JP6357336B2 - Electrolytic copper foil, electrolytic copper foil with carrier foil and printed wiring board - Google Patents

Description

  The present invention relates to an electrolytic copper foil, an electrolytic copper foil with a carrier foil, and a printed wiring board.

  In recent years, the MSAP (Modified Semi-Additive Process) method and the subtractive method have been widely adopted as methods for manufacturing printed wiring boards suitable for circuit miniaturization.

  The MSAP method is a method suitable for forming an extremely fine circuit, and is performed using an ultrathin copper foil with a carrier foil in order to take advantage of the feature. For example, as shown in FIGS. 1 and 2, an ultrathin copper foil 10 is applied to a primer layer on an insulating resin substrate 11 having a prepreg 11b on a base substrate 11a (lower layer circuit 11c may be included if necessary). 12 is pressed and adhered (step (a)), the carrier foil (not shown) is peeled off, and then via holes 13 are formed by laser drilling as necessary (step (b)). Next, after applying chemical copper plating 14 (step (c)), masking with a predetermined pattern by exposure and development using a dry film 15 (step (d)), and applying electrolytic copper plating 16 (step (e) )). After the dry film 15 is removed to form the wiring portion 16a (step (f)), unnecessary ultrathin copper foil or the like between the adjacent wiring portions 16a and 16a is removed by etching over the entire thickness (step). (G)) A wiring 17 formed in a predetermined pattern is obtained.

  On the other hand, the subtractive method is a technique capable of forming a fine circuit using a copper foil without a carrier foil, although the level of miniaturization is inferior to that of the MSAP method. For example, as shown in FIGS. 3 and 4, the roughened surface of the copper foil 20 is bonded to an insulating resin substrate 21 having a prepreg 21 b on a base substrate 21 a (a lower circuit 21 c can be included if necessary). (Step (a)), after thinning the copper foil 20 by half etching (Step (b)), if necessary, via holes 23 are formed by laser drilling (Step (c)). Next, chemical copper plating 24 (step (d)) and electrolytic copper plating 26 (step (e)) are performed, masking with a predetermined pattern by exposure and development using the dry film 25 (step (f)), and etching. Then, unnecessary copper foil or the like directly under the opening of the dry film 25 is dissolved and removed (step (g)), and then the dry film 25 is peeled off (step (h)) to form the wiring 27 formed in a predetermined pattern. obtain.

  In both the MSAP method and the subtractive method, an acidic solution (for example, an aqueous sulfuric acid solution containing hydrogen peroxide) is mainly used as an etching solution used in the etching process. This acidic solution has a characteristic that the etching rate of copper oxide is larger than that of copper. For this reason, when the surface of the copper foil is oxidized, as schematically shown in FIG. 5, the etching of the interface portion between the insulating resin substrate 11 and the copper foil 10 is promoted. This leads to a cause of failure called “insertion” 18 that is eroded so that the roots are pierced. When this insertion 18 occurs, the adhesiveness between the substrate 11 and the wiring 17 is lowered, causing circuit peeling. This insertion is particularly likely to occur in the MSAP method in which a smooth ultrathin copper foil 10 that has not been roughened is used. In this respect, insertion can be avoided by reducing the etching amount, but there is a concern that a short circuit may occur due to residual copper between circuits due to insufficient etching. Therefore, in order to reduce the variation in the etching process, it is desired to stabilize the surface state of the copper foil, particularly an ultrathin copper foil.

  By the way, the ultrathin copper foil with a carrier foil has a large distortion during deposition of the ultrathin copper foil due to the difference in the size of the copper crystal forming the ultrathin copper foil and the size of the copper crystal forming the carrier foil. , Curl phenomenon is likely to occur. In order to improve the curl phenomenon, a method of correcting the curl by heat treatment is known. For example, Patent Document 1 (Japanese Patent Application Laid-Open No. 2007-152969) discloses performing curl correction by heat treatment at a temperature of 120 to 250 ° C. for 1 to 10 hours. In this document, it is preferable to replace the air with an inert gas in order to prevent metal oxidation (that is, formation of copper oxide in the case of copper foil) by heat treatment. However, in this method, not only the cost of the heating furnace itself and the running cost of the heat treatment are required, but also productivity is lowered due to excessive heat treatment.

  On the other hand, a technique for preventing oxidation by performing a rust prevention treatment on the surface of the copper foil is also known. For example, Patent Document 2 (International Publication No. 2004/005588) discloses an electrolytic copper foil with a carrier foil in which the electrolytic copper foil layer includes a rust-proofing layer formed without performing a roughening treatment with a bump. In particular, a rust prevention treatment layer made of a nickel-zinc alloy has been proposed. Patent Document 3 (International Publication No. 2006/028207) includes a nickel-zinc-containing plating layer and a chromate treatment layer as a rust prevention treatment layer, and a carrier foil having a Ni / Zn adhesion ratio of 1.5 to 10. An attached electrolytic copper foil is disclosed.

JP 2007-152996 A International Publication No. 2004/005588 International Publication No. 2006/028207

  Therefore, when heat treatment for curl correction is performed, it is conceivable to perform a high rust prevention treatment in which more nickel or zinc is deposited in order to prevent oxidation accompanying the heat treatment. However, zinc and nickel are easier to etch than copper because they are more base ions than copper. For this reason, the above-mentioned insertion is likely to occur from the portion subjected to the rust prevention treatment in the etching process, and as a result, circuit peeling increases and the yield at the time of circuit manufacture tends to decrease. Therefore, it is difficult to adopt an ultrathin copper foil having a high rust prevention amount as a copper foil for the MSAP method. Therefore, a copper foil, in particular an ultrathin copper foil, that can significantly suppress circuit peeling due to insertion or the like in the etching process while being a relatively small amount of rust prevention treatment is desired.

  In the electrolytic copper foil that has been subjected to surface treatment using zinc such as rust prevention treatment, the present inventors have recently determined the amount of zinc deposited from the surface treatment and the Cu abundance ratio on the treated surface respectively. It was found that by controlling within the range, circuit peeling due to insertion or the like in the etching process during circuit formation can be effectively prevented.

  Therefore, an object of the present invention is to effectively prevent circuit peeling due to insertion or the like in an etching process at the time of circuit formation, thereby contributing to facilitation of thin wire processing and improvement of circuit yield. Is to provide.

According to an aspect of the present invention, there is provided an electrolytic copper foil having a surface that has been surface-treated with at least zinc, wherein the surface of the electrolytic copper foil and its vicinity are derived from the surface treatment, and zinc is used. wherein at a coverage of 5 to 20 mg / ^{m 2,} and the surface when analyzed by XPS (X-ray photoelectron spectroscopy), in terms of element, Cu, C, N, O , Si, Cr, Ni and Zn An electrolytic copper foil is provided in which the proportion of Cu in the total amount is 20 at% or less.

  According to another aspect of the present invention, a carrier foil electrolysis comprising a carrier foil, a release layer provided on the carrier foil, and an electrolytic copper foil of the invention provided on the release layer. Copper foil is provided.

  According to another one aspect | mode of this invention, the printed wiring board provided with the electrolytic copper foil of this invention is provided.

According to yet another aspect of the present invention, there is provided a method for producing an electrolytic copper foil,
Performing a surface treatment using at least zinc on the copper foil that has been electroformed, and obtaining an electrolytic copper foil containing zinc in an amount of 5 to 20 mg / m ^{2 on} the surface-treated surface and in the vicinity thereof; and ,
When the surface after heat treatment is analyzed by XPS (X-ray photoelectron spectroscopy) within a temperature range of 120 to 250 ° C. with respect to the electrolytic copper foil, Cu, C, N, O, A step of performing heat treatment under conditions controlled so that the ratio of Cu in the total amount of Si, Cr, Ni, and Zn falls within 20 at%;
A method is provided comprising:

According to yet another aspect of the present invention, a method for selecting an electrolytic copper foil suitable for manufacturing a printed wiring board,
An electrolytic copper foil having a surface treated with at least zinc, wherein the surface and its vicinity are derived from the surface treatment and contain zinc in an amount of 5 to 20 mg / m ^2. A process of preparing
The surface of the electrolytic copper foil is analyzed by XPS (X-ray photoelectron spectroscopy), and the ratio of Cu in the total amount of Cu, C, N, O, Si, Cr, Ni and Zn in terms of element is 20 at%. Evaluating whether or not:
A step of selecting or providing an electrolytic copper foil having a Cu ratio of 20 at% or less in a region where circuit formation is to be performed at least during the production of a printed wiring board;
Including a method.

It is a process flow chart for explaining a MSAP method, and is a figure showing the first half process (process (a)-(d)). It is a process flow chart for explaining a MSAP method, and is a figure showing the latter half process (process (e)-(g)). It is a process flowchart for demonstrating a subtractive method, and is a figure which shows the process (process (a)-(d)) of the first half. It is a process flow chart for explaining a subtractive method, and is a figure showing the latter half process (process (e)-(h)). It is a schematic cross section which shows the circuit wiring in which the insertion generate | occur | produced at the etching process. It is a schematic cross section which shows the basic composition of electrolytic copper foil with carrier foil.

  Hereinafter, the present invention will be specifically described. In the present specification, a numerical range expressed in the form of “A to B” (A and B are arbitrary numbers) means A or more and B or less.

Electrolytic copper foil The electrolytic copper foil of the present invention is an electrolytic copper foil having a surface treated with at least zinc (hereinafter referred to as a treated surface), and may be in the form of a carrier foil or a carrier. It may be a form without foil. The surface treatment preferably includes a rust prevention treatment, but may include other surface treatments as described later. In any case, the treated surface of the electrolytic copper foil of the present invention and its vicinity are derived from the surface treatment and contain zinc in an amount of 5 to 20 mg / m ² . When this treated surface is analyzed by XPS (X-ray photoelectron spectroscopy), the ratio of Cu in the total amount of Cu, C, N, O, Si, Cr, Ni and Zn in terms of elements (hereinafter referred to as Cu) The abundance ratio is 20 at% or less. As described above, in the electrolytic copper foil of the present invention, by controlling the adhesion amount of zinc derived from the surface treatment and the Cu abundance ratio on the treated surface within the above ranges, in the MSAP method, the subtractive method, and the like. Circuit peeling due to insertion or the like in the etching process during circuit formation can be effectively prevented.

  As described above, zinc is an active ingredient used in surface treatment such as rust prevention treatment, but is more easily etched than copper because it is a base metal that has a lower ionization tendency than copper. For this reason, if it is attempted to reduce the zinc adhesion amount, the surface treatment effect such as rust prevention becomes insufficient, and it becomes easier to produce copper oxide that is more easily etched than copper by heat treatment for curl correction or the like. In that sense, even if the amount of zinc adhesion is increased or decreased too much, circuit peeling due to insertion or the like tends to occur in the etching process. Even more disadvantageously, even a single electrolytic copper foil treated with the same amount of zinc applied over the entire surface has a variation in etching speed depending on the position on the surface, so there is one place (for example, the central portion in the width direction). Even if the surface treatment can be performed appropriately to prevent circuit peeling, a phenomenon may occur in which circuit peeling occurs in other places (for example, in the vicinity of the end in the width direction) where the same surface treatment is applied. Therefore, if the amount of zinc adhesion is increased to deal with the other part (for example, the vicinity of the end in the width direction), this time, the other part (for example, the center part in the width direction) is likely to be etched and the circuit is peeled off. Can occur. For this reason, it has been extremely difficult to cope with circuit peeling only by adjusting the amount of zinc adhesion. Under such circumstances, the present inventors have found that this variation in the etching rate is largely caused by a variation in the degree of oxidation on the copper foil surface, particularly a variation in the degree of oxidation in the width direction of the rolled copper foil. Got. The variation in the degree of oxidation in the width direction of the copper foil most typically remains in the heating furnace or between the rolls when the heat treatment of the copper foil in the form of a roll is performed in an air-containing atmosphere. This is because oxygen in the air tends to cause oxidation at the end in the width direction of the roll. That is, when the electrolytic copper foil is rolled, the closer it is to the end of the copper foil that is easily exposed to the outside air, the easier it is to oxidize. Therefore, the degree of oxidation of copper tends to vary in the width direction of the copper foil. However, it goes without saying that oxidation of the copper foil due to factors other than those described above is also possible.

Based on this knowledge, the present inventors adjusted not only the amount of zinc adhered on the copper foil surface but also the degree of oxidation of copper on the copper foil surface as a factor for controlling the etching rate of the copper foil, thereby forming a circuit. We have succeeded in effectively preventing circuit peeling due to insertion in the etching process. Specifically, an epoch-making indicator that circuit peeling due to insertion or the like can be effectively prevented by setting the Cu abundance ratio on the treated surface having a zinc adhesion amount of 5 to 20 mg / m ² to 20 at% or less. Obtained. The Cu abundance ratio of 20 at% or less is not only that the Cu abundance ratio is relatively reduced if the surface of the copper foil is sufficiently surface-treated by plating or the like, but is treated by XPS when the copper foil is oxidized. This also reflects the current knowledge that the proportion of Cu detected in selenium increases. That is, according to the present knowledge, when the surface-treated copper foil is heated, oxygen reacts with the Cu component of the copper foil from the defective portion of the surface treatment in the copper foil, and the volume is increased by forming copper oxide and the like. The Cu component of the copper foil is exposed so as to break through the surface treatment. Since Cu exposed on the surface is detected by XPS, as a result, when the copper foil is oxidized, the Cu existing ratio on the treated surface increases. Then, by examining the relationship between the Cu abundance ratio and circuit peeling, the Cu abundance ratio of 20 at% or less was reached as an index for defining the surface state of the copper foil that can effectively prevent circuit peeling due to insertion or the like. That is, the amount of zinc adhesion on the copper foil surface, which is a factor controlling the etching rate of the copper foil, by controlling the Cu abundance ratio on the treated surface having a zinc adhesion amount of 5 to 20 mg / m ² to 20 at% or less, and copper Both the degree of copper oxidation on the foil surface can be controlled simultaneously and conveniently, thereby reducing the etch rate variation that results from these two factors intricately intertwined. As a result, while ensuring the desired surface treatment effect by surface treatment such as rust prevention treatment at an acceptable level, it is inserted based on a common index regardless of the position on the copper foil surface (especially the position in the width direction). It is possible to appropriately control the etching rate so that circuit peeling due to the above does not occur. Thus, according to the electrolytic copper foil of the present invention, it is possible to effectively prevent circuit peeling due to insertion or the like in the etching process at the time of circuit formation, thereby facilitating fine wire processing and improving circuit yield. can do.

  In particular, according to the present invention, by using the Cu abundance ratio on the treated surface as an index indicating the degree of copper oxidation, the surface treatment amount can be adjusted appropriately while grasping or monitoring the degree of copper oxidation on the treated surface. (For example, adjust to a lower rust prevention amount within the allowable range where the rust prevention effect can be obtained) and / or adjust the temperature and time of heat treatment performed for the purpose of curl removal etc. appropriately Thus, the etching rate can be appropriately controlled so that circuit peeling due to insertion or the like does not occur. For example, the surface-treated electrolytic copper foil is subjected to a heat treatment within the range of a heating temperature (for example, 120 to 250 ° C.) to be described later and controlled so that the Cu content ratio is suppressed to 20 at% or less. The heat treatment can be performed under an air-containing atmosphere (typically an air atmosphere). Alternatively, it is evaluated whether or not the Cu content ratio is 20 at% or less with respect to the treated surface of the electrolytic copper foil. A copper foil can be selected and provided or used in the production of a printed wiring board.

  The treated surface of the electrolytic copper foil of the present invention is a surface treated with at least zinc. “Surface treatment” in the present invention refers to any properties (for example, rust prevention, moisture resistance, chemical resistance, acid resistance, heat resistance, and substrate) on the surface of a copper foil (so-called raw foil) that has been electroformed. Various surface treatments that are performed to improve or impart the adhesiveness. That is, the “surface treatment” in the present invention may consist of one surface treatment step or may include two or more surface treatment steps of the same type or different types. In any case, when two or more surface treatment steps are included, zinc is used in some form in at least one of the surface treatment steps, so that zinc is somehow formed on the copper foil surface (for example, metallic zinc, zinc Alloy and zinc compound), and it is not necessary to use zinc in other surface treatment steps. The surface treatment may be performed on at least one surface of the electrolytic copper foil, or may be performed on both surfaces of the electrolytic copper foil. Representative examples of the surface treatment performed on the electrolytic copper foil include rust prevention treatment (which contributes to oxidation prevention of the copper foil) and silane treatment (which contributes to improvement in adhesion to the base material). ), Roughening treatment (which contributes to improvement in adhesion to the substrate), barrier formation treatment (which contributes to improvement in acid resistance, heat resistance, etc.), and any combination thereof, Particularly preferred is rust prevention treatment. In addition, when a roughening process is performed, it is preferable that a rust prevention process is performed to the surface in which the roughening process was performed.

  The rust prevention treatment preferably includes a plating treatment using zinc. The plating treatment using zinc may be either a zinc plating treatment or a zinc alloy plating treatment, and the zinc alloy plating treatment is particularly preferably a zinc-nickel alloy treatment. The zinc-nickel alloy treatment may be a plating treatment containing at least Ni and Zn, and may further contain other elements such as Sn, Cr, and Co. The Ni / Zn adhesion ratio in the zinc-nickel alloy plating is preferably 1.2 to 10, more preferably 2 to 7, still more preferably 2.7 to 4, in terms of mass ratio. The rust prevention treatment preferably further includes a chromate treatment, and this chromate treatment is more preferably performed on the surface of the plating containing zinc after the plating treatment using zinc. By carrying out like this, rust prevention property can further be improved. A particularly preferable antirust treatment is a combination of a zinc-nickel alloy plating treatment and a subsequent chromate treatment. The copper foil surface after the rust prevention treatment may be further subjected to silane treatment using a silane coupling agent, thereby improving moisture resistance, chemical resistance, adhesion to the substrate, and the like. it can. Rust prevention treatment (for example, plating treatment and chromate treatment using zinc), silane treatment, and other various surface treatments may be performed according to known methods (for example, methods described in Patent Documents 2 and 3).

  Cu existing ratio when the treated surface of the electrolytic copper foil of the present invention is analyzed by XPS (that is, the ratio of Cu in the total amount of Cu, C, N, O, Si, Cr, Ni and Zn in terms of element) Is 20 at% or less, preferably 3 to 20 at%, more preferably 3 to 18 at%, and still more preferably 3 to 15 at%. By making the Cu abundance ratio of the treated surface within the above range, it is possible to effectively prevent circuit peeling due to insertion or the like in an etching process during circuit formation. The element group of C, N, O, Si, Cr, Ni and Zn, excluding Cu derived from copper foil, is a typical element known to exist on the treated surface of electrolytic copper foil derived from the surface treatment. Elements other than Cu, Zn are optional components in the present invention. For example, Ni may be present on the treated surface by zinc-nickel containing plating that constitutes a rust prevention treatment. Cr can be present on the treated surface by the chromate treatment that constitutes the antirust treatment. Si can be present on the treated surface by silane treatment. C originates from a silane treatment (particularly an organic component contained in a silane coupling agent or the like) and can be present on the treated surface. N originates from a rust preventive agent containing a nitrogen atom such as an azole group and may be present in the surface treatment. O may be present on the treated surface by oxidation or the like.

  It should be noted that the portions subjected to rust prevention treatment, zinc / zinc alloy plating treatment, chromate treatment, silane treatment, etc. are rust prevention treatment layer, zinc / zinc alloy plating layer, chromate treatment layer, silane treatment layer (or silane coupling layer). In general, it will not be referred to as such in the following description. This is because even if the electrolytic copper foil as a final product actually subjected to these surface treatments is observed in cross section, the above-mentioned layers are hardly observed as clear layers, but rather the surface of the electrolytic copper foil and its vicinity are stunned. This is due to the fact that they are united. However, in the various prior art documents, it is not intended to be essentially different from the antirust treatment layer, plating layer, chromate treatment layer, silane treatment layer (or silane coupling agent layer), etc. Therefore, it goes without saying that the layers referred to above can be referred to as appropriate.

The treated surface of the electrolytic copper foil of the present invention and its vicinity are derived from the surface treatment, and zinc (Zn) is 5 to 20 mg / m ² , preferably 8 to 18 mg / m ² , more preferably 10 to 15 mg / m. ² is included. Within such a range, it is easy to ensure a uniform rust prevention effect brought about by zinc. That is, when the copper foil surface is coated with a zinc component, the zinc component thermally diffuses into the copper foil under a temperature condition of 120 ° C. or higher. Then, since the zinc component on the surface is reduced, the zinc component on the surface of the copper foil is distributed on the surface of the copper foil in a non-uniform form such as an island-like structure, and it is difficult to prevent the copper foil surface from being uniformly oxidized. . In this regard, such an uneven distribution of zinc can be suppressed by coating the surface of the electrolytic copper foil so that the amount of zinc is within the above range. In addition, the said zinc adhesion amount means the zinc adhesion amount in one side of electrolytic copper foil, and when surface treatment using zinc is given to both surfaces of electrolytic copper foil, copper foil unit area Needless to say, the amount of zinc per hit is twice the above numerical range.

The treatment surface of the electrolytic copper foil of the present invention and the vicinity thereof may be derived from the surface treatment and may contain 0 to 40 mg / m ² of nickel (Ni) as an optional component, preferably 10 to 40 mg / m ² , More preferably, it comprises 12 to 38 mg / m ² , more preferably 15 to 35 mg / m ² . When coating with zinc, if it is coated together with nickel, the rust resistance is further improved. This is thought to be because the thermal diffusion of the zinc component is prevented compared to the case of zinc alone. In particular, by setting the amount of nickel within the above range, a reasonably high etching rate can be obtained. In addition, the said nickel adhesion amount means the nickel adhesion amount in one surface of electrolytic copper foil, and when the surface treatment using nickel is given to both surfaces of electrolytic copper foil, copper foil unit area Needless to say, the per-nickel adhesion amount is twice the above numerical range.

Treated surface and its vicinity of the electrolytic copper foil of the present invention is derived from the surface treatment may include 0-10 mg / ^{m 2} of chromium (Cr) as an optional component, preferably 1-10 mg ^{/ m} 2, More preferably, it comprises 3 to 10 mg / m ² , more preferably 3 to 8 mg / m ² . Chromium further improves rust resistance by forming a dense film on the copper foil surface. In particular, when the chromium content is within the above range, generation of residues during the etching process can be more effectively avoided. In addition, the said chromium adhesion amount means the chromium adhesion amount in one surface of electrolytic copper foil, and when the surface treatment using chromium is given to both surfaces of electrolytic copper foil, copper foil unit area Needless to say, the amount of permeated chromium is twice the above numerical range.

  The treatment surface of the electrolytic copper foil of the present invention and the vicinity thereof may be derived from the surface treatment and may contain silicon (Si) as an optional component. However, the silane treatment derived from silicon can improve the adhesion to the resin substrate, but cannot be expected to have a rust prevention effect as obtained with zinc or the like. Therefore, it can be said that silicon is an element that does not contribute to prevention of circuit peeling due to insertion or the like in an etching process during circuit formation.

  Although the thickness of electrolytic copper foil is not specifically limited, Preferably it is 0.1-18 micrometers, More preferably, it is 0.5-7 micrometers, More preferably, it is 1-5 micrometers. In particular, when providing an electrolytic copper foil in the form of an electrolytic copper foil with a carrier foil, it is preferably as thin as 0.5 μm to 8 μm, more preferably 0.5 μm to 6 μm, and even more preferably 0.5 μm to 2.5 μm. The thickness can be set to be suitable for forming a fine circuit by the MSAP method or the like.

  The electrolytic copper foil of the present invention is preferably heat-treated, and a typical example thereof is heat treatment for curl correction. This heat treatment is typically performed after the surface treatment is performed on the electrolytic copper foil. As described above, the surface of the copper foil is oxidized by heat treatment and may cause the circuit peeling. However, the degree of oxidation is peeled off by referring to the above-described index (particularly the Cu existing ratio of the processing surface) according to the present invention. It is possible to appropriately control so as not to occur. Therefore, heat treatment can be preferably performed in an air-containing atmosphere (typically an air atmosphere) without using an inert gas atmosphere for preventing oxidation. As described above, in order to obtain an inert gas atmosphere, air must be replaced with an inert gas. In this case, not only the cost of the heating furnace itself and the running cost of the heat treatment are required, but also excessive heat treatment is performed. This causes a decrease in productivity. However, according to the present invention, a certain amount of oxidation is allowed as long as the above-described index (particularly, the Cu abundance ratio of the treated surface) is satisfied, so that it is not necessary to use an inert gas atmosphere. The heat treatment for curl correction is preferably performed at 120 to 250 ° C. for 1 to 10 hours, and more preferably at 150 to 200 ° C. for 1 to 7 hours. The heating temperature and the heating time may be appropriately adjusted in consideration of the degree of curl development, productivity, and the index according to the present invention (particularly, the Cu existing ratio on the treated surface). In raising the temperature up to the above temperature condition range, it is preferable to set the upper limit of the rate of temperature rise after the lower limit temperature is about 50 ° C./hour.

  Various element adhesion amounts and Cu abundance ratios that characterize the electrolytic copper foil in the present invention described above are preferably substantially the entire area of at least one surface of the electrolytic copper foil (preferably the region where circuit formation is performed). It is desirable to be realized over substantially the entire area. In particular, in the electrolytic copper foil provided in the form of a roll, substantially the entire region in the width direction (for example, a region where circuit formation is performed) on at least one surface, preferably approximately the entire region in the width direction. It is desirable to be realized over the For example, when viewed in the width direction of the electrolytic copper foil, the total width of the electrolytic copper foil is preferably 50% or more, more preferably 80% or more, still more preferably 90% or more, and particularly preferably 95% or more. It is desirable that various element adhesion amounts and Cu abundance ratios required in the present invention can be realized in an area of about 100%.

Electrolytic copper foil with carrier foil The electrolytic copper foil of the present invention is particularly advantageously provided in the form of an electrolytic copper foil with carrier foil. This is because, as described above, curling correction by heat treatment is desirable for ultra-thin copper foil with carrier foil, and the circuit by insertion at the time of circuit formation resulting from oxidation of the copper foil surface by this heat treatment This is because peeling can be effectively prevented according to the electrolytic copper foil of the present invention.

  As shown in FIG. 6, the electrolytic copper foil 30 with a carrier foil typically includes a carrier foil 32, a release layer 34 provided on the carrier foil 32, and the present invention provided on the release layer 34. The electrolytic copper foil 36 is provided. However, the electrolytic copper foil 30 with carrier foil can employ a known layer configuration except that the electrolytic copper foil 36 of the present invention is used.

  The carrier foil 32 is a foil for supporting the electrolytic copper foil 36 and improving its handleability. Examples of the carrier foil 32 include an aluminum foil, a copper foil, a resin film whose surface is metal-coated, and the like, preferably a copper foil. The copper foil may be a rolled copper foil or an electrolytic copper foil. The thickness of the carrier foil is typically 200 μm or less, preferably 18 μm to 200 μm.

  The release layer 34 has a function of weakening the peeling strength of the carrier foil, ensuring the stability of the strength, and further suppressing the interdiffusion that may occur between the carrier foil and the electrolytic copper foil during press molding at a high temperature. It is a layer having. The release layer 34 is generally formed on one side of the carrier foil, but may be formed on both sides. The release layer may be either an organic release layer or an inorganic release layer. Examples of organic components used in the organic release layer include nitrogen-containing organic compounds, sulfur-containing organic compounds, carboxylic acids and the like. Examples of nitrogen-containing organic compounds include triazole compounds, imidazole compounds, and the like. Among these, triazole compounds are preferred in terms of easy release stability. Examples of triazole compounds include 1,2,3-benzotriazole, carboxybenzotriazole, N ′, N′-bis (benzotriazolylmethyl) urea, 1H-1,2,4-triazole and 3-amino- 1H-1,2,4-triazole and the like can be mentioned. Examples of the sulfur-containing organic compound include mercaptobenzothiazole, thiocyanuric acid, 2-benzimidazolethiol and the like. Examples of the carboxylic acid include monocarboxylic acid and dicarboxylic acid. On the other hand, examples of inorganic components used in the inorganic release layer include Cr, Zn, chromate-treated films, and the like. The release layer may be formed by bringing a release layer component-containing solution into contact with at least one surface of the carrier foil and fixing the release layer component to the surface of the carrier foil. The contact of the carrier foil with the release layer component-containing solution may be performed by immersion in the release layer component-containing solution, spraying of the release layer component-containing solution, flowing down of the release layer component-containing solution, or the like. The release layer component may be fixed to the surface of the carrier foil by drying the release layer component-containing solution, electrodeposition of the release layer component in the release layer component-containing solution, or the like. The thickness of the release layer is typically 1 nm to 1 μm, preferably 5 nm to 500 nm.

  As the electrolytic copper foil 36, the above-described electrolytic copper foil of the present invention is used. The electrolytic copper foil of the present invention has been subjected to surface treatment using at least zinc. As a procedure, first, a bulk copper layer is formed as an electrolytic copper foil by electrodeposition on the surface of the release layer, and then at least zinc A surface treatment (preferably antirust treatment) may be performed. The details of the surface treatment are as described above. In addition, in order to make use of the advantage as an electrolytic copper foil with a carrier, the electrolytic copper foil is preferably configured in the form of an ultrathin copper foil. The preferable thickness of the ultrathin copper foil is 0.5 μm to 8 μm, more preferably 0.5 μm to 6 μm, and still more preferably 0.5 μm to 2.5 μm.

  Another functional layer may be provided between the release layer 34 and the electrolytic copper foil 36. An example of such another functional layer is an auxiliary metal layer. The auxiliary metal layer is preferably made of nickel and / or cobalt. By using the electrolytic copper foil formed with such an auxiliary metal layer as the outer copper foil of the printed wiring board, the copper foil and the base material component can be removed without etching the copper foil in advance as in the conventional conformal mask method. And laser drilling at the same time. The thickness of the auxiliary metal layer is preferably 0.08 to 2 μm when configured as a nickel layer, and 0.05 to 3 μm when configured as a cobalt layer.

  The electrolytic copper foil 30 with carrier foil is preferably heat-treated, and a typical example thereof is heat treatment for curl correction. In particular, the electrolytic copper foil with carrier foil is likely to curl, and therefore, it is desirable that heat treatment for curling correction is performed (see, for example, Patent Document 1). The curling correction effect is obtained by releasing the distortion that is the cause of curling by this heat treatment. This heat treatment is typically performed after the surface treatment is performed on the electrolytic copper foil. As described above, the surface of the copper foil is oxidized by heat treatment and may cause the circuit peeling. However, the degree of oxidation is peeled off by referring to the above-described index (particularly the Cu existing ratio of the processing surface) according to the present invention. It is possible to appropriately control so as not to occur. Therefore, heat treatment can be preferably performed in an air-containing atmosphere (typically an air atmosphere) without using an inert gas atmosphere for preventing oxidation. As described above, in order to obtain an inert gas atmosphere, air must be replaced with an inert gas. In this case, not only the cost of the heating furnace itself and the running cost of the heat treatment are required, but also excessive heat treatment is performed. This causes a decrease in productivity. However, according to the present invention, a certain amount of oxidation is allowed as long as the above-described index (particularly, the Cu abundance ratio of the treated surface) is satisfied, so that it is not necessary to use an inert gas atmosphere. The heat treatment for curl correction is preferably performed at 120 to 250 ° C. for 1 to 10 hours, and more preferably at 150 to 200 ° C. for 1 to 7 hours. The heating temperature and the heating time may be appropriately adjusted in consideration of the degree of curl development, productivity, and the index according to the present invention (particularly, the Cu existing ratio on the treated surface). In raising the temperature up to the above temperature condition range, it is preferable to set the upper limit of the rate of temperature rise after the lower limit temperature is about 50 ° C./hour. In addition, as an aspect of the curl correction by heat treatment, the electrolytic copper foil with carrier foil is continuously run while being heat treated to correct the curl, and then wound up, or the electrolytic copper foil with carrier foil is wound up (roll form) ) To correct the curl by heat treatment, and heat treatment to correct the curl in a state where the electrolytic copper foil with carrier foil is formed into a sheet and stacked, and is not particularly limited.

Printed wiring board The electrolytic copper foil of the present invention is preferably used for production of a printed wiring board. That is, according to this invention, the printed wiring board provided with the electrolytic copper foil is also provided. The printed wiring board can employ a known layer configuration except that the electrolytic copper foil of the present invention is used. For example, when the circuit is formed by the MSAP method, the configuration as shown in FIGS. 1 and 2 can be adopted, and when the circuit is formed by the subtractive method, the configuration as shown in FIGS. 3 and 4 can be adopted.

  The present invention is more specifically described by the following examples.

Examples 1-19
After forming an organic peeling layer and an ultrathin copper foil layer in order on the glossy surface side of the electrolytic copper foil as the carrier foil, an antithin treatment was performed to produce an ultrathin copper foil with a carrier foil. And various evaluation was performed about the obtained ultra-thin copper foil with a carrier foil. Specifically, it is as follows.

(1) Preparation of carrier foil As the carrier foil, an electrolytic copper foil having a thickness of 18 μm classified as grade 3 according to the IPC standard was prepared. The electrolytic copper foil (hereinafter referred to as carrier copper foil) as the carrier foil is a copper foil that has been electrolytically made (so-called raw foil) and is subjected to surface treatment such as rust prevention treatment and roughening treatment. It is not. In order to remove the oil and fat component and the surface oxide film adhering to the surface of the copper foil for carrier, pickling treatment was performed.

(2) Formation of Organic Peeling Layer The glossy side of the pickled copper foil for carrier is placed in a CBTA aqueous solution containing 1000 ppm by weight of CBTA (carboxybenzotriazole), 150 g / l of sulfuric acid and 10 g / l of copper. It was immersed for 30 seconds at 30 ° C. and pulled up to adsorb the CBTA component on the glossy surface of the carrier foil. Thus, a CBTA layer was formed as an organic release layer on the glossy surface of the carrier copper foil.

(3) Formation of Auxiliary Metal Layer The carrier copper foil on which the organic release layer was formed was immersed in a solution containing 20 g / l nickel and 300 g / l potassium pyrophosphate prepared using nickel sulfate. Under the conditions of 45 ° C., pH 3, and current density of 5 A / dm ² , nickel having a deposition amount corresponding to a thickness of 0.2 μm was deposited on the organic release layer. Thus, a nickel layer was formed as an auxiliary metal layer on the organic release layer.

(4) Formation of ultrathin copper foil The copper foil for carriers on which the auxiliary metal layer is formed is immersed in an acidic copper sulfate solution and electrolyzed for 60 seconds under a smooth plating condition with a current density of 8 A / dm ² to obtain a thickness. A 3 μm ultra-thin copper foil was formed on the auxiliary metal layer. The surface of the ultrathin copper foil thus formed was roughened. This roughening treatment includes a baking plating process in which fine copper grains are deposited on an ultrathin copper foil, and a covering plating process for preventing the fine copper grains from falling off. In the baking plating step, a roughening treatment was performed using an acidic copper sulfate solution containing 10 g / l copper and 120 g / l sulfuric acid at a liquid temperature of 40 ° C. and a current density of 30 A / dm ² . In the subsequent plating step, electrodeposition was performed using an acidic copper sulfate solution containing 70 g / l of copper and 120 g / l of sulfuric acid at a liquid temperature of 40 ° C., a current density of 30 A / dm ² , and smooth plating conditions.

(5) Surface treatment On the surface of the roughening layer of the ultrathin copper foil with carrier foil, as surface treatment, rust prevention treatment consisting of zinc-nickel alloy plating treatment and chromate treatment, and silane treatment in this order are as follows: Performed according to conditions.
<Zinc-nickel alloy plating conditions>
Based on the electrolyte composition of zinc 1-5 g / l, nickel 0.5-1 g / l and potassium pyrophosphate 300 g / l, liquid temperature 40 ° C., current density 3 A / dm ² , zinc and nickel in the electrolyte The adhesion amount of zinc and nickel was adjusted by adjusting the concentration ratio, treatment time and current density. That is, the amounts of zinc and nickel deposited in the zinc-nickel rust prevention treatment are appropriately changed by changing the concentration of water-soluble zinc and water-soluble nickel in the electrolytic solution and / or changing the amount of electricity during electrolysis. be able to.
<Chromate treatment conditions>
Based on 3 g / l chromic acid aqueous solution, pH 10, and current density 5 A / dm ² , the treatment time was adjusted to adjust the amount of chromium deposited. That is, the amount of chromium deposited in the chromate treatment can be changed as appropriate by changing the chromium component concentration in the chromate treatment solution and / or changing the amount of electricity during electrolysis.
<Silane treatment conditions>
Based on a 2 g / l aqueous solution of γ-glycidoxypropyltrimethoxysilane, the silane adsorption amount was adjusted by changing the concentration of the silane treating agent. That is, the amount of silicon component to be deposited in the silane treatment can be appropriately changed by changing the treatment concentration and treatment time of the silane agent in the liquid for silane treatment.

(6) Heat treatment The ultrathin copper foil with the carrier foil thus obtained is heat-treated at 180 ° C. for 1 to 24 hours in the atmosphere, and the surface of the ultrathin copper foil is oxidized to various degrees. Various ultrathin copper foils with carrier foil were obtained. At this time, in Examples 1 to 9, the surface of the ultrathin copper foil was oxidized to various degrees by changing the heat treatment time within the above range, thereby changing the existence ratio of the copper atoms. On the other hand, in Examples 10 to 19, the heat treatment time was 6 hours.

(7) Evaluation of electrolytic copper foil The following analyzes and tests were performed on the ultrathin copper foil with carrier foil thus heat-treated.

(7a) Quantitative analysis of elements derived from surface treatment Dissolve ultrathin copper foil that has been subjected to rust prevention treatment with acid, and determine the concentrations of Zn, Ni, and Cr in the resulting solution by ICP emission spectrometry. did. Based on each measured density | concentration, the adhesion amount (mg / m < ² >) per unit area of Zn, Ni, and Cr was computed.

(7b) Surface analysis by XPS Elemental analysis is performed by X-ray photoelectron spectroscopy (XPS) on the surface of the ultrathin copper foil subjected to rust prevention treatment, and the detected C, N, O, Si, Cr, The content (at%) of the target element was measured when the total of the elements of Ni, Cu and Zn was 100 at%. This measurement uses an X-ray photoelectron spectroscopy (XPS) apparatus (manufactured by ULVAC-PHI, Quantum 2000), output: 40 W, X-ray source: Al (using a monochromator), X-ray beam diameter: 200 μm, energy Range: 0 to 1400 eV, pass energy: 58.7 eV, step: 1.0 eV, measurement setting time: 5 minutes, survey measurement was performed. Quantification of the target element using the obtained survey spectrum was performed with software using the relative sensitivity coefficient method. The target elements for quantitative measurement by XPS and the trajectories corresponding to the respective measurement spectra are as shown in Table 1 below.

  By performing XPS measurement on the surface of the ultrathin copper foil thus subjected to rust prevention treatment, the presence ratio of Cu element (at%) when the total amount of the above eight elements is 100 atm%. ) Was calculated. The results were as shown in Table 2.

(7c) Circuit peeling test Circuit formation was performed based on the MSAP method using an ultrathin copper foil with a carrier foil, and the peeling state of the obtained circuit was confirmed. Specifically, the ultra-thin with carrier foil so that the surface of the ultra-thin copper foil of 40 mm x 70 mm is in contact with the surface of the prepreg (manufactured by Mitsubishi Gas Chemical, 830NX-A, thickness 0.1 mm x 2 sheets). Copper foil was laminated on the prepreg. The obtained laminate was thermocompression bonded at 0.4 MPa and 220 ° C. for 90 minutes, and then the carrier foil was peeled off. By attaching a dry film to the surface of the ultra-thin copper foil from which the carrier foil has been peeled off, and performing exposure, dry film removal, plating up treatment by electrolytic plating (18 μm), etc., the interval of line / space = 25 μm / 25 μm Thus, a circuit having a length of 250 μm (the lower part of each circuit is electrically connected by an ultrathin copper foil) was formed. By treating the resulting circuit with an etching solution (Mitsubishi Gas Chemical Co., Ltd., CPE800) using hydrogen peroxide and sulfuric acid, the ultrathin copper foil remaining between the circuits is dissolved and removed, and the circuits are insulated. did. The amount of etching at this time was measured under the so-called over-etching conditions in which the etching rate of the copper foil was measured in advance, and etching equivalent to 6 μm was further performed than the so-called just etching. After the etching process, the circuit was washed with water and dried. The cross section of the circuit was observed using an optical microscope, and the ratio of the circuit remaining without circuit peeling after the etching process was determined with respect to the number of circuits subjected to the etching process. That is, when insertion occurs due to over-etching, the remaining circuit is reduced by peeling off the circuit. The results were as shown in Table 2.

DESCRIPTION OF SYMBOLS 10 Ultrathin copper foil 11,21 Insulation resin substrate 11a, 21a Underlying base material 11b, 21b Prepreg 11c, 21c Lower layer circuit 12 Primer layer 13, 23 Via hole 14, 24 Chemical copper plating 15, 25 Dry film 16, 26 Electro copper plating 16a Wiring part 17, 27 Wiring 18 Insertion 20 Copper foil 30 Electrolytic copper foil with carrier foil 32 Carrier foil 34 Peeling layer 36 Electrolytic copper foil

Claims (10)

A method for producing an electrolytic copper foil,
Performing a surface treatment using at least zinc on the copper foil as it is made of electrolytic foil, and obtaining an electrolytic copper foil containing zinc derived from the surface treatment in an amount of 5 to 20 mg / m ² ;
A step of performing heat treatment for curl correction within a temperature range of 120 to 250 ° C. with respect to the electrolytic copper foil ,
When the surface treated surface of the electrolytic copper foil after the heat treatment is analyzed by XPS (X-ray photoelectron spectroscopy), the total amount of Cu, C, N, O, Si, Cr, Ni and Zn is converted into elements. A method in which the proportion of Cu occupied is 20 at% or less. The method according to claim 1, wherein a ratio of Cu in a total amount of the Cu, C, N, O, Si, Cr, Ni, and Zn is 3 to 15 at%. Nickel is used in the surface treatment, and the electrolytic copper foil after the surface treatment contains 10 to 40 mg / m of nickel derived from the surface treatment. ² The method according to claim 1, further comprising: Chromium is used during the surface treatment, and the electrolytic copper foil after the surface treatment contains 1 to 10 mg / m of chromium derived from the surface treatment. ² The method according to any one of claims 1 to 3, further comprising: The method according to claim 1, wherein the electrolytic copper foil has a thickness of 0.1 to 18 μm. The method according to claim 1, wherein the heat treatment is performed in an air-containing atmosphere. The method according to claim 1, wherein the heat treatment is performed for 1 to 10 hours. The method according to claim 1, wherein the electrolytic copper foil is used for producing a printed wiring board. A method for producing an electrolytic copper foil with a carrier foil,
Preparing a carrier foil;
Forming a release layer on the carrier foil;
Forming an electrolytic copper foil on the release layer,
The method by which an electrolytic copper foil is produced by the method as described in any one of Claims 1-8 when forming the said electrolytic copper foil. A method of manufacturing a printed wiring board,
A step of producing an electrolytic copper foil by the method according to any one of claims 1 to 8 or producing an electrolytic copper foil with a carrier foil by the method according to claim 9,
Producing a printed wiring board using the electrolytic copper foil or the electrolytic copper foil with carrier foil;
Including a method.

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