JP5527210B2 - 液晶組成物および液晶表示素子 - Google Patents
液晶組成物および液晶表示素子 Download PDFInfo
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- JP5527210B2 JP5527210B2 JP2010526657A JP2010526657A JP5527210B2 JP 5527210 B2 JP5527210 B2 JP 5527210B2 JP 2010526657 A JP2010526657 A JP 2010526657A JP 2010526657 A JP2010526657 A JP 2010526657A JP 5527210 B2 JP5527210 B2 JP 5527210B2
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- 239000000203 mixture Substances 0.000 title claims description 186
- 239000004973 liquid crystal related substance Substances 0.000 title claims description 121
- 150000001875 compounds Chemical class 0.000 claims description 295
- 229910052731 fluorine Inorganic materials 0.000 claims description 202
- 125000003342 alkenyl group Chemical group 0.000 claims description 38
- 239000011737 fluorine Substances 0.000 claims description 30
- -1 1,4-phenylene, 2-fluoro-1,4-phenylene, 3-fluoro-1, 4-phenylene Chemical group 0.000 claims description 26
- 125000000217 alkyl group Chemical group 0.000 claims description 26
- 239000001257 hydrogen Substances 0.000 claims description 25
- 229910052739 hydrogen Inorganic materials 0.000 claims description 25
- 230000003287 optical effect Effects 0.000 claims description 23
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 21
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims description 20
- 125000003545 alkoxy group Chemical group 0.000 claims description 18
- 125000000876 trifluoromethoxy group Chemical group FC(F)(F)O* 0.000 claims description 14
- 125000004955 1,4-cyclohexylene group Chemical group [H]C1([H])C([H])([H])C([H])([*:1])C([H])([H])C([H])([H])C1([H])[*:2] 0.000 claims description 10
- 125000001153 fluoro group Chemical group F* 0.000 claims description 10
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims description 7
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 claims description 7
- 239000005977 Ethylene Substances 0.000 claims description 7
- 125000005708 carbonyloxy group Chemical group [*:2]OC([*:1])=O 0.000 claims description 7
- 229910052801 chlorine Inorganic materials 0.000 claims description 7
- 239000000460 chlorine Substances 0.000 claims description 7
- 239000011159 matrix material Substances 0.000 claims description 5
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 4
- 229910052799 carbon Inorganic materials 0.000 claims description 4
- 125000005701 difluoromethyleneoxy group Chemical group FC(F)([*:1])O[*:2] 0.000 claims description 4
- 150000002431 hydrogen Chemical group 0.000 claims description 4
- 125000005714 2,5- (1,3-dioxanylene) group Chemical group [H]C1([H])OC([H])([*:1])OC([H])([H])C1([H])[*:2] 0.000 claims description 3
- 125000005453 2,5-difluoro-1,4-phenylene group Chemical group [H]C1=C([*:1])C(F)=C([H])C([*:2])=C1F 0.000 claims description 2
- 239000012071 phase Substances 0.000 description 39
- 238000000034 method Methods 0.000 description 20
- 230000003247 decreasing effect Effects 0.000 description 17
- 230000001965 increasing effect Effects 0.000 description 14
- 238000005259 measurement Methods 0.000 description 12
- QUJIDNSQCMTYNG-UHFFFAOYSA-N 5-[4-(4-butylphenyl)-2-fluorophenyl]-2-[difluoro-(3,4,5-trifluorophenoxy)methyl]-1,3-difluorobenzene Chemical compound C1=CC(CCCC)=CC=C1C1=CC=C(C=2C=C(F)C(=C(F)C=2)C(F)(F)OC=2C=C(F)C(F)=C(F)C=2)C(F)=C1 QUJIDNSQCMTYNG-UHFFFAOYSA-N 0.000 description 11
- 239000000654 additive Substances 0.000 description 9
- 230000000694 effects Effects 0.000 description 8
- 239000010408 film Substances 0.000 description 8
- 238000002834 transmittance Methods 0.000 description 8
- 239000011521 glass Substances 0.000 description 7
- 0 *C(CC1)CCC1c(cc1)ccc1C#N Chemical compound *C(CC1)CCC1c(cc1)ccc1C#N 0.000 description 6
- 239000003963 antioxidant agent Substances 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 6
- 230000007423 decrease Effects 0.000 description 6
- 239000003999 initiator Substances 0.000 description 6
- 239000000758 substrate Substances 0.000 description 6
- MEKOFIRRDATTAG-UHFFFAOYSA-N 2,2,5,8-tetramethyl-3,4-dihydrochromen-6-ol Chemical group C1CC(C)(C)OC2=C1C(C)=C(O)C=C2C MEKOFIRRDATTAG-UHFFFAOYSA-N 0.000 description 5
- 239000002518 antifoaming agent Substances 0.000 description 5
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 5
- 239000012535 impurity Substances 0.000 description 5
- 238000003786 synthesis reaction Methods 0.000 description 5
- 239000000975 dye Substances 0.000 description 4
- 239000007789 gas Substances 0.000 description 4
- 229920000642 polymer Polymers 0.000 description 4
- 125000001140 1,4-phenylene group Chemical group [H]C1=C([H])C([*:2])=C([H])C([H])=C1[*:1] 0.000 description 3
- 125000006017 1-propenyl group Chemical group 0.000 description 3
- 239000004642 Polyimide Substances 0.000 description 3
- 239000004990 Smectic liquid crystal Substances 0.000 description 3
- 230000003078 antioxidant effect Effects 0.000 description 3
- 239000013078 crystal Substances 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 229920001721 polyimide Polymers 0.000 description 3
- 239000003505 polymerization initiator Substances 0.000 description 3
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- 230000002459 sustained effect Effects 0.000 description 3
- 229920002554 vinyl polymer Polymers 0.000 description 3
- 125000004973 1-butenyl group Chemical group C(=CCC)* 0.000 description 2
- 125000006039 1-hexenyl group Chemical group 0.000 description 2
- 125000006023 1-pentenyl group Chemical group 0.000 description 2
- 125000004974 2-butenyl group Chemical group C(C=CC)* 0.000 description 2
- 125000006040 2-hexenyl group Chemical group 0.000 description 2
- 125000006024 2-pentenyl group Chemical group 0.000 description 2
- 125000004975 3-butenyl group Chemical group C(CC=C)* 0.000 description 2
- 125000006041 3-hexenyl group Chemical group 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- 239000006096 absorbing agent Substances 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 239000012298 atmosphere Substances 0.000 description 2
- 230000002238 attenuated effect Effects 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 238000004364 calculation method Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000013213 extrapolation Methods 0.000 description 2
- 229910052736 halogen Inorganic materials 0.000 description 2
- 150000002367 halogens Chemical class 0.000 description 2
- 125000003187 heptyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 2
- 230000010287 polarization Effects 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 230000002194 synthesizing effect Effects 0.000 description 2
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 2
- 238000009834 vaporization Methods 0.000 description 2
- 230000008016 vaporization Effects 0.000 description 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 2
- QNODIIQQMGDSEF-UHFFFAOYSA-N (1-hydroxycyclohexyl)-phenylmethanone Chemical compound C=1C=CC=CC=1C(=O)C1(O)CCCCC1 QNODIIQQMGDSEF-UHFFFAOYSA-N 0.000 description 1
- ZKJNETINGMOHJG-GGWOSOGESA-N (e)-1-[(e)-prop-1-enoxy]prop-1-ene Chemical compound C\C=C\O\C=C\C ZKJNETINGMOHJG-GGWOSOGESA-N 0.000 description 1
- KWVGIHKZDCUPEU-UHFFFAOYSA-N 2,2-dimethoxy-2-phenylacetophenone Chemical compound C=1C=CC=CC=1C(OC)(OC)C(=O)C1=CC=CC=C1 KWVGIHKZDCUPEU-UHFFFAOYSA-N 0.000 description 1
- JECYNCQXXKQDJN-UHFFFAOYSA-N 2-(2-methylhexan-2-yloxymethyl)oxirane Chemical compound CCCCC(C)(C)OCC1CO1 JECYNCQXXKQDJN-UHFFFAOYSA-N 0.000 description 1
- KOFASFPAZGQDKP-UHFFFAOYSA-N 2-[difluoro-(3,4,5-trifluorophenoxy)methyl]-1,3-difluoro-5-[2-fluoro-4-(4-pentylphenyl)phenyl]benzene Chemical compound C1=CC(CCCCC)=CC=C1C1=CC=C(C=2C=C(F)C(=C(F)C=2)C(F)(F)OC=2C=C(F)C(F)=C(F)C=2)C(F)=C1 KOFASFPAZGQDKP-UHFFFAOYSA-N 0.000 description 1
- XMLYCEVDHLAQEL-UHFFFAOYSA-N 2-hydroxy-2-methyl-1-phenylpropan-1-one Chemical compound CC(C)(O)C(=O)C1=CC=CC=C1 XMLYCEVDHLAQEL-UHFFFAOYSA-N 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- 125000006042 4-hexenyl group Chemical group 0.000 description 1
- 125000006043 5-hexenyl group Chemical group 0.000 description 1
- XXUSEPRYHRDKFV-UHFFFAOYSA-N CCCC(CC1)CCC1c(cc1)ccc1C#N Chemical compound CCCC(CC1)CCC1c(cc1)ccc1C#N XXUSEPRYHRDKFV-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
- 239000002250 absorbent Substances 0.000 description 1
- 230000002745 absorbent Effects 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 229910021417 amorphous silicon Inorganic materials 0.000 description 1
- 239000001000 anthraquinone dye Substances 0.000 description 1
- 239000000987 azo dye Substances 0.000 description 1
- 150000001558 benzoic acid derivatives Chemical class 0.000 description 1
- 150000008366 benzophenones Chemical class 0.000 description 1
- 239000012159 carrier gas Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000004587 chromatography analysis Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000007865 diluting Methods 0.000 description 1
- 125000000118 dimethyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 239000004205 dimethyl polysiloxane Substances 0.000 description 1
- 235000013870 dimethyl polysiloxane Nutrition 0.000 description 1
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 1
- 238000005187 foaming Methods 0.000 description 1
- 238000004817 gas chromatography Methods 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 125000005446 heptyloxy group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])O* 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 230000001939 inductive effect Effects 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 239000004611 light stabiliser Substances 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 150000002734 metacrylic acid derivatives Chemical class 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 238000006053 organic reaction Methods 0.000 description 1
- AHHWIHXENZJRFG-UHFFFAOYSA-N oxetane Chemical compound C1COC1 AHHWIHXENZJRFG-UHFFFAOYSA-N 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- UCUUFSAXZMGPGH-UHFFFAOYSA-N penta-1,4-dien-3-one Chemical compound C=CC(=O)C=C UCUUFSAXZMGPGH-UHFFFAOYSA-N 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 description 1
- 229920003216 poly(methylphenylsiloxane) Polymers 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 238000010526 radical polymerization reaction Methods 0.000 description 1
- 239000000523 sample Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 229920002545 silicone oil Polymers 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 238000001308 synthesis method Methods 0.000 description 1
- 238000010189 synthetic method Methods 0.000 description 1
- 229940042055 systemic antimycotics triazole derivative Drugs 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 230000001052 transient effect Effects 0.000 description 1
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 description 1
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- C—CHEMISTRY; METALLURGY
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- C09K19/06—Non-steroidal liquid crystal compounds
- C09K19/08—Non-steroidal liquid crystal compounds containing at least two non-condensed rings
- C09K19/10—Non-steroidal liquid crystal compounds containing at least two non-condensed rings containing at least two benzene rings
- C09K19/12—Non-steroidal liquid crystal compounds containing at least two non-condensed rings containing at least two benzene rings at least two benzene rings directly linked, e.g. biphenyls
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- C09K19/06—Non-steroidal liquid crystal compounds
- C09K19/08—Non-steroidal liquid crystal compounds containing at least two non-condensed rings
- C09K19/10—Non-steroidal liquid crystal compounds containing at least two non-condensed rings containing at least two benzene rings
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- C09K19/06—Non-steroidal liquid crystal compounds
- C09K19/08—Non-steroidal liquid crystal compounds containing at least two non-condensed rings
- C09K19/10—Non-steroidal liquid crystal compounds containing at least two non-condensed rings containing at least two benzene rings
- C09K19/14—Non-steroidal liquid crystal compounds containing at least two non-condensed rings containing at least two benzene rings linked by a carbon chain
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- C09K19/06—Non-steroidal liquid crystal compounds
- C09K19/08—Non-steroidal liquid crystal compounds containing at least two non-condensed rings
- C09K19/10—Non-steroidal liquid crystal compounds containing at least two non-condensed rings containing at least two benzene rings
- C09K19/20—Non-steroidal liquid crystal compounds containing at least two non-condensed rings containing at least two benzene rings linked by a chain containing carbon and oxygen atoms as chain links, e.g. esters or ethers
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- C09K19/04—Liquid crystal materials characterised by the chemical structure of the liquid crystal components, e.g. by a specific unit
- C09K19/42—Mixtures of liquid crystal compounds covered by two or more of the preceding groups C09K19/06 - C09K19/40
- C09K19/44—Mixtures of liquid crystal compounds covered by two or more of the preceding groups C09K19/06 - C09K19/40 containing compounds with benzene rings directly linked
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- C09K2019/0444—Liquid crystal materials characterised by the chemical structure of the liquid crystal components, e.g. by a specific unit characterized by a linking chain between rings or ring systems, a bridging chain between extensive mesogenic moieties or an end chain group
- C09K2019/0466—Liquid crystal materials characterised by the chemical structure of the liquid crystal components, e.g. by a specific unit characterized by a linking chain between rings or ring systems, a bridging chain between extensive mesogenic moieties or an end chain group the linking chain being a -CF2O- chain
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- C09K19/06—Non-steroidal liquid crystal compounds
- C09K19/08—Non-steroidal liquid crystal compounds containing at least two non-condensed rings
- C09K19/10—Non-steroidal liquid crystal compounds containing at least two non-condensed rings containing at least two benzene rings
- C09K19/12—Non-steroidal liquid crystal compounds containing at least two non-condensed rings containing at least two benzene rings at least two benzene rings directly linked, e.g. biphenyls
- C09K2019/121—Compounds containing phenylene-1,4-diyl (-Ph-)
- C09K2019/123—Ph-Ph-Ph
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- C09K19/08—Non-steroidal liquid crystal compounds containing at least two non-condensed rings
- C09K19/10—Non-steroidal liquid crystal compounds containing at least two non-condensed rings containing at least two benzene rings
- C09K19/12—Non-steroidal liquid crystal compounds containing at least two non-condensed rings containing at least two benzene rings at least two benzene rings directly linked, e.g. biphenyls
- C09K2019/121—Compounds containing phenylene-1,4-diyl (-Ph-)
- C09K2019/124—Ph-Ph-Ph-Ph
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- C09K19/06—Non-steroidal liquid crystal compounds
- C09K19/08—Non-steroidal liquid crystal compounds containing at least two non-condensed rings
- C09K19/10—Non-steroidal liquid crystal compounds containing at least two non-condensed rings containing at least two benzene rings
- C09K19/20—Non-steroidal liquid crystal compounds containing at least two non-condensed rings containing at least two benzene rings linked by a chain containing carbon and oxygen atoms as chain links, e.g. esters or ethers
- C09K19/2007—Non-steroidal liquid crystal compounds containing at least two non-condensed rings containing at least two benzene rings linked by a chain containing carbon and oxygen atoms as chain links, e.g. esters or ethers the chain containing -COO- or -OCO- groups
- C09K2019/205—Ph-Ph-Ph-COO-Ph
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- C09K19/00—Liquid crystal materials
- C09K19/04—Liquid crystal materials characterised by the chemical structure of the liquid crystal components, e.g. by a specific unit
- C09K19/06—Non-steroidal liquid crystal compounds
- C09K19/08—Non-steroidal liquid crystal compounds containing at least two non-condensed rings
- C09K19/10—Non-steroidal liquid crystal compounds containing at least two non-condensed rings containing at least two benzene rings
- C09K19/20—Non-steroidal liquid crystal compounds containing at least two non-condensed rings containing at least two benzene rings linked by a chain containing carbon and oxygen atoms as chain links, e.g. esters or ethers
- C09K19/2007—Non-steroidal liquid crystal compounds containing at least two non-condensed rings containing at least two benzene rings linked by a chain containing carbon and oxygen atoms as chain links, e.g. esters or ethers the chain containing -COO- or -OCO- groups
- C09K2019/2064—Ph-Ph-COO-Ph-Ph
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Description
ここで、R1は独立して、炭素数1から12のアルキル、炭素数1から12のアルコキシ、炭素数2から12のアルケニル、または任意の水素がフッ素で置き換えられた炭素数2から12のアルケニルであり;Z1およびZ2は独立して、単結合、エチレン、またはカルボニルオキシであり;X1、X2、X3、X4、X5、およびX6は独立して、水素またはフッ素であり;Y1は、フッ素、塩素、またはトリフルオロメトキシである。
1. 第一成分として式(1)で表される化合物の群から選択された少なくとも1つの化合物、および第二成分として式(2)で表される化合物の群から選択された少なくとも1つの化合物を含有し、そしてネマチック相を有する液晶組成物。
ここで、R1は独立して、炭素数1から12のアルキル、炭素数1から12のアルコキシ、炭素数2から12のアルケニル、または任意の水素がフッ素で置き換えられた炭素数2から12のアルケニルであり;Z1およびZ2は独立して、単結合、エチレン、またはカルボニルオキシであり;X1、X2、X3、X4、X5、およびX6は独立して、水素またはフッ素であり;Y1は、フッ素、塩素、またはトリフルオロメトキシである。
ここで、R1は炭素数1から12のアルキル、炭素数1から12のアルコキシ、炭素数2から12のアルケニル、または任意の水素がフッ素で置き換えられた炭素数2から12のアルケニルである。
ここで、R1は炭素数1から12のアルキル、炭素数1から12のアルコキシ、炭素数2から12のアルケニル、または任意の水素がフッ素で置き換えられた炭素数2から12のアルケニルである。
5. 第一成分が式(1−4)で表される化合物の群から選択された少なくとも1つの化合物である項4に記載の液晶組成物。
ここで、R1は炭素数1から12のアルキル、炭素数1から12のアルコキシ、炭素数2から12のアルケニル、または任意の水素がフッ素で置き換えられた炭素数2から12のアルケニルである。
ここで、R2およびR3は独立して、炭素数1から12のアルキル、炭素数1から12のアルコキシ、炭素数2から12のアルケニル、または任意の水素がフッ素で置き換えられた炭素数2から12のアルケニルであり;環A、環Bおよび環Cは独立して、1,4−シクロへキシレン、1,4−フェニレン、2−フルオロ−1,4−フェニレン、3−フルオロ−1,4−フェニレンまたは2,5−ジフルオロ−1,4−フェニレンであり;Z3およびZ4は独立して、単結合、エチレン、またはカルボニルオキシであり;mは、0、1または2である。
ここで、R2およびR3は独立して、炭素数1から12のアルキル、炭素数1から12のアルコキシ、炭素数2から12のアルケニル、または任意の水素がフッ素で置き換えられた炭素数2から12のアルケニルである。
ここで、R1は、炭素数1から12のアルキル、炭素数1から12のアルコキシ、炭素数2から12のアルケニル、または任意の水素がフッ素で置き換えられた炭素数2から12のアルケニルであり;環Dは独立して、1,4−シクロへキシレン、1,3−ジオキサン−2,5−ジイル、1,4−フェニレン、2−フルオロ−1,4−フェニレン、3−フルオロ−1,4−フェニレン、3,5−ジフルオロ−1,4−フェニレン、または2,5−ピリミジンであり;Z5は独立して、単結合、エチレン、カルボニルオキシ、またはジフルオロメチレンオキシであり;X1およびX2は独立して、水素またはフッ素であり;Y1は、フッ素、塩素、またはトリフルオロメトキシであり;kは1または2である。
ここで、R4は、炭素数1から12のアルキル、または炭素数2から12のアルケニルである。
25. 項1から24のいずれか1項に記載の液晶組成物を含有する液晶表示素子。
26. 液晶表示素子の動作モードが、TNモード、OCBモード、IPSモード、またはPSAモードであり、液晶表示素子の駆動方式がアクティブマトリックス方式である項25に記載の液晶表示素子。
表3において、1,4−シクロヘキシレンに関する立体配置はトランスである。実施例において記号の後にあるかっこ内の番号は化合物の番号に対応する。(−)の記号はその他の液晶性化合物を意味する。液晶性化合物の割合(百分率)は、液晶組成物の全重量に基づいた重量百分率(重量%)であり、液晶組成物にはこの他に不純物が含まれている。最後に、組成物の特性値をまとめた。
特表2008−502619号公報に開示された組成物の中から実施例1を選んだ。根拠は、この組成物が化合物(1−1−1)、化合物(3−2−1)、化合物(3−6−1)および化合物(4)を含有し、最も回転粘度が小さいからである。この組成物の成分および特性は下記のとおりである。
2−BB(F)B−3 (3−6−1) 15%
2−BB(F)B−4 (3−6−1) 15%
3−BB(F)B−2 (3−6−1) 9%
3−HB−O1 (3−2−1) 19%
2−B(F)B(F)B−F (4) 9%
3−B(F)B(F)B−F (4) 11%
3−HB(F)B(F)−F (4) 16%
3−BBB(F)B(F,F)−F (1−1−1) 6%
NI=88.0℃;Δn=0.202;Δε=5.0;γ1=154.0mPa・s.
特表2008−502753号公報に開示された組成物の中から実施例5を選んだ。根拠は、この組成物が化合物(1−1−1)、化合物(3−1−1)、化合物(3−4−1)、化合物(4)、化合物(4−5−1)、化合物(4−16−1)および化合物(4−17)を含有し、最も回転粘度が小さいからである。この組成物の成分および特性は下記のとおりである。
3−HHB(F,F)−F (4−5−1) 8%
2−HHEB(F,F)−F (4−15) 7%
3−HHEB(F,F)−F (4−15) 9%
2−HB(F)EB−OCF3 (4) 4%
3−HB(F)EB−OCF3 (4) 4%
2−HGB(F,F)−F (4−17) 9%
3−HGB(F,F)−F (4−17) 8%
5−HGB(F,F)−F (4−17) 5%
1V−HH−3 (3−1−1) 10%
V−HH−4 (3−1−1) 18%
V−HHB−1 (3−4−1) 11%
3−BBB(F)B(F,F)−F (1−1−1) 3%
3−BB(F,F)XB(F,F)−F (4−11−1) 4%
NI=82.0℃;Δn=0.083;Δε=9.7;γ1=94.0mPa・s.
特表2008−502754号公報に開示された組成物の中から実施例7を選んだ。根拠は、この組成物が化合物(1−1−1)、化合物(3−1−1)、化合物(3−2−1)、化合物(3−3−1)、化合物(3−4−1)、化合物(4)、化合物(4−9−1)および化合物(4−11−1)を含有し、最も回転粘度が小さいからである。この組成物の成分および特性は下記のとおりである。
2−HHB−OCF3 (4) 4.5%
3−HHB−OCF3 (4) 4.5%
3−BB(F)B(F,F)−F (4−9−1) 3%
2−BB(F,F)XB(F,F)−F (4−11−1) 6%
3−BB(F,F)XB(F,F)−F (4−11−1) 8%
1V−HH−3 (3−1−1) 14%
V−HH−4 (3−1−1) 10%
3−HB−O1 (3−2−1) 14%
V−HHB−1 (3−4−1) 13%
V2−HHB−1 (3−4−1) 12%
3−BBB(F)B(F,F)−F (1−1−1) 5%
1V2−BB―1 (3−3−1) 6%
NI=77.0℃;Δn=0.111;Δε=5.4;γ1=65.0mPa・s.
3−BBB(F)B(F,F)−F (1−1−1) 3%
3−BB(F)B(F,F)XB(F,F)−F (2−1−1) 3%
4−BB(F)B(F,F)XB(F,F)−F (2−1−1) 5%
V−HH−3 (3−1−1)46%
1V−HH−3 (3−1−1) 9%
V−HHB−1 (3−4−1)13%
V2−HHB−1 (3−4−1) 6%
5−HBBH−3 (3−8−1) 5%
3−HHB(F,F)−F (4−5−1) 7%
3−BB(F,F)XB(F,F)−F (4−11−1)3%
NI=92.9℃;Tc≦−20℃;Δn=0.091;Δε=2.9;Vth=2.43V;η=11.0mPa・s;γ1=48.0mPa・s;τ=8.8ms;VHR−1=99.1%;VHR−2=98.1%;VHR−3=98.1%.
3−BBB(F)B(F,F)−F (1−1−1) 3%
3−BB(F)B(F,F)XB(F,F)−F (2−1−1) 3%
4−BB(F)B(F,F)XB(F,F)−F (2−1−1) 5%
V−HH−3 (3−1−1)46%
1V−HH−3 (3−1−1) 9%
V−HHB−1 (3−4−1)13%
V2−HHB−1 (3−4−1) 6%
3−HHB(F,F)−F (4−5−1) 7%
3−BB(F,F)XB(F,F)−F (4−11−1)3%
3−HHBB(F)−F (−) 5%
NI=91.3℃;Tc≦−20℃;Δn=0.091;Δε=3.2;Vth=2.33V;η=11.3mPa・s;γ1=48.6mPa・s;τ=8.9ms;VHR−1=99.2%;VHR−2=98.2%;VHR−3=98.1%.
3−BB2BB(F,F)−F (1−2−1) 3%
3−BB2B(F)B(F,F)−F (1−3−1) 4%
5−BB2B(F)B(F,F)−F (1−3−1) 4%
5−BB(F)B(F,F)XB(F)−OCF3(2−2−1) 4%
V−HH−3 (3−1−1)44%
V−HH−5 (3−1−1)14%
3−HHB−1 (3−4−1) 4%
V−HHB−1 (3−4−1) 7%
V2−HHB−1 (3−4−1) 6%
1−BB(F)B−2V (3−6−1) 5%
3−BB(F)B(F,F)−F (4−9−1) 5%
NI=92.4℃;Tc≦−20℃;Δn=0.111;Δε=2.7;Vth=2.58V;η=13.1mPa・s;γ1=52.6mPa・s;τ=9.1ms;VHR−1=99.1%;VHR−2=98.0%;VHR−3=98.0%.
3−BBB(F)B(F,F)−F (1−1−1) 4%
5−BBB(F,F)XB(F,F)−F (2−3) 3%
5−BBB(F,F)XB(F)−OCF3 (2−4) 3%
2−HH−3 (3−1−1) 20%
V−HH−3 (3−1−1) 25%
3−HB−O2 (3−2−1) 4%
V2−BB−1 (3−3−1) 5%
V−HHB−1 (3−4−1) 8%
1V−HBB−2 (3−5−1) 5%
2−BB(F)B−3 (3−6−1) 4%
5−HBB(F)B−2 (3−10−1) 6%
3−HHB−CL (4−4−1) 3%
3−BB(F,F)XB(F,F)−F (4−11−1) 10%
NI=79.4℃;Tc≦−20℃;Δn=0.111;Δε=4.3;Vth=2.11V;η=12.6mPa・s;γ1=51.1mPa・s;τ=9.0ms;VHR−1=99.1%;VHR−2=98.2%;VHR−3=98.0%.
3−BBB(F)B(F,F)−F (1−1−1) 3%
3−BB(F)B(F,F)XB(F,F)−F (2−1−1) 3%
4−BB(F)B(F,F)XB(F,F)−F (2−1−1) 5%
V−HH−3 (3−1−1)46%
1V−HH−3 (3−1−1) 9%
V−HHB−1 (3−4−1)13%
3−HHEBH−3 (3−7−1) 4%
5−HB(F)BH−3 (3−9−1) 4%
3−HHXB(F,F)−F (4−6−1) 7%
3−BB(F,F)XB(F,F)−F (4−11−1)3%
5−GHB(F,F)−F (4−18) 3%
NI=92.3℃;Tc≦−20℃;Δn=0.089;Δε=3.7;Vth=2.27V;η=13.7mPa・s;γ1=53.0mPa・s;τ=9.2ms;VHR−1=99.0%;VHR−2=98.1%;VHR−3=98.1%.
3−BBB(F)B(F,F)−F (1−1−1) 3%
3−BB(F)B(F,F)XB(F,F)−F (2−1−1) 3%
4−BB(F)B(F,F)XB(F,F)−F (2−1−1) 5%
V−HH−3 (3−1−1)46%
V−HHB−1 (3−4−1)13%
V2−HHB−1 (3−4−1) 6%
5−HBBH−3 (3−8−1) 5%
3−HB−CL (4−1−1) 4%
1V2−BB―F (4−2−1) 5%
1V2−BB−CL (4−3−1) 3%
3−HBB(F,F)−F (4−8−1) 7%
NI=83.2℃;Tc≦−20℃;Δn=0.101;Δε=3.0;Vth=2.36V;η=10.3mPa・s;γ1=47.2mPa・s;τ=8.8ms;VHR−1=99.2%;VHR−2=98.1%;VHR−3=98.2%.
3−BBB(F)B(F,F)−F (1−1−1) 3%
3−BB(F)B(F,F)XB(F,F)−F (2−1−1) 3%
4−BB(F)B(F,F)XB(F,F)−F (2−1−1) 8%
V−HH−3 (3−1−1)44%
1V−HH−3 (3−1−1) 8%
V−HHB−1 (3−4−1)13%
V2−HHB−1 (3−4−1) 6%
V2−BB(F)B−1 (3−6−1) 5%
3−BB(F,F)XB(F)−OCF3 (4−12−1)3%
3−HHXB(F)−OCF3 (4−13) 3%
3−HHEB(F,F)−F (4−15) 4%
NI=90.4℃;Tc≦−20℃;Δn=0.102;Δε=3.9;Vth=2.23V;η=13.0mPa・s;γ1=52.1mPa・s;τ=9.1ms;VHR−1=99.1%;VHR−2=98.1%;VHR−3=98.1%.
3−BBB(F)B(F,F)−F (1−1−1) 3%
3−BB(F)B(F,F)XB(F,F)−F (2−1−1) 3%
4−BB(F)B(F,F)XB(F,F)−F (2−1−1) 5%
3−HH−VFF (3−1) 8%
V−HH−3 (3−1−1)38%
1V−HH−3 (3−1−1) 8%
1V2−BB−1 (3−3−1) 6%
V−HHB−1 (3−4−1) 8%
3−HBB−F (4−7−1) 4%
3−HBEB(F,F)−F (4−16) 3%
3−HGB(F,F)−F (4−17) 5%
1O1−HBBH−5 (−) 5%
3−HHBB(F,F)−F (−) 4%
NI=89.0℃;Tc≦−20℃;Δn=0.101;Δε=3.8;Vth=2.25V;η=12.3mPa・s;γ1=51.3mPa・s;τ=9.0ms;VHR−1=99.2%;VHR−2=98.0%;VHR−3=98.2%.
3−BBB(F)B(F,F)−F (1−1−1) 3%
3−BB(F)B(F,F)XB(F,F)−F (2−1−1) 3%
4−BB(F)B(F,F)XB(F,F)−F (2−1−1) 5%
V−HH−3 (3−1−1)46%
1V−HH−3 (3−1−1) 9%
V−HHB−1 (3−4−1)13%
V2−HHB−1 (3−4−1) 6%
3−PyBB−F (4−10−1)3%
4−PyBB−F (4−10−1)3%
5−PyBB−F (4−10−1)3%
3−BB(F,F)XB(F)−F (4−14) 6%
NI=88.5℃;Tc≦−20℃;Δn=0.104;Δε=3.8;Vth=2.24V;η=11.7mPa・s;γ1=49.1mPa・s;τ=8.9ms;VHR−1=99.2%;VHR−2=98.1%;VHR−3=97.9%.
3−BBB(F)B(F,F)−F (1−1−1) 3%
3−BB(F)B(F,F)XB(F,F)−F (2−1−1) 3%
4−BB(F)B(F,F)XB(F,F)−F (2−1−1) 5%
3−HHEH−5 (3) 3%
V−HH−3 (3−1−1)46%
1V−HH−3 (3−1−1) 9%
3−HH−O1 (3−1−1) 5%
VFF−HHB−1 (3−4) 3%
3−HHB−O1 (3−4−1) 4%
V−HHB−1 (3−4−1) 9%
V2−HHB−1 (3−4−1) 4%
3−BB(F,F)XB(F)−F (4−14) 6%
NI=82.6℃;Tc≦−20℃;Δn=0.085;Δε=2.8;Vth=2.40V;η=9.6mPa・s;γ1=46.3mPa・s;τ=8.7ms;VHR−1=99.2%;VHR−2=98.2%;VHR−3=98.1%.
3−BBB(F)B(F,F)−F (1−1−1) 3%
5−BBB(F)B(F,F)−F (1−1−1) 3%
4−BB(F)B(F,F)XB(F,F)−F (2−1−1) 7%
5−BB(F)B(F,F)XB(F,F)−F (2−1−1) 3%
2−HH−3 (3−1−1) 4%
V−HH−3 (3−1−1)45%
1V−HH−3 (3−1−1) 8%
V2−BB−1 (3−3−1) 5%
V−HHB−1 (3−4−1)13%
2−BB(F)B−3 (3−6−1) 4%
1−BB(F)B−2V (3−6−1) 5%
NI=84.5℃;Tc≦−20℃;Δn=0.110;Δε=3.0;Vth=2.38V;η=8.8mPa・s;γ1=44.4mPa・s;τ=8.5ms;VHR−1=99.1%;VHR−2=98.1%;VHR−3=98.2%.
5−BBB(F,F)B(F,F)−F (1−4−1) 1%
5−BB2B(F,F)B(F,F)−F (1−5−1) 2%
3−BB(F)B(F,F)XB(F,F)−F (2−1−1) 3%
4−BB(F)B(F,F)XB(F,F)−F (2−1−1) 5%
V−HH−3 (3−1−1)46%
1V−HH−3 (3−1−1) 9%
V−HHB−1 (3−4−1)13%
V2−HHB−1 (3−4−1) 6%
5−HBBH−3 (3−8−1) 5%
3−HHB(F,F)−F (4−5−1) 7%
3−BB(F,F)XB(F,F)−F (4−11−1)3%
NI=91.9℃;Tc≦−20℃;Δn=0.090;Δε=3.0;Vth=2.40V;η=11.4mPa・s;γ1=48.2mPa・s;τ=8.8ms;VHR−1=99.0%;VHR−2=98.1%;VHR−3=98.0%.
5−BBB(F)B(F,F)−F (1−1−1) 3%
5−BBB(F,F)B(F,F)−F (1−4−1) 1%
4−BB(F)B(F,F)XB(F,F)−F (2−1−1) 5%
V−HH−3 (3−1−1)44%
1V−HH−3 (3−1−1) 8%
V−HHB−1 (3−4−1)11%
V2−HHB−1 (3−4−1) 5%
2−BB(F)B−3 (3−6−1) 6%
2−BB(F)B−5 (3−6−1) 4%
3−HHB(F,F)−F (4−5−1)10%
3−BB(F,F)XB(F,F)−F (4−11−1)3%
NI=83.2℃;Tc≦−20℃;Δn=0.099;Δε=2.8;Vth=2.44V;η=12.8mPa・s;γ1=51.7mPa・s;τ=9.1ms;VHR−1=99.1%;VHR−2=98.2%;VHR−3=98.2%.
Claims (23)
- 第一成分として式(1−4)および式(1−5)で表される化合物の群から選択された少なくとも1つの化合物、および第二成分として式(2)で表される化合物の群から選択された少なくとも1つの化合物を含有し、そしてネマチック相を有する液晶組成物。
ここで、R1は独立して、炭素数1から12のアルキル、炭素数1から12のアルコキシ、炭素数2から12のアルケニル、または任意の水素がフッ素で置き換えられた炭素数2から12のアルケニルであり;Z1は独立して、単結合、エチレン、またはカルボニルオキシであり;X1、X2、X3、X4、X5、およびX6は独立して、水素またはフッ素であり;Y1は、フッ素、塩素、またはトリフルオロメトキシである。 - 第一成分が式(1−4)で表される化合物の群から選択された少なくとも1つの化合物である請求項1に記載の液晶組成物。
- 第二成分が、式(2−1)で表される化合物の群から選択された少なくとも1つの化合物である請求項3に記載の液晶組成物。
- 液晶組成物の全重量に基づいて、第一成分の割合が3重量%から30重量%の範囲であり、そして第二成分の割合が4重量%から30重量%の範囲である請求項1から4のいずれか1項に記載の液晶組成物。
- 第三成分として式(3)で表される化合物の群から選択された少なくとも1つの化合物をさらに含有する、請求項1から5のいずれか1項に記載の液晶組成物。
ここで、R2およびR3は独立して、炭素数1から12のアルキル、炭素数1から12のアルコキシ、炭素数2から12のアルケニル、または任意の水素がフッ素で置き換えられた炭素数2から12のアルケニルであり;環A、環Bおよび環Cは独立して、1,4−シクロへキシレン、1,4−フェニレン、2−フルオロ−1,4−フェニレン、3−フルオロ−1,4−フェニレンまたは2,5−ジフルオロ−1,4−フェニレンであり;Z3およびZ4は独立して、単結合、エチレン、またはカルボニルオキシであり;mは、0、1または2である。 - 第三成分が式(3−1)で表される化合物の群から選択された少なくとも1つの化合物である請求項7に記載の液晶組成物。
- 第三成分が、式(3−1)で表される化合物の群から選択された少なくとも1つの化合物、および式(3−4)で表される化合物の群から選択された少なくとも1つの化合物の混合物である請求項7に記載の液晶組成物。
- 第三成分が、式(3−1)で表される化合物の群から選択された少なくとも1つの化合物、および式(3−6)で表される化合物の群から選択された少なくとも1つの化合物の混合物である請求項7に記載の液晶組成物。
- 第三成分が、式(3−6)で表される化合物の群から選択された少なくとも1つの化合物、および式(3−10)で表される化合物の群から選択された少なくとも1つの化合物の混合物である請求項7に記載の液晶組成物。
- 第三成分が、式(3−1)で表される化合物の群から選択された少なくとも1つの化合物、式(3−4)で表される化合物の群から選択された少なくとも1つの化合物、および式(3−6)で表される化合物の群から選択された少なくとも1つの化合物の混合物である請求項7に記載の液晶組成物。
- 液晶組成物の全重量に基づいて、第三成分の割合が35重量%から90重量%の範囲である請求項6から12のいずれか1項に記載の液晶組成物。
- 第四成分として式(4)で表される化合物の群から選択された少なくとも1つの化合物をさらに含有する、請求項1から13のいずれか1項に記載の液晶組成物。
ここで、R1は、炭素数1から12のアルキル、炭素数1から12のアルコキシ、炭素数2から12のアルケニル、または任意の水素がフッ素で置き換えられた炭素数2から12のアルケニルであり;環Dは独立して、1,4−シクロへキシレン、1,3−ジオキサン−2,5−ジイル、1,4−フェニレン、2−フルオロ−1,4−フェニレン、3−フルオロ−1,4−フェニレン、3,5−ジフルオロ−1,4−フェニレン、または2,5−ピリミジンであり;Z5は独立して、単結合、エチレン、カルボニルオキシ、またはジフルオロメチレンオキシであり;X1およびX2は独立して、水素またはフッ素であり;Y1は、フッ素、塩素、またはトリフルオロメトキシであり;kは1または2である。 - 第四成分が、式(4−9)で表される化合物の群から選択された少なくとも1つの化合物である請求項15に記載の液晶組成物。
- 第四成分が、式(4−11)で表される化合物の群から選択された少なくとも1つの化合物である請求項15に記載の液晶組成物。
- 第四成分が、式(4−6)で表される化合物の群から選択された少なくとも1つの化合物および式(4−11)で表される化合物の群から選択された少なくとも1つの化合物の混合物である請求項15に記載の液晶組成物。
- 第四成分が、式(4−9)で表される化合物の群から選択された少なくとも1つの化合物および式(4−11)で表される化合物の群から選択された少なくとも1つの化合物の混合物である請求項15に記載の液晶組成物。
- 液晶組成物の全重量に基づいて、第四成分の割合が5重量%から40重量%の範囲である請求項14から19のいずれか1項に記載の液晶組成物。
- ネマチック相の上限温度が70℃以上であり、波長589nmにおける光学異方性(25℃)が0.08以上であり、そして周波数1kHzにおける誘電率異方性(25℃)が2以上である請求項1から20のいずれか1項に記載の液晶組成物。
- 請求項1から21のいずれか1項に記載の液晶組成物を含有する液晶表示素子。
- 液晶表示素子の動作モードが、TNモード、OCBモード、IPSモード、またはPSAモードであり、液晶表示素子の駆動方式がアクティブマトリックス方式である請求項22に記載の液晶表示素子。
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Families Citing this family (116)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US11229472B2 (en) | 2001-06-12 | 2022-01-25 | Cilag Gmbh International | Modular battery powered handheld surgical instrument with multiple magnetic position sensors |
US9089360B2 (en) | 2008-08-06 | 2015-07-28 | Ethicon Endo-Surgery, Inc. | Devices and techniques for cutting and coagulating tissue |
US8663220B2 (en) | 2009-07-15 | 2014-03-04 | Ethicon Endo-Surgery, Inc. | Ultrasonic surgical instruments |
US11090104B2 (en) | 2009-10-09 | 2021-08-17 | Cilag Gmbh International | Surgical generator for ultrasonic and electrosurgical devices |
US10441345B2 (en) | 2009-10-09 | 2019-10-15 | Ethicon Llc | Surgical generator for ultrasonic and electrosurgical devices |
US8956349B2 (en) | 2009-10-09 | 2015-02-17 | Ethicon Endo-Surgery, Inc. | Surgical generator for ultrasonic and electrosurgical devices |
US10172669B2 (en) | 2009-10-09 | 2019-01-08 | Ethicon Llc | Surgical instrument comprising an energy trigger lockout |
US8469981B2 (en) | 2010-02-11 | 2013-06-25 | Ethicon Endo-Surgery, Inc. | Rotatable cutting implement arrangements for ultrasonic surgical instruments |
GB2480498A (en) | 2010-05-21 | 2011-11-23 | Ethicon Endo Surgery Inc | Medical device comprising RF circuitry |
US8795327B2 (en) | 2010-07-22 | 2014-08-05 | Ethicon Endo-Surgery, Inc. | Electrosurgical instrument with separate closure and cutting members |
US9192431B2 (en) | 2010-07-23 | 2015-11-24 | Ethicon Endo-Surgery, Inc. | Electrosurgical cutting and sealing instrument |
CN102250625B (zh) * | 2011-04-18 | 2013-06-19 | 鹿泉市新型电子材料有限公司 | 一种快速响应液晶组合物 |
US9259265B2 (en) | 2011-07-22 | 2016-02-16 | Ethicon Endo-Surgery, Llc | Surgical instruments for tensioning tissue |
US8968595B2 (en) * | 2011-09-02 | 2015-03-03 | Industrial Technology Research Institute | Methods for recycling liquid crystal and forming reformulated liquid crystal mixtures |
JP6234932B2 (ja) | 2011-10-24 | 2017-11-22 | エシコン・エンド−サージェリィ・インコーポレイテッドEthicon Endo−Surgery,Inc. | 医療用器具 |
EP2811932B1 (en) | 2012-02-10 | 2019-06-26 | Ethicon LLC | Robotically controlled surgical instrument |
US9439668B2 (en) | 2012-04-09 | 2016-09-13 | Ethicon Endo-Surgery, Llc | Switch arrangements for ultrasonic surgical instruments |
US20140005705A1 (en) | 2012-06-29 | 2014-01-02 | Ethicon Endo-Surgery, Inc. | Surgical instruments with articulating shafts |
US9198714B2 (en) | 2012-06-29 | 2015-12-01 | Ethicon Endo-Surgery, Inc. | Haptic feedback devices for surgical robot |
US20140005702A1 (en) | 2012-06-29 | 2014-01-02 | Ethicon Endo-Surgery, Inc. | Ultrasonic surgical instruments with distally positioned transducers |
US9393037B2 (en) | 2012-06-29 | 2016-07-19 | Ethicon Endo-Surgery, Llc | Surgical instruments with articulating shafts |
US9408622B2 (en) | 2012-06-29 | 2016-08-09 | Ethicon Endo-Surgery, Llc | Surgical instruments with articulating shafts |
US9326788B2 (en) | 2012-06-29 | 2016-05-03 | Ethicon Endo-Surgery, Llc | Lockout mechanism for use with robotic electrosurgical device |
US9351754B2 (en) | 2012-06-29 | 2016-05-31 | Ethicon Endo-Surgery, Llc | Ultrasonic surgical instruments with distally positioned jaw assemblies |
US9226767B2 (en) | 2012-06-29 | 2016-01-05 | Ethicon Endo-Surgery, Inc. | Closed feedback control for electrosurgical device |
JP6275727B2 (ja) | 2012-09-28 | 2018-02-07 | エシコン・エンド−サージェリィ・インコーポレイテッドEthicon Endo−Surgery,Inc. | 多機能バイポーラ鉗子 |
US9095367B2 (en) | 2012-10-22 | 2015-08-04 | Ethicon Endo-Surgery, Inc. | Flexible harmonic waveguides/blades for surgical instruments |
JP5565542B1 (ja) * | 2012-10-24 | 2014-08-06 | Dic株式会社 | ネマチック液晶組成物及びこれを用いた液晶表示素子 |
US20140135804A1 (en) | 2012-11-15 | 2014-05-15 | Ethicon Endo-Surgery, Inc. | Ultrasonic and electrosurgical devices |
US9441160B2 (en) | 2012-12-27 | 2016-09-13 | Dic Corporation | Fluorobiphenyl-containing composition |
CN105102586B (zh) | 2013-03-25 | 2017-10-10 | Dic株式会社 | 液晶组合物和使用其的液晶显示元件 |
EP2806010B1 (en) * | 2013-03-25 | 2017-07-26 | DIC Corporation | Liquid crystal composition and liquid crystal display element using same |
TWI561616B (en) * | 2013-03-26 | 2016-12-11 | Dainippon Ink & Chemicals | Liquid crystal composition, and liquid crystal display element using the same |
CN107312552A (zh) * | 2013-07-03 | 2017-11-03 | 捷恩智株式会社 | 液晶组合物及其用途、以及液晶显示元件 |
CN107573949B (zh) * | 2013-08-20 | 2020-12-22 | Dic株式会社 | 液晶组合物和使用其的液晶显示元件 |
US9814514B2 (en) | 2013-09-13 | 2017-11-14 | Ethicon Llc | Electrosurgical (RF) medical instruments for cutting and coagulating tissue |
US9265926B2 (en) | 2013-11-08 | 2016-02-23 | Ethicon Endo-Surgery, Llc | Electrosurgical devices |
GB2521228A (en) | 2013-12-16 | 2015-06-17 | Ethicon Endo Surgery Inc | Medical device |
US9795436B2 (en) | 2014-01-07 | 2017-10-24 | Ethicon Llc | Harvesting energy from a surgical generator |
US9554854B2 (en) | 2014-03-18 | 2017-01-31 | Ethicon Endo-Surgery, Llc | Detecting short circuits in electrosurgical medical devices |
US10092310B2 (en) | 2014-03-27 | 2018-10-09 | Ethicon Llc | Electrosurgical devices |
US10463421B2 (en) | 2014-03-27 | 2019-11-05 | Ethicon Llc | Two stage trigger, clamp and cut bipolar vessel sealer |
US9737355B2 (en) | 2014-03-31 | 2017-08-22 | Ethicon Llc | Controlling impedance rise in electrosurgical medical devices |
US9913680B2 (en) | 2014-04-15 | 2018-03-13 | Ethicon Llc | Software algorithms for electrosurgical instruments |
WO2016013449A1 (ja) * | 2014-07-25 | 2016-01-28 | Dic株式会社 | 液晶組成物及びそれを使用した液晶表示素子 |
US10285724B2 (en) | 2014-07-31 | 2019-05-14 | Ethicon Llc | Actuation mechanisms and load adjustment assemblies for surgical instruments |
US10194972B2 (en) | 2014-08-26 | 2019-02-05 | Ethicon Llc | Managing tissue treatment |
US10639092B2 (en) | 2014-12-08 | 2020-05-05 | Ethicon Llc | Electrode configurations for surgical instruments |
US10092348B2 (en) | 2014-12-22 | 2018-10-09 | Ethicon Llc | RF tissue sealer, shear grip, trigger lock mechanism and energy activation |
US10111699B2 (en) | 2014-12-22 | 2018-10-30 | Ethicon Llc | RF tissue sealer, shear grip, trigger lock mechanism and energy activation |
US10159524B2 (en) | 2014-12-22 | 2018-12-25 | Ethicon Llc | High power battery powered RF amplifier topology |
US10245095B2 (en) | 2015-02-06 | 2019-04-02 | Ethicon Llc | Electrosurgical instrument with rotation and articulation mechanisms |
US10321950B2 (en) | 2015-03-17 | 2019-06-18 | Ethicon Llc | Managing tissue treatment |
US10342602B2 (en) | 2015-03-17 | 2019-07-09 | Ethicon Llc | Managing tissue treatment |
US10595929B2 (en) | 2015-03-24 | 2020-03-24 | Ethicon Llc | Surgical instruments with firing system overload protection mechanisms |
US10314638B2 (en) | 2015-04-07 | 2019-06-11 | Ethicon Llc | Articulating radio frequency (RF) tissue seal with articulating state sensing |
US10130410B2 (en) | 2015-04-17 | 2018-11-20 | Ethicon Llc | Electrosurgical instrument including a cutting member decouplable from a cutting member trigger |
US10765470B2 (en) | 2015-06-30 | 2020-09-08 | Ethicon Llc | Surgical system with user adaptable techniques employing simultaneous energy modalities based on tissue parameters |
US10034704B2 (en) | 2015-06-30 | 2018-07-31 | Ethicon Llc | Surgical instrument with user adaptable algorithms |
US11051873B2 (en) | 2015-06-30 | 2021-07-06 | Cilag Gmbh International | Surgical system with user adaptable techniques employing multiple energy modalities based on tissue parameters |
US10898256B2 (en) | 2015-06-30 | 2021-01-26 | Ethicon Llc | Surgical system with user adaptable techniques based on tissue impedance |
US11129669B2 (en) | 2015-06-30 | 2021-09-28 | Cilag Gmbh International | Surgical system with user adaptable techniques based on tissue type |
KR20180044229A (ko) * | 2015-08-21 | 2018-05-02 | 디아이씨 가부시끼가이샤 | 액정 표시 소자 |
US10736685B2 (en) | 2015-09-30 | 2020-08-11 | Ethicon Llc | Generator for digitally generating combined electrical signal waveforms for ultrasonic surgical instruments |
US10595930B2 (en) | 2015-10-16 | 2020-03-24 | Ethicon Llc | Electrode wiping surgical device |
US10959771B2 (en) | 2015-10-16 | 2021-03-30 | Ethicon Llc | Suction and irrigation sealing grasper |
US10959806B2 (en) | 2015-12-30 | 2021-03-30 | Ethicon Llc | Energized medical device with reusable handle |
US10179022B2 (en) | 2015-12-30 | 2019-01-15 | Ethicon Llc | Jaw position impedance limiter for electrosurgical instrument |
US10575892B2 (en) | 2015-12-31 | 2020-03-03 | Ethicon Llc | Adapter for electrical surgical instruments |
US11129670B2 (en) | 2016-01-15 | 2021-09-28 | Cilag Gmbh International | Modular battery powered handheld surgical instrument with selective application of energy based on button displacement, intensity, or local tissue characterization |
US10716615B2 (en) | 2016-01-15 | 2020-07-21 | Ethicon Llc | Modular battery powered handheld surgical instrument with curved end effectors having asymmetric engagement between jaw and blade |
US10779849B2 (en) | 2016-01-15 | 2020-09-22 | Ethicon Llc | Modular battery powered handheld surgical instrument with voltage sag resistant battery pack |
US11229471B2 (en) | 2016-01-15 | 2022-01-25 | Cilag Gmbh International | Modular battery powered handheld surgical instrument with selective application of energy based on tissue characterization |
US10555769B2 (en) | 2016-02-22 | 2020-02-11 | Ethicon Llc | Flexible circuits for electrosurgical instrument |
US10702329B2 (en) | 2016-04-29 | 2020-07-07 | Ethicon Llc | Jaw structure with distal post for electrosurgical instruments |
US10646269B2 (en) | 2016-04-29 | 2020-05-12 | Ethicon Llc | Non-linear jaw gap for electrosurgical instruments |
US10485607B2 (en) | 2016-04-29 | 2019-11-26 | Ethicon Llc | Jaw structure with distal closure for electrosurgical instruments |
US10987156B2 (en) | 2016-04-29 | 2021-04-27 | Ethicon Llc | Electrosurgical instrument with electrically conductive gap setting member and electrically insulative tissue engaging members |
US10856934B2 (en) | 2016-04-29 | 2020-12-08 | Ethicon Llc | Electrosurgical instrument with electrically conductive gap setting and tissue engaging members |
US10456193B2 (en) | 2016-05-03 | 2019-10-29 | Ethicon Llc | Medical device with a bilateral jaw configuration for nerve stimulation |
US10376305B2 (en) | 2016-08-05 | 2019-08-13 | Ethicon Llc | Methods and systems for advanced harmonic energy |
US10751117B2 (en) | 2016-09-23 | 2020-08-25 | Ethicon Llc | Electrosurgical instrument with fluid diverter |
US11266430B2 (en) | 2016-11-29 | 2022-03-08 | Cilag Gmbh International | End effector control and calibration |
US11033325B2 (en) | 2017-02-16 | 2021-06-15 | Cilag Gmbh International | Electrosurgical instrument with telescoping suction port and debris cleaner |
US10799284B2 (en) | 2017-03-15 | 2020-10-13 | Ethicon Llc | Electrosurgical instrument with textured jaws |
US11497546B2 (en) | 2017-03-31 | 2022-11-15 | Cilag Gmbh International | Area ratios of patterned coatings on RF electrodes to reduce sticking |
CN108690638B (zh) * | 2017-04-06 | 2021-08-31 | 石家庄诚志永华显示材料有限公司 | 液晶组合物 |
US10603117B2 (en) | 2017-06-28 | 2020-03-31 | Ethicon Llc | Articulation state detection mechanisms |
US11484358B2 (en) | 2017-09-29 | 2022-11-01 | Cilag Gmbh International | Flexible electrosurgical instrument |
US11490951B2 (en) | 2017-09-29 | 2022-11-08 | Cilag Gmbh International | Saline contact with electrodes |
US11033323B2 (en) | 2017-09-29 | 2021-06-15 | Cilag Gmbh International | Systems and methods for managing fluid and suction in electrosurgical systems |
CN108531197A (zh) * | 2018-05-31 | 2018-09-14 | 烟台显华化工科技有限公司 | 一种液晶组合物及其应用 |
US20210196357A1 (en) | 2019-12-30 | 2021-07-01 | Ethicon Llc | Electrosurgical instrument with asynchronous energizing electrodes |
US12076006B2 (en) | 2019-12-30 | 2024-09-03 | Cilag Gmbh International | Surgical instrument comprising an orientation detection system |
US11950797B2 (en) | 2019-12-30 | 2024-04-09 | Cilag Gmbh International | Deflectable electrode with higher distal bias relative to proximal bias |
US20210196363A1 (en) | 2019-12-30 | 2021-07-01 | Ethicon Llc | Electrosurgical instrument with electrodes operable in bipolar and monopolar modes |
US12114912B2 (en) | 2019-12-30 | 2024-10-15 | Cilag Gmbh International | Non-biased deflectable electrode to minimize contact between ultrasonic blade and electrode |
US12053224B2 (en) | 2019-12-30 | 2024-08-06 | Cilag Gmbh International | Variation in electrode parameters and deflectable electrode to modify energy density and tissue interaction |
US11944366B2 (en) | 2019-12-30 | 2024-04-02 | Cilag Gmbh International | Asymmetric segmented ultrasonic support pad for cooperative engagement with a movable RF electrode |
US12082808B2 (en) | 2019-12-30 | 2024-09-10 | Cilag Gmbh International | Surgical instrument comprising a control system responsive to software configurations |
US11707318B2 (en) | 2019-12-30 | 2023-07-25 | Cilag Gmbh International | Surgical instrument with jaw alignment features |
US11786291B2 (en) | 2019-12-30 | 2023-10-17 | Cilag Gmbh International | Deflectable support of RF energy electrode with respect to opposing ultrasonic blade |
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Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003301179A (ja) * | 2002-04-11 | 2003-10-21 | Chisso Corp | 液晶組成物および液晶表示素子 |
JP2003301178A (ja) * | 2002-04-09 | 2003-10-21 | Chisso Corp | 液晶組成物および液晶表示素子 |
JP2006089622A (ja) * | 2004-09-24 | 2006-04-06 | Chisso Corp | 高分子と光学活性な液晶材料からなる複合体 |
JP2008502754A (ja) * | 2004-06-18 | 2008-01-31 | メルク パテント ゲゼルシャフト ミット ベシュレンクテル ハフトング | 液晶媒体 |
JP2008088433A (ja) * | 2006-10-04 | 2008-04-17 | Merck Patent Gmbh | 液晶媒体 |
JP2008111113A (ja) * | 2006-10-05 | 2008-05-15 | Chisso Corp | 液晶組成物および液晶表示素子 |
JP2009215556A (ja) * | 2008-03-11 | 2009-09-24 | Merck Patent Gmbh | 液晶媒体および液晶ディスプレイ |
WO2009156118A1 (en) * | 2008-06-27 | 2009-12-30 | Merck Patent Gmbh | Liquid-crystalline medium |
JP2011514410A (ja) * | 2008-02-20 | 2011-05-06 | メルク パテント ゲゼルシャフト ミット ベシュレンクテル ハフツング | 液晶媒体 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3660505A (en) | 1969-08-27 | 1972-05-02 | Exxon Research Engineering Co | Hindered alkenyl phenols from quinone methide |
JPS59176221A (ja) | 1983-03-16 | 1984-10-05 | メルク・パテント・ゲゼルシヤフト・ミツト・ベシユレンクテル・ハフツング | アルケニル化合物 |
JP2696557B2 (ja) | 1989-03-07 | 1998-01-14 | チッソ株式会社 | トリフルオロベンゼン誘導体 |
JP3287288B2 (ja) * | 1996-11-22 | 2002-06-04 | チッソ株式会社 | ポリハロアルキルエーテル誘導体とそれらを含む液晶組成物及び液晶表示素子 |
JPH10251186A (ja) | 1997-03-10 | 1998-09-22 | Chisso Corp | ハロゲン置換ベンゼン誘導体、液晶組成物および液晶表示素子 |
WO2005123878A1 (de) | 2004-06-18 | 2005-12-29 | Merck Patent Gmbh | Flüssigkristallines medium |
DE502005006152D1 (de) | 2004-06-18 | 2009-01-15 | Merck Patent Gmbh | Flüssigkristallines medium |
DE602006004250D1 (de) * | 2005-05-25 | 2009-01-29 | Merck Patent Gmbh | Flüssigkristallines Medium und Flüssigkristallanzeige |
WO2009115226A1 (en) * | 2008-03-19 | 2009-09-24 | Merck Patent Gmbh | Liquid crystalline medium and liquid crystal display |
-
2009
- 2009-08-17 US US13/061,114 patent/US8361569B2/en active Active
- 2009-08-17 WO PCT/JP2009/064383 patent/WO2010024142A1/ja active Application Filing
- 2009-08-17 KR KR1020117004007A patent/KR20110046481A/ko not_active Application Discontinuation
- 2009-08-17 EP EP20090809795 patent/EP2316907A4/en not_active Withdrawn
- 2009-08-17 CN CN2009801331653A patent/CN102131896A/zh active Pending
- 2009-08-17 JP JP2010526657A patent/JP5527210B2/ja not_active Expired - Fee Related
- 2009-08-26 TW TW098128714A patent/TW201012906A/zh unknown
Patent Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003301178A (ja) * | 2002-04-09 | 2003-10-21 | Chisso Corp | 液晶組成物および液晶表示素子 |
JP2003301179A (ja) * | 2002-04-11 | 2003-10-21 | Chisso Corp | 液晶組成物および液晶表示素子 |
JP2008502754A (ja) * | 2004-06-18 | 2008-01-31 | メルク パテント ゲゼルシャフト ミット ベシュレンクテル ハフトング | 液晶媒体 |
JP2006089622A (ja) * | 2004-09-24 | 2006-04-06 | Chisso Corp | 高分子と光学活性な液晶材料からなる複合体 |
JP2008088433A (ja) * | 2006-10-04 | 2008-04-17 | Merck Patent Gmbh | 液晶媒体 |
JP2008111113A (ja) * | 2006-10-05 | 2008-05-15 | Chisso Corp | 液晶組成物および液晶表示素子 |
JP2011514410A (ja) * | 2008-02-20 | 2011-05-06 | メルク パテント ゲゼルシャフト ミット ベシュレンクテル ハフツング | 液晶媒体 |
JP2009215556A (ja) * | 2008-03-11 | 2009-09-24 | Merck Patent Gmbh | 液晶媒体および液晶ディスプレイ |
WO2009156118A1 (en) * | 2008-06-27 | 2009-12-30 | Merck Patent Gmbh | Liquid-crystalline medium |
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KR20110046481A (ko) | 2011-05-04 |
TW201012906A (en) | 2010-04-01 |
EP2316907A1 (en) | 2011-05-04 |
JPWO2010024142A1 (ja) | 2012-01-26 |
US20110149227A1 (en) | 2011-06-23 |
EP2316907A4 (en) | 2013-07-17 |
CN102131896A (zh) | 2011-07-20 |
US8361569B2 (en) | 2013-01-29 |
WO2010024142A1 (ja) | 2010-03-04 |
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