JP5717296B2 - 回折顕微法 - Google Patents
回折顕微法 Download PDFInfo
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- JP5717296B2 JP5717296B2 JP2011551750A JP2011551750A JP5717296B2 JP 5717296 B2 JP5717296 B2 JP 5717296B2 JP 2011551750 A JP2011551750 A JP 2011551750A JP 2011551750 A JP2011551750 A JP 2011551750A JP 5717296 B2 JP5717296 B2 JP 5717296B2
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B21/00—Microscopes
- G02B21/36—Microscopes arranged for photographic purposes or projection purposes or digital imaging or video purposes including associated control and data processing arrangements
- G02B21/365—Control or image processing arrangements for digital or video microscopes
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
- G01N23/20058—Measuring diffraction of electrons, e.g. low energy electron diffraction [LEED] method or reflection high energy electron diffraction [RHEED] method
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/0808—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more diffracting elements
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/42—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect
- G02B27/4205—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having a diffractive optical element [DOE] contributing to image formation, e.g. whereby modulation transfer function MTF or optical aberrations are relevant
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/04—Processes or apparatus for producing holograms
- G03H1/08—Synthesising holograms, i.e. holograms synthesized from objects or objects from holograms
- G03H1/0866—Digital holographic imaging, i.e. synthesizing holobjects from holograms
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H5/00—Holographic processes or apparatus using particles or using waves other than those covered by groups G03H1/00 or G03H3/00 for obtaining holograms; Processes or apparatus for obtaining an optical image from them
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/22—Optical, image processing or photographic arrangements associated with the tube
- H01J37/222—Image processing arrangements associated with the tube
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/244—Detectors; Associated components or circuits therefor
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/295—Electron or ion diffraction tubes
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/0005—Adaptation of holography to specific applications
- G03H2001/005—Adaptation of holography to specific applications in microscopy, e.g. digital holographic microscope [DHM]
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/04—Processes or apparatus for producing holograms
- G03H1/08—Synthesising holograms, i.e. holograms synthesized from objects or objects from holograms
- G03H1/0808—Methods of numerical synthesis, e.g. coherent ray tracing [CRT], diffraction specific
- G03H2001/0816—Iterative algorithms
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H2226/00—Electro-optic or electronic components relating to digital holography
- G03H2226/11—Electro-optic recording means, e.g. CCD, pyroelectric sensors
- G03H2226/13—Multiple recording means
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/22—Treatment of data
- H01J2237/221—Image processing
- H01J2237/223—Fourier techniques
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/22—Treatment of data
- H01J2237/226—Image reconstruction
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- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
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- Engineering & Computer Science (AREA)
- Optics & Photonics (AREA)
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- Crystallography & Structural Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
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- General Health & Medical Sciences (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Description
10 電子回折顕微鏡
100 入射系
110 電子源
120 平行照射用レンズ系
200 試料系
210 サポート用スリット
212、332 孔
220 試料
300 検出系
310 対物レンズ
320 コース検出器
330 ファイン検出器
400 計算機系
410 コンピュータ
500 真空筐体
Claims (2)
- ビームを試料に照射し、試料からの回折パターンの強度を計測し、計測した回折パターンの強度をもとにフーリエ反復位相回復法を用いて物体の像を再構成する回折顕微法において、
計測した回折パターンの強度から表される振幅|F obs |を逐次的にデコンボリューションし、フーリエ拘束条件として、第2の複素関数F n の振幅|F n |を、前記逐次的にデコンボリューションした|F deconv |に置き換えて、第3の複素関数F' n を得るステップを組み込んでなる、
回折顕微法。 - ビームを試料に照射し、試料からの回折パターンの強度を計測し、計測した回折パターンの強度をもとにフーリエ反復位相回復法を用いて物体の像を再構成する回折顕微法において、
前記物体を所定の第1の複素関数fnで表す第1ステップと、
前記第1の複素関数fnをフーリエ変換して第2の複素関数Fnを得る第2ステップと、
計測した回折パターンの強度から表される振幅|Fobs|を逐次的にデコンボリューションし、フーリエ拘束条件として、前記第2の複素関数Fnの振幅|Fn|を、前記逐次的にデコンボリューションした|Fdeconv|に置き換えて、第3の複素関数F'nを得る第3ステップと、
前記第3の複素関数F'nを逆フーリエ変換して第4の複素関数f'nを得る第4ステップと、
前記第4の複素関数f'nにオブジェクト拘束条件を付加して、インクリメントされた第1の複素関数fn+1を得る第5ステップと、
を有する回折顕微法。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2011551750A JP5717296B2 (ja) | 2010-01-27 | 2011-01-21 | 回折顕微法 |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2010015698 | 2010-01-27 | ||
JP2010015698 | 2010-01-27 | ||
PCT/JP2011/000318 WO2011093043A1 (ja) | 2010-01-27 | 2011-01-21 | 回折顕微法 |
JP2011551750A JP5717296B2 (ja) | 2010-01-27 | 2011-01-21 | 回折顕微法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPWO2011093043A1 JPWO2011093043A1 (ja) | 2013-05-30 |
JP5717296B2 true JP5717296B2 (ja) | 2015-05-13 |
Family
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JP2011551750A Expired - Fee Related JP5717296B2 (ja) | 2010-01-27 | 2011-01-21 | 回折顕微法 |
Country Status (4)
Country | Link |
---|---|
US (1) | US8994811B2 (ja) |
EP (1) | EP2530459A4 (ja) |
JP (1) | JP5717296B2 (ja) |
WO (1) | WO2011093043A1 (ja) |
Families Citing this family (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5683236B2 (ja) * | 2010-11-29 | 2015-03-11 | 兵庫県 | 形状測定装置 |
CN102313983B (zh) * | 2011-09-02 | 2013-12-18 | 北京航空航天大学 | 一种基于非均等采样图像序列的定量数字相衬成像方法 |
JP5883689B2 (ja) * | 2012-03-14 | 2016-03-15 | 株式会社日立製作所 | X線撮像装置およびx線撮像方法 |
NL2009367C2 (en) * | 2012-08-27 | 2014-03-03 | Stichting Vu Vumc | Microscopic imaging apparatus and method to detect a microscopic image. |
US9864184B2 (en) | 2012-10-30 | 2018-01-09 | California Institute Of Technology | Embedded pupil function recovery for fourier ptychographic imaging devices |
WO2014070656A1 (en) * | 2012-10-30 | 2014-05-08 | California Institute Of Technology | Fourier ptychographic imaging systems, devices, and methods |
US10652444B2 (en) | 2012-10-30 | 2020-05-12 | California Institute Of Technology | Multiplexed Fourier ptychography imaging systems and methods |
CA2919985A1 (en) | 2013-07-31 | 2015-02-05 | California Institute Of Technology | Aperture scanning fourier ptychographic imaging |
WO2015027188A1 (en) * | 2013-08-22 | 2015-02-26 | California Institute Of Technoloby | Variable-illumination fourier ptychographic imaging devices, systems, and methods |
US11468557B2 (en) | 2014-03-13 | 2022-10-11 | California Institute Of Technology | Free orientation fourier camera |
CN106471415B (zh) * | 2014-04-30 | 2019-11-15 | 惠普发展公司,有限责任合伙企业 | 使用基于衍射的照明的成像装置和方法 |
US10162161B2 (en) | 2014-05-13 | 2018-12-25 | California Institute Of Technology | Ptychography imaging systems and methods with convex relaxation |
CA2966926A1 (en) | 2014-12-22 | 2016-06-30 | California Institute Of Technology | Epi-illumination fourier ptychographic imaging for thick samples |
AU2016209275A1 (en) | 2015-01-21 | 2017-06-29 | California Institute Of Technology | Fourier ptychographic tomography |
WO2016123157A1 (en) | 2015-01-26 | 2016-08-04 | California Institute Of Technology | Multi-well fourier ptychographic and fluorescence imaging |
EP3268769A4 (en) | 2015-03-13 | 2018-12-05 | California Institute of Technology | Correcting for aberrations in incoherent imaging system using fourier ptychographic techniques |
US9993149B2 (en) | 2015-03-25 | 2018-06-12 | California Institute Of Technology | Fourier ptychographic retinal imaging methods and systems |
US10228550B2 (en) | 2015-05-21 | 2019-03-12 | California Institute Of Technology | Laser-based Fourier ptychographic imaging systems and methods |
US20190235224A1 (en) | 2015-11-11 | 2019-08-01 | Scopio Labs Ltd. | Computational microscopes and methods for generating an image under different illumination conditions |
US11092795B2 (en) | 2016-06-10 | 2021-08-17 | California Institute Of Technology | Systems and methods for coded-aperture-based correction of aberration obtained from Fourier ptychography |
US10568507B2 (en) | 2016-06-10 | 2020-02-25 | California Institute Of Technology | Pupil ptychography methods and systems |
CN108550108B (zh) * | 2017-09-28 | 2020-11-03 | 武汉大学 | 一种基于相位迭代最小化的傅里叶叠层成像图像重建方法 |
WO2019090149A1 (en) | 2017-11-03 | 2019-05-09 | California Institute Of Technology | Parallel digital imaging acquisition and restoration methods and systems |
JP7313682B2 (ja) * | 2019-11-13 | 2023-07-25 | 国立大学法人東北大学 | 光学特性の評価方法 |
US12198300B2 (en) | 2021-02-25 | 2025-01-14 | California Institute Of Technology | Computational refocusing-assisted deep learning |
Family Cites Families (8)
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JP3431386B2 (ja) * | 1995-03-16 | 2003-07-28 | 株式会社東芝 | 記録素子およびドリフト移動度変調素子 |
EP1768161A4 (en) * | 2004-05-20 | 2011-08-31 | Univ Hokkaido Nat Univ Corp | ELECTRONIC MICROSCOPIC PROCESS AND ELECTRONIC MICROSCOPE THEREOF |
EP1991204A2 (en) * | 2006-02-24 | 2008-11-19 | Novartis AG | Microparticles containing biodegradable polymer and cationic polysaccharide for use in immunogenic compositions |
US7847238B2 (en) * | 2006-11-07 | 2010-12-07 | New York University | Holographic microfabrication and characterization system for soft matter and biological systems |
EP2282771B1 (en) * | 2008-04-28 | 2014-06-25 | Novartis AG | Method for producing nanoparticles |
JP2010015698A (ja) | 2008-07-01 | 2010-01-21 | Panasonic Corp | プラズマディスプレイパネル |
WO2010017330A1 (en) * | 2008-08-06 | 2010-02-11 | Novartis Ag | Microparticles for use in immunogenic compositions |
US9517263B2 (en) * | 2009-06-10 | 2016-12-13 | Glaxosmithkline Biologicals Sa | Benzonaphthyridine-containing vaccines |
-
2011
- 2011-01-21 EP EP11736760.7A patent/EP2530459A4/en not_active Withdrawn
- 2011-01-21 JP JP2011551750A patent/JP5717296B2/ja not_active Expired - Fee Related
- 2011-01-21 WO PCT/JP2011/000318 patent/WO2011093043A1/ja active Application Filing
- 2011-01-21 US US13/575,776 patent/US8994811B2/en not_active Expired - Fee Related
Non-Patent Citations (3)
Title |
---|
JPN6011012339; 川原宏太,外2名: 'フーリエ反復位相回復法への角度拡がりデコンボリューションの適用' 電子情報通信学会技術研究報告 Vol.106,No.500, 20070118, P.25-29 * |
JPN6011012340; 郷原一寿,外1名: '電子回折顕微法' 顕微鏡 Vol.44,No.1, 20090330, P.69-73 * |
JPN6011012341; 郷原一寿,外3名: '電子回折イメージング' 日本物理学会講演概要集 第62巻,第2号, 20070821, P.991 * |
Also Published As
Publication number | Publication date |
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US8994811B2 (en) | 2015-03-31 |
EP2530459A1 (en) | 2012-12-05 |
JPWO2011093043A1 (ja) | 2013-05-30 |
EP2530459A4 (en) | 2017-05-10 |
WO2011093043A1 (ja) | 2011-08-04 |
US20120320185A1 (en) | 2012-12-20 |
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