JP6138059B2 - Touch panel - Google Patents

Description

  The present invention relates to a capacitive transparent touch panel.

  In recent years, computer and electronic devices have been actively developed for operations that use the display on the display without using push buttons. For this operation, a transparent touch panel is placed on the front of the display to detect the touch position. doing. Types of touch panels include a resistance film type, a surface acoustic wave type, an infrared type, and the like, and there is also a capacitance type that detects a position by a change in capacitance due to a finger touch or proximity. For example, Patent Document 1 describes a capacitive touch switch having matrix electrodes (two-layer structure in the X direction and the Y direction).

  A conventional capacitive touch panel includes a first conductive substrate having a transparent first electrode made of indium tin oxide (ITO) patterned in a strip shape on one surface of the substrate, And a second conductive base material on which a transparent second electrode made of ITO or the like patterned in a strip shape is formed on one side, and the two electrodes are arranged so that the first electrode and the second electrode face each other. An adhesive base material is stuck through an adhesive layer. However, ITO has a high resistivity, and is generally 200Ω / □ to 1000Ω / □. In particular, in a large-sized touch panel, the resistance value between the terminals of the electrodes increases, and the sensitivity of capacitance detection decreases accordingly, which may make it difficult to operate as a touch panel.

  Therefore, a capacitive touch panel that does not use ITO has been proposed (see, for example, Patent Document 2). In the touch panel of Patent Document 2, the electrode is formed by forming a metal wire made of copper or a copper alloy in a mesh shape, so that the transmittance of the electrode is 70% or more, and low resistance is maintained while maintaining visibility. An electrode is formed.

JP-T-2006-511879 JP 2013-069257 A

  However, in the touch panel of Patent Document 2, a first conductive base material in which a mesh-like first electrode is formed on one surface of the base material, and a second electrode in which a mesh-like second electrode is formed on one surface of the base material. Since it is the structure which piled up 2 electroconductive base materials, the thickness of the whole touch panel becomes thick. In recent years, the touch panel is required to be thin and light, but the touch panel of Patent Document 2 has a problem that it is disadvantageous for the requirement for lightness and thinness. Moreover, since it is necessary to form an electrode, wiring, etc. on the two base materials, respectively, there are problems in that it is difficult to efficiently manufacture the touch panel because the number of steps for manufacturing the touch panel is increased.

  The present invention has been made paying attention to the above problem, and an object of the present invention is to provide a touch panel that is provided with a low-resistance electrode and can be reduced in thickness and weight.

  The object of the present invention is to provide a base material, a plurality of rows of first electrodes arranged at intervals in a first direction on one side of the base material, and the first direction on one side of the base material. A plurality of rows of second electrodes arranged at intervals in a second direction intersecting with the touch panel and attached to the front surface of the display device, wherein the substrate includes the first electrode and the second electrode A sensor region in which electrodes are arranged; and a peripheral region provided around the sensor region, wherein the first electrode is formed by intersecting a plurality of conductor lines and spaced in the second direction. A plurality of first electrode cells arranged at intervals, wherein the second electrode is formed by intersecting a plurality of conductor lines and arranged at intervals in the first direction; And a wiring is connected to the first electrode cell and the second electrode cell. The wirings are drawn toward the peripheral region without crossing each other, and the wirings drawn from the first electrode cells in the same row and the wirings drawn from the second electrode cells in the same row are electrically coupled to each other. Achieved by touch panel.

  In the touch panel having the above configuration, it is preferable that at least a portion of the wiring extending between the first electrode cell and the second electrode cell is parallel to a part of the conductor lines.

  In addition, it is preferable that a plurality of auxiliary lines that are not connected to the conductor lines and the wirings are provided between the first electrode cells and the second electrode cells, and the auxiliary lines are parallel to the wirings.

  More preferably, at least a part of the wiring is provided with a first dummy line that intersects with the wiring and is not connected to the wiring and the conductor line adjacent to the wiring.

  In addition, it is preferable that at least a part of the auxiliary line is provided with a second dummy line that intersects with the auxiliary line and is not connected to the wiring and the conductor line.

  Moreover, it is preferable that at least one of the first dummy wire and the second dummy wire is disposed on a plurality of lines having a pitch equal to the pitch between the conductor wires.

  Moreover, it is preferable that the direction of the said conductor line is a diagonal direction with respect to the black matrix of a display apparatus.

  Moreover, it is preferable that the said 1st electrode and the said 2nd electrode are provided with the cutting part which cut | disconnects the said conductor wire in the range which does not inhibit the electrical conductivity between both ends.

  Moreover, it is preferable that it is a mutual capacitance detection type capacitive touch panel.

  According to the present invention, since the first electrode and the second electrode having a mesh shape are formed by crossing a plurality of conductor wires, it is possible to avoid the use of indium which is a rare metal, rather than using ITO. Since the resistance of the electrode pattern formed on the substrate can be reduced and the visibility of the electrode pattern can be improved, it can be suitably used as a capacitive touch panel. In addition, since both the first electrode and the second electrode are formed on one side of the substrate, the touch panel structure is simplified and the overall thickness and weight are reduced (thinning and weight reduction). Has the advantage of being able to. Furthermore, each wiring connected to each electrode cell is drawn out toward the peripheral region of the base material without crossing each other, and the predetermined wirings are coupled to each other, so that the sensor region of the base material has a simple structure. And can be formed directly on the substrate using a single photolithography or other printing method. Thus, the number of steps for manufacturing the touch panel can be reduced and the manufacturing process can be simplified, so that the touch panel can be efficiently manufactured and the manufacturing cost can be reduced.

It is a top view of the touch panel concerning one embodiment of the present invention. It is a schematic sectional drawing of FIG. It is a top view which expands and shows a part of FIG. It is a top view of the touch panel concerning other embodiments of the present invention. It is a top view which expands and shows a part of FIG. It is a top view which expands and shows a part of touch panel concerning other embodiments of the present invention.

  Hereinafter, actual forms of the present invention will be described with reference to the accompanying drawings. Each drawing is partially enlarged or reduced to facilitate understanding of the configuration, not the actual size ratio.

  FIG. 1 is a plan view of a touch panel according to an embodiment of the present invention. FIG. 2 is a schematic cross-sectional view of FIG. FIG. 3 is an enlarged plan view of a part of FIG. The touch panel 1 according to the present embodiment is a capacitive touch panel, more specifically, a mutual capacitance detection type capacitive touch panel. This type of touch panel 1 includes a transparent substrate 2, a plurality of strip-shaped first electrodes 3 and a plurality of rows of strip-shaped second electrodes 4 provided on one side T of the substrate 2. The drive voltage is applied to one first electrode 3, the change in capacitance between the finger is detected by the other second electrode 4, the Y position is detected by the second electrode 4, and the first electrode 3 is detected. To detect the X position. The mutual capacitance detection type touch panel can accurately detect each touch position even when the operator performs multi-touch in which multiple touch operations are simultaneously performed within the sensor region R of the touch panel. This method is preferable to the detection type touch panel. Such a touch panel 1 is used for display devices such as bank terminals (cash dispensers), ticket machines, mobile phones, smartphones, tablet devices, notebook computers, display-integrated computers, car navigation systems, game machines, and POS terminals. Installed and used.

  The substrate 2 is a dielectric substrate. Examples of the material of the substrate 2 include transparent materials such as polyester, polyethylene terephthalate, polycarbonate, polymethyl methacrylate, and polyethylene naphthalate. The thickness of the substrate 2 is preferably about 10 μm to 2000 μm. Further, these materials may be laminated in multiple layers. In addition, a hard coat layer for protecting the front and back surfaces, and a functional layer such as an antireflection layer, an antifouling layer, an antiblocking layer, and a receiving layer are provided on the front and back surfaces of the substrate 2, or plasma treatment is performed. You may give it. The base material 2 has a central sensor region R that may be touched with a finger or a conductive pen, and a peripheral region C that surrounds the sensor region R. The plurality of rows of the first electrode 3 and the second electrode 4 are arranged in the sensor region R.

  The first electrodes 3 are arranged in a row at a predetermined interval in the first direction (left and right Y directions in the illustrated example) of the one surface T of the substrate 2, and the adjacent first electrodes 3 are not spaced apart from each other. It is electrically insulated. The first electrode 3 in each column includes a plurality of first electrode cells 30. On the other hand, the second electrodes 4 form a row at a predetermined interval in a second direction (upper and lower X directions in the illustrated example) perpendicularly intersecting the first direction (Y direction) of the one surface T of the substrate 2. The adjacent second electrodes 4 are electrically insulated from each other. The second electrode 4 in each column includes a plurality of second electrode cells 40. In the present embodiment, the first direction (Y direction) and the second direction (X direction) are orthogonal to each other, but the first electrode 3 and the second electrode on the one surface T of the substrate 2 at an angle that is not orthogonal. 4 can also be arranged.

  The plurality of first electrode cells 30 are arranged at equal intervals in the second direction (X direction) of the one surface T of the substrate 2. The first electrode cell 30 is formed in a mesh shape by intersecting a plurality of two types of conductor lines L1 and L2 (shown in FIG. 3) that are oriented obliquely (U direction or V direction) with respect to the X direction. A shape in which a plurality of lattices K are combined. The lattice K has a square shape in the illustrated example, but is not limited thereto, and may have an arbitrary shape such as a diamond shape. The line width of the conductor lines L1 and L2 is, for example, about 1 μm to 30 μm, and preferably about 1 μm to 15 μm. The pitch between the conductor lines L1 and L2 is, for example, about 50 μm to 500 μm. Moreover, the thickness of the conductor lines L1 and L2 is, for example, about 0.1 μm to 10 μm. The first electrode cell 30 having such dimensions is hardly noticeable because the conductor lines L1 and L2 have a very narrow line width and a sufficiently large pitch with respect to the line width.

  The plurality of second electrode cells 40 are arranged at equal intervals in the first direction (Y direction) of the one surface T of the substrate 2. The outer shapes of the first electrode cell 30 and the second electrode cell 40 are rhombus-shaped in this embodiment, and the second electrode cell 40 overlaps with the first electrode cell 30 provided on the one surface T of the substrate 2. The first electrode cell 30 is provided so as to fill a vacant space where the first electrode cell 30 does not exist. Thereby, the sensor region R of the base material 2 is in a state in which a plurality of first electrode cells 30 and a plurality of second electrode cells 40 are spread. Further, in the sensor region R, gaps S1 and S2 extending between the electrode cells 30 and 40 spread out are provided. Each of the gaps S1 and S2 extends to the peripheral region C by extending in the U direction and the V direction which are oblique to the X direction. Similarly to the first electrode cell 30, the second electrode cell 40 is also formed in a mesh shape by crossing a plurality of two types of conductor lines L1 and L2. The conductor lines L1 and L2 of the second electrode cell 40 have the same line width, pitch and thickness as the conductor lines L1 and L2 of the first electrode cell 30, and the second electrode cell 40 is the same as the first electrode cell 30. This is a shape in which a plurality of shaped lattices K are combined. The conductor lines L1 and L2 of the second electrode cell 40 are formed of the same material as the conductor lines L1 and L2 of the first electrode cell 30. Thereby, since the 2nd electrode cell 40 can be collectively formed on the one surface T of the base material 2 with the 1st electrode cell 30, it can be formed efficiently.

  In addition, the external shape of the 1st electrode cell 30 and the 2nd electrode cell 40 does not necessarily need to be a rhombus shape, insulation is ensured between the 1st electrode cell 30 and the 2nd electrode cell 40, fingers, etc. Any shape can be used as long as the contact point can be detected.

  In the above description, the mesh shape means that the conductor lines L1 and L2 intersect with each other so as to have an intersection, and at least one of the lines intersects at a portion where the lines intersect. It also includes that the line does not have an intersection but intersects (substantially mesh).

  The conductor lines L1 and L2 are preferably oriented in an oblique direction (X direction or U direction or V direction inclined with respect to the Y direction) with respect to a black matrix of a display device (not shown). If the conductor lines L1 and L2 are oriented in the same direction as the black matrix, moire is likely to occur. This prevents the occurrence of moire. For this reason, wirings 5 and auxiliary lines 6 described later are also inclined with respect to the black matrix.

  The conductor lines L1 and L2 can be formed on the substrate 2 using, for example, photolithography. For example, after a metal thin film such as copper or silver is formed on one surface T of the substrate 2, a photosensitive resist is thinly applied to the surface of the metal thin film and heated. A pattern mask is arranged on the resist coating surface, and a pattern composed of an exposed portion and an unexposed portion is produced by irradiating with ultraviolet rays for a predetermined time from above. Then, the resist in the unexposed portion is removed using a developer to form a resist pattern, and the exposed portion of the metal thin film is etched away from the base material 2, and the conductor wire is formed on the base material 2. L1 and L2 wiring patterns are formed. Thereafter, the conductor lines L1 and L2 are formed by removing excess resist on the metal thin film. The metal thin film is formed by a film forming method such as sputtering or vacuum evaporation. Etching is performed by wet etching using an acid or an oxidizing agent, or dry etching using laser ablation or corrosive gas.

  In forming the conductor lines L1 and L2, it is preferable to provide a rust preventive layer on the surface in order to prevent the conductor lines L1 and L2 from aging. For example, when forming a metal thin film on one surface T of the substrate 2, the rust preventive layer is deposited by depositing a metal having a rust preventive action such as nickel copper (NiCu) as a thin film on the surface of the metal thin film. Can be formed.

  Further, when forming the conductor lines L1 and L2, in order to suppress the metallic luster that deteriorates the invisible property of the first and second electrode cells 30 and 40 patterned in a mesh shape (the difference between presence / absence of electrodes is difficult to see) It is preferable to perform a blackening treatment. For example, when the metal thin film is formed on one surface T of the base material 2, the blackening treatment is performed on the surface of the metal thin film formed on the one surface T of the base material 2 or the one surface T of the base 2. It can be performed by changing the color to a low reflection color that can suppress the reflection of light such as black. One surface T of the base material 2 and the surface of the metal thin film are formed by flowing a gas such as oxygen or nitrogen into the chamber when the metal thin film is formed on the one surface T of the base material 2 by sputtering or vacuum deposition, for example. By depositing a product produced by oxidation or nitridation as a thin film on the lowermost layer or the outermost layer of the metal thin film, the color can be changed to a low reflection color such as black. Thereby, the conductor lines L1 and L2 after etching and resist removal have the blackened layer formed by the blackening process on the front surface or the back surface (boundary surface with the base material 2). As a result, the metallic luster of the conductor lines L1 and L2 can be suppressed, so that the invisibility of the first and second electrode cells 30 and 40 can be improved. In addition, when forming a metal thin film on the one surface T of the base material 2, a metal having a low light reflectance is deposited on the front surface or the back surface of the metal thin film (boundary surface with the base material 2). On the other hand, the surface T or the surface of the metal thin film may be changed to a low reflection color such as black.

  Further, after forming the conductor wires L1 and L2, the surface of the conductor wires L1 and L2 is immersed in a chemical solution such as sulfuric acid or a sodium hydroxide aqueous solution to change the color to a low reflection color such as black, thereby performing blackening treatment. be able to. In addition, the blackening treatment can also be performed by depositing an oxide having a low light reflectance such as copper oxide on the conductor lines L1 and L2 by plating or the like.

  As a method for forming the conductor lines L1 and L2, photolithography other than the above may be used. For example, the conductor lines L1 and L2 can be formed also by photolithography using conductive ink having photosensitivity such as silver ink. In addition, the method is not limited to the photolithography method, and a conductive ink containing ultrafine conductive particles such as silver, gold, platinum, palladium, copper, and carbon, or a transparent conductive resin such as PEDOT / PSS is used as a base material. The conductor lines L1 and L2 can also be formed on the substrate 2 by printing in a fine line pattern using a known printing method such as screen printing, gravure printing, and ink jet printing.

  A linear wiring 5 is connected to each first electrode cell 30 and each second electrode cell 40. Each wiring 5 is drawn out so as to extend from each first electrode cell 30 or each second electrode cell 40 to the peripheral region C of the substrate 2 without crossing each other. In the present embodiment, each first electrode cell 30 and each second electrode cell 40 adjacent to the peripheral region C (that is, each first electrode disposed at both ends of each strip-shaped first electrode 3 and each second electrode 4). The wiring 5 connected to the cell 30 and each second electrode cell 40) is arranged outside the sensor region R and extends in the peripheral region C as it is. On the other hand, the wiring 5 connected to each of the other first electrode cells 30 and each of the second electrode cells 40 extends through the gaps S1 and S2 between the first electrode cell 30 and the second electrode cell 40 and has a peripheral region C. Has been pulled out. For example, in FIG. 1 and FIG. 3, each wiring 5 is a gap extending in the U direction among the gaps S <b> 1 and S <b> 2 adjacent above the electrode cells 30 and 40 from the upper end of each electrode cell 30 and 40. It is pulled out to S1, and this gap S1 extends linearly to the peripheral region C. In addition, when the wiring 5 extends in a straight line through the gap S1, the conductor lines L1 and L2 of the first electrode cell 30 and the second electrode cell 40 do not come into contact with the electrode cells 30 and 40. Among them, it extends in parallel with the conductor line L1 extending in the U direction, and extends in parallel with a distance from each other so as not to intersect the wiring 5 drawn from the other electrode cells 30 and 40. . The term “parallel” includes not only perfect parallelism but also a state slightly inclined from parallelism. The line width of the wiring 5 is, for example, about 1 μm to 30 μm, and preferably about 1 μm to 15 μm. The pitch of the wiring 5 is, for example, about 50 μm to 500 ** μm. Moreover, the thickness of the wiring 5 is about 0.1 μm to 10 μm, for example.

  In FIG. 1 and FIG. 3, each wiring 5 extends from each electrode cell 30, 40 through the gap S <b> 1 obliquely upward to the left and is drawn to the peripheral region C, but the gap S <b> 1 is directed obliquely downward to the right. The conductor line L1 extending in parallel with the conductor line L1 in the U direction may be drawn without intersecting the peripheral region C, and the gap S2 extending in the V direction may be directed diagonally downward left or upward diagonally to the left. The conductor line L2 may extend in parallel to the peripheral region C and may be drawn without intersecting the peripheral region C. Further, each wiring 5 does not need to have a straight line extending in one direction, and does not cross each other and does not come into contact with each electrode cell 30, 40. The region C may be drawn out. That is, the method of drawing out each wiring 5 to the peripheral region C is not particularly limited as long as the wirings 5 do not intersect with each other and do not come into contact with the electrode cells 30 and 40. The method can be adopted.

  Each wiring 5 drawn out to the peripheral area C is electrically coupled to another predetermined wiring 5 by a connector 7 such as a flexible printed board. Specifically, with respect to the first electrodes 3 in a plurality of columns, the plurality of first electrode cells 30 constituting the first electrode 3 for each column have the same potential, and the second electrodes 4 in the plurality of columns. For each of the columns, the wirings 5 and the same column drawn from all the first electrode cells 30 in the same column are arranged so that the plurality of second electrode cells 40 constituting the second electrode 4 have the same potential for each column. Wirings 5 drawn from all the second electrode cells 30 are electrically connected by the connector 7 in the peripheral region C. For example, as shown in FIGS. 1 and 3, the first electrodes 3 arranged in a row in the Y direction are arranged in the α column, the β column, the γ column, and the δ column in order from the left side, and the columns in the X direction. The second electrodes 4 arranged in this manner are designated as a column, b column, c column, d column, and e column in order from the upper side. In this case, among the wirings 5 drawn out to the peripheral region C of the base material 2, the wirings 5 from the first electrode cells 30 constituting the first electrode 3 in the α row (described as α at the tip), β rows Wiring 5 from the first electrode cell 30 constituting the first electrode 3 (described as β at the tip), and wiring 5 from the first electrode cell 30 constituting the first electrode 3 in the γ row (γ at the tip) And the wiring 5 (described as δ at the tip) from the first electrode cells 30 constituting the first electrode 3 in the δ row are coupled by the connector 7, respectively. Further, the wirings 5 from the second electrode cells 40 constituting the second electrodes 4 in the a row (described as “a” at the tip), and the wirings 5 from the second electrode cells 40 constituting the second electrodes 4 in the b row ( The second electrode cells constituting the second electrodes 4 in the d rows and the wirings 5 (denoted by c in the tip) between the second electrode cells 40 constituting the second electrodes 4 in the c row and the second electrodes 4 in the c rows. The connectors 5 connect the wires 5 (denoted at the tip) 40 from the wires 40 and the wires 5 (written at the tip) of the second electrode cells 40 constituting the second electrode 4 in the e row, respectively. Then, the coupling wiring electrically coupled by the connector 7 is connected to a capacitance detection circuit (not shown), whereby the first electrode 3 in each column, the second electrode 4 in each column, and the capacitance detection circuit. (Not shown) are electrically connected. In the illustrated example, the first electrode 3 has four rows and the second electrode 4 has five rows, but it goes without saying that the number of each of the electrodes 3 and 4 may be larger than this.

  Each wiring 5 may be formed on the one surface T of the base material 2 together with the conductor lines L1 and L2 by the above method. After the conductor lines L1 and L2 are formed, the conductive ink is used for screen printing, for example. You may form by printing on the one surface T of the base material 2 in the shape of a fine line using a well-known printing method. However, if each wiring 5 is collectively formed on the one surface T of the base material 2 with the same material as the conductor lines L1 and L2, it can be efficiently formed.

  In the touch panel 1 configured as described above, the touch position detection method is the same as that of a conventional capacitive touch panel, and the voltage based on the capacitance of the human body at the contact position of the first electrode cell 30 and the second electrode cell 40. The coordinates of the contact position are calculated by detecting changes such as.

  In the touch panel 1 according to the present embodiment, since the mesh-like electrodes 3 and 4 are formed by intersecting a plurality of conductor lines L1 and L2, use of indium which is a rare metal can be avoided, and ITO Since the resistance of the electrode pattern formed on the substrate 2 can be reduced and the visibility of the electrode pattern can be improved as compared with the use of the electrode, it can be suitably used as a capacitive touch panel. Can do. In addition, since both the first electrode 3 and the second electrode 4 are formed on the one surface T of the substrate 2, the structure of the touch panel 1 is simplified and the overall thickness and weight are reduced (thinning / (Weight reduction) can be realized.

  In addition, the wirings 5 connected to the electrode cells 30 and 40 are led out toward the peripheral region C of the base material 2 without intersecting each other, and predetermined capacitances 5 are coupled to each other to detect a capacitance. The sensor region R of the substrate 2 has a simple structure and can be formed directly on the substrate 2 using a single photolithography or other printing method. Thus, the number of steps for manufacturing the touch panel can be reduced and the manufacturing process is simplified, so that the touch panel 1 can be efficiently manufactured and the manufacturing cost can be reduced.

  As mentioned above, although one Embodiment of this invention was described, the specific aspect of this invention is not limited to the said embodiment. For example, as shown in FIGS. 4 and 5, the wiring 5 is provided between the adjacent first electrode cell 30 and the second electrode cell 40 in the sensor region R on the one surface T of the substrate 2. A plurality of auxiliary lines 6 that are electrically independent from the electrode cells 30 and 40 may be provided in a non-existing region (gap S2 in the present embodiment). The plurality of auxiliary lines 6 extend in the same direction (U direction) as the wiring 5 (and the conductor line L1) so as not to be connected to the conductor lines L1 and L2 and the wiring 5, and are spaced apart from each other. It is provided in parallel. The pitch between the auxiliary lines 6 is preferably equal to the pitch between the wirings 5. Thereby, since the gap between the first electrode cell 30 and the second electrode cell 40 is supplemented by the auxiliary line 6 and the wiring 5 can be made inconspicuous, the visibility of the touch panel 1 can be improved. The line width of the auxiliary line 6 is preferably the same as that of the wiring 5, but may be different, for example, about 1 μm to 30 μm, and preferably about 1 μm to 15 μm. Moreover, the thickness of the auxiliary line 6 is about 0.1 μm to 10 μm, for example. Of the gap between the adjacent first electrode cell 30 and the second electrode cell 40, the wiring 5 and the conductor lines L1 and L2 (each of the areas where the wiring 5 is provided (gap S1 in this embodiment) are also provided. One or a plurality of auxiliary lines 6 may be provided in parallel with the wiring 5 so as not to be connected to the electrode cells 30 and 40) (the same applies to FIG. 3). Thereby, in the sensor region R on the one surface T of the base material 2, the pattern of the wiring 5 can be made uniform by complementing the portion where the density of the wiring 5 is low with the auxiliary line 6. Further improvement can be achieved. Further, by providing the auxiliary line 6 together with the wiring 5, the pitch of the lines arranged in parallel by the wiring 5 and the auxiliary line 6 can be made the same as the pitch of the conductor line L1 (L2). Thereby, the visibility of the touch panel 1 can be further improved. In FIGS. 3 and 5, the auxiliary line 6 is shown thicker than the wiring 5, but this is because the auxiliary line 6 can be easily discriminated. The line widths are preferably the same.

  Further, as shown in FIGS. 6A to 6C, at least some of the wirings 5 may be provided with a plurality of first imitation wires 8 extending in a direction intersecting the wirings 5 (V direction). FIGS. 6B and 6C are enlarged views of the region A in FIG. 6A. Between the first dummy wire 8 and the two wires 5 sandwiching the first dummy wire 8 (two wires 5 adjacent to the wire 5 provided with the first dummy wire 8), both are not electrically connected. A gap is formed. In FIG. 6B and FIG. 6C, the gap is depicted with a larger size for the sake of explanation, but it is preferable to reduce the gap from the viewpoint of visibility. Each first dummy line 8 is arranged so that another first dummy line 8 is positioned on the same line (virtual line I), and this line (virtual line I) is a conductor line L2 (or L1). It is preferable that a plurality of them be arranged in parallel with a pitch equal to the pitch between them. For example, in FIG. 6B, the conductor lines L2 (in the length direction (U direction) of each wiring 5 with respect to every other wiring 5 out of a plurality of wirings 5 arranged in the V direction at intervals. Alternatively, a plurality of first imitation wires 8 are provided with a pitch equal to the pitch between L1). In FIG. 6B, a plurality of first imitation wires 8 are also provided for the auxiliary wires 6 extending in parallel with the wires 5 provided to complement the wires 5. In FIG. 6C, the pitch between the conductor lines L2 (or L1) in the length direction (U direction) of each wiring 5 with respect to all the wirings 5 arranged in the V direction at intervals. A plurality of first dummy wires 8 are provided with a pitch twice as large as that of the first dummy wires 8 so that the first dummy wires 8 are alternately arranged between adjacent wirings 5. Thereby, the several 1st imitation wire 8 is provided on the some virtual line I which has a pitch equal to the pitch of conductor line L2 (or L1). In FIG. 6C as well, a plurality of first imitation wires 8 are provided for the auxiliary wires 6 extending in parallel with the wires 5 provided to complement the wires 5.

  In this way, by arranging the first dummy wire 8 so as to intersect the predetermined wiring 5 (and auxiliary line 6), the wiring 5 (and auxiliary line 6) and each first dummy line 8 are approximately A mesh pattern is formed. That is, a substantially mesh pattern having a shape close to the mesh pattern of the surrounding first electrode cell 30 and second electrode cell 40 is formed in the gap between the first electrode cell 30 and the second electrode cell 40. If a substantially mesh pattern is formed in the gap between the first electrode cell 30 and the second electrode cell 40, the mesh pattern of the first electrode cell 30 and the second electrode cell 40 can be made inconspicuous. The visibility of the touch panel 1 can be improved. In addition, the method of providing the first imitation wire 8 with respect to the wiring 5 is not limited to the method of FIG. 6B or FIG. 6C, and the wirings 5 arranged at intervals are electrically connected. Otherwise, various methods can be employed. The line width of the first imitation line 8 is preferably the same as that of the wiring 5 and the auxiliary line 6, but may be different, for example, about 1 μm to 30 μm, and preferably about 1 μm to 15 μm. Moreover, the thickness of the 1st imitation wire 8 is about 0.1 micrometer-10 micrometers, for example.

  Furthermore, a plurality of second imitation lines 9 extending in the direction intersecting with the auxiliary line 6 (V direction) may be provided for the auxiliary line 6. The length of the second imitation wire 9 is not limited as long as the second imitation wire 9 is not electrically connected to the wiring 5 and the conductor wires L1 and L2. For example, the first dummy wire 8 has a predetermined length (a length that is between the two auxiliary wires 6 adjacent to the auxiliary wire 6 provided with the second dummy wire 9), and the first dummy wire 8. The line 8 may be provided on each auxiliary line 6 by a method similar to that provided on each wiring 5 (for example, FIG. 6B and FIG. 6C). That is, by arranging a plurality of second imitation wires 9 so as to be provided on a plurality of virtual lines I having a pitch equal to the pitch between the conductor lines L2 (or L1) and intersecting with the predetermined auxiliary line 6 A substantially mesh pattern is formed by the auxiliary lines 6 and the second dummy lines 9. Further, the length of the second dummy wire 9 is set to a length that intersects with all the auxiliary lines 6, and the plurality of second dummy lines 9 are arranged in the length direction of each auxiliary line 6 with the pitch between the conductor lines L2 (or L1). They may be provided so as to be parallel to each other with an equal pitch. In this case, a mesh pattern is formed by the auxiliary lines 6 and the second dummy lines 9. In this way, in the gap between the first electrode cell 30 and the second electrode cell 40, a substantially mesh pattern or mesh pattern having a shape close to the mesh pattern of the surrounding first electrode cell 30 and second electrode cell 40. Since the mesh pattern of the first electrode cell 30 and the second electrode cell 40 can be made inconspicuous, the visibility of the touch panel 1 can be further improved. The line width of the second imitation line 9 is preferably the same as that of the wiring 5 and the auxiliary line 6, but may be different, for example, about 1 μm to 30 μm, and preferably about 1 μm to 15 μm. Moreover, the thickness of the 2nd imitation wire 9 is about 0.1 micrometer-10 micrometers, for example.

  Each auxiliary line 6, each first dummy line 8 and second dummy line 9 may be formed on one surface T of the base material 2 together with the conductor lines L1 and L2 by the above method. After forming L2, the conductive ink may be formed in a thin line shape on one surface T of the substrate 2 using a known printing method such as screen printing. However, if each wiring 5 is collectively formed on the one surface T of the base material 2 with the same material as the conductor lines L1 and L2, it can be efficiently formed.

  In each of the embodiments described above, the conductor lines L1 and L2, the wiring 5, the auxiliary line 6, and the dummy lines 8 and 9 are straight straight lines. Various shapes such as a sawtooth shape can be used. Moreover, in the said embodiment, although the auxiliary line 6 and the imitation line | wires 8 and 9 are provided, it does not necessarily need to provide.

  In the above embodiment, the conductor lines L1, L2 are connected to the plurality of conductor lines L1, L2 constituting the electrode cells 30, 40 within a range that does not impair the conductivity between both ends of the electrodes 3, 4. You may provide the cutting part which cut | disconnects L2 partially. Between the conductor lines L1, L2 and the wiring 5, between the conductor lines L1, L2 and the auxiliary line 6, and between the wiring 5, the auxiliary line 6, the first imitation line 8, and the second imitation line 9. Since a gap is formed in each of the electrode cells 30 and 40, an intermittent portion (blank portion) in which a line is uniformly interrupted with respect to the entire electrode pattern is generated. Therefore, the light transmittance is improved and the appearance of the electrode pattern can be made more uniform, so that the visibility can be further improved. Such a cut portion may be formed at an intersection of the plurality of conductor lines L1 and L2 forming the mesh-like electrodes 30 and 40, or may be formed at a location different from the intersection. .

DESCRIPTION OF SYMBOLS 1 Touch panel 2 Base material 3 1st electrode 4 2nd electrode 5 Wiring 6 Auxiliary line 8 1st imitation line 9 2nd imitation line 30 1st electrode cell 40 2nd electrode cell R Sensor area C Peripheral area L1, L2 Conductor line

Claims (9)

In a second direction intersecting the first direction on the one surface side of the base material, a plurality of rows of first electrodes arranged at intervals in the first direction on the one surface side of the base material, A plurality of rows of second electrodes arranged at intervals, and a touch panel attached to the front surface of the display device,
The base material has a sensor region in which the first electrode and the second electrode are arranged, and a peripheral region provided around the sensor region,
The first electrode has a plurality of first electrode cells formed by intersecting a plurality of conductor lines and arranged at intervals in the second direction,
The second electrode has a plurality of second electrode cells that are formed by intersecting a plurality of conductor lines and arranged at intervals in the first direction,
A wiring is connected to the first electrode cell and the second electrode cell,
The wirings are drawn toward the peripheral region without crossing each other, and the wirings drawn from the first electrode cells in the same row and the wirings drawn from the second electrode cells in the same row are electrically coupled to each other. Touch panel.   The touch panel according to claim 1, wherein at least a portion of the wiring extending between the first electrode cell and the second electrode cell is parallel to a part of the conductor line.   The auxiliary line that is not connected to the conductor line and the wiring is provided between the first electrode cell and the second electrode cell, and the auxiliary line is parallel to the wiring. The touch panel described.   4. The first dummy wire that intersects with the wiring and is not connected to the wiring and the conductor wire adjacent to the wiring is provided in at least a part of the wiring. Touch panel. At least a portion of said auxiliary line intersects with the auxiliary line, in claim 4 wherein the wiring and the conductor lines to cite claim 3 or claim 3 second imitation line not connected is provided The touch panel described. 6. The method according to claim 5 , wherein at least one of the first dummy wire and the second dummy wire is arranged so as to be positioned on a plurality of lines having a pitch equal to a pitch between the conductor wires. Touch panel.   The touch panel according to claim 1, wherein a direction of the conductor line is an oblique direction with respect to a black matrix of the display device.   The touch panel according to claim 1, wherein each of the first electrode and the second electrode includes a cutting portion that cuts the conductor wire within a range that does not impair conductivity between both end portions.   The touch panel according to claim 1, which is a mutual capacitance detection type capacitive touch panel.