JP5549279B2 - Antistatic agent and its use - Google Patents

Description

  The present invention relates to an antistatic agent and its use.

  From the viewpoint of high processability, light weight, and variety of materials, resin has become one of the materials that are indispensable in modern times. The general property is high insulation. Utilizing this characteristic, resins have been used as insulating sites for many electronic products and electronic parts. On the other hand, because of its high insulating property, it has a problem that it is easily charged by friction and peeling.

  Not only dust and debris adhere to the charged resin molding, but when applied to electronic products and electronic components, it may adversely affect the internal circuits, transistors, ICs, CPUs, etc., and may damage them. is there. In addition, there is a possibility of causing an explosion in places where electric shock is given to the human body or where flammable gas or dust is handled. In clean rooms, medical institutions, and the like, dust and dust are disliked, and interior materials having antistatic performance are required.

  In the field of electronic materials used for electronic products and electronic parts, contamination by alkali metal ions such as sodium ions and potassium ions and alkaline earth metal ions is regarded as a problem. When these ions are mixed in the electronic material, not only the function of the electronic product or the electronic component is deteriorated or destroyed, but also there is a risk of heat generation, ignition, and explosion due to these. From such a point of view, it is desirable that materials applied to electronic products and electronic parts do not contain metal ions.

  In order to solve these problems, the resin is often treated with an antistatic agent. Treatment with an antistatic agent is roughly divided into surface treatment and internal treatment depending on how it is used.

  In the surface treatment, an antistatic agent is applied to the surface of a resin molding using a technique such as application, immersion, or spraying. A typical example is a water-soluble surfactant, but it has a drawback that its antistatic ability decreases with time.

  The internal treatment is a technique of adding an antistatic agent to the polymer during resin molding. Representative antistatic agents in this technique include conductive fine particles and surfactants.

  Examples of the conductive fine particles include metal powder, metal oxide fine particles such as ITO and ATO, and carbon. However, in order to impart antistatic ability to the resin using these materials, a considerable amount is not added. In addition, advanced technology is required to uniformly disperse them. Further, due to the large amount of addition, the original physical properties of the resin are greatly affected.

  Furthermore, many metal oxide fine particles contain metals such as antimony and indium. Among them, heavy metals such as antimony have a big problem at the time of disposal, and there are concerns about human health and environmental safety. Furthermore, noble metals such as indium have problems of depletion and high price.

  Surfactants include anionic, cationic, and nonionic surfactants, which are inexpensive and are used in various applications. However, they also have the problem of causing bleeding from the resin surface and contaminating the surroundings. In addition, anionic systems lack compatibility with polymers, are difficult to disperse uniformly, and have low heat resistance. Cationic systems have no problem with antistatic properties, but have low thermal stability. However, there are problems such as low compatibility with polymers.

  In addition, an antistatic agent having a metal ion such as sodium ion or potassium ion has a low compatibility with a polymer or an organic solvent, and is easily discolored.

  Furthermore, in these materials, the influence on the performance by the surrounding environment is large. In particular, it is said that the influence of humidity is great. In general, the antistatic effect is exhibited under high humidity conditions, but when the humidity is low, the effect diminishes and eventually may not function at all.

  In addition, when combined with a colorless and highly transparent resin, the antistatic agent is also required to have high colorless transparency so as not to lose its characteristics. Even if it is an application that does not require so much colorless transparency, it is desired that the colorless transparency is high due to problems in design and the like.

  In the market, an antistatic agent capable of comprehensively solving these problems is demanded. That is, there is a demand for an antistatic agent that has not only high antistatic ability, but also colorless transparency, solubility in resins and solvents (compatibility), heat resistance, and moisture resistance, and does not contain metals or metal ions.

JP-A-4-239565 Japanese Patent Laid-Open No. 4-7350 Japanese Patent Laid-Open No. 4-198239

  The object of the present invention is to provide an antistatic agent that has not only high antistatic ability, but also colorless transparency, solubility in resins and solvents (compatibility), heat resistance, and moisture resistance, and does not contain metals or metal ions. There is to do. Another object of the present invention is to provide a resin composition, a resin varnish, a polymerizable composition, a coating liquid using the antistatic agent, and a method for producing a resin shaped article having antistatic ability using these. It is to provide. Furthermore, the other object of this invention is to provide the resin molded article which has antistatic ability.

  As a result of intensive studies to solve the above problems in consideration of the above problems, the present inventors have reached the present invention. That is, the present invention relates to an antistatic agent comprising a compound represented by the following general formula (1).

General formula (1)

Wherein R ^{01 to} R ¹² are each independently a hydrogen atom, a halogen atom, a cyano group, a nitro group, a hydroxyl group, a carboxyl group, a sulfonic acid group, a substituted or unsubstituted alkenyl group, a substituted or unsubstituted alkyl Group, substituted or unsubstituted alkyloxy group, substituted or unsubstituted aryl group, substituted or unsubstituted aryloxy group, substituted or unsubstituted heterocyclic group, substituted or unsubstituted heterocyclic oxy group, substituted or unsubstituted Substituted alkylsulfanyl group, substituted or unsubstituted arylsulfanyl group, substituted or unsubstituted acyl group, substituted or unsubstituted alkyloxycarbonyl group, substituted or unsubstituted aryloxycarbonyl group, substituted or unsubstituted alkylsulfonyl Group or a substituted or unsubstituted arylsulfonyl group .
R ⁰¹ and R ^02, R ⁰² and R ^03, R ⁰³ and R ^04, R ⁰⁵ and R ^06, R ⁰⁶ and R ^07, R ⁰⁷ and R ^08, R ⁰⁹ and R ^10, R ¹⁰ and R ^11, R ¹¹ And R ¹² may be bonded to each other to form a ring structure.
X ⁺ represents an onium cation. )

The present invention also relates to the above-described antistatic agent, wherein X ⁺ in the general formula (1) is an onium cation represented by the following general formulas (2) to (8).

General formula (2)

General formula (3)

General formula (4)

General formula (5)

General formula (6)

General formula (7)

General formula (8)

Wherein R ^{13 to} R ¹⁶ are each independently a hydrogen atom, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkenyl group, a substituted or unsubstituted aryl group, a substituted or unsubstituted heterocyclic group. A substituted or unsubstituted alkyloxy group, a substituted or unsubstituted aryloxy group, a substituted or unsubstituted heterocyclic oxy group, a substituted or unsubstituted acyl group, a substituted or unsubstituted carbonyloxy group, or a halogen atom Represents a selected group.
R ¹³ and R ¹⁴ , R ¹⁴ and R ¹⁵ , R ¹⁵ And R ¹⁶ or R ¹³ And R ¹⁶ may be bonded to each other to form a ring structure.
R ^{17 to} R ²⁷ and R ^{30 to} R ³² are each independently a hydrogen atom, halogen atom, hydroxyl group, carboxyl group, cyano group, nitro group, amino group, substituted or unsubstituted alkyloxy group, substituted or unsubstituted An alkyl group, a substituted or unsubstituted alkenyl group, a substituted or unsubstituted alkynyl group, a substituted or unsubstituted aryl group, a substituted or unsubstituted heterocyclic group, or a substituted or unsubstituted acyl group.
Adjacent R ^{17 to} R ²⁷ and R ^{30 to} R ³² may be bonded to each other to form a ring.
R ²⁸ and R ²⁹ each independently represents a hydrogen atom, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkenyl group, a substituted or unsubstituted aryl group, or a substituted or unsubstituted heterocyclic group. .
R ^{33 to} R ³⁶ each independently represent a hydrogen atom, a substituted or unsubstituted alkyl group, or a substituted or unsubstituted aryl group.
R ^{37 to} R ⁵⁴ each independently represent a hydrogen atom, a halogen atom, a hydroxyl group, a substituted or unsubstituted alkyl group, a substituted or unsubstituted aryl group, a substituted or unsubstituted heterocyclic group, a substituted or unsubstituted alkyl Represents an oxy group, a substituted or unsubstituted aryloxy group, or a substituted or unsubstituted heterocyclic oxy group, or R ³⁷ and R ³⁸ , R ³⁹ and R ⁴⁰ , R ⁴¹ and R ⁴² , R ⁴³ and R ⁴⁴ , R ⁴⁵ and R ⁴⁶ , R ⁴⁷ and R ⁴⁸ , R ⁴⁹ and R ⁵⁰ , R ⁵¹ and R ⁵² , or R ⁵³ and R ⁵⁴ , together with a carbon atom to be bonded, together with a carbonyl group (C═O ).
R ³³ and R ³⁷ , R ³⁷ and R ³⁹ , R ³⁹ and R ⁴¹ , R ⁴¹ and R ⁴³ , R ³⁵ and R ⁴⁵ , R ⁴⁵ and R ⁴⁷ , R ⁴⁷ and R ⁴⁹ , R ⁴⁹ and R ⁵¹ , Alternatively, R ⁵¹ and R ⁵³ may be bonded to each other to form a ring structure. )

  The present invention also relates to a resin composition comprising a resin and the antistatic agent.

  The present invention also relates to a resin composition comprising a resin and the antistatic agent. Preferably, the resin is a thermoplastic resin and / or a thermosetting resin.

  The present invention also relates to a resin varnish comprising the resin composition and a solvent.

  The present invention also relates to a polymerizable composition comprising a compound having a polymerizable functional group, a polymerization initiator, and the antistatic agent. Furthermore, the present invention provides a method for producing a cured resin having an antistatic ability, wherein the polymerizable composition is cured by light irradiation, and a cured resin having an antistatic ability produced by the production method. About.

  The present invention also relates to a coating liquid comprising a solvent and an antistatic agent. Furthermore, the present invention relates to a method for producing a resin shaped article having an antistatic ability, in which the coating liquid is applied to a resin shaped article, and a resin shaped article having an antistatic ability, which is produced by the production method.

  Moreover, this invention relates to the resin molded article which has the antistatic ability modeled using the said resin composition, the said resin varnish, or the said polymeric composition.

  Moreover, this invention relates to the coating film which has the antistatic ability shape | molded using the said resin composition, the said resin varnish, the said polymeric composition, or the said coating liquid.

  According to the present invention, it is possible to provide an antistatic agent having not only high antistatic ability, but also transparency, solubility in a resin or solvent (compatibility), and heat resistance.

  Hereinafter, embodiments of the present invention will be described in detail.

  First, the antistatic agent used in the present invention will be described. The antistatic agent used in the present invention is a salt represented by the following general formula (1), and has a basic structure composed of a phosphorus anion and an onium cation in which three catechol derivatives are coordinated. By having a basic structure combining these specific organic ions, it is possible to provide not only high antistatic properties, but also solubility (compatibility) and heat resistance in transparent resins and solvents. As long as the properties are not impaired, an appropriate substituent can be introduced into the molecule to adjust the solubility (compatibility) in the resin or solvent used in combination.

General formula (1)

Wherein R ^{01 to} R ¹² are each independently a hydrogen atom, a halogen atom, a cyano group, a nitro group, a hydroxyl group, a carboxyl group, a sulfonic acid group, a substituted or unsubstituted alkenyl group, a substituted or unsubstituted alkyl Group, substituted or unsubstituted alkyloxy group, substituted or unsubstituted aryl group, substituted or unsubstituted aryloxy group, substituted or unsubstituted heterocyclic group, substituted or unsubstituted heterocyclic oxy group, substituted or unsubstituted Substituted alkylsulfanyl group, substituted or unsubstituted arylsulfanyl group, substituted or unsubstituted acyl group, substituted or unsubstituted alkyloxycarbonyl group, substituted or unsubstituted aryloxycarbonyl group, substituted or unsubstituted alkylsulfonyl Group or a substituted or unsubstituted arylsulfonyl group .
R ⁰¹ and R ^02, R ⁰² and R ^03, R ⁰³ and R ^04, R ⁰⁵ and R ^06, R ⁰⁶ and R ^07, R ⁰⁷ and R ^08, R ⁰⁹ and R ^10, R ¹⁰ and R ^11, R ¹¹ And R ¹² may be bonded to each other to form a ring structure.
X ⁺ represents an onium cation. )

  The substituent in the general formula (1) will be described.

The substituents R ^{01 to} R ¹² in the general formula (1) are a hydrogen atom, a halogen atom, a cyano group, a nitro group, a hydroxyl group, a carboxyl group, a substituted or unsubstituted alkenyl group, a substituted or unsubstituted alkyl group, substituted or Unsubstituted alkyloxy group, substituted or unsubstituted aryl group, substituted or unsubstituted aryloxy group, substituted or unsubstituted heterocyclic group, substituted or unsubstituted heterocyclic oxy group, substituted or unsubstituted alkylsulfanyl Group, substituted or unsubstituted arylsulfanyl group, substituted or unsubstituted acyl group, substituted or unsubstituted alkyloxycarbonyl group, substituted or unsubstituted aryloxycarbonyl group, substituted or unsubstituted alkylsulfonyl group, or substituted Or it is an unsubstituted arylsulfonyl group.

Examples of the halogen atom in the substituents R ^{01 to} R ¹² in the general formula (1) include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom.

Examples of the substituted or unsubstituted alkenyl group in the substituents R ^{01 to} R ¹² in the general formula (1) include linear, branched, monocyclic or condensed polycyclic alkenyl groups having 1 to 30 carbon atoms. They may have a plurality of carbon-carbon double bonds in the structure, and specific examples thereof include vinyl group, 1-propenyl group, allyl group, 2-butenyl group, 3-butenyl group, Propenyl group, isobutenyl group, 1-pentenyl group, 2-pentenyl group, 3-pentenyl group, 4-pentenyl group, 1-hexenyl group, 2-hexenyl group, 3-hexenyl group, 4-hexenyl group, 5-hexenyl group , Cyclopentenyl group, cyclohexenyl group, 1,3-butadienyl group, cyclohexadienyl group, cyclopentadienyl group, etc., but are not limited thereto. There.

The substituted or unsubstituted alkyl group in the substituents R ^{01 to} R ¹² in the general formula (1) is a linear, branched, monocyclic or condensed polycyclic alkyl group having 1 to 30 carbon atoms, or Examples thereof include linear, branched, monocyclic or condensed polycyclic alkyl groups having 2 to 30 carbon atoms and optionally interrupted by one or more ether bonds. Specific examples of the linear, branched, monocyclic or condensed polycyclic alkyl group having 1 to 30 carbon atoms include methyl group, ethyl group, propyl group, butyl group, pentyl group, hexyl group, heptyl group, octyl group. Group, nonyl group, decyl group, dodecyl group, octadecyl group, isopropyl group, isobutyl group, isopentyl group, sec-butyl group, tert-butyl group, sec-pentyl group, tert-pentyl group, tert-octyl group, neopentyl group , Cyclopropyl group, cyclobutyl group, cyclopentyl group, cyclohexyl group, adamantyl group, norbornyl group, boronyl group, 4-decylcyclohexyl group and the like, but are not limited thereto. Specific examples of the linear or branched alkyl group having 2 to 30 carbon atoms and optionally interrupted by one or more ether bonds include —CH ₂ —O—CH ₃ , —CH ₂ —. CH ₂ —O—CH ₂ —CH ₃ , —CH ₂ —CH ₂ —CH ₂ —O—CH ₂ —CH ₃ , — (CH ₂ —CH ₂ —O) _n —CH ₃ (where n is from 1) 8), — (CH ₂ —CH ₂ —CH ₂ —O) _m —CH ₃ (where m is from 1 to 5), —CH ₂ —CH (CH ₃ ) —O—CH ₂ —CH. _3— , —CH ₂ —CH— (OCH ₃ ) _{2 and the} like can be mentioned, but are not limited thereto.

  Specific examples of the monocyclic or condensed polycyclic alkyl group having 2 to 30 carbon atoms and optionally interrupted by one or more ether bonds include, but are not limited to: It is not something.

The substituted or unsubstituted alkyloxy group in the substituents R ^{01 to} R ¹² in the general formula (1) is a linear, branched, monocyclic or condensed polycyclic alkyloxy having 1 to 30 carbon atoms. Or a linear, branched, monocyclic or condensed polycyclic alkyloxy group having 2 to 30 carbon atoms and optionally interrupted by one or more ether bonds. Specific examples of the linear, branched, monocyclic or condensed polycyclic alkyloxy group having 1 to 30 carbon atoms include methyloxy group, ethyloxy group, propyloxy group, butyloxy group, pentyloxy group, and hexyloxy. Group, heptyloxy group, octyloxy group, nonyloxy group, decyloxy group, dodecyloxy group, octadecyloxy group, isopropyloxy group, isobutyloxy group, isopentyloxy group, sec-butyloxy group, tert-butyloxy group, sec-pentyl Oxy group, tert-pentyloxy group, tert-octyloxy group, neopentyloxy group, cyclopropyloxy group, cyclobutyloxy group, cyclopentyloxy group, cyclohexyloxy group, adamantyloxy group, norbornyloxy group, boroni Group, 4-decyl cyclohexyl although group and the like, but is not limited thereto. Specific examples of the linear or branched alkyloxy group having 2 to 18 carbon atoms and optionally interrupted by one or more ether bonds include —O—CH ₂ —O—CH ₃ , — O—CH ₂ —CH ₂ —O—CH ₂ —CH ₃ , —O—CH ₂ —CH ₂ —CH ₂ —O—CH ₂ —CH ₃ , —O— (CH ₂ —CH ₂ —O) _n — CH ₃ (where n is 1 to 8), —O— (CH ₂ —CH ₂ —CH ₂ —O) _m —CH ₃ (where m is 1 to 5), —O—CH _{2 -CH (CH 3) -O-CH} 2 -CH 3 -, - OCH 2 -CH- (OCH 3) can be cited _2, etc., but is not limited thereto.

  Specific examples of monocyclic or condensed polycyclic alkyloxy groups having 2 to 18 carbon atoms and optionally interrupted by one or more ether bonds include, but are not limited to: Is not to be done.

Examples of the substituted or unsubstituted aryl group in the substituents R ^{01 to} R ¹² in the general formula (1) include monocyclic or condensed polycyclic aryl groups having 6 to 24 carbon atoms. Specific examples include phenyl Group, 1-naphthyl group, 2-naphthyl group, 1-anthryl group, 9-anthryl group, 2-phenanthryl group, 3-phenanthryl group, 9-phenanthryl group, 1-pyrenyl group, 5-naphthacenyl group, 1-indenyl Group, 2-azurenyl group, 1-acenaphthyl group, 2-fluorenyl group, 9-fluorenyl group, 3-perylenyl group, o-tolyl group, m-tolyl group, p-tolyl group, 2,3-xylyl group, 2 , 5-xylyl group, mesityl group, p-cumenyl group, p-dodecylphenyl group, p-cyclohexylphenyl group, 4-biphenyl group, o-fluorophenyl group, m-chlorophenyl Nyl group, p-bromophenyl group, p-hydroxyphenyl group, m-carboxyphenyl group, o-mercaptophenyl group, p-cyanophenyl group, m-nitrophenyl group, m-azidophenyl group and the like can be mentioned. However, it is not limited to these.

Examples of the substituted or unsubstituted aryloxy group in the substituents R ^{01 to} R ¹² in the general formula (1) include a monocyclic or condensed polycyclic aryloxy group having 6 to 24 carbon atoms. , Phenoxy group, 1-naphthyloxy group, 2-naphthyloxy group, 9-anthryloxy group, 9-phenanthryloxy group, 1-pyrenyloxy group, 5-naphthacenyloxy group, 1-indenyloxy group, 2 -Azulenyloxy group, 1-acenaphthyloxy group, 9-fluorenyloxy group and the like can be mentioned, but are not limited thereto.

The substituted or unsubstituted heterocyclic group in the substituents R ^{01 to} R ¹² in the general formula (1) is an aromatic group having 4 to 24 carbon atoms, including a nitrogen atom, an oxygen atom, a sulfur atom, and a phosphorus atom. Or an aliphatic heterocyclic group is mentioned, 2-thienyl group, 2-benzothienyl group, naphtho [2,3-b] thienyl group, 3-thianthrenyl group, 2-thianthrenyl group, 2-furyl group, 2- Benzofuryl group, pyranyl group, isobenzofuranyl group, chromenyl group, xanthenyl group, phenoxathiinyl group, 2H-pyrrolyl group, pyrrolyl group, imidazolyl group, pyrazolyl group, pyridyl group, pyrazinyl group, pyrimidinyl group, pyridazinyl group, Indolizinyl group, isoindolyl group, 3H-indolyl group, 2-indolyl group, 3-indolyl group, 1H-indazolyl group, purinyl group, 4 -Quinolidinyl group, isoquinolyl group, quinolyl group, phthalazinyl group, naphthyridinyl group, quinoxanilyl group, quinazolinyl group, cinnolinyl group, pteridinyl group, 4aH-carbazolyl group, 2-carbazolyl group, 3-carbazolyl group, β-carbolinyl group, phenant Lidinyl group, 2-acridinyl group, perimidinyl group, phenanthrolinyl group, phenazinyl group, phenalsadinyl group, isothiazolyl group, phenothiazinyl group, isoxazolyl group, furazanyl group, 3-phenixazinyl group, isochromanyl group, chromanyl group, pyrrolidinyl group Pyrrolinyl group, imidazolidinyl group, imidazolinyl group, pyrazolidinyl group, pyrazolinyl group, piperidyl group, piperazinyl group, indolinyl group, isoindolinyl group, quinuclidinyl group, morpholini Nyl group, thioxanthryl group, 4-quinolinyl group, 4-isoquinolyl group, 3-phenothiazinyl group, 2-phenoxathiinyl group, 3-coumarinyl group, etc. is not.

The substituted or unsubstituted heterocyclic oxy group in the substituents R ^{01 to} R ¹² in the general formula (1) is a monocyclic group having 4 to 24 carbon atoms, including a nitrogen atom, an oxygen atom, a sulfur atom, and a phosphorus atom. Or a condensed polycyclic heterocyclic oxy group is mentioned, As a specific example, 2-furanyloxy group, 2-thienyloxy group, 2-indolyloxy group, 3-indolyloxy group, 2-benzofuryloxy group, 2 -A benzothienyloxy group, a 2-carbazolyloxy group, a 3-carbazolyloxy group, a 4-carbazolyloxy group, a 9-acridinyloxy group and the like can be mentioned, but are not limited thereto. It is not a thing.

The substituted or unsubstituted alkylsulfanyl group in the substituents R ^{01 to} R ¹² in the general formula (1) is a linear, branched, monocyclic or condensed polycyclic alkylthio group having 1 to 18 carbon atoms. Specific examples include a methylthio group, an ethylthio group, a propylthio group, a butylthio group, a pentylthio group, a hexylthio group, an octylthio group, a decylthio group, a dodecylthio group, an octadecylthio group, and the like. is not.

Examples of the substituted or unsubstituted arylsulfanyl group in the substituents R ^{01 to} R ¹² in the general formula (1) include monocyclic or condensed polycyclic arylthio groups having 6 to 18 carbon atoms, and specific examples include: Examples thereof include, but are not limited to, a phenylthio group, a 1-naphthylthio group, a 2-naphthylthio group, a 9-anthrylthio group, and a 9-phenanthrylthio group.

In the substituents R ^{01 to} R ¹² in the general formula (1), the substituted or unsubstituted alkylsulfonyl group is preferably an alkylsulfonyl group having 1 to 20 carbon atoms. Specific examples include a methylsulfonyl group and an ethylsulfonyl group. Group, propylsulfonyl group, isopropylsulfonyl group, butylsulfonyl group, hexylsulfonyl group, cyclohexylsulfonyl group, octylsulfonyl group, 2-ethylhexylsulfonyl group, decanoylsulfonyl group, dodecanoylsulfonyl group, octadecanoylsulfonyl group, cyanomethyl Examples thereof include, but are not limited to, a sulfonyl group and a methyloxymethylsulfonyl group.

In the substituents R ^{01 to} R ¹² in the general formula (1), the substituted or unsubstituted arylsulfonyl group is preferably an arylsulfonyl group having 6 to 30 carbon atoms. Specific examples include a phenylsulfonyl group, 1- Naphthylsulfonyl group, 2-naphthylsulfonyl group, 2-chlorophenylsulfonyl group, 2-methylphenylsulfonyl group, 2-methyloxyphenylsulfonyl group, 2-butyloxyphenylsulfonyl group, 3-chlorophenylsulfonyl group, 3-trifluoromethyl Phenylsulfonyl group, 3-cyanophenylsulfonyl group, 3-nitrophenylsulfonyl group, 4-fluorophenylsulfonyl group, 4-cyanophenylsulfonyl group, 4-methyloxyphenylsulfonyl group, 4-methylsulfanylphenylsulfonyl group, 4- Feni Sulfanyl phenylsulfonyl group, 4-dimethylaminophenyl sulfonyl group, and the like, but not limited thereto.

The substituted or unsubstituted acyl group in the substituents R ^{01 to} R ¹² in the general formula (1) is a hydrogen atom or a linear, branched, monocyclic or condensed polycyclic having 1 to 30 carbon atoms. A carbonyl group bonded with an aliphatic group, a carbonyl group substituted with an alkyloxy group having 2 to 20 carbon atoms, a carbonyl group bonded with a monocyclic or condensed polycyclic aryl group with 6 to 18 carbon atoms, or a monocyclic group with 6 to 18 carbon atoms A carbonyl group substituted with a cyclic or condensed polycyclic aryloxy group, a carbonyl group containing a nitrogen atom, oxygen atom, sulfur atom, or phosphorus atom and a monocyclic or condensed polycyclic heterocyclic group having 4 to 18 carbon atoms bonded thereto Specific examples include formyl group, acetyl group, propionyl group, butyryl group, isobutyryl group, valeryl group, isovaleryl group, pivaloyl group, lauroyl group, myristo Group, palmitoyl group, stearoyl group, cyclopentylcarbonyl group, cyclohexylcarbonyl group, acryloyl group, methacryloyl group, crotonoyl group, isocrotonoyl group, oleoyl group, cinnamoyl group benzoyl group, methyloxycarbonyl group, ethyloxycarbonyl group, propyloxy Carbonyl group, butyloxycarbonyl group, hexyloxycarbonyl group, octyloxycarbonyl group, decyloxycarbonyl group, octadecyloxycarbonyl group, trifluoromethyloxycarbonyl group, benzoyl group, toluoyl group, 1-naphthoyl group, 2-naphthoyl group 9-anthrylcarbonyl group, phenyloxycarbonyl group, 4-methylphenyloxycarbonyl group, 3-nitrophenyloxycarbonyl group, 4- Methylaminophenyloxycarbonyl group, 2-methylsulfanylphenyloxycarbonyl group, 1-naphthoyloxycarbonyl group, 2-naphthoyloxycarbonyl group, 9-anthrylyloxycarbonyl group, 3-furoyl group, 2-thenoyl group, Although a nicotinoyl group, an isonicotinoyl group, etc. can be mentioned, it is not limited to these.

The substituted or unsubstituted alkyloxycarbonyl group in the substituents R ^{01 to} R ¹² in the general formula (1) is a linear, branched, monocyclic or condensed polycyclic alkyloxy having 2 to 30 carbon atoms. Specific examples include a carbonyl group to which a group is bonded, and specific examples include a methyloxycarbonyl group, an ethyloxycarbonyl group, a propyloxycarbonyl group, a butyloxycarbonyl group, a pentyloxycarbonyl group, a hexyloxycarbonyl group, a heptyloxycarbonyl group, Octyloxycarbonyl group, nonyloxycarbonyl group, decyloxycarbonyl group, dodecyloxycarbonyl group, octadecyloxycarbonyl group, isopropyloxycarbonyl group, isobutyloxycarbonyl group, isopentyloxycarbonyl group, sec-butyloxycal Nyl group, tert-butyloxycarbonyl group, sec-pentyloxycarbonyl group, tert-pentyloxycarbonyl group, tert-octyloxycarbonyl group, neopentyloxycarbonyl group, cyclopropyloxycarbonyl group, cyclobutyloxycarbonyl group, cyclopentyl Examples thereof include, but are not limited to, oxycarbonyl group, cyclohexyloxycarbonyl group, adamantyloxycarbonyl group, norbornyloxycarbonyl group, boronyloxycarbonyl group, 4-decylcyclohexyloxycarbonyl group, and the like. .

Examples of the substituted or unsubstituted aryloxycarbonyl group in the substituents R ^{01 to} R ¹² in the general formula (1) include a carbonyl group to which a monocyclic or condensed polycyclic aryloxy group having 7 to 30 carbon atoms is bonded. Specific examples include a phenoxycarbonyl group, 1-naphthyloxycarbonyl group, 2-naphthyloxycarbonyl group, 9-anthryloxycarbonyl group, 9-phenanthryloxycarbonyl group, 1-pyrenyloxycarbonyl group, Examples thereof include 5-naphthacenyloxycarbonyl group, 1-indenyloxycarbonyl group, 2-azurenyloxycarbonyl group, 1-acenaphthyloxycarbonyl group, 9-fluorenyloxycarbonyl group, and the like. It is not limited to.

The hydrogen atom of the substituent in R ^{01 to} R ¹² described above may be further substituted with another substituent.

  Examples of such substituents include halogen groups such as fluorine atom, chlorine atom, bromine atom and iodine atom, alkyloxy groups such as methoxy group, ethoxy group and tert-butoxy group, phenoxy group and p-tolyloxy group. Alkyloxycarbonyl groups such as aryloxy group, methoxycarbonyl group, butoxycarbonyl group, aryloxycarbonyl groups such as phenoxycarbonyl group, acyloxy groups such as acetoxy group, propionyloxy group, benzoyloxy group, acetyl group, benzoyl group, isobutyryl Groups, acryloyl groups, methacryloyl groups, methacrylyl groups and other acyl groups, methylsulfanyl groups, alkylsulfanyl groups such as tert-butylsulfanyl groups, arylsulfanyl groups such as phenylsulfanyl groups and p-tolylsulfanyl groups Group, methylamino group, alkylamino group such as cyclohexylamino group, dimethylamino group, diethylamino group, morpholino group, dialkylamino group such as piperidino group, arylamino group such as phenylamino group, p-tolylamino group, methyl group, Alkyl groups such as ethyl group, tert-butyl group, dodecyl group, phenyl group, p-tolyl group, xylyl group, cumenyl group, naphthyl group, anthryl group, aryl group such as phenanthryl group, complex such as furyl group, thienyl group, etc. In addition to ring groups, etc., hydroxy group, carboxy group, formyl group, mercapto group, sulfo group, mesyl group, p-toluenesulfonyl group, amino group, nitro group, cyano group, trifluoromethyl group, trichloromethyl group, trimethylsilyl group , Phosphinico group, phosphono group, trimethylammonium Group, dimethylsulfoxide Niu mill group, triphenyl phenacyl phosphonium Niu mill group, and the like.

The substituents R ^{01 to} R ¹² in the general formula (1) are preferably a hydrogen atom, a halogen atom, a cyano group, a nitro group, a substituted or substituted group in consideration of the stability of the compound and the ease of synthesis. An unsubstituted alkyl group, a substituted or unsubstituted alkyloxy group, a substituted or unsubstituted acyl group, a substituted or unsubstituted alkyloxycarbonyl group, and a substituted or unsubstituted aryloxycarbonyl group are preferred. Furthermore, from the standpoint of obtaining high antistatic performance and heat resistance, cyano group, nitro group, substituted or unsubstituted acyl group, substituted or unsubstituted, with the ability to disperse anion charges more with electron withdrawing properties Are preferably an alkyloxycarbonyl group and a substituted or unsubstituted aryloxycarbonyl group.

  Specific examples of the structure of the phosphorus anion in the general formula (1) of the present invention are shown below, but are not limited thereto. In the exemplified compounds, Me represents a methyl group, and Et represents an ethyl group.

Next, X ⁺ in the general formula (1) will be described.

X ⁺ in the general formula (1) represents an onium cation. Specific examples include ammonium cation, phosphonium cation, pyridinium cation, pyrazinium cation, imidazolium cation, piperidinium cation, pyrrolidinium cation, oxonium cation, iodonium cation, sulfonium cation, sulfoxonium cation, and pyrroline skeleton. Cation having pyrrole skeleton, tetrahydropyrimidinium cation, dihydropyrimidinium cation, pyrazolium cation, pyrazolinium cation, amidinium cation, oxazolium cation, isoxazolium cation, benzoxa Zolium cation, thiazolium cation, isothiazolium cation, benzothiazolium cation, pyrimidinium cation, pyridazinium cation Although and the like, but is not limited thereto.

Preferred structures for the onium cation X ⁺ in the general formula (1) include onium cations represented by the general formulas (2) to (8).

General formula (2)

General formula (3)

General formula (4)

General formula (5)

General formula (6)

General formula (7)

General formula (8)

Wherein R ¹³ , R ¹⁴ , R ¹⁵ and R ¹⁶ are each independently a hydrogen atom, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkenyl group, a substituted or unsubstituted aryl group, substituted or Unsubstituted heterocyclic group, substituted or unsubstituted alkyloxy group, substituted or unsubstituted aryloxy group, substituted or unsubstituted heterocyclic oxy group, substituted or unsubstituted acyl group, substituted or unsubstituted carbonyloxy Represents a group selected from a group or a halogen atom.
R ¹³ and R ¹⁴ , R ¹⁴ and R ¹⁵ , R ¹⁵ And R ¹⁶ or R ¹³ And R ¹⁶ may be bonded to each other to form a ring structure.
R ^{17 to} R ²⁷ and R ^{30 to} R ³² are each independently a hydrogen atom, halogen atom, hydroxyl group, carboxyl group, cyano group, nitro group, amino group, substituted or unsubstituted alkyloxy group, substituted or unsubstituted An alkyl group, a substituted or unsubstituted alkenyl group, a substituted or unsubstituted alkynyl group, a substituted or unsubstituted aryl group, a substituted or unsubstituted heterocyclic group, or a substituted or unsubstituted acyl group.
Adjacent R ^{17 to} R ²⁷ and R ^{30 to} R ³² may be bonded to each other to form a ring.
R ²⁸ and R ²⁹ each independently represents a hydrogen atom, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkenyl group, a substituted or unsubstituted aryl group, or a substituted or unsubstituted heterocyclic group. .
R ^{33 to} R ³⁶ each independently represent a hydrogen atom, a substituted or unsubstituted alkyl group, or a substituted or unsubstituted aryl group.
R ^{37 to} R ⁵⁴ each independently represent a hydrogen atom, a halogen atom, a hydroxyl group, a substituted or unsubstituted alkyl group, a substituted or unsubstituted aryl group, a substituted or unsubstituted heterocyclic group, a substituted or unsubstituted alkyl An oxy group, a substituted or unsubstituted aryloxy group, or a substituted or unsubstituted heterocyclic oxy group is represented.
R ³³ and R ³⁷ , R ³⁷ and R ³⁹ , R ³⁹ and R ⁴¹ , R ⁴¹ and R ⁴³ , R ³⁵ and R ⁴⁵ , R ⁴⁵ and R ⁴⁷ , R ⁴⁷ and R ⁴⁹ , R ⁴⁹ and R ⁵¹ , Alternatively, R ⁵¹ and R ⁵³ may be bonded to each other to form a ring structure.
Furthermore, R ³⁷ and R ³⁸ , R ³⁹ and R ⁴⁰ , R ⁴¹ and R ⁴² , R ⁴³ and R ⁴⁴ , R ⁴⁵ and R ⁴⁶ , R ⁴⁷ and R ⁴⁸ , R ⁴⁹ and R ⁵⁰ , R ⁵¹ and R ⁵² , Alternatively, R ⁵³ and R ⁵⁴ may form a carbonyl group (C═O) together with the carbon atom to which each is bonded. )

  The onium cation represented by the general formula (2) to the general formula (8) is preferable in terms of transparency, solubility in a resin or a solvent (compatibility), and improvement of the antistatic function.

  Among these, the onium cation represented by the general formula (2), the general formula (4), or the general formula (6) is more preferable as the structure of the onium cation because of the ease of synthesis and the availability of raw materials. can give.

  The substituents in the general formulas (2) to (8) will be described.

The substituted or unsubstituted alkyl groups in the substituents R ^{13 to} R ⁵⁴ in the general formula (2) to the general formula (8) are substituted with the substituents R ^{01 to} R ¹² in the general formula (1). Or it is synonymous with an unsubstituted alkyl group.

The substituted or unsubstituted alkenyl groups in the substituents R ^{13 to} R ³² in the general formula (2) to the general formula (8) are substituted with the substituents R ^{01 to} R ¹² in the general formula (1). Or it is synonymous with an unsubstituted alkenyl group.

The substituted or unsubstituted aryl groups in the substituents R ^{13 to} R ⁵⁴ in the general formula (2) to the general formula (8) are substituted with the substituents R ^{01 to} R ¹² in the general formula (1). Or it is synonymous with an unsubstituted aryl group.

The substituted or unsubstituted heterocyclic group in the substituents R ^{13 to} R ³² and R ^{37 to} R ⁵⁴ in the general formula (2) to the general formula (8) is the substituent R in the general formula (1). in ⁰¹ to R ^12, the same meaning as the heterocyclic group substituted or unsubstituted.

The substituted or unsubstituted alkyloxy group in the substituents R ^{13 to} R ²⁷ , R ^{30 to} R ³² , and R ^{37 to} R ⁵⁴ in the general formula (2) to the general formula (8) is the above-described general formula ( It is synonymous with the substituted or unsubstituted alkyloxy group in the substituents R ^{01 to} R ¹² in 1).

The substituted or unsubstituted aryloxy group in the substituents R ^{13 to} R ¹⁶ and R ^{37 to} R ⁵⁴ in the general formula (2) to the general formula (8) is the substituent R in the general formula (1). in ⁰¹ to R ^12, the same meaning as aryloxy substituted or unsubstituted.

The substituted or unsubstituted heterocyclic oxy group in the substituents R ^{13 to} R ¹⁶ and R ^{37 to} R ⁵⁴ in the general formula (2) to the general formula (8) is the substituent in the general formula (1). in R ⁰¹ to R ^12, the same meaning as the heterocyclic group having a substituted or unsubstituted.

The substituted or unsubstituted acyl groups in the substituents R ^{13 to} R ¹⁶ in the general formula (2) to the general formula (8) are substituted with the substituents R ^{01 to} R ¹² in the general formula (1). Or it is synonymous with an unsubstituted acyl group.

Examples of the substituted or unsubstituted carbonyloxy group in the substituents R ^{13 to} R ¹⁶ in the general formula (2) to the general formula (8) include a carbonyloxy group having 2 to 20 carbon atoms. Acetyloxy group, propanoyloxy group, butanoyloxy group, pentanoyloxy group, trifluoromethylcarbonyloxy group, benzoyloxy group, 1-naphthylcarbonyloxy group, 2-naphthylcarbonyloxy group and the like. However, it is not limited to these.

Examples of the substituted or unsubstituted alkynyl group in the substituents R ^{17 to} R ²⁷ and R ^{30 to} R ³² in the general formula (2) to the general formula (8) include alkynyl groups having 2 to 10 carbon atoms, Specific examples include, but are not limited to, an ethynyl group, a propynyl group, a propargyl group, and the like.

The hydrogen atom of the substituent in R ^{13 to} R ⁵⁴ described above may be further substituted with another substituent.

  Examples of such substituents include halogen groups such as fluorine atom, chlorine atom, bromine atom and iodine atom, alkyloxy groups such as methoxy group, ethoxy group and tert-butoxy group, phenoxy group and p-tolyloxy group. Alkyloxycarbonyl groups such as aryloxy group, methoxycarbonyl group, butoxycarbonyl group, aryloxycarbonyl groups such as phenoxycarbonyl group, acyloxy groups such as acetoxy group, propionyloxy group, benzoyloxy group, acetyl group, benzoyl group, isobutyryl Groups, acryloyl groups, methacryloyl groups, methacrylyl groups and other acyl groups, methylsulfanyl groups, alkylsulfanyl groups such as tert-butylsulfanyl groups, arylsulfanyl groups such as phenylsulfanyl groups and p-tolylsulfanyl groups Group, methylamino group, alkylamino group such as cyclohexylamino group, dimethylamino group, diethylamino group, morpholino group, dialkylamino group such as piperidino group, arylamino group such as phenylamino group, p-tolylamino group, methyl group, Alkyl groups such as ethyl group, tert-butyl group, dodecyl group, phenyl group, p-tolyl group, xylyl group, cumenyl group, naphthyl group, anthryl group, aryl group such as phenanthryl group, complex such as furyl group, thienyl group, etc. In addition to ring groups, etc., hydroxy group, carboxy group, formyl group, mercapto group, sulfo group, mesyl group, p-toluenesulfonyl group, amino group, nitro group, cyano group, trifluoromethyl group, trichloromethyl group, trimethylsilyl group , Phosphinico group, phosphono group, trimethylammonium Group, dimethylsulfoxide Niu mill group, triphenyl phenacyl phosphonium Niu mill group, and the like.

Specific examples of the structure of the onium cation X ⁺ in the general formula (1) of the present invention are shown below, but are not limited thereto. In the exemplified compounds, Me is a methyl group, Et is an ethyl group, Pr is a normal propyl group, i-Pr is an isopropyl group, Bu is a normal butyl group, t-Bu is a tertiary butyl group, Hex is a normal hexyl group, Oct represents a normal octyl group, and Dec represents a normal decyl group.

Examples of ammonium cations

Examples of phosphonium cations

Examples of pyridinium cations

Examples of pyrazinium cations

Examples of imidazolium cations

Examples of pyrrolidinium cations

Examples of piperidinium cations

  Specific examples of the compound of the present invention described above are shown below, but the structure of the compound of the present invention is not limited thereto. In the exemplified compounds, Me is a methyl group, Et is an ethyl group, Pr is a normal propyl group, i-Pr is an isopropyl group, Bu is a normal butyl group, t-Bu is a tertiary butyl group, Hex is a normal hexyl group, Oct represents a normal octyl group, Cet represents a normal cetyl group, and Ph represents a phenyl group.

Table 1

  With the antistatic agent of the present invention, not only a high level of antistatic function, but also the mechanism that can be obtained in combination with colorless transparency, solubility in resins and solvents (compatibility), heat resistance and moisture resistance is completely clear However, the structure in which the charge is dispersed or delocalized in both the anion site and the cation site not only stabilizes, but also promotes dissociation and improves ionic conductivity, and high antistatic performance. I think it will lead to

The antistatic agent of the present invention is characterized by comprising a phosphorus anion and an onium cation in which three catechol derivatives are coordinated, but the synthesis method is not particularly limited. Usually, it comprises a salt (A) comprising a phosphorus anion coordinated with three catechol derivatives and an arbitrary cation, an onium cation represented by the substituent X ⁺ in the general formula (1), and an arbitrary anion. The antistatic agent of the present invention can be easily obtained by separately synthesizing the salt (B) and subjecting them to salt exchange in water or an organic solvent.

  The antistatic agent of this invention can be used individually or in combination of 2 or more types.

  As a method of applying the antistatic agent of the present invention to a resin molded product, a method of modeling a resin in which an antistatic agent is directly blended (kneaded), and a coating film (film) of the antistatic agent on the surface of the molded resin There are mainly two types of forming methods.

  First, a method for forming a resin in which an antistatic agent is directly blended (kneaded) will be described. For modeling, a resin composition containing an antistatic agent and a resin, a resin varnish containing a resin composition (an antistatic agent and a resin) and a solvent, or the like can be used.

  Examples of resins that can be blended (kneaded) with the antistatic agent of the present invention include thermoplastic resins, thermosetting resins, fluororesins, and polymer rubbers.

  Examples of the thermoplastic resin include polyolefin, polyhaloolefin, polystyrene, polyethylene terephthalate (PET), polybutylene terephthalate (PBT), polyhexamethylene terephthalate, polyamide resin, polyvinyl alcohol, polyetherimide resin, polyarylate resin, polysulfone resin, Polyamideimide resin, polyvinyl butyral, acrylic resin, methacrylic resin, norbornene resin, polyimide resin, polyether ether ketone, ketone resin, polycarbonate, polyvinyl formal, polymethyl methacrylate, polyphenylene ether resin, polyvinyl acetate, polyacetal resin, polyphenylene sulfide resin Ethylene-vinyl alcohol copolymer, acrylonitrile-styrene copolymer (AS), Len - vinyl acetate copolymer (EVA), acrylonitrile - butadiene - styrene copolymer (ABS) and the like.

  Examples of the polyolefin include low density polyethylene (LDPE), high density polyethylene (HDPE), polypropylene (PP), ethylene-propylene copolymer, polybutadiene, polyisoprene and the like.

  Examples of the polyhaloolefin include polyvinyl chloride (PVC), polychloroprene, polyvinylidene chloride, vinyl chloride-vinyl acetate copolymer, ethylene-vinyl chloride copolymer, vinyl chloride-vinylidene chloride copolymer, and the like.

  Thermosetting resins include silicone resin, melamine resin, phenol resin, polyurethane resin, furan resin, diallyl phthalate resin, urea resin, rosin modified maleic acid resin, rosin modified phenolic resin, epoxy resin, xylene resin, polylactic acid resin, Examples include guanamine resins, vinyl ester resins, polyimide resins, unsaturated polyester resins, and the like.

  Examples of the fluororesin include tetrafluoroethylene, polyvinylidene fluoride, and trifluoroethylene.

  Examples of the polymer rubber include natural rubber (NR), styrene butadiene rubber (SBR), ethylene-propylene-diene rubber (EPDM), polyisoprene rubber, chloroprene rubber, polybutadiene rubber, butyl rubber, acrylonitrile-butadiene rubber, and silicone rubber. It is done.

  Furthermore, what is called a polymer alloy combining these resins may be used.

  Moreover, as a method of kneading these, any commonly used method can be used. For example, it is possible to knead by roll kneading, bumper kneading, an extruder or a kneader.

  By shaping the kneaded resin composition into an arbitrary shape, a resin shaped product having antistatic ability can be produced.

  The antistatic agent of this invention can also be mix | blended with resin and a solvent, and can also be used as a resin varnish. In this case, the above-mentioned resins can be used as the resin. Preferably, acrylic resin, methacrylic resin, polyimide resin, polyamide resin, polyacrylate resin, unsaturated polyester resin, polyester acrylate resin, polyepoxy acrylate resin, polyurethane acrylate resin, polyether acrylate resin, polyol acrylate Resin, cellulose acetate resin, nitrocellulose resin, styrene (co) polymer, polyvinyl butyral resin, amino alkyd resin, polyester resin, amino resin modified polyester resin, polyurethane resin, acrylic polyol urethane Resin, soluble polyamide resin, soluble polyimide resin, soluble polyamideimide resin, soluble polyesterimide resin, hydroxyethyl cellulose, styrene monomer Water-soluble salts of inic acid ester-based copolymers, water-soluble salts of (meth) acrylic acid ester-based (co) polymers, water-soluble amino alkyd resins, water-soluble amino polyester resins, water-soluble polyamide resins, petroleum Resins, alkyd resins, soybean oil, tung oil, and linseed oil can be used. Furthermore, these can be used individually or in combination of 2 or more types.

  As the solvent in the varnish, various solvents can be used in accordance with the properties of the resin such as a high boiling point petroleum solvent, an aliphatic hydrocarbon solvent, an alcohol solvent, and an aqueous solvent. Commonly used solvents include methyl ethyl ketone (MEK), dimethylformamide (DMF), N-methylpyrrolidone (NMP), methoxypropanol, toluene, water and the like. Further, these solvents can be arbitrarily used alone or in combination of two or more.

  For example, a resin shaped article having an antistatic ability can also be produced by applying the resin varnish on an appropriate support and drying it.

  Drying and curing of the applied resin varnish is appropriately selected depending on the solvent to be combined and can be dried at room temperature, but usually it is often performed using a heating and drying furnace. The drying furnace is preferably filled with air, an inert gas (such as nitrogen or argon), or the inert gas is preferably allowed to flow into the drying furnace. The drying and curing temperatures are appropriately selected according to the boiling point of the solvent, but are preferably in the range of 60 ° C to 600 ° C. In addition, it is preferable to raise the temperature stepwise because a molded resin product having a uniform film thickness and excellent dimensional stability can be obtained without causing problems such as foaming and crushed skin. The drying and curing time is appropriately selected depending on the thickness of the resin molded product to be formed, the solid content concentration of the resin varnish, and the type of the solvent, and is preferably about 0.05 to 500 minutes.

  In the resin composition and the resin varnish, the amount of the antistatic agent added to the resin is not particularly limited. However, if blended in a large amount, it may affect the original physical properties of the resin, such as a decrease in physical properties such as mechanical strength, and if the blended amount is small, the antistatic effect may be insufficient. Therefore, the preferable blending amount is 0.01 to 30% by weight, more preferably 0.02 to 25% by weight, and most preferably 0.02 to 20% by weight based on the resin.

  Next, a method for forming a coating film of an antistatic agent on the surface of the shaped resin will be described. For forming the coating film, a coating liquid containing an antistatic agent and a solvent can be used in addition to the resin composition and the resin varnish.

  For example, in the case of using a coating liquid, as a coating method for forming a coating film on the surface of a molded resin, a solution, dispersion, or emulsion containing the antistatic agent according to the present invention is immersed, spin-coated, sprayed. There are methods using various means such as a method, a roller coating method, a gravure coating method, a die coating method, a comma coating method, a roll coating method, a curtain coating method, and a bar coating method. These methods can be appropriately used depending on the thickness, viscosity, and the like to be applied.

  The solvent used at this time is not particularly limited as long as it can dissolve or disperse the antistatic agent, but ketones such as methyl ethyl ketone, cyclohexanone, 2-heptanone, and 3-heptanone; ethylene glycol monomethyl (Poly) alkylene glycol monoalkyl ether acetates such as ether acetate, ethylene glycol monoethyl ether acetate, diethylene glycol monomethyl ether acetate, diethylene glycol monoethyl ether acetate, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate; ethylene glycol monomethyl ether , Ethylene glycol monoethyl ether, ethylene glycol mono-n-propyl ether Ethylene glycol mono-n-butyl ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol mono-n-propyl ether, ethylene glycol mono-n-butyl ether, triethylene glycol monomethyl ether, triethylene glycol monoethyl ether, propylene glycol Monomethyl ether, propylene glycol monoethyl ether, propylene glycol mono-n-propyl ether, propylene glycol mono-n-butyl ether, dipropylene glycol monomethyl ether, dipropylene glycol monoethyl ether, dipropylene glycol mono-n-propyl ether, di Propylene glycol mono-n-butyl ether, tripp (Poly) alkylene glycol monoalkyl ethers such as propylene glycol monomethyl ether and tripropylene glycol monoethyl ether; ethyl acetate, n-butyl acetate, isobutyl acetate, amyl formate, isoamyl acetate, butyl propionate, ethyl butyrate, isopropyl butyrate , Butyl butyrate, methyl lactate, ethyl lactate, methyl oxyacetate, ethyl oxyacetate, butyl oxyacetate, methyl methoxyacetate, ethyl methoxyacetate, butyl methoxyacetate, methyl ethoxyacetate, ethyl ethoxyacetate, 3-oxypropion Acid methyl, ethyl 3-oxypropionate, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, 2-oxypropionate Methyl acetate, ethyl 2-oxypropionate, propyl 2-oxypropionate, methyl 2-methoxypropionate, ethyl 2-methoxypropionate, propyl 2-methoxypropionate, methyl 2-ethoxypropionate, 2-ethoxypropion Ethyl acetate, methyl 2-oxy-2-methylpropionate, ethyl 2-oxy-2-methylpropionate, methyl 2-methoxy-2-methylpropionate, ethyl 2-methoxy-2-methylpropionate, methyl pyruvate , Esters such as ethyl pyruvate, propyl pyruvate, methyl acetoacetate, ethyl acetoacetate, methyl 2-oxobutanoate and ethyl 2-oxobutanoate; aromatic hydrocarbons such as toluene and xylene, N-methylpyrrolidone, N Amides such as N-dimethylacetamide And the like can be given.

  These solvents can be used alone or in admixture of two or more.

  Furthermore, the quantity which mix | blends the antistatic agent of this invention with these solvents is not specifically limited. However, when blended in a large amount, the viscosity of the coating liquid may become too high, or the coating liquid may be whitened. Therefore, a preferable blending amount is 0.01 to 30% by weight, more preferably 0.02 to 15% by weight, and most preferably 0.02 to 10% by weight with respect to the entire coating liquid.

  The antistatic agent of the present invention, a compound having a polymerizable functional group (monomer, oligomer or prepolymer) and a polymerization initiator can be mixed and used as a polymerizable composition. As a method of using the polymerizable composition, according to the form of the polymerizable composition, a method for producing a resin shaped article by polymerizing the polymerizable composition, and using the polymerizable composition on the surface of the shaped resin Both methods of forming an antistatic agent coating film can be taken. That is, when the polymerizable composition is applied to a resin substrate or the like and cured, it corresponds to the latter method, and when it is cured with the polymerizable composition alone, it corresponds to the former method.

  The polymerizable composition comprises at least an antistatic agent, a monomer, oligomer or prepolymer having a polymerizable functional group, and a polymerization initiator.

  Examples of monomers having a polymerizable functional group include ethylene glycol di (meth) acrylate, diethylene glycol di (meth) acrylate, polyethylene glycol di (meth) acrylate, 1,6-hexanediol di (meth) acrylate, ethoxylation 1 , 6-hexanediol diacrylate, neopentyl glycol di (meth) acrylate, ethoxylated neopentyl glycol di (meth) acrylate, propoxylated neopentyl glycol di (meth) acrylate, tripropylene glycol di (meth) acrylate, polypropylene glycol Diacrylate, 1,4-butanediol di (meth) acrylate, 1,9-nonanediol diacrylate, tetraethylene glycol diacrylate, 2-n-butyl-2-ethyl-1,3-propanedi Diacrylate, dimethylol tricyclodecane diacrylate, hydroxypivalate neopentyl glycol diacrylate, 1,3-butylene glycol di (meth) acrylate, ethoxylated bisphenol A di (meth) acrylate, propoxylated bisphenol A di (meth) ) Acrylate, cyclohexanedimethanol di (meth) acrylate, dimethylol dicyclopentane diacrylate, trimethylolpropane triacrylate, hydroxypivalic acid trimethylolpropane triacrylate, ethoxylated trimethylolpropane triacrylate, propoxylated trimethylolpropane triacrylate , Ethoxylated phosphate triacrylate, ethoxylated tripropylene glycol diacrylate, neopentyl glycol Modified trimethylolpropane diacrylate, stearic acid modified pentaerythritol diacrylate, pentaerythritol triacrylate, tetramethylolpropane triacrylate, tetramethylolmethane triacrylate, pentaerythritol tetraacrylate, caprolactone modified trimethylolpropane triacrylate, ethoxylated isocyanuric acid Triacrylate, tri (2-hydroxyethyl isocyanurate) triacrylate, propoxylate glyceryl triacrylate, tetramethylol methane tetraacrylate, pentaerythritol tetraacrylate, ditrimethylolpropane tetraacrylate, ethoxylated pentaerythritol tetraacrylate, dipentaerythritol hexaa Lilate, caprolactone-modified dipentaerythritol hexaacrylate, dipentaerythritol hydroxypentaacrylate, neopentyl glycol oligoacrylate, 1,4-butanediol oligoacrylate, 1,6-hexanediol oligoacrylate, trimethylolpropane oligoacrylate, pentaerythritol oligo Acrylate, 2-phenoxyethyl acrylate, acryloylmorpholine, 2-hydroxyethyl acrylate, 2-hydroxypropyl acrylate, 4-hydroxybutyl acrylate, isobutyl acrylate, t-butyl acrylate, isooctyl acrylate, isobornyl acrylate, cyclohexyl acrylate, 2 -Methoxyethyl acrylate, methoxytri Ethylene glycol acrylate, 2-ethoxyethyl acrylate, tetrahydrofurfuryl acrylate, 3-methoxybutyl acrylate, benzyl acrylate, ethoxyethoxyethyl acrylate, butoxyethyl acrylate, ethoxydiethylene glycol acrylate, methoxydipropylene glycol acrylate, methylphenoxyethyl acrylate, dipropylene Glycol acrylate, β-carboxyl ethyl acrylate, phenoxydiethylene glycol acrylate, vinyl caprolactam, vinyl pyrrolidone, N-vinylformamide, ethyl diglycol acrylate, trimethylolpropane formal monoacrylate, 4-t-butylcyclohexyl acrylate, tri (meth) allyl isocyania Nu And imide acrylate, isoamyl acrylate, ethoxylated succinic acid acrylate, caprolactone-modified tetrahydrofurfuryl acrylate, tribromophenyl acrylate, ethoxylated tribromophenyl acrylate, trifluoroethyl acrylate, and ω-carboxypolycaprolactone monoacrylate . Furthermore, edited by Shinzo Yamashita et al., “Cross-linking agent handbook” (1981, Taiseisha), Kiyoto Kato edition, “UV / EB curing handbook (raw material edition)”, (1985, Polymer publication society), Radtech. Study Group, "Application and Market of UV / EB Curing Technology", 79, (1989, CMC), Akamatsu Kiyoshi, "New Technology for Photosensitive Resins", (1987, CMC), Commercially available products described in Teiyama Shinichiro, “Polyester Resin Handbook” (1988, Nikkan Kogyo Shimbun) or cross-linkable monomers known in the industry can be mentioned, but the present invention is not limited thereto.

  Examples of oligomers and prepolymers include “Ebecryl 230, 244, 245, 270, 280 / 15IB, 284, 285, 4830, 4835, 4858, 4883, 8402, 8803, 8800, 254, 264, 265, manufactured by Daicel UCB. 294 / 35HD, 1259, 1264, 4866, 9260, 8210, 1290, 1290K, 5129, 2000, 2001, 2002, 2100, KRM7222, KRM7735, 4842, 210, 215, 4827, 4849, 6700, 6700-20T, 204, 205, 6602, 220, 4450, 770, IRR567, 81, 84, 83, 80, 657, 800, 805, 808, 810, 812, 1657, 1810, IRR302, 450, 670, 30, 835, 870, 1830, 1870, 2870, IRR267, 813, IRR483, 811, 436, 438, 446, 505, 524, 525, 554W, 584, 586, 745, 767, 1701, 1755, 740 / 40TP, 600, 601, 604, 605, 607, 608, 609, 600 / 25TO, 616, 645, 648, 860, 1606, 1608, 1629, 1940, 2958, 2959, 3200, 3201, 3404, 3411, 3412, 3415, 3500, 3502, 3600, 3603, 3604, 3605, 3608, 3700, 3700-20H, 3700-20T, 3700-25R, 3701, 3701-20T, 3703, 3702, RDX63182, 6040, IR 419 ”, manufactured by Sartomer“ CN104, CN120, CN124, CN136, CN151, CN2270, CN2271E, CN435, CN454, CN970, CN971, CN972, CN9782, CN981, CN9873, CN991 ”L871 , LR8986, PE56F, PE44F, LR8800, PE46T, LR8907, PO43F, PO77F, PE55F, LR8967, LR8981, LR8982, LR8992, LR9004, LR8956, LR8985, LR8987, UP35D, UA19T, F83L63 , LR8869, LR8889, LR8997, R8996, LR9013, LR9019, PO9026V, PE9027V, manufactured by Cognis, "Photomer 3005, 3015, 3016, 3072, 3982, 3215, 5010, 5429, 5430, 5432, 5662, 5806, 5930, 6008, 6010, 6019, 6184, 6210, 6217, 6230, 6891, 6892, 6893-20R, 6363, 6572, 3660, manufactured by Negami Kogyo Co., Ltd., "Art Resin UN-9000HP, 9000PEP, 9200A, 7600, 5200, 1003, 1255, 3320HA, 3320HB, 3320HC, 3320HS, 901T, 1200TPK, 6060PTM, 6060P ", manufactured by Nippon Synthetic Chemical Co., Ltd.," purple light UV-6630B, 7000B, 7510B, 746 " 1TE, 3000B, 3200B, 3210EA, 3310B, 3500BA, 3520TL, 3700B, 6100B, 6640B, 1400B, 1700B, 6300B, 7550B, 7605B, 7610B, 7620EA, 7630B, 7640B, 2000B, 2010B, 2250EA, 2750B, Nippon Kayaku “Kayarad R-280, R-146, R131, R-205, EX2320, R190, R130, R-300, C-0011, TCR-1234, ZFR-1122, UX-2201, UX-2301, UX3204, UX-3301, UX-4101, UX-6101, UX-7101, MAX-5101, MAX-5100, MAX-3510, UX-4101 "and the like. The present invention is not limited to these.

  The compounds having a polymerizable functional group can be used alone or in combination of two or more. The compounding amount of the compound having a polymerizable functional group is preferably 70 to 99.5% by weight, more preferably 75 to 99% by weight, and most preferably 80 to 99% by weight with respect to the entire polymerizable composition. .

  Irgacure 651, Irgacure 184, Darocur 1173, Irgacure 500, Irgacure 1000, Irgacure 2959, Irgacure 907, Irgacure 369, Irgacure 379, Irgacure 1700, Irgacure 149, Irgacure Cure 1800, Irgacure 1850, Irgacure 819, Irgacure 784, Irgacure 261, Irgacure OXE-01 (CGI124), CGI242 (Ciba Specialty Chemicals), Adekaoptomer N1414, Adekaoptomer N1717 (Asahi) Denka), Esacure 1001M (Lamberti), Lucyrin TPO (BASF), DidoCure 174 (Daido Kasei Co., Ltd.), JP-B 59-1281 And triazine derivatives described in JP-B-61-9621 and JP-A-60-60104, organic peroxides described in JP-A-59-1504 and JP-A-61-243807, and JP-B-43 No. 236844, Japanese Examined Patent Publication No. 44-6413, Japanese Examined Patent Publication No. 47-1604 and US Pat. No. 3,567,453, Japanese Patent Publication No. 2,848,328, USP No. 2,852,379, and US Pat. No. 2,940,553. Organic azide compounds described in the specification, ortho-quinonediazides described in Japanese Patent Publication No. 36-22062, Japanese Patent Publication No. 37-13109, Japanese Patent Publication No. 38-18015 and Japanese Patent Publication No. 45-9610, Japanese Patent Publication No. 55 -39162, JP-A-59-140203 And various onium compounds such as iodonium compounds described in “MACROMOLECULES”, Vol. 10, page 1307 (1977), azo compounds described in JP-A-59-142205, JP-A-1 -54440, European Patent No. 109851, European Patent No. 126712, "Journal of Imaging Science (J. IMAGE. SCI.)", Volume 30, p. 174 (1986). The metal allene complexes described above, the titanocenes described in JP-A No. 61-151197, “COORDINATION CHEMISTRY REVIEW”, Vol. 84, pages 85-277 (1988) and JP-A No. 2 -1822701 publication Transition metal complexes containing transition metals such as ruthenium, aluminate complexes described in JP-A-3-209477, borate compounds described in JP-A-2-157760, JP-A-55-127550 and JP 2,4,5-triarylimidazole dimer described in JP-A-60-202437, 2,2′-bis (o-chlorophenyl) -4,4 ′, 5,5′-tetraphenyl-1,1 ′ -Biimidazole, carbon tetrabromide, organic halogen compounds described in JP-A-59-107344, JP-A-5-213861, JP-A-5-255347, JP-A-5-255421, JP-A-6 JP-A-157623, JP-A-2000-344812, JP-A-2002-265512, Japanese Patent Application No. 2004-053009, and Japanese Patent Application No. 004-263413, sulfonium complex or oxosulfonium complex, JP 2001-264530 A, JP 2001-261661 A, JP 2000-80068 A, JP 2001-233842 A, US Pat. No. 3,558,309. (1971), USP 4202697 specification (1980), Japanese Patent Application Laid-Open No. 61-24558, Japanese Patent Application Publication No. 2004-534797, and Japanese Patent Application Laid-Open No. 2004-359539, Japanese Patent Application Publication No. 2002-530372. Examples of the bifunctional photoinitiator described in the publication No. are mentioned, but the present invention is not limited thereto. A polymerization initiator can be used individually or in combination of 2 or more types.

  In addition, by adding a sensitizer that absorbs ultraviolet to near-infrared light to the polymerizable composition, the activity for light from the ultraviolet to the near-infrared region is increased, and an extremely sensitive polymerizable composition. Can be a product.

  Examples of such sensitizers include benzophenones, unsaturated ketones typified by chalcone derivatives and dibenzalacetone, 1,2-diketone derivatives typified by benzyl and camphorquinone, benzoin derivatives, and fluorene derivatives. , Naphthoquinone derivatives, anthraquinone derivatives, xanthene derivatives, thioxanthene derivatives, xanthone derivatives, thioxanthone derivatives, coumarin derivatives, ketocoumarin derivatives, cyanine derivatives, merocyanine derivatives, oxonol derivatives and other polymethine dyes, acridine derivatives, azine derivatives, thiazine derivatives, oxazine derivatives , Indoline derivatives, azulene derivatives, azurenium derivatives, squarylium derivatives, porphyrin derivatives, tetraphenylporphyrin derivatives, triarylmethane derivatives, Trabenzoporphyrin derivative, tetrapyrazinoporphyrazine derivative, phthalocyanine derivative, tetraazaporphyrazine derivative, tetraquinoxalyloporphyrazine derivative, naphthalocyanine derivative, subphthalocyanine derivative, pyrylium derivative, thiopyrylium derivative, tetraphyrin derivative, annulene derivative, Spiropyran derivatives, spirooxazine derivatives, thiospiropyran derivatives, metal arene complexes, organoruthenium complexes, and the like. Other specific examples include Okawara Nobu et al., “Dye Handbook” (1986, Kodansha), Okawara Nobu et al. Examples include, but are not limited to, the dyes and sensitizers described in “Chemicals of Functional Dyes” (1981, CMC), edited by Tadasaburo Ikemori, “Special Functional Materials” (1986, CMC). thing No. Other examples include dyes and sensitizers that absorb light in the ultraviolet to near infrared region. Two or more of these may be used in any ratio as required. Among the sensitizers, thioxanthone derivatives include 2,4-diethylthioxanthone, 2-chlorothioxanthone, 2,4-dichlorothioxanthone, 2-isopropylthioxanthone, 4-isopropylthioxanthone, 1-chloro-4-propoxythioxanthone. Examples of benzophenones include benzophenone, 4-methylbenzophenone, 2,4,6-trimethylbenzophenone, 4,4′-dimethylbenzophenone, 4,4′-dimethoxybenzophenone, 4,4′-bis. (Diethylamino) benzophenone and the like can be mentioned. Coumarins can include coumarin 1, coumarin 338, coumarin 102 and the like. Ketocoumarins can include 3,3′-carbonylbis (7-diethylaminocouma). Emissions) and the like, but not limited thereto.

  The blending amount of the polymerization initiator and the sensitizer used in the present invention is not particularly limited, but the total amount thereof is preferably 0 to 20% by weight of the whole polymerizable composition, more preferably 0.1%. It is in the range of ˜15% by weight.

  The amount of the antistatic agent of the present invention blended in the polymerizable composition is not particularly limited. However, if blended in a large amount, it may take a long time to cure, and may affect curing properties such as being unable to cure completely. Therefore, the preferable blending amount is 0.01 to 30% by weight based on the entire polymerizable composition, more Preferably it is 0.02-25 weight%, Most preferably, it is 0.02-20 weight%.

  In addition, a polymerization inhibitor can be added to the polymerizable composition of the present invention for the purpose of preventing polymerization during storage.

  Specific examples of the polymerization inhibitor that can be added include hydroquinone, p-methoxyphenol, alkyl-substituted hydroquinone, catechol, tert-butylcatechol, phenothiazine, and the like. The addition amount of the polymerization inhibitor is not particularly limited, but is preferably used in the range of 0.01 to 5% by weight in the polymerizable composition.

  Furthermore, in the polymerizable composition of the present invention, a polymerization accelerator represented by amine, thiol, disulfide or the like or a chain transfer catalyst can be added for the purpose of further promoting the polymerization.

  Specific examples of the polymerization accelerator and chain transfer catalyst that can be added to the polymerizable composition of the present invention include, for example, trimethylamine, methyldimethanolamine, N-phenylglycine, triethanolamine, N, N-diethylaniline and the like. Amines, thiols described in USP No. 4414312 and JP-A 64-13144, disulfides described in JP-A-2-291561, USP 3558322 and JP-A 64-17048 And the O-acylthiohydroxamates and N-alkoxypyridinethiones described in JP-A-2-291560. The addition amount of the polymerization accelerator and the chain transfer catalyst is not particularly limited, but is preferably used in the range of 0.001 to 5% by weight in the polymerizable composition.

  The polymerizable composition in the present invention can be polymerized by applying energy by ultraviolet rays, visible rays, near infrared rays, electron beams or the like to obtain a desired polymer. The definitions of ultraviolet rays, visible rays, near-infrared rays and the like in this specification are based on “Iwanami Rikagaku Dictionary 4th Edition” (1987, Iwanami) edited by Ryogo Kubo et al.

  Therefore, the polymerizable composition of the present invention includes a low pressure mercury lamp, a medium pressure mercury lamp, a high pressure mercury lamp, an ultrahigh pressure mercury lamp, a xenon lamp, a carbon arc lamp, a metal halide lamp, a fluorescent lamp, a tungsten lamp, an argon ion laser, a helium cadmium laser, and helium. Neon laser, krypton ion laser, various semiconductor lasers, YAG laser, light emitting diode, CRT light source, plasma light source, electron beam, gamma ray, ArF excimer laser, KrF excimer laser, F2 laser, etc. A polymer (cured product) can be obtained.

  When using the antistatic agent in the present invention, other antistatic agents, pigments, colorants, antioxidants, ultraviolet absorbers, reinforcing agents, weathering agents, lubricants, antiblocking agents, plasticizers, if necessary. Additives such as a fragrance, an inorganic electrolyte, a foaming agent, a flame retardant, a filler, and a surface conditioner can be blended at the same time.

  Other antistatic agents include glycerin mono fatty acid ester, polyglycerin fatty acid ester, diethanolamine fatty acid amide, polyalkylene glycol alkyl ether, N-alkyl ammonium chloride, metal fine particles, metal oxides (ITO, FTO, ATO, etc.), etc. Can be mentioned.

  Examples of pigments include inorganic pigments such as carbon black, iron oxide, calcium carbonate, titanium oxide, zinc oxide, cadmium yellow, nickel titanium yellow, strontium chromate and Prussian blue, azo pigments, indigo pigments, phthalocyanine pigments, quinophthalone pigments, Examples thereof include organic pigments such as indoline pigments, isoindolinone pigments, diketopyrrolopyrrole pigments, quinacridone pigments, perylene pigments, indanthrone pigments, perinone pigments, and dioxazine pigments.

  Examples of the antioxidant include 2,6-di-tert. -Butylphenol (hereinafter, tert.-butyl is abbreviated as "t-butyl"), 2,6-di-t-butyl-4-methylphenol, 2,6-di-t-butyl-4-ethylphenol 2,4-dimethyl-6-tert-butylphenol, 4,4′-methylenebis (2,6-di-tert-butylphenol), 4,4′-bis (2,6-di-tert-butylphenol), 4 , 4'-bis (2-methyl-6-t-butylphenol), 2,2'-methylenebis (4-methyl-6-t-butylphenol), 2,2'-methylenebis (4-ethyl-6-t-) Butylphenol), 4,4′-butylidenebis (3-methyl-6-tert-butylphenol), 4,4′-isopropylidenebis (2,6-di-tert-butylphenol), 2,2′-methylenebis (4- Methyl-6-cyclo Xylphenol), 2,2'-methylenebis (4-methyl-6-nonylphenol), 2,2'-isobutylidenebis (4,6-dimethylphenol), 2,6-bis (2'-hydroxy-3) '-T-butyl-5'-methylbenzyl) 4-methylphenol, 3-t-butyl-4-hydroxyanisole, 2-t-butyl-4-hydroxyanisole, 3- (4-hydroxy-3,5- Stearyl di-t-butylphenyl) propionate, oleyl 3- (4-hydroxy-3,5-di-t-butylphenyl) propionate, 3- (4-hydroxy-3,5-di-t-butylphenyl) ) Dodecyl propionate, octyl 3- (4-hydroxy-3,5-di-t-butylphenyl) propionate, tetrakis {3- (4-hydroxy-3,5-di-t-butylpheny) ) Propionyloxymethyl} methane, 3- (4-hydroxy-3,5-di-t-butylphenyl) propionic acid glycerin monoester, 3- (4-hydroxy-3,5-di-t-butylphenyl) propion Esters of acids with glycerin monooleyl ether, 3- (4-hydroxy-3,5-di-t-butylphenyl) propionic acid butylene glycol ester, 3- (4-hydroxy-3,5-di-t-butyl) Phenyl) propionic acid thiodiglycol ester, 4,4′-thiobis (3-methyl-6-tert-butylphenol), 4,4′-thiobis (2-methyl-6-tert-butylphenol), 2,2′- Thiobis (4-methyl-6-tert-butylphenol), 2,6-di-tert-butyl-α-dimethylamino-p-cresol, 2,6-di-tert-butyl 4 (N, N′-dimethylaminomethylphenol), bis (3,5-di-tert-butyl-4-hydroxybenzyl) sulfide, tris {(3,5-di-tert-butyl-4-hydroxyphenyl) Propionyl-oxyethyl} isocyanurate, tris (3,5-di-t-butyl-4-hydroxyphenyl) isocyanurate, 1,3,5-tris (3 ′, 5′-di-t-butyl-4-hydroxy) Benzoyl) isocyanurate, bis {2-methyl-4- (3-n-alkylthiopropionyloxy) -5-tert-butylphenyl) sulfide, 1,3,5-tris (4-di-tert-butyl-3- Hydroxy-2,6-dimethylbenzyl) isocyanurate, tetraphthaloyl-di (2,6-dimethyl-4-tert-butyl-3-hydroxybenzyl sulfide), 6 -(4-Hydroxy-3,5-di-t-butylanilino) -2,4-bis (octylthio) -1,3,5-triazine, 2,2-thio- {diethyl-bis-3- (3 5-di-t-butyl-4-hydroxyphenyl)} propionate, N, N′-hexamethylenebis (3,5-di-t-butyl-4-hydroxy-hydrocinnamide), 3,5-di-t- Butyl-4-hydroxy-benzyl-phosphate diester, bis (3-methyl-4-hydroxy-5-tert-butylbenzyl) sulfide, 3,9-bis [1,1-dimethyl-2- {β- (3 -T-butyl-4-hydroxy-5-methylphenyl) propionyloxy} ethyl] -2,4,8,10-tetraoxaspiro [5,5] undecane, 1,1,3-tris (2-methyl- 4-hydroxy-5-t-butyl Phenyl) butane, 1,3,5-trimethyl-2,4,6-tris (3,5-di-t-butyl-4-hydroxybenzyl) benzene, bis {3,3'-bis- (4'- Hydroxy-3'-t-butylphenyl) butyric acid} glycol ester, triphenyl phosphite, diphenylisodecyl phosphite, phenyl diisodecyl phosphite, 4,4-butylidenebis (3-methyl-6-tert-butylphenyldi) Sotridecyl) phosphite, distearyl pentaerythritol diphosphite, diisodecylpentaerythritol diphosphite, tris (nonylphenyl) phosphite, tris (dinonylphenyl) phosphite, tris (2,4-di-t-butylphenyl) ) Phosphite, bis (2,6-di-tert-butyl-4-methylphenol) Nyl) pentaerythritol phosphite, 2,2-methylenebis (4,6-di-tert-butylphenyl) octyl phosphite, 1,1,3-butyridine tris (3-methyl-6-tert-butylphenyl diisotri) Decyl) phosphite, 2,2-propylidenebis (3-methyl-6-tert-butylphenyldiisotridecyl) phosphite, tetrakis (2,4-di-tert-butylphenyl) -4,4-biphenylene-diphosphonite, 9,10-dihydro-9-oxa-10-phosphaphenanthrene-10-oxide, 10- (3,5-di-t-butyl-4-hydroxybenzyl) -9,10-dihydro-9-oxa-10 Phosphaphenanthrene-10-oxide, 10-decyloxy-9,10-dihydro-9-oxa-10-phosphaphenane Len, Dioctylthiodipropionate, Didecylthiodipropionate, Dilaurylthiodipropionate, Dimyristylthiodipropionate, Distearylthiodipropionate, Laurylstearylthiodipropionate, Distearyl-β, β ′ -Thiodibutyrate, (3-octylthiopropionic acid) pentaerythritol tetraester, (3-decylthiopropionic acid) pentaerythritol tetraester, (3-laurylthiopropionic acid) pentaerythritol tetraester, (3-stearylthiopropion Acid) pentaerythritol tetraester, (3-oleylthiopropionic acid) pentaerythritol tetraester, (3-laurylthiopropionic acid) -4,4′-thiodi (3-methyl-5-tert-butyl-4-phenol) Examples thereof include esters, 2-mercaptobenzimidazole, 2-mercaptomethylbenzimidazole, 2-benzimidazole disulfide, dilauryl sulfide, amylthioglycol and the like.

  Examples of the ultraviolet absorber include 2- (2′-hydroxy-5′-methylphenyl) benzotriazole, 2- (2′-hydroxy-5′-t-butylphenyl) benzotriazole, 2- (2′- Hydroxy-3 ′, 5′-di-t-butylphenyl) benzotriazole, 2- (2′-hydroxy-3′-t-butyl-5′-methylphenyl) benzotriazole, 2- {2′-hydroxy- 3 ′, 5′-bis (α, α-dimethylbenzyl) phenyl} benzotriazole, 2- (2′-hydroxy-3′-tert-butyl-5′-methylphenyl) -5-chlorobenzotriazole, 2- (2′-hydroxy-3 ′, 5′-di-t-butylphenyl) -5-chlorobenzotriazole, 2- (2′-hydroxy-3 ′, 5′-di-t-amylphenyl) benzotria 2- (2′-hydroxy-5′-t-ocylphenyl) benzotriazole, 2- {2′-hydroxy-3 ′-(3 ″, 4 ″, 5 ″, 6 ″ -tetrahydrophthalimidomethyl) -5′-methylphenyl} benzotriazole, 2,2-methylenebis {4- (1,1,3,3-tetramethylbutyl) -6- (2H-benzotriazol-2-yl) phenol}, 2- ( 2'-hydroxy-5'-methacryloxyphenyl) -2H-benzotriazole, 2,4-dihydroxybenzophenone, 2-hydroxy-4-methoxybenzophenone, 2-hydroxy-4-octoxybenzophenone, 2-hydroxy-4- Dodecyloxybenzophenone, 2,2'-dihydroxy-4-methoxybenzophenone, 2,2'-dihydroxy-4,4'-meth Cibenzophenone, 2-hydroxy-4-methoxy-5-sulfobenzophenone, bis (5-benzoyl-4-hydroxy-2-methoxyphenylmethane), phenyl salicylate, 4-t-butylphenyl salicylate, 4-octylphenyl salicylate, etc. Salicylate type; Cyanoacrylate type such as ethyl-2-cyano-3,3-diphenyl acrylate, 2-ethylhexyl-2-cyano-3,3-diphenyl acrylate; 2-ethoxy-2′-ethyl oxalic acid bis Oxalic acids such as anilide, bis (2,2,6,6-tetramethyl-4-piperidyl) sebacate, bis (N-methyl-2,2,6,6-tetramethyl-4-piperidyl) sebacate Bis (1,2,2,6,6-pentamethyl-4-piperidyl)- -(3,5-di-tert-butyl-4-hydroxybenzyl) -2-n-butylmalonate, tetrakis (2,2,6,6-tetramethyl-4-piperidyl) -1,2,3 4-butanetetracarboxylate, tetrakis (1,2,2,6,6-pentamethyl-4-piperidyl) -1,2,3,4-butanetetracarboxylate, (mixed-2,2,6,6 -Tetramethyl-4-piperidyl / tridecyl) -1,2,3,4-butanetetracarboxylate, (mixed-1,2,2,6,6-pentamethyl-4-piperidyl / tridecyl) -1,2 , 3,4-butanetetracarboxylate, mixed- {2,2,6,6-tetramethyl-4-piperidyl / β, β, β ′, β′-tetramethyl-3,9- (2,4 , 8,10-Tetraoxaspiro [ , 5] undecane) diethyl} -1,2,3,4-butanetetracarboxylate, mixed- {1,2,2,6,6-pentamethyl-4-piperidyl / β, β, β ′, β ′ -Tetramethyl-3,9- (2,4,8,10-tetraoxaspiro [5,5] undecane) diethyl} -1,2,3,4-butanetetracarboxylate, poly {6- (1, 1,3,3-tetramethylbutyl) imino-1,3,5-triazine-2,4-diyl} {(2,2,6,6-tetramethyl-4-piperidyl) imino} hexamethylene {( 2,2,6,6-tetramethyl-4-piperidyl) imino}, dimethyl succinate / 4-hydroxy-2,2,6,6-tetramethyl-1-piperidineethanol polymer, 2,2,6, 6-tetramethyl-4-piperidylmetac Lilate, 1,2,2,6,6-pentamethyl-4-piperidylmethacrylate, ethylenebis (2,2,6,6-tetramethyl-3-oxa-4-piperidine), {2,2′-thiobis ( 4-t-octylphenolate)}-2-ethylhexylamine nickel (II), nickel dibutyldithiocarbamate, {2,2′-thiobis (4-t-octylphenolate)}-2-butylamine nickel (II), Nickel light stabilizers such as nickel bis (octylphenyl) sulfide, 3,5-di-t-butyl-4-hydroxybenzyl phosphate monoethylate nickel complex; 2,4-di-t-butylphenyl-3, And 5′-di-t-butyl-4′-hydroxybenzoate.

  Examples of the plasticizer include phthalic acid ester, phosphoric acid ester, polyester, trimellitic acid ester, chlorinated paraffin, dibasic acid ester, and epoxidized ester.

  Flame retardants include tetrabromobisphenol A, hexabromobenzene, tris (2,3-dibromopropyl) isocyanurate, 2,2-bis (4-hydroxyethoxy-3,5-dibromophenyl) propane, decabromodiphenyl oxide , Hexabromocyclodecane, tetrabromophthalic anhydride, chlorinated polyethylene, chlorinated paraffin, perchlorocyclopentadecane, chlorendic acid, tetrachlorophthalic anhydride, ammonium phosphate, tricresyl phosphate, triethyl phosphate, tris (β -Chloroethyl phosphate, trischloroethyl phosphate, trisdichloropropyl phosphate, cresyl diphenyl phosphate, xylenyl diphenyl phosphate, red phosphorus, tin oxide, antimony trioxide , Zirconium hydroxide, barium metaborate, zinc borate, aluminum hydroxide, magnesium hydroxide, nitrogenated guanidine, and the like.

  Examples of the surface conditioner include BYK-300, 302, 306, 307, 310, 315, 320, 322, 323, 325, 330, 331, 333, 337, 340, 344, 370, 375, 377, manufactured by Big Chemie. 350, 352, 354, 355, 356, 358N, 361N, 357, 390, 392, UV3500, UV3510, UV3570 ”,“ Tegorad-2100, 2200, 2250, 2500, 2700 ”manufactured by Tegochemy. These surface conditioners may be used alone or in combination of two or more as required.

  According to the present invention, there is provided an antistatic agent having not only high antistatic ability, but also transparency, solubility in a resin or solvent (compatibility), heat resistance, and moisture resistance, and does not contain metal or metal ions. It becomes possible.

  In the present invention, the resin molded product includes various films for FPD, conductive rubber, antistatic coating, electronic component package, and the like.

  In the present invention, the substrate includes glass, silicon, polycarbonate, polyester, aromatic polyamide, polyamideimide, polyimide, glass epoxy, polyphenylene ether resin, polyolefin resin, fluororesin, thermoplastic elastomer, epoxy resin, polyimide resin, and the like. However, the present invention is not limited to this.

Next, although this invention is demonstrated using an Example, this invention is not limited to these Examples.
First, the synthesis example of the compound in this invention is shown below.

<Synthesis Example 1> Synthesis of Compound (43) In 90 ml of toluene, 8.73 g of phosphorus pentachloride is added, and 14.54 g of catechol is added while stirring at 50 ° C. After the addition, the mixture is stirred at 70 ° C. for 2 hours and then allowed to cool. The gray solid obtained after distilling off the solvent under reduced pressure is dissolved in 120 ml of dichloromethane. A solution prepared by dissolving 8.16 g of tributylammonium in 20 ml of dichloromethane is added dropwise to this solution. After completion of dropping, the mixture is stirred for 1 hour at 25 ° C. Thereafter, the solvent was distilled off to obtain a compound (43).

<Synthesis Example 2> Synthesis of Compound (42) Compound (42) was obtained in the same manner as in Synthesis Example 1 except that catechol in Synthesis Example 1 was replaced with 4-cyanocatechol.

<Synthesis Example 3> Synthesis of Compound (6) A solution prepared by dissolving 5.53 g of Compound (42) and 2.89 g of tetrabutylammonium bromide in 30 ml of dichloromethane comprises 0.43 g of sodium hydroxide and 20 ml of ion-exchanged water. Add aqueous solution and stir vigorously at 25 ° C. for 1 hour. After the stationary separation layer, the organic layer is washed with ion-exchanged water and dried with magnesium sulfate. After the desiccant was filtered off, the solvent was distilled off to obtain compound (6).

<Synthesis Example 4> Synthesis of Compound (8) Compound (8) was obtained in the same manner as in Synthesis Example 3, except that Compound (42) in Synthesis Example 3 was replaced with Compound (43).

<Synthesis Example 5> Synthesis of Compound (101) Compound (101) was obtained in the same manner as in Synthesis Example 4, except that tetrabutylammonium bromide in Synthesis Example 4 was replaced with N-acetoxymethylpyridinium bromide.

<Synthesis Example 6> Synthesis of Compound (131) Compound (131) was synthesized in the same manner as in Synthesis Example 3, except that tetrabutylammonium bromide in Synthesis Example 3 was replaced with 1-benzyl-3-methylimidazolium chloride. Obtained.

<Synthesis Example 7> Synthesis of Compound (181) Compound (181) was obtained in the same manner as in Synthesis Example 4, except that tetrabutylammonium bromide in Synthesis Example 4 was replaced with tetrahexylphosphonium chloride.

<Synthesis Example 8> Synthesis of Compound (220) Compound (220) was synthesized in the same manner as in Synthesis Example 3, except that tetrabutylammonium bromide in Synthesis Example 3 was replaced with 1,2,5-trimethylpyrazinium bromide. Got.

<Synthesis Example 9> Synthesis of Compound (235) In the same manner as in Synthesis Example 3, except that tetrabutylammonium bromide in Synthesis Example 3 was replaced with 1- (2-hydroxyethyl) -1-methylpiperidinium chloride. Compound (235) was obtained.

<Synthesis Example 10> Synthesis of Compound (255) In the same manner as in Synthesis Example 4, except that tetrabutylammonium bromide in Synthesis Example 4 was replaced with 1,1-diethyl-2,5-diphenylpyrrolidinium bromide. Compound (255) was obtained.

<Synthesis Example 11> Synthesis of Compound (48) Compound (48) was obtained in the same manner as in Synthesis Example 1, except that catechol in Synthesis Example 1 was replaced with ethyl 3,4-dihydroxybenzoate.

<Synthesis Example 12> Synthesis of Compound (127) After synthesizing the tributylammonium salt of Compound (127) in the same manner as in Synthesis Example 1, except that the catechol in Synthesis Example 1 was replaced with 4-nitrocatechol, In the same manner as in Synthesis Example 3, except that Compound (42) of Synthesis Example 3 was replaced with tributylammonium salt of Compound (127) and tetrabutylammonium bromide was replaced with 1-methyl-3-allylimidazolium chloride. (127) was obtained.

<Synthesis Example 13> Synthesis of Compound (94) Except that 4-nitrocatechol in Synthesis Example 12 was replaced with 4-acetylcatechol and 1-methyl-3-allylimidazolium chloride was replaced with 1-butyl-4-methylpyridinium bromide. Gave compound (94) in the same manner as in Synthesis Example 12.

<Synthesis Example 14> Synthesis of Compound (20) Synthesis Example 12 except that 4-nitrocatechol in Synthesis Example 12 was replaced with 4-methoxycatechol and 1-methyl-3-allylimidazolium chloride was replaced with tetrabutylammonium chloride. In the same manner as above, compound (20) was obtained.

<Synthesis Example 15> Synthesis of Compound (54) Compound (54) was obtained in the same manner as in Synthesis Example 1, except that catechol in Synthesis Example 1 was replaced with 2,3-dihydroxynaphthalene.

  The synthesized compounds were analyzed for elemental analysis (MT-5, manufactured by Yanagimoto Seisakusho Co., Ltd.) and P content from ICP emission spectroscopic analysis (SPS 4000, manufactured by SII Nanotechnology Co., Ltd.). Table 2 shows the elemental analysis values and ICP emission spectroscopic analysis values of representative ones of the synthesized compounds.

Table 2

Example 1
As a UV curable monomer, 1.5 g of purple light UV1700B (manufactured by Nippon Synthetic Chemical Co., Ltd.), as a polymerization initiator, 0.15 g of DidoCure 174 (manufactured by Daido Kasei), and 3 g of PGME (propylene glycol monomethyl ether) as a diluent As an antistatic agent, 0.03 g (resin ratio 2%) of the compound (6) was weighed, mixed, and stirred so that the mixed solution became uniform.

Using the bar coater # 12, the mixed solution was applied onto a PET substrate to form a coating film, and then dried at 90 ° C. for 1 minute. The film was cured by light irradiation (640 mW / cm ² ) using a metal halide lamp. The antistatic ability was evaluated by measuring the surface resistance value of the cured coating film (R8340A manufactured by Advantest Corporation). Thereafter, the surface resistance value (Ω / □) is a value of 10 ¹⁰ units or less ◎, a value of 10 ¹¹ Ω / □ is ◯, a value of 10 ¹² Ω / □ is △, a value of 10 ¹³ Ω The value of / □ is indicated by ▽, and the 10 ^13th power or more is indicated by ×. Moreover, it measured about the total light transmittance (HGM-2B by Suga Test Instruments Co., Ltd.) of the cured coating film.

Examples 2 to 80
The surface resistance value of the cured coating film was measured in the same manner as in Example 1 except that the compounds listed in Table 3 were used instead of the compound (6).

Examples 81-160
The surface resistance values of the cured coating films were measured in the same manner as in Examples 1 to 80 except that 0.075 g (resin ratio 5%) of the antistatic agent of Examples 1 to 80 was used.

Comparative Example 1
The surface resistance value of the cured coating film was measured in the same manner as in Example 1 except that the commercially available antistatic agent Light Ester DQ-100 (manufactured by Kyoeisha Chemical Co., Ltd.) was used instead of the compound (6).

Comparative Example 2
The surface resistance value of the cured coating film was measured in the same manner as in Example 81 except that the commercially available antistatic agent Light Ester DQ-100 (manufactured by Kyoeisha Chemical Co., Ltd.) was used instead of the compound (6).

Comparative Example 3
The surface resistance value of the cured coating film was measured in the same manner as in Example 1 except that the commercially available antistatic agent Sanconol A400-50R (manufactured by Sanko Chemical Co., Ltd.) was used instead of the compound (6).

Comparative Example 4
The surface resistance value of the cured coating film was measured in the same manner as in Example 81 except that the commercially available antistatic agent Sanconol A400-50R (manufactured by Sanko Chemical Co., Ltd.) was used instead of the compound (6).

  Table 3 shows the results of Examples 1 to 160 and Comparative Examples 1 to 4.

Table 3

  When the antistatic agent of the present invention was used, a sufficient antistatic effect was obtained regardless of the amount added (Examples 1 to 160). Specifically, even when the values of 2% and 5% were compared, there was no significant difference, and even a small amount was sufficiently effective. On the other hand, when a commercially available antistatic agent was used, the surface resistance of the cured coating film exceeded the measurement range and did not function as an antistatic agent.

  The total light transmittance of the PET film of the substrate was 89.80%, and when the antistatic agent of the present invention was used, almost the same value was shown. The antistatic agent of the present invention is a highly transparent material. On the other hand, in Comparative Examples 1 to 4, irregularities were observed in the coating film because of the low compatibility of the antistatic agent. The total light transmittance showed a low value because the scattering component by them increased.

Example 161
5 g of the compound (6) was added to 100 g of Aquaable 48E (water-soluble alkyd resin manufactured by Showa Varnish Co., Ltd.) and mixed uniformly to prepare a resin varnish. This resin varnish was applied onto a glass substrate using a bar coater # 15 to form a coating film, and dried by heating at 120 ° C. for 45 minutes. Table 4 shows the results of measuring the surface resistance value of the coating film as an evaluation of the antistatic ability.

Example 162 to Example 200
The surface resistance value of the coating film was measured in the same manner as in Example 161 except that the compounds listed in Table 4 were used instead of the compound (6). The results are shown in Table 4.

Comparative Example 5
The surface resistance value of the coating film was measured in the same manner as in Example 161 except that the commercially available antistatic agent Light Ester DQ-100 (manufactured by Kyoeisha Chemical Co., Ltd.) was used instead of the compound (6). The results are shown in Table 4.

Comparative Example 6
The surface resistance value of the coating film was measured in the same manner as in Example 161 except that the commercially available antistatic agent Dasper 125B (manufactured by Miyoshi Resin Co., Ltd.) was used instead of the compound (6). The results are shown in Table 4.

Comparative Example 7
The surface resistance value of the coating film was measured in the same manner as in Example 161 except that the commercially available antistatic agent Emulgen 105 (manufactured by Kao Corporation) was used instead of the compound (6). The results are shown in Table 4.

Table 4

  As can be seen from the results in Table 4, when the antistatic agent of the present invention was used, even when blended in an aqueous varnish, it was uniformly dispersed, the surface resistance value was low, and a high antistatic effect was obtained. On the other hand, in the comparative example, the surface resistance value was higher than that in the case of using the antistatic agent of the present invention. Particularly in Comparative Example 7, the antistatic agent could not be uniformly dispersed in the aqueous varnish, and the coating film was whitened.

Example 201
100 g of high density polyethylene (manufactured by Aldrich) and 5 g of compound (6) as an antistatic agent were kneaded at 130 ° C. for 8 hours using a kneader manufactured by Inoue Seisakusho. Further, the kneaded product was extruded using an extrusion molding machine to form a resin plate having a thickness of 5 mm. As an evaluation of the antistatic ability, the surface resistance value of the resin plate was measured. Further, the yellowing of the resin plate was visually evaluated.

Examples 202-240
Instead of the compound (6), the surface resistance value of the resin plate was measured in the same manner as in Example 201 except that the compounds described in Table 5 were used, and yellowing was evaluated.

Comparative Example 8
The surface resistance value of the resin plate was measured in the same manner as in Example 201 except that a commercially available antistatic agent dodecylpyridinium chloride (DPC: manufactured by Tokyo Chemical Industry Co., Ltd.) was used instead of the compound (6), and yellowing was reduced. evaluated.

Comparative Example 9
The surface resistance value of the resin plate was measured in the same manner as in Example 201 except that the commercially available antistatic agent Dasper 125B (manufactured by Miyoshi Resin Co., Ltd.) was used instead of the compound (6), and yellowing was evaluated. .

Comparative Example 10
The surface resistance value of the resin plate was measured in the same manner as in Example 201 except that a commercially available antistatic agent Emulgen 105 (manufactured by Kao Corporation) was used instead of the compound (6), and yellowing was evaluated.

  The results of Examples 201 to 240 and Comparative Examples 8 to 10 are shown in Table 5.

Table 5

  As can be seen from the results in Table 5, when the antistatic agent of the present invention is used (Examples 201 to 240), even if the thermoplastic resin is kneaded at a high temperature of 130 ° C. for 8 hours, it has a high antistatic ability. It was found that Moreover, no yellowing was observed in the resin plate using the antistatic agent of the present invention.

  On the other hand, in Comparative Examples 8 to 10 tested with a general-purpose antistatic agent, an antistatic effect was not obtained, and yellowing was also observed due to kneading at a high temperature for a long time.

Example 241
A solution prepared by dissolving 0.5 g of compound (6) in 10 g of PGME (propylene glycol monomethyl ether) was applied onto a 100 μm PET film using a spin coater and dried at 100 ° C. for 1 minute to form a coating film. . As an evaluation of the antistatic ability, the surface resistance value of the coating film was measured.

Examples 242-280
The surface resistance value of the coating film was measured in the same manner as in Example 241 except that the compounds listed in Table 6 were used instead of the compound (6).

Comparative Example 11
The surface resistance value of the coating film was measured in the same manner as in Example 241 except that a commercially available antistatic agent dodecylpyridinium chloride (DPC: manufactured by Tokyo Chemical Industry Co., Ltd.) was used instead of the compound (6).

Comparative Example 12
The surface resistance value of the coating film was measured in the same manner as in Example 241 except that the commercially available antistatic agent Dasper 125B (manufactured by Miyoshi Resin Co., Ltd.) was used instead of the compound (6).

  Table 6 shows the results of Examples 241 to 280 and Comparative Examples 11 to 12.

Table 6

  As is clear from the results in Table 6, the antistatic agent of the present invention exhibited a low surface resistance value compared to a general-purpose antistatic agent.

Example 281
As a UV monomer, 5 g of purple light UV1700B (manufactured by Nippon Synthetic Chemical Co., Ltd.), as a polymerization initiator, 0.5 g of DidoCure 174 (manufactured by Daido Kasei Co., Ltd.), 15 g of ethyl acetate as a diluting solvent, and 0.25 g of compound (6) (Resin ratio 5 wt%) Weighed, mixed and stirred.

Using a bar coater # 12, the mixture was applied onto a PET substrate to form a coating film, and then dried at 100 ° C. for 1 minute. The film was cured by light irradiation using a metal halide lamp (640 mW: cm ² ). The haze value of the cured coating film immediately after curing and the haze value of the cured coating film after storage for one week (25 ° C., 60% RH) were measured.

Examples 282 to 320
A cured coating film was prepared and the haze value was measured in the same manner as in Example 281 except that the compound shown in Table 7 was used instead of the compound (6).

  The results of Examples 281 to 320 are shown in Table 7.

Table 7

  From the results of Table 7, when the antistatic agent of the present invention was used, immediately after curing, all the cured coating films had low haze values and high transparency. Furthermore, the haze value of the cured coating film stored for one week at 25 ° C. and 60% RH also showed a value almost equal to that immediately after curing.

Example 321
As a UV curable monomer, 5 g of Aronix M408 (manufactured by Toagosei Co., Ltd.), 0.5 g of DidoCure 174 (manufactured by Daido Kasei Co., Ltd.) as a polymerization initiator, 15 g of ethyl acetate as a diluting solvent, 0 of compound (6) .25 g (resin ratio: 5% by weight) were weighed, mixed and stirred.

Using the bar coater # 12, the mixed solution was applied onto a PET substrate to form a coating film, and then dried at 100 ° C. for 1 minute. The film was cured by light irradiation (640 mW / cm ² ) using a metal halide lamp. The surface resistance value of the cured coating film was measured by changing the humidity conditions.

Examples 322-360
The surface resistance value was measured in the same manner as in Example 321 except that the compound shown in Table 8 was used instead of the compound (6).

Comparative Examples 13-14
Surface resistance values were measured in the same manner as in Example 321 except that the compounds shown in Table 8 were used instead of the compound (6).

  The results of Examples 321 to 360 and Comparative Examples 13 to 14 are shown in Table 8.

Table 8

When the antistatic agent of the present invention was used, there was hardly any change in the surface resistance value due to humidity. However, when the compound of the comparative example was used, the surface resistance value increased as the humidity decreased, and it was 10 ¹⁴ Ω / □ or more at 35% RH, and did not function as an antistatic agent.

Example 361
Using a tablet molding machine, pellets of compound (6) were prepared, and the surface resistance value was measured by changing the humidity conditions.

Examples 362 to 400, Comparative Examples 15 to 16
The surface resistance value was measured in the same manner as in Example 361 except that the compound shown in Table 9 was used instead of the compound (6).

  The results of Examples 361 to 400 and Comparative Examples 15 to 16 are shown in Table 9.

Table 9

  In the antistatic agent of the present invention shown in Table 9, the surface resistance value was not affected by humidity at all, and showed a favorable value of almost the same in any humidity condition. However, the compound of the comparative example was significantly affected by humidity. Furthermore, the surface resistance value became very large under the condition where the humidity was 35% RH, and it did not function as an antistatic agent.

Examples 401-415
Some of the antistatic agents of the present invention shown in Table 10 were subjected to solubility tests in organic solvents and UV curable monomers.

Comparative Example 17
A solubility test of a commercially available antistatic agent light ester DQ-100 (manufactured by Kyoeisha Chemical Co., Ltd.) in an organic solvent and a UV curable monomer was performed.

  The results of Examples 401 to 415 and Comparative Example 17 are shown in Table 10.

Table 10

  The antistatic agents of the present invention shown in Table 10 were highly soluble in organic solvents and UV curable monomers. On the other hand, the antistatic agent of the comparative example had high solubility in water, low solubility in organic solvents and UV curable monomers, and exhibited almost the opposite properties to the antistatic agent of the present invention.

  Considering the above results comprehensively, the compound group listed in the comparative example is characterized by being easily yellowed. This is thought to be due to the fact that it is composed of organic cations and inorganic anions. Furthermore, since the compound group mentioned in the comparative example has a high surface resistance value and low antistatic ability under low humidity conditions, it is considered that water is greatly involved in the static elimination mechanism. However, since the antistatic agent of the present invention is a salt between organic substances, it is difficult to yellow, and the surface resistance value was not affected by humidity under various conditions.

  Comprehensively judging from these examples, the antistatic agent comprising a combination of the organic cation and the specific anion of the present invention has not only high antistatic ability but also colorless transparency and solubility in a resin and a solvent ( It is an excellent antistatic agent that has characteristics such as compatibility (compatibility), heat resistance, and moisture resistance, has no characteristics of precious metals, heavy metals, and metal ions, and is colorless even when dissolved in a solvent or resin. It can be said.

Claims (13)

An antistatic agent comprising a compound represented by the following general formula (1).
General formula (1)

Wherein R ^{01 to} R ¹² are each independently a hydrogen atom, a halogen atom, a cyano group, a nitro group, a hydroxyl group, a carboxyl group, a sulfonic acid group, a substituted or unsubstituted alkenyl group, a substituted or unsubstituted alkyl Group, substituted or unsubstituted alkyloxy group, substituted or unsubstituted aryl group, substituted or unsubstituted aryloxy group, substituted or unsubstituted heterocyclic group, substituted or unsubstituted heterocyclic oxy group, substituted or unsubstituted Substituted alkylsulfanyl group, substituted or unsubstituted arylsulfanyl group, substituted or unsubstituted acyl group, substituted or unsubstituted alkyloxycarbonyl group, substituted or unsubstituted aryloxycarbonyl group, substituted or unsubstituted alkylsulfonyl Group or a substituted or unsubstituted arylsulfonyl group .
R ⁰¹ and R ^02, R ⁰² and R ^03, R ⁰³ and R ^04, R ⁰⁵ and R ^06, R ⁰⁶ and R ^07, R ⁰⁷ and R ^08, R ⁰⁹ and R ^10, R ¹⁰ and R ^11, R ¹¹ And R ¹² may be bonded to each other to form a ring structure.
X ⁺ represents an onium cation. ) The antistatic agent according to claim 1, wherein X ^{+ in the} general formula (1) is an onium cation represented by the following general formula (2) to general formula (8).
General formula (2)

General formula (3)

General formula (4)

General formula (5)

General formula (6)

General formula (7)

General formula (8)

Wherein R ^{13 to} R ¹⁶ are each independently a hydrogen atom, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkenyl group, a substituted or unsubstituted aryl group, a substituted or unsubstituted heterocyclic group. A substituted or unsubstituted alkyloxy group, a substituted or unsubstituted aryloxy group, a substituted or unsubstituted heterocyclic oxy group, a substituted or unsubstituted acyl group, a substituted or unsubstituted carbonyloxy group, or a halogen atom Represents a selected group.
R ¹³ and R ¹⁴ , R ¹⁴ and R ¹⁵ , R ¹⁵ And R ¹⁶ or R ¹³ And R ¹⁶ may be bonded to each other to form a ring structure.
R ^{17 to} R ²⁷ and R ^{30 to} R ³² are each independently a hydrogen atom, halogen atom, hydroxyl group, carboxyl group, cyano group, nitro group, amino group, substituted or unsubstituted alkyloxy group, substituted or unsubstituted An alkyl group, a substituted or unsubstituted alkenyl group, a substituted or unsubstituted alkynyl group, a substituted or unsubstituted aryl group, a substituted or unsubstituted heterocyclic group, or a substituted or unsubstituted acyl group.
Adjacent R ^{17 to} R ²⁷ and R ^{30 to} R ³² may be bonded to each other to form a ring.
R ²⁸ and R ²⁹ each independently represents a hydrogen atom, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkenyl group, a substituted or unsubstituted aryl group, or a substituted or unsubstituted heterocyclic group. .
R ^{33 to} R ³⁶ each independently represent a hydrogen atom, a substituted or unsubstituted alkyl group, or a substituted or unsubstituted aryl group.
R ^{37 to} R ⁵⁴ each independently represent a hydrogen atom, a halogen atom, a hydroxyl group, a substituted or unsubstituted alkyl group, a substituted or unsubstituted aryl group, a substituted or unsubstituted heterocyclic group, a substituted or unsubstituted alkyl Represents an oxy group, a substituted or unsubstituted aryloxy group, or a substituted or unsubstituted heterocyclic oxy group, or R ³⁷ and R ³⁸ , R ³⁹ and R ⁴⁰ , R ⁴¹ and R ⁴² , R ⁴³ and R ⁴⁴ , R ⁴⁵ and R ⁴⁶ , R ⁴⁷ and R ⁴⁸ , R ⁴⁹ and R ⁵⁰ , R ⁵¹ and R ⁵² , or R ⁵³ and R ⁵⁴ , together with a carbon atom to be bonded, together with a carbonyl group (C═O ).
R ³³ and R ³⁷ , R ³⁷ and R ³⁹ , R ³⁹ and R ⁴¹ , R ⁴¹ and R ⁴³ , R ³⁵ and R ⁴⁵ , R ⁴⁵ and R ⁴⁷ , R ⁴⁷ and R ⁴⁹ , R ⁴⁹ and R ⁵¹ , Alternatively, R ⁵¹ and R ⁵³ may be bonded to each other to form a ring structure. ) A resin composition comprising a resin and the antistatic agent according to claim 1. The resin composition according to claim 3, wherein the resin is a thermoplastic resin and / or a thermosetting resin. A resin varnish comprising the resin composition according to claim 3 and 4 and a solvent. A polymerizable composition comprising a compound having a polymerizable functional group, a polymerization initiator, and the antistatic agent according to claim 1. A method for producing a cured resin having antistatic ability, wherein the polymerizable composition according to claim 6 is cured by light irradiation. A cured resin product having antistatic ability, which is produced by the production method according to claim 7. A coating liquid comprising a solvent and the antistatic agent according to claim 1. The manufacturing method of the resin molded product which has the antistatic ability formed by apply | coating the coating liquid of Claim 9 to a resin molded product. A resin shaped article having antistatic ability, produced by the production method according to claim 10. A resin shaped article having antistatic ability, which is shaped using the resin composition according to claim 3 or 4, the resin varnish according to claim 5, or the polymerizable composition according to claim 6. The resin composition according to claim 3 or 4, the resin varnish according to claim 5, the polymerizable composition according to claim 6, or the coating liquid according to claim 9, and having antistatic ability. Paint film .