JP6346833B2 - 被加工物の研削方法 - Google Patents
被加工物の研削方法 Download PDFInfo
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- JP6346833B2 JP6346833B2 JP2014189352A JP2014189352A JP6346833B2 JP 6346833 B2 JP6346833 B2 JP 6346833B2 JP 2014189352 A JP2014189352 A JP 2014189352A JP 2014189352 A JP2014189352 A JP 2014189352A JP 6346833 B2 JP6346833 B2 JP 6346833B2
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- grinding
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- 238000000034 method Methods 0.000 title claims description 65
- 238000005259 measurement Methods 0.000 claims description 31
- 238000013459 approach Methods 0.000 claims description 4
- 238000012986 modification Methods 0.000 description 14
- 230000004048 modification Effects 0.000 description 14
- 238000012545 processing Methods 0.000 description 12
- 238000003754 machining Methods 0.000 description 8
- 235000012431 wafers Nutrition 0.000 description 8
- 238000001514 detection method Methods 0.000 description 3
- JMASRVWKEDWRBT-UHFFFAOYSA-N Gallium nitride Chemical compound [Ga]#N JMASRVWKEDWRBT-UHFFFAOYSA-N 0.000 description 2
- 239000006061 abrasive grain Substances 0.000 description 2
- 239000012530 fluid Substances 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- 229910052594 sapphire Inorganic materials 0.000 description 2
- 239000010980 sapphire Substances 0.000 description 2
- 230000001629 suppression Effects 0.000 description 2
- 239000007767 bonding agent Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 238000010298 pulverizing process Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
Images
Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B1/00—Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B41/00—Component parts such as frames, beds, carriages, headstocks
- B24B41/06—Work supports, e.g. adjustable steadies
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
- B24B49/02—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation according to the instantaneous size and required size of the workpiece acted upon, the measuring or gauging being continuous or intermittent
- B24B49/04—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation according to the instantaneous size and required size of the workpiece acted upon, the measuring or gauging being continuous or intermittent involving measurement of the workpiece at the place of grinding during grinding operation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B7/00—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
- B24B7/07—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor involving a stationary work-table
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B7/00—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
- B24B7/20—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground
- B24B7/22—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Ceramic Engineering (AREA)
- Inorganic Chemistry (AREA)
- Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
- Chemical & Material Sciences (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Physics & Mathematics (AREA)
- Grinding Of Cylindrical And Plane Surfaces (AREA)
Description
本発明の実施形態に係る被加工物の研削方法を図面に基いて説明する。図1は、実施形態に係る被加工物の研削方法に用いられる研削装置の構成を示す外観斜視図であり、図2は、実施形態に係る被加工物の研削方法に用いられる研削装置の保持手段と高さ測定手段などの斜視図であり、図3は、実施形態に係る被加工物の研削方法に用いられる研削装置の高さ測定手段と複数の被加工物の斜視図であり、図4は、実施形態に係る被加工物の研削方法に用いられる研削装置の高さ測定手段などと複数の被加工物の平面図である。
次に、本発明の実施形態の変形例1に係る被加工物の研削方法を図面に基いて説明する。図8は、実施形態に係る被加工物の研削方法に用いられる研削装置の保持手段と高さ測定手段などの側面図である。なお、図8において、実施形態と同一部分には、同一符号を付して説明を省略する。
次に、本発明の実施形態の変形例2に係る被加工物の研削方法を図面に基いて説明する。図9は、実施形態に係る被加工物の研削方法に用いられる研削装置の保持手段と高さ測定手段などの平面図である。なお、図9において、実施形態と同一部分には、同一符号を付して説明を省略する。
10 保持手段
10a 保持面
20 研削手段
23 研削ホイール
30 研削送り手段
40 高さ測定手段
43 接触子
A 回転軸
T 仕上げ厚さ
W 被加工物
WR 裏面(上面)
Claims (1)
- 被加工物を同時に研削する研削方法であって、
被加工物を保持する保持面に直交する回転軸周りに回転可能な保持手段と、該保持手段に保持された被加工物の上面を研削する研削ホイールが装着される研削手段と、該研削手段を該保持面と直交する方向に接近および離間させる研削送り手段と、該研削手段によって研削される被加工物の上面の高さを測定する高さ測定手段と、を備える研削装置を用い、
該保持手段の該保持面に、該保持面より小さいサイズの複数の被加工物を並べて保持する保持ステップと、
該保持ステップを実施した後、被加工物の上面に高さ測定手段の接触子を接触させつつ該保持手段を回転させて複数の被加工物の高さを測定し、最も低い高さを割り出す予備測定ステップと、
該予備測定ステップを実施した後、該接触子を被加工物の上面から離間させて待避させる待避ステップと、
該待避ステップを実施した後に、該高さ測定手段で測定した被加工物の最も低い高さ位置に該研削ホイールが位置づけられるまで、該保持手段を回転させつつ該研削送り手段を作動して該研削ホイールで被加工物を研削し、複数の被加工物の高さを揃える第1研削ステップと、
該第1研削ステップを実施した後、待避していた該接触子を被加工物の上面に接触させ、該高さ測定手段で測定される被加工物の高さが所望の仕上げ厚さに至るまで該保持手段を回転させつつ被加工物を該研削手段で研削する第2研削ステップと、を備え、
該予備測定ステップで該保持手段が回転する速度は、該第1研削ステップで該保持手段が回転する速度より遅く、異なる高さの被加工物の上面を通過する該接触子が破損しない速度であることを特徴とする被加工物の研削方法。
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2014189352A JP6346833B2 (ja) | 2014-09-17 | 2014-09-17 | 被加工物の研削方法 |
TW104125653A TWI651161B (zh) | 2014-09-17 | 2015-08-06 | 被加工物之磨削方法 |
KR1020150128985A KR102197502B1 (ko) | 2014-09-17 | 2015-09-11 | 피가공물의 연삭 방법 |
CN201510590987.1A CN105436999B (zh) | 2014-09-17 | 2015-09-16 | 被加工物的磨削方法 |
Applications Claiming Priority (1)
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---|---|---|---|
JP2014189352A JP6346833B2 (ja) | 2014-09-17 | 2014-09-17 | 被加工物の研削方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2016059993A JP2016059993A (ja) | 2016-04-25 |
JP6346833B2 true JP6346833B2 (ja) | 2018-06-20 |
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JP2014189352A Active JP6346833B2 (ja) | 2014-09-17 | 2014-09-17 | 被加工物の研削方法 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP6346833B2 (ja) |
KR (1) | KR102197502B1 (ja) |
CN (1) | CN105436999B (ja) |
TW (1) | TWI651161B (ja) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109352431B (zh) * | 2018-09-17 | 2020-04-21 | 上海理工大学 | 超声振动磨削去除量在位检测装置 |
JP2020089930A (ja) * | 2018-12-04 | 2020-06-11 | 株式会社ディスコ | クリープフィード研削方法 |
JP7405563B2 (ja) * | 2019-11-01 | 2023-12-26 | 株式会社ディスコ | クリープフィード研削方法及び研削装置 |
CN111660157A (zh) * | 2020-06-08 | 2020-09-15 | 苏州辰轩光电科技有限公司 | 减薄机 |
CN112518432B (zh) * | 2020-10-13 | 2022-05-10 | 欣强电子(清远)有限公司 | 一种提高电镀铂金表面平整度的方法及其使用的打磨设备 |
Family Cites Families (17)
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CN2086646U (zh) * | 1991-02-27 | 1991-10-16 | 东北工学院 | 平面磨削加工尺寸在线检测装置 |
JPH07246552A (ja) * | 1994-03-10 | 1995-09-26 | Nippon Telegr & Teleph Corp <Ntt> | ロボットによるばり研削方法 |
JP2000006018A (ja) | 1998-06-23 | 2000-01-11 | Disco Abrasive Syst Ltd | 研削装置 |
DE10121556A1 (de) * | 2001-05-03 | 2002-11-14 | Infineon Technologies Ag | Verfahren zum Rückseitenschleifen von Wafern |
JP2006021264A (ja) * | 2004-07-07 | 2006-01-26 | Disco Abrasive Syst Ltd | 研削装置 |
DE102007056627B4 (de) * | 2007-03-19 | 2023-12-21 | Lapmaster Wolters Gmbh | Verfahren zum gleichzeitigen Schleifen mehrerer Halbleiterscheiben |
JP4980140B2 (ja) * | 2007-05-25 | 2012-07-18 | 株式会社ディスコ | ウェーハの研削加工方法 |
JP2009094326A (ja) | 2007-10-10 | 2009-04-30 | Disco Abrasive Syst Ltd | ウェーハの研削方法 |
JP2009113149A (ja) | 2007-11-06 | 2009-05-28 | Disco Abrasive Syst Ltd | 研削装置 |
CN201249373Y (zh) * | 2008-09-16 | 2009-06-03 | 横店集团东磁股份有限公司 | 铁氧体材料平面磨削装置 |
JP2010247311A (ja) * | 2009-04-20 | 2010-11-04 | Disco Abrasive Syst Ltd | 被加工物の研削方法 |
JP5554601B2 (ja) | 2010-03-25 | 2014-07-23 | 株式会社ディスコ | 研削装置 |
JP2012101293A (ja) * | 2010-11-08 | 2012-05-31 | Disco Corp | 加工方法 |
JP5836757B2 (ja) * | 2011-11-02 | 2015-12-24 | 株式会社ディスコ | 板状物の研削方法 |
JP5823880B2 (ja) | 2012-01-16 | 2015-11-25 | 株式会社ディスコ | 板状物の研削方法 |
WO2014040001A1 (en) | 2012-09-07 | 2014-03-13 | Axus Technology, Llc | Method and apparatus for wafer backgrinding and edge trimming on one machine |
CN203077065U (zh) * | 2012-12-29 | 2013-07-24 | 铜陵市方远电子科技有限公司 | 一种晶体研磨机 |
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2014
- 2014-09-17 JP JP2014189352A patent/JP6346833B2/ja active Active
-
2015
- 2015-08-06 TW TW104125653A patent/TWI651161B/zh active
- 2015-09-11 KR KR1020150128985A patent/KR102197502B1/ko active IP Right Grant
- 2015-09-16 CN CN201510590987.1A patent/CN105436999B/zh active Active
Also Published As
Publication number | Publication date |
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CN105436999B (zh) | 2019-04-19 |
TWI651161B (zh) | 2019-02-21 |
KR102197502B1 (ko) | 2020-12-31 |
JP2016059993A (ja) | 2016-04-25 |
KR20160033041A (ko) | 2016-03-25 |
CN105436999A (zh) | 2016-03-30 |
TW201615344A (zh) | 2016-05-01 |
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