JP5523336B2 - 高い耐引掻性と耐候性とを有する被覆剤 - Google Patents
高い耐引掻性と耐候性とを有する被覆剤 Download PDFInfo
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- JP5523336B2 JP5523336B2 JP2010538458A JP2010538458A JP5523336B2 JP 5523336 B2 JP5523336 B2 JP 5523336B2 JP 2010538458 A JP2010538458 A JP 2010538458A JP 2010538458 A JP2010538458 A JP 2010538458A JP 5523336 B2 JP5523336 B2 JP 5523336B2
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- 238000000576 coating method Methods 0.000 title claims description 118
- 239000011248 coating agent Substances 0.000 title claims description 114
- 239000000463 material Substances 0.000 title description 6
- -1 bicyclic amine Chemical class 0.000 claims description 75
- 150000001875 compounds Chemical class 0.000 claims description 67
- 229920005862 polyol Polymers 0.000 claims description 40
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical group [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims description 39
- 150000003077 polyols Chemical class 0.000 claims description 39
- 239000005056 polyisocyanate Substances 0.000 claims description 34
- 229920001228 polyisocyanate Polymers 0.000 claims description 34
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 claims description 29
- 239000003054 catalyst Substances 0.000 claims description 25
- 125000000217 alkyl group Chemical group 0.000 claims description 23
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 21
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 18
- 125000000753 cycloalkyl group Chemical group 0.000 claims description 18
- 125000003118 aryl group Chemical group 0.000 claims description 17
- 125000003710 aryl alkyl group Chemical group 0.000 claims description 15
- 125000004432 carbon atom Chemical group C* 0.000 claims description 12
- 238000004132 cross linking Methods 0.000 claims description 12
- 238000000034 method Methods 0.000 claims description 12
- NBIIXXVUZAFLBC-UHFFFAOYSA-N phosphoric acid Substances OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims description 12
- 239000000758 substrate Substances 0.000 claims description 12
- 229910019142 PO4 Inorganic materials 0.000 claims description 11
- 125000000524 functional group Chemical group 0.000 claims description 11
- 239000010452 phosphate Substances 0.000 claims description 11
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical group [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims description 10
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical group [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 10
- 229910052760 oxygen Inorganic materials 0.000 claims description 10
- 239000001301 oxygen Substances 0.000 claims description 10
- 229910052717 sulfur Inorganic materials 0.000 claims description 10
- 239000011593 sulfur Chemical group 0.000 claims description 10
- 229910003813 NRa Chemical group 0.000 claims description 8
- 229910000147 aluminium phosphate Inorganic materials 0.000 claims description 8
- NFDXQGNDWIPXQL-UHFFFAOYSA-N 1-cyclooctyldiazocane Chemical group C1CCCCCCC1N1NCCCCCC1 NFDXQGNDWIPXQL-UHFFFAOYSA-N 0.000 claims description 7
- 239000012973 diazabicyclooctane Substances 0.000 claims description 7
- 239000011230 binding agent Substances 0.000 claims description 6
- 125000002947 alkylene group Chemical group 0.000 claims description 5
- 239000005058 Isophorone diisocyanate Substances 0.000 claims description 4
- 238000009835 boiling Methods 0.000 claims description 4
- RRAMGCGOFNQTLD-UHFFFAOYSA-N hexamethylene diisocyanate Chemical compound O=C=NCCCCCCN=C=O RRAMGCGOFNQTLD-UHFFFAOYSA-N 0.000 claims description 4
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical compound OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 claims description 4
- NIMLQBUJDJZYEJ-UHFFFAOYSA-N isophorone diisocyanate Chemical compound CC1(C)CC(N=C=O)CC(C)(CN=C=O)C1 NIMLQBUJDJZYEJ-UHFFFAOYSA-N 0.000 claims description 4
- 239000013638 trimer Substances 0.000 claims description 4
- OHJMTUPIZMNBFR-UHFFFAOYSA-N biuret Chemical class NC(=O)NC(N)=O OHJMTUPIZMNBFR-UHFFFAOYSA-N 0.000 claims description 3
- 239000003431 cross linking reagent Substances 0.000 claims description 3
- 125000002993 cycloalkylene group Chemical group 0.000 claims description 3
- KORSJDCBLAPZEQ-UHFFFAOYSA-N dicyclohexylmethane-4,4'-diisocyanate Chemical compound C1CC(N=C=O)CCC1CC1CCC(N=C=O)CC1 KORSJDCBLAPZEQ-UHFFFAOYSA-N 0.000 claims description 3
- 229910052739 hydrogen Inorganic materials 0.000 claims description 3
- 239000001257 hydrogen Substances 0.000 claims description 3
- 229920000193 polymethacrylate Polymers 0.000 claims description 3
- 239000007787 solid Substances 0.000 claims description 3
- ABLZXFCXXLZCGV-UHFFFAOYSA-N Phosphorous acid Chemical compound OP(O)=O ABLZXFCXXLZCGV-UHFFFAOYSA-N 0.000 claims description 2
- 125000004185 ester group Chemical group 0.000 claims description 2
- 150000002148 esters Chemical class 0.000 claims description 2
- 125000000962 organic group Chemical group 0.000 claims description 2
- 229940008841 1,6-hexamethylene diisocyanate Drugs 0.000 claims 1
- BSIJQKQJZLFYPP-UHFFFAOYSA-N P(=O)(O)(O)O.P(=O)(OC(CCCCC)CC)(OC(CCCCC)CC)O Chemical class P(=O)(O)(O)O.P(=O)(OC(CCCCC)CC)(OC(CCCCC)CC)O BSIJQKQJZLFYPP-UHFFFAOYSA-N 0.000 claims 1
- 150000002431 hydrogen Chemical class 0.000 claims 1
- CMPQUABWPXYYSH-UHFFFAOYSA-N phenyl phosphate Chemical group OP(O)(=O)OC1=CC=CC=C1 CMPQUABWPXYYSH-UHFFFAOYSA-N 0.000 claims 1
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 28
- 150000001412 amines Chemical class 0.000 description 25
- 229910000077 silane Inorganic materials 0.000 description 24
- 229920004482 WACKER® Polymers 0.000 description 20
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 15
- 238000006243 chemical reaction Methods 0.000 description 14
- 239000012948 isocyanate Substances 0.000 description 14
- 150000002513 isocyanates Chemical class 0.000 description 14
- 150000003973 alkyl amines Chemical class 0.000 description 12
- 239000002904 solvent Substances 0.000 description 12
- 230000009257 reactivity Effects 0.000 description 11
- 150000004756 silanes Chemical class 0.000 description 11
- 239000000126 substance Substances 0.000 description 11
- 238000004448 titration Methods 0.000 description 11
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical group N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 10
- 239000000203 mixture Substances 0.000 description 10
- 239000000243 solution Substances 0.000 description 10
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 9
- 239000002253 acid Substances 0.000 description 9
- 238000005336 cracking Methods 0.000 description 9
- 238000001723 curing Methods 0.000 description 9
- 238000003756 stirring Methods 0.000 description 9
- 229910001868 water Inorganic materials 0.000 description 9
- 229920003023 plastic Polymers 0.000 description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 8
- 239000000178 monomer Substances 0.000 description 7
- 239000004033 plastic Substances 0.000 description 7
- 229920000058 polyacrylate Polymers 0.000 description 7
- FZHAPNGMFPVSLP-UHFFFAOYSA-N silanamine Chemical class [SiH3]N FZHAPNGMFPVSLP-UHFFFAOYSA-N 0.000 description 7
- 239000004593 Epoxy Substances 0.000 description 6
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 6
- 239000003795 chemical substances by application Substances 0.000 description 6
- 229920001577 copolymer Polymers 0.000 description 6
- 125000001261 isocyanato group Chemical group *N=C=O 0.000 description 6
- XCOASYLMDUQBHW-UHFFFAOYSA-N n-(3-trimethoxysilylpropyl)butan-1-amine Chemical compound CCCCNCCC[Si](OC)(OC)OC XCOASYLMDUQBHW-UHFFFAOYSA-N 0.000 description 6
- 238000012360 testing method Methods 0.000 description 6
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 5
- 239000000654 additive Substances 0.000 description 5
- 125000005370 alkoxysilyl group Chemical group 0.000 description 5
- 125000005442 diisocyanate group Chemical group 0.000 description 5
- 238000010494 dissociation reaction Methods 0.000 description 5
- 230000005593 dissociations Effects 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 229910052757 nitrogen Inorganic materials 0.000 description 5
- 239000004417 polycarbonate Substances 0.000 description 5
- 229920000515 polycarbonate Polymers 0.000 description 5
- 239000000047 product Substances 0.000 description 5
- 238000005507 spraying Methods 0.000 description 5
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 4
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 4
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 4
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 229920002877 acrylic styrene acrylonitrile Polymers 0.000 description 4
- 239000002981 blocking agent Substances 0.000 description 4
- 150000005690 diesters Chemical class 0.000 description 4
- 238000005227 gel permeation chromatography Methods 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 4
- 239000003921 oil Substances 0.000 description 4
- 229920000642 polymer Polymers 0.000 description 4
- 238000010992 reflux Methods 0.000 description 4
- 125000001424 substituent group Chemical group 0.000 description 4
- WYTZZXDRDKSJID-UHFFFAOYSA-N (3-aminopropyl)triethoxysilane Chemical compound CCO[Si](OCC)(OCC)CCCN WYTZZXDRDKSJID-UHFFFAOYSA-N 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- TZZGHGKTHXIOMN-UHFFFAOYSA-N 3-trimethoxysilyl-n-(3-trimethoxysilylpropyl)propan-1-amine Chemical compound CO[Si](OC)(OC)CCCNCCC[Si](OC)(OC)OC TZZGHGKTHXIOMN-UHFFFAOYSA-N 0.000 description 3
- SJECZPVISLOESU-UHFFFAOYSA-N 3-trimethoxysilylpropan-1-amine Chemical compound CO[Si](OC)(OC)CCCN SJECZPVISLOESU-UHFFFAOYSA-N 0.000 description 3
- XDLMVUHYZWKMMD-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C(C)=C XDLMVUHYZWKMMD-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 3
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- SJRJJKPEHAURKC-UHFFFAOYSA-N N-Methylmorpholine Chemical compound CN1CCOCC1 SJRJJKPEHAURKC-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 125000002015 acyclic group Chemical group 0.000 description 3
- 125000003545 alkoxy group Chemical group 0.000 description 3
- 125000005250 alkyl acrylate group Chemical group 0.000 description 3
- 229920003180 amino resin Polymers 0.000 description 3
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 3
- 230000000903 blocking effect Effects 0.000 description 3
- 239000007795 chemical reaction product Substances 0.000 description 3
- 230000007613 environmental effect Effects 0.000 description 3
- 239000000945 filler Substances 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 230000009477 glass transition Effects 0.000 description 3
- 150000002500 ions Chemical class 0.000 description 3
- 229910052698 phosphorus Inorganic materials 0.000 description 3
- 239000011574 phosphorus Substances 0.000 description 3
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 3
- 229920005906 polyester polyol Polymers 0.000 description 3
- 239000004926 polymethyl methacrylate Substances 0.000 description 3
- 229920001296 polysiloxane Polymers 0.000 description 3
- 239000004814 polyurethane Substances 0.000 description 3
- 229920002635 polyurethane Polymers 0.000 description 3
- 230000003678 scratch resistant effect Effects 0.000 description 3
- 125000006850 spacer group Chemical group 0.000 description 3
- 239000007921 spray Substances 0.000 description 3
- 238000001029 thermal curing Methods 0.000 description 3
- PUPZLCDOIYMWBV-UHFFFAOYSA-N (+/-)-1,3-Butanediol Chemical compound CC(O)CCO PUPZLCDOIYMWBV-UHFFFAOYSA-N 0.000 description 2
- ARXKVVRQIIOZGF-UHFFFAOYSA-N 1,2,4-butanetriol Chemical compound OCCC(O)CO ARXKVVRQIIOZGF-UHFFFAOYSA-N 0.000 description 2
- BHWUCEATHBXPOV-UHFFFAOYSA-N 2-triethoxysilylethanamine Chemical compound CCO[Si](CCN)(OCC)OCC BHWUCEATHBXPOV-UHFFFAOYSA-N 0.000 description 2
- ZHTLMPWATZQGAP-UHFFFAOYSA-N 2-triethoxysilylethanol Chemical compound CCO[Si](CCO)(OCC)OCC ZHTLMPWATZQGAP-UHFFFAOYSA-N 0.000 description 2
- QHQNYHZHLAAHRW-UHFFFAOYSA-N 2-trimethoxysilylethanamine Chemical compound CO[Si](OC)(OC)CCN QHQNYHZHLAAHRW-UHFFFAOYSA-N 0.000 description 2
- BOSZBTFBHSYELP-UHFFFAOYSA-N 2-trimethoxysilylethanol Chemical compound CO[Si](OC)(OC)CCO BOSZBTFBHSYELP-UHFFFAOYSA-N 0.000 description 2
- FMGBDYLOANULLW-UHFFFAOYSA-N 3-isocyanatopropyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)CCCN=C=O FMGBDYLOANULLW-UHFFFAOYSA-N 0.000 description 2
- NMUBRRLYMADSGF-UHFFFAOYSA-N 3-triethoxysilylpropan-1-ol Chemical compound CCO[Si](OCC)(OCC)CCCO NMUBRRLYMADSGF-UHFFFAOYSA-N 0.000 description 2
- YATIYDNBFHEOFA-UHFFFAOYSA-N 3-trimethoxysilylpropan-1-ol Chemical compound CO[Si](OC)(OC)CCCO YATIYDNBFHEOFA-UHFFFAOYSA-N 0.000 description 2
- SWDDLRSGGCWDPH-UHFFFAOYSA-N 4-triethoxysilylbutan-1-amine Chemical compound CCO[Si](OCC)(OCC)CCCCN SWDDLRSGGCWDPH-UHFFFAOYSA-N 0.000 description 2
- SBCIVMFCVBDNOF-UHFFFAOYSA-N 4-triethoxysilylbutan-1-ol Chemical compound CCO[Si](OCC)(OCC)CCCCO SBCIVMFCVBDNOF-UHFFFAOYSA-N 0.000 description 2
- RBVMDQYCJXEJCJ-UHFFFAOYSA-N 4-trimethoxysilylbutan-1-amine Chemical compound CO[Si](OC)(OC)CCCCN RBVMDQYCJXEJCJ-UHFFFAOYSA-N 0.000 description 2
- PIDYPPNNYNADRY-UHFFFAOYSA-N 4-trimethoxysilylbutan-1-ol Chemical compound CO[Si](OC)(OC)CCCCO PIDYPPNNYNADRY-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- SOGAXMICEFXMKE-UHFFFAOYSA-N Butylmethacrylate Chemical compound CCCCOC(=O)C(C)=C SOGAXMICEFXMKE-UHFFFAOYSA-N 0.000 description 2
- KXDHJXZQYSOELW-UHFFFAOYSA-N Carbamic acid Chemical group NC(O)=O KXDHJXZQYSOELW-UHFFFAOYSA-N 0.000 description 2
- 229940126062 Compound A Drugs 0.000 description 2
- 239000004971 Cross linker Substances 0.000 description 2
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 2
- NLDMNSXOCDLTTB-UHFFFAOYSA-N Heterophylliin A Natural products O1C2COC(=O)C3=CC(O)=C(O)C(O)=C3C3=C(O)C(O)=C(O)C=C3C(=O)OC2C(OC(=O)C=2C=C(O)C(O)=C(O)C=2)C(O)C1OC(=O)C1=CC(O)=C(O)C(O)=C1 NLDMNSXOCDLTTB-UHFFFAOYSA-N 0.000 description 2
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 2
- 239000006096 absorbing agent Substances 0.000 description 2
- 230000002378 acidificating effect Effects 0.000 description 2
- 125000002723 alicyclic group Chemical group 0.000 description 2
- 125000001931 aliphatic group Chemical group 0.000 description 2
- 150000008064 anhydrides Chemical class 0.000 description 2
- 230000001588 bifunctional effect Effects 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 229910052794 bromium Inorganic materials 0.000 description 2
- WERYXYBDKMZEQL-UHFFFAOYSA-N butane-1,4-diol Chemical compound OCCCCO WERYXYBDKMZEQL-UHFFFAOYSA-N 0.000 description 2
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 125000004122 cyclic group Chemical group 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 125000003700 epoxy group Chemical group 0.000 description 2
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 229910052736 halogen Inorganic materials 0.000 description 2
- 150000002367 halogens Chemical class 0.000 description 2
- 238000013007 heat curing Methods 0.000 description 2
- 230000007062 hydrolysis Effects 0.000 description 2
- 238000006460 hydrolysis reaction Methods 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 238000010348 incorporation Methods 0.000 description 2
- 150000002576 ketones Chemical class 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- UAEPNZWRGJTJPN-UHFFFAOYSA-N methylcyclohexane Chemical compound CC1CCCCC1 UAEPNZWRGJTJPN-UHFFFAOYSA-N 0.000 description 2
- KGNDVXPHQJMHLX-UHFFFAOYSA-N n-(3-trimethoxysilylpropyl)cyclohexanamine Chemical compound CO[Si](OC)(OC)CCCNC1CCCCC1 KGNDVXPHQJMHLX-UHFFFAOYSA-N 0.000 description 2
- SLCVBVWXLSEKPL-UHFFFAOYSA-N neopentyl glycol Chemical compound OCC(C)(C)CO SLCVBVWXLSEKPL-UHFFFAOYSA-N 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- PGMYKACGEOXYJE-UHFFFAOYSA-N pentyl acetate Chemical compound CCCCCOC(C)=O PGMYKACGEOXYJE-UHFFFAOYSA-N 0.000 description 2
- 150000003014 phosphoric acid esters Chemical class 0.000 description 2
- 229910052615 phyllosilicate Inorganic materials 0.000 description 2
- 239000000049 pigment Substances 0.000 description 2
- 229920000582 polyisocyanurate Polymers 0.000 description 2
- 239000011495 polyisocyanurate Substances 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 239000006120 scratch resistant coating Substances 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 239000012086 standard solution Substances 0.000 description 2
- 150000003512 tertiary amines Chemical class 0.000 description 2
- 239000012085 test solution Substances 0.000 description 2
- DVKJHBMWWAPEIU-UHFFFAOYSA-N toluene 2,4-diisocyanate Chemical compound CC1=CC=C(N=C=O)C=C1N=C=O DVKJHBMWWAPEIU-UHFFFAOYSA-N 0.000 description 2
- 238000005809 transesterification reaction Methods 0.000 description 2
- IMNIMPAHZVJRPE-UHFFFAOYSA-N triethylenediamine Chemical compound C1CN2CCN1CC2 IMNIMPAHZVJRPE-UHFFFAOYSA-N 0.000 description 2
- QLNOVKKVHFRGMA-UHFFFAOYSA-N trimethoxy(propyl)silane Chemical group [CH2]CC[Si](OC)(OC)OC QLNOVKKVHFRGMA-UHFFFAOYSA-N 0.000 description 2
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 2
- UOKUUKOEIMCYAI-UHFFFAOYSA-N trimethoxysilylmethyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)COC(=O)C(C)=C UOKUUKOEIMCYAI-UHFFFAOYSA-N 0.000 description 2
- 229920002554 vinyl polymer Polymers 0.000 description 2
- PSGCQDPCAWOCSH-UHFFFAOYSA-N (4,7,7-trimethyl-3-bicyclo[2.2.1]heptanyl) prop-2-enoate Chemical compound C1CC2(C)C(OC(=O)C=C)CC1C2(C)C PSGCQDPCAWOCSH-UHFFFAOYSA-N 0.000 description 1
- DNIAPMSPPWPWGF-GSVOUGTGSA-N (R)-(-)-Propylene glycol Chemical compound C[C@@H](O)CO DNIAPMSPPWPWGF-GSVOUGTGSA-N 0.000 description 1
- LUYHWJKHJNFYGV-UHFFFAOYSA-N 1,2-diisocyanato-3-phenylbenzene Chemical compound O=C=NC1=CC=CC(C=2C=CC=CC=2)=C1N=C=O LUYHWJKHJNFYGV-UHFFFAOYSA-N 0.000 description 1
- ZTNJGMFHJYGMDR-UHFFFAOYSA-N 1,2-diisocyanatoethane Chemical compound O=C=NCCN=C=O ZTNJGMFHJYGMDR-UHFFFAOYSA-N 0.000 description 1
- AZYRZNIYJDKRHO-UHFFFAOYSA-N 1,3-bis(2-isocyanatopropan-2-yl)benzene Chemical compound O=C=NC(C)(C)C1=CC=CC(C(C)(C)N=C=O)=C1 AZYRZNIYJDKRHO-UHFFFAOYSA-N 0.000 description 1
- ALQLPWJFHRMHIU-UHFFFAOYSA-N 1,4-diisocyanatobenzene Chemical compound O=C=NC1=CC=C(N=C=O)C=C1 ALQLPWJFHRMHIU-UHFFFAOYSA-N 0.000 description 1
- CDMDQYCEEKCBGR-UHFFFAOYSA-N 1,4-diisocyanatocyclohexane Chemical compound O=C=NC1CCC(N=C=O)CC1 CDMDQYCEEKCBGR-UHFFFAOYSA-N 0.000 description 1
- ATOUXIOKEJWULN-UHFFFAOYSA-N 1,6-diisocyanato-2,2,4-trimethylhexane Chemical compound O=C=NCCC(C)CC(C)(C)CN=C=O ATOUXIOKEJWULN-UHFFFAOYSA-N 0.000 description 1
- LFSYUSUFCBOHGU-UHFFFAOYSA-N 1-isocyanato-2-[(4-isocyanatophenyl)methyl]benzene Chemical compound C1=CC(N=C=O)=CC=C1CC1=CC=CC=C1N=C=O LFSYUSUFCBOHGU-UHFFFAOYSA-N 0.000 description 1
- ICLCCFKUSALICQ-UHFFFAOYSA-N 1-isocyanato-4-(4-isocyanato-3-methylphenyl)-2-methylbenzene Chemical compound C1=C(N=C=O)C(C)=CC(C=2C=C(C)C(N=C=O)=CC=2)=C1 ICLCCFKUSALICQ-UHFFFAOYSA-N 0.000 description 1
- JCTXKRPTIMZBJT-UHFFFAOYSA-N 2,2,4-trimethylpentane-1,3-diol Chemical compound CC(C)C(O)C(C)(C)CO JCTXKRPTIMZBJT-UHFFFAOYSA-N 0.000 description 1
- KXZLHMICGMACLR-UHFFFAOYSA-N 2-(hydroxymethyl)-2-pentylpropane-1,3-diol Chemical compound CCCCCC(CO)(CO)CO KXZLHMICGMACLR-UHFFFAOYSA-N 0.000 description 1
- GOXQRTZXKQZDDN-UHFFFAOYSA-N 2-Ethylhexyl acrylate Chemical compound CCCCC(CC)COC(=O)C=C GOXQRTZXKQZDDN-UHFFFAOYSA-N 0.000 description 1
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 1
- OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical compound OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 description 1
- VHSHLMUCYSAUQU-UHFFFAOYSA-N 2-hydroxypropyl methacrylate Chemical compound CC(O)COC(=O)C(C)=C VHSHLMUCYSAUQU-UHFFFAOYSA-N 0.000 description 1
- GWZMWHWAWHPNHN-UHFFFAOYSA-N 2-hydroxypropyl prop-2-enoate Chemical compound CC(O)COC(=O)C=C GWZMWHWAWHPNHN-UHFFFAOYSA-N 0.000 description 1
- RUMACXVDVNRZJZ-UHFFFAOYSA-N 2-methylpropyl 2-methylprop-2-enoate Chemical compound CC(C)COC(=O)C(C)=C RUMACXVDVNRZJZ-UHFFFAOYSA-N 0.000 description 1
- CFVWNXQPGQOHRJ-UHFFFAOYSA-N 2-methylpropyl prop-2-enoate Chemical compound CC(C)COC(=O)C=C CFVWNXQPGQOHRJ-UHFFFAOYSA-N 0.000 description 1
- MICGRWJJZLKTMU-UHFFFAOYSA-N 3,3,5-trimethylhexyl prop-2-enoate Chemical compound CC(C)CC(C)(C)CCOC(=O)C=C MICGRWJJZLKTMU-UHFFFAOYSA-N 0.000 description 1
- IPLIHNINQXYJLK-UHFFFAOYSA-N 3,3-dimethylbutyl-(2-isocyanatopropan-2-yloxy)-di(propan-2-yloxy)silane Chemical compound CC(C)(C)CC[Si](OC(C)C)(OC(C)C)OC(C)(C)N=C=O IPLIHNINQXYJLK-UHFFFAOYSA-N 0.000 description 1
- ZUVIFIYRCYTXCH-UHFFFAOYSA-N 3,3-dimethylbutyl-(isocyanatomethoxy)-dimethoxysilane Chemical compound CC(C)(C)CC[Si](OC)(OC)OCN=C=O ZUVIFIYRCYTXCH-UHFFFAOYSA-N 0.000 description 1
- FFTMHOQWCSNUTJ-UHFFFAOYSA-N 3,3-dimethylbutyl-diethoxy-(1-isocyanatoethoxy)silane Chemical compound CC(C)(C)CC[Si](OCC)(OCC)OC(C)N=C=O FFTMHOQWCSNUTJ-UHFFFAOYSA-N 0.000 description 1
- SGYJWPLQHGEQMH-UHFFFAOYSA-N 3,3-dimethylbutyl-diethoxy-isocyanatosilane Chemical compound CCO[Si](N=C=O)(OCC)CCC(C)(C)C SGYJWPLQHGEQMH-UHFFFAOYSA-N 0.000 description 1
- AZUYFAIRTQEVGG-UHFFFAOYSA-N 3,3-dimethylbutyl-isocyanato-di(propan-2-yloxy)silane Chemical compound CC(C)O[Si](N=C=O)(OC(C)C)CCC(C)(C)C AZUYFAIRTQEVGG-UHFFFAOYSA-N 0.000 description 1
- RTLNAWTZFMPFOZ-UHFFFAOYSA-N 3,3-dimethylbutyl-isocyanato-dimethoxysilane Chemical compound O=C=N[Si](OC)(OC)CCC(C)(C)C RTLNAWTZFMPFOZ-UHFFFAOYSA-N 0.000 description 1
- PYSRRFNXTXNWCD-UHFFFAOYSA-N 3-(2-phenylethenyl)furan-2,5-dione Chemical compound O=C1OC(=O)C(C=CC=2C=CC=CC=2)=C1 PYSRRFNXTXNWCD-UHFFFAOYSA-N 0.000 description 1
- GXDMUOPCQNLBCZ-UHFFFAOYSA-N 3-(3-triethoxysilylpropyl)oxolane-2,5-dione Chemical compound CCO[Si](OCC)(OCC)CCCC1CC(=O)OC1=O GXDMUOPCQNLBCZ-UHFFFAOYSA-N 0.000 description 1
- VHNJXLWRTQNIPD-UHFFFAOYSA-N 3-hydroxybutyl 2-methylprop-2-enoate Chemical compound CC(O)CCOC(=O)C(C)=C VHNJXLWRTQNIPD-UHFFFAOYSA-N 0.000 description 1
- JRCGLALFKDKSAN-UHFFFAOYSA-N 3-hydroxybutyl prop-2-enoate Chemical compound CC(O)CCOC(=O)C=C JRCGLALFKDKSAN-UHFFFAOYSA-N 0.000 description 1
- GNSFRPWPOGYVLO-UHFFFAOYSA-N 3-hydroxypropyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCCO GNSFRPWPOGYVLO-UHFFFAOYSA-N 0.000 description 1
- QZPSOSOOLFHYRR-UHFFFAOYSA-N 3-hydroxypropyl prop-2-enoate Chemical compound OCCCOC(=O)C=C QZPSOSOOLFHYRR-UHFFFAOYSA-N 0.000 description 1
- NNTRMVRTACZZIO-UHFFFAOYSA-N 3-isocyanatopropyl-dimethoxy-methylsilane Chemical compound CO[Si](C)(OC)CCCN=C=O NNTRMVRTACZZIO-UHFFFAOYSA-N 0.000 description 1
- JQKBYCKXGRPGAV-UHFFFAOYSA-N 3-isocyanatopropyl-tri(propan-2-yloxy)silane Chemical compound CC(C)O[Si](OC(C)C)(OC(C)C)CCCN=C=O JQKBYCKXGRPGAV-UHFFFAOYSA-N 0.000 description 1
- RWLDCNACDPTRMY-UHFFFAOYSA-N 3-triethoxysilyl-n-(3-triethoxysilylpropyl)propan-1-amine Chemical compound CCO[Si](OCC)(OCC)CCCNCCC[Si](OCC)(OCC)OCC RWLDCNACDPTRMY-UHFFFAOYSA-N 0.000 description 1
- URDOJQUSEUXVRP-UHFFFAOYSA-N 3-triethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CCO[Si](OCC)(OCC)CCCOC(=O)C(C)=C URDOJQUSEUXVRP-UHFFFAOYSA-N 0.000 description 1
- UPMLOUAZCHDJJD-UHFFFAOYSA-N 4,4'-Diphenylmethane Diisocyanate Chemical compound C1=CC(N=C=O)=CC=C1CC1=CC=C(N=C=O)C=C1 UPMLOUAZCHDJJD-UHFFFAOYSA-N 0.000 description 1
- YKXAYLPDMSGWEV-UHFFFAOYSA-N 4-hydroxybutyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCCCO YKXAYLPDMSGWEV-UHFFFAOYSA-N 0.000 description 1
- NDWUBGAGUCISDV-UHFFFAOYSA-N 4-hydroxybutyl prop-2-enoate Chemical compound OCCCCOC(=O)C=C NDWUBGAGUCISDV-UHFFFAOYSA-N 0.000 description 1
- JTHZUSWLNCPZLX-UHFFFAOYSA-N 6-fluoro-3-methyl-2h-indazole Chemical compound FC1=CC=C2C(C)=NNC2=C1 JTHZUSWLNCPZLX-UHFFFAOYSA-N 0.000 description 1
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- XZMCDFZZKTWFGF-UHFFFAOYSA-N Cyanamide Chemical compound NC#N XZMCDFZZKTWFGF-UHFFFAOYSA-N 0.000 description 1
- PMPVIKIVABFJJI-UHFFFAOYSA-N Cyclobutane Chemical compound C1CCC1 PMPVIKIVABFJJI-UHFFFAOYSA-N 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 description 1
- 229940123457 Free radical scavenger Drugs 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 1
- CKLJMWTZIZZHCS-REOHCLBHSA-N L-aspartic acid Chemical compound OC(=O)[C@@H](N)CC(O)=O CKLJMWTZIZZHCS-REOHCLBHSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
- 238000006845 Michael addition reaction Methods 0.000 description 1
- 238000006957 Michael reaction Methods 0.000 description 1
- WEQUTIJUYIPKKY-UHFFFAOYSA-N N(=C=O)CC(C)(C)O[Si](OC(C)C)(C)CCC(C)C Chemical compound N(=C=O)CC(C)(C)O[Si](OC(C)C)(C)CCC(C)C WEQUTIJUYIPKKY-UHFFFAOYSA-N 0.000 description 1
- XVYILAMMBQIVGH-UHFFFAOYSA-N N(=C=O)CC(C)(C)O[Si](OC(C)C)(OC(C)C)CCC(C)C Chemical compound N(=C=O)CC(C)(C)O[Si](OC(C)C)(OC(C)C)CCC(C)C XVYILAMMBQIVGH-UHFFFAOYSA-N 0.000 description 1
- RGGRVJAQRWVVNA-UHFFFAOYSA-N N(=C=O)CC(C)O[Si](OCC)(C)CCC(C)C Chemical compound N(=C=O)CC(C)O[Si](OCC)(C)CCC(C)C RGGRVJAQRWVVNA-UHFFFAOYSA-N 0.000 description 1
- ODWUVKALXKEWST-UHFFFAOYSA-N N(=C=O)CCCO[Si](OCC)(OCC)CCC(C)C Chemical compound N(=C=O)CCCO[Si](OCC)(OCC)CCC(C)C ODWUVKALXKEWST-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- ALQSHHUCVQOPAS-UHFFFAOYSA-N Pentane-1,5-diol Chemical compound OCCCCCO ALQSHHUCVQOPAS-UHFFFAOYSA-N 0.000 description 1
- 229920002845 Poly(methacrylic acid) Polymers 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229920002125 Sokalan® Polymers 0.000 description 1
- 229920000147 Styrene maleic anhydride Polymers 0.000 description 1
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 1
- 230000006750 UV protection Effects 0.000 description 1
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical class C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 description 1
- IAXXETNIOYFMLW-COPLHBTASA-N [(1s,3s,4s)-4,7,7-trimethyl-3-bicyclo[2.2.1]heptanyl] 2-methylprop-2-enoate Chemical compound C1C[C@]2(C)[C@@H](OC(=O)C(=C)C)C[C@H]1C2(C)C IAXXETNIOYFMLW-COPLHBTASA-N 0.000 description 1
- XDODWINGEHBYRT-UHFFFAOYSA-N [2-(hydroxymethyl)cyclohexyl]methanol Chemical compound OCC1CCCCC1CO XDODWINGEHBYRT-UHFFFAOYSA-N 0.000 description 1
- YIMQCDZDWXUDCA-UHFFFAOYSA-N [4-(hydroxymethyl)cyclohexyl]methanol Chemical compound OCC1CCC(CO)CC1 YIMQCDZDWXUDCA-UHFFFAOYSA-N 0.000 description 1
- LBKOBSXMPMKAKL-UHFFFAOYSA-N [Li].[F].[Na].[Mg] Chemical compound [Li].[F].[Na].[Mg] LBKOBSXMPMKAKL-UHFFFAOYSA-N 0.000 description 1
- GXDZOSLIAABYHM-UHFFFAOYSA-N [diethoxy(methyl)silyl]methyl 2-methylprop-2-enoate Chemical compound CCO[Si](C)(OCC)COC(=O)C(C)=C GXDZOSLIAABYHM-UHFFFAOYSA-N 0.000 description 1
- BLAKAEFIFWAFGH-UHFFFAOYSA-N acetyl acetate;pyridine Chemical compound C1=CC=NC=C1.CC(=O)OC(C)=O BLAKAEFIFWAFGH-UHFFFAOYSA-N 0.000 description 1
- 230000021736 acetylation Effects 0.000 description 1
- 238000006640 acetylation reaction Methods 0.000 description 1
- 238000007171 acid catalysis Methods 0.000 description 1
- 238000005903 acid hydrolysis reaction Methods 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 125000004423 acyloxy group Chemical group 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 239000002318 adhesion promoter Substances 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 1
- 125000002877 alkyl aryl group Chemical group 0.000 description 1
- 125000004448 alkyl carbonyl group Chemical group 0.000 description 1
- 125000005119 alkyl cycloalkyl group Chemical group 0.000 description 1
- XYLMUPLGERFSHI-UHFFFAOYSA-N alpha-Methylstyrene Chemical compound CC(=C)C1=CC=CC=C1 XYLMUPLGERFSHI-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- SNAAJJQQZSMGQD-UHFFFAOYSA-N aluminum magnesium Chemical compound [Mg].[Al] SNAAJJQQZSMGQD-UHFFFAOYSA-N 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 239000000010 aprotic solvent Substances 0.000 description 1
- 125000004350 aryl cycloalkyl group Chemical group 0.000 description 1
- 229940009098 aspartate Drugs 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- 230000003796 beauty Effects 0.000 description 1
- 125000003354 benzotriazolyl group Chemical class N1N=NC2=C1C=CC=C2* 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 1
- 150000001244 carboxylic acid anhydrides Chemical group 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 238000006555 catalytic reaction Methods 0.000 description 1
- 239000001913 cellulose Substances 0.000 description 1
- 229920002678 cellulose Polymers 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 125000001316 cycloalkyl alkyl group Chemical group 0.000 description 1
- 125000004367 cycloalkylaryl group Chemical group 0.000 description 1
- OIWOHHBRDFKZNC-UHFFFAOYSA-N cyclohexyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1CCCCC1 OIWOHHBRDFKZNC-UHFFFAOYSA-N 0.000 description 1
- KBLWLMPSVYBVDK-UHFFFAOYSA-N cyclohexyl prop-2-enoate Chemical compound C=CC(=O)OC1CCCCC1 KBLWLMPSVYBVDK-UHFFFAOYSA-N 0.000 description 1
- XXKOQQBKBHUATC-UHFFFAOYSA-N cyclohexylmethylcyclohexane Chemical compound C1CCCCC1CC1CCCCC1 XXKOQQBKBHUATC-UHFFFAOYSA-N 0.000 description 1
- WRAABIJFUKKEJQ-UHFFFAOYSA-N cyclopentyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1CCCC1 WRAABIJFUKKEJQ-UHFFFAOYSA-N 0.000 description 1
- BTQLDZMOTPTCGG-UHFFFAOYSA-N cyclopentyl prop-2-enoate Chemical compound C=CC(=O)OC1CCCC1 BTQLDZMOTPTCGG-UHFFFAOYSA-N 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000002242 deionisation method Methods 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- GUJOJGAPFQRJSV-UHFFFAOYSA-N dialuminum;dioxosilane;oxygen(2-);hydrate Chemical compound O.[O-2].[O-2].[O-2].[Al+3].[Al+3].O=[Si]=O.O=[Si]=O.O=[Si]=O.O=[Si]=O GUJOJGAPFQRJSV-UHFFFAOYSA-N 0.000 description 1
- PJIFJEUHCQYNHO-UHFFFAOYSA-N diethoxy-(3-isocyanatopropyl)-methylsilane Chemical compound CCO[Si](C)(OCC)CCCN=C=O PJIFJEUHCQYNHO-UHFFFAOYSA-N 0.000 description 1
- 238000004455 differential thermal analysis Methods 0.000 description 1
- 239000003085 diluting agent Substances 0.000 description 1
- PKTOVQRKCNPVKY-UHFFFAOYSA-N dimethoxy(methyl)silicon Chemical compound CO[Si](C)OC PKTOVQRKCNPVKY-UHFFFAOYSA-N 0.000 description 1
- ORHSGYTWJUDWKU-UHFFFAOYSA-N dimethoxymethyl(ethenyl)silane Chemical compound COC(OC)[SiH2]C=C ORHSGYTWJUDWKU-UHFFFAOYSA-N 0.000 description 1
- XXBDWLFCJWSEKW-UHFFFAOYSA-N dimethylbenzylamine Chemical compound CN(C)CC1=CC=CC=C1 XXBDWLFCJWSEKW-UHFFFAOYSA-N 0.000 description 1
- 150000002009 diols Chemical class 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- GMSCBRSQMRDRCD-UHFFFAOYSA-N dodecyl 2-methylprop-2-enoate Chemical compound CCCCCCCCCCCCOC(=O)C(C)=C GMSCBRSQMRDRCD-UHFFFAOYSA-N 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 230000032050 esterification Effects 0.000 description 1
- 238000005886 esterification reaction Methods 0.000 description 1
- FWDBOZPQNFPOLF-UHFFFAOYSA-N ethenyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)C=C FWDBOZPQNFPOLF-UHFFFAOYSA-N 0.000 description 1
- NKSJNEHGWDZZQF-UHFFFAOYSA-N ethenyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C=C NKSJNEHGWDZZQF-UHFFFAOYSA-N 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- UHKJHMOIRYZSTH-UHFFFAOYSA-N ethyl 2-ethoxypropanoate Chemical compound CCOC(C)C(=O)OCC UHKJHMOIRYZSTH-UHFFFAOYSA-N 0.000 description 1
- SUPCQIBBMFXVTL-UHFFFAOYSA-N ethyl 2-methylprop-2-enoate Chemical compound CCOC(=O)C(C)=C SUPCQIBBMFXVTL-UHFFFAOYSA-N 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 230000003203 everyday effect Effects 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- 150000002222 fluorine compounds Chemical class 0.000 description 1
- 239000006260 foam Substances 0.000 description 1
- 229920000578 graft copolymer Polymers 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 125000005842 heteroatom Chemical group 0.000 description 1
- 125000000623 heterocyclic group Chemical group 0.000 description 1
- XXMIOPMDWAUFGU-UHFFFAOYSA-N hexane-1,6-diol Chemical compound OCCCCCCO XXMIOPMDWAUFGU-UHFFFAOYSA-N 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- LNCPIMCVTKXXOY-UHFFFAOYSA-N hexyl 2-methylprop-2-enoate Chemical compound CCCCCCOC(=O)C(C)=C LNCPIMCVTKXXOY-UHFFFAOYSA-N 0.000 description 1
- LNMQRPPRQDGUDR-UHFFFAOYSA-N hexyl prop-2-enoate Chemical compound CCCCCCOC(=O)C=C LNMQRPPRQDGUDR-UHFFFAOYSA-N 0.000 description 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 1
- 238000005470 impregnation Methods 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 229940119545 isobornyl methacrylate Drugs 0.000 description 1
- BYTCQKGPXREDTO-UHFFFAOYSA-N isocyanato-dimethoxy-(4-methylpentyl)silane Chemical compound O=C=N[Si](OC)(OC)CCCC(C)C BYTCQKGPXREDTO-UHFFFAOYSA-N 0.000 description 1
- AWNDFZREUPYSIS-UHFFFAOYSA-N isocyanatomethoxy-dimethoxy-(3-methylbutyl)silane Chemical compound CC(C)CC[Si](OC)(OC)OCN=C=O AWNDFZREUPYSIS-UHFFFAOYSA-N 0.000 description 1
- HENJUOQEQGBPSV-UHFFFAOYSA-N isocyanatomethyl-dimethoxy-methylsilane Chemical compound CO[Si](C)(OC)CN=C=O HENJUOQEQGBPSV-UHFFFAOYSA-N 0.000 description 1
- PBOSTUDLECTMNL-UHFFFAOYSA-N lauryl acrylate Chemical compound CCCCCCCCCCCCOC(=O)C=C PBOSTUDLECTMNL-UHFFFAOYSA-N 0.000 description 1
- 239000004611 light stabiliser Substances 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- NEMFQSKAPLGFIP-UHFFFAOYSA-N magnesiosodium Chemical compound [Na].[Mg] NEMFQSKAPLGFIP-UHFFFAOYSA-N 0.000 description 1
- 238000003760 magnetic stirring Methods 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 150000007974 melamines Chemical class 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- 125000004184 methoxymethyl group Chemical group [H]C([H])([H])OC([H])([H])* 0.000 description 1
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 description 1
- 239000011859 microparticle Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- DNIAPMSPPWPWGF-UHFFFAOYSA-N monopropylene glycol Natural products CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 1
- 229910052901 montmorillonite Inorganic materials 0.000 description 1
- 238000010137 moulding (plastic) Methods 0.000 description 1
- PHQOGHDTIVQXHL-UHFFFAOYSA-N n'-(3-trimethoxysilylpropyl)ethane-1,2-diamine Chemical compound CO[Si](OC)(OC)CCCNCCN PHQOGHDTIVQXHL-UHFFFAOYSA-N 0.000 description 1
- MQWFLKHKWJMCEN-UHFFFAOYSA-N n'-[3-[dimethoxy(methyl)silyl]propyl]ethane-1,2-diamine Chemical compound CO[Si](C)(OC)CCCNCCN MQWFLKHKWJMCEN-UHFFFAOYSA-N 0.000 description 1
- FTWUXYZHDFCGSV-UHFFFAOYSA-N n,n'-diphenyloxamide Chemical compound C=1C=CC=CC=1NC(=O)C(=O)NC1=CC=CC=C1 FTWUXYZHDFCGSV-UHFFFAOYSA-N 0.000 description 1
- YFBFAHMPVMWKIM-UHFFFAOYSA-N n-(3-triethoxysilylpropyl)cyclohexanamine Chemical compound CCO[Si](OCC)(OCC)CCCNC1CCCCC1 YFBFAHMPVMWKIM-UHFFFAOYSA-N 0.000 description 1
- WUFHQGLVNNOXMP-UHFFFAOYSA-N n-(triethoxysilylmethyl)cyclohexanamine Chemical compound CCO[Si](OCC)(OCC)CNC1CCCCC1 WUFHQGLVNNOXMP-UHFFFAOYSA-N 0.000 description 1
- VNBLTKHUCJLFSB-UHFFFAOYSA-N n-(trimethoxysilylmethyl)aniline Chemical compound CO[Si](OC)(OC)CNC1=CC=CC=C1 VNBLTKHUCJLFSB-UHFFFAOYSA-N 0.000 description 1
- REODOQPOCJZARG-UHFFFAOYSA-N n-[[diethoxy(methyl)silyl]methyl]cyclohexanamine Chemical compound CCO[Si](C)(OCC)CNC1CCCCC1 REODOQPOCJZARG-UHFFFAOYSA-N 0.000 description 1
- 239000002105 nanoparticle Substances 0.000 description 1
- 230000003472 neutralizing effect Effects 0.000 description 1
- 150000002825 nitriles Chemical class 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- HMZGPNHSPWNGEP-UHFFFAOYSA-N octadecyl 2-methylprop-2-enoate Chemical compound CCCCCCCCCCCCCCCCCCOC(=O)C(C)=C HMZGPNHSPWNGEP-UHFFFAOYSA-N 0.000 description 1
- OTLDLKLSNZMTTA-UHFFFAOYSA-N octahydro-1h-4,7-methanoindene-1,5-diyldimethanol Chemical compound C1C2C3C(CO)CCC3C1C(CO)C2 OTLDLKLSNZMTTA-UHFFFAOYSA-N 0.000 description 1
- KCAMXZBMXVIIQN-UHFFFAOYSA-N octan-3-yl 2-methylprop-2-enoate Chemical compound CCCCCC(CC)OC(=O)C(C)=C KCAMXZBMXVIIQN-UHFFFAOYSA-N 0.000 description 1
- 125000001181 organosilyl group Chemical group [SiH3]* 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 239000000123 paper Substances 0.000 description 1
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 1
- GYDSPAVLTMAXHT-UHFFFAOYSA-N pentyl 2-methylprop-2-enoate Chemical compound CCCCCOC(=O)C(C)=C GYDSPAVLTMAXHT-UHFFFAOYSA-N 0.000 description 1
- ULDDEWDFUNBUCM-UHFFFAOYSA-N pentyl prop-2-enoate Chemical compound CCCCCOC(=O)C=C ULDDEWDFUNBUCM-UHFFFAOYSA-N 0.000 description 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- 150000003013 phosphoric acid derivatives Chemical class 0.000 description 1
- 239000004584 polyacrylic acid Substances 0.000 description 1
- 229920002239 polyacrylonitrile Polymers 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 229920000036 polyvinylpyrrolidone Polymers 0.000 description 1
- 239000001267 polyvinylpyrrolidone Substances 0.000 description 1
- 235000013855 polyvinylpyrrolidone Nutrition 0.000 description 1
- 238000003918 potentiometric titration Methods 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- HJWLCRVIBGQPNF-UHFFFAOYSA-N prop-2-enylbenzene Chemical compound C=CCC1=CC=CC=C1 HJWLCRVIBGQPNF-UHFFFAOYSA-N 0.000 description 1
- BOQSSGDQNWEFSX-UHFFFAOYSA-N propan-2-yl 2-methylprop-2-enoate Chemical compound CC(C)OC(=O)C(C)=C BOQSSGDQNWEFSX-UHFFFAOYSA-N 0.000 description 1
- LYBIZMNPXTXVMV-UHFFFAOYSA-N propan-2-yl prop-2-enoate Chemical compound CC(C)OC(=O)C=C LYBIZMNPXTXVMV-UHFFFAOYSA-N 0.000 description 1
- 125000002572 propoxy group Chemical group [*]OC([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
- NHARPDSAXCBDDR-UHFFFAOYSA-N propyl 2-methylprop-2-enoate Chemical compound CCCOC(=O)C(C)=C NHARPDSAXCBDDR-UHFFFAOYSA-N 0.000 description 1
- PNXMTCDJUBJHQJ-UHFFFAOYSA-N propyl prop-2-enoate Chemical compound CCCOC(=O)C=C PNXMTCDJUBJHQJ-UHFFFAOYSA-N 0.000 description 1
- 235000013772 propylene glycol Nutrition 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 239000002516 radical scavenger Substances 0.000 description 1
- 150000003254 radicals Chemical class 0.000 description 1
- 230000008439 repair process Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000000518 rheometry Methods 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 125000000467 secondary amino group Chemical group [H]N([*:1])[*:2] 0.000 description 1
- 238000007086 side reaction Methods 0.000 description 1
- 238000002444 silanisation Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000011877 solvent mixture Substances 0.000 description 1
- 241000894007 species Species 0.000 description 1
- 238000003892 spreading Methods 0.000 description 1
- 230000007480 spreading Effects 0.000 description 1
- 150000003440 styrenes Chemical class 0.000 description 1
- 229920001059 synthetic polymer Polymers 0.000 description 1
- 238000010345 tape casting Methods 0.000 description 1
- SJMYWORNLPSJQO-UHFFFAOYSA-N tert-butyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC(C)(C)C SJMYWORNLPSJQO-UHFFFAOYSA-N 0.000 description 1
- ISXSCDLOGDJUNJ-UHFFFAOYSA-N tert-butyl prop-2-enoate Chemical compound CC(C)(C)OC(=O)C=C ISXSCDLOGDJUNJ-UHFFFAOYSA-N 0.000 description 1
- 125000000383 tetramethylene group Chemical group [H]C([H])([*:1])C([H])([H])C([H])([H])C([H])([H])[*:2] 0.000 description 1
- RUELTTOHQODFPA-UHFFFAOYSA-N toluene 2,6-diisocyanate Chemical compound CC1=C(N=C=O)C=CC=C1N=C=O RUELTTOHQODFPA-UHFFFAOYSA-N 0.000 description 1
- 230000001988 toxicity Effects 0.000 description 1
- 231100000419 toxicity Toxicity 0.000 description 1
- FRGPKMWIYVTFIQ-UHFFFAOYSA-N triethoxy(3-isocyanatopropyl)silane Chemical compound CCO[Si](OCC)(OCC)CCCN=C=O FRGPKMWIYVTFIQ-UHFFFAOYSA-N 0.000 description 1
- JXUKBNICSRJFAP-UHFFFAOYSA-N triethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCOCC1CO1 JXUKBNICSRJFAP-UHFFFAOYSA-N 0.000 description 1
- UZIAQVMNAXPCJQ-UHFFFAOYSA-N triethoxysilylmethyl 2-methylprop-2-enoate Chemical compound CCO[Si](OCC)(OCC)COC(=O)C(C)=C UZIAQVMNAXPCJQ-UHFFFAOYSA-N 0.000 description 1
- QXJQHYBHAIHNGG-UHFFFAOYSA-N trimethylolethane Chemical compound OCC(C)(CO)CO QXJQHYBHAIHNGG-UHFFFAOYSA-N 0.000 description 1
- 229910021642 ultra pure water Inorganic materials 0.000 description 1
- 239000012498 ultrapure water Substances 0.000 description 1
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 description 1
- AVWRKZWQTYIKIY-UHFFFAOYSA-N urea-1-carboxylic acid Chemical group NC(=O)NC(O)=O AVWRKZWQTYIKIY-UHFFFAOYSA-N 0.000 description 1
- 150000003673 urethanes Chemical class 0.000 description 1
- 229920001567 vinyl ester resin Polymers 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 239000000080 wetting agent Substances 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/08—Processes
- C08G18/16—Catalysts
- C08G18/18—Catalysts containing secondary or tertiary amines or salts thereof
- C08G18/1883—Catalysts containing secondary or tertiary amines or salts thereof having heteroatoms other than oxygen and nitrogen
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/36—Successively applying liquids or other fluent materials, e.g. without intermediate treatment
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/36—Successively applying liquids or other fluent materials, e.g. without intermediate treatment
- B05D1/38—Successively applying liquids or other fluent materials, e.g. without intermediate treatment with intermediate treatment
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/02—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by baking
- B05D3/0209—Multistage baking
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D7/00—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
- B05D7/50—Multilayers
- B05D7/52—Two layers
- B05D7/53—Base coat plus clear coat type
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D7/00—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
- B05D7/50—Multilayers
- B05D7/52—Two layers
- B05D7/53—Base coat plus clear coat type
- B05D7/534—Base coat plus clear coat type the first layer being let to dry at least partially before applying the second layer
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/08—Processes
- C08G18/16—Catalysts
- C08G18/18—Catalysts containing secondary or tertiary amines or salts thereof
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
- C08G18/2805—Compounds having only one group containing active hydrogen
- C08G18/288—Compounds containing at least one heteroatom other than oxygen or nitrogen
- C08G18/289—Compounds containing at least one heteroatom other than oxygen or nitrogen containing silicon
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
- C08G18/40—High-molecular-weight compounds
- C08G18/62—Polymers of compounds having carbon-to-carbon double bonds
- C08G18/6216—Polymers of alpha-beta ethylenically unsaturated carboxylic acids or of derivatives thereof
- C08G18/625—Polymers of alpha-beta ethylenically unsaturated carboxylic acids; hydrolyzed polymers of esters of these acids
- C08G18/6254—Polymers of alpha-beta ethylenically unsaturated carboxylic acids and of esters of these acids containing hydroxy groups
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/70—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the isocyanates or isothiocyanates used
- C08G18/72—Polyisocyanates or polyisothiocyanates
- C08G18/73—Polyisocyanates or polyisothiocyanates acyclic
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/70—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the isocyanates or isothiocyanates used
- C08G18/72—Polyisocyanates or polyisothiocyanates
- C08G18/77—Polyisocyanates or polyisothiocyanates having heteroatoms in addition to the isocyanate or isothiocyanate nitrogen and oxygen or sulfur
- C08G18/778—Polyisocyanates or polyisothiocyanates having heteroatoms in addition to the isocyanate or isothiocyanate nitrogen and oxygen or sulfur silicon
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/70—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the isocyanates or isothiocyanates used
- C08G18/72—Polyisocyanates or polyisothiocyanates
- C08G18/77—Polyisocyanates or polyisothiocyanates having heteroatoms in addition to the isocyanate or isothiocyanate nitrogen and oxygen or sulfur
- C08G18/78—Nitrogen
- C08G18/79—Nitrogen characterised by the polyisocyanates used, these having groups formed by oligomerisation of isocyanates or isothiocyanates
- C08G18/791—Nitrogen characterised by the polyisocyanates used, these having groups formed by oligomerisation of isocyanates or isothiocyanates containing isocyanurate groups
- C08G18/792—Nitrogen characterised by the polyisocyanates used, these having groups formed by oligomerisation of isocyanates or isothiocyanates containing isocyanurate groups formed by oligomerisation of aliphatic and/or cycloaliphatic isocyanates or isothiocyanates
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- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
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- C08K3/32—Phosphorus-containing compounds
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- C09D175/00—Coating compositions based on polyureas or polyurethanes; Coating compositions based on derivatives of such polymers
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Description
(a)少なくとも1種のヒドロキシル基含有化合物(A)と、
(b)遊離及び/又はブロック化イソシアネート基を有する少なくとも1種の化合物(B)と、
(c)シラン基の架橋のための少なくとも1種の触媒(C)と、
を含む被覆剤であって、
1種又は1種より多い成分(A)及び/又は(B)、及び/又は被覆剤の少なくとも1種の更なる成分が、加水分解性シラン基を含む、被覆剤に関する。
高度な耐候安定度を有する網状組織につながる、特にOEM仕上げ及び自動車の再仕上げにおけるクリアコート層のための被覆剤であって、高耐酸性を確保するために加水分解及び天候に対して不安定な部分の望ましくない形成が非常に大きく抑制されている被覆剤を提供することが、本発明の目的であった。更に、被覆剤は、熱硬化の直後の引掻耐性が高度であり、且つ、特に引掻曝露後の光沢の保持率が高い被覆につながるべきである。その上、被覆及び被覆系、とりわけクリアコート系は、>40μmの膜厚でもストレスクラックが生じることなく製造することが可能であるべきである。これは、自動車OEM仕上げの技術的且つ審美的に特に要求が厳しい分野における、被覆及び被覆系、特にクリアコート系の使用のための主要な要件である。
従って、本発明は、当初は特定された種類の被覆剤であって、触媒(C)が、≧3のpKbと>100℃の沸点とを有するアミンでブロック化されるリン酸化合物、殊にリン酸又はホスホン酸である被覆剤を提供するものである。
適切なリン触媒(C)の例は、好ましくは非環式ホスホン酸ジエステル、環式ホスホン酸ジエステル、非環式ジホスホン酸ジエステル及び環式ジホスホン酸ジエステルから成る群からの、置換されたホスホン酸ジエステル及びジホスホン酸ジエステルである。この種類の触媒は、例えば独国特許出願DE−A−102005045228に記載されている。
−置換及び非置換の、1〜20個、好ましくは2〜16個、殊に2〜10個の炭素原子を有するアルキル−、3〜20個、好ましくは3〜16個、殊に3〜10個の炭素原子を有するシクロアルキル−、及び5〜20個、好ましくは6〜14個、殊に6〜10個の炭素原子を有するアリール−、
−置換及び非置換のアルキルアリール−、アリールアルキル−、アルキルシクロアルキル−、シクロアルキルアルキル−、アリールシクロアルキル−、シクロアルキルアリール−、アルキルシクロアルキルアリール−、アルキルアリールシクロアルキル−、アリールシクロアルキルアルキル−、アリールアルキルシクロアルキル−、シクロアルキルアルキルアリール−及びシクロアルキルアリールアルキル−(その中に存在するアルキル基、シクロアルキル基及びアリール基は、各場合において前述の炭素原子数を含む);及び
−酸素原子、硫黄原子、窒素原子、リン原子及びケイ素原子、殊に酸素原子、硫黄原子及び窒素原子から成る群から選択される少なくとも1個、殊に1個のヘテロ原子を含有し;且つ水素(部分エステル化)を表すことも可能な前述の種類の置換及び非置換の基−
から成る群から選択される]の非環式リン酸ジエステル(C)から成る群から選択される。
被覆剤の1種又は1種より多い成分が加水分解性シラン基を含有することは、本発明にとって必須である。被覆剤の1種又は1種より多い成分が、式(I)
G=同じ又は異なる加水分解基、
X=有機基、殊に1〜20個の炭素原子を有する直鎖状及び/又は分枝状アルキレン基又はシクロアルキレン基、非常に好ましくはX=1〜4個の炭素原子を有するアルキレン基、
R’’=アルキル、シクロアルキル、アリール又はアラルキル(炭素鎖が、隣接しない酸素基、硫黄基又はNRa基で遮断され得、Ra=アルキル、シクロアルキル、アリール又はアラルキル)、好ましくはR’’=アルキル基、殊に1〜6C原子を有するアルキル基、
x=0〜2、好ましくは0〜1、より好ましくはx=0]の1つ又はそれより多い同様の又は異なる構造単位を少なくとも部分的に含有する被覆剤は、この文脈において特に適切である。
R’=水素、アルキル又はシクロアルキル(炭素鎖が、隣接しない酸素基、硫黄基又はNRa基で遮断され得、Ra=アルキル、シクロアルキル、アリール又はアラルキル)、好ましくはR’=エチル及び/又はメチル、X、X’=1〜20個の炭素原子を有する直鎖状及び/又は分枝状アルキレン又はシクロアルキレン基、好ましくはX、X’=1〜4個の炭素原子を有するアルキレン基、
R’’=アルキル、シクロアルキル、アリール又はアラルキル(炭素鎖が、基酸素、硫黄基又はNRa基で遮断され得、Ra=アルキル、シクロアルキル、アリール又はアラルキル)、好ましくはR’’=アルキル基、殊に1〜6C原子を有するアルキル基、
n=0〜2、m=0〜2、m+n=2、及びx,y=0〜2]の少なくとも1つの構造単位と、構造単位(II)及び(III)の全体に対して2.5〜97.5モル%の式(III)
Z=−NH−、−NR−、−O−、ここで
R=アルキル、シクロアルキル、アリール又はアラルキル(炭素鎖が、隣接しない酸素基、硫黄基又はNRa基で遮断され得、Ra=アルキル、シクロアルキル、アリール又はアラルキル)、
x=0〜2、及び
X、R’、R’’は、式(II)について定義される通りである]の少なくとも1つの構造単位とを含む被覆剤が、より好ましい。
ヒドロキシル基含有化合物(A)として、低分子量ポリオール及び更にオリゴマーポリオール及び/又はポリマーポリオールを使用することが好ましい。
成分(B)として、本発明の被覆剤は、遊離、即ち非ブロック化、及び/又はブロック化イソシアネート基を有する1種又は1種より多い化合物を含む。好ましくは、本発明の被覆剤は、遊離イソシアネート基を有する化合物(B)を含む。しかしながら、イソシアナト含有化合物Bの遊離イソシアネート基は、ブロック化形態で使用してもよい。これは、好ましくは、本発明の被覆剤が一成分系として使用される場合である。
イソシアナト含有化合物Bの質量分率に対する用いられるヒドロキシル基含有化合物Aの質量分率は、ポリオールのヒドロキシ当量と、ポリイソシアネートBの遊離イソシアネート基の当量とに依存する。
−特にUV吸収剤;
−特に光安定剤(例えば、HALS化合物、ベンゾトリアゾール、オキサラニリド);
−遊離基捕捉剤;
−滑性付与剤;
−重合防止剤;
−泡制止剤;
−先行技術から周知であり且つ好ましくは−Si(OR)3基に対して不活性である種類の反応性希釈剤;
−湿潤剤(例えば、シロキサン、フッ素化合物、カルボン酸モノエステル、リン酸エステル、ポリアクリル酸及びそれらのコポリマー、ポリウレタン);
−付着促進剤(例えば、トリシクロデカンジメタノール);
−流れ調整剤;
−膜形成助剤(例えば、セルロース誘導体);
−充填剤(例えば、二酸化ケイ素、酸化アルミニウム又は酸化ジルコニウムに基づくナノ粒子;詳しくは、Roempp Lexikon"Lacke und Druckfarben"Georg Thieme Verlag,Stuttgart,1998,250〜252ページを参照すること;
−レオロジ制御添加剤(例えば、特許WO94/22968、EP−A−0276501、EP−A−0249201又はWO97/12945から知られている添加剤);例えばEP−A−0008127に開示される通りの架橋ポリマー微小粒子;無機フィロシリケート(例えば、ケイ酸マグネシウムアルミニウム、モンモリロナイト型のナトリウム−マグネシウム及びナトリウム−マグネシウム−フッ素−リチウムフィロシリケート);シリカ(例えば、Aerosils);又はイオン基及び/又は会合基を含有する合成ポリマー(例えば、ポリビニルアルコール、ポリ(メタ)アクリルアミド、ポリ(メタ)アクリル酸、ポリビニルピロリドン、スチレン−マレイン酸無水物コポリマー又はエチレン−マレイン酸無水物コポリマー及びそれらの誘導体、疎水的に改質されたエトキシル化ウレタン又はポリアクリレート);
−及び/又は難燃剤である。
シラン処理された硬化剤1:
バッチ:
−品目1:HDI(ヘキサメチル−1,6−ジイソシアネート)からの57.30g(0.100モル)のポリイソシアヌレート(Basonat(登録商標)HI 100)
−品目2:63.74gのソルベントナフサ(芳香族炭化水素の混合物)
−品目3:51.23g(0.150モル)のビス[3−(トリメトキシシリル)プロピル]アミン(Dynasilan 1124(登録商標))
撹拌磁石と内部温度計と滴下漏斗とを備えた250mL三つ口フラスコに、品目1及び2を投入する。窒素を生成しつつ還流下で室温で、透明で無色の溶液を撹拌する。品目3を、温度が60℃を超えて上昇しないような速度で徐々に滴下する。品目3の終了後、透明な帯黄色の溶液が存在する。温度は56℃であり、加熱された撹拌プレート及び油浴を使用して、温度を50〜60℃に4時間保つ。滴定によって遊離イソシアネート含量を決定する。31μm篩を使用して生成物を密封する。
バッチ:
−品目1:HDI(ヘキサメチル−1,6−ジイソシアネート)からの57.30g(0.100モル)のポリイソシアヌレート(Basonat(登録商標)HI 100)
−品目2:62.70gのソルベントナフサ(芳香族炭化水素の混合物)
−品目3:25.62g(0.075モル)のビス[3−(トリメトキシシリル)プロピル]アミン(Dynasilan 1124(登録商標))
−品目4:17.65g(0.075モル)のN−[3−(トリメトキシシリル)プロピル]ブチルアミン(Dynasilan 1189(登録商標))
撹拌磁石と内部温度計と滴下漏斗とを備えた250mL三つ口フラスコに、品目1及び2を投入する。窒素を生成しつつ還流下で室温で、透明で無色の溶液を撹拌する。品目3及び4の混合物を、温度が60℃を超えて上昇しないような速度で徐々に滴下する。品目3及び4の終了後、透明でわずかに帯黄色の溶液が存在する。温度は56℃であり、加熱された撹拌プレート及び油浴を使用して、温度を50〜60℃に4時間保つ。滴定によって遊離イソシアネート含量を決定する。31μm篩を使用して生成物を密封する。
トリエチルアミン系触媒:
バッチ:
−品目1:10.62g(0.105モル)のトリエチルアミン
−品目2:32.24g(0.100モル)のビス(2−エチルヘキシル)ホスフェート
−品目3:10.00g(0.100モル)のメチルイソブチルケトン
−品目4:10.00g(0.113モル)のエチルアセテート
撹拌磁石と内部温度計と滴下漏斗とを備えた100mL三つ口フラスコに、品目2、3及び4を投入する。窒素を生成しつつ還流下で室温で、透明で無色の溶液を撹拌する。品目1を、温度が45℃を超えて上昇しないような速度で徐々に滴下する。品目1の終了後、透明で無色の溶液が存在する。温度は40℃であり、加熱された撹拌プレート及び油浴を使用して、温度を3時間保つ。続いて、65℃及び20mbarで回転蒸発器によって溶媒(品目3及び4)を留去する。これにより、透明で無色の溶液を得る。収量は40.20g(94%)である。次いで、それをイソプロパノールで25%のnfAに調整する。(nfA=130℃で1時間後に重さを再測定することにより決定される非揮発性物質含量)。
−粘度η[mPas]:124.7mPas、T=23.0℃
−屈折率n:nD 20=1.4488
−酸価AN[mgKOH/g]:144mgKOH/g
−pH:pH=6;T=24℃
バッチ:
−品目1:11.78g(0.105モル)の1,4−ジアザビシクロ[2.2.2]オクタン[DABCO Crystal]
−品目2:32.24g(0.100モル)のビス(2−エチルヘキシル)ホスフェート
−品目3:10.00g(0.100モル)のメチルイソブチルケトン
−品目4:20.00g(0.226モル)のエチルアセテート
撹拌磁石と内部温度計と滴下漏斗とを備えた100mL三つ口フラスコに、品目1、3及び4を投入する。窒素を生成しつつ還流下で44℃で、品目1を撹拌し、溶解させる。品目2を、温度が50℃を超えて上昇しないような速度で徐々に滴下する。品目1の終了後、透明で淡黄色の溶液が存在する。温度は48℃であり、加熱された撹拌プレート及び油浴を使用して、温度を40℃に3時間保つ。続いて、65℃及び20mbarで回転蒸発器によって溶媒(品目3及び4)を留去する。これにより、室温で凝固する白色のゼラチン状の塊を得る。収量は41.00g(93%)である。
−酸価AN[mgKOH/g]:134mgKOH/g
−pH:pH=7;T=24℃
参考文献:
決定は、"Dissociation Constants in Water"及び更に以下の研究書:
A.Albert,E.P.Serjeant,Determination of lonization Constants,Chapter2:Determination of ionization constants by potentiometric titration using a glass electrode,Chapman and Hall,London(1984)のラインに沿って行う。
pKa=解離定数の負の対数
pH=H+イオン活量(およそH+イオン濃度)の負の対数、式中:
pH=−logcH+
cH+=モル/LでのH+イオンの濃度(測定されたpHから算出される。pHが7を越える場合、結果を算出する際にcH+を無視することができる。)
cOH-=モル/LでのOH-イオンの濃度(測定されたpHから算出される:pH+pOH=14。pHが7を下回る場合、結果を算出する際にcOH-を無視することができる。)
cS=初期質量によって与えられるモル/Lでの試験溶液における試験物質の総計濃度(固体濃度)
cMH=モル/Lでの滴定媒質MHの濃度[式中、Mは、一般にハロゲン(例えば、Cl、Br等)である]
c=モル/Lでの滴定媒質の目標濃度
t=滴定量
Vp=cSを調製する際のmLでの試料体積
2.1.1 天秤:Mettler AT 261 Wag 17
2.1.2 滴定装置:10mLの取替えユニットW20を備えたMetrohm DMS Titrino 716
2.1.3 複合ガラス電極:Metrohm 6.0203.100 EG 10
2.2.1 標準溶液:塩酸、
モル濃度c(HCl)=0.1モル/L、製造業者:Bernd Kraft、物品番号1044、滴定量t=1.0016、滴定量番号98/08/32
2.2.2 水、脱イオン化、BASF(ELGA−Maxima超純水プラント)
約0.09gの試験物質を正確に秤量し(第2項参照)、磁気撹拌しながら47.5mLの水(2.2.2)に溶解させた。次いで、約0.01Mの濃度cSを有する得られた溶液を、等量の塩酸(2.2.1)と徐々に混合する。得られたpHを決定し、第2項で得られた式を使用して表形式で評価する。
Claims (18)
- (a)反応基を有する少なくとも1種の結合剤(A)と、
(b)架橋すると共に結合剤(A)の反応基と反応し得る少なくとも1種の架橋剤(B)と、
(c)シラン基を架橋させるための少なくとも1種の触媒(C)と、を含む被覆剤であって、1種又は1種より多い成分(A)及び/又は(B)、及び/又は前記被覆剤の少なくとも1種の更なる成分が、加水分解性シラン基を含み、前記触媒(C)が、≧3のpKb及び>100℃の沸点を有する二環式アミンでブロック化される、リン酸化合物、リン酸及びホスホン酸からなる群より選ばれるいずれかであり、結合剤として少なくとも1種のヒドロキシル基含有化合物(A)と、架橋剤として遊離イソシアネート基及び/又はブロック化イソシアネート基を有する少なくとも1種の化合物(B)とを含む
ことを特徴とする、前記被覆剤。 - 前記リン酸化合物が、リン酸モノエステル及びリン酸ジエステルから成る群から選択されることを特徴とする、請求項1に記載の被覆剤。
- 触媒(C)が、アミンブロック化リン酸エチルヘキシル部分エステル及びアミンブロック化リン酸フェニル部分エステルの群から選択されることを特徴とする、請求項1に記載の被覆剤。
- 触媒(C)が、アミンブロック化リン酸ビス(エチルヘキシル)エステルから選択されることを特徴とする、請求項1に記載の被覆剤。
- 二環式アミンがジアザビシクロオクタンであることを特徴とする、請求項1から4までのいずれか1項に記載の被覆剤。
- 被覆剤の1種又は1種より多い成分が、構造単位(II)及び(III)の全体に対して2.5〜97.5モル%の式(II)
R’=水素、アルキル又はシクロアルキル(炭素鎖が、隣接しない酸素基、硫黄基又はNRa基で遮断され得、Ra=アルキル、シクロアルキル、アリール又はアラルキル)、
X、X’=1〜20個の炭素原子を有する直鎖状及び/又は分枝状アルキレン又はシクロアルキレン基、
R’’=アルキル、シクロアルキル、アリール又はアラルキル(炭素鎖が、隣接しない酸素基、硫黄基又はNRa基で遮断され得、Ra=アルキル、シクロアルキル、アリール又はアラルキル)、
n=0〜2、m=0〜2、m+n=2、及びx,y=0〜2]の少なくとも1つの構造単位と、
構造単位(II)及び(III)の全体に対して2.5〜97.5モル%の式(III)
Z=−NH−、−NR−、−O−、ここで
R=アルキル、シクロアルキル、アリール又はアラルキル(炭素鎖が、隣接しない酸素基、硫黄基又はNRa基で遮断され得、Ra=アルキル、シクロアルキル、アリール又はアラルキル)、
x=0〜2、及び
X、R’、R’’は、式(II)について定義される通りである]の少なくとも1つの構造単位とを含むことを特徴とする、請求項1から6までのいずれか1項に記載の被覆剤。 - 被覆剤の1種又は1種より多い成分が、各場合において構造単位(II)及び(III)の全体に対して5〜95モル%の式(II)の少なくとも1つの構造単位と、各場合において構造単位(II)及び(III)の全体に対して5〜95モル%の式(III)の少なくとも1つの構造単位とを含有することを特徴とする、請求項7に記載の被覆剤。
- ヒドロキシル基及びイソシアネート基の分率と、前記構造単位(II)及び(III)の分率とから得られる、各場合において前記被覆剤における架橋に重要な官能基の合計に対して、前記構造単位(II)及び(III)が、2.5〜97.5モル%の分率で存在することを特徴とする、請求項7又は8に記載の被覆剤。
- 前記ポリイソシアネート(B)が、前記構造単位(I)若しくは(II)若しくは(III)を有することを特徴とする、請求項6から9までのいずれか1項に記載の被覆剤。
- 前記ポリイソシアネート(B)において、
コアポリイソシアネート構造における2.5〜90モル%のイソシアネート基が、構造単位(II)に反応しており、及び
コアポリイソシアネート構造における2.5〜90モル%のイソシアネート基が、構造単位(III)に反応しており、
及び、コアポリイソシアネート構造における、構造単位(II)及び(III)に反応したイソシアネート基の総分率が、5〜95モル%であることを特徴とする、請求項10に記載の被覆剤。 - 前記コアポリイソシアネート構造が、1,6−ヘキサメチレンジイソシアネート、イソホロンジイソシアネート及び4,4’−メチレンジシクロヘキシルジイソシアネート、上述のポリイソシアネートのビウレットダイマー及び/又は上述のポリイソシアネートのイソシアヌレートトリマーの群から選択されることを特徴とする、請求項10又は11に記載の被覆剤。
- 前記ポリオール(A)が、少なくとも1種のポリ(メタ)アクリレートポリオールを含むことを特徴とする、請求項1から12までのいずれか1項に記載の被覆剤。
- 前記触媒(C)が、前記被覆剤の固形物含量に対して0.1質量%〜10質量%の量で被覆剤中に存在することを特徴とする、請求項1から13までのいずれか1項に記載の被覆剤。
- 前記触媒(C)が、前記被覆剤の固形物含量に対して0.1質量%〜3質量%の量で被覆剤中に存在することを特徴とする、請求項1から13までのいずれか1項に記載の被覆剤。
- 着色ベースコート層を、場合によりプレコートされた基材に塗布し、その後、請求項1から15までのいずれか1項に記載の被覆剤から成る層を塗布することを特徴とする、多段階被覆方法。
- 前記着色ベースコート層の塗布の後、塗布されたベースコートを最初に室温〜80℃までの温度で乾燥させ、請求項1から15までのいずれか1項に記載の被覆剤の塗布の後、1分間〜10時間までの時間、30〜200℃の温度で硬化させる、請求項16に記載の多段階被覆方法。
- クリアコートとしての、若しくは自動車のOEM仕上げ及び自動車の再仕上げのための請求項16又は17に記載の前記方法の適用としての、請求項1から15までのいずれか1項に記載の被覆剤の使用。
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CA (1) | CA2709317C (ja) |
DE (1) | DE102007061854A1 (ja) |
MX (1) | MX2010006001A (ja) |
PL (1) | PL2225299T3 (ja) |
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WO (1) | WO2009077180A1 (ja) |
Families Citing this family (36)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
BRPI0721288A2 (pt) * | 2006-12-19 | 2014-03-25 | Basf Coatings Ag | Agente de revestimento com resistência a arranhões e estabilidade ao intemperismo elevadas |
DE102007061856A1 (de) * | 2007-12-19 | 2009-06-25 | Basf Coatings Ag | Beschichtungsmittel mit hoher Kratzbeständigkeit und Witterungsstabilität |
DE102007061855A1 (de) * | 2007-12-19 | 2009-06-25 | Basf Coatings Ag | Beschichtungsmittel mit hoher Kratzbeständigkeit und Witterungsstabilität |
DE102008030304A1 (de) | 2008-06-25 | 2009-12-31 | Basf Coatings Ag | Verwendung teilsilanisierter Verbindungen auf Polyisocyanatbasis als Vernetzungsmittel in Beschichtungszusammensetzungen und Beschichtungszusammensetzung enthaltend die Verbindungen |
DE102010015675A1 (de) | 2010-04-21 | 2011-10-27 | Basf Coatings Gmbh | Beschichtungsmittel mit verbesserter Ablaufneigung |
BR112012026924A2 (pt) * | 2010-04-21 | 2016-07-12 | Basf Coatings Gmbh | agente de revestimento com alto teor de corpo sólido e bom nivelamento, bem como laqueamentos de multicamadas produzidos desse e seu uso |
IT1400108B1 (it) * | 2010-05-20 | 2013-05-17 | Acomon Ag | Catalizzatore di polimerizzazione per politiouretani, composizione liquida polimerizzabile e procedimento per la produzione di vetri organici politiouretanici ad alto indice di rifrazione |
KR20120044540A (ko) | 2010-10-28 | 2012-05-08 | 엘지전자 주식회사 | 태양전지 패널 및 이의 제조 방법 |
EP2665758B1 (de) * | 2011-01-20 | 2017-12-06 | BASF Coatings GmbH | Wässriges polyurethanbeschichtungsmittel und daraus hergestellte beschichtungen mit hoher kratzbeständigkeit und guter chemikalienbeständigkeit |
ES2684145T3 (es) * | 2011-11-17 | 2018-10-01 | Basf Coatings Gmbh | Materiales de recubrimiento que contienen diésteres de glicerina y su uso en pinturas de varias capas |
ES2670602T3 (es) | 2012-07-04 | 2018-05-31 | Basf Coatings Gmbh | Composición de laca clara que cura por vía térmica y con UV para el lacado de reparación de vehículos a motor |
WO2014016026A1 (de) | 2012-07-25 | 2014-01-30 | Basf Coatings Gmbh | Polyurethan-beschichtungsmittelzusammensetzung und ihre verwendung, mehrstufige beschichtungsverfahren |
MX2015000948A (es) * | 2012-07-25 | 2015-04-16 | Basf Coatings Gmbh | Composiciones de agente de revestimiento de poliuretano, metodos de revestimiento de varias etapas. |
CN104837568B (zh) * | 2012-12-03 | 2017-05-17 | 巴斯夫涂料有限公司 | 赋予效果和/或色彩的多层漆料以及其制备方法和其用途 |
WO2014086530A1 (de) * | 2012-12-03 | 2014-06-12 | Basf Coatings Gmbh | Beschichtungsmittelzusammensetzungen und daraus hergestellte beschichtungen mit hoher kratzfestigkeit bei gleichzeitig guter polierbarkeit und guten optischen eigenschaften sowie deren verwendung |
CA2929917C (en) * | 2013-12-03 | 2022-01-04 | Akzo Nobel Coatings International B.V. | Coating method for surfaces in chemical installations |
EP2896639A1 (de) | 2014-01-15 | 2015-07-22 | BASF Coatings GmbH | Beschichtete metallisierte Oberflächen |
CN105939848B (zh) * | 2014-02-28 | 2017-09-12 | 新日铁住金株式会社 | 预涂金属板、预涂金属板的制造方法以及连续涂装装置 |
US20170355876A1 (en) * | 2014-12-08 | 2017-12-14 | Basf Coatings Gmbh | Coating material compositions and coatings produced therefrom and also use thereof |
ES2740125T3 (es) * | 2014-12-08 | 2020-02-05 | Basf Coatings Gmbh | Composiciones no acuosas de agentes de recubrimiento, recubrimientos fabricados a partir de ellas, con resistencia a los arañazos y adherencia mejoradas, así como su uso |
KR102071433B1 (ko) | 2015-06-15 | 2020-01-30 | 바스프 코팅스 게엠베하 | 폴리우레탄 코팅제 조성물 및 다층 페인트 시스템의 제조를 위한 그의 용도 |
WO2017042177A1 (de) | 2015-09-09 | 2017-03-16 | Covestro Deutschland Ag | Kratzfeste 2k-pur-beschichtungen |
CN107922574B (zh) | 2015-09-09 | 2021-02-26 | 科思创德国股份有限公司 | 耐划伤水性2k pu涂料 |
EP3162827B1 (de) * | 2015-10-29 | 2018-06-06 | Evonik Degussa GmbH | Beschichtungsmittel mit monoallophanaten auf basis von alkoxysilanalkylisocyanaten |
CN109642009B (zh) | 2016-08-09 | 2021-12-10 | 科思创德国股份有限公司 | 硅烷官能的聚合聚氨酯 |
EP3305863A1 (de) * | 2016-10-07 | 2018-04-11 | Basf Se | Verfahren zur herstellung von in lösungsmitteln flockulationsstabilen polyisocyanaten von (cyclo)aliphatischen diisocyanaten |
WO2018104108A1 (en) | 2016-12-07 | 2018-06-14 | Basf Se | Composites comprising layers of nanoobjects and coating, preferably clear coating |
DE102017205444A1 (de) | 2017-03-30 | 2018-10-04 | Evonik Degussa Gmbh | Zusammensetzung umfassend ein Gemisch von Bis(triethoxysilylpropyl)amin und Bis(trimethoxysilylpropyl)amin sowie dessen Verwendung in einer 2K-Beschichtungszusammensetzung |
DE102019209307A1 (de) * | 2019-06-26 | 2020-12-31 | Karl Wörwag Lack- Und Farbenfabrik Gmbh & Co. Kg | Verfahren zur Beschichtung von Polycarbonatoberflächen |
EP3760658A1 (de) | 2019-07-03 | 2021-01-06 | Covestro Deutschland AG | Beständige 2k-pur-beschichtungen |
CN111019596B (zh) * | 2019-12-31 | 2021-12-21 | 广东皓明有机硅材料有限公司 | 加成型有机硅灌封胶室温粘接活性物及其制备方法与应用 |
JP7382300B2 (ja) * | 2020-10-28 | 2023-11-16 | 日本ペイント・オートモーティブコーティングス株式会社 | 2液型コーティング組成物 |
EP4108694A1 (de) | 2021-06-21 | 2022-12-28 | Covestro Deutschland AG | Beschichtungsmittel und daraus erhältliche beschichtungen mit verbesserten anschmutzungsresistenzen und (selbst-)reinigungseigenschaften |
EP4108695A1 (de) | 2021-06-21 | 2022-12-28 | Covestro Deutschland AG | Beschichtungsmittel und daraus erhältliche beschichtungen mit verbesserten anschmutzungsresistenzen und (selbst-)reinigungseigenschaften |
EP4108697A1 (de) | 2021-06-21 | 2022-12-28 | Covestro Deutschland AG | Beschichtungsmittel und daraus erhältliche beschichtungen mit verbesserten anschmutzungsresistenzen und (selbst-)reinigungseigenschaften |
EP4198094A1 (de) | 2021-12-20 | 2023-06-21 | Covestro Deutschland AG | Mehrschichtaufbau auf metallischen untergründen basierend auf polyaspartatbeschichtungen |
Family Cites Families (82)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3168483A (en) * | 1961-01-17 | 1965-02-02 | Air Prod & Chem | Diazabicyclooctane-alkylene oxide catalyst compositions |
US3707521A (en) | 1970-03-05 | 1972-12-26 | Essex Chemical Corp | Polyurethane sealant-primer system isocyanate-reactive surface primer composition for polyurethane sealants |
US3718614A (en) | 1971-02-23 | 1973-02-27 | American Cyanamid Co | Polymeric viscosity control additives for silica thixotropic compositions |
US3959403A (en) | 1975-03-31 | 1976-05-25 | General Electric Company | Process for making silarylenesilanediol, silarylenesiloxanediol and silarylenesiloxane-polydiorganosiloxane block copolymers |
DE2835451C2 (de) | 1978-08-12 | 1985-10-24 | Saarbergwerke AG, 6600 Saarbrücken | Verfahren zum Verfestigen von Kohle und/oder Gestein im Bergbau |
JPS5536216A (en) | 1978-09-05 | 1980-03-13 | Mitsubishi Gas Chem Co Inc | Curing of organoalkoxysilane compound |
US4479990A (en) | 1982-07-30 | 1984-10-30 | Westinghouse Electric Co. | Arc and track resistant articles utilizing photosensitive sag resistant cycloaliphatic epoxy resin coating compositions |
US4499150A (en) | 1983-03-29 | 1985-02-12 | Ppg Industries, Inc. | Color plus clear coating method utilizing addition interpolymers containing alkoxy silane and/or acyloxy silane groups |
US4499151A (en) | 1983-03-29 | 1985-02-12 | Ppg Industries, Inc. | Color plus clear coating method utilizing addition interpolymers containing alkoxy silane and/or acyloxy silane groups |
DE3328661A1 (de) * | 1983-08-09 | 1985-02-21 | Bayer Ag, 5090 Leverkusen | Verwendung von ammoniumsalzen als latente katalysatoren fuer die isocyanat-polyadditionsreaktion |
US4598131A (en) | 1984-12-19 | 1986-07-01 | Ppg Industries, Inc. | Catalysts for curable coating vehicle based upon aminoalkyloxy silanes and organic isocyanates |
US4710542A (en) | 1986-05-16 | 1987-12-01 | American Cyanamid Company | Alkylcarbamylmethylated amino-triazine crosslinking agents and curable compositions containing the same |
EP0249201A3 (en) | 1986-06-10 | 1989-07-19 | Union Carbide Corporation | High solids sag resistant cycloaliphatic epoxy coatings containing low molecular weight high tg organic polymeric sag resisting additives |
NO170944C (no) | 1987-01-24 | 1992-12-30 | Akzo Nv | Fortykkede, vandige preparater, samt anvendelse av slike |
US5250605A (en) | 1990-12-17 | 1993-10-05 | E. I. Du Pont De Nemours And Company | Coating compositions comprising an organosilane polymer and reactive dispersed polymers |
US5225248A (en) | 1991-05-13 | 1993-07-06 | E. I. Du Pont De Nemours And Company | Method of curing a topcoat |
DE4132430A1 (de) | 1991-09-28 | 1993-04-01 | Basf Lacke & Farben | Waessrige lacke und verfahren zur herstellung von automobildecklackierungen |
DE69301158T2 (de) | 1992-01-17 | 1996-05-30 | Kanegafuchi Chemical Ind | Härtbare Lackzusammensetzung |
JP3086737B2 (ja) | 1992-01-17 | 2000-09-11 | 鐘淵化学工業株式会社 | 塗料用硬化性組成物 |
DE4204518A1 (de) | 1992-02-15 | 1993-08-19 | Basf Lacke & Farben | Verfahren zur herstellung einer zweischichtigen lackierung und fuer dieses verfahren geeignete nicht-waessrige lacke |
JP3144872B2 (ja) | 1992-02-27 | 2001-03-12 | 鐘淵化学工業株式会社 | 硬化性組成物 |
GB9210653D0 (en) | 1992-05-19 | 1992-07-01 | Ici Plc | Silane functional oligomer |
US5238993A (en) | 1992-10-02 | 1993-08-24 | The Dow Chemical Company | Primer composition for improving the bonding of urethane adhesives to acid resistant paints |
DE4310413A1 (de) | 1993-03-31 | 1994-10-06 | Basf Lacke & Farben | Nichtwäßriger Lack und Verfahren zur Herstellung einer zweischichtigen Decklackierung |
DE4310414A1 (de) | 1993-03-31 | 1994-10-06 | Basf Lacke & Farben | Verfahren zur Herstellung einer zweischichtigen Decklackierung auf einer Substratoberfläche |
JP3482569B2 (ja) | 1994-06-14 | 2003-12-22 | 鐘淵化学工業株式会社 | 塗料用樹脂組成物、及び耐汚染性に優れた塗膜の形成方法 |
NZ303624A (en) | 1995-03-08 | 1999-01-28 | Du Pont | Reactive organosilicons as coatings, adhesives, and sealants |
WO1997012945A1 (en) | 1995-10-06 | 1997-04-10 | Cabot Corporation | Aqueous thixotropes for waterborne systems |
DE19624972C2 (de) | 1996-06-22 | 1998-06-04 | Herberts Gmbh | Wäßrige Dispersion von silanfunktionellen Polyurethanharzen, deren Herstellung und Verwendung |
US5747590A (en) | 1996-12-04 | 1998-05-05 | E. I. Du Pont De Nemours And Company | Acrylic-melamine-functionalized oligomer coating composition |
US5691439A (en) | 1996-12-16 | 1997-11-25 | Bayer Corporation | Low surface energy polyisocyanates and their use in one- or two-component coating compositions |
JPH10306251A (ja) | 1997-05-07 | 1998-11-17 | Kanegafuchi Chem Ind Co Ltd | 塗料用硬化性組成物およびそれを塗布してなる塗装物 |
SE510128C2 (sv) | 1997-06-26 | 1999-04-19 | Perstorp Ab | Förfarande för framställning av dendritisk polyol |
JPH11116847A (ja) * | 1997-10-09 | 1999-04-27 | Kanegafuchi Chem Ind Co Ltd | 上塗り塗料組成物およびその塗膜の形成方法 |
DE19908562A1 (de) * | 1998-03-25 | 1999-10-07 | Henkel Kgaa | Polyurethan und polyurethanhaltige Zubereitung |
US5952445A (en) | 1998-04-09 | 1999-09-14 | Bayer Corporation | Water dispersible compounds containing alkoxysilane groups |
US5985463A (en) | 1998-06-24 | 1999-11-16 | E.I. Du Pont De Nemours And Company | Coating containing hydroxy containing acrylosilane polymer to improve mar and acid etch resistance |
US6046270A (en) | 1998-10-14 | 2000-04-04 | Bayer Corporation | Silane-modified polyurethane resins, a process for their preparation and their use as moisture-curable resins |
DE19911326A1 (de) * | 1999-03-15 | 2000-09-28 | Fege Wolfgang | Vorrichtung zum Züchten von menschlichem oder tierischem Gewebe |
JP2002539305A (ja) * | 1999-03-17 | 2002-11-19 | イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー | 高固形分酸腐蝕抵抗性透明塗料組成物 |
BR0013294A (pt) | 1999-07-30 | 2002-04-02 | Ppg Ind Ohio Inc | Composições de revestimento tendo resistência a arranhamento aperfeiçoada, substratos revestidos e métodos relacionados a eles |
WO2001098393A1 (en) | 2000-06-22 | 2001-12-27 | Basf Corporation | Coating compositions having improved adhesion to aluminum substrates |
DE10048615A1 (de) | 2000-09-30 | 2002-04-11 | Degussa | Nichtwäßriges, wärmehärtendes Zweikomponenten-Beschichtungsmittel |
DE60116825T2 (de) * | 2000-10-13 | 2006-07-27 | Tosoh Corp., Shinnanyo | Katalysator zur Herstellung von einer Zwei-Komponenten Polyurethandichtungsmasse |
US6379807B1 (en) | 2000-11-07 | 2002-04-30 | E. I. Du Pont De Nemours And Company | Coating composition having improved acid etch resistance |
DE10103027A1 (de) | 2001-01-24 | 2002-07-25 | Bayer Ag | Zweikomponenten-Polyurethan-Bindemittel als Haftvermittler |
DE10132938A1 (de) * | 2001-07-06 | 2003-01-16 | Degussa | Nichtwässriges, wärmehärtendes Zweikomponenten-Beschichtungsmittel |
AT412090B (de) | 2002-01-29 | 2004-09-27 | Surface Specialties Austria | Hydroxyfunktionelle polyester |
DE10204523A1 (de) * | 2002-02-05 | 2003-08-07 | Bayer Ag | Alkoxysilan- und OH-Endgruppen aufweisende Polyurethanprepolymere mit erniedrigter Funktionalität, ein Verfahren zu ihrer Herstellung sowie ihre Verwendung |
DE10219508A1 (de) | 2002-04-30 | 2003-11-13 | Basf Ag | Verfahren zur Herstellung hochfunktioneller, hyperverzweigter Polyester |
US7056976B2 (en) | 2002-08-06 | 2006-06-06 | Huntsman International Llc | Pultrusion systems and process |
US20040077778A1 (en) | 2002-08-07 | 2004-04-22 | Isidor Hazan | One-pack primer sealer compositions for SMC automotive body panels |
DE10352907A1 (de) | 2002-11-15 | 2004-08-05 | Henkel Kgaa | Silylgruppen enthaltende Präpolymere, deren Herstellung und Verwendung in Montageschäumen |
DE10323206A1 (de) | 2003-05-22 | 2004-12-09 | Consortium für elektrochemische Industrie GmbH | Schäumbare Mischungen |
EP1496114A1 (de) | 2003-07-07 | 2005-01-12 | Margraf, Stefan, Dr.med. | Verfahren zur Inaktivierung von Mikroorganismen |
EP1502927A1 (de) | 2003-07-31 | 2005-02-02 | Sika Technology AG | Isocyanatfreie Primerzusammensetzung für Glas und Glaskeramiken |
DE10344448A1 (de) | 2003-09-25 | 2005-04-28 | Henkel Kgaa | Bindemittel mit Barriere-Eigenschaft |
US20050208312A1 (en) | 2004-03-17 | 2005-09-22 | Isidor Hazan | One-pack primer surfacer composition for SMC automotive body panels |
US20050238899A1 (en) | 2004-04-27 | 2005-10-27 | Isao Nagata | High solids clearcoat compositions containing silane functional compounds |
DE102004026904A1 (de) | 2004-06-01 | 2005-12-22 | Basf Ag | Hochfunktionelle, hoch- oder hyperverzweigte Polyester sowie deren Herstellung und Verwendung |
US7871669B2 (en) | 2004-08-30 | 2011-01-18 | E.I. Du Pont De Nemours And Company | Method for achieving a durable two-tone finish on a vehicle |
DE102004050747A1 (de) | 2004-10-19 | 2006-04-27 | Basf Coatings Ag | Beschichtungsmittel enthaltend Addukte mit Alkoxysilanfunktionalität |
DE102004050746A1 (de) | 2004-10-19 | 2006-04-20 | Basf Coatings Ag | Hochkratzfeste und hochelastische Beschichtungsmittel auf Basis von Alkoxysilan-funktionellen Komponenten |
DE102004050748A1 (de) | 2004-10-19 | 2006-04-20 | Basf Coatings Aktiengesellschaft | Hochkratzfeste und hochelastische Beschichtungsmittel auf Basis von Alkoxysilanen |
DE102005003299A1 (de) * | 2005-01-24 | 2006-07-27 | Goldschmidt Gmbh | Nanopartikel für die Herstellung von Polyurethanschaum |
WO2006099054A2 (en) | 2005-03-11 | 2006-09-21 | The Sherwin-Williams Company | Scratch resistant curable coating composition |
FR2886284B1 (fr) | 2005-05-30 | 2007-06-29 | Commissariat Energie Atomique | Procede de realisation de nanostructures |
DE102005026085A1 (de) | 2005-06-07 | 2006-12-14 | Construction Research & Technology Gmbh | Silan-modifizierte Harnstoff-Derivate, Verfahren zu ihrer Herstellung und deren Verwendung als Rheologiehilfsmittel |
FR2887996B1 (fr) | 2005-06-30 | 2007-08-17 | Prismaflex Internat Sa | Panneau de communication retroeclaire |
US7858190B2 (en) | 2005-09-15 | 2010-12-28 | Basf Coatings Gmbh | Thermosetting coating compositions with multiple cure mechanisms |
DE102005045228A1 (de) * | 2005-09-22 | 2007-04-05 | Basf Coatings Ag | Verwendung von Phosphonsäurediestern und Diphosphonsäurediestern sowie silangruppenhaltige, härtbare Gemische, enthaltend Phosphonsäurediester und Diphosphonsäurediester |
DE102006024823A1 (de) | 2006-05-29 | 2007-12-06 | Basf Coatings Ag | Verwendung von härtbaren Gemischen, enthaltend silangruppenhaltige Verbindungen sowie Phosphonsäurediester oder Diphosphonsäurediester, als Haftvermittler |
US20080075871A1 (en) | 2006-09-21 | 2008-03-27 | Ppg Industries Ohio, Inc. | Low temperature, moisture curable coating compositions and related methods |
BRPI0721288A2 (pt) | 2006-12-19 | 2014-03-25 | Basf Coatings Ag | Agente de revestimento com resistência a arranhões e estabilidade ao intemperismo elevadas |
DE102007013242A1 (de) | 2007-03-15 | 2008-09-18 | Basf Coatings Ag | Hochkratzfeste Beschichtung mit guter Witterungs- und Rissbeständigkeit |
DE102007026722A1 (de) | 2007-06-06 | 2008-12-11 | Basf Coatings Japan Ltd., Yokohama | Klarlackzusammensetzungen enthaltend hyperverzweigte, dendritische hydroxyfunktionelle Polyester |
DE102007061856A1 (de) | 2007-12-19 | 2009-06-25 | Basf Coatings Ag | Beschichtungsmittel mit hoher Kratzbeständigkeit und Witterungsstabilität |
DE102007061855A1 (de) | 2007-12-19 | 2009-06-25 | Basf Coatings Ag | Beschichtungsmittel mit hoher Kratzbeständigkeit und Witterungsstabilität |
DE102008030304A1 (de) | 2008-06-25 | 2009-12-31 | Basf Coatings Ag | Verwendung teilsilanisierter Verbindungen auf Polyisocyanatbasis als Vernetzungsmittel in Beschichtungszusammensetzungen und Beschichtungszusammensetzung enthaltend die Verbindungen |
DE102008060454A1 (de) | 2008-12-05 | 2010-06-10 | Basf Coatings Ag | Beschichtungsmittel und daraus hergestellte Beschichtungen mit hoher Kratzbeständigkeit und Witterungsstabilität sowie guten optischen Eigenschaften |
DE102009024103A1 (de) | 2009-06-06 | 2010-12-09 | Basf Coatings Gmbh | Beschichtungsmittel und daraus hergestellte Beschichtungen mit hoher Kratzfestigkeit und hoher Kocherstabilität |
DE102009030481A1 (de) | 2009-06-24 | 2011-01-05 | Basf Coatings Gmbh | Beschichtungsmittel und daraus hergestellte Beschichtungen mit hoher Kratzfestigkeit bei gleichzeitig guten Ergebnissen in der Prüfung der Erichsentiefung und guten Steinschlagschutzeigenschaften |
-
2007
- 2007-12-19 DE DE102007061854A patent/DE102007061854A1/de not_active Withdrawn
-
2008
- 2008-12-18 US US12/808,985 patent/US8808805B2/en active Active
- 2008-12-18 JP JP2010538458A patent/JP5523336B2/ja active Active
- 2008-12-18 MX MX2010006001A patent/MX2010006001A/es active IP Right Grant
- 2008-12-18 WO PCT/EP2008/010808 patent/WO2009077180A1/de active Application Filing
- 2008-12-18 PL PL08862756.7T patent/PL2225299T3/pl unknown
- 2008-12-18 CA CA2709317A patent/CA2709317C/en not_active Expired - Fee Related
- 2008-12-18 EP EP08862756.7A patent/EP2225299B1/de active Active
- 2008-12-18 CN CN200880121760.0A patent/CN101952337B/zh active Active
- 2008-12-18 RU RU2010129106/05A patent/RU2502769C2/ru not_active IP Right Cessation
- 2008-12-18 BR BRPI0821745A patent/BRPI0821745A8/pt not_active IP Right Cessation
- 2008-12-18 KR KR1020107016068A patent/KR101542248B1/ko active IP Right Grant
Also Published As
Publication number | Publication date |
---|---|
EP2225299B1 (de) | 2016-03-30 |
US8808805B2 (en) | 2014-08-19 |
EP2225299A1 (de) | 2010-09-08 |
RU2010129106A (ru) | 2012-01-27 |
PL2225299T3 (pl) | 2016-09-30 |
WO2009077180A1 (de) | 2009-06-25 |
JP2011509315A (ja) | 2011-03-24 |
KR101542248B1 (ko) | 2015-08-12 |
CA2709317C (en) | 2017-09-05 |
KR20100105855A (ko) | 2010-09-30 |
CN101952337A (zh) | 2011-01-19 |
MX2010006001A (es) | 2010-11-22 |
DE102007061854A1 (de) | 2009-06-25 |
CN101952337B (zh) | 2012-11-14 |
RU2502769C2 (ru) | 2013-12-27 |
BRPI0821745A2 (pt) | 2015-06-16 |
BRPI0821745A8 (pt) | 2019-01-29 |
CA2709317A1 (en) | 2009-06-25 |
US20110045190A1 (en) | 2011-02-24 |
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