JP5724438B2 - Halogen-containing gas supply apparatus and halogen-containing gas supply method - Google Patents

Description

  The present invention relates to a halogen-containing gas supply device and a halogen-containing gas supply method.

  Halogen gas plays an important role as an etching process gas for substrates in semiconductor manufacturing processes such as semiconductor devices, МEMS devices, liquid crystal TFT panels and solar cells, and a cleaning process gas for thin film forming equipment such as CVD equipment. ing.

  As one of the methods for supplying the halogen gas, there is a method for supplying the halogen gas from a cylinder filled with a high pressure. The halogen gas filled in the cylinder at high pressure is supplied to the semiconductor manufacturing apparatus via a valve for introduction.

  By improving the filling pressure of the halogen gas and reducing the replacement frequency of the cylinder, the transportation cost and work load of the cylinder can be reduced. In addition, the cleaning process can be efficiently performed by using a high-concentration halogen gas. Therefore, it is desired to fill the cylinder with a high pressure and high concentration of halogen gas.

  Halogen gas is a highly reactive gas and is not easy to handle in semiconductor manufacturing equipment. In particular, development of a container valve suitable for highly reactive fluorine gas is desired.

  Patent Document 1 discloses a container valve that supplies a high concentration fluorine gas to a semiconductor manufacturing system at a high pressure.

  Patent Document 2 discloses a vacuum pumping performance and a purging performance as a container valve (valve) for supplying a high purity gas such as a semiconductor material gas, a purge gas, a standard gas, and a carrier gas used in the semiconductor industry. For the purpose of improving gas replacement characteristics, a direct diaphragm valve is disclosed in which an obstacle is removed from a gas flow path and a dead space in which gas stays is minimized.

  Further, Patent Document 3 discloses a valve in which a rubber seal is disposed in a portion recessed from a flame flow path in order to cope with burnout of the rubber seal and a decrease in the sealing function of the seal portion of the valve.

  Furthermore, Patent Document 4 discloses a linear servo valve that does not burn out the coil or deteriorates insulation by adopting a configuration in which the coil or bobbin that opens and closes the valve seat is air-cooled.

JP 2005-207480 A JP 2005-188672 A JP 2000-291500 A Japanese Utility Model Publication No. 5-62704

  However, since the container valve described in Patent Document 1 is a valve that opens and closes a gas flow path with a seat disk and seals the airtightness with the outside by a diaphragm, a dead space in which gas in the valve chamber tends to stay increases. .

  Patent Document 2 discloses that the influence of gas molecules such as moisture and particles adsorbing on the surface of the gas contact portion is reduced by polishing the inside of the valve. However, the detailed polishing portion and shape are not specifically described. Further, there is no description that it can be applied to fluorine and fluorine compound gas.

In conventional valves, when high-pressure, high-concentration fluorine gas is handled, the temperature in the valve chamber rises, causing problems such as surface corrosion in the valve chamber and deterioration of the sealing material. Also, resin materials are used for the sealing material. There was a problem that the resin material was burnt out by fluorine gas. This problem is also the same when handling a combustion-supporting gas such as O ₂ or NO.

  The valve described in Patent Document 3 is a countermeasure against backfire, and cannot be applied to high-pressure, high-concentration fluorine gas. Further, the linear servo valve described in Patent Document 4 is such that coils and bobbins are air-cooled and cannot be applied to high-pressure, high-concentration fluorine gas.

  When introducing halogen gas through a supply valve from a container filled with highly corrosive halogen gas such as fluorine gas, the halogen gas tends to cause surface corrosion and deterioration of the sealing material in the valve chamber of the introduction valve on the introduction side. Even if the above-described conventional valve is used as the introduction valve, burning of the sealing material cannot be prevented.

  The present invention has been made in view of the above problems, and an object of the present invention is to suppress the surface corrosion of the introduction valve that guides the halogen-containing gas to an external device and the deterioration of the sealing material used in the introduction valve.

The present invention is a halogen-containing gas supply device for supplying a halogen-containing gas from a container filled with the halogen-containing gas to an external device, the supply valve for supplying the halogen-containing gas from the container; A shock wave preventing mechanism that is provided downstream of the supply valve and prevents a shock wave from being generated.

  In the present invention, the halogen of the halogen-containing gas is fluorine, chlorine, bromine, or iodine.

  Further, the present invention is characterized in that the halogen-containing gas filling pressure is 5 MPa or more and 20 MPa or less.

  Further, the present invention is a halogen-containing gas supply method for supplying a halogen-containing gas from a container filled with the halogen-containing gas to an external device, and the container is opened to a high pressure by opening a supply valve. The filled halogen-containing gas is guided to the external device through a shock wave prevention mechanism that prevents generation of shock waves.

  According to the present invention, since the halogen-containing gas is supplied to the external device through a shock wave prevention mechanism that prevents the generation of shock waves, the surface corrosion of the introduction valve that leads the halogen-containing gas to the external device and the seal used for the introduction valve Deterioration of the material can be suppressed.

It is a systematic diagram of the Example of this invention. It is the schematic of the shock wave prevention mechanism in Example 1 of this invention. It is the schematic of the shock wave prevention mechanism in Example 2 of this invention. It is the schematic of the shock wave prevention mechanism in Example 3, 5 of this invention. It is the schematic of the shock wave prevention mechanism in Example 4 of this invention.

  A halogen-containing gas supply device according to an embodiment of the present invention supplies a halogen-containing gas from a container filled with the halogen-containing gas to a external device, and supplies the halogen-containing gas from the container. And a shock wave prevention mechanism that is provided downstream of the supply pipe and prevents the generation of shock waves.

  The external apparatus is a semiconductor manufacturing apparatus that manufactures semiconductors used for semiconductor devices, МEMS devices, liquid crystal TFT panels, solar cells, and the like. The halogen-containing gas is used as a cleaning process gas or an etching process gas in a semiconductor manufacturing process.

  Hereinafter, a halogen-containing gas supply device and a halogen-containing gas supply method according to embodiments of the present invention will be described in detail.

  A container filled with a halogen-containing gas at a high pressure is a container having an on-off valve and capable of sealing the high-pressure gas. A conduit is connected to the opening / closing valve of the container, and the supply valve for supplying the halogen-containing gas from the container is provided in the conduit. A supply device capable of supplying a halogen-containing gas is configured by the container and the supply valve. A shock wave preventing mechanism for preventing the generation of shock waves is provided downstream of the supply valve. An introduction valve for introducing the halogen-containing gas into the external device is provided downstream of the shock wave prevention mechanism. The introduction valve may be provided in the external device or in the supply device.

  By opening the supply valve, the halogen-containing gas in the container is supplied to the external device via the shock wave prevention mechanism and the introduction valve. In addition, a container may be used independently or may connect and use several things in parallel. The number of containers is not particularly limited.

  The material of the container is preferably one having corrosion resistance against the halogen gas to be filled, and examples thereof include manganese steel, stainless steel, and nickel-containing alloys (Hastelloy, Inconel, Monel, etc.).

  The halogen of the halogen-containing gas is fluorine, chlorine, bromine, or iodine, and any two or more of these may be mixed.

Any halogen-containing gas may be used as long as it contains halogen, and fluorine gas, chlorine gas, bromine gas, iodine gas halogen gas, or halogen compounds such as NF ₃ , BF ₃ , ClF, ClF ₃ , and IF ₇ . These gases may be mixed with an inert gas such as N ₂ , Ar, or He. Alternatively, a mixed gas of a halogen gas and a halogen compound gas may be mixed with an inert gas.

The concentration of the halogen gas and the halogen compound gas in the halogen-containing gas is not particularly limited. For example, fluorine gas, chlorine gas, bromine gas, iodine gas, NF ₃ gas, BF ₃ gas, ClF gas, ClF ₃ gas, And at least one of IF ₇ gases is in the range of 0.1 vol% or more and 100 vol% or less.

  The filling pressure of the halogen-containing gas is desirably 5 MPaG or more and 20 MPaG or less. If the pressure is less than 5 MPaG, the temperature inside the introduction valve on the introduction side is unlikely to increase, and surface corrosion in the valve chamber of the introduction valve and deterioration of the sealing material used for the introduction valve are unlikely to occur. On the other hand, if it exceeds 20 MPaG, the use of the present invention is not preferable because the temperature inside the introduction valve does not increase, but corrosion of the surface of the gas contact portion due to halogen gas tends to occur.

  When the halogen-containing gas is supplied from the supply valve, a shock wave is generated when the moving speed of the supplied gas exceeds a certain level. In general, the speed at which this shock wave is generated is expressed using the Mach number expressed by the following equation (1).

Mach number (M) = fluid velocity (V) / sound velocity (a) (1)
Here, the sound velocity (a) in gas is expressed by the following equation (2) using the specific heat ratio (κ), gas constant (R), gas temperature (T), and gas average molecular weight (M). It is.

  When the gas velocity is such that the Mach number calculated from the above equations (1) and (2) is 0.7 or more and less than 1.2, depending on the conditions of the diameter and length of the conduit through which the gas flows, Shock waves can occur. When the gas velocity is such that the Mach number is 1.2 or more, a shock wave is generated as the gas moves.

  Therefore, in order to prevent the generation of shock waves due to gas movement, it is necessary to reduce the gas movement speed so that the Mach number is less than 0.7.

  Specifically, for example, when the halogen-containing gas is 100% fluorine gas, the speed of sound at 25 ° C. is 302.12 m / s, so the gas moving speed should be controlled to less than 211.48 m / s. Thus, the generation of shock waves can be prevented.

  Further, since the shock wave generated by the movement of the gas has high straightness, the generated shock wave can be dispersed and the growth of the shock wave can be suppressed by changing the moving direction of the gas.

  The shock wave prevention mechanism is a shock wave suppression mechanism that suppresses generation of a shock wave or a shock wave attenuation mechanism that attenuates the generated shock wave by using the above-described properties of the shock wave.

  Specific examples of the shock wave suppressing mechanism for suppressing the generation of shock waves are given below.

  The first shock wave suppression mechanism is a mechanism having a structure that restricts gas flow, such as a valve, a straight tube, or an orifice. In this mechanism, since the moving speed of the gas decreases downstream of the location where the gas flow is restricted, the generation of shock waves can be suppressed.

  A 2nd shock wave suppression mechanism is a mechanism provided with the bypass pipe provided so that the structure part which restricted gas distribution in the 1st shock wave suppression mechanism may be bypassed, and the on-off valve provided in the bypass pipe. In this mechanism, first, gas is filled from the structure that restricts gas flow at a speed that does not generate shock waves throughout the shock wave suppression mechanism, and then the on-off valve is opened to allow gas to flow through the bypass pipe. Therefore, when gas is supplied to the external device, the gas also flows to the bypass pipe, and the supply flow rate can be improved.

  Next, a specific example of a shock wave attenuating mechanism for attenuating the generated shock wave is given below.

  The first shock wave attenuating mechanism is a mechanism in which a conduit is wound in a coil shape. In this mechanism, since the conduit is coiled, gas does not flow linearly through the conduit. Therefore, the growth of the shock wave in the conduit is suppressed, and the shock wave is attenuated.

  The second shock wave attenuation mechanism is a mechanism in which a baffle plate is installed in the conduit. In this mechanism, since the gas flow direction changes discontinuously, the growth of the shock wave in the conduit is suppressed, and the shock wave is attenuated.

  The structure of the shock wave preventing mechanism used in the present invention is particularly limited as long as it has a mechanism for suppressing the generation of the shock wave or attenuating the generated shock wave based on the above-described properties of the shock wave. There is no.

  When supplying a high-pressure halogen-containing gas by opening the supply valve, the internal temperature of the introduction valve for introducing the halogen-containing gas into the external device is likely to increase, and surface corrosion or introduction in the valve chamber of the introduction valve The sealing material used for the valve is likely to deteriorate. This is presumed that due to the opening of the supply valve, a shock wave is generated in the conduit through which the halogen-containing gas flows, and it grows in the process of propagation of the generated shock wave and reaches the introduction valve, thus causing a rise in temperature inside the introduction valve. Is done. Therefore, in the present invention, the generation and growth of shock waves between the supply valve and the introduction valve are suppressed by supplying the halogen-containing gas to the introduction valve via the shock wave generation preventing mechanism. Thereby, the temperature rise inside the introduction valve, the surface corrosion in the valve chamber of the introduction valve, and the deterioration of the sealing material can be suppressed.

  Hereinafter, the present invention will be described in detail by way of examples.

FIG. 1 shows a system diagram of this embodiment. Manganese steel container 1 is filled with 20 vol% F ₂ gas diluted with N _{2 at} a pressure of 5 MPaG. An opening / closing valve 2 is mounted on the container 1, and a linear stainless steel conduit 3 having an inner diameter of 1.07 cm and a length of 20 cm is connected to the opening / closing valve 2. The conduit 3 is provided with the supply valve 4 for supplying the F ₂ gas, introducing valve leading to the external device 100 the F ₂ gas is provided downstream of the supply valve 4. A shock wave prevention mechanism 50 is provided between the supply valve 4 and the introduction valve 5. A vacuum exhaust system is connected to the downstream of the introduction valve 5 via a manual valve 6. The vacuum evacuation equipment is for performing gas replacement in the conduit 3.

  As shown in FIG. 2, the shock wave prevention mechanism 50 is a stainless pipe 51 having an inner diameter of 0.75 cm, wound in a spiral shape having a diameter of 7 cm, and is connected between the supply valve 4 and the introduction valve 5. The introduction valve 5 is a valve for which damage is evaluated. The material 5 of the sealing material of the introduction valve 5 is PCTFE (ethylene trifluorochloride).

  All the valves other than the opening / closing valve 2 of the container 1 are opened and the inside of the conduit 3 is evacuated, and then all the valves are closed. Thereafter, the on-off valve 2 was opened, and the pressure in the conduit 3 from the container 1 to the supply valve 4 was set to 5 MPaG.

  Next, the supply valve 4 was opened, and the pressure up to the introduction valve 5 was maintained at 5 MPaG for 5 minutes. After 5 minutes, the on-off valve 2 was closed, the introduction valve 5 and the manual valve 6 were opened, and the inside of the conduit 3 was evacuated by vacuum exhaust equipment.

After the above operation was repeated 10 times, when the internal leak amount of the introduction valve 5 was measured by the leak detector, the leak amount was 1.0 × 10 ⁻⁸ Pa · m ³ / s or less and there was no leak. It was confirmed.

  When the introduction valve 5 was disassembled and the sealing material was visually observed, no burning of the sheet material was observed.

  As shown in FIG. 3, the shock wave preventing mechanism 50 includes a stainless steel pipe 52 having an inner diameter of 5.27 cm and a length of 20 cm, and a plurality of stainless baffle plates 53 disposed inside the stainless steel pipe 52 and partially cut away. With. FIG. 3A is a perspective view of the shock wave preventing mechanism 50, and FIG. 3B is a cross-sectional view of the shock wave preventing mechanism 50. The configuration other than the shock wave prevention mechanism 50 is the same as the configuration of the first embodiment. The operation was also performed in the same manner as in Example 1.

The baffle plate 53 is arranged so that the outer diameter is substantially the same as the inner diameter of the stainless steel pipe 52, and the outer circumference is along the inner circumference of the stainless steel pipe 52. The baffle plate 53 is notched so that the area of the opening 54 through which the halogen-containing gas can pass is 4.4 cm ^{2 while} being arranged inside the stainless steel pipe 52. Seven baffle plates 53 are arranged in the length direction of the stainless steel pipe 52 at equal intervals so that the openings 54 are staggered.

As a result, the internal leak amount of the introduction valve 5 measured by the leak detector was 1.0 × 10 ⁻⁸ Pa · m ³ / s or less, and it was confirmed that there was no leak.

  When the introduction valve 5 was disassembled and the sealing material was visually observed, no burning of the sheet material was observed.

  As shown in FIG. 4, the shock wave preventing mechanism 50 is an orifice tube in which the orifice plate 10 is installed inside the center of a stainless steel pipe 56 having an inner diameter of 1.07 cm and a length of 20 cm.

  The orifice plate 10 is provided with a through hole having a diameter of 0.2 cm in the center of a stainless disc having a diameter of 2 cm. The orifice plate 10 is arranged so that the outer diameter is substantially the same as the inner diameter of the stainless steel pipe 56 and the outer circumference is along the inner circumference of the stainless steel pipe 56. The configuration other than the shock wave prevention mechanism 50 is the same as the configuration of the first embodiment. The operation was also performed in the same manner as in Example 1.

As a result, the internal leak amount of the automatic valve 5 measured by the leak detector was 1.0 × 10 ⁻⁸ Pa · m ³ / s or less, and it was confirmed that there was no leak.

  When the introduction valve 5 was disassembled and the sealing material was visually observed, no burning of the sheet material was observed.

  As shown in FIG. 5, the shock wave preventing mechanism 50 includes a stainless steel main conduit 11 having an inner diameter of 1.07 cm through which gas flows, and a stainless steel tube 12 having an inner diameter of 0.08 cm and a length of 10 cm provided in the main conduit 11. And a stainless steel bypass pipe 13 having an inner diameter of 1.07 cm connected to the main conduit 11 so as to bypass the tube 12 and an on-off valve 14 provided in the bypass pipe 13. The configuration other than the shock wave prevention mechanism 50 is the same as the configuration of the first embodiment. The operation was also performed in the same manner as in Example 1.

  All the valves other than the opening / closing valve 2 of the container 1 are opened, and the inside of the conduit 3, the main conduit 11, the tube 12, and the bypass pipe 13 is evacuated, and then all the valves are closed. Thereafter, the on-off valve 2 was opened, and the pressure in the conduit 3 from the container 1 to the supply valve 4 was set to 5 MPaG.

  Next, the supply valve 4 was opened, gas was circulated through the tube 12, the pressure up to the introduction valve 5 was increased to 5 MPaG, and then the on-off valve 14 was opened and held for 5 minutes. After 5 minutes, the on-off valve 2 was closed, the manual valve 6 was opened, and the inside of the conduit 3, the main conduit 11, the tube 12, and the bypass tube 13 was evacuated by vacuum exhaust equipment.

After repeating the above operation 10 times, when measuring the internal leak amount of the introduction valve 5 by the leak detector, the leak amount is 1.0 × 10 ⁻⁸ Pa · m ³ / s or less, It was confirmed that there was no leak.

  When the introduction valve 5 was disassembled and the sealing material was visually observed, no burning of the sheet material was observed.

The shock wave preventing mechanism 50 uses the orifice tube used in the third embodiment instead of the tube 12 of the fourth embodiment. Other configurations are the same as those of the fourth embodiment. The operation was also performed in the same manner as in Example 4 .

As a result, the internal leak amount of the introduction valve 5 measured by the leak detector was 1.0 × 10 ⁻⁸ Pa · m ³ / s or less, and it was confirmed that there was no leak.

  When the introduction valve 5 was disassembled and the sealing material was visually observed, no burning of the sheet material was observed.

In this embodiment, the container 1 is filled with 100 vol% NF ₃ gas at a pressure of 14.7 MPaG. Other configurations are the same as those of the first embodiment. The operation was also performed in the same manner as in Example 1.

As a result, the internal leak amount of the introduction valve 5 measured by the leak detector was 1.0 × 10 ⁻⁸ Pa · m ³ / s or less, and it was confirmed that there was no leak.

  When the introduction valve 5 was disassembled and the sealing material was visually observed, no burning of the sheet material was observed.

In this embodiment, the container 1 is filled with 100 vol% O ₂ gas at a pressure of 14.7 MPaG. Other configurations are the same as those of the first embodiment. The operation was also performed in the same manner as in Example 1.

As a result, the internal leak amount of the introduction valve 5 measured by the leak detector was 1.0 × 10 ⁻⁸ Pa · m ³ / s or less, and it was confirmed that there was no leak.

  When the introduction valve 5 was disassembled and the sealing material was visually observed, no burning of the sheet material was observed.

In this embodiment, the container 1 is filled with 20 vol% BF ₃ gas diluted with N _{2 at} a pressure of 14.7 MPaG. Other configurations are the same as those of the first embodiment. The operation was also performed in the same manner as in Example 1.

As a result, the internal leak amount of the introduction valve 5 measured by the leak detector was 1.0 × 10 ⁻⁸ Pa · m ³ / s or less, and it was confirmed that there was no leak.

  When the introduction valve 5 was disassembled and the sealing material was visually observed, no burning of the sheet material was observed.

In the present embodiment, the container 1 is filled with 20 vol% ClF gas diluted with N _{2 at} a pressure of 14.7 MPaG. Other configurations are the same as those of the first embodiment. The operation was also performed in the same manner as in Example 1.

As a result, the internal leak amount of the introduction valve 5 measured by the leak detector was 1.0 × 10 ⁻⁸ Pa · m ³ / s or less, and it was confirmed that there was no leak.

  When the introduction valve 5 was disassembled and the sealing material was visually observed, no burning of the sheet material was observed.

In this embodiment, the container 1 is filled with 0.1 vol% ClF ₃ gas diluted with N _{2 at} a pressure of 5 MPaG. Other configurations are the same as those of the first embodiment. The operation was also performed in the same manner as in Example 1.

As a result, the internal leak amount of the introduction valve 5 measured by the leak detector was 1.0 × 10 ⁻⁸ Pa · m ³ / s or less, and it was confirmed that there was no leak.

  When the introduction valve 5 was disassembled and the sealing material was visually observed, no burning of the sheet material was observed.

In this embodiment, the container 1 is filled with 0.1 vol% IF ₇ gas diluted with N _{2 at} a pressure of 5 MPaG. Other configurations are the same as those of the first embodiment. The operation was also performed in the same manner as in Example 1.

As a result, the internal leak amount of the introduction valve 5 measured by the leak detector was 1.0 × 10 ⁻⁸ Pa · m ³ / s or less, and it was confirmed that there was no leak.

When the introduction valve 5 was disassembled and the sealing material was visually observed, no burning of the sheet material was observed.
[Comparative Example 1]
Instead of the shock wave prevention mechanism 50 shown in the first to fourth embodiments, the supply valve 4 and the introduction valve 5 are directly connected using a straight stainless steel pipe having an outer diameter of 1/2 inch and a length of 200 mm. did. Other than that was carried out in the same manner as in Example 1.

As a result, the amount of internal leakage of the introduction valve 5 measured by the leak detector was 1.3 × 10 ⁻¹ Pa · m ³ / s, which was a poor airtightness.
[Comparative Example 2]
In this comparative example, the container 1 is filled with 100 vol% NF ₃ gas at a pressure of 14.7 MPaG. Other configurations are the same as those of the first comparative example. The operation was also performed in the same manner as in Comparative Example 1.

As a result, the internal leak amount of the introduction valve 5 measured by the leak detector was 1.0 × 10 ⁻⁸ Pa · m ³ / s or less, and it was confirmed that there was no leak.

However, when the introduction valve 5 was disassembled and the sealing material was visually observed, burning of the sheet material was observed.
[Comparative Example 3]
In this comparative example, the container 1 is filled with 100 vol% O ₂ gas at a pressure of 14.7 MPaG. Other configurations are the same as those of the first comparative example. The operation was also performed in the same manner as in Comparative Example 1.

As a result, the internal leak amount of the introduction valve 5 measured by the leak detector was 1.0 × 10 ⁻⁸ Pa · m ³ / s or less, and it was confirmed that there was no leak.

However, when the introduction valve 5 was disassembled and the sealing material was visually observed, burning of the sheet material was observed.
[Comparative Example 4]
In this comparative example, the container 1 is filled with 20 vol% BF ₃ gas diluted with N _{2 at} a pressure of 14.7 MPaG. Other configurations are the same as those of the first comparative example. The operation was also performed in the same manner as in Comparative Example 1.

As a result, the internal leak amount of the introduction valve 5 measured by the leak detector was 1.0 × 10 ⁻⁸ Pa · m ³ / s or less, and it was confirmed that there was no leak.

However, when the introduction valve 5 was disassembled and the sealing material was visually observed, burning of the sheet material was observed.
[Comparative Example 5]
In this comparative example, the container 1 is filled with 20 vol% ClF gas diluted with N _{2 at} a pressure of 14.7 MPaG. Other configurations are the same as those of the first comparative example. The operation was also performed in the same manner as in Comparative Example 1.

As a result, the internal leak amount of the introduction valve 5 measured by the leak detector was 1.0 × 10 ⁻⁸ Pa · m ³ / s or less, and it was confirmed that there was no leak.

However, when the introduction valve 5 was disassembled and the sealing material was visually observed, burning of the sheet material was observed.
[Comparative Example 6]
In this comparative example, the container 1 is filled with 0.1 vol% ClF ₃ gas diluted with N _{2 at} a pressure of 5 MPaG. Other configurations are the same as those of the first comparative example. The operation was also performed in the same manner as in Comparative Example 1.

As a result, the internal leak amount of the introduction valve 5 measured by the leak detector was 1.0 × 10 ⁻⁸ Pa · m ³ / s or less, and it was confirmed that there was no leak.

However, when the introduction valve 5 was disassembled and the sealing material was visually observed, burning of the sheet material was observed.
[Comparative Example 7]
In this comparative example, the container 1 is filled with 0.1 vol% IF ₇ gas diluted with N _{2 at} a pressure of 5 MPaG. Other configurations are the same as those of the first comparative example. The operation was also performed in the same manner as in Comparative Example 1.

As a result, the internal leak amount of the introduction valve 5 measured by the leak detector was 1.0 × 10 ⁻⁸ Pa · m ³ / s or less, and it was confirmed that there was no leak.

  However, when the introduction valve 5 was disassembled and the sealing material was visually observed, burning of the sheet material was observed.

  When the introduction valve 5 was disassembled and the sealing material was visually observed, burning of the sheet material was observed.

In the above embodiment, the apparatus for supplying the halogen-containing gas filled with high pressure from the container to the external apparatus has been described. However, as shown in Example 7 and Comparative Example 3, the same effects can be obtained when a flammable gas such as O ₂ or NO is used instead of the halogen-containing gas. That is, even if the gas to be applied is changed from the halogen-containing gas to the combustion-supporting gas and the other configurations are the same, the invention is established.

Specifically, it is a combustion-supporting gas supply device that supplies a combustion-supporting gas from a container filled with the high-pressure combustion-supporting gas to an external device for supplying the combustion-supporting gas from the container. and the supply valve, and a shock wave preventing mechanism for preventing the generation of the shock wave is provided downstream of the supply valve, and the invention is established even if the configuration.

Also, there is provided a combustion-supporting gas supply method for supplying a combustion-supporting gas from a container filled with the combustion-supporting gas to the external device to the external device. filled combustion supporting gas through a shock wave preventing mechanism for preventing the generation of the shock wave is led to the external device, and the invention is established even if the configuration.

  Further, the filling pressure of the combustion-supporting gas is preferably 5 MPa or more and 20 MPa or less.

  Even in this configuration in which a combustion-supporting gas is used, since the combustion-supporting gas is supplied to the external device through a shock wave prevention mechanism that prevents the generation of shock waves, the surface of the introduction valve that leads the combustion-supporting gas to the external device Corrosion and deterioration of the sealing material used for the introduction valve can be suppressed.

  The present invention is not limited to the above-described embodiment, and it is obvious that various modifications can be made within the scope of the technical idea.

  The halogen-containing gas supply apparatus and the halogen-containing gas supply method of the present invention can be used for safely supplying a halogen-containing gas as a cleaning gas or an etching gas to a semiconductor manufacturing apparatus.

50 Shock wave prevention mechanism 1 Container 2 Open / close valve 3 Conduit 4 Supply valve 5 Introduction valve 6 Manual valve 10 Orifice plate 11 Main conduit 12 Tube 13 Bypass pipe 14 Open / close valve

Claims (4)

A halogen-containing gas supply device that supplies a halogen-containing gas to an external device from a container filled with the halogen-containing gas at a high pressure,
A supply valve for supplying a halogen-containing gas from the container;
A shock wave prevention mechanism that is provided downstream of the supply valve and prevents the generation of shock waves;
A halogen-containing gas supply device comprising:   The halogen-containing gas supply device according to claim 1, wherein the halogen of the halogen-containing gas is fluorine, chlorine, bromine, or iodine.   The halogen-containing gas supply device according to claim 1 or 2, wherein a filling pressure of the halogen-containing gas is 5 MPa or more and 20 MPa or less. A halogen-containing gas supply method for supplying a halogen-containing gas to an external device from a container filled with the halogen-containing gas at a high pressure,
By supply valve is opened, the halogen-containing gas which is pressure filled into the vessel, a halogen-containing gas supply method characterized by through the shock wave preventing mechanism for preventing the generation of the shock wave is led to the external device .