JP6462157B2 - 蒸着マスク及びその製造方法、有機el表示装置の製造方法 - Google Patents
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
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- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
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- H10K59/12—Active-matrix OLED [AMOLED] displays
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- H10K71/164—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using vacuum deposition
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- H10K71/166—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using selective deposition, e.g. using a mask
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Description
10a 第1面
10b 第2面
11 樹脂フィルム
11a 樹脂材料
11b 樹脂塗布膜
11c 樹脂焼成膜
11d 短波長光吸収層
12 凹凸形状部
12a 凸部
12b 凹部
13 開口部
14 枠体
20 被蒸着基板
21 TFT基板
22 第1電極
23 バンク
24 有機材料
25 有機層
26 第2電極
37 保護膜
30 ダミー基板
41 レーザ用マスク
41a 開口部
41b 遮光薄膜
42 光学レンズ
Claims (13)
- 表面に、上面で狭く底部で広い第1テーパ形状に形成された凸部を有する凹凸形状を含む被蒸着基板の前記表面の所定の場所に積層膜を蒸着により形成するための蒸着マスクであって、
樹脂フィルムにより形成され、一面は平坦面で、他面が前記被蒸着基板の前記凹凸形状と反転した形状に対応する凹凸形状を有し、前記所定の場所に対応する部分に開口部を有し、前記被蒸着基板の前記凹凸形状に嵌合し、
前記開口部が、前記一面から前記他面側に開口が小さくなる第2テーパ形状に形成され、前記開口部の前記第2テーパ形状の底面と斜面とのなす角度であるテーパ角度α、蒸着材料源から飛来する蒸着材料の蒸着角度θ、及び前記被蒸着基板の前記第1テーパ形状の底面と斜面とのなす角度であるテーパ角度βとの間には、θ≧α≧βの関係がある、蒸着マスク。 - 前記樹脂フィルムの線膨張率と、前記被蒸着基板の線膨張率との差が3ppm/℃以下になるように前記樹脂フィルムがポリイミドにより形成されてなる請求項1記載の蒸着マスク。
- 表面に凹凸を有する被蒸着基板の表面の所定の場所に積層膜を形成するため、蒸着材料を前記所定の場所に蒸着するための蒸着マスクの製造方法であって、
前記被蒸着基板の表面の形状に対応する凹凸を有するダミー基板を作製し、
前記ダミー基板の凹凸面に表面がほぼ平坦になるまで液状の樹脂材料を塗布することで樹脂塗布膜を形成し、
前記樹脂塗布膜の温度を前記樹脂材料が硬化する温度まで上昇させて前記樹脂塗布膜を硬化した膜である樹脂焼成膜を形成し、
前記ダミー基板に付着している前記樹脂焼成膜にレーザ光を照射して加工することにより、前記樹脂焼成膜に所望の開口部のパターンを形成することで所望の開口部のパターンを有する樹脂フィルムを形成し、
前記樹脂フィルムを前記ダミー基板から剥離することにより蒸着マスクとする
ことを特徴とする蒸着マスクの製造方法。 - 前記レーザ光を照射することにより前記開口部のパターンを形成する際に、前記開口部のパターンを形成するためのレーザマスクの開口の周縁に、前記開口の端縁に行くほどレーザ光の透過率が低下するレーザ光透過率の漸減領域を形成することにより、前記開口部のパターンの各開口部を前記樹脂フィルムの厚さ方向でテーパ形状に形成する請求項3記載の蒸着マスクの製造方法。
- 前記樹脂塗付膜の硬化を、前記樹脂材料の塗布厚、前記硬化時の硬化温度、前記硬化の時間、及び硬化温度と硬化時間のプロファイルの少なくとも1つを調整しながら行うことにより、硬化により形成される前記樹脂焼成膜の線膨張率と、前記被蒸着基板の線膨張率との差を3ppm/℃以下にする請求項3又は4記載の蒸着マスクの製造方法。
- 前記樹脂塗付膜の硬化を、前記樹脂材料の塗布厚、前記硬化時の硬化温度、前記硬化の時間、及び硬化温度と硬化時間のプロファイルの少なくとも1つを調整しながら行うことにより、硬化により形成される前記樹脂焼成膜の線膨張率と、前記ダミー基板の線膨張率との差が3ppm/℃以下になるように前記ダミー基板の材料を選定する請求項3〜5のいずれか1項に記載の蒸着マスクの製造方法。
- 前記樹脂材料の硬化を、5分以上であって120分以下ごとに10℃以上であって200℃以下の温度で段階的に上昇させながら、硬化温度まで上昇させることにより行う請求項3〜6のいずれか1項に記載の蒸着マスクの製造方法。
- 前記レーザ光の照射による加工が、被蒸着基板上の画素ごとに有機材料を蒸着する蒸着マスクを形成するための加工である請求項3〜7のいずれか1項に記載の蒸着マスクの製造方法。
- 前記レーザ光が、パルスレーザである請求項3〜8のいずれか1項に記載の蒸着マスクの製造方法。
- 前記樹脂フィルムを前記ダミー基板から剥離する前に前記樹脂フィルムの周縁に枠体を形成する請求項3〜9のいずれか1項に記載の蒸着マスクの製造方法。
- 前記樹脂フィルムを前記ダミー基板から剥離する際に、前記樹脂フィルムと前記ダミー基板との界面に焦点を合せた短波長光を照射することにより、前記樹脂フィルムと前記ダミー基板との密着力を弱くして剥離する請求項3〜10のいずれか1項に記載の蒸着マスクの製造方法。
- 被蒸着基板上に有機層を積層して有機EL表示装置を製造する方法であって、
有機層を積層する被蒸着基板の表面と対応する凹凸を有するダミー基板を作製し、
前記ダミー基板の凹凸面に表面がほぼ平坦になるまで液状樹脂を塗布して硬化した膜である樹脂焼成膜にレーザ光を照射することで開口部のパターンを形成することにより樹脂フィルムとし、前記ダミー基板から前記樹脂フィルムを剥離することで、蒸着マスクを形成し、
装置基板上にTFT及び第1電極が形成され、各画素を区分するバンクが形成された被蒸着基板上に前記蒸着マスクを位置合せして重ね合せ、有機材料を蒸着することにより前記被蒸着基板上に有機層を積層し、
前記蒸着マスクを除去して第2電極を形成する
ことを特徴とする有機EL表示装置の製造方法。 - 前記バンクを断面形状で先細りになるテーパ形状に形成し、前記バンクのテーパの角度が、前記有機材料の蒸着源から飛来する蒸着材料の蒸着角度以下になるように前記バンクを形成する請求項12記載の有機EL表示装置の製造方法。
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US11807933B2 (en) | 2020-08-10 | 2023-11-07 | Samsung Display Co., Ltd. | Apparatus for manufacturing display device, method of manufacturing mask assembly, and method of manufacturing display device |
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TWI653351B (zh) | 2019-03-11 |
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US20190013471A1 (en) | 2019-01-10 |
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US10580985B2 (en) | 2020-03-03 |
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