JP5424617B2 - Surface emitting laser, surface emitting laser array, optical scanning device, image forming apparatus, optical transmission module, and optical transmission system - Google Patents

Description

  The present invention relates to a surface emitting laser, a surface emitting laser array, an optical scanning device, an image forming apparatus, an optical transmission module, and an optical transmission system, and more specifically, a surface emitting laser that outputs light in a direction perpendicular to a substrate, The present invention relates to a surface emitting laser array in which the surface emitting lasers are integrated, an optical scanning device having the surface emitting laser array, an image forming apparatus, an optical transmission module, and an optical transmission system.

  A vertical cavity surface emitting laser (VCSEL) is a semiconductor laser that outputs light in a direction perpendicular to a substrate, and is an edge-emitting type that outputs light in a direction parallel to the substrate. Compared with semiconductor lasers, they have the following features: (1) low price, (2) low power consumption, (3) small size and high performance, and (4) easy two-dimensional integration.

  The surface emitting laser has a constricted structure in order to increase current inflow efficiency. As this constriction structure, a constriction structure obtained by selective oxidation of an Al (aluminum) As (arsenic) layer (hereinafter, also referred to as “oxidized constriction structure” for convenience. For example, see Patent Document 1) is often used. . This oxidized constriction structure is included in the selective oxidation layer after forming a mesa having a predetermined size with the selective oxidation layer made of p-AlAs exposed on the side surface, and then placing it in a high-temperature steam atmosphere. Al is selectively oxidized from the side of the mesa, and an unoxidized region in the selectively oxidized layer remains in the vicinity of the center of the mesa. This non-oxidized region becomes a driving current passing region (current passing region, current injection region) of the surface emitting laser.

Further, the refractive index of Al oxide (Al _x O _y ) in the oxide confinement structure is about 1.6, which is lower than that of the semiconductor layer. As a result, a refractive index difference in the lateral direction is generated inside the resonator structure, and light is confined in the center of the mesa. As a result, it is possible to realize excellent characteristics such as a low threshold current and high light emission efficiency.

  Also, in order to obtain a single fundamental transverse mode oscillation, it is necessary to reduce the size of the current passing region and increase the diffraction loss for higher order modes. Usually, the size of the current passing region is required to be narrowed to 3 to 4 times the oscillation wavelength as one side or diameter. Specifically, it is 3.5 μm or less when the oscillation wavelength is 0.85 μm, and 5 μm or less when the oscillation wavelength is 1.3 μm. This simultaneously reduces the threshold current.

  In Patent Document 2, an intermediate thin film made of an AlGaAs thin film having an Al composition ratio of 0.38 is provided on both surfaces of a current confinement layer with a thickness of 20 nm to 30 nm for the purpose of preventing a decrease in light emission efficiency. A surface emitting laser is disclosed.

  However, in the surface emitting laser disclosed in Patent Document 2, since all the low refractive index layers are oxidized, the thickness of the oxide layer is increased, and the strain caused by volume shrinkage due to oxidation has an adverse effect on the active layer. There was a possibility that the deterioration of the material was accelerated. In addition, the current confinement layer exists from the position of the antinode of the electric field intensity distribution to the position of the node, and there is a disadvantage that the diffraction loss is large and the single mode output is low.

  Patent Document 3 discloses a first layer having a low Al content (for example, 0 to 35%, beneficially about 15%) and a second layer having a moderate Al content (for example, around 65%, desirably less than 85%). Oxide layer confinement with distributed Bragg reflector with highly doped high Al content (eg, greater than 95%, beneficially about 98%) oxide aperture forming layer disposed between the two layers A VCSEL is disclosed. In this oxide layer confined VCSEL, a transition layer is provided between the first layer and the oxide aperture forming layer. This transition layer is a relatively thin layer having a thickness of about 20 nm, and is a layer with a change in Al concentration that changes substantially linearly over the thickness.

  By the way, it is preferable that the so-called composition gradient layer for reducing the electrical resistance in the semiconductor distributed Bragg reflector is selectively enhanced in doping (see, for example, Patent Document 4), and in order not to increase the absorption loss, the electric field strength. It is preferable to provide at the position of the node of the distribution. The oxide constriction structure is also preferably provided at the node of the electric field strength distribution in order to reduce diffraction loss.

  However, in the oxide layer confinement type VCSEL disclosed in Patent Document 3, the oxide aperture formation layer (corresponding to the oxide confinement structure) and the transition layer (corresponding to the composition gradient layer) are adjacent to each other. It cannot be provided at the node of the intensity distribution.

  By the way, the oxidation rate of the selective oxidation layer containing Al and As is extremely sensitive to the film thickness, the composition of Al and As, the oxidation temperature, and the like (for example, see Non-Patent Document 1). The oxidation rate of the selective oxidation layer is also affected by the thickness of the natural oxide film formed on the side surface of the selective oxidation layer immediately before the oxidation treatment.

  If the oxidation amount of the selective oxidation layer deviates from the target (target) and the area of the current passing region varies, the area of the portion contributing to oscillation in the active layer varies. As a result, the device characteristics such as light output vary, and the product yield decreases. In particular, since the area of the current passing region is smaller in the single mode element than in the multimode element, the influence of the variation in the oxidation amount of the selective oxidation layer on the variation in element characteristics is extremely large. Further, when the area of the current passing region is shifted to the larger one, it becomes an element that operates in a multimode, and the yield of the single mode element is particularly low.

US Pat. No. 5,493,577 JP 11-26879 A JP-T-2006-504281 Japanese Patent No. 2757633 J. et al. Select, “Topics Quantum Electron”, IEEE, vol. 3, p. 916-926, 1997

  When many conventional surface-emitting lasers were investigated, optical characteristics such as single mode output may vary even if the area of the current passing region was the same. Therefore, as a result of various experiments, the inventors have varied the thickness of the oxide layer between lots and within the same lot even if the thickness, Al composition, and oxidation conditions of the selective oxidation layer are constant. There was a new finding that the variation in the thickness of the oxide layer was a factor in the variation in the optical characteristics. The variation in the thickness of the oxide layer was particularly remarkable at the oxidation start portion (mesa outer peripheral portion). In addition, in some cases, the thickness of the oxide layer was not uniform from the oxidation start portion (mesa outer peripheral portion) to the oxidation termination portion (mesa central portion) in the selective oxidation layer.

The present invention has been made on the basis of the novel knowledge obtained by the inventors described above, and includes a resonator structure including an active layer, and a plurality of sets each including a low refractive index layer and a high refractive index layer. In the surface emitting laser having two semiconductor distributed Bragg reflectors provided across the ceramic structure and a narrowed structure formed by selective oxidation of the selective oxidation layer containing aluminum, the selective oxidation layer includes Of the two semiconductor distributed Bragg reflectors, a part of one low refractive index layer of one of the semiconductor distributed Bragg reflectors is formed, and the one low refractive index layer is provided on one side and the other side of the selectively oxidized layer. A first layer adjacent to at least one and a second layer adjacent to the first layer, wherein the aluminum content in the first layer is the aluminum content in the selectively oxidized layer Smaller than the rate, said The aluminum content in the second layer is greater than the aluminum content in the second layer, and the aluminum content in the second layer is such that the aluminum in the low refractive index layer other than the one low refractive index layer of the one semiconductor distributed Bragg reflector is smaller than the content, the optical thickness of the low refractive index layer including the layer to be selectively oxidized by using the oscillation wavelength lambda, 1 or more integer n, (2n + 1) λ / 4 der is, the object to be selected The sum of the thickness of the oxide layer and the thickness of the first layer is 110 nm or less, and the difference between the aluminum content in the selective oxidation layer and the aluminum content in the first layer is 5% or more. , and the and 20% or less, the difference between the content of aluminum in the second layer and the aluminum content of the layer to be selectively oxidized, the surface emitting laser is characterized in that more than 20% A.

  In addition, when the composition inclination layer which changed the composition gradually from one composition toward the other composition is provided between each refractive index layer, the optical thickness of each refractive index layer is all. Further, it may include a half of the adjacent composition gradient layer. By the way, the optical thickness and the actual thickness of the layer have the following relationship. When the optical thickness is λ / 4, the actual thickness d of the layer is d = λ / 4N (where N is the refractive index of the medium of the layer).

According to this, it is possible to reduce the variation in the thickness of the oxide layer to easily. That is, the manufacturing is easy and the yield can be increased. In addition, the influence of strain on the active layer can be reduced, and the lifetime can be extended.

  From a second viewpoint, the present invention is a surface emitting laser array in which the surface emitting lasers of the present invention are integrated.

  According to this, since the surface emitting laser of the present invention is integrated, it is easy to manufacture, the yield is high, and the life can be extended.

  From a third aspect, the present invention is an optical scanning device that scans a surface to be scanned with light, the light source having the surface emitting laser array of the present invention; a deflector that deflects light from the light source; A scanning optical system that condenses the light deflected by the deflector onto the surface to be scanned.

  According to this, since the surface emitting laser array of the present invention is provided, high-density optical scanning can be stably performed without increasing the cost.

  According to a fourth aspect of the present invention, there is provided a first image forming apparatus comprising: an image carrier; and the optical scanning device according to the invention that scans the image carrier with light including image information. .

  According to a fifth aspect of the present invention, there is provided an image carrier; a surface-emitting laser array according to the invention; and an exposure apparatus that drives the surface-emitting laser array in accordance with image information to expose the image carrier. And a second image forming apparatus.

  According to the first and second image forming apparatuses, since each of the surface emitting laser arrays of the present invention is provided, it is possible to stably form a high-quality image without increasing the cost. It becomes.

  According to a sixth aspect of the present invention, there is provided an optical transmission module for generating an optical signal corresponding to an input electric signal, the surface emitting laser array of the present invention; An optical transmission module comprising: a driving device that is driven according to an electrical signal.

  According to this, since the surface emitting laser array according to the present invention is provided, it is possible to stably generate a high-quality optical signal without increasing the cost.

  According to a seventh aspect of the present invention, an optical transmission module of the present invention; an optical transmission medium that transmits an optical signal generated by the optical transmission module; and an optical signal that passes through the optical transmission medium as an electrical signal. An optical transmission system comprising: a converter for converting.

  According to this, since the optical transmission module of the present invention is provided, it is possible to stably perform high-quality optical transmission without increasing the cost.

<Surface emitting laser>
“First Embodiment”
FIG. 1 is a cross-sectional view showing a schematic configuration of a surface emitting laser 100 according to a first embodiment of the present invention. In this specification, the laser oscillation direction is defined as the Z-axis direction, and two directions orthogonal to each other in a plane perpendicular to the Z-axis direction are described as the X-axis direction and the Y-axis direction.

  The surface-emitting laser 100 is a surface-emitting laser having a design oscillation wavelength of 850 nm band. On the substrate 101, a lower semiconductor DBR 103, a lower spacer layer 104, an active layer 105, an upper spacer layer 106, an upper semiconductor DBR 107, a contact layer. Semiconductor layers such as 109 are sequentially stacked. Hereinafter, a structure in which a plurality of these semiconductor layers are stacked is also referred to as a “stacked body” for convenience. 2 is an enlarged view of the vicinity of the active layer 105, and FIG. 3 is an enlarged view of a part of the upper semiconductor DBR 107.

  The substrate 101 is an n-GaAs single crystal substrate.

The lower semiconductor DBR 103 has 40.5 pairs of a low refractive index layer 103a made of n-Al _0.9 Ga _0.1 As and a high refractive index layer 103b made of n-Al _0.1 Ga _0.9 As. doing. And between each refractive index layer, in order to reduce an electrical resistance, the composition inclination layer (refer FIG. 2) which changed the composition gradually toward the other composition from one composition is provided. Each refractive index layer includes 1/2 of the adjacent composition gradient layer, and is set to have an optical thickness of λ / 4 when the oscillation wavelength is λ.

The lower spacer layer 104 is a layer made of Al _0.4 Ga _0.6 As.

The active layer 105 is a layer composed of three GaAs quantum well layers 105a and four Al _0.3 Ga _0.7 As barrier layers 105b (see FIG. 2).

The upper spacer layer 106 is a layer made of Al _0.4 Ga _0.6 As.

  The portion composed of the lower spacer layer 104, the active layer 105, and the upper spacer layer 106 is also called a resonator structure, and the thickness thereof is set to be one wavelength optical thickness. The active layer 105 is provided at the center of the resonator structure at a position corresponding to the antinode of the standing wave distribution of the electric field so as to obtain a high stimulated emission probability.

  This resonator structure is sandwiched between the lower semiconductor DBR 103 and the upper semiconductor DBR 107.

  The upper semiconductor DBR 107 has 24 pairs of a low refractive index layer and a high refractive index layer. And between the low refractive index layer and the high refractive index layer, there is a composition gradient layer (see FIG. 3) in which the composition is gradually changed from one composition to the other composition in order to reduce electrical resistance. Is provided.

  In one of the low refractive index layers in the upper semiconductor DBR 107, a selectively oxidized layer 108 made of p-AlAs is inserted with a thickness of 20 nm. The insertion position of the selectively oxidized layer 108 is optically separated from the upper spacer layer 106 by 5λ / 4. The low refractive index layer including the selective oxidation layer 108 is set so as to have an optical thickness of 3λ / 4 including 1/2 of the adjacent composition gradient layer.

  Further, the selective oxidation layer 108 and the composition gradient layer on the + Z side of the low refractive index layer including the selective oxidation layer 108 are both set to positions corresponding to the nodes of the electric field intensity distribution (FIG. 3).

  Each refractive index layer except the low refractive index layer including the selective oxidation layer 108 in the upper semiconductor DBR 107 is set to have an optical thickness of λ / 4 including 1/2 of the adjacent composition gradient layer. Has been.

On the −Z side and + Z side of the selective oxidation layer 108, an intermediate layer 107m made of p-Al _0.83 Ga _0.17 As and having a thickness of 20 nm is provided.

A layer 107c (hereinafter referred to as “low refractive index layer 107c”) adjacent to each intermediate layer 107m in the low refractive index layer including the selectively oxidized layer 108 is made of p-Al _0.75 Ga _0.25 As. Is a layer.

The low refractive index layer 107 a other than the low refractive index layer including the selective oxidation layer 108 in the upper semiconductor DBR 107 is a layer made of p-Al _0.9 Ga _0.1 As. Moreover, the high refractive index layer 107b in the upper semiconductor DBR107 _is a layer made of _p-Al 0.1 _{Ga 0.9} As.

  That is, the selective oxidation layer 108 forms a part of the low refractive index layer of the upper semiconductor DBR 107, and the low refractive index layer including the selective oxidation layer 108 includes two intermediate layers 107m adjacent to the selective oxidation layer 108. And two low refractive index layers 107c adjacent to each intermediate layer 107m. The Al content in the intermediate layer 107m is 17% smaller than the Al content in the selectively oxidized layer 108. Further, the Al content in the low refractive index layer 107 c is 25% smaller than the Al content in the selectively oxidized layer 108.

  The contact layer 109 is a layer made of p-GaAs.

  Next, a method for manufacturing the surface emitting laser 100 will be briefly described.

(1) The laminate is formed by crystal growth by metal organic vapor phase epitaxy (MOCVD) or molecular beam epitaxy (MBE).

Here, trimethylaluminum (TMA), trimethylgallium (TMG), and trimethylindium (TMI) are used as the Group III material, and arsine (AsH ₃ ) gas is used as the Group V material. Further, carbon tetrabromide (CBr ₄ ) is used as a p-type dopant material, and hydrogen selenide (H ₂ Se) is used as an n-type dopant material.

(2) A square resist pattern having a side of 20 μm is formed on the surface of the laminate.

(3) A square columnar mesa is formed by ECR etching using Cl ₂ gas, using the resist pattern as a photomask. Here, the bottom surface of the etching is located in the lower spacer layer 104.

(4) The photomask is removed.

(5) The laminated body is heat-treated in water vapor. Here, Al in the selectively oxidized layer 108 and the intermediate layer 107m is selectively oxidized from the outer peripheral portion of the mesa. Then, an unoxidized region 108b surrounded by the Al oxide layer 108a is left in the center of the mesa. As a result, a so-called oxidized constriction structure is formed in which the drive current path of the light emitting part is limited to only the central part of the mesa. The non-oxidized region 108b is a current passage region (current injection region). The oxide layer 108a contains the oxide of Al in the selectively oxidized layer 108 and the intermediate layer 107m.

(6) A protective layer 111 made of SiN or SiO ₂ is formed by vapor phase chemical deposition (CVD) (see FIG. 1).

(7) Flatten with polyimide 112 (see FIG. 1).

(8) Open the window of the P-side electrode contact on the top of the mesa. Here, after masking with a photoresist, the opening at the top of the mesa is exposed to remove the photoresist at that portion, and then the polyimide 112 and the protective layer 111 are etched and opened with BHF.

(9) A square resist pattern having a side of 10 μm is formed in a region to be a light emitting portion on the top of the mesa, and a p-side electrode material is deposited. As the electrode material on the p side, a multilayer film made of Cr / AuZn / Au or a multilayer film made of Ti / Pt / Au is used.

(10) Lift off the electrode material of the light emitting portion to form the p-side electrode 113 (see FIG. 1).

(11) After polishing the back side of the substrate 101 to a predetermined thickness (for example, about 100 μm), an n-side electrode 114 is formed (see FIG. 1). Here, the n-side electrode 114 is a multilayer film made of AuGe / Ni / Au.

(12) Ohmic conduction is established between the p-side electrode 113 and the n-side electrode 114 by annealing. Thereby, the mesa becomes a light emitting part.

(13) Cut for each chip.

  With respect to the plurality of surface emitting lasers 100 manufactured as described above, each oxidized constriction structure was observed using an SEM (scanning electron microscope). As a result, the thickness of the oxide layer 108a at the outer periphery of the mesa where oxidation was started was 60 nm to 70 nm, and the degree of variation was small. The current passing region 108b has a square shape with a desired size. And the dispersion | variation in characteristics, such as a threshold current, was small.

  As Comparative Example 1, as shown in FIG. 4, when the intermediate layer 107m is not provided, the thickness of the oxide layer at the outer periphery of the mesa where oxidation is started in the oxidized constriction structure is 40 nm to 50 nm. Yes, the degree of variation was small. However, in this case, the variation in the oxidation rate in the XY plane was large, and the current passing region did not reflect the mesa shape and did not become a square shape. That is, a current passing region having a desired size and shape could not be obtained. And the dispersion | variation in characteristics, such as a threshold current, was very large. In this case, it can be said that the epi structure has poor controllability.

As Comparative Example 2, as shown in FIG. 5, when the low refractive index layer 107 c in FIG. 4 is replaced with a low refractive index layer 107 d made of p-Al _0.83 Ga _0.17 As, The current passing region was substantially square like the surface emitting laser 100, but the thickness of the oxide layer on the outer periphery of the mesa where oxidation was started varied widely from 80 nm to 160 nm. The thickness at the oxidation termination portion was the same as that of the selective oxidation layer. That is, the oxide layer has a tapered shape in which the thickness gradually decreases from the oxidation start portion toward the oxidation end portion. This indicates that, in the selectively oxidized layer 108, the oxidation progresses toward the center of the mesa in the XY plane, and at the same time, the oxidation progresses in the stacking direction (here, the Z-axis direction). The thinner the oxide layer, the larger the single mode output and the narrower the light divergence angle, and the single mode output and the light divergence angle both varied widely. Moreover, the thing with the thick thickness of the oxide layer in a mesa outer peripheral part was short-lived.

  Therefore, by providing the intermediate layer 107m adjacent to the selective oxidation layer 108, (1) the oxidation rate in the XY plane can be controlled with high accuracy, and (2) the oxidation layer 108a It can be seen that the thickness can be made uniform in a thin state.

  Here, by providing the intermediate layer 107m having an Al content of 83% adjacent to the selective oxidation layer 108, the oxidation in the XY plane proceeds smoothly, the intermediate layer 107m is as thin as 20 nm, and the intermediate layer Since there is a low refractive index layer 107c with an Al content of 75% adjacent to 107m, it is considered that oxidation did not progress much in the stacking direction (here, the Z-axis direction).

  As a result, the controllability of the area of the current passing region 108b and the thickness of the oxide layer 108a can be improved, and variations in characteristics such as threshold current, single mode output, light divergence angle, and lifetime can be reduced.

  The difference between the Al content in the selectively oxidized layer 108 and the Al content in the intermediate layer 107m is preferably 5% or more and 20% or less. The difference between the Al content in the selectively oxidized layer 108 and the Al content in the low refractive index layer 107c is preferably more than 20%.

  As described above, according to the surface emitting laser 100 according to the first embodiment, the selective oxidation layer 108 forms a part of the low refractive index layer of the upper semiconductor DBR 107 and includes the selective oxidation layer 108. The low refractive index layer has two intermediate layers 107m adjacent to the selectively oxidized layer 108 and two low refractive index layers 107c adjacent to each intermediate layer 107m. The Al content in each intermediate layer 107 m is 17% smaller than the Al content in the selectively oxidized layer 108. Further, the Al content in each low refractive index layer 107 c is 25% smaller than the Al content in the selectively oxidized layer 108. Thereby, when the selective oxidation layer 108 is selectively oxidized, the controllability of the oxidation rate in the XY plane of the selective oxidation layer 108 and the thickness of the oxide layer can be improved. Therefore, it is possible to easily reduce the variation in the thickness of the oxide layer. That is, the manufacturing is easy and the yield can be increased. In addition, the influence of strain on the active layer can be reduced, and the lifetime can be extended.

  Further, since the optical thickness of the low refractive index layer including the selective oxidation layer 108 is 3λ / 4, the composition on the + Z side of the selective oxidation layer 108 and the low refractive index layer including the selective oxidation layer 108 Both graded layers can be positioned corresponding to nodes of the electric field strength distribution. As a result, it is possible to reduce both the diffraction loss due to the selective oxidation layer 108 and the absorption loss in the high-concentration doped composition gradient layer. If the optical thickness of the low refractive index layer including the selective oxidation layer 108 is (2n + 1) λ / 4 using the oscillation wavelength λ, an integer n of 1 or more, the selective oxidation layer 108, and Both the composition gradient layers on the + Z side of the low refractive index layer including the selective oxidation layer 108 can be positioned corresponding to the nodes of the electric field intensity distribution.

  In the first embodiment, the case where the intermediate layer is provided above and below the selective oxidation layer (both) has been described. However, the present invention is not limited to this, and the intermediate layer may be provided only on one side.

  In the first embodiment, the low refractive index layer including the selective oxidation layer 108 is set so as to have an optical thickness of 3λ / 4 including 1/2 of the adjacent composition gradient layer. However, the present invention is not limited to this.

  For example, FIG. 6 shows a case where the optical thickness of the low refractive index layer including the selective oxidation layer 108 is λ / 4 including 1/2 of the adjacent composition gradient layer.

  In FIG. 6, the selective oxidation layer 108 is inserted at a position optically separated from the upper spacer layer 106 by λ / 4. The intermediate layer 107m and the low refractive index layer 107c are provided on the −Z side of the selective oxidation layer 108. A high refractive index layer 107b is provided on the + Z side of the selective oxidation layer 108 via a composition gradient layer. Even in this case, the controllability of the oxidation rate in the XY plane of the selective oxidation layer 108 and the thickness of the oxide layer can be improved as compared with the conventional case.

“Second Embodiment”
FIG. 7 is a sectional view showing a schematic configuration of a surface emitting laser 200 according to the second embodiment of the present invention.

  The surface-emitting laser 200 is a surface-emitting laser having a design oscillation wavelength of 780 nm band. On the substrate 201, a lower semiconductor DBR 203, a lower spacer layer 204, an active layer 205, an upper spacer layer 206, an upper semiconductor DBR 207, a contact layer Semiconductor layers such as 209 are sequentially stacked. FIG. 8 is an enlarged view of the vicinity of the active layer 205, and FIG. 9 is an enlarged view of a part of the upper semiconductor DBR 207.

  The substrate 201 is an n-GaAs single crystal substrate.

The lower semiconductor DBR 203 has 40.5 pairs of a low refractive index layer 203a made of n-AlAs and a high refractive index layer 203b made of n-Al _0.3 Ga _0.7 As. And, between the low refractive index layer and the high refractive index layer, there is a composition gradient layer (see FIG. 8) in which the composition is gradually changed from one composition to the other composition in order to reduce electrical resistance. Is provided. Each refractive index layer includes 1/2 of the adjacent composition gradient layer, and is set to have an optical thickness of λ / 4 when the oscillation wavelength is λ.

The lower spacer layer 204 is a layer made of (Al _0.7 Ga _0.3 ) _0.5 In _0.5 P.

The active layer 205 is a layer made of a _Ga 0.6 _{In 0.4} P barrier layers 205b of GaInPAs quantum well layer 205a and the four layers of three layers. The quantum well layer 205a has a composition having a compressive strain with respect to the substrate 201, and has a band gap wavelength of about 780 nm. The barrier layer 205b is lattice-matched with the quantum well layer 205a and has tensile strain.

The upper spacer layer 206 is a layer made of (Al _0.7 Ga _0.3 ) _0.5 In _0.5 P.

  A portion composed of the lower spacer layer 204, the active layer 205, and the upper spacer layer 206 is also called a resonator structure, and the thickness thereof is set to be one wavelength optical thickness. The active layer 205 is provided at the center of the resonator structure at a position corresponding to the antinode of the standing wave distribution of the electric field so that a high stimulated emission probability can be obtained.

  The upper semiconductor DBR 207 has 24 pairs of a low refractive index layer and a high refractive index layer. And between each refractive index layer, in order to reduce an electrical resistance, the composition inclination layer (refer FIG. 9) which changed the composition gradually toward the other composition from one composition is provided.

  In one of the low refractive index layers in the upper semiconductor DBR 207, a selective oxidation layer 208 made of p-AlAs is inserted with a thickness of 30 nm. The insertion position of the selectively oxidized layer 208 is optically separated from the upper spacer layer 206 by 5λ / 4. The low refractive index layer including the selective oxidation layer 208 is set so as to have an optical thickness of 3λ / 4 including 1/2 of the adjacent composition gradient layer.

  In addition, the selective oxidation layer 208 and the composition gradient layer on the + Z side of the low refractive index layer including the selective oxidation layer 208 are both set to positions corresponding to the nodes of the electric field intensity distribution (FIG. 9).

  Each refractive index layer excluding the low refractive index layer including the selective oxidation layer 208 is set to have an optical thickness of λ / 4 including 1/2 of the adjacent composition gradient layer.

On the −Z side and + Z side of the selective oxidation layer 208, an intermediate layer 207 m made of p-Al _0.83 Ga _0.17 As and having a thickness of 40 nm is provided.

A layer 207c (hereinafter referred to as “low refractive index layer 207c”) adjacent to each intermediate layer 207m in the low refractive index layer including the selective oxidation layer 208 is made of p-Al _0.75 Ga _0.25 As. Is a layer.

The low refractive index layer 207a other than the low refractive index layer including the selective oxidation layer 208 in the upper semiconductor DBR 207 is a layer made of p-Al _0.9 Ga _0.1 As. The high refractive index layer 107b is a layer made of p-Al _0.3 Ga _0.7 As.

  That is, the selective oxidation layer 208 forms part of the low refractive index layer of the upper semiconductor DBR 207, and the low refractive index layer including the selective oxidation layer 208 includes two intermediate layers 207m adjacent to the selective oxidation layer 208. And two low refractive index layers 207c adjacent to each intermediate layer 207m. The Al content in each intermediate layer 207 m is 17% smaller than the Al content in the selectively oxidized layer 208. Further, the Al content in each low refractive index layer 207 c is 25% smaller than the Al content in the selectively oxidized layer 208.

  The contact layer 209 is a layer made of p-GaAs.

  In FIG. 7, reference numeral 208a is an Al oxide layer, reference numeral 208a is a current passing region, reference numeral 211 is a protective layer, reference numeral 212 is polyimide, reference numeral 213 is a p-side electrode, and reference numeral 214 is an n-side electrode.

  The surface emitting laser 200 can be manufactured in the same manner as the surface emitting laser element 100.

  As described above, according to the surface emitting laser 200 according to the second embodiment, the selective oxidation layer 208 forms a part of the low refractive index layer of the upper semiconductor DBR 207 and includes the selective oxidation layer 208. The low refractive index layer has two intermediate layers 207m adjacent to the selective oxidation layer 208 and two low refractive index layers 207c adjacent to each intermediate layer 207m. The Al content in each intermediate layer 207 m is 17% smaller than the Al content in the selectively oxidized layer 208. Further, the Al content in each low refractive index layer 207 c is 25% smaller than the Al content in the selectively oxidized layer 208. Thereby, when the selective oxidation layer 208 is selectively oxidized, the controllability of the oxidation rate in the XY plane of the selective oxidation layer 208 and the thickness of the oxide layer can be improved. Therefore, it is possible to easily reduce the variation in the thickness of the oxide layer. That is, the manufacturing is easy and the yield can be increased. In addition, the influence of strain on the active layer can be reduced, and the lifetime can be extended.

  In addition, since the optical thickness of the low refractive index layer including the selective oxidation layer 208 is 3λ / 4, the composition on the + Z side of the selective oxidation layer 208 and the low refractive index layer including the selective oxidation layer 208 is Both the gradient layers can be positioned corresponding to the nodes of the electric field intensity distribution, and both the diffraction loss due to the selective oxidation layer 208 and the absorption loss due to the composition gradient layer can be reduced.

  In the first and second embodiments, the case where the mesa shape in the cross section orthogonal to the laser oscillation direction is square has been described. However, the present invention is not limited to this, and may be any shape such as a circle, an ellipse, or a rectangle. There may be.

  Moreover, although the said 1st and 2nd embodiment demonstrated the case where an etching bottom face was made into a lower spacer layer when forming a mesa, it is not limited to this. For example, etching may be performed until the bottom surface of the etching reaches the lower semiconductor DBR.

  In the first and second embodiments, the case where the oscillation wavelength of the surface emitting laser is in the 850 nm band and the 780 nm band has been described. However, the present invention is not limited to this. For example, wavelength bands such as a 650 nm band, a 980 nm band, a 1.3 μm band, and a 1.5 μm band may be used. In this case, a semiconductor material corresponding to the oscillation wavelength can be used as the semiconductor material constituting the active layer. For example, an AlGaInP mixed crystal semiconductor material can be used in the 650 nm band, an InGaAs mixed crystal semiconductor material can be used in the 980 nm band, and a GaInNAs (Sb) mixed crystal semiconductor material can be used in the 1.3 μm band and the 1.5 μm band.

<Surface emitting laser array>
“Third Embodiment”
FIG. 10 shows a schematic configuration of a surface emitting laser array 500 according to the third embodiment of the present invention.

  In the surface emitting laser array 500, a plurality of (in this case, 32) light emitting units are arranged on the same substrate.

  As shown in FIG. 11, the surface emitting laser array 500 includes eight light emitting units along the T direction, which is a direction that forms an inclination angle α (0 ° <α <90 °) from the M direction toward the S direction. Have four rows of light emitting sections arranged at equal intervals. These four light emitting unit rows are arranged at equal intervals in the S direction. That is, the 32 light emitting units are two-dimensionally arranged along the T direction and the S direction, respectively. In this specification, the “light emitting portion interval” refers to the distance between the centers of two light emitting portions.

  Here, the light emitting portion interval d in the S direction in the two-dimensional array is 24 μm, and the light emitting portion interval X in the M direction is 30 μm (see FIG. 11). Further, the interval c when the 32 light emitting units are orthogonally projected onto the virtual line extending in the S direction is 3 μm (see FIG. 11).

  Each light emitting section has the same structure as the surface emitting laser 200 described above, as shown in FIG.

  The surface emitting laser array 500 can be manufactured by the same method as the surface emitting laser 200.

  By the way, it is preferable that the groove | channel between a light emission part and a light emission part shall be 5 micrometers or more for electrical and spatial separation of each light emission part. This is because if it is too narrow, it becomes difficult to control etching during production. Further, the mesa size (length of one side) is preferably 10 μm or more. This is because if it is too small, heat will be accumulated during operation and the characteristics may be deteriorated.

  As described above, the surface emitting laser array 500 according to the third embodiment is a surface emitting laser array in which the surface emitting lasers 200 are integrated, and thus has the same effect as the surface emitting laser 200. . Further, in the surface emitting laser array 500, the variation of the area of the current passing region and the thickness of the oxide layer in each light emitting portion is small, and the characteristics such as threshold current, single mode output, light divergence angle, and lifetime are aligned.

  Incidentally, the relationship between the maximum thickness of the oxide layer and the lifetime is shown in FIG. FIG. 13 shows a case in which a plurality of lots of surface emitting laser arrays in which the surface emitting lasers of Comparative Example 2 are integrated are manufactured, and the maximum thickness and life of each oxide layer are measured. The difference in symbol in FIG. 13 indicates the difference in production lot. Further, the drive current is feedback-controlled so that the light output of each light emitting unit is constant, and the elapsed time when the drive current of at least one light emitting unit becomes 120% or more of the initial value is regarded as the lifetime.

  Furthermore, from another experiment, the lifetime when the maximum thickness of the oxide layer was 60 nm was almost the same as the lifetime when the maximum thickness of the oxide layer was 80 nm.

  Therefore, the maximum thickness of the oxide layer is preferably 110 nm or less. In the surface emitting laser array 500 according to the third embodiment, the maximum thickness of the oxide layer was 70 to 90 nm.

  Further, since the oxide layer surrounding the current passing region in the oxide confinement structure includes the oxide of Al of the selective oxidation layer and the oxide of Al of the intermediate layer, the thickness of the selective oxidation layer and the thickness of each intermediate layer The total thickness is preferably 110 nm or less.

  Therefore, the surface emitting laser array 500 is easier to manufacture, has a higher yield, and has a longer life than the conventional surface emitting laser array.

  In the third embodiment, the case where the surface emitting laser array 500 includes 32 light emitting units has been described. However, the present invention is not limited to this.

“Fourth Embodiment”
FIG. 14 shows a schematic configuration of a surface emitting laser array 600 according to the fourth embodiment of the present invention.

  In the surface emitting laser array 600, a plurality of (here, ten) light emitting units are one-dimensionally arranged on the same substrate.

  Each light emitting portion of the surface emitting laser array 600 is a surface emitting laser having a design oscillation wavelength of 1.3 μm band, and is formed on a substrate 301 as shown in FIG. The semiconductor layers such as the lower semiconductor DBR 303, the lower spacer layer 304, the active layer 305, the upper spacer layer 306, the upper semiconductor DBR 307, and the contact layer 309 are sequentially stacked. FIG. 16 is an enlarged view of the vicinity of the active layer 305, and FIG. 17 is an enlarged view of a part of the upper semiconductor DBR 307.

  The substrate 301 is an n-GaAs single crystal substrate.

The lower semiconductor DBR 303 has 36.5 pairs of a low refractive index layer 303a made of n-Al _0.9 Ga _0.1 As and a high refractive index layer 303b made of n-GaAs. And between each refractive index layer, in order to reduce an electrical resistance, the composition inclination layer which changed the composition gradually toward the other composition from one composition is provided. Each refractive index layer includes 1/2 of the adjacent composition gradient layer, and is set to have an optical thickness of λ / 4 when the oscillation wavelength is λ.

  The lower spacer layer 304 is a layer made of GaAs.

  The active layer 305 is a layer composed of three GaInNAs quantum well layers 305a and four GaAs barrier layers 305b.

  The upper spacer layer 306 is a layer made of GaAs.

  A portion composed of the lower spacer layer 304, the active layer 305, and the upper spacer layer 306 is also called a resonator structure, and the thickness thereof is set to be one wavelength optical thickness. The active layer 305 is provided at the center of the resonator structure at a position corresponding to the antinode of the standing wave distribution of the electric field so that a high stimulated emission probability can be obtained.

  The upper semiconductor DBR 307 has 26 pairs of a low refractive index layer and a high refractive index layer. And between each refractive index layer, in order to reduce an electrical resistance, the composition inclination layer which changed the composition gradually toward the other composition from one composition is provided.

  In one of the low refractive index layers in the upper semiconductor DBR 307, a selective oxidation layer 308 made of p-AlAs is inserted with a thickness of 20 nm. The insertion position of the selectively oxidized layer 308 is optically separated from the upper spacer layer 306 by 5λ / 4. The low refractive index layer including the selective oxidation layer 308 is set to have an optical thickness of 3λ / 4 including 1/2 of the adjacent composition gradient layer.

  Each refractive index layer excluding the low refractive index layer including the selective oxidation layer 308 is set to have an optical thickness of λ / 4, including 1/2 of the adjacent composition gradient layer.

On the −Z side and + Z side of the selective oxidation layer 308, an intermediate layer 307m made of p-Al _0.8 Ga _0.2 As and having a thickness of 35 nm is provided.

A layer 307c (hereinafter referred to as “low refractive index layer 307c”) adjacent to each intermediate layer 307m in the low refractive index layer including the selectively oxidized layer 308 is made of p-Al _0.6 Ga _0.4 As. Is a layer.

The low refractive index layer 307a other than the low refractive index layer including the selective oxidation layer 308 in the upper semiconductor DBR 307 is a layer made of p-Al _0.9 Ga _0.1 As. The high refractive index layer 307b is a layer made of p-GaAs.

  That is, the selective oxidation layer 308 forms part of the low refractive index layer of the upper semiconductor DBR 307, and the low refractive index layer including the selective oxidation layer 308 includes two intermediate layers 307m adjacent to the selective oxidation layer 308. And two low refractive index layers 307c adjacent to each intermediate layer 307m. The Al content in each intermediate layer 307m is 20% smaller than the Al content in the selectively oxidized layer 308. In addition, the Al content in each low refractive index layer 307c is 40% smaller than the Al content in the selectively oxidized layer 308.

  The surface emitting laser array 600 can be manufactured by the same method as the surface emitting laser 100 described above. However, the shape of the mesa is a cylindrical shape.

  As described above, the surface emitting laser array 600 according to the fourth embodiment is a surface emitting laser array having a plurality of light emitting units having a structure similar to that of the surface emitting laser 100, and thus is the same as the surface emitting laser 100. It has the effect of. Further, in the surface emitting laser array 600, variations in the area of the current passing region and the thickness of the oxide layer in each light emitting portion are small, and characteristics such as threshold current, single mode output, light divergence angle, and lifetime are aligned.

  Accordingly, the surface emitting laser array 600 is easier to manufacture, has a higher yield, and has a longer life than the conventional surface emitting laser array.

  In the fourth embodiment, the case where the surface emitting laser array 600 has ten light emitting units has been described. However, the present invention is not limited to this.

  In the third and fourth embodiments, the case where the mesa shape in the cross section perpendicular to the laser oscillation direction is square or circular has been described. However, the present invention is not limited to these, and for example, an ellipse or a rectangle. It can be of any shape.

  In the third and fourth embodiments, the case where the oscillation wavelength of the surface emitting laser array is in the 780 nm band and the 1.3 μm band has been described. However, the present invention is not limited to this. For example, a wavelength band such as a 650 nm band, an 850 nm band, a 980 nm band, and a 1.5 μm band may be used.

<Image forming apparatus>
“Fifth Embodiment”
FIG. 18 shows a schematic configuration of a laser printer 1000 as an image forming apparatus according to the fifth embodiment of the present invention.

  The laser printer 1000 includes an optical scanning device 1010, a photosensitive drum 1030, a charging charger 1031, a developing roller 1032, a transfer charger 1033, a charge removal unit 1034, a cleaning blade 1035, a toner cartridge 1036, a paper feeding roller 1037, a paper feeding tray 1038, A registration roller pair 1039, a fixing roller 1041, a paper discharge roller 1042, a paper discharge tray 1043, a communication control device 1050, a printer control device 1060 that comprehensively controls the above-described units, and the like are provided. These are housed in predetermined positions in the printer housing 1044.

  The communication control device 1050 controls bidirectional communication with a host device (for example, a personal computer) via a network or the like.

  The photosensitive drum 1030 is a cylindrical member, and a photosensitive layer is formed on the surface thereof. That is, the surface of the photoconductor drum 1030 is a scanned surface. The photosensitive drum 1030 is rotated in the direction of the arrow in FIG.

  The charging charger 1031, the developing roller 1032, the transfer charger 1033, the charge removal unit 1034, and the cleaning blade 1035 are each arranged in the vicinity of the surface of the photosensitive drum 1030. Then, along the rotation direction of the photosensitive drum 1030, the charging charger 1031 → the developing roller 1032 → the transfer charger 1033 → the discharging unit 1034 → the cleaning blade 1035 are arranged in this order.

  The charging charger 1031 uniformly charges the surface of the photosensitive drum 1030.

  The optical scanning device 1010 irradiates the surface of the photosensitive drum 1030 charged by the charging charger 1031 with a light beam modulated based on image information from the host device. As a result, a latent image corresponding to the image information is formed on the surface of the photosensitive drum 1030. The latent image formed here moves in the direction of the developing roller 1032 as the photosensitive drum 1030 rotates. The configuration of the optical scanning device 1010 will be described later.

  The toner cartridge 1036 stores toner, and the toner is supplied to the developing roller 1032.

  The developing roller 1032 causes the toner supplied from the toner cartridge 1036 to adhere to the latent image formed on the surface of the photosensitive drum 1030 to visualize the image information. Here, the latent image to which the toner is attached (hereinafter also referred to as “toner image” for the sake of convenience) moves in the direction of the transfer charger 1033 as the photosensitive drum 1030 rotates.

  Recording paper 1040 is stored in the paper feed tray 1038. A paper feed roller 1037 is disposed in the vicinity of the paper feed tray 1038, and the paper feed roller 1037 takes out the recording paper 1040 one by one from the paper feed tray 1038 and conveys it to the registration roller pair 1039. The registration roller pair 1039 temporarily holds the recording paper 1040 taken out by the paper supply roller 1037, and in the gap between the photosensitive drum 1030 and the transfer charger 1033 according to the rotation of the photosensitive drum 1030. Send it out.

  A voltage having a polarity opposite to that of the toner is applied to the transfer charger 1033 in order to electrically attract the toner on the surface of the photosensitive drum 1030 to the recording paper 1040. With this voltage, the toner image on the surface of the photosensitive drum 1030 is transferred to the recording paper 1040. The recording sheet 1040 transferred here is sent to the fixing roller 1041.

  In the fixing roller 1041, heat and pressure are applied to the recording paper 1040, whereby the toner is fixed on the recording paper 1040. The recording paper 1040 fixed here is sent to the paper discharge tray 1043 via the paper discharge roller 1042 and is sequentially stacked on the paper discharge tray 1043.

  The neutralization unit 1034 neutralizes the surface of the photosensitive drum 1030.

  The cleaning blade 1035 removes toner (residual toner) remaining on the surface of the photosensitive drum 1030. The surface of the photosensitive drum 1030 from which the residual toner has been removed returns to the position facing the charging charger 1031 again.

<Optical scanning device>
Next, the configuration of the optical scanning device 1010 will be described.

  As shown in FIG. 19 as an example, the optical scanning device 1010 includes a light source 14, a coupling lens 15, an aperture plate 16, an anamorphic lens 17, a reflection mirror 18, a polygon mirror 13, a deflector-side scanning lens 11a, An image plane side scanning lens 11b, a scanning control device (not shown), and the like are provided. These are assembled at predetermined positions in the housing 30.

  In the following, for convenience, the direction corresponding to the main scanning direction is abbreviated as “main scanning corresponding direction”, and the direction corresponding to the sub scanning direction is abbreviated as “sub scanning corresponding direction”.

  The light source 14 includes the surface emitting laser array 500 as an example, and can simultaneously output 32 light beams. Here, the surface emitting laser array 500 is arranged so that the M direction coincides with the main scanning corresponding direction and the S direction coincides with the sub scanning corresponding direction.

  The coupling lens 15 makes the light beam output from the light source 14 weak divergent light. The light source 14 and the coupling lens 15 are fixed to an aluminum holding member in a predetermined positional relationship and unitized.

  The aperture plate 16 has an aperture and defines the beam diameter of the light beam through the coupling lens 15.

  The anamorphic lens 17 forms an image of the light beam that has passed through the opening of the aperture plate 16 in the sub-scanning corresponding direction in the vicinity of the deflection reflection surface of the polygon mirror 13 via the reflection mirror 18.

  The optical system arranged on the optical path between the light source 14 and the polygon mirror 13 is also called a pre-deflector optical system. In the present embodiment, the pre-deflector optical system includes a coupling lens 15, an aperture plate 16, an anamorphic lens 17, and a reflection mirror 18.

  As an example, the polygon mirror 13 has a hexahedral mirror having an inscribed circle radius of 18 mm, and each mirror serves as a deflecting reflection surface. The polygon mirror 13 deflects the light flux from the reflection mirror 18 while rotating at a constant speed around an axis parallel to the sub-scanning corresponding direction.

  The deflector-side scanning lens 11 a is disposed on the optical path of the light beam deflected by the polygon mirror 13.

  The image plane side scanning lens 11b is disposed on the optical path of the light beam via the deflector side scanning lens 11a. Then, the light beam that has passed through the image plane side scanning lens 11b is irradiated onto the surface of the photosensitive drum 1030, and a light spot is formed. This light spot moves in the longitudinal direction of the photosensitive drum 1030 as the polygon mirror 13 rotates. That is, the photoconductor drum 1030 is scanned. The moving direction of the light spot at this time is the “main scanning direction”. The rotation direction of the photosensitive drum 1030 is the “sub-scanning direction”.

  The optical system arranged on the optical path between the polygon mirror 13 and the photosensitive drum 1030 is also called a scanning optical system. Here, the scanning optical system includes a deflector side scanning lens 11a and an image plane side scanning lens 11b. At least one folding mirror is disposed on at least one of the optical path between the deflector side scanning lens 11a and the image plane side scanning lens 11b and the optical path between the image plane side scanning lens 11b and the photosensitive drum 1030. May be.

  In this case, in the surface emitting laser array 500, since the intervals between the light emitting portions when the respective light emitting portions are orthogonally projected onto the virtual line extending in the S direction are equal intervals c, the photosensitive drum 1030 is adjusted by adjusting the lighting timing. In the above, it can be considered that the configuration is the same as the case where the light emitting units are arranged at equal intervals in the sub-scanning direction.

  Since the distance c is 3 μm, if the magnification of the optical system of the optical scanning device 1010 is about 1.8, high-density writing of 4800 dpi (dot / inch) can be performed. Of course, the density can be increased by increasing the number of light emitting portions in the T direction, making the array arrangement in which the distance d is narrowed and the distance c is further reduced, or by reducing the magnification of the optical system. Printing is possible. Note that the writing interval in the main scanning direction can be easily controlled by the lighting timing of the light emitting unit.

  In this case, the laser printer 1000 can perform printing without decreasing the printing speed even if the writing dot density increases. Further, when the writing dot density is the same, the printing speed can be further increased.

  Further, in the surface emitting laser array 500, since the variation in the size of the current passing region between the light emitting portions and the variation in the thickness of the oxide layer are small, the emission diameter and various characteristics are uniform. The beam spot diameter can be made uniform.

  As described above, according to the optical scanning device 1010 according to the fifth embodiment, since the light source 14 includes the surface-emitting laser array 500, high-density optical scanning can be performed without increasing the cost. It becomes possible to carry out stably.

  Further, the laser printer 1000 according to the fifth embodiment includes the optical scanning device 1010. As a result, it is possible to stably form a high-quality image without increasing the cost. It becomes.

  In addition, the thickness of the oxide layer on the outer periphery of the mesa where oxidation starts will not be greater than the design value, and the life of the surface emitting laser array will be greatly improved, so that the reuse of the writing unit or light source unit will be possible. It becomes possible.

  In the fifth embodiment, the light source 14 has 32 light emitting units. However, the present invention is not limited to this.

  In the fifth embodiment, instead of the surface emitting laser array 500, a surface emitting laser array in which light emitting units similar to the light emitting units in the surface emitting laser array 500 are arranged one-dimensionally may be used.

  In the fifth embodiment, the case of the laser printer 1000 as the image forming apparatus has been described. However, the present invention is not limited to this. In short, an image forming apparatus including the optical scanning device 1010 can stably form a high-quality image without incurring an increase in cost.

  For example, an image forming apparatus that directly irradiates laser light onto a medium (for example, paper) that develops color with laser light may be used.

  Further, an image forming apparatus using a silver salt film as the image carrier may be used. In this case, a latent image is formed on the silver salt film by optical scanning, and this latent image can be visualized by a process equivalent to a developing process in a normal silver salt photographic process. Then, it can be transferred to photographic paper by a process equivalent to a printing process in a normal silver salt photographic process. Such an image forming apparatus can be implemented as an optical plate making apparatus or an optical drawing apparatus that draws a CT scan image or the like.

  In addition, even an image forming apparatus that forms a multicolor image can stably form a high-quality image without increasing the cost by using an optical scanning device corresponding to the color image. Is possible.

  For example, as shown in FIG. 20, a tandem color machine 1500 corresponding to a color image and including a plurality of photosensitive drums may be used.

  The tandem color machine 1500 includes a “photosensitive drum K1, a charging device K2, a developing device K4, a cleaning unit K5, and a transfer device K6” for black, and a “photosensitive drum C1, a charging device C2, a developing device for cyan”. C4, cleaning unit C5, and transfer device C6 ”,“ photosensitive drum M1, charging device M2, developing device M4, cleaning unit M5, and transfer device M6 ”for magenta, and“ photosensitive drum Y1, Charging device Y2, developing device Y4, cleaning unit Y5, and transfer device Y6 ", optical scanning device 1010A, transfer belt 1580, fixing unit 1530, and the like.

  Each photosensitive drum rotates in the direction of the arrow in FIG. 20, and a charging device, a developing device, a transfer device, and a cleaning unit are arranged in the order of rotation. Each charging device uniformly charges the surface of the corresponding photosensitive drum. The surface of the photosensitive drum charged by the charging device is irradiated with light by the optical scanning device 1010A, and a latent image is formed on the photosensitive drum. Then, a toner image is formed on the surface of the photosensitive drum by the corresponding developing device. Further, the toner image of each color is transferred onto the recording paper on the transfer belt 1580 by the corresponding transfer device, and finally the image is fixed on the recording paper by the fixing unit 1530.

  The optical scanning device 1010A has the same light source as the light source 14 for each color. Therefore, the same effect as that of the optical scanning device 1010 can be obtained. Further, since the tandem color machine 1500 includes the optical scanning device 1010A, the same effects as those of the laser printer 1000 can be obtained.

  By the way, in a tandem color machine, a color shift may occur due to a manufacturing error or a position error of each part. Even in such a case, each light source of the optical scanning device 1010A has a surface-emitting laser array similar to the surface-emitting laser array 500. Therefore, the color shift can be reduced by changing the light-emitting unit to be lit. can do.

  In the fifth embodiment, an exposure apparatus having a light source including the surface emitting laser array 500 may be used instead of the optical scanning apparatus 1010. Even in this case, the same effect as the laser printer 1000 can be obtained.

<Optical transmission system>
“Sixth Embodiment”
FIG. 21 shows a schematic configuration of an optical transmission system 2000 according to the sixth embodiment of the present invention. In this optical transmission system 2000, an optical transmission module 2001 and an optical reception module 2005 are connected by an optical fiber cable 2004, and one-way optical communication from the optical transmission module 2001 to the optical reception module 2005 is possible.

  The optical transmission module 2001 includes a light source 2002 and a drive circuit 2003 that modulates the light intensity of laser light output from the light source 2002 in accordance with an electrical signal input from the outside.

  The light source 2002 includes the surface emitting laser array 600 described above as an example.

  The optical signal output from the light source 2002 is coupled to the optical fiber cable 2004, guided through the optical fiber cable 2004, and input to the optical receiving module 2005. Note that the optical fiber cable 2004 includes a plurality of optical fibers respectively corresponding to a plurality of light emitting units of the surface emitting laser array 600, as shown in FIG. 22 as an example.

  The optical receiving module 2005 includes a light receiving element 2006 that converts an optical signal into an electric signal, and a receiving circuit 2007 that performs signal amplification, waveform shaping, and the like on the electric signal output from the light receiving element 2006.

  According to the optical transmission module 2001 according to the sixth embodiment, since the light source 2002 includes the surface-emitting laser array 600 described above, high-quality optical signals can be stably generated without increasing the cost. It becomes possible to do.

  In addition, according to the optical transmission system 2000 according to the sixth embodiment, since the optical transmission module 2001 is provided, it is possible to stably perform high-quality optical transmission without increasing the cost. .

  Therefore, the optical transmission system 2000 is also effective for short-distance data communication such as home use, office indoor use, and device use.

  In addition, since a plurality of light emitting portions having uniform characteristics are integrated on the same substrate, data transmission by a large number of beams can be easily performed simultaneously, and high-speed communication can be performed.

  Further, since the surface emitting laser operates with low power consumption, the temperature rise can be reduced particularly when incorporated in an apparatus.

  In the sixth embodiment, the case where the light emitting unit and the optical fiber are made to correspond one-to-one has been described. However, by performing wavelength multiplexing transmission using a plurality of light emitting units having different oscillation wavelengths, the transmission speed can be increased. Further increase is possible.

  In the sixth embodiment, a configuration example of one-way communication is shown, but a two-way communication configuration can also be used.

  As described above, the surface emitting laser and the surface emitting laser array according to the present invention are easier to manufacture and have a higher yield than conventional ones, and are suitable for extending the life. Further, the optical scanning device of the present invention is suitable for stably performing high-density optical scanning without increasing the cost. The image forming apparatus according to the present invention is suitable for stably forming a high-quality image without increasing the cost. The optical transmission module according to the present invention is suitable for stably generating a high-quality optical signal without incurring an increase in cost. The optical transmission system of the present invention is suitable for stably performing high-quality optical transmission without incurring cost increases.

It is a figure for demonstrating schematic structure of the surface emitting laser which concerns on the 1st Embodiment of this invention. It is the figure which expanded the active layer vicinity in FIG. FIG. 2 is an enlarged view of a part of an upper semiconductor DBR in FIG. 1. It is a figure for demonstrating the comparative example 1 of upper semiconductor DBR in FIG. It is a figure for demonstrating the comparative example 2 of upper semiconductor DBR in FIG. It is a figure for demonstrating the modification of upper semiconductor DBR in FIG. It is a figure for demonstrating schematic structure of the surface emitting laser which concerns on the 2nd Embodiment of this invention. It is the figure which expanded the active layer vicinity in FIG. FIG. 8 is an enlarged view of a part of the upper semiconductor DBR in FIG. 7. It is a figure for demonstrating the surface emitting laser array which concerns on the 3rd Embodiment of this invention. It is a figure for demonstrating the two-dimensional arrangement | sequence of the light emission part in FIG. It is AA sectional drawing of FIG. It is a figure for demonstrating the relationship between the maximum thickness of an oxide layer, and a lifetime. It is a figure for demonstrating the surface emitting laser array which concerns on the 4th Embodiment of this invention. It is AA sectional drawing of FIG. It is the figure which expanded the active layer vicinity in FIG. FIG. 16 is an enlarged view of a part of the upper semiconductor DBR in FIG. 15. It is a figure for demonstrating schematic structure of the laser printer which concerns on the 5th Embodiment of this invention. It is the schematic which shows the optical scanning device in FIG. It is a figure for demonstrating schematic structure of a tandem color machine. It is a figure for demonstrating schematic structure of the optical transmission module and optical transmission system which concern on the 6th Embodiment of this invention. It is a figure for demonstrating the optical fiber cable in FIG.

Explanation of symbols

  DESCRIPTION OF SYMBOLS 11a ... Deflector side scanning lens (a part of scanning optical system), 11b ... Image surface side scanning lens (a part of scanning optical system), 13 ... Polygon mirror (deflector), 14 ... Light source, 100 ... Surface emitting laser , 103 ... lower semiconductor DBR (part of semiconductor distributed Bragg reflector), 104 ... lower spacer layer (part of resonator structure), 105 ... active layer, 106 ... upper spacer layer (part of resonator structure) ), 107... Upper semiconductor DBR (part of semiconductor distributed Bragg reflector), 107a... Low refractive index layer, 107b... High refractive index layer, 107c... Low refractive index layer (second layer), 107m. 1st layer), 108 ... selectively oxidized layer, 108a ... oxide layer, 108b ... current passing region, 200 ... surface emitting laser, 203 ... lower semiconductor DBR (part of semiconductor distributed Bragg reflector), 204 ... lower spacer layer( Part of the vibrator structure), 205 ... Active layer, 206 ... Upper spacer layer (part of the resonator structure), 207 ... Upper semiconductor DBR (part of the semiconductor distributed Bragg reflector), 207a ... Low refractive index Layer, 207b ... high refractive index layer, 207c ... low refractive index layer (second layer), 207m ... intermediate layer (first layer), 208 ... selective oxidation layer, 208a ... oxidation layer, 208b ... current passing region , 303 ... lower semiconductor DBR (part of semiconductor distributed Bragg reflector), 304 ... lower spacer layer (part of resonator structure), 305 ... active layer, 306 ... upper spacer layer (part of resonator structure) ), 307... Upper semiconductor DBR (part of semiconductor distributed Bragg reflector), 307a... Low refractive index layer, 307b... High refractive index layer, 307c... Low refractive index layer (second layer), 307m. 1st layer), 308 ... selected 308a ... oxide layer, 308b ... current passing region, 500 ... surface emitting laser array, 600 ... surface emitting laser array, 1000 ... laser printer (image forming apparatus), 1010 ... optical scanning device, 1010A ... optical scanning device, DESCRIPTION OF SYMBOLS 1030 ... Photosensitive drum (image carrier) 1500 ... Tandem color machine (image forming apparatus), 2000 ... Optical transmission system, 2001 ... Optical transmission module (optical transmission module), 2002 ... Light source, 2003 ... Driving circuit (driving apparatus) ), 2004 ... Optical fiber cable (light transmission medium), 2006 ... Light receiving element (part of the converter), 2007 ... Receiver circuit (part of the converter), K1, C1, M1, Y1 ... Photosensitive drum (image) Carrier).

Claims (11)

A resonator structure including an active layer, two semiconductor distributed Bragg reflectors each including a plurality of sets of low refractive index layers and high refractive index layers sandwiched between the resonator structures, and an object including aluminum In a surface emitting laser having a constricted structure formed by selective oxidation of a selective oxidation layer,
The selective oxidation layer is a part of one low refractive index layer of one of the two semiconductor distributed Bragg reflectors,
The one low refractive index layer has a first layer adjacent to at least one of the one side and the other side of the selective oxidation layer, and a second layer adjacent to the first layer,
The aluminum content in the first layer is smaller than the aluminum content in the selectively oxidized layer and larger than the aluminum content in the second layer,
The aluminum content in the second layer is smaller than the aluminum content in the low refractive index layer other than the one low refractive index layer of the one semiconductor distributed Bragg reflector,
The optical thickness of the low refractive index layer including the layer to be selectively oxidized, the oscillation wavelength lambda, using one or more integer n, Ri (2n + 1) λ / 4 der,
The sum of the thickness of the selectively oxidized layer and the thickness of the first layer is 110 nm or less;
The difference between the aluminum content in the selectively oxidized layer and the aluminum content in the first layer is 5% or more and 20% or less,
The surface emitting laser characterized in that the difference between the aluminum content in the selectively oxidized layer and the aluminum content in the second layer exceeds 20% .   The aluminum content in the first layer is smaller than the aluminum content in a low refractive index layer other than the one low refractive index layer of the one semiconductor distributed Bragg reflector. 2. The surface emitting laser according to 1. The constriction structure has a current passing region and an oxide layer surrounding the current passing region,
Wherein the oxide layer, the oxide which is partially oxidized in the selective oxidation layer, and according to claim 1 or 2 a portion of said first layer, characterized in that it comprises an oxide which has been oxidized Surface emitting laser. 4. The surface emitting laser according to claim 3 , wherein the thickness of the oxide layer is 110 nm or less. A surface-emitting laser array in which the surface-emitting lasers according to any one of claims 1 to 4 are integrated. An optical scanning device that scans a surface to be scanned with light,
A light source comprising the surface emitting laser array according to claim 5 ;
A deflector for deflecting light from the light source;
A scanning optical system for condensing the light deflected by the deflector onto the surface to be scanned. An image carrier;
An image forming apparatus comprising: the optical scanning device according to claim 6 , wherein the image carrier scans light including image information. An image carrier;
A surface emitting laser array according to claim 5 ;
An image forming apparatus comprising: an exposure device that drives the surface-emitting laser array in accordance with image information to expose the image carrier. The image forming apparatus according to claim 7 , wherein the image information is multicolor color image information. An optical transmission module that generates an optical signal according to an input electrical signal,
A surface emitting laser array according to claim 5 ;
An optical transmission module comprising: a driving device that drives the surface-emitting laser array in accordance with the input electric signal. An optical transmission module according to claim 10 ;
An optical transmission medium for transmitting an optical signal generated by the optical transmission module;
A converter for converting an optical signal through the optical transmission medium into an electric signal;

Images