JP5905658B2 - Functional coating - Google Patents
Functional coating Download PDFInfo
- Publication number
- JP5905658B2 JP5905658B2 JP2009269170A JP2009269170A JP5905658B2 JP 5905658 B2 JP5905658 B2 JP 5905658B2 JP 2009269170 A JP2009269170 A JP 2009269170A JP 2009269170 A JP2009269170 A JP 2009269170A JP 5905658 B2 JP5905658 B2 JP 5905658B2
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- Japan
- Prior art keywords
- group
- component
- coating film
- carbon atoms
- polymerization
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 238000000576 coating method Methods 0.000 title claims description 96
- 239000011248 coating agent Substances 0.000 title claims description 95
- 239000002245 particle Substances 0.000 claims description 65
- 238000006116 polymerization reaction Methods 0.000 claims description 53
- 125000004432 carbon atom Chemical group C* 0.000 claims description 46
- 229920002554 vinyl polymer Polymers 0.000 claims description 39
- 239000000178 monomer Substances 0.000 claims description 38
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims description 38
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 36
- 238000000034 method Methods 0.000 claims description 32
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 29
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 23
- 239000000839 emulsion Substances 0.000 claims description 22
- 150000003377 silicon compounds Chemical class 0.000 claims description 21
- 239000011550 stock solution Substances 0.000 claims description 16
- 239000003995 emulsifying agent Substances 0.000 claims description 15
- 229920000642 polymer Polymers 0.000 claims description 15
- 239000011148 porous material Substances 0.000 claims description 13
- 125000000217 alkyl group Chemical group 0.000 claims description 12
- 239000002131 composite material Substances 0.000 claims description 12
- 229910044991 metal oxide Inorganic materials 0.000 claims description 12
- 150000004706 metal oxides Chemical class 0.000 claims description 12
- 125000003368 amide group Chemical group 0.000 claims description 10
- 125000003277 amino group Chemical group 0.000 claims description 10
- 125000001033 ether group Chemical group 0.000 claims description 10
- 239000006087 Silane Coupling Agent Substances 0.000 claims description 9
- 239000008119 colloidal silica Substances 0.000 claims description 9
- 125000005843 halogen group Chemical group 0.000 claims description 9
- 125000003545 alkoxy group Chemical group 0.000 claims description 8
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 8
- 125000000524 functional group Chemical group 0.000 claims description 8
- 230000000379 polymerizing effect Effects 0.000 claims description 7
- 125000003118 aryl group Chemical group 0.000 claims description 5
- 229910052799 carbon Inorganic materials 0.000 claims description 4
- 125000000753 cycloalkyl group Chemical group 0.000 claims description 4
- 125000003544 oxime group Chemical group 0.000 claims description 4
- 230000001681 protective effect Effects 0.000 claims description 4
- 238000003980 solgel method Methods 0.000 claims description 4
- 125000003668 acetyloxy group Chemical group [H]C([H])([H])C(=O)O[*] 0.000 claims description 3
- 125000002344 aminooxy group Chemical group [H]N([H])O[*] 0.000 claims description 3
- 125000001183 hydrocarbyl group Chemical group 0.000 claims 1
- -1 BiVO 4 Inorganic materials 0.000 description 52
- 239000006185 dispersion Substances 0.000 description 27
- 239000008199 coating composition Substances 0.000 description 18
- 239000000126 substance Substances 0.000 description 17
- 239000000203 mixture Substances 0.000 description 15
- 150000001875 compounds Chemical class 0.000 description 14
- 239000010410 layer Substances 0.000 description 14
- 239000000758 substrate Substances 0.000 description 14
- 238000002834 transmittance Methods 0.000 description 14
- 238000006243 chemical reaction Methods 0.000 description 13
- 239000000047 product Substances 0.000 description 13
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 12
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 11
- 230000003373 anti-fouling effect Effects 0.000 description 11
- 239000002253 acid Substances 0.000 description 10
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 9
- 239000011521 glass Substances 0.000 description 9
- 239000001257 hydrogen Substances 0.000 description 9
- 229910052739 hydrogen Inorganic materials 0.000 description 9
- 239000000463 material Substances 0.000 description 9
- 239000002685 polymerization catalyst Substances 0.000 description 9
- 239000007787 solid Substances 0.000 description 9
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 8
- 239000006096 absorbing agent Substances 0.000 description 8
- 239000007864 aqueous solution Substances 0.000 description 8
- 239000003795 chemical substances by application Substances 0.000 description 8
- 230000002378 acidificating effect Effects 0.000 description 7
- 150000003863 ammonium salts Chemical class 0.000 description 7
- 230000007423 decrease Effects 0.000 description 7
- 238000007720 emulsion polymerization reaction Methods 0.000 description 7
- 238000002156 mixing Methods 0.000 description 7
- 150000003254 radicals Chemical class 0.000 description 7
- 229920005989 resin Polymers 0.000 description 7
- 239000011347 resin Substances 0.000 description 7
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 6
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 6
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 6
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 6
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 6
- 239000002585 base Substances 0.000 description 6
- 239000004611 light stabiliser Substances 0.000 description 6
- 229910000077 silane Inorganic materials 0.000 description 6
- 239000000377 silicon dioxide Substances 0.000 description 6
- 239000000344 soap Substances 0.000 description 6
- 125000001424 substituent group Chemical group 0.000 description 6
- 125000000542 sulfonic acid group Chemical group 0.000 description 6
- ZNOCGWVLWPVKAO-UHFFFAOYSA-N trimethoxy(phenyl)silane Chemical compound CO[Si](OC)(OC)C1=CC=CC=C1 ZNOCGWVLWPVKAO-UHFFFAOYSA-N 0.000 description 6
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 6
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 5
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- XAEFZNCEHLXOMS-UHFFFAOYSA-M potassium benzoate Chemical compound [K+].[O-]C(=O)C1=CC=CC=C1 XAEFZNCEHLXOMS-UHFFFAOYSA-M 0.000 description 5
- 159000000000 sodium salts Chemical class 0.000 description 5
- 239000003381 stabilizer Substances 0.000 description 5
- 125000001302 tertiary amino group Chemical group 0.000 description 5
- 125000003396 thiol group Chemical group [H]S* 0.000 description 5
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 5
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 4
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 4
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 4
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 4
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 4
- 238000010521 absorption reaction Methods 0.000 description 4
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 4
- ROOXNKNUYICQNP-UHFFFAOYSA-N ammonium peroxydisulfate Substances [NH4+].[NH4+].[O-]S(=O)(=O)OOS([O-])(=O)=O ROOXNKNUYICQNP-UHFFFAOYSA-N 0.000 description 4
- VAZSKTXWXKYQJF-UHFFFAOYSA-N ammonium persulfate Chemical compound [NH4+].[NH4+].[O-]S(=O)OOS([O-])=O VAZSKTXWXKYQJF-UHFFFAOYSA-N 0.000 description 4
- 229910001870 ammonium persulfate Inorganic materials 0.000 description 4
- 150000001735 carboxylic acids Chemical class 0.000 description 4
- 125000003700 epoxy group Chemical group 0.000 description 4
- 238000009472 formulation Methods 0.000 description 4
- 230000007062 hydrolysis Effects 0.000 description 4
- 238000006460 hydrolysis reaction Methods 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- WHIVNJATOVLWBW-UHFFFAOYSA-N n-butan-2-ylidenehydroxylamine Chemical compound CCC(C)=NO WHIVNJATOVLWBW-UHFFFAOYSA-N 0.000 description 4
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 4
- 238000010248 power generation Methods 0.000 description 4
- 150000003839 salts Chemical class 0.000 description 4
- 229920006395 saturated elastomer Polymers 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- 238000003756 stirring Methods 0.000 description 4
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 4
- VAZCHDZAXOUQBU-HWKANZROSA-N (e)-2-ethylbut-2-enamide Chemical compound CC\C(=C/C)C(N)=O VAZCHDZAXOUQBU-HWKANZROSA-N 0.000 description 3
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- DCQBZYNUSLHVJC-UHFFFAOYSA-N 3-triethoxysilylpropane-1-thiol Chemical compound CCO[Si](OCC)(OCC)CCCS DCQBZYNUSLHVJC-UHFFFAOYSA-N 0.000 description 3
- UUEWCQRISZBELL-UHFFFAOYSA-N 3-trimethoxysilylpropane-1-thiol Chemical compound CO[Si](OC)(OC)CCCS UUEWCQRISZBELL-UHFFFAOYSA-N 0.000 description 3
- XDLMVUHYZWKMMD-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C(C)=C XDLMVUHYZWKMMD-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- 239000004925 Acrylic resin Substances 0.000 description 3
- 229920000178 Acrylic resin Polymers 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 3
- WMFOQBRAJBCJND-UHFFFAOYSA-M Lithium hydroxide Chemical compound [Li+].[OH-] WMFOQBRAJBCJND-UHFFFAOYSA-M 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical class C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 description 3
- 125000005011 alkyl ether group Chemical group 0.000 description 3
- 150000001412 amines Chemical class 0.000 description 3
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 3
- 239000003638 chemical reducing agent Substances 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 239000007859 condensation product Substances 0.000 description 3
- 239000012792 core layer Substances 0.000 description 3
- 235000014113 dietary fatty acids Nutrition 0.000 description 3
- IJKVHSBPTUYDLN-UHFFFAOYSA-N dihydroxy(oxo)silane Chemical compound O[Si](O)=O IJKVHSBPTUYDLN-UHFFFAOYSA-N 0.000 description 3
- JJQZDUKDJDQPMQ-UHFFFAOYSA-N dimethoxy(dimethyl)silane Chemical compound CO[Si](C)(C)OC JJQZDUKDJDQPMQ-UHFFFAOYSA-N 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 239000000194 fatty acid Substances 0.000 description 3
- 229930195729 fatty acid Natural products 0.000 description 3
- 230000009477 glass transition Effects 0.000 description 3
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 3
- 230000003993 interaction Effects 0.000 description 3
- 230000001699 photocatalysis Effects 0.000 description 3
- 239000011941 photocatalyst Substances 0.000 description 3
- 239000011164 primary particle Substances 0.000 description 3
- 239000011163 secondary particle Substances 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 235000012239 silicon dioxide Nutrition 0.000 description 3
- 125000001273 sulfonato group Chemical group [O-]S(*)(=O)=O 0.000 description 3
- UQMOLLPKNHFRAC-UHFFFAOYSA-N tetrabutyl silicate Chemical compound CCCCO[Si](OCCCC)(OCCCC)OCCCC UQMOLLPKNHFRAC-UHFFFAOYSA-N 0.000 description 3
- ZQZCOBSUOFHDEE-UHFFFAOYSA-N tetrapropyl silicate Chemical compound CCCO[Si](OCCC)(OCCC)OCCC ZQZCOBSUOFHDEE-UHFFFAOYSA-N 0.000 description 3
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 3
- 229910001887 tin oxide Inorganic materials 0.000 description 3
- JCVQKRGIASEUKR-UHFFFAOYSA-N triethoxy(phenyl)silane Chemical compound CCO[Si](OCC)(OCC)C1=CC=CC=C1 JCVQKRGIASEUKR-UHFFFAOYSA-N 0.000 description 3
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical compound C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 description 2
- WBIQQQGBSDOWNP-UHFFFAOYSA-N 2-dodecylbenzenesulfonic acid Chemical compound CCCCCCCCCCCCC1=CC=CC=C1S(O)(=O)=O WBIQQQGBSDOWNP-UHFFFAOYSA-N 0.000 description 2
- 125000000954 2-hydroxyethyl group Chemical group [H]C([*])([H])C([H])([H])O[H] 0.000 description 2
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 2
- OXYZDRAJMHGSMW-UHFFFAOYSA-N 3-chloropropyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)CCCCl OXYZDRAJMHGSMW-UHFFFAOYSA-N 0.000 description 2
- JMGZKPMMFXFSGK-UHFFFAOYSA-N 3-tri(propan-2-yloxy)silylpropyl prop-2-enoate Chemical compound CC(C)O[Si](OC(C)C)(OC(C)C)CCCOC(=O)C=C JMGZKPMMFXFSGK-UHFFFAOYSA-N 0.000 description 2
- XDQWJFXZTAWJST-UHFFFAOYSA-N 3-triethoxysilylpropyl prop-2-enoate Chemical compound CCO[Si](OCC)(OCC)CCCOC(=O)C=C XDQWJFXZTAWJST-UHFFFAOYSA-N 0.000 description 2
- SJECZPVISLOESU-UHFFFAOYSA-N 3-trimethoxysilylpropan-1-amine Chemical compound CO[Si](OC)(OC)CCCN SJECZPVISLOESU-UHFFFAOYSA-N 0.000 description 2
- YATIYDNBFHEOFA-UHFFFAOYSA-N 3-trimethoxysilylpropan-1-ol Chemical compound CO[Si](OC)(OC)CCCO YATIYDNBFHEOFA-UHFFFAOYSA-N 0.000 description 2
- HGEKXQRHZRDGKO-UHFFFAOYSA-N 3-tripropoxysilylpropyl prop-2-enoate Chemical compound CCCO[Si](OCCC)(OCCC)CCCOC(=O)C=C HGEKXQRHZRDGKO-UHFFFAOYSA-N 0.000 description 2
- HVCNXQOWACZAFN-UHFFFAOYSA-N 4-ethylmorpholine Chemical compound CCN1CCOCC1 HVCNXQOWACZAFN-UHFFFAOYSA-N 0.000 description 2
- CIWBSHSKHKDKBQ-JLAZNSOCSA-N Ascorbic acid Chemical compound OC[C@H](O)[C@H]1OC(=O)C(O)=C1O CIWBSHSKHKDKBQ-JLAZNSOCSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- CPELXLSAUQHCOX-UHFFFAOYSA-M Bromide Chemical compound [Br-] CPELXLSAUQHCOX-UHFFFAOYSA-M 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 2
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 2
- OKIZCWYLBDKLSU-UHFFFAOYSA-M N,N,N-Trimethylmethanaminium chloride Chemical compound [Cl-].C[N+](C)(C)C OKIZCWYLBDKLSU-UHFFFAOYSA-M 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- 239000004721 Polyphenylene oxide Substances 0.000 description 2
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 2
- WQDUMFSSJAZKTM-UHFFFAOYSA-N Sodium methoxide Chemical compound [Na+].[O-]C WQDUMFSSJAZKTM-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- 229910010413 TiO 2 Inorganic materials 0.000 description 2
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 description 2
- RMKZLFMHXZAGTM-UHFFFAOYSA-N [dimethoxy(propyl)silyl]oxymethyl prop-2-enoate Chemical compound CCC[Si](OC)(OC)OCOC(=O)C=C RMKZLFMHXZAGTM-UHFFFAOYSA-N 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 2
- 125000003647 acryloyl group Chemical group O=C([*])C([H])=C([H])[H] 0.000 description 2
- 238000007259 addition reaction Methods 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 230000000996 additive effect Effects 0.000 description 2
- 150000001298 alcohols Chemical class 0.000 description 2
- 229910052783 alkali metal Inorganic materials 0.000 description 2
- 150000004996 alkyl benzenes Chemical class 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 229910021529 ammonia Inorganic materials 0.000 description 2
- 229910000410 antimony oxide Inorganic materials 0.000 description 2
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical compound C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 description 2
- 239000012964 benzotriazole Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 229920001400 block copolymer Polymers 0.000 description 2
- 239000001569 carbon dioxide Substances 0.000 description 2
- 229910002092 carbon dioxide Inorganic materials 0.000 description 2
- 238000009833 condensation Methods 0.000 description 2
- 230000005494 condensation Effects 0.000 description 2
- 229920001577 copolymer Polymers 0.000 description 2
- 125000004122 cyclic group Chemical group 0.000 description 2
- MEWFSXFFGFDHGV-UHFFFAOYSA-N cyclohexyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C1CCCCC1 MEWFSXFFGFDHGV-UHFFFAOYSA-N 0.000 description 2
- 238000000354 decomposition reaction Methods 0.000 description 2
- 150000001991 dicarboxylic acids Chemical class 0.000 description 2
- YYLGKUPAFFKGRQ-UHFFFAOYSA-N dimethyldiethoxysilane Chemical compound CCO[Si](C)(C)OCC YYLGKUPAFFKGRQ-UHFFFAOYSA-N 0.000 description 2
- 238000003618 dip coating Methods 0.000 description 2
- USIUVYZYUHIAEV-UHFFFAOYSA-N diphenyl ether Chemical compound C=1C=CC=CC=1OC1=CC=CC=C1 USIUVYZYUHIAEV-UHFFFAOYSA-N 0.000 description 2
- 239000002612 dispersion medium Substances 0.000 description 2
- 229940060296 dodecylbenzenesulfonic acid Drugs 0.000 description 2
- 239000000975 dye Substances 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- FWDBOZPQNFPOLF-UHFFFAOYSA-N ethenyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)C=C FWDBOZPQNFPOLF-UHFFFAOYSA-N 0.000 description 2
- NKSJNEHGWDZZQF-UHFFFAOYSA-N ethenyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C=C NKSJNEHGWDZZQF-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- SBRXLTRZCJVAPH-UHFFFAOYSA-N ethyl(trimethoxy)silane Chemical compound CC[Si](OC)(OC)OC SBRXLTRZCJVAPH-UHFFFAOYSA-N 0.000 description 2
- 239000005357 flat glass Substances 0.000 description 2
- NKHAVTQWNUWKEO-UHFFFAOYSA-N fumaric acid monomethyl ester Natural products COC(=O)C=CC(O)=O NKHAVTQWNUWKEO-UHFFFAOYSA-N 0.000 description 2
- FFUAGWLWBBFQJT-UHFFFAOYSA-N hexamethyldisilazane Chemical compound C[Si](C)(C)N[Si](C)(C)C FFUAGWLWBBFQJT-UHFFFAOYSA-N 0.000 description 2
- 150000002430 hydrocarbons Chemical group 0.000 description 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 2
- 229910003437 indium oxide Inorganic materials 0.000 description 2
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 description 2
- 150000002596 lactones Chemical class 0.000 description 2
- 230000007774 longterm Effects 0.000 description 2
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- 229920002401 polyacrylamide Polymers 0.000 description 1
- 229920002857 polybutadiene Polymers 0.000 description 1
- 229920005862 polyol Polymers 0.000 description 1
- 150000003077 polyols Chemical class 0.000 description 1
- 229920002503 polyoxyethylene-polyoxypropylene Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920006295 polythiol Polymers 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 235000019422 polyvinyl alcohol Nutrition 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- USHAGKDGDHPEEY-UHFFFAOYSA-L potassium persulfate Chemical compound [K+].[K+].[O-]S(=O)(=O)OOS([O-])(=O)=O USHAGKDGDHPEEY-UHFFFAOYSA-L 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- BNMCQIRVFUGISV-UHFFFAOYSA-N propan-2-one;prop-2-enamide Chemical compound CC(C)=O.NC(=O)C=C BNMCQIRVFUGISV-UHFFFAOYSA-N 0.000 description 1
- ZNZJJSYHZBXQSM-UHFFFAOYSA-N propane-2,2-diamine Chemical compound CC(C)(N)N ZNZJJSYHZBXQSM-UHFFFAOYSA-N 0.000 description 1
- 230000008439 repair process Effects 0.000 description 1
- 238000000518 rheometry Methods 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 238000005488 sandblasting Methods 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 125000003156 secondary amide group Chemical group 0.000 description 1
- AIFMYMZGQVTROK-UHFFFAOYSA-N silicon tetrabromide Chemical compound Br[Si](Br)(Br)Br AIFMYMZGQVTROK-UHFFFAOYSA-N 0.000 description 1
- FDNAPBUWERUEDA-UHFFFAOYSA-N silicon tetrachloride Chemical compound Cl[Si](Cl)(Cl)Cl FDNAPBUWERUEDA-UHFFFAOYSA-N 0.000 description 1
- ABTOQLMXBSRXSM-UHFFFAOYSA-N silicon tetrafluoride Chemical compound F[Si](F)(F)F ABTOQLMXBSRXSM-UHFFFAOYSA-N 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 239000001632 sodium acetate Substances 0.000 description 1
- 235000017281 sodium acetate Nutrition 0.000 description 1
- 229910001388 sodium aluminate Inorganic materials 0.000 description 1
- 235000017557 sodium bicarbonate Nutrition 0.000 description 1
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 1
- 229940001607 sodium bisulfite Drugs 0.000 description 1
- 235000010267 sodium hydrogen sulphite Nutrition 0.000 description 1
- CHQMHPLRPQMAMX-UHFFFAOYSA-L sodium persulfate Substances [Na+].[Na+].[O-]S(=O)(=O)OOS([O-])(=O)=O CHQMHPLRPQMAMX-UHFFFAOYSA-L 0.000 description 1
- 239000001488 sodium phosphate Substances 0.000 description 1
- 239000004328 sodium tetraborate Substances 0.000 description 1
- 235000010339 sodium tetraborate Nutrition 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 239000004071 soot Substances 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 230000007480 spreading Effects 0.000 description 1
- 238000003892 spreading Methods 0.000 description 1
- 239000008107 starch Substances 0.000 description 1
- 235000019698 starch Nutrition 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 229940014800 succinic anhydride Drugs 0.000 description 1
- 150000003460 sulfonic acids Chemical class 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- CIHOLLKRGTVIJN-UHFFFAOYSA-N tert‐butyl hydroperoxide Chemical compound CC(C)(C)OO CIHOLLKRGTVIJN-UHFFFAOYSA-N 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- OQTSOKXAWXRIAC-UHFFFAOYSA-N tetrabutan-2-yl silicate Chemical compound CCC(C)O[Si](OC(C)CC)(OC(C)CC)OC(C)CC OQTSOKXAWXRIAC-UHFFFAOYSA-N 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- ZUEKXCXHTXJYAR-UHFFFAOYSA-N tetrapropan-2-yl silicate Chemical compound CC(C)O[Si](OC(C)C)(OC(C)C)OC(C)C ZUEKXCXHTXJYAR-UHFFFAOYSA-N 0.000 description 1
- BCLLLHFGVQKVKL-UHFFFAOYSA-N tetratert-butyl silicate Chemical compound CC(C)(C)O[Si](OC(C)(C)C)(OC(C)(C)C)OC(C)(C)C BCLLLHFGVQKVKL-UHFFFAOYSA-N 0.000 description 1
- 239000002562 thickening agent Substances 0.000 description 1
- 150000003566 thiocarboxylic acids Chemical class 0.000 description 1
- NJRXVEJTAYWCQJ-UHFFFAOYSA-N thiomalic acid Chemical compound OC(=O)CC(S)C(O)=O NJRXVEJTAYWCQJ-UHFFFAOYSA-N 0.000 description 1
- 239000013008 thixotropic agent Substances 0.000 description 1
- 150000003606 tin compounds Chemical class 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000005341 toughened glass Substances 0.000 description 1
- JFLKFZNIIQFQBS-FNCQTZNRSA-N trans,trans-1,4-Diphenyl-1,3-butadiene Chemical group C=1C=CC=CC=1\C=C\C=C\C1=CC=CC=C1 JFLKFZNIIQFQBS-FNCQTZNRSA-N 0.000 description 1
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 1
- 238000006276 transfer reaction Methods 0.000 description 1
- YZVRVDPMGYFCGL-UHFFFAOYSA-N triacetyloxysilyl acetate Chemical compound CC(=O)O[Si](OC(C)=O)(OC(C)=O)OC(C)=O YZVRVDPMGYFCGL-UHFFFAOYSA-N 0.000 description 1
- KBSUPJLTDMARAI-UHFFFAOYSA-N tribromo(methyl)silane Chemical compound C[Si](Br)(Br)Br KBSUPJLTDMARAI-UHFFFAOYSA-N 0.000 description 1
- IBOKZQNMFSHYNQ-UHFFFAOYSA-N tribromosilane Chemical compound Br[SiH](Br)Br IBOKZQNMFSHYNQ-UHFFFAOYSA-N 0.000 description 1
- IMFACGCPASFAPR-UHFFFAOYSA-N tributylamine Chemical compound CCCCN(CCCC)CCCC IMFACGCPASFAPR-UHFFFAOYSA-N 0.000 description 1
- YNJBWRMUSHSURL-UHFFFAOYSA-N trichloroacetic acid Chemical compound OC(=O)C(Cl)(Cl)Cl YNJBWRMUSHSURL-UHFFFAOYSA-N 0.000 description 1
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 description 1
- 239000005052 trichlorosilane Substances 0.000 description 1
- FOQJQXVUMYLJSU-UHFFFAOYSA-N triethoxy(1-triethoxysilylethyl)silane Chemical compound CCO[Si](OCC)(OCC)C(C)[Si](OCC)(OCC)OCC FOQJQXVUMYLJSU-UHFFFAOYSA-N 0.000 description 1
- ALVYUZIFSCKIFP-UHFFFAOYSA-N triethoxy(2-methylpropyl)silane Chemical compound CCO[Si](CC(C)C)(OCC)OCC ALVYUZIFSCKIFP-UHFFFAOYSA-N 0.000 description 1
- ZLGWXNBXAXOQBG-UHFFFAOYSA-N triethoxy(3,3,3-trifluoropropyl)silane Chemical compound CCO[Si](OCC)(OCC)CCC(F)(F)F ZLGWXNBXAXOQBG-UHFFFAOYSA-N 0.000 description 1
- FRGPKMWIYVTFIQ-UHFFFAOYSA-N triethoxy(3-isocyanatopropyl)silane Chemical compound CCO[Si](OCC)(OCC)CCCN=C=O FRGPKMWIYVTFIQ-UHFFFAOYSA-N 0.000 description 1
- PYOKTQVLKOAHRM-UHFFFAOYSA-N triethoxy(3-triethoxysilylpropyl)silane Chemical compound CCO[Si](OCC)(OCC)CCC[Si](OCC)(OCC)OCC PYOKTQVLKOAHRM-UHFFFAOYSA-N 0.000 description 1
- BJDLPDPRMYAOCM-UHFFFAOYSA-N triethoxy(propan-2-yl)silane Chemical compound CCO[Si](OCC)(OCC)C(C)C BJDLPDPRMYAOCM-UHFFFAOYSA-N 0.000 description 1
- NIINUVYELHEORX-UHFFFAOYSA-N triethoxy(triethoxysilylmethyl)silane Chemical compound CCO[Si](OCC)(OCC)C[Si](OCC)(OCC)OCC NIINUVYELHEORX-UHFFFAOYSA-N 0.000 description 1
- YYJNCOSWWOMZHX-UHFFFAOYSA-N triethoxy-(4-triethoxysilylphenyl)silane Chemical compound CCO[Si](OCC)(OCC)C1=CC=C([Si](OCC)(OCC)OCC)C=C1 YYJNCOSWWOMZHX-UHFFFAOYSA-N 0.000 description 1
- UDUKMRHNZZLJRB-UHFFFAOYSA-N triethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OCC)(OCC)OCC)CCC2OC21 UDUKMRHNZZLJRB-UHFFFAOYSA-N 0.000 description 1
- QQQSFSZALRVCSZ-UHFFFAOYSA-N triethoxysilane Chemical compound CCO[SiH](OCC)OCC QQQSFSZALRVCSZ-UHFFFAOYSA-N 0.000 description 1
- WPPVEXTUHHUEIV-UHFFFAOYSA-N trifluorosilane Chemical compound F[SiH](F)F WPPVEXTUHHUEIV-UHFFFAOYSA-N 0.000 description 1
- SRPWOOOHEPICQU-UHFFFAOYSA-N trimellitic anhydride Chemical compound OC(=O)C1=CC=C2C(=O)OC(=O)C2=C1 SRPWOOOHEPICQU-UHFFFAOYSA-N 0.000 description 1
- JCGDCINCKDQXDX-UHFFFAOYSA-N trimethoxy(2-trimethoxysilylethyl)silane Chemical compound CO[Si](OC)(OC)CC[Si](OC)(OC)OC JCGDCINCKDQXDX-UHFFFAOYSA-N 0.000 description 1
- JLGNHOJUQFHYEZ-UHFFFAOYSA-N trimethoxy(3,3,3-trifluoropropyl)silane Chemical compound CO[Si](OC)(OC)CCC(F)(F)F JLGNHOJUQFHYEZ-UHFFFAOYSA-N 0.000 description 1
- LQASLKRKZDJCBO-UHFFFAOYSA-N trimethoxy(3-trimethoxysilylpropyl)silane Chemical compound CO[Si](OC)(OC)CCC[Si](OC)(OC)OC LQASLKRKZDJCBO-UHFFFAOYSA-N 0.000 description 1
- NMEPHPOFYLLFTK-UHFFFAOYSA-N trimethoxy(octyl)silane Chemical compound CCCCCCCC[Si](OC)(OC)OC NMEPHPOFYLLFTK-UHFFFAOYSA-N 0.000 description 1
- HILHCDFHSDUYNX-UHFFFAOYSA-N trimethoxy(pentyl)silane Chemical compound CCCCC[Si](OC)(OC)OC HILHCDFHSDUYNX-UHFFFAOYSA-N 0.000 description 1
- LGROXJWYRXANBB-UHFFFAOYSA-N trimethoxy(propan-2-yl)silane Chemical compound CO[Si](OC)(OC)C(C)C LGROXJWYRXANBB-UHFFFAOYSA-N 0.000 description 1
- DJYGUVIGOGFJOF-UHFFFAOYSA-N trimethoxy(trimethoxysilylmethyl)silane Chemical compound CO[Si](OC)(OC)C[Si](OC)(OC)OC DJYGUVIGOGFJOF-UHFFFAOYSA-N 0.000 description 1
- YIRZROVNUPFFNZ-UHFFFAOYSA-N trimethoxy-(4-trimethoxysilylphenyl)silane Chemical compound CO[Si](OC)(OC)C1=CC=C([Si](OC)(OC)OC)C=C1 YIRZROVNUPFFNZ-UHFFFAOYSA-N 0.000 description 1
- DQZNLOXENNXVAD-UHFFFAOYSA-N trimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OC)(OC)OC)CCC2OC21 DQZNLOXENNXVAD-UHFFFAOYSA-N 0.000 description 1
- YUYCVXFAYWRXLS-UHFFFAOYSA-N trimethoxysilane Chemical compound CO[SiH](OC)OC YUYCVXFAYWRXLS-UHFFFAOYSA-N 0.000 description 1
- QLERFSPANXQJMK-UHFFFAOYSA-N triphenoxy(1-triphenoxysilylethyl)silane Chemical compound C=1C=CC=CC=1O[Si](OC=1C=CC=CC=1)(OC=1C=CC=CC=1)C(C)[Si](OC=1C=CC=CC=1)(OC=1C=CC=CC=1)OC1=CC=CC=C1 QLERFSPANXQJMK-UHFFFAOYSA-N 0.000 description 1
- OAKRVFBXZCHVCL-UHFFFAOYSA-N triphenoxy(3-triphenoxysilylpropyl)silane Chemical compound C=1C=CC=CC=1O[Si](OC=1C=CC=CC=1)(OC=1C=CC=CC=1)CCC[Si](OC=1C=CC=CC=1)(OC=1C=CC=CC=1)OC1=CC=CC=C1 OAKRVFBXZCHVCL-UHFFFAOYSA-N 0.000 description 1
- AABYOUNGNSKTRH-UHFFFAOYSA-N triphenoxy(triphenoxysilylmethyl)silane Chemical compound C=1C=CC=CC=1O[Si](OC=1C=CC=CC=1)(OC=1C=CC=CC=1)C[Si](OC=1C=CC=CC=1)(OC=1C=CC=CC=1)OC1=CC=CC=C1 AABYOUNGNSKTRH-UHFFFAOYSA-N 0.000 description 1
- FEPLNUFFRSBNSK-UHFFFAOYSA-N tris[(2,2,2-trichloroacetyl)oxy]silyl 2,2,2-trichloroacetate Chemical compound ClC(Cl)(Cl)C(=O)O[Si](OC(=O)C(Cl)(Cl)Cl)(OC(=O)C(Cl)(Cl)Cl)OC(=O)C(Cl)(Cl)Cl FEPLNUFFRSBNSK-UHFFFAOYSA-N 0.000 description 1
- VMDWRHNNZFIVTK-UHFFFAOYSA-N tris[(2,2,2-trifluoroacetyl)oxy]silyl 2,2,2-trifluoroacetate Chemical compound FC(F)(F)C(=O)O[Si](OC(=O)C(F)(F)F)(OC(=O)C(F)(F)F)OC(=O)C(F)(F)F VMDWRHNNZFIVTK-UHFFFAOYSA-N 0.000 description 1
- CMPGARWFYBADJI-UHFFFAOYSA-L tungstic acid Chemical compound O[W](O)(=O)=O CMPGARWFYBADJI-UHFFFAOYSA-L 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 229920003169 water-soluble polymer Polymers 0.000 description 1
- 229940124024 weight reducing agent Drugs 0.000 description 1
- 239000000080 wetting agent Substances 0.000 description 1
- 238000004383 yellowing Methods 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
- 239000004711 α-olefin Substances 0.000 description 1
- DGVVWUTYPXICAM-UHFFFAOYSA-N β‐Mercaptoethanol Chemical compound OCCS DGVVWUTYPXICAM-UHFFFAOYSA-N 0.000 description 1
- PAPBSGBWRJIAAV-UHFFFAOYSA-N ε-Caprolactone Chemical compound O=C1CCCCCO1 PAPBSGBWRJIAAV-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
Landscapes
- Surface Treatment Of Glass (AREA)
- Paints Or Removers (AREA)
- Photovoltaic Devices (AREA)
Description
本発明は、太陽エネルギー部材に使用できる機能性塗膜に関する。 The present invention relates to a functional coating film that can be used for a solar energy member.
近年、世界的な温暖化現象により環境に対する意識が高まり、炭酸ガス等の温暖化ガスを発生しない新しいエネルギーシステムが関心を集めている。太陽電池発電や風力発電等の環境にやさしい再生可能なエネルギーは、炭酸ガス等の温暖化を誘発するといわれているガスを排出しないため、クリーンなエネルギーとして研究開発が盛んに行われており、安全性や扱いやすさに優れることから、太陽電池発電の技術が急速に普及している。しかし、太陽電池の表面に使用されているガラスなどの保護カバーは煤塵や砂塵の堆積などで汚れることによって、太陽光の光線透過率が低下し、太陽電池のエネルギー出力が低下することが問題となっている。そのため、太陽電池のエネルギー出力の低下を長期間抑制できる実用的な防汚技術が求められている。 In recent years, the global warming phenomenon has heightened awareness of the environment, and a new energy system that does not generate greenhouse gases such as carbon dioxide is attracting attention. Renewable energy that is friendly to the environment, such as solar cell power generation and wind power generation, does not emit carbon dioxide and other gases that are said to induce global warming. Because of its superiority and ease of handling, solar cell power generation technology is rapidly spreading. However, there is a problem that the protective cover such as glass used on the surface of the solar cell becomes dirty due to accumulation of soot and sand dust, so that the light transmittance of sunlight decreases and the energy output of the solar cell decreases. It has become. Therefore, there is a demand for a practical antifouling technique that can suppress a decrease in energy output of the solar cell for a long period of time.
また、大規模発電のプラントでは数%でも高いエネルギー効率が求められており、そのような目的で例えば太陽電池のカバーガラス表面に反射防止のためのコーティングがなされる場合があるが、その表面の汚れによって出力が低下するという課題がある。 In addition, a large-scale power generation plant is required to have high energy efficiency even at a few percent. For this purpose, for example, a solar cell cover glass surface may be coated with an antireflection coating. There is a problem that the output decreases due to dirt.
特許文献1には、アナターゼ型酸化チタン含有層上に、アンモニア水に溶解させたタングステン酸と蒸留水を加えたコーティング液を塗布し、700℃で焼付け処理を施して酸化タングステンからなる層を形成して、表面層を形成する技術が開示されている。この塗布品では、光触媒機能を有するアナターゼ型酸化チタン含有層によって、表面層に付着した有機物が分解されて表面が親水性を呈すると共に、酸化タングステンからなる層により表面の親水性が維持される。これにより、表面に付着した凝集水や水滴が表面一面に広がる易くなることから、表面に付着した汚れを雨水などで洗い流すことができる。
特許文献2では透明性と防汚性に優れた有機・無機複合組成物が開示されているが、反射防止に関する開示は十分にはなされていない。
In Patent Document 1, a coating solution in which tungstic acid dissolved in ammonia water and distilled water are added is applied onto an anatase-type titanium oxide-containing layer, and a layer made of tungsten oxide is formed by baking at 700 ° C. Thus, a technique for forming a surface layer is disclosed. In this coated product, the anatase-type titanium oxide-containing layer having a photocatalytic function decomposes organic substances attached to the surface layer to make the surface hydrophilic, and the layer made of tungsten oxide maintains the surface hydrophilicity. Thereby, since the condensed water and water droplets adhering to the surface are easily spread over the entire surface, the dirt adhering to the surface can be washed away with rainwater or the like.
Patent Document 2 discloses an organic / inorganic composite composition excellent in transparency and antifouling property, but does not sufficiently disclose antireflection.
本発明は、上記問題点を解決するものであり、防汚性と反射防止性に優れた機能性塗膜を提供することを目的とするものである。 The present invention has been made to solve the above-mentioned problems, and an object thereof is to provide a functional coating film having excellent antifouling properties and antireflection properties.
本発明者らは上記課題を解決すべく鋭意検討した結果、本発明に到達した。
すなわち、本発明は以下の通りである。
(1)(A)、(B)の各成分を含んだ有機無機複合塗膜であって、(A)成分と(B)成分の質量比率がA/B=1000/100〜150/100、膜厚が80〜300nm、塗膜の屈折率が1.3〜1.48、下記の方法で測定される塗膜の空隙率が20〜60%であり、
(C)成分:下記式(1)で示される珪素化合物の加水分解縮合物(ゾル−ゲル法で得られたコロイダルシリカを除く)を更に含み、(A)成分と(C)成分の質量比率がC/A=0.2/100〜30/100であることを特徴とする有機無機複合塗膜。
(A)成分;数平均粒子径が1nm〜400nmの金属酸化物
(B)成分;数平均粒子径が10nm〜800nmの重合体エマルジョン粒子
前記(B)成分は、以下の(b1)〜(b4)の各成分、
(b1)成分:下記式(4)で表される加水分解性珪素化合物およびビニル重合性基を有するシランカップリング剤
SiWxRy (4)
(式中、Wは炭素数1〜20のアルコキシ基、水酸基、炭素数1〜20のアセトキシ基、ハロゲン原子、炭素数1〜20のオキシム基、エノキシ基、アミノキシ基、アミド基から選ばれた少なくとも1種の基を表す。Rは、直鎖状又は分岐状の炭素数が1〜30個のアルキル基、炭素数5〜20のシクロアルキル基、及び置換されていないか又は炭素数1〜20のアルキル基若しくは炭素数1〜20のアルコキシ基若しくはハロゲン原子で置換されている炭素数6〜20のアリール基から選ばれる少なくとも1種の炭化水素基を表す。xは2以上4以下の整数であり、yは0以上2以下の整数である。また、x+y=4である。)
(b2)成分:水酸基、カルボキシル基、アミド基、アミノ基、エーテル基よりなる群から選ばれる少なくとも1種の官能基を含有するビニル単量体、
(b3)成分:乳化剤、
(b4)成分:水、
を含む重合原液を重合して得られる重合体エマルジョン粒子である。
SiX4 (1)
(式中、Xは加水分解基を表す。)
空隙率(Va)の測定方法
電子顕微鏡を用いて塗膜表面を25万倍で観察し、その表面の空孔の外接円相当径の平均値(2d)を求める。1辺1000nmの正方形中の空孔の個数(n)を求め、空孔を球に換算した場合の体積(Vo)を求める。塗膜体積(V1)は1辺1000nmの正方形の面積と膜厚から求め、その結果から空隙率を算出する。
Vo=n4/3πd3
Va(%)=Vo/V1×100
(2)(A)成分と(B)成分との質量比がA/B=150/100〜450/100であることを特徴とする上記(1)記載の有機無機複合塗膜。
(3)塗膜表面の空孔径が10〜300nmであることを特徴とする上記(1)または(2)記載の有機無機複合塗膜。
(4)太陽電池用保護カバー用である、上記(1)〜(3)のいずれかに記載の有機無機複合塗膜。
As a result of intensive studies aimed at solving the above problems, the present inventors have reached the present invention.
That is, the present invention is as follows.
(1) An organic-inorganic composite coating film containing the components (A) and (B), wherein the mass ratio of the components (A) and (B) is A / B = 1000/100 to 150/100, The film thickness is 80 to 300 nm, the refractive index of the coating film is 1.3 to 1.48, and the porosity of the coating film measured by the following method is 20 to 60%.
Component (C): Hydrolyzed condensate of a silicon compound represented by the following formula (1) (excluding colloidal silica obtained by a sol-gel method), and a mass ratio of component (A) and component (C) Is an organic-inorganic composite coating film, wherein C / A = 0.2 / 100 to 30/100.
Component (A): metal oxide having a number average particle diameter of 1 nm to 400 nm
(B) component; polymer emulsion particles having a number average particle diameter of 10 nm to 800 nm The component (B) includes the following components (b1) to (b4):
(B1) Component: Hydrolyzable silicon compound represented by the following formula (4) and a silane coupling agent having a vinyl polymerizable group SiWxRy (4)
(W is selected from an alkoxy group having 1 to 20 carbon atoms, a hydroxyl group, an acetoxy group having 1 to 20 carbon atoms, a halogen atom, an oxime group having 1 to 20 carbon atoms, an enoxy group, an aminoxy group, and an amide group. R represents at least one group, and R is a linear or branched alkyl group having 1 to 30 carbon atoms, a cycloalkyl group having 5 to 20 carbon atoms, and an unsubstituted or substituted 1 to carbon atom. 20 represents an at least one hydrocarbon group selected from an alkyl group having 20 carbon atoms, an alkoxy group having 1 to 20 carbon atoms, or an aryl group having 6 to 20 carbon atoms substituted with a halogen atom, where x is an integer of 2 or more and 4 or less. And y is an integer of 0 or more and 2 or less, and x + y = 4.)
(B2) component: a vinyl monomer containing at least one functional group selected from the group consisting of a hydroxyl group, a carboxyl group, an amide group, an amino group, and an ether group;
(B3) component: emulsifier,
(B4) component: water,
Polymer emulsion particles obtained by polymerizing a polymerization stock solution containing
SiX 4 (1)
(In the formula, X represents a hydrolyzable group.)
Method of measuring porosity (Va) The surface of the coating film is observed at 250,000 times using an electron microscope, and the average value (2d) of the circumscribed circle equivalent diameter of the pores on the surface is obtained. The number of holes (n) in a square with a side of 1000 nm is obtained, and the volume (Vo) when the holes are converted into a sphere is obtained. The coating film volume (V1) is determined from the square area and film thickness of 1000 nm on each side, and the porosity is calculated from the result.
Vo = n4 / 3πd 3
Va (%) = Vo / V1 × 100
(2) The organic-inorganic composite coating film as described in (1) above, wherein the mass ratio of the component (A) to the component (B) is A / B = 150/100 to 450/100.
(3) The organic-inorganic composite coating film as described in (1) or (2) above, wherein the pore diameter of the coating film surface is 10 to 300 nm.
(4) The organic-inorganic composite coating film according to any one of (1) to (3), which is for a protective cover for solar cells.
本発明の機能性塗膜は、防汚性と反射防止性に優れる。 The functional coating film of the present invention is excellent in antifouling properties and antireflection properties.
以下、本発明を実施するための形態(以下、「実施の形態」と略記することがある。)について詳細に説明する。尚、本発明は、以下の実施の形態に限定されるものではなく、その要旨の範囲内で種々変形して実施することができる。 Hereinafter, modes for carrying out the present invention (hereinafter sometimes abbreviated as “embodiments”) will be described in detail. In addition, this invention is not limited to the following embodiment, It can implement by changing variously within the range of the summary.
本発明の機能性塗膜は基材の少なくとも片面にコーティング組成物を塗布、乾燥して有機無機複合塗膜を形成することで得られる。本発明で使用できるコーティング組成物とは、以下の(A)、(B)の各成分、
(A)成分:粒子径が1nm〜400nmの金属酸化物、
(B)成分:粒子径が10nm〜800nmの重合体エマルジョン粒子、
を含み、
前記(B)成分は、以下の(b1)〜(b4)の各成分、
(b1)成分:加水分解性珪素化合物、
(b2)成分:水酸基、カルボキシル基、アミド基、アミノ基、エーテル基よりなる群から選ばれる少なくとも1種の官能基を含有するビニル単量体、
(b3)成分:乳化剤、
(b4)成分:水、
を含む重合原液を重合して得られる重合体エマルジョン粒子である。
The functional coating film of the present invention is obtained by applying a coating composition on at least one surface of a substrate and drying it to form an organic-inorganic composite coating film. The coating composition that can be used in the present invention includes the following components (A) and (B):
(A) component: a metal oxide having a particle size of 1 nm to 400 nm,
(B) component: polymer emulsion particles having a particle size of 10 nm to 800 nm,
Including
The component (B) includes the following components (b1) to (b4):
(B1) component: hydrolyzable silicon compound,
(B2) component: a vinyl monomer containing at least one functional group selected from the group consisting of a hydroxyl group, a carboxyl group, an amide group, an amino group, and an ether group;
(B3) component: emulsifier,
(B4) component: water,
Polymer emulsion particles obtained by polymerizing a polymerization stock solution containing
前記(A)成分は、前記(B)成分と相互作用することにより、前記(B)成分の硬化剤として作用すると考えられる。当該相互作用としては、例えば、前記(A)成分が一般に有する水酸基と、前記(B)成分が有する水酸基、カルボキシル基、アミド基、アミノ基、エーテル基との水素結合や、前記(A)成分が一般に有する水酸基と、前記(B)成分を構成する前記(b1)成分の重合生成物との縮合(化学結合)等を例示することができる。
また、前記(A)成分が、前記(B)成分と相互作用しながら前記(B)成分の粒子間に連続層を形成して存在することが好ましい。この場合、得られるコーティング組成物の光線透過率、耐候性、防汚性がより向上し得る。
The component (A) is considered to act as a curing agent for the component (B) by interacting with the component (B). Examples of the interaction include a hydrogen bond between the hydroxyl group that the component (A) generally has and the hydroxyl group, carboxyl group, amide group, amino group, and ether group that the component (B) has, or the component (A). Can be exemplified by the condensation (chemical bond) of the hydroxyl group generally possessed by the polymerization product of the component (b1) constituting the component (B).
Moreover, it is preferable that the component (A) exists while forming a continuous layer between the particles of the component (B) while interacting with the component (B). In this case, the light transmittance, weather resistance, and antifouling property of the resulting coating composition can be further improved.
前記(A)成分に用いられる金属酸化物としては、前記(B)成分との相互作用の観点から、例えば、二酸化珪素、酸化アルミニウム、酸化アンチモン、酸化チタン、酸化インジウム、酸化スズ、酸化ジルコニウム、酸化鉛、酸化鉄、珪酸カルシウム、酸化マグネシウム、酸化ニオブ、酸化セリウム、等を例示することができる。 As the metal oxide used in the component (A), from the viewpoint of interaction with the component (B), for example, silicon dioxide, aluminum oxide, antimony oxide, titanium oxide, indium oxide, tin oxide, zirconium oxide, Examples thereof include lead oxide, iron oxide, calcium silicate, magnesium oxide, niobium oxide, and cerium oxide.
中でも、表面水酸基の多い二酸化珪素(シリカ)、酸化アルミニウム(アルミナ)、酸化アンチモン、及びそれらの複合酸化物等は前記(B)成分との相互作用が強く好ましい。また、表面水酸基の多い前記(A)成分が連続層を形成することで塗膜表面の水酸基密度が高くなり、それ自身の親水性が高くなるために好ましい。
ここで、前記(A)成分として2種以上のこれら金属酸化物を併用することもできる。
Of these, silicon dioxide (silica), aluminum oxide (alumina), antimony oxide, and complex oxides thereof having a large number of surface hydroxyl groups are preferred because of their strong interaction with the component (B). Further, the component (A) having a large number of surface hydroxyl groups is preferable because the density of hydroxyl groups on the surface of the coating film is increased by forming a continuous layer, and the hydrophilicity of itself is increased.
Here, two or more of these metal oxides can be used in combination as the component (A).
前記(A)成分に用いられる金属酸化物としては、有機物分解性を付与する観点から、光照射により、光触媒活性及び/又は親水性を発現する化合物(以下、単に「光触媒」と略記することがある)を用いることができる。前記(A)成分として、光照射により光触媒活性を発現する化合物を用いた場合、得られる機能性塗膜の表面は優れた汚染有機物質の分解活性や耐汚染性を発現し得る。なお、本実施の形態において「親水性」とは、測定対象物表面に対する水(23℃)の接触角として、好ましくは60゜以下、より好ましくは30゜以下、更に好ましくは20゜以下になることを意味する。 The metal oxide used in the component (A) is a compound that expresses photocatalytic activity and / or hydrophilicity by light irradiation (hereinafter simply abbreviated as “photocatalyst”) from the viewpoint of imparting organic substance decomposability. Can be used). When a compound that expresses photocatalytic activity by light irradiation is used as the component (A), the surface of the functional coating film obtained can exhibit excellent decomposition activity and contamination resistance of the contaminating organic substance. In the present embodiment, “hydrophilic” means that the contact angle of water (23 ° C.) with respect to the surface of the measurement object is preferably 60 ° or less, more preferably 30 ° or less, and even more preferably 20 ° or less. Means that.
前記光触媒としてより具体的には、例えば、TiO2、ZnO、SrTiO3、BaTiO3、BaTiO4、BaTi4O9、K2NbO3、Nb2O5、Fe2O3、Ta2O5、K3Ta3Si2O3、WO3、SnO2、Bi2O3、BiVO4、NiO、Cu2O、RuO2、CeO2等、さらにはTi、Nb、Ta、Vから選ばれた少なくとも1種の元素を有する層状酸化物(例えば特開昭62−74452号公報、特開平2−172535号公報、特開平7−24329号公報、特開平8−89799号公報、特開平8−89800号公報、特開平8−89804号公報、特開平8−198061号公報、特開平9−248465号公報、特開平10−99694号公報、特開平10−244165号公報等参照)を挙げることができる。これらの光触媒の中でもTiO2(酸化チタン)は無害であり、化学的安定性にも優れるため好ましい。酸化チタンとしては、アナターゼ型、ルチル型、ブルッカイト型のいずれも使用できる。 More specifically, examples of the photocatalyst include TiO 2 , ZnO, SrTiO 3 , BaTiO 3 , BaTiO 4 , BaTi 4 O 9 , K 2 NbO 3 , Nb 2 O 5 , Fe 2 O 3 , Ta 2 O 5 , K 3 Ta 3 Si 2 O 3 , WO 3 , SnO 2 , Bi 2 O 3 , BiVO 4 , NiO, Cu 2 O, RuO 2 , CeO 2, etc., and at least selected from Ti, Nb, Ta, V Layered oxides having one element (for example, JP-A-62-274452, JP-A-2-172535, JP-A-7-24329, JP-A-8-89799, JP-A-8-89800) JP-A-8-89804, JP-A-8-198061, JP-A-9-248465, JP-A-10-99694, JP-A-10-2 It can be cited reference No. Publication 4165). Among these photocatalysts, TiO 2 (titanium oxide) is preferable because it is harmless and has excellent chemical stability. As the titanium oxide, any of anatase type, rutile type and brookite type can be used.
また、前記(A)成分に用いられる金属酸化物としては、得られる機能性塗膜の帯電防止性能等を発現する観点から、導電性を有する金属酸化物を用いることができる。
このような導電性を有する金属酸化物としては、例えば、錫をドープした酸化インジウム(ITO)、アンチモンをドープした酸化錫(ATO)、酸化スズ、酸化亜鉛等を挙げることができる。
前記(A)成分を用いる際の形態としては、例えば、粉体、分散液、ゾル等が挙げられる。
ここでいう分散液、またはゾルとは、前記(A)成分が水及び/又は親水性有機溶媒中に0.01〜80質量%、好ましくは0.1〜50質量%の濃度で、一次粒子及び/又は二次粒子として分散された状態を意味する。
Moreover, as a metal oxide used for the said (A) component, the metal oxide which has electroconductivity can be used from a viewpoint of expressing the antistatic performance etc. of the functional coating film obtained.
Examples of such conductive metal oxides include indium oxide (ITO) doped with tin, tin oxide (ATO) doped with antimony, tin oxide, and zinc oxide.
Examples of forms when the component (A) is used include powders, dispersions, and sols.
The dispersion or sol as used herein refers to primary particles in which the component (A) is in a concentration of 0.01 to 80% by mass, preferably 0.1 to 50% by mass in water and / or a hydrophilic organic solvent. And / or a state of being dispersed as secondary particles.
上記親水性有機溶媒としては、例えば、エチレングリコール、ブチルセロソルブ、n−プロパノール、イソプロパノール、n−ブタノール、エタノール、メタノール等のアルコール類、アセトン、メチルエチルケトン、メチルイソブチルケトン等のケトン類、テトラヒドロフラン、ジオキサン等のエーテル類、ジメチルアセトアミド、ジメチルホルムアミド等のアミド類、ジメチルスルホキシド、ニトロベンゼン等、さらにはこれらの2種以上の混合物が挙げられる。 Examples of the hydrophilic organic solvent include alcohols such as ethylene glycol, butyl cellosolve, n-propanol, isopropanol, n-butanol, ethanol and methanol, ketones such as acetone, methyl ethyl ketone and methyl isobutyl ketone, tetrahydrofuran and dioxane, and the like. Examples include ethers, amides such as dimethylacetamide, dimethylformamide, dimethyl sulfoxide, nitrobenzene, and a mixture of two or more thereof.
上記分散液又はゾル中に観察される前記(A)成分の数平均粒子径(1次粒子と2次粒子との混合物であっても良いし、1次粒子、2次粒子何れかのみであってもよい)としては、好ましくは1nm〜400nm、より好ましくは1nm〜100nm、更に好ましくは3nm〜80nm、特に好ましくは5nm〜50nmである。前記(A)成分の数平均粒子径は、得られるコーティング組成物を用いて形成される機能性塗膜の光学特性等に寄与し得る。特に、100nm以下とすることは、得られる機能性塗膜の光線透過率を大きく向上させ得る。
なお、本実施の形態における数平均粒子径(単に、「粒子径」と略記することがある)とは、後述する実施例の方法に準じて測定された値である。
The number average particle size of the component (A) observed in the dispersion or sol (may be a mixture of primary particles and secondary particles, or only primary particles or secondary particles). May be 1 nm to 400 nm, more preferably 1 nm to 100 nm, still more preferably 3 nm to 80 nm, and particularly preferably 5 nm to 50 nm. The number average particle diameter of the component (A) can contribute to the optical characteristics and the like of a functional coating film formed using the resulting coating composition. Particularly, when the thickness is 100 nm or less, the light transmittance of the obtained functional coating film can be greatly improved.
In addition, the number average particle diameter (simply abbreviated as “particle diameter”) in the present embodiment is a value measured according to the method of Examples described later.
本発明で使用できる金属酸化物(A)としては取扱い性の観点からコロイダルシリカが好ましい。
これらコロイダルシリカは、ゾル−ゲル法で調製して使用することもでき、市販品を利用することもできる。ゾル−ゲル法で調製する場合には、WernerStober et al;J.Colloidand Interface Sci.,26, 62−69 (1968)、RickeyD.Badley et al;Lang muir 6, 792−801 (1990)、色材協会誌,61 [9] 488−493(1988) などを参照できる。コロイダルシリカは、二酸化ケイ素を基本単位とするシリカの水または水溶性溶媒の分散体であり、その粒子径は1〜400nmであることが必要であり、好ましくは、1〜100nm、より好ましくは5〜50nmである。粒子径が1nm以上であれば、塗液の貯蔵安定性が良好であり、400nm以下の場合は、透明性が良好となる。上記範囲の粒子径のコロイダルシリカは、水性分散液の状態で、酸性、塩基性のいずれであっても用いることができ、混合する水性分散体(B)の安定領域に応じて、適宜選択することができる。水を分散媒体とする酸性のコロイダルシリカとしては、例えば市販品として日産化学工業(株)製スノーテックス(商標)−O、スノーテックス−OS、スノーテックス−OL、スノーテックス−OUP、スノーテックス−UP、旭電化工業(株)製アデライト(商標)AT−20Q、クラリアントジャパン(株)製クレボゾール(商標)20H12、クレボゾール30CAL25などが利用できる。
The metal oxide (A) that can be used in the present invention is preferably colloidal silica from the viewpoint of handleability.
These colloidal silicas can be prepared and used by a sol-gel method, and commercially available products can also be used. For preparation by the sol-gel method, WernerStober et al; Colloidand Interface Sci. , 26, 62-69 (1968), Rickey D. et al. Badley et al; Lang muir 6, 792-801 (1990), Color Material Association Journal, 61 [9] 488-493 (1988). Colloidal silica is a dispersion of water or a water-soluble solvent of silica having silicon dioxide as a basic unit, and the particle diameter thereof needs to be 1 to 400 nm, preferably 1 to 100 nm, more preferably 5 ~ 50 nm. When the particle diameter is 1 nm or more, the storage stability of the coating liquid is good, and when it is 400 nm or less, the transparency is good. Colloidal silica having a particle size in the above range can be used in the state of an aqueous dispersion, whether acidic or basic, and is appropriately selected according to the stable region of the aqueous dispersion (B) to be mixed. be able to. Examples of acidic colloidal silica using water as a dispersion medium include, as commercial products, Snowtex (trademark) -O, Snowtex-OS, Snowtex-OL, Snowtex-OUP, and Snowtex-manufactured by Nissan Chemical Industries, Ltd. UP, Adelite (trademark) AT-20Q manufactured by Asahi Denka Kogyo Co., Ltd., Clevosol (trademark) 20H12 manufactured by Clariant Japan Co., Ltd., and clebosol 30CAL25 can be used.
塩基性のコロイダルシリカとしては、アルカリ金属イオン、アンモニウムイオン、アミンの添加で安定化したシリカがあり、例えば日産化学工業(株)製スノーテックス−20、スノーテックス−30、スノーテックス−C、スノーテックス−C30、スノーテックス−CM40、スノーテックス−N、スノーテックス−N30、スノーテックス−K、スノーテックス−XL、スノーテックス−YL、スノーテックス−ZL、スノーテックスPS−M、スノーテックスPS−Lなど、旭電化工業(株)製アデライトAT−20、アデライトAT−30、アデライトAT−20N、アデライトAT−30N、アデライトAT−20A、アデライトAT−30A、アデライトAT−40、アデライトAT−50など、クラリアントジャパン(株)製クレボゾール30R9、クレボゾール30R50、クレボゾール50R50など、デュポン社製ルドックス(商標)HS−40、ルドックスHS−30、ルドックスLS、ルドックスSM−30などを挙げることができる。 Examples of basic colloidal silica include silica stabilized by addition of alkali metal ions, ammonium ions, and amines. For example, SNOWTEX-20, SNOWTEX-30, SNOWTEX-C, and SNOWTEX-C manufactured by Nissan Chemical Industries, Ltd. Tex-C30, Snotex-CM40, Snotex-N, Snotex-N30, Snotex-K, Snotex-XL, Snotex-YL, Snotex-ZL, Snotex PS-M, Snotex PS-L Adelite AT-20, Adelite AT-30, Adelite AT-20N, Adelite AT-30N, Adelite AT-20A, Adelite AT-30A, Adelite AT-40, Adelite AT-50, etc. manufactured by Asahi Denka Kogyo Co., Ltd. Clariant Japan Co., Ltd. Kurebozoru 30R9, Kurebozoru 30R50, such Kurebozoru 50R50, DuPont Ludox (TM) HS-40, Ludox HS-30, Ludox LS, and the like Ludox SM-30.
また、水溶性溶剤を分散媒体とするコロイダルシリカとしては、例えば、日産化学工業(株)製MA−ST−M(粒子径が20〜25nmのメタノール分散タイプ)、IPA−ST(粒子径が10〜15nmのイソプロピルアルコール分散タイプ)、EG−ST(粒子径が10〜15nmのエチレングリコール分散タイプ)、EG−ST−ZL(粒子径が70〜100nmのエチレングリコール分散タイプ)、NPC−ST(粒子径が10〜15nmのエチレングリコールモノプロピルエーテール分散タイプ)などを挙げることができる。 Examples of colloidal silica using a water-soluble solvent as a dispersion medium include MA-ST-M (methanol dispersion type having a particle size of 20 to 25 nm), IPA-ST (particle size of 10) manufactured by Nissan Chemical Industries, Ltd. ˜15 nm isopropyl alcohol dispersion type), EG-ST (ethylene glycol dispersion type with particle diameter of 10 to 15 nm), EG-ST-ZL (ethylene glycol dispersion type with particle diameter of 70 to 100 nm), NPC-ST (particles) And ethylene glycol monopropyl ether dispersion type having a diameter of 10 to 15 nm).
また、これらコロイダルシリカは一種または二種類以上組み合わせてもよい。少量成分として、アルミナ、アルミン酸ナトリウムなどを含んでいてもよい。また、コロイダルシリカは、安定剤として無機塩基(水酸化ナトリウム、水酸化カリウム、水酸化リチウム、アンモニアなど)や有機塩基(テトラメチルアンモニウムなど)を含んでいてもよい。 These colloidal silicas may be used alone or in combination. As a minor component, alumina, sodium aluminate or the like may be contained. Colloidal silica may contain an inorganic base (such as sodium hydroxide, potassium hydroxide, lithium hydroxide, or ammonia) or an organic base (such as tetramethylammonium) as a stabilizer.
前記(B)成分は、以下の(b1)〜(b4)の各成分、
(b1)成分:加水分解性珪素化合物、
(b2)成分:水酸基、カルボキシル基、アミド基、アミノ基、エーテル基よりなる群から選ばれる少なくとも1種の官能基を含有するビニル単量体、
(b3)成分:乳化剤、
(b4)成分:水、
を含む重合原液を重合して得られる重合体エマルジョン粒子である。このようにして得られる(B)成分としては、前記(b1)成分に由来する水酸基と、前記(b2)成分の重合生成物とが、水素結合等により複合化されたものを用いることが好適である。
The component (B) includes the following components (b1) to (b4):
(B1) component: hydrolyzable silicon compound,
(B2) component: a vinyl monomer containing at least one functional group selected from the group consisting of a hydroxyl group, a carboxyl group, an amide group, an amino group, and an ether group;
(B3) component: emulsifier,
(B4) component: water,
Polymer emulsion particles obtained by polymerizing a polymerization stock solution containing As the component (B) thus obtained, it is preferable to use a compound in which the hydroxyl group derived from the component (b1) and the polymerization product of the component (b2) are combined by hydrogen bonding or the like. It is.
前記(b1)成分としては、下記式(4)で表される化合物やその縮合生成物、シランカップリング剤を例示することができる。
SiWxRy (4)
(式中、Wは炭素数1〜20のアルコキシ基、水酸基、炭素数1〜20のアセトキシ基、ハロゲン原子、水素原子、炭素数1〜20のオキシム基、エノキシ基、アミノキシ基、アミド基から選ばれた少なくとも1種の基を表す。Rは、直鎖状又は分岐状の炭素数が1〜30個のアルキル基、炭素数5〜20のシクロアルキル基、及び置換されていないか又は炭素数1〜20のアルキル基若しくは炭素数1〜20のアルコキシ基若しくはハロゲン原子で置換されている炭素数6〜20のアリール基から選ばれる少なくとも1種の炭化水素基を表す。xは1以上4以下の整数であり、yは0以上3以下の整数である。また、x+y=4である。)
As said (b1) component, the compound represented by following formula (4), its condensation product, and a silane coupling agent can be illustrated.
SiWxRy (4)
(In the formula, W represents an alkoxy group having 1 to 20 carbon atoms, a hydroxyl group, an acetoxy group having 1 to 20 carbon atoms, a halogen atom, a hydrogen atom, an oxime group having 1 to 20 carbon atoms, an enoxy group, an aminoxy group, and an amide group. Represents at least one selected group, wherein R represents a linear or branched alkyl group having 1 to 30 carbon atoms, a cycloalkyl group having 5 to 20 carbon atoms, and an unsubstituted or carbon atom. It represents at least one hydrocarbon group selected from an alkyl group having 1 to 20 carbon atoms, an alkoxy group having 1 to 20 carbon atoms, or an aryl group having 6 to 20 carbon atoms substituted with a halogen atom, where x is 1 or more and 4; And y is an integer of 0 or more and 3 or less, and x + y = 4.)
なお、シランカップリング剤とは、ビニル重合性基、エポキシ基、アミノ基、メタクリル基、メルカプト基、イソシアネート基等の有機物と反応性を有する官能基が分子内に存在する化合物を意味する。 In addition, a silane coupling agent means the compound in which the functional group which has reactivity with organic substances, such as a vinyl polymerizable group, an epoxy group, an amino group, a methacryl group, a mercapto group, an isocyanate group, exists in a molecule | numerator.
前記式(4)で表される化合物の具体例としては、例えばテトラメトキシシラン、テトラエトキシシラン、テトラ−n−プロポキシシラン、テトライソプロポキシシラン、テトラ−n−ブトキシシラン等のテトラアルコキシシラン類;
メチルトリメトキシシラン、メチルトリエトキシシラン、エチルトリメトキシシラン、エチルトリエトキシシラン、n−プロピルトリメトキシシラン、n−プロピルトリエトキシシラン、イソプロピルトリメトキシシラン、イソプロピルトリエトキシシラン、n−ブチルトリメトキシシラン、n−ブチルトリエトキシシラン、n−ペンチルトリメトキシシラン、n−ヘキシルトリメトキシシラン、n−ヘプチルトリメトキシシラン、n−オクチルトリメトキシシラン、ビニルトリメトキシシラン、ビニルトリエトキシシラン、アリルトリメトキシシラン、シクロヘキシルトリメトキシシラン、シクロヘキシルトリエトキシシラン、フェニルトリメトキシシラン、フェニルトリエトキシシラン、3−クロロプロピルトリメトキシシラン、3−クロロプロピルトリエトキシシラン、3,3,3−トリフロロプロピルトリメトキシシラン、3,3,3−トリフロロプロピルトリエトキシシラン、3−アミノプロピルトリメトキシシラン、3−アミノプロピルトリエトキシシラン、2−ヒドロキシエチルトリメトキシシラン、2−ヒドロキシエチルトリエトキシシラン、2−ヒドロキシプロピルトリメトキシシラン、2−ヒドロキシプロピルトリエトキシシラン、3−ヒドロキシプロピルトリメトキシシラン、3−ヒドロキシプロピルトリエトキシシラン、3−メルカプトプロピルトリメトキシシラン、3−メルカプトプロピルトリエトキシシラン、3−イソシアナートプロピルトリメトキシシラン、3−イソシアナートプロピルトリエトキシシラン、3−グリシドキシプロピルトリメトキシシラン、3−グリシドキシプロピルトリエトキシシラン、2−(3,4−エポキシシクロヘキシル)エチルトリメトキシシラン、2−(3,4−エポキシシクロヘキシル)エチルトリエトキシシラン、3−(メタ)アクリルオキシプロピルトリメトキシシラン、3−(メタ)アタクリルオキシプロピルトリエトキシシラン、3−(メタ)アクリロイルオキシプロピルトリ−n−プロポキシシラン、3−(メタ)アクリロイルオキシプロピルトリイソプロポキシシラン、3−ウレイドプロピルトリメトキシシラン、3−ウレイドプロピルトリエトキシシラン等のトリアルコキシシラン類;
Specific examples of the compound represented by the formula (4) include tetraalkoxysilanes such as tetramethoxysilane, tetraethoxysilane, tetra-n-propoxysilane, tetraisopropoxysilane, tetra-n-butoxysilane;
Methyltrimethoxysilane, methyltriethoxysilane, ethyltrimethoxysilane, ethyltriethoxysilane, n-propyltrimethoxysilane, n-propyltriethoxysilane, isopropyltrimethoxysilane, isopropyltriethoxysilane, n-butyltrimethoxysilane N-butyltriethoxysilane, n-pentyltrimethoxysilane, n-hexyltrimethoxysilane, n-heptyltrimethoxysilane, n-octyltrimethoxysilane, vinyltrimethoxysilane, vinyltriethoxysilane, allyltrimethoxysilane Cyclohexyltrimethoxysilane, cyclohexyltriethoxysilane, phenyltrimethoxysilane, phenyltriethoxysilane, 3-chloropropyltrimethoxysilane, 3-c Ropropyltriethoxysilane, 3,3,3-trifluoropropyltrimethoxysilane, 3,3,3-trifluoropropyltriethoxysilane, 3-aminopropyltrimethoxysilane, 3-aminopropyltriethoxysilane, 2- Hydroxyethyltrimethoxysilane, 2-hydroxyethyltriethoxysilane, 2-hydroxypropyltrimethoxysilane, 2-hydroxypropyltriethoxysilane, 3-hydroxypropyltrimethoxysilane, 3-hydroxypropyltriethoxysilane, 3-mercaptopropyl Trimethoxysilane, 3-mercaptopropyltriethoxysilane, 3-isocyanatopropyltrimethoxysilane, 3-isocyanatopropyltriethoxysilane, 3-glycidoxypropyltrimethoxy Silane, 3-glycidoxypropyltriethoxysilane, 2- (3,4-epoxycyclohexyl) ethyltrimethoxysilane, 2- (3,4-epoxycyclohexyl) ethyltriethoxysilane, 3- (meth) acryloxypropyl Trimethoxysilane, 3- (meth) acryloyloxypropyltriethoxysilane, 3- (meth) acryloyloxypropyltri-n-propoxysilane, 3- (meth) acryloyloxypropyltriisopropoxysilane, 3-ureidopropyltri Trialkoxysilanes such as methoxysilane and 3-ureidopropyltriethoxysilane;
ジメチルジメトキシシラン、ジメチルジエトキシシラン、ジエチルジメトキシシラン、ジエチルジエトキシシラン、ジ−n−プロピルジメトキシシラン、ジ−n−プロピルジエトキシシラン、ジイソプロピルジメトキシシラン、ジイソプロピルジエトキシシラン、ジ−n−ブチルジメトキシシラン、ジ−n−ブチルジエトキシシラン、ジ−n−ペンチルジメトキシシラン、ジ−n−ペンチルジエトキシシラン、ジ−n−ヘキシルジメトキシシラン、ジ−n−ヘキシルジエトキシシラン、ジ−n−ヘプチルジメトキシシラン、ジ−n−ヘプチルジエトキシシラン、ジ−n−オクチルジメトキシシラン、ジ−n−オクチルジエトキシシラン、ジ−n−シクロヘキシルジメトキシシラン、ジ−n−シクロヘキシルジエトキシシラン、ジフェニルジメトキシシラン、ジフェニルジエトキシシラン、3−(メタ)アクリロイルオキシプロピルメチルジメトキシシラン等のジアルコキシシラン類;
トリメチルメトキシシラン、トリメチルエトキシシラン等のモノアルコキシシラン類;
等を挙げることができる。また、これらは、単独で又は2種以上を混合して使用することができる。
Dimethyldimethoxysilane, dimethyldiethoxysilane, diethyldimethoxysilane, diethyldiethoxysilane, di-n-propyldimethoxysilane, di-n-propyldiethoxysilane, diisopropyldimethoxysilane, diisopropyldiethoxysilane, di-n-butyldimethoxy Silane, di-n-butyldiethoxysilane, di-n-pentyldimethoxysilane, di-n-pentyldiethoxysilane, di-n-hexyldimethoxysilane, di-n-hexyldiethoxysilane, di-n-heptyl Dimethoxysilane, di-n-heptyldiethoxysilane, di-n-octyldimethoxysilane, di-n-octyldiethoxysilane, di-n-cyclohexyldimethoxysilane, di-n-cyclohexyldiethoxysilane, diphenyldimethyl Kishishiran, diphenyl diethoxy silane, 3- (meth) acryloyl dialkoxysilane such as propyl methyl dimethoxy silane;
Monoalkoxysilanes such as trimethylmethoxysilane and trimethylethoxysilane;
Etc. Moreover, these can be used individually or in mixture of 2 or more types.
また、前記(b1)成分としては、フェニル基を有する珪素アルコキシド(例えばフェニルトリメトキシシラン、フェニルトリエトキシシラン、ジフェニルジメトキシシラン等)を用いることができる。フェニル基を有する珪素アルコキシドを用いた場合、水及び乳化剤の存在下における重合安定性が良好となり好適である。
更に、前記(b1)成分としては、チオール基を有するシランカップリング剤や、以下の(b1−1)成分、
(b1−1)成分:ビニル重合性基を有する加水分解性珪素化合物
を含んでも良い。これらを用いた場合、得られる機能性塗膜の長期防汚染性が良好となり好適である。
上記チオール基を有するシランカップリング剤としては、例えば、3−メルカプトプロピルトリメトキシシラン、3−メルカプトプロピルトリエトキシシラン等、を挙げることができる。
As the component (b1), a silicon alkoxide having a phenyl group (for example, phenyltrimethoxysilane, phenyltriethoxysilane, diphenyldimethoxysilane, etc.) can be used. When a silicon alkoxide having a phenyl group is used, the polymerization stability in the presence of water and an emulsifier is good, which is preferable.
Furthermore, as said (b1) component, the silane coupling agent which has a thiol group, the following (b1-1) component,
(B1-1) Component: A hydrolyzable silicon compound having a vinyl polymerizable group may be included. When these are used, the long-term antifouling property of the obtained functional coating film is good, which is preferable.
Examples of the silane coupling agent having a thiol group include 3-mercaptopropyltrimethoxysilane and 3-mercaptopropyltriethoxysilane.
また、前記(b1−1)成分としては、例えば、3−(メタ)アクリルオキシプロピルトリメトキシシラン、3−(メタ)アタクリルオキシプロピルトリエトキシシラン、3−(メタ)アクリロイルオキシプロピルメチルジメトキシシラン、3−(メタ)アクリロイルオキシプロピルトリn−プロポキシシラン、3−(メタ)アクリロイルオキシプロピルトリイソプロポキシシラン、ビニルトリメトキシシラン、ビニルトリエトキシシラン、アリルトリメトキシシラン、2−トリメトキシシリルエチルビニルエーテル等のビニル重合性基を有するシランカップリング剤、等を挙げることができる。 Examples of the component (b1-1) include 3- (meth) acryloxypropyltrimethoxysilane, 3- (meth) acryloxypropyltriethoxysilane, and 3- (meth) acryloyloxypropylmethyldimethoxysilane. 3- (meth) acryloyloxypropyltri-n-propoxysilane, 3- (meth) acryloyloxypropyltriisopropoxysilane, vinyltrimethoxysilane, vinyltriethoxysilane, allyltrimethoxysilane, 2-trimethoxysilylethyl vinyl ether Examples thereof include silane coupling agents having a vinyl polymerizable group.
これらシランカップリング剤は、後述する(b2)成分との共重合又は連鎖移動反応により化学結合を生成し得る。このため、ビニル重合性基やチオール基を有するシランカップリング剤を上述した前記(b1)成分と混合若しくは複合化させて用いた場合、前記(b1)の重合生成物と後述する(b2)成分の重合生成物とを化学結合により複合化し得る。 These silane coupling agents can generate chemical bonds by copolymerization or chain transfer reaction with the component (b2) described later. For this reason, when a silane coupling agent having a vinyl polymerizable group or a thiol group is used by mixing or combining with the above-described component (b1), the polymerization product of (b1) and the component (b2) described later These polymerization products can be combined by chemical bonding.
なお、(b1−1)成分にいう「ビニル重合性基」としては、例えば、ビニル基、アリル基等を挙げることができ、中でも3(メタ)アクリルオキシプロピル基が好ましい。
また、前記(b1)成分としては、以下の(b1−2)成分、
(b1−2)成分:環状シロキサンオリゴマー
を含んでいても良い。当該(b1−2)成分を用いた場合、得られる機能性塗膜の柔軟性がより良好となり好適である。
Examples of the “vinyl polymerizable group” referred to as the component (b1-1) include a vinyl group and an allyl group, and among them, a 3 (meth) acryloxypropyl group is preferable.
Moreover, as said (b1) component, the following (b1-2) components,
(B1-2) Component: A cyclic siloxane oligomer may be included. When the said (b1-2) component is used, the softness | flexibility of the functional coating film obtained becomes more favorable, and is suitable.
前記環状シロキサンオリゴマーとしては、下記式(5)で表される化合物を例示することができる。
(R’2SiO)m (5)
(式中、R’は、水素原子、直鎖状又は分岐状の炭素数が1〜30個のアルキル基、炭素数5〜20のシクロアルキル基、及び置換されていないか又は炭素数1〜20のアルキル基若しくは炭素数1〜20のアルコキシ基若しくはハロゲン原子で置換されている炭素数6〜20のアリール基から選ばれる少なくとも1種を表す。mは整数であり、2≦m≦20である。)
中でも、反応性等の点からオクタメチルシクロテトラシロキサン等の環状ジメチルシロキサンオリゴマーが好ましい。
As said cyclic siloxane oligomer, the compound represented by following formula (5) can be illustrated.
(R ′ 2 SiO) m (5)
(In the formula, R ′ is a hydrogen atom, a linear or branched alkyl group having 1 to 30 carbon atoms, a cycloalkyl group having 5 to 20 carbon atoms, and an unsubstituted or substituted carbon atom having 1 to 30 carbon atoms. It represents at least one selected from an alkyl group having 20 carbon atoms, an alkoxy group having 1 to 20 carbon atoms, or an aryl group having 6 to 20 carbon atoms substituted with a halogen atom, m is an integer, and 2 ≦ m ≦ 20 is there.)
Of these, cyclic dimethylsiloxane oligomers such as octamethylcyclotetrasiloxane are preferred from the viewpoint of reactivity.
なお、前記(b1)成分が縮合生成物として使用される場合、当該縮合生成物のポリスチレン換算重量平均分子量(GPC法による)は、好ましくは200〜5000、より好ましくは300〜1000である。
前記(b1)成分と、後述する(B)成分との比(b1)/(B)(質量比)としては、重合安定性の観点から、好ましくは0.01/100〜80/100、より好ましくは0.1/100〜70/100、さらには0.2/100〜40/100である。
In addition, when the said (b1) component is used as a condensation product, the polystyrene conversion weight average molecular weight (by GPC method) of the said condensation product becomes like this. Preferably it is 200-5000, More preferably, it is 300-1000.
The ratio (b1) / (B) (mass ratio) between the component (b1) and the component (B) described later is preferably 0.01 / 100 to 80/100, from the viewpoint of polymerization stability. Preferably they are 0.1 / 100-70 / 100, Furthermore, 0.2 / 100-40 / 100.
一方、前記(b1−1)成分と、前記(B)成分との比(b1−1)/(B)(質量比)としては、重合安定性の観点から、好ましくは0.01/100〜20/100、より好ましくは0.5/100〜10/100である。
また、前記(b1−1)成分と、前記(b2)成分との比(b1−1)/(b2)(質量比)としては、重合安定性の観点から、好ましくは0.1/100〜100/100、より好ましくは0.5/100〜50/100である。
他方、前記(b1−2)成分と、前記(B)成分との比(b1−2)/(B)(質量比)としては、親水性の観点から、好ましくは0.01/100〜20/100、より好ましくは0.5/100〜5/100である。
また、前記(b1−2)成分と、前記(b2)成分との比(b1−2)/(b2)(質量比)としては、重合安定性の観点から、好ましくは0.5/100〜50/100、より好ましくは1.0/100〜20/100である。
On the other hand, the ratio (b1-1) / (B) (mass ratio) between the component (b1-1) and the component (B) is preferably 0.01 / 100 to from the viewpoint of polymerization stability. 20/100, more preferably 0.5 / 100 to 10/100.
The ratio (b1-1) / (b2) (mass ratio) between the component (b1-1) and the component (b2) is preferably 0.1 / 100 to from the viewpoint of polymerization stability. 100/100, more preferably 0.5 / 100 to 50/100.
On the other hand, the ratio (b1-2) / (B) (mass ratio) between the component (b1-2) and the component (B) is preferably 0.01 / 100 to 20 from the viewpoint of hydrophilicity. / 100, more preferably 0.5 / 100 to 5/100.
The ratio (b1-2) / (b2) (mass ratio) between the component (b1-2) and the component (b2) is preferably 0.5 / 100 to from the viewpoint of polymerization stability. 50/100, more preferably 1.0 / 100 to 20/100.
前記(b2)成分は、水酸基、カルボキシル基、アミド基、アミノ基、エーテル基よりなる群から選ばれる少なくとも1種の官能基を含有するビニル単量体である。
水酸基含有ビニル単量体としては、2−ヒドロキシエチル(メタ)アクリレート、2−ヒドロキシプロピル(メタ)アクリレートもしくは4−ヒドロキシブチル(メタ)アクリレートの如き、各種のヒドロキシアルキル(メタ)アクリレート類;2−ヒドロキシエチルビニルエーテルもしくは4−ヒドロキシブチルビニルエーテルの如き、各種の水酸基含有ビニルエーテル類;2−ヒドロキシエチルアリルエーテルの如き、各種の水酸基含有アリルエーテル類;ポリエチレングリコールなどで以て代表されるような、種々のポリエーテルポリオールと、(メタ)アクリル酸などで以て代表されるような、種々の不飽和カルボン酸とから得られるポリオキシアルキレングリコールのモノエステル類;前掲したような各種の水酸基含有単量体類と、ε−カプロラクトンなどで以て代表されるような、種々のラクトン類との付加物;またはグリシジル(メタ)アクリレートなどで以て代表されるような、種々のエポキシ基含有不飽和単量体と、酢酸などで以て代表されるような、種々の酸類との付加物;さらには、(メタ)アクリル酸などで以て代表されるような、種々の不飽和カルボン酸類と、「カーデュラE」(オランダ国シェル社製の商品名)などで以て代表されるような、α−オレフィンのエポキサイド以外の、種々のモノエポキシ化合物との付加物などのような種々の水酸基含有ビニル単量体類などが挙げられる。
The component (b2) is a vinyl monomer containing at least one functional group selected from the group consisting of a hydroxyl group, a carboxyl group, an amide group, an amino group, and an ether group.
Examples of the hydroxyl group-containing vinyl monomer include various hydroxyalkyl (meth) acrylates such as 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate or 4-hydroxybutyl (meth) acrylate; Various hydroxyl group-containing vinyl ethers such as hydroxyethyl vinyl ether or 4-hydroxybutyl vinyl ether; Various hydroxyl group-containing allyl ethers such as 2-hydroxyethyl allyl ether; Monoesters of polyoxyalkylene glycols obtained from polyether polyols and various unsaturated carboxylic acids such as represented by (meth) acrylic acid; various hydroxyl group-containing monomers as described above With adducts with various lactones, such as represented by ε-caprolactone, or various epoxy group-containing unsaturated monomers, such as represented by glycidyl (meth) acrylate, Adducts with various acids as typified by acetic acid and the like; Furthermore, various unsaturated carboxylic acids as typified by (meth) acrylic acid and the like, and “Cardura E” ( Various hydroxyl group-containing vinyl monomers such as adducts with various monoepoxy compounds other than epoxides of α-olefin, as represented by the trade name of the Dutch company Shell, etc. Is mentioned.
カルボキシル基含有ビニル単量体としては、(メタ)アクリル酸、2−カルボキシエチル(メタ)アクリレート、クロトン酸、イタコン酸、マレイン酸またはフマル酸の如き、各種の不飽和カルボン酸類;イタコン酸モノメチル、イタコン酸モノ−n−ブチル、マレイン酸モノメチル、マレイン酸モノ−n−ブチル、フマル酸モノメチル、フマル酸モノ−n−ブチルの如き、不飽和ジカルボン酸類と、飽和1価アルコール類とのモノエステル類(ハーフエステル類);
アジピン酸モノビニルまたはコハク酸モノビニルの如き、各種の飽和ジカルボン酸のモノビニルエステル類;無水コハク酸、無水グルタル酸、無水フタル酸または無水トリメリット酸の如き、各種の飽和ポリカルボン酸の無水物類と前掲した各種の水酸基含有ビニル系単量体類との付加反応生成物;さらには、前掲したような各種のカルボキシル基含有単量体類とラクトン類を付加反応せしめて得られるような単量体類などである。
As the carboxyl group-containing vinyl monomer, various unsaturated carboxylic acids such as (meth) acrylic acid, 2-carboxyethyl (meth) acrylate, crotonic acid, itaconic acid, maleic acid or fumaric acid; monomethyl itaconate, Monoesters of unsaturated dicarboxylic acids with saturated monohydric alcohols such as mono-n-butyl itaconate, monomethyl maleate, mono-n-butyl maleate, monomethyl fumarate, mono-n-butyl fumarate (Half esters);
Monovinyl esters of various saturated dicarboxylic acids such as monovinyl adipate or monovinyl succinate; various saturated polycarboxylic anhydrides such as succinic anhydride, glutaric anhydride, phthalic anhydride or trimellitic anhydride Addition reaction products with various hydroxyl group-containing vinyl monomers listed above; and monomers obtained by addition reaction of various carboxyl group-containing monomers with lactones as described above Etc.
アミド基含有ビニル単量体としては、例えば、N−アルキル又はN−アルキレン置換(メタ)アクリルアミドを例示することができる。 Examples of the amide group-containing vinyl monomer include N-alkyl or N-alkylene-substituted (meth) acrylamide.
より具体的には、例えばN−メチルアクリルアミド、N−メチルメタアクリルアミド、N−エチルアクリルアミド、N,N−ジメチルアクリルアミド、N,N−ジメチルメタアクリルアミド、N,N−ジエチルアクリルアミド、N−エチルメタアクリルアミド、N−メチル−N−エチルアクリルアミド、N−メチル−N−エチルメタアクリルアミド、N−イソプロピルアクリルアミド、N−n−プロピルアクリルアミド、N−イソプロピルメタアクリルアミド、N−n−プロピルメタアクリルアミド、N−メチル−N−n−プロピルアクリルアミド、N−メチル−N−イソプロピルアクリルアミド、N−アクリロイルピロリジン、N−メタクリロイルピロリジン、N−アクリロイルピペリジン、N−メタクリロイルピペリジン、N−アクリロイルヘキサヒドロアゼピン、N−アクリロイルモルホリン、N−メタクリロイルモルホリン、N−ビニルピロリドン、N−ビニルカプロラクタム、N,N’−メチレンビスアクリルアミド、N,N’−メチレンビスメタクリルアミド、N−ビニルアセトアミド、ダイアセトンアクリルアミド、ダイアセトンメタアクリルアミド、N−メチロールアクリルアミド、N−メチロールメタアクリルアミド等を挙げることができる。 More specifically, for example, N-methylacrylamide, N-methylmethacrylamide, N-ethylacrylamide, N, N-dimethylacrylamide, N, N-dimethylmethacrylamide, N, N-diethylacrylamide, N-ethylmethacrylamide N-methyl-N-ethylacrylamide, N-methyl-N-ethylmethacrylamide, N-isopropylacrylamide, Nn-propylacrylamide, N-isopropylmethacrylamide, Nn-propylmethacrylamide, N-methyl- Nn-propylacrylamide, N-methyl-N-isopropylacrylamide, N-acryloylpyrrolidine, N-methacryloylpyrrolidine, N-acryloylpiperidine, N-methacryloylpiperidine, N-acrylo Ruhexahydroazepine, N-acryloylmorpholine, N-methacryloylmorpholine, N-vinylpyrrolidone, N-vinylcaprolactam, N, N'-methylenebisacrylamide, N, N'-methylenebismethacrylamide, N-vinylacetamide, dye Acetone acrylamide, diacetone methacrylamide, N-methylol acrylamide, N-methylol methacrylamide, etc. can be mentioned.
アミノ基含有ビニル単量体としては、2−ジメチルアミノエチル(メタ)アクリレート、2−ジエチルアミノエチル(メタ)アクリレート、2−ジ−n−プロピルアミノエチル(メタ)アクリレート、3−ジメチルアミノプロピル(メタ)アクリレート、4−ジメチルアミノブチル(メタ)アクリレートまたはN−[2−(メタ)アクリロイルオキシ]エチルモルホリンの如き、各種の3級アミノ基含有(メタ)アクリル酸エステル類;ビニルピリジン、N−ビニルカルバゾールN−ビニルキノリンの如き、各種の3級アミノ基含有芳香族ビニル系単量体類;N−(2−ジメチルアミノ)エチル(メタ)アクリルアミド、N−(2−ジエチルアミノ)エチル(メタ)アクリルアミド、N−(2−ジ−n−プロピルアミノ)エチル(メタ)アクリルアミド、N−(3−ジメチルアミノ)プロピル(メタ)アクリルアミド、N−(4−ジメチルアミノ)ブチル(メタ)アクリルアミドまたはN−[2−(メタ)アクリルアミド]エチルモルホリンの如き、各種の3級アミノ基含有(メタ)アクリルアミド類;N−(2−ジメチルアミノ)エチルクロトン酸アミド、N−(2−ジエチルアミノ)エチルクロトン酸アミド、N−(2−ジ−n−プロピルアミノ)エチルクロトン酸アミド、N−(3−ジメチルアミノ)プロピルクロトン酸アミドまたはN−(4−ジメチルアミノ)ブチルクロトン酸アミドの如き、各種の3級アミノ基含有クロトン酸アミド類;2−ジメチルアミノエチルビニルエーテル、2−ジエチルアミノエチルビニルエーテル、3−ジメチルアミノプロピルビニルエーテルまたは4−ジメチルアミノブチルビニルエーテルの如き、各種の3級アミノ基含有ビニルエーテル類などである。 Examples of amino group-containing vinyl monomers include 2-dimethylaminoethyl (meth) acrylate, 2-diethylaminoethyl (meth) acrylate, 2-di-n-propylaminoethyl (meth) acrylate, 3-dimethylaminopropyl (meth) ) Various tertiary amino group-containing (meth) acrylic esters such as acrylate, 4-dimethylaminobutyl (meth) acrylate or N- [2- (meth) acryloyloxy] ethylmorpholine; vinylpyridine, N-vinyl Various tertiary amino group-containing aromatic vinyl monomers such as carbazole N-vinylquinoline; N- (2-dimethylamino) ethyl (meth) acrylamide, N- (2-diethylamino) ethyl (meth) acrylamide N- (2-di-n-propylamino) ethyl (meth) acrylate Various tertiary amino acids such as luamide, N- (3-dimethylamino) propyl (meth) acrylamide, N- (4-dimethylamino) butyl (meth) acrylamide or N- [2- (meth) acrylamide] ethylmorpholine Group-containing (meth) acrylamides; N- (2-dimethylamino) ethylcrotonamide, N- (2-diethylamino) ethylcrotonamide, N- (2-di-n-propylamino) ethylcrotonamide, Various tertiary amino group-containing crotonic acid amides such as N- (3-dimethylamino) propyl crotonic acid amide or N- (4-dimethylamino) butyl crotonic acid amide; 2-dimethylaminoethyl vinyl ether, 2-diethylamino Ethyl vinyl ether, 3-dimethylaminopropyl vinyl ether Or 4, such as dimethylamino-butyl vinyl ether, tertiary amino group-containing vinyl ethers of various or the like.
エーテル基含有ビニル単量体としては、ポリオキシエチレンアルキルエーテル、ポリオキシエチレンアルキルフェニルエーテル、ポリオキシエチレン高級脂肪酸エステル、ポリオキシエチレン-ポリオキシプロピレンブロック共重合体のような各種のポリエーテル鎖を側鎖に有するビニルエーテル類、アリルエーテル類又は(メタ)アクリル酸エステル類のビニル単量体類などが挙げられる。具体例としては、ブレンマーPE−90、PE−200、PE−350、PME−100、PME−200、PME−400、AE−350〔以上、日本油脂(株)製〕、MA−30、MA−50、MA−100、MA−150、RA−1120、RA−2614、RMA−564、RMA−568、RMA−1114、MPG130−MA〔以上、日本乳化剤(株)製〕などが挙げられる。ここで、ポリオキシエチレン鎖のオキシエチレン単位は2〜30が好ましい。2未満では、塗膜の柔軟性が不十分となり、30を超えると、塗膜が軟らかくなり、耐ブロッキング性に劣る。 Examples of ether group-containing vinyl monomers include various polyether chains such as polyoxyethylene alkyl ether, polyoxyethylene alkyl phenyl ether, polyoxyethylene higher fatty acid ester, and polyoxyethylene-polyoxypropylene block copolymer. Examples thereof include vinyl ethers, allyl ethers or vinyl monomers such as (meth) acrylic acid esters having a side chain. As specific examples, Bremer PE-90, PE-200, PE-350, PME-100, PME-200, PME-400, AE-350 [above, manufactured by NOF Corporation], MA-30, MA- 50, MA-100, MA-150, RA-1120, RA-2614, RMA-564, RMA-568, RMA-1114, MPG130-MA [above, manufactured by Nippon Emulsifier Co., Ltd.]. Here, as for the oxyethylene unit of a polyoxyethylene chain, 2-30 are preferable. If it is less than 2, the flexibility of the coating film becomes insufficient, and if it exceeds 30, the coating film becomes soft and the blocking resistance is poor.
前記(b2)成分としては、他成分との水素結合性をより向上させる観点から、2級及び/又は3級アミド基を有するビニル単量体を用いることが好ましい。特に水素結合力の観点から3級アミド基を有するビニル単量体が好ましい。
前記(b2)成分と、前記(B)成分との比(b2)/(B)(質量比)としては、重合安定性の観点から、好ましくは0.05/1〜1/1、より好ましくは0.1/1〜0.8/1、さらには0.2/1〜0.5/1である。
また、前記(b2)成分と、前記(A)成分との比(b2)/(A)(質量比)としては、(A)成分との水素結合性や配合安定性の観点から、好ましくは0.05/1〜1/1より好ましくは0.1/1〜0.8/1、さらには0.2/1〜0.5/1である。
である。
As said (b2) component, it is preferable to use the vinyl monomer which has a secondary and / or tertiary amide group from a viewpoint of improving a hydrogen bond property with another component more. In particular, a vinyl monomer having a tertiary amide group is preferable from the viewpoint of hydrogen bonding strength.
The ratio (b2) / (B) (mass ratio) between the component (b2) and the component (B) is preferably 0.05 / 1 to 1/1, more preferably from the viewpoint of polymerization stability. Is 0.1 / 1 to 0.8 / 1, more preferably 0.2 / 1 to 0.5 / 1.
The ratio (b2) / (A) (mass ratio) between the component (b2) and the component (A) is preferably from the viewpoint of hydrogen bondability with the component (A) and blending stability. 0.05 / 1 to 1/1, more preferably 0.1 / 1 to 0.8 / 1, and further 0.2 / 1 to 0.5 / 1.
It is.
前記(b3)成分としては、例えば、アルキルベンゼンスルホン酸、アルキルスルホン酸、アルキルスルホコハク酸、ポリオキシエチレンアルキル硫酸、ポリオキシエチレンアルキルアリール硫酸、ポリオキシエチレンジスチリルフェニルエーテルスルホン酸等の酸性乳化剤、酸性乳化剤のアルカリ金属(Li、Na、K等)塩、酸性乳化剤のアンモニウム塩、脂肪酸石鹸等のアニオン性界面活性剤;
アルキルトリメチルアンモニウムブロミド、アルキルピリジニウムブロミド、イミダゾリニウムラウレート等の四級アンモニウム塩、ピリジニウム塩、イミダゾリニウム塩型のカチオン性界面活性剤;
ポリオキシエチレンアルキルアリールエーテル、ポリオキシエチレンソルビタン脂肪酸エステル、ポリオキシエチレンオキシプロピレンブロックコポリマー、ポリオキシエチレンジスチリルフェニルエーテル等のノニオン型界面活性剤;
等が挙げられる。これらは1種を単独で、又は2種以上を併用することができる。
Examples of the component (b3) include acidic emulsifiers such as alkylbenzenesulfonic acid, alkylsulfonic acid, alkylsulfosuccinic acid, polyoxyethylene alkylsulfuric acid, polyoxyethylenealkylarylsulfuric acid, polyoxyethylene distyrylphenyl ether sulfonic acid, Anionic surfactants such as alkali metal (Li, Na, K, etc.) salts of emulsifiers, ammonium salts of acidic emulsifiers, fatty acid soaps;
Quaternary ammonium salts such as alkyltrimethylammonium bromide, alkylpyridinium bromide, imidazolinium laurate, pyridinium salts, imidazolinium salt type cationic surfactants;
Nonionic surfactants such as polyoxyethylene alkyl aryl ether, polyoxyethylene sorbitan fatty acid ester, polyoxyethylene oxypropylene block copolymer, polyoxyethylene distyryl phenyl ether;
Etc. These can be used alone or in combination of two or more.
前記(b3)成分としては、得られる前記(B)成分の水分散安定性を向上させる観点、及び、得られる機能性塗膜の長期防汚染性を向上させる観点から、ラジカル重合性の二重結合を有する反応性乳化剤を用いることが好ましい。
上記反応性乳化剤としてより具体的には、例えば、スルホン酸基又はスルホネート基を有するビニル単量体、硫酸エステル基を有するビニル単量体やそれらのアルカリ金属塩、アンモニウム塩、ポリオキシエチレン等のノニオン基を有するビニル単量体、4級アンモニウム塩を有するビニル単量体等を挙げることができる。
As the component (b3), from the viewpoint of improving the water dispersion stability of the component (B) to be obtained, and from the viewpoint of improving the long-term antifouling property of the functional coating film to be obtained, a radical polymerizable double It is preferable to use a reactive emulsifier having a bond.
More specifically, the reactive emulsifier includes, for example, a vinyl monomer having a sulfonic acid group or a sulfonate group, a vinyl monomer having a sulfate ester group, an alkali metal salt thereof, an ammonium salt, a polyoxyethylene, etc. Examples thereof include a vinyl monomer having a nonionic group and a vinyl monomer having a quaternary ammonium salt.
上記スルホン酸基又はスルホネート基を有するビニル単量体としては、例えば、ラジカル重合性の二重結合を有し、且つスルホン酸基のアンモニウム塩、ナトリウム塩又はカリウム塩のような置換基により一部が置換された、炭素数1〜20のアルキル基、炭素数2〜4のアルキルエーテル基、炭素数2〜4のポリアルキルエーテル基、フェニル基、ナフチル基、及びコハク酸基よりなる群から選ばれる置換基を有する化合物;
スルホン酸基のアンモニウム塩、ナトリウム塩又はカリウム塩のような置換基が結合しているビニル基を有するビニルスルホネート化合物;
等が挙げられる。
Examples of the vinyl monomer having a sulfonic acid group or a sulfonate group include, for example, a radically polymerizable double bond, and partly by a substituent such as an ammonium salt, a sodium salt, or a potassium salt of the sulfonic acid group. Selected from the group consisting of an alkyl group having 1 to 20 carbon atoms, an alkyl ether group having 2 to 4 carbon atoms, a polyalkyl ether group having 2 to 4 carbon atoms, a phenyl group, a naphthyl group, and a succinic acid group. A compound having a substituent;
A vinyl sulfonate compound having a vinyl group to which a substituent is bonded, such as an ammonium salt, sodium salt or potassium salt of a sulfonic acid group;
Etc.
硫酸エステル基を有するビニル単量体としては、例えば、ラジカル重合性の二重結合を有し、かつ硫酸エステル基のアンモニウム塩、ナトリウム塩又はカリウム塩のような置換基により一部が置換された、炭素数1〜20のアルキル基、炭素数2〜4のアルキルエーテル基、炭素数2〜4のポリアルキルエーテル基、フェニル基、及びナフチル基よりなる群から選ばれる置換基を有する化合物が挙げられる。
上記スルホン酸基のアンモニウム塩、ナトリウム塩又はカリウム塩のような置換基により一部が置換されたコハク酸基を有する化合物の具体例としては、アリルスルホコハク酸塩が挙げられる。より詳しくは、例えば、エレミノールJS−2(商品名)(三洋化成(株)製)、ラテムルS−120、S−180A又はS−180(商品名)(花王(株)製)等を挙げることができる。
As the vinyl monomer having a sulfate ester group, for example, it has a radical polymerizable double bond and is partially substituted by a substituent such as an ammonium salt, sodium salt or potassium salt of the sulfate ester group. , A compound having a substituent selected from the group consisting of an alkyl group having 1 to 20 carbon atoms, an alkyl ether group having 2 to 4 carbon atoms, a polyalkyl ether group having 2 to 4 carbon atoms, a phenyl group, and a naphthyl group. It is done.
Specific examples of the compound having a succinic acid group partially substituted with a substituent such as ammonium salt, sodium salt or potassium salt of the sulfonic acid group include allylsulfosuccinate. More specifically, for example, Eleminol JS-2 (trade name) (manufactured by Sanyo Chemical Co., Ltd.), Latemuru S-120, S-180A or S-180 (trade name) (manufactured by Kao Corporation), etc. Can do.
また、上記スルホン酸基のアンモニウム塩、ナトリウム塩又はカリウム塩である基により一部が置換された、炭素数2〜4のアルキルエーテル基又は炭素数2〜4のポリアルキルエーテル基を有する化合物の具体例としては、例えばアクアロンHS−10又はKH−1025(商品名)(第一工業製薬(株)製)、アデカリアソープSE−1025N又はSR−1025(商品名)(旭電化工業(株)製)等を挙げることができる。 Further, a compound having an alkyl ether group having 2 to 4 carbon atoms or a polyalkyl ether group having 2 to 4 carbon atoms, which is partially substituted by a group which is an ammonium salt, sodium salt or potassium salt of the sulfonic acid group. Specific examples include, for example, Aqualon HS-10 or KH-1025 (trade name) (Daiichi Kogyo Seiyaku Co., Ltd.), Adeka Soap SE-1025N or SR-1025 (trade name) (Asahi Denka Kogyo Co., Ltd.) Manufactured).
また、ノニオン基を有するビニル単量体として具体的には、例えば、α−〔1−〔(アリルオキシ)メチル〕−2−(ノニルフェノキシ)エチル〕−ω−ヒドロキシポリオキシエチレン(商品名:アデカリアソープNE−20、NE−30、NE−40等、旭電化工業(株)製)、ポリオキシエチレンアルキルプロペニルフェニルエーテル(商品名:アクアロンRN−10、RN−20、RN−30、RN−50等、第一製薬工業(株)製)等を挙げることができる。
前記(b3)成分の使用量としては、重合安定性の観点から、前記(B)成分100質量部に対して、好ましくは10質量部以下、より好ましくは0.001〜5質量部である。
Specific examples of the vinyl monomer having a nonionic group include, for example, α- [1-[(allyloxy) methyl] -2- (nonylphenoxy) ethyl] -ω-hydroxypolyoxyethylene (trade name: ADEKA Rear soap NE-20, NE-30, NE-40, etc., manufactured by Asahi Denka Kogyo Co., Ltd., polyoxyethylene alkylpropenyl phenyl ether (trade names: Aqualon RN-10, RN-20, RN-30, RN- 50, manufactured by Dai-ichi Pharmaceutical Co., Ltd.).
The amount of the component (b3) used is preferably 10 parts by mass or less, more preferably 0.001 to 5 parts by mass with respect to 100 parts by mass of the component (B) from the viewpoint of polymerization stability.
前記(B)成分は上述した(b1)〜(b3)の各成分、及び前記(b4)成分(即ち「水」)を含む重合原液を重合して得られる重合体エマルジョン粒子である。前記(b4)成分の使用量としては、重合安定性の観点から、重合原液中の含有率として好ましくは30〜99.9質量%である。
前記重合原液には、(b1)〜(b4)成分に加え、更に種々の成分を混合することができる。
The component (B) is polymer emulsion particles obtained by polymerizing a polymerization stock solution containing the components (b1) to (b3) described above and the component (b4) (that is, “water”). The amount of the component (b4) used is preferably 30 to 99.9% by mass as the content in the polymerization stock solution from the viewpoint of polymerization stability.
In addition to the components (b1) to (b4), various components can be further mixed in the polymerization stock solution.
まず、前記重合原液には、以下の(b5)成分、
(b5)成分:(b2)成分と共重合可能な他のビニル単量体、
を混合することができる。このような(b5)成分を用いることは、生成する重合生成物の特性(ガラス転移温度、分子量、水素結合力、極性、分散安定性、耐候性、加水分解性珪素化合物(b1)の重合生成物との相溶性等)を制御する観点から好適である。
前記(b5)成分としては、例えば、アクリル酸エステル、メタクリル酸エステル、芳香族ビニル化合物、シアン化ビニル類の他、エポキシ基含有ビニル単量体、カルボニル基含有ビニル単量体、アニオン型ビニル単量体のような官能基を含有する単量体、等を挙げることができる。
First, the polymerization stock solution contains the following component (b5):
Component (b5): other vinyl monomer copolymerizable with component (b2),
Can be mixed. The use of such component (b5) means that the properties of the polymerization product to be produced (glass transition temperature, molecular weight, hydrogen bonding force, polarity, dispersion stability, weather resistance, polymerization of hydrolyzable silicon compound (b1)) From the viewpoint of controlling compatibility with the product.
Examples of the component (b5) include acrylic acid esters, methacrylic acid esters, aromatic vinyl compounds, vinyl cyanides, epoxy group-containing vinyl monomers, carbonyl group-containing vinyl monomers, anionic vinyl monomers. Examples thereof include a monomer containing a functional group such as a monomer.
前記(b5)成分が全ビニル単量体中に占める割合としては、好ましくは0.001〜30質量%であり、より好ましくは0.05〜10質量%の範囲である。このような使用量とすることは、ガラス転移温度、分子量、水素結合力、極性、分散安定性、耐候性、加水分解性珪素化合物(b1)の重合生成物との相溶性等を制御する観点から好適である。
また、前記重合原液には、連鎖移動剤を混合することができる。
The proportion of the component (b5) in the total vinyl monomer is preferably 0.001 to 30% by mass, and more preferably 0.05 to 10% by mass. The use amount is such that the glass transition temperature, molecular weight, hydrogen bonding force, polarity, dispersion stability, weather resistance, compatibility with the polymerization product of the hydrolyzable silicon compound (b1), and the like are controlled. To preferred.
Further, a chain transfer agent can be mixed in the polymerization stock solution.
このような連鎖移動剤としては、例えば、n−オクチルメルカプタン、n−ドデシルメルカプタン、t−ドデシルメルカプタンのようなアルキルメルカプタン類;ベンジルメルカプタン、ドデシルベンジルメルカプタンのような芳香族メルカプタン類;チオリンゴ酸のようなチオカルボン酸又はそれらの塩若しくはそれらのアルキルエステル類、又はポリチオール類、ジイソプロピルキサントゲンジスルフィド、ジ(メチレントリメチロールプロパン)キサントゲンジスルフィド及びチオグリコール、さらにはα−メチルスチレンのダイマー等のアリル化合物等を挙げることができる。 Examples of such chain transfer agents include alkyl mercaptans such as n-octyl mercaptan, n-dodecyl mercaptan and t-dodecyl mercaptan; aromatic mercaptans such as benzyl mercaptan and dodecyl benzyl mercaptan; thiomalic acid and the like. Thiocarboxylic acids or their salts or their alkyl esters, or polythiols, diisopropylxanthogen disulfide, di (methylenetrimethylolpropane) xanthogen disulfide and thioglycol, and allyl compounds such as dimers of α-methylstyrene be able to.
これら連鎖移動剤の使用量としては、全ビニル単量体合計量100質量部に対して、好ましくは0.001〜30質量部、より好ましくは0.05〜10質量部である。このような使用量とすることは、重合安定性の観点から好適である。
更に、前記重合原液には分散安定剤を混合することができる。
The amount of these chain transfer agents to be used is preferably 0.001 to 30 parts by mass, more preferably 0.05 to 10 parts by mass with respect to 100 parts by mass of the total amount of all vinyl monomers. Setting the amount to be used is suitable from the viewpoint of polymerization stability.
Furthermore, a dispersion stabilizer can be mixed in the polymerization stock solution.
このような分散安定剤としては、例えば、ポリカルボン酸及びスルホン酸塩からなる群から選ばれる各種の水溶性オリゴマー類や、ポリビニルアルコール、ヒドロキシエチルセルロース、澱粉、マレイン化ポリブタジエン、マレイン化アルキッド樹脂、ポリアクリル酸(塩)、ポリアクリルアミド、水溶性又は水分散性アクリル樹脂などの合成又は天然の水溶性又は水分散性の各種の水溶性高分子物質が挙げられ、これらの1種又は2種以上の混合物を使用することができる。
これらの分散安定剤の使用量としては、重合体エマルジョン粒子(B)100質量部に対して、好ましくは10質量部以下であり、より好ましくは0.001〜5質量部である。
上述した重合原液の重合は、重合触媒の存在下で実施するのが好ましい。
Examples of such a dispersion stabilizer include various water-soluble oligomers selected from the group consisting of polycarboxylic acids and sulfonates, polyvinyl alcohol, hydroxyethyl cellulose, starch, maleated polybutadiene, maleated alkyd resins, poly Synthetic or natural water-soluble or water-dispersible various water-soluble polymer substances such as acrylic acid (salt), polyacrylamide, water-soluble or water-dispersible acrylic resin, and the like, one or more of these Mixtures can be used.
The amount of these dispersion stabilizers used is preferably 10 parts by mass or less, more preferably 0.001 to 5 parts by mass with respect to 100 parts by mass of the polymer emulsion particles (B).
The polymerization of the polymerization stock solution described above is preferably carried out in the presence of a polymerization catalyst.
前記(b1)成分の重合触媒としては、例えば、塩酸、フッ酸等のハロゲン化水素類、酢酸、トリクロル酢酸、トリフルオロ酢酸、乳酸等のカルボン酸類、硫酸、p−トルエンスルホン酸等のスルホン酸類、アルキルベンゼンスルホン酸、アルキルスルホン酸、アルキルスルホコハク酸、ポリオキシエチレンアルキル硫酸、ポリオキシエチレンアルキルアリール硫酸、ポリオキシエチレンジスチリルフェニルエーテルスルホン酸等の酸性乳化剤類、酸性又は弱酸性の無機塩、フタル酸、リン酸、硝酸のような酸性化合物類;水酸化ナトリウム、水酸化カリウム、ナトリウムメチラート、酢酸ナトリウム、テトラメチルアンモニウムクロリド、テトラメチルアンモニウムヒドロキシド、トリブチルアミン、ジアザビシクロウンデセン、エチレンジアミン、ジエチレントリアミン、エタノールアミン類、γ−アミノプロピルトリメトキシシラン、γ−(2−アミノエチル)−アミノプロピルトリメトキシシランのような塩基性化合物類;ジブチル錫オクチレート、ジブチル錫ジラウレートのような錫化合物等を挙げることができる。 Examples of the polymerization catalyst for the component (b1) include hydrogen halides such as hydrochloric acid and hydrofluoric acid, carboxylic acids such as acetic acid, trichloroacetic acid, trifluoroacetic acid and lactic acid, and sulfonic acids such as sulfuric acid and p-toluenesulfonic acid. Acid emulsifiers such as alkylbenzene sulfonic acid, alkyl sulfonic acid, alkyl sulfosuccinic acid, polyoxyethylene alkyl sulfuric acid, polyoxyethylene alkyl aryl sulfuric acid, polyoxyethylene distyryl phenyl ether sulfonic acid, acidic or weakly acidic inorganic salts, phthalates Acid compounds such as acid, phosphoric acid and nitric acid; sodium hydroxide, potassium hydroxide, sodium methylate, sodium acetate, tetramethylammonium chloride, tetramethylammonium hydroxide, tributylamine, diazabicycloundecene, ethylene Basic compounds such as amines, diethylenetriamine, ethanolamines, γ-aminopropyltrimethoxysilane, γ- (2-aminoethyl) -aminopropyltrimethoxysilane; tin compounds such as dibutyltin octylate and dibutyltin dilaurate Etc.
中でも、加水分解性珪素化合物(b1)の重合触媒としては、重合触媒のみならず乳化剤としての作用を有する酸性乳化剤類、特に炭素数が5〜30のアルキルベンゼンスルホン酸(ドデシルベンゼンスルホン酸等)が非常に好ましい。
前記(b2)成分の重合触媒としては、熱又は還元性物質などによってラジカル分解してビニル単量体の付加重合を起こさせるラジカル重合触媒が好適である。水溶性又は油溶性の過硫酸塩、過酸化物、アゾビス化合物等が好ましく使用される。より具体的には、例えば、過硫酸カリウム、過硫酸ナトリウム、過硫酸アンモニウム、過酸化水素、t−ブチルヒドロパーオキシド、t−ブチルパーオキシベンゾエート、2,2−アゾビスイソブチロニトリル、2,2−アゾビス(2−ジアミノプロパン)ヒドロクロリド、2,2−アゾビス(2,4−ジメチルバレロニトリル)等が挙げられる。
Among them, as the polymerization catalyst for the hydrolyzable silicon compound (b1), not only the polymerization catalyst but also an acidic emulsifier having an action as an emulsifier, particularly an alkylbenzene sulfonic acid having 5 to 30 carbon atoms (such as dodecylbenzene sulfonic acid). Highly preferred.
The polymerization catalyst for the component (b2) is preferably a radical polymerization catalyst that undergoes radical decomposition by heat or a reducing substance to cause addition polymerization of a vinyl monomer. Water-soluble or oil-soluble persulfates, peroxides, azobis compounds and the like are preferably used. More specifically, for example, potassium persulfate, sodium persulfate, ammonium persulfate, hydrogen peroxide, t-butyl hydroperoxide, t-butyl peroxybenzoate, 2,2-azobisisobutyronitrile, 2, Examples include 2-azobis (2-diaminopropane) hydrochloride, 2,2-azobis (2,4-dimethylvaleronitrile), and the like.
なお、重合触媒の使用量としては、全ビニル単量体100質量部に対して、好ましくは0.001〜5質量部である。なお、重合速度の促進、及び70℃以下での低温の重合を望むときには、例えば重亜硫酸ナトリウム、塩化第一鉄、アスコルビン酸塩、ロンガリット等の還元剤をラジカル重合触媒と組み合わせて用いると有利である。 In addition, as a usage-amount of a polymerization catalyst, Preferably it is 0.001-5 mass parts with respect to 100 mass parts of all the vinyl monomers. When acceleration of the polymerization rate and polymerization at a low temperature of 70 ° C. or lower are desired, it is advantageous to use a reducing agent such as sodium bisulfite, ferrous chloride, ascorbate, or longalite in combination with the radical polymerization catalyst. is there.
本実施の形態において、前記(b1)成分の重合と、前記(b2)成分との重合とは、別々に実施することも可能であるが、同時に実施すると水素結合等によるミクロな有機・無機複合化が達成できるので好ましい。
前記(B)成分を得る方法としては、乳化剤がミセルを形成するのに十分な量の水の存在下に前記(b1)成分と前記(b2)成分とを重合する、いわゆる乳化重合が適している。
In the present embodiment, the polymerization of the component (b1) and the polymerization of the component (b2) can be carried out separately. This is preferable because it can be achieved.
As a method for obtaining the component (B), so-called emulsion polymerization in which the emulsifier polymerizes the component (b1) and the component (b2) in the presence of a sufficient amount of water to form micelles is suitable. Yes.
乳化重合の方法としては、例えば、前記(b1)成分と前記(b2)成分、更には必要に応じて前記(b3)成分を、そのまま、又は乳化した状態で、一括若しくは分割で、又は連続的に反応容器中に滴下し、前記重合触媒の存在下、好ましくは大気圧から必要により10MPaの圧力下で、約30〜150℃の反応温度で重合させる方法が挙げられる。場合によっては、これ以上の圧力で、又はこれ以下の温度条件で重合を行っても差し支えない。
なお、重合原液の配合としては、重合安定性の観点から、最終固形分量が0.1〜70質量%、好ましくは1〜55質量%の範囲になるように前記(b1)〜(b4)の各成分を配合するのが好ましい。
As a method of emulsion polymerization, for example, the component (b1) and the component (b2), and further, the component (b3) as necessary, as they are or in an emulsified state, in a lump or divided, or continuously And a method of polymerizing at a reaction temperature of about 30 to 150 ° C. in the presence of the polymerization catalyst, preferably from atmospheric pressure to 10 MPa as necessary. In some cases, the polymerization may be carried out at a higher pressure or lower temperature.
In addition, as a mixing | blending of superposition | polymerization stock solution, from a viewpoint of superposition | polymerization stability, the amount of final solid content is 0.1-70 mass%, Preferably it is 1-55 mass% of said (b1)-(b4). Each component is preferably blended.
更に、前記乳化重合を行なうに際しては、粒子径を適度に成長又は制御する観点から、シード重合法を用いることが好ましい。シード重合法とは、予め水相中にエマルジョン粒子(シード粒子)を存在させて重合させる方法である。シード重合法を行なう際の重合系中のpHとしては、好ましくは1.0〜10.0、より好ましくは1.0〜6.0である。pHは、燐酸二ナトリウムやボラックス、又は、炭酸水素ナトリウム、アンモニアなどのpH緩衝剤を用いて調節することが可能である。 Furthermore, when performing the emulsion polymerization, it is preferable to use a seed polymerization method from the viewpoint of appropriately growing or controlling the particle diameter. The seed polymerization method is a method in which emulsion particles (seed particles) are previously present in an aqueous phase for polymerization. The pH in the polymerization system when performing the seed polymerization method is preferably 1.0 to 10.0, more preferably 1.0 to 6.0. The pH can be adjusted using a pH buffer such as disodium phosphate, borax, sodium hydrogen carbonate, or ammonia.
なお、前記(B)成分を得る方法としては、前記(b1)成分を重合させるのに必要な前記(b3)成分及び前記(b4)成分の存在下、前記(b1)成分及び前記(b2)成分を、必要により溶剤存在下で重合した後、重合生成物がエマルジョンとなるまで水を添加する手法も適用できる。
前記(B)成分としては、得られるコーティング組成物を用いて形成される塗膜の基材密着性、塗膜間の密着性を向上させる観点から、コア層と、当該コア層を被覆する1層又は2層以上のシェル層とを備えたコア/シェル構造を有することが好ましい。そして、当該コア/シェル構造を形成する方法としては、前記乳化重合を多段で行なう、多段乳化重合が非常に有用である。
In addition, as a method of obtaining the component (B), the component (b1) and the component (b2) in the presence of the component (b3) and the component (b4) necessary for polymerizing the component (b1). A method in which water is added until the polymerization product becomes an emulsion after the components are polymerized in the presence of a solvent, if necessary, can also be applied.
As the component (B), from the viewpoint of improving the substrate adhesion of the coating film formed using the resulting coating composition and the adhesion between the coating films, the core layer and the core layer 1 are coated. It is preferable to have a core / shell structure including a layer or two or more shell layers. As a method for forming the core / shell structure, multistage emulsion polymerization in which the emulsion polymerization is performed in multiple stages is very useful.
多段乳化重合の例としてより具体的には、例えば第一段階として、前記(b3)成分及び前記(b4)成分の存在下、前記(b1)、(b2)、及び(b5)成分よりなる群から選択される少なくとも1種以上を重合してシード粒子を形成し、第二段階として、当該シード粒子の存在下、前記(b1)成分及び前記(b2)成分、更には必要に応じ前記(b5)成分を含む重合原液を添加して重合する(2段重合法)。3段以上の多段乳化重合を実施する場合は、例えば第三段階として、さらに前記(b1)成分及び前記(b2)成分、必要に応じ前記(b5)成分を含む重合原液を添加して重合することができる。このような方法は、重合安定性の観点からも好適である。 More specifically as an example of multi-stage emulsion polymerization, for example, as the first stage, in the presence of the component (b3) and the component (b4), a group consisting of the components (b1), (b2), and (b5) At least one selected from the above is polymerized to form seed particles, and in the second stage, in the presence of the seed particles, the component (b1) and the component (b2), and further, if necessary (b5) ) Polymerization is carried out by adding a polymerization stock solution containing the component (two-stage polymerization method). When carrying out multi-stage emulsion polymerization of three or more stages, for example, as a third stage, polymerization is carried out by adding a polymerization stock solution further containing the component (b1) and the component (b2) and, if necessary, the component (b5). be able to. Such a method is also suitable from the viewpoint of polymerization stability.
2段重合法においては、前記第一段階において用いられる重合原液中の固形分質量(M1)と、前記第二段階において添加される重合原液中の固形分質量(M2)の質量比としては、重合安定性の観点から、好ましくは(M1)/(M2)=9/1〜1/9、より好ましくは8/2〜2/8である。 In the two-stage polymerization method, as a mass ratio of the solid content mass (M1) in the polymerization stock solution used in the first stage and the solid content mass (M2) in the polymerization stock solution added in the second stage, From the viewpoint of polymerization stability, (M1) / (M2) = 9/1 to 1/9, more preferably 8/2 to 2/8.
また、前記コア/シェル構造としては、重合安定性の観点から、前記シード粒子の粒径分布(体積平均粒子径/数平均粒子径)が大きく変化することなく、前記第二段階の重合によって粒子径が増大した構造を有することが好ましい。なお、体積平均粒子径は、数平均粒子径と同様に測定し得る。
前記コア/シェル構造は、例えば、透過型電子顕微鏡等による形態観察や粘弾性測定による解析等により観察することができる。
前記コア/シェル構造のコア層のガラス転移温度(Tg)としては、好ましくは0℃以下である。この場合、得られる機能性塗膜の室温における柔軟性に優れ、厚膜化した場合の割れ等が生じにくくなるため好ましい。
なお、本実施の形態におけるTgは示差走査熱量測定装置(DSC)にて測定することができる。
Further, as the core / shell structure, from the viewpoint of polymerization stability, the particle size distribution (volume average particle size / number average particle size) of the seed particles does not change greatly, and the particles are obtained by the second stage polymerization. It is preferable to have a structure with an increased diameter. The volume average particle diameter can be measured in the same manner as the number average particle diameter.
The core / shell structure can be observed, for example, by morphological observation using a transmission electron microscope or the like, analysis by viscoelasticity measurement, or the like.
The glass transition temperature (Tg) of the core layer having the core / shell structure is preferably 0 ° C. or lower. In this case, the functional coating film obtained is excellent in flexibility at room temperature, and cracks and the like when it is thickened are less likely to occur, which is preferable.
In addition, Tg in this Embodiment can be measured with a differential scanning calorimeter (DSC).
前記(B)成分の粒子径は、10nm〜800nmである。この様な粒子径の範囲に調整し、粒子径が1nm〜400nmの前記(A)成分と組み合わせて組成物を形成することにより、光線透過率の著しい低下を招くこともなく塗膜屈折率、見掛け空隙率の制御が可能で、かつ防汚染性が良好である。また、前記(B)成分の粒子径を10nm〜100nmとすることは、得られる機能性塗膜の光線透過率向上の観点から好ましく、さらには20nm〜80nmが好ましい。
前記(A)成分と前記(B)成分の比(A)/(B)(質量比)としては、1000/100〜400/100、より好ましくは150/100〜350/100、さらには200/100〜300/100である。この範囲で配合されたコーティング組成物からは、塗膜屈折率が低く、光線透過率が高い防汚染性に優れた機能性塗膜が実現し得るため好ましい。
The particle size of the component (B) is 10 nm to 800 nm. By adjusting the particle diameter to such a range and forming the composition in combination with the component (A) having a particle diameter of 1 nm to 400 nm, the coating film refractive index without causing a significant decrease in light transmittance, Apparent porosity can be controlled and antifouling property is good. Moreover, it is preferable that the particle diameter of the said (B) component shall be 10 nm-100 nm from a viewpoint of the light transmittance improvement of the functional coating film obtained, and also 20 nm-80 nm are preferable.
The ratio (A) / (B) (mass ratio) of the component (A) to the component (B) is 1000/100 to 400/100, more preferably 150/100 to 350/100, and even 200 / 100-300 / 100. The coating composition blended in this range is preferable because a functional coating film having a low coating film refractive index and a high light transmittance and excellent antifouling property can be realized.
また、前記(A)成分の表面積(SA)と前記(B)成分の表面積(SB)との比(SA)/(SB)としては、好ましくは0.001〜1000の範囲である。なお表面積は、前記(A)成分及び前記(B)成分の各々の粒子径、及び各々の配合質量数から算出することができる。 The ratio (SA) / (SB) of the surface area (SA) of the component (A) and the surface area (SB) of the component (B) is preferably in the range of 0.001 to 1000. The surface area can be calculated from the particle diameter of each of the component (A) and the component (B) and the blending mass number.
本実施の形態のコーティング組成物には、その用途及び使用方法などに応じて、通常、塗料や成型用樹脂に添加配合される添加剤成分、例えば、光安定剤、紫外線吸収剤、増粘剤、レベリング剤、チクソ化剤、消泡剤、凍結安定剤、艶消し剤、架橋反応触媒、顔料、硬化触媒、架橋剤、充填剤、皮張り防止剤、分散剤、湿潤剤、酸化防止剤、紫外線吸収剤、レオロジーコントロール剤、成膜助剤、防錆剤、染料、可塑剤、潤滑剤、還元剤、防腐剤、防黴剤、消臭剤、黄変防止剤、静電防止剤又は帯電調整剤等をそれぞれの目的に応じて選択したり、組み合わせたりして配合することができる。
前記光安定剤としては、例えば、ヒンダードアミン系光安定剤が好ましく用いられる。中でも、分子内にラジカル重合性の二重結合を有するラジカル重合性光安定剤が好ましい。
In the coating composition of the present embodiment, additive components that are usually added to and blended with paints and molding resins, for example, light stabilizers, ultraviolet absorbers, thickeners, depending on the application and usage method. Leveling agent, thixotropic agent, antifoaming agent, freezing stabilizer, matting agent, crosslinking reaction catalyst, pigment, curing catalyst, crosslinking agent, filler, anti-skinning agent, dispersing agent, wetting agent, antioxidant, UV absorbers, rheology control agents, film-forming aids, rust inhibitors, dyes, plasticizers, lubricants, reducing agents, antiseptics, antifungal agents, deodorants, anti-yellowing agents, antistatic agents or electrification A regulator or the like can be selected or combined depending on the purpose.
As the light stabilizer, for example, a hindered amine light stabilizer is preferably used. Among these, a radical polymerizable light stabilizer having a radical polymerizable double bond in the molecule is preferable.
また、前記紫外線吸収剤としては、例えば有機系紫外線吸収剤を挙げることができる。このような有機系紫外線吸収剤としては、例えば、ベンゾフェノン系紫外線吸収剤、ベンゾトリアゾール系紫外線吸収剤、トリアジン系紫外線吸収剤が挙げられる。中でも、分子内にラジカル重合性の二重結合を有するラジカル重合性紫外線吸収剤を用いることが好ましい。また、紫外線吸収能の高いベンゾトリアゾール系紫外線吸収剤、トリアジン系紫外線吸収剤が好ましい。 Moreover, as said ultraviolet absorber, an organic type ultraviolet absorber can be mentioned, for example. Examples of such organic ultraviolet absorbers include benzophenone ultraviolet absorbers, benzotriazole ultraviolet absorbers, and triazine ultraviolet absorbers. Among these, it is preferable to use a radical polymerizable ultraviolet absorber having a radical polymerizable double bond in the molecule. Moreover, a benzotriazole type ultraviolet absorber and a triazine type ultraviolet absorber having high ultraviolet absorbing ability are preferable.
なお、前記光安定剤は、前記有機系紫外線吸収剤と併用することが好ましい。両者を併用することは、得られるコーティング組成物の耐候性向上に寄与し得る。
また、これらの有機系紫外線吸収剤や、光安定剤、各種添加剤成分は、前記(A)成分及び前記(B)成分と単に配合することも可能であるし、前記(B)成分を合成する際に共存させることも可能である。
The light stabilizer is preferably used in combination with the organic ultraviolet absorber. Using both in combination can contribute to improving the weather resistance of the resulting coating composition.
Moreover, these organic ultraviolet absorbers, light stabilizers, and various additive components can be simply blended with the component (A) and the component (B), or the component (B) is synthesized. It is also possible to coexist when doing so.
前記(C)成分は、下記式(1)、下記式(2)、又は下記式(3)で示される珪素化合物の加水分解縮合物である。珪素化合物としては、下記一般式(1)で表される加水分解性珪素化合物(c1)、一般式(2)で表される加水分解性珪素化合物(c2)を用いることが出来る。
R1 nSiX4−n(1)
(式中、R1は水素または炭素数1〜10のアルキル基、アルケニル基、アルキニル基、アリール基を表す。またこれらの置換基上にさらにハロゲン基、ヒドロキシ基、メルカプト基、アミノ基、(メタ)アクリロイル基、エポキシ基等の官能基を有していても良い。Xは加水分解基を表し、nは0〜3の整数である。加水分解基とは加水分解により水酸基が生じる基であればよく、ハロゲン原子、アルコキシ基、アシルオキシ基、アミノ基、フェノキシ基、オキシム基等が挙げられる。)
X3Si−R2 n−SiX3(2)
(式中、Xは加水分解基を表し、R2は炭素数1〜6のアルキレン基またはフェニレン基を表す。また、nは0または1である)
The component (C) is a hydrolysis condensate of a silicon compound represented by the following formula (1), the following formula (2), or the following formula (3). As the silicon compound, a hydrolyzable silicon compound (c1) represented by the following general formula (1) and a hydrolyzable silicon compound (c2) represented by the general formula (2) can be used.
R 1 n SiX 4-n (1)
(Wherein R 1 represents hydrogen or an alkyl group having 1 to 10 carbon atoms, an alkenyl group, an alkynyl group or an aryl group. Further, a halogen group, a hydroxy group, a mercapto group, an amino group, ( It may have a functional group such as a (meth) acryloyl group, an epoxy group, etc. X represents a hydrolyzable group, n is an integer of 0 to 3. The hydrolyzable group is a group that generates a hydroxyl group by hydrolysis. And may be any halogen atom, alkoxy group, acyloxy group, amino group, phenoxy group, oxime group, etc.)
X 3 Si—R 2 n —SiX 3 (2)
(Wherein X represents a hydrolyzable group, R 2 represents an alkylene group having 1 to 6 carbon atoms or a phenylene group, and n is 0 or 1)
加水分解性珪素化合物(c1、c2)として具体的に用いられるものは、テトラメトキシシラン、テトラエトキシシラン、テトラ(n−プロポキシ)シラン、テトラ(i−プロポキシ)シラン、テトラ(n−ブトキシ)シラン、テトラ(i−ブトキシ)シラン、テトラ−sec−ブトキシシラン、テトラ−tert−ブトキシシラン、トリメトキシシラン、トリエトキシシラン、メチルトリメトキシシラン、メチルトリエトキシシラン、エチルトリメトキシシラン、エチルトリエトキシシラン、プロピルトリメトキシシラン、プロピルトリエトキシシラン、イソブチルトリエトキシシラン、シクロヘキシルトリメトキシシラン、フェニルトリメトキシシラン、フェニルトリエトキシシラン、ジメトキシシラン、ジエトキシシラン、メチルジメトキシシラン、メチルジエトキシシラン、ジメチルジメトキシシラン、ジメチルジエトキシシラン、ビス(トリメトキシシリル)メタン、ビス(トリエトキシシリル)メタン、ビス(トリフェノキシシリル)メタン、ビス(トリメトキシシリル)エタン、ビス(トリエトキシシリル)エタン、ビス(トリフェノキシシリル)エタン、1,3−ビス(トリメトキシシリル)プロパン、1,3−ビス(トリエトキシシリル)プロパン、1,3−ビス(トリフェノキシシリル)プロパン、1,4−ビス(トリメトキシシリル)ベンゼン、1,4−ビス(トリエトキシシリル)ベンゼン、3−クロロプロピルトリメトキシシラン、3−クロロプロピルトリエトキシシラン、3−ヒドロキシプロピルトリメトキシシラン、3−ヒドロキシプロピルトリエトキシシラン、3−メルカプトプロピルトリメトキシシラン、3−メルカプトプロピルトリエトキシシラン、3−グリシドキシプロピルトリメトキシシラン、3−グリシドキシプロピルトリエトキシシラン、3−アクリロキシプロピルトリメトキシシラン、3−アクリロキシプロピルトリエトキシシラン、3−メタクリロキシプロピルトリメトキシシラン、3−メタクリロキシプロピルトリエトキシシラン、テトラアセトキシシラン、テトラキス(トリクロロアセトキシ)シラン、テトラキス(トリフルオロアセトキシ)シラン、トリアセトキシシラン、トリス(トリクロロアセトキシ)シラン、トリス(トリフルオロアセトキシ)シラン、メチルトリアセトキシシラン、メチルトリス(トリクロロアセトキシ)シラン、テトラクロロシラン、テトラブロモシラン、テトラフルオロシラン、トリクロロシラン、トリブロモシラン、トリフルオロシラン、メチルトリクロロシラン、メチルトリブロモシラン、メチルトリフルオロシラン、テトラキス(メチルエチルケトキシム)シラン、トリス(メチルエチルケトキシム)シラン、メチルトリス(メチルエチルケトキシム)シラン、フェニルトリス(メチルエチルケトキシム)シラン、ビス(メチルエチルケトキシム)シラン、メチルビス(メチルエチルケトキシム)シラン、ヘキサメチルジシラザン、ヘキサメチルシクロトリシラザン、ビス(ジメチルアミノ)ジメチルシラン、ビス(ジエチルアミノ)ジメチルシラン、ビス(ジメチルアミノ)メチルシラン、ビス(ジエチルアミノ)メチルシラン等が挙げられる。 Specific examples of hydrolyzable silicon compounds (c1, c2) include tetramethoxysilane, tetraethoxysilane, tetra (n-propoxy) silane, tetra (i-propoxy) silane, and tetra (n-butoxy) silane. , Tetra (i-butoxy) silane, tetra-sec-butoxysilane, tetra-tert-butoxysilane, trimethoxysilane, triethoxysilane, methyltrimethoxysilane, methyltriethoxysilane, ethyltrimethoxysilane, ethyltriethoxysilane , Propyltrimethoxysilane, propyltriethoxysilane, isobutyltriethoxysilane, cyclohexyltrimethoxysilane, phenyltrimethoxysilane, phenyltriethoxysilane, dimethoxysilane, diethoxysilane, methyldimethyl Xysilane, methyldiethoxysilane, dimethyldimethoxysilane, dimethyldiethoxysilane, bis (trimethoxysilyl) methane, bis (triethoxysilyl) methane, bis (triphenoxysilyl) methane, bis (trimethoxysilyl) ethane, bis ( Triethoxysilyl) ethane, bis (triphenoxysilyl) ethane, 1,3-bis (trimethoxysilyl) propane, 1,3-bis (triethoxysilyl) propane, 1,3-bis (triphenoxysilyl) propane, 1,4-bis (trimethoxysilyl) benzene, 1,4-bis (triethoxysilyl) benzene, 3-chloropropyltrimethoxysilane, 3-chloropropyltriethoxysilane, 3-hydroxypropyltrimethoxysilane, 3- Hydroxypropyltrie Xysilane, 3-mercaptopropyltrimethoxysilane, 3-mercaptopropyltriethoxysilane, 3-glycidoxypropyltrimethoxysilane, 3-glycidoxypropyltriethoxysilane, 3-acryloxypropyltrimethoxysilane, 3-acrylic Roxypropyltriethoxysilane, 3-methacryloxypropyltrimethoxysilane, 3-methacryloxypropyltriethoxysilane, tetraacetoxysilane, tetrakis (trichloroacetoxy) silane, tetrakis (trifluoroacetoxy) silane, triacetoxysilane, tris (trichloro Acetoxy) silane, tris (trifluoroacetoxy) silane, methyltriacetoxysilane, methyltris (trichloroacetoxy) silane, tetrachlorosilane, Tetrabromosilane, tetrafluorosilane, trichlorosilane, tribromosilane, trifluorosilane, methyltrichlorosilane, methyltribromosilane, methyltrifluorobromo, tetrakis (methylethylketoxime) silane, tris (methylethylketoxime) silane, methyltris (methylethylketo) Ximem) silane, phenyltris (methylethylketoxime) silane, bis (methylethylketoxime) silane, methylbis (methylethylketoxime) silane, hexamethyldisilazane, hexamethylcyclotrisilazane, bis (dimethylamino) dimethylsilane, bis (diethylamino) dimethyl Examples include silane, bis (dimethylamino) methylsilane, and bis (diethylamino) methylsilane.
また、下記一般式(3)にて表される加水分解性珪素化合物(c3)も好適に用いることができる。具体例としては、テトラメトキシシランの部分加水分解縮合物(商品名「Mシリケート51」多摩化学工業(株)製、商品名「MSI51」コルコート(株)製)、商品名「MS51」、「MS56」三菱化学(株)製)、テトエトキシシランの部分加水分解縮合物(商品名「シリケート35」、「シリケート45」多摩化学工業(株)製、商品名「ESI40」、「ESI48」コルコート(株)製)、テトラメトキシシランとテトラエトキシシランとの共部分加水分解縮合物(商品名「FR−3」多摩化学工業(株)製、商品名「EMSi48」コルコート(株)製)などを挙げることができる。
R3−(O−Si(OR3)2)n−OR3(3)
(式中、R3は炭素数1〜6のアルキル基を表す。nは2〜8の整数である。)
In addition, a hydrolyzable silicon compound (c3) represented by the following general formula (3) can also be suitably used. Specific examples include a partial hydrolysis condensate of tetramethoxysilane (trade name “M silicate 51” manufactured by Tama Chemical Industry Co., Ltd., trade name “MSI51” manufactured by Colcoat Co., Ltd.), trade names “MS51”, “MS56”. “Mitsubishi Chemical Co., Ltd.”, partially hydrolyzed condensate of tetoethoxysilane (trade names “Silicate 35”, “Silicate 45”, manufactured by Tama Chemical Industry Co., Ltd., trade names “ESI 40”, “ESI 48” )), A co-hydrolyzed condensate of tetramethoxysilane and tetraethoxysilane (trade name “FR-3” manufactured by Tama Chemical Industry Co., Ltd., trade name “EMSi48” manufactured by Colcoat Co., Ltd.) Can do.
R 3 — (O—Si (OR 3 ) 2 ) n —OR 3 (3)
(In the formula, R 3 .n represents an alkyl group having 1 to 6 carbon atoms is an integer of 2-8.)
上記加水分解性珪素化合物は、単独または2種以上の混合物として用いることができる。また、上記加水分解性珪素化合物は予め加水分解と縮合を進めてから配合することもできるが、金属酸化物(A)及び又はエマルジョン粒子(B)に配合して使用してもよい。
また、前記(A)成分と前記(C)成分の質量比は、好ましくはC/A=0.2/100〜300/100であり、好ましくはC/A=1/100〜100/100、さらにはC/A=30/100〜75/100である。C/Aは、高温条件下での接触角を下げるという観点から0.2/100以上、機能性塗膜の強度の観点から300/100である。
The said hydrolysable silicon compound can be used individually or in mixture of 2 or more types. The hydrolyzable silicon compound can be added after advance hydrolysis and condensation in advance, but may be added to the metal oxide (A) and / or the emulsion particles (B).
The mass ratio of the component (A) to the component (C) is preferably C / A = 0.2 / 100 to 300/100, preferably C / A = 1/100 to 100/100, Furthermore, C / A = 30/100 to 75/100. C / A is 0.2 / 100 or more from the viewpoint of lowering the contact angle under high temperature conditions, and 300/100 from the viewpoint of the strength of the functional coating film.
本発明で使用される基材としては、太陽電池のカバーとして使用される場合には例えば、ガラスや樹脂等が好ましく用いられ、可視光における透過率が、好ましくは80%以上であり、さらに好ましくは92%〜99%である。また光線透過率を向上させる目的でテクスチャーを形成していてもよい。ここでのテクスチャーとは、ガラスの片面又は両面に規則的に凹凸構造を有しているガラスのことである。
また、強化ガラスや合わせガラス、複層ガラスなども目的に応じて使用することができる。
樹脂としてはアクリル樹脂、ポリカーボネート樹脂、環状ポリオレフィン樹脂、ポリエチレンテレフタレート樹脂、エチレン−フルオロエチレン共重合体などが例示でき、これら樹脂基材には耐候性を付与する目的で紫外線吸収剤などの耐候剤等を更に練り込んでも良い。
本発明のコーティング組成物は、特に限定されるものではないが、水等の溶媒等に溶解乃至分散させた状態として調製することができる。
As a base material used in the present invention, when used as a cover of a solar cell, for example, glass or resin is preferably used, and the transmittance in visible light is preferably 80% or more, and more preferably. Is 92% to 99%. A texture may be formed for the purpose of improving the light transmittance. The texture here is glass having a regular concavo-convex structure on one side or both sides of the glass.
Further, tempered glass, laminated glass, multilayer glass, and the like can be used depending on the purpose.
Examples of the resin include acrylic resins, polycarbonate resins, cyclic polyolefin resins, polyethylene terephthalate resins, ethylene-fluoroethylene copolymers, etc., and weathering agents such as ultraviolet absorbers for the purpose of imparting weather resistance to these resin substrates. May be further kneaded.
The coating composition of the present invention is not particularly limited, but can be prepared in a state dissolved or dispersed in a solvent such as water.
また、本発明の機能性塗膜は、例えば、水等の溶媒等に分散させた前記コーティング組成物(「水分散体」と略記することがある)を前記基材上に塗工し、乾燥して形成される。ここで、水分散体の固形分濃度としては、好ましくは0.01〜60質量%、より好ましくは1〜40質量%である。また、水分散体の粘度としては、好ましくは20℃において0.1〜100000mPa・s、好ましくは1〜10000mPa・sである。更に、前記塗工方法としては、例えばスプレー吹き付け法、フローコーティング法、ロールコート法、刷毛塗り法、ディップコーティング法、スピンコーティング法、スクリーン印刷法、キャスティング法、グラビア印刷法、フレキソ印刷法等が挙げられる。なお、前記機能性塗膜は、例えば、前記塗膜を前記基材上で乾燥した後、所望により好ましくは20℃〜500℃、より好ましくは40℃〜250℃での熱処理や紫外線照射等を行い、形成することも可能である。補修を目的にする場合には、該機能性塗膜にスプレーコートすることが好ましい。この場合、設置した現場でコーティングすることが可能となり好ましい。また、長さが1mを超えるような大判の機能性塗膜に再度積層する場合にはフローコート、ディップコートして機能性塗膜を得る方法が、ハンドリング、コストの面から好ましい。 In addition, the functional coating film of the present invention is, for example, coated on the substrate with the coating composition dispersed in a solvent such as water (sometimes abbreviated as “water dispersion”) and dried. Formed. Here, as solid content concentration of an aqueous dispersion, Preferably it is 0.01-60 mass%, More preferably, it is 1-40 mass%. The viscosity of the aqueous dispersion is preferably 0.1 to 100,000 mPa · s, preferably 1 to 10,000 mPa · s at 20 ° C. Further, examples of the coating method include spray spraying, flow coating, roll coating, brush coating, dip coating, spin coating, screen printing, casting, gravure printing, flexographic printing, and the like. Can be mentioned. In addition, the functional coating film is preferably subjected to heat treatment or ultraviolet irradiation at 20 ° C. to 500 ° C., more preferably 40 ° C. to 250 ° C., if desired, after drying the coating film on the substrate. It is also possible to do and form. For the purpose of repair, it is preferable to spray coat the functional coating film. In this case, it is possible to perform coating at an installed site, which is preferable. Moreover, when laminating again on a large functional coating film having a length exceeding 1 m, a method of obtaining a functional coating film by flow coating or dip coating is preferable from the viewpoint of handling and cost.
本発明の機能性塗膜に設ける塗膜は乾燥後の膜厚が10nm〜1000nm、好ましくは50nm〜750nm、さらには80nm〜300nmが好ましい。単層の厚みが10nmよりも小さい場合には膜厚の制御が難しくなり凹凸のある基材に対しては塗膜のムラが発生し、1000nmを超えると光の干渉により、例えばシリコンの吸収波長範囲の中で比較的エネルギー効率の高い500nm〜1000nmの波長範囲で光線透過率の向上効果が低下する傾向にある。
ここで本発明の光線透過率とは日本電色工業製NDH2000によって測定された全光線透過率のことである。
The coating film provided on the functional coating film of the present invention has a film thickness after drying of 10 nm to 1000 nm, preferably 50 nm to 750 nm, and more preferably 80 nm to 300 nm. When the thickness of the single layer is smaller than 10 nm, it becomes difficult to control the film thickness, and unevenness of the coating film occurs on the uneven substrate, and when it exceeds 1000 nm, for example, the absorption wavelength of silicon due to light interference Within the range, the effect of improving the light transmittance tends to decrease in the wavelength range of 500 nm to 1000 nm, which is relatively high in energy efficiency.
Here, the light transmittance of the present invention is the total light transmittance measured by NDH2000 manufactured by Nippon Denshoku Industries Co., Ltd.
本発明の機能性塗膜の屈折率は1.3〜1.48であり、1.35〜1.45が好ましい。塗膜の屈折率は使用される基材によって適宜選択することができるが、屈折率が1.3よりも低い場合には、砂消しを用いた強い強度の擦過性試験には耐えられない場合がある。屈折率が1.48を超える場合には反射防止効果が小さくなる。ここで本発明の屈折率とは大塚電子製FE−3000によって測定された屈折率(633nm)のことである。 The refractive index of the functional coating film of the present invention is 1.3 to 1.48, preferably 1.35 to 1.45. The refractive index of the coating can be selected as appropriate depending on the substrate used, but if the refractive index is lower than 1.3, it cannot withstand a strong scratch test using sandblasting. There is. When the refractive index exceeds 1.48, the antireflection effect is reduced. Here, the refractive index of the present invention is a refractive index (633 nm) measured by FE-3000 manufactured by Otsuka Electronics.
本発明の塗膜表面の空孔径は2〜500nmであることが好ましく、5〜400nmがより好ましく、10〜300nmがさらに好ましい。塗膜表面の空孔径は電子顕微鏡写真の25万倍の観察から求めることができる。空孔径とは、塗膜表面に形成された円形、楕円形、矩形などの空孔であって、縦500nm、横500nmの範囲で目視で観察される一つの空孔の最大径、または最大幅である。本発明の空孔径が2nmよりも小さい場合には塗膜の空隙率が低く反射防止性能が十分とは言えず、500nmよりも大きい場合には塗膜表面の粗さにより光線透過率が低下することがある。 The pore diameter of the coating film surface of the present invention is preferably 2 to 500 nm, more preferably 5 to 400 nm, and further preferably 10 to 300 nm. The pore diameter on the surface of the coating film can be determined from observation 250,000 times the electron micrograph. The hole diameter is a hole formed in the surface of the coating film, such as a circle, an ellipse, or a rectangle. The maximum diameter or the maximum width of one hole that is visually observed in the range of 500 nm in length and 500 nm in width. It is. When the pore diameter of the present invention is smaller than 2 nm, the porosity of the coating film is low and the antireflection performance cannot be said to be sufficient, and when it is larger than 500 nm, the light transmittance decreases due to the roughness of the coating film surface. Sometimes.
本発明の空孔は金属酸化物やエマルジョン粒子の粒子間に形成されるものであったり、溶剤が揮発する際に形成される空孔などである。この空孔は塗膜内部に形成されていてもよい。この塗膜表面、内部に形成された空孔、すなわち塗膜の空隙によって塗膜の屈折率が低下する効果があり反射防止効果を付与することができる。ここでいう空隙率は60%以下が好ましい。空隙率が60%を超えることは反射防止の観点からは好ましいが、強度が低下し実用的であるとは言い難い。従って、反射防止性、防汚性の観点からは見掛け空隙率が20〜60%であることが好ましく、さらには25〜40%が好ましい。 The vacancies of the present invention are those formed between metal oxide and emulsion particles, or vacancies formed when the solvent volatilizes. These pores may be formed inside the coating film. There is an effect of reducing the refractive index of the coating film due to the voids formed on the surface and inside of the coating film, that is, the voids of the coating film, and an antireflection effect can be imparted. The porosity here is preferably 60% or less. It is preferable that the porosity exceeds 60% from the viewpoint of antireflection, but it is difficult to say that the strength is lowered and practical. Therefore, from the viewpoint of antireflection and antifouling properties, the apparent porosity is preferably 20 to 60%, and more preferably 25 to 40%.
空隙率Va(%)を求める一例としては、塗膜表面の空孔径の単位面積あたりの円相当径の平均値(2d)と含まれる空孔の個数(n)を用いて、空孔を球に換算した場合の体積(Vo)を求める。1000nmの膜厚の塗膜体積(V1)に含まれるその換算球の体積(Vo)から求めることができる。
Vo=n4/3πd3
Va(%)=Vo/V1×100
As an example for determining the porosity Va (%), the average value of the equivalent circle diameter per unit area (2d) of the pore diameter on the coating film surface and the number of included pores (n) are used to divide the pores into spheres. The volume (Vo) when converted to is obtained. It can be determined from the volume (Vo) of the converted sphere contained in the coating film volume (V1) having a film thickness of 1000 nm.
Vo = n4 / 3πd 3
Va (%) = Vo / V1 × 100
ここで円相当径には一般的に以下の定義がある。投影面積円相当径は、粒子の投影面積と同じ面積を持つ円の直径であり、Heywood径とも呼ぶ。投影周長円相当径は、粒子の投影図形の周長に等しい円周をもつ円の直径で,おもに粒子の形状評価に用いる。外接および内接円相当径は、粒子の投影像に外接および内接する円の直径で、おもに粒子の形状評価に用いる。上記の円相当径の他に、顕微鏡法による粒径の計測、表示の仕方として、統計的径としては次の三種がある。マーチン(Martin)径は一定方向で粒子の投影面積を二等分する線分の長さ。フェレー(Feret)径は、粒子をはさむ一定方向の二本の平行線の間隔。定方向最大径は、一定方向での各粒子の最大幅である。 Here, the equivalent circle diameter generally has the following definition. The projected area equivalent circle diameter is the diameter of a circle having the same area as the projected area of the particles, and is also called the Heywood diameter. The projected circumference equivalent circle diameter is the diameter of a circle having a circumference equal to the circumference of the projected figure of the particle, and is mainly used for evaluating the shape of the particle. The circumscribed and inscribed circle equivalent diameters are the diameters of the circle circumscribed and inscribed on the projected image of the particle, and are mainly used for evaluating the shape of the particle. In addition to the above-mentioned equivalent circle diameter, there are the following three types of statistical diameters for measuring and displaying the particle diameter by microscopy. The Martin diameter is the length of a line segment that bisects the projected area of a particle in a fixed direction. The Feret diameter is the distance between two parallel lines in a certain direction between the particles. The maximum diameter in the fixed direction is the maximum width of each particle in a fixed direction.
また、空隙率(Vb)を求める方法としては、機能性塗膜を構成する材料の仕込み質量(W)と比重(K)(文献値)から求めた体積率(V)と、文献値から求めた屈折率(Nref)とから計算された機能性塗膜の屈折率(Ncal)を基準に、実験で求めた機能性塗膜の屈折率(Nmeas)とを用いて以下の式から光学的に求める方法がある。
Vb(%)=(Ncal−Nmeas)/(Ncal−1)×100
Moreover, as a method of calculating | requiring porosity (Vb), it calculates | requires from the volume ratio (V) calculated | required from the preparation mass (W) and specific gravity (K) (document value) of the material which comprises a functional coating film, and a document value. Based on the refractive index (Nmeas) of the functional coating film obtained from the experiment, the refractive index (Nmeas) of the functional coating film calculated based on the refractive index (Nref) calculated from There is a way to ask.
Vb (%) = (Ncal-Nmeas) / (Ncal-1) × 100
物理的方法により空隙率を求める方法としては、ブリストー法があげられる。ターンテーブル型吸液性試験機(熊谷理機製)を用いて塗膜の飽和吸水量を測定して求める方法であり、Lucas−Washburnの理論式を用いて求めることができる。
V2=(dtγcosθ/4η)0.5
d:管径、t:接触時間、γ:表面張力、θ:接触角、η:粘度
この吸水量(V2)と塗膜の体積(V3)から空隙率Vc(%)を換算することができる。
Vc(%)=V2/V3×100
The Bristow method is a method for obtaining the porosity by a physical method. This is a method for determining the saturated water absorption amount of a coating film by using a turntable type liquid absorption tester (manufactured by Kumagai Riki Co., Ltd.), and can be determined using a Lucas-Washburn theoretical formula.
V2 = (dtγcos θ / 4η) 0.5
d: tube diameter, t: contact time, γ: surface tension, θ: contact angle, η: viscosity The porosity Vc (%) can be converted from the water absorption (V2) and the volume (V3) of the coating film. .
Vc (%) = V2 / V3 × 100
この他にも窒素吸着法、水銀圧入法など公知の方法を用いることも出来る。
また、本発明で使用することができる空隙率が20%未満ある場合は塗膜の強度が向上するため反射鏡などに使用することができる。反射鏡に使用する場合、空隙率は10〜20%がさらに好ましい。
In addition, a known method such as a nitrogen adsorption method or a mercury intrusion method can also be used.
Moreover, since the intensity | strength of a coating film improves when the porosity which can be used by this invention is less than 20%, it can be used for a reflective mirror. When used for a reflecting mirror, the porosity is more preferably 10 to 20%.
尚、反射鏡として使用される場合、本発明で使用される基材としては、例えば、ガラス、セラミック及びプラスチック(樹脂)などの基板上に金属メッキ又は金属コーティング(例えば蒸着によるコーティング)を施したり、上記基板と金属板又は金属箔とを透明な接着剤により貼り合わせたりすることで形成された反射層を備え、太陽光の反射機能を有する平面状又は曲面状の反射基材が挙げられる。また、用いる基板及び/又は反射層の種類に応じて、その基板及び/又は反射層を保護する目的で、反射基材は、透明層を基板及び/又は反射層に積層して備えるものであってもよい。透明層の素材としては、例えば、ガラス、アクリル樹脂、ポリカーボネート樹脂、環状ポリオレフィン樹脂、ポリエチレンテレフタレート樹脂、エチレン−フルオロエチレン共重合体が挙げられる。これらは1種を単独で又は2種以上を組み合わせて用いることもできる。また、基材として、表面に鏡面処理が施されたガラス基材を用いることも耐久性の観点から好ましい。これら基材の可視光における反射率は好ましくは80%以上であり、さらには85%以上が好ましい。
尚、本実施の形態に言う「塗膜」は、必ずしも連続膜である必要はなく、不連続膜、島状分散膜等の態様であっても構わない。
In addition, when used as a reflecting mirror, the base material used in the present invention is, for example, metal plating or metal coating (for example, coating by vapor deposition) on a substrate such as glass, ceramic and plastic (resin). A planar or curved reflective substrate having a reflective layer formed by bonding the substrate and a metal plate or a metal foil together with a transparent adhesive, and having a sunlight reflecting function. Further, depending on the type of substrate and / or reflective layer used, the reflective base material is provided with a transparent layer laminated on the substrate and / or reflective layer for the purpose of protecting the substrate and / or reflective layer. May be. Examples of the material for the transparent layer include glass, acrylic resin, polycarbonate resin, cyclic polyolefin resin, polyethylene terephthalate resin, and ethylene-fluoroethylene copolymer. These may be used alone or in combinations of two or more. Moreover, it is also preferable from a durable viewpoint to use the glass base material by which the mirror surface process was performed as a base material. The reflectance of these base materials in visible light is preferably 80% or more, and more preferably 85% or more.
The “coating film” referred to in the present embodiment is not necessarily a continuous film, and may be a discontinuous film, an island-shaped dispersion film, or the like.
次に、実施例及び比較例を挙げて本実施の形態をより具体的に説明するが、本実施の形態はその要旨を超えない限り、以下の実施例に限定されるものではない。なお、各種物性は下記の方法で評価した。
1.全光線透過率
濁度計(日本電色工業製NDH2000)を用い、JIS−K7105に準じて機能性塗膜の全光線透過率を測定した。
2.屈折率
膜厚計(大塚電子製FE−3000)を用い、機能性塗膜の屈折率(633nm)を測定した。
3.接触角
機能性塗膜の塗膜の最表面に脱イオン水の水滴を乗せ、23℃で10秒放置した後、接触角計(協和界面科学製 CA−X150型接触角計)を用いて測定した。
4.空孔径、空隙率
電子顕微鏡を用いて塗膜表面を25万倍で観察し、その表面の空孔径の最大直径、最大幅を求めた。さらに、外接円相当径を求めた。塗膜体積は1辺1000nmの正方形の面積と膜厚から求め、その結果から空隙率を算出した。
Next, the present embodiment will be described more specifically with reference to examples and comparative examples. However, the present embodiment is not limited to the following examples unless it exceeds the gist. Various physical properties were evaluated by the following methods.
1. Total light transmittance The total light transmittance of the functional coating film was measured according to JIS-K7105 using a turbidimeter (NDH2000 manufactured by Nippon Denshoku Industries Co., Ltd.).
2. Refractive index A refractive index (633 nm) of the functional coating film was measured using a film thickness meter (FE-3000 manufactured by Otsuka Electronics Co., Ltd.).
3. Contact angle A drop of deionized water was placed on the outermost surface of the functional coating film, left at 23 ° C. for 10 seconds, and then measured using a contact angle meter (CA-X150 type contact angle meter manufactured by Kyowa Interface Science). did.
4). Pore diameter and porosity The surface of the coating film was observed at 250,000 times using an electron microscope, and the maximum diameter and the maximum width of the pore diameter on the surface were determined. Furthermore, the circumscribed circle equivalent diameter was determined. The volume of the coating film was determined from the area of a square having a side of 1000 nm and the film thickness, and the porosity was calculated from the result.
[製造例1]重合体エマルジョン粒子(B−1)水分散体の合成
かくはん機、還流冷却器、滴下槽及び温度計を取りつけた反応容器に、水212部及び「アデカリアソープSE1025N」の25%水溶液1部を投入し、反応容器内を80℃とした。次に、アクリル酸2部、ダイアセトンアクリルアミド2部、メタクリル酸メチル51部、アクリル酸ブチル5部、2-ヒドロキシメタクリル酸エチル1部を混合し、該モノマー混合液に、「アデカリアソープSE1025N」の25%水溶液10部、過硫酸アンモニウムの2%水溶液10部の混合液とをホモジナイザーによりプレ乳化液とし、滴下槽より反応容器中へ2時間かけて添加した。添加中及び添加が終了してからさらに1時間、反応容器中の温度を80℃に保った。この段階でのエマルジョンの数平均粒径は10nmであった。引き続き、過硫酸アンモニウムの2%水溶液10部、N-イソプロピルアクリルアミド140部と水600部の混合液とアクリル酸ブチル5g、フェニルトリメトキシシラン10g、3-メタクリロキシプロピルトリメトキシシラン0.2gを滴下槽より該反応容器内に添加し始め、2.5時間かけて添加を終了させた。添加中及び添加終了後1時間、反応容器内液温を80℃に保った後、50℃まで冷却し、エタノールの60%水溶液780部を徐々に該反応容器内に添加した。エタノール水溶液の添加終了後室温まで冷却し、固形分10%に調整した。数平均粒径が100nmの重合体エマルジョン粒子(B−1)水分散体エマルジョンを得た。
[Production Example 1] Synthesis of polymer emulsion particles (B-1) aqueous dispersion In a reaction vessel equipped with a stirrer, a reflux condenser, a dropping tank and a thermometer, 212 parts of water and 25 of "ADEKA rear soap SE1025N" 1 part of a% aqueous solution was added, and the inside of the reaction vessel was brought to 80 ° C. Next, 2 parts of acrylic acid, 2 parts of diacetone acrylamide, 51 parts of methyl methacrylate, 5 parts of butyl acrylate, and 1 part of 2-hydroxyethyl methacrylate were mixed, and this monomer mixture was mixed with “Adekari Soap SE1025N”. A mixture of 10 parts of a 25% aqueous solution and 10 parts of a 2% aqueous solution of ammonium persulfate was made into a pre-emulsion liquid by a homogenizer and added into the reaction vessel from a dropping tank over 2 hours. The temperature in the reaction vessel was kept at 80 ° C. during the addition and for another hour after the addition was completed. The number average particle size of the emulsion at this stage was 10 nm. Subsequently, 10 parts of a 2% aqueous solution of ammonium persulfate, 140 parts of N-isopropylacrylamide and 600 parts of water, 5 g of butyl acrylate, 10 g of phenyltrimethoxysilane, and 0.2 g of 3-methacryloxypropyltrimethoxysilane were added dropwise. Further, the addition was started in the reaction vessel, and the addition was completed over 2.5 hours. The liquid temperature in the reaction vessel was kept at 80 ° C. during the addition and for 1 hour after the completion of the addition, and then cooled to 50 ° C., and 780 parts of a 60% ethanol aqueous solution was gradually added into the reaction vessel. After the addition of the ethanol aqueous solution, the mixture was cooled to room temperature and adjusted to a solid content of 10%. A polymer emulsion particle (B-1) aqueous dispersion emulsion having a number average particle diameter of 100 nm was obtained.
[製造例2]重合体エマルジョン粒子(B−2)水分散体の合成
還流冷却器、滴下槽、温度計および撹拌装置を有する反応器に、イオン交換水1600g、ドデシルベンゼンスルホン酸6gを投入した後、撹拌下で温度を80℃に加温した。これに、ジメチルジメトキシシラン185g、フェニルトリメトキシシラン117gの混合液を反応容器中の温度を80℃に保った状態で約2時間かけて滴下し、その後、反応容器中の温度が80℃の状態で約1時間撹拌を続行した。次にアクリル酸ブチル86g、フェニルトリメトキシシラン133g、3-メタクリロキシプロピルトリメトキシシラン1.3gの混合液とジエチルアクリルアミド137g、アクリル酸3g、反応性乳化剤(商品名「アデカリアソープSR-1025」、旭電化(株)製、固形分25%水溶液)13g、過硫酸アンモニウムの2質量%水溶液40g、イオン交換水1900gの混合液を、反応容器中の温度を80℃に保った状態で約2時間かけて同時に滴下した。さらに反応容器中の温度が80℃の状態で約2時間撹拌を続行した後、室温まで冷却し、100メッシュの金網で濾過した後、イオン交換水で固形分を10.0質量%に調整し、数平均粒子径70nmの重合体エマルジョン粒子(B)水分散体を得た。
[Production Example 2] Synthesis of polymer emulsion particles (B-2) aqueous dispersion A reactor having a reflux condenser, a dropping tank, a thermometer and a stirring device was charged with 1600 g of ion-exchanged water and 6 g of dodecylbenzenesulfonic acid. Thereafter, the temperature was raised to 80 ° C. with stirring. To this, a mixture of 185 g of dimethyldimethoxysilane and 117 g of phenyltrimethoxysilane was dropped over about 2 hours while maintaining the temperature in the reaction vessel at 80 ° C., and then the temperature in the reaction vessel was 80 ° C. And stirring was continued for about 1 hour. Next, 86 g of butyl acrylate, 133 g of phenyltrimethoxysilane, 1.3 g of 3-methacryloxypropyltrimethoxysilane, 137 g of diethylacrylamide, 3 g of acrylic acid, a reactive emulsifier (trade name “ADEKA rear soap SR-1025” Asahi Denka Co., Ltd., 25% solid content aqueous solution) 13 g, ammonium persulfate 2 mass% aqueous solution 40 g, and ion-exchanged water 1900 g mixed solution with the temperature in the reaction vessel kept at 80 ° C. for about 2 hours It was dripped at the same time. Further, stirring was continued for about 2 hours in a state where the temperature in the reaction vessel was 80 ° C., then cooled to room temperature, filtered through a 100-mesh wire mesh, and the solid content was adjusted to 10.0% by mass with ion-exchanged water. A polymer emulsion particle (B) aqueous dispersion having a number average particle diameter of 70 nm was obtained.
[参考実施例1]
日産化学工業(株)製商品名「スノーテックOS」((A)成分)を水で希釈して固形分10質量%の分散液(数平均粒子径8nm)に調整し、製造例1で合成した重合体エマルジョンを配合し、表1に示す配合にてコーティング組成物を得た。
得られたコーティング組成物を膜厚250nmになるように白板ガラス(厚み2mm、6×6cm角)の上に、スピンコートした後、70℃、30分間乾燥させて機能性塗膜を得た。
[ Reference Example 1]
The product name “Snow Tech OS” (component (A)) manufactured by Nissan Chemical Industries, Ltd. was diluted with water to prepare a dispersion having a solid content of 10% by mass (number average particle size 8 nm). The obtained polymer emulsion was blended, and a coating composition was obtained by blending as shown in Table 1.
The obtained coating composition was spin-coated on white plate glass (thickness 2 mm, 6 × 6 cm square) so as to have a film thickness of 250 nm, and then dried at 70 ° C. for 30 minutes to obtain a functional coating film.
[参考実施例2]
表1に示す配合にてコーティング組成物を得た他は参考実施例1と同様にして機能性塗膜を得た。
[ Reference Example 2]
A functional coating film was obtained in the same manner as in Reference Example 1 except that the coating composition was obtained with the formulation shown in Table 1.
[参考実施例3]
表1に示す配合にてコーティング組成物を得た他は参考実施例1と同様にして機能性塗膜を得た。
[ Reference Example 3]
A functional coating film was obtained in the same manner as in Reference Example 1 except that the coating composition was obtained with the formulation shown in Table 1.
[実施例4]
日産化学工業(株)製商品名「スノーテックOS」((A)成分)を水で希釈して固形分10質量%の分散液(数平均粒子径8nm)に調整し、製造例2で合成した重合体エマルジョンを配合し、テトラエトキシシラン(C)として信越化学社製商品名「KBE−04」を表1に示す配合にてコーティング組成物を得た。
得られたコーティング組成物を膜厚250nmになるように白板ガラス(厚み2mm、6×6cm角)の上に、スピンコートした後、70℃、30分間乾燥させて機能性塗膜を得た。
[Example 4]
The product name “Snow Tech OS” (component (A)) manufactured by Nissan Chemical Industries, Ltd. is diluted with water to prepare a dispersion (number average particle size 8 nm) having a solid content of 10% by mass. The resulting polymer emulsion was blended, and a coating composition was obtained by blending as shown in Table 1 with trade name “KBE-04” manufactured by Shin-Etsu Chemical Co., Ltd. as tetraethoxysilane (C).
The obtained coating composition was spin-coated on white plate glass (thickness 2 mm, 6 × 6 cm square) so as to have a film thickness of 250 nm, and then dried at 70 ° C. for 30 minutes to obtain a functional coating film.
[参考実施例5]
表1に示す配合にてコーティング組成物を得た他は実施例4と同様にして機能性塗膜を得た。
[ Reference Example 5]
A functional coating film was obtained in the same manner as in Example 4 except that the coating composition was obtained with the formulation shown in Table 1.
[比較例1]
基材のガラスのみを用いて評価した。
[Comparative Example 1]
Evaluation was made using only the glass of the substrate.
[比較例2]
表1に示す配合にてコーティング組成物を得た他は参考実施例1と同様にして機能性塗膜を得た。
[Comparative Example 2]
A functional coating film was obtained in the same manner as in Reference Example 1 except that the coating composition was obtained with the formulation shown in Table 1.
本発明によって提供される機能性塗膜は、防汚性、反射防止性に優れるため太陽電池用保護カバー等用いると、太陽電池の出力を維持することができる。 Since the functional coating film provided by the present invention is excellent in antifouling property and antireflection property, the output of the solar cell can be maintained when a protective cover for solar cell is used.
Claims (4)
(C)成分:下記式(1)で示される珪素化合物の加水分解縮合物(ゾル−ゲル法で得られたコロイダルシリカを除く)を更に含み、(A)成分と(C)成分の質量比率がC/A=0.2/100〜30/100であることを特徴とする有機無機複合塗膜。
(A)成分;数平均粒子径が1nm〜400nmの金属酸化物
(B)成分;数平均粒子径が10nm〜800nmの重合体エマルジョン粒子
前記(B)成分は、以下の(b1)〜(b4)の各成分、(b1)成分:下記式(4)で表される加水分解性珪素化合物およびビニル重合性基を有するシランカップリング剤
SiWxRy (4)
(式中、Wは炭素数1〜20のアルコキシ基、水酸基、炭素数1〜20のアセトキシ基、ハロゲン原子、炭素数1〜20のオキシム基、エノキシ基、アミノキシ基、アミド基から選ばれた少なくとも1種の基を表す。Rは、直鎖状又は分岐状の炭素数が1〜30個のアルキル基、炭素数5〜20のシクロアルキル基、及び置換されていないか又は炭素数1〜20のアルキル基若しくは炭素数1〜20のアルコキシ基若しくはハロゲン原子で置換されている炭素数6〜20のアリール基から選ばれる少なくとも1種の炭化水素基を表す。xは2以上4以下の整数であり、yは0以上2以下の整数である。また、x+y=4である。)
(b2)成分:水酸基、カルボキシル基、アミド基、アミノ基、エーテル基よりなる群から選ばれる少なくとも1種の官能基を含有するビニル単量体、
(b3)成分:乳化剤、
(b4)成分:水、
を含む重合原液を重合して得られる重合体エマルジョン粒子である。
SiX4 (1)
(式中、Xは加水分解基を表す。)
空隙率(Va)の測定方法
電子顕微鏡を用いて塗膜表面を25万倍で観察し、その表面の空孔の外接円相当径の平
均値(2d)を求める。1辺1000nmの正方形中の空孔の個数(n)を求め、空孔を球に換算した場合の体積(Vo)を求める。塗膜体積(V1)は1辺1000nmの正方形の面積と膜厚から求め、その結果から空隙率を算出する。
Vo=n4/3πd3
Va(%)=Vo/V1×100 (A) It is an organic-inorganic composite coating film containing each component of (B), Comprising: Mass ratio of (A) component and (B) component is A / B = 1000 / 100-150 / 100, and film thickness is 80 to 300 nm, the refractive index of the coating film is 1.3 to 1.48, the porosity of the coating film measured by the following method is 20 to 60%,
Component (C): Hydrolyzed condensate of a silicon compound represented by the following formula (1) (excluding colloidal silica obtained by a sol-gel method), and a mass ratio of component (A) and component (C) Is an organic-inorganic composite coating film, wherein C / A = 0.2 / 100 to 30/100.
Component (A): metal oxide having a number average particle diameter of 1 nm to 400 nm
(B) component; polymer emulsion particles having a number average particle size of 10 nm to 800 nm The (B) component is the following components (b1) to (b4), (b1) component: represented by the following formula (4) Hydrolyzable silicon compound and silane coupling agent having vinyl polymerizable group SiWxRy (4)
(W is selected from an alkoxy group having 1 to 20 carbon atoms, a hydroxyl group, an acetoxy group having 1 to 20 carbon atoms, a halogen atom, an oxime group having 1 to 20 carbon atoms, an enoxy group, an aminoxy group, and an amide group. R represents at least one group, and R is a linear or branched alkyl group having 1 to 30 carbon atoms, a cycloalkyl group having 5 to 20 carbon atoms, and an unsubstituted or substituted 1 to carbon atom. 20 represents an at least one hydrocarbon group selected from an alkyl group having 20 carbon atoms, an alkoxy group having 1 to 20 carbon atoms, or an aryl group having 6 to 20 carbon atoms substituted with a halogen atom, x being an integer of 2 or more and 4 or less. And y is an integer of 0 or more and 2 or less, and x + y = 4.)
(B2) component: a vinyl monomer containing at least one functional group selected from the group consisting of a hydroxyl group, a carboxyl group, an amide group, an amino group, and an ether group;
(B3) component: emulsifier,
(B4) component: water,
Polymer emulsion particles obtained by polymerizing a polymerization stock solution containing
SiX 4 (1)
(In the formula, X represents a hydrolyzable group.)
Method for Measuring Porosity (Va) The surface of the coating film is observed at 250,000 times using an electron microscope, and the average value (2d) of the circumscribed circle equivalent diameter of pores on the surface is obtained. The number of holes (n) in a square with a side of 1000 nm is obtained, and the volume (Vo) when the holes are converted into a sphere is obtained. The coating film volume (V1) is determined from the square area and film thickness of 1000 nm on each side, and the porosity is calculated from the result.
Vo = n4 / 3πd 3
Va (%) = Vo / V1 × 100
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JP5599134B2 (en) * | 2007-07-26 | 2014-10-01 | 旭化成ケミカルズ株式会社 | Organic / inorganic composite composition using polyfunctional silane |
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