JP5981197B2 - Ion generator - Google Patents

Description

  The present invention relates to an ion generator that generates positive ions and negative ions.

  In recent years, ion generators that generate positive ions and negative ions have been used to decompose fungi or viruses floating in the air.

  A conventional ion generator is shown in FIG. In the conventional ion generator 5, the ion generator 15 for generating negative ions and the ion generator 30 for generating positive ions are respectively provided in the respective flow paths formed for releasing positive ions or negative ions. It is arranged. Then, the generated positive ions and negative ions are discharged from the discharge ports of the respective flow paths to the external space. Here, the ion generator 15 and the ion generator 30 generate positive ions and negative ions by applying a high-voltage discharge voltage between the discharge electrodes to generate corona discharge. Further, the discharge voltage applied between the discharge electrodes is adjusted so that approximately the same amount of negative ions and positive ions are released.

Here, positive ions and negative ions released from the ion generator 5 are generated by ionization of molecules in the air (hereinafter referred to as “air molecules”) due to a discharge phenomenon. That is, positive ions and negative ions generated by the ion generator 5 are, for example, a form in which a plurality of water molecules are attached around a hydrogen ion (H ⁺ ) or an oxygen ion (0 ₂ ⁻ ), that is, a so-called cluster ion form. Is made. Then, by releasing positive ions and negative ions in such a form into the air, the positive ions and negative ions are aggregated into the floating particles and chemically reacted to sterilize the floating bacteria.

  On the other hand, Patent Documents 1 and 2 disclose electron-emitting devices that can be applied in fields such as FED (Field Emission Display).

  As shown in FIG. 16, the electron-emitting device 100 of Patent Document 1 includes a fine particle layer 104 including fine particles 105 of insulating material and fine metal particles 106 between an electrode substrate 102 and a thin film electrode 103. Electrons are emitted from the thin film electrode 103 by applying a voltage between the electrode substrate 102 and the thin film electrode 103.

  As shown in FIG. 17, in the electron-emitting device 200 of Patent Document 2, insulating fine particles and the second electrode 204 are formed between the first electrode 202 and the second electrode 204 in which the insulating layer 205 having an opening is formed in the upper layer. A fine particle layer 203 composed of conductive fine particles is provided. Then, by applying a voltage between the first electrode 202 and the second electrode 204, electrons are emitted from the second electrode 204.

JP 2009-146891 A JP 2011-222452 A

  Like the conventional ion generator 5 shown in FIG. 13, the ion discharge | released using the ion generator of a corona discharge system is in a chemically unstable state. That is, there is a problem that ions released by the apparatus disappear in a relatively short time and the effect of sterilizing the floating bacteria is not maintained.

  That is, in the conventional ion generator 5, the minute space due to the electric field concentration near the tip of the negatively biased needle electrode becomes a strong electric field, whereby the air molecules in the region are ionized and electrons are emitted. Accelerated electrons are generated with large energy. Then, when the electrons collide with other air molecules, the air molecules are newly ionized. Alternatively, bonds between air molecules are dissociated. Or it adheres to air molecules. And it is thought that a negative ion is produced | generated by repeating such reaction.

From this, the negative ions generated by the conventional ion generator 5 contain negative ions of various components such as O ⁻ , O ₂ ⁻ , O ₃ ⁻ , NO ₂ ⁻ or NO ₃ ⁻ . Inferred. O ₂ ⁻ is chemically relatively stable, but O ⁻ and O ₃ ⁻ are liable to react with a substance floating in the atmosphere or the surface of a fixed object such as an indoor wall surface or floor surface. For this reason, it is thought that the negative ion produced | generated by corona discharge will be extinguished in a comparatively short time.

  This invention is made | formed in view of such a subject, The objective is to provide the ion generator which continues the bactericidal effect by ion after stopping discharge | release of ion.

An ion generator according to the present invention is an ion generator having a first ion generator that generates negative ions and a second ion generator that generates positive ions, and the first ion generator generates the ions. In addition, a flow path for transporting the negative ions and a flow path for transporting the positive ions generated by the second ion generation section are provided separately, and the first ion generation section includes a first electrode, 2 electrodes, and a fine particle layer including insulating fine particles and a binder component between the first electrode and the second electrode, and a voltage is applied between the first electrode and the second electrode. have a electron-emitting device which emits electrons by the electron-emitting device, between the particle layer and the first electrode, the Rukoto insulating layer having a plurality of openings penetrating in the thickness direction is formed Features.

Preferably, the openings are arranged in a grid pattern at predetermined intervals on the substrate of the first electrode .

  Preferably, the insulating fine particles include at least one of silicon oxide, zinc oxide, aluminum oxide, titanium oxide, or copper oxide.

  Preferably, the fine particle layer includes conductive fine particles having a smaller particle diameter than the insulating fine particles.

  More preferably, the conductive fine particles include at least one of gold, silver, platinum, palladium, tungsten, or nickel.

  Preferably, a voltage including a direct current component that makes the second electrode a positive side with respect to the first electrode is applied between the first electrode and the second electrode.

  More preferably, a pulse voltage is applied between the first electrode and the second electrode.

  According to the ion generator according to the present invention, the bactericidal effect by ions can be maintained for a long time even after the release of ions is stopped.

It is a figure showing the whole ion generating device 1 composition which is one embodiment of the present invention. FIG. 2 is a diagram illustrating a configuration of a first ion generation unit 10. 2 is a view showing a laminated structure of an electron-emitting device 20. FIG. FIG. 4 is an enlarged view in which the vicinity of a fine particle layer 23 of the electron-emitting device 20 in FIG. 3 is enlarged. 3 is a diagram illustrating a configuration example of an insulating layer 24 in the electron-emitting device 20. FIG. 4 is a flowchart showing a manufacturing process of the electron-emitting device 20. It is a schematic diagram which shows the environmental conditions which measure the time change of indoor ion concentration. It is a figure which shows the detailed structure of the drive condition of the ion generator in an experiment example, and each part of the ion generator used in the experiment example. It is a figure which shows the detailed structure of each part of the electron emission element 20 used for the experiment example. It is a figure which shows the laminated structure of the fine particle layer 23 in the electron emission element 20 used for the experiment example. It is a figure which shows the measurement result which measured the ion concentration which the ion generator 1 discharge | releases. It is a figure which shows the measurement result of an experiment example. It is a figure which shows the whole structure of the conventional ion generator 5 used for the comparative example compared with an experiment example. It is a figure which shows the voltage condition applied to the detailed structure of the negative ion generation part 15 of the ion generator 5, and the negative ion generation part 15 in a comparative example. It is a figure which shows the measurement result of a comparative example. 2 is a diagram showing a configuration of an electron-emitting device 100 described in Patent Document 1. FIG. It is a figure which shows the structure of the electron emission element 200 described in patent document 2. FIG.

  FIG. 1 shows an overall configuration of an ion generator 1 according to an embodiment of the present invention. The configuration of the ion generator 1 will be described below with reference to this drawing.

<Overall configuration of ion generator>
The ion generator 1 includes a first ion generator 10 that generates negative ions by electrons emitted from a built-in electron emitter, and an electrode between the electrodes of the electron emitter 20 that is built in the first ion generator 10. Has a power supply unit 50 for applying a voltage. Here, as the voltage applied between the electrodes of the electron-emitting device, it is desirable to use a voltage in which a DC component is superimposed on an AC component so that the amount of electron emission is stabilized.

  The ion generator 1 also includes a second ion generator 30 that generates corona discharge by applying a high voltage between the needle electrode 31 and the counter electrode 32 to generate positive ions, and the second ion generation. A power supply unit 51 for applying a high voltage between the needle electrode 31 and the counter electrode 32 of the unit 30 is provided. And it has the ion generation controller 60 for controlling the application of the voltage by the power supply part 50 and the power supply part 51. FIG.

  Here, in order to prevent the generated negative ions and positive ions from reacting in the apparatus, the flow path for carrying the negative ions generated by the first ion generation unit 10 and the positive ion generated by the second ion generation unit 30 are used. A channel for conveying the ion channel is provided separately. Further, the ion generator 1 is provided with an airflow generation unit (not shown) that generates an airflow toward the ion emission port in order to discharge a gas medium such as air together with the generated negative ions and positive ions. ing.

<Overall configuration of first ion generator>
FIG. 2 shows the configuration of the first ion generator 10. According to this figure, the first ion generation unit 10 is configured to include a plurality of electron-emitting devices 20 that emit electrons. The plurality of electron-emitting devices 20 are connected to the power supply unit 50 so that the voltage of the power supply unit 50 can be individually applied thereto.

<Configuration of electron-emitting device>
FIG. 3 is a view showing a laminated structure of the electron-emitting device 20. The configuration of the electron-emitting device 20 will be described below using this figure.

  The electron-emitting device 20 includes a first electrode 21, a second electrode 22, and a fine particle layer 23 formed between the first electrode 21 and the second electrode 22. Furthermore, the first electrode 21 and the second electrode 22 can be applied between the first electrode 21 and the second electrode 22 so that a voltage including a direct current component that makes the second electrode 22 positive can be applied to the first electrode 21. 22 is connected to the power supply unit 50. That is, the electron-emitting device 20 applies a voltage between the first electrode 21 and the second electrode 22 to generate a strong electric field on the surface of the fine particle layer 23 on the second electrode 22 side. A part of the electrons moving to the two electrodes 22 is configured to be emitted from the second electrode 22.

  In addition, in the case of an electron-emitting device that applies a voltage to the fine particle layer and emits electrons, if a voltage is applied continuously between the electrodes of the device for a long time, a current flows for a long time to a specific portion of the fine particle layer, The element may be deteriorated or damaged. In order to solve the problem, in the electron-emitting device 20 according to the present invention, the insulating layer 24 having a plurality of openings 24a penetrating in the stacking direction (up and down direction in the drawing) between the first electrode 21 and the fine particle layer 23. And is unevenly distributed at a specific portion of the fine particle layer 23 to prevent a current from flowing for a long time. Here, as the various conditions related to the opening 24a, those satisfying such a condition that the electric fields in the opening 24a do not interfere with each other are adopted. Furthermore, if the size of the opening 24a is too large, it is difficult to uniformly emit electrons from the electron-emitting device 20. On the other hand, if it is too small, the electric field in each opening 24a may weaken and the electron emission efficiency may deteriorate. For this reason, it is desirable to employ a size of the opening 24a that fits within a square having a side of about 1 to 500 μm. Further, from the viewpoint of uniformly emitting electrons from the electron-emitting device 20, it is desirable to arrange the plurality of openings 24a in a matrix form in a vertical and horizontal manner.

  The first electrode 21 is a conductive plate-like substrate and has a function as a support for the electron-emitting device 20. Therefore, a substrate having a certain degree of strength and moderate conductivity is used. For example, a metal substrate mainly composed of stainless steel, aluminum, titanium, copper, or the like is used. Alternatively, a semiconductor substrate whose main component is silicon, germanium, GaAs (gallium arsenide), or the like is used. Alternatively, an insulating substrate such as glass or plastic, on which a metal vapor deposition film or a conductive film such as an ITO film (iridium tin oxide film) is formed, is used.

  The second electrode 22 is an electrode for applying a voltage to the fine particle layer 23 as a pair with the first electrode 21 and can be used without particular limitation as long as it is a material capable of applying a voltage. it can. However, from the standpoint that electrons that have been accelerated by the fine particle layer 23 and have high energy are transmitted with as little loss as possible and emitted, the conductivity is low and can be formed as a thin film. It is preferable to use materials. Examples of such a material include gold, silver, tungsten, titanium, and palladium. In particular, when an operation at atmospheric pressure is assumed, gold having no oxide and sulfide forming reaction is the best material. In addition, silver, tungsten, palladium, or the like that has a relatively small oxide formation reaction can be cited as a material that can withstand actual use.

The fine particle layer 23 is composed of insulating fine particles 231. For the insulating fine particles 231, a semiconductor oxide such as SiO ₂ (silicon oxide) or Zn 0 (zinc oxide) is used. Alternatively, a metal oxide such as Al ₂ 0 ₃ (aluminum oxide), Ti0 ₂ (titanium oxide), or Cu0 (copper oxide) is used. Here, the particle size (average diameter) of each insulating fine particle 231 is preferably in the range of 5 to 1000 nm. This is because, when the insulating fine particles 231 having a particle diameter smaller than 5 nm are used, it is difficult to reduce the variation in the size of individual fine particles, and it is difficult to form the fine particle layer 23 having a uniform film thickness. It is. On the other hand, when the dispersion of insulating fine particles 231 having a particle diameter larger than 1000 nm is applied to form the fine particle layer 23, the insulating fine particles 231 are precipitated in the dispersion, so that the dispersibility of the insulating fine particles 231 is reduced. It gets worse. That is, in the coating film coated with the dispersion liquid, it is easy to cause a variation between a portion containing a large amount of insulating fine particles 231 and a portion containing a small amount of insulating fine particles 231, and it becomes difficult to form a fine particle layer 23 having a uniform thickness. .

<Configuration of fine particle layer>
FIG. 4 is an enlarged view in which the vicinity of the fine particle layer 23 of the electron-emitting device 20 in FIG. 3 is enlarged. The configuration of the fine particle layer 23 will be supplemented using this drawing.

  The fine particle layer 23 desirably includes a conductive fine particle 232 having a smaller particle diameter than the insulating fine particle 231. This is because the resistance value of the fine particle layer 23 can be adjusted in an arbitrary range by including the conductive fine particles 232 and adjusting the content of the conductive fine particles 232. Here, when the particle size of the conductive fine particles 232 is larger than the insulating fine particles 231, the insulating properties required by the fine particle layer 23 cannot be obtained. Therefore, the particle size of the conductive fine particles 232 is the particle size of the insulating fine particles 231. It is necessary to make it smaller. The conductive fine particles 232 can be used without particular limitation as long as it is a conductive material. For example, a material such as gold, silver, platinum, palladium, tungsten, or nickel is used. Further, the fine particle layer 23 may include a binder component such as a silicone resin. By including a binder component, the mechanical strength of the element can be improved, and deterioration of the element due to oxygen or moisture in the atmosphere can be prevented.

  As described above, the insulating layer 24 has an opening penetrating in the stacking direction (vertical direction on the paper surface) between the first electrode 21 and the fine particle layer 23 in order to prevent damage or deterioration of the element due to continuous driving for a long time. A plurality of 24a are formed.

  As the insulating layer 24, for example, an inorganic film such as a silicon oxide film, a silicon nitride film, or a silicon oxynitride film can be used to form a film thickness in the range of 0.1 to 3 μm. Alternatively, by using an organic film such as a silicone resin film, an acrylic resin film, a polyimide resin film, an epoxy resin film, a polyester resin film, a polyurethane resin film, or a polystyrene resin film, the film thickness is 0.1. It can be formed in a range of ˜3 μm. Note that it is more preferable to use a silicon oxide film, a silicon nitride film, a silicone resin film, an acrylic resin film, or a polyimide resin film from the viewpoint of resistance value, heat resistance, water absorption rate, mechanical strength, and the like.

<Overall structure of insulating layer>
FIG. 5 shows a configuration example of the insulating layer 24 in the electron-emitting device 20. Here, FIG. 5A is a top view (plan view) showing an example of the overall configuration of the insulating layer 24. FIG. 5B is an enlarged view (perspective view) in which a part of the insulating layer 24 is enlarged. With reference to these drawings, an example of the overall configuration of the insulating layer 24 will be described below.

  The insulating layer 24 is formed on the substantially square first electrode 21 substrate whose one side is BS. Here, in the four areas of the upper right corner area A1, the lower right corner area A2, the upper left corner area A3 and the lower left corner area A4 of the sheet of the insulating layer 24, square opening areas 24b each having a length of AS are provided. In a lattice shape, a total of 9 sections of 3 × 3 sections are formed with a pitch AP interval. In each of the partitioned opening areas 24b, a plurality of substantially square openings 24a each having a length of HS are formed in a lattice shape at a predetermined pitch interval HP.

<Manufacturing process of electron-emitting device>
FIG. 6 is a flowchart showing a manufacturing process of the electron-emitting device 20. According to this figure, the electron-emitting device 20 covers the upper layer of the insulating layer 24 formed in the insulating layer forming step of forming the insulating layer 24 on the conductive substrate to be the first electrode 21 and the insulating layer forming step. The fine particle layer is formed by sequentially performing a fine particle layer forming step for forming the fine particle layer 23 and a second electrode forming step for forming the second electrode 22 on the fine particle layer 23 formed in the fine particle layer forming step. Below, the detail of each process is demonstrated.

  In the insulating layer forming step, first, a coating solution in which an acrylic resin as an insulating material is dissolved in a solvent is applied onto the first electrode 21 by a spin coating method to form a coating film, and the coating film is heated and dried. Then, the insulating layer 24 is formed by forming a plurality of small holes to be the openings 24a in the dried coating film by photolithography. The insulating layer 24 formed by this step is adjusted to a desired film thickness in the range of 0.1 to 3 μm and to a desired inner diameter in the range of the opening 24 a from 15 to 100 μm.

  Here, in addition to the acrylic resin, an organic polymer such as a silicone resin, a polyimide resin, an epoxy resin, a polyester resin, a polyurethane resin, or a polystyrene resin is used as the insulator material. Further, two or more of these organic polymers may be mixed and used. Furthermore, in addition to the organic polymer, the insulating layer 24 may be formed by using an inorganic material such as silicon oxide or silicon nitride, for example, by sputtering, vapor deposition, CVD (Chemical Vapor Deposition), or the like. An electron beam lithography method, a plasma etching method, an ink jet method, or the like is used as a method for forming a small hole that becomes the opening 24a.

  In the fine particle layer forming step, first, a dispersion liquid in which the insulating fine particles 231 are dispersed in a solvent is prepared. Then, the prepared dispersion is applied by spin coating so as to cover the upper layer of the insulating layer 24 formed in the insulating layer forming step to form a coating film, and the coating film is dried to form the fine particle layer 23. Form. In addition, application | coating of a dispersion liquid and drying of a coating film are repeated until it becomes a desired film thickness.

  Here, in the preparation of the dispersion, it is desirable to mix and prepare the conductive fine particles 232 and the raw material to be the binder component in addition to the insulating fine particles 231. Further, when preparing the dispersion, a solvent is used that dissolves the raw material to be the binder component to be mixed, disperses the insulating fine particles 231 or the conductive fine particles 232, and can be dried after coating. As such a solvent, for example, toluene, benzene, xylene, hexane, tetradecane, or the like is used. Further, the concentration of the insulating fine particles 231 in the dispersion is prepared in the range of 10 to 50% by weight. This is because if the concentration is lower than 10% by weight, it is difficult to fully fill the opening 24a with the insulating fine particles 231. On the other hand, if the concentration is higher than 50% by weight, the viscosity of the dispersion increases and aggregates, making it difficult to form the fine particle layer 23 of a thin film. Although there is no particular limitation in the formation of the coating film, for example, the coating film is formed by performing two-step spin coating such as rotating for 1 second at a spin speed of 500 rpm and then rotating for 10 seconds at a spin speed of 3000 rpm. Form.

  In the second electrode forming step, first, a carbon thin film is formed on the fine particle layer 23 formed in the fine particle layer forming step. Then, the second electrode 22 is formed on the upper layer of the carbon thin film using, for example, a magnetron sputtering method, an ink jet method, a spin coating method, a vapor deposition method, or the like.

  Note that the first ion generation unit 10 leads the first electrode 21 and the second electrode 22 of each of the plurality of electron-emitting devices 20 to the plurality of electron-emitting devices 20 manufactured by the manufacturing process described above. It is manufactured by performing a forming process so that it can be connected to the power supply unit 50 via a line.

  Thus, in the ion generator 1 according to the present invention, negative ions are generated using the electron-emitting device 20. And it thinks that it can maintain a bactericidal effect for a long time by this.

  That is, in the ion generator 1 according to the present invention, electrons emitted by the element 20 collide with air molecules existing in the vicinity of the electron emitting element 20. And it is thought that a negative ion is produced | generated by adhering to this air molecule.

  Here, electrons emitted from the electron-emitting device 20 have much lower energy than electrons generated by corona discharge. From this, it is presumed that the reaction for dissociating the bonds between the air molecules hardly occurs, and that most of the emitted electrons are attached to oxygen molecules having high affinity.

From this, it is considered that the negative ions generated by the electron-emitting device 20 contain a large amount of chemically relatively stable O ₂ ⁻ and disappear over a relatively long time. That is, since the negative ions generated by the ion generator 1 according to the present invention contain a large amount of O ₂ ^−, it is thought that the bactericidal effect by the ions can be sustained for a long time.

<Experimental example: Measurement by ion generator according to the present invention>
FIG. 7 is a schematic diagram showing environmental conditions for measuring temporal changes in the indoor ion concentration. The environmental conditions of the experimental example for measuring temporal changes related to the ion concentration in the room when ions are released from the ion generator 1 will be described with reference to FIG.

  In the experimental example, the ion generator 1 is installed in the center of a measurement chamber having a size of about 5.0 m × 5.0 m and a height from the floor surface to the ceiling of about 2.5 m. Here, the height from the floor surface to the ion emission port of the ion generator 1 is set to approximately 0.6 m. An ion counter (manufactured by Asahi System Co., Ltd., MY1210-2) is installed at one corner of the measurement chamber. Specifically, it is installed at a position approximately 0.5 m away from each of the two wall surfaces in the measurement chamber and at a height of approximately 1.0 m from the floor surface.

<Experimental example: Driving conditions of ion generator, detailed configuration of each part>
FIG. 8 shows a driving condition of the ion generator 1 in the experimental example and a detailed configuration of each part of the ion generator 1 used in the experimental example, which will be described below.

  The first ion generator 10 of the ion generator 1 includes a plurality of electron-emitting devices 20 described later with reference to FIG. That is, the ion generator 1 used in the experimental example can adjust the concentration of negative ions to be generated by changing the number of electron-emitting devices 20 driven by the power supply unit 50, that is, the number of driving devices.

  In the experimental example, the number of drive elements is six, and measurement is performed by applying a pulse wave voltage having a frequency of 600 Hz, a duty ratio of 20%, and a peak value of 17.4 V to the six electron-emitting elements 20.

  The second ion generator 30 of the ion generator 1 includes a tungsten needle electrode 31 having an original diameter of 0.5 mm and a length of 6.0 mm, and a ring-shaped counter electrode 32 having an inner diameter of 10 mm and a width of 2.0 mm. It is configured. Here, the tip of the needle electrode 31 is positioned in the vicinity of the center inside the ring-shaped counter electrode 32 so that ions are generated by generating corona discharge. Further, the power supply unit 51 is configured so that the counter electrode 32 is set to GND and a positive pulse voltage can be applied to the needle electrode 31.

  In the experimental example, a pulse wave voltage having a frequency of 60 Hz, a duty ratio of 20%, and a crest value of +4.0 kV is applied to the needle electrode 31 of the second ion generation unit 30 and driven for measurement.

Furthermore, the ion generator 1 is provided with an airflow generation unit for generating an airflow toward the ion discharge port. The air flow generation unit is disposed at a position away from the position where the first ion generation unit 10 and the second ion generation unit 30 are disposed with respect to the ion emission port. That is, the airflow generation part of the ventilation type which generates an airflow toward an ion discharge port is provided. Here, in the experimental example, measurement is performed by generating an air flow with an air flow rate of 0.001 m ³ / sec.

<Experimental example: Detailed configuration of each part of electron-emitting device>
FIG. 9 shows a detailed configuration of each part of the electron-emitting device 20 used in the experimental example and will be described below.

  As the first electrode 21 of the electron-emitting device 20, a substantially square aluminum substrate having a side length BS of approximately 24 mm is used.

  Further, as the insulating layer 24 of the electron-emitting device 20, a layer made of an acrylic resin having a film thickness of about 1.5 μm is formed on the aluminum substrate. Here, in the four areas of area A1, area A2, area A3, and area A4 of the insulating layer 24, a square opening area 24b having a side AS of 2.4 mm is divided into 3 × 3 sections in a lattice shape. Divide into 9 sections and pitch AP 3.0mm intervals. In each opening area 24b, approximately square openings 24a each having a side length HS of 60 μm are formed in a lattice form with a pitch HP of 120 μm, for a total of 400.

  Further, as the fine particle layer 23 of the electron-emitting device 20, the first fine particle layer 23A and the second fine particle layer 23B are formed in the range where the insulating layer 24 is formed. Here, the laminated structure of the fine particle layer 23 will be supplemented below.

  FIG. 10 shows a laminated structure of the fine particle layer 23 in the electron-emitting device 20 used in the experimental example. As shown in the figure, a first fine particle layer 23A having a thickness of about 1.0 μm is formed in a range where the insulating layer 24 is formed. A second fine particle layer 23B having a thickness of about 1.5 μm is formed in the range where the first fine particle layer 23A is formed. That is, the fine particle layer 23 having a thickness of about 2.5 μm is formed on the insulating layer 24.

  A method for forming the first fine particle layer 23A and the second fine particle layer 23B will be described below.

  First, 0.6 g of hexane as a solvent and 0.1 g of spherical silica particles having a particle diameter of 50 nm as a raw material for the insulating fine particles 231 are put into a 5 ml reagent bottle and dispersed using an ultrasonic disperser. Furthermore, 0.024 g of silver nanoparticles (manufactured by Applied Nanoparticles Laboratories) having a particle diameter of 10 nm, which is a raw material for the conductive fine particles 232, is added, and the first dispersion liquid dispersed using an ultrasonic disperser is prepared.

  Subsequently, 0.6 g of hexane as a solvent and 0.1 g of spherical silica particles having a particle diameter of 50 nm as a raw material for the insulating fine particles 231 are charged into another 5 ml reagent bottle and dispersed using an ultrasonic disperser. . Furthermore, 0.02 g of silicone resin (SR2411, manufactured by Toray Dow Corning Co., Ltd.) is added as a binder component, and the second dispersion liquid dispersed using an ultrasonic disperser is prepared.

  Subsequently, the first dispersion is dropped in a range where the insulating layer 24 is formed, and a first coating film is formed by performing two-stage spin coating at 500 rpm for 1 second, and subsequently at 3000 rpm for 10 seconds, The first coating film is dried at 150 ° C. for 60 seconds using a hot plate to form a first fine particle layer 23A having a thickness of approximately 1.0 μm. Here, since the first dispersion liquid includes the raw material to be the insulating fine particles 231 and the raw material to be the conductive fine particles 232, the first fine particle layer 23A contains the insulating fine particles 231 and the conductive fine particles 232. Will be included.

  Subsequently, after the first fine particle layer 23A is formed, the second dispersion liquid is dropped on the first fine particle layer 23A immediately so as not to cause a change with time, and then at 500 rpm for 1 second, and subsequently at 3000 rpm for 10 seconds. The second coating film is formed by performing the two-stage spin coating, and the second coating film is dried at 200 ° C. for 90 seconds using a hot plate, whereby the second fine particle layer having a thickness of about 1.5 μm is formed. 23B is formed.

  In this way, the second fine particle layer 23 having a thickness of approximately 1.5 μm is laminated on the first fine particle layer 23A having a thickness of approximately 1.0 μm, and the fine particle layer 23 having a thickness of approximately 2.5 μm is formed on the insulating layer 24. Form in the upper layer.

  Further, as the second electrode 22 of the electron-emitting device 20, a carbon thin film layer having a thickness of about 10 nm is formed in a range where the fine particle layer 23 is formed. A conductive layer for the second electrode 22 having a thickness of about 40 nm is formed in the range where the carbon thin film layer is formed. Further, a conductive layer for wiring is laminated in a part of the range where the conductive layer for the second electrode 22 is formed, and a contact for connecting to the power supply unit 50 is formed. Below, the formation method of each part of the 2nd electrode 22 is demonstrated.

  First, a carbon thin film layer made of graphite having a thickness of about 10 nm is formed in a range where the fine particle layer 23 is formed, using a vacuum vapor deposition apparatus.

  Subsequently, a conductive layer for the second electrode 22 made of an Au—Pd alloy having a thickness of about 20 mm × 20 mm square and a thickness of about 40 nm is formed in the range where the carbon thin film layer is formed using a magnetron sputtering apparatus.

  Subsequently, gold is vapor deposited using a vacuum vapor deposition device within a range where the conductive layer for the second electrode 22 is formed and the opening area 24b is not partitioned in the lower layer. A conductive layer for wiring having a thickness of 620 nm is stacked. Then, a metal pad made of gold having a thickness of 200 μm and 2 mm × 2 mm square is bonded to the conductive layer for wiring via a conductive paste CT223 manufactured by Kyocera Chemical Co., Ltd., and 1 at 150 ° C. using an electronic furnace. It is formed by heat curing for hours.

<Experimental example: Ion concentration released by ion generator>
In FIG. 11, the result of having measured the ion concentration which the ion generator 1 discharge | releases is shown. According to the figure, the ion generating device 1 is at a distance 20cm from the ion emission port, the negative ions are about 1.12 × 10 ⁶ cells / cm ^3, the positive ions are about 0.91 × 10 ⁶ cells / cm ³ Ions are released.

  Here, the measurement result is an average value of five measurements of the ion concentration measured by the ion counter installed at a position 20 cm away from the ion emission port while the ion generator 1 is operated.

Note that the ion concentration emitted by the ion generator 5 used in the comparative example described later is also set to be approximately the same ion concentration under the same measurement conditions. In other words, the ion generator 5 also has a negative ion of about 1.12 × 10 ⁶ ions / cm ³ and a positive ion of about 0.91 × 10 ⁶ cells / cm ³ at a position 20 cm away from the ion emission port. It is set to emit.

  Here, it supplements about the drive conditions of the ion generator 1 in an experiment example. The number of drive elements shown in FIG. 8 and the peak value of the applied pulse wave voltage are adjusted and set so that the ion concentration shown in FIG.

  That is, in the ion generator 1, the number of driving elements is six and the wave of the pulse wave voltage applied to the electron emitter 20 is substantially matched with the ion concentration emitted by the ion generator 5 used in the comparative example described later. The high value is set to 17.4V and measurement is performed.

<Experimental example: measurement result>
FIG. 12 shows the measurement results of the experimental example and will be described below. Here, in the experimental example, the ion generator 1 is operated for 30 minutes to release negative ions and positive ions into the measurement chamber. And the drive of the 1st ion generation part 10 and the 2nd ion generation part 30 is stopped, with the ventilation by the airflow generation part continuing. Then, after the driving of the first ion generator 10 and the second ion generator 30 is stopped, the change in the ion concentration measured by the ion counter is measured.

As shown in this figure, in the experimental example, negative ions 5.10 × 10 ³ / cm ³ , positive ions 4 at the initial stage immediately after the driving of the first ion generator 10 and the second ion generator 30 is stopped. 10 × 10 ³ ions / cm ³ ions are measured.

In the experimental example, 10 seconds after the driving of the first ion generation unit 10 and the second ion generation unit 30 is stopped, 4.59 × 10 ³ negative ions / cm ³ and 3.70 × positive ions are generated. 10 ³ ions / cm ³ ions are measured. Therefore, with respect to the initial ion concentration, the ion concentration 10 seconds after the stop of driving is reduced to approximately 90% for negative ions and approximately 90% for positive ions.

In the experimental example, 30 seconds after the driving of the first ion generation unit 10 and the second ion generation unit 30 is stopped, 2.19 × 10 ³ negative ions / cm ³ and 1.71 × positive ions are generated. 10 ³ ions / cm ³ ions are measured. Therefore, with respect to the initial ion concentration, the ion concentration 30 seconds after the stop of driving is reduced to approximately 43% for negative ions and approximately 42% for positive ions.

In the experimental example, negative ions 1.02 × 10 ³ ions / cm ³ and positive ions 0.82 × 60 seconds after the driving of the first ion generator 10 and the second ion generator 30 is stopped. 10 ³ ions / cm ³ ions are measured. Therefore, with respect to the initial ion concentration, the ion concentration after 60 seconds from the stop of driving is reduced to about 20% for negative ions and about 20% for positive ions.

  Thus, the ion concentration in the room released by the ion generator 1 decreases at approximately the same rate for both negative ions and positive ions as time passes.

<Comparative example: Measurement with a conventional ion generator>
FIG. 13 shows the overall configuration of a conventional ion generator 5 used in a comparative example to be compared with the experimental example, and the configuration of the ion generator 5 will be described below with reference to FIG. In addition, the same referential mark is attached | subjected to the component same as the component of the ion generator 1 mentioned above. Therefore, description of these components is omitted.

  Compared with the ion generator 1 described above, the ion generator 5 includes a negative ion generator 15 instead of the first ion generator 10 and a power supply 55 instead of the power supply 50. The only difference is that That is, the ion generator 5 applies a high voltage between the needle electrode 16 and the counter electrode 17 to generate a corona discharge to generate negative ions, and the negative ion generator 15 A power supply unit 55 for applying a high voltage between the needle electrode 16 and the counter electrode 17 is provided. And it has the ion generation controller 60 for controlling the application of the voltage by the power supply part 55 and the power supply 51. FIG.

  Furthermore, the environmental conditions of the comparative example for measuring the temporal change in the indoor ion concentration when ions are released using the ion generator 5 are exactly the same as those of the experimental example described above. That is, the ion generator 5 is installed in the center of the measurement chamber of about 5.0 m × 5.0 m and the height from the floor surface to the ceiling is about 2.5 m. Here, the height from the floor surface to the ion emission port of the ion generator 5 is set to be about 0.6 m. An ion counter is installed at one corner of the measurement chamber. Specifically, it is installed at a position approximately 0.5 m away from each of the two wall surfaces in the measurement chamber and at a height of approximately 1.0 m from the floor surface.

<Comparative example: Driving conditions of ion generator, detailed configuration of each part>
FIG. 14 is a diagram illustrating a configuration of the negative ion generation unit 15 of the ion generation device 5 and a voltage condition applied to the negative ion generation unit 15 in the comparative example.

  The negative ion generator 15 of the ion generator 5 includes a tungsten needle electrode 16 having an original diameter of 0.5 mm and a length of 6 mm, and a ring-shaped counter electrode 17 having an inner diameter of 10 mm and a width of 2 mm. Here, the tip of the needle electrode 16 is positioned in the vicinity of the center inside the ring-shaped counter electrode 17 so as to generate corona discharge to generate ions. Further, the power supply unit 55 is configured so that the counter electrode 17 is set to GND and a negative pulse voltage can be applied to the needle electrode 16. Further, in the comparative example, measurement is performed by applying and driving a pulse wave voltage having a frequency of 60 Hz, a duty ratio of 20%, and a peak value of −4.0 kV to the needle electrode 16 of the negative ion generation unit 30. Therefore, the configuration of the negative ion generator 15 is different from that of the ion generator 1 and the ion generator 5 only in the polarity of the pulse voltage applied to the needle electrode 16 of the negative ion generator 15 by the power supply unit 55. The configuration is the same as that of the unit 30.

<Comparative example: measurement result>
FIG. 15 shows the measurement results of the comparative example, which will be described below. Here, in the comparative example, the same measurement as in the experimental example is performed. That is, the ion generator 5 is operated for 30 minutes to release negative ions and positive ions into the measurement chamber. And the drive of the negative ion generation part 15 and the 2nd ion generation part 30 is stopped, with the ventilation by an airflow generation part continuing. Then, after the driving of the negative ion generation unit 10 and the second ion generation unit 30 is stopped, the change in the ion concentration measured by the ion counter is measured.

As shown in the figure, in the comparative example, at the initial stage immediately after the driving of the negative ion generation unit 15 and the second ion generation unit 30 is stopped, 4.95 × 10 ³ negative ions / cm ³ and positive ions 3. 99 × 10 ³ ions / cm ³ ions are measured.

Further, in the comparative example, 10 seconds after the driving of the negative ion generation unit 15 and the second ion generation unit 30 is stopped, 2.57 × 10 ³ negative ions / cm ³ and 2.06 × 10 positive ions are generated. ^Three ions / cm ³ ions are measured. Therefore, with respect to the initial ion concentration, the ion concentration after 10 seconds from the stop of driving is reduced to approximately 52% for negative ions and approximately 52% for positive ions.

In the comparative example, negative ions 0.74 × 10 ³ ions / cm ³ and positive ions 0.65 × 10 30 seconds after the driving of the negative ion generator 15 and the second ion generator 30 is stopped. ^Three ions / cm ³ ions are measured. Therefore, with respect to the initial ion concentration, the ion concentration after 30 seconds from the stop of driving is reduced to about 15% for negative ions and about 16% for positive ions.

Further, in the comparative example, after 60 seconds after the driving of the negative ion generation unit 15 and the second ion generation unit 30 is stopped, 0.40 × 10 ³ negative ions / cm ³ and 0.31 × 10 positive ions are generated. ^Three ions / cm ³ ions are measured. Therefore, the ion concentration after 60 seconds from the stop of driving with respect to the initial ion concentration is reduced to about 8% for negative ions and about 8% for positive ions.

  As can be seen from the results of the experimental example and the comparative example for measuring the temporal change in the ion concentration, the ion generator 1 according to the present invention stops the driving of the ion generator as compared with the conventional ion generator 5. The decrease in ion concentration after that is kept low. That is, the sterilization effect by ions can be maintained for a long time even after the release of ions is stopped as compared with the conventional case.

  The embodiment disclosed this time should be considered as illustrative in all points and not restrictive. The scope of the present invention is defined by the terms of the claims, rather than the description above, and is intended to include any modifications within the scope and meaning equivalent to the terms of the claims.

DESCRIPTION OF SYMBOLS 1 Ion generator 10 1st ion generation part 20 Electron emission element 21 1st electrode 22 2nd electrode 23 Fine particle layer 231 Insulating fine particle 232 Conductive fine particle 24 Insulating layer 24a Opening part 30 2nd ion generating part 50, 51 Power supply part 60 Ion generation controller

Claims (7)

A first ion generator that generates negative ions;
A second ion generator for generating positive ions;
An ion generator comprising:
A flow path for transporting the negative ions generated by the first ion generation section and a flow path for transporting the positive ions generated by the second ion generation section are provided separately,
The first ion generator is
A first electrode; a second electrode; and a fine particle layer formed including insulating fine particles and a binder component between the first electrode and the second electrode. voltage possess an electron emitting device which emits electrons by applying between,
The electron-emitting device is
Wherein between the first electrode and the fine particle layer, the ion generating device according to claim Rukoto insulating layer having a plurality of openings penetrating in the thickness direction is formed. The ion generator according to claim 1 , wherein the openings are arranged in a lattice pattern at predetermined intervals on the substrate of the first electrode . The insulating fine particles are
The ion generator according to claim 1 or 2, comprising at least one of silicon oxide, zinc oxide, aluminum oxide, titanium oxide, or copper oxide. The fine particle layer is
The ion generator according to claim 1, further comprising conductive fine particles having a particle diameter smaller than that of the insulating fine particles. The conductive fine particles are
The ion generator according to claim 4, comprising at least one of gold, silver, platinum, palladium, tungsten, or nickel.   6. The voltage according to claim 1, wherein a voltage including a DC component that makes the second electrode a positive side with respect to the first electrode is applied between the first electrode and the second electrode. Ion generator.   The ion generator according to claim 6, wherein a pulse voltage is applied between the first electrode and the second electrode.