JP6420143B2 - An organic semiconductor material characterized by a bent thienothiophene skeleton having a thiophene at the end. - Google Patents
An organic semiconductor material characterized by a bent thienothiophene skeleton having a thiophene at the end. Download PDFInfo
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- JP6420143B2 JP6420143B2 JP2014266919A JP2014266919A JP6420143B2 JP 6420143 B2 JP6420143 B2 JP 6420143B2 JP 2014266919 A JP2014266919 A JP 2014266919A JP 2014266919 A JP2014266919 A JP 2014266919A JP 6420143 B2 JP6420143 B2 JP 6420143B2
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- 239000004065 semiconductor Substances 0.000 title claims description 34
- YTPLMLYBLZKORZ-UHFFFAOYSA-N Thiophene Chemical compound C=1C=CSC=1 YTPLMLYBLZKORZ-UHFFFAOYSA-N 0.000 title claims description 26
- 239000000463 material Substances 0.000 title claims description 24
- VJYJJHQEVLEOFL-UHFFFAOYSA-N thieno[3,2-b]thiophene Chemical group S1C=CC2=C1C=CS2 VJYJJHQEVLEOFL-UHFFFAOYSA-N 0.000 title claims description 19
- 229930192474 thiophene Natural products 0.000 title claims description 11
- 239000000126 substance Substances 0.000 claims description 72
- 125000004432 carbon atom Chemical group C* 0.000 claims description 33
- 125000001424 substituent group Chemical group 0.000 claims description 20
- 125000003118 aryl group Chemical group 0.000 claims description 7
- 125000000623 heterocyclic group Chemical group 0.000 claims description 7
- 125000003342 alkenyl group Chemical group 0.000 claims description 6
- 125000000217 alkyl group Chemical group 0.000 claims description 6
- 125000000304 alkynyl group Chemical group 0.000 claims description 6
- 125000003277 amino group Chemical group 0.000 claims description 6
- 125000005843 halogen group Chemical group 0.000 claims description 4
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 4
- 125000003545 alkoxy group Chemical group 0.000 claims description 3
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 3
- 125000004185 ester group Chemical group 0.000 claims description 3
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 3
- 125000001841 imino group Chemical group [H]N=* 0.000 claims description 3
- 125000002560 nitrile group Chemical group 0.000 claims description 3
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims description 3
- 125000003808 silyl group Chemical group [H][Si]([H])([H])[*] 0.000 claims description 3
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 claims description 3
- 125000003396 thiol group Chemical group [H]S* 0.000 claims description 3
- 125000003368 amide group Chemical group 0.000 claims description 2
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 claims 1
- 238000000034 method Methods 0.000 description 27
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 18
- 150000001875 compounds Chemical class 0.000 description 17
- -1 polycyclic aromatic compound Chemical class 0.000 description 17
- 238000005160 1H NMR spectroscopy Methods 0.000 description 12
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 12
- 230000008569 process Effects 0.000 description 11
- 239000000243 solution Substances 0.000 description 11
- 239000003960 organic solvent Substances 0.000 description 10
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 9
- 238000006243 chemical reaction Methods 0.000 description 9
- 238000001644 13C nuclear magnetic resonance spectroscopy Methods 0.000 description 8
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 8
- 229910052717 sulfur Inorganic materials 0.000 description 8
- FYSNRJHAOHDILO-UHFFFAOYSA-N thionyl chloride Chemical compound ClS(Cl)=O FYSNRJHAOHDILO-UHFFFAOYSA-N 0.000 description 8
- 229940126062 Compound A Drugs 0.000 description 7
- NLDMNSXOCDLTTB-UHFFFAOYSA-N Heterophylliin A Natural products O1C2COC(=O)C3=CC(O)=C(O)C(O)=C3C3=C(O)C(O)=C(O)C=C3C(=O)OC2C(OC(=O)C=2C=C(O)C(O)=C(O)C=2)C(O)C1OC(=O)C1=CC(O)=C(O)C(O)=C1 NLDMNSXOCDLTTB-UHFFFAOYSA-N 0.000 description 7
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 7
- 239000011593 sulfur Substances 0.000 description 7
- HEDRZPFGACZZDS-MICDWDOJSA-N Trichloro(2H)methane Chemical compound [2H]C(Cl)(Cl)Cl HEDRZPFGACZZDS-MICDWDOJSA-N 0.000 description 6
- 125000005605 benzo group Chemical group 0.000 description 6
- 238000005259 measurement Methods 0.000 description 6
- 238000000425 proton nuclear magnetic resonance spectrum Methods 0.000 description 6
- YLQBMQCUIZJEEH-UHFFFAOYSA-N Furan Chemical group C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 5
- 238000004770 highest occupied molecular orbital Methods 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- FCEHBMOGCRZNNI-UHFFFAOYSA-N 1-benzothiophene Chemical compound C1=CC=C2SC=CC2=C1 FCEHBMOGCRZNNI-UHFFFAOYSA-N 0.000 description 4
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 4
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 4
- 229910052794 bromium Inorganic materials 0.000 description 4
- 239000003795 chemical substances by application Substances 0.000 description 4
- 239000000460 chlorine Substances 0.000 description 4
- SLIUAWYAILUBJU-UHFFFAOYSA-N pentacene Chemical compound C1=CC=CC2=CC3=CC4=CC5=CC=CC=C5C=C4C=C3C=C21 SLIUAWYAILUBJU-UHFFFAOYSA-N 0.000 description 4
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 4
- 238000007639 printing Methods 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- 238000001228 spectrum Methods 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- 102100022704 Amyloid-beta precursor protein Human genes 0.000 description 3
- 102100033215 DNA nucleotidylexotransferase Human genes 0.000 description 3
- 101000823051 Homo sapiens Amyloid-beta precursor protein Proteins 0.000 description 3
- 101000800646 Homo sapiens DNA nucleotidylexotransferase Proteins 0.000 description 3
- DZHSAHHDTRWUTF-SIQRNXPUSA-N amyloid-beta polypeptide 42 Chemical compound C([C@@H](C(=O)N[C@@H](C)C(=O)N[C@@H](CCC(O)=O)C(=O)N[C@@H](CC(O)=O)C(=O)N[C@H](C(=O)NCC(=O)N[C@@H](CO)C(=O)N[C@@H](CC(N)=O)C(=O)N[C@@H](CCCCN)C(=O)NCC(=O)N[C@@H](C)C(=O)N[C@H](C(=O)N[C@@H]([C@@H](C)CC)C(=O)NCC(=O)N[C@@H](CC(C)C)C(=O)N[C@@H](CCSC)C(=O)N[C@@H](C(C)C)C(=O)NCC(=O)NCC(=O)N[C@@H](C(C)C)C(=O)N[C@@H](C(C)C)C(=O)N[C@@H]([C@@H](C)CC)C(=O)N[C@@H](C)C(O)=O)[C@@H](C)CC)C(C)C)NC(=O)[C@H](CC=1C=CC=CC=1)NC(=O)[C@@H](NC(=O)[C@H](CC(C)C)NC(=O)[C@H](CCCCN)NC(=O)[C@H](CCC(N)=O)NC(=O)[C@H](CC=1N=CNC=1)NC(=O)[C@H](CC=1N=CNC=1)NC(=O)[C@@H](NC(=O)[C@H](CCC(O)=O)NC(=O)[C@H](CC=1C=CC(O)=CC=1)NC(=O)CNC(=O)[C@H](CO)NC(=O)[C@H](CC(O)=O)NC(=O)[C@H](CC=1N=CNC=1)NC(=O)[C@H](CCCNC(N)=N)NC(=O)[C@H](CC=1C=CC=CC=1)NC(=O)[C@H](CCC(O)=O)NC(=O)[C@H](C)NC(=O)[C@@H](N)CC(O)=O)C(C)C)C(C)C)C1=CC=CC=C1 DZHSAHHDTRWUTF-SIQRNXPUSA-N 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 229910052731 fluorine Inorganic materials 0.000 description 3
- 125000001153 fluoro group Chemical group F* 0.000 description 3
- 229910052736 halogen Inorganic materials 0.000 description 3
- 230000002140 halogenating effect Effects 0.000 description 3
- 150000002367 halogens Chemical class 0.000 description 3
- 238000002844 melting Methods 0.000 description 3
- 230000008018 melting Effects 0.000 description 3
- 239000012044 organic layer Substances 0.000 description 3
- 229920000137 polyphosphoric acid Polymers 0.000 description 3
- 238000001308 synthesis method Methods 0.000 description 3
- 238000003786 synthesis reaction Methods 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- 238000002211 ultraviolet spectrum Methods 0.000 description 3
- QPFMBZIOSGYJDE-UHFFFAOYSA-N 1,1,2,2-tetrachloroethane Chemical compound ClC(Cl)C(Cl)Cl QPFMBZIOSGYJDE-UHFFFAOYSA-N 0.000 description 2
- NMPVEAUIHMEAQP-UHFFFAOYSA-N 2-Bromoacetaldehyde Chemical compound BrCC=O NMPVEAUIHMEAQP-UHFFFAOYSA-N 0.000 description 2
- LILXDMFJXYAKMK-UHFFFAOYSA-N 2-bromo-1,1-diethoxyethane Chemical compound CCOC(CBr)OCC LILXDMFJXYAKMK-UHFFFAOYSA-N 0.000 description 2
- YUQUNWNSQDULTI-UHFFFAOYSA-N 2-bromobenzenethiol Chemical compound SC1=CC=CC=C1Br YUQUNWNSQDULTI-UHFFFAOYSA-N 0.000 description 2
- 229920003026 Acene Polymers 0.000 description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- KYQCOXFCLRTKLS-UHFFFAOYSA-N Pyrazine Chemical compound C1=CN=CC=N1 KYQCOXFCLRTKLS-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- KAESVJOAVNADME-UHFFFAOYSA-N Pyrrole Chemical compound C=1C=CNC=1 KAESVJOAVNADME-UHFFFAOYSA-N 0.000 description 2
- SMWDFEZZVXVKRB-UHFFFAOYSA-N Quinoline Chemical compound N1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-N 0.000 description 2
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 2
- DHKHKXVYLBGOIT-UHFFFAOYSA-N acetaldehyde Diethyl Acetal Natural products CCOC(C)OCC DHKHKXVYLBGOIT-UHFFFAOYSA-N 0.000 description 2
- IOJUPLGTWVMSFF-UHFFFAOYSA-N benzothiazole Chemical compound C1=CC=C2SC=NC2=C1 IOJUPLGTWVMSFF-UHFFFAOYSA-N 0.000 description 2
- 238000001460 carbon-13 nuclear magnetic resonance spectrum Methods 0.000 description 2
- 239000003153 chemical reaction reagent Substances 0.000 description 2
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 2
- WDECIBYCCFPHNR-UHFFFAOYSA-N chrysene Chemical compound C1=CC=CC2=CC=C3C4=CC=CC=C4C=CC3=C21 WDECIBYCCFPHNR-UHFFFAOYSA-N 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- TXCDCPKCNAJMEE-UHFFFAOYSA-N dibenzofuran Chemical compound C1=CC=C2C3=CC=CC=C3OC2=C1 TXCDCPKCNAJMEE-UHFFFAOYSA-N 0.000 description 2
- IYYZUPMFVPLQIF-UHFFFAOYSA-N dibenzothiophene Chemical compound C1=CC=C2C3=CC=CC=C3SC2=C1 IYYZUPMFVPLQIF-UHFFFAOYSA-N 0.000 description 2
- BOCFGAMKSYQRCI-UHFFFAOYSA-N dinaphtho[2,3-b:2',3'-d]furan Chemical compound C1=CC=C2C=C3C4=CC5=CC=CC=C5C=C4OC3=CC2=C1 BOCFGAMKSYQRCI-UHFFFAOYSA-N 0.000 description 2
- CZWHMRTTWFJMBC-UHFFFAOYSA-N dinaphtho[2,3-b:2',3'-f]thieno[3,2-b]thiophene Chemical compound C1=CC=C2C=C(SC=3C4=CC5=CC=CC=C5C=C4SC=33)C3=CC2=C1 CZWHMRTTWFJMBC-UHFFFAOYSA-N 0.000 description 2
- SYXXZXWLYNODHL-UHFFFAOYSA-N dinaphthothiophene Chemical compound C1=CC=CC2=C(C3=C(C4=CC=CC=C4C=C3)S3)C3=CC=C21 SYXXZXWLYNODHL-UHFFFAOYSA-N 0.000 description 2
- VGWBXRXNERKBSJ-UHFFFAOYSA-N dithieno[2,3-a:2',3'-d]thiophene Chemical compound C1=CSC2=C1SC1=C2SC=C1 VGWBXRXNERKBSJ-UHFFFAOYSA-N 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 230000006870 function Effects 0.000 description 2
- DLEDOFVPSDKWEF-UHFFFAOYSA-N lithium butane Chemical compound [Li+].CCC[CH2-] DLEDOFVPSDKWEF-UHFFFAOYSA-N 0.000 description 2
- KWGKDLIKAYFUFQ-UHFFFAOYSA-M lithium chloride Chemical compound [Li+].[Cl-] KWGKDLIKAYFUFQ-UHFFFAOYSA-M 0.000 description 2
- MZRVEZGGRBJDDB-UHFFFAOYSA-N n-Butyllithium Substances [Li]CCCC MZRVEZGGRBJDDB-UHFFFAOYSA-N 0.000 description 2
- LQNUZADURLCDLV-UHFFFAOYSA-N nitrobenzene Chemical compound [O-][N+](=O)C1=CC=CC=C1 LQNUZADURLCDLV-UHFFFAOYSA-N 0.000 description 2
- 239000012299 nitrogen atmosphere Substances 0.000 description 2
- 125000001979 organolithium group Chemical group 0.000 description 2
- 150000002902 organometallic compounds Chemical class 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 238000000746 purification Methods 0.000 description 2
- 229910052711 selenium Inorganic materials 0.000 description 2
- 239000011669 selenium Substances 0.000 description 2
- MFRIHAYPQRLWNB-UHFFFAOYSA-N sodium tert-butoxide Chemical compound [Na+].CC(C)(C)[O-] MFRIHAYPQRLWNB-UHFFFAOYSA-N 0.000 description 2
- 230000002194 synthesizing effect Effects 0.000 description 2
- 125000000101 thioether group Chemical group 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical compound C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 description 1
- WQONPSCCEXUXTQ-UHFFFAOYSA-N 1,2-dibromobenzene Chemical compound BrC1=CC=CC=C1Br WQONPSCCEXUXTQ-UHFFFAOYSA-N 0.000 description 1
- YJTKZCDBKVTVBY-UHFFFAOYSA-N 1,3-Diphenylbenzene Chemical group C1=CC=CC=C1C1=CC=CC(C=2C=CC=CC=2)=C1 YJTKZCDBKVTVBY-UHFFFAOYSA-N 0.000 description 1
- OIRHKGBNGGSCGS-UHFFFAOYSA-N 1-bromo-2-iodobenzene Chemical compound BrC1=CC=CC=C1I OIRHKGBNGGSCGS-UHFFFAOYSA-N 0.000 description 1
- 125000001637 1-naphthyl group Chemical group [H]C1=C([H])C([H])=C2C(*)=C([H])C([H])=C([H])C2=C1[H] 0.000 description 1
- 125000001622 2-naphthyl group Chemical group [H]C1=C([H])C([H])=C2C([H])=C(*)C([H])=C([H])C2=C1[H] 0.000 description 1
- IKHGUXGNUITLKF-UHFFFAOYSA-N Acetaldehyde Chemical class CC=O IKHGUXGNUITLKF-UHFFFAOYSA-N 0.000 description 1
- 0 CC1C(N)=C(C(CC([P-])=C2*)C(CC3C4=C(C)[*+2]5)IC3C(*)=C(*)C4=C5C#C)C2=C1C Chemical compound CC1C(N)=C(C(CC([P-])=C2*)C(CC3C4=C(C)[*+2]5)IC3C(*)=C(*)C4=C5C#C)C2=C1C 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- PCNDJXKNXGMECE-UHFFFAOYSA-N Phenazine Natural products C1=CC=CC2=NC3=CC=CC=C3N=C21 PCNDJXKNXGMECE-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- XBDYBAVJXHJMNQ-UHFFFAOYSA-N Tetrahydroanthracene Natural products C1=CC=C2C=C(CCCC3)C3=CC2=C1 XBDYBAVJXHJMNQ-UHFFFAOYSA-N 0.000 description 1
- FZWLAAWBMGSTSO-UHFFFAOYSA-N Thiazole Chemical compound C1=CSC=N1 FZWLAAWBMGSTSO-UHFFFAOYSA-N 0.000 description 1
- RWBMMASKJODNSV-UHFFFAOYSA-N [1]benzothiolo[2,3-g][1]benzothiole Chemical compound C1=CC=C2C3=C(SC=C4)C4=CC=C3SC2=C1 RWBMMASKJODNSV-UHFFFAOYSA-N 0.000 description 1
- 150000001241 acetals Chemical class 0.000 description 1
- 239000003377 acid catalyst Substances 0.000 description 1
- 125000005073 adamantyl group Chemical group C12(CC3CC(CC(C1)C3)C2)* 0.000 description 1
- 150000001299 aldehydes Chemical class 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- MWPLVEDNUUSJAV-UHFFFAOYSA-N anthracene Chemical group C1=CC=CC2=CC3=CC=CC=C3C=C21 MWPLVEDNUUSJAV-UHFFFAOYSA-N 0.000 description 1
- 125000005428 anthryl group Chemical group [H]C1=C([H])C([H])=C2C([H])=C3C(*)=C([H])C([H])=C([H])C3=C([H])C2=C1[H] 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical group [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 238000007611 bar coating method Methods 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- RFRXIWQYSOIBDI-UHFFFAOYSA-N benzarone Chemical compound CCC=1OC2=CC=CC=C2C=1C(=O)C1=CC=C(O)C=C1 RFRXIWQYSOIBDI-UHFFFAOYSA-N 0.000 description 1
- 125000006267 biphenyl group Chemical group 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 229910052798 chalcogen Inorganic materials 0.000 description 1
- 150000001787 chalcogens Chemical class 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 125000006165 cyclic alkyl group Chemical group 0.000 description 1
- HPXRVTGHNJAIIH-UHFFFAOYSA-N cyclohexanol Chemical compound OC1CCCCC1 HPXRVTGHNJAIIH-UHFFFAOYSA-N 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 125000001559 cyclopropyl group Chemical group [H]C1([H])C([H])([H])C1([H])* 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- XPPKVPWEQAFLFU-UHFFFAOYSA-N diphosphoric acid Chemical compound OP(O)(=O)OP(O)(O)=O XPPKVPWEQAFLFU-UHFFFAOYSA-N 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 230000005669 field effect Effects 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 125000004991 fluoroalkenyl group Chemical group 0.000 description 1
- 125000003709 fluoroalkyl group Chemical group 0.000 description 1
- 238000005227 gel permeation chromatography Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 230000009878 intermolecular interaction Effects 0.000 description 1
- PNDPGZBMCMUPRI-UHFFFAOYSA-N iodine Chemical compound II PNDPGZBMCMUPRI-UHFFFAOYSA-N 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- IUYHWZFSGMZEOG-UHFFFAOYSA-M magnesium;propane;chloride Chemical compound [Mg+2].[Cl-].C[CH-]C IUYHWZFSGMZEOG-UHFFFAOYSA-M 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000004949 mass spectrometry Methods 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 125000005743 methylethenyl group Chemical group [H]\C(*)=C(\[H])C([H])([H])[H] 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000003136 n-heptyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- JIKUXBYRTXDNIY-UHFFFAOYSA-N n-methyl-n-phenylformamide Chemical compound O=CN(C)C1=CC=CC=C1 JIKUXBYRTXDNIY-UHFFFAOYSA-N 0.000 description 1
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 239000012071 phase Substances 0.000 description 1
- 125000005561 phenanthryl group Chemical group 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 125000000168 pyrrolyl group Chemical group 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 238000001953 recrystallisation Methods 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- MABNMNVCOAICNO-UHFFFAOYSA-N selenophene Chemical group C=1C=C[se]C=1 MABNMNVCOAICNO-UHFFFAOYSA-N 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 125000004434 sulfur atom Chemical group 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- IFLREYGFSNHWGE-UHFFFAOYSA-N tetracene Chemical compound C1=CC=CC2=CC3=CC4=CC=CC=C4C=C3C=C21 IFLREYGFSNHWGE-UHFFFAOYSA-N 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/549—Organic PV cells
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Description
本発明は、屈曲型の有機半導体材料に関する、また該有機半導体材料を用いた有機電子デバイスに関するものである。 The present invention relates to a bent organic semiconductor material, and to an organic electronic device using the organic semiconductor material.
有機半導体は、有機ELや電子ペーパーなどのフレキシブルディスプレーへの応用が期待され、ウェットプロセスである塗布や印刷によって大面積の素子を、シリコン半導体よりも低コストで作製できることが期待されている。このようなウェットプロセスへ適応させるために、溶媒への溶解性を高め、また耐酸化性等の安定性のある有機半導体材料が求められている。 Organic semiconductors are expected to be applied to flexible displays such as organic EL and electronic paper, and it is expected that a large-area element can be produced at a lower cost than silicon semiconductors by application or printing, which are wet processes. In order to adapt to such a wet process, an organic semiconductor material having improved solubility in a solvent and having stability such as oxidation resistance is required.
高いキャリア移動度を有するペンタセンやテトラセン等のポリアセン化合物は、有機半導体材料として古くから知られている。しかし、このポリアセン化合物は、光や酸化に対して不安定であり、更に有機溶媒への溶解性が低いためウェットプロセスに利用することが困難である。そこで、化学的安定性や溶解度を改善するため、アセン骨格の一部に硫黄やセレン等のカルコゲン元素を導入したベンゾチエノベンゾチオフェン(以下、BTBTとする。)やジナフトチエノチオフェン(以下、DNTTとする。)などが多数検討されている。 Polyacene compounds such as pentacene and tetracene having high carrier mobility have long been known as organic semiconductor materials. However, this polyacene compound is unstable to light and oxidation, and further has low solubility in an organic solvent, so that it is difficult to use it in a wet process. Therefore, in order to improve chemical stability and solubility, benzothienobenzothiophene (hereinafter referred to as BTBT) or dinaphthothienothiophene (hereinafter referred to as DNTT) in which a chalcogen element such as sulfur or selenium is introduced into a part of the acene skeleton. Etc.) are being studied.
DNTTの中でも非特許文献1、特許文献1に記載のジナフト[2,3−b:2’,3’−f]チエノ[3,2−b]チエノチオフェン(以下,本非特許文献1の提案者は、この有機半導体をDNTTと称しているが、ここでは2,3−DNTTとする。)は、キャリアー移動度が2.0cm2/Vsと高い値を示すことが報告されている。しかし、2,3−DNTTは、溶液状態で安定であるが、その溶解度は、室温でジクロロメタン1リットル中3.44mgであり、溶解性が低く、ウェットプロセスに利用することが困難である。そこで、本願発明者らは、2,3−DNTTとは別に溶媒中で安定であり、かつ、溶解性の高いジナフト[2,1−b:2‘,1’−f]チエノ[3,2−b]チオフェン(以下2,1−DNTTとする。)を開発し特許権を取得した。(特許文献2、特許文献3)
また、2,1−DNTTと異性体関係にあるジナフト[1,2−b:1‘,2’−f]チエノ[3,2−b]チオフェン(以下1,2−DNTTとする。)も特許文献2、3と同一の出願人により特許されている(特許文献4)。
Among the DNTTs, dinaphtho [2,3-b: 2 ′, 3′-f] thieno [3,2-b] thienothiophene described in
In addition, dinaphtho [1,2-b: 1 ′, 2′-f] thieno [3,2-b] thiophene (hereinafter referred to as 1,2-DNTT) which has an isomer relationship with 2,1-DNTT is also used. Patented by the same applicant as
以下に、2,3−DNTT、2,1−DNTT、1,2−DNTTの一般式を[化A1]、[化A2]、[化A3]に示す。
[化A1]
[化A2]
[化A3]
The general formulas of 2,3-DNTT, 2,1-DNTT, and 1,2-DNTT are shown in [Chemical A1], [Chemical A2], and [Chemical A3] below.
[Chemical A1]
[Chemical A2]
[Chemical A3]
一方、2,3−DNTT類似の構造を有する縮合多環芳香族化合物において、中心のヘテロ環部分に隣接する芳香族環に置換基を導入することによって、縮合多環芳香族化合物の溶解度が改良されることを見出した特許出願もある(特許文献5)。 On the other hand, in a condensed polycyclic aromatic compound having a structure similar to 2,3-DNTT, the solubility of the condensed polycyclic aromatic compound is improved by introducing a substituent into the aromatic ring adjacent to the central heterocyclic portion. There is also a patent application that has been found (Patent Document 5).
また、有機半導体では、分子構造が直線的な場合、温度が高くなるに従い動きやすくなり、それによって分子状態が変化し不安定となる傾向があることが明らかとなっている。そのため、ジグザグな構造を求められ、化学的及び物理的に安定で、かつ、高いキャリア移動度を示すW型構造を取るジナフトチオフェン及びジナフトチオフェン以外の化合物を有機半導体とする特許文献もある(特許文献6)。特許文献6のW型構造の化学式を[化A4]に示す。
[化A4]
[化A4]中、Xは、酸素、硫黄またはセレンである。
In addition, it has been clarified that in an organic semiconductor, when the molecular structure is linear, it tends to move as the temperature increases, thereby changing the molecular state and becoming unstable. Therefore, there is also a patent document in which a zigzag structure is required, dinaphthothiophene having a W-type structure which is chemically and physically stable and exhibits high carrier mobility, and a compound other than dinaphthothiophene as an organic semiconductor. (Patent Document 6). The chemical formula of the W-type structure of
[Chemical A4]
In [Chemical A4], X is oxygen, sulfur or selenium.
本願発明者らの特許権に係わる発明である2,1−DNTTの末端のベンゼン環をチオフェン環に置き換えた屈折型のチエノチオフェン骨格の有機半導体材料を検討した結果、特許文献7にジ(ベンゾ[b]チエノ)[4,5―b:4‘,5’―f]チエノ[3,2―b]チオフェン(以下、略称45DBT3とする。)が見出された。45DBT3の一般式を[化A5]に示す。
45DBT3は1,2−DNTTの端末のベンゼン環をチオフェン環に置き換えた有機半導体材料である。
[化A5]
[化A5]中、Aは、チオフェン、フラン、セレノフェン、ピロール環である。
As a result of examining an organic semiconductor material having a refractive thienothiophene skeleton in which the benzene ring at the end of 2,1-DNTT, which is an invention relating to the patent rights of the present inventors, is replaced with a thiophene ring,
45DBT 3 is an organic semiconductor material in which the benzene ring at the terminal of 1,2-DNTT is replaced with a thiophene ring.
[Chemical A5]
In [Chemical A5], A represents thiophene, furan, selenophene, or a pyrrole ring.
これまで、2,1−DNTTよりも1,2−DNTTのトランジスタ特性が出にくいという問題があった。この理由の一つとして、1,2−DNTTのHOMOレベルが−5.56eVで、2,1−DNTTのHOMOレベルの−5.40eVよりも深く、[図1]のように、有機半導体材料のHOMOレベルと電極の仕事関数とのエネルギー差が大きいと、正孔注入障壁が大きくなり、キャリアが流れにくくなるため、キャリア移動度などのデバイス特性が出にくくなるということが挙げられる。 Up to now, there has been a problem that the transistor characteristics of 1,2-DNTT are less likely to appear than 2,1-DNTT. One of the reasons is that the HOMO level of 1,2-DNTT is −5.56 eV, which is deeper than the HOMO level of −5.40 eV of 2,1-DNTT, as shown in FIG. When the energy difference between the HOMO level of the electrode and the work function of the electrode is large, the hole injection barrier becomes large and carriers are difficult to flow, so that device characteristics such as carrier mobility are difficult to be obtained.
そこで、1,2−DNTTと2,1−DNTTの関係のような、45DBT3とは異なり、より屈折した分子構造を持つ異性体の方が、HOMOレベルも浅くなると推察され、また、2,1−DNTTの端末のベンゼン環をチオフェン環に置き換えることで、末端の硫黄原子によって、2,1−DNTTよりも分子間相互作用が強くなり、耐熱性も向上すると推測されることから、合成を試みた。
その結果、耐熱性に優れ、有機溶媒に溶けやすい、末端にチオフェンを有する屈曲型のチエノチオフェン骨格を特徴とする有機半導体を発明するに至った。
Therefore, 1, 2-DNTT and like
As a result, the inventors have invented an organic semiconductor characterized by a bent thienothiophene skeleton having excellent heat resistance and being easily soluble in an organic solvent and having a thiophene at the end.
解決しようとする課題は、安定性があり、溶解度も公知である、ジ(ベンゾ[b]チエノ)[4,5―b:4‘,5’―f]チエノ[3,2―b]チオフェン(45DBT3)、及び、ジナフト[2,3−b:2’,3’−f]チエノ[3,2−b]チエノチオフェン(2,3−DNTT)よりも高く、末端にチオフェンを有する屈曲型チエノチオフェン骨格を特徴とする有機半導体材料である。一般式を[化8]に示す。
[化8]
The problem to be solved is di (benzo [b] thieno) [4,5-b: 4 ′, 5′-f] thieno [3,2-b] thiophene, which is stable and has known solubility (45DBT 3 ) and higher than dinaphtho [2,3-b: 2 ′, 3′-f] thieno [3,2-b] thienothiophene (2,3-DNTT), bent with thiophene at the end It is an organic semiconductor material characterized by a type thienothiophene skeleton. The general formula is shown in [Chemical Formula 8].
[Chemical 8]
すなわち、第1発明は、化学式[化1]で示される末端にチオフェンを有する屈曲型のチエノチオフェン骨格を特徴とする有機半導体材料である。
[化1]
That is, the first invention is an organic semiconductor material characterized by a bent thienothiophene skeleton having a thiophene at the end represented by the chemical formula [Chemical Formula 1].
[Chemical 1]
化学式[化1]中の置換基R1からR8は、水素原子及びハロゲン原子、炭素数が3から60のアリール基、炭素数が3から60の複素環基、炭素数が1から30のアルキル基、炭素数が2から30のアルケニル基、炭素数が2から30のアルキニル基、炭素数が1から30のアルコキシル基、炭素数が1から60のアミノ基、炭素数が1から30のアミド基、炭素数が1から30のイミノ基、炭素数が1から30のカルボキシル基、ヒドロキシル基、炭素数が1から30のエステル基、ニトロ基、ニトリル基、炭素数が1から30のスルフィド基、メルカプト基、炭素数が1から30のスルホニル基、炭素数が1から60のシリル基のうち、少なくとも一つを含み、これらの各基は置換基を有していてもよい。なお、置換基R1からR8の好ましい例は、水素原子、フッ素原子、アリール基、複素環基、アルキル基、アルケニル基、アルキニル基、アミノ基である。 Chemical [formula 1] R 8 substituted groups R1 in a hydrogen atom and a halogen atom, an aryl group having from 3 to 60 carbon atoms, heterocyclic group having a carbon number of 3 to 60, alkyl of from 1 to 30 carbon atoms Group, alkenyl group having 2 to 30 carbon atoms, alkynyl group having 2 to 30 carbon atoms, alkoxyl group having 1 to 30 carbon atoms, amino group having 1 to 60 carbon atoms, amide having 1 to 30 carbon atoms Group, imino group having 1 to 30 carbon atoms, carboxyl group having 1 to 30 carbon atoms, hydroxyl group, ester group having 1 to 30 carbon atoms, nitro group, nitrile group, sulfide group having 1 to 30 carbon atoms , A mercapto group, a sulfonyl group having 1 to 30 carbon atoms, and a silyl group having 1 to 60 carbon atoms, each of which may have a substituent. Preferred examples of the substituents R 1 to R 8 are a hydrogen atom, a fluorine atom, an aryl group, a heterocyclic group, an alkyl group, an alkenyl group, an alkynyl group, and an amino group.
置換基R1からR8における、ハロゲン原子はフッ素、塩素、臭素、ヨウ素であり、好ましい例はフッ素原子である。 In the substituents R 1 to R 8 , the halogen atom is fluorine, chlorine, bromine or iodine, and a preferred example is a fluorine atom.
置換基R1からR8における、アリール基は炭素数が3から60の芳香環基で、例えば、フェニル基、1−ナフチル基、2−ナフチル基、ビフェニル基、ターフェニル基、アントリル基、フェナントリル基、クリセンなどが挙げられ、これらの各基は置換基を有していてもよい。 In the substituents R 1 to R 8 , the aryl group is an aromatic ring group having 3 to 60 carbon atoms, such as a phenyl group, 1-naphthyl group, 2-naphthyl group, biphenyl group, terphenyl group, anthryl group, phenanthryl. Group, chrysene and the like, and each of these groups may have a substituent.
置換基R1からR8における、複素環基は炭素数が3から60の複素環基で、ピリジン、ピラジン、トリアジン、ピロール、キノリン、チオフェン、ベンゾチオフェン、ジベンゾチオフェン、チエノチオフェン、フラン、ベンゾフラン、ジベンゾフラン、チアゾール、ベンゾチアゾールなどが挙げられ、これらの各基は置換基を有していてもよい。 The heterocyclic group in the substituents R 1 to R 8 is a heterocyclic group having 3 to 60 carbon atoms, such as pyridine, pyrazine, triazine, pyrrole, quinoline, thiophene, benzothiophene, dibenzothiophene, thienothiophene, furan, benzofuran, Dibenzofuran, thiazole, benzothiazole and the like can be mentioned, and each of these groups may have a substituent.
置換基R1からR8における、アルキル基は炭素数が1から30の直鎖型、分岐型、環状型のアルキル基であり、例えば、メチル基、n−ブチル基、n−ペンチル基、n−ヘキシル基、n−ヘプチル基、n−オクチル基、n−ノニル基、n−デシル基、n−ウンデシル基、n−ドデシル基、n−トリデシル基、イソプロピル基、t-ブチル基、シクロプロピル基、シクロヘキシル基、アダマンチル基、n−トリフルオロメチル基などが挙げられ、これらの各基は置換基を有していてもよい。 In the substituents R 1 to R 8 , the alkyl group is a linear, branched or cyclic alkyl group having 1 to 30 carbon atoms, such as a methyl group, n-butyl group, n-pentyl group, n -Hexyl, n-heptyl, n-octyl, n-nonyl, n-decyl, n-undecyl, n-dodecyl, n-tridecyl, isopropyl, t-butyl, cyclopropyl , A cyclohexyl group, an adamantyl group, an n-trifluoromethyl group, and the like, and each of these groups may have a substituent.
置換基R1からR8におけるアルケニル基は炭素数が2から60のアルケニル基で、例えば、エテニル基、メチルエテニル基、(n−オクチル)エテニル基、フェニルエテニル基、ナフチルエテニル基、ビフェニルエテニル基、ターフェニルエテニル基、パーフルオロフェニルエテニル基などが挙げられ、これらの各基は置換基を有していてもよい。 The alkenyl group in the substituents R 1 to R 8 is an alkenyl group having 2 to 60 carbon atoms, and examples thereof include an ethenyl group, a methylethenyl group, an (n-octyl) ethenyl group, a phenylethenyl group, a naphthylethenyl group, and a biphenylethenyl group. , Terphenylethenyl group, perfluorophenylethenyl group and the like, and each of these groups may have a substituent.
置換基R1からR8における、アルキニル基は炭素数が2から60のアルキニル基で、例えば、エチニル基、メチルエチニル基、(n−オクチル)エチニル基、フェニルエチニル基、ナフチルエチニル基、ビフェニルエチニル基、ターフェニルエチニル基、パーフルオロフェニルエチニル基などが挙げられ、これらの各基は置換基を有していてもよい。 The alkynyl group in the substituents R 1 to R 8 is an alkynyl group having 2 to 60 carbon atoms, such as ethynyl group, methylethynyl group, (n-octyl) ethynyl group, phenylethynyl group, naphthylethynyl group, biphenylethynyl group. Group, terphenylethynyl group, perfluorophenylethynyl group and the like, and each of these groups may have a substituent.
置換基R1からR8における、アミノ基は炭素数が1から60のアミノ基で、例えば、ジフェニルアミノ基、ジナフチルアミノ基、ジチエニルアミノ基、ジピリジルアミノ基などが挙げられ、これらの各基は置換基を有していてもよい。 In the substituents R 1 to R 8 , the amino group is an amino group having 1 to 60 carbon atoms, and examples thereof include a diphenylamino group, a dinaphthylamino group, a dithienylamino group, and a dipyridylamino group. The group may have a substituent.
前記置換基とは、水素原子及びハロゲン原子、アリール基、複素環基、アルキル基、フルオロアルキル基、アルケニル基、フルオロアルケニル基、アルキニル基、フルオロアルキニル基、アルコキシル基、フルオロアルコキシル基、アミノ基、アミド基、イミノ基、カルボキシル基、ヒドロキシル基、エステル基、ニトロ基、ニトリル基、スルフィド基、メルカプト基、スルホニル基、シリル基が挙げられる。 Examples of the substituent include a hydrogen atom and a halogen atom, an aryl group, a heterocyclic group, an alkyl group, a fluoroalkyl group, an alkenyl group, a fluoroalkenyl group, an alkynyl group, a fluoroalkynyl group, an alkoxyl group, a fluoroalkoxyl group, an amino group, Examples include amide group, imino group, carboxyl group, hydroxyl group, ester group, nitro group, nitrile group, sulfide group, mercapto group, sulfonyl group, and silyl group.
[化1]の正式名はジ(ベンゾ[b]チエノ)[6,7―b:6‘,7’―f]チエノ[3,2―b]チオフェンであり、以下、略して67DBT3とする。 The formal name of [Chemical Formula 1] is di (benzo [b] thieno) [6,7-b: 6 ′, 7′-f] thieno [3,2-b] thiophene, hereinafter referred to as 67DBT 3 for short. To do.
第1発明に記載の化学式[化1]の67DBT3の有機半導体材料の合成過程を反応式[化4]に示すが、下記の合成法に限定されるものではなく、公知の反応を組み合わせて合成することが可能である。
[化4]
The synthesis process of the 67DBT 3 organic semiconductor material represented by the chemical formula [Chemical Formula 1] described in the first invention is shown in Reaction Formula [Chemical Formula 4], but is not limited to the following synthesis method, and is a combination of known reactions. It is possible to synthesize.
[Chemical formula 4]
2−ブロモチオフェノールを塩基性条件下で、2−ブロモアセトアルデヒドジエチルアセタールを作用させ、次にポリリン酸を作用させると、化合物Aを合成することができる。
上記以外の化合物Aの合成法として、公知のベンゾ[b]チオフェンの合成法を用いることができる。例えば、o−ジブロモベンゼンや1−ブロモー2−ヨードベンゼンなどo−ジハロベンゼンに、n−BuLiなどの公知の有機リチウム試薬やMgなどを用いて有機金属化合物とし、硫黄を作用させ、2−ブロモアセトアルデヒドジエチルアセタールなど、2−ハロゲン化アセトアルデヒドジアルキルアセタールを用い、さらにポリリン酸や二リン酸等の酸触媒を用いることで化合物Aを合成することができる。
Compound A can be synthesized by reacting 2-bromothiophenol under basic conditions with 2-bromoacetaldehyde diethyl acetal and then with polyphosphoric acid.
As a method for synthesizing Compound A other than the above, a known method for synthesizing benzo [b] thiophene can be used. For example, an o-dihalobenzene such as o-dibromobenzene or 1-bromo-2-iodobenzene is converted into an organometallic compound using a known organolithium reagent such as n-BuLi or Mg, and sulfur is allowed to act on 2-bromoacetaldehyde. Compound A can be synthesized by using 2-halogenated acetaldehyde dialkyl acetal such as diethyl acetal and further using an acid catalyst such as polyphosphoric acid or diphosphoric acid.
化合物Aにn−BuLiなどの公知の有機リチウム試薬やMgなどを用いて、有機金属化合物とし、DMFやN−メチルホルムアニリドなど公知のホルミル化剤を作用させると、化合物Bを合成することができる。
化合物Bに臭素などのハロゲンや塩化チオニル等の公知のハロゲン化剤と硫黄を作用させることで、67DBT3を合成することができる。
Compound B can be synthesized by using a known organolithium reagent such as n-BuLi or Mg or the like as an organometallic compound and allowing a known formylating agent such as DMF or N-methylformanilide to act on compound A. it can.
67DBT 3 can be synthesized by allowing compound B to react with a halogen such as bromine or a known halogenating agent such as thionyl chloride and sulfur.
続いて、第2発明は、化学式[化2]で示される末端にチオフェンを有する屈曲型のチエノチオフェン骨格を特徴とする有機半導体材料である。
[化2]
ただし、化学式[化2]中のR1からR8は、第1発明の[化1]のR1からR8と同じである。
Subsequently, the second invention is an organic semiconductor material characterized by a bent thienothiophene skeleton having a thiophene at the terminal represented by the chemical formula [Chemical Formula 2].
[Chemical 2]
However, R 1 to R 8 of the formula [Formula 2] in is the same as R 1 to R 8 in Formula 1] of the first invention.
化学式[化2]の正式名はジ(ベンゾ[b]チエノ)[5,4―b:5‘,4’―f]チエノ[3,2―b]チオフェンであり、54DBT3とする。 Full name of the chemical formula [Formula 2] is di (benzo [b] thieno) [5,4-b: 5 ' , 4'-f] a thieno [3,2-b] thiophene, and 54DBT 3.
化合物[化2]は第1発明の化合物[化1]と同様にアルデヒドに臭素などのハロゲンや塩化チオニル等の公知のハロゲン化剤と硫黄を作用させることで、54DBT3を合成することができる。反応式を[化5]に示す。
[化5]
Compound [Chemical Formula 2] can synthesize 54DBT3 by reacting a known halogenating agent such as halogen such as bromine or thionyl chloride with sulfur in the same manner as Compound [Chemical Formula 1] of the first invention. . The reaction formula is shown in [Chemical Formula 5].
[Chemical formula 5]
続いて、第3発明は、化学式[化3]で示される末端にチオフェンを有する屈曲型のチエノチオフェン骨格を特徴とする有機半導体材料である。
[化3]
ただし、化学式[化3]中のR1からR8は、第1発明の[化1]のR1からR8と同じである。
Subsequently, a third invention is an organic semiconductor material characterized by a bent thienothiophene skeleton having a thiophene at a terminal represented by the chemical formula [Chemical Formula 3].
[Chemical formula 3]
However, R 1 to R 8 in the formula [Formula 3] is the same as R 1 to R 8 in Formula 1] of the first invention.
化学式[化3]の正式名はジ(ベンゾ[c]チエノ)[5,4―b:5‘,4’―f]チエノ[3,2―b]チオフェンであり、54DBT3−Cとする。 The formal name of the chemical formula [Chemical Formula 3] is di (benzo [c] thieno) [5,4-b: 5 ′, 4′-f] thieno [3,2-b] thiophene, which is 54DBT 3 -C. .
化合物[化3]は[化1]と同様にアルデヒドに臭素などのハロゲンや塩化チオニル等の公知のハロゲン化剤と硫黄を作用させることで、54DBT3−Cを合成することができる。反応式を[化6]に示す。
[化6]
Similarly to [Chemical Formula 1], Compound [Chemical Formula 3] can synthesize 54DBT 3 -C by reacting aldehyde with a halogen such as bromine or a known halogenating agent such as thionyl chloride and sulfur. The reaction formula is shown in [Chemical Formula 6].
[Chemical 6]
続いて第4発明は、第1発明から第3発明に記載の化学式[化1]、[化2]、[化3]のいずれかの有機半導体材料からなる有機電子デバイスである。 Subsequently, a fourth invention is an organic electronic device made of an organic semiconductor material of any one of the chemical formulas [Chemical Formula 1], [Chemical Formula 2], and [Chemical Formula 3] described in the first invention to the third invention.
ここでいう有機電子デバイスとは、本化合物の電気特性を利用した電子デバイスのことであり、具体的には、有機トランジスタ、有機発光ダイオード、有機ダイオード、有機レーザー、有機薄膜太陽電池、有機メモリーなどが挙げられる。 An organic electronic device as used herein refers to an electronic device that utilizes the electrical characteristics of the present compound. Specifically, an organic transistor, an organic light emitting diode, an organic diode, an organic laser, an organic thin film solar cell, an organic memory, etc. Is mentioned.
本発明の化合物をこれら有機電子デバイスに利用するに当たっては、高純度化のために不純物の除去等の精製が必要になるが、本発明の化合物は、液体クロマトグラフィー法、昇華法、ゾーンメルティング法、ゲルパーミネーションクロマトグラフィー法、再結晶法などによって精製できる。 In order to use the compound of the present invention for these organic electronic devices, purification such as removal of impurities is required for high purity. Purification by gel method, gel permeation chromatography method, recrystallization method and the like.
また、本発明の化合物を有機電子デバイスに利用するに当たって、主として薄膜の形態で用いられるが、その薄膜作製法として、ウェットプロセスとドライプロセスどちらを使用してもよい。本発明の化合物は、有機溶媒等への溶解させることにより、産業上メリットの大きいウェットプロセスに適応できる。 Further, when the compound of the present invention is used for an organic electronic device, it is mainly used in the form of a thin film, and either a wet process or a dry process may be used as a method for forming the thin film. The compound of the present invention can be applied to a wet process having a large industrial merit by dissolving it in an organic solvent or the like.
ここで、有機溶媒としては、例えば、ジクロロメタン、クロロホルム、クロロベンゼン、シクロヘキサノール、トルエン、キシレン、ニトロベンゼン、メチルエチルケトン、ジグライム、テトラヒドロフランなど、これまで公知のものが使用できる。また、本発明の化合物を有機溶媒等へ溶解させる場合、温度や圧力に特に制限は無いが、溶解させる温度に関しては、0〜200℃の範囲が好ましく、さらに好ましくは、10〜150℃の範囲である。また、溶解させる圧力に関しては、0.1〜100MPaの範囲が好ましく、さらに好ましくは、0.1〜10MPaの範囲である。また、有機溶媒の代わりに、超臨界二酸化炭素のようなものを用いることも可能である。 Here, as the organic solvent, for example, known solvents such as dichloromethane, chloroform, chlorobenzene, cyclohexanol, toluene, xylene, nitrobenzene, methyl ethyl ketone, diglyme, and tetrahydrofuran can be used. In addition, when the compound of the present invention is dissolved in an organic solvent or the like, the temperature and pressure are not particularly limited, but the temperature for dissolution is preferably in the range of 0 to 200 ° C, more preferably in the range of 10 to 150 ° C. It is. Moreover, regarding the pressure to melt | dissolve, the range of 0.1-100 MPa is preferable, More preferably, it is the range of 0.1-10 MPa. Moreover, it is also possible to use something like supercritical carbon dioxide instead of the organic solvent.
ここで言うウェットプロセスとは、スピンコート法、ディップコート法、バーコート法、スプレーコート法、インクジェット法、スクリーン印刷法、平板印刷法、凹版印刷法、凸版印刷法などを示しており、これら公知の方法が利用できる。また、ここで言うドライプロセスとは、真空蒸着法、スパッタリング法、CVD法、レーザー蒸着法、分子線エピタキシャル成長法、気相輸送成長法などを示しており、これら公知の方法が利用できる。 The wet process here refers to a spin coating method, a dip coating method, a bar coating method, a spray coating method, an ink jet method, a screen printing method, a lithographic printing method, an intaglio printing method, a relief printing method, and the like. Can be used. In addition, the dry process mentioned here indicates a vacuum deposition method, a sputtering method, a CVD method, a laser deposition method, a molecular beam epitaxial growth method, a vapor phase transport growth method, and the like, and these known methods can be used.
続いて、第5発明は、第1発明から第3発明に記載の化学式[化1]、[化2]、[化3]のいずれかの有機半導体材料の複数を組み合わせてからなる有機電子デバイスである。 Subsequently, the fifth invention is an organic electronic device comprising a combination of a plurality of organic semiconductor materials of any one of the chemical formulas [Chemical Formula 1], [Chemical Formula 2], and [Chemical Formula 3] described in the first to third inventions. It is.
化学式[化1]、[化2]、[化3]のいずれかの有機半導体材料の中から2種類の有機半導体材料選択し組み合わせるか、又は3種類のすべてを選択し組み合わせてなる有機電子デバイスである。他の事項は、第4発明と同じである。 Organic electronic device obtained by selecting and combining two types of organic semiconductor materials from any one of chemical formulas [Chemical Formula 1], [Chemical Formula 2], and [Chemical Formula 3], or selecting and combining all three types It is. The other matters are the same as in the fourth invention.
本発明の有機半導体材料を使用した有機電子デバイスの使用例を、図2及び図3に示す。図2、図3では、電界効果型トランジスタ(以下FETとする)での使用例を挙げている。FETはその特徴から、スイッチング素子や増幅素子として利用される。ゲート電流が低いことに加え、構造が平面的であるため、ウェットプロセスによる作製や集積化が容易であり大面積化を可能とする。ここでは、本発明の化合物は、主にp型半導体として利用されているが、置換基、溶剤によってn型半導体として機能する場合もある。 Examples of use of organic electronic devices using the organic semiconductor material of the present invention are shown in FIGS. 2 and 3 show examples of use in a field effect transistor (hereinafter referred to as FET). FETs are used as switching elements and amplifying elements because of their characteristics. In addition to a low gate current, the structure is planar, so that fabrication and integration by a wet process are easy and a large area can be achieved. Here, although the compound of the present invention is mainly used as a p-type semiconductor, it may function as an n-type semiconductor depending on a substituent or a solvent.
第1発明ないし第3発明は、チエノチオフェン骨格を特徴とする有機半導体材料であるジナフト[2,1−b:2‘,1’−f]チエノ[3,2−b]チオフェン(略称2,1−DNT)に比較し、有機溶媒に対する溶解性、溶液中での安定性が高く、かつ、本願に係わる有機半導体の異性体である、ジ(ベンゾ[b]チエノ)[4,5―b:4‘,5’―f]チエノ[3,2―b]チオフェン(45DBT3)に比較し、有機溶媒に対する溶解性が高く、更に、HOMOレベルが浅く、低電圧で駆動できると推定される、有機半導体材料を提供するものである。第4発明及び第5発明はこれらの有機半導体材料を使用した有機電子デバイスを提供し、保護するものである。
1st invention thru | or 3rd invention is dinaphtho [2,1-b: 2 ', 1'-f] thieno [3,2-b] thiophene (
本発明の実施例を以下に示す。 Examples of the present invention are shown below.
前記反応式[化4]の67DBT3の合成過程を詳細に説明するが、本発明はこれらの実施例のみに限定されるものではない。
また、目的の化合物は必要に応じてMS(質量分析スペクトル)、1H―NMRおよび13C−NMRにより決定した。使用した機器は以下の通りである。
MS:ABSCIEX Q−STAR
1H―NMRおよび13C−NMR:Agilent Technologies MercuryPlus
The synthesis process of 67DBT 3 of the reaction formula [Chem. 4] will be described in detail, but the present invention is not limited only to these examples.
The target compound was determined by MS (mass spectrometry spectrum), 1 H-NMR and 13 C-NMR as required. The equipment used is as follows.
MS: ABSCIEX Q-STAR
1 H-NMR and 13 C-NMR: Agilent Technologies MercuryPlus
操作1
ナトリウムt−ブトキシド0.59g(5.3mmol)のTHF溶液10mlに2−ブロモベンゼンチオール0.5g(2.6mmol)のTHF溶液5mlを滴下した。30分撹拌後、2−ブロモアセトアルデヒドジエチルアセタール0.62g(3.2mmol、1.2eq)を滴下し、室温で1時間撹拌した。反応液に水を加え、トルエンで抽出し、有機層を減圧濃縮後、ポリリン酸0.5gを加え、一晩撹拌した。反応液に水を加え、トルエンで抽出し、有機層を減圧濃縮後、化合物A0.3gを収率54%で得た。
化合物Aの1H−NMRおよび13C−NMRの測定結果を以下に示す。
1H―NMR(CDCl3, 400.4MHz)δ=7.23(1H,t,J=8.6Hz),7.41(1H,d,J=5.5Hz),7.47(1H,d,J=8.6Hz),7.47(1H,d,J=5.3Hz),7.74(1H,dd,J=0.8Hz,8.6Hz).
13C−NMR(CDCl3, 100.7MHz)δ=116.1,122.7,124.9,125.7,127.3,127.4,140.7,141.8.
To 10 ml of a THF solution of 0.59 g (5.3 mmol) of sodium t-butoxide, 5 ml of a THF solution of 0.5 g (2.6 mmol) of 2-bromobenzenethiol was added dropwise. After stirring for 30 minutes, 0.62 g (3.2 mmol, 1.2 eq) of 2-bromoacetaldehyde diethyl acetal was added dropwise, and the mixture was stirred at room temperature for 1 hour. Water was added to the reaction mixture, and the mixture was extracted with toluene. The organic layer was concentrated under reduced pressure, 0.5 g of polyphosphoric acid was added, and the mixture was stirred overnight. Water was added to the reaction solution, extraction was performed with toluene, and the organic layer was concentrated under reduced pressure to obtain 0.3 g of Compound A in a yield of 54%.
The measurement results of 1H-NMR and 13C-NMR of Compound A are shown below.
1H-NMR (CDCl3, 400.4 MHz) δ = 7.23 (1H, t, J = 8.6 Hz), 7.41 (1H, d, J = 5.5 Hz), 7.47 (1H, d, J = 8.6 Hz), 7.47 (1H, d, J = 5.3 Hz), 7.74 (1H, dd, J = 0.8 Hz, 8.6 Hz).
13C-NMR (CDCl3, 100.7 MHz) [delta] = 116.1, 122.7, 124.9, 125.7, 127.3, 127.4, 140.7, 141.8.
操作2
窒素雰囲気下、化合物A0.3g(1.4mmol)のTHF溶液10mlにiPrMgCl・LiCl(1M−THF溶液)を2.8ml(2.8mmol、2eq)滴下し、室温で2時間撹拌後、0℃でN,N−ジメチルホルムアミド0.29ml(4.2mmol、3eq)を滴下し、滴下後室温に昇温後、塩酸で処理、トルエンで抽出し、有機層を減圧濃縮後、化合物Bを0.15g、収率66%で得た。
化合物Bの1H−NMRおよび13C−NMRの測定結果を以下に示す。
1H―NMR(CDCl3, 400.4MHz)δ=7.42(1H,d,J=5.5Hz),7.56(1H,t,J=7.2Hz),7.64(1H,d,J=5.6Hz),7.85(1H,ddd,J=0.4Hz,1.1Hz,7.2Hz)8.03(1H,dd,J=1.1Hz,7.8Hz),10.23(1H,s).
13C−NMR(CDCl3, 100.7MHz)δ=122.9,124.3,129.8,130.5,130.9,131.4,137.1,141.3,191.3.
In a nitrogen atmosphere, 2.8 ml (2.8 mmol, 2 eq) of iPrMgCl·LiCl (1M-THF solution) was added dropwise to 10 ml of a THF solution of 0.3 g (1.4 mmol) of Compound A, and the mixture was stirred at room temperature for 2 hours and then 0 ° C. Then, 0.29 ml (4.2 mmol, 3 eq) of N, N-dimethylformamide was added dropwise, and after the dropwise addition, the mixture was warmed to room temperature, treated with hydrochloric acid, extracted with toluene, and the organic layer was concentrated under reduced pressure. 15 g, 66% yield.
The measurement results of 1 H-NMR and 13 C-NMR of Compound B are shown below.
1 H-NMR (CDCl 3 , 400.4 MHz) δ = 7.42 (1H, d, J = 5.5 Hz), 7.56 (1H, t, J = 7.2 Hz), 7.64 (1H, d, J = 5.6 Hz), 7.85 (1H, ddd, J = 0.4 Hz, 1.1 Hz, 7.2 Hz) 8.03 (1H, dd, J = 1.1 Hz, 7.8 Hz), 10.23 (1H, s).
13 C-NMR (CDCl 3 , 100.7 MHz) δ = 122.9, 124.3, 129.8, 130.5, 130.9, 131.4, 137.1, 141.3, 191.3.
操作3
窒素雰囲気下、化合物B0.15g(0.93mmol)のトルエン溶液5mlにN,N−ジメチルホルムアミド0.1mlを加えた。塩化チオニル0.9g(7.4mmol、8eq)と硫黄0.04g(1.1mmol、1.2eq)を加え220℃に加温し、1時間保った。冷却後、反応液をろ過し、67DBTを収率11%で得た。
以下に、67DBT3のMSおよび1H−NMRの測定結果を示す。また、67DBT3の1H−NMRスペクトルを図4に示す。
MS(APPI) m/z=352
1H―NMR(CDCl3, 400.4MHz)δ=7.58(2H,d,J=5.28Hz),7.63(2H,d,J=5.28Hz),7.91(2H,d,J=8.6Hz),8.00(2H,d,J=8.6Hz).
Under a nitrogen atmosphere, 0.1 ml of N, N-dimethylformamide was added to 5 ml of a toluene solution of 0.15 g (0.93 mmol) of Compound B. 0.9 g (7.4 mmol, 8 eq) thionyl chloride and 0.04 g (1.1 mmol, 1.2 eq) sulfur were added and heated to 220 ° C. and kept for 1 hour. After cooling, the reaction solution was filtered to obtain 67DBT in a yield of 11%.
The measurement results of MS and 1H-NMR of 67DBT 3 are shown below. Further, the 1H-NMR spectrum of 67DBT 3 is shown in FIG.
MS (APPI) m / z = 352
1H-NMR (CDCl3, 400.4 MHz) δ = 7.58 (2H, d, J = 5.28 Hz), 7.63 (2H, d, J = 5.28 Hz), 7.91 (2H, d, J = 8.6 Hz), 8.00 (2H, d, J = 8.6 Hz).
同様の合成法を用いて8−67DBT3を合成した。8−67DBT3としたのは、端末のチオフェン環にC8H17が付加しているためである。8−67DBT3の反応式を[化7]に示す。
[化7]
8−67DBT3のMS、1H−NMRおよび13C−NMRの測定結果を以下に示す。また、8−67DBT3の1H−NMRスペクトルを図5に、13C−NMRスペクトルを図6に示す。
MS(APPI) m/z=576
1H―NMR(C2D2Cl4, 400.4MHz)δ=0.91(6H,t,J=7.1Hz),1.31(20H,m),1.85(4H,m),3.04(4H,t,J=7.4Hz),7.25(2H,s),7.76(2H,d,J=8.6Hz),7.94(2H,d,J=8.6Hz).
13C−NMR(C2D2Cl4, 100.7MHz)δ=14.3,22.7,29.2,29.3,29.4,30.9,31.5,31.9,120.1,120.2,121.2,127.0,131.8,132.1,137.7,139.0,146.7.
8-67DBT 3 was synthesized using the same synthesis method. The reason why 8-67DBT 3 is selected is that C 8 H 17 is added to the terminal thiophene ring. The reaction formula of 8-67DBT 3 is shown in [Chemical 7].
[Chemical 7]
The measurement results of MS, 1 H-NMR and 13 C-NMR of 8-67DBT 3 are shown below. Further, the 1 H-NMR spectrum of 8-67DBT 3 is shown in FIG. 5, and the 13 C-NMR spectrum is shown in FIG.
MS (APPI) m / z = 576
1 H-NMR (C 2 D 2 Cl 4 , 400.4 MHz) δ = 0.91 (6H, t, J = 7.1 Hz), 1.31 (20H, m), 1.85 (4H, m) 3.04 (4H, t, J = 7.4 Hz), 7.25 (2H, s), 7.76 (2H, d, J = 8.6 Hz), 7.94 (2H, d, J = 8.6 Hz).
13 C-NMR (C 2 D 2 Cl 4 , 100.7 MHz) δ = 14.3, 22.7, 29.2, 29.3, 29.4, 30.9, 31.5, 31.9, 120.1, 120.2, 121.2, 127.0, 131.8, 132.1, 137.7, 139.0, 146.7.
同様の合成法を用いて54DBT3を合成した。54DBT3の合成は、前記反応式[化5]に示す。
54DBT3のMSおよび1H−NMRの測定結果を以下に示す。また、54DBT3の1H−NMRスペクトルを図7に示す。
MS(APPI) m/z=352
1H―NMR(C2D2Cl4, 400.4MHz)δ=7.76(2H,d,J=5.3Hz),7.96(6H,m).
54DBT 3 was synthesized using a similar synthesis method. The synthesis of 54DBT 3 is shown in the above reaction formula [Chem. 5].
The measurement results of MS and 1 H-NMR of 54DBT 3 are shown below. The 1 H-NMR spectrum of 54DBT 3 is shown in FIG.
MS (APPI) m / z = 352
1 H-NMR (C 2 D 2 Cl 4 , 400.4 MHz) δ = 7.76 (2H, d, J = 5.3 Hz), 7.96 (6H, m).
図8、図9、図10に、有機溶媒1,1,2,2−Tetrachloroethaneに溶解させたペンタセン、54DBT3及び8−67DBT3の0時間、24時間及び48時間後の経時変化におけUVスペクトルを示す。これらの図より、54DBT3及び8−67DBT3は、溶液中で48時間放置しても、スペクトルの変化が全く無く、非常に安定しているということがいえる。一方、ペンタセンは24時間後でスペクトルが大きく変化し、溶液中で不安定で、分解してしまっていることがわかる。
8, FIG. 9, FIG. 10, UV put pentacene dissolved in an
溶解度は、2,3―DNTTがジクロロメタン中3.4mg/L(文献値)、45DBT3は、45.5mg/Lであるのに対し、54DBT3は、166.7mg/Lという結果となり、54DBT3は、45DBT3、2,3―DNTTよりも溶解性が高いことが分かる。また、アルキル基を有する8−67DBT3の溶解度は、ジクロロメタン中1125mg/Lであり、80℃トルエン中66g/Lと溶解性が非常に高い。 Solubility was as follows: 2,3-DNTT was 3.4 mg / L in dichloromethane (literature value), 45DBT 3 was 45.5 mg / L, whereas 54DBT 3 was 166.7 mg / L. 3 is found to be more soluble than 45DBT 3 , 2,3-DNTT. The solubility of 8-67DBT 3 having an alkyl group is 1125 mg / L in dichloromethane, and the solubility is very high at 66 g / L in 80 ° C. toluene.
また、[図11]、[図12]に示すように、DSC(示差走査熱量計)の測定結果より、2,1−DNTTの融点が306.3−307.0℃、54DBT3の融点が357.6−358.0℃となり、54DBT3は2,1−DNTTよりも融点が高く、低温での相転移点もないことから、耐熱性に優れているといえる。 Moreover, as shown in [FIG. 11] and [FIG. 12], from the measurement result of DSC (differential scanning calorimeter), the melting point of 2,1-DNTT is 306.3-307.0 ° C., and the melting point of 54DBT 3 is Since 357.6-358.0 ° C., 54DBT 3 has a higher melting point than 2,1-DNTT and no phase transition point at low temperature, it can be said that it has excellent heat resistance.
1 トップコンタクト型FET
2 ボトムコンタクト型FET
3 ソース
4 ドレイン
5 有機半導体
6 絶縁膜
7 基板(ゲート)
1 Top contact FET
2 Bottom contact FET
3 Source
4
上記のように有機溶媒に対する溶解度が高く、安定性もあることから、ウェットプロセスに用いられる有機半導体材料として期待される。 As described above, since it has high solubility in organic solvents and is stable, it is expected as an organic semiconductor material used in wet processes.
Claims (4)
化学式〔化1〕中の置換基R1からR8は、水素原子及びハロゲン原子、炭素数が3から60のアリール基、炭素数が3から60の複素環基、炭素数が1から30のアルキル基、炭素数が2から30のアルケニル基、炭素数が2から30のアルキニル基、炭素数が1から30のアルコキシル基、炭素数が1から60のアミノ基、炭素数が1から30のアミド基、炭素数が1から30のイミノ基、炭素数が1から30のカルボキシル基、ヒドロキシル基、炭素数が1から30のエステル基、ニトロ基、ニトリル基、炭素数が1から30のスルフィド基、メルカプト基、炭素数が1から30のスルホニル基、炭素数が1から60のシリル基のうち、少なくとも一つを含み、これらの各基は置換基を有していてもよい。 An organic semiconductor material characterized by a bent thienothiophene skeleton having a thiophene at a terminal represented by the chemical formula [Chemical Formula 1]. [Chemical 1]
The substituents R 1 to R 8 in the chemical formula [Chemical Formula 1] are a hydrogen atom and a halogen atom, an aryl group having 3 to 60 carbon atoms, a heterocyclic group having 3 to 60 carbon atoms, and 1 to 30 carbon atoms. Alkyl group, alkenyl group having 2 to 30 carbon atoms, alkynyl group having 2 to 30 carbon atoms, alkoxyl group having 1 to 30 carbon atoms, amino group having 1 to 60 carbon atoms, 1 to 30 carbon atoms Amido group, imino group having 1 to 30 carbon atoms, carboxyl group having 1 to 30 carbon atoms, hydroxyl group, ester group having 1 to 30 carbon atoms, nitro group, nitrile group, sulfide having 1 to 30 carbon atoms It includes at least one of a group, a mercapto group, a sulfonyl group having 1 to 30 carbon atoms, and a silyl group having 1 to 60 carbon atoms, and each of these groups may have a substituent.
ただし、化学式[化2]中のR1からR8は、請求項1の[化1]のR1からR8と同じである。 An organic semiconductor material characterized by a bent thienothiophene skeleton having a thiophene at a terminal represented by the chemical formula [Chemical Formula 2]. [Chemical 2]
However, R 8 from R 1 of the formula [Formula 2] in is the same as the R 1 of Formula 1 of claim 1 and R 8.
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