JP5434589B2 - 重合性組成物および架橋性樹脂 - Google Patents
重合性組成物および架橋性樹脂 Download PDFInfo
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- JP5434589B2 JP5434589B2 JP2009505260A JP2009505260A JP5434589B2 JP 5434589 B2 JP5434589 B2 JP 5434589B2 JP 2009505260 A JP2009505260 A JP 2009505260A JP 2009505260 A JP2009505260 A JP 2009505260A JP 5434589 B2 JP5434589 B2 JP 5434589B2
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Classifications
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- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
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- C08G61/02—Macromolecular compounds containing only carbon atoms in the main chain of the macromolecule, e.g. polyxylylenes
- C08G61/04—Macromolecular compounds containing only carbon atoms in the main chain of the macromolecule, e.g. polyxylylenes only aliphatic carbon atoms
- C08G61/06—Macromolecular compounds containing only carbon atoms in the main chain of the macromolecule, e.g. polyxylylenes only aliphatic carbon atoms prepared by ring-opening of carbocyclic compounds
- C08G61/08—Macromolecular compounds containing only carbon atoms in the main chain of the macromolecule, e.g. polyxylylenes only aliphatic carbon atoms prepared by ring-opening of carbocyclic compounds of carbocyclic compounds containing one or more carbon-to-carbon double bonds in the ring
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- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
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- B32B27/32—Layered products comprising a layer of synthetic resin comprising polyolefins
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- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
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- C08J5/24—Impregnating materials with prepolymers which can be polymerised in situ, e.g. manufacture of prepregs
- C08J5/249—Impregnating materials with prepolymers which can be polymerised in situ, e.g. manufacture of prepregs characterised by the additives used in the prepolymer mixture
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- C—CHEMISTRY; METALLURGY
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- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
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- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B3/00—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties
- H01B3/18—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances
- H01B3/30—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes
- H01B3/44—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes vinyl resins; acrylic resins
- H01B3/441—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes vinyl resins; acrylic resins from alkenes
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2365/00—Characterised by the use of macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain; Derivatives of such polymers
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Description
(1) シクロオレフィンモノマー、メタセシス重合触媒、および下式(A)で表される基を分子内に少なくとも2つ有する化合物(α)を含むことを特徴とする重合性組成物。
(A):CH2=CRa−CRbRc−
(式中、Raは、炭素数1〜5のアルキル基を表す。RbおよびRcはそれぞれ独立して水素原子または炭化水素基を表し、互いに結合して脂環もしくは二重結合を形成するかまたは芳香環の一部となっていてもよい。)
(3)前記式(A)において、Raがメチル基である前記(1)または(2)に記載の重合性組成物。
(4)シクロオレフィンモノマー100質量部に対し、前記化合物(α)の量が0.1〜50質量部である前記(1)〜(3)のいずれかに記載の重合性組成物。
(5)さらに連鎖移動剤を含む含む前記(1)〜(4)のいずれかに記載の重合性組成物。
(6)前記連鎖移動剤が式(C):CH2=CH−Q−Yで表される化合物であることを特徴とする前記(5)に記載の重合性組成物。
(式中、Qは二価の炭化水素基を表し、Yはビニル基、アクリロイル基またはメタクリロイル基を表す。)
(7)さらに架橋剤を含む前記(1)〜(6)のいずれかに記載の重合性組成物。
(8)前記架橋剤が非極性ラジカル発生剤であることを特徴とする、前記(7)に記載の重合性組成物。
(10)前記(1)〜(8)のいずれかに記載の重合性組成物を塊状重合する工程を含む、架橋性樹脂の製造方法。
(11)前記(1)〜(8)のいずれかに記載の重合性組成物を支持体に塗布または含浸し、塊状重合する工程を含む、架橋性樹脂複合体の製造方法。
(12)前記(9)に記載の架橋性樹脂を架橋する工程を含む、架橋体の製造方法。
(13)前記(9)に記載の架橋性樹脂の成形体を支持体上で架橋する工程を含む、架橋樹脂複合体の製造方法。
(14)前記(10)に記載の製造方法で得られた架橋性樹脂複合体を架橋する工程を含む、架橋樹脂複合体の製造方法。
(15)前記架橋を別の支持体上で行う、前記(14)に記載の架橋樹脂複合体の製造方法。
本発明の重合性組成物は、シクロオレフィンモノマー、メタセシス重合触媒、および下式(A)で表される基を分子内に少なくとも2つ有する化合物(α)を含む。
(A):CH2=CRa−CRbRc−
(式中、Raは、炭素数1〜5のアルキル基を表す。RbおよびRcはそれぞれ独立して水素原子または炭化水素基を表し、互いに結合して脂環もしくは二重結合を形成するかまたは芳香環の一部となっていてもよい。)
本発明の重合性組成物を構成するシクロオレフィンモノマーは、炭素原子で形成される環構造を有し、該環中に炭素−炭素二重結合を有する化合物である。その例として、ノルボルネン系モノマーおよび単環シクロオレフィンなどが挙げられ、ノルボルネン系モノマーが好ましい。ノルボルネン系モノマーは、ノルボルネン環を含むモノマーである。具体的には、ノルボルネン類、ジシクロペンタジエン類、テトラシクロドデセン類などが挙げられる。これらは、アルキル基、アルケニル基、アルキリデン基、アリール基などの炭化水素基や、カルボキシル基又は酸無水物基などの極性基が置換基として含まれていてもよい。
また、ノルボルネン環の二重結合以外に、さらに二重結合を有していてもよい。これらの中でも、極性基を含まない、すなわち炭素原子と水素原子のみで構成されるノルボルネン系モノマーが好ましい。
本発明の重合性組成物を構成するメタセシス重合触媒は、シクロオレフィンモノマーを、メタセシス開環重合させるものであれば特に限定されない。
メタセシス重合触媒としては、遷移金属原子を中心にして、イオン、原子、多原子イオン及び/又は化合物が複数結合してなる錯体が挙げられる。遷移金属原子としては、5族、6族及び8族(長周期型周期表、以下同じ)の原子が使用される。それぞれの族の原子は特に限定されないが、好ましい5族の原子としてはタンタルが挙げられ、好ましい6族の原子としては、モリブデン、タングステンが挙げられ、好ましい8族の原子としては、ルテニウム、オスミウムが挙げられる。
活性剤の使用量は、(メタセシス重合触媒中の金属原子:活性剤)のモル比で、通常、1:0.05〜1:100、好ましくは1:0.2〜1:20、より好ましくは1:0.5〜1:10の範囲である。
本発明の重合性組成物を構成する化合物(α)は、下式(A)で表される基を分子内に少なくとも2つ有する。
(A):CH2=CRa−CRbRc−
得られる架橋性樹脂が化合物(α)を含むことで、これを加熱し、溶融したときに化合物(α)が可塑剤として作用し、流動性に優れる。そのため、該架橋性樹脂は、後述する支持体の表面への樹脂の埋め込み性に優れる。また、化合物(α)は、空気中の酸素やラジカル発生剤により発生したラジカルによるラジカル架橋を促進し、架橋助剤としても作用する。このため、該架橋性樹脂を架橋すると、架橋密度が高く、強度の高い架橋体を得ることができる。さらに、化合物(α)は分子中に二重結合を有しているので、架橋性樹脂を架橋する際に化合物(α)も共に架橋することにより分子鎖に取り込まれる。これにより該化合物(α)のブリードアウト等がなく、耐熱性が高い架橋体を得ることができる。
ベンゼンがより好ましい。
本発明の重合性組成物は、さらに重合反応の連鎖移動剤を含有することが好ましい。連鎖移動剤としては、式(B):CH2=CH−で表される基を有する化合物を用いることができる。
本発明の重合性組成物は、塊状重合後に架橋性を有する樹脂とするために、架橋剤を含有するのが好ましい。架橋剤としては、例えば、ラジカル発生剤、エポキシ化合物、イソシアネート基含有化合物、カルボキシル基含有化合物、酸無水物基含有化合物、アミノ基含有化合物、ルイス酸などが挙げられる。これらは1種単独で又は2種以上を組み合わせて使用することができる。これらの中でも、ラジカル発生剤、エポキシ化合物、イソシアネート基含有化合物、カルボキシル基含有化合物、酸無水物基含有化合物が好ましく、ラジカル発生剤、エポキシ化合物、イソシアネート基含有化合物がより好ましく、ラジカル発生剤が特に好ましい。
本発明の重合性組成物には、各種の添加剤、例えば、重合反応遅延剤、ラジカル架橋遅延剤、強化材、改質剤、酸化防止剤、充填材、着色剤、光安定剤などを含有させることができる。これらは、予め後述するモノマー液又は触媒液に溶解又は分散させて用いることができる。
改質剤としては、天然ゴム、ポリブタジエン、ポリイソプレン、スチレン−ブタジエン共重合体(SBR)、スチレン−ブタジエン−スチレンブロック共重合体(SBS)、スチレン−イソプレン−スチレン共重合体(SIS)、エチレン−プロピレン−ジエンターポリマー(EPDM)、エチレン−酢酸ビニル共重合体(EVA)及びこれらの水素化物などのエラストマーなどが挙げられる。
酸化防止剤としては、ヒンダードフェノール系、リン系、アミン系などの各種のプラスチック・ゴム用酸化防止剤などが挙げられる。これらの酸化防止剤は単独で用いてもよいが、二種以上を組合せて用いることが好ましい。
本発明の架橋性樹脂は、前記重合性組成物を重合することによって得られる。重合方法は特に限定されないが、塊状重合が好ましい。
重合性組成物を塊状重合する方法としては、(i)重合性組成物を支持体に注ぐか又は塗布し、塊状重合する方法、(ii)重合性組成物を型内に注ぎこみ、塊状重合する方法、(iii)重合性組成物を支持体に含浸し塊状重合する方法などが挙げられる。なお、(i)又は(iii)の方法によって前記重合性組成物を塊状重合すると、支持体と架橋性樹脂とを含む架橋性樹脂複合体が得られる。
本発明の架橋体の製造方法は、前記架橋性樹脂を架橋する工程を含む。架橋性樹脂の架橋方法は限定されないが、例えば、本発明の架橋性樹脂を加熱溶融するなどして、架橋性樹脂が架橋反応を起す温度以上に維持する方法が挙げられる。架橋性樹脂を架橋させるときの温度は、前記塊状重合時のピーク温度より20℃以上高いことが好ましく、通常170〜250℃、好ましくは180〜220℃である。また、架橋する時間は特に制約されないが、通常数分から数時間である。
本発明の架橋樹脂複合体の製造方法は、(I)前記本発明の架橋性樹脂の成形体を支持体上で架橋する工程を含む方法、および(II)前記本発明の架橋性樹脂複合体を架橋する工程を含む方法、である。上記(II)の方法においては、本発明の架橋性樹脂複合体の架橋を別の支持体上で行ってもよい。いずれの方法においても、架橋の方法は限定されず、上記架橋体の製造方法と同様である。
プリプレグから架橋性樹脂部分をサンプリングし、テトラヒドロフランを展開溶媒とするゲル・パーミエーション・クロマトグラフィー測定を行い、標準ポリスチレン換算値として求めた。
架橋樹脂複合体Aを目視で観察し以下の指標で評価した。
A:全面積に対し、まったくカスレがなく、平坦である。
B:全面積に対し、カスレが0%を越えて10%未満の面積である。
C:全面積に対し、カスレが10%以上30%未満の面積である。
D:全面積に対し、カスレが30%以上の面積である。
なお、カスレとは、銅箔と樹脂、樹脂とガラスクロス、樹脂とIPC基板など異種材料間で空間が発生していることをいう。カスレが少ないほど、配線パターンの有無に関わらず、架橋樹脂複合体は平坦になり、成形性に優れることを表す。
架橋樹脂複合体Bから銅箔を引き剥がすときの強度を、JIS C6481に基づいて測定した。ピール強度の値に応じて以下の指標で評価した。
A:0.7kN/mを超える
B:0.6kN/mを超え0.7kN/m以下
C:0.4kN/mを超え0.6kN/m以下
D:0.4kN/m以下
架橋樹脂複合体Bを5mm角に切り出し、40℃の塩化第二鉄溶液(サンハヤト社製)に浸漬し、表面の銅箔を取り除いてTMA測定用試験片を得た。TMAとは、試験片に圧縮、引張り、曲げなどの非振動的荷重を加えてその物質の変形を温度又は時間の関数として測定する方法である。このTMA測定用試験片についてSIIナノテクノロジー社製TMA装置により180℃〜240℃までの線膨張変化率(α2)測定を行った。α2の変化率が小さいと、耐熱信頼性が優れることを表す。
比較例1の値を基準(評価D)として、以下の指標で評価した。
A:α2が10%以上低い。
B:α2が5%以上10%未満低い。
C:α2が0%を超え5%未満低い。
D:α2が比較例1と同じか、または高い。
架橋樹脂複合体Bを5mm×50mmの矩形に切り出し、上記(4)と同様に塩化第二鉄溶液を用いて表面の銅箔を取り除き、試験片を得た。SIIナノテクノロジー社製DMA装置(粘弾性スペクトロメーター)にて架橋樹脂の弾性率の変化を測定した。比較例1の値を基準(評価D)として、以下の指標で評価した。弾性率が高いほど、架橋密度が高いことを表す。DMAとは、試験片に時間によって変化する歪みまたは応力を与えて、それによって発生する応力または歪みを測定する方法である。
A:弾性率が10%以上高い。
B:弾性率が5%以上10%未満高い。
C:弾性率が0%を超え10%未満高い。
D:弾性率が比較例1と同じか、または低い。
架橋樹脂複合体Bを20mm角に切り出し、上記(4)と同様に塩化第二鉄溶液を用いて表面の銅箔を取り除き、試験片を得た。インピーダンスアナライザー(アジレントテクノロジー社製、型番号E4991A)を用いて周波数1GHzにおける積層体Cの誘電損失(tanδ)を容量法にて測定した。誘電損失の値に応じて以下の指標で評価した。
A:0.0015以下
B:0.0015を超え0.0020以下
C:0.0020を超える
メタセシス触媒として、ベンジリデン(1,3−ジメシチルイミダゾリジン−2−イリデン)(トリシクロヘキシルホスフィン)ルテニウムジクロリドを0.1部、及びトリフェニルホスフィン0.2部をフラスコに入れた。該フラスコに窒素雰囲気下でトルエン2.4部を注ぎ入れてメタセシス触媒を溶解し、触媒液を調製した。
m−ジイソプロペニルベンゼンの量をそれぞれ表1に示す量とした以外は実施例1と同様にして、プリプレグ、および架橋樹脂複合体を得た。これらについて各特性を評価した結果を表1に示す。
連鎖移動剤として、メタクリル酸ヘキセニル1.8部に代えて、1,5−ヘキサジエン1.8部を用いた以外は実施例2と同様にして、プリプレグ、および架橋樹脂複合体を得た。これらについて各特性を評価した結果を表1に示す。
化合物(α)として、m−ジイソプロペニルベンゼン20部に代えて、トリメタリルイソシアヌレート(TMAIC/商標登録番号第2025324号)3部を用いた以外は実施例1と同様にして、プリプレグ、および架橋樹脂複合体を得た。これらについて各特性を評価した結果を表1に示す。
架橋剤として、ジ−t−ブチルパーオキサイド1部に代えて、2,3−ジメチル−2,3−ジフェニルブタン(日本油脂社製、製品名ノフマーBC−90)2部を用いた以外は実施例4と同様にして、プリプレグを得た。こうして得られたプリプレグを用いて、熱プレスの条件をいずれも温度240℃、時間30分、圧力3MPaとした他は実施例1の(A)および(B)の方法と同様にして、架橋樹脂複合体をそれぞれ作成した。これらについて各特性を評価した結果を表1に示す。
m−ジイソプロペニルベンゼンを使用しなかった以外は実施例1と同様にして、プリプレグ、および架橋樹脂複合体を得た。これらについて各特性を評価した結果を表1に示す。
m−ジイソプロペニルベンゼン20部に代えて、他の架橋助剤としてトリメチロールプロパントリメタクリレート(TMTMP)3部を用いた以外は実施例1と同様にして、プリプレグ、および架橋樹脂複合体を得た。これらについて各特性を評価した結果を表1に示す。
m−ジイソプロペニルベンゼン20部に代えて、ジビニルベンゼン(純度55%、2つのビニル基の位置がm位のものとp位のものとの混合物、東京化成社製、不純物としてエチルビニルベンゼン、ジエチルベンゼンを含む)6部を用いた以外は実施例1と同様にして、プリプレグを得た。このプリプレグの重合体部分の分子量を測定したところ、Mw=3,000であった。このプリプレグを用いて架橋樹脂複合体の製造を試みたが、樹脂流動が大きすぎるため厚みが制御できず、製造ができなかった。結果を表1に示す。
Claims (14)
- シクロオレフィンモノマー、メタセシス重合触媒、およびトリイソプロペニルベンゼン、p−ジイソプロペニルベンゼン、m−ジイソプロペニルベンゼン、o−ジイソプロペニルベンゼン、トリメタリルイソシアヌレートのいずれかを含むことを特徴とする重合性組成物。
- シクロオレフィンモノマー100質量部に対し、トリイソプロペニルベンゼン、p−ジイソプロペニルベンゼン、m−ジイソプロペニルベンゼン、o−ジイソプロペニルベンゼン、トリメタリルイソシアヌレートの量が0.1〜50質量部である請求項1に記載の重合性組成物。
- さらに連鎖移動剤を含む請求項1または2に記載の重合性組成物。
- 前記連鎖移動剤が式(C):CH2=CH−Q−Yで表される化合物であることを特徴とする請求項3に記載の重合性組成物。
(式中、Qは二価の炭化水素基を表し、Yはビニル基、アクリロイル基またはメタクリロイル基を表す。) - さらに架橋剤を含む請求項1〜4のいずれかに記載の重合性組成物。
- 前記架橋剤が非極性ラジカル発生剤であることを特徴とする、請求項5に記載の重合性組成物。
- 請求項1〜6のいずれかに記載の重合性組成物を塊状重合して得られる架橋性樹脂。
- 請求項1〜6のいずれかに記載の重合性組成物を塊状重合する工程を含む、架橋性樹脂の製造方法。
- 請求項1〜6のいずれかに記載の重合性組成物を支持体に塗布または含浸し、塊状重合する工程を含む、架橋性樹脂複合体の製造方法。
- 請求項7に記載の架橋性樹脂を架橋する工程を含む、架橋体の製造方法。
- 請求項7に記載の架橋性樹脂の成形体を支持体上で架橋する工程を含む、架橋樹脂複合体の製造方法。
- 請求項9に記載の製造方法で得られた架橋性樹脂複合体を架橋する工程を含む、架橋樹脂複合体の製造方法。
- 前記架橋を別の支持体上で行う、請求項12に記載の架橋樹脂複合体の製造方法。
- シクロオレフィンモノマー、メタセシス重合触媒、およびm−ジイソプロペニルベンゼンまたはトリメタリルイソシアヌレートを含むことを特徴とする重合性組成物。
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US5268232A (en) * | 1991-10-15 | 1993-12-07 | Hercules Incorporated | Dicyclopentadiene polymers with heat-resistant dimensional integrity and high Tg |
JP2001226466A (ja) * | 2000-02-17 | 2001-08-21 | Hitachi Chem Co Ltd | マクロモノマーの製造方法及びそれにより得られるマクロモノマー |
JP2002265573A (ja) * | 2001-03-14 | 2002-09-18 | Sekisui Chem Co Ltd | 官能基含有シクロオレフィン系重合体及びその製造方法 |
JP2004244609A (ja) * | 2002-07-29 | 2004-09-02 | Nippon Zeon Co Ltd | 熱可塑性樹脂、架橋樹脂及び架橋樹脂複合材料の製造方法 |
WO2005017033A1 (ja) * | 2003-08-13 | 2005-02-24 | Zeon Corporation | 架橋性樹脂組成物およびその樹脂成形体 |
JP2005220184A (ja) * | 2004-02-04 | 2005-08-18 | Sumitomo Chemical Co Ltd | 熱可塑性エラストマー組成物 |
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US5268232A (en) * | 1991-10-15 | 1993-12-07 | Hercules Incorporated | Dicyclopentadiene polymers with heat-resistant dimensional integrity and high Tg |
JP2001226466A (ja) * | 2000-02-17 | 2001-08-21 | Hitachi Chem Co Ltd | マクロモノマーの製造方法及びそれにより得られるマクロモノマー |
JP2002265573A (ja) * | 2001-03-14 | 2002-09-18 | Sekisui Chem Co Ltd | 官能基含有シクロオレフィン系重合体及びその製造方法 |
JP2004244609A (ja) * | 2002-07-29 | 2004-09-02 | Nippon Zeon Co Ltd | 熱可塑性樹脂、架橋樹脂及び架橋樹脂複合材料の製造方法 |
WO2005017033A1 (ja) * | 2003-08-13 | 2005-02-24 | Zeon Corporation | 架橋性樹脂組成物およびその樹脂成形体 |
JP2005220184A (ja) * | 2004-02-04 | 2005-08-18 | Sumitomo Chemical Co Ltd | 熱可塑性エラストマー組成物 |
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