JP5700106B2 - Solid-state imaging device and electronic device - Google Patents

Description

  The present invention relates to a MOS type solid-state imaging device, and an electronic device such as a camera equipped with the solid-state imaging device.

  As a solid-state imaging device, an amplification-type solid-state imaging device represented by a MOS type image sensor such as a CMOS (Complementary Metal Oxide Semiconductor) is known. In addition, a charge transfer type solid-state imaging device represented by a CCD (Charge Coupled Device) image sensor is known. These solid-state imaging devices are widely used in digital still cameras, digital video cameras, and the like. In recent years, MOS image sensors are often used as solid-state imaging devices mounted on mobile devices such as camera-equipped mobile phones and PDAs (Personal Digital Assistants) from the viewpoint of low power supply voltage and power consumption.

  The MOS type solid-state imaging device is configured by arranging a plurality of pixels including a photodiode serving as a photoelectric conversion unit and a plurality of pixel transistors in a two-dimensional array. Recently, with the miniaturization of pixels, a so-called multiple pixel sharing structure in which a part of a pixel transistor is shared by a plurality of pixels has been proposed in order to suppress the area occupied by the pixel transistor per pixel. For example, Patent Documents 1 to 3 disclose a solid-state imaging device having a two-pixel sharing structure.

JP 2004-172950 A JP 2006-54276 A JP 2006-157953 A

  By the way, in a MOS type solid-state imaging device, further higher resolution is desired by further miniaturizing pixels. However, further miniaturization of the pixels leads to a reduction in the opening area of the light receiving portion, and the sensitivity is lowered. Therefore, it is desired that the sensitivity can be improved even if the pixel is miniaturized.

  In view of the above, the present invention provides a solid-state imaging device capable of improving sensitivity even when pixels are miniaturized, and an electronic apparatus including the solid-state imaging device.

  The solid-state imaging device according to the present invention has a layout in which a pixel array of two horizontal pixels and 4 × n pixels (n is a positive integer) sharing at least a reset transistor and an amplification transistor among pixel transistors is used as one shared unit. Have Each sharing unit has a total of four photodiodes, two horizontally and two vertically, and a floating diffusion shared by the photodiodes. In addition, one shared unit is composed of a readout gate electrode formed for each photodiode, and at least the amplification between a plurality of components arranged in the vertical direction of the pixel portion and two adjacent components. The amplifying transistor has a gate electrode. Furthermore, one sharing unit has a reset transistor provided at a position spaced apart from the amplification transistor across two vertical photodiodes, and a readout wiring provided for each readout gate electrode. The readout wiring is connected to each of the readout gate electrodes, extends in the horizontal direction of the pixel portion, and has a plurality of layers so that there is one between the photodiodes adjacent in the vertical direction of the pixel portion when viewed from above. The wiring is formed. Further, in the uppermost wiring layer, each photodiode is provided between the photodiodes adjacent to each other in the horizontal direction of each component and the wiring extending in the vertical direction of the pixel portion, and between the photodiodes adjacent in the vertical direction. Surrounded in a U shape by wiring extending in the horizontal direction of the pixel portion.

  In the solid-state imaging device of the present invention, the amplification transistor is configured such that at least the gate electrode is disposed between two adjacent components. Thereby, the gate length can be increased to about twice the pixel pitch, and 1 / f noise can be reduced.

  An electronic apparatus according to the present invention includes the solid-state imaging device, an optical system that guides incident light to a photodiode of the solid-state imaging device, and a signal processing circuit that processes an output signal of the solid-state imaging device.

  In the electronic apparatus of the present invention, 1 / f noise can be reduced by providing the solid-state imaging device.

  According to the solid-state imaging device according to the present invention, 1 / f noise is reduced, so that the sensitivity can be improved.

  According to the electronic apparatus according to the present invention, since the opening area of the photodiode in the solid-state imaging device is increased, the sensitivity can be improved even if the pixel is miniaturized. Therefore, a high quality electronic device can be provided.

It is a schematic block diagram which shows an example of the solid-state imaging device applied to this invention. 6 is a layout diagram of one sharing unit in a pixel unit of a solid-state imaging device according to Reference Example 1. FIG. A to C are exploded layout diagrams in which one shared unit according to a reference example is exploded in a planar manner. 6 is a schematic cross-sectional view showing an example of a two-layer wiring of Reference Example 1. FIG. 6 is an equivalent circuit diagram of one sharing unit having an 8-pixel / 10-transistor structure in the solid-state imaging device according to Reference Example 1. FIG. FIG. 10 is a layout diagram of a main part of one sharing unit in a pixel unit of a solid-state imaging device according to Reference Example 2. It is sectional drawing with which it uses for description of a diffraction limit. It is a graph with which it uses for description of a diffraction limit. 10 is a layout diagram of one sharing unit in a pixel portion of a solid-state imaging device according to Reference Example 3. FIG. 10 is a layout diagram of first-layer wiring in Reference Example 3. FIG. It is a top view of the principal part of FIG. 10 is an explanatory diagram for explaining a reference example 3. FIG. 10 is a layout diagram of one sharing unit in a pixel portion of a solid-state imaging device according to Reference Example 4. FIG. It is a schematic sectional drawing which shows an example of the photodiode in the pixel part of the solid-state imaging device which concerns on the reference example 4. A and B are layout diagrams of one sharing unit in a pixel portion of a solid-state imaging device according to Reference Example 5. FIG. FIG. 10 is a layout diagram of one sharing unit in a pixel portion of a solid-state imaging device according to Reference Example 6. FIG. 10 is a layout diagram of one sharing unit in a pixel portion of a solid-state imaging device according to Reference Example 7. FIG. 16 is a layout diagram of one sharing unit in a pixel portion of a solid-state imaging device according to Reference Example 8. AB is a formation process diagram showing an example of a method for forming a dot-like body of Reference Example 8. FIG. FIGS. 9A to 9B are formation process diagrams illustrating another example of a method for forming a dot-like body according to Reference Example 8; FIGS. It is explanatory drawing explaining the effect | action of the dot-shaped body in the reference example 8. FIG. It is sectional drawing which shows an example of the state of the dot-like body and wiring by the two-layer metal in the reference example 8. It is sectional drawing which shows one state example of the dot-like body by the 2 layer metal in Reference Example 8, and wiring. It is sectional drawing which shows the other example of the state of the dot-like body by 2 layer metal in Example 8, and wiring. 10 is a layout diagram of one sharing unit in a pixel portion of a solid-state imaging device according to Reference Example 9. FIG. It is sectional drawing of the principal part of 1 share unit in the pixel part of the solid-state imaging device which concerns on the reference example 10. FIG. 14 is a layout diagram of one sharing unit in a pixel portion of a solid-state imaging device according to Reference Example 11. FIG. 14 is an equivalent circuit diagram of one sharing unit having an 8 pixel / 11 transistor structure in a solid-state imaging device according to Reference Example 11. FIG. It is a layout figure of 1 share unit in the pixel part of the solid-state imaging device concerning the reference example 12. A to C are exploded layout diagrams in which one shared unit according to Reference Example 12 is exploded in a planar manner. It is a layout figure of 1 share unit in the pixel part of the solid-state imaging device concerning the reference example 13. It is a layout figure of 1 share unit in the pixel part of the solid-state imaging device concerning a reference example 14. 16 is a layout diagram of one sharing unit in a pixel unit of a solid-state imaging device according to Reference Example 15. FIG. FIGS. 14A to 14C are exploded layout diagrams in which one shared unit according to Reference Example 15 is planarly decomposed. 18 is a layout diagram of one sharing unit in a pixel portion of a solid-state imaging device according to Reference Example 16. FIG. 18 is a layout diagram of one sharing unit in a pixel portion of a solid-state imaging device according to Reference Example 17. FIG. A to C are exploded layout diagrams in which one shared unit according to Reference Example 17 is exploded in a planar manner. It is a layout figure of 1 share unit in the pixel part of the solid-state imaging device concerning the example 18 of a reference. FIGS. 14A and 14B are exploded layout diagrams (part 1) obtained by planarly decomposing one shared unit according to Reference Example 18. FIGS. A and B are exploded layout diagrams (part 2) in which one sharing unit according to Reference Example 18 is planarly decomposed. 32 is a layout diagram of one sharing unit in a pixel portion of a solid-state imaging device according to Reference Example 19. FIG. A and B are exploded layout diagrams (part 1) in which one shared unit according to Reference Example 19 is exploded in a plane. A and B are exploded layout diagrams (part 2) in which one shared unit according to Reference Example 19 is exploded in a plane. FIG. 19 is an exploded layout diagram (part 3) in which one sharing unit according to Reference Example 19 is planarly decomposed. FIG. 3 is a layout diagram of one sharing unit in the pixel unit of the solid-state imaging device according to the first embodiment. A and B are exploded layout diagrams (part 1) in which one shared unit according to the first embodiment is exploded in a plane. FIGS. 4A and 4B are exploded layout diagrams (part 2) in which one shared unit according to the first embodiment is exploded in a plane. It is a top view which shows the schematic layout of the solid-state imaging device which concerns on this invention. It is a layout figure with which it uses for description of the effect of this invention. It is a layout figure of the reference example used by the comparison of the effect of the present invention. It is a layout figure which shows the modification (1) of the amplification transistor in the solid-state imaging device which concerns on this invention. It is a layout figure which shows the modification (2) of the amplification transistor in the solid-state imaging device which concerns on this invention. It is a layout figure which shows the modification (3) of the amplification transistor in the solid-state imaging device concerning this invention. It is a layout figure which shows the modification (4) of the amplification transistor in the solid-state imaging device which concerns on this invention. It is a layout figure which shows the modification (5) of the amplification transistor in the solid-state imaging device concerning this invention. It is a layout figure which shows the modification (6) of the amplification transistor in the solid-state imaging device concerning this invention. It is a layout figure which shows the modification (7) of the amplification transistor in the solid-state imaging device which concerns on this invention. It is a layout figure which shows the modification (1) of the reset transistor in the solid-state imaging device which concerns on this invention. It is a layout figure which shows the modification (2) of the reset transistor in the solid-state imaging device which concerns on this invention. It is a schematic block diagram which shows embodiment of the electronic device which concerns on this invention.

  Embodiments of the present invention will be described below with reference to the drawings.

  FIG. 1 shows an example of a schematic configuration of a solid-state imaging device applied to the present invention, that is, a MOS solid-state imaging device. The solid-state imaging device 1 of the present example includes a pixel unit (so-called imaging region) 3 in which pixels 2 including photodiodes serving as a plurality of photoelectric conversion units are regularly and two-dimensionally arranged on a semiconductor substrate 11 such as a silicon substrate, And a peripheral circuit portion. The pixel 2 includes a photodiode and a plurality of pixel transistors (so-called MOS transistors). The plurality of pixel transistors can be constituted by three transistors, for example, a transfer transistor, a reset transistor, and an amplification transistor. In addition, a selection transistor may be added to configure the transistor with four transistors.

  The peripheral circuit section includes a vertical drive circuit 4, a column signal processing circuit 5, a horizontal drive circuit 6, an output circuit 7, a control circuit 8, and the like.

  The control circuit 8 generates a clock signal and a control signal that serve as a reference for operations of the vertical drive circuit 4, the column signal processing circuit 5, the horizontal drive circuit 6, and the like based on the vertical synchronization signal, the horizontal synchronization signal, and the master clock. The control circuit 8 inputs these signals to the vertical drive circuit 4, the column signal processing circuit 5, the horizontal drive circuit 6, and the like.

  The vertical drive circuit 4 is configured by, for example, a shift register. The vertical drive circuit 4 selectively scans each pixel 2 of the pixel unit 3 in the vertical direction sequentially in units of rows, and generates the signal according to the amount of light received by, for example, a photodiode serving as a photoelectric conversion element of each pixel 2 through the vertical signal line 9. A pixel signal based on the signal charge is supplied to the column signal processing circuit 5.

  The column signal processing circuit 5 is arranged, for example, for each column of the pixels 2, and signals output from the pixels 2 for one row are generated from black reference pixels (formed around the effective pixel region) for each pixel column. The signal processing such as noise removal is performed by the signal. That is, the column signal processing circuit 5 performs signal processing such as CDS for removing fixed pattern noise unique to the pixel 2 and signal amplification. A horizontal selection switch (not shown) is connected to the horizontal signal line 10 at the output stage of the column signal processing circuit 5.

  The horizontal drive circuit 6 is constituted by, for example, a shift register, and sequentially outputs horizontal scanning pulses to select each of the column signal processing circuits 5 in order, and the pixel signal is output from each of the column signal processing circuits 5 to the horizontal signal line. 10 to output. The output circuit 7 performs signal processing and outputs the signals sequentially supplied from each of the column signal processing circuits 5 through the horizontal signal line 10.

  When the above-described solid-state imaging device 1 is applied to a front-illuminated solid-state imaging device, a plurality of layers of wiring are provided above the surface side of the substrate on which the pixel unit 3 and the peripheral circuit unit are formed via an interlayer insulating film. A plurality of wiring layers having are formed. In the pixel unit 3, an on-chip color filter is formed on a plurality of wiring layers via a planarizing film, and an on-chip microlens is further formed thereon.

  When the solid-state imaging device 1 is applied to a back-illuminated solid-state imaging device, there are no multiple wiring layers on the back surface on the light incident surface (so-called light receiving surface) side. The plurality of wiring layers are formed on the surface side opposite to the light receiving surface.

  The solid-state imaging device according to the present invention is characterized by an optimized layout of the pixel unit 3 when pixels are miniaturized.

[Reference Example 1: Configuration Example of Solid-State Imaging Device]
FIG. 2 shows a MOS solid-state imaging device according to Reference Example 1. FIG. 2 shows a main part of the layout of the pixel portion. 3 to 5 are exploded plan views for understanding the patterns of the first layer wiring and the second layer wiring. In the following description, the vertical or vertical direction refers to the vertical direction of the pixel portion, and the horizontal or horizontal direction refers to the horizontal direction of the pixel portion. That is, the vertical is parallel to the vertical signal line, and the horizontal is perpendicular to it.

  As shown in FIG. 2, the solid-state imaging device 101 according to Reference Example 1 uses a photodiode PD [PD1 to PD8] array of a total of 8 pixels of 2 horizontal pixels and 4 vertical pixels as one shared unit 21, and this shared unit 21 Are arranged in a two-dimensional array to form a pixel unit 3. That is, as one shared unit 21, a so-called horizontal 2 × vertical 4 configuration in which one floating diffusion FD is shared by a total of four photodiodes PD of 2 × 2 is arranged vertically. Are laid out in the form of sharing eight pixels. In the figure, the symbol P indicates a pixel pitch.

  One sharing unit 21 includes eight photodiodes and ten pixel transistors, and is formed of 1.25 pixel transistors per pixel. The breakdown of the ten pixel transistors is a total of ten transfer transistors Tr1 [Tr11 to Tr18], one reset transistor Tr2, and one amplification transistor Tr3 in this example.

  The layout in one shared unit 21 includes a first configuration unit 23, a second configuration unit 25, read transistors Tr11 to Tr18, an amplification transistor Tr3, and a reset transistor Tr2. Further, this layout includes eight readout wirings 26 [261 to 268], a reset wiring 27, and a connection wiring 28. The amplification transistor Tr3 includes a source region 31S, a drain region 31D, and an amplification gate electrode 32. The reset transistor Tr2 includes a source region 33S, a drain region 33D, and a reset gate electrode 34.

  The first configuration unit 23 includes four photodiodes PD1, PD2, PD3, and PD4, four read gate electrodes 221 to 224, and one first photodiode PD1 for the four photodiodes PD1 to PD4. (See FIG. 3A). Each of the photodiodes PD1 to PD4, the first floating diffusion FD1, and each of the read gate electrodes 221 to 224 constitute a read transistor Tr11 to Tr14.

  In the upper first component 23, four substantially square-shaped photodiodes PD <b> 1 to PD <b> 4 are arranged in two rows vertically and horizontally at a predetermined interval, for example, equally spaced vertically and horizontally. One first floating diffusion FD1 is formed in a central region surrounded by the four photodiodes PD1 to PD4. Corresponding read gate electrodes 221 to 224 are formed on the corner portions of the four photodiodes PD1 to PD4 facing each other so as to be in contact with the first floating diffusion FD1. Each of the readout gate electrodes 221 to 224 has a substantially triangular shape or a substantially trapezoidal shape with a part of the protruding portion 24, and is formed so that the bottom side is located on the photodiode PD1 side and the top side is located on the first floating diffusion FD1 side. Is done. More specifically, the four read gate electrodes 221 to 224 are formed in the same shape and are arranged symmetrically with each other.

  The second component 25 includes four photodiodes PD5, PD6, PD7, and PD8, four read gate electrodes 225 to 228, and one second photodiode PD2 for the four photodiodes PD5 to PD8. (See FIG. 3A). Each of the photodiodes PD5 to PD8, the second floating diffusion FD2, and each of the read gate electrodes 225 to 228 constitute read transistors Tr15 to Tr18.

  Similarly to the upper first component unit 23, the lower second component unit 25 also has four substantially rectangular photodiodes PD5 to PD8 arranged in two rows vertically and horizontally at a predetermined interval, for example, at equal intervals. Is done. One second rotating diffusion FD2 is formed in a central region surrounded by the four photodiodes PD5 to PD8. Corresponding read gate electrodes 225 to 228 are formed on the corner portions of the four photodiodes PD5 to PD8 facing each other so as to be in contact with the second floating diffusion FD2. The read gate electrodes 225 to 228 are formed in the same shape as the read gate electrodes 221 to 224 described above. The readout gate electrodes 225 to 228 are also symmetrically arranged so that the bottom side of the substantially triangular or trapezoidal shape is located on the photodiode PD2 side and the top side is located on the first floating diffusion FD2 side. Is done.

  The eight read wirings 261 to 268 are connected to the read gate electrodes 221 to 228 of the read transistors Tr11 to Tr18, respectively, and are formed such that independent read pulses are applied and controlled independently. The reset wiring 27 is connected to the reset gate electrode 34 of the reset transistor Tr2 and is formed so that a reset pulse is applied. The connection wiring 28 is connected to the first floating diffusion FD1, the second floating diffusion FD2, the amplification gate electrode 32 of the amplification transistor Tr3, and the source region 33S of the reset transistor Tr2.

  Further, in the shared unit 21, a power supply wiring 29 connected to the drain region 33D of the reset transistor Tr2, a vertical signal line 35 connected to the source region 31S of the amplification transistor Tr3, and a power supply connected to the drain region 31D of the amplification transistor Tr3. A wiring 36 is provided.

  The amplification transistor Tr3 is formed between the upper first component 23 and the lower second component 25. The amplification transistor Tr3 is configured by forming an amplification gate electrode 32 so as to have a long gate length in the lateral direction, and forming a source region 31S and a drain region 31D at both ends of the amplification gate electrode 32. The length of the amplification gate electrode 32 in the gate length direction is formed longer than the pixel pitch P1. In this example, the length of the amplification gate electrode 32 corresponds to the length of the two horizontal photodiodes PD1 and PD2, that is, is formed with a dimension close to two pixel pitches.

  The reset transistor Tr2 is formed at the upper center of the upper first component 23. That is, the reset transistor Tr2 is configured by forming a drain region 33D and a source region 33S vertically in a region corresponding to between the two horizontal photodiodes PD1 and PD2 with the reset gate electrode 34 interposed therebetween.

  In Reference Example 1, the readout wirings 261 to 268, the reset wiring 27, and the power supply wiring 29 connected to the drain region 33D of the reset transistor Tr2 are two of the two-layered wirings (hereinafter referred to as two-layer wiring). It is formed by the first layer wiring. As shown in FIG. 4, the two-layer wiring is formed by metal wirings M1 and M2. The wirings 261 to 268, 27, 29 by the first layer wiring, that is, the first layer metal wiring M1, are wired in the horizontal direction (see FIG. 3B).

  As shown in FIG. 4, the metal wirings M1 and M2 are formed on the semiconductor substrate 38 on which the photodiode PD and the pixel transistors Tr1 to Tr3 are formed via an interlayer insulating film 39. Reference numeral 40 denotes a planarizing film. The metal wirings M1 and M2 are formed of, for example, a Cu wiring whose lower surface and side surfaces are surrounded by a barrier metal 41. An SiC film 42 for preventing Cu diffusion is formed on the upper surfaces of the Cu metal wirings M1 and M2.

  The four readout wirings 261 to 264 on the first configuration unit 23 side are arranged in a region corresponding to between the two rows of photodiodes PD arranged vertically. The upper two readout wirings 261 and 262 are partially bent along the readout gate electrodes 221 and 222, are connected to the corresponding readout gate electrodes 221 and 222, and are arranged in parallel to each other. The lower two read wirings 263 and 264 are partially bent along the read gate electrodes 223 and 224, are connected to the corresponding read gate electrodes 223 and 224, respectively, and are arranged in parallel to each other. The upper two readout wirings 261 and 262 connected to the readout gate electrodes 221 and 222 and the lower two readout wirings 263 and 264 connected to the readout gate electrodes 223 and 224 are formed in a symmetrical layout. .

  The four readout wirings 265 to 268 on the second component section 25 side are similarly arranged. That is, the read wirings 265 to 268 are arranged in a region corresponding to between the two rows of photodiodes PD arranged vertically. The upper two read wirings 265 and 266 are partially bent along the read gate electrodes 225 and 226, connected to the corresponding read gate electrodes 225 and 226, respectively, and arranged in parallel to each other. The lower two read wirings 267 and 268 are partially bent along the read gate electrodes 227 and 228, connected to the corresponding read gate electrodes 227 and 228, respectively, and arranged in parallel to each other. The upper two readout wirings 265 and 266 connected to the readout gate electrodes 225 and 226 and the lower two readout wirings 267 and 268 connected to the readout gate electrodes 227 and 228 are formed in a symmetrical layout. .

  The upper and lower first and second floating diffusions FD1, FD2, the amplification gate electrode 32, and the source region 33S of the reset transistor Tr2 are connected by a connection wiring 28. The connection wiring 28, the vertical signal line 35 connected to the source region 31S of the amplification transistor Tr3, and the power supply wiring 36 connected to the drain region 31D of the amplification transistor Tr3 are the second layer of the two-layer wirings. It is formed by wiring. The second-layer wiring, that is, the connection wiring 28, the vertical signal line 35, and the power supply wiring 36 by the second-layer metal wiring M2 are wired in the vertical direction (see FIG. 3C).

  In the four parallel readout wirings 261 to 264 and the four parallel readout wirings 265 to 268 that are wired in the horizontal direction, the gaps between the wirings are set to be equal to or less than the diffraction limit. Therefore, in the region of the four parallel readout wirings 261 to 264 and readout wirings 265 to 268, light is not substantially transmitted and becomes a light shielding region. In FIG. 2, reference numeral 30 denotes a contact portion. The contact portion 30 is interconnected via a conductive plug that penetrates the interlayer insulating film. In this case, the first layer metal wiring M1 and the second layer metal M2 are each connected directly to the target connection region via the conductive plug, or the second layer metal M2 is the conductive plug and the first layer metal. A configuration is adopted in which connection is made to a target connection area via M1.

  An element isolation region 20 is formed between the photodiodes PD1 to PD8, the amplification transistor Tr3, and the reset transistor Tr2. As the element isolation region 20, for example, although not shown, an impurity diffusion region is formed, and a flat insulating film similar to the gate insulating film is formed on the entire surface of the impurity diffusion region. As the impurity diffusion region, for example, a p-type semiconductor region is formed. In this case, an n-channel pixel transistor is used as the pixel transistor, and electrons are used as signal charges.

  3A to 3C show an exploded plane of one share unit 21. FIG. 3A shows a layout of the photodiodes PD1 to PD8, the first and second floating diffusions FD1 and FD2, the read gate electrodes 221 to 228, the read transistor Tr1, the reset transistor Tr2, and the amplification transistor Tr3. FIG. 3B shows a layout of the readout wirings 261 to 268, the reset wiring 27, and the power supply wiring 29 that are wired in the horizontal direction by the first layer metal wiring M1. FIG. 3C shows a layout of the connection wiring 28, the vertical signal line 35, and the power supply wiring 36 that are vertically wired by the second layer metal wiring M2.

  The connection between each wiring by the second layer metal M2 and the pixel transistor is connected from the wiring by the second layer metal M2 to the required part of the pixel transistor through the connection portion of the first layer metal M1.

  The wiring arranged on the peripheral circuit part via the interlayer insulating film has two or more wiring layers. When the number of wiring layers in the pixel portion and the peripheral circuit portion is different, the film thickness of the insulating film on the uppermost layer wiring in the pixel portion is formed smaller than the film thickness of the insulating film on the uppermost layer wiring in the peripheral circuit portion.

  FIG. 5 shows an equivalent circuit of an 8-pixel / 10-transistor configuration related to one sharing unit 21 of Reference Example 1. In this circuit configuration, the four photodiodes PD [PD11, PD12, PD13, PD14] in the first configuration unit are connected to the sources of the four read transistors Tr11, Tr12, Tr13, Tr14, respectively. The drains of the read transistors Tr11 to Tr14 are connected to the source of the reset transistor Tr2. The four photodiodes PD [PD15, PD16, PD17, PD18] in the second component are connected to the sources of the four read transistors Tr15, Tr16, Tr17, Tr18, respectively. The drains of the read transistors Tr15 to Tr18 are connected to the source of the reset transistor Tr2. A first floating diffusion FD1 between the read transistors Tr11 to Tr14 and the reset transistor Tr2 is connected to the amplification gate of the amplification transistor Tr3 via the connection wiring 28. A second floating diffusion FD2 between the read transistors Tr15 to Tr18 and the reset transistor Tr2 is connected to the amplification gate of the amplification transistor Tr3 via the connection wiring 28. The source of the amplification transistor Tr3 is connected to the vertical signal line 35, and the drain thereof is connected to the power supply wiring 36. The drain of the reset transistor Tr2 is connected to the power supply wiring 29, and the gate thereof is connected to the reset wiring 27 to which a reset pulse is applied. The read gates of the read transistors Tr11 to Tr18 are connected to read wirings 261 to 268 to which independent row read pulses are applied, respectively.

  The color filters in the four pixels of each of the first component unit 23 and the second component unit 25 can be arranged in a Bayer array of primary colors red, green, and blue (RGB). Alternatively, as the color filter, various color filters such as a color filter obtained by adding white W to primary colors red, green, and blue (RGB), other complementary colors, or a combined color filter of complementary colors and primary colors can be employed.

  According to the solid-state imaging device according to Reference Example 1, since one sharing unit 21 has an 8 pixel / 10 transistor structure, the number of pixel transistors per pixel is reduced, and the opening areas of the photodiodes PD1 to PD8 are increased accordingly. . Further, each wiring is formed by only two-layer wiring, and the first-layer metal wiring M1 is used for the horizontal wiring, and the second-layer metal M2 is used for the vertical wiring. The area is defined. This wiring layout is not complicated and does not obstruct the opening of the photodiode. Thus, since the opening area of the photodiode increases, the sensitivity can be improved even if the pixel is miniaturized. A solid-state imaging device with high sensitivity and high resolution can be obtained.

  The number of wiring layers is two, and the connection wiring 28 connected to the floating diffusions FD1 and FD2 is formed by the second layer metal wiring M2 separated from the semiconductor substrate. Moreover, the region overlapping the first layer metal M1 intersecting with the connection wiring 28 is only the intersection of the narrow read wirings 261 to 268. The stray capacitance between the connection wiring 28 and the semiconductor substrate and the stray capacitance between the connection wiring 28 and the readout wirings 261 to 268 are small. Therefore, there are few stray capacitances connected to the floating diffusions FD1 and FD2, and the conversion efficiency does not decrease even if the pixels are miniaturized. The sensitivity can be improved.

  In Reference Example 1, each wiring is formed by a two-layer wiring. Compared to the four-layer wiring, both the two-layer wiring are formed at positions close to the photodiode. Since the diffracted light generated in the first layer metal wiring M1 and the second layer metal wiring M2 reaches the photodiode with little lateral spread, the light collection efficiency is improved. Since it has a two-layer wiring structure, the manufacturing yield can be increased. As the number of wiring layers increases, the manufacturing yield decreases.

  In the above example, the horizontal wiring is formed of the first layer metal wiring M1 and the vertical wiring is formed of the second layer metal wiring M2. However, the vertical wiring is formed of the first layer metal wiring M1 and the horizontal wiring is formed of the second layer metal wiring M2. It is also possible to form the wiring M2. However, considering light diffraction, floating diffusions FD1 and FD2, etc., the horizontal wiring having the readout wirings 261 to 268 is formed by the first layer metal wiring M1, and the vertical wiring is formed by the second layer metal wiring M2. Better to do.

  The gates of the respective read transistors Tr11 to tr18 can be uniquely controlled via the read wirings 261 to 268 connected to the read gate electrodes 221 to 228 of the read transistors Tr11 to Tr18 with 8 pixels as one shared unit. . Since each of these gates can be controlled independently, it is possible to easily add the required pixels among the 8 pixels. This pixel addition can be performed in the floating diffusions FD1 and FD2 of one sharing unit 21. For example, when the RGB pixels are in a Bayer array, arbitrary same-color pixel addition can be performed within 8 pixels. Alternatively, when the four pixels are arranged in white (W), red (R), green (G), and blue (B), arbitrary pixel addition of, for example, white (W) and green (G) can be performed within the eight pixels. Any other pixel addition is possible. Various addition methods are possible, such as addition of the pixels of the first configuration unit 23 and the pixels of the second configuration unit 25, addition of pixels in the first configuration unit, and in the second configuration unit. In addition, thinning out pixels in a vertical array is also possible.

  Since it is laid out in a shared unit of 2 horizontal pixels and 4 vertical pixels, reading is performed in two columns and one column, the area of the column signal processing circuit can be halved, and gains by color can be realized relatively easily. The chip area is small.

  Incidentally, in the solid-state imaging device 118 in which a plurality of pixels 114 are arranged in a two-dimensional array shown in the reference example of FIG. 50 and the vertical signal line 116 and the power supply wiring 117 are arranged for each column of the pixels 114, the unit column signal A processing circuit 119 is arranged for each column of pixels. On the other hand, in this example, as shown in FIG. 49, a total of 8 pixels 114 of 2 horizontal pixels and 4 vertical pixels are regarded as one shared unit 140, and a vertical signal line 141 and a power supply wiring 142 are provided for each shared unit. In addition, a unit column signal processing circuit 143 is arranged for each sharing unit. That is, since the vertical vertical signal line 141 and the power supply wiring 142 are arranged for every two columns of pixels, the unit column signal processing circuit 143 can be laid out at a pitch (dimension) about twice the pixel pitch. The area is reduced in the vertical direction.

  On the other hand, in a MOS solid-state imaging device, when a signal is amplified by an amplification transistor, the noise power spectrum is proportional to the reciprocal of the frequency f due to the trap level in the gate insulating film of the amplification transistor. Noise (flicker noise) occurs. The 1 / f noise generated in the amplification transistor has a great influence on the image quality.

  In Reference Example 1, since the length of the amplification gate electrode 32 of the amplification transistor Tr3 is 1 pixel pitch or more, therefore, the gate length is 1 pixel pitch or more, and in this example, the length is close to 2 pixel pitch. The noise of f can be reduced. Equation 1 shows an expression representing 1 / f noise.

  Here, the process dependent coefficient (coefficient related to electron capture and emission at the interface of the gate insulating film) is K, the gate insulating film capacitance is Cox, the gate length (channel length) of the transistor is L, and the gate width (channel width) is W. The power spectrum of 1 / f noise (root mean square of noise voltage) is given by the above equation (1).

  As can be seen from the above equation 1, since the amplification gate electrode 32 (that is, the gate length) of the amplification transistor Tr3 is long, 1 / f noise is reduced.

  Since the drain region 31D of the amplification transistor Tr3 is connected by the vertical power supply wiring 36, the current flowing through the amplification transistor in the selected row does not increase, and an appropriate current value is sufficient. Incidentally, when the drain region 31D of the amplification transistor is connected by the power line wiring of the horizontal wiring, a current flows through the amplification transistors of all the pixels in the selected row, and an excessive drive capability is required. It becomes impossible to implement.

  Since the shared units of the horizontal 2 × vertical 4 pixel arrangement are arranged in a two-dimensional array, the first row can be read out dot-sequentially from the end. Incidentally, when the shared units of the horizontal 4 × vertical 2 pixel arrangement are arranged in a two-dimensional array, subsequent processing is difficult and dot sequential readout is impossible.

  In Reference Example 1, it is preferable that the number of wiring layers on the peripheral circuit portion be two or more. Further, when the number of wiring layers in the pixel portion and the peripheral circuit portion is different, the film thickness of the insulating film on the uppermost layer wiring in the pixel portion is formed to be smaller than the film thickness of the insulating film on the uppermost layer wiring in the peripheral circuit portion. Is preferred. In the peripheral circuit, if the number of wiring layers can be increased, the circuit area can be reduced. However, in the pixel region, if the number of wiring layers increases, it becomes difficult to condense light on the photodiode, so the number of wiring layers needs to be reduced. In addition, even if the number of wiring layers in the pixel portion is small, if the distance from the on-chip lens arranged for each pixel from the uppermost layer wiring is increased, the light collection efficiency for oblique light is reduced. It is still better to make the insulating film thinner.

[Reference Example 2: Configuration Example of Solid-State Imaging Device]
FIG. 6 shows a MOS solid-state imaging device according to Reference Example 2. FIG. 6 shows only the layout of the first layer metal when forming the first layer metal wiring M1. The solid-state imaging device 102 according to the reference example 2 is configured by forming a light shielding portion 45 on the floating diffusions FD1 and FD2 with the first layer metal in the one sharing unit 21. That is, in the solid-state imaging device 102, the first-layer metal wiring M1 forms the readout wirings 261 to 268, the reset wiring 27, and the power supply wiring 29 connected to the drain region of the reset transistor Tr2. Further, the first layer metal M1 forms a light shielding portion 45 that covers the floating diffusions FD1 and FD2. Since other configurations are the same as those described in the first reference example, the portions corresponding to those in FIG.

  According to the solid-state imaging device 102 of the reference example 2, the light-shielding portion 45 is formed by the first metal wiring M1 on the floating diffusions FD1 and FD2 with a slight clearance from the readout wirings 262, 263, 266, and 267. Thereby, the light shielding with respect to floating diffusion FD1, FD2 can be made more reliable. In addition, the same effects as described in Reference Example 1 are obtained.

  In Reference Example 1 described above, when the width of each of the four readout wirings 261 to 264 and 265 to 268 and the gap between adjacent wirings become narrower due to the miniaturization of pixels, the light cannot pass. In other words, when the gap between the readout wirings becomes narrower than the diffraction limit, light substantially does not pass through the gaps between the wirings. Accordingly, each of the areas where the four readout wirings 261 to 264 and 265 to 268 are arranged serves as a light shielding portion. As miniaturization progresses, the gap between readout wirings becomes narrower and becomes less than the diffraction limit. Therefore, in Reference Example 1, as the width of the readout wiring and the gap between the readout wirings are narrowed, the opening areas of the photodiodes PD1 to PD8 are widened, and the sensitivity is improved.

  The diffraction limit will be described with reference to FIGS. In FIG. 7, the opening width between the wirings 311 is a. FIG. 7 shows the light intensity distribution when light, in this example, green light having a wavelength λ of 530 nm, is transmitted through the opening 312 and irradiated to the photodiode PD. The light intensity reaching the photodiode PD decreases with increasing distance from the opening center with the opening center O as a peak, and becomes zero at the point P. This P point is referred to as a first dark ring. As the aperture 312 is narrowed, the light is diffracted, the distance (OP) from the aperture center O of the light intensity distribution to the first dark ring P increases, and the peak of the light intensity also decreases.

  FIG. 8 shows how the distance (OP) increases. FIG. 8 is a graph when the dimension D from the center to the end of the photodiode PD in FIG. 7 is 600 nm and green light Lg having a wavelength λ of 530 nm is incident. The aperture width a that maximizes the distance (OP) is the diffraction limit. For example, as the distance (OP) becomes wider than 1/2 of the pixel pitch, it becomes difficult for light to be collected on the photodiode PD. When the aperture width is less than the diffraction limit, the light is diffracted and is not collected on the photodiode PD, that is, the light does not enter the photodiode PD.

If the position of the opening 312 is diffracted close to the photodiode PD, the distance (OP) does not increase and the light can be condensed on the photodiode PD.
In the case of multilayer wiring, since the light is kicked by the lower layer wiring as the distance (OP) increases, the distance (OP) further increases and the peak also decreases. Therefore, the distance (OP) in the light intensity distribution reaching the photodiode PD becomes shorter when the number of wiring layers is smaller.

[Reference Example 3: Configuration Example of Solid-State Imaging Device]
9 and 10 show a MOS type solid-state imaging device according to Reference Example 3, and FIG. 11 shows a plan view of the main part of FIG. FIG. 9 shows a main part of the layout of the pixel portion. FIG. 10 shows a pattern of the first layer wiring. In the solid-state imaging device 103 according to the reference example 3, in one shared unit 21, at least one readout wiring in the unit pixel exists in the region of the photodiode PD, and both sides and immediately below this one readout wiring. In this configuration, a photodiode PD region exists.

  In this example, in one sharing unit 21, one readout wiring among a plurality of readout wirings of the same layer arranged in the pixel pitch P is separated from other readout wirings. This one readout wiring is arranged at a distance d2 that is separated from the minimum distance d1 between readout wirings in the same layer that repeatedly exist in one shared unit 21. The minimum interval d1 is an interval corresponding to a so-called diffraction limit or less that does not substantially transmit light. The distance (gap) d2 is a distance that exceeds the diffraction limit, and is a distance that allows substantial light transmission.

  In other words, the solid-state imaging device 103 is configured such that, in one sharing unit 21, each one readout wiring is arranged on the photodiode PD so as to be separated from the other readout wiring by a distance exceeding the diffraction limit. To do. That is, as shown in FIGS. 9 and 10, in the first configuration unit 23, among the four readout wirings 261 to 264, the readout wiring 261 is arranged corresponding to, for example, the vicinity of the center of PD1 and PD2, and the readout wiring H.264 is arranged corresponding to, for example, the center of PD3 and PD4. In the second component 25, among the four readout wirings 265 to 268, the readout wiring 265 is arranged corresponding to, for example, the vicinity of the center of PD5 and PD6, and the readout wiring 268 corresponds to, for example, the vicinity of the center of PD7 and PD8. Arranged.

  The minimum distance (distance) d1 between the readout wirings 262 and 263 and the minimum distance (distance) d1 between the readout wirings 266 and 267 are distances that are not more than the diffraction limit. The distance d2 between the readout wirings 261 and 262 and the distance d2 between the readout wirings 264 and 263 are distances exceeding the diffraction limit. Further, the distance d2 between the readout wirings 265 and 266 and the distance d2 between the readout wirings 268 and 267 are also distances exceeding the diffraction limit. Each of the readout wirings 261, 264, 265, and 268 may be arranged on the photodiode PD at a distance exceeding the diffraction limit, but is preferably arranged near the center of the photodiode PD. That is, as shown in FIG. 12, the layout of the readout wiring is preferably performed so that the readout wirings 261, 264, 265, and 268 exist at the optical center O (or the pixel pitch center) of the pixel.

The read wiring 261 is connected to the read gate electrode 221 through the extension 261a. The read wirings 262 and 263 are connected to the read gate electrodes 222 and 223, respectively. The read wiring 264 is connected to the read gate electrode 224 through the extension 264a. The read wiring 265 is connected to the read gate electrode 225 through the extension 265a. The read wirings 266 and 267 are connected to the read gate electrodes 226 and 227, respectively. The read wiring 268 is connected to the read gate electrode 228 via the extension 268a.
Since the other configuration is the same as that described in Reference Example 1, the portions corresponding to those in FIG. However, in this example, the shape of the read gate electrodes 221 to 228 is slightly different from the shape of FIG. 2, but may be the same shape as FIG.

  According to the solid-state imaging device 103 according to the reference example 3, each of the readout wirings 261, 264, 265, and 268 is shifted so as to come on PD1, PD2, PD3, PD4, PD5, PD6, PD7, and PD8, respectively. Arranged. With this configuration, the opening areas of the photodiodes PD1 to PD8 are widened by one gap between the read wirings as compared to the configuration of FIG. At this time, the light in the vicinity of the readout wiring near the center of the photodiode PD goes around to the back side of the readout wiring due to diffraction and is condensed on the photodiode PD.

  This will be described with reference to the schematic diagram of FIG. FIG. 12 shows a portion of the photodiode PD1. The photodiode PD1 is formed on the semiconductor substrate 70, and the readout wiring 262, the reset wiring 27, and the second-layer metal wiring M2 by the first-layer metal wiring M1 are interlayered so as to define the opening of the photodiode PD1 thereon. The insulating film 39 is disposed. An on-chip color filter 47 and an on-chip microlens 48 are formed on the two-layer wiring via a planarizing film (not shown). Further, a readout wiring 261 using a first layer metal wiring is arranged near the center of the photodiode PD1.

  The light La coming from directly above the readout wiring 261 is reflected by the readout wiring. However, since the width of the readout wiring 261 disposed in the vicinity of the center of the photodiode PD1 is extremely narrow, the light Lb incident on the vicinity of the readout wiring 261 is diffracted by the readout wiring 261 and wraps around the readout wiring 261 to the back side. The light is condensed on the photodiode PD1. Since incident light is collected by the on-chip microlens 48, the wavefront 49 toward the center of the photodiode PD1 is dominant as the wavefront of the light. For this reason, at the time of diffraction in the readout wiring 261, the wraparound of light to the center of the back surface becomes dominant.

On the other hand, there is conventionally known a solid-state imaging device in which the light collection efficiency is increased by a combination of an on-chip microlens and an in-layer lens. As the pixel size becomes finer, it becomes difficult to form this intra-layer lens. In Reference Example 3, one readout wiring is arranged near the center of the photodiode PD, and incident light is collected by diffraction by this readout wiring. Therefore, this central readout wiring serves as an in-layer lens. The light collection efficiency can be improved.
In Reference Example 3, since the light collection efficiency is improved, the sensitivity can be further improved. In addition, the same effects as described in Reference Example 1 are obtained.

[Reference Example 4: Configuration Example of Solid-State Imaging Device]
In the reference example 4, in one shared unit 21, at least one readout wiring in the unit pixel exists in the region of the photodiode PD, and the photodiode PD is disposed on both sides and directly below the one readout wiring. Another example is shown in which a region exists.

  When the pixels are further miniaturized, for example, red, green, and blue (RGB) photodiodes are arranged at different positions in the depth direction, and each RGB photodiode is arranged from the upper surface in order to enlarge the light receiving region. In view of this, a configuration in which a part of each other is superposed is conceivable. At this time, since there is no region where the photodiode is not formed between the photodiodes of adjacent pixels, it becomes impossible to collectively arrange the four readout wirings between the pixels. Reference example 4 is a solid-state imaging device corresponding to such a case.

  13 and 14 show a MOS type solid-state imaging device according to Reference Example 4. FIG. FIG. 13 shows a main part of the layout of the pixel portion. However, on the plan view, the photodiode is shown for each pixel for convenience. FIG. 14 shows a configuration of the photodiode in the semiconductor substrate.

  As shown in FIG. 13, the solid-state imaging device 104 according to the reference example 4 includes all the readout wirings 261 to 268 in the same layer in the same sharing unit 21 with the above-described minimum interval. It is arranged at a distance d3 that is further away from d1 (see FIG. 9). In other words, the solid-state imaging device 104 is configured by arranging the readout wirings 261 to 268 at a distance d3 that exceeds the diffraction limit. When considering the diffraction, the readout wirings 261 to 268 are preferably separated sufficiently, for example, at equal pitch intervals to maximize the distance between the wirings. Two readout wirings 261 to 268 are arranged on the photodiodes PD1 and PD2, on the photodiodes PD3 and PD4, on the photodiodes PD5 and PD6, and on the photodiodes PD7 and PD8. Although not shown, each of the readout wirings 261 to 268 is connected to the corresponding readout gate electrodes 221 to 228 via the extension portions, similarly to the reference example 3.

  On the other hand, for example, a photodiode PD with a Bayer array will be described. Each of the red (R), green (G), and blue (B) photodiodes PDr, PDg, and PDb is formed on a semiconductor substrate 51 of, for example, a first conductivity type, for example, an n-type, as shown in FIG. It is formed in a p-type semiconductor well region 52 which is a conductive type. Each photodiode PDr, PDg, PDb is formed by an n-type semiconductor region 53 and a p-type semiconductor region 54 thereon.

  Since the blue wavelength light is absorbed in a shallow region, the blue pixel photodiode PDb is formed on the surface side of the semiconductor well region 52. Since the green wavelength light is absorbed at a position deeper than the blue wavelength light, the photodiode PDg of the green pixel is formed so that a part thereof extends directly below the photodiode PDb of the blue pixel from the surface of the semiconductor well region. Is done. Since the red wavelength light is absorbed at the deepest position, the photodiode PDr of the red pixel is formed so that a part thereof extends directly below the photodiode PDg of the green pixel from the surface of the semiconductor well region. Here, the photodiode PDg for the green pixel and the photodiode PDr for the red pixel are formed so as to be interchanged in the depth direction. As shown in FIG. 14, the photodiodes PDr, PDg, and PDb of each pixel are formed so as to partially overlap each other in the substrate depth direction, so that the photodiode is interposed between the photodiodes of adjacent pixels. There is no region that is not formed.

  Since the other configuration is the same as that described in Reference Example 1, the portions corresponding to those in FIG.

  According to the solid-state imaging device 104 according to the reference example 4, since the photodiodes of red, green, and blue pixels are formed at different positions in the depth direction of the semiconductor substrate 51, color separation is performed within the semiconductor substrate. Done. That is, color mixing is prevented in the semiconductor substrate 51. Then, by arranging the readout wirings 261 to 268 connected to the readout transistors Tr11 to Tr18 of each pixel with a distance exceeding the diffraction limit, the opening areas of the photodiodes PD1 to PD8 can be further expanded. . In each of the read wirings 261 to 268, the same operation as described in FIG. 12 occurs. As a result, the sensitivity can be improved even if the pixels are further miniaturized. In addition, the same effects as described in Reference Example 1 are obtained.

[Reference Example 5: Configuration example of solid-state imaging device]
FIG. 15 shows a MOS solid-state imaging device according to Reference Example 5. FIG. 15 shows a main part of the layout of the pixel portion, and FIGS. A and B are exploded plan views showing patterns of the first-layer wiring and the second-layer wiring, respectively. The solid-state imaging device 105 according to the reference example 5 is configured by forming dummy wirings by the first layer wiring and the second layer wiring as shown in FIG. 15B in order to improve the symmetry of the wiring in one sharing unit 21. Is done. That is, the read wirings 261 to 268, the reset wiring 27, and the power supply wiring 29 which are horizontal wirings are formed by the same first layer metal wiring M1, and no voltage is applied to the left and right sides of the photodiodes PD1 to PD8. Divided dummy wirings 56 are formed. Further, the same second-layer metal wiring M2 forms a vertical connection wiring 28, a vertical signal line 35, and a power supply wiring 36, and is divided so that no voltage is applied to the upper and lower sides of each of the photodiodes PD1 to PD8. The dummy wiring 57 thus formed is formed.

  Since the other configuration is the same as that described in Reference Example 1, the portions corresponding to those in FIG.

  According to the solid-state imaging device 105 according to the reference example 5, in addition to the horizontal wiring and the vertical wiring, dummy wirings 56 and 57 are formed by the first layer metal wiring M1 and the second layer metal wiring M2. These wirings surround each of the photodiodes PD1 to PD8. For this reason, the photodiodes PD1 to PD8 are surrounded by the same-layer metal wiring with good symmetry, so that color mixing due to light diffraction can be prevented. In addition, the same effects as described in Reference Example 1 are obtained.

[Reference Example 6: Configuration Example of Solid-State Imaging Device]
FIG. 16 shows a MOS solid-state imaging device according to Reference Example 6. FIG. 16 shows a main part (one sharing unit) of the layout of the pixel portion. This reference example 6 shows another layout in which dummy wirings are arranged.

  As shown in FIG. 16A, the solid-state imaging device 106 according to Reference Example 6 is configured by arranging a dummy wiring 57 formed of a second-layer metal wiring M2 so as to sandwich the photodiodes PD1 to PD8 vertically. The dummy wiring 57 includes positions corresponding to the read wirings 261, 263, 266, and 267 by the first layer metal wiring M1, positions corresponding to the amplification gate electrode 32, and a reset wiring 27 by the first layer metal wiring M1. In addition, the power supply lines 29 are divided and arranged at corresponding positions.

Here, as shown in FIG. 16B, the reset wiring 27 by the first layer metal wiring M1 includes a reset wiring section 27A having one end connected to the reset gate electrode 34 and a reset wiring section 27B not connected to the reset gate electrode 34. And have been split. The reset wiring portions 27A and 27B are connected by the connection line 27C formed by the second layer metal wiring M2, thereby forming the reset wiring 27. Further, the light shielding portion 45 that shields the floating diffusions FD1 and FD2 is formed integrally with the connection wiring 28 that connects the floating diffusions FD1 and FD2, the amplification gate electrode 32, and the source region 33S of the reset transistor Tr2. The light shielding portion 45 is formed of the second-layer metal wiring M2, and is formed just to widen the portions corresponding to the floating diffusions FD1 and FD2 and the contact portion of the connection wiring 28.
Since the other configuration is the same as that described in Reference Example 1, the portions corresponding to those in FIG.

  According to the solid-state imaging device 106 according to the reference example 6, since the dummy wiring 57 by the second-layer metal wiring M2 is arranged, the metal wiring is arranged with good symmetry around each of the photodiodes PD1 to PD1. Thus, as in the reference example 5, the photodiodes PD1 to PD8 are surrounded by the dummy wiring 57 and the other wiring, thereby preventing color mixing due to light diffraction. In addition, the same effects as described in Reference Example 1 are obtained.

[Reference Example 7: Configuration example of solid-state imaging device]
FIG. 17 shows a MOS solid-state imaging device according to Reference Example 7. FIG. 17 shows a main part (one sharing unit) of the layout of the pixel portion. The solid-state imaging device 107 according to Reference Example 7 is configured by forming each of the photodiodes PD1 to PD8 into a rounded shape at the corner instead of a square shape.

  When the photodiodes PD1 to PD8 are formed using an ion implantation method, a resist mask is used as an ion implantation mask. Since this resist mask is formed by using a photolithography technique, the corner portion of the opening is easily rounded and is not easily formed into a strict rectangular shape. By using such a resist mask, it is possible to form photodiodes PD1 to PD8 having a substantially square shape with rounded corners.

  Since the other configuration is the same as that described in Reference Example 1, the portions corresponding to those in FIG.

  According to the solid-state imaging device 107 according to the reference example 7, since the corner portion of the photoresist is rounded, each of the corner portions is rounded as the photodiodes PD1 to PD8. By disposing the source region 31S and drain region 31D of the amplification transistor Tr3, the source region 33S and drain region 33D of the reset transistor Tr2, etc. in the region surrounded by this rounded corner portion, the invalid region is minimized. The effect can be expected. Further, damage during ion implantation does not affect the photodiode. In addition, the same effects as described in Reference Example 1 are obtained.

  The configuration in which the corner portion of the photodiode in Reference Example 7 is rounded can be applied to the above-described Reference Example 2 to Reference Example 5 and further to the configuration described later.

[Reference Example 8: Configuration Example of Solid-State Imaging Device]
FIG. 18 shows a MOS solid-state imaging device according to Reference Example 8. FIG. 18 shows a main part (one sharing unit) of the pixel portion. The solid-state imaging device 108 according to the reference example 8 is configured by forming a dot-like body 61 having a condensing action at a position corresponding to each of the photodiodes PD1 to PD8, preferably near the center, in one sharing unit 21. The dot-like body 61 is formed in an island shape away from the wiring by a distance exceeding the diffraction limit and to which no potential is applied. When the dot-like body 61 is a two-layer wiring, it is formed by either the metal in the same layer as the first-layer metal wiring M1 or the metal in the same layer as the second-layer metal wiring M2. The dot-shaped body 61 is preferably formed of the same metal as the first-layer metal wiring M1.

  The dot-like body 61 is preferably formed with a film thickness that allows light to pass therethrough. The dot-like body 61 is preferably formed of a metal thin film having a thickness smaller than that of the first layer metal wiring M1 and the second layer metal wiring M2.

The dot-like body 61 can be formed in, for example, a square, a circle, a cross, a polygon, or any other geometric shape. One, two, or a plurality of dot-like bodies 61 can be formed. As the material of the dots, Cu, Al, SiON, SiN, SiC, TiN, ITO, TaN, W, WSi, WN, or the like can be used.
Since the other configuration is the same as that described in Reference Example 1, the portions corresponding to those in FIG.

  FIG. 19 shows an example of a method for forming the dot-like body 61. As shown in FIG. 19A, grooves 63 and 64 having the same depth are formed on the surface of the interlayer insulating film 62 at positions where dot-like bodies and wirings are to be formed. A Cu film 65 is embedded in the grooves 63 and 64 through a barrier metal, for example. Next, after the planarization process, as shown in FIG. 19B, the Cu film 65 embedded in the groove 63 on the dot-like body side is selectively etched together with the barrier metal so as to have a required thickness. As a result, a Cu wiring is formed in the groove 64, and a dot-like body 61 made of a Cu thin film is formed in the groove 63.

  FIG. 20 shows another example of a method for forming a dot-like body. As shown in FIG. 20A, a shallow groove 67 is formed on the surface of the interlayer insulating film 62 at a position where a dot-like body is to be formed, and a groove 68 deeper than the groove 67 is formed at a position where a wiring is to be formed. Next, as shown in FIG. 20B, a Cu film 65 is embedded in each of the grooves 67 and 68 via a barrier metal. Thereafter, by performing a flattening process, a dot-like body 61 made of a Cu thin film is formed in the groove 67, and a Cu wiring 66 is formed in the groove 68.

  The Cu wiring 66 is, for example, a horizontal wiring (readout wirings 261 to 268, a reset wiring 27, and a power supply wiring 29) using a first layer metal wiring.

  According to the solid-state imaging device 108 according to the reference example 8, the dot-like body 61 arranged independently in the vicinity of the center of the photodiodes PD1 to PD8 is the readout wirings 261, 264, 265 described in the reference example 3 described above. It has the same light collecting effect as that of 268. As shown in the schematic view of FIG. 21, light diffracts in the vicinity of the dot-like body 61 and diffracts around the back side of the dot-like body 61 and is condensed on the photodiode PD. Here, the light intensity directly below the dot-like body 61 increases due to the interference of light. At the same time, the diffracted light Lc and the transmitted light Ld transmitted through the dot-like body 61 are added to further increase the light intensity. This dot-like body 61 has a function of an in-layer lens.

  In the above example, the dot-like body 61 is formed of a single-layer metal. However, the dot-shaped body 61 may be formed of a plurality of layers of metal such as two layers, three layers, and four layers through an interlayer insulating film at the same position. When the dot-like body 61 is composed of a plurality of layers, it is preferable to reduce the dot width as it goes to the lower layer. When the dot-like body 61 is composed of a plurality of layers, the light first wraps around the upper-layer dot-like body and then converges so as to wrap around at the lower layer dot.

  As shown in FIG. 22, for example, a SiC film 60 for preventing Cu diffusion is formed on the entire upper surface of the wiring 66 and the dot-like body 61 made of the first layer Cu metal and the wiring 67 made of the second layer Cu metal. The This SiC film 60 can also be formed by leaving it in the corresponding part on the photodiode. By the way, as shown in FIG. 22, when the SiC film 60 is formed in two layers, a part of the incident light Lf is multiple-reflected between the two SiC films 60, resulting in ripples and lowering the sensitivity. There is.

  Therefore, as shown in FIG. 23, it is desirable to selectively remove the second-layer SiC film 60 corresponding to the photodiode. As a result of the simulation, it has been found that it is not necessary to selectively etch the SiC films 60 of all the layers corresponding to the photodiode, and only the second-layer SiC film 60 needs to be selectively etched. Thereby, multiple reflection is reduced, the occurrence of ripples is suppressed, and the sensitivity is improved. Here, since the removal of the second-layer SiC film 60 is etching by direct mask alignment, the SiC film portion corresponding to the photodiode can be completely removed by etching. For this reason, the opening is large and the length w1 of the eaves portion 69 can be reduced, and the occurrence of multiple reflections can be suppressed accordingly.

  Incidentally, in the case of a configuration in which a waveguide, which is another means for increasing the light collection efficiency, is provided, as shown in FIG. 24, all the layers of the corresponding portion on the photodiode, in this case, the first layer and the first layer It is necessary to selectively etch away the second-layer SiC film 60. At this time, in the etching process of the first layer and the second layer SiC film 60, indirect mask alignment is performed, and etching is performed with a margin in consideration of misalignment. For this reason, the opening is small and the length w2 of the eaves portion 69 is long, and the effect of suppressing multiple reflection is small compared to FIG.

  The position of the dot-like body 61 is shifted between the center and the periphery of the pixel portion. Since light is incident from substantially above in the center of the pixel portion, the dot-like body 61 is arranged in the center. The peripheral dot-like body 61 on which the oblique light is incident is shifted to the optimum position on the center side of the pixel portion according to the shift amount between the on-chip microlens and the pixel.

[Reference Example 9: Configuration Example of Solid-State Imaging Device]
FIG. 25 shows a MOS solid-state imaging device according to Reference Example 9. FIG. 25 shows a main part (one sharing unit) of the pixel portion. The solid-state imaging device 109 according to the reference example 9 is configured by arranging the wiring 71 having no wiring function so as to cross the corresponding positions on the photodiodes PD1 to PD8, preferably near the center. The wiring 71 has a light collecting function equivalent to that of the in-layer lens, like the readout wirings 261, 264, 265, 268 of Reference Example 3 and the dot-like body 61 of Reference Example 8 described above. As shown in FIG. 22, the wiring 71 may be arranged for each sharing unit 21 or may be arranged in common for photodiodes of all pixels in one row. The wiring 71 is formed simultaneously with the same metal wiring as the readout wirings 261 to 268. Alternatively, the wiring 71 can be formed with a film thickness smaller than that of the readout wiring, similarly to the dot-shaped body 61.
Since the other configuration is the same as that of the reference example 1, portions corresponding to those in FIG.

  According to the solid-state imaging device 109 according to the reference example 9, as described with reference to FIGS. 12 and 21 described above, since the light is condensed by the diffraction action by the wiring 71, the light collection efficiency is improved and the sensitivity is further improved. Can be planned. In addition, the same effects as described in Reference Example 1 are obtained.

[Reference Example 10: Configuration Example of Solid-State Imaging Device]
FIG. 26 shows a MOS solid-state imaging device according to Reference Example 10. FIG. 26 is a cross-sectional view schematically showing the cross-sectional structure of one shared unit red pixel. The cross sections of other green and blue pixels are similarly configured.

  As in Reference Example 1 of FIG. 2, the solid-state imaging device 110 according to Reference Example 10 includes a photodiode PD [PD1 to PD8] of a total of 8 pixels of 2 horizontal pixels and 4 vertical pixels and an array of 10 pixel transistors. It is configured as one share unit 21. The read wirings 261 to 268 connected to the respective read transistors Tr11 to Tr18, the reset wiring 27 connected to the reset transistor Tr2, and the power supply wiring 29 are wired in the horizontal direction by the first layer metal wiring M1. The connection wiring 28, the vertical signal line 35 and the power supply wiring 36 connected to the amplification transistor Tr3 are wired in the vertical direction by the second-layer metal wiring M2.

  In Reference Example 10, as shown in FIG. 26, a two-layer wiring 72 is formed on a semiconductor substrate 70 on which a photodiode (represented by a red pixel photodiode) PDr and each pixel transistor are formed. That is, first and second layer metal wirings M 1 and M 2 are formed via the interlayer insulating film 39. The metal wirings M1 and M2 are formed having a Cu wiring 73 and a SiC film 74 for preventing Cu diffusion formed through a barrier metal in the same manner as described above.

  In the reference example 10, the color filter 75, specifically the red filter in the figure, is embedded in the interlayer insulating film 39 corresponding to the photodiode PDr of the two-layer wiring 72. A planarized passivation film 76 is formed on the surface. An on-chip microlens may not be formed on the passivation film 76. Alternatively, an on-chip microlens can be formed on the passivation film 76.

  The cross sections of other green and blue pixels are similarly configured. Other configurations are the same as those described in the reference example 1, and thus description of the same layout as that in FIG. 2 is omitted.

  The solid-state imaging device 110 according to the reference example 10 uses a configuration in which the horizontal wiring and the vertical wiring configuring each wiring are formed by the two-layer wiring 72 whose overall height is lower than that of the conventional four-layer wiring, for example. Then, the color filter 75 is embedded in the two-layer wiring 72. With this configuration, color mixing is prevented. Further, the height h1 from the photodiode PDr to the upper surface of the color filter 75 becomes lower than the conventional height, and the light collection efficiency can be further improved. When the on-chip microlens is omitted, the configuration can be further simplified. In addition, the same effects as described in Reference Example 1 are obtained.

[Reference Example 11: Configuration Example of Solid-State Imaging Device]
FIG. 27 shows a MOS solid-state imaging device according to Reference Example 11. FIG. 27 shows a main part of the layout of the pixel portion using the two-layer wiring. As shown in FIG. 27, the solid-state imaging device 113 according to the reference example 11 includes a photodiode PD [PD1 to PD8] having a total of 8 pixels of 2 horizontal pixels and 4 vertical pixels, and one shared unit 81 including 11 pixel transistors. Configured as The pixel unit 3 is configured by arranging the shared units 81 in a two-dimensional array. That is, in one sharing unit 21, as in Reference Example 1, two sets of configurations in which one floating diffusion FD is shared for a total of four photodiodes PD of 2 × 2 are arranged vertically. The so-called layout is arranged in a so-called 8-pixel sharing form of 2 × 4.

  One sharing unit 21 is formed by 1.375 pixel transistors per pixel. The breakdown of the 11 pixel transistors is a total of 11 transfer transistors Tr1 [Tr11 to Tr18], 1 reset transistor Tr2, 1 amplification transistor Tr3, and 1 selection transistor Tr4.

  As shown in FIG. 27, the solid-state imaging device 113 according to Reference Example 11 is configured by arranging an amplification transistor Tr3 and a selection transistor Tr4 between a first configuration unit 23 and a second configuration unit 25. The amplification transistor Tr3 is formed to include the source region 31S, the drain region 31D, and the amplification gate electrode 32 as described above. The selection transistor Tr4 is formed having a source region 83S, a drain region 83D, and a selection gate electrode 84, and is connected to the amplification transistor Tr3. The source region 83S of the selection transistor Tr4 is the same region as the drain region 31D of the amplification transistor Tr3.

The vertical signal line 35 is connected to the source region 31S of the amplification transistor tr3, and the power supply wiring 36 is connected to the drain region 83D of the selection transistor Tr4. The selection gate electrode 84 of the selection transistor Tr4 is connected to the selection wiring 85. The vertical signal line 35, the power supply wiring 36 and the selection wiring 85 are formed so as to extend in the vertical direction from the second layer metal wiring M2. In particular, the selection gate electrode 84 of the selection transistor Tr4 is connected to the selection wiring 85 by the second layer metal wiring M2 through the connection line 85a by the first layer metal M1.
Since the other configuration is the same as that described in Reference Example 1, the portions corresponding to those in FIG.

  FIG. 28 shows an equivalent circuit of one sharing unit 81 of Reference Example 11. In this equivalent circuit, a configuration in which the selection transistor Tr4 is connected between the power supply wiring 36 and the drain of the amplification transistor Tr3 and the selection wiring 85 is connected to the selection gate is added to the equivalent circuit of FIG. Other circuit configurations are the same as those of FIG.

  According to the solid-state imaging device 113 according to the reference example 1, since one sharing unit 81 has an 8 pixel / 11 transistor structure, the number of pixel transistors per pixel is reduced, and the opening areas of the photodiodes PD1 to PD8 are correspondingly reduced. spread. Further, each wiring is formed by only two-layer wiring, and the first-layer metal wiring M1 is used for the horizontal wiring, and the second-layer metal M2 is used for the vertical wiring. The area is defined. This wiring layout is not complicated and does not obstruct the opening of the photodiode. Thus, since the opening area of the photodiode increases, the sensitivity can be improved even if the pixel is miniaturized. A solid-state imaging device with high sensitivity and high resolution can be obtained. In addition, the same effects as described in Reference Example 1 are obtained.

[Reference Example 12: Configuration Example of Solid-State Imaging Device]
29 and 30 show a MOS solid-state imaging device according to Reference Example 12. FIG. FIG. 29 shows a main part of the layout of the pixel portion using the two-layer wiring. 30A to 30C are exploded plan views for understanding the pattern of the first layer wiring and the second layer wiring.

  As shown in FIG. 29, the solid-state imaging device 115 according to the reference example 12 includes a photodiode PD [PD1 to PD8] having a total of 8 pixels of 2 horizontal pixels and 4 vertical pixels, as in the reference example 1. A pixel transistor is configured as one shared unit 21. The one share unit 21 is arranged in a two-dimensional array to form the pixel unit 3. The configurations of the photodiodes PD1 to PD8, the readout transistors Tr11 to Tr18 constituting the pixel transistor, and the amplification transistor Tr3 are the same as those in the first reference example.

  In the reference example 12, in particular, the configuration of the reset transistor Tr2 is changed. That is, as shown in FIG. 30A, the source region 33S and the drain region 33D of the reset transistor Tr2 are arranged not in the vertical direction but in the horizontal direction with respect to the reset gate electrode. In addition, the reset transistor Tr2 is formed so as to be shifted in the lateral direction so as to straddle between the adjacent shared units 21. Further, the reset wiring 27 connected to the reset gate electrode 34 of the reset transistor Tr2 and the power supply wiring 29 connected to the drain region 33D are parallel in the horizontal direction using the first and second layer metal wirings M1 and M2. Placed in. The reset wiring 27 and the power supply wiring 29 are disposed on the reset gate electrode 34 and are preferably formed so as to fall within the electrode width.

  First, as shown in FIG. 30A, read transistors Tr11 to Tr18 having two horizontal pixels and four vertical pixel photodiodes PD1 to PD8, floating diffusions FD1 and FD2, and read gate electrodes 221 to 228 are formed. . Further, a reset having a source region 33S and a drain region 33D in the lateral direction with respect to the reset gate electrode 34 so that the gate length is in the lateral direction, a transistor TR2, and an amplification transistor Tr3 are formed. When viewed within one sharing unit 21, in the reset transistor Tr2, one half of the reset gate electrode 34 having the source region 33S and the other half of the reset gate electrode 34 having the drain region 33D are formed separately. In this case, the separated reset gate electrode 34 is formed such that the source region 33S and the drain region 33D face each other.

  Next, as shown in FIG. 30B, the read wirings 261 to 268 connected to the read gate electrodes 221 to 228 extending in the lateral direction are formed by the first layer metal wiring M1. In addition, the first layer metal wiring M1 forms a connection portion 116 connected to the floating diffusions FD1 and FD2, a source region 31S of the amplification transistor Tr3, and a connection portion 117 connected to the drain region 31D. A connection portion 118 connected to the amplification gate electrode 32 is formed by the first layer metal wiring M1. Further, the first-layer metal wiring M1 forms a connection wiring portion 281 extending in the vertical direction and connected to the source region 33S of the reset transistor Tr2. Further, the first-layer metal wiring M1 separates the reset wiring portions 271 connected to the respective reset gate electrodes 34 corresponding to the adjacent shared units 21, and the separated power wiring connected to the respective drain regions 33D. A portion 291 is formed in the lateral direction. The separated end portion of the power supply wiring portion 291 is formed so as to face a position sandwiching the source region 33S located at the center in the horizontal direction of the sharing unit 21. Further, the first-layer metal wiring extends along the amplification gate electrode 32 of the amplification transistor Tr3 and escapes the connection portion 117 on the source and drain regions 33S and 33D and the connection portion 118 connected to the amplification gate electrode 32. The corrugated wiring 121 is formed along the horizontal direction. The waveform wiring 121 is a wiring for applying a required potential to a substrate potential, that is, a semiconductor well region in which a photodiode and a pixel transistor are formed. For example, when an n-type substrate (substrate) is used, a potential of 0 V is applied to a p-type semiconductor well region where photodiodes and pixel transistors are formed. The wiring 121 is a wiring that applies a potential of 0 V to the p-type semiconductor well region, but is also referred to as a substrate contact wiring here.

  Next, as shown in FIG. 30C, the vertical signal line 35 connected to the source region 31S of the amplification transistor Tr3 and the power supply wiring 36 connected to the drain region 31D are arranged along the vertical direction by the second-layer metal wiring M2. It is formed. The second-layer metal wiring M2 is connected to the floating diffusions FD1 and FD2, the amplification gate electrode 32, and the connection portion 281 connected to the source region of the reset transistor Tr2 via the connection portions 116 and 118. Connection wiring 28 is formed. Further, the connection wiring portion 292 that connects the power supply wiring portions 291 connected to the drain region 33D of the reset transistor Tr2 is connected by the second layer metal wiring M2. The power supply wiring portion 291 by the first layer metal wiring M1 and the connection wiring portion 292 by the second layer metal wiring M2 are connected to the drain region 33D of each reset transistor Tr2 of the shared unit 21 arranged in the horizontal direction. A power supply wiring 29 to be connected is formed. Further, the connection wiring portion 272 that connects the reset wiring portions 271 connected to the reset gate electrode 34 is connected in the horizontal direction by the second-layer metal wiring M2. A reset wiring that connects the reset gate electrodes 34 of the shared units 21 arranged in the horizontal direction by the reset wiring portion 271 by the first layer metal wiring M1 and the connection wiring portion 272 by the second layer metal wiring M2. 27 is formed. By the second-layer metal wiring M2, an optical dummy wiring 122 is formed on a part of the wiring 121 for applying a so-called substrate potential on the amplification transistor Tr3 side.

  According to the solid-state imaging device 115 according to the reference example 12, the source region 33S of the reset transistor Tr2 is not inserted in the vicinity between the photodiodes PD1 and PD2, but is formed on the upper side of the photodiode PD. Thereby, compared with the reference example 1 of FIG. 2, the source region 33S does not get in the way, and the interval between the photodiodes PD arranged in the horizontal direction (lateral direction) can be narrowed. Accordingly, the area of the photodiode PD can be increased, and the sensitivity can be further improved. Further, since the reset wiring 27 and the power supply wiring 29 connected to the reset transistor Tr2 are also formed so as to crawl on the reset gate electrode 34, the interval between the sharing units 21 adjacent in the vertical direction can be reduced. Accordingly, the area of the photodiode PD can be increased, and the sensitivity can be further improved. In addition, the same effects as described in Reference Example 1 are obtained.

[Reference Example 13: Configuration Example of Solid-State Imaging Device]
FIG. 31 shows a thirteenth MOS type solid-state imaging device according to Reference Example 13. FIG. FIG. 31 shows a main part of the layout of the pixel portion using the two-layer wiring.

  The solid-state imaging device 130 according to Reference Example 13 is configured by omitting the substrate contact wiring 121 and the dummy wiring 122 thereon in the solid-state imaging device 115 of Reference Example 12. The dummy wiring 122 may be formed as shown by a chain line. Since other configurations are the same as those of the reference example 12, portions corresponding to those in FIG. 29 are denoted by the same reference numerals, and redundant description is omitted.

  Since the solid-state imaging device 130 according to the reference example 12 is the same as the reference example 12 except for the configuration in which the substrate contact wiring 121 is omitted, the same effects as the solid-state imaging device 115 of the reference example 3 described above can be obtained. .

[Reference Example 14: Configuration Example of Solid-State Imaging Device]
FIG. 32 shows a form of the solid-state imaging device according to Reference Example 14. FIG. 32 shows a main part of the layout of the pixel portion using the two-layer wiring. The solid-state imaging device 129 according to the reference example 14 is configured by arranging the dummy wiring 91 by the second layer metal wiring M2. That is, in the configuration of Reference Example 12 in FIG. 29, dummy wirings are further provided between the readout wirings 261 and 264, between the readout wirings 265 and 268, partly on the substrate contact wiring 121, and below the floating diffusion FD2. 122, 91 are formed. Other configurations are the same as those described in the reference example 12 of FIG. 29, and therefore, corresponding portions are denoted by the same reference numerals, and redundant description is omitted.

  According to the solid-state imaging device 129 according to the reference example 14, each photodiode PD is surrounded with good symmetry by the dummy wiring 91 by the second-layer metal wiring M2, the vertical signal line 35, the power supply wiring 36, and the connection wiring. It is. Thereby, color mixing due to light diffraction can be prevented. In addition, the same effects as described in Reference Example 12 are obtained.

[Reference Example 15: Configuration Example of Solid-State Imaging Device]
33 and 34 show a MOS solid-state imaging device according to Reference Example 15. FIG. FIG. 33 shows a main part of the layout of the pixel portion using the two-layer wiring. 34A to 34C are exploded plan views for understanding the patterns of the first-layer wiring and the second-layer wiring.

  As shown in FIG. 33, the solid-state imaging device 120 according to the reference example 15 includes a photodiode PD [PD1 to PD8] having a total of 8 pixels of 2 horizontal pixels and 4 vertical pixels, and 10 A pixel transistor is configured as one shared unit 21. The one share unit 21 is arranged in a two-dimensional array to form the pixel unit 3. The configurations of the photodiodes PD1 to PD8, the readout transistors Tr11 to Tr18 constituting the pixel transistor, the reset transistor Tr2, and the amplification transistor Tr3 are the same as those in the first reference example.

  In this example, in particular, the layouts of the readout wirings 261 to 268, the reset wiring 27 connected to the reset transistor Tr2, and the power supply wiring 29 are changed. That is, the read wirings 261 to 268 use the first and second-layer metal wirings M1 and M2 so as to shield the region including the read gate electrodes 221 to 228 and partly 2 as viewed from above. It is laid out to be a book wiring. Further, the reset wiring 27 and the power supply wiring 29 connected to the reset transistor Tr2 are laid out so as to be one when viewed from above using the first and second layer metal wirings M1 and M2. The

  First, as shown in FIG. 34A, two horizontal and four vertical pixel photodiodes PD1 to PD8, floating diffusions FD1 and FD2, and read transistors Tr11 to Tr18 having read gate electrodes 221 to 228 are formed. . Further, a reset, transistor TR2, and amplification transistor Tr3 are formed. The reset transistor Tr2 is formed to include a reset gate electrode 34, and a source region 33S and a drain region 33D arranged so that the gate length is in the vertical direction. The amplifying transistor Tr3 is formed to have an amplifying gate electrode 32 that is long in the horizontal direction, and a source region 31S and a drain region 31D disposed at both ends thereof. These layouts are the same as in Reference Example 1.

  Next, as shown in FIG. 34B, the read wiring 262 connected to the read gate electrode 222 is formed linearly in the horizontal direction by the first layer metal wiring M1, and on the read gate electrodes 221 and 222. It is formed to be bent in an inverted U shape. In addition, linear wiring portions 261a and 261b are divided and formed in the horizontal direction so as to constitute a part of the readout wiring connected to the readout gate electrode 221 by the first layer metal wiring M1. The wiring portion 261 a is connected to the reading gate electrode 221 inside the inverted U-shaped portion of the reading wiring 262 and is formed across both the reading gate electrodes 221 and 222. The wiring part 261 b is formed on the upper side of the straight line part of the readout wiring 262 so as to be positioned at both ends in the horizontal direction of the sharing unit 21.

  The read wiring 262 connected to the read gate electrode 223 and the wiring portions 264a and 274b constituting a part of the read wiring 264 are symmetrical with the layout of the read wiring 262 and the wiring portions 261a and 261b in the first layer. It is formed by metal wiring M1.

  With the same layout, the first-layer metal wiring M1 forms the wiring portions 265a and 265b constituting part of the reading wiring 266 connected to the reading gate electrode 226 and the reading wiring 265 connected to the reading gate electrode 225. Is done. In addition, wiring portions 268 a and 268 b that form part of the reading wiring 267 connected to the reading gate electrode 227 and the reading wiring 268 connected to the reading gate electrode 228 are formed.

  Further, the first layer metal wiring M1 forms a connection portion 116 connected to the floating diffusions FD1 and FD2, a source region 31S of the amplification transistor Tr3, and a connection portion 117 connected to the drain region 31D. A connection portion 118 connected to the amplification gate electrode 32 is formed by the first layer metal wiring M1. Further, a reset wiring 27 connected to the reset gate electrode 34 of the reset transistor Tr2 is formed in the horizontal direction by the first layer metal wiring M1, and the power supply wiring portion 291 constituting a part of the power supply wiring 29 is used as the shared unit 21. Are formed at both ends in the horizontal direction. The power supply wiring portion 291 and the reset wiring 27 are formed in parallel with the reset wiring 27.

  Next, as shown in FIG. 34C, the vertical signal line 35 connected to the source region 31S of the amplification transistor Tr3 and the power supply wiring 36 connected to the drain region 31D are arranged along the vertical direction by the second-layer metal wiring M2. It is formed. Further, the second-layer metal wiring M2 forms the connection wiring 28 in the vertical direction connected to the floating diffusions FD1 and FD2, the amplification gate electrode 32, and the source region 33S of the reset transistor Tr2 via the connection portions 116 and 118. Is done.

  In the first configuration unit 23, the wiring layer 261 c that interconnects the wiring units 261 a and 261 b that are part of the readout wiring 261, the wiring unit 263 a that is part of the readout wiring 263, and the second layer metal wiring M 2. A wiring portion 263c is formed to connect the 263b to each other. The wiring portion 261c formed by the second layer metal wiring M2 overlaps both straight line portions sandwiching the bent portion of the read wiring 261 formed by the first layer metal wiring M1, and between the wiring on the read gate electrode and the floating diffusion FD1. It is bent to cover the gap. The wiring portion 263c formed by the second layer metal wiring M2 overlaps both straight line portions sandwiching the bent portion of the read wiring 264 formed by the first layer metal wiring M1, and is between the read gate electrode and the wiring on the floating diffusion FD1. It is bent to cover the gap.

  In the second configuration unit 25, the wiring unit 265 c that connects the wiring units 265 a and 265 b that are part of the readout wiring 265, the wiring unit 268 a that is part of the readout wiring 268, and the second layer metal wiring M 2. A wiring portion 268c connecting the 268b to each other is formed. The wiring portion 265c by the second layer metal wiring M2 overlaps with both straight portions sandwiching the bent portion of the read wiring 266 by the first layer metal wiring M1, and between the wiring on the read gate electrode and the floating diffusion FD2. It is bent to cover the gap. The wiring portion 268c formed by the second-layer metal wiring M2 overlaps both straight portions sandwiching the bent portion of the read-out wiring 267 by the first-layer metal wiring M1, and between the read gate electrode and the wiring on the floating diffusion FD2. It is bent to cover the gap.

  On the other hand, in the reset transistor Tr2, the power wiring part 292 that connects the power wiring part 291 on both ends of the shared unit 21 and the drain region 33D is formed by the second-layer metal wiring M2. The power supply wiring 29 is constituted by the power supply wiring portions 291 and 292. The power supply wiring portion 292 formed by the second layer metal wiring M2 is formed so as to partially overlap the linear portion extending in the lateral direction of the reset wiring 27 formed by the first layer metal wiring M1. By the second-layer metal wiring M2, a dummy wiring 122 is formed on a part of a so-called substrate contact wiring 121 on the amplification transistor Tr3 side.

  According to the solid-state imaging device 120 according to the reference example 15, in the first configuration unit 23, the readout wirings 262 and 261 overlap, the readout wirings 263 and 264 overlap, and when viewed from above, the main horizontal wiring portion is two. Become. Similarly, in the second component 25, there are two main horizontal wiring portions of the read wiring as viewed from above. For this reason, the area of the photodiodes PD1 to PD4 of the pixel can be increased, and the sensitivity can be improved. In addition, the readout wirings 261 to 268 arranged at intervals equal to or less than the diffraction limit can shield the regions requiring light shielding, that is, the readout gate electrodes 221 to 228 and the floating diffusions FD1 and FD2. It is not necessary to form a light shielding film separately. That is, in a configuration in which there is a floating diffusion FD surrounded by the transfer gate electrode, the readout wiring can be used as a light shielding film by forming the readout wiring on the readout gate electrode. Since the read gate length of the photodiode PD and the floating diffusion FD winding is maintained at about 0.3 μm, the operation of the read transistors Tr11 to Tr18 is maintained. Also in the reset transistor Tr2, a part of the power supply wiring 29 and the reset wiring 27 are overlapped, and when viewed from above, it looks like one, so that the layout is refreshing. In addition, the same effects as described in Reference Example 1 are obtained.

[Reference Example 16: Configuration example of solid-state imaging device]
FIG. 35 shows a MOS solid-state imaging device according to Reference Example 16. FIG. 35 shows a main part of the layout of the pixel portion using the two-layer wiring. The solid-state imaging device 123 according to Reference Example 16 is configured by replacing the layout of the reset transistor Tr2, the reset wiring 27, and the power supply wiring 29 in the solid-state imaging device 120 according to Reference Example 15 with the layout shown in Reference Example 12. The Other configurations are the same as those described in Reference Example 12 and Reference Example 15, and therefore, parts corresponding to those in FIGS. 29, 30A to 30C, 33, and 34A to 34C are denoted by the same reference numerals and detailed. Description is omitted.

  According to the solid-state imaging device 123 according to the reference example 16, the source region 33S of the reset transistor Tr2 does not interfere with the photodiode PD, and the interval between the photodiodes PD arranged in the horizontal direction (lateral direction) can be reduced. Become. Accordingly, the area of the photodiode PD can be increased, and the sensitivity can be further improved. Further, since the reset wiring 27 and the power supply wiring 29 connected to the reset transistor Tr2 are also formed so as to crawl on the reset gate electrode 34, the interval between the sharing units 21 adjacent in the vertical direction can be reduced. Accordingly, the area of the photodiode PD can be increased, and the sensitivity can be further improved.

  The readout wirings 261 to 268 can shield the readout gate electrodes 221 to 228 and the floating diffusions FD1 and FD2 that are not desired to receive light. In addition, the same effects as described in Reference Example 1 are obtained.

[Reference Example 17: Configuration example of solid-state imaging device]
36 to 37 show a MOS solid-state imaging device according to Reference Example 17. FIG. FIG. 36 shows a main part of a layout of a pixel having a selection transistor using a two-layer wiring. 37A to 37C are exploded plan views for understanding patterns of the first layer wiring and the second layer wiring.

  As shown in FIG. 36, the solid-state imaging device 125 according to the reference example 17 includes a photodiode PD [PD1 to PD8] having a total of 8 pixels of 2 horizontal pixels and 4 vertical pixels, and one pixel unit 81 including 11 pixel transistors. Configured as The pixel transistor includes eight readout transistors Tr11 to Tr18, one reset transistor Tr2, one amplification transistor Tr3, and one selection transistor Tr4. The equivalent circuit of the solid-state imaging device 125 is the same as that described with reference to FIG. The shared units 81 are arranged in a two-dimensional array to form a pixel portion.

  The amplification transistor Tr3 and the selection transistor Tr4 are arranged between the first configuration unit 23 and the second configuration unit 25 in one sharing unit 81. The selection transistor Tr4 is formed to include a source region 83S and a drain region 83D and a selection gate electrode 84, and is connected to the amplification transistor Tr3. The source region 83S of the selection transistor Tr4 is the same region as the drain region 31D of the amplification transistor Tr3.

  The vertical signal line 35 is connected to the source region 31S of the amplification transistor Tr3, and the power supply wiring 36 is connected to the drain region 83D of the selection transistor Tr4. The selection gate electrode 84 of the selection transistor Tr4 is connected to a selection wiring 85 extending in the vertical direction. The selection gate electrode 84 of the selection transistor Tr4 is connected to the vertical selection wiring 85 by the second layer metal wiring M2 through the horizontal connection line 85a by the first layer metal wiring M1.

  36 and FIGS. 37A to C, other configurations are the same as those in FIGS. 33 and 34A to C, and accordingly, the corresponding portions are denoted by the same reference numerals and redundant description is omitted.

  The solid-state imaging device 125 according to the reference example 17 is the same as the configuration of the reference example 15 except that the selection transistor Tr4 is added, and thus has the same effect as the solid-state imaging device of the reference example 15 described above.

[Reference Example 18: Configuration example of solid-state imaging device]
38 to 40 show a MOS solid-state imaging device according to Reference Example 18. FIG. FIG. 38 shows the main part of the layout of the pixel portion using three-layer wiring. 39 to 40 are exploded plan views for understanding patterns of the first-layer wiring, the second-layer wiring, and the third-layer wiring.

  As shown in FIG. 38, the solid-state imaging device 111 according to Reference Example 18 has a total of 8 pixels of photodiodes PD [PD1 to PD8] with 2 horizontal pixels and 4 vertical pixels, as described in Reference Example 1. An arrangement with ten pixel transistors is configured as one sharing unit 21. The shared units 21 are arranged in a two-dimensional array to constitute the pixel unit 3. The configurations of the photodiodes PD1 to PD8 and the read transistors Tr11 to Tr18 constituting the pixel transistors are the same as those in the first reference example.

  In this example, particularly, as shown in FIGS. 39A and 39B and FIGS. 40A and 40B, each wiring is divided into three-layer wirings, that is, the first-layer metal wiring M1, the second-layer metal wiring M2, and the third-layer wiring. It is formed by distributing to the eye metal wiring M3. First, as shown in FIG. 39A, one sharing unit 21 including photodiodes PD1 to PD8 rows of two horizontal pixels and four vertical pixels is formed. That is, the photodiodes PD1 to PD8, the floating diffusions FD1 and FD2, the read transistors Tr11 to Tr18 having the read gate electrodes 221 to 228, the reset transistor Tr2, and the amplification transistor Tr3 are formed. Next, as shown in FIG. 39B, the four readout wirings 261, 264, 265, 268 connected to the readout gate electrodes 221, 224, 225, 228 are laterally connected by the first layer metal wiring M1, respectively. It is formed to extend.

  Next, as shown in FIG. 40A, four read wirings 26 [262, 263, 266, 267] connected to the read gate electrode 22 [222, 223, 226, 227] are respectively connected to the second layer metal. The wiring M2 is extended in the horizontal direction. The readout wiring 26 [262, 263, 266, 267] by the second layer metal wiring M2 is formed so as to overlap the readout wiring 26 [261, 264, 265, 268] by the first layer metal wiring M1, respectively. The Therefore, when viewed from above, as shown in FIG. 38, between the photodiode PD in the first row and the photodiode PD in the second row, between the photodiode PD in the third row and the photodiode PD in the fourth row, Each of the two readout wirings 26 is arranged. The interval between the two readout wirings 26 arranged between each row is set to an interval equal to or less than the diffraction limit. In addition, a reset wiring 27 connected to the reset gate electrode 34 of the reset transistor Tr2 and a power supply wiring 29 connected to the drain region 33S are formed extending in the lateral direction by the second-layer metal wiring M2.

Next, as shown in FIG. 40B, the connection wiring 28, the vertical signal line 35, and the power supply wiring 36 connected to the drain region 31D of the amplification transistor are extended in the vertical direction by the third-layer metal wiring M3. It is formed. Of course, the connection wiring 28 is a wiring for connecting the floating diffusions FD1, FD2, the amplification gate electrode 32, and the source region 33S of the reset transistor.
Since the other configuration is the same as that described in Reference Example 1, the portions corresponding to those in FIG.

  In Reference Example 18, when the first readout pulse is applied from the terminal t1 to the readout wiring 261 by the first-layer metal wiring M1, the readout transistor Tr11 is turned on and the photodiode PD1 is read out. By applying a second readout pulse from the terminal t2 to the readout wiring 262 by the second metal wiring M2, the readout transistor Tr12 is turned on and the photodiode PD2 is read out. By applying a third readout pulse from the terminal t3 to the readout wiring 263 by the second metal wiring M2, the readout transistor Tr13 is turned on and the photodiode PD3 is read out. When the fourth read pulse is applied from the terminal t4 to the read wiring 264 by the first-layer metal wiring M1, the read transistor Tr14 is turned on and the photodiode PD4 is read.

  When the fifth read pulse is applied from the terminal t5 to the read wiring 265 by the first-layer metal wiring M1, the read transistor Tr15 is turned on and the photodiode PD5 is read. When the sixth read pulse is applied from the terminal t6 to the read wiring 266 by the second metal wiring M2, the read transistor Tr16 is turned on and the photodiode PD6 is read. By applying a seventh readout pulse from the terminal t7 to the readout wiring 267 by the second metal wiring M2, the readout transistor Tr17 is turned on and the photodiode PD7 is read out. When the eighth read pulse is applied from the terminal t8 to the read wiring 268 by the first-layer metal wiring M1, the read transistor Tr18 is turned on and the photodiode PD8 is read.

  According to the solid-state imaging device 111 according to the reference example 18, each wiring is formed by being distributed to the first, second, and third-layer metal wirings M1, M2, and M3 constituting the three-layer wiring. Therefore, the parasitic capacitance connected to the floating diffusions FD1 and FD2 is reduced. That is, since the connection wiring 28 connected to the floating diffusions FD1 and FD2 is formed of the third-layer metal wiring M3, the distance between the connection wiring 28 and the semiconductor substrate is increased, and the parasitic capacitance formed therebetween is reduced. And conversion efficiency is improved. Further, since there are two readout wirings 26 arranged between the rows as viewed from above, the opening areas of the photodiodes PD1 to PD8 are wider than those of the first reference example. Therefore, the sensitivity of the solid-state imaging device 111 can be improved. In addition, the same effects as described in Reference Example 1 are obtained.

[Reference Example 19: Configuration example of solid-state imaging device]
41 to 44 show a MOS type solid-state imaging device according to Reference Example 19. FIG. FIG. 41 shows the main part of the layout of the pixel portion using four-layer wiring. 42 to 44 are exploded plan views for understanding patterns of the first layer wiring, the second layer wiring, the third layer wiring, and the fourth layer wiring.

  As shown in FIG. 41, the solid-state imaging device 112 according to Reference Example 19 has a total of 8 pixels of photodiodes PD [PD1 to PD8] having 2 horizontal pixels and 4 vertical pixels, as described in Reference Example 1. An array with ten pixel transistors is configured as one shared unit 21. The shared units 21 are arranged in a two-dimensional array to constitute the pixel unit 3. The configurations of the photodiodes PD1 to PD8 and the read transistors Tr11 to Tr18 constituting the pixel transistors are the same as those in the first reference example.

  In this example, particularly, as shown in FIG. 42 to FIG. 44, each wiring is divided into four-layer wirings, that is, the first layer metal wiring M1, the second layer metal wiring M2, and the third layer metal wiring M3. And the fourth-layer metal wiring M4. First, as shown in FIG. 42A, read transistors Tr11 to Tr18 each having two horizontal pixels and four vertical pixel photodiodes PD1 to PD8 and read gate electrodes 221 to 228 are formed. Further, a reset transistor Tr2 and an amplification transistor Tr3 are formed, and one sharing unit 21 is formed here.

  Next, as shown in FIG. 42B, the connection wiring 28, the vertical signal line 35, and the power supply wiring 36 connected to the drain region 31D of the amplification transistor are extended in the vertical direction by the first-layer metal wiring M1. It is formed. Of course, the connection wiring 28 is a wiring for connecting the floating diffusions FD1, FD2, the amplification gate electrode 32, and the source region 33S of the reset transistor.

  Next, as shown in FIG. 43A, the readout wiring 262 for readout of the photodiode PD2, the readout wiring 264 for readout of the photodiode PD4, and the readout wiring 268 for readout of the photodiode PD8 are provided in the second layer metal. It is formed by the wiring M2. Each of the readout wirings 262, 264, 268 is formed to extend in the lateral direction so as to be one between each row. The read wiring 262 is connected to the read gate electrode 222. The read wiring 268 is connected to the read gate electrode. The readout wiring 264 is formed at the center so that the connection portion 264a protrudes upward in the drawing. Further, a reset wiring 27 connected to the reset gate electrode 34 is formed extending in the lateral direction by the second-layer metal wiring M2.

  Next, as shown in FIG. 43B, the readout wiring 263 for readout of the photodiode PD3, the readout wiring 266 for readout of the photodiode PD6, and the readout wiring 267 for readout of the photodiode PD7 are the third layer metal. It is formed by the wiring M3. Each of the readout wirings 263, 266, 267 is formed to extend in the horizontal direction to one line between each row so as to overlap with the readout wirings 262, 264, 268 by the second-layer metal wiring M2. The read wiring 263 is connected to the read gate electrode 223. The read wiring 267 is connected to the read gate electrode 227. The readout wiring 266 is formed at the center so that the connection portion 266a protrudes downward in the drawing. Further, a power supply wiring 29 connected to the drain region 33D of the reset transistor Tr2 is formed extending in the lateral direction by the third layer metal wiring M3.

  Next, as shown in FIG. 44, a read wiring 261 for reading the photodiode PD1 and a read wiring 265 for reading the photodiode PD5 are formed by the fourth-layer metal wiring M4. The readout wiring 261 is formed to extend in the lateral direction so as to overlap the readout wiring 262 by the second layer metal wiring M2 and the readout wiring 263 by the third layer metal wiring M3. The read wiring 261 is connected to the read gate electrode 221 of the read transistor Tr11 through a connection portion between the third layer metal M3 and the second layer metal M2. Further, the substrate contact wiring 50 connected to the substrate contact portion 50a is formed by the fourth layer metal wiring M4. The substrate contact wiring 50 is a wiring for applying a required potential to a substrate potential, that is, a semiconductor well region in which a photodiode and a pixel transistor are formed. For example, when an n-type substrate (substrate) is used, a potential of 0 V is applied to a p-type semiconductor well region where photodiodes and pixel transistors are formed.

  The readout wiring 265 is formed to extend in the lateral direction so as to overlap the readout wiring 268 by the second layer metal wiring M2 and the readout wiring 267 by the third layer metal wiring M3. The read wiring 265 is connected to the read gate electrode 225 of the read transistor Tr15 through a connection portion between the third layer metal M3 and the second layer metal M2.

  Further, a connection line 264B that connects the read gate electrode 224 of the transistor Tr14 and the connection portion 264a of the read wiring 264 by the second layer metal wiring M2 is formed by the fourth layer metal wiring M4. One end of the connection line 264B is connected to the read gate electrode 224 through a connection portion of the third layer metal M3, the second layer metal M2, and the first layer metal M1. The other end of the connection line 264B is connected to the connection line 264a of the readout wiring 264 of the second layer metal M2 via the connection part of the third layer metal M3. The connection line 264B is formed so as to overlap the connection wiring 28 formed by the first layer metal wiring M1. In addition, the fourth layer metal wiring M4 forms a connection line 266B that connects the read gate electrode 226 of the transistor Tr16 and the connection portion 266a of the read wiring 266 by the third layer metal wiring M3. One end of the connection line 266B is connected to the read gate electrode 226 through a connection portion of the third layer metal M3, the second layer metal M2, and the first layer metal M1. The other end of the connection line 266B is connected to the connection portion 266a of the readout wiring 266 of the third layer metal M3. The connection line 266B is formed so as to overlap with the connection wiring 28 formed by the first layer metal wiring M1. In Reference Example 12, when viewed from above, one readout wiring is arranged between each row of the photodiodes PD.

  In Reference Example 19, when the first readout pulse is applied from the terminal t1 to the readout wiring 261 by the fourth-layer metal wiring M4, the readout transistor Tr1 is turned on and the photodiode PD1 is read out. When the second read pulse is applied from the terminal t2 to the read wiring 262 by the second-layer metal wiring M2, the read transistor Tr2 is turned on and the photodiode PD2 is read. By applying a third readout pulse from the terminal t3 to the readout wiring 263 by the third-layer metal wiring M3, the readout transistor Tr3 is turned on and the photodiode PD3 is read out.

  When the fourth read pulse is applied from the terminal t4 to the read wiring 264 by the second-layer metal wiring M2, the read transistor Tr4 is turned on through the connection line 264B by the fourth-layer metal M4, and the photodiode PD4 is read. . By applying the sixth read pulse from the terminal t6 to the read wiring 266 by the third layer metal wiring M3, the read transistor Tr6 is turned on through the connection line 266B by the fourth layer metal M4, and the photodiode PD6 is read.

  When the fifth read pulse is applied from the terminal 5 to the read wiring 265 by the fourth-layer metal wiring M4, the read transistor Tr5 is turned on and the photodiode PD5 is read. By applying a seventh readout pulse from the terminal t7 to the readout wiring 267 by the third layer metal wiring M3, the readout transistor Tr7 is turned on and the photodiode PD7 is read out. By applying an eighth readout pulse from the terminal t8 to the readout wiring 268 by the second-layer metal wiring M2, the readout transistor Tr8 is turned on and the photodiode PD8 is read out.

  Although the pixel reading order is changed, the pixels are rearranged so that the pixels can be read row by row in the processing circuit in the subsequent stage.

  According to the solid-state imaging device 112 according to the reference example 19, since there is one readout wiring 26 arranged between the rows when viewed from above, the opening area of each of the photodiodes PD1 to PD8 is wider than that of the reference example 1. In addition, each wiring is formed of a four-layer wiring, and on the connection wiring 28 of the first-layer metal wiring M1 connected to the floating diffusions FD1 and FD2, the fourth-layer metal M4 farthest from the connection wiring 28 is formed. Connection lines 264B and 266B are formed. For this reason, the parasitic capacitance between the connection wiring 28 and the connection lines 264B and 266B is reduced, and the conversion efficiency is improved. Therefore, the sensitivity of the solid-state imaging device 112 can be improved. In addition, the same effects as described in Reference Example 1 are obtained.

[First Embodiment: Configuration Example of Solid-State Imaging Device]
45 and 47 show a first embodiment of a solid-state imaging device according to the present invention, that is, a MOS solid-state imaging device. FIG. 45 shows a main part of the layout of the pixel portion using the four-layer wiring. 46A-B and 47C-D are exploded plan views for understanding the patterns of the first-layer wiring, the second-layer wiring, the third-layer wiring, and the fourth-layer wiring.

  As shown in FIG. 45, the solid-state imaging device 127 according to the first embodiment includes an array of eight pixel photodiodes PD [PD1 to PD8] of two horizontal pixels and four vertical pixels and eleven pixel transistors. Are configured as one sharing unit 81. The pixel transistor includes eight readout transistors Tr11 to Tr18, one reset transistor Tr2, one amplification transistor Tr3, and one selection transistor Tr4. The equivalent circuit of the solid-state imaging device 125 is the same as that described with reference to FIG. The shared units 81 are arranged in a two-dimensional array to form a pixel portion.

  The amplification transistor Tr3 and the selection transistor Tr4 are arranged between the first configuration unit 23 and the second configuration unit 25 in one sharing unit 81. The selection transistor Tr4 is formed having a source region 83S, a drain region 83D, and a selection gate electrode 84, and is connected to the amplification transistor Tr3. The source region 83S of the selection transistor Tr4 is the same region as the drain region 31D of the amplification transistor Tr3.

  And in this Embodiment, as shown in FIGS. 46-47, it comprises substantially the same as the reference example 19 except the selection transistor Tr4.

  First, as shown in FIG. 46A, two horizontal and four vertical pixel photodiodes PD1 to PD8, read transistors Tr11 to Tr18 having read gate electrodes 221 to 228, and a reset transistor Tr2. Further, an amplification transistor Tr3 and a selection transistor Tr4 are formed, and one sharing unit 21 is formed here. Then, the connection wiring 28 that connects the floating diffusions FD1, FD2, the amplification gate electrode 32, and the source region 33S of the reset transistor is formed by the first layer metal wiring M1.

  In addition, each wiring by the first layer metal wiring M1 is formed. That is, the vertical signal line 35 connected to the source region 31S of the amplification transistor Tr3 and the power supply wiring 36 connected to the drain region 83D of the selection transistor Tr4 are formed extending in the vertical direction. Further, the selection wiring 85 is formed in the vertical direction so as to be parallel to the power supply wiring 36. At the same time, by the first layer metal wiring M1, the connection part 131 connected to the read gate electrodes 221 to 228, the connection part 132 connected to the reset gate electrode 34, the connection part 133 connected to the selection gate electrode 84, and the substrate contact A connecting portion 134 is formed.

  Next, as shown in FIG. 46B, each wiring by the second layer metal wiring M2 is formed. That is, the reset wiring 27 connected to the reset gate electrode 34 through the connection portion 132 is formed. In addition, a connection line 85 a connected to the selection gate electrode 84 and the selection wiring 85 through the connection portion 133 is formed in the horizontal direction. The connection line 85a is formed with a width of one sharing unit 21. In addition, a readout wiring 262 connected to the readout gate electrode 222 via the connection portion 131 and a readout wiring 268 connected to the readout gate electrode 228 via the connection portion 131 are formed in the horizontal direction. The readout wiring 268 is formed between pixels adjacent in the vertical direction of the first configuration unit 23. The readout wiring 268 is formed between pixels adjacent in the vertical direction of the second configuration unit 25.

  Next, as shown in FIG. 47C, each wiring by the third layer metal wiring M3 is formed. That is, the power supply wiring 29 connected to the drain region 33D of the reset transistor Tr2 through the connection portion (not shown) of the second and third metal layers M1 and M2 so as to overlap the reset wiring 27. Is formed. Further, the readout wiring 263 connected to the readout gate electrode 223 through the connection portion 131 of the first layer metal M1 and the connection portion (not shown) of the second layer metal M2 so as to overlap the readout wiring 262. Is formed. Further, the readout wiring 267 connected to the readout gate electrode 227 through the connection portion 131 of the first layer metal M1 and the connection portion (not shown) of the second layer metal M2 so as to overlap the readout wiring 268. Is formed. Further, a readout wiring 266 extending partly between the photodiodes PD5 and PD6 so as to overlap with the connection line 85a on the amplification transistor Tr3 and connected to the readout gate electrode 226 in a later step is formed.

  Next, as shown in FIG. 47D, each wiring by the fourth layer metal wiring M4 is formed. That is, the read gate electrode is connected via the connection portion 131 of the first layer metal M1 and the connection portions (not shown) of the second and third layer metals M2 and M3 so as to overlap the read wiring 263. Readout wiring 261 connected to 221 is formed. Further, it is connected to the read gate electrode 225 via the connection portion 131 of the first layer metal M1, the second layer, and the third layer connection portion (not shown) so as to overlap the read wiring 268. A read wiring 265 is formed. Further, the read gate electrode 226 and the third layer are connected to each other via the connection part 131 of the first layer metal M1, the second layer, and the third layer connection part (not shown) so as to overlap the connection wiring 28. A connection line 266a for connecting the readout wiring 266 with the layer metal M3 is formed. Further, the connection part 131 of the first-layer metal M1 and the connection parts (not shown) of the second-layer and third-layer metals M2 and M3 are arranged so as to overlap the readout wiring 266 and the connection wiring 28. Thus, a readout wiring 264 connected to the readout gate electrode 224 is formed.

  Further, the substrate contact wiring 50 is formed through the connection part 134 of the first layer metal M1, and the connection parts (not shown) of the second and third layers M2 and M3. In consideration of the balance of the wirings, a dummy wiring 89 that overlaps the connection wiring 28 during the transition to the floating diffusion FD1 and the source region 33S of the reset transistor Tr2, and a dummy wiring 90 that overlaps the power supply wiring 29 on the reset transistor Tr2. Is formed.

  In the first embodiment, when the first read pulse is applied from the terminal t1 to the read wiring 261 by the fourth-layer metal wiring M4, the read transistor Tr1 is turned on and the photodiode PD1 is read. When the second read pulse is applied from the terminal t2 to the read wiring 262 by the second-layer metal wiring M2, the read transistor Tr2 is turned on and the photodiode PD2 is read. By applying a third readout pulse from the terminal t3 to the readout wiring 263 by the third-layer metal wiring M3, the readout transistor Tr3 is turned on and the photodiode PD3 is read out.

  When the fourth read pulse is applied from the terminal t4 to the read wiring 264 by the fourth-layer metal wiring M4, the read transistor Tr4 is turned on and the photodiode PD4 is read. When the sixth read pulse is applied from the terminal t6 to the read wiring 266 by the third layer metal wiring M3, the read transistor Tr6 is turned on through the connection line 266a by the fourth layer metal M4, and the photodiode PD6 is read.

  When the fifth read pulse is applied from the terminal 5 to the read wiring 265 by the fourth-layer metal wiring M4, the read transistor Tr5 is turned on and the photodiode PD5 is read. By applying a seventh readout pulse from the terminal t7 to the readout wiring 267 by the third layer metal wiring M3, the readout transistor Tr7 is turned on and the photodiode PD7 is read out. By applying an eighth readout pulse from the terminal t8 to the readout wiring 268 by the second-layer metal wiring M2, the readout transistor Tr8 is turned on and the photodiode PD8 is read out.

  Although the pixel reading order is changed, the pixels are rearranged so that the pixels can be read row by row in the processing circuit in the subsequent stage.

  According to the solid-state imaging device 127 according to the first embodiment, as in the above-described Reference Example 19, since there is one readout wiring 26 arranged between the rows when viewed from above, each of the photodiodes PD1 to PD8. Is larger than that of Reference Example 1. In addition, each wiring is formed of a four-layer wiring, and on the connection wiring 28 of the first-layer metal wiring M1 connected to the floating diffusions FD1 and FD2, the fourth-layer metal M4 farthest from the connection wiring 28 is formed. Connection lines 264B and 266B are formed. For this reason, the parasitic capacitance between the connection wiring 28 and the connection lines 264B and 266B is reduced, and the conversion efficiency is improved. Therefore, the sensitivity of the solid-state imaging device 127 can be improved.

  Dummy wirings 89 and 90 are formed so as to surround the photodiodes PD1 to PD8 together with the readout wirings 261, 264, 266a, and 225 in a U-shape. For this reason, the photodiodes PD1 to PD8 are surrounded by the same-layer metal wiring with good symmetry, so that color mixing due to light diffraction can be prevented. In addition, the same effects as described in Reference Example 1 are obtained.

  In the solid-state imaging device in which one sharing unit 21 is configured by the photodiode PD [PG1 to PD8] of 8 pixels in total of 2 pixels in the horizontal direction and 4 pixels in the vertical direction and 10 pixel transistors, as shown in FIG. It has a directional wiring layout. That is, in the solid-state imaging device of the present embodiment, one vertical connection wiring 28 is arranged in the center of the 8-pixel photodiode PD column, and the vertical signal line 35 and the power supply wiring 36 are disposed between the adjacent shared units 21. The two wirings are arranged. The wiring layout is extremely simple.

[Modification of amplification transistor]
51 to 57 show modified examples of the amplification transistor Tr3 arranged between the first configuration unit 23 and the second configuration unit 25. FIG.
The amplification transistor Tr3 shown in FIG. 51 is formed by bending an active region 87 extending from the source region 31 through the channel region to the drain region 31D at a right angle, and forming the amplification gate electrode 32 on the region including the bent portion. Is done. One of the L-shaped active regions 87 bent at right angles is formed in the horizontal direction between the rows of the photodiodes PD, and the other is formed in the vertical direction between the columns of the photodiodes PD. The amplification gate electrode 32 is formed linearly in the horizontal direction between the rows of the photodiodes PD.

  According to the amplification transistor Tr3 of FIG. 51, since the active region 87 is formed by being bent at a right angle, the gate length Lg is increased and 1 / f noise can be suppressed.

  The amplification transistor Tr3 shown in FIG. 52 is formed by bending an active region 87 extending from the source region 31 through the channel region to the drain region 31D at a right angle, and bent at a right angle along the bent active region 87. An amplification gate electrode 32 is formed and configured. One of the L-shaped active regions 87 bent at right angles is formed in the horizontal direction between the rows of the photodiodes PD, and the other is formed in the vertical direction between the columns of the photodiodes PD. Similarly, one of the L-shaped amplification gate electrodes 32 bent at a right angle is formed in the horizontal direction between the rows of the photodiodes PD, and the other is formed in the vertical direction between the columns of the photodiodes PD.

  According to the amplification transistor Tr3 of FIG. 52, the active region 87 is bent at a right angle and the amplification gate electrode 32 is bent at a right angle along the active region 87, so that the gate length Lg becomes longer, and 1 / f Noise can be suppressed. Here, as the element isolation region around the active region 87, as described above, a flat element isolation region formed of an impurity diffusion region, for example, a p-type semiconductor region and having a flat insulating film formed on the surface thereof is used. Thus, stress concentration at the L-shaped bent portion of the active region 87 is suppressed. That is, generation of noise due to stress concentration is suppressed. Incidentally, when the element isolation region has the STI structure, stress concentration at the L-shaped bent portion of the active region 87 may occur, and noise due to the stress concentration may occur.

  The amplification transistor Tr3 shown in FIG. 53 is configured by forming an active region 87 including a source region 31S, a channel region and a drain region 31D in a cross shape, and forming an amplification gate electrode on the vertical channel region of the cross. .

  According to the amplification transistor Tr3 of FIG. 53, the gate width Wg is increased, and 1 / f noise can be suppressed.

  In the amplification transistor tr3 shown in FIG. 54, an active region 87 including a source region 31S, a channel region, and a drain region 31D is located between the columns of the photodiodes PD and is linearly formed in the vertical direction. The amplification gate electrode 32 is configured by forming a source region 31S and a drain region 31D extending from the active region 87 between the rows of the photodiodes PD and forming a linear shape in the lateral direction.

  The amplification transistor Tr3 shown in FIG. 55 is located between the rows of the photodiodes PD, and an active region 87 including a source region 31S, a channel region, and a drain region 31D is formed with a length of two pixel pitches, and an amplification gate electrode 32 is formed. It is formed with a length shorter than two pixel pitches. The length of the amplification gate electrode 32 in the gate length direction is preferably formed with a pitch of 1 pixel or more, but can be formed with a pitch shorter than 1 pixel.

  An amplification transistor Tr3 shown in FIG. 56 is located between the rows of the photodiodes PD, and an active region 87 including a source region 31S, a channel region, and a drain region 31D is formed to be shorter than the length of two pixel pitches. An amplification gate electrode 32 is formed and configured. The vertical signal line 35 and the power supply wiring 36 connected to the source region 31S and the drain region 31D are partly extended between the rows of the photodiodes PD.

  In the amplification transistor Tr3 shown in FIG. 57, an active region 87 including a source region 31S, a channel region, and a drain region 31D is formed in a lateral direction with a length of two pixel pitches, and an amplification gate electrode 32 is formed so as to be orthogonal to the active region. It is formed in the vertical direction. The active region 87 is formed between the rows of the photodiodes PD, and the amplification gate electrode 32 is formed between the columns of the photodiodes PD.

  The layout of the amplification transistor Tr3 shown in FIGS. 51 to 57 can be applied to the solid-state imaging device according to the above-described embodiment of the present invention. The amplification transistor Tr3 is formed in the central portion of one sharing unit, so that the degree of freedom of the layout of the amplification transistor Tr3 is increased as shown in FIGS.

[Modification of reset transistor]
58 to 59 show modified examples of the reset transistor Tr3. 58, the active region 88 including the source region 33S, the channel region and the drain region 33D is formed in the vertical direction, and the reset gate electrode 34 is arranged at a two-pixel pitch in the horizontal direction so as to be orthogonal to the active region 88. It is formed and formed in the length.

  According to the reset transistor Tr2 of FIG. 58, the reset gate electrode 34 is formed with a length of 2 pixel pitches. The reset transistor Tr2 can be balanced with the amplification transistor TR3 when combined with the amplification transistor Tr3 having the amplification gate electrode 32 having a length of 2 pixels.

  The reset transistor Tr2 shown in FIG. 59 forms a cross-shaped active region 88 having a channel region in the horizontal direction and a source region 33S and a drain region 33D in the vertical direction, and the reset gate electrode 34 is formed by two pixels in the horizontal direction. It is formed to have a pitch length.

  According to the reset transistor Tr2 of FIG. 59, the channel width Wg can be increased. Further, since the reset gate electrode 34 is formed with a length of 2 pixels, a balance with the amplification transistor TR3 can be achieved when combined with the amplification transistor Tr3 having the amplification gate electrode 32 with a length of 2 pixels.

  These reset transistor Tr2 layouts shown in FIGS. 58 to 59 can be applied to the solid-state imaging device according to the above-described embodiment of the present invention. By forming the reset transistor Tr2 in the central portion on the upper side of one sharing unit, as shown in FIGS. 2, 31, and 58 to 59, the flexibility of the layout of the reset transistor Tr2 is increased.

  In the present invention, although not shown, the solid-state imaging device can be configured by combining the characteristic configurations of the above-described embodiments.

  In the above example, the amplification transistor Tr3 is arranged in the center of the sharing unit 21, and the reset transistor Tr2 is arranged on the upper side of the sharing unit 21. In addition, a reverse arrangement, that is, a configuration in which the reset transistor Tr2 is arranged in the center of the sharing unit 21 and the amplification transistor Tr3 is arranged on the upper side of the sharing unit may be adopted. However, it is advantageous to dispose the amplifying transistor Tr3 in the center of the common unit 21 and the reset transistor Tr2 in the upper side because the connection wiring does not intersect the reset wiring, and the floating capacitance added to the floating diffusion is reduced. is there.

  In the above example, a photodiode array of a total of 8 pixels in the horizontal 2 × vertical 4 (pixels) is one shared pixel. However, in addition, a horizontal 2 × vertical 6 (pixel) total 12 pixel photodiode array, a horizontal 2 × vertical 8 (pixel) total 16 pixel photodiode array, and the like, horizontal 2 × vertical 4n pixels (n is positive) An integer) photodiode array may be configured as one shared unit.

[Second Embodiment: Configuration Example of Electronic Device]
The solid-state imaging device according to the present invention can be applied to electronic devices such as a camera equipped with a solid-state imaging device, a portable device with a camera, and other devices equipped with a solid-state imaging device. In particular, since a fine pixel is formed, a camera having a small solid-state imaging device can be manufactured.

  FIG. 60 shows an embodiment applied to a camera as an example of the electronic apparatus of the invention. The camera 300 according to the present embodiment includes an optical system (optical lens) 92, a solid-state imaging device 93, and a signal processing circuit 94. As the solid-state imaging device 93, any one of the above-described embodiments is applied. The optical system 92 forms image light (incident light) from the subject on the imaging surface of the solid-state imaging device 93. As a result, signal charges are accumulated for a certain period in the photodiode which is the photoelectric conversion unit of the solid-state imaging device 93. The signal processing circuit 94 performs various signal processing on the output signal of the solid-state imaging device 93 and outputs it. The camera 300 according to the present embodiment includes a camera module in which an optical system 92, a solid-state imaging device 93, and a signal processing circuit 94 are modularized.

  In the present invention, the configuration of a camera 300 represented by, for example, a mobile phone including the camera of FIG. 60 or a camera module is a module having an imaging function in which an optical system 92, a solid-state imaging device 93 and a signal processing circuit 94 are modularized. The so-called imaging function module can be configured. The present invention can constitute an electronic apparatus provided with such an imaging function module.

  According to the electronic apparatus according to the present embodiment, in the solid-state imaging device, even if the pixel is miniaturized with high accuracy and the size is reduced accordingly, the sensitivity can be improved, and high image quality and high resolution can be obtained. A high-quality electronic device can be provided.

  DESCRIPTION OF SYMBOLS 1,101-113,115,123,125,127,129,130 .. Solid-state imaging device 2 .... Pixel 3 .... Pixel part 4 .... Vertical drive circuit 5 .... Column signal processing circuit 6 ..Horizontal drive circuit 7 ..Output section 8 ..Control circuit 9 ..Vertical signal line 10 ..Horizontal signal line 11 ..Board 21 ..1 shared unit 23. , 25... Second component, 221 to 228... Readout gate electrode, 261 to 268... Readout wiring, 27 .. reset wiring, 28 .. connection wiring, 29 .. power wiring, 31 S. 31D..Drain region, 32..Amplification gate electrode, 33S..Source region, 33D..Drain region, 34..Reset gate electrode, PD [PD1 to PD8] .. Photodiode, Tr11 to Tr18..Readout G Transistor, Tr2 ... reset transistor, Tr3 ... amplification transistor, Tr4 ... selection transistor, M1-M4 ... first layer to fourth layer metal wiring, 56, 57 ... dummy wiring, 61 ... dot state

Claims (8)

Among pixel transistors, it has a layout in which a photodiode array of two horizontal pixels and four vertical n pixels (n is a positive integer) sharing at least a reset transistor and an amplifying transistor is one shared unit,
The one sharing unit is
Each is composed of a total of four photodiodes, two horizontally and two vertically, a floating diffusion shared by the photodiodes, and a readout gate electrode formed for each of the photodiodes, in the vertical direction of the pixel portion. A plurality of arranged components;
An amplification transistor in which at least the amplification gate electrode is disposed between two adjacent components; and
A reset transistor provided at a position spaced apart from the amplification transistor across two vertical photodiodes;
Provided for each of the readout gate electrodes, connected to each of the readout gate electrodes, extending in the horizontal direction of the pixel portion, and one photodiode between adjacent photodiodes in the vertical direction of the pixel portion as viewed from above. And a readout wiring formed of multiple layers of wiring so that
In the uppermost wiring layer, each photodiode is provided between photodiodes adjacent to each other in the horizontal direction of each component, and between the wiring extending in the vertical direction of the pixel portion and the photodiode adjacent in the vertical direction. A solid-state imaging device surrounded by a U-shape by wiring extending in the horizontal direction of the pixel portion. The solid-state imaging device according to claim 1, wherein some of the wirings provided in a U shape in the uppermost wiring layer are dummy wirings. Two floating diffusions, the reset transistor, and the amplification transistor are arranged linearly,
A connection wiring that connects the two floating diffusions, the amplification gate electrode, and the source region of the reset transistor extends in the vertical direction of the pixel portion between the photodiodes adjacent to each other in the horizontal direction of each component. The solid-state imaging device according to claim 1 or 2. The reset wiring connected to the reset gate electrode of the reset transistor and the power supply wiring connected to the drain region of the reset transistor extend in the horizontal direction of the pixel portion above the reset transistor in different wiring layers, respectively. and it provided, the power supply line and the reset line is a solid-state imaging device according to any one of claims 1 to 3 provided so as to be one from a top view. The amplification transistor includes an active region including a source region, a channel region, and a drain region provided along a horizontal direction of the pixel portion, and the active region has a vertical width of the channel region of the amplification transistor, the solid-state imaging device according to any one of claims 1 to 4 which is a cross shape which is larger than the vertical width of the source region and the drain region of the amplifying transistor. The reset transistor includes an active region including a source region, a channel region, and a drain region provided along a vertical direction of the pixel portion, and the active region has a horizontal width of the channel region of the reset transistor, the solid-state imaging device according to any one of claims 1 to 5 which is a cross-shaped, which is larger than the horizontal width of the source region and the drain region of the reset transistor. Horizontal width of the reset gate electrode provided in the channel region above the reset transistor, the solid-state imaging device according to any one of claims 1 to 6 in 2 pixel pitch in length. A solid-state imaging device;
An optical system for guiding incident light to the photodiode of the solid-state imaging device;
A signal processing circuit for processing an output signal of the solid-state imaging device,
The solid-state imaging device
Among pixel transistors, it has a layout in which a photodiode array of two horizontal pixels and four vertical n pixels (n is a positive integer) sharing at least a reset transistor and an amplifying transistor is one shared unit,
The one sharing unit is
Each is composed of a total of four photodiodes, two horizontally and two vertically, a floating diffusion shared by the photodiodes, and a readout gate electrode formed for each of the photodiodes, in the vertical direction of the pixel portion. A plurality of arranged components;
An amplification transistor in which at least the amplification gate electrode is disposed between two adjacent components; and
A reset transistor provided at a position spaced apart from the amplification transistor across two vertical photodiodes;
Provided for each of the readout gate electrodes, connected to each of the readout gate electrodes, extending in the horizontal direction of the pixel portion, and one photodiode between adjacent photodiodes in the vertical direction of the pixel portion as viewed from above. And a readout wiring formed of multiple layers of wiring so that
In the uppermost wiring layer, each photodiode is arranged between a wiring extending in the vertical direction of the pixel portion provided between the photodiodes adjacent in the horizontal direction of each component and a photodiode adjacent in the vertical direction. An electronic device surrounded by a U-shape by wiring extending in the horizontal direction of the pixel portion provided in the electronic device.