JP5633282B2 - Gas barrier film laminate - Google Patents

Description

  The present invention relates to a gas barrier laminate for suppressing deterioration of contents sensitive to oxygen and water vapor, which is used as a packaging material for electronic paper, foods and drinks, pharmaceuticals, electronic components and the like.

  The gas barrier film laminate of the present invention is used for packaging bags for sealing, especially packaging bags for sealing display elements such as organic electroluminescence (organic EL) display and electronic paper, foods, pharmaceuticals, and other electronic members. Etc., and can be used for any application that requires gas barrier properties.

  In recent years, in the packaging field, as a packaging material for foods and drinks, pharmaceuticals, electronic components, etc., in the preservation of contents, maintenance of packaging form, quality assurance, etc., and in the display field, display elements that are sensitive to oxygen and water vapor are deteriorated. In order to suppress this, a packaging bag made of a gas barrier laminate that prevents permeation of oxygen and water vapor is used.

  These gas barrier laminates usually have a structure in which a base film layer, a gas barrier property-imparting layer, and the like are laminated for the purpose of preventing the intrusion of oxygen and water vapor from the surface, and without using an adhesive. Are laminated by vapor deposition or coextrusion only (Patent Documents 1 and 2), and laminated by using an adhesive (Patent Document 3).

  In addition, for the purpose of developing a gas barrier laminate film suitable for packaging materials having transparency and excellent gas barrier properties such as oxygen and water vapor, particularly gas barrier properties under high humidity, an inorganic oxide vapor deposition layer is provided. A gas barrier laminate film characterized in that a protective layer made of a composition of a vinyl alcohol polymer and a (meth) acrylic acid polymer is formed on the vapor deposition layer surface of the formed film base film is known. (Patent Document 4).

  Furthermore, for the purpose of obtaining a packaging material that is excellent in transparency and has a high gas barrier property and does not deteriorate in physical properties even after boil sterilization, a gas barrier transparent laminate that is useful for the packaging material is made of a transparent plastic material. A transparent primer layer made of a mixture of an acrylic polyol and an isocyanate compound and a vapor-deposited thin film layer made of an inorganic oxide were sequentially laminated on at least one surface of the film, and a polyolefin-based thermoplastic resin layer was laminated thereon as a sealing layer. It is known to have a layer structure (Patent Document 5).

  A laminate used as a packaging material for electronic components or a sealing member for display elements is required to have extremely high gas barrier properties. To satisfy this requirement, two or more gas barrier films are bonded with an adhesive. And there exists a laminated body which improved the gas-barrier property. And such a gas-barrier laminated body can prevent suitably permeation | transmission of oxygen and water vapor | steam from the surface.

  However, it has been found that, in the configuration of the above document, the barrier property deteriorates in a humid heat environment such as a temperature of 60 ° C. and a humidity of 90% (RH), and water enters the display device to cause deterioration. Further, it has been found that oxygen and water vapor enter from the end face, that is, the side face of the gas barrier laminate, and particularly from the adhesive layer that bonds the films to each other, thereby promoting the deterioration of the contents. In the prior art, no measures have been taken from such a viewpoint.

Japanese Patent Laid-Open No. 2003-340956 JP 2007-130857 A JP 2005-161691 A JP 2004-299173 A JP-A-11-147276

  The present invention not only has a good barrier property that water does not enter the display device without deteriorating the barrier property even under a severe wet heat environment such as a temperature of 60 ° C. and a humidity of 90% (RH). It is an object of the present invention to provide a gas barrier laminate and a packaging bag that can prevent the intrusion of oxygen and water vapor and can be applied to various packaging applications and display fields.

  As a result of intensive studies, the present inventors have provided a first weather-resistant coat layer, a vapor deposition layer, and a second weather-resistant coat layer in this order on one surface of a base film made of a plastic material. In the gas barrier film laminate, the first weather-resistant coat layer and / or the second weather-resistant coat layer includes a fluorine-containing copolymer having a crosslinkable group and a curing agent that reacts with the crosslinkable group. It has been found that a gas barrier film laminate comprising the formed fluororesin achieves the above object.

The present invention is characterized by the following points.
1. In the gas barrier film laminate in which a first weather-resistant coating layer, a vapor deposition layer, and a second weather-resistant coating layer are provided in this order on one surface of a base film made of a plastic material, the first The weather-resistant coat layer and / or the second weather-resistant coat layer is composed of a fluorine-based resin formed by a fluorine-containing copolymer having a crosslinkable group and a curing agent that reacts with the crosslinkable group. A gas barrier film laminate.
2. The gas barrier film laminate, wherein the vapor deposition layer is a carbon-containing silicon oxide layer formed by a plasma chemical vapor deposition method.
3. The vapor deposition layer further has a gas barrier coating film provided on the vapor deposition layer, and the gas barrier coating film has a general formula R ¹ _n M (OR ² ) _m (where R ¹ , R ² represents an organic group having 1 to 8 carbon atoms, M represents a metal atom, n represents an integer of 0 or more, m represents an integer of 1 or more, and n + m represents the valence of M. And a gas barrier composition obtained by polycondensation by a sol-gel method, containing at least one alkoxide represented by the formula (1)), a polyvinyl alcohol resin and / or an ethylene / vinyl alcohol copolymer. A gas barrier film laminate comprising a film.
4). The gas barrier film laminate, wherein the second weather-resistant coat layer further has a heat fusion layer provided on the weather-resistant coat layer.
5. The gas barrier film laminate, wherein the heat-fusible layer is made of a polyolefin resin.

  According to the present invention, the barrier layer is not deteriorated for a long time even in a severe wet heat environment such as a humidity of 90% at an air temperature of 60 ° C. by sandwiching the vapor deposition layer between two layers of weather-resistant coating layers. To obtain a gas barrier film laminate that not only has a good barrier property that water does not enter the inside of the device but also can prevent the intrusion of oxygen and water vapor from the sealing surface and the end surface, and also has transparency. Can do.

  Hereinafter, in the present invention, the ability to prevent the entry of oxygen and water vapor from the surface is referred to as surface gas barrier property, and the ability to prevent the entry of oxygen and water vapor from the end face is referred to as end face gas barrier property.

  In the present invention, a weather-resistant coating layer formed of a fluorine-containing copolymer having a crosslinkable group and a curing agent that reacts with the crosslinkable group is used to penetrate oxygen and water vapor into the layer. In addition to being prevented, oxygen and water vapor can be prevented from entering the interface between the layer and the vapor deposition layer. Therefore, by sealing display elements such as organic EL and electronic paper in the packaging bag made of the laminate of the present invention, deterioration of these electronic members due to exposure to oxygen or water vapor can be effectively prevented.

Further, on the deposited layer, the general formula _{^{R 1 n M (OR 2)}} m ( where in the formula, R ^1, R ² represents an organic group having 1 to 8 carbon atoms, M represents a metal atom, n Represents an integer of 0 or more, m represents an integer of 1 or more, and n + m represents a valence of M.), and a polyvinyl alcohol resin and / or ethylene / vinyl alcohol. By providing a gas barrier coating film containing a copolymer and further comprising a gas barrier composition obtained by polycondensation by a sol-gel method, the end face gas barrier property and the surface gas barrier property can be further improved.

  In the present invention, a polyolefin resin is used as the heat fusion layer. Since the layer made of this polyolefin resin itself has a good gas barrier property against oxygen and water vapor, it can improve the surface gas barrier property of the laminate and further prevent the end surface gas barrier property from being lowered.

According to the present invention, in the measurement method defined in the present invention, a packaging bag having a high barrier property such that the water vapor permeability from the end surface of the laminate forming the packaging bag is 30 g / m ² · day or less can be obtained.

It is a schematic sectional drawing which shows an example about the layer structure of the gas barrier film laminated body concerning this invention. It is a schematic sectional drawing which shows another example about the layer structure of the gas barrier film laminated body concerning this invention. It is a schematic sectional drawing which shows another example about the layer structure of the gas barrier film laminated body concerning this invention.

The present invention will be described in more detail below.
<1> Layer Configuration of Gas Barrier Film Laminate of the Present Invention As the gas barrier film laminate of the present invention, for example, as shown in FIG. 1, a base film 1, first and second weather-resistant coating layers 2a 2b, a gas barrier film laminate having a basic structure consisting of the vapor deposition layer 3 can be mentioned.

  As an example of the gas barrier film laminate of the present invention, as shown in FIG. 2, a base film 1, first and second weather-resistant coating layers 2a and 2b, a vapor deposition layer 3, a gas barrier coating film 4 and And a gas barrier film laminate comprising:

Furthermore, as an example of the gas barrier film laminate of the present invention, as shown in FIG. 3, a base film 1, first and second weather-resistant coating layers 2 a and 2 b, a vapor deposition layer 3, a gas barrier coating film 4, A gas barrier film laminate comprising the heat fusion layer 5 is exemplified.
In addition, the weather-resistant coat layer of the present invention may be a two-layer or a multilayer of three or more layers, and can be appropriately set as necessary.

<2> Base film The base film of the present invention is excellent in chemical or physical strength, withstands the conditions for forming a weather-resistant coat layer, etc., and maintains well without impairing the properties of the weather-resistant coat layer. Plastic films that can be used can be used.

  Examples of such plastic films include polyolefin films such as polypropylene and polyethylene, polyester films such as polyethylene terephthalate and polyethylene naphthalate, polyamide films, polycarbonate films, cyclic olefin copolymer films, cyclic olefin polymer films, liquid crystal polymer films, Polyimide film, TAC film and other various resin films or sheets can be used.

In particular, when used as a packaging bag for sealing a display element of a display, from the viewpoint of transparency and heat resistance, a film made of polyethylene terephthalate or a cyclic olefin copolymer is used among the films made of the above plastic material. It is preferable.
The layer thickness of the base film of the present invention is 2 to 400 μm, more preferably 10 to 200 μm.

  In the present invention, the plastic film used as the base film is, for example, one or more of the above-described resins, and formed by a film forming method such as an extrusion method, a cast molding method, a T-die method, a cutting method, an inflation method, or the like. Or it can manufacture by a multilayer coextrusion film-forming method using 2 or more types of resin. Furthermore, if desired, the film can be stretched in a uniaxial or biaxial direction using, for example, a tenter system or a tubular system.

  In addition, various plastic compounding agents, additives, and the like can be added at the time of film formation, and the addition amount can be arbitrarily added from a very small amount to several tens of percent depending on the purpose. it can. As general additives, for example, a lubricant, a crosslinking agent, an antioxidant, an ultraviolet absorber, a light stabilizer, a filler, a reinforcing agent, an antistatic agent, a pigment and the like can be used. A quality resin can also be used.

The plastic film may be subjected to, for example, corona discharge treatment, ozone treatment, low temperature plasma treatment using oxygen gas or nitrogen gas, glow discharge treatment, oxidation treatment using chemicals, or other pretreatment. Can be applied arbitrarily.
The surface pretreatment is carried out as a method for improving the adhesion between the plastic film and the weather-resistant coating layer. As a method for improving the adhesion, for example, on the surface of the plastic film. In addition, a primer coating agent layer, an undercoat layer, a vapor deposition anchor coating agent layer, or the like can be arbitrarily formed in advance.

<3> Weatherproof Coat Layer The gas barrier film laminate of the present invention has a first weatherproof coat layer, a vapor deposition layer, and a second weatherproof coat layer on one surface of a base film made of a plastic material. In this order, the weather-resistant coating layer is a fluorine-based resin formed by a fluorine-containing copolymer having a crosslinkable group and a curing agent that reacts with the crosslinkable group. It is characterized by that.
The fluororesin used for the weather-resistant coating layer of the present invention is not particularly limited as long as it has necessary adhesion, transparency, coating suitability, etc., and can be appropriately selected from known resins. .

  The fluorine-based resin of the present invention functions as a binder component for enhancing adhesion to a base film, and is formed of a fluorine-containing copolymer having a crosslinkable group and a curing agent that reacts with the crosslinkable group. Made of fluororesin. The weather-resistant coating layer, which is formed of a fluorine-containing copolymer having a crosslinkable group and a curing agent that reacts with the crosslinkable group, prevents oxygen and water vapor from penetrating into the layer. In addition, oxygen and water vapor can be prevented from entering the interface between the layer and the vapor deposition layer.

Fluorine-containing copolymer The fluorine-containing copolymer used in the present invention is a polymer soluble in a general-purpose organic solvent, and can be copolymerized with the fluoroolefin monomer (A) and the fluoroolefin monomer. The crosslinkable group-containing monomer (B) is used as a monomer component.
Examples of the fluoroolefin monomer (A) include tetrafluoroethylene, trifluoroethylene, hexafluoropropylene and the like. Since high adhesive strength can be obtained, trifluoroethylene represented by Formula 1: CF ₂ = CFX (where X is a fluorine atom, a chlorine atom, a hydrogen atom or a trifluoromethyl group) is preferable. More preferably, it is chlorotrifluoroethylene in which X in the formula is a chlorine atom.

As the crosslinkable group-containing monomer (B) copolymerizable with the fluoroolefin monomer, a monomer having a hydroxyl group, an epoxy group, a carboxyl group, an amide group, an amino group or a hydrolyzable silyl group as the crosslinkable group. The body is mentioned. Specifically, 2-hydroxyethyl vinyl ether, 3-hydroxypropyl vinyl ether, 2-hydroxypropyl vinyl ether, 2-hydroxy-2-methylpropyl vinyl ether, 4-hydroxybutyl vinyl ether, 5-hydroxypentyl vinyl ether, 6-hydroxyhexyl vinyl ether , Hydroxyl group-containing monomers such as 2-hydroxyethyl allyl ether and 4-hydroxybutyl allyl ether, epoxy group-containing monomers such as glycidyl vinyl ether and glycidyl (meth) acrylate, carboxyl groups such as acrylic acid and methacrylic acid Monomers, amide group-containing monomers such as (meth) acrylamide and N-methylolacrylamide, and amino groups such as aminoalkyl vinyl ether and aminoalkyl allyl ether Hydrolyzable silyl group-containing monomers such as monomers, trimethoxyvinylsilane, triethoxyvinylsilane, γ-methacryloxypropyltrimethoxysilane, etc. can be mentioned, but they can be easily processed by the gravure coating method and can be cured appropriately. Since the speed is obtained, a hydroxyl group-containing monomer, in particular, formula 2: CH ₂ = CHR ¹ [wherein R ¹ is —OR ² to —CH ₂ OR ² (where R ² is an alkyl group having a hydroxyl group) It is particularly preferable to use a hydroxyl group-containing monomer represented by

  In addition to the fluoroolefin monomer and the crosslinkable group-containing monomer, the fluorine-containing copolymer used in the present invention further improves coating properties and coating properties (hardness, flexibility, etc.) as necessary. Therefore, a monomer copolymerizable with the above two types of monomers can be copolymerized and contained.

As such a monomer, β-methyl-substituted α-olefin monomer represented by the formula 3: CH ₂ = CR (CH ₃ ) [wherein R is an alkyl group having 1 to 8 carbon atoms] Compound (C), Formula 4: CHR ³ = CHOR ³ (CH ₃ ), wherein R ³ is an alkyl group having 1 to 8 carbon atoms, Formula 5: A vinyl ether monomer (E) represented by CH ₂ ═CHR ³ , wherein R ³ is —OR ⁴ to —CH ₂ OR ⁴ (where R ⁴ is an alkyl group having a carboxyl group), and And other monomer (F) which does not have a crosslinkable functional group and can be copolymerized with the monomers of the above formulas 1 to 5.

  In the present invention, a copolymer containing all of the monomers (A) to (F) is particularly preferable because the coating property is stabilized.

  The fluorine-containing copolymer used in the present invention contains a fluoroolefin monomer (A) and a crosslinkable group-containing monomer (B) copolymerizable with the fluoroolefin monomer as essential components. Accordingly, at least one monomer selected from the monomers (C), (D), (E), and (F) is added, and a known method such as emulsion polymerization, solution polymerization, or suspension polymerization is performed. It can be obtained by copolymerization.

  The number average molecular weight of the fluorine-containing copolymer of the present invention is 1,000 to 500,000, preferably 3000 to 100,000 as a value in terms of polystyrene measured by gel permeation chromatography (GPC). When the number average molecular weight is less than 1000, the barrier property against water vapor and oxygen may be lowered. Moreover, when larger than 500,000, it may be inferior to coating property.

  The composition ratio between the fluoroolefin monomer (A) in the fluorine-containing copolymer of the present invention and the crosslinkable group-containing monomer (B) copolymerizable with the fluoroolefin monomer is in terms of mole. , (A) :( B) is preferably 1: 1 to 10: 1, particularly preferably 2: 1 to 5: 1. If the ratio of the monomer (A) is too low, the barrier property against water vapor and oxygen may be lowered, and if it is too high, the coatability may be inferior.

  The total amount of the monomers (C), (D), (E), and (F) is not particularly limited as long as the effects of the present invention are not impaired. It is preferable that it is 5-30 mol% with respect to quantity, and it is further more preferable that it is 10-25 mol%. The composition ratio between the monomers (C), (D), (E) and (F) can be appropriately set according to the application.

A compounding agent known to those skilled in the art may be added to the fluorine-containing copolymer used in the present invention, if necessary.
In addition, as a commercial item of the fluorine-containing copolymer of this invention, Daikin Industries make Zeffle GK550, Asahi Glass Lumiflon LF200, etc. can be used, for example.

Curing Agent As the curing agent used in the present invention, a compound that reacts with the above-described crosslinkable group to form a crosslink can be used. The curing agent for the hydroxyl group-containing monomer is a compound having an isocyanate group or a carboxyl group, and an organic polyisocyanate compound having an isocyanate group is preferable because a suitable curing reaction rate can be obtained.

  Examples of the organic polyisocyanate compound include 2,4-tolylene diisocyanate, diphenylmethane-4,4′-diisocyanate, xylylene diisocyanate, isophorone diisocyanate, lysine methyl ester diisocyanate, methylcyclohexyl diisocyanate, trimethylhexamethylene diisocyanate, hexamethylene diisocyanate. , N-pentane-1,4-diisocyanate, and trimers thereof, adducts and burettes thereof, or polymers having two or more isocyanate groups, and further blocked. Examples include isocyanates.

  Preferably, it is a trimer of isophorone diisocyanate or hexamethylene diisocyanate. This is because the compatibility with the fluorine-containing copolymer is good, the curing rate is appropriate, and the laminate strength is high. Moreover, the compound which has a hydroxyl group, a carboxyl group, an amide group, an amino group, or an isocyanate group can be used for the hardening | curing agent with respect to an epoxy group containing monomer. Moreover, the compound which has a hydroxyl group, an amino group, an isocyanate group, or an epoxy group can be used for the hardening | curing agent with respect to a carboxyl group-containing monomer.

Moreover, the compound which has an epoxy group can be used for the hardening | curing agent with respect to an amide group containing monomer. Moreover, the compound which has a carboxyl group, an epoxy group, or an isocyanate group can be used for the hardening | curing agent with respect to an amino group containing monomer. Moreover, the compound which has an amino group or an isocyanate group can be used for the hardening | curing agent with respect to a hydrolysable silyl group containing monomer.
Examples of the compound having a hydroxyl group include 1,4-bis-2′-hydroxyethoxybenzene and bishydroxyethyl terephthalate.

Examples of the compound having a carboxyl group include aliphatic dibasic acids such as fumaric acid, succinic acid, adipic acid, and azelaic acid, and acid anhydrides such as phthalic anhydride. Examples of the compound having an epoxy group include terephthalic acid diglycidyl ester and p-hydroxybenzoic acid diglycidyl ester.
In addition, as a commercial item of the hardening | curing agent of this invention, Asahi Kasei Chemical Co., Ltd. hexamethylene diisocyanate, TPA-100, etc. can be used, for example.

Silane Coupling Agent In the present invention, the weather-resistant coating layer may contain a silane coupling agent in addition to the fluorine-based resin, in order to further increase the adhesive strength and the barrier property against oxygen and water vapor.
As the silane coupling agent, a known organic reactive group-containing organoalkoxysilane can be used.

  In the present invention, an organoalkoxysilane having an epoxy group is particularly suitable. For example, γ-glycidoxypropyltrimethoxysilane, γ-glycidoxypropylmethyldiethoxysilane, or β- ( 3,4-epoxycyclohexyl) ethyltrimethoxysilane or the like can be used. These silane coupling agents may be used alone or in combination of two or more.

  As a compounding quantity of a silane coupling agent, it can set suitably in the range by which the effect of this invention is not impaired, For example, it is preferable in it being 0.05-10 mass% with respect to a fluorine resin, More preferably, it is 0.1-5 mass%. If the amount is less than 0.05% by mass, a sufficient effect cannot be obtained. If the amount is more than 10% by mass, the reaction rate may be slow, which may not be preferable.

Method for Preparing Weatherproof Coat Layer The method for preparing the weather resistant coat layer used in the present invention will be described using a fluorine-containing copolymer containing a hydroxyl group as an example. The fluorine-containing copolymer containing a hydroxyl group and the curing agent are dissolved in a solvent in which one or two or more of acetates, ketones, ethers, aromatic hydrocarbons and the like are mixed. Here, the curing agent is a group that reacts with the crosslinkable group in the curing agent, such as an isocyanate group or a carboxyl group, with respect to 1 equivalent of the crosslinkable group in the fluorine-containing copolymer, such as a hydroxyl group (—OH group). Is added in an amount of 0.1 to 5.0 equivalents, preferably 0.5 to 1.5 equivalents.

The solution in which the fluorine-containing copolymer and the curing agent are dissolved is applied and dried on the base film and the vapor deposition layer by using a known application method such as a roll coating method, a gravure coating method, or a bar coating method. To form.
The layer thickness of the weather resistant coating layer is 0.1 to 6 μm, more preferably 0.3 to 2 μm, respectively. In order to ensure weather resistance, 0.1 μm or more is necessary, but 0.2 μm or more is further desirable. In order to minimize the moisture permeation from the end face, the thickness of the weather-resistant coating layer should be as thin as possible. If the layer thickness exceeds 6 μm, it is required as a sealing member for display elements and the like. The end face gas barrier property may not be maintained.

<4> Vapor deposition layer
Vapor Deposition Layer A vapor deposition layer made of an inorganic oxide described below is applied as the vapor deposition layer suitable for the present invention from the viewpoints of close adhesion with the weatherproof coating layer, transparency, and surface and end face gas barrier properties. be able to.
The material for forming the inorganic oxide vapor deposition layer may be any material having transparency and gas barrier properties such as oxygen and water vapor. For example, aluminum oxide, silicon oxide, magnesium oxide, calcium oxide, zirconium oxide In addition, oxides such as titanium oxide, boron oxide, hafnium oxide, and barium oxide are preferable, and aluminum oxide, silicon oxide, silicon oxynitride, and silicon oxide carbide are particularly preferable in terms of gas barrier properties and production efficiency. .

  As a method for forming the inorganic oxide vapor deposition layer, vacuum deposition, reactive vapor deposition, ion beam assisted vapor deposition, sputtering, ion plating, plasma CVD, thermal CVD, and other vacuum film formation methods can be used. Can be mentioned.

  The inorganic oxide vapor deposition layer may be a single layer formed by a single vapor deposition step, or may be a multilayer structure formed by repeating the vapor deposition step a plurality of times. In the case of a multilayer structure, each layer may be made of the same material, or may be made of different materials, and may be formed by the same forming method or formed by different forming methods. Also good. For example, a vapor deposition film made of silicon oxide may be formed on the base film layer by chemical vapor deposition, and then a vapor deposition film made of aluminum oxide may be formed by physical vapor deposition.

The layer thickness of the inorganic oxide vapor deposition layer can be appropriately set within the range of 5 to 100 nm, more preferably 10 to 50 nm, as the thickness of the entire layer. If the thickness exceeds 100 nm, the flexibility is lowered, and there is a possibility that the deposited layer may be cracked by an external force such as bending or pulling after film formation, the transparency is lowered, the stress of the material itself is increased, and the coloring is increased. It is not preferable. On the other hand, if the thickness exceeds 100 nm, productivity is remarkably lowered, and further, protrusions tend to be formed due to abnormal grain growth, which is not preferable.
On the other hand, when the thickness of the inorganic compound layer is less than 5 nm, the transparency is good, but it is difficult to obtain a uniform layer and it is difficult to sufficiently perform the gas barrier function.

  In the present invention, a carbon-containing silicon oxide layer that forms a particularly suitable vapor deposition layer is a thin film having a gas barrier performance that blocks or blocks permeation of oxygen gas, water vapor, etc., and is a chemical vapor deposition method (Chemical Vapor Deposition method). , CVD method), specifically, a method of forming a silicon oxide film using a plasma chemical vapor deposition method, a thermal chemical vapor deposition method, a photochemical vapor deposition method, or the like. In particular, it is desirable to manufacture using a low temperature plasma chemical vapor deposition method.

  In the present invention, specifically, a film-forming mixed gas composition containing a monomer gas for film formation, oxygen gas and inert gas composed of one or more organic silicon compounds is used, and low temperature plasma generation is performed. A carbon-containing silicon oxide layer is formed on the surface of a base film (hereinafter referred to as a coated base film) provided with a first weather-resistant coating layer using a low-temperature plasma chemical vapor deposition apparatus utilizing an apparatus or the like. can do.

  In the above, as the low-temperature plasma generator, for example, generators such as high-frequency plasma, pulse wave plasma, microwave plasma can be used, but in the present invention, in order to obtain a highly active stable plasma, It is desirable to use a high frequency plasma generator.

  In the present invention, a low temperature plasma chemical vapor deposition apparatus having at least two film forming chambers is used, and the gas component mixing ratio of the film forming mixed gas composition used for each chamber is changed. Two or more carbon-containing silicon oxide vapor deposition films may be formed. Here, it is more preferable that the carbon atom contents contained in the carbon-containing silicon oxide vapor deposition films are different from each other. Thereby, a higher gas barrier property can be obtained than in the case where the carbon-containing silicon oxide layer is formed of a single-layer deposited film.

  The method for forming the carbon-containing silicon oxide layer by the plasma chemical vapor deposition method is as described in, for example, Japanese Patent Application Laid-Open No. 2010-070224 by the present applicant. The outline of the method for forming the silicon oxide layer will be described.

  In the present invention, the low temperature plasma chemical vapor deposition apparatus includes a coated base film supply chamber, a first deposition chamber, a second deposition chamber, a third deposition chamber, and a carbon-containing silicon oxide layer. It is comprised from the winding chamber which winds up a gas barrier film.

  In the present invention, first, from the unwinding roll arranged in the supply chamber of the coated substrate film, the coated substrate film is fed to the first film forming chamber, and further, the coated substrate film is used as an auxiliary roll. Via the cooling / conveying on the electrode drum circumferential surface at a predetermined speed.

  Next, a film-forming monomer gas, oxygen gas, inert gas, etc. composed of one or more organic silicon compounds are supplied from a raw material volatilization supply device, a gas supply device, etc., and a film-forming mixed gas composition comprising them The mixed gas composition for film formation is introduced into the first film formation chamber through the raw material supply nozzle while adjusting the material, and the coated substrate film conveyed on the cooling / electrode drum peripheral surface is On top, plasma is generated by glow discharge plasma and irradiated to form a first carbon-containing silicon oxide layer made of silicon oxide or the like.

  Further, in some cases, the polyamide-based resin film obtained by forming the carbon-containing silicon oxide layer of the first layer in the first film forming chamber is applied to the second film forming chamber and further to the third film forming chamber. In the same manner as described above, the second and third carbon-containing silicon oxide layers made of silicon oxide or the like can be formed.

Next, in the present invention, the coated substrate film in which the carbon-containing silicon oxide layers of the first layer, the second layer, and the third layer are overlaid as described above is fed out to the winding chamber via the auxiliary roll, A gas barrier film in which the first layer, the second layer, and the third layer of the carbon-containing silicon oxide layer are overlaid can be manufactured by winding on a winding roll.
In the present invention, each cooling / electrode drum disposed in each of the first, second, and third film forming chambers receives a predetermined power from a power source disposed outside each film forming chamber. In addition, a magnet is disposed in the vicinity of each cooling / electrode drum to promote the generation of plasma.
Of course, the above-described plasma chemical vapor deposition apparatus is provided with a vacuum pump or the like, and each film forming chamber or the like can be prepared so as to be kept in vacuum.

The above exemplification is an example, and it is needless to say that the present invention is not limited thereby.
For example, in the above example, a gas barrier film in which the carbon-containing silicon oxide layers of the first layer, the second layer, and the third layer are overlaid is manufactured. The carbon-containing silicon oxide layer has a desired gas barrier. The number of film forming chambers can be arbitrarily adjusted according to the property, and can be arbitrarily formed into a film such as one layer, two layers, four layers or more, and the present invention includes the first layer, the second layer, and the like. It is not limited only to the example which manufactures the gas barrier film which the layer and the carbon-containing silicon oxide layer of the 3rd layer overlaid.
In the above, each film forming chamber is decompressed by a vacuum pump or the like and adjusted to a degree of vacuum of 1 × 10 to 1 × 10 ⁻⁶ Pa, preferably a degree of vacuum of 1 × 10 ⁻¹ to 1 × 10 ⁻⁵ Pa. Is desirable.

  On the other hand, since a predetermined voltage is applied to each cooling / electrode drum from the power source, glow discharge plasma is generated in the vicinity of the opening of the raw material supply nozzle in each film forming chamber and the cooling / electrode drum. The glow discharge plasma is derived from one or more gas components in the mixed gas composition for film formation. In this state, the coated substrate film is transported at a constant speed, and is cooled by a glow discharge probe. A carbon-containing silicon oxide layer made of silicon oxide or the like can be formed on the coated substrate film on the electrode drum peripheral surface.

Note that the degree of vacuum in each film forming chamber at this time is preferably 1 × 10 ¹ to 1 × 10 ⁻² Pa, and preferably adjusted to a vacuum degree of 1 × 10 ¹ to 1 × 10 ⁰ Pa. The conveying speed of the coated base film is preferably 10 to 300 m / min, and preferably 50 to 150 m / min.

  In the raw material volatilization supply device, the monomer gas for film formation composed of one or more organic silicon compounds as raw materials is volatilized and mixed with oxygen gas, inert gas, etc. supplied from the gas supply device, and from these The film-forming mixed gas composition is introduced into each film-forming chamber through the raw material supply nozzle while adjusting the film-forming mixed gas composition.

  In this case, the gas mixing ratio of each gas component of the mixed gas composition for film formation is such that the content of the monomer gas for film formation is 1 to 40%, the content of oxygen gas is 0 to 70%, the content of inert gas The amount is preferably adjusted in the range of 1 to 60%.

  Thus, in the present invention, each film forming chamber uses a film forming mixed gas composition prepared by changing the gas mixing ratio of each gas component of the film forming mixed gas composition to be introduced. The gas barrier film according to the present invention is manufactured by forming a film for each film forming chamber and overlaying a carbon-containing silicon oxide layer made of silicon oxide or the like.

  In the present invention, the mixing ratio of each gas component of the above-mentioned mixed gas composition for film formation varies depending on various conditions such as the type of raw material compound used, oxygen gas and water remaining in the chamber, and plasma energy. Those skilled in the art can determine appropriately.

In the low-temperature plasma chemical vapor deposition apparatus, the carbon-containing silicon oxide layer made of silicon oxide or the like is formed into a plasma on the plasma etching layer provided on the coated substrate film in each film forming chamber. It is formed into a thin film in the form of SiO _x while oxidizing the raw material gas with oxygen gas, so it becomes a thin film with high density, few gaps, spreadability, flexibility, flexibility, etc. Therefore, the gas barrier property of the carbon-containing silicon oxide layer made of silicon oxide or the like is much higher than that of a silicon oxide layer made of silicon oxide or the like formed by a conventional vacuum vapor deposition method, etc. Gas barrier properties can be obtained.

In the present invention, the surface of the coated base film is cleaned by SiO _X plasma, and polar groups and free radicals are generated on the surface. This has the advantage that the tight adhesion between the silicon oxide vapor-deposited layer and the coated substrate film is increased.

Further, when two or more carbon-containing silicon oxide layers are continuously stacked using a plasma chemical vapor deposition apparatus including at least two film forming chambers, each layer has a high gas barrier property. Since it can be formed into a film, it is possible to obtain a higher gas barrier property than that of a single layer, and further, foreign matter and dust that cause cracks by continuously forming a film without opening it to the atmosphere. Can be prevented from being mixed between the film-forming layers, and the gas barrier property is not deteriorated, and each carbon-containing silicon oxide layer is mainly composed of silicon oxide, carbon, hydrogen, This is a discontinuous layer containing at least one compound composed of silicon and one or more elements in oxygen and having a different content of the above compound for each carbon-containing silicon oxide layer. From have various advantages in that oxygen gas, it is possible to completely prevent the permeation of water vapor or the like.

  In the present invention, the total film thickness of the carbon-containing silicon oxide layer formed in each film forming chamber constituting the gas barrier layer is preferably about 60 to 4000 mm, particularly about 100 to 1000 mm. desirable. If it is thicker than 1000 mm, and more preferably 4000 mm, cracks and the like are likely to occur in the film, and it is not preferable. If it is less than 100 mm, and less than 60 mm, it is difficult to achieve the gas barrier effect. It is not preferable.

  Next, in the present invention, examples of the organosilicon compound constituting the monomer gas for film formation include 1.1.3.3-tetramethyldisiloxane, hexamethyldisiloxane (HMDSO), vinyltrimethylsilane, and methyltrimethyl. Silane, hexamethyldisilane, methylsilane, dimethylsilane, trimethylsilane, diethylsilane, propylsilane, phenylsilane, vinyltriethoxysilane, vinyltrimethoxysilane, tetramethoxysilane, tetraethoxysilane, phenyltrimethoxysilane, methyltriethoxysilane , Octamethylcyclotetrasiloxane, and the like can be used.

In the present invention, among the organosilicon compounds as described above, 1.1.3.3-tetramethyldisiloxane or hexamethyldisiloxane is particularly preferable because of its handleability and the characteristics of the formed continuous film. Preferred raw material.
Moreover, in this invention, argon gas, helium gas etc. can be used as inert gas, for example.

Gas barrier coating film In the present invention, a gas barrier coating film may be provided on the vapor deposition layer.

  By providing a gas barrier coating film on the vapor-deposited layer, not only a superior surface gas barrier property can be obtained, but also the tight adhesion with the weather-resistant coating layer is enhanced, and a higher end face gas barrier property is obtained.

  In the present invention, the gas barrier coating film is a film obtained by applying and drying a gas barrier composition obtained by polycondensation of an alkoxide and a water-soluble polymer by a sol-gel method.

The alkoxide used in the gas barrier composition has a general formula R ¹ _n M (OR ² ) _m (wherein R ¹ and R ² represent an organic group having 1 to 8 carbon atoms, and M is a metal An atom is represented, n represents an integer greater than or equal to 0, m represents an integer greater than or equal to 1, n + m represents the valence of M.) At least 1 type or more alkoxide represented by this can be mentioned. .

  As the water-soluble polymer, either a polyvinyl alcohol resin or an ethylene / vinyl alcohol copolymer or both can be preferably used.

In the present invention, as the alkoxide represented by the general formula R ¹ _n M (OR ² ) _m , silicon, zirconium, titanium, aluminum or the like can be used as the metal atom M. Moreover, in this invention, the alkoxide of a single or 2 or more types of different metal atoms can be mixed and used in the same solution.

In the alkoxide represented by the general formula R ¹ _n M (OR ² ) _m , specific examples of the organic group represented by R ¹ include, for example, a methyl group, an ethyl group, an n-propyl group, i Examples include -propyl group, n-butyl group, i-butyl group, sec-butyl group, t-butyl group, n-hexyl group, n-octyl group and other alkyl groups.

In the alkoxide represented by the general formula R ¹ _n M (OR ² ) _m , specific examples of the organic group represented by R ² include, for example, a methyl group, an ethyl group, an n-propyl group, i -Propyl group, n-butyl group, sec-butyl group and the like.

  In the present invention, these alkyl groups may be the same or different in the same molecule.

In the present invention, as the alkoxide represented by the general formula R ¹ _n M (OR ² ) _m , for example, an alkoxysilane in which M is Si can be used. As the alkoxysilane, for example, tetramethoxy Examples thereof include silane Si (OCH ₃ ) ₄ , tetraethoxysilane Si (OC ₂ H ₅ ) ₄ , tetrapropoxysilane Si (OC ₃ H ₇ ) ₄ , tetrabutoxysilane Si (OC ₄ H ₉ ) _{4 and the} like.

  Moreover, in this invention, it is preferable that content of a polyvinyl alcohol-type resin and / or an ethylene vinyl alcohol copolymer is the range of 5-500 mass parts with respect to 100 mass parts of total amounts of said alkoxide. In the above, if it exceeds 500 parts by mass, the brittleness of the gas barrier coating film to be formed becomes large, and its weather resistance and the like are also unfavorable.

  In the present invention, as the polyvinyl alcohol-based resin, generally obtained by saponifying polyvinyl acetate can be used. Specific examples of the polyvinyl alcohol resin include PVA110 (degree of saponification = 98 to 99%, degree of polymerization = 1100), PVA117 (degree of saponification = 98 to 99%, degree of polymerization = 1700), PVA124 (made by Kuraray Co., Ltd.) Degree of saponification = 98-99%, degree of polymerization = 2400), PVA135H (degree of saponification = 99.7% or more, degree of polymerization = 3500), RS-110 (degree of saponification = 99%) manufactured by the same company , Degree of polymerization = 1,000), Kuraray Poval LM-20SO (degree of saponification = 40%, degree of polymerization = 2,000) manufactured by the same company, Gohsenol NM-14 (degree of saponification = 99%, degree of polymerization = 1,400) and gohsenol NH-18 (degree of saponification = 98 to 99%, degree of polymerization = 1700) and the like can be used.

  In the present invention, as the ethylene-vinyl alcohol copolymer, a saponified product of a copolymer of ethylene and vinyl acetate, that is, a product obtained by saponifying an ethylene-vinyl acetate random copolymer should be used. Can do. Such saponification products include partial saponification products in which several tens mol% of acetic acid groups remain to complete saponification products in which only several mol% of acetic acid groups remain or no acetic acid groups remain. The Although not particularly limited, it is desirable to use a saponification degree of 80 mol% or more, more preferably 90 mol% or more, and still more preferably 95 mol% or more from the viewpoint of gas barrier properties. The content of repeating units derived from ethylene in the ethylene / vinyl alcohol copolymer (hereinafter also referred to as “ethylene content”) is usually 0 to 50 mol%, preferably 20 to 45 mol%. Is preferably used. Specific examples of the ethylene / vinyl alcohol copolymer include Kuraray Co., Ltd., Eval EP-F101 (ethylene content: 32 mol%), Nippon Synthetic Chemical Industry Co., Ltd., Soarnol D2908 (ethylene content: 29 mol%). ) Etc. can be used.

In the present invention, a silane coupling agent or the like can also be added to prepare a gas barrier composition for forming a gas barrier coating film according to the present invention. Suitable silane coupling agents include N- (2-aminoethyl) -3-aminopropylmethyldimethoxysilane, N- (2-aminoethyl) -3-aminopropyltrimethoxysilane, N- (2- Amino group-containing silane coupling agents such as aminoethyl) -3-aminopropyltriethoxysilane, 3-aminopropyltrimethoxysilane, 3-aminopropyltriethoxysilane, N-phenyl-3-aminopropyltrimethoxysilane, 2 -Epoxy group-containing silanes such as (3,4-epoxycyclohexyl) ethyltrimethoxysilane, 3-glycidoxypropyltrimethoxysilane, 3-glycidoxypropylmethyldiethoxysilane, 3-glycidoxypropyltriethoxysilane Coupling agent, 3-mercaptopro Examples include mercapto group-containing silane coupling agents such as rumethyldimethoxysilane and 3-mercaptopropyltrimethoxysilane, and isocyanate group-containing silane coupling agents such as 3-isocyanatopropyltriethoxysilane and 3-isocyanatopropyltrimethoxysilane. .

  The gas barrier composition used in the present invention can be prepared by hydrolyzing and polycondensing an alkoxide and a water-soluble polymer by a sol-gel method in the presence of an acid, water and an organic solvent.

  The gas barrier coating film is a temperature at which the gas barrier composition is applied on the inorganic oxide vapor deposition layer and is 20 ° C. to 200 ° C., preferably 140 ° C. or more, and the melting point of the plastic film constituting the base film layer. Can be formed by heat treatment for 10 seconds to 10 minutes.

  Moreover, as an acid used in preparation of said gas-barrier composition, organic acids, such as mineral acids, such as a sulfuric acid, hydrochloric acid, nitric acid, and an acetic acid, tartaric acid, etc. can be used, for example. Furthermore, as the organic solvent, for example, methyl alcohol, ethyl alcohol, isopropyl alcohol, n-propyl alcohol, or the like can be used.

  Further, regarding the gas barrier composition, the polyvinyl alcohol-based resin and / or the ethylene / vinyl alcohol copolymer is preferably in a state of being dissolved in a coating solution containing the alkoxide, the silane coupling agent, or the like. Therefore, the type of the organic solvent is appropriately selected. In the present invention, as the ethylene / vinyl alcohol copolymer solubilized in a solvent, for example, those commercially available as Soarnol (manufactured by Nippon Synthetic Chemical Co., Ltd.) can be used.

  When the above gas barrier composition is applied on the inorganic oxide vapor deposition layer and heated to remove the solvent and the alcohol produced by the polycondensation reaction, the polycondensation reaction is completed and a transparent gas barrier coating film is formed. Is done.

  Furthermore, since the hydroxyl group generated by hydrolysis and the silanol group derived from the silane coupling agent are bonded to the hydroxyl group on the surface of the inorganic oxide deposition layer, close adhesion between the inorganic oxide deposition layer and the gas barrier coating film, etc. Will be good.

  By being formed as described above, the gas barrier coating film of the present invention includes a linear polymer having crystallinity and has a structure in which a large number of minute crystals are embedded in an amorphous portion. . Such a crystal structure is the same as that of a crystalline organic polymer (for example, vinylidene chloride or polyvinyl alcohol), and a polar group (OH group) is partially present in the molecule, and the cohesive energy of the molecule is high. Good surface gas barrier properties.

In the present invention, the inorganic oxide vapor deposition layer and the gas barrier coating film are, for example, hydrolyzed and
A chemical bond, a hydrogen bond, a coordination bond, or the like by co-condensation is formed, the adhesion between these two layers is improved, and a better surface gas barrier effect can be exhibited by a synergistic effect.

  In the present invention, the gas barrier composition may be applied by one or more times by a coating means such as a roll coat such as a gravure roll coater, a spray coat, dipping, a brush, a bar coat, or an applicator. With this coating, a gas barrier coating film having a dry film thickness of 0.01 to 30 μm, preferably 0.1 to 10 μm can be formed.

  In the present invention, in order to obtain a higher surface gas barrier property, after providing the gas barrier coating film, the inorganic oxide vapor deposition layer and the gas barrier coating film are alternately or once in this order. A transparent gas barrier film may be formed by repeatedly laminating as described above and preferably forming the gas barrier coating film to be the outermost layer.

  In addition, in this invention, after forming said vapor deposition layer on the 1st weather-resistant coat layer on a base film surface, a 2nd weather-resistant coat layer is laminated | stacked, and also it heat-seals on it. Laminate the layers to form the packaging bag of the present invention by laminating the layers, fold this laminate into two or prepare two laminates, and place the surface of the heat-sealing layer (sealant film) Overlapping each other and further heat-sealing the peripheral edge thereof to produce various forms of packaging bags, but the gas barrier coating film is only on one vapor deposition layer when used as a packaging bag, or both You may provide in a vapor deposition layer.

<5> Heat-fusion layer The heat-fusion layer constituting the laminate of the present invention may be a layer composed of an olefin-based heat-fusion resin composition (olefin-based hot melt resin composition), or It may be a layer made of a heat-fusible film (sealant film).

Olefin-based heat fusion resin composition (olefin-based hot melt resin composition)
In the present invention, the hot melt resin composition means a resin composition containing a base polymer and a tackifier and having heat melting property and adhesiveness, and the base polymer is an olefin resin, in particular. It is called an olefin-based hot melt resin composition.

  The heat-sealing layer composed of the hot melt resin composition can be directly laminated on the transparent gas barrier film. Thereby, since the layer thickness can be set thin, the gas permeability from the end face can be kept low.

  The base polymer imparts cohesive force by imparting bulk physical properties to the hot-melt resin composition, and is tough and has a strong property against tensile strength and compressive stress. An olefin-based hot melt resin composition containing an olefin-based resin as a base polymer is preferable because it is excellent in suppressing the intrusion of oxygen and water vapor from the end face.

  As the olefin resin of the present invention, an α-olefin copolymer is preferably used. The α-olefin copolymer is a copolymer composed of two or more kinds of α-olefins, and may be a copolymer containing other copolymerizable monomers if necessary. . Those skilled in the art can arbitrarily set characteristics such as copolymerization ratio, viscosity, intramolecular branching, and molecular weight distribution. α-olefins include ethylene, propylene, pentene-1, 4-methylpentene-1, butene-1, hexene-1, octene-1, decene-1, and dodecene-1. Of these, propylene, ethylene, pentene-1, 4-methylpentene-1, decene-1, and hexene-1 are preferred because of their high density and excellent suppression of water vapor penetration. Particularly preferred is a copolymer comprising propylene, ethylene and butene-1, particularly a copolymer of ethylene and another α-olefin, that is, an ethylene / α-olefin copolymer.

  Commercially available α-olefin copolymers suitably used in the present invention include “Bureon” (manufactured by Mitsui Petrochemical Co., Ltd.), “Nack Flex” (manufactured by Nihon Unicar), “Shell Polybutylene” (Shell Chemical). ), “Tuffmer” (manufactured by Mitsui Petrochemical Co., Ltd.), “Excellen VL” (manufactured by Sumitomo Chemical Co., Ltd.), and the like. These α-olefin copolymers may be used in combination of two or more.

  A tackifier is used in order to adjust the adhesiveness of a hot-melt resin composition. As the tackifier used in the present invention, saturated petroleum resins such as aliphatic hydrocarbons, cycloaliphatic hydrocarbons, hydrogenated petroleum resins and the like are preferable. Specifically, for example, C9 to C10 fractions such as resins obtained by copolymerizing C5 fractions containing pentenes, isoprene, piperine, 1,3-pentadiene, indene, vinyltoluene, α-methylstyrene and the like. And a resin obtained by polymerizing a cyclic monomer such as dicyclopentadiene. Examples of commercially available tackifiers suitably used in the present invention include “FTR-600” (manufactured by Mitsui Petrochemical Industries), “Arcon” (manufactured by Arakawa Chemical Industries), “Quinton” (Nippon Zeon Corporation) ), “Escollets” (manufactured by Tonex), etc. can be used.

  In the olefin-based hot melt resin composition of the present invention, the ratio of base polymer: tackifier is 70:30 to 95: 5, preferably 75:25 to 90:10. When the ratio of the base polymer is small, the handleability and the adhesive strength are lowered. On the other hand, when the ratio of the base polymer is large, the adhesive strength is also lowered.

  It does not specifically limit as a preparation method and the coating method of an olefin type hot-melt resin composition, A conventionally well-known method is employable. As a specific preparation method, it can be carried out by kneading each component by an operation usually performed using an apparatus having heating, stirring, kneading functions and the like. And the method and apparatus which apply | coat the obtained hot-melt resin composition to a coating layer are conventionally well-known, such as spray coating, nozzle coating, dip coating, roll coating, gravure coating, rolling coating, brush coating, etc. A coating method and a coating apparatus can be used. Such a coating method and a coating apparatus can be appropriately selected in consideration of the viscosity and viscosity of the olefinic hot melt resin composition according to the present invention. Moreover, it is good also as a heat-fusion layer by adhere | attaching the film which consists of an olefin type hot-melt resin composition by hot press.

  In the present invention, the olefin-based heat-sealing resin composition (olefin-based hot-melt resin composition) is provided on the second weather-resistant coating layer, and in that case, it is laminated via an appropriate adhesive resin layer. I decided to.

  The layer thickness of the hot melt resin composition forming the heat-sealing layer is preferably 20 to 50 μm. When it is thicker than 50 μm, the amount of oxygen and water vapor penetrating from the end face of the heat-fusible layer increases. On the other hand, if it is thinner than 20 μm, the heat seal strength is lowered, which causes a leak.

Heat-sealable film (sealant film)
The heat-sealable film (sealant film) of the present invention is non-adhesive at room temperature, but after being melted by heat, it is overlapped with the heat-sealable layer that is also melted by heat, and is pressure-bonded and cooled. By adhering to each other. Here, normal temperature refers to a temperature state in the range of 5 ° C. to 35 ° C. based on JIS Z 8703. Non-adhesive means a material that cannot be measured by a 180-degree peeling test measured according to JIS Z 0237.

  The heat-fusible film (sealant film) constituting the laminate forming the packaging bag of the present invention is preferably made of a polyolefin resin.

  Polyolefin resins include low-density polyethylene, medium-density polyethylene, high-density polyethylene, linear low-density polyethylene, ethylene-butene copolymer and other polyethylene resins, homopolypropylene, ethylene-propylene copolymer, ethylene-propylene- Polypropylene resins such as butene copolymers are used alone or as a mixture of two or more, as a resin composition containing an optional additive in some cases. When the polyolefin resin contains an optional additive and is used as a resin composition, the composition is a tackifier such as an aliphatic hydrocarbon, a cyclic aliphatic hydrocarbon, a hydrogenated petroleum resin, or the like. Does not contain saturated petroleum resin.

  The film made of polyolefin resin may be a single layer film made of polyolefin resin or a coextruded film having a layer made of polyolefin resin as the outermost layer. In order to maintain excellent end face gas barrier properties, a single-layer film made of a polyolefin resin or a coextruded film in which all layers are layers made of a polyolefin resin is preferable.

In the present invention, the heat-fusible film (sealant film) is laminated on the second weather-resistant coat layer side.
When the film made of polyolefin resin is a coextruded film, the layers made of polyolefin resin are laminated so as to be the outermost layer. Since the polyolefin-based resin exhibits waterproofness, it is possible to improve the surface gas barrier property of the laminate and to prevent the end-face gas barrier property from being lowered by bonding the heat-sealing layer made of the polyolefin-based resin.

  The film thickness of the heat-fusible film (sealant film) forming the heat-sealing layer is preferably 15 to 50 μm. When it is thicker than 50 μm, the amount of oxygen and water vapor penetrating from the end face of the heat-fusible layer increases. On the other hand, if it is thinner than 15 μm, the heat seal strength is lowered, which causes leakage.

<6> Bonding In the present invention, after forming the above-mentioned vapor-deposited layer on the first weather-resistant coat layer on the base film surface, the second weather-resistant coat layer is laminated, and further thereon. A gas barrier film laminate is obtained by laminating the heat-sealing layer.

The weather-resistant coating layer of the present invention adheres firmly to the vapor deposition layer or the gas barrier coating film, is stable with time, and has an end face gas barrier property in order to prevent oxygen and water vapor from entering the bonded interface. Increase further.
Further, as one aspect of the present invention, one or more additional layers may be laminated on the surface of the first weather-resistant coat layer opposite to the surface facing the second weather-resistant coat layer.

In order to be suitably used as a packaging bag for sealing a display element, the packaging bag needs to exhibit both excellent surface gas barrier properties and end surface gas barrier properties. Especially for the end face gas barrier property, as a measured value of the water vapor permeability from the end face based on the method described below, the water vapor permeability from the end face of the laminate forming the packaging bag is 30 g / m ² · day or less. Preferably, it is required to show a low value of 15 g / m ² · day or less, and more preferably 10 g / m ² · day or less. According to the present invention, this requirement can be achieved.

  In the present invention, the water vapor permeability from the surface is a value measured using AQUATRAN manufactured by MOCON in an environment of a temperature of 60 ° C. and a humidity of 90% (RH) according to ASTM F1249-90.

  Further, in the present invention, the transparent means that it has a necessary transparency depending on the use, and includes colorless or colored and transparent, particularly as a packaging bag for sealing such as a display element of a display. When using, high transparency is requested | required, for example, the average light transmittance in visible light region 380 nm-780 nm says the case where it is 80% or more. In addition, the measurement of light transmittance uses the value measured in room temperature and air | atmosphere using the ultraviolet visible spectrophotometer (For example, Shimadzu Corporation UV-3100PC).

Post-treatment The gas barrier film laminate of the present invention can further improve the barrier properties by treating the uncured product by irradiating an electron beam as a post-treatment after lamination (lamination).
Here, the acceleration voltage of the electron beam can be appropriately selected according to the resin to be used and the thickness of the layer, but it is preferable to cure the uncured resin layer at an acceleration voltage of about 70 to 300 kV. In addition, in electron beam irradiation, the transmission capability increases as the acceleration voltage increases. Therefore, when using a base film that deteriorates due to an electron beam as the base film, the penetration depth of the electron beam and the thickness of the resin layer By selecting the accelerating voltage so that they are substantially equal, it is possible to suppress the irradiation of the extra electron beam to the base film, and to minimize the deterioration of the base film due to the excess electron beam Can do.
The irradiation dose is preferably such that the crosslink density of the resin layer is saturated, and is usually selected in the range of 5 to 300 kGy (0.5 to 30 Mrad), preferably 10 to 50 kGy (1 to 5 Mrad).

  Further, the electron beam source is not particularly limited. For example, various electron beam accelerators such as a cockroft Walton type, a bandegraft type, a resonant transformer type, an insulated core transformer type, a linear type, a dynamitron type, and a high frequency type. Can be used.

<7> Manufacture and use of packaging bag The gas barrier film laminate of the present invention is obtained by folding the laminate into two or preparing two laminates, and the surface of the heat-sealing layer (sealant film). For example, a side seal type, a two-side seal type, a three-side seal type, a four-side seal type, an envelope-attached seal type, a joint-attached seal type (pillow seal type), and a pleated seal It can be manufactured as a packaging bag of various forms by heat-sealing by a heat-sealing form such as a mold, a flat bottom seal type, a square bottom seal type, a gusset type.

  In the above, as a heat sealing method, for example, a known method such as a bar seal, a rotary roll seal, a belt seal, an impulse seal, a high frequency seal, and an ultrasonic seal can be used.

  The gas barrier film laminate of the present invention can be used as various packaging materials, and in particular, can be suitably used as a sealing packaging bag for display elements of a display.

  When a sealed display device is manufactured by sealing a display element in a packaging bag made of the gas barrier film laminate of the present invention, an organic EL display element, an electrophoretic display element, a liquid crystal display element are used as the sealed display element. , A light emitting diode display element and the like, but are not limited thereto. Furthermore, as a display element enclosed in the packaging bag of this invention, what was described in special table 2004-526210 grade | etc., Can be applied, for example.

The gas barrier film laminate of the present invention is obtained by laminating a barrier film having a high water vapor barrier property and further imparting performance capable of withstanding use in a high temperature and high humidity environment. Therefore, according to the gas barrier film laminate of the present invention, it has excellent water vapor barrier properties and can prevent deterioration and alteration of the contents due to water vapor, so food and drink, pharmaceuticals, electronic parts, chemicals, It can be suitably used as a packaging material for various articles such as daily necessities. Further, it can be suitably used as a protective material for electrophoretic ink of electronic paper that is easily affected by moisture.

Furthermore, the gas barrier film laminate of the present invention can be applied to a solar cell backsheet, a display substrate such as a liquid crystal display and an organic EL display. When the display element is exposed to water vapor, its performance deteriorates, and troubles such as not emitting light may occur. According to the gas barrier film laminate of the present invention, for example, the display element can be protected from water vapor by being applied instead of the two glass substrates of the display or outside the glass substrate.
Next, the present invention will be specifically described with reference to examples.

[Example 1]
(1) A biaxially stretched polyethylene terephthalate film having a thickness of 12 μm was used as a base film, and a solution under the following conditions was applied to the corona-treated surface by a gravure coating method and dried at 100 ° C. for 30 seconds. (Coating amount 0.5g / m2, thickness 0.5μ)
Line speed: 100m
Fluoroolefin-hydroxyl group-containing vinyl ether copolymer resin Daifuru Kogyo Zefle GK550 100 parts by mass Hexamethylene diisocyanate trimer Asahi Kasei Chemicals TPA-100 22 parts by mass (2) Low temperature plasma chemical vapor deposition apparatus on the coated surface of the film Then, a carbon-containing silicon oxide vapor deposition layer having a thickness of 10 nm was laminated.
(Deposition conditions)
Mixing ratio of mixed gas reaction gas composition for vapor deposition
Hexamethyldisiloxane: Oxygen gas: Helium
= 1: 10: 10 (unit: slm)
Degree of vacuum: 6Pa
Cooling / electrode drum supply power: 22Kw
Line speed: 100m / min
(3) It coated like the (1) on the vapor deposition surface of the said film, and obtained the gas barrier laminated body.
(4) Next, an olefin-based hot melt resin (Aron Melt HMP, manufactured by Toa Gosei Co., Ltd.) melted at 230 ° C. is extruded and formed on one surface of the laminate obtained in (3), and heat fusion having a thickness of 20 μm. A layered product of the present invention was manufactured by forming an adhesion layer.

[Example 2]
The same as Example 1 except that the following solution is used as the weather-resistant coating layer.
Fluororesin: 100 parts by mass of Lumiflon LF-200 manufactured by Asahi Glass Curing agent: hexamethylene diisocyanate manufactured by Asahi Kasei Chemicals,
25 parts by mass of TPA-100

[Example 3]
Same as Example 1 except that the deposition is PVD alumina deposition.
That is, using a magnetron sputtering apparatus, argon gas 500 sccm is introduced, plasma treatment is performed at 20 kW, and a plasma treatment surface with an inert gas is formed on one surface of the base film, and then the plasma treatment is performed. A vapor deposition layer made of aluminum oxide having a thickness of 10 nm was formed on the surface by vacuum deposition using an electron beam (EB) heating method while supplying oxygen gas using aluminum as a vapor deposition source. .
(Deposition conditions)
Degree of vacuum in the deposition chamber: 2 × 10 ⁻⁴ mbar
Degree of vacuum in the take-up chamber: 2 × 10 ^-2 mbar
Electron beam power: 25kw
Film transport speed: 600 m / min

[Comparative Example 1]
Same as Example 1 except that there is no weatherproof coat layer between the substrate film and the deposited layer.
That is, it was set as base film / deposition layer / weather-proof coat layer.

[Comparative Example 2]
Same as Example 2 except that there is no weatherproof coat layer on the deposited layer.
That is, it was set as base film / weather-resistant coating layer / deposition layer.

[Evaluation of gas barrier properties]
Evaluation Method The film produced above was cut into A4 size and stored at a temperature of 60 ° C. and a humidity of 90% (RH) for 200 hours.
According to ASTM F1249-90, the water vapor transmission rate per 1 m ^{2 of} the laminate is measured per 24 hours using PERMAT RAN manufactured by MOCON under an environment of 40 ° C. and 90% RH.

Evaluation results In Examples 1 to 3, almost no deterioration in the performance of the barrier was observed even after 200 hours in an environment of a temperature of 60 ° C. and a humidity of 90% (RH).
On the other hand, in Comparative Examples 1 and 2, significant performance deterioration was observed.

[Measurement method of water vapor permeability from surface direction and end face]
(1) Laminate two laminates so that the surfaces of the heat-sealing layer face each other, heat-seal three sides, put 10 g of calcium chloride, heat-seal the other side, An evaluation bag having a size of 100 mm × 100 mm and a seal width of 3 mm is manufactured.
(2) The evaluation bag produced above is allowed to stand in an environment of 60 ° C. and 90% RH, and the weight increase of calcium chloride after 24 hours is measured.
(3) On the other hand, according to ASTM F1249-90, using AQUATRAN manufactured by MOCON in an environment of 60 ° C. and 90% RH, the following is per 24 hours per stack of 0.01 m ² as follows: The amount of water vapor transmission in the surface direction is measured.
(4) From the measured value of (2) above (the water vapor permeation amount of the evaluation bag), the measured value of (3) above (0.
Subtract the double value of the water vapor transmission rate in the surface direction per 01 m ² , divide the value by the area of the end face of the evaluation bag, and use this value as the water vapor permeation from the end face of the laminate. Degree.
Water vapor transmission rate from end face = {(water vapor transmission rate of evaluation bag) −2 × (water vapor transmission rate in surface direction per 0.01 m ² )} / (area of end surface of evaluation bag)

[Evaluation of surface direction and end face gas barrier properties]
Based on the above method, the water vapor transmission rate from the end face was measured for each of the laminates manufactured in Examples 1 to 3 and Comparative Examples 1 and 2.
The results are shown in Table 2.

1. Base film 2a. First weather-resistant coat layer 2b. Second weather-resistant coat layer3. 3. Deposition layer 4. Gas barrier coating film Thermal fusion layer

Claims (4)

In the gas barrier film laminate in which the first weather-resistant coat layer, the vapor deposition layer, and the second weather-resistant coat layer are provided in this order on one surface of the base film made of a plastic material,
The first weather-resistant coat layer and / or the second weather-resistant coat layer is made of a fluorine-based resin formed by a fluorine-containing copolymer having a crosslinkable group and a curing agent that reacts with the crosslinkable group. a Do that gas barrier film laminate,
The fluorine-containing copolymer having a crosslinkable group is a monomer component comprising a fluoroolefin monomer and a crosslinkable group-containing monomer copolymerizable with the fluoroolefin monomer,
The curing agent that reacts with the crosslinkable group is an organic polyisocyanate compound,
A gas barrier film laminate having improved end face gas barrier properties .   The gas barrier film laminate according to claim 1, wherein the vapor deposition layer is a carbon-containing silicon oxide layer formed by a plasma chemical vapor deposition method.   The gas barrier film laminate according to claim 1 or 2, wherein the second weather-resistant coat layer further includes a heat-sealing layer provided on the weather-resistant coat layer.   The gas barrier film laminate according to any one of claims 1 to 3, wherein the heat-fusible layer is made of a polyolefin-based resin.

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