数を少なくして製造コストを低減することができる切削装置を提供することにある。 The present invention has been made in view of the above-mentioned facts, and the main technical problem thereof is that the first index feeding means and the first index feeding means for machining and feeding the first cutting means and the second cutting means in the machining feed direction. Another object of the present invention is to provide a cutting apparatus that can simplify the structure of the indexing and feeding means 2 and reduce the manufacturing cost by reducing the number of parts.
上記主たる技術課題を解決するため、本発明によれば、複数の被加工物を収容したカセットが載置されるカセット載置機構と、該カセット載置機構に載置されたカセットから被加工物を搬出および搬入する搬出・搬入機構と、該搬出・搬入機構によって搬出された被加工物を仮置きする仮置き機構と、該仮置き機構に仮置きされた被加工物を保持する保持テーブルと、該保持テーブルを加工送り方向(X軸方向)に移動せしめる加工送り機構と、該保持テーブルに保持された被加工物に切削加工を施す第1の切削手段および第2の切削手段と、該第1の切削手段および第2の切削手段をX軸方向と直交する割り出し送り方向(Y軸方向)にそれぞれ移動せしめる割り出し送り機構と、を具備する切削装置であって、 該第1の切削手段および第2の切削手段は、それぞれ移動基台と、該移動基台にそれぞれ配設され互いに同一軸線上に配設された切削ブレードを備え、該第1の切削手段の移動基台および該第2の切削手段の移動基台がY軸方向に沿って配設されたY軸ガイドレールに移動可能に支持されており、
該割り出し送り手段は、該Y軸ガイドレールに沿って配設された共通のY軸リニアレールと、該Y軸リニアレールに移動可能に嵌挿され該第1の切削手段の移動基台に装着された第1のコイル可動子と、該Y軸リニアレールに移動可能に嵌挿され該第2の切削手段の移動基台に装着された第2のコイル可動子と、からなり、
該加工送り機構は、該保持テーブルが配設された移動基台を該仮置き機構が配設された被加工物着脱領域と、該第1の切削手段および第2の切削手段が配設された加工領域との間において移動可能に支持するX軸ガイドレールと、該X軸ガイドレールに沿って配設されたX軸リニアレールと、該X軸リニアレールに移動可能に嵌挿され該移動基台に装着されたX軸コイル可動子と、からなり、
該カセット載置機構と該仮置き機構はY軸方向に隣接して配設され、
該搬出・搬入機構は、支持基台と、該支持基台に配設されカセットに収容された被加工物を把持する把持部材と、被加工物を所定の位置に規制する一対の規制ピンと、該支持基台をY軸方向に移動する搬送移動手段とを備え、
該仮置き機構は、Y軸方向に延在し被加工物の両側部を支持する底部と側部とを有し該底部が開閉可能に構成された一対の支持レールと、該一対の支持レールの該底部を開閉する開閉手段と、該一対の支持レールを上下方向に移動せしめる昇降手段と、を備えており、 該保持テーブルが該被加工物着脱領域に位置付けられている際に、該搬出・搬入機構によってカセットに収容された被加工物を搬出して該仮置き機構を構成する該一対の支持レールに仮置きし、該昇降手段によって該一対の支持レールを下降して被加工物を該保持テーブルに載置し、該開閉手段によって該底部を開くことにより被加工物を該保持テーブルに保持する切削装置が提供される。
In order to solve the main technical problem, according to the present invention, a cassette mounting mechanism on which a cassette containing a plurality of workpieces is mounted, and a workpiece from the cassette mounted on the cassette mounting mechanism. An unloading / loading mechanism for unloading and unloading, a temporary placing mechanism for temporarily placing the workpiece unloaded by the unloading / loading mechanism, and a holding table for holding the workpiece temporarily placed on the temporary placing mechanism; A machining feed mechanism for moving the holding table in the machining feed direction (X-axis direction), a first cutting means and a second cutting means for cutting a workpiece held on the holding table, A cutting apparatus comprising: an index feed mechanism that moves the first cutting means and the second cutting means in an index feed direction (Y-axis direction) orthogonal to the X-axis direction, wherein the first cutting means And second The cutting means 2 includes a moving base and cutting blades disposed on the moving base and on the same axis, respectively, and the moving base of the first cutting means and the second The moving base of the cutting means is movably supported on a Y-axis guide rail disposed along the Y-axis direction,
The indexing and feeding means is mounted on a common base of the first cutting means and a common Y-axis linear rail arranged along the Y-axis guide rail and movably fitted on the Y-axis linear rail. A first coil mover, and a second coil mover that is movably inserted into the Y-axis linear rail and is mounted on the moving base of the second cutting means,
The processing-feed mechanism, and the workpiece detaching area mechanism placed provisional movement base on which the holding table is disposed is disposed, said first cutting means and the second cutting means is arranged An X-axis guide rail that is movably supported between the machining area, an X-axis linear rail disposed along the X-axis guide rail, and a movement that is inserted into the X-axis linear rail so as to be movable. An X-axis coil mover mounted on the base,
The cassette placement mechanism and the temporary placement mechanism are disposed adjacent to each other in the Y-axis direction,
The unloading / carrying-in mechanism includes a support base, a gripping member that grips the workpiece disposed in the support base and accommodated in a cassette, and a pair of regulation pins that regulate the workpiece to a predetermined position; Transport movement means for moving the support base in the Y-axis direction,
The temporary placement mechanism includes a pair of support rails extending in the Y-axis direction and having bottom and side portions that support both side portions of the workpiece, the bottom portions being configured to be openable and closable, and the pair of support rails An opening / closing means for opening and closing the bottom of the base plate and an elevating means for moving the pair of support rails in the vertical direction, and when the holding table is positioned in the workpiece attaching / detaching area, -The workpiece stored in the cassette is unloaded by the loading mechanism, temporarily placed on the pair of support rails constituting the temporary placement mechanism, and the workpiece is lowered by lowering the pair of support rails by the lifting means. There is provided a cutting device which is placed on the holding table and holds the workpiece on the holding table by opening the bottom by the opening / closing means.
上記仮置き機構に隣接しカセット載置機構に対してY軸方向反対側に被加工物を洗浄するためのスピンナーテーブルを備えた洗浄機構が配設されるとともに、洗浄機構の直上に仮置き機構と連通するように構成され被加工物を仮置きする補助仮置き機構が配設されており、
補助仮置き機構は、Y軸方向に延在し被加工物の両側部を支持する底部と側部とを有し底部が開閉可能に構成された一対の補助支持レールと、該一対の補助支持レールの底部を開閉する開閉手段と、一対の補助支持レールを上下方向に移動せしめる補助昇降手段とを備えている。
A cleaning mechanism having a spinner table for cleaning the workpiece adjacent to the temporary placement mechanism and on the opposite side of the cassette mounting mechanism in the Y-axis direction is disposed, and the temporary placement mechanism is directly above the cleaning mechanism. An auxiliary temporary placement mechanism that is configured to communicate with the temporary placement of the workpiece is disposed,
The auxiliary temporary placement mechanism includes a pair of auxiliary support rails that extend in the Y-axis direction and have a bottom portion and a side portion that support both side portions of the workpiece, and the bottom portion can be opened and closed, and the pair of auxiliary support rails. Opening / closing means for opening and closing the bottom of the rail and auxiliary lifting means for moving the pair of auxiliary support rails in the vertical direction are provided.
上記搬出・搬入機構は、支持基台に配設され一対の補助支持レールに支持された被加工物における把持部材によって把持される領域と反対側の領域を把持する補助把持部材と、一対の補助支持レールに支持された被加工物を所定の位置に規制する一対の補助規制ピンとを備え、
切削済みの被加工物を保持した保持テーブルが被加工物着脱領域に位置付けられている際に、仮置き機構を構成する一対の支持レールの底部を開にした状態で一対の支持レールを下降して底部を切削済みの被加工物の下部に位置付けた後に底部を閉にして切削済みの被加工物を支持した状態で該一対の支持レールを上昇させ、
次に、搬出・搬入機構の該把持部材によってカセットに収容された被加工物を把持するとともに支持基台に設けられた一対の補助規制ピンを切削済みの被加工物における把持部材によって把持された領域と反対側の領域の端面に位置付け、支持基台を補助仮置き機構側に移動することにより、カセットに収容された被加工物を仮置き機構に位置付けるとともに切削済みの被加工物を補助仮置き機構に位置付け、
次に、補助仮置き機構を構成する補助昇降手段によって一対の補助支持レールに仮置きし、昇降手段によって一対の補助支持レールを下降して被加工物を洗浄機構のスピンナーテーブルに載置し、開閉手段によって底部を開くことにより切削済みの被加工物をスピンナーテーブルに保持する。
The carry-out / carry-in mechanism includes an auxiliary gripping member that grips a region opposite to a region gripped by a gripping member on a workpiece that is disposed on a support base and supported by a pair of auxiliary support rails, and a pair of auxiliary members. A pair of auxiliary restricting pins for restricting the work piece supported by the support rail to a predetermined position;
When the holding table holding the cut workpiece is positioned in the workpiece attachment / detachment area, the pair of support rails are lowered with the bottoms of the pair of support rails constituting the temporary placement mechanism open. The bottom portion is positioned below the cut workpiece, and then the bottom portion is closed to lift the pair of support rails while supporting the cut workpiece,
Next, the workpiece accommodated in the cassette is gripped by the gripping member of the unloading / loading mechanism, and the pair of auxiliary regulating pins provided on the support base are gripped by the gripping member on the cut workpiece. By positioning the support base on the end surface of the region opposite to the region and moving the support base to the auxiliary temporary placement mechanism side, the workpiece stored in the cassette is positioned on the temporary placement mechanism and the cut workpiece is placed on the auxiliary temporary placement mechanism. Positioned in the place mechanism,
Next, the auxiliary lifting means constituting the auxiliary temporary placing mechanism temporarily places the pair of auxiliary supporting rails, the lifting means lowers the pair of auxiliary supporting rails, and the workpiece is placed on the spinner table of the cleaning mechanism, The cut workpiece is held on the spinner table by opening the bottom by the opening / closing means.
上記洗浄機構は、スピンナーテーブルの上方に配設された洗浄水を噴射する噴射ノズルを備えており、噴射ノズルは搬出・搬入機構を構成する支持基台に配設され選択的に係合する係合手段によって支持基台の移動に伴いY軸方向に移動し、少なくとも被加工物の外周から中心までの領域に洗浄水を噴射する。 The cleaning mechanism includes a spray nozzle that sprays cleaning water disposed above the spinner table, and the spray nozzle is disposed on a support base that constitutes a carry-out / load-in mechanism and is selectively engaged. The joint means moves in the Y-axis direction along with the movement of the support base, and the cleaning water is jetted at least in the region from the outer periphery to the center of the workpiece.
上記洗浄機構の噴射ノズルには、一端に錘が連結されたワイヤーの他端がプーリーを介して連結され、錘の重力によってY軸方向に移動するように構成されており、
上記係合手段は、支持基台に進退可能に配設された係合ロッドを備え、係合ロッドを進出した状態で噴射ノズルにおける錘の重力によって移動する方向から接触せしめる。
The spray nozzle of the cleaning mechanism is configured such that the other end of a wire having a weight connected to one end is connected via a pulley and moves in the Y-axis direction by the gravity of the weight.
The engagement means includes an engagement rod disposed on the support base so as to be able to advance and retreat, and makes the contact from the direction of movement due to the gravity of the weight in the injection nozzle in the state where the engagement rod is advanced.
本発明による切削装置は、上述したように構成され、第1の切削手段および第2の切削手段を加工送り方向と直交する割り出し送り方向にそれぞれ移動せしめる割り出し送り手段は、Y軸ガイドレールに沿って配設された共通のY軸リニアレールと、該Y軸リニアレールに移動可能に嵌挿され第1の切削手段の移動基台に装着された第1のコイル可動子と、Y軸リニアレールに移動可能に嵌挿され第2の切削手段の移動基台に装着された第2のコイル可動子とからなり、該加工送り機構は、該保持テーブルが配設された移動基台を該仮置き機構が配設された被加工物着脱領域と、該第1の切削手段および第2の切削手段が配設された加工領域との間において移動可能に支持するX軸ガイドレールと、該X軸ガイドレールに沿って配設されたX軸リニアレールと、該X軸リニアレールに移動可能に嵌挿され該移動基台に装着されたX軸コイル可動子と、からなり、該カセット載置機構と該仮置き機構はY軸方向に隣接して配設され、該搬出・搬入機構は、支持基台と、該支持基台に配設されカセットに収容された被加工物を把持する把持部材と、被加工物を所定の位置に規制する一対の規制ピンと、該支持基台をY軸方向に移動する搬送移動手段とを備え、該仮置き機構は、Y軸方向に延在し被加工物の両側部を支持する底部と側部とを有し該底部が開閉可能に構成された一対の支持レールと、該一対の支持レールの該底部を開閉する開閉手段と、該一対の支持レールを上下方向に移動せしめる昇降手段と、を備えており、該保持テーブルが該被加工物着脱領域に位置付けられている際に、該搬出・搬入機構によってカセットに収容された被加工物を搬出して該仮置き機構を構成する該一対の支持レールに仮置きし、該昇降手段によって該一対の支持レールを下降して被加工物を該保持テーブルに載置し、該開閉手段によって該底部を開くことにより被加工物を該保持テーブルに保持するので、ボールねじ機構を使用しないため、部品点数を少なくすることができ製造コストが低減するとともに、装置の小型化を図ることができる。 The cutting device according to the present invention is configured as described above, and the index feed means for moving the first cutting means and the second cutting means in the index feed direction perpendicular to the machining feed direction is provided along the Y-axis guide rail. A common Y-axis linear rail, a first coil mover that is movably fitted on the Y-axis linear rail and is mounted on the moving base of the first cutting means, and a Y-axis linear rail And a second coil mover that is movably inserted into the moving base of the second cutting means, and the machining feed mechanism moves the temporary base on which the holding table is disposed to the temporary base. and the workpiece detaching area mechanism is disposed placed, an X-axis guide rails for movably supporting between the said first cutting means and the second cutting means disposed processability region, wherein said X X arranged along the shaft guide rail A linear rail, and an X-axis coil mover that is movably inserted into the X-axis linear rail and is mounted on the moving base. The cassette mounting mechanism and the temporary placement mechanism are adjacent to each other in the Y-axis direction. The unloading / carrying-in mechanism regulates the workpiece to a predetermined position, a supporting member, a gripping member for gripping the workpiece disposed in the cassette and accommodated in the cassette. A temporary moving mechanism that moves the support base in the Y-axis direction, and the temporary placement mechanism extends in the Y-axis direction and supports both sides of the workpiece. A pair of support rails configured to be openable and closable, opening and closing means for opening and closing the bottom parts of the pair of support rails, and elevating means for moving the pair of support rails in the vertical direction. And the holding table is positioned in the workpiece attaching / detaching region. Then, the workpieces accommodated in the cassette are unloaded by the unloading / loading mechanism, temporarily placed on the pair of support rails constituting the temporary placement mechanism, and the pair of support rails are lowered by the lifting means. Since the work piece is placed on the holding table and the work piece is held on the holding table by opening the bottom by the opening / closing means, the ball screw mechanism is not used, so the number of parts can be reduced. The manufacturing cost can be reduced and the apparatus can be miniaturized.
以下、本発明に従って構成された切削装置の好適な実施形態について、添付図面を参照して詳細に説明する。 Hereinafter, a preferred embodiment of a cutting device configured according to the present invention will be described in detail with reference to the accompanying drawings.
図1には、本発明に従って構成された切削装置の一実施形態の斜視図が示されている。
図示の実施形態における切削装置は、静止基台2と、該静止基台2上に配設され被加工物を保持する保持テーブル機構3と、該保持テーブル機構3に保持された被加工物を切削する切削機構4とを具備している。
FIG. 1 shows a perspective view of one embodiment of a cutting device constructed in accordance with the present invention.
The cutting apparatus in the illustrated embodiment includes a stationary base 2, a holding table mechanism 3 that is disposed on the stationary base 2 and holds a workpiece, and a workpiece held by the holding table mechanism 3. And a cutting mechanism 4 for cutting.
保持テーブル機構3は、図2に示すように静止基台2上に矢印Xで示す加工送り方向(X軸方向)に沿って配設された2本のX軸ガイドレール31、31と、該2本のX軸ガイドレール31、31上に摺動可能に配設された移動基台32と、該移動基台32上に配設された円筒状の支持部材33に回転可能に支持された被加工物を保持する保持テーブル34と、該保持テーブル34が配設された移動基台32を2本のX軸ガイドレール31、31に沿って加工送り方向(X軸方向)に移動させるための加工送り手段35とを具備している。保持テーブル34は、円筒状の支持部材33に回転可能に支持されたテーブル本体341と、該テーブル本体341の上面に配設された吸着チャック342とを具備している。テーブル本体341は、外径が後述する被加工物としてのウエーハの外径より大きくウエーハをダイシングテープを介して支持する環状のフレームの内径より小さく形成されている。吸着チャック342は、ポーラスセラミックスによって形成され図示しない吸引手段に接続されており、適宜負圧が作用せしめられるようになっている。従って、吸着チャック342上に載置された被加工物は、図示しない吸引手段を作動することにより吸着チャック342上に吸引保持される。また、保持テーブル34は、円筒状の支持部材33内に配設された図示しないパルスモータによって回動せしめられるようになっている。 As shown in FIG. 2, the holding table mechanism 3 includes two X-axis guide rails 31, 31 disposed on the stationary base 2 along the processing feed direction (X-axis direction) indicated by an arrow X, A movable base 32 slidably disposed on the two X-axis guide rails 31, 31 and a cylindrical support member 33 disposed on the movable base 32 are rotatably supported. In order to move the holding table 34 that holds the workpiece and the moving base 32 on which the holding table 34 is disposed along the two X-axis guide rails 31 and 31 in the processing feed direction (X-axis direction). The processing feed means 35 is provided. The holding table 34 includes a table main body 341 that is rotatably supported by a cylindrical support member 33, and a suction chuck 342 disposed on the upper surface of the table main body 341. The table main body 341 is formed to have an outer diameter larger than an outer diameter of a wafer as a workpiece to be described later and smaller than an inner diameter of an annular frame that supports the wafer via a dicing tape. The suction chuck 342 is made of porous ceramics and is connected to suction means (not shown) so that a negative pressure is appropriately applied. Therefore, the workpiece placed on the suction chuck 342 is sucked and held on the suction chuck 342 by operating a suction means (not shown). The holding table 34 can be rotated by a pulse motor (not shown) disposed in a cylindrical support member 33.
上記加工送り手段35は、2本のX軸ガイドレール31と31の間に配設されX軸方向に延在するX軸リニアレール351と、該X軸リニアレール351に移動可能に嵌挿され保持テーブル34が配設された移動基台32に装着されたX軸コイル可動子352とからなっている。X軸リニアレール351は、例えば複数の円柱状の永久磁石のN極とS極とを交互に接合して軸状に構成し、この軸状に構成された複数の円柱状の永久磁石をステンレス鋼等の非磁性材からなる円筒状のケースに配設して構成されている。このように構成されたX軸リニアレール351は、その両端部に図2に示すように支持部材353、353が装着されており、この支持部材353、353を介して上記支静止基台2に取付けられる。X軸リニアレール351とX軸コイル可動子352とからなる加工送り手段35は、所謂リニアシャフトモータを構成しており、X軸コイル可動子352に電流が流れると磁力による吸引力、反発力を繰り返して推力が発生する。従って、X軸コイル可動子352に印加する電流の方向を変えることにより、X軸コイル可動子352がX軸リニアレール351に沿って移動する方向を変更することができる。このように所謂リニアシャフトモータによって構成された加工送り手段35は、X軸リニアレール351にX軸コイル可動子352を摺動可能に嵌挿した構成であるため、構成が簡単であり、非接触で駆動するため磨耗することがなくメンテナンスが極めて簡単となる。また、所謂リニアシャフトモータによって構成された加工送り手段35は、従来の送り機構のようにボールねじ機構を使用しないため、部品点数を少なくすることができ製造コストが低減するとともに、装置の小型化を図ることができることに加え、後述する切削機構4による切削加工時に被加工物を保持した保持テーブル34を加工送りする際にヨーイングが抑制されるため切削精度を向上させることができる。このように構成された加工送り手段35は、保持テーブル34が配設された移動基台32を図2に示す被加工物着脱領域と切削機構4が配設された加工領域との間を移動せしめる。 The machining feed means 35 is disposed between the two X-axis guide rails 31 and 31 and extends in the X-axis direction, and is inserted into the X-axis linear rail 351 so as to be movable. It consists of an X-axis coil mover 352 mounted on a moving base 32 on which a holding table 34 is disposed. For example, the X-axis linear rail 351 is formed into a shaft shape by alternately joining N poles and S poles of a plurality of columnar permanent magnets, and the plurality of columnar permanent magnets configured in this shaft shape are made of stainless steel. It is configured by being disposed in a cylindrical case made of a nonmagnetic material such as steel. As shown in FIG. 2, the X-axis linear rail 351 configured in this manner is provided with support members 353 and 353 at both ends, and the support base pedestal 2 is connected to the support bases 353 and 353 via the support members 353 and 353. Mounted. The machining feed means 35 comprising the X-axis linear rail 351 and the X-axis coil mover 352 constitutes a so-called linear shaft motor, and when an electric current flows through the X-axis coil mover 352, an attractive force and a repulsive force are generated. Thrust is generated repeatedly. Accordingly, the direction in which the X-axis coil mover 352 moves along the X-axis linear rail 351 can be changed by changing the direction of the current applied to the X-axis coil mover 352. Thus, the machining feed means 35 constituted by a so-called linear shaft motor has a configuration in which the X-axis coil movable element 352 is slidably fitted to the X-axis linear rail 351, and thus the configuration is simple and non-contact. Because it is driven by the motor, it is not worn out and the maintenance becomes extremely simple. Further, since the machining feed means 35 constituted by a so-called linear shaft motor does not use a ball screw mechanism unlike the conventional feed mechanism, the number of parts can be reduced, the manufacturing cost can be reduced, and the apparatus can be downsized. In addition, the yawing is suppressed when the holding table 34 holding the workpiece is cut and fed by the cutting mechanism 4 described later, so that the cutting accuracy can be improved. The processing feeding means 35 configured as described above moves the moving base 32 provided with the holding table 34 between the workpiece attaching / detaching region shown in FIG. 2 and the processing region provided with the cutting mechanism 4. Let me.
次に、上記切削機構4について説明する。
切削機構4は、上記静止基台2上に固定された門型の支持フレーム41を具備している。この門型の支持フレーム41は、間隔を置いて配設された第1の柱部411および第2の柱部412と、該第1の柱部411と第2の柱部412の上端を連結し矢印Xで示す加工送り方向と直交する矢印Yで示す割り出し送り方向(Y軸方向)に沿って配設された支持部413とからなり、上記2本のX軸ガイドレール31を跨ぐように配設されている。
Next, the cutting mechanism 4 will be described.
The cutting mechanism 4 includes a gate-shaped support frame 41 fixed on the stationary base 2. The gate-shaped support frame 41 connects the first pillar part 411 and the second pillar part 412 that are arranged at intervals, and the upper ends of the first pillar part 411 and the second pillar part 412. And a support portion 413 disposed along an index feed direction (Y-axis direction) indicated by an arrow Y orthogonal to the machining feed direction indicated by an arrow X, and straddling the two X-axis guide rails 31 It is arranged.
上記門型の支持フレーム41を構成する支持部413の図1および図2において背面側には、第1の切削手段5aと第2の切削手段5bが配設されている。第1の切削手段5aおよび第2の切削手段5bについて、図3および図4を参照して説明する。第1の切削手段5aおよび第2の切削手段5bは、それぞれ割り出し移動基台51と切り込み移動基台52およびスピンドルユニット53を具備している。第1の切削手段5aの割り出し移動基台51および第2の切削手段5bの割り出し移動基台51は、それぞれ上記支持部413の図4において左方の側面に設けられた2本のY軸ガイドレール413a、413aと嵌合する被案内溝511、511が設けられており、この被案内溝511、511を2本のY軸ガイドレール413a、413aに嵌合することにより、割り出し移動基台51は2本のY軸ガイドレール413a、413aに沿って移動可能に構成される。なお、第1の切削手段5aの割り出し移動基台51および第2の切削手段5bの割り出し移動基台51の一方の面には、それぞれ後述する割り出し送り手段が配設される凹部513が形成されている。また、第1の切削手段5aの割り出し移動基台51および第2の切削手段5bの割り出し移動基台51の他方の面には、それぞれ図4に示すように矢印Zで示す切り込み送り方向に沿って一対の案内レール512、512(図4には一方の案内レールのみが示されている)が設けられている。 A first cutting means 5a and a second cutting means 5b are disposed on the back side of the support portion 413 constituting the portal-type support frame 41 in FIGS. The 1st cutting means 5a and the 2nd cutting means 5b are demonstrated with reference to FIG. 3 and FIG. The first cutting means 5 a and the second cutting means 5 b include an indexing movement base 51, a cutting movement base 52 and a spindle unit 53, respectively. The index movement base 51 of the first cutting means 5a and the index movement base 51 of the second cutting means 5b are respectively two Y-axis guides provided on the left side surface of the support portion 413 in FIG. Guided grooves 511 and 511 that are fitted to the rails 413a and 413a are provided. By fitting the guided grooves 511 and 511 to the two Y-axis guide rails 413a and 413a, the index moving base 51 Is configured to be movable along two Y-axis guide rails 413a and 413a. A concave portion 513 in which an index feeding means to be described later is provided is formed on one surface of the index movement base 51 of the first cutting means 5a and the index movement base 51 of the second cutting means 5b. ing. Further, the other surfaces of the indexing movement base 51 of the first cutting means 5a and the indexing movement base 51 of the second cutting means 5b are respectively along the cutting feed direction indicated by the arrow Z as shown in FIG. A pair of guide rails 512 and 512 (only one guide rail is shown in FIG. 4) is provided.
上記第1の切削手段5aの切り込み移動基台52および第2の切削手段5bの切り込み移動基台52は、それぞれ上下方向に延びる被支持部521と、該被支持部521の下端から直角に水平に延びる装着部522とからなっている。図4に示すように被支持部521における装着部522側の面には上記割り出し移動基台51の他方の面に設けられた一対のZ軸ガイドレール512、512と嵌合する被案内溝523、523(図4には一方の被案内溝のみが示されている)が設けられており、この被案内溝523、523を2本のZ軸ガイドレール512、512に嵌合することにより、切り込み移動基台52は2本のZ軸ガイドレール512、512に沿って矢印Zで示す切り込み送り方向に移動可能に構成される。このようにして割り出し移動基台51に装着された切り込み移動基台52は、図1および図2に示すように装着部522が門型の支持フレーム41を構成する支持部413の下側に突出して配置される。 The incision moving base 52 of the first cutting means 5a and the incision movement base 52 of the second cutting means 5b are horizontally supported at a right angle from the supported portion 521 extending in the vertical direction and the lower end of the supported portion 521, respectively. And a mounting portion 522 extending in the direction. As shown in FIG. 4, a guided groove 523 fitted to a pair of Z-axis guide rails 512 and 512 provided on the other surface of the indexing movement base 51 is provided on the surface of the supported portion 521 on the mounting portion 522 side. 523 (only one guided groove is shown in FIG. 4), and by fitting the guided grooves 523 and 523 to the two Z-axis guide rails 512 and 512, The cutting base 52 is configured to be movable in the cutting feed direction indicated by the arrow Z along the two Z-axis guide rails 512 and 512. In the cutting movement base 52 mounted on the indexing movement base 51 in this way, the mounting portion 522 protrudes below the support portion 413 constituting the portal-type support frame 41 as shown in FIGS. Arranged.
上記スピンドルユニット53は、第1の切削手段5aと第2の切削手段5bの切り込み移動基台52を形成する装着部522の下面にそれぞれ装着されている。この第1の切削手段5aのスピンドルユニット53および第2の切削手段5bのスピンドルユニット53は、それぞれ図3および図4に示すようにスピンドルハウジング531と、該スピンドルハウジング531に回転可能に支持された回転スピンドル532と、該回転スピンドル532の一端に装着された切削ブレード533と、切削水を供給する切削水供給管534および回転スピンドル532を回転駆動する図示しないサーボモータを具備しており、回転スピンドル532の軸線方向が矢印Yで示す割り出し送り方向に沿って配設されている。そして、第1の切削手段5aのスピンドルユニット53を構成する切削ブレード533と第2の切削手段5bのスピンドルユニット53を構成する切削ブレード533は、互いに対向して配設されている。 The spindle unit 53 is mounted on the lower surface of the mounting portion 522 that forms the cutting movement base 52 of the first cutting means 5a and the second cutting means 5b. The spindle unit 53 of the first cutting means 5a and the spindle unit 53 of the second cutting means 5b are rotatably supported by the spindle housing 531 and the spindle housing 531 as shown in FIGS. The rotary spindle 532, a cutting blade 533 attached to one end of the rotary spindle 532, a cutting water supply pipe 534 for supplying cutting water, and a servo motor (not shown) for rotationally driving the rotary spindle 532 are provided. The axial direction of 532 is arranged along the index feed direction indicated by the arrow Y. The cutting blade 533 constituting the spindle unit 53 of the first cutting means 5a and the cutting blade 533 constituting the spindle unit 53 of the second cutting means 5b are arranged to face each other.
図示の実施形態における第1の切削手段5aと第2の切削手段5bは、図3に示すように上記割り出し移動基台51、51を2本のY軸ガイドレール413a、413aに沿って矢印Yで示す割り出し送り方向(Y軸方向)に移動するための割り出し送り手段54を具備している。割り出し送り手段54は、上記2本のY軸ガイドレール413a、413aに沿って配設された共通のY軸リニアレール540と、該共通のY軸リニアレール540に移動可能に嵌挿され第1の切削手段5aの割り出し移動基台51に装着された第1のY軸コイル可動子544aと、共通のY軸リニアレール540に移動可能に嵌挿され第2の切削手段5bの割り出し移動基台51に装着された第2のY軸コイル可動子544bとからなっている。共通のY軸リニアレール540は、例えば複数の円柱状の永久磁石のN極とS極とを交互に接合して軸状に構成し、この軸状に構成された複数の円柱状の永久磁石をステンレス鋼等の非磁性材からなる円筒状のケースに配設して構成されている。このように構成された共通のY軸リニアレール540は、その両端部に図3に示すように支持部材543、543が装着されており、この支持部材543、543を介して上記支持フレーム41の支持部413に取付けられる。この共通のY軸リニアレール540に移動可能に嵌挿された第1のコイル可動子544aおよび第2のコイル可動子544bは、それぞれ第1の切削手段5aの割り出し移動基台51および第2の切削手段5bの割り出し移動基台51に設けられた凹部513に配設され、それぞれ割り出し移動基台51の一方の面に装着される。 As shown in FIG. 3, the first cutting means 5a and the second cutting means 5b in the illustrated embodiment are arranged such that the index moving bases 51 and 51 are moved along the two Y-axis guide rails 413a and 413a by the arrow Y. The index feeding means 54 for moving in the index feeding direction (Y-axis direction) shown in FIG. The index feeding means 54 is a common Y-axis linear rail 540 disposed along the two Y-axis guide rails 413a and 413a, and is movably fitted and inserted into the common Y-axis linear rail 540. The index movement base of the second cutting means 5b is movably fitted to the first Y-axis coil mover 544a mounted on the index movement base 51 of the cutting means 5a and the common Y-axis linear rail 540. 51 and a second Y-axis coil mover 544b attached to the main body 51. The common Y-axis linear rail 540 is formed into a shaft shape by alternately joining N poles and S poles of a plurality of columnar permanent magnets, for example, and a plurality of columnar permanent magnets configured in this shaft shape. Are arranged in a cylindrical case made of a nonmagnetic material such as stainless steel. As shown in FIG. 3, the common Y-axis linear rail 540 configured in this manner is mounted with support members 543 and 543 as shown in FIG. 3, and the support frame 41 of the support frame 41 is interposed via the support members 543 and 543. It is attached to the support portion 413. The first coil mover 544a and the second coil mover 544b that are movably fitted in the common Y-axis linear rail 540 are respectively the index moving base 51 and the second coil mover 51a of the first cutting means 5a. It is disposed in a recess 513 provided in the indexing movement base 51 of the cutting means 5b and is mounted on one surface of the indexing movement base 51, respectively.
上記のように共通のY軸リニアレール540と第1のコイル可動子544aおよび第2のコイル可動子544bとからなる割り出し送り手段54は、上記X軸リニアレール361とX軸コイル可動子362とからなる加工送り手段35と同様に所謂シャフトモータを構成しており、第1のコイル可動子544aおよび第2のコイル可動子544bに電流が流れると磁力による吸引力、反発力を繰り返して推力が発生する。従って、第1のコイル可動子544aおよび第2のコイル可動子544bに印加する電流の方向を変えることにより、第1のコイル可動子544aおよび第2のコイル可動子544bが共通のY軸リニアレール540に沿って移動する方向を変更することができる。このように所謂シャフトモータによって構成された割り出し送り手段54は、共通のY軸リニアレール540に第1のコイル可動子544aおよび第2のコイル可動子544bを摺動可能に嵌挿した構成であるため、構成が簡単であり、非接触で駆動するため磨耗することがなくメンテナンスが極めて簡単となる。また、所謂リニアシャフトモータによって構成された割り出し送り手段54は、従来の送り機構のようにボールねじ機構を使用しないため、部品点数を少なくすることができ製造コストが低減する。 As described above, the index feeding means 54 including the common Y-axis linear rail 540, the first coil mover 544a, and the second coil mover 544b includes the X-axis linear rail 361, the X-axis coil mover 362, and the like. A so-called shaft motor is formed in the same manner as the machining feed means 35, and when an electric current flows through the first coil movable element 544a and the second coil movable element 544b, a thrust is generated by repeating an attractive force and a repulsive force. Occur. Therefore, by changing the direction of the current applied to the first coil mover 544a and the second coil mover 544b, the first coil mover 544a and the second coil mover 544b can be shared by the Y-axis linear rail. The direction of movement along 540 can be changed. Thus, the index feeding means 54 configured by a so-called shaft motor has a configuration in which the first coil movable element 544a and the second coil movable element 544b are slidably fitted to the common Y-axis linear rail 540. Therefore, the structure is simple, and since it is driven in a non-contact manner, there is no wear and the maintenance becomes extremely simple. Further, since the indexing feeding means 54 constituted by a so-called linear shaft motor does not use a ball screw mechanism unlike the conventional feeding mechanism, the number of parts can be reduced and the manufacturing cost is reduced.
また、図示の実施形態における第1の切削手段5aと第2の切削手段5bは、図3および図4に示すように上記切り込み移動基台52、52を2本のZ軸ガイドレール512、512に沿って矢印Zで示す切り込み送り方向(Z軸方向)に移動するための切り込み送り手段55、55を具備している。切り込み送り手段55、55は、それぞれ2本のZ軸ガイドレール512、512と平行に配設された雄ネジロッド551と、雄ネジロッド551の一端部を回転可能に支持する軸受552と、雄ネジロッド551の他端に連結され該雄ネジロッド551を正転または逆転駆動するパルスモータ553とからなっている。このように構成された切り込み送り手段55、55は、それぞれ雄ネジロッド551が上記切り込み移動基台52の被支持部521に形成された雌ネジ521aに螺合される。従って、切り込み送り手段55、55は、それぞれパルスモータ553を駆動して雄ネジロッド551を正転または逆転駆動することにより、切り込み移動基台52を2本のZ軸ガイドレール512、512に沿って図3において矢印Zで示す切り込み送り方向(Z軸方向)に移動することができる。 Further, the first cutting means 5a and the second cutting means 5b in the illustrated embodiment have the above-mentioned cutting movement bases 52, 52 as two Z-axis guide rails 512, 512, as shown in FIGS. Are provided with cutting feed means 55, 55 for moving in the cutting feed direction (Z-axis direction) indicated by the arrow Z. The cut-in feeding means 55 and 55 include a male screw rod 551 disposed in parallel with the two Z-axis guide rails 512 and 512, a bearing 552 that rotatably supports one end of the male screw rod 551, and a male screw rod 551. And a pulse motor 553 that is connected to the other end of the motor and drives the male screw rod 551 to rotate forward or backward. In the cutting feed means 55 and 55 configured as described above, the male screw rod 551 is screwed into a female screw 521 a formed on the supported portion 521 of the cutting moving base 52. Accordingly, the cutting feed means 55 and 55 drive the pulse motor 553 to drive the male screw rod 551 in the normal direction or the reverse direction, thereby moving the cutting base 52 along the two Z-axis guide rails 512 and 512. In FIG. 3, it can move in the cutting feed direction (Z-axis direction) indicated by an arrow Z.
図1を参照して説明を続けると、上記静止基台2には、半導体ウエーハ等の複数の被加工物を収容するカセット60が載置されるカセット載置機構6と、該カセット載置機構6に載置されたカセット60から被加工物を搬出するとともに切削済の被加工物をカセット60に搬入する搬出・搬入機構7と、該搬出・搬入機構7によって搬出された被加工物を仮置きする仮置き機構8と、該仮置き機構8と隣接して配設された補助仮置き機構9と、切削後の被加工物を洗浄する洗浄機構10とを具備している。カセット載置機構6は、図示しない昇降手段によって昇降せしめられるカセットテーブル61上にカセット60が載置されるようになっている。カセット60には環状のフレームFに装着されたダイシングテープTの表面に貼着された半導体ウエーハWが収容されている。なお、環状のフレームFの外周には、後述する規制ピンが係合するノッチF-1およびフラット面F-2が設けられている。 The description will be continued with reference to FIG. 1. On the stationary base 2, a cassette mounting mechanism 6 on which a cassette 60 for storing a plurality of workpieces such as semiconductor wafers is mounted, and the cassette mounting mechanism. The work piece is carried out from the cassette 60 placed on the work piece 6 and the cut work piece is carried into the cassette 60, and the work piece carried out by the carry-out / carry-in mechanism 7 is temporarily A temporary placement mechanism 8 to be placed, an auxiliary temporary placement mechanism 9 disposed adjacent to the temporary placement mechanism 8, and a cleaning mechanism 10 for cleaning a workpiece after cutting are provided. The cassette mounting mechanism 6 is configured such that a cassette 60 is mounted on a cassette table 61 that is lifted and lowered by a lifting means (not shown). The cassette 60 accommodates a semiconductor wafer W attached to the surface of a dicing tape T attached to an annular frame F. In addition, on the outer periphery of the annular frame F, a notch F-1 and a flat surface F-2 that engage with a regulation pin described later are provided.
搬出・搬入機構7は、図1に示すように上記門型の支持フレーム41を構成する支持部413の表面側に配設された搬送移動手段71と、該搬送移動手段71によってY軸方向移動せしめられる支持基台72と、該支持基台72と搬送移動手段71とを連結する連結部材73とからなっている。搬送移動手段71は支持基台72が連結された連結部材73をY軸方向に移動せしめるベルト機構からなっている。図5および図6を参照して説明を続けると、搬出・搬入機構7を構成する支持基台72には、下側に配設されカセット載置機構6に載置されたカセット60に収容された半導体ウエーハWをダイシングテープTを介して支持する環状のフレームFを把持するための把持部材74(図6参照)と、該把持部材74を上下方向に移動するエアーシリンダー740と、把持部材74の両側に配設され上記環状のフレームFに設けられたノッチF-1およびフラット面F-2と係合して環状のフレームFを所定の位置に規制する一対の規制ピン75が取り付けられている。このように構成された搬出・搬入機構7は、支持基台72をカセット載置機構6に載置されたカセット60に向けて移動し、一対の規制ピン75をカセット60に収容された半導体ウエーハWをダイシングテープTを介して支持する環状のフレームFに設けられたノッチF-1およびフラット面F-2と係合することにより、半導体ウエーハWを所定の位置に位置規制する。そして、エアーシリンダー740によって把持部材74を上方に移動することにより、環状のフレームFを支持基台72と把持部材74との間に把持する。 As shown in FIG. 1, the carry-out / carry-in mechanism 7 includes a transfer movement means 71 disposed on the surface side of the support portion 413 constituting the portal-type support frame 41, and the transfer movement means 71 moves in the Y-axis direction. It comprises a support base 72 to be fastened, and a connecting member 73 that connects the support base 72 and the transport movement means 71. The transport moving means 71 is composed of a belt mechanism that moves the connecting member 73 connected to the support base 72 in the Y-axis direction. The description will be continued with reference to FIGS. 5 and 6. The support base 72 constituting the carry-out / carry-in mechanism 7 is accommodated in a cassette 60 disposed on the lower side and placed on the cassette placement mechanism 6. A gripping member 74 (see FIG. 6) for gripping the annular frame F that supports the semiconductor wafer W via the dicing tape T, an air cylinder 740 that moves the gripping member 74 in the vertical direction, and a gripping member 74 A pair of restricting pins 75 are attached to restrict the annular frame F to a predetermined position by engaging with the notches F-1 and the flat surface F-2 provided on the annular frame F. Yes. The carry-out / carry-in mechanism 7 configured as described above moves the support base 72 toward the cassette 60 placed on the cassette placement mechanism 6, and the semiconductor wafer in which the pair of regulation pins 75 are accommodated in the cassette 60. By engaging W with a notch F-1 and a flat surface F-2 provided on an annular frame F that supports a dicing tape T, the position of the semiconductor wafer W is regulated at a predetermined position. Then, the annular frame F is gripped between the support base 72 and the gripping member 74 by moving the gripping member 74 upward by the air cylinder 740.
また、搬出・搬入機構7を構成する支持基台72には、下側に配設され後述する切削済の半導体ウエーハWをダイシングテープTを介して支持する環状のフレームFを把持するための補助把持部材76(図6参照)と、該補助把持部材76を上下方向に移動するエアーシリンダー760と、補助把持部材76の両側に配設され上記環状のフレームFと係合して環状のフレームFを所定の位置に規制する一対の補助規制ピン77が取り付けられている。更に、搬出・搬入機構7を構成する支持基台72には、後述する洗浄機構の噴射ノズルと選択的に係合する係合手段78が配設されている。この係合手段78は、支持基台72の下面より下方に進退可能に配設された係合ロッド781と、該係合ロッド781を進退せしめるエアーシリンダー782とからなっている。 Further, the support base 72 constituting the carry-out / carry-in mechanism 7 has an auxiliary for gripping an annular frame F that is disposed on the lower side and supports a cut semiconductor wafer W, which will be described later, via a dicing tape T. A gripping member 76 (see FIG. 6), an air cylinder 760 that moves the auxiliary gripping member 76 in the vertical direction, and an annular frame F that is disposed on both sides of the auxiliary gripping member 76 and engages with the annular frame F. A pair of auxiliary restricting pins 77 are attached to restrict the position to a predetermined position. Further, the support base 72 constituting the carry-out / carry-in mechanism 7 is provided with an engaging means 78 that selectively engages with an ejection nozzle of a cleaning mechanism described later. The engaging means 78 includes an engaging rod 781 disposed so as to be able to advance and retract downward from the lower surface of the support base 72, and an air cylinder 782 for moving the engaging rod 781 forward and backward.
上記仮置き機構8について、図1、図7および図8を参照して説明する。仮置き機構8は、上記カセット載置機構6とY軸方向に隣接して上記保持テーブル34の被加工物着脱領域の直上に配設されている。この仮置き機構8は、Y軸方向に延在し環状のフレームFの両側部を支持する底部81a、81bと側部82a、82bとを有し底部81a、81bが開閉可能に構成された一対の支持レール80と、該一対の支持レール80の底部81a、81bを開閉する開閉手段85a、85bと、該一対の支持レール80を上下方向に移動せしめる昇降手段86とを備えている。なお、一対の支持レール80を構成する側部82a、82bの上端には互いに内側に突出するフランジ部83a、83bが設けられており、該フランジ部83aと83bの互いに一端部が連結部84によって連結されている。上記開閉手段85a、85bは、図示の実施形態においてはエアーモーターからなっており、一対の支持レール80の底部81a、81bを図8において実線で示す水平位置である閉位置と2点鎖線で示す垂直位置である開位置にそれぞれ作動せしめる。上記昇降手段86は、図示しない固定部材に取り付けられたエアーシリンダー861からなっており、該エアーシリンダー861のピストンロッド862が上記一対の支持レール80の連結部84に連結されている。 The temporary placement mechanism 8 will be described with reference to FIGS. 1, 7 and 8. The temporary placement mechanism 8 is disposed immediately above the workpiece attachment / detachment area of the holding table 34 adjacent to the cassette placement mechanism 6 in the Y-axis direction. The temporary placement mechanism 8 includes a pair of bottom portions 81a and 81b and side portions 82a and 82b that extend in the Y-axis direction and support both side portions of the annular frame F, and the bottom portions 81a and 81b are configured to be openable and closable. Support rails 80, opening / closing means 85 a and 85 b for opening and closing the bottom portions 81 a and 81 b of the pair of support rails 80, and elevating means 86 for moving the pair of support rails 80 in the vertical direction. In addition, flange portions 83a and 83b projecting inward from each other are provided at the upper ends of the side portions 82a and 82b constituting the pair of support rails 80, and one end portions of the flange portions 83a and 83b are connected to each other by the connecting portion 84. It is connected. The opening / closing means 85a and 85b are air motors in the illustrated embodiment, and the bottom portions 81a and 81b of the pair of support rails 80 are indicated by a closed position and a two-dot chain line which are horizontal positions indicated by solid lines in FIG. Operate each to the open position, which is the vertical position. The elevating means 86 includes an air cylinder 861 attached to a fixing member (not shown), and a piston rod 862 of the air cylinder 861 is connected to the connecting portion 84 of the pair of support rails 80.
上記補助仮置き機構9は、上記仮置き機構8とY軸方向に隣接し上記カセット載置機構6に対してY軸方向反対側において後述する洗浄機構10の直上に配設されている。この補助仮置き機構9は、上記仮置き機構8と同様の構成であり、図7に示すようにY軸方向に延在し環状のフレームFの両側部を支持する底部91a、91bと側部92a、92bとを有し底部91a、91bが開閉可能に構成された一対の補助支持レール90と、該一対の補助支持レール90の底部91a、91bを開閉する開閉手段95a、95bと、該一対の補助支持レール90を上下方向に移動せしめる昇降手段96とを備えている。なお、一対の補助支持レール90を構成する側部92a、92bの上端には互いに内側に突出するフランジ部93a、93bが設けられており、該フランジ部93aと93bの互いに一端部が連結部94によって連結されている。上記開閉手段95a、95bは、図示の実施形態においてはエアーモーターからなっており、一対の補助支持レール90の底部91a、91bを水平位置である閉位置と垂直位置である開位置にそれぞれ作動せしめる。上記昇降手段96は、図示しない固定部材に取り付けられたエアーシリンダー961からなっており、該エアーシリンダー961のピストンロッド962が上記一対の補助支持レール90の連結部94に連結されている。 The auxiliary temporary placement mechanism 9 is adjacent to the temporary placement mechanism 8 in the Y-axis direction and is disposed immediately above a cleaning mechanism 10 described later on the opposite side of the cassette placement mechanism 6 in the Y-axis direction. The auxiliary temporary placement mechanism 9 has the same configuration as the temporary placement mechanism 8, and includes bottom portions 91a and 91b and side portions that extend in the Y-axis direction and support both side portions of the annular frame F as shown in FIG. A pair of auxiliary support rails 90 having bottom portions 91a and 91b configured to be openable and closable; opening and closing means 95a and 95b for opening and closing the bottom portions 91a and 91b of the pair of auxiliary support rails 90; Lifting / lowering means 96 for moving the auxiliary support rail 90 in the vertical direction. In addition, flange portions 93a and 93b projecting inward from each other are provided at the upper ends of the side portions 92a and 92b constituting the pair of auxiliary support rails 90, and one end portions of the flange portions 93a and 93b are connected to the connecting portion 94. Are connected by The opening / closing means 95a and 95b are air motors in the illustrated embodiment, and operate the bottom portions 91a and 91b of the pair of auxiliary support rails 90 to a closed position which is a horizontal position and an open position which is a vertical position, respectively. . The elevating means 96 includes an air cylinder 961 attached to a fixing member (not shown), and a piston rod 962 of the air cylinder 961 is connected to the connecting portion 94 of the pair of auxiliary support rails 90.
次に、上記洗浄機構10について、図1および図9を参照して説明する。
図示の実施形態における洗浄機構10は、上記仮置き機構8に隣接しカセット載置機構6に対してY軸方向反対側に配設される。この洗浄機構10は、洗浄ハウジング11を具備している。この洗浄ハウジング11は、前壁111と後壁112と側壁113および114と底壁(図示せず)とからなっており、上方が解放されている。このように構成された洗浄ハウジング11内には、スピンナーテーブル12が配設されている。スピンナーテーブル12は、テーブル本体121と、該テーブル本体121の上面に配設された吸着チャック122と、テーブル本体121を回転駆動するサーボモータ123とからなっている。テーブル本体121は、外径が上記ウエーハWの外径より大きくウエーハWをダイシングテープTを介して支持する環状のフレームFの内径より小さく形成されている。吸着チャック122は、ポーラスセラミックスによって形成され図示しない吸引手段に接続されており、適宜負圧が作用せしめられるようになっている。従って、吸着チャック122上に載置された被加工物は、図示しない吸引手段を作動することにより吸着チャック122上に吸引保持される。
Next, the cleaning mechanism 10 will be described with reference to FIGS. 1 and 9.
The cleaning mechanism 10 in the illustrated embodiment is disposed adjacent to the temporary placement mechanism 8 and on the opposite side to the cassette mounting mechanism 6 in the Y-axis direction. The cleaning mechanism 10 includes a cleaning housing 11. The cleaning housing 11 includes a front wall 111, a rear wall 112, side walls 113 and 114, and a bottom wall (not shown), and an upper portion is released. A spinner table 12 is disposed in the cleaning housing 11 thus configured. The spinner table 12 includes a table main body 121, a suction chuck 122 disposed on the upper surface of the table main body 121, and a servo motor 123 that rotationally drives the table main body 121. The table body 121 is formed so that the outer diameter is larger than the outer diameter of the wafer W and smaller than the inner diameter of the annular frame F that supports the wafer W via the dicing tape T. The suction chuck 122 is made of porous ceramics and is connected to a suction means (not shown) so that a negative pressure is appropriately applied. Therefore, the workpiece placed on the suction chuck 122 is sucked and held on the suction chuck 122 by operating a suction means (not shown).
図1および図9を参照して説明を続けると、洗浄ハウジング11の前壁111にはY軸方向に沿って形成された案内穴111aが設けられているおり、この案内穴111aに上記スピンナーテーブル12に保持された被加工物に洗浄水を噴射する噴射ノズル13がY軸方向に移動可能に配設されている。この噴射ノズル13には一端に錘14が連結されたワイヤー15の他端がプーリー16を介して連結され、錘14の重力によって矢印Y1で示す方向に移動するように構成されている。そして、噴射ノズル13には、上記搬出・搬入機構7を構成する支持基台72に配設された係合手段78は、支持基台72の下面より下方に進退可能に配設された係合ロッド781が進出した状態で噴射ノズル13における錘14の重力によって移動する矢印Y1で示す方向から接触せしめられる。なお、噴射ノズル13は、図示しない洗浄水供給手段に接続されている。 1 and 9, the front wall 111 of the cleaning housing 11 is provided with a guide hole 111a formed along the Y-axis direction, and the spinner table is formed in the guide hole 111a. An injection nozzle 13 for injecting cleaning water onto the workpiece held by 12 is arranged to be movable in the Y-axis direction. The jet nozzle 13 is connected to the other end of a wire 15 having a weight 14 connected to one end via a pulley 16 and is moved in the direction indicated by the arrow Y1 by the gravity of the weight 14. The engaging means 78 disposed on the support base 72 constituting the carry-out / carry-in mechanism 7 is engaged with the injection nozzle 13 so as to be able to advance and retract downward from the lower surface of the support base 72. The rod 781 is brought into contact from the direction indicated by the arrow Y <b> 1 that moves due to the gravity of the weight 14 in the injection nozzle 13 in the advanced state. The injection nozzle 13 is connected to a cleaning water supply means (not shown).
図示の実施形態における切削装置は以上のように構成されており、以下その作用について説明する。
先ず、図10に示すように仮置き機構8のエアーシリンダー861を作動して一対の支持レール80を上部位置に位置付けるとともに、搬出・搬入機構7の把持部材74(図6参照)および一対の規制ピン75(図5および図6参照)が配設された支持基台72を図示の待機位置に位置付ける。
The cutting apparatus in the illustrated embodiment is configured as described above, and the operation thereof will be described below.
First, as shown in FIG. 10, the air cylinder 861 of the temporary placement mechanism 8 is operated to position the pair of support rails 80 at the upper position, and the gripping member 74 (see FIG. 6) of the unloading / loading mechanism 7 and the pair of restrictions. The support base 72 on which the pin 75 (see FIGS. 5 and 6) is disposed is positioned at the standby position shown.
次に、搬出・搬入機構7の搬送移動手段71(図1および図5参照)を作動して、図11に示すように把持部材74および一対の規制ピン75が配設された支持基台72をカセット載置機構6側に移動し、一対の規制ピン75(図5および図6参照)をカセット60に収容された半導体ウエーハWをダイシングテープTを介して支持する環状のフレームFに設けられたノッチF-1およびフラット面F-2(図1参照)と係合することにより、半導体ウエーハWを所定の位置に位置規制する。そして、エアーシリンダー740を作動することにより、環状のフレームFを支持基台72と把持部材74(図6参照)との間に把持する。 Next, the transport moving means 71 (see FIGS. 1 and 5) of the carry-out / carry-in mechanism 7 is operated, and the support base 72 in which the gripping member 74 and the pair of regulation pins 75 are disposed as shown in FIG. Is moved to the cassette mounting mechanism 6 side, and a pair of regulating pins 75 (see FIGS. 5 and 6) are provided on the annular frame F that supports the semiconductor wafer W accommodated in the cassette 60 via the dicing tape T. By engaging with the notch F-1 and the flat surface F-2 (see FIG. 1), the position of the semiconductor wafer W is regulated at a predetermined position. Then, by operating the air cylinder 740, the annular frame F is gripped between the support base 72 and the gripping member 74 (see FIG. 6).
環状のフレームFを支持基台72と把持部材74によって把持したならば、搬出・搬入機構7の搬送移動手段71を作動して支持基台72をカセット載置機構6と反対側に移動し、図12に示すように環状のフレームFを仮置き機構8の一対の支持レール80に搬送し、仮置きする。 If the annular frame F is gripped by the support base 72 and the gripping member 74, the transport movement means 71 of the unloading / loading mechanism 7 is operated to move the support base 72 to the opposite side of the cassette mounting mechanism 6. As shown in FIG. 12, the annular frame F is transported to a pair of support rails 80 of the temporary placement mechanism 8 and temporarily placed.
環状のフレームFを仮置き機構8の一対の支持レール80に搬送したならば、図13に示すようにエアーシリンダー861を作動して一対の支持レール80を下降して下部位置に位置付ける。この結果、環状のフレームFに装着され半導体ウエーハWが貼着されているダイシングテープTが、保持テーブル機構3における被加工物着脱位置に位置付けられている保持テーブル34の上面に載置される。そして、上記開閉手段85a、85b(図6および図8参照)を作動して一対の支持レール80の底部81a、81bを図8において実践で示す平一から2点鎖線で示す開市に位置付ける。 When the annular frame F is conveyed to the pair of support rails 80 of the temporary placement mechanism 8, as shown in FIG. 13, the air cylinder 861 is operated to lower the pair of support rails 80 and position them at the lower position. As a result, the dicing tape T attached to the annular frame F and having the semiconductor wafer W attached thereto is placed on the upper surface of the holding table 34 positioned at the workpiece attaching / detaching position in the holding table mechanism 3. Then, the opening / closing means 85a and 85b (see FIGS. 6 and 8) are operated so that the bottom portions 81a and 81b of the pair of support rails 80 are positioned in an open market indicated by a two-dot chain line shown in practice in FIG.
次に、図示しない吸引手段を作動することにより、図14に示すように保持テーブル34の上面にダイシングテープTを介して半導体ウエーハWを吸引保持する。そして、仮置き機構8のエアーシリンダー851を作動して一対の支持レール80を上昇して上部位置に位置付ける。 Next, by operating a suction means (not shown), the semiconductor wafer W is sucked and held on the upper surface of the holding table 34 via the dicing tape T as shown in FIG. Then, the air cylinder 851 of the temporary placement mechanism 8 is operated to raise the pair of support rails 80 and position them at the upper position.
図14に示すように保持テーブル34の上面にダイシングテープTを介して半導体ウエーハWを吸引保持したならば、保持テーブル機構3を構成する加工送り手段35を作動して半導体ウエーハWを吸引保持した保持テーブル34を図15に示すように切削機構4が配設された加工領域に移動する。そして、第1の切削手段5aと第2の切削手段5bとによって保持テーブル34に保持された半導体ウエーハWに所定の切削加工が施される。なお、保持テーブル34は上述したように外径が半導体ウエーハWの外径より大きく環状のフレームFの内径より小さく形成されているので、環状のフレームFが自重によって僅かに垂れ下がり、切削加工において第1の切削手段5aと第2の切削手段5bの切削ブレード533と干渉することがないとともに、フレーム押え機構が不要となりコスト低減になる。 As shown in FIG. 14, when the semiconductor wafer W is sucked and held on the upper surface of the holding table 34 via the dicing tape T, the processing feed means 35 constituting the holding table mechanism 3 is operated to suck and hold the semiconductor wafer W. As shown in FIG. 15, the holding table 34 is moved to the machining area where the cutting mechanism 4 is disposed. A predetermined cutting process is performed on the semiconductor wafer W held on the holding table 34 by the first cutting means 5a and the second cutting means 5b. As described above, the holding table 34 is formed so that the outer diameter is larger than the outer diameter of the semiconductor wafer W and smaller than the inner diameter of the annular frame F. There is no interference with the cutting blade 533 of the first cutting means 5a and the second cutting means 5b, and the frame pressing mechanism is not required, thereby reducing the cost.
上述したように保持テーブル34に保持された半導体ウエーハWに所定の切削加工を施したならば、加工送り手段35を作動して切削済みの半導体ウエーハWを吸引保持した保持テーブル34を図16に示す被加工物着脱位置に位置付ける。この状態で、保持テーブル34に保持された切削済みの半導体ウエーハWは、仮置き機構8の直下に位置付けられる。 When the semiconductor wafer W held on the holding table 34 is subjected to predetermined cutting as described above, the holding table 34 that sucks and holds the cut semiconductor wafer W by operating the processing feeding means 35 is shown in FIG. Position it at the workpiece attachment / detachment position shown. In this state, the cut semiconductor wafer W held on the holding table 34 is positioned directly below the temporary placement mechanism 8.
保持テーブル34に保持された切削済みの半導体ウエーハWを仮置き機構8の直下に位置付けたならば、仮置き機構8の一対の支持レール80の底部81a、81bを開位置に位置付けた状態でエアーシリンダー861を作動して、図17に示すように一対の支持レール80を下降して下部位置に位置付ける。そして、一対の支持レール80の底部81a、81bを閉位置に位置付けて環状のフレームFを支持するとともに、保持テーブル34による半導体ウエーハWの吸引保持を解除する。 If the cut semiconductor wafer W held on the holding table 34 is positioned immediately below the temporary placement mechanism 8, the air is applied with the bottom portions 81a and 81b of the pair of support rails 80 of the temporary placement mechanism 8 positioned at the open position. The cylinder 861 is operated, and the pair of support rails 80 are lowered and positioned at the lower position as shown in FIG. Then, the bottom portions 81a and 81b of the pair of support rails 80 are positioned at the closed position to support the annular frame F, and the suction holding of the semiconductor wafer W by the holding table 34 is released.
次に、仮置き機構8のエアーシリンダー861を作動して環状のフレームFを支持した一対の支持レール80を上昇させ、図18に示すように上部位置より僅かに下方で搬出・搬入機構7の把持部材74および一対の規制ピン75が一対の支持レール80に支持された切削済み半導体ウエーハWの上方を移動できる中間位置に一対の支持レール80を位置付ける。 Next, the air cylinder 861 of the temporary placement mechanism 8 is actuated to raise the pair of support rails 80 that support the annular frame F, and the carry-out / load-in mechanism 7 is slightly below the upper position as shown in FIG. The pair of support rails 80 are positioned at an intermediate position where the gripping member 74 and the pair of regulation pins 75 can move above the cut semiconductor wafer W supported by the pair of support rails 80.
そして、搬出・搬入機構7の搬送移動手段71を作動して、図19に示すように支持基台72をカセット載置機構6側に移動し、一対の規制ピン75(図5および図6参照)をカセット60に収容された半導体ウエーハWをダイシングテープTを介して支持する環状のフレームFに設けられたノッチF-1およびフラット面F-2(図1参照)と係合することにより、半導体ウエーハWを所定の位置に位置規制する。そして、エアーシリンダー740を作動することにより、新たな半導体ウエーハWを支持した環状のフレームFを支持基台72と把持部材74(図6参照)との間に把持する。このとき、把持部材74と一対の規制ピン75は、切削済み半導体ウエーハWの上方を移動する。 Then, the transport moving means 71 of the unloading / loading mechanism 7 is operated to move the support base 72 to the cassette mounting mechanism 6 side as shown in FIG. 19, and a pair of regulating pins 75 (see FIGS. 5 and 6). ) Is engaged with a notch F-1 and a flat surface F-2 (see FIG. 1) provided on an annular frame F that supports the semiconductor wafer W accommodated in the cassette 60 via the dicing tape T. The position of the semiconductor wafer W is regulated to a predetermined position. Then, by operating the air cylinder 740, the annular frame F supporting the new semiconductor wafer W is gripped between the support base 72 and the gripping member 74 (see FIG. 6). At this time, the gripping member 74 and the pair of regulating pins 75 move above the cut semiconductor wafer W.
次に、仮置き機構8のエアーシリンダー851を作動して切削済み半導体ウエーハWを支持した一対の支持レール80を上部位置に位置付けるとともに、切削済み半導体ウエーハWを支持する環状のフレームFにおけるカセット載置機構6側の端面を一対の補助規制ピン77と対向する位置に位置付ける。その後、搬出・搬入機構7の搬送移動手段71を作動して、図20に示すように支持基台72をカセット載置機構6と反対側に移動することにより、支持基台72と把持部材74によって把持された新たな半導体ウエーハWを支持した環状のフレームFを仮置き機構8の一対の支持レール80に搬送するとともに、一対の補助規制ピン77が当接される切削済み半導体ウエーハWを支持した環状のフレームFを補助仮置き機構9の一対の補助支持レール90に搬送する。 Next, the air cylinder 851 of the temporary placement mechanism 8 is operated to position the pair of support rails 80 that support the cut semiconductor wafer W at the upper position, and the cassette is mounted on the annular frame F that supports the cut semiconductor wafer W. The end surface on the placement mechanism 6 side is positioned at a position facing the pair of auxiliary regulating pins 77. Thereafter, the transport moving means 71 of the unloading / loading mechanism 7 is operated to move the support base 72 to the opposite side of the cassette mounting mechanism 6 as shown in FIG. The annular frame F supporting the new semiconductor wafer W held by the carrier is transported to the pair of support rails 80 of the temporary placement mechanism 8 and supports the semiconductor wafer W after being cut against which the pair of auxiliary regulating pins 77 abut. The annular frame F is conveyed to a pair of auxiliary support rails 90 of the auxiliary temporary placement mechanism 9.
切削済み半導体ウエーハWを支持した環状のフレームFを補助仮置き機構9の一対の補助支持レール90に搬送したならば、図21に示すようにエアーシリンダー961を作動して一対の補助支持レール90を下降して下部位置に位置付ける。この状態で、環状のフレームFに装着され半導体ウエーハWが貼着されているダイシングテープTが、洗浄機構10のスピンナーテーブル12の上面に接触する。そして、一対の補助支持レール90の底部91a、91bを閉位置から開位置に位置付けることにより、切削済みの半導体ウエーハWをダイシングテープTを介してスピンナーテーブル12の上面に載置する。そして、図示しない吸引手段を作動することにより、スピンナーテーブル12の上面にダイシングテープTを介して切削済みの半導体ウエーハWを吸引保持する。 When the annular frame F supporting the cut semiconductor wafer W is transferred to the pair of auxiliary support rails 90 of the auxiliary temporary placement mechanism 9, the air cylinder 961 is operated as shown in FIG. Move down to the lower position. In this state, the dicing tape T attached to the annular frame F and having the semiconductor wafer W attached thereto contacts the upper surface of the spinner table 12 of the cleaning mechanism 10. Then, by positioning the bottom portions 91a and 91b of the pair of auxiliary support rails 90 from the closed position to the open position, the cut semiconductor wafer W is placed on the upper surface of the spinner table 12 via the dicing tape T. Then, by operating a suction means (not shown), the semiconductor wafer W that has been cut is sucked and held on the upper surface of the spinner table 12 via the dicing tape T.
次に、仮置き機構8の一対の支持レール80と補助仮置き機構9の一対の補助支持レール90を図22の(a)に示すように上部位置に位置付け、スピンナーテーブル12を回転するとともに、図22の(b)に示すように図示しない洗浄水供給手段を作動することにより噴射ノズル13から洗浄水130を噴射する。このとき、搬出・搬入機構7の支持基台72に配設された係合手段78の係合ロッド781を進出して噴射ノズル13と係合する位置に位置付け、搬送移動手段71を作動して係合ロッド781をY軸方向に往復動させる。従って、噴射ノズル13に連結されたワイヤー15の一端に連結された錘14の重力と協働して噴射ノズル13はY軸方向に往復動せしめられる。なお、噴射ノズル13の往復動範囲は、少なくとも切削済みの半導体ウエーハWの外周から中心までの範囲でよい。この結果、スピンナーテーブル12にダイシングテープTを介して吸引保持された切削済みの半導体ウエーハWはスピンナー洗浄される。なお、上記噴射ノズル13のY軸方向への往復動においては、搬出・搬入機構7が駆動源となっているので、小型化が可能となるとともに、コストの低減を図ることができる。また、スピンナーテーブル12は上述したように外径が半導体ウエーハWの外径より大きく環状のフレームFの内径より小さく形成されているので、環状のフレームFが自重によって僅かに垂れ下がり、半導体ウエーハWに供給された洗浄水が円滑に外周に排出されるとともに、フレーム押え機構が不要となりコスト低減になる。 Next, as shown in FIG. 22A, the pair of support rails 80 of the temporary placement mechanism 8 and the pair of auxiliary support rails 90 of the auxiliary temporary placement mechanism 9 are positioned at the upper position, and the spinner table 12 is rotated. As shown in FIG. 22B, the cleaning water 130 is sprayed from the spray nozzle 13 by operating the cleaning water supply means (not shown). At this time, the engaging rod 781 of the engaging means 78 disposed on the support base 72 of the carry-out / carry-in mechanism 7 is advanced to the position where it engages with the injection nozzle 13, and the transport moving means 71 is operated. The engagement rod 781 is reciprocated in the Y-axis direction. Therefore, the injection nozzle 13 is reciprocated in the Y-axis direction in cooperation with the gravity of the weight 14 connected to one end of the wire 15 connected to the injection nozzle 13. The reciprocating range of the injection nozzle 13 may be at least the range from the outer periphery to the center of the cut semiconductor wafer W. As a result, the cut semiconductor wafer W sucked and held on the spinner table 12 via the dicing tape T is subjected to spinner cleaning. In the reciprocating movement of the injection nozzle 13 in the Y-axis direction, the carry-out / carry-in mechanism 7 serves as a drive source, so that the size can be reduced and the cost can be reduced. Since the spinner table 12 is formed so that the outer diameter is larger than the outer diameter of the semiconductor wafer W and smaller than the inner diameter of the annular frame F as described above, the annular frame F slightly hangs down by its own weight. The supplied cleaning water is smoothly discharged to the outer periphery, and the frame pressing mechanism is unnecessary, thereby reducing the cost.
上述したように切削済みの半導体ウエーハWを洗浄したならば、図23に示すように搬出・搬入機構7を上記待機位置に位置付けるとともに、補助仮置き機構9を構成する一対の補助支持レール90の底部91a、91bを開位置に位置付けた状態で下部位置に位置付け、底部91a、91bを閉位置にして洗浄済みの半導体ウエーハWを支持する環状のフレームFを支持する。そして、スピンナーテーブル12による半導体ウエーハWの吸引保持を解除する。 When the cut semiconductor wafer W is cleaned as described above, the unloading / loading mechanism 7 is positioned at the standby position as shown in FIG. With the bottom portions 91a and 91b positioned at the open position, the bottom portions 91a and 91b are positioned at the lower position, and the bottom portions 91a and 91b are closed and the annular frame F that supports the cleaned semiconductor wafer W is supported. Then, the suction and holding of the semiconductor wafer W by the spinner table 12 is released.
次に、図24に示すように洗浄済みの半導体ウエーハWを支持する環状のフレームFを支持した補助仮置き機構9を構成する一対の補助支持レール90を上部位置に位置付ける。そして、搬出・搬入機構7の支持基台72に配設された補助把持部材76を作動して環状のフレームFを把持する。 Next, as shown in FIG. 24, a pair of auxiliary support rails 90 constituting the auxiliary temporary placement mechanism 9 that supports the annular frame F that supports the cleaned semiconductor wafer W are positioned at the upper position. Then, the auxiliary gripping member 76 disposed on the support base 72 of the unloading / loading mechanism 7 is operated to grip the annular frame F.
そして、搬出・搬入機構7の搬送移動手段71を作動して、図25に示すように洗浄済みの半導体ウエーハWを支持する環状のフレームFを補助仮置き機構9の一対の補助支持レール90から仮置き機構8の一対の支持レール80まで移動する。 Then, the transport movement means 71 of the carry-out / carry-in mechanism 7 is operated, and the annular frame F that supports the cleaned semiconductor wafer W is moved from the pair of auxiliary support rails 90 of the auxiliary temporary placement mechanism 9 as shown in FIG. It moves to the pair of support rails 80 of the temporary placement mechanism 8.
次に、図26に示すように仮置き機構8の一対の支持レール80を中間位置に位置付けるとともに、搬出・搬入機構7の支持基台72に配設された把持部材74および一対の規制ピン75を待機位置に位置付ける。 Next, as shown in FIG. 26, the pair of support rails 80 of the temporary placement mechanism 8 are positioned at an intermediate position, and the gripping member 74 and the pair of restriction pins 75 disposed on the support base 72 of the carry-out / load-in mechanism 7. At the standby position.
そして、搬出・搬入機構7の搬送移動手段71を作動して、図27に示すように支持基台72をカセット載置機構6側に移動して把持部材74および一対の規制ピン75を待機位置からカセット載置機構6に載置されたカセット60まで移動することにより、洗浄済みの半導体ウエーハWを支持する環状のフレームFをカセット60に収容する。 Then, the transport moving means 71 of the carry-out / carry-in mechanism 7 is operated to move the support base 72 toward the cassette mounting mechanism 6 as shown in FIG. 27 so that the gripping member 74 and the pair of regulating pins 75 are moved to the standby position. To the cassette 60 mounted on the cassette mounting mechanism 6, the annular frame F that supports the cleaned semiconductor wafer W is accommodated in the cassette 60.
なお、上述したように洗浄済みの半導体ウエーハWを洗浄するとともにカセット60に収容する作業を実施している際に、カセット60から仮置き機構8の一対の支持レール80に搬出された新たな半導体ウエーハWは、上述したように保持テーブル機構3を構成する保持テーブル34に搬送され吸引保持される。そして、保持テーブル34に吸引保持された新たな半導体ウエーハWは、加工送り手段35によって切削機構4が配設された加工領域に移動せしめられ、第1の切削手段5aと第2の切削手段5bによって所定の切削加工が施される。 As described above, a new semiconductor carried out from the cassette 60 to the pair of support rails 80 of the temporary placement mechanism 8 when the cleaned semiconductor wafer W is cleaned and accommodated in the cassette 60 is implemented. As described above, the wafer W is conveyed to the holding table 34 constituting the holding table mechanism 3 and sucked and held. Then, the new semiconductor wafer W sucked and held by the holding table 34 is moved to the machining area where the cutting mechanism 4 is disposed by the machining feed means 35, and the first cutting means 5a and the second cutting means 5b. A predetermined cutting process is performed.
以上のように、図示の実施形態における切削装置は、被加工物を保持する保持テーブル34が被加工物着脱領域に位置付けられている際に、搬出・搬入機構7によってカセット60に収容された半導体ウエーハWをダイシングテープTを介して支持する環状のフレームFを搬出して仮置き機構8を構成する一対の支持レール80に仮置きし、昇降手段86によって一対の支持レール80を下降して環状のフレームFにダイシングテープTを介して支持された半導体ウエーハWを保持テーブル34に載置し、開閉手段85a、85bによって底部81a、81bを開くことによりダイシングテープTを介して半導体ウエーハWを保持テーブル34に保持するので、被加工物としての半導体ウエーハWをダイシングテープTを介して支持する環状のフレームFを搬送する搬送手段は実質的に搬出・搬入機構7のみであるため、部品点数が低減してコストが低減が低減するとともに、装置の小型化を図ることができる。また、搬出・搬入機構7は、洗浄機構10のスピンナーテーブル12の直上に配設された補助仮置き機構9にも切削済の半導体ウエーハWをダイシングテープTを介して支持する環状のフレームFを搬送する機能を有しているので、更に装置の小型化を図ることができる。 As described above, the cutting apparatus in the illustrated embodiment is configured such that the semiconductor housed in the cassette 60 by the carry-out / carry-in mechanism 7 when the holding table 34 that holds the workpiece is positioned in the workpiece attachment / detachment region. The annular frame F that supports the wafer W via the dicing tape T is unloaded and temporarily placed on a pair of support rails 80 constituting the temporary placement mechanism 8. The semiconductor wafer W supported on the frame F via the dicing tape T is placed on the holding table 34, and the semiconductor wafer W is held via the dicing tape T by opening the bottom portions 81a and 81b by the opening / closing means 85a and 85b. Since it is held on the table 34, it conveys an annular frame F that supports a semiconductor wafer W as a workpiece through a dicing tape T. Since the carrying means for carrying out is substantially only the carry-out / carry-in mechanism 7, the number of parts can be reduced, the cost can be reduced, and the apparatus can be downsized. Further, the carry-out / carry-in mechanism 7 also has an annular frame F that supports the cut semiconductor wafer W via the dicing tape T also in the auxiliary temporary placement mechanism 9 disposed immediately above the spinner table 12 of the cleaning mechanism 10. Since it has the function to convey, the apparatus can be further miniaturized.
2:静止基台
3:保持テーブル機構
32:移動基台
34:保持テーブル
35:加工送り手段
351:X軸リニアレール
352:X軸コイル可動子
4:切削機構
5a:第1の切削手段
5b:第2の切削手段
54:割り出し送り手段
540:共通のY軸リニアレール
544a:第1のY軸コイル可動子
544b:第2のコイル可動子
6:カセット載置機構
60:カセット
7:搬出・搬入機構
71:搬送移動手段
72:支持基台
74:把持部材
75:一対の規制ピン
76:補助把持部材
77:一対の補助規制ピン
8:仮置き機構
80:一対の支持レール
9:補助仮置き機構
90:一対の補助支持レール
10:洗浄機構
11:洗浄ハウジング
12:スピンナーテーブル
13:噴射ノズル
14:錘
15:ワイヤー
16:プーリー
F:環状のフレーム
T:ダイシングテープ
W:半導体ウエーハ
2: Stationary base 3: Holding table mechanism 32: Moving base 34: Holding table 35: Processing feed means 351: X-axis linear rail 352: X-axis coil mover 4: Cutting mechanism 5a: First cutting means 5b: Second cutting means 54: Index feeding means 540: Common Y-axis linear rail 544a: First Y-axis coil mover 544b: Second coil mover 6: Cassette mounting mechanism 60: Cassette 7: Unloading / loading Mechanism 71: Transport moving means 72: Support base 74: Holding member 75: A pair of restricting pins 76: Auxiliary holding member 77: A pair of auxiliary restricting pins 8: Temporary placement mechanism 80: A pair of support rails 9: Auxiliary temporary placement mechanism 90: A pair of auxiliary support rails 10: Cleaning mechanism 11: Cleaning housing 12: Spinner table 13: Injection nozzle 14: Weight 15: Wire 16: Pulley
F: Ring frame
T: Dicing tape
W: Semiconductor wafer
Claims (5)
該第1の切削手段および第2の切削手段は、それぞれ移動基台と、該移動基台にそれぞれ配設され互いに同一軸線上に配設された切削ブレードを備え、該第1の切削手段の移動基台および該第2の切削手段の移動基台がY軸方向に沿って配設されたY軸ガイドレールに移動可能に支持されており、
該割り出し送り手段は、該Y軸ガイドレールに沿って配設された共通のY軸リニアレールと、該Y軸リニアレールに移動可能に嵌挿され該第1の切削手段の移動基台に装着された第1のコイル可動子と、該Y軸リニアレールに移動可能に嵌挿され該第2の切削手段の移動基台に装着された第2のコイル可動子と、からなり、
該加工送り機構は、該保持テーブルが配設された移動基台を該仮置き機構が配設された被加工物着脱領域と、該第1の切削手段および第2の切削手段が配設された加工領域との間において移動可能に支持するX軸ガイドレールと、該X軸ガイドレールに沿って配設されたX軸リニアレールと、該X軸リニアレールに移動可能に嵌挿され該移動基台に装着されたX軸コイル可動子と、からなり、
該カセット載置機構と該仮置き機構はY軸方向に隣接して配設され、
該搬出・搬入機構は、支持基台と、該支持基台に配設されカセットに収容された被加工物を把持する把持部材と、被加工物を所定の位置に規制する一対の規制ピンと、該支持基台をY軸方向に移動する搬送移動手段とを備え、
該仮置き機構は、Y軸方向に延在し被加工物の両側部を支持する底部と側部とを有し該底部が開閉可能に構成された一対の支持レールと、該一対の支持レールの該底部を開閉する開閉手段と、該一対の支持レールを上下方向に移動せしめる昇降手段と、を備えており、 該保持テーブルが該被加工物着脱領域に位置付けられている際に、該搬出・搬入機構によってカセットに収容された被加工物を搬出して該仮置き機構を構成する該一対の支持レールに仮置きし、該昇降手段によって該一対の支持レールを下降して被加工物を該保持テーブルに載置し、該開閉手段によって該底部を開くことにより被加工物を該保持テーブルに保持する、切削装置。 A cassette mounting mechanism on which a cassette containing a plurality of workpieces is mounted, a carry-out / carry-in mechanism for carrying out and carrying in the workpieces from the cassette placed on the cassette mounting mechanism, and the carry-out / carry-in Temporary placement mechanism for temporarily placing the workpiece unloaded by the mechanism, holding table for holding the workpiece temporarily placed on the temporary placement mechanism, and moving the holding table in the machining feed direction (X-axis direction) The cutting feed mechanism, the first cutting means and the second cutting means for cutting the workpiece held on the holding table, and the first cutting means and the second cutting means in the X-axis direction. A cutting apparatus comprising: an indexing feed mechanism that moves each in an indexing feed direction (Y-axis direction) orthogonal to
Each of the first cutting means and the second cutting means includes a moving base, and cutting blades disposed on the moving base and arranged on the same axis, respectively. The moving base and the moving base of the second cutting means are supported movably on a Y-axis guide rail disposed along the Y-axis direction,
The indexing and feeding means is mounted on a common base of the first cutting means and a common Y-axis linear rail arranged along the Y-axis guide rail and movably fitted on the Y-axis linear rail. A first coil mover, and a second coil mover that is movably inserted into the Y-axis linear rail and is mounted on the moving base of the second cutting means,
The processing-feed mechanism, and the workpiece detaching area mechanism placed provisional movement base on which the holding table is disposed is disposed, said first cutting means and the second cutting means is arranged An X-axis guide rail that is movably supported between the machining area, an X-axis linear rail disposed along the X-axis guide rail, and a movement that is inserted into the X-axis linear rail so as to be movable. An X-axis coil mover mounted on the base,
The cassette placement mechanism and the temporary placement mechanism are disposed adjacent to each other in the Y-axis direction,
The unloading / carrying-in mechanism includes a support base, a gripping member that grips the workpiece disposed in the support base and accommodated in a cassette, and a pair of regulation pins that regulate the workpiece to a predetermined position; Transport movement means for moving the support base in the Y-axis direction,
The temporary placement mechanism includes a pair of support rails extending in the Y-axis direction and having bottom and side portions that support both side portions of the workpiece, the bottom portions being configured to be openable and closable, and the pair of support rails An opening / closing means for opening and closing the bottom of the base plate and an elevating means for moving the pair of support rails in the vertical direction, and when the holding table is positioned in the workpiece attaching / detaching area, -The workpiece stored in the cassette is unloaded by the loading mechanism, temporarily placed on the pair of support rails constituting the temporary placement mechanism, and the workpiece is lowered by lowering the pair of support rails by the lifting means. A cutting apparatus that is placed on the holding table and holds the workpiece on the holding table by opening the bottom by the opening / closing means.
該補助仮置き機構は、Y軸方向に延在し被加工物の両側部を支持する底部と側部とを有し該底部が開閉可能に構成された一対の補助支持レールと、該一対の補助支持レールの該底部を開閉する開閉手段と、該一対の補助支持レールを上下方向に移動せしめる補助昇降手段とを備えている、請求項1記載の切削装置。 A cleaning mechanism provided with a spinner table for cleaning a workpiece adjacent to the temporary placement mechanism and on the opposite side to the cassette mounting mechanism in the Y-axis direction is disposed, and the cleaning mechanism is disposed immediately above the cleaning mechanism. An auxiliary temporary placement mechanism that is configured to communicate with the temporary placement mechanism and temporarily places the workpiece is disposed,
The auxiliary temporary placement mechanism includes a pair of auxiliary support rails that extend in the Y-axis direction and have a bottom portion and a side portion that support both side portions of the workpiece, and the bottom portions are configured to be openable and closable. The cutting apparatus according to claim 1, further comprising: an opening / closing means for opening and closing the bottom portion of the auxiliary support rail; and an auxiliary lifting means for moving the pair of auxiliary support rails in the vertical direction .
切削済みの被加工物を保持した該保持テーブルが該被加工物着脱領域に位置付けられている際に、該仮置き機構を構成する該一対の支持レールの該底部を開にした状態で該一対の支持レールを下降して該底部を切削済みの被加工物の下部に位置付けた後に該底部を閉にして切削済みの被加工物を支持した状態で該一対の支持レールを上昇させ、
次に、該搬出・搬入機構の該把持部材によってカセットに収容された被加工物を把持するとともに該支持基台に設けられた該一対の補助規制ピンを切削済みの該被加工物における該把持部材によって把持された領域と反対側の領域の端面に位置付け、該支持基台を該補助仮置き機構側に移動することにより、カセットに収容された被加工物を該仮置き機構に位置付けるとともに切削済みの被加工物を該補助仮置き機構に位置付け、
次に、該補助仮置き機構を構成する該補助昇降手段によって該一対の補助支持レールに仮置きし、該昇降手段によって該一対の補助支持レールを下降して被加工物を該洗浄機構の該スピンナーテーブルに載置し、該開閉手段によって該底部を開くことにより切削済みの被加工物を該スピンナーテーブルに保持する、請求項2記載の切削装置。 The carry-in / carry-in mechanism includes an auxiliary gripping member that grips a region opposite to a region gripped by the gripping member in a workpiece that is disposed on the support base and supported by the pair of auxiliary support rails; A pair of auxiliary restriction pins for restricting the workpiece supported by the pair of auxiliary support rails to a predetermined position;
When the holding table holding the cut workpiece is positioned in the workpiece attaching / detaching region, the pair of support rails constituting the temporary placement mechanism are opened with the bottom portions open. The pair of support rails are raised in a state where the bottom is closed and the cut workpiece is supported after the bottom is positioned below the cut workpiece and the bottom is closed.
Next, the workpiece stored in the cassette is gripped by the gripping member of the unloading / loading mechanism, and the pair of auxiliary regulating pins provided on the support base are gripped on the workpiece after cutting. Positioned on the end surface of the region opposite to the region gripped by the member, and moves the support base to the auxiliary temporary placement mechanism side, thereby positioning the workpiece contained in the cassette to the temporary placement mechanism and cutting Positioning the finished workpiece on the auxiliary temporary placement mechanism,
Next, the auxiliary lifting means constituting the auxiliary temporary placing mechanism temporarily places the pair of auxiliary supporting rails, and the lifting means lowers the pair of auxiliary supporting rails to remove the workpiece from the cleaning mechanism. The cutting apparatus according to claim 2, wherein the workpiece is mounted on the spinner table, and the cut workpiece is held on the spinner table by opening the bottom by the opening / closing means .
該係合手段は、該支持基台に進退可能に配設された係合ロッドを備え、該係合ロッドを進出した状態で該噴射ノズルにおける該錘の重力によって移動する方向から接触せしめる、請求項4記載の切削装置。 The spray nozzle of the cleaning mechanism is connected to the other end of a wire having a weight connected to one end via a pulley, and is configured to move in the Y-axis direction by the gravity of the weight.
The engagement means includes an engagement rod disposed on the support base so as to be capable of advancing and retreating, and makes the contact from the direction of movement by the gravity of the weight in the injection nozzle in the advanced state. Item 5. The cutting device according to Item 4.
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