JP6170160B2 - Cmc製部品の製造方法 - Google Patents
Cmc製部品の製造方法 Download PDFInfo
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- JP6170160B2 JP6170160B2 JP2015533659A JP2015533659A JP6170160B2 JP 6170160 B2 JP6170160 B2 JP 6170160B2 JP 2015533659 A JP2015533659 A JP 2015533659A JP 2015533659 A JP2015533659 A JP 2015533659A JP 6170160 B2 JP6170160 B2 JP 6170160B2
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- preform
- intermediate phase
- motomeko
- boron nitride
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- 238000004519 manufacturing process Methods 0.000 title description 10
- 238000000034 method Methods 0.000 claims description 49
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 claims description 48
- 229910052582 BN Inorganic materials 0.000 claims description 47
- 239000000835 fiber Substances 0.000 claims description 32
- 239000011159 matrix material Substances 0.000 claims description 27
- 238000010438 heat treatment Methods 0.000 claims description 25
- 239000000919 ceramic Substances 0.000 claims description 20
- 238000000151 deposition Methods 0.000 claims description 20
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 claims description 19
- 229910010271 silicon carbide Inorganic materials 0.000 claims description 19
- 238000000280 densification Methods 0.000 claims description 15
- 230000008021 deposition Effects 0.000 claims description 15
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims description 14
- 239000012495 reaction gas Substances 0.000 claims description 14
- 238000005470 impregnation Methods 0.000 claims description 13
- 239000000126 substance Substances 0.000 claims description 13
- 239000000203 mixture Substances 0.000 claims description 10
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 9
- 239000001301 oxygen Substances 0.000 claims description 9
- 229910052760 oxygen Inorganic materials 0.000 claims description 9
- 230000001590 oxidative effect Effects 0.000 claims description 8
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 7
- 229910021529 ammonia Inorganic materials 0.000 claims description 7
- 239000001257 hydrogen Substances 0.000 claims description 7
- 229910052739 hydrogen Inorganic materials 0.000 claims description 7
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims description 7
- 229910052710 silicon Inorganic materials 0.000 claims description 7
- 239000010703 silicon Substances 0.000 claims description 7
- WTEOIRVLGSZEPR-UHFFFAOYSA-N boron trifluoride Chemical compound FB(F)F WTEOIRVLGSZEPR-UHFFFAOYSA-N 0.000 claims description 6
- 229910052799 carbon Inorganic materials 0.000 claims description 6
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 5
- 239000012700 ceramic precursor Substances 0.000 claims description 5
- 239000000843 powder Substances 0.000 claims description 5
- 229920000642 polymer Polymers 0.000 claims description 4
- FAQYAMRNWDIXMY-UHFFFAOYSA-N trichloroborane Chemical compound ClB(Cl)Cl FAQYAMRNWDIXMY-UHFFFAOYSA-N 0.000 claims description 4
- 229910015900 BF3 Inorganic materials 0.000 claims description 3
- 239000002131 composite material Substances 0.000 claims description 3
- 239000002184 metal Substances 0.000 claims description 3
- 238000001354 calcination Methods 0.000 claims 1
- 230000000087 stabilizing effect Effects 0.000 claims 1
- 239000010410 layer Substances 0.000 description 11
- 239000011248 coating agent Substances 0.000 description 7
- 238000000576 coating method Methods 0.000 description 7
- 239000007789 gas Substances 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 238000005229 chemical vapour deposition Methods 0.000 description 4
- 238000010304 firing Methods 0.000 description 4
- 238000009941 weaving Methods 0.000 description 4
- 230000001427 coherent effect Effects 0.000 description 3
- 230000003647 oxidation Effects 0.000 description 3
- 238000007254 oxidation reaction Methods 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 230000005489 elastic deformation Effects 0.000 description 2
- 230000010354 integration Effects 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 230000002787 reinforcement Effects 0.000 description 2
- 238000007582 slurry-cast process Methods 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 238000007872 degassing Methods 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 230000008595 infiltration Effects 0.000 description 1
- 238000001764 infiltration Methods 0.000 description 1
- 230000016507 interphase Effects 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 150000003961 organosilicon compounds Chemical class 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 229920003257 polycarbosilane Polymers 0.000 description 1
- 229920001709 polysilazane Polymers 0.000 description 1
- -1 polysiloxane Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 239000004753 textile Substances 0.000 description 1
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Description
1原子%未満の酸素を含む炭化ケイ素繊維から繊維性プレフォームを製造すること;
化学気相含浸法によってそのプレフォームの繊維の表面に窒化ホウ素中間相を0.3μm/時未満の堆積速度で堆積させること;
その中間相を堆積させた後、その中間相をあらかじめ酸化雰囲気に曝露することなく、マトリックス層をその中間相の上に堆積させる前に、1300℃よりも高く、かつその後マトリックスによるプレフォームの高密化が完了するまでに遭遇する最高温度以上の温度で熱処理を実施してその中間相の窒化ホウ素を安定化させること;
次いで、少なくとも大半がセラミックでできたマトリックスによってプレフォームを高密化すること
を含む方法によって達成される。
・化学気相含浸法によって、および/または
・プレフォームにセラミック前駆ポリマーを含浸させて焼成することによって、および/または
・炭素および/またはセラミックの粉末をプレフォームの内部に導入し、融解状態のケイ素系金属を浸透させることによって
実現することができる。
CVI法により、マトリックスを、単層として、または複数の積層された層として形成する。
液体法、すなわちポリマー含浸焼成(PIP)により、少なくとも1種類のセラミック前駆体を含む液体組成物を含浸させて焼成するサイクルを複数回実施してマトリックスを形成する。
1種類以上の炭素粉末またはセラミック粉末(例えばSiCまたはSi3N4)を含む泥漿を含浸させ(すなわち泥漿鋳込み(SC)法)、次いで乾燥させ、溶融ケイ素、または大半がケイ素である溶融合金を含浸させること(すなわち溶融含浸(MI)法)によってセラミック製マトリックスを形成する。
[1]
少なくとも大半がセラミックでできたマトリックスを有する複合材料からなる部品を製造する方法であって、
1原子%未満の酸素を含む炭化ケイ素繊維から繊維性プレフォームを製造すること、
化学気相含浸法によってそのプレフォームの繊維の表面に窒化ホウ素中間相を0.3μm/時未満の堆積速度で堆積させること
その中間相を堆積させた後、その中間相をあらかじめ酸化雰囲気に曝露することなく、マトリックス層をその中間相の上に堆積させる前に、1300℃よりも高く、かつその後マトリックスによるプレフォームの高密化が完了するまでに遭遇する最高温度以上の温度で熱処理を実施してその中間相の窒化ホウ素を安定化させること、
次いで、少なくとも大半がセラミックでできたマトリックスによってプレフォームを高密化すること
を含む方法。
[2]
前記窒化ホウ素中間相を0.1μm/時未満の堆積速度で堆積させることを特徴とする項目1に記載の方法。
[3]
前記窒化ホウ素中間相を、三塩化ホウ素BCl 3 とアンモニアNH 3 と気体水素H 2 を含む反応ガス混合物から、800℃未満の温度にて5kPa未満の圧力で堆積させることを特徴とする項目1または2に記載の方法。
[4]
前記窒化ホウ素中間相を、三フッ化ホウ素BF 3 とアンモニアNH 3 と気体水素H 2 を含む反応ガス混合物から、1050℃未満の温度にて20kPa未満の圧力で堆積させることを特徴とする項目1または2に記載の方法。
[5]
前記熱処理の時間が0.25時間〜4時間の範囲であることを特徴とする項目1〜4のいずれかに記載の方法。
[6]
前記熱処理の時間が0.5時間〜2時間の範囲であることを特徴とする項目1〜4のいずれかに記載の方法。
[7]
コンフォメータに保持されたプレフォームを用いて前記窒化ホウ素中間相を形成し、熱処理の後、化学気相含浸によってその中間相の上に少なくとも1つのセラミック層を堆積させて前記コンフォメータに保持されたプレフォームを一体化し、その一体化したプレフォームを前記コンフォメータから取り出した後にそのプレフォームの高密化を実施することを特徴とする項目1〜6のいずれかに記載の方法。
[8]
前記プレフォームの高密化の少なくとも一部を化学気相含浸法によって実現することを特徴とする項目1〜7のいずれかに記載の方法。
[9]
前記プレフォームの高密化の少なくとも一部を、少なくとも1種類のセラミック前駆ポリマーを含浸させて焼成することにより実現することを特徴とする項目1〜8のいずれかに記載の方法。
[10]
前記プレフォームの高密化の少なくとも一部を、炭素および/またはセラミックの粉末をそのプレフォームの中に導入し、溶融状態のケイ素系金属を含浸させることによって実現することを特徴とする項目1〜9のいずれかに記載の方法。
Claims (10)
- 少なくとも大半がセラミックでできたマトリックスを有する複合材料からなる部品を製造する方法であって、
1原子%未満の酸素を含む炭化ケイ素繊維から繊維性プレフォームを製造すること、
化学気相含浸法によってそのプレフォームの繊維の表面に窒化ホウ素中間相を0.3μm/時未満の堆積速度で堆積させること
その中間相を堆積させた後、その中間相をあらかじめ酸化雰囲気に曝露することなく、マトリックス層をその中間相の上に堆積させる前に、1300℃よりも高く、かつその後マトリックスによるプレフォームの高密化が完了するまでに遭遇する最高温度以上の温度で熱処理を実施してその中間相の窒化ホウ素を安定化させること、
次いで、少なくとも大半がセラミックでできたマトリックスによってプレフォームを高密化すること
を含む方法。 - 前記窒化ホウ素中間相を0.1μm/時未満の堆積速度で堆積させる、請求項1に記載の方法。
- 前記窒化ホウ素中間相を、三塩化ホウ素BCl3とアンモニアNH3と気体水素H2を含む反応ガス混合物から、800℃未満の温度にて5kPa未満の圧力で堆積させる、請求項1に記載の方法。
- 前記窒化ホウ素中間相を、三フッ化ホウ素BF3とアンモニアNH3と気体水素H2を含む反応ガス混合物から、1050℃未満の温度にて20kPa未満の圧力で堆積させる、請求項1に記載の方法。
- 前記熱処理の時間が0.25時間〜4時間の範囲である、請求項1に記載の方法。
- 前記熱処理の時間が0.5時間〜2時間の範囲である、請求項1に記載の方法。
- コンフォメータに保持されたプレフォームを用いて前記窒化ホウ素中間相を形成し、熱処理の後、化学気相含浸によってその中間相の上に少なくとも1つのセラミック層を堆積させて前記コンフォメータに保持されたプレフォームを一体化し、その一体化したプレフォームを前記コンフォメータから取り出した後にそのプレフォームの高密化を実施する、請求項1に記載の方法。
- 前記プレフォームの高密化の少なくとも一部を化学気相含浸法によって実現する、請求項1に記載の方法。
- 前記プレフォームの高密化の少なくとも一部を、少なくとも1種類のセラミック前駆ポリマーを含浸させて焼成することにより実現する、請求項1に記載の方法。
- 前記プレフォームの高密化の少なくとも一部を、炭素および/またはセラミックの粉末をそのプレフォームの中に導入し、溶融状態のケイ素系金属を含浸させることによって実現する、請求項1に記載の方法。
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FR1259139 | 2012-09-27 | ||
PCT/FR2013/052110 WO2014049221A1 (fr) | 2012-09-27 | 2013-09-13 | Procede de fabrication d'une piece en cmc |
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US10745803B2 (en) * | 2017-06-15 | 2020-08-18 | Rolls-Royce High Temperature Composites Inc. | Method of forming a moisture-tolerant coating on a silicon carbide fiber |
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CN109665855B (zh) * | 2019-01-23 | 2021-10-08 | 中南大学 | 一种碳/碳-氮化硼减摩复合材料的制备方法 |
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US20150251959A1 (en) | 2015-09-10 |
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