JP5339550B2 - 真空積層システムおよび真空積層成形方法 - Google Patents
真空積層システムおよび真空積層成形方法 Download PDFInfo
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- JP5339550B2 JP5339550B2 JP2011246464A JP2011246464A JP5339550B2 JP 5339550 B2 JP5339550 B2 JP 5339550B2 JP 2011246464 A JP2011246464 A JP 2011246464A JP 2011246464 A JP2011246464 A JP 2011246464A JP 5339550 B2 JP5339550 B2 JP 5339550B2
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- 238000003475 lamination Methods 0.000 title claims abstract description 50
- 238000000034 method Methods 0.000 title claims abstract description 33
- 238000000465 moulding Methods 0.000 title claims description 28
- 238000005520 cutting process Methods 0.000 claims abstract description 100
- 238000010030 laminating Methods 0.000 claims abstract description 39
- 230000007246 mechanism Effects 0.000 claims description 37
- 239000005001 laminate film Substances 0.000 abstract description 10
- 235000012431 wafers Nutrition 0.000 description 137
- 239000000853 adhesive Substances 0.000 description 8
- 230000001070 adhesive effect Effects 0.000 description 8
- 230000008569 process Effects 0.000 description 8
- 239000012790 adhesive layer Substances 0.000 description 5
- 230000002093 peripheral effect Effects 0.000 description 4
- 238000003825 pressing Methods 0.000 description 4
- 229920005989 resin Polymers 0.000 description 4
- 239000011347 resin Substances 0.000 description 4
- 238000004804 winding Methods 0.000 description 4
- 238000001514 detection method Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 230000008878 coupling Effects 0.000 description 2
- 238000010168 coupling process Methods 0.000 description 2
- 238000005859 coupling reaction Methods 0.000 description 2
- 238000009434 installation Methods 0.000 description 2
- 239000002648 laminated material Substances 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 229920001187 thermosetting polymer Polymers 0.000 description 2
- 230000009471 action Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000000088 plastic resin Substances 0.000 description 1
- -1 polyethylene terephthalate Polymers 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B37/00—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding
- B32B37/10—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by the pressing technique, e.g. using action of vacuum or fluid pressure
- B32B37/1009—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by the pressing technique, e.g. using action of vacuum or fluid pressure using vacuum and fluid pressure
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67092—Apparatus for mechanical treatment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67132—Apparatus for placing on an insulating substrate, e.g. tape
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2457/00—Electrical equipment
- B32B2457/14—Semiconductor wafers
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
- Y10T156/10—Methods of surface bonding and/or assembly therefor
- Y10T156/1052—Methods of surface bonding and/or assembly therefor with cutting, punching, tearing or severing
- Y10T156/108—Flash, trim or excess removal
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
- Y10T156/12—Surface bonding means and/or assembly means with cutting, punching, piercing, severing or tearing
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Fluid Mechanics (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Laminated Bodies (AREA)
- Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
Description
12 真空積層装置
13 切断装置
14 搬送装置
24,25 ゴム膜体
33 切断刃
37,44 サーボモータ
47 電動シリンダ
50 載置板
51 吸着具
53 CCDカメラ
A 搬送方向
C1 下キャリアフィルム
C2 上キャリアフィルム
NCF NCF(積層フィルム)
NCFa NCFの余剰部(積層フィルムの余剰部)
S1 載置ステージ
S2 切断ステージ
W ウエハ
W1 NCFが積層成形されたウエハ(NCF積層ウエハ)
W2 NCFの余剰部が切断された後のNCF積層ウエハ(NCF積層ウエハ)
Claims (5)
- 積層フィルムと下側の下キャリアフィルム上を個別に搬送される被積層品とをバッチ式の真空積層装置で積層し、積層フィルムが積層された積層品から積層フィルムを切断する真空積層システムであって、
被積層品は円形のウエハであり、積層フィルムは連続式の積層フィルムまたは矩形に切断された積層フィルムであり、
下キャリアフィルムに積層フィルムが積層されたウエハが載置されるとともに、上キャリアフィルムが無い状態で、
下キャリアフィルムの下側に設けられたフィルムテンション機構の載置板を、載置板の上面が下キャリアフィルムの高さ位置よりも上方まで上昇させて停止させ下キャリアフィルムに一定以上のテンションをかけ、
下キャリアフィルムの上側に設けられた切断機構の高さをクローズドループ制御して、前記積層フィルムが積層されたウエハの形状に合わせて該積層フィルムが積層されたウエハから積層フィルムの余剰部を切断することを特徴とする真空積層システム。 - 前記切断機構は、CCDカメラにより計測されたウエハの位置情報により、水平方向に移動可能であることを特徴とする請求項1に記載の真空積層システム。
- 前記切断機構は、回転軸芯と所定距離隔てた位置に設けられた切断刃がウエハの外周に沿うように円弧上を移動するものであることを特徴とする請求項1または請求項2に記載の真空積層システム。
- 積層フィルムと下側の下キャリアフィルム上を個別に搬送される被積層品とをバッチ式の真空積層装置で積層し、積層フィルムが積層された積層品から積層フィルムを切断する真空積層成形方法であって、
被積層品は円形のウエハであり、積層フィルムは連続式の積層フィルムまたは矩形に切断された積層フィルムであり、
下キャリアフィルムに積層フィルムが積層されたウエハが載置されるとともに、上キャリアフィルムが無い状態で、
上方に設けられた切断機構により、下キャリアフィルムは一部または全部が切断されないようにして、前記積層フィルムが積層されたウエハの形状に合わせて該積層フィルムが積層されたウエハから積層フィルムの余剰部を切断することを特徴とする真空積層成形方法。 - 前記積層フィルムは矩形に切断された積層フィルムであり、
上キャリアフィルムと下キャリアフィルムに挟まれた状態で真空積層装置に搬入され、ウエハと前記積層フィルムは上下のキャリアフィルムを介して加圧されて積層成形され、
後工程において上キャリアフィルムが剥がされた後に、切断機構によりウエハから積層フィルムの余剰部が切断されることを特徴とする請求項4に記載の真空積層成形方法。
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2011246464A JP5339550B2 (ja) | 2011-11-10 | 2011-11-10 | 真空積層システムおよび真空積層成形方法 |
KR1020120026499A KR101352484B1 (ko) | 2011-11-10 | 2012-03-15 | 진공 적층 시스템 및 진공 적층 성형 방법 |
SG2012081899A SG190522A1 (en) | 2011-11-10 | 2012-11-06 | Vacuum lamination system and vacuum lamination method |
US13/670,704 US8845844B2 (en) | 2011-11-10 | 2012-11-07 | Vacuum lamination system and vacuum lamination method |
CN201210448014.0A CN103101283B (zh) | 2011-11-10 | 2012-11-09 | 真空层叠系统及真空层叠成形方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2011246464A JP5339550B2 (ja) | 2011-11-10 | 2011-11-10 | 真空積層システムおよび真空積層成形方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2013103346A JP2013103346A (ja) | 2013-05-30 |
JP5339550B2 true JP5339550B2 (ja) | 2013-11-13 |
Family
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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JP2011246464A Expired - Fee Related JP5339550B2 (ja) | 2011-11-10 | 2011-11-10 | 真空積層システムおよび真空積層成形方法 |
Country Status (5)
Country | Link |
---|---|
US (1) | US8845844B2 (ja) |
JP (1) | JP5339550B2 (ja) |
KR (1) | KR101352484B1 (ja) |
CN (1) | CN103101283B (ja) |
SG (1) | SG190522A1 (ja) |
Cited By (1)
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KR102205137B1 (ko) * | 2019-12-12 | 2021-01-19 | 손명식 | 라미네이션용 기판 고정장치 및 이를 이용한 라미네이션 방법 |
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JP5955271B2 (ja) * | 2013-06-04 | 2016-07-20 | 信越半導体株式会社 | 研磨ヘッドの製造方法 |
CN105058942B (zh) * | 2015-07-23 | 2017-05-24 | 佛山市粤金海机械设备有限公司 | 铝型材数控自动贴膜系统 |
KR101866880B1 (ko) * | 2016-07-26 | 2018-06-12 | 주식회사 아이에스티코리아 | Vfp 3d 프린팅 시스템 및 그 방법 |
EP3522277B1 (en) * | 2016-09-30 | 2022-06-15 | Kolon Industries, Inc. | Method for manufacturing membrane electrode assembly for fuel cell |
KR101896384B1 (ko) | 2016-10-04 | 2018-09-07 | 주식회사 대성엔지니어링 | 진공 라미네이터용 챔버장치 |
US10800104B2 (en) | 2017-03-24 | 2020-10-13 | Korea Institute Of Machinery & Materials | 3D printing device for multiple materials and 3D printing method for multiple materials |
KR101963436B1 (ko) * | 2017-03-24 | 2019-03-29 | 한국기계연구원 | 다종 소재용 3d 프린팅 장치 및 다종 소재 3d 프린팅 방법 |
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JP7073551B1 (ja) * | 2021-02-12 | 2022-05-23 | 株式会社日本製鋼所 | 積層成形システムおよび積層成形方法 |
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JP7337323B1 (ja) | 2022-08-30 | 2023-09-04 | 東洋インキScホールディングス株式会社 | 品質推定システム、ラミネートシステム、品質推定方法、及びプログラム |
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JP5272397B2 (ja) | 2007-12-13 | 2013-08-28 | 日立化成株式会社 | 接着フィルムの貼付装置及び接着フィルムの貼付方法 |
JP2009194064A (ja) * | 2008-02-13 | 2009-08-27 | Takatori Corp | 基板への接着フィルム貼付け装置及び貼付け方法 |
-
2011
- 2011-11-10 JP JP2011246464A patent/JP5339550B2/ja not_active Expired - Fee Related
-
2012
- 2012-03-15 KR KR1020120026499A patent/KR101352484B1/ko active IP Right Grant
- 2012-11-06 SG SG2012081899A patent/SG190522A1/en unknown
- 2012-11-07 US US13/670,704 patent/US8845844B2/en not_active Expired - Fee Related
- 2012-11-09 CN CN201210448014.0A patent/CN103101283B/zh not_active Expired - Fee Related
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR102205137B1 (ko) * | 2019-12-12 | 2021-01-19 | 손명식 | 라미네이션용 기판 고정장치 및 이를 이용한 라미네이션 방법 |
Also Published As
Publication number | Publication date |
---|---|
CN103101283A (zh) | 2013-05-15 |
US8845844B2 (en) | 2014-09-30 |
JP2013103346A (ja) | 2013-05-30 |
SG190522A1 (en) | 2013-06-28 |
KR101352484B1 (ko) | 2014-01-17 |
CN103101283B (zh) | 2015-04-01 |
US20130118684A1 (en) | 2013-05-16 |
KR20130051865A (ko) | 2013-05-21 |
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