JP5685419B2 - 静止型分散システム - Google Patents
静止型分散システム Download PDFInfo
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- JP5685419B2 JP5685419B2 JP2010252646A JP2010252646A JP5685419B2 JP 5685419 B2 JP5685419 B2 JP 5685419B2 JP 2010252646 A JP2010252646 A JP 2010252646A JP 2010252646 A JP2010252646 A JP 2010252646A JP 5685419 B2 JP5685419 B2 JP 5685419B2
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- 239000006185 dispersion Substances 0.000 claims description 62
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- 238000011144 upstream manufacturing Methods 0.000 description 6
- 238000006243 chemical reaction Methods 0.000 description 5
- 238000002347 injection Methods 0.000 description 3
- 239000007924 injection Substances 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
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- 125000006850 spacer group Chemical group 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 230000015271 coagulation Effects 0.000 description 1
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Images
Description
2 旋回羽根
3 分散エレメント
3A,3B エレメント
3a 通孔
G ギャップ
S 間隙
Claims (3)
- 流路内に固定されて該流路内に旋回流を発生させるための旋回羽根と、
前記旋回羽根の下流側流路内に設けられ、複数の通孔を有するディスク状のエレメントの複数枚が積層された分散エレメントであって、分散されるべき流体が前記エレメントの各々を通過する毎に分割されるように前記通孔が配設された前記分散エレメントと、を備え、
前記旋回羽根の縁部と前記流路の内壁面との間に、所定の間隙が設けられ、
前記旋回羽根に対向する前記エレメントは、対向する該旋回羽根の外縁に相当する領域より狭い領域内に、前記通孔が形成されていることを特徴とする静止型分散システム。 - 前記旋回羽根と前記分散エレメントとの間に、所定のギャップが設けられていることを特徴とする請求項1に記載の静止型分散システム。
- 所定寸法及び所定配列の複数の孔が前記旋回羽根に穿設されていることを特徴とする請求項1又は2に記載の静止型分散システム。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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JP2010252646A JP5685419B2 (ja) | 2010-11-11 | 2010-11-11 | 静止型分散システム |
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JP2010252646A JP5685419B2 (ja) | 2010-11-11 | 2010-11-11 | 静止型分散システム |
Publications (2)
Publication Number | Publication Date |
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JP2012101190A JP2012101190A (ja) | 2012-05-31 |
JP5685419B2 true JP5685419B2 (ja) | 2015-03-18 |
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ID=46392257
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JP2010252646A Active JP5685419B2 (ja) | 2010-11-11 | 2010-11-11 | 静止型分散システム |
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JP (1) | JP5685419B2 (ja) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6698921B1 (ja) * | 2019-06-30 | 2020-05-27 | 株式会社西村ケミテック | 研磨液供給装置 |
JP6667032B1 (ja) * | 2019-06-30 | 2020-03-18 | 株式会社西村ケミテック | 研磨液供給装置 |
CN111001324B (zh) * | 2019-11-15 | 2023-11-24 | 中核新科(天津)精密机械制造有限公司 | 用于高粘度液相物料的静态混料器 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3861652A (en) * | 1972-11-15 | 1975-01-21 | Du Pont | Mixing device |
JPS50148970A (ja) * | 1974-05-20 | 1975-11-28 | ||
JPH02277533A (ja) * | 1989-04-17 | 1990-11-14 | Fuirutoreeshiyon Kk | 混合装置 |
JP3677424B2 (ja) * | 2000-01-26 | 2005-08-03 | 株式会社ノリタケカンパニーリミテド | スタティックミキサーエレメント |
JP2007330894A (ja) * | 2006-06-15 | 2007-12-27 | Nagoya Oshima Kikai:Kk | 活性汚泥処理装置 |
JP5130428B2 (ja) * | 2007-12-05 | 2013-01-30 | 独立行政法人水産総合研究センター | 水の浄化方法とその方法に用いる泡沫分離装置 |
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JP2012101190A (ja) | 2012-05-31 |
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