JP5868191B2 - Toilet bowl cleaning device and flush toilet bowl - Google Patents

Description

  The present invention relates to a toilet bowl cleaning device and a flush toilet bowl.

  Patent document 1 is disclosing the flush toilet bowl provided with the conventional toilet bowl washing | cleaning apparatus. In this flush toilet, toilet cleaning is performed by the toilet cleaning device supplying cleaning water to the toilet body. The toilet body has a toilet bowl portion and a toilet drainage channel communicating with the downstream side of the toilet bowl portion. The toilet bowl cleaning device includes a low tank, a hollow tube, an exhaust passage, and a water supply channel. The low tank stores wash water supplied to the toilet body. The hollow tube is accommodated in the low tank, and the lower end opening is opened in the low tank. The exhaust passage communicates the upper end portion of the hollow tube and the toilet drainage passage of the toilet body via a position higher than the highest water storage level of the low tank. The water supply channel communicates the low tank with the toilet bowl of the toilet body.

  This flush toilet bowl performs toilet flushing by supplying flush water stored in a low tank to the toilet bowl of the toilet bowl main body via a water supply channel. At this time, the level of the cleaning water in the hollow tube also decreases slightly after the level of the cleaning water in the low tank decreases. As a result, the hollow tube sucks the gas in the toilet drainage channel through the ventilation channel.

  In this flush toilet, when toilet flushing is performed, the flushing water flows into the toilet drainage channel through the toilet bowl, and the hollow tube sucks the gas in the toilet drainage channel, thereby reducing the amount of flushing water. Siphon action can be generated in the toilet drainage channel. For this reason, this flush toilet bowl can discharge the filth in the toilet bowl to the outside of the toilet body using the siphon action generated in the toilet drainage channel.

Japanese Utility Model Publication No. 5-57080

  However, in the flush toilet of Patent Document 1, the water level of the wash water in the hollow tube is lowered while maintaining a level slightly higher than the water level of the wash water in the low tank (the water level difference between the low tank and the hollow tube is small). . For this reason, the hollow tube sucks the gas in the toilet drainage channel with a weak suction force from the start to the end of the suction. Therefore, in this flush toilet, the hollow tube may not suck the gas in the toilet drainage channel well in order to generate and continue the siphon action in the toilet drainage channel. That is, since the suction force of the hollow tube is weak, there is a possibility that the siphon action does not occur in the toilet drainage channel. In addition, after the siphon action occurs in the toilet drainage channel, the negative pressure in the toilet drainage channel becomes stronger than the suction force of the hollow tube, and the gas flows backward into the toilet drainage channel, so that the siphoning action ends early. There is a fear. For this reason, there exists a possibility that this flush toilet bowl cannot discharge | emit the waste in a toilet bowl favorably by execution of toilet bowl washing | cleaning.

  This invention is made | formed in view of the said conventional situation, Comprising: It is the problem which should be solved to provide the toilet bowl washing | cleaning apparatus and flush toilet bowl which can perform toilet bowl washing | cleaning satisfactorily.

The toilet cleaning device of the first invention is a toilet cleaning device for supplying cleaning water to a toilet body having a toilet bowl portion and a toilet drainage channel communicating with the downstream side of the toilet bowl portion,
A first tank for storing wash water;
A second tank having a lower opening communicating with the first tank and having a larger amount of water stored per unit height in an upper region than in a lower region;
A vent path communicating the second tank and the toilet drainage path via a position higher than the highest water storage level of the first tank;
A water supply channel communicating the first tank and the toilet bowl,
The flow rate of the gas in the ventilation path that flows from the toilet drainage path side to the second tank side at a later time than the supply of the wash water stored in the first tank to the toilet bowl through the water supply path And a delay device for maximizing.

  This toilet flushing apparatus performs toilet flushing by supplying flush water stored in the first tank to the toilet bowl via a water supply channel. At this time, when the water level in the second tank is lowered, the second tank sucks the gas in the toilet drainage channel through the ventilation channel. As a result, a siphon action can be generated in the toilet drainage channel even with a small amount of washing water, and filth and the like in the toilet bowl can be discharged well.

  Further, this toilet flushing device has a maximum flow rate of gas flowing from the toilet drainage channel side in the ventilation passage to the second tank side later than the time when the toilet flushing is started by the delay device, so that the water level in the second tank is Can be delayed. For this reason, the water level in the 1st tank falls quickly compared with the water level in the 2nd tank in the meantime, and the water level difference between the 1st tank and the 2nd tank can be enlarged. The magnitude of the water level difference between the first tank and the second tank is proportional to the strength of the suction force of the second tank. For this reason, the second tank can have a strong suction force, and can suck the gas in the toilet drainage channel at once. Therefore, this toilet bowl washing | cleaning apparatus can generate | occur | produce a siphon action reliably in a toilet bowl drainage channel.

  Moreover, this toilet bowl washing | cleaning apparatus has much water storage amount per unit height in a 2nd tank in an upper area | region rather than a lower area | region. As a result, the delay device maximizes the gas flow rate in the ventilation passage flowing from the toilet drainage channel side to the second tank side, and the wash water in the second tank flows out into the first tank at a large flow rate. The water level in the second tank slowly decreases. For this reason, in this toilet bowl cleaning device, the water level difference between the first tank and the second tank does not decrease rapidly. Therefore, this toilet bowl cleaning device can maintain the strong suction force of the second tank.

  As described above, the toilet cleaning device can maintain a state where the suction force of the second tank is stronger than the negative pressure in the toilet drainage channel due to the siphoning action generated in the toilet drainage channel. It is possible to prevent gas from flowing back into the toilet drainage channel from the second tank side during the continuation. For this reason, this toilet bowl washing | cleaning apparatus can continue a siphon effect | action, and can discharge | emit waste etc. in a toilet bowl well out of a toilet bowl body using a siphon effect | action.

  Therefore, the toilet bowl cleaning device of the first invention can perform toilet bowl cleaning satisfactorily.

  The first tank can reduce the amount of water stored per unit height in the upper region than in the lower region. In this case, this toilet flushing device has a lower water storage amount per unit height in the upper region of the first tank than in the lower region, so that when the toilet flushing is started, the water level in the first tank can be rapidly lowered. For this reason, this toilet flushing device can increase the water level difference between the first tank and the second tank from the beginning when the second tank sucks the gas in the toilet drainage channel. The gas in the drainage channel can be sucked with a strong suction force.

  In the toilet cleaning device, the second tank sucks the gas in the toilet drainage channel and causes the cleaning water to flow into the first tank, but the lower region of the first tank stores water per unit height from the upper region. Since there is much quantity, the raise of the water level in the 1st tank by the washing water can be decreased. For this reason, a decrease in the water level difference between the first tank and the second tank can be suppressed, and a decrease in the suction force of the second tank can be suppressed. In particular, the combination with the second tank having a larger amount of stored water per unit height in the upper region than in the lower region slowly reduces the water level in the second tank and reduces the increase in the water level in the first tank. Therefore, it is possible to maintain a state in which a difference in water level between the first tank and the second tank is sufficiently secured.

  The second tank may communicate with the first tank at a height where the lower opening is lower than the lowest water storage level of the first tank. In this case, since the lower opening of the second tank is always closed by the wash water stored in the first tank and is not opened in the first tank, the gas (odor) in the toilet drainage channel through the ventilation channel Can be reliably prevented from being discharged into the first tank.

  The delay device may be an on-off valve that is provided in the air passage and opens and closes the air passage. In this case, the second tank opens the toilet drainage channel via the ventilation passage by opening the on-off valve at a later timing than the supply of the wash water stored in the first tank to the toilet bowl via the water supply channel. The gas inside can be sucked. In this way, by controlling the opening / closing of the on-off valve, it is possible to easily control when the second tank starts to suck the gas in the toilet drainage channel. For this reason, this toilet bowl washing | cleaning apparatus can attract | suck the gas in a toilet drainage channel appropriately, in order to generate a siphon action in a toilet drainage channel.

  The second tank may be stored in the first tank. In this case, the communication between the first tank and the second tank can be completed only by housing and fixing the second tank in the first tank. For this reason, the member which connects a 1st tank and a 2nd tank becomes unnecessary. In addition, it is possible to eliminate the possibility of water leakage from the connecting portion between the first tank and the second tank.

  The flush toilet of the present invention comprises a toilet bowl body, a toilet body having a toilet drainage channel communicating with the downstream side of the toilet bowl section, and the toilet bowl cleaning device. In this case, the flush toilet can reliably generate the siphon action as described above and can continue the siphon action. For this reason, this flush toilet bowl can discharge | emit the waste in a toilet bowl etc. outside a toilet bowl main body using a siphon effect | action. Therefore, this flush toilet can perform toilet cleaning well.

It is the schematic which shows the flush toilet bowl of Example 1. FIG. In the flush toilet bowl of Example 1, it is the schematic which shows the initial state of toilet bowl washing | cleaning. In the flush toilet of Example 1, it is the schematic which shows the state in the middle of toilet cleaning before a 2nd tank suck | inhales gas. In the flush toilet of Example 1, it is the schematic which shows the state which is in the middle of toilet cleaning and the 2nd tank starts the suction of gas. In the flush toilet bowl of Example 1, it is the schematic which shows the state which was in the middle of toilet bowl washing | cleaning and the negative pressure in a toilet drainage channel became the maximum. It is a graph which shows the flow volume change of the pump of Example 1. FIG. 3 is a schematic view showing a flush toilet of Example 2. In the flush toilet bowl of Example 2, it is the schematic which shows the initial state of toilet bowl washing | cleaning. In the flush toilet bowl of Example 2, it is the schematic which shows the state before the 2nd tank attracts | sucks gas in the middle of toilet bowl washing | cleaning. In the flush toilet bowl of Example 2, it is the schematic which shows the state which is in the middle of toilet cleaning and the 2nd tank starts the suction of gas. In the flush toilet bowl of Example 2, it is the schematic which shows the state in the middle of toilet cleaning, and the negative pressure in a toilet drainage channel became the maximum. Is a schematic view showing a first tank or the second tank, (A), (B) is mounted reference example of the first tank with its upper part recessed inward, the (C) is a separate part of a rectangular parallelepiped on the inside of the upper Reference example of the first tank, (D) is another example of the second tank in which the upper part of the outer shell part is expanded in the horizontal direction in the horizontal direction compared to the lower part, and (E) is the outer shell part facing downward. The other Example of the 2nd tank gradually squeezed inside is shown. It is the schematic which shows the other form of a delay apparatus, (A) is the 2nd tank which has the division wall which formed the orifice, (B) is the 2nd tank which float-stored the division wall which formed the orifice, and the downward direction Is shown. It is the schematic which shows the other Example of the flush toilet bowl.

For Examples 1 and 2 embodying the flushing toilet provided with a first shot Ming toilet bowl cleaning device will be described with reference to the drawings.

<Example 1>
As shown in FIG. 1, the flush toilet of Example 1 includes a toilet main body 10 and a toilet cleaning device 20 that supplies cleaning water to the toilet main body 10. The toilet bowl body 10 includes a toilet bowl 11 and a toilet drainage channel 12 communicating with the downstream side of the toilet bowl 11. The toilet body 10 forms a water seal portion 13 for storing washing water by a lower portion of the toilet bowl portion 11 and an upstream portion of the toilet drainage channel 12.

  The toilet bowl cleaning device 20 is disposed behind the toilet bowl main body 10 at a position lower than the upper surface of the toilet bowl main body 10. For this reason, this flush toilet bowl can realize a low silhouette. The toilet bowl cleaning device 20 includes a first tank 21, a second tank 22, an air passage 23, a water supply passage 24, and an opening / closing valve 25 that is a delay device.

  The first tank 21 has an upper end that opens upward, and includes a peripheral wall portion 21A that extends in the vertical direction and a bottom wall portion 21B that closes the lower end of the peripheral wall portion 21A. The peripheral wall portion 21A has a drain port 21C penetrating in the lower portion. The drain port 21 </ b> C connects one end of the water supply channel 24. The first tank 21 can store water by flowing in the wash water via the tank water supply channel 26. The tank water supply channel 26 communicates with the water pipe as a water supply source at the upstream end. The tank water supply passage 26 is provided with a water supply valve 26V at the downstream end.

  The second tank 22 is hollow, and has a communication port 22B in which one end of the air passage 23 is connected to the upper end surface of the outer shell portion 22A, and a lower opening 22C that opens downward at the lower end. Yes. Moreover, as for the 2nd tank 22, the upper part of outer shell part 22A is expanded in one direction of the horizontal direction compared with the lower part. For this reason, the second tank 22 has a larger water storage amount per unit height in the upper region 22U than in the lower region 22D. The second tank 22 is housed and fixed in the first tank 21 such that the upper surface of the outer shell portion 22A is substantially the same height as the highest water storage level L of the first tank 21. The second tank 22 has a lower opening 22 </ b> C opened in the first tank 21. For this reason, the wash water flows into the second tank 22 from the lower opening 22 </ b> C, and the wash water can be stored at the same water level as the first tank 21. Thus, the communication between the first tank 21 and the second tank 22 can be completed only by housing and fixing the second tank 22 in the first tank 21. For this reason, the member which connects the 1st tank 21 and the 2nd tank 22 is unnecessary, and the possibility that the water leakage from the connection part of the 1st tank 21 and the 2nd tank 22 arises can be eliminated.

  By storing and fixing the second tank 22 in which the upper portion of the outer shell portion 22A is expanded in the horizontal direction compared to the lower portion in the first tank 21, the first tank 21 is located in the upper region 21U rather than the lower region 21D. The amount of water stored per unit height is reduced.

  The air passage 23 has one end connected to the communication port 22 </ b> B of the second tank 22, extends from the upper end opening of the first tank 21 toward the toilet body 10, and the other end downstream of the water seal 13. It is connected to the upper part of the toilet drainage channel 12. For this reason, the air passage 23 communicates the second tank 22 and the toilet drainage passage 12 via a position higher than the maximum water storage level L of the first tank 21. The air passage 23 is provided with an on-off valve 25 as a delay device in the middle. The on-off valve 25 is controlled to open and close by a control device (not shown), and can open and close the air passage 23.

  One end of the water supply channel 24 is connected to the drain outlet 21 </ b> C of the first tank 21, and the other end is arranged at the rear of the toilet bowl 11 of the toilet body 10. The water discharge port 24A is formed so as to discharge the cleaning water along the upper peripheral edge. For this reason, the wash water discharged from the water discharge port 24 </ b> A flows in one direction along the surface of the toilet bowl 11, and a swirling flow can be formed in the toilet bowl 11. The water supply path 24 is provided with a pump P that pumps the wash water stored in the first tank 21 to the toilet bowl 11 side. This pump P has a flow rate adjusting function capable of increasing or decreasing the flow rate of the wash water to be pumped.

  Next, the toilet cleaning process of the flush toilet having such a configuration will be described.

  In the flush toilet, in the standby state before toilet flushing, the first tank 21 stores flush water up to the maximum reservoir level L as shown in FIG. The second tank 22 stores the wash water at the same water level as that in the first tank 21. In this standby state, the open / close valve 25 provided in the vent passage 23 and the water supply valve 26V provided in the tank water supply passage 26 are closed. The toilet body 10 stores washing water in the water seal portion 13 to form a water seal.

  In the flush toilet, when a toilet cleaning button (not shown) is operated, the pump P is activated to start toilet cleaning. As shown in FIG. 6, the pump P pumps the wash water to the toilet bowl 11 side while gradually increasing the flow rate in the initial operation (0 to t1 seconds). As a result, the air in the pump P is vented, and the occurrence of air biting noise can be avoided. Further, as shown in FIG. 2, the first tank 21 has a smaller amount of water stored per unit height in the upper region 21U than the lower region 21D, and therefore the water level in the first tank 21 decreases at a stretch. The water level difference between the inside 21 and the inside of the second tank 22 is formed. Moreover, the water level in the toilet bowl part 11 of the toilet bowl body 10 rises.

  When t1 seconds elapse, the pump P increases the flow rate of the wash water to be pumped up to q1 (L / min) (t1 seconds to t2 seconds). Then, first, as shown in FIG. 3, the flow rate of the wash water that overflows from the water seal portion 13 of the toilet body 10 to the downstream side of the toilet drainage channel 12 also increases. Further, the water level in the first tank 21 is further lowered, and the water level difference between the first tank 21 and the second tank 22 is further increased. As a result, the second tank 22 can generate a suction force necessary to suck the gas from the toilet drainage channel 12.

  Further, as the pump P continues to operate, as shown in FIG. 4, the wash water overflowing from the water seal portion 13 of the toilet body 10 to the downstream side of the toilet drainage channel 12 becomes water in the downstream portion of the toilet drainage channel 12. A membrane is formed and the downstream part of the toilet drainage channel 12 is sealed. In this state, the toilet bowl cleaning device 20 opens the opening / closing valve 25 provided in the ventilation path 23. Then, since gas can flow from the toilet drainage channel 12 side to the second tank 22 side in the ventilation channel 23, the second tank 22 is placed in the toilet drainage channel 12 as the water level in the second tank 22 decreases. Aspirate the gas. In other words, the on-off valve 25 is later in time than the supply of the wash water stored in the first tank 21 to the toilet bowl 11 through the water supply channel 24 (the toilet P is started by operating the pump P). It is a delay device that opens the valve and maximizes the flow rate of the gas in the air passage 23 that flows from the toilet drainage channel 12 side to the second tank 22 side.

  In addition, since the second tank 22 starts to suck the gas in the toilet drainage channel 12 by opening the opening / closing valve 25, the toilet bowl cleaning device 20 controls the opening of the opening / closing valve 25. The timing when the second tank 22 starts to suck the gas in the toilet drainage channel 12 can be easily controlled. For this reason, the toilet flushing device 20 can appropriately suck the gas in the toilet drainage channel 12 in order to generate a siphon action in the toilet drainage channel 12.

  A closed space is formed in the toilet drainage channel 12 by a water film formed in the downstream portion of the toilet drainage channel 12, and the gas in the closed space is sucked into the second tank 22. For this reason, since this flush toilet can reduce gas reliably from the inside of the toilet drainage channel 12, the siphon action can be generated in the toilet drainage channel 12 even with a small amount of washing water.

  In addition, when the opening / closing valve 25, which is a delay device, is opened later than when the toilet flushing is started, the water level in the first tank 21 decreases during that time, and the water level in the second tank 22 is greatly different from the water level. Can be formed. Since the difference in water level between the first tank 21 and the second tank 22 is proportional to the strength of the suction force of the second tank 22, the second tank 22 has a strong suction force. For this reason, the second tank 22 can suck the gas in the toilet drainage channel 12 at a stretch. Therefore, the toilet flushing device 20 can reliably generate a siphon action in the toilet drainage channel 12.

  Further, the pump P is operated, and the second tank 22 continues to suck the gas from the toilet drainage channel 12 as the water level in the second tank 22 decreases. At this time, the wash water in the second tank 22 flows out into the first tank 21 at a large flow rate, but the amount of water stored per unit height in the second tank 22 is higher in the upper region 22U than in the lower region 22D. Since there are many, the water level in the 2nd tank 22 falls slowly.

  Further, since the lower area 21D of the first tank 21 has a larger amount of stored water per unit height than the upper area 21U, the level of water in the first tank 21 due to the wash water flowing out from the second tank 22 into the first tank 21 is increased. The rise can be reduced. Thus, since this toilet bowl washing | cleaning apparatus 20 can reduce the water level in the 2nd tank 22 slowly, and can raise the raise of the water level in the 1st tank 21, the 1st tank 21 and 2nd It is possible to maintain a state in which a difference in water level from the tank 22 is sufficiently secured. That is, the second tank 22 can suck the gas in the toilet drainage channel 12 with a strong suction force for a long time from the beginning.

  As described above, the toilet cleaning device 20 can maintain a state in which the suction force of the second tank 22 is stronger than the negative pressure in the toilet drainage channel 12 due to the siphon action generated in the toilet drainage channel 12. Further, it is possible to prevent the gas from flowing back into the toilet drainage channel 12 from the second tank 22 side during the siphon action. For this reason, this toilet bowl washing | cleaning apparatus 20 can continue a siphon effect | action.

  In addition, as shown in FIG. 5, the toilet bowl cleaning device 20 includes a first tank 21 in a state where the flush water in the toilet drainage channel 12 is substantially full and the negative pressure in the toilet drainage channel 12 is maximum. When the water level difference between the inside and the second tank 22 decreases, the flow rate of the cleaning water pumped by the pump P is further increased to q2 (L / min) (t2 seconds to t3 seconds) as shown in FIG. As a result, the flow rate of the wash water flowing out from the first tank 21 into the toilet bowl 11 increases, so that the water level in the first tank 21 is increased by the wash water flowing out from the second tank 22 into the first tank 21. The rise is prevented, and the decrease in the water level difference in the first tank 21 and the second tank 22 is prevented. Thus, the suction force of the second tank 22 can be maintained so as not to become weaker than the negative pressure in the toilet drainage channel 12, the siphon action in the toilet drainage channel 12 can be continued, and the filth in the toilet bowl Etc. can be satisfactorily discharged out of the toilet body 10 using the siphon action.

  Therefore, the flush toilet of Example 1 can perform toilet cleaning well.

  By reducing the flow rate of the wash water pumped by the pump P from t3 seconds to t4 seconds, the wash water in the toilet bowl portion 11 is reduced and the water level in the toilet bowl portion 11 is lowered. As a result, air flows into the toilet drainage channel 12 from the toilet bowl 11 side, and the siphon action ends.

  After the siphon action is finished, the wash water is stored in the water seal portion 13 of the toilet body 10 and is sealed in water, so that the wash water is supplied into the toilet bowl portion 11 at a small flow rate q3 (L / min). Pump P is stopped and toilet flushing is terminated (t4 seconds to t5 seconds). Further, the water supply valve 26 </ b> V provided in the tank water supply passage 26 is opened, and the cleaning water is stored in the first tank 21. Thereafter, when the cleaning water level in the first tank 21 reaches the maximum water storage level L and the water level in the second tank 22 reaches the same level as in the first tank 21, the water supply valve 26V is closed, and the air passage The on-off valve 25 provided at 23 is also closed. Thereby, as shown in FIG. 1, the flush toilet bowl returns to a standby state before toilet flushing.

  The water level in the first tank 21 is lowered when the toilet P is washed by operating the pump P, but does not become lower than the lower opening 22 </ b> C of the second tank 22. That is, the second tank 22 is arranged so that the lower opening 22 </ b> C opens to the first tank 21 at a height lower than the lowest water storage level of the first tank 21. For this reason, the lower opening 22C of the second tank 22 is always closed by the washing water stored in the first tank 21 and is not opened in the first tank 21, and therefore the toilet drainage channel 12 through the ventilation passage 23. The internal gas (odor) can be reliably prevented from being released into the first tank 21.

<Example 2>
As shown in FIG. 7, in the flush toilet of the second embodiment, the toilet bowl cleaning device 30 includes a third tank 32, and the flush water stored in the first tank 31 is stored in the first tank 31 using the jet pump mechanism 33. This is different from the first embodiment in that it is supplied to the first embodiment. Other configurations are the same as those of the first embodiment, and the same configurations are denoted by the same reference numerals and detailed description thereof is omitted.

  The toilet bowl cleaning device 30 is located behind the toilet bowl main body 10 and at a position lower than the upper surface of the toilet bowl main body 10. For this reason, this flush toilet bowl can realize a low silhouette. The toilet bowl cleaning device 30 includes a first tank 21, a second tank 22, an air passage 23, a water supply passage 24, an on-off valve 25 that is a delay device, a third tank 32, and a jet pump mechanism 33.

  The first tank 31 has an upper end opened upward, and includes a peripheral wall portion 31A extending in the vertical direction and a bottom wall portion 31B closing the lower end of the peripheral wall portion 31A. The first tank 31 houses and fixes the second tank 22 and the third tank 32 therein.

  The third tank 32 has an inflow port 32 </ b> A that opens downward in the first tank 31. The third tank 32 has an outlet 32B at the upper end. In the third tank 32, a branch water supply passage 37 for supplying cleaning water to an injection nozzle 36 described later is inserted in a watertight manner from the upper surface. The opening area of the outflow port 32 </ b> B is formed larger than the opening area of the injection port 36 </ b> A of the injection nozzle 36.

  The water supply channel 34 communicates the outlet 32 </ b> B and the toilet body 10. This water supply path 34 extends continuously from the opening edge of the outlet 32B. For this reason, the flow passage area of the water supply passage 34 is formed larger than the opening area of the injection port 36 </ b> A of the injection nozzle 36. Further, the water supply channel 34 has an ascending slope that extends obliquely upward to reach the upper rear end of the toilet body 10, and the water discharge port 34 </ b> A at the downstream end extends along the upper peripheral edge of the toilet bowl 11 of the toilet body 10. It is arranged to discharge the washing water. For this reason, the wash water discharged from the water discharge port 34 </ b> A of the water supply channel 34 flows in one direction along the surface of the toilet bowl 11, and a swirling flow can be formed in the toilet bowl 11.

  Moreover, since the outflow port 32B of the 3rd tank 32 is formed in the upper end part of the 3rd tank 32, the water supply path 34 does not become long, and the ascending gradient does not become steep in the water supply path 34. For this reason, the pressure loss of the washing water passing through the water supply channel 34 can be reduced. For this reason, the toilet bowl cleaning device 30 can supply a large amount of flush water to the toilet bowl body 10.

  The jet pump mechanism 33 has an injection nozzle 36 disposed in a position facing the outflow port 32 </ b> B of the third tank 32 with a gap in the third tank 32. The jet pump mechanism 33 includes an outlet 32 </ b> B of the third tank 32 and an injection nozzle 36. The injection nozzle 36 is provided in the upper part in the third tank 32, and directs the washing water to the outlet 32B so that the jetted washing water flows along the water supply channel 34. As described above, the jet pump mechanism 33 is disposed on the upper portion of the third tank 32. Wash water flows into the injection nozzle 36 through a branch water supply passage 37 that branches off the tank water supply passage 26. The branch water supply passage 37 is provided with an injection nozzle valve 37V on the way.

  Next, the toilet cleaning process of the flush toilet having such a configuration will be described.

  In the flush toilet, the first tank 31 stores the wash water up to the maximum water storage level L as shown in FIG. The second tank 22 stores cleaning water at the same water level as the first tank 31. The third tank 32 is in a full state with the wash water flowing into the water supply channel 34. In this standby state, the on-off valve 25 provided in the vent passage 23, the water supply valve 26V provided in the tank water supply passage 26, and the injection nozzle valve 37V provided in the branch water supply passage 37 are closed. The toilet body 10 stores washing water in the water seal portion 13 to form a water seal.

  In the flush toilet, when a toilet flush button (not shown) is operated, the injection nozzle valve 37V is opened as shown in FIG. 8, and toilet flushing is started. That is, wash water is jetted from the jet port 36A of the jet nozzle 36, the wash water in the third tank 32 is drawn in, and the wash water is supplied to the toilet bowl 11 of the toilet body 10 through the outlet 32B and the water supply channel 34. To do. At this time, the wash water having a flow rate of about 3 to 4 times the flow rate of the wash water ejected from the jet port 36 </ b> A of the jet nozzle 36 can be supplied to the toilet bowl 11 of the toilet body 10.

  When toilet cleaning is started, the water level per unit height in the first tank 31 is lower in the upper region 31U than in the lower region 31D, so the water level in the first tank 31 drops at a stretch, A water level difference from the inside of the second tank 22 is formed. Moreover, the water level of the toilet bowl part 11 of the toilet body 10 rises.

  Thereafter, when the toilet flushing is continued, as shown in FIG. 9, the flow rate of the washing water overflowing from the water seal portion 13 of the toilet bowl body 10 to the downstream side of the toilet drainage channel 12 also increases. Further, the water level in the first tank 31 is further lowered, and the water level difference between the first tank 31 and the second tank 22 is further increased. As a result, the second tank 22 can generate a suction force necessary to suck the gas from the toilet drainage channel 12.

  Furthermore, if the toilet bowl cleaning is continued, as shown in FIG. 10, the wash water that overflows from the water seal portion 13 of the toilet body 10 to the downstream side of the toilet drainage channel 12 forms a water film in the downstream portion of the toilet drainage channel 12. Then, the downstream part of the toilet drainage channel 12 is blocked. In this state, the toilet bowl cleaning device 30 opens the opening / closing valve 25 provided in the ventilation path 23. Then, since gas can flow from the toilet drainage channel 12 side to the second tank side in the air passage 23, the second tank 22 moves into the toilet drainage channel 12 as the water level in the second tank 22 decreases. Aspirate the gas.

  In addition, since the second tank 22 starts to suck the gas in the toilet drainage channel 12 by opening the opening / closing valve 25, the toilet flushing device 30 controls the opening of the opening / closing valve 25. The timing when the second tank 22 starts to suck the gas in the toilet drainage channel 12 can be easily controlled. For this reason, this toilet bowl washing | cleaning apparatus 30 can attract | suck the gas in the toilet drainage channel 12 appropriately, in order to generate a siphon action in the toilet drainage channel 12.

  A closed space is formed in the toilet drainage channel 12 by a water film formed in the downstream portion of the toilet drainage channel 12, and the gas in the closed space is sucked into the second tank 22. For this reason, since this flush toilet can reduce gas reliably from the inside of the toilet drainage channel 12, the siphon action can be generated in the toilet drainage channel 12 even with a small amount of washing water.

  In addition, when the opening / closing valve 25, which is a delay device, is opened later than when the toilet flushing is started, the water level in the first tank 31 decreases during that time, and the water level in the second tank 22 is greatly different from the water level. Can be formed. Since the difference in water level between the first tank 31 and the second tank 22 is proportional to the suction force of the second tank 22, the second tank 22 has a strong suction force. For this reason, the second tank 22 can suck the gas in the toilet drainage channel 12 at a stretch. Therefore, the toilet flushing device 30 can reliably generate a siphon action in the toilet drainage channel 12.

  Further, toilet flushing is continued, and the second tank 22 continues to suck gas from the toilet drainage channel 12 as the water level in the second tank 22 decreases. At this time, the wash water in the second tank 22 flows out into the first tank 31 at a large flow rate, but the amount of water stored per unit height in the second tank 22 is higher in the upper region 22U than in the lower region 22D. Since there are many, the water level in a 2nd tank falls slowly.

  Further, since the lower area 31D of the first tank 31 has a larger amount of stored water per unit height than the upper area 31U, the water level in the first tank 31 due to the wash water flowing out from the second tank 22 into the first tank 31 is reduced. The rise can be reduced. Thus, since this toilet bowl washing | cleaning apparatus 30 can reduce the water level in the 2nd tank 22 slowly, and can reduce the raise of the water level in the 1st tank 31, it is 2nd in the 1st tank 31 and 2nd. It is possible to maintain a state in which a difference in water level from the tank 22 is sufficiently secured. That is, the second tank 22 can suck the gas in the toilet drainage channel 12 with a strong suction force for a long time from the beginning.

  As described above, the toilet cleaning device 30 can maintain a state in which the suction force of the second tank 22 is stronger than the negative pressure in the toilet drainage channel 12 due to the siphon action generated in the toilet drainage channel 12. Further, it is possible to prevent the gas from flowing back into the toilet drainage channel 12 from the second tank 22 side during the siphon action. For this reason, this toilet bowl washing | cleaning apparatus 20 can continue a siphon effect | action.

  In addition, as shown in FIG. 11, the toilet bowl cleaning device 30 has the second tank 22 even when the flush water in the toilet drainage channel 12 is substantially full and the negative pressure in the toilet drainage channel 12 becomes maximum. Since the suction force is stronger, it is possible to prevent the gas from flowing back into the toilet drainage channel 12 from the second tank 22 side during the siphon action. Therefore, this toilet bowl washing | cleaning apparatus 30 can continue a siphon effect | action, and can discharge | emit the waste in a toilet bowl etc. out of the toilet body main body 10 using a siphon effect | action.

  Therefore, the flush toilet of Example 2 can perform toilet cleaning well.

  When toilet cleaning is further continued, the level of the wash water in the first tank 31 is further lowered, and the level of the wash water in the first tank 31 is lowered from the inlet 32A of the third tank 32. Then, air flows into the third tank 32 from the first tank 31 through the inlet 32A of the third tank 32, and the level of the washing water in the third tank 32 is lowered at a stretch. For this reason, the jet pump mechanism 33 is exposed in the third tank 32, and the jet pump mechanism 33 cannot draw the cleaning water. Then, the flow rate of the wash water supplied into the toilet bowl 11 decreases, and the water level in the toilet bowl 11 decreases. As a result, air flows into the toilet drainage channel 12 from the toilet bowl 11 side, and the siphon action ends.

  After the siphoning operation is finished, the washing water is stored in the water sealing portion 13 of the toilet body 10 and sealed, so that the washing water is supplied into the toilet bowl 11 and then the injection nozzle valve 37V is closed. End toilet cleaning. Further, the water supply valve 26 </ b> V provided in the tank water supply passage 26 is opened, and the cleaning water is stored in the first tank 31. Thereafter, when the water level of the cleaning water in the first tank 31 becomes the highest water storage level L, the water level in the second tank 22 becomes the same water level as in the first tank 31, and the inside of the third tank 32 becomes full, The water supply valve 26V is closed, and the on-off valve 25 provided in the ventilation path is also closed. Thereby, as shown in FIG. 7, the flush toilet bowl returns to a standby state before toilet flushing.

  Since the lower opening 22C of the second tank 22 is positioned below the inflow port 32A of the third tank 32, the second tank 22 has a lower opening 22C at a height lower than the lowest water storage level of the first tank 31. It arrange | positions so that it may open to 31. For this reason, the lower opening 22C of the second tank 22 is always closed by the wash water stored in the first tank 31 and is not opened in the first tank 31, and therefore the toilet drainage channel 12 through the vent passage 23. It is possible to reliably prevent the internal gas (odor) from being released into the first tank 31.

  In the toilet cleaning device 30, the cleaning water in the third tank 32 is drawn by the jet pump mechanism 33 and a large flow of cleaning water starts to be supplied to the toilet body 10. It flows into the third tank 32 through the inlet 32 </ b> A of the third tank 32. At this time, since the wash water in the third tank 32 is affected by the pressure of the wash water in the first tank 31, the inside of the third tank 32 is maintained in a full state with the wash water. For this reason, since the jet pump mechanism 33 can maintain the state immersed in the wash water in the 3rd tank 32, and can continue drawing in the wash water in the 3rd tank 32, a large flow of wash water is supplied to the toilet body 10. Can continue to supply.

The present invention is not limited to the first and second embodiments described with reference to the above description and drawings. For example, the following embodiments are also included in the technical scope of the present invention .

( 1 ) In the first and second embodiments, the upper part of the outer shell of the second tank is enlarged in one horizontal direction compared to the lower part. However, as shown in FIG. The upper part of the outer shell part may be expanded in a plurality of directions such as the horizontal direction in the horizontal direction as compared with the lower part. Further, as shown in FIG. 12 (E), the second tank 46 has a larger amount of water stored per unit height in the upper region than in the lower region by gradually narrowing the outer shell portion inward toward the lower portion. May be.

( 2 ) In the first and second embodiments, the on-off valve is used as the delay device. However, as shown in FIGS. 13A and 13B, the second tank 51 may be provided with a delay device. That is, the second tank 51 shown in FIG. 13A is divided into an upper water storage chamber 51U and a lower water storage chamber 51D by the partition wall 52 in which the orifice 53 is formed. In the second tank 51, when toilet cleaning starts and the cleaning water in the second tank 51 flows into the first tank 21 from the lower opening 51A, the cleaning water passes through the orifice 53 in the initial stage of toilet cleaning. At this time, since the washing water has a relatively large flow resistance, the water level in the second tank 51 is slowly lowered. When the water level in the second tank 51 falls below the partition wall 52, air having a smaller flow resistance than the washing water passes through the orifice 53, so that the water level in the second tank 51 rapidly decreases. Thus, with this structure, it is possible to form a delay device that can maximize the flow rate of the gas flowing from the toilet drainage channel side to the second tank 51 side later than when the toilet flushing is started.

  In addition, the second tank 51 shown in FIG. 13B is partitioned into an upper water storage chamber 51U and a lower water storage chamber 51D by a partition wall 52 in which an orifice 53 is formed, and the lower water storage chamber 51D has a specific gravity higher than that of washing water. And a spherical float 54 that can close the orifice 53 is housed. In the second tank 51, when the toilet cleaning starts and the cleaning water in the second tank 51 flows into the first tank 21 from the lower opening 51A, the cleaning water passing through the orifice 53 floats in the initial stage of toilet cleaning. Since the resistance of 54 is received, the water level in the second tank 51 falls more slowly than in the case where there is no float 54. When the water level in the second tank 51 falls below the partition wall 52, the float 54 descends to open the orifice 53, and air having a smaller flow resistance than the washing water passes through the orifice 53. The water level in the two tanks 51 drops rapidly. Thus, with this structure, it is possible to form a delay device that can maximize the flow rate of the gas flowing from the toilet drainage channel side to the second tank 51 side later than when the toilet flushing is started.

( 3 ) In Example 2, the toilet bowl cleaning device includes the third tank, and includes the jet pump mechanism having the injection nozzle that jets the cleaning water toward the outlet of the third tank. As shown in FIG. In addition, the third tank may not be provided. In this case, the branch water supply passage 37 is extended to the vicinity of the bottom wall portion 31B of the first tank 31, and the jet outlet 61A of the jet nozzle 61 is arranged in the vicinity of the bottom wall portion 31B, and is located at a position facing the jet outlet 61A. An upstream end opening 62A of the water supply passage 62 may be disposed to form a jet pump mechanism.

DESCRIPTION OF SYMBOLS 10 ... Toilet body 11 ... Toilet bowl part 12 ... Toilet drain 20, 20, Toilet washing device 21, 31 ... First tank 21D ... Lower region (of the first tank) 21U ... Upper region (of the first tank) 22 ... Second tank 22C ... Lower opening 22D (second tank) Lower area 22U (Second tank) Upper area 23 ... Air passage 24, 34 ... Water supply path 25 ... Open / close valve (delay device) )
L ... Highest water storage level

Claims (6)

A toilet cleaning device for supplying cleaning water to a toilet body having a toilet bowl and a toilet drainage channel communicating with the downstream side of the toilet bowl,
A first tank for storing wash water;
A second tank having a lower opening communicating with the first tank and having a larger amount of water stored per unit height in an upper region than in a lower region;
A vent path communicating the second tank and the toilet drainage path via a position higher than the highest water storage level of the first tank;
A water supply channel communicating the first tank and the toilet bowl,
The flow rate of the gas in the ventilation path that flows from the toilet drainage path side to the second tank side at a later time than the supply of the wash water stored in the first tank to the toilet bowl through the water supply path A toilet cleaning device comprising a delay device for maximizing the amount of the toilet.   The toilet cleaning device according to claim 1, wherein the first tank has a smaller amount of water stored per unit height in an upper region than in a lower region. The toilet cleaning apparatus according to claim 1 or 2 , wherein the second tank communicates with the first tank so that the lower opening has a height lower than the lowest water storage level of the first tank . Said delay device, the provided air passage, the toilet flushing apparatus of any one of claims 1 to 3, wherein the opening and closing valve der Rukoto for opening and closing the air passage. It said second tank toilet bowl flushing device according to any one of claims 1 to 4, characterized that you have been accommodated in the first tank. Bowl portion, and washing, wherein the toilet body having a toilet drain passage communicating with the downstream side of the bowl portion, that is a toilet bowl flushing device according to any one of claims 1 to 5 Toilet bowl.

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