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JP5597314B1 - Processing equipment - Google Patents

Processing equipment Download PDF

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JP5597314B1
JP5597314B1 JP2014049031A JP2014049031A JP5597314B1 JP 5597314 B1 JP5597314 B1 JP 5597314B1 JP 2014049031 A JP2014049031 A JP 2014049031A JP 2014049031 A JP2014049031 A JP 2014049031A JP 5597314 B1 JP5597314 B1 JP 5597314B1
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supply
stirring
processing region
processing
discharge port
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JP2015171694A (en
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和久 村田
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ヤマテック株式会社
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Priority to PCT/JP2015/057182 priority patent/WO2015137410A1/en
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    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00Treatment of water, waste water, or sewage
    • C02F1/38Treatment of water, waste water, or sewage by centrifugal separation
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01FMIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F23/00Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
    • B01F23/20Mixing gases with liquids
    • B01F23/23Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids
    • B01F23/233Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids using driven stirrers with completely immersed stirring elements
    • B01F23/2331Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids using driven stirrers with completely immersed stirring elements characterised by the introduction of the gas along the axis of the stirrer or along the stirrer elements
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01FMIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F23/00Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
    • B01F23/20Mixing gases with liquids
    • B01F23/23Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids
    • B01F23/233Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids using driven stirrers with completely immersed stirring elements
    • B01F23/2331Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids using driven stirrers with completely immersed stirring elements characterised by the introduction of the gas along the axis of the stirrer or along the stirrer elements
    • B01F23/23311Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids using driven stirrers with completely immersed stirring elements characterised by the introduction of the gas along the axis of the stirrer or along the stirrer elements through a hollow stirrer axis
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01FMIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F23/00Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
    • B01F23/20Mixing gases with liquids
    • B01F23/23Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids
    • B01F23/233Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids using driven stirrers with completely immersed stirring elements
    • B01F23/2331Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids using driven stirrers with completely immersed stirring elements characterised by the introduction of the gas along the axis of the stirrer or along the stirrer elements
    • B01F23/23314Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids using driven stirrers with completely immersed stirring elements characterised by the introduction of the gas along the axis of the stirrer or along the stirrer elements through a hollow stirrer element
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01FMIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F27/00Mixers with rotary stirring devices in fixed receptacles; Kneaders
    • B01F27/80Mixers with rotary stirring devices in fixed receptacles; Kneaders with stirrers rotating about a substantially vertical axis
    • B01F27/81Mixers with rotary stirring devices in fixed receptacles; Kneaders with stirrers rotating about a substantially vertical axis the stirrers having central axial inflow and substantially radial outflow
    • B01F27/811Mixers with rotary stirring devices in fixed receptacles; Kneaders with stirrers rotating about a substantially vertical axis the stirrers having central axial inflow and substantially radial outflow with the inflow from one side only, e.g. stirrers placed on the bottom of the receptacle, or used as a bottom discharge pump
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01FMIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F27/00Mixers with rotary stirring devices in fixed receptacles; Kneaders
    • B01F27/80Mixers with rotary stirring devices in fixed receptacles; Kneaders with stirrers rotating about a substantially vertical axis
    • B01F27/81Mixers with rotary stirring devices in fixed receptacles; Kneaders with stirrers rotating about a substantially vertical axis the stirrers having central axial inflow and substantially radial outflow
    • B01F27/811Mixers with rotary stirring devices in fixed receptacles; Kneaders with stirrers rotating about a substantially vertical axis the stirrers having central axial inflow and substantially radial outflow with the inflow from one side only, e.g. stirrers placed on the bottom of the receptacle, or used as a bottom discharge pump
    • B01F27/8111Mixers with rotary stirring devices in fixed receptacles; Kneaders with stirrers rotating about a substantially vertical axis the stirrers having central axial inflow and substantially radial outflow with the inflow from one side only, e.g. stirrers placed on the bottom of the receptacle, or used as a bottom discharge pump the stirrers co-operating with stationary guiding elements, e.g. surrounding stators or intermeshing stators
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01FMIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F27/00Mixers with rotary stirring devices in fixed receptacles; Kneaders
    • B01F27/80Mixers with rotary stirring devices in fixed receptacles; Kneaders with stirrers rotating about a substantially vertical axis
    • B01F27/87Mixers with rotary stirring devices in fixed receptacles; Kneaders with stirrers rotating about a substantially vertical axis the receptacle being divided into superimposed compartments
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00Treatment of water, waste water, or sewage
    • C02F1/001Processes for the treatment of water whereby the filtration technique is of importance
    • C02F1/004Processes for the treatment of water whereby the filtration technique is of importance using large scale industrial sized filters
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00Treatment of water, waste water, or sewage
    • C02F1/52Treatment of water, waste water, or sewage by flocculation or precipitation of suspended impurities
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2103/00Nature of the water, waste water, sewage or sludge to be treated
    • C02F2103/007Contaminated open waterways, rivers, lakes or ponds
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2103/00Nature of the water, waste water, sewage or sludge to be treated
    • C02F2103/34Nature of the water, waste water, sewage or sludge to be treated from industrial activities not provided for in groups C02F2103/12 - C02F2103/32
    • C02F2103/346Nature of the water, waste water, sewage or sludge to be treated from industrial activities not provided for in groups C02F2103/12 - C02F2103/32 from semiconductor processing, e.g. waste water from polishing of wafers
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F3/00Biological treatment of water, waste water, or sewage
    • C02F3/02Aerobic processes
    • C02F3/08Aerobic processes using moving contact bodies
    • C02F3/085Fluidized beds
    • C02F3/087Floating beds with contact bodies having a lower density than water
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04DNON-POSITIVE-DISPLACEMENT PUMPS
    • F04D7/00Pumps adapted for handling specific fluids, e.g. by selection of specific materials for pumps or pump parts
    • F04D7/02Pumps adapted for handling specific fluids, e.g. by selection of specific materials for pumps or pump parts of centrifugal type
    • F04D7/04Pumps adapted for handling specific fluids, e.g. by selection of specific materials for pumps or pump parts of centrifugal type the fluids being viscous or non-homogenous
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02WCLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO WASTEWATER TREATMENT OR WASTE MANAGEMENT
    • Y02W10/00Technologies for wastewater treatment
    • Y02W10/10Biological treatment of water, waste water, or sewage

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Hydrology & Water Resources (AREA)
  • Environmental & Geological Engineering (AREA)
  • Water Supply & Treatment (AREA)
  • Mechanical Engineering (AREA)
  • Analytical Chemistry (AREA)
  • Mixers Of The Rotary Stirring Type (AREA)
  • Biological Treatment Of Waste Water (AREA)
  • Filtration Of Liquid (AREA)

Abstract

【課題】各種流体に対する各種処理を簡便且つ効率的に行うことが可能な処理装置を提供する。
【解決手段】処理装置1は、被処理流体100に所定の処理を施すための処理領域10と、処理後の被処理流体100を排出するための排出口20と、処理領域10内に被処理流体100を供給するための供給用回転体40と、を備え、供給用回転体40は、処理領域10外に配置される処理領域外面40b、および処理領域10内に配置される処理領域内面40aを有し、回転軸Cを中心に回転する本体41と、処理領域外面40bに設けられる供給用吸入口42と、処理領域内面40aにおいて供給用吸入口42よりも回転軸Cから遠心方向外側の位置に設けられる供給用吐出口44と、供給用吸入口42と供給用吐出口44を繋ぐ供給用流通路46と、を備えている。
【選択図】図1
Disclosed is a processing apparatus capable of simply and efficiently performing various processes on various fluids.
A processing apparatus includes a processing region for performing a predetermined processing on a fluid to be processed, a discharge port for discharging the processed fluid after processing, and a processing target in the processing region. A supply rotator 40 for supplying the fluid 100. The supply rotator 40 includes a processing region outer surface 40b disposed outside the processing region 10 and a processing region inner surface 40a disposed within the processing region 10. A main body 41 that rotates about the rotation axis C, a supply suction port 42 provided in the processing region outer surface 40b, and is located on the processing region inner surface 40a on the outer side in the centrifugal direction from the rotation axis C with respect to the supply suction port 42. A supply discharge port 44 provided at a position, and a supply flow passage 46 connecting the supply suction port 42 and the supply discharge port 44 are provided.
[Selection] Figure 1

Description

本発明は、液体その他の各種流体に、例えば濾過処理等の所定の処理を施す処理装置に関する。   The present invention relates to a processing apparatus that performs predetermined processing such as filtration processing on liquid and other various fluids.

従来、半導体基板等を浸漬してエッチング処置等を行う基板処理槽では、処理液を基板処理槽からオーバーフロー(越流)させて回収し、ポンプによる圧送でフィルタを通して濾過処理を施した後に、再度基板処理槽に戻して再利用するといったことが行われている(例えば、特許文献1参照)。   Conventionally, in a substrate processing tank that immerses a semiconductor substrate or the like and performs an etching treatment or the like, the processing liquid overflows (overflows) from the substrate processing tank and is collected. For example, Patent Document 1 discloses that the substrate is returned to the substrate processing tank and reused.

また、各種排水の浄化を行う排水処理では、高分子凝集剤を投入することで排水中に含まれる油分等を含油スカムとして浮上させて分離し、コンベヤ状のフィルタで回収するといったことが行われている(例えば、特許文献2参照)。   Also, in wastewater treatment that purifies various wastewaters, the polymer flocculant is introduced to float and separate the oil contained in the wastewater as oil-impregnated scum and collect it with a conveyor-type filter. (For example, refer to Patent Document 2).

特開平7−99177号公報JP-A-7-99177 特開2010−29813号公報JP 2010-29813 A

しかしながら、上記特許文献1に記載されているような濾過処理方法では、管路の途中にポンプおよびフィルタを配置していることから、フィルタが突発的な目詰まりを起こしたような場合には、管路内の圧力が急激に上昇し、ポンプや管路の継手部等に破損が生じる可能性があるという問題があった。このため、管路内の圧力や流量等を常時測定してフィルタの目詰まり具合を常時監視しておく必要があるだけでなく、処理液の性質によっては、破損等により漏洩した処理液を外部に流出、飛散させないための対策が必要となり、設備コストと共に維持管理コストが上昇するという問題があった。   However, in the filtration method as described in Patent Document 1 above, since the pump and the filter are arranged in the middle of the pipeline, when the filter suddenly becomes clogged, There was a problem that the pressure in the pipe line suddenly increased, and the pump and the joint part of the pipe line might be damaged. For this reason, it is not only necessary to constantly measure the clogging of the filter by constantly measuring the pressure and flow rate in the pipe line, but depending on the nature of the processing liquid, the processing liquid leaked due to damage etc. Therefore, there is a problem that the maintenance management cost rises together with the equipment cost.

また、上記特許文献2に記載されているような排水処理方法では、高分子凝集剤の投入に手間とコストを要するだけでなく、フィルタの目詰まり等の不具合が容易に処理槽からの排水の溢れ出しを引き起こすことから、フィルタをこまめに監視、洗浄等すると共に、漏洩対策を施しておく必要があり、やはり設備コストおよび維持管理コストが上昇するという問題があった。   In addition, in the wastewater treatment method as described in Patent Document 2, not only labor and cost are required for introducing the polymer flocculant, but also problems such as clogging of the filter can be easily caused. Since it causes overflow, it is necessary to monitor and clean the filter frequently and to take countermeasures against leakage, which also increases the equipment cost and the maintenance cost.

また、上述の濾過処理や排水の浄化処理以外にも、例えば曝気や脱気、溶解等の各種処理をより簡便且つ効率的に行うことが可能な手法が望まれていた。   In addition to the above-described filtration treatment and wastewater purification treatment, a technique capable of performing various treatments such as aeration, deaeration, and dissolution more simply and efficiently has been desired.

本発明は、斯かる実情に鑑み、各種流体に対する各種処理を簡便且つ効率的に行うことが可能な処理装置を提供しようとするものである。   In view of such circumstances, the present invention intends to provide a processing apparatus capable of simply and efficiently performing various processes on various fluids.

(1)本発明は、被処理流体に所定の処理を施すための処理領域と、処理後の前記被処理流体を排出するための排出口と、前記処理領域内に前記被処理流体を供給するための供給用回転体と、を備え、前記供給用回転体は、前記処理領域外に配置される処理領域外面、および前記処理領域内に配置される処理領域内面を有し、回転軸を中心に回転する本体と、前記本体の前記処理領域外面に設けられる供給用吸入口と、前記本体の前記処理領域内面において前記供給用吸入口よりも前記回転軸から遠心方向外側の位置に設けられる供給用吐出口と、前記供給用吸入口と前記供給用吐出口を繋ぐように前記本体内に設けられる供給用流通路と、を備え、前記供給用回転体の前記本体は、前記処理領域の内外に跨がった状態で配置されることを特徴とする、処理装置である。 (1) In the present invention, a processing region for performing a predetermined process on the processing fluid, a discharge port for discharging the processed fluid after processing, and the processing fluid are supplied into the processing region. A rotating body for supply, the rotating body for supply having a processing region outer surface disposed outside the processing region and a processing region inner surface disposed within the processing region, and having a rotation axis as a center A main body that rotates in a rotating manner, a supply inlet provided on the outer surface of the processing area of the main body, and a supply provided on the inner surface of the processing area of the main body at a position on the outer side in the centrifugal direction from the rotation shaft than the supply inlet. And a supply flow passage provided in the main body so as to connect the supply suction port and the supply discharge port, and the main body of the supply rotating body is located inside and outside the processing region. Japanese to be placed in a straddle wants state To a processing device.

(2)本発明はまた、前記被処理流体を貯留する貯留領域の上部に配置されることを特徴とする、上記(1)に記載の処理装置である。   (2) The present invention is also the processing apparatus according to the above (1), characterized in that the processing apparatus is disposed in an upper part of a storage area for storing the fluid to be processed.

(3)本発明はまた、前記排出口よりも高い位置に設けられる越流口を備え、前記越流口は、前記処理領域から越流した前記被処理流体が前記貯留領域内に落下するように構成されることを特徴とする、上記(2)に記載の処理装置である。   (3) The present invention also includes an overflow port provided at a position higher than the discharge port, and the overflow port causes the fluid to be treated that has overflowed from the processing region to fall into the storage region. The processing apparatus according to (2), wherein the processing apparatus is configured as follows.

(4)本発明はまた、前記処理領域内において前記排出口と前記供給用回転体の間に配置されるフィルタを備えることを特徴とする、上記(1)乃至(3)のいずれかに記載の処理装置である。   (4) The present invention also includes a filter disposed between the discharge port and the supply rotating body in the processing region, according to any one of the above (1) to (3). It is a processing device.

(5)本発明はまた、前記供給用回転体は、前記本体の前記処理領域外面に設けられる攪拌用吸入口と、前記本体の前記処理領域外面において前記攪拌用吸入口よりも前記回転軸から遠心方向外側の位置に設けられる攪拌用吐出口と、前記攪拌用吸入口と前記攪拌用吐出口を繋ぐように前記本体内に設けられる攪拌用流通路と、を備えることを特徴とする、上記(1)乃至(4)のいずれかに記載の処理装置である。 (5) The present invention also relates to the supply rotary member includes a stirring inlet provided in the processing region exterior surface of the body, from the rotational axis than the stirring inlet in the processing region exterior surface of said body A stirring discharge port provided at a position outside in the centrifugal direction , and a stirring flow passage provided in the main body so as to connect the stirring suction port and the stirring discharge port. (1) It is a processing apparatus in any one of (4).

(6)本発明はまた、前記処理領域外において前記供給用回転体と同軸的に配置される攪拌用回転体を備え、前記攪拌用回転体は、前記回転軸を中心に回転する攪拌用本体と、前記攪拌用本体の表面に設けられる攪拌用吸入口と、前記攪拌用本体の表面において前記攪拌用吸入口よりも前記回転軸から遠心方向外側の位置に設けられる攪拌用吐出口と、前記攪拌用吸入口と前記攪拌用吐出口を繋ぐ攪拌用流通路と、を備えることを特徴とする、上記(1)乃至(4)のいずれかに記載の処理装置である。   (6) The present invention also includes an agitation rotator arranged coaxially with the supply rotator outside the processing region, and the agitation rotator rotates around the rotation axis. A stirring suction port provided on the surface of the stirring main body, a stirring discharge port provided on the surface of the stirring main body on the outer side in the centrifugal direction from the rotation shaft than the stirring suction port, The processing apparatus according to any one of (1) to (4), further comprising a stirring flow path connecting the stirring suction port and the stirring discharge port.

(7)本発明はまた、前記供給用回転体に対し、前記処理領域とは反対側の位置に配置される流動抵抗体を備えることを特徴とする、上記(1)乃至(6)に記載の処理装置である。   (7) The present invention also includes a flow resistor disposed at a position opposite to the processing region with respect to the supply rotator, as described in (1) to (6) above. It is a processing device.

(8)本発明はまた、前記供給用吐出口よりも前記回転軸から遠心方向外側の位置に配置される誘導部材を備えることを特徴とする、上記(1)乃至(7)のいずれかに記載の処理装置である。   (8) The present invention also includes a guide member disposed at a position on the outer side in the centrifugal direction from the rotation shaft with respect to the supply discharge port, according to any one of the above (1) to (7), It is a processing apparatus of description.

(9)本発明はまた、前記処理領域と前記排出口を繋ぐ排出用流通路を備えることを特徴とする、上記(1)乃至(8)のいずれかに記載の処理装置である。   (9) The present invention is also the processing apparatus according to any one of the above (1) to (8), further including a discharge flow passage connecting the processing region and the discharge port.

本発明に係る処理装置によれば、各種流体に対する各種処理を簡便且つ効率的に行うことが可能という優れた効果を奏し得る。   According to the processing apparatus which concerns on this invention, the outstanding effect that it can perform various processes with respect to various fluids simply and efficiently can be show | played.

本発明の実施の形態に係る処理装置の一例を示した概略断面図である。It is the schematic sectional drawing which showed an example of the processing apparatus which concerns on embodiment of this invention. (a)供給用回転体の平面図である。(b)供給用回転体の正面図(側面図)である。(A) It is a top view of the rotary body for supply. (B) It is a front view (side view) of the rotating body for supply. 処理装置の作用を示した概略断面図である。It is the schematic sectional drawing which showed the effect | action of the processing apparatus. (a)攪拌用吸入口を1つとし、供給用吸入口を複数設けるようにした場合の一例を示した平面図である。(b)供給用吸入口および攪拌用吸入口をそれぞれ複数設けるようにした場合の一例を示した平面図である。(c)供給用吸入口および攪拌用吸入口を互いに兼用するようにした場合の一例を示した正面図(側面図)である。(A) It is the top view which showed an example at the time of setting the suction inlet for stirring to one, and providing multiple suction inlets for supply. (B) It is the top view which showed an example at the time of providing a suction inlet for supply, and a plurality of suction inlets for stirring. (C) It is the front view (side view) which showed an example at the time of making it use the suction inlet for supply and the suction inlet for stirring mutually. (a)および(b)供給用回転体の処理領域内面および処理領域外面における半径方向寸法を互いに異ならせるようにした場合の例を示した正面図(側面図)である。(A) And (b) It is the front view (side view) which showed the example at the time of making it differ from each other in the radial direction in the process area inner surface and process area outer surface of a supply rotary body. (a)および(b)供給用回転体とは別に攪拌用回転体を設けるようにした場合の例を示した正面図(側面図)である。(A) And (b) It is the front view (side view) which showed the example at the time of providing the rotary body for stirring separately from the rotary body for supply. 貯留槽内に流動抵抗体を設けると共に、処理領域内に誘導部材を設けるようにした場合の一例を示した概略断面図である。It is the schematic sectional drawing which showed an example at the time of providing a flow resistance body in a storage tank, and providing a guide member in a process area | region. 処理領域の第1室の手前に前室を設け、供給用回転体の処理領域内面を前室内に配置するようにした場合の一例を示した概略断面図である。It is the schematic sectional drawing which showed an example at the time of providing a front chamber before the 1st chamber of a process area | region, and arrange | positioning the process area inner surface of the rotation body for supply in a front chamber. 処理領域と排出口の間に排出用流通路を設けるようにした場合の一例を示した概略断面図である。It is the schematic sectional drawing which showed an example at the time of providing a flow path for discharge | emission between a process area | region and a discharge port. 微生物を担持させた担体をフィルタに代えて処理領域内に配置するようにした場合の一例を示した概略断面図である。It is the schematic sectional drawing which showed an example at the time of replacing | exchanging the support | carrier which carry | supported microorganisms in a process area instead of a filter. 処理領域と貯留槽内との間を明確に仕切らないようにした場合の一例を示した概略断面図である。It is the schematic sectional drawing which showed an example at the time of making it not partition clearly between a process area | region and the inside of a storage tank.

以下、本発明の実施の形態を、添付図面を参照して説明する。   Hereinafter, embodiments of the present invention will be described with reference to the accompanying drawings.

まず、本実施形態に係る処理装置1の構造について説明する。図1は、処理装置1の一例を示した概略断面図である。本実施形態の処理装置1は、液体の被処理流体100を貯留する貯留領域である貯留槽110内から被処理流体100を取り出して濾過処理を施し、処理後の被処理流体100を貯留槽110に戻すものである。   First, the structure of the processing apparatus 1 according to the present embodiment will be described. FIG. 1 is a schematic cross-sectional view showing an example of the processing apparatus 1. The processing apparatus 1 of this embodiment takes out the to-be-processed fluid 100 from the storage tank 110 which is the storage area | region which stores the to-be-processed fluid 100 of a liquid, performs a filtration process, and stores the to-be-processed fluid 100 after a process into the storage tank 110. It is something to return to.

同図に示されるように、処理装置1は、被処理流体100に濾過処理を施すための処理領域10と、処理後の被処理流体100を貯留槽110内に戻すための排出口20と、処理領域10からオーバーフロー(越流)した被処理流体100を貯留槽110内に戻すための越流口30と、貯留槽110内から処理領域10内に被処理流体100を供給するための供給用回転体40と、を備えている。   As shown in the figure, the processing apparatus 1 includes a processing region 10 for subjecting the fluid 100 to be treated to filtration, a discharge port 20 for returning the treated fluid 100 after processing into the storage tank 110, and An overflow port 30 for returning the treated fluid 100 overflowed (overflow) from the processing region 10 into the storage tank 110 and a supply for supplying the treated fluid 100 from the storage tank 110 into the processing region 10 And a rotating body 40.

処理領域10は、貯留槽110の上部に配置される箱体12の内部空間であり、箱体12によって貯留槽110から略隔離された空間となっている。箱体12は、処理領域10を上方から覆う上壁12aと、処理領域10の下方から覆う底壁12bと、上壁12aおよび底壁12bを繋ぎ、処理領域10を側方から覆う側壁12cと、から構成されている。箱体12は、支持部材14を介して貯留槽110の上部に配置されており、底壁12bおよび側壁12cの下側の一部が貯留槽110内の被処理流体100に浸漬された状態となっている。   The processing region 10 is an internal space of the box 12 that is disposed above the storage tank 110, and is a space that is substantially isolated from the storage tank 110 by the box 12. The box 12 includes an upper wall 12a that covers the processing region 10 from above, a bottom wall 12b that covers the processing region 10 from below, a side wall 12c that connects the upper wall 12a and the bottom wall 12b, and covers the processing region 10 from the side. , Is composed of. The box 12 is disposed on the upper part of the storage tank 110 via the support member 14, and the bottom wall 12 b and a part of the lower side of the side wall 12 c are immersed in the fluid 100 to be processed in the storage tank 110. It has become.

処理領域10内には、被処理流体100を濾過し、不純物等を取り除くためのフィルタ16が配置されている。より詳細には、フィルタ16は、処理領域10を供給用回転体40側の第1室10aと、排出口20側の第2室10bに仕切るように配置されている。すなわち、本実施形態の処理装置1では、被処理流体100は、まず供給用回転体40によって第1室10a内に流入し、その後フィルタ16を通過して濾過された後に第2室10b内に流入し、最終的に排出口20を通過して再び貯留槽110に戻るようになっている。   A filter 16 for filtering the fluid 100 to be processed and removing impurities and the like is disposed in the processing region 10. More specifically, the filter 16 is disposed so as to partition the processing region 10 into a first chamber 10a on the supply rotator 40 side and a second chamber 10b on the discharge port 20 side. That is, in the processing apparatus 1 of the present embodiment, the fluid 100 to be processed flows into the first chamber 10a by the supplying rotator 40 first, then passes through the filter 16 and is filtered, and then into the second chamber 10b. It flows in, finally passes through the discharge port 20 and returns to the storage tank 110 again.

本実施形態では、処理領域10内に目の粗さの異なる3つのフィルタ16を配置するようにしている。フィルタ16は、上壁12aに設けられた扉(図示省略)を介して容易に取り外し可能となっており、洗浄や交換等のメンテナンスがきわめて容易となっている。なお、上壁12aに扉を設けるのではなく、上壁12aに開口を設け、この開口を介してフィルタ16を取り外すようにしてもよい。また、上壁12aを省略し、処理領域10の上部を開放状態とするようにしてもよい。   In the present embodiment, three filters 16 having different eye roughnesses are arranged in the processing region 10. The filter 16 can be easily removed through a door (not shown) provided on the upper wall 12a, and maintenance such as cleaning and replacement is extremely easy. Instead of providing a door on the upper wall 12a, an opening may be provided in the upper wall 12a, and the filter 16 may be removed through this opening. Further, the upper wall 12a may be omitted, and the upper portion of the processing region 10 may be opened.

排出口20は、箱体12の底壁12bに設けられた開口であり、第2室10bと貯留槽110を連通するように構成されている。なお、排出口20は、箱体12の側壁12cに設けられるものであってもよい。   The discharge port 20 is an opening provided in the bottom wall 12b of the box body 12, and is configured to communicate the second chamber 10b and the storage tank 110. The discharge port 20 may be provided on the side wall 12c of the box 12.

越流口30は、箱体12の第1室10a側の側壁に設けられた開口であり、排出口20よりも上方に設けられている。本実施形態では、箱体12を貯留槽110の上部に配置することにより、越流口30から流出した被処理流体100は、そのまま貯留槽110内に落下するようになっている。   The overflow port 30 is an opening provided on the side wall of the box 12 on the first chamber 10 a side, and is provided above the discharge port 20. In the present embodiment, by disposing the box 12 on the upper part of the storage tank 110, the fluid 100 to be processed that has flowed out of the overflow port 30 falls into the storage tank 110 as it is.

すなわち、本実施形態の処理装置1では、フィルタ16の目詰まりによってフィルタ16を通過可能な流量が極端に減少した場合にも、被処理流体100は越流口30を介して貯留槽110内にそのまま戻るようになっており、特別な漏洩対策等は不要となっている。なお、箱体12の上部の全体または一部を開放することにより、越流口30を構成するようにしてもよい。また、被処理流体100を貯留槽110内に誘導する適宜の配管や樋等を、越流口30に設けるようにしてもよい。   That is, in the processing apparatus 1 of the present embodiment, even when the flow rate that can pass through the filter 16 is extremely reduced due to the clogging of the filter 16, the fluid 100 to be processed enters the storage tank 110 through the overflow port 30. It returns as it is, and no special measures against leakage are required. Note that the overflow port 30 may be configured by opening all or part of the upper portion of the box 12. Moreover, you may make it provide in the overflow port 30 appropriate piping, a soot, etc. which guide | induce the to-be-processed fluid 100 in the storage tank 110. FIG.

供給用回転体40は、モータ等の駆動装置50に駆動されて回転することにより、貯留槽110内の被処理流体100を吸引し、処理領域10の第1室10a内に吐出するものである。また、本実施形態では、供給用回転体40に貯留槽110の被処理流体100を攪拌する機能も持たせるようにしている。供給用回転体40は、箱体12の底壁12bに設けられた略円形状の回転体用開口18内に挿通された状態で配置されており、上壁12aに固定された駆動装置50と駆動軸60を介して接続されている。   The supply rotator 40 is driven and rotated by a driving device 50 such as a motor, thereby sucking the fluid 100 to be processed in the storage tank 110 and discharging it into the first chamber 10 a of the processing region 10. . In the present embodiment, the supply rotating body 40 is also provided with a function of stirring the fluid 100 to be processed in the storage tank 110. The supply rotator 40 is disposed in a state of being inserted into a substantially circular rotator opening 18 provided in the bottom wall 12b of the box 12, and includes a driving device 50 fixed to the upper wall 12a. They are connected via a drive shaft 60.

図2(a)は、供給用回転体40の平面図であり、同図(b)は、供給用回転体40の正面図(側面図)である。これらの図に示されるように、供給用回転体40の本体41は、略円柱状に構成されており、本体41の表面は、略円形状の上面41aおよび底面41b、ならびに外周面である側面41cから構成されている。   FIG. 2A is a plan view of the supplying rotator 40, and FIG. 2B is a front view (side view) of the supplying rotator 40. FIG. As shown in these drawings, the main body 41 of the supplying rotator 40 is formed in a substantially cylindrical shape, and the surface of the main body 41 has a substantially circular upper surface 41a and a bottom surface 41b, and side surfaces that are outer peripheral surfaces. 41c.

供給用回転体40は、図2(b)に示されるように、箱体12の底壁12bに設けられた回転体用開口18内に挿通された状態で配置される。従って、本体41の上面41aおよび側面41cの上面41a側の部分は、処理領域10内に位置する処理領域内面40aとなっている。また、本体41の底面41bおよび側面41cの底面41b側の部分は、処理領域10外に位置する処理領域外面40bとなっている。なお、供給用回転体40と回転体用開口18との間には、パッキンやラビリンス等の適宜のシール機構を必要に応じて設けるようにしてもよい。   As shown in FIG. 2B, the supply rotator 40 is disposed in a state of being inserted into the rotator opening 18 provided in the bottom wall 12 b of the box 12. Accordingly, the upper surface 41 a of the main body 41 and the upper surface 41 a side of the side surface 41 c are the processing region inner surface 40 a located in the processing region 10. Further, the bottom surface 41 b of the main body 41 and the portions of the side surface 41 c on the bottom surface 41 b side are processing area outer surfaces 40 b located outside the processing area 10. An appropriate sealing mechanism such as packing or labyrinth may be provided between the supply rotator 40 and the rotator opening 18 as necessary.

本体41の表面には、1つの供給用吸入口42および複数の供給用吐出口44が設けられ、本体41の内部には、供給用吸入口42と各供給用吐出口44を繋ぐように形成された供給用流通路46が設けられている。本体41の表面にはさらに、複数の攪拌用吸入口43および複数の攪拌用吐出口45が設けられており、攪拌用吸入口43と攪拌用吐出口45を繋ぐ攪拌用流通路47が本体41の内部に設けられている。   A supply suction port 42 and a plurality of supply discharge ports 44 are provided on the surface of the main body 41, and the supply suction port 42 and each supply discharge port 44 are formed inside the main body 41. A supply flow passage 46 is provided. A plurality of stirring suction ports 43 and a plurality of stirring discharge ports 45 are further provided on the surface of the main body 41, and a stirring flow passage 47 connecting the stirring suction port 43 and the stirring discharge port 45 is provided in the main body 41. Is provided inside.

また、本体41の上面41aの中心には、駆動軸60が接続される接続部48が設けられている。従って、供給用回転体40は、駆動装置50に駆動され、中心軸Cを回転軸として回転するように構成されている。なお、駆動軸60と接続部48の接続方法は、例えば止めネジや係合、クランプ等、既知のいずれの方法であってもよい。   A connection portion 48 to which the drive shaft 60 is connected is provided at the center of the upper surface 41 a of the main body 41. Therefore, the supplying rotator 40 is driven by the driving device 50 and is configured to rotate about the central axis C as a rotation axis. In addition, the connection method of the drive shaft 60 and the connection part 48 may be any known method such as a set screw, engagement, or clamp.

供給用吸入口42は、処理領域外面40bの一部である底面41bの略中心に設けられ、中心軸Cと略同一方向に向けられている。供給用吐出口44は、処理領域内面40aの一部である側面41cの上面41a側に設けられている。本実施形態では、4つの供給用吐出口44を設けており、各供給用吐出口44は、供給用吸入口42に対して本体41の半径方向(遠心方向)外側となる位置(中心軸Cから中心軸Cに垂直な方向に離れた位置)に配置されている。また、供給用吐出口44は、中心軸Cに対して略直交する方向に向けられている。   The supply inlet 42 is provided substantially at the center of the bottom surface 41b, which is a part of the processing region outer surface 40b, and is directed in the same direction as the central axis C. The supply discharge port 44 is provided on the upper surface 41a side of the side surface 41c which is a part of the processing region inner surface 40a. In the present embodiment, four supply discharge ports 44 are provided, and each supply discharge port 44 is located outside the main body 41 in the radial direction (centrifugal direction) with respect to the supply suction port 42 (central axis C). At a position away from the center axis C in a direction perpendicular to the central axis C). Further, the supply discharge port 44 is directed in a direction substantially orthogonal to the central axis C.

供給用流通路46は、1つの供給用吸入口42と4つの供給用吐出口44を繋ぐトンネル状の通路として形成されている。従って、供給用流通路46は、供給用吸入口42から中心軸C方向に沿って直進した後に4つに分岐し、本体41の遠心方向に向けて直進して各吐出口44に到達するように形成されている。   The supply flow passage 46 is formed as a tunnel-like passage connecting one supply suction port 42 and four supply discharge ports 44. Accordingly, the supply flow passage 46 straightly travels along the direction of the central axis C from the supply suction port 42 and then branches into four, and travels straight in the centrifugal direction of the main body 41 to reach each discharge port 44. Is formed.

攪拌用吸入口43は、供給用吸入口42と同様に、処理領域外面40bの一部である底面41bに設けられている。本実施形態では、4つの攪拌用吸入口43を、中心軸Cを中心とする円周上に等間隔に並べて配置している。また、攪拌用吸入口43は、中心軸Cと略同一方向に向けられている。攪拌用吐出口45は、供給用吐出口44とは異なり、処理領域外面40bの一部である側面41cの底面41b側に設けられている。本実施形態では、4つの攪拌用吐出口45を設けており、各攪拌用吐出口45は、攪拌用吸入口43に対して本体41の半径方向(遠心方向)外側となる位置(中心軸Cから中心軸Cに垂直な方向に離れた位置)に配置されている。また、攪拌用吐出口45は、中心軸Cに対して略直交する方向に向けられると共に、周方向における位置が供給用吐出口44と略同一となるように配置されている。   The agitation suction port 43 is provided on the bottom surface 41b, which is a part of the processing region outer surface 40b, like the supply suction port 42. In the present embodiment, the four stirring inlets 43 are arranged on the circumference centered on the central axis C at equal intervals. Further, the stirring inlet 43 is directed in the substantially same direction as the central axis C. Unlike the supply discharge port 44, the stirring discharge port 45 is provided on the bottom surface 41b side of the side surface 41c that is a part of the processing region outer surface 40b. In the present embodiment, four agitation discharge ports 45 are provided, and each agitation discharge port 45 is located at a position (center axis C) that is radially outward (centrifugal) of the main body 41 with respect to the agitation suction port 43. At a position away from the center axis C in a direction perpendicular to the central axis C). In addition, the stirring discharge port 45 is oriented in a direction substantially orthogonal to the central axis C, and is disposed so that the position in the circumferential direction is substantially the same as the supply discharge port 44.

攪拌用流通路47は、1つの攪拌用吸入口43と1つの攪拌用吐出口45を繋ぐトンネル状の通路として形成されている。従って、本体41の内部には、4つの攪拌用流通路47が形成されている。本実施形態では、各攪拌用流通路47は、攪拌用吸入口43から中心軸C方向に沿って直進した後に直角に曲がり、本体41の遠心方向に向けて直進して攪拌用吐出口45に到達するように形成されている。   The stirring flow passage 47 is formed as a tunnel-shaped passage that connects one stirring suction port 43 and one stirring discharge port 45. Accordingly, four stirring flow passages 47 are formed inside the main body 41. In the present embodiment, each of the agitating flow passages 47 goes straight from the agitating suction port 43 along the direction of the central axis C and then bends at a right angle, and then goes straight in the centrifugal direction of the main body 41 to the agitating discharge port 45. Shaped to reach.

なお、以下の説明では、供給用吸入口42および攪拌用吸入口43をまとめて吸入口42、43と呼ぶ場合がある。同様に、供給用吐出口44および攪拌用吐出口45をまとめて吐出口44、45と、供給用流通路46および攪拌用流通路47をまとめて流通路46、47と、呼ぶ場合がある。   In the following description, the supply suction port 42 and the stirring suction port 43 may be collectively referred to as suction ports 42 and 43. Similarly, the supply discharge port 44 and the stirring discharge port 45 may be collectively referred to as discharge ports 44 and 45, and the supply flow passage 46 and the stirring flow passage 47 may be collectively referred to as flow passages 46 and 47.

被処理流体100中に供給用回転体40を浸漬して中心軸Cを中心に回転させると、流通路46、47内に進入した被処理流体100も供給用回転体40と共に回転することとなる。すると、流通路46、47内の被処理流体100に遠心力が作用し、図2(a)および(b)に示されるように、流通路46、47内の被処理流体100は供給用回転体40の半径方向外側に向けて流動する。   When the supply rotating body 40 is immersed in the processing target fluid 100 and rotated around the central axis C, the processing target fluid 100 that has entered the flow passages 46 and 47 also rotates together with the supplying rotating member 40. . Then, centrifugal force acts on the fluid 100 to be processed in the flow passages 46 and 47, and the fluid 100 to be processed in the flow passages 46 and 47 rotates for supply as shown in FIGS. 2 (a) and 2 (b). It flows toward the radially outer side of the body 40.

吐出口44、45は、吸入口42、43よりも供給用回転体40の半径方向外側に設けられているため、吐出口44、45では吸入口42、43よりも強い遠心力が働くこととなる。従って、被処理流体100は、供給用回転体40が回転している限り吸入口42、43から吐出口44、45に向けて流動する。すなわち、流通路46、47内の被処理流体100が吐出口44、45から噴出すると共に、外部の被処理流体100が吸入口42、43から流通路46、47内に吸引されることとなる。   Since the discharge ports 44 and 45 are provided on the radially outer side of the supply rotator 40 with respect to the suction ports 42 and 43, a centrifugal force stronger than that of the suction ports 42 and 43 acts on the discharge ports 44 and 45. Become. Accordingly, the fluid 100 to be treated flows from the suction ports 42 and 43 toward the discharge ports 44 and 45 as long as the supply rotator 40 rotates. That is, the fluid 100 to be processed in the flow passages 46 and 47 is ejected from the discharge ports 44 and 45, and the external fluid 100 to be processed is sucked into the flow passages 46 and 47 from the suction ports 42 and 43. .

供給用吸入口42は処理領域外面40bに設けられ、供給用吐出口44は処理領域内面40aに設けられている。従って、供給用回転体40が回転している限り、処理領域10外の被処理流体100は、供給用吸入口42から吸引されて供給用流通路46を通過し、供給用吐出口44から処理領域10内に噴出することとなる。すなわち、回転する供給用回転体40によって、貯留槽110内の被処理流体100が処理領域10内に供給される。   The supply suction port 42 is provided in the processing region outer surface 40b, and the supply discharge port 44 is provided in the processing region inner surface 40a. Therefore, as long as the supply rotator 40 is rotating, the fluid 100 to be processed outside the processing region 10 is sucked from the supply suction port 42, passes through the supply flow passage 46, and is processed from the supply discharge port 44. It will be ejected into the region 10. That is, the fluid 100 to be processed in the storage tank 110 is supplied into the processing region 10 by the rotating supply rotating body 40.

一方、攪拌用吸入口43および攪拌用吐出口45は、いずれも処理領域外面40bに設けられている。従って、供給用回転体40の回転によって攪拌用吸入口43に吸引された被処理流体100は、攪拌用流通路47を通過した後に攪拌用吐出口45から貯留槽110内に噴出することとなる。これにより、処理領域10外、すなわち貯留槽110内の被処理流体100には、供給用吸入口42および攪拌用吸入口43のある底面41bに向かう流動と共に、攪拌用吐出口45のある側面41cから放射状に広がる流動が発生することとなる。なお、底面41bに向かう流動は、攪拌用吸入口43の回転により比較的強い旋回流となる。   On the other hand, both the stirring inlet 43 and the stirring outlet 45 are provided on the processing region outer surface 40b. Accordingly, the fluid 100 to be treated sucked into the stirring suction port 43 by the rotation of the supply rotating body 40 is ejected from the stirring discharge port 45 into the storage tank 110 after passing through the stirring flow passage 47. . As a result, the fluid 100 to be processed outside the processing region 10, that is, in the storage tank 110, flows toward the bottom surface 41 b having the supply suction port 42 and the stirring suction port 43, and the side surface 41 c having the stirring discharge port 45. The flow that spreads radially from the bottom will occur. The flow toward the bottom surface 41 b becomes a relatively strong swirling flow due to the rotation of the stirring inlet 43.

本実施形態ではこのように、供給用回転体40によって被処理流体100を貯留槽110から処理領域10内に供給するだけでなく、貯留槽110内の被処理流体100に2種類の流動を発生させ、これにより、貯留槽110内の被処理流体100を適宜に攪拌するようにしている。そして、この結果、きわめて簡便な構成でありながらも、被処理流体100に対する濾過処理を、効率的に行うことを可能としている。   In the present embodiment, in this way, not only the supply target fluid 100 is supplied from the storage tank 110 into the processing region 10 by the supply rotating body 40, but also two types of flow are generated in the target fluid 100 in the storage tank 110. Thus, the fluid 100 to be processed in the storage tank 110 is appropriately agitated. As a result, it is possible to efficiently perform the filtering process on the fluid 100 to be processed, even though the configuration is very simple.

なお、本実施形態では、本体41を略円柱状に構成しているが、本体41の形状はこれに限定されるものではなく、例えば球状や半球状、多角柱状等、その他の任意の形状を採用することができる。また、吸入口42、43および吐出口44、45の形状(断面形状)は円形状に限定されるものではなく、例えば楕円形状や多角形状等、その他の形状であってもよい。また、流通路46、47の断面形状は、特に限定されるものではなく、吸入口42、43および吐出口44、45の形状や位置、または加工方法等に応じて適宜の形状に構成することができる。   In the present embodiment, the main body 41 is configured in a substantially cylindrical shape, but the shape of the main body 41 is not limited to this, and for example, any other shape such as a spherical shape, a hemispherical shape, a polygonal column shape, etc. Can be adopted. The shapes (cross-sectional shapes) of the suction ports 42 and 43 and the discharge ports 44 and 45 are not limited to a circular shape, and may be other shapes such as an elliptical shape and a polygonal shape. Further, the cross-sectional shape of the flow passages 46 and 47 is not particularly limited, and the flow passages 46 and 47 may be configured in an appropriate shape according to the shape and position of the suction ports 42 and 43 and the discharge ports 44 and 45, the processing method, or the like. Can do.

また、本実施形態では、加工のしやすさから流通路46、47を略直角に曲折するL字状に構成しているが、滑らかに湾曲した曲線状の通路として流通路46、47を構成するようにしてもよいし、吸入口42、43と吐出口44、45を直線的に繋ぐようにしてもよい。また、吸入口42、43、および吐出口44、45を中心軸Cまたは中心軸Cと直交する方向に対して斜め方向に向くように形成してもよい。   In the present embodiment, the flow passages 46 and 47 are formed in an L shape that bends at a substantially right angle for ease of processing, but the flow passages 46 and 47 are configured as smoothly curved curved passages. Alternatively, the suction ports 42 and 43 and the discharge ports 44 and 45 may be connected linearly. In addition, the suction ports 42 and 43 and the discharge ports 44 and 45 may be formed so as to be directed obliquely with respect to the central axis C or the direction orthogonal to the central axis C.

また、本実施形態では、本体41の流通路46、47以外の部分を中実に構成することで、本体41の強度を高めるようにしているが、本体41の流通路46、47以外の部分を中空状に構成するようにしてもよい。また、本体41を構成する材質は、特に限定されるものではなく、例えば金属やセラミックス、樹脂、ゴム、木材等、使用条件に応じた適宜の材質を採用することができる。   Further, in the present embodiment, the strength of the main body 41 is increased by configuring the portions other than the flow passages 46 and 47 of the main body 41 to be solid, but the portions other than the flow passages 46 and 47 of the main body 41 are increased. You may make it comprise in hollow shape. Moreover, the material which comprises the main body 41 is not specifically limited, For example, appropriate materials according to use conditions, such as a metal, ceramics, resin, rubber | gum, wood, etc., are employable.

次に、処理装置1の作用について説明する。図3は、処理装置1の作用を示した概略断面図である。上述のように、供給用回転体40を回転させることで、貯留槽110中の被処理流体100は処理領域10内に流入する。この結果、処理領域10内の圧力が上昇し、処理領域10内の液面は、貯留槽110内の液面よりも高くなる。すなわち、処理領域10内と貯留槽110内にヘッド差が生じ、このヘッド差によって、処理領域10内の被処理流体100は排出口20から貯留槽110内に流出する。   Next, the operation of the processing apparatus 1 will be described. FIG. 3 is a schematic sectional view showing the operation of the processing apparatus 1. As described above, the fluid 100 to be processed in the storage tank 110 flows into the processing region 10 by rotating the supply rotating body 40. As a result, the pressure in the processing region 10 increases, and the liquid level in the processing region 10 becomes higher than the liquid level in the storage tank 110. That is, a head difference occurs in the processing region 10 and the storage tank 110, and due to this head difference, the fluid 100 to be processed in the processing region 10 flows out from the discharge port 20 into the storage tank 110.

これにより、処理領域10内では、供給用回転体40が回転している限り、略定常的に被処理流体100が第1室10aからフィルタ16を通過して第2室10bに流入することとなり、この結果、被処理流体100に濾過処理が施されることとなる。また、第1室10a内では、供給用回転体40の本体41および供給用吐出口44の回転により、旋回流を含む複雑な流動が発生することとなるため、被処理流体100中の不純物等は、適宜に分散されることとなる。この結果、不純物等がフィルタ16の特定の部位に集中するといったことがなくなるため、濾過処理を効率的に行うことが可能となると共に、フィルタの寿命を延ばすことができる。   As a result, as long as the supply rotator 40 is rotating in the processing region 10, the fluid 100 to be processed flows from the first chamber 10a through the filter 16 into the second chamber 10b almost constantly. As a result, the fluid to be treated 100 is filtered. Further, in the first chamber 10a, a complicated flow including a swirling flow is generated by the rotation of the main body 41 of the supply rotating body 40 and the supply discharge port 44. Will be dispersed appropriately. As a result, impurities and the like are not concentrated on a specific part of the filter 16, so that the filtration process can be performed efficiently and the life of the filter can be extended.

一方、貯留槽110内では、排出口20からの流動に加え、下方から供給用回転体40に向かう旋回流および供給用回転体40から放射状に広がる流動より、複雑な循環流が発生することとなる。すなわち、貯留槽110内の被処理流体100は、十分に攪拌された状態で、処理領域10内に流入することとなるため、迅速且つ効率的に濾過処理が行われることとなる。   On the other hand, in the storage tank 110, in addition to the flow from the discharge port 20, a complicated circulation flow is generated from the swirling flow toward the supply rotator 40 from below and the flow spreading radially from the supply rotator 40. Become. That is, since the fluid 100 to be processed in the storage tank 110 flows into the processing region 10 in a sufficiently agitated state, the filtration process is performed quickly and efficiently.

特に、本実施形態では、供給用回転体40に攪拌用吸入口43、攪拌用吐出口45および攪拌用流通路47を設けているため、攪拌用吸入口43への吸引により発生する旋回流によって貯留槽110底部の沈降物を適宜に巻き上げて処理領域10内に送り込むことが可能であると共に、攪拌用吐出口45からの噴出によって貯留槽110内のより遠方の領域にまで攪拌作用を及ぼすことが可能となっている。すなわち、貯留槽110内の隅々に存在する不純物等を確実に処理領域10内に送り込むことができるため、より迅速且つ効率的に、濾過処理を行うことが可能となっている。   In particular, in the present embodiment, the supply rotating body 40 is provided with the agitation suction port 43, the agitation discharge port 45 and the agitation flow passage 47, so that the swirl flow generated by the suction to the agitation suction port 43 is caused. The sediment at the bottom of the storage tank 110 can be appropriately rolled up and fed into the treatment area 10 and the stirring action can be exerted on a farther area in the storage tank 110 by the ejection from the stirring outlet 45. Is possible. That is, since impurities and the like present in every corner of the storage tank 110 can be reliably sent into the processing region 10, it is possible to perform the filtration process more quickly and efficiently.

また、供給用回転体40は、タービン翼やプロペラ翼等とは異なり、破損しにくい形状となっていることから、砂利等を含む被処理流体100に濾過処理を施す場合にも、破損等による不具合が生じにくいものとなっている。すなわち、被処理流体100の状態によらず、迅速且つ確実に濾過処理を施すことが可能となっている。   In addition, unlike the turbine blade and the propeller blade, the supply rotor 40 has a shape that is not easily damaged. Therefore, even when the fluid to be processed 100 including gravel is subjected to a filtration process, the supply rotor 40 is damaged. It is difficult for problems to occur. That is, the filtration process can be performed quickly and reliably regardless of the state of the fluid 100 to be processed.

次に、処理装置1のその他の形態について説明する。まず、図4(a)は、攪拌用吸入口43を1つとし、供給用吸入口42を複数設けるようにした場合の一例を示した平面図である。上述の例では、中央に供給用吸入口42を1つ設け、その周囲に複数の攪拌用吸入口43を設ける場合を示したが、中央に攪拌用吸入口43を1つ設け、その周囲に供給用吸入口42を複数設けるようにしてもよい。被処理流体100の状態等によっては、このようにした方が供給および攪拌が効率的となる場合がある。   Next, other forms of the processing apparatus 1 will be described. First, FIG. 4A is a plan view showing an example in which one stirring suction port 43 is provided and a plurality of supply suction ports 42 are provided. In the above example, the case where one supply suction port 42 is provided at the center and a plurality of stirring suction ports 43 are provided around it is shown. However, one stirring suction port 43 is provided at the center and the surroundings are provided. A plurality of supply inlets 42 may be provided. Depending on the state of the fluid 100 to be processed, supply and stirring may be more efficient in this way.

なお、図4(a)に示す例では、供給用吸入口42および供給用吐出口44の周方向の位置をずらすことにより、供給用流通路46と攪拌用流通路47の干渉を避けるようにしているが、供給用吸入口42および供給用吐出口44のいずれか一方のみをずらすようにしてもよいし、供給用流通路46または攪拌用流通路47を迂回させて互いの干渉を避けるようにしてもよい。   In the example shown in FIG. 4A, the circumferential positions of the supply suction port 42 and the supply discharge port 44 are shifted so that interference between the supply flow passage 46 and the stirring flow passage 47 is avoided. However, only one of the supply suction port 42 and the supply discharge port 44 may be shifted, or the supply flow passage 46 or the stirring flow passage 47 may be bypassed to avoid mutual interference. It may be.

図4(b)は、供給用吸入口42および攪拌用吸入口43をそれぞれ複数設けるようにした場合の一例を示した平面図である。このように、供給用吸入口42を複数設けると共に攪拌用吸入口43を複数設けるようにしてもよく、この場合、吸入口42、43に向かう旋回流をより強くすることが可能となる。   FIG. 4B is a plan view showing an example in which a plurality of supply suction ports 42 and a plurality of stirring suction ports 43 are provided. As described above, a plurality of supply suction ports 42 and a plurality of stirring suction ports 43 may be provided. In this case, the swirling flow toward the suction ports 42 and 43 can be made stronger.

なお、図4(b)に示す例では、中心軸Cを中心とする同一円周上に供給用吸入口42および攪拌用吸入口43を交互に並べて配置するようにしているが、例えば供給用吸入口42および攪拌用吸入口43をそれぞれ異なる円周上に配置する等、その他の配置構成を採用するようにしてもよい。   In the example shown in FIG. 4B, the supply suction ports 42 and the stirring suction ports 43 are alternately arranged on the same circumference with the central axis C as the center. Other arrangement configurations, such as arranging the suction port 42 and the stirring suction port 43 on different circumferences, may be adopted.

図4(c)は、供給用吸入口42および攪拌用吸入口43を互いに兼用するようにした場合の一例を示した正面図(側面図)である。このように、供給用吸入口42および攪拌用吸入口43、ならびに供給用流通路46および攪拌用流通路47の一部を互いに兼用するようにしてもよい。被処理流体100の状態等によっては、このようにした方が供給および攪拌が効率的となる場合がある。   FIG. 4C is a front view (side view) showing an example in which the supply suction port 42 and the stirring suction port 43 are also used as one another. As described above, a part of the supply suction port 42 and the stirring suction port 43, and the supply flow passage 46 and the stirring flow passage 47 may be used together. Depending on the state of the fluid 100 to be processed, supply and stirring may be more efficient in this way.

このように、吸入口42、43および吐出口44、45の配置構成を適宜に設定することで、被処理流体100の状態等に応じた効率的な濾過処理を行うことが可能となる。なお、上述の例では、吸入口42、43および吐出口44、45を1つまたは4つ設ける場合を示したが、吸入口42、43および吐出口44、45の数はこれらに限定されるものではなく、その他の数であってもよいことは言うまでもない。   In this manner, by appropriately setting the arrangement configuration of the suction ports 42 and 43 and the discharge ports 44 and 45, it is possible to perform an efficient filtration process according to the state of the fluid 100 to be processed. In the above example, one or four suction ports 42 and 43 and discharge ports 44 and 45 are shown. However, the number of suction ports 42 and 43 and discharge ports 44 and 45 is limited to these. Needless to say, other numbers may be used.

図5(a)および(b)は、供給用回転体40の処理領域内面40aおよび処理領域外面40bにおける半径方向寸法を互いに異ならせるようにした場合の例を示した正面図(側面図)である。このようにすることで、中心軸Cから供給用吐出口44までの距離、および中心軸Cから攪拌用吐出口45までの距離を適宜に設定して、供給に作用する遠心力と攪拌に作用する遠心力を適宜に調整することが可能となる。すなわち、供給用回転体40による供給力と攪拌力を適宜にバランスさせることができるため、処理領域10および貯留槽110の大きさや形状等によらず、迅速且つ効率的な濾過処理が可能となる。   FIGS. 5A and 5B are front views (side views) showing an example in which the radial dimensions of the processing region inner surface 40a and the processing region outer surface 40b of the supply rotator 40 are made different from each other. is there. In this manner, the distance from the central axis C to the supply discharge port 44 and the distance from the central axis C to the stirring discharge port 45 are appropriately set, and the centrifugal force acting on the supply and the stirring action are affected. The centrifugal force to be adjusted can be adjusted appropriately. That is, since the supply force and the stirring force by the supply rotator 40 can be appropriately balanced, quick and efficient filtration can be performed regardless of the size and shape of the processing region 10 and the storage tank 110. .

図6(a)および(b)は、供給用回転体40とは別に攪拌用回転体70を設けるようにした場合の例を示した正面図(側面図)である。このように、供給用回転体40の本体41には、供給用吸入口42、供給用吐出口44および供給用流通路46のみを設けて供給専用とし、本体71(攪拌用本体)に攪拌用吸入口43、攪拌用吐出口45および攪拌用流通路47のみを備える攪拌専用の攪拌用回転体70を別途設けるようにしてもよい。   FIGS. 6A and 6B are front views (side views) showing an example in which a stirring rotator 70 is provided separately from the supply rotator 40. As described above, the main body 41 of the supply rotator 40 is provided with only the supply suction port 42, the supply discharge port 44 and the supply flow passage 46, and is dedicated to supply, and the main body 71 (main body for stirring) is used for stirring. A stirring-use rotating body 70 that is provided only with the suction port 43, the stirring discharge port 45, and the stirring flow passage 47 may be separately provided.

この場合、図6(a)に示されるように、延長した駆動軸60に攪拌用回転体70を接続するようにしてもよいし、図6(b)に示されるように、供給用回転体40に攪拌用回転体70を直接接続可能に構成するようにしてもよい。このようにすることで、供給用回転体40と攪拌用回転体70の組み合わせを容易に変更することできるため、供給力と攪拌力のバランスを容易に調整することが可能となる。なお、図6(b)に示す例においては、攪拌用回転体70に供給用吸入口42および供給用流通路46の一部を設け、攪拌用回転体70を供給用回転体40接続した場合に、これらが供給用回転体40に設けた供給用流通路46の一部および供給用吐出口44と連通するようにしてもよい。   In this case, as shown in FIG. 6 (a), a stirring rotator 70 may be connected to the extended drive shaft 60, or as shown in FIG. 6 (b), a supplying rotator. 40 may be configured such that the rotating body for stirring 70 can be directly connected. By doing in this way, since the combination of the supply rotary body 40 and the stirring rotary body 70 can be easily changed, the balance between the supply force and the stirring force can be easily adjusted. In the example shown in FIG. 6B, the stirring rotary body 70 is provided with a part of the supply inlet 42 and the supply flow passage 46, and the stirring rotary body 70 is connected to the supply rotary body 40. In addition, they may communicate with a part of the supply flow passage 46 provided in the supply rotating body 40 and the supply discharge port 44.

なお、攪拌用回転体70が必要ない場合には、これを省略するようにしてもよい。すなわち、処理装置1は、供給用吸入口42、供給用吐出口44および供給用流通路46のみが設けられた供給用回転体40のみを備えるものであってもよい。この場合にも、供給用吸入口42に向かう流動、および排出口20からの流動によって貯留槽110内を適宜に攪拌することが可能である。   In addition, when the rotating body for stirring 70 is not necessary, this may be omitted. That is, the processing apparatus 1 may include only the supply rotating body 40 provided with only the supply suction port 42, the supply discharge port 44, and the supply flow passage 46. Also in this case, the inside of the storage tank 110 can be appropriately stirred by the flow toward the supply suction port 42 and the flow from the discharge port 20.

図7は、貯留槽110内に流動抵抗体80を設けると共に、処理領域10内に誘導部材90を設けるようにした場合の一例を示した概略断面図である。流動抵抗体80は、貯留槽110内において供給用回転体40に向かう流動の抵抗となるものであり、供給用回転体40に対し、中心軸C方向において処理領域10の反対側に配置される。流動抵抗体80の形状および配置は特に限定されるものではなく、被処理流体100の状態および貯留槽110の大きさや形状等に応じた適宜の形状および配置を採用することができる。また、図7に示す例では、棒状の支持部材82を介して箱体12に流動抵抗体80を固定するようにしているが、例えば貯留槽110の底部112等、その他の部位に固定するようにしてもよいし、供給用回転体40に固定して流動抵抗体80を回転させるようにしてもよい。   FIG. 7 is a schematic cross-sectional view showing an example in which the flow resistor 80 is provided in the storage tank 110 and the guide member 90 is provided in the processing region 10. The flow resistor 80 becomes a resistance of the flow toward the supply rotator 40 in the storage tank 110, and is disposed on the opposite side of the processing region 10 in the central axis C direction with respect to the supply rotator 40. . The shape and arrangement of the flow resistor 80 are not particularly limited, and an appropriate shape and arrangement according to the state of the fluid 100 to be processed and the size and shape of the storage tank 110 can be employed. In the example shown in FIG. 7, the flow resistor 80 is fixed to the box 12 via the rod-shaped support member 82. However, the flow resistor 80 is fixed to other parts such as the bottom 112 of the storage tank 110. Alternatively, the flow resistor 80 may be rotated while being fixed to the supply rotator 40.

このように、流動抵抗体80を配置することで、供給用回転体40に向かう流動を適宜に乱すことができるため、攪拌効率を高めることが可能となる。また、図7に示されるように、略平板状の流動抵抗体80を貯留槽110の底部112近傍に配置することで、底部112近傍における旋回流を適宜に乱すことができるため、例えば比重の重い砂利等の不純物が略同じ場所で旋回し続けることで底部112が摩耗するといった不具合を防止することが可能となる。   In this manner, by arranging the flow resistor 80, the flow toward the supplying rotator 40 can be appropriately disturbed, so that the stirring efficiency can be increased. In addition, as shown in FIG. 7, by arranging the substantially flat flow resistor 80 in the vicinity of the bottom 112 of the storage tank 110, the swirling flow in the vicinity of the bottom 112 can be appropriately disturbed. It is possible to prevent a problem such that the bottom 112 is worn when impurities such as heavy gravel continue to turn at substantially the same place.

誘導部材90は、処理領域10の第1室10a内において供給用吐出口44からの流動を適宜の方向に誘導するものであり、供給用回転体40の外周側、すなわち供給用吐出口44よりも中心軸Cから遠心方向外側に配置される。このように、誘導部材90を適宜に配置することで、例えば供給用吐出口44からの流動がフィルタ16や箱体12の特定の箇所に集中するといったことを防止することができるため、フィルタ16や箱体12の損傷を防止すると共に、濾過処理の効率を高めることが可能となる。また、被処理流体100および不純物等の状態によっては、供給用吐出口44からの流動を直接または誘導部材90を介して積極的にフィルタ16に衝突させることによってフィルタ16の目詰まりを防止するようにしてもよい。   The guide member 90 guides the flow from the supply discharge port 44 in an appropriate direction in the first chamber 10 a of the processing region 10, and from the outer peripheral side of the supply rotating body 40, that is, from the supply discharge port 44. Is also arranged on the outer side in the centrifugal direction from the central axis C. Thus, by appropriately arranging the guide member 90, for example, it is possible to prevent the flow from the supply discharge port 44 from being concentrated on a specific portion of the filter 16 or the box body 12. It is possible to prevent damage to the box body 12 and increase the efficiency of the filtration process. In addition, depending on the state of the fluid 100 to be processed and impurities, the filter 16 is prevented from being clogged by causing the flow from the supply discharge port 44 to collide with the filter 16 directly or via the guide member 90. It may be.

なお、誘導部材90の形状および配置は特に限定されるものではなく、処理領域10の形状やフィルタ16の構成等に応じた適宜の形状および配置を採用することができる。また、誘導部材90は、箱体12に固定されるものであってもよいし、供給用回転体40に固定されるものであってもよい。また、図7では、処理装置1に流動抵抗体80と誘導部材90の両方を設けた場合の例を示したが、いずれか一方のみを処理装置1に設けるようにしてもよいことは言うまでもない。また、流動抵抗体80および誘導部材90は、それぞれ1つ設けられるものであってもよいし、複数設けられるものであってもよい。   In addition, the shape and arrangement | positioning of the guidance member 90 are not specifically limited, The appropriate | suitable shape and arrangement | positioning according to the shape of the process area | region 10, the structure of the filter 16, etc. are employable. Further, the guide member 90 may be fixed to the box body 12 or may be fixed to the supply rotating body 40. 7 shows an example in which both the flow resistor 80 and the guide member 90 are provided in the processing apparatus 1, but it goes without saying that only one of them may be provided in the processing apparatus 1. . Further, one each of the flow resistor 80 and the guide member 90 may be provided, or a plurality of the guide members 90 may be provided.

図8は、処理領域10の第1室10aの手前に前室10cを設け、供給用回転体40の処理領域内面40aを前室10c内に配置するようにした場合の一例を示した概略断面図である。この例では、箱体12の下側に、追加側壁12dおよび追加底壁12eを設けて前室10cを形成する共に、接続口10dによって前室10cと第1室10aを連通させるようにしている。そして、追加底壁12eに回転体用開口18を設け、これに挿通した状態で供給用回転体40を配置するようにしている。すなわち、被処理流体100は、一旦前室10c内に流入した後に第1室10a内に流入するようになっている。   FIG. 8 is a schematic cross-sectional view showing an example in which a front chamber 10c is provided in front of the first chamber 10a in the processing region 10 and the processing region inner surface 40a of the supply rotating body 40 is disposed in the front chamber 10c. FIG. In this example, an additional side wall 12d and an additional bottom wall 12e are provided below the box body 12 to form the front chamber 10c, and the front chamber 10c and the first chamber 10a are communicated with each other through the connection port 10d. . The rotating body opening 18 is provided in the additional bottom wall 12e, and the supplying rotating body 40 is arranged in a state of being inserted through the opening 18 for the rotating body. That is, the fluid 100 to be processed once flows into the front chamber 10c and then flows into the first chamber 10a.

このように、被処理流体100を一旦前室10c内に取り込んだ後に第1室10a内に流入させることで、前室10cを例えばバッファ空間として機能させる等、処理領域10内における流動をコントロールすることが可能となる。被処理流体100の状態によっては、このように処理領域10に前室10cを設けることにより、濾過処理の効率を向上させることが可能となる。   In this manner, the flow in the processing region 10 is controlled by, for example, causing the front chamber 10c to function as a buffer space by, for example, causing the fluid 100 to be processed to flow into the first chamber 10a after being taken into the front chamber 10c. It becomes possible. Depending on the state of the fluid 100 to be treated, the efficiency of the filtration process can be improved by providing the front chamber 10c in the treatment region 10 as described above.

なお、第1室10aに対して前室10cを離隔させて配置し、適宜の管路等を介して前室10cと第1室10aを接続するようにしてもよい。また、前室10cと第1室10aの間にさらに中間室を設けるようにしてもよいし、第2室10bの後に後室を設けるようにしてもよい。すなわち、処理領域10は、複数の室(空間)に分割されたものであってもよい。   Alternatively, the front chamber 10c may be arranged separately from the first chamber 10a, and the front chamber 10c and the first chamber 10a may be connected via an appropriate pipe line or the like. Further, an intermediate chamber may be further provided between the front chamber 10c and the first chamber 10a, or a rear chamber may be provided after the second chamber 10b. That is, the processing area 10 may be divided into a plurality of chambers (spaces).

図9は、処理領域10と排出口20の間に排出用流通路22を設けるようにした場合の一例を示した概略断面図である。この例では、配管22aを箱体12の底壁12bから延設することで排出用流通路22を形成し、排出口20を供給用回転体40から離隔した位置に配置するようにしている。配管22aの途中の3箇所に補助排出口20aを設け、濾過処理後の被処理流体100が複数箇所から貯留槽110内に流出するようにしている。   FIG. 9 is a schematic cross-sectional view showing an example in which a discharge flow path 22 is provided between the processing region 10 and the discharge port 20. In this example, the discharge flow passage 22 is formed by extending the pipe 22 a from the bottom wall 12 b of the box 12, and the discharge port 20 is disposed at a position separated from the supply rotating body 40. The auxiliary discharge ports 20a are provided at three locations in the middle of the pipe 22a so that the processed fluid 100 after the filtration process flows into the storage tank 110 from a plurality of locations.

このように、排出用流通路22を設けることで、濾過処理後の被処理流体100を、貯留槽110の大きさや形状等に応じた適切な位置に流出させることが可能となる。すなわち、排出口20および補助排出口20aからの流動と供給用回転体40による流動を適切に組み合わせ、両者を相乗的に作用させることによって貯留槽110内を適切に攪拌することで、濾過処理の効率を高めることが可能となる。   As described above, by providing the discharge flow passage 22, the treated fluid 100 after the filtration treatment can be discharged to an appropriate position according to the size, shape, and the like of the storage tank 110. That is, by appropriately combining the flow from the discharge port 20 and the auxiliary discharge port 20a and the flow by the supply rotating body 40 and synergistically acting both, the inside of the storage tank 110 is appropriately stirred, thereby Efficiency can be increased.

なお、排出用流通路22および排出口20はそれぞれ複数設けられるものであってもよいし、排出用流通路22を途中で分岐させて複数の排出口20を設けるようにしてもよい。また、補助排出口20aは、必要に応じて設ければよいことは言うまでもない。   Note that a plurality of discharge flow paths 22 and discharge ports 20 may be provided, or a plurality of discharge ports 20 may be provided by branching the discharge flow paths 22 on the way. Needless to say, the auxiliary outlet 20a may be provided as necessary.

図10は、微生物を担持させた担体120をフィルタ16に代えて処理領域10内に配置するようにした場合の一例を示した概略断面図である。この例では、排出口20および越流口30にそれぞれ担体120の流出防止用の網24、32を設け、微生物を担持させた複数の担体120を処理領域10内に浮遊させるようにしている。このようにすることで、処理領域10内において、被処理流体100の生物処理を行うことが可能となる。この場合、貯留槽110内の被処理流体100を適宜に攪拌するだけでなく、処理領域10内においても供給用吐出口44からの流動によって担体120を適宜に分散させることができるため、効率的な生物処理を行うことが可能となる。   FIG. 10 is a schematic cross-sectional view showing an example in which a carrier 120 carrying microorganisms is arranged in the processing region 10 instead of the filter 16. In this example, nets 24 and 32 for preventing outflow of the carrier 120 are provided at the discharge port 20 and the overflow port 30, respectively, and a plurality of carriers 120 carrying microorganisms are floated in the processing region 10. By doing so, it is possible to perform biological treatment of the fluid 100 to be treated within the treatment region 10. In this case, not only the fluid 100 to be processed in the storage tank 110 is appropriately stirred, but also the carrier 120 can be appropriately dispersed by the flow from the supply discharge port 44 in the processing region 10, which is efficient. Biological treatment can be performed.

さらに、図10に示されるように、例えば供給用流通路46に繋がる軸部流通路62および吸気口64を駆動軸60に設けることで、処理領域10内の被処理流体100に外気をきわめて容易に導入することができるため、好気性微生物を使用する生物処理であっても従来以上に効率的に行うことが可能となっている。なお、この場合さらに、排出口20の位置や個数を調整したり、誘導部材90を適宜に配置したりすることによって、担体120の浮遊状態を調整するようにしてもよい。また、例えば図6(a)に示した攪拌用回転体70を、処理領域10内に配置するようにしてもよい。また、担体120は、処理領域10内に固定されるものであってもよい。   Furthermore, as shown in FIG. 10, for example, by providing a shaft flow passage 62 and an intake port 64 connected to the supply flow passage 46 in the drive shaft 60, outside air can be very easily supplied to the fluid 100 to be processed in the processing region 10. Therefore, even biological treatment using aerobic microorganisms can be performed more efficiently than before. In this case, the floating state of the carrier 120 may be adjusted by adjusting the position and number of the discharge ports 20 or by appropriately arranging the guide member 90. Further, for example, the stirring rotator 70 shown in FIG. 6A may be arranged in the processing region 10. Further, the carrier 120 may be fixed within the processing region 10.

このように、処理装置1は、被処理流体100に対して濾過処理を施す場合に好適であるが、その他の各種処理を施すものであってもよい。例えば、処理装置1は、処理領域10において被処理流体100に対して曝気や脱気等の処理を施すものであってもよいし、処理領域10において被処理流体100に対して他の物体を投入し、溶解や反応等させる処理を施すものであってもよい。また、処理装置1は、処理領域10において被処理流体100と他の熱媒体との間で熱交換させる処理を施すものであってもよい。   Thus, although the processing apparatus 1 is suitable when performing the filtration process with respect to the to-be-processed fluid 100, you may perform other various processes. For example, the processing apparatus 1 may perform processing such as aeration and deaeration on the processing target fluid 100 in the processing region 10, or may apply other objects to the processing target fluid 100 in the processing region 10. It may be one that is charged and subjected to a treatment such as dissolution or reaction. Further, the processing apparatus 1 may perform a process of exchanging heat between the fluid 100 to be processed and another heat medium in the processing region 10.

図11は、処理領域10と貯留槽110内の間を明確に仕切らないようにした場合の一例を示した概略断面図である。この例では、支持部材14、16aに支持された4つのフィルタ16によって供給用回転体40の外周を囲み、この4つのフィルタ16によって囲まれた領域およびフィルタ16内を処理領域10としている。また、この例では、被処理流体100が流出するフィルタ16の外側面が排出口20となり、フィルタ16の上部が越流口30となる。なお、フィルタ16同士の間は隙間を設けるようにしてもよいし、塞ぐようにしてもよい。   FIG. 11 is a schematic cross-sectional view showing an example in which the processing region 10 and the storage tank 110 are not clearly partitioned. In this example, the outer periphery of the supply rotating body 40 is surrounded by the four filters 16 supported by the support members 14 and 16 a, and the region surrounded by the four filters 16 and the inside of the filter 16 are used as the processing region 10. In this example, the outer surface of the filter 16 from which the fluid 100 to be processed flows out becomes the discharge port 20, and the upper part of the filter 16 becomes the overflow port 30. Note that a gap may be provided between the filters 16 or may be closed.

このように、処理領域10は、貯留槽110内(貯留領域)から明確に隔離されたものである必要はなく、処理の種類によっては、例えば処理領域10と貯留槽110内との間の隔壁を必要な部分に限定して設けたり、フィルタ16等を隔壁として兼用したりするようにしてもよい。このようにすることで、処理装置1の構造をさらに簡素化し、コスト削減および設置の自由度を高めることが可能となる。   Thus, the processing area 10 does not have to be clearly isolated from the storage tank 110 (storage area), and depending on the type of processing, for example, a partition wall between the processing area 10 and the storage tank 110 May be provided only in necessary portions, or the filter 16 or the like may be used as a partition wall. By doing in this way, it becomes possible to further simplify the structure of the processing apparatus 1, and to reduce the cost and increase the degree of freedom of installation.

その他、図示は省略するが、処理装置1は、複数の供給用回転体40を備えるものであってもよく、この場合、各供給用回転体40の供給力および攪拌力は、同一であってもよいし、異なっていてもよい。また、供給用回転体40は、中心軸Cを略鉛直方向として配置されるものに限定されず、中心軸Cをその他の方向にして配置されるものであってもよい。   In addition, although illustration is abbreviate | omitted, the processing apparatus 1 may be provided with the some rotary body 40 for supply, and the supply force and stirring force of each rotary body 40 for supply are the same in this case It may be different or different. Further, the supplying rotator 40 is not limited to the one that is arranged with the central axis C as the substantially vertical direction, and may be arranged with the central axis C as the other direction.

また、例えば処理装置1に2つの供給用回転体40を設け、通常時は2つの供給用回転体40をそれぞれ定格の50%の回転数で回転させて使用し、いずれか一方の供給用回転体40またはその駆動装置50に不具合が生じた場合にはこれを停止させて、他方の供給用回転体40を定格の100%の回転数で回転させて使用するようにしてもよい。本実施形態の供給用回転体40では、プロペラ翼やタービン翼等とは異なり、供給力および攪拌力が回転数に略比例するようになっているため、このような構成とすることで、処理を中断することなく修理やメンテナンス等を行うことが可能となる。   Further, for example, the processing apparatus 1 is provided with two supply rotators 40, and in normal times, the two supply rotators 40 are rotated at a rotation speed of 50% of the rated value, respectively, and either one of the supply rotators 40 is rotated. When a problem occurs in the body 40 or its driving device 50, it may be stopped, and the other supply rotating body 40 may be rotated at a rotation speed of 100% of the rated value. In the supply rotating body 40 of the present embodiment, unlike the propeller blades and the turbine blades, the supply force and the stirring force are substantially proportional to the rotation speed. Repairs and maintenance can be performed without interruption.

また、処理装置1は、例えばタンクや容器等の貯留槽110に設置されるものに限定されず、例えば、湖沼や河川、海等に設置されるものであってもよい。また、被処理流体100は、液体に限定されず、例えば気体等、その他の流体であってもよいことは言うまでもない。また、排出口20は、被処理流体100の供給元とは異なる場所に処理後の被処理流体100を排出するものであってもよい。   Moreover, the processing apparatus 1 is not limited to what is installed in the storage tank 110, such as a tank and a container, for example, For example, you may install in a lake, a river, the sea, etc. Needless to say, the fluid 100 to be treated is not limited to a liquid, and may be another fluid such as a gas. Further, the discharge port 20 may discharge the processed fluid 100 after processing to a place different from the supply source of the processed fluid 100.

以上説明したように、本実施形態に係る処理装置1は、被処理流体100に所定の処理を施すための処理領域10と、処理後の被処理流体100を排出するための排出口20と、処理領域10内に被処理流体100を供給するための供給用回転体40と、を備え、供給用回転体40は、処理領域10外に配置される処理領域外面40b、および処理領域10内に配置される処理領域内面40aを有し、回転軸(中心軸C)を中心に回転する本体41と、処理領域外面40bに設けられる供給用吸入口42と、処理領域内面40aにおいて供給用吸入口42よりも回転軸(中心軸C)から遠心方向外側の位置に設けられる供給用吐出口44と、供給用吸入口42と供給用吐出口44を繋ぐ供給用流通路46と、を備えている。   As described above, the processing apparatus 1 according to the present embodiment includes the processing region 10 for performing a predetermined process on the processing target fluid 100, the discharge port 20 for discharging the processing target fluid 100 after processing, A supply rotator 40 for supplying the fluid 100 to be processed into the processing region 10, and the supply rotator 40 is disposed outside the processing region 10 and inside the processing region 10. A main body 41 having a processing region inner surface 40a disposed and rotating around a rotation axis (center axis C), a supply inlet 42 provided on the processing region outer surface 40b, and a supply inlet on the processing region inner surface 40a 42, a supply discharge port 44 provided at a position on the outer side in the centrifugal direction from the rotation axis (center axis C) than 42, and a supply flow passage 46 connecting the supply suction port 42 and the supply discharge port 44. .

このような構成とすることで、各種流体に対する各種処理を簡便且つ効率的に行うことができる。すなわち、供給用回転体40を設けることにより、装置全体をきわめて簡素且つ低コストに構成しながらも、被処理流体100を適宜に攪拌しつつ、処理領域10内に効率的に供給して処理することができる。また、処理領域10を被処理流体100の貯留領域に近接させて配置することが可能となるため、処理領域10からの被処理流体100の漏洩対策を簡略化し、設備コストおよび維持管理コストを削減することができる。   By setting it as such a structure, the various processes with respect to various fluids can be performed simply and efficiently. That is, by providing the supply rotating body 40, the entire apparatus is configured to be extremely simple and low cost, and the fluid 100 to be processed is appropriately supplied and processed into the processing region 10 while being appropriately stirred. be able to. Further, since it becomes possible to arrange the processing region 10 close to the storage region of the fluid 100 to be processed, measures for leakage of the fluid 100 to be processed from the processing region 10 are simplified, and equipment costs and maintenance costs are reduced. can do.

また、処理装置1は、被処理流体100を貯留する貯留領域(貯留槽110)の上部に配置されている。このようにすることで、処理領域10から漏洩した被処理流体100をそのまま落下させるだけで貯留領域に戻すことが可能となるため、被処理流体100の漏洩対策を簡略化し、設備コストおよび維持管理コストを削減することができる。   Moreover, the processing apparatus 1 is arrange | positioned at the upper part of the storage area | region (storage tank 110) which stores the to-be-processed fluid 100. FIG. By doing so, it becomes possible to return the treated fluid 100 leaked from the processing region 10 to the storage region simply by dropping it, so that the countermeasure for leakage of the treated fluid 100 is simplified, and the equipment cost and maintenance management are performed. Cost can be reduced.

また、処理装置1は、排出口20よりも高い位置に設けられる越流口30を備え、越流口30は、処理領域10から越流(オーバーフロー)した被処理流体100が貯留領域(貯留槽110)内に落下するように構成されている。このようにすることで、処理領域10内の不具合等により被処理流体100の流動が停滞したような場合にも、被処理流体100を処理領域10からオーバーフローさせて元の貯留領域に戻すことが可能となるため、安全性を高めると共に、設備コストおよび維持管理コストを削減することができる。   In addition, the processing apparatus 1 includes an overflow port 30 provided at a position higher than the discharge port 20, and the overflow port 30 stores a fluid to be processed 100 that overflows (overflows) from the processing region 10. 110). By doing in this way, even when the flow of the fluid 100 to be processed stagnate due to a defect in the processing region 10 or the like, the fluid 100 to be processed can overflow from the processing region 10 and return to the original storage region. Therefore, it is possible to improve safety and reduce equipment costs and maintenance costs.

また、処理装置1は、処理領域10内において排出口20と供給用回転体40の間に配置されるフィルタ16を備えている。供給用回転体40によれば、貯留領域内の被処理流体100に含まれる不純物等を被処理流体100と共に効率的に処理領域10内に供給することが可能であり、また、フィルタ16の目詰まり等による漏洩対策も容易であるため、処理装置1は、被処理流体100に対して濾過処理を施す場合に好適である。   In addition, the processing apparatus 1 includes a filter 16 disposed between the discharge port 20 and the supply rotating body 40 in the processing region 10. According to the supply rotator 40, it is possible to efficiently supply impurities and the like contained in the fluid 100 to be processed in the storage region together with the fluid 100 to be processed into the processing region 10, and the filter 16 Since it is easy to take measures against leakage due to clogging or the like, the processing apparatus 1 is suitable for performing a filtering process on the fluid 100 to be processed.

また、供給用回転体40は、前記処理領域外面40bに設けられる攪拌用吸入口43と、前記処理領域外面40bにおいて攪拌用吸入口43よりも回転軸(中心軸C)から遠心方向外側の位置に設けられる攪拌用吐出口45と、攪拌用吸入口43と攪拌用吐出口45を繋ぐ攪拌用流通路47と、を備えている。このようにすることで、貯留領域内の被処理流体100を効果的に攪拌した上で処理領域10内に供給することが可能となるため、被処理流体100に対する各種処理をより効率的に行うことができる。   Further, the supply rotating body 40 is provided with a stirring suction port 43 provided on the processing region outer surface 40b, and a position on the processing region outer surface 40b that is located on the outer side in the centrifugal direction from the rotation axis (center axis C) than the stirring suction port 43. And a stirring flow passage 47 that connects the stirring suction port 43 and the stirring discharge port 45 to each other. By doing in this way, it becomes possible to supply the process fluid 100 in the storage area | region 100, after effectively stirring the process fluid 100 in a storage area | region, Therefore Various processes with respect to the process fluid 100 are performed more efficiently. be able to.

また、処理装置1は、処理領域10外において供給用回転体40と同軸的に配置される攪拌用回転体70を備え、攪拌用回転体70は、回転軸(中心軸C)を中心に回転する攪拌用本体71と、攪拌用本体71の表面に設けられる攪拌用吸入口43と、攪拌用本体71の表面において攪拌用吸入口43よりも回転軸(中心軸C)から遠心方向外側の位置に設けられる攪拌用吐出口45と、攪拌用吸入口43と攪拌用吐出口45を繋ぐ攪拌用流通路47と、を備えるものであってもよい。このようにすることで、貯留領域内の被処理流体100を効果的に攪拌した上で処理領域10内に供給することが可能となるため、被処理流体100に対する各種処理をより効率的に行うことができる。   In addition, the processing apparatus 1 includes an agitation rotator 70 disposed coaxially with the supply rotator 40 outside the processing region 10, and the agitation rotator 70 rotates about a rotation axis (central axis C). Stirring main body 71, stirring suction port 43 provided on the surface of stirring main body 71, and position on the surface of stirring main body 71 on the outer side in the centrifugal direction from the rotation axis (center axis C) than stirring suction port 43. And a stirring flow passage 47 that connects the stirring suction port 43 and the stirring discharge port 45 to each other. By doing in this way, it becomes possible to supply the process fluid 100 in the storage area | region 100, after effectively stirring the process fluid 100 in a storage area | region, Therefore Various processes with respect to the process fluid 100 are performed more efficiently. be able to.

また、処理装置1は、供給用回転体40に対し、処理領域10とは反対側の位置に配置される流動抵抗体80を備えるものであってもよい。このようにすることで、貯留領域内の被処理流体100をより効果的に攪拌した上で処理領域10内に供給することができる。また、攪拌による流動に伴う貯留領域内の部材の摩耗や損傷等を低減することができる。   Further, the processing apparatus 1 may include a flow resistor 80 disposed at a position opposite to the processing region 10 with respect to the supply rotator 40. By doing in this way, the to-be-processed fluid 100 in a storage area | region can be supplied in the process area | region 10, after stirring more effectively. In addition, it is possible to reduce wear or damage of the members in the storage region due to the flow due to stirring.

また、処理装置1は、供給用吐出口44よりも回転軸(中心軸C)から遠心方向外側の位置に配置される誘導部材90を備えるものであってもよい。このようにすることで、処理領域10内における被処理流体100の流動を適切にコントロールし、各種処理の効率を高めることができる。また、処理領域10内の流動に伴う処理領域10内の部材の摩耗や損傷等を低減することができる。   Further, the processing apparatus 1 may include a guide member 90 that is disposed at a position on the outer side in the centrifugal direction from the rotation axis (center axis C) than the supply discharge port 44. By doing in this way, the flow of the to-be-processed fluid 100 in the process area | region 10 can be controlled appropriately, and the efficiency of various processes can be improved. In addition, it is possible to reduce wear or damage of the members in the processing region 10 due to the flow in the processing region 10.

また、処理装置1は、処理領域10と排出口20を繋ぐ排出用流通路22を備えるものであってもよい。このようにすることで、排出口20の位置を適宜に設定して排出口20からの流動と供給用回転体40による流動を相乗的に作用させることが可能となるため、貯留領域内をより効果的に攪拌し、各種処理の効率を高めることができる。   Further, the processing apparatus 1 may include a discharge flow path 22 that connects the processing region 10 and the discharge port 20. By doing so, it becomes possible to set the position of the discharge port 20 appropriately and synergize the flow from the discharge port 20 and the flow by the supply rotator 40, so It can stir effectively and can raise the efficiency of various treatments.

以上、本発明の実施の形態について説明したが、本発明の処理装置は、上記した実施の形態に限定されるものではなく、本発明の要旨を逸脱しない範囲内において種々変更を加え得ることは勿論である。例えば、箱体12、支持部材14およびフィルタ16その他の各部材の形状および配置構成等は、上記実施形態において示したものに限定されず、任意の形状および配置構成を採用することができる。また、上記実施形態において示した作用および効果は、本発明から生じる最も好適な作用および効果を列挙したものに過ぎず、本発明による作用および効果は、これらに限定されるものではない。   As mentioned above, although embodiment of this invention was described, the processing apparatus of this invention is not limited to above-described embodiment, In the range which does not deviate from the summary of this invention, it can add various changes. Of course. For example, the shape, arrangement configuration, and the like of the box 12, the support member 14, the filter 16, and other members are not limited to those shown in the above embodiment, and any shape and arrangement configuration can be adopted. In addition, the functions and effects shown in the above embodiment are merely a list of the most preferable functions and effects resulting from the present invention, and the functions and effects of the present invention are not limited to these.

本発明に係る処理装置は、液体その他の各種流体を取り扱う様々な分野において利用することができる。   The processing apparatus according to the present invention can be used in various fields for handling liquids and other various fluids.

1 処理装置
10 処理領域
16 フィルタ
20 排出口
22 排出用流通路
30 越流口
40 供給用回転体
40a 処理領域内面
40b 処理領域外面
41 供給用回転体の本体
42 供給用吸入口
43 攪拌用吸入口
44 供給用吐出口
45 攪拌用吐出口
46 供給用流通路
47 攪拌用流通路
70 攪拌用回転体
71 攪拌用回転体の本体
80 流動抵抗体
90 誘導部材
100 被処理流体
110 貯留槽
C 中心軸
DESCRIPTION OF SYMBOLS 1 Processing apparatus 10 Processing area | region 16 Filter 20 Discharge port 22 Discharge flow path 30 Overflow port 40 Supply rotating body 40a Processing area inner surface 40b Processing area outer surface 41 Main body of supply rotating body 42 Supply suction port 43 Stirring suction port 44 Supply Discharge Port 45 Agitation Discharge Port 46 Supply Flow Path 47 Stir Flow Path 70 Stirring Rotor 71 Stirring Rotor Main Body 80 Flow Resistor 90 Guiding Member 100 Processed Fluid 110 Storage Tank C Center Axis

Claims (9)

被処理流体に所定の処理を施すための処理領域と、
処理後の前記被処理流体を排出するための排出口と、
前記処理領域内に前記被処理流体を供給するための供給用回転体と、を備え、
前記供給用回転体は、
前記処理領域外に配置される処理領域外面、および前記処理領域内に配置される処理領域内面を有し、回転軸を中心に回転する本体と、
前記本体の前記処理領域外面に設けられる供給用吸入口と、
前記本体の前記処理領域内面において前記供給用吸入口よりも前記回転軸から遠心方向外側の位置に設けられる供給用吐出口と、
前記供給用吸入口と前記供給用吐出口を繋ぐように前記本体内に設けられる供給用流通路と、を備え、
前記供給用回転体の前記本体は、前記処理領域の内外に跨がった状態で配置されることを特徴とする、
処理装置。
A processing region for applying a predetermined process to the fluid to be processed;
A discharge port for discharging the treated fluid after treatment;
A supply rotator for supplying the fluid to be processed into the processing region,
The rotating body for supply is
A main body having a processing region outer surface disposed outside the processing region and a processing region inner surface disposed within the processing region, and rotating about a rotation axis;
A supply inlet provided on the outer surface of the processing region of the main body ;
A supply discharge port provided at a position on the outer side in the centrifugal direction from the rotation shaft with respect to the supply suction port on the inner surface of the processing region of the main body ;
A supply flow passage provided in the main body so as to connect the supply suction port and the supply discharge port;
The main body of the supply rotating body is arranged in a state straddling the inside and outside of the processing region ,
Processing equipment.
前記被処理流体を貯留する貯留領域の上部に配置されることを特徴とする、
請求項1に記載の処理装置。
It is arranged at the upper part of the storage area for storing the fluid to be processed,
The processing apparatus according to claim 1.
前記排出口よりも高い位置に設けられる越流口を備え、
前記越流口は、前記処理領域から越流した前記被処理流体が前記貯留領域内に落下するように構成されることを特徴とする、
請求項2に記載の処理装置。
An overflow port provided at a position higher than the discharge port,
The overflow port is configured such that the fluid to be processed that has overflowed from the processing region falls into the storage region,
The processing apparatus according to claim 2.
前記処理領域内において前記排出口と前記供給用回転体の間に配置されるフィルタを備えることを特徴とする、
請求項1乃至3のいずれかに記載の処理装置。
In the processing region, comprising a filter disposed between the discharge port and the supply rotator,
The processing apparatus according to claim 1.
前記供給用回転体は、
前記本体の前記処理領域外面に設けられる攪拌用吸入口と、
前記本体の前記処理領域外面において前記攪拌用吸入口よりも前記回転軸から遠心方向外側の位置に設けられる攪拌用吐出口と、
前記攪拌用吸入口と前記攪拌用吐出口を繋ぐように前記本体内に設けられる攪拌用流通路と、を備えることを特徴とする、
請求項1乃至4のいずれかに記載の処理装置。
The rotating body for supply is
A stirring inlet provided on the outer surface of the processing region of the main body ;
An agitation discharge port provided at a position on the outer side in the centrifugal direction from the rotation axis of the agitation suction port on the outer surface of the processing area of the main body ;
A stirring flow path provided in the main body so as to connect the stirring suction port and the stirring discharge port;
The processing apparatus according to claim 1.
前記処理領域外において前記供給用回転体と同軸的に配置される攪拌用回転体を備え、
前記攪拌用回転体は、
前記回転軸を中心に回転する攪拌用本体と、
前記攪拌用本体の表面に設けられる攪拌用吸入口と、
前記攪拌用本体の表面において前記攪拌用吸入口よりも前記回転軸から遠心方向外側の位置に設けられる攪拌用吐出口と、
前記攪拌用吸入口と前記攪拌用吐出口を繋ぐ攪拌用流通路と、を備えることを特徴とする、
請求項1乃至4のいずれかに記載の処理装置。
A stirring rotator disposed coaxially with the supply rotator outside the processing region;
The stirring rotating body includes:
A stirring main body that rotates about the rotation axis;
A stirring inlet provided on the surface of the stirring main body;
A stirring outlet provided on the surface of the stirring main body at a position on the outer side in the centrifugal direction from the rotation shaft with respect to the stirring inlet;
A stirring flow path connecting the stirring suction port and the stirring discharge port,
The processing apparatus according to claim 1.
前記供給用回転体に対し、前記処理領域とは反対側の位置に配置される流動抵抗体を備えることを特徴とする、
請求項1乃至6のいずれかに記載の処理装置。
It is characterized by comprising a flow resistor disposed at a position opposite to the processing region with respect to the supply rotator.
The processing apparatus according to claim 1.
前記供給用吐出口よりも前記回転軸から遠心方向外側の位置に配置される誘導部材を備えることを特徴とする、
請求項1乃至7のいずれかに記載の処理装置。
It is characterized by comprising a guide member arranged at a position on the outer side in the centrifugal direction from the rotation shaft than the supply outlet.
The processing apparatus according to claim 1.
前記処理領域と前記排出口を繋ぐ排出用流通路を備えることを特徴とする、
請求項1乃至8のいずれかに記載の処理装置。
It is characterized by comprising a discharge flow path connecting the treatment area and the discharge port,
The processing apparatus according to claim 1.
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