JP5621298B2 - Surface fine irregularities and manufacturing method thereof - Google Patents

Description

  The present invention relates to a surface fine unevenness suitably used for, for example, an optical element, a method for producing the same, and an optical element provided with the surface fine unevenness. Further, the present invention relates to a transfer body to which a concavo-convex pattern of a surface fine concavo-convex body is transferred, a manufacturing method thereof, and an optical element including the transfer body.

An uneven pattern consisting of fine wavy irregularities is formed on the surface, and the average pitch of the irregular pattern is less than the wavelength of visible light. It is known that it can be used as an element (Non-Patent Document 1).
Moreover, it is known that the surface fine unevenness | corrugation body whose average pitch of an uneven | corrugated pattern is 1-10 micrometers can be utilized as a light-diffusion body (patent documents 1, 2).

  As a method for manufacturing such a fine surface irregularity, a photolithography method using visible light using a pattern mask, an ultraviolet laser irradiation method and an electron beam lithography method capable of finer processing are known. In these methods, a resist layer formed on a substrate is exposed to visible light, ultraviolet laser light, or an electron beam and developed to form a resist pattern layer, and the resist pattern layer is used as a mask to form irregularities by dry etching or the like. This is a method of forming a shape. These methods have such problems as being complicated and not suitable for mass production.

On the other hand, for example, in Patent Document 3, a hard film is formed by heating a laminated film in which a resin hard layer is provided on a resin base made of a heat shrinkable film, and shrinking the heat shrinkable film. A method for manufacturing a surface fine uneven body to be uneven is described. According to this method, fine surface irregularities suitable for use as an optical element can be produced easily and in large quantities.
Patent Document 4 describes that a wire grid polarizing plate can be manufactured by forming a surface fine concavo-convex body by the same method and then forming a metal thin wire-like metal layer on the concavo-convex pattern. .

JP-A-10-123307 Japanese Patent Application Laid-Open No. 2006-261064 JP 2008-302591 A JP 2009-122298 A

Hisao Kikuta and Koichi Iwata, “Optics”, published by The Optical Society of Japan, Vol. 27, No. 1, 1998, p. 12-17

  According to the manufacturing methods described in Patent Documents 3 and 4 described above, the surface fine irregularities can be manufactured easily and in large quantities. Moreover, the obtained surface fine unevenness | corrugation body is suitable for use as an optical element. However, recently, there has been a demand for an optical element having better performance.

  The present invention has been made in view of the above circumstances, and a surface fine concavo-convex body that exhibits excellent performance as an optical element and a manufacturing method thereof, and a transfer body onto which a concavo-convex pattern of the surface fine concavo-convex body is transferred and its manufacture It is an object to provide a method.

As a result of intensive studies by the present inventors, when heat-shrinking a laminated film comprising a heat-shrinkable film and a hard layer, the film is laminated so that it does not shrink and does not stretch in a direction perpendicular to the main direction of shrinkage. By shrinking while applying force to the film, for example, when used for an antireflection body, it is possible to produce a surface fine uneven body with low reflectance and sufficient transmittance, for example, used for a wire grid polarizer In that case, it was conceived that a fine surface irregularity having excellent polarization characteristics can be produced, and the present invention has been completed.

The manufacturing method of the surface fine unevenness | corrugation body of this invention is a laminated | multilayer film formation process in which the resin-made hard layer is provided in the at least single side | surface of the resin-made base materials which consist of a heat-shrinkable film, and the said laminated film The base material is contracted by heating to deform the hard layer so as to be folded and form a concavo-convex pattern, and in the contraction step, in a direction orthogonal to the main direction of the contraction Is characterized in that the laminated film is contracted while restraining the orthogonal direction so as not to contract and stretch .
The method for producing a transfer body according to the present invention includes a transfer step of transferring the uneven pattern of the surface fine uneven body manufactured by the manufacturing method.
The surface fine unevenness body or transfer body manufactured by the manufacturing method is suitably used for optical elements such as an antireflection body and a wire grid polarizer, for example.

  ADVANTAGE OF THE INVENTION According to this invention, the surface fine unevenness | corrugation body which exhibits the outstanding performance as an optical element, its manufacturing method, Furthermore, the transfer body by which the uneven | corrugated pattern of the surface fine unevenness | corrugation body was transferred, and its manufacturing method can be provided. .

It is an expansion perspective view which expands and shows a part of surface fine unevenness | corrugation body of an example of this invention. It is explanatory drawing explaining oblique deposition.

  Hereinafter, the present invention will be described in detail with reference to exemplary embodiments.

[Surface fine irregularities and manufacturing method thereof]
(Surface fine irregularities)
FIG. 1 schematically shows a sheet-like surface fine unevenness produced by the production method of the present embodiment. The surface fine uneven body 10 includes a base material 11 in which a resin heat-shrinkable film is contracted (heat-shrinked) by heating, and a resin hard layer 12 provided on one entire surface of the base material 11. The hard layer 12 has a wavy uneven pattern 12a that is periodically repeated along the sheet-like surface.
The surface fine concavo-convex body 10 in FIG. 1 is provided with a heat-shrinkable film as a substrate 11 that mainly heat-shrinks in a uniaxial direction (in this example, Cross Machine Direction: CD direction (width direction)). Therefore, in this example, the CD direction is the main direction of contraction (hereinafter referred to as the main contraction direction), and the streak-shaped convex portions and the concave portions forming the concave / convex pattern 12a are directions perpendicular to the CD direction ( (Machine Direction: MD direction).

A glass transition temperature T _{g1 of} a resin constituting the base material 11 (hereinafter referred to as a first resin) and a glass transition temperature T _{g2 of} a resin constituting the hard layer 12 (hereinafter referred to as a second resin). The difference (T _g2 −T _g1 ) is preferably 10 ° C. or higher, more preferably 20 ° C. or higher, and further preferably 30 ° C. or higher. When the difference of (Tg ₂ −Tg ₁ ) is 10 ° C. or more, the laminated film can be easily heat-shrinked at a temperature between Tg ₂ and Tg ₁ . As described above, when the temperature between Tg ₂ and Tg ₁ is the heat shrinkage temperature (that is, the temperature of the shrinking process described later), the heat shrinkage is performed under the condition that the Young's modulus of the base material 11 is higher than the Young's modulus of the hard layer 12. As a result, the concavo-convex pattern 12 a can be easily formed on the hard layer 12.
Hereinafter, the Young's modulus is a value measured according to JIS K 7113-1995.

In addition, (T _g2 -T _g1 ) is not necessary from the economical viewpoint to use a resin having a T _g2 exceeding 400 ° C, and there is no resin having a T _g1 lower than -150 ° C. It is preferable that it is 550 degrees C or less, and it is more preferable that it is 200 degrees C or less.
The difference in Young's modulus between the base material 11 and the hard layer 12 at the heat shrinkage temperature is preferably 0.01 to 300 GPa and more preferably 0.1 to 10 GPa because the uneven pattern 12a can be easily formed. preferable.

The glass transition temperature Tg ₁ of the first resin is preferably −150 to 300 ° C., more preferably −120 to 200 ° C. Lower than the glass transition temperature T _g1 is -150 ° C. resin does not exist, if the first below the glass transition temperature T _g1 is 300 ° C. of the resin, it is because it is possible to easily set the heat shrinkage temperature.

  The Young's modulus of the first resin at the heat shrinkage temperature is preferably 0.01 to 100 MPa, and more preferably 0.1 to 10 MPa. If the Young's modulus of the first resin is 0.01 MPa or more, it is a hardness that can be used as a substrate, and if it is 100 MPa or less, the softness that can be deformed by following the hard layer 12 at the same time. It is.

  Examples of the first resin include polyesters such as polyethylene terephthalate, polyolefins such as polyethylene and polypropylene, polystyrene resins such as styrene-butadiene block copolymers, and silicone resins such as polyvinyl chloride, polyvinylidene chloride, and polydimethylsiloxane. , Fluororesin, ABS resin, polyamide, acrylic resin, polycarbonate, polycycloolefin, and the like.

Preferably has a glass transition temperature Tg ₂ of the second resin is 40 to 400 ° C., and more preferably 80 to 250 ° C.. If the glass transition temperature _Tg2 of the second resin is 40 ° C. or higher, the heat shrinkage temperature can be increased to room temperature or higher, which is useful, and a resin whose glass transition temperature _Tg2 exceeds 400 ° C. is useful. This is because the use as the second resin is less necessary from the economical aspect.

  The Young's modulus of the second resin at the heat shrinkage temperature is preferably 0.01 to 300 GPa, more preferably 0.1 to 10 GPa. If the Young's modulus of the second resin is 0.01 GPa or more, sufficient hardness is obtained at the heating shrinkage temperature than the Young's modulus of the first resin, and the uneven pattern 12a is maintained after the uneven pattern 12a is formed. It is because it is scarcely necessary to use a resin that has sufficient hardness and a Young's modulus exceeding 300 GPa as the second resin in terms of economy.

  Depending on the type of the first resin, examples of the second resin include polyvinyl alcohol, polystyrene, acrylic resin, styrene-acrylic copolymer, styrene-acrylonitrile copolymer, polyethylene terephthalate, polybutylene terephthalate, and polyethylene. Resins such as naphthalate, polycarbonate, polyethersulfone, and fluororesin can be used. Among these, a fluororesin is preferable in that it has an antifouling function. Moreover, in order to raise the orientation degree mentioned later, you may use 2 or more types of resin together. Moreover, when using the surface fine unevenness | corrugation body 10 for an antireflection body, when the refractive index of the hard layer 12 is made lower than the base material 11, since an antireflection characteristic improves, it is preferable.

  The thickness of the substrate 11 is preferably 0.3 to 500 μm. If the thickness of the base material 11 is 0.3 μm or more, the surface fine uneven body 10 is hardly broken, and if it is 500 μm or less, the surface fine uneven body 10 can be easily thinned. Moreover, in order to support the base material 11, you may provide further 5-5-500-micrometer-thick resin-made support bodies.

The thickness of the hard layer 12 affects the pitch, depth, etc. of the uneven pattern 12a to be formed, and therefore is appropriately determined according to the use of the surface fine uneven body 10 and the like.
For example, when the surface fine uneven body 10 is used for an antireflection body, a range of 1 to 100 nm is preferable, and when used for an anisotropic diffuser, a range of 0.05 to 5 μm is preferable, When used for a wire grid polarizer, a range of 1 to 100 nm is preferred. If it is the thickness of such a hard layer 12, the uneven | corrugated pattern 12a of an appropriate size according to each use can be formed.
Further, a primer layer may be formed between the base material 11 and the hard layer 12 for the purpose of improving adhesion and forming a finer structure.
Further, a resin layer may be provided on the hard layer 12.

The most frequent pitch of the concavo-convex pattern 12a can be appropriately set according to the use of the surface fine concavo-convex body 10 or the like.
Specifically, when the use of the surface fine concavo-convex body 10 is, for example, an anisotropic diffuser, 1 to 20 μm is preferable. Moreover, when it is such a diffuser use, glare is suppressed and it can be set as the diffuser excellent in visibility as the most frequent pitch exceeds 1 micrometer and is 5 micrometers or less. On the other hand, when the use of the surface fine irregularities 10 is an antireflection body or a wire grid polarizer, 0.2 μm or less is suitable. Moreover, from the point which can form the uneven | corrugated pattern 12a easily, Preferably it is 0.05 micrometer or more.

Here, the most frequent pitch is an average value of the pitches A ₁ , A ₂ , A ₃ . When the concavo-convex pattern spreads in two dimensions instead of one direction, the most frequent pitch is obtained by a method of Fourier transforming the concavo-convex pattern image.
That is, with respect to the concavo-convex pattern, a height image is observed (converted into a gray scale image) with an atomic force microscope, a laser microscope, or the like, and the observed gray scale image is subjected to Fourier transform. The Fourier transform image, on X _F -Y _F coordinate plane of the Fourier transform image, the frequency is represented by shading. This includes the pitch and orientation information of the concavo-convex pattern 12a.
Next, the frequency of Z _F axis information of the Fourier transform, performing smoothing as needed. The most frequent pitch A = 1 / {√ (X _Fmax ² + Y _Fmax ² )} is _obtained from the position (X _Fmax , Y _Fmax ) indicating the maximum frequency of the portion excluding the central portion of the Fourier transform image. The most frequent pitch may be regarded as an average value of each pitch.

Each of the pitches A ₁ , A ₂ , A ₃ ... Of the concavo-convex pattern 12a is preferably within a range of ± 60% of the most frequent pitch A, and more preferably within a range of ± 30%. . If each pitch is in the range of ± 60% of the most frequent pitch A, the pitch becomes uniform and more excellent performance as an optical element is exhibited.
Also, each pitch _{A 1, A 2, A 3} ··· are may be continuously changed.

Further, the average depth H of the concave / convex pattern 12a is 10% or more, preferably 100% or more when the most frequent pitch A is 100%. Further, the average depth H is preferably 500% or less when the most frequent pitch A is 100% from the viewpoint that the uneven pattern 12a can be easily formed.
The average depth H means the average of the depth from the peak of the convex part of the concavo-convex pattern to the bottom of the concave part, and is obtained as follows here.
That is, the concave / convex pattern is observed with an atomic force microscope, and from the observation, a cross-sectional view of the surface fine concave / convex body 10 (a cross-sectional view in the thickness direction of the surface fine concave / convex body cut in a direction perpendicular to the streaky convex and concave portions) Get. The depth to the bottom of one concave portion is ½ of the sum of the distances from the peaks of two adjacent convex portions to the bottom of the concave portion. Therefore, for each of 10 or more randomly extracted recesses, the sum of the distances from the peak of the two adjacent protrusions to the bottom of the recess was obtained, and 1/2 of each was obtained. The average value is defined as an average depth H.

Each of the depths H ₁ , H ₂ , H ₃ ... Of the concavo-convex pattern 12a is preferably within a range of ± 60% of the average depth H, and more preferably within a range of ± 30%. preferable. If each depth is in the range of ± 60% of the average depth H, the depth becomes uniform and more excellent performance as an optical element is exhibited.
Each depth H ₁ , H ₂ , H ₃ ... Continuously changes after satisfying that the average depth H is 10% or more when the most frequent pitch A is 100%. It doesn't matter.

When the degree of orientation of the concavo-convex pattern 12a is less than 0.1, the anisotropy of the concavo-convex pattern increases, and a surface fine concavo-convex body suitable for use in an anisotropic diffuser or wire grid polarizer is obtained.
The degree of orientation is determined as follows.
That is, as calculated Fourier transformed image in the same manner as described above, the maximum luminance portion of the maximum intensity part is rotated by θ on the X _F axis X _F -Y _F coordinate plane on X _F axis coincides θ create a Fourier transform images _{rotated, (X Fmax, Y Fmax)} ' pull the _F, auxiliary line Y' _{Y F} parallel auxiliary lines axis Y passing through the _F as the horizontal axis, the brightness on the auxiliary line Y _'F A Y ' _F -Z _F diagram with the (Z _F axis) as the vertical axis is created. The Y value of _'F -Z _F diagram of Y' _F-axis "to create a F -Z _F diagram, Y" divided by _Y to the inverse of the modal pitch (1 / A) -Z _F view from the peak half The value width W (the width of the peak at a height where the frequency is half the maximum value) is obtained. This half width W is the degree of orientation.

(Method for producing surface fine unevenness)
The surface fine concavo-convex body 10 described above was obtained by a laminated film forming step of forming a laminated film by providing a resin hard layer 12 on at least one surface of a resin base 11 made of a heat-shrinkable film. By heating the laminated film and shrinking the base material 11, the hard layer 12 can be deformed so as to be folded, and can be produced by a shrinking step of forming a concavo-convex pattern. At this time, in the shrinking step, the laminated film is shrunk while restraining the orthogonal direction so as not to shrink in the direction orthogonal to the main shrinking direction. According to this method, it is possible to manufacture the surface fine uneven body 10 having the uneven pattern 12a having a large depth.

  As the material of the heat-shrinkable film used as the substrate 11, those exemplified above as the first resin can be used. Among them, for example, a polyethylene terephthalate shrink film, a polystyrene shrink film, a polyolefin shrink film Polyvinyl chloride shrink film and the like are suitable. Further, the substrate 11 has a flat surface before heat shrinkage, and specifically, the center line average roughness according to JIS B 0601 is preferably 0.1 μm or less.

  In the laminated film forming step, a resin solution or dispersion for forming a hard layer is applied to at least one surface of the substrate 11 and the solvent is dried, or a hard layer prepared in advance on at least one surface of the substrate 11. A laminated film can be formed by the method of laminating 12.

Next, the laminated film obtained in the laminated film forming step is heated to shrink the base material 11 to deform the hard layer 12 so as to be folded, thereby performing a shrinking step for forming an uneven pattern. In this shrinking step, The laminated film is contracted while restraining the orthogonal direction so as not to contract in the direction orthogonal to the main contraction direction.
Specifically, both ends of the laminated film in a direction perpendicular to the main shrinkage direction are held and fixed, and tension is applied to the laminated film along the direction perpendicular to the main shrinkage direction of the laminated film. The method of performing a contraction process in such a state is mentioned.

In the contraction step, it is preferable to contract 40% or more in the main contraction direction. Thus, by setting the shrinkage ratio to 40% or more, the surface fine uneven body 10 that exhibits sufficient performance when used in an optical element can be manufactured. Moreover, since the area of the surface fine unevenness | corrugation body 10 obtained when a shrinkage rate becomes large too much becomes small, it is unpreferable on a yield. From such a viewpoint, the upper limit of the shrinkage rate is preferably 80%.
The shrinkage rate in the present invention is (shrinkage rate [%]) = {(length before shrinkage) − (length after shrinkage)} / (length before shrinkage) × 100 (where, Both lengths are the lengths in the main direction of contraction).

As a heating method when the base material 11 is thermally contracted, a method of passing it through hot air, steam or hot water can be used.
It is preferable that the heating temperature (heating shrinkage temperature) when the substrate 11 is thermally shrunk is appropriately selected according to the type of heat-shrinkable film to be used and the pitch and depth of the target concavo-convex pattern 12a. Specifically, it may be a glass transition temperature _Tg2 or higher of the second resin constituting the hard layer 12, but preferably, as described above, the glass transition temperature _Tg2 constituting the hard layer 12 and the substrate 11 are used. It is preferable to carry out at the temperature between the glass transition temperature _Tg1 of the 1st resin which comprises. When heat shrinking is performed at a temperature between Tg ₂ and Tg _{1 in} this manner, the substrate 11 can be processed under the condition that the Young's modulus of the base material 11 is higher than the Young's modulus of the hard layer 12, and as a result, the concave / convex pattern 12a is formed on the hard layer 12. Can be easily formed.

As described above, in the method of manufacturing such a surface fine uneven body 10, the both ends of the laminated film in the direction perpendicular to the main shrinkage direction are gripped and restrained, and the like in the direction perpendicular to the main shrinkage direction. The shrinkage process is performed so as not to shrink. As a result, although the reason is not necessarily clear, the concave / convex pattern 12a having a large depth can be formed as compared with the case where the direction orthogonal to the main contraction direction is not constrained and the contraction is not suppressed.
By using such a surface fine uneven body 10, it is possible to provide an antireflection body having a low reflectance and a high transmittance.
Further, as will be described in detail later, when the surface fine uneven body 10 having such a deep uneven pattern is used, the wire metal polarizer is manufactured along the uneven pattern of the surface metal uneven body 10. The fine metal wire can be formed with high accuracy. As a result, a wire grid polarizer having excellent polarization characteristics can be provided.
In the shrinking process, if the direction orthogonal to the main shrinking direction is not constrained, the main shrinkage can be achieved even when a heat-shrinkable film that mainly heat-shrinks in the uniaxial direction (CD direction in this example) is used as the substrate 11. Even in a direction orthogonal to the direction, it shrinks unintentionally, and as a result, the formed uneven pattern has a small depth.

  In the embodiment described above, the hard layer 12 is provided on the entire surface of one side of the base material 11. However, the hard layer may be provided on a part of one side of the base material depending on the purpose and application. The hard layer may be provided on all of the both surfaces of the substrate, or the hard layer may be provided on a part of both surfaces of the substrate.

[Transfer and production method thereof]
By performing the transfer process of transferring the concavo-convex pattern of the surface fine concavo-convex body 10 described above, a transfer body to which the concavo-convex pattern 12a is transferred can be manufactured.
Examples of the transfer body include a resin sheet-like transfer body to which the uneven pattern 12a of the surface fine uneven body 10 is transferred. The sheet-like transfer body made of resin can be suitably used for applications such as an optical element, similarly to the above-described surface fine uneven body 10.

A resin sheet-like transfer body can be manufactured as follows, for example.
(A) After applying the uncured active energy ray-curable resin to the surface of the surface fine irregularities 10 on which the uneven pattern 12a is formed and irradiating the active energy rays to cure the curable resin And a step of peeling the cured coating film from the surface fine irregularities 10. Here, the active energy ray is usually an ultraviolet ray or an electron beam, but in this specification, it includes a visible ray, an X-ray, an ion beam, and the like.
(B) A step of applying an uncured liquid thermosetting resin to the surface of the surface fine concavo-convex body 10 on which the concavo-convex pattern 12a is formed, and heating and curing the liquid thermosetting resin, followed by curing. And a step of peeling the coating film from the surface fine irregularities 10.
(C) A step of bringing the sheet-shaped thermoplastic resin into contact with the surface of the surface fine uneven body 10 on which the uneven pattern 12a is formed, and heating the sheet-shaped thermoplastic resin while pressing the sheet-like thermoplastic resin against the surface fine uneven body 10. And a step of cooling after softening, and a step of peeling the cooled sheet-like thermoplastic resin from the surface fine irregularities 10.

Further, by using the surface fine uneven body 10, a metal or other secondary process molded product to which the uneven pattern 12 a of the surface fine uneven body 10 is transferred is produced, and the secondary process molded product is formed into a mold (stamper). ) Can be used to produce a resinous sheet-like transfer body. As the molded product for the secondary process, the surface fine irregularities 10 are rounded into a cylindrical shape so that the concave / convex pattern 12a is inside, and this is attached to the inside of the cylinder, and a roll is inserted inside the cylinder. Examples thereof include a plating roll obtained by plating and taking out from a cylinder. Examples of other secondary process moldings include sheet-like secondary process sheets.
Specific methods using the molded product for the secondary process include the following methods (d) to (f).

(D) A step of performing metal plating of nickel or the like on the surface of the surface fine concavo-convex body 10 on which the concavo-convex pattern 12a is formed and laminating a plating layer (a material for transferring the concavo-convex pattern); Peeling from the body, producing a metal secondary process molding, and then on the side that was in contact with the concave / convex pattern of the secondary process molding (surface on which the concave / convex pattern was transferred) A step of applying an uncured active energy ray-curable resin; and a step of irradiating the active energy ray to cure the curable resin and then peeling the cured coating film from the molded product for the secondary step. Method.
(E) A step of laminating a plating layer (a material for transferring a concavo-convex pattern) on the surface of the surface fine concavo-convex body 10 on which the concavo-convex pattern 12a is formed; The step of preparing the molded product for the secondary process and an uncured liquid thermosetting resin on the surface (the surface on which the concavo-convex pattern was transferred) that was in contact with the concavo-convex pattern of the molded product for the secondary process The method which has the process of apply | coating, and the process which peels the hardened coating film from the molding for secondary processes, after hardening this resin by heating.
(F) A step of laminating a plating layer (a material for transferring concavo-convex pattern) on the surface of the surface fine concavo-convex body 10 on which the concavo-convex pattern 12a is formed; The sheet-shaped thermoplastic resin is brought into contact with the step of producing the molded product for the secondary process and the surface of the molded product for the secondary process that is in contact with the concave-convex pattern (the surface on which the concave-convex pattern is transferred). A process, a step of heating and softening the sheet-shaped thermoplastic resin while pressing it against a molded product for a secondary process, and a cooling process; and molding the cooled sheet-shaped thermoplastic resin for a secondary process And a step of peeling from the substrate. Alternatively, a step of bringing a molten thermoplastic resin into contact with the surface (the surface on which the concavo-convex pattern has been transferred) that has been in contact with the concavo-convex pattern of the molded product for the secondary process produced by the same method as described above, and melting The method which has the process of cooling the thermoplastic resin of a state into a sheet form, and the process of peeling the cooled sheet-like thermoplastic resin from the molding for secondary processes.

  A specific example of the method (a) will be described. First, an uncured liquid active energy ray-curable resin is applied to the surface of the web-shaped surface fine uneven body 10 on which the uneven pattern 12a is formed. The application method mentioned when the hard layer consists of resin can be used for the application method. Next, the surface fine uneven body 10 coated with the curable resin is pressed by passing between the rolls, and the curable resin is filled into the uneven pattern 12 a of the surface fine uneven body 10. Then, an active energy ray is irradiated with an active energy ray irradiation apparatus, and curable resin is bridge | crosslinked and hardened. And the transcription | transfer body can be manufactured by peeling the active energy ray curable resin after hardening from the surface fine unevenness | corrugation body 10. FIG.

In the method (a), for the purpose of imparting releasability to the surface of the surface fine concavo-convex body 10 on which the concavo-convex pattern 12a is formed, before applying the uncured active energy ray curable resin, a silicone resin, fluorine A layer made of resin or the like may be provided with a thickness of about 1 to 10 nm.
Uncured active energy ray-curable resins include epoxy acrylate, epoxidized oil acrylate, urethane acrylate, unsaturated polyester, polyester acrylate, polyether acrylate, vinyl / acrylate, polyene / acrylate, silicon acrylate, polybutadiene, and polystyrylmethyl. 1 selected from monomers such as prepolymers such as methacrylate, aliphatic acrylate, alicyclic acrylate, aromatic acrylate, hydroxyl group-containing acrylate, allyl group-containing acrylate, glycidyl group-containing acrylate, carboxy group-containing acrylate, halogen-containing acrylate The thing containing the component more than a kind is mentioned. The uncured active energy ray-curable resin is preferably diluted with a solvent or the like.
Moreover, you may add a fluororesin, a silicone resin, etc. to uncured active energy ray hardening resin.
When the uncured active energy ray-curable resin is cured with ultraviolet rays, it is preferable to add a photopolymerization initiator such as acetophenones and benzophenones to the uncured active energy ray-curable resin.
In addition, in the uncured active energy ray-curable resin, at least one of a polyfunctional (meth) acrylate monomer and an oligomer may be used for the purpose of increasing the hardness after curing. Moreover, you may contain a reactive inorganic oxide particle and / or a reactive organic particle.

    After applying an uncured liquid active energy ray-curable resin, an active energy ray may be irradiated after bonding a bonding substrate made of resin, glass or the like. Irradiation of the active energy ray may be performed from any one of the pasting base material and the surface fine concavo-convex body 10 having active energy ray permeability.

    The thickness of the cured active energy ray-curable resin sheet is preferably about 0.1 to 100 μm. If the thickness of the cured active energy ray-curable resin sheet is 0.1 μm or more, sufficient strength can be secured, and if it is 100 μm or more, sufficient flexibility can be secured.

In the above method, since the web-like thing is used as the surface fine uneven body 10, the uneven pattern 12a can be continuously formed in a large area. Therefore, even if the number of repeated use of the surface fine irregularities 10 is small, a necessary amount of sheet-like transfer body can be produced in a short time.
The surface fine uneven body 10 may be a single sheet. In the case of using a single sheet, a stamp method using a single sheet as a flat plate mold, a roll imprint method using a single sheet wound around a roll as a cylindrical mold, and the like can be applied. Moreover, the surface fine irregularities 10 of the single wafer may be arranged inside the mold of the injection molding machine.

In the methods (b) and (e), examples of the liquid thermosetting resin include uncured melamine resin, urethane resin, and epoxy resin.
Further, the curing temperature in the method (b) is preferably lower than the glass transition temperature of the surface fine irregularities 10. This is because if the curing temperature is equal to or higher than the glass transition temperature of the surface fine irregularities 10, the irregular pattern 12a of the transfer body may be deformed during curing.

In the methods (c) and (f), examples of the thermoplastic resin include acrylic resin, polyolefin, polyester, and the like.
The pressure when pressing the sheet-like thermoplastic resin against the molded product for the secondary process is preferably 1 to 100 MPa. If the pressure at the time of pressing is 1 MPa or more, the concavo-convex pattern can be transferred with high accuracy, and if it is 100 MPa or less, excessive pressurization can be prevented.
Moreover, it is preferable that the heating temperature of the thermoplastic resin in the method (c) is lower than the glass transition temperature of the surface fine irregularities 10. This is because if the heating temperature is equal to or higher than the glass transition temperature of the surface fine uneven body 10, the uneven pattern 12a of the surface fine uneven body 10 may be deformed during heating.
The cooling temperature after heating is preferably less than the glass transition temperature of the thermoplastic resin because the uneven pattern 12a can be transferred with high accuracy.

    Among the methods (a) to (c), the method (a) using an active energy ray-curable resin is preferable in that heating can be omitted and deformation of the uneven pattern of the surface fine unevenness can be prevented.

    In the methods (d) to (f), it is preferable that the thickness of the metallic secondary process molded product is about 50 to 500 μm. If the thickness of the metal secondary process molded product is 50 μm or more, the secondary process molded product has sufficient strength, and if it is 500 μm or less, sufficient flexibility can be secured. In the methods (d) to (f), since a transfer body is manufactured using a metal secondary process molding that is less deformed by heat as a mold, active energy rays are used as the material of the transfer body. Any of a curable resin, a thermosetting resin, and a thermoplastic resin can be suitably used.

  In addition, in (d)-(f), although the metal thing was used as the molded object for secondary processes, the uneven | corrugated pattern 12a of the surface fine unevenness | corrugation body 10 is transcribe | transferred to resin, and it is for resin-made secondary process A molded product may be obtained. Examples of the resin that can be used in this case include polycarbonate, polyacetal, polysulfone, and an active energy ray-curable resin used in the method (a). When the active energy ray-curable resin is used, the active energy ray-curable resin is sequentially applied, cured, and peeled in the same manner as in the method (a) to obtain a molded product for the secondary process.

    In the resin sheet-like transfer body thus obtained, a concavo-convex pattern may be formed on the surface opposite to the surface on which the concavo-convex pattern is transferred.

[Optical element]
The resin sheet-like transfer body described above is suitably used for optical elements such as an anisotropic diffuser, a wire grid polarizer, a phase difference plate, and an antireflection body, for example.

When used for an antireflection body, another layer may be provided on one side or both sides of the transfer body. For example, the surface on which the concavo-convex pattern is formed may be provided with an antifouling layer having a thickness of about 1 to 5 nm containing a fluororesin or a silicone resin as a main component in order to prevent contamination of the surface. Good.
The surface on which the concave / convex pattern is not formed may be provided with, for example, a resin sheet such as triacetyl cellulose as the base material of the antireflection body.

Such an antireflection body exhibits an intermediate refractive index between the refractive index of air and the refractive index of the transfer body at the wavy uneven pattern portion, and the intermediate refractive index changes continuously. For example, the most frequent pitch A of the concavo-convex pattern is 0.2 μm or less, and the average depth H of the concavo-convex pattern is 10% or more when the most frequent pitch A is 100%. In particular, the reflectance can be reduced to almost 0%. This is because the portion where the intermediate refractive index continuously changes becomes longer in the thickness direction, and the effect of suppressing light reflection is remarkably exhibited.
In the production method of the present invention, in the shrinking step, the shrinkage is performed while applying force to the laminated film so as not to shrink in the direction orthogonal to the main shrinkage direction, so the antireflection performance as an antireflection body is high. The surface fine uneven body 10 provided with the uneven pattern 12a having a large depth can be manufactured. Therefore, the transfer body is also provided with an uneven pattern having a high depth and a large depth. 0.1-0.5 micrometer is suitable for the specific average depth of the uneven | corrugated pattern in the case of a reflection preventing body use.

Such an antireflection body is attached to, for example, an image display device such as a liquid crystal display panel or a plasma display, a light emitting portion tip of a light emitting diode, a surface of a solar cell panel, or the like.
When it is attached to the image display device, it is possible to prevent reflection of illumination, so that the visibility of the image is improved. When it is attached to the tip of the light emitting part of the light emitting diode, the light extraction efficiency is improved. When it is attached to the surface of the solar cell panel, the amount of light taken in increases, so that the power generation efficiency of the solar cell is improved.
As the antireflection body, not the transfer body but the surface fine irregularities 10 can be used.

When a resin sheet-like transfer body is used for a wire grid polarizer, it is necessary to provide a plurality of fine metal wires in a direction along the streaky concave portions and convex portions of the concavo-convex pattern.
The wire grid polarizer is a reflective polarizer that transmits one polarization component of light and reflects the other. The wire grid polarizer has a characteristic of transmitting light that vibrates perpendicularly to a large number of fine metal wires arranged in parallel and reflecting light that vibrates in parallel to the fine metal wires. The wire grid polarizer exhibits polarization characteristics when the period of the fine metal wires is sufficiently shorter than the wavelength of light used.

The metal thin wire is preferably composed of a metal-based vapor deposition layer or a nano metal coating layer.
As a metal seed | species of a metal type vapor deposition layer, a well-known thing can be used if it is a metal which can be vapor-deposited, and metal compounds, such as metalloids, such as germanium, tin, and silicon, and ITO (indium-tin oxide) are also included. Specifically, at least one selected from the group consisting of gold, aluminum, silver, carbon, copper, germanium, indium, magnesium, niobium, palladium, lead, platinum, silicon, tin, titanium, vanadium, zinc, bismuth, and ITO. Preferably it is a seed. More preferred are aluminum, nickel, zinc, tin, chromium, cobalt, gold, silver, copper and ITO, and particularly preferred is aluminum and / or nickel for reasons such as price and stability of metallic luster.
The surface of the metal-based vapor deposition layer may be oxidized by exposure to air.

  As a method for forming a plurality of fine metal wires comprising a metal-based vapor deposition layer, oblique vapor deposition is preferred. By oblique vapor deposition, a metal-based vapor deposition layer can be provided only in the vicinity of the convex portion of the concavo-convex pattern of the transfer body, and a portion having no or almost no vapor deposition layer in the vicinity of the concave portion can be created. In this case, if the oblique vapor deposition angle is large, the vapor deposition layer can be provided only in the vicinity of the convex portion, and the polarization characteristics of the obtained wire grid polarizer can be improved. Moreover, in the manufacturing method of this invention, since an uneven | corrugated pattern with a larger depth can be formed, a vapor deposition layer can be provided only in the convex part vicinity.

Specifically, the oblique deposition angle is preferably 30 ° or more, more preferably 40 ° or more, further preferably 55 ° or more, and particularly preferably 70 ° or more. On the other hand, the upper limit of the oblique vapor deposition angle is 90 °, but it is preferably less than 80 ° because the efficiency of vapor deposition deteriorates.
Here, as shown in FIG. 2, the oblique vapor deposition angle is a straight line (hereinafter referred to as J-line) connecting the metal vapor deposition source P and the vapor deposition location Q and the sheet method passing through the vapor deposition location Q. This is the angle α (angle between J line and H line) formed by a straight line (line perpendicular to the sheet surface; hereinafter referred to as H line), and the J line and H line coincide. In this case, the oblique deposition angle is 0 °. Here, the sheet normal direction is a normal direction with respect to the sheet surface as the entire surface fine uneven body 10 or the entire transfer body, and is a normal line corresponding to each concave portion or each convex portion. Absent.

  Further, an angle formed by a line in the sheet surface (hereinafter referred to as I line) of a locus in which a perpendicular line is dropped from the J line to the surface fine uneven body 10 or the surface of the transfer body and a direction along the concave and convex portions. If it is preferably 60 ° to 120 °, more preferably 80 ° to 100 °, the metal-based vapor deposition layer can be efficiently provided only in the vicinity of the convex portion of the concave / convex pattern 12a. If it is not within this range, the polarization characteristics of the obtained wire grid polarizer may not be sufficient.

  Deposition may be performed once or more, and may be performed a plurality of times as necessary. Further, at least one kind of material to be deposited, that is, a plurality of kinds can be used. In the case of vapor deposition a plurality of times, a colored substance other than metal may be vapor-deposited as necessary. Preferred examples of the colored substance include carbon, phthalocyanines, and anilines, with carbon being particularly preferred.

The vapor deposition may be batch-type vapor deposition in which the transfer body is a single sheet, or roll-to-roll vapor deposition that is a continuous film such as a web. In the case of such continuous vapor deposition, for example, it is preferable that the vapor deposition source is arranged in a straight line along the width direction of the resin sheet-like transfer body in that vapor deposition can be performed uniformly in the width direction.
Alternatively, the obliquely deposited sheet-like transfer body can be evaporated again by rotating 180 ° about the center of the transfer body. For example, in the case of roll-to-roll vapor deposition, when the sheet conveyance direction and the direction along the concave and convex portions coincide with each other, or when the angle formed by these directions is 45 ° or less, the oblique vapor deposited sheet is 180 °. From the viewpoint of in-plane uniformity of the polarization characteristics of the polarizing plate to be obtained, it is preferable to rotate and rotate again. Here, “rotate 180 ° and re-deposit” means the same as depositing at an oblique deposition angle α and then depositing at an oblique deposition angle −α.

  Examples of the vapor deposition method include known vapor deposition methods such as a physical vapor deposition method and a chemical vapor deposition method. Preferred examples of the physical vapor deposition method include resistance heating vapor deposition, electron beam vapor deposition, high frequency induction vapor deposition, molecular beam epitaxy vapor deposition, ion plating vapor deposition, ion beam deposition vapor deposition, and sputter vapor deposition. Further, preferable examples of the chemical vapor deposition method include thermal CVD, plasma CVD, photo CVD, epitaxial CVD, atomic layer CVD, metal organic chemical vapor deposition, catalytic chemical vapor deposition, and the like. Particularly preferred vapor deposition methods are resistance heating vapor deposition, electron beam vapor deposition, and sputter vapor deposition.

  The thickness of the metal-based vapor deposition layer is preferably 1 to 100 nm, more preferably 1 to 30 nm, and particularly preferably 5 to 20 nm when the oblique vapor deposition angle is set to 0 to 30 °. When it is provided at an oblique vapor deposition angle of 30 to 90 °, it is more preferably 5 to 100 nm, and particularly preferably 10 to 60 nm. If the thickness of the metal-based vapor deposition layer is too thin, sufficient metallic luster may not be obtained. If it is too thick, the light transmittance of the obtained wire grid polarizer may not be sufficiently obtained.

        In the case where a plurality of fine metal wires are formed from the nano metal coating layer, the nano metal coating layer may be formed only in the recesses of the concavo-convex pattern.

As a metal seed | species of a nano metal coating layer, what is known can be used if it is a nano metal. Nanosilver, nanogold, nanocopper, and nanoplatinum are preferable, and nanosilver is particularly preferable. The nanometal is preferably a metal dispersion having an average particle diameter of 0.1 to 200 nm, more preferably 1 to 100 nm, and particularly preferably 5 to 70 nm. If the particle diameter is too large, the obtained wire grid polarizer may have insufficient polarization characteristics. The surface of the nanometal coating layer may be oxidized by exposure to air.
The nano metal coating layer can be formed by a known coating method. For example, air knife coating, roll coating, blade coating, Mayer bar coating, gravure coating, spray coating, cast coating, curtain coating, die slot coating, gate roll coating, size press coating, spin coating, dip coating, etc. it can.

  The nanometal coating layer is preferably fired (heat treated) to obtain a strong metallic luster after coating and drying the nanometal dispersion. However, the firing step may cause thermal damage to the fine surface irregularities 10 or the transfer body. In that respect, since a metal-based vapor deposition layer does not require a firing step after vapor deposition, it is preferable to form a fine metal wire from the metal vapor deposition layer.

In forming the fine metal wires in this way, a primer layer may be provided in advance on the hard layer in accordance with the necessity for improving the adhesion. In addition, after the formation of the fine metal wire, a known anti-oxidation layer such as SiO ₂ or a known hard coat layer for improving scratch resistance is provided as necessary for the purpose of preventing oxidation of the fine metal wire. Can do.
In addition, for wire grid polarizers, a known adhesive layer, antireflection layer, diffusion layer, viewing angle correction layer (when this polarizing plate is used for a liquid crystal display, for example, a field of view in which a discotic liquid crystal is obliquely oriented is used. An angle correction layer, a viewing angle correction layer using cholesteric liquid crystal, a viewing angle correction layer in which rod-shaped liquid crystal is aligned, and the like can be provided. In addition, a phase difference plate and other films for improving the functions can be used in combination or in combination.

The wire grid polarizer described above is preferably used for visible light (400 to 700 nm), and exhibits polarization characteristics within this range. In the ultraviolet region where the wavelength is short, the resin of the base material may be deteriorated, which is likely to cause a problem in terms of durability, and in the infrared region where the wavelength is long, there is absorption of the resin of the base material. It can be difficult to obtain.
Moreover, this wire grid polarizer can be preferably used for various known flat panel displays. More preferred are a liquid crystal display (LCD), an organic EL display, and an inorganic EL display. Luminance can be improved by using the above-mentioned wire grid polarizer for these displays instead of the conventional iodine absorption polarizing plate or dye absorption polarizing plate. This is because the above-described wire grid polarizer selectively reflects S wave (or P wave), so that the reflected S wave (or P wave) is phase-converted again and transmitted through P wave (or This is because it can be effectively used as an S wave. This wire grid polarizer can be used in combination with a conventional iodine absorption polarizing plate or dye absorption polarizing plate, and bonded together as necessary.

  When a wire grid polarizer is used for a liquid crystal display, it can be used on both sides of the liquid crystal cell or on one side. When it is used on one side, it is preferably used on the backlight side or the back side, not on the viewer side. This is because the reflection can be reduced by using the backlight side or the back side.

Further, a resin sheet-like transfer body provided with a plurality of fine metal wires can be used not as a wire grid polarizer but as a brightness enhancement film. For example, a liquid crystal display can be incorporated in a backlight unit. The light source in this case may be any known light source (for example, a hot cathode tube, a cold cathode tube, or an LED). Moreover, it can use together with the well-known functional film used for a backlight unit. Examples of such a functional film include a reflection plate, a light guide plate, a diffusion plate, a diffusion sheet, and a prism sheet.
For the wire grid polarizer, not the transfer body but the surface fine irregularities 10 can also be used.

[Others]
The form of the surface fine unevenness | corrugation body demonstrated above is not limited to embodiment mentioned above. For example, the formation direction of the periodic concavo-convex pattern repeated in a wave shape may be the CD direction or the MD direction of the surface fine concavo-convex body. Further, the shape of the convex portion is preferably pointed at the tip in terms of refractive index, but the tip may be rounded. The shape of the surface fine irregularities may be other shapes such as a plate shape in addition to a sheet shape.
In addition, a primer layer may be provided between the base material and the hard layer according to the necessity for improving adhesion or the like.

Hereinafter, the present invention will be specifically described with reference to examples.
<Production example>
(Laminated film forming process)
As a base material, a polyethylene terephthalate shrink film (Mitsubishi Resin Hissippet LX-61S, glass transition temperature 70 ° C.) having a thickness of 50 μm, which has a flat surface and mainly heat-shrinks in a uniaxial direction (CD direction) was used. On one side, polymethyl methacrylate (P4831-MMA manufactured by Polymer Source, weight average molecular weight 110,000, dispersity (ratio of weight average molecular weight Mw to number average molecular weight Mn: Mw / Mn) 1.15, glass transition temperature (95 ° C.) diluted in toluene was applied by gravure coating to form a hard layer to obtain a laminated film having a flat surface. At this time, the hard layer was formed by coating so that the coating thickness after drying was 0.05 μm.
The weight average molecular weight and the degree of polymerization dispersion were measured using gel permeation chromatography. A polystyrene having a known molecular weight was used as a molecular weight standard. For the measurement, TSKgel HZ series manufactured by Tosoh Corporation was used as the column, THF was used as the eluent, and the flow rate was 0.35 ml / min and the temperature was 40 ° C.
The glass transition temperature was measured using a differential scanning calorimeter (DSC).

(Shrinking process)
Next, with respect to the laminated film cut into 1 m square, both ends in the MD direction are held and restrained so that the direction orthogonal to the main shrinkage direction (MD direction) does not shrink or stretch, The shrinking process was performed for 1 minute in a dryer at 90 ° C. while maintaining tension on the film.
The laminated film (surface fine irregularities) after shrinkage was 55 cm (main shrinkage direction) × 100 cm (direction perpendicular to the main shrinkage direction).
The shrinkage rate in the main shrinkage direction was 45%.
The surface on the hard layer side of the surface fine irregularities was measured with an atomic force microscope (Nanoscope III manufactured by Nihon Beco).
From this atomic force microscope image, the most frequent pitch A was obtained by the method already described.
That is, a two-dimensional Fourier transform was performed after converting a microscope image into a gray scale image. The frequency (Z _F ) of the Fourier transform image is smoothed, and the mode pitch A = 1 / {√ (X _Fmax ) from the position (X _Fmax , Y _Fmax ) indicating the maximum frequency of the portion excluding the center of the Fourier transform image. ² + Y _Fmax ² )}. As a result, the most frequent pitch _{A 1} was 160nm.
Subsequently, using this Fourier transform image, the degree of orientation was determined by the method already described.
That creates a Fourier transform image rotated θ so that the maximum luminance portion of the X _F -Y _F coordinate plane maximum brightness portion is rotated by θ on the X _F axis on X _F-axis of the Fourier transform image matches , The auxiliary line Y ′ _F parallel to the Y _F axis passing through (X _Fmax , Y _Fmax ) is drawn, the auxiliary line Y ′ _F is taken as the horizontal axis, and the luminance (Z _F axis) on the auxiliary line Y ′ _F is taken as the vertical axis Y ' _F -Z _F diagram was created. The Y value of _'F -Z _F diagram of Y' _F-axis "to create a F -Z _F diagram, Y" divided by _Y to the inverse of the modal pitch (1 / A) -Z _F view from the peak half The value width W ₁ (the width of the peak at a height at which the frequency is half the maximum value) was determined. The full width at half maximum, that is, the degree of orientation W ₁ was 0.15. Further, in the cross-sectional image obtained by the atomic force microscope measurement, the depth from the peak of the convex portion of the concave-convex pattern to the bottom of the concave portion was measured at ten locations, and the average depth H ₁ was determined to be 125 nm. It was. The results are shown in Table 1.

(Manufacture of transfer material)
Next, a stamper was manufactured by nickel electroforming of the concavo-convex pattern of the obtained surface fine concavo-convex body, and a PET substrate (Cosmo Shine A4300: thickness 100 μm [Toyobo] was produced by a roll-to-roll UV nanoimprint machine (manufactured by Toshiba Machine Co., Ltd.) A transfer sheet (transfer body having a concavo-convex pattern) was manufactured using UV resin (PAK-02 [manufactured by Toyo Gosei Co., Ltd.]).
The resulting uneven pattern of transfer sheet, the average depth H ₂ in the same manner as described _above, the modal pitch A _2, was determined orientation W _2. The results are shown in Table 1.
As the performance of the obtained transfer sheet as an optical element, the reflectance and transmittance were evaluated using a JASCO evaluation device (V-7200). As shown in Table 1, the reflectance at a wavelength of 550 nm was The transmittance was 0.8% and the transmittance was 94%.
Next, as a comparison, in the shrinking process, heat shrinkage was performed without restraining in the direction orthogonal to the main shrinkage direction, and a shrink film was obtained. The film after shrinkage was 55 cm (main shrinkage direction) × 93 cm (direction perpendicular to the main shrinkage direction). A transfer sheet was similarly obtained from the shrink film. For even these, the average depth _H 1, _{H 2,} the pitch _A 1, _{A 2} modal was determined orientation _W 1, _{W 2.} Further, when the reflectance and transmittance at a wavelength of 550 nm of this transfer sheet were measured in the same manner, the reflectance was 2.2% and the transmittance was 91%. The results are shown in Table 2.

  From the above results, it was possible to manufacture a surface fine uneven body having an uneven pattern with a large average depth by restraining in the direction orthogonal to the main shrink direction and performing heat shrinkage in the shrinking step. In addition, the degree of orientation was reduced, and suppression of variation was also confirmed. According to such a manufacturing method, it was shown that the surface fine unevenness | corrugation body and transfer sheet which have a small reflectance and a large transmittance and are suitable for use as an antireflection body can be produced.

DESCRIPTION OF SYMBOLS 10 Surface fine uneven body 11 Base material 12 Hard layer 12a Uneven pattern

Claims (8)

A laminated film forming step of forming a laminated film by providing a resin hard layer on at least one surface of a resin base material comprising a heat-shrinkable film;
By shrinking the substrate by heating the laminated film to deform the hard layer so as to fold, and forming a concavo-convex pattern,
In the shrinking step, the laminated film is shrunk while constraining the orthogonal direction so that the laminated film does not shrink in a direction perpendicular to the main direction of the shrinkage and does not stretch. Manufacturing method.   A fine surface irregularity body produced by the production method according to claim 1.   A method for producing a transfer body, comprising a transfer step of transferring the uneven pattern of the surface fine uneven body according to claim 2. The transfer step includes
Applying an uncured active energy ray-curable resin containing at least one of a polyfunctional (meth) acrylate monomer and an oligomer to the surface on which the uneven pattern of the surface fine unevenness is formed;
The transfer body according to claim 3, further comprising a step of irradiating an active energy ray to cure the active energy ray curable resin, and then peeling the cured coating film from the surface fine irregularities. Manufacturing method.   The transfer body manufactured with the manufacturing method of Claim 3 or 4.   An optical element comprising the fine surface irregularities according to claim 2 or the transfer body according to claim 5.   The optical element according to claim 6, wherein the optical element is an antireflection body.   The optical element according to claim 6, wherein the optical element is a wire grid polarizer.

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