JP5335045B2 - Photosensitive resin composition, oxime sulfonate compound, method for forming cured film, cured film, organic EL display device, and liquid crystal display device - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a photosensitive resin composition having high sensitivity and excellent development latitude and transparency of a cured film and to provide a method for forming a cured film by using the composition. <P>SOLUTION: The photosensitive resin composition comprises: (component A) an oxime sulfonate compound expressed by formula (1) or formula (2); (component B) a resin having an acid decomposable group that is decomposed by an acid to generate a carboxyl group or a phenolic hydroxyl group; and (component C) a solvent. In the formulae, R<SP POS="POST">1</SP>represents an alkyl group, an aryl group or a heteroaryl group; R<SP POS="POST">2</SP>each independently represents a hydrogen atom, an alkyl group, an aryl group or a halogen atom; Ar<SP POS="POST">1</SP>represents an o-arylene group or an o-heteroarylene group; X represents O, S or NR' group; Y represents a specified hetero atom-containing group; R' represents an alkyl group, an aryl group or a heteroaryl group; and n represents 0 or 1. <P>COPYRIGHT: (C)2013,JPO&amp;INPIT

Description

  The present invention relates to a photosensitive resin composition, an oxime sulfonate compound, a method for forming a cured film, a cured film, an organic EL display device, and a liquid crystal display device.

An organic EL display device, a liquid crystal display device, and the like are provided with a patterned interlayer insulating film. In forming the interlayer insulating film, photosensitive resin compositions are widely used because the number of steps for obtaining a required pattern shape is small and sufficient flatness is obtained.
In addition to the properties of the cured film, such as insulation, solvent resistance, heat resistance, hardness, and indium tin oxide (ITO) sputter suitability, the interlayer insulating film in the display device is desired to have high transparency. Yes. For this reason, an attempt has been made to use an acrylic resin having excellent transparency as a film forming component.
In addition to the light source for sensitizing the photosensitive resin composition, in addition to the direct drawing method by 355 nm laser light exposure, the conventional g-line, h-line, and i-line mixed light source, the g-line and h-line mixed with the i-line cut Attempts have been made to form patterns with various light sources such as a light source.

  As such a photosensitive resin composition, for example, in Patent Document 1, (A) a structural unit represented by the following general formula (1) having an acid dissociable group reacts with a carboxyl group to form a covalent bond. A resin containing a structural unit having a functional group capable of being insoluble in alkali or hardly soluble in alkali and becoming alkali-soluble when the acid-dissociable group is dissociated; (B) an acid upon irradiation with actinic rays or radiation A positive photosensitive resin composition characterized in that it contains at least a compound capable of generating.

In the general formula (1), R ¹ represents a hydrogen atom, a methyl group, a halogen atom or a cyano group. R ² and R ³ each independently represents a hydrogen atom, a linear or branched alkyl group, or a cycloalkyl group. However, at least one of R ² and R ³ represents a linear or branched alkyl group or a cycloalkyl group. R ⁴ represents a linear or branched alkyl group, cycloalkyl group, or aralkyl group which may be substituted. R ² or R ³ and R ⁴ may be linked to form a cyclic ether.

  As an acid generator, Patent Document 2 discloses an oxime sulfonic acid compound represented by the following general formula (1).

However, in said general formula (1), R < ¹ > represents either the alkyl group which may have a substituent, an aryl group, and a heteroaromatic group, and Ar is aromatic which may have a substituent. Represents a group ring or a heteroaromatic ring, and X represents one of O and S. A represents either a 5- or 6-membered ring.

JP 2009-98616 A JP 2008-247780 A

An object of the present invention is to provide a photosensitive resin composition having high sensitivity, excellent development latitude and transparency of a cured film, and a method for forming a cured film using the same.
Another object of the present invention is to provide an oxime sulfonate compound having high sensitivity, excellent development latitude, and excellent transparency of a cured film obtained by polymerizing a polymerizable compound.

The above-described problems of the present invention have been solved by means described in the following <1>, <9>, <13>, <14>, <15>, <17> or <18>. It is described below together with <2> to <8>, <10> to <12> and <16> which are preferred embodiments.
<1> (Component A) An oxime sulfonate compound represented by formula (1) or (2), (Component B) a structural unit having an acid-decomposable group that decomposes with an acid to form a carboxyl group or a phenolic hydroxyl group. A photosensitive resin composition characterized by containing a resin having (Component C) a solvent,

（式（１）又は式（２）中、Ｒ¹はアルキル基、アリール基又はヘテロアリール基を表し、Ｒ²はそれぞれ独立に、水素原子、アルキル基、アリール基又はハロゲン原子を表し、Ａｒ¹はｏ−アリーレン基又はｏ−ヘテロアリーレン基を表し、ＸはＯ、Ｓ又はＮＲ’基を表し、ＹはＯ、Ｓ、ＮＲ’基、ＮＯＲ’基、Ｎ−ＯＣ（Ｒ’）₂基、Ｎ−Ｎ（Ｒ’）₂基、Ｃ（Ｒ’）₂基、Ｎ−ＯＣＯ−Ｎ（Ｒ’）₂基、Ｎ−ＯＳＯ₂−ＯＲ’基、Ｎ−ＯＳＯ₂−ＳＲ’基又はＮ−ＯＳＯ₂−Ｎ（Ｒ’）₂基を表し、Ｒ’はアルキル基、アリール基又はヘテロアリール基を表し、ｎは０又は１を表す。）

(In Formula (1) or Formula (2), R ¹ represents an alkyl group, an aryl group, or a heteroaryl group, R ² each independently represents a hydrogen atom, an alkyl group, an aryl group, or a halogen atom; Ar ¹ Represents an o-arylene group or an o-heteroarylene group, X represents an O, S or NR ′ group, Y represents an O, S, NR ′ group, a NOR ′ group, an N—OC (R ′) ₂ group, N—N (R ′) ₂ group, C (R ′) ₂ group, N—OCO—N (R ′) ₂ group, N—OSO ₂ —OR ′ group, N—OSO ₂ —SR ′ group or N— OSO ₂ —N (R ′) ₂ represents a group, R ′ represents an alkyl group, an aryl group or a heteroaryl group, and n represents 0 or 1.

<2> The above <1, wherein the component B further has a structural unit derived from at least one compound selected from the group consisting of a styrene derivative, a maleimide derivative, (meth) acrylic acid, and a hydroxyl group-containing (meth) acrylate compound. > The photosensitive resin composition according to
<3> The photosensitive resin composition according to the above <1> or <2>, wherein the component B further has a structural unit having a functional group capable of reacting with a carboxyl group or a phenolic hydroxyl group to form a covalent bond,
<4> Any one of the above <1> to <3>, wherein the acid-decomposable group is a group represented by the formula (Ia), the formula (Ib), the formula (IIa), or the formula (IIb). A photosensitive resin composition according to claim 1,

（式中、Ｒ³はアルキル基又はシクロアルキル基を表し、Ｒ⁴はアルキル基を表し、Ｒ³と
Ｒ⁴は環を形成してもよく、Ｒ⁵は第三級アルキル基を表し、Ｒ^5'は第三級アルキル基又はｔｅｒｔ−ブトキシカルボニル基を表し、Ａｒ²及びＡｒ³はそれぞれ独立に、二価の芳香族基を表し、波線部分は他の構造との結合箇所を表す。）

(Wherein R ³ represents an alkyl group or a cycloalkyl group, R ⁴ represents an alkyl group, R ³ and R ⁴ may form a ring, R ⁵ represents a tertiary alkyl group, R ^{5 ′} represents a tertiary alkyl group or a tert-butoxycarbonyl group, Ar ² and Ar ³ each independently represent a divalent aromatic group, and a wavy line represents a bonding site with another structure.)

  <5> The photosensitive resin composition according to any one of the above <1> to <4>, wherein the component A is an oxime sulfonate compound represented by any one of formulas (3) to (8). ,

（式（３）〜式（８）中、Ｒ¹はアルキル基、アリール基又はヘテロアリール基を表し、Ｒ²はそれぞれ独立に、水素原子、アルキル基、アリール基又はハロゲン原子を表し、Ｒ⁶はそれぞれ独立に、ハロゲン原子、アルキル基、アルキルオキシ基、スルホン酸基、アミノスルホニル基又はアルコキシスルホニル基を表し、ＸはＯ、Ｓ又はＮＲ’基を表し、ＹはＯ、Ｓ、ＮＲ’基、ＮＯＲ’基、Ｎ−ＯＣ（Ｒ’）₂基、Ｎ−Ｎ（Ｒ’）₂基、Ｃ（Ｒ’）₂基、Ｎ−ＯＣＯ−Ｎ（Ｒ’）₂基、Ｎ−ＯＳＯ₂−ＯＲ’基、Ｎ−ＯＳＯ₂−ＳＲ’基又はＮ−ＯＳＯ₂−Ｎ（Ｒ’）₂基を表し、Ｒ’はアルキル基、アリール基又はヘテロアリール基を表し、ｎは０又は１を表し、ｍは０〜６の整数を表し、Ｌは０〜４の整数を表す。）

(In the formula (3) to Formula (8), R ¹ is an alkyl group, an aryl group or heteroaryl group, R ² each independently represents a hydrogen atom, an alkyl group, an aryl group or a halogen atom, R ⁶ Each independently represents a halogen atom, an alkyl group, an alkyloxy group, a sulfonic acid group, an aminosulfonyl group or an alkoxysulfonyl group, X represents an O, S or NR ′ group, and Y represents an O, S or NR ′ group. , NOR ′ group, N—OC (R ′) ₂ group, N—N (R ′) ₂ group, C (R ′) ₂ group, N—OCO—N (R ′) ₂ group, N—OSO ₂ — Represents an OR ′ group, an N—OSO ₂ —SR ′ group or an N—OSO ₂ —N (R ′) ₂ group, R ′ represents an alkyl group, an aryl group or a heteroaryl group, and n represents 0 or 1 M represents an integer of 0 to 6, and L represents an integer of 0 to 4.)

  <6> The photosensitive resin composition according to any one of <1> to <5>, wherein Component A is an oxime sulfonate compound represented by any of the following formulas (9) to (18): object,

（式（９）〜式（１８）中、Ｒ¹はアルキル基、アリール基又はヘテロアリール基を表し、Ｒ²はそれぞれ独立に、水素原子、アルキル基、アリール基又はハロゲン原子を表し、Ｒ⁶はそれぞれ独立に、ハロゲン原子、アルキル基、アルキルオキシ基、スルホン酸基、アミノスルホニル基又はアルコキシスルホニル基を表し、Ｒ⁷は水素原子、アルキル基、アリール基又はハロゲン原子を表し、ＸはＯ、Ｓ又はＮＲ’基を表し、ＹはＯ、Ｓ、ＮＲ’基、ＮＯＲ’基、Ｎ−ＯＣ（Ｒ’）₂基、Ｎ−Ｎ（Ｒ’）₂基、Ｃ（Ｒ’）₂基、Ｎ−ＯＣＯ−Ｎ（Ｒ’）₂基、Ｎ−ＯＳＯ₂−ＯＲ’基、Ｎ−ＯＳＯ₂−ＳＲ’基又はＮ−ＯＳＯ₂−Ｎ（Ｒ’）₂基を表し、Ｒ’はアルキル基、アリール基又はヘテロアリール基を表し、ｎは０又は１を表し、ｍは０〜６の整数を表し、Ｌは０〜４の整数を表す。）

(In the formula (9) to Formula (18), R ¹ represents an alkyl group, an aryl group or heteroaryl group, R ² each independently represents a hydrogen atom, an alkyl group, an aryl group or a halogen atom, R ⁶ Each independently represents a halogen atom, an alkyl group, an alkyloxy group, a sulfonic acid group, an aminosulfonyl group or an alkoxysulfonyl group, R ⁷ represents a hydrogen atom, an alkyl group, an aryl group or a halogen atom, X represents O, Y represents O, S, NR ′ group, NOR ′ group, N—OC (R ′) ₂ group, NN (R ′) ₂ group, C (R ′) ₂ group, N-OCO-N (R ') ₂ group, N-OSO ₂ -OR' group, N-OSO ₂ -SR 'group or N-OSO ₂ -N (R') ₂ group is represented, R 'is an alkyl group Represents an aryl group or a heteroaryl group, n represents 0 or 1, and m represents an integer of 0 to 6. , L is an integer of 0-4.)

  <7> The photosensitive resin composition according to any one of <1> to <6>, wherein Component A is an oxime sulfonate compound represented by any of the following formulas (19) to (24): object,

（式（１９）〜式（２４）中、Ｒ¹はアルキル基、アリール基又はヘテロアリール基を表し、Ｒ⁷は水素原子又はメチル基を表し、Ｒ⁸は水素原子、ハロゲン原子又はアルコキシ基を表し、ＸはＯ又はＳを表し、Ｒ’はアルキル基又はアリール基を表す。）

(In formula (19) to formula (24), R ¹ represents an alkyl group, an aryl group or a heteroaryl group, R ⁷ represents a hydrogen atom or a methyl group, and R ⁸ represents a hydrogen atom, a halogen atom or an alkoxy group. X represents O or S, and R ′ represents an alkyl group or an aryl group.)

  <8> The photosensitive resin composition according to any one of <1> to <7>, wherein Component A is an oxime sulfonate compound represented by any of the following formulas (25) to (29): object,

（式（２５）〜式（２９）中、Ｒ¹はアルキル基、アリール基又はヘテロアリール基を表し、Ｒ⁷は水素原子又はメチル基を表し、Ｒ⁹は水素原子、臭素原子又はアルコキシ基を表し、Ｒ¹⁰は水素原子又はアルコキシ基を表し、Ｒ¹¹は水素原子又は塩素原子を表す。）

(In Formula (25) to Formula (29), R ¹ represents an alkyl group, an aryl group or a heteroaryl group, R ⁷ represents a hydrogen atom or a methyl group, and R ⁹ represents a hydrogen atom, a bromine atom or an alkoxy group. R ¹⁰ represents a hydrogen atom or an alkoxy group, and R ¹¹ represents a hydrogen atom or a chlorine atom.)

  <9> An oxime sulfonate compound represented by any one of the following formulas (30) to (37):

（式（３０）〜式（３７）中、Ｒ¹はアルキル基、アリール基又はヘテロアリール基を表し、Ｒ²はそれぞれ独立に、水素原子、アルキル基、アリール基又はハロゲン原子を表し、Ｒ⁶はそれぞれ独立に、ハロゲン原子、アルキル基、アルキルオキシ基、スルホン酸基、アミノスルホニル基又はアルコキシスルホニル基を表し、ＸはＯ、Ｓ又はＮＲ’基を表し、ＹはＯ、Ｓ、ＮＲ’基、ＮＯＲ’基、Ｎ−ＯＣ（Ｒ’）₂基、Ｎ−Ｎ（Ｒ’）₂基、Ｃ（Ｒ’）₂基、Ｎ−ＯＣＯ−Ｎ（Ｒ’）₂基、Ｎ−ＯＳＯ₂−ＯＲ’基、Ｎ−ＯＳＯ₂−ＳＲ’基又はＮ−ＯＳＯ₂−Ｎ（Ｒ’）₂基を表し、ＷはＯ又はＮＲ’基を表し、ＺはＳ又はＮＲ’基を表し、Ｒ’はアリール基又はヘテロアリール基を表し、ｎは０又は１を表し、ｍは０〜６の整数を表し、Ｌは０〜４の整数を表す。）

(In the formula (30) to Formula (37), R ¹ represents an alkyl group, an aryl group or heteroaryl group, R ² each independently represents a hydrogen atom, an alkyl group, an aryl group or a halogen atom, R ⁶ Each independently represents a halogen atom, an alkyl group, an alkyloxy group, a sulfonic acid group, an aminosulfonyl group or an alkoxysulfonyl group, X represents an O, S or NR ′ group, and Y represents an O, S or NR ′ group. , NOR ′ group, N—OC (R ′) ₂ group, N—N (R ′) ₂ group, C (R ′) ₂ group, N—OCO—N (R ′) ₂ group, N—OSO ₂ — OR 'group, N-OSO ₂ -SR' group or N-OSO ₂ -N (R ') ₂ group, W represents O or NR' group, Z represents S or NR 'group, R' Represents an aryl group or a heteroaryl group, n represents 0 or 1, m represents an integer of 0 to 6, and L represents an integer of 0 to 4. It is.)

  <10> The oxime sulfonate compound according to <9>, represented by any one of the following formulas (38) to (49):

（式（３８）〜式（４９）中、Ｒ¹はアルキル基、アリール基又はヘテロアリール基を表し、Ｒ⁶はそれぞれ独立に、ハロゲン原子、アルキル基、アルキルオキシ基、スルホン酸基、アミノスルホニル基又はアルコキシスルホニル基を表し、Ｒ⁷は水素原子、アルキル基、アリール基又はハロゲン原子を表し、ＸはＯ又はＳを表し、ＹはＯ、Ｓ、ＮＲ’基、ＮＯＲ’基、Ｎ−ＯＣ（Ｒ’）₂基、Ｎ−Ｎ（Ｒ’）₂基、Ｃ（Ｒ’）₂基、Ｎ−ＯＣＯ−Ｎ（Ｒ’）₂基、Ｎ−ＯＳＯ₂−ＯＲ’基、Ｎ−ＯＳＯ₂−ＳＲ’基又はＮ−ＯＳＯ₂−Ｎ（Ｒ’）₂基を表し、ＷはＯ又はＮＲ’基を表し、ＺはＳ又はＮＲ’基を表し、Ｒ’はアリール基又はヘテロアリール基を表し、ｍは０〜６の整数を表し、Ｌは０〜４の整数を表す。）

(In formula (38) to formula (49), R ¹ represents an alkyl group, an aryl group or a heteroaryl group, and R ⁶ each independently represents a halogen atom, an alkyl group, an alkyloxy group, a sulfonic acid group, or an aminosulfonyl group. R ⁷ represents a hydrogen atom, an alkyl group, an aryl group or a halogen atom, X represents O or S, Y represents O, S, NR ′ group, NOR ′ group, N—OC (R ') ₂ group, NN (R') ₂ group, C (R ') ₂ group, N-OCO-N (R') ₂ group, N-OSO ₂ -OR 'group, N-OSO ₂ -SR "group or _{N-OSO 2 -N (R '} ) represents ₂ group, W is' represents a group, Z is S or NR 'O, or NR a group, R' is an aryl or heteroaryl group And m represents an integer of 0 to 6, and L represents an integer of 0 to 4.)

  <11> The oxime sulfonate compound according to <10>, represented by any one of the following formulas (50) to (55):

（式（５０）〜式（５５）中、Ｒ¹はアルキル基、アリール基又はヘテロアリール基を表し、Ｒ⁷は水素原子又はメチル基を表し、Ｒ⁸は水素原子、ハロゲン原子又はアルコキシ基を表し、ＸはＯ又はＳを表し、ＷはＯ又はＮＲ’基を表し、ＺはＳ又はＮＲ’基を表し、Ｒ’はアリール基を表す。）

(In Formula (50) to Formula (55), R ¹ represents an alkyl group, an aryl group or a heteroaryl group, R ⁷ represents a hydrogen atom or a methyl group, and R ⁸ represents a hydrogen atom, a halogen atom or an alkoxy group. X represents O or S, W represents an O or NR ′ group, Z represents an S or NR ′ group, and R ′ represents an aryl group.)

  <12> The oxime sulfonate compound according to <11>, represented by any one of the following formulas (56) to (60):

（式（５６）〜式（６０）中、Ｒ¹はアルキル基、アリール基又はヘテロアリール基を表し、Ｒ⁷は水素原子又はメチル基を表し、Ｒ⁹は水素原子、臭素原子又はアルコキシ基を表し、Ｒ¹⁰は水素原子又はアルコキシ基を表し、Ｒ¹¹は水素原子又は塩素原子を表す。）

(In formula (56) to formula (60), R ¹ represents an alkyl group, an aryl group or a heteroaryl group, R ⁷ represents a hydrogen atom or a methyl group, and R ⁹ represents a hydrogen atom, a bromine atom or an alkoxy group. R ¹⁰ represents a hydrogen atom or an alkoxy group, and R ¹¹ represents a hydrogen atom or a chlorine atom.)

  <13> A photoacid generator, which is the oxime sulfonate compound according to any one of <9> to <12> above,

<14> (1) Application step of applying the photosensitive resin composition according to any one of the above <1> to <8> on a substrate, (2) Solvent from the applied photosensitive resin composition. A solvent removing step to remove, (3) an exposure step of exposing the coated photosensitive resin composition with actinic rays, (4) a developing step of developing the exposed photosensitive resin composition with an aqueous developer, and ( 5) a post-baking step of thermosetting the developed photosensitive resin composition, a method for forming a cured film,
<15> A cured film formed by applying at least one of light and heat to the photosensitive resin composition according to any one of <1> to <8>,
<16> The cured film according to <15>, which is an interlayer insulating film,
<17> An organic EL display device comprising the cured film according to <15> or <16> above,
<18> A liquid crystal display device comprising the cured film according to <15> or <16>.

According to the present invention, it was possible to provide a photosensitive resin composition having high sensitivity, excellent development latitude and transparency of a cured film, and a method for forming a cured film using the same.
In addition, according to the present invention, it was possible to provide an oxime sulfonate compound that has high sensitivity, excellent development latitude, and excellent transparency of a cured film obtained by polymerizing a polymerizable compound.

1 shows a conceptual diagram of a configuration of an example of an organic EL display device. A schematic cross-sectional view of a substrate in a bottom emission type organic EL display device is shown, and a planarizing film 4 is provided. 1 is a conceptual diagram of a configuration of an example of a liquid crystal display device. The schematic sectional drawing of the active matrix substrate in a liquid crystal display device is shown, and it has the cured film 17 which is an interlayer insulation film.

(Photosensitive resin composition)
Hereinafter, the photosensitive resin composition of the present invention will be described in detail.
The photosensitive resin composition of the present invention (hereinafter also simply referred to as “resin composition”) comprises (Component A) an oxime sulfonate compound represented by Formula (1) or Formula (2), and (Component B) an acid. It contains a resin having a structural unit having an acid-decomposable group that decomposes to produce a carboxyl group or a phenolic hydroxyl group, and (Component C) a solvent.

（式（１）又は式（２）中、Ｒ¹はアルキル基、アリール基又はヘテロアリール基を表し、Ｒ²はそれぞれ独立に、水素原子、アルキル基、アリール基又はハロゲン原子を表し、Ａｒ¹はｏ−アリーレン基又はｏ−ヘテロアリーレン基を表し、ＸはＯ、Ｓ又はＮＲ’基を表し、ＹはＯ、Ｓ、ＮＲ’基、ＮＯＲ’基、Ｎ−ＯＣ（Ｒ’）₂基、Ｎ−Ｎ（Ｒ’）₂基、Ｃ（Ｒ’）₂基、Ｎ−ＯＣＯ−Ｎ（Ｒ’）₂基、Ｎ−ＯＳＯ₂−ＯＲ’基、Ｎ−ＯＳＯ₂−ＳＲ’基又はＮ−ＯＳＯ₂−Ｎ（Ｒ’）₂基を表し、Ｒ’はアルキル基、アリール基又はヘテロアリール基を表し、ｎは０又は１を表す。）

(In Formula (1) or Formula (2), R ¹ represents an alkyl group, an aryl group, or a heteroaryl group, R ² each independently represents a hydrogen atom, an alkyl group, an aryl group, or a halogen atom; Ar ¹ Represents an o-arylene group or an o-heteroarylene group, X represents an O, S or NR ′ group, Y represents an O, S, NR ′ group, a NOR ′ group, an N—OC (R ′) ₂ group, N—N (R ′) ₂ group, C (R ′) ₂ group, N—OCO—N (R ′) ₂ group, N—OSO ₂ —OR ′ group, N—OSO ₂ —SR ′ group or N— OSO ₂ —N (R ′) ₂ represents a group, R ′ represents an alkyl group, an aryl group or a heteroaryl group, and n represents 0 or 1.

The photosensitive resin composition of the present invention is preferably a positive photosensitive resin composition.
The photosensitive resin composition of the present invention is more preferably a chemically amplified positive photosensitive resin composition (chemically amplified positive photosensitive resin composition).
The photosensitive resin composition of the present invention preferably contains no 1,2-quinonediazide compound as a photoacid generator sensitive to actinic rays. The 1,2-quinonediazide compound generates a carboxyl group by a sequential photochemical reaction, but its quantum yield is always 1 or less.
On the other hand, the oxime sulfonate compound represented by formula (1) or formula (2) used in the present invention is suitable for deprotection of acid-protected acid groups generated in response to actinic rays. On the other hand, it acts as a catalyst, so that the acid produced by the action of one photon contributes to many deprotection reactions, and the quantum yield exceeds 1, for example, a large value such as the power of 10, High sensitivity is obtained as a result of so-called chemical amplification.
“Actinic light” is light that can give energy to generate an acid in the photosensitive resin composition by irradiation, and includes α rays, γ rays, X rays, ultraviolet rays, visible rays, electron rays, and the like. Of these, ultraviolet rays are preferable.
Hereinafter, each component shown by these (component A) etc. is also called "component A" etc., respectively.

(Component A) Oxime sulfonate compound represented by formula (1) or formula (2) The photosensitive resin composition of the present invention comprises (Component A) an oxime sulfonate compound represented by formula (1) or formula (2). Containing.
(Component A) The oxime sulfonate compound represented by formula (1) or formula (2) can be suitably used as a photoacid generator that generates an acid in response to actinic rays.

（式（１）又は式（２）中、Ｒ¹はアルキル基、アリール基又はヘテロアリール基を表し、Ｒ²はそれぞれ独立に、水素原子、アルキル基、アリール基又はハロゲン原子を表し、Ａｒ¹はｏ−アリーレン基又はｏ−ヘテロアリーレン基を表し、ＸはＯ、Ｓ又はＮＲ’基を表し、ＹはＯ、Ｓ、ＮＲ’基、ＮＯＲ’基、Ｎ−ＯＣ（Ｒ’）₂基、Ｎ−Ｎ（Ｒ’）₂基、Ｃ（Ｒ’）₂基、Ｎ−ＯＣＯ−Ｎ（Ｒ’）₂基、Ｎ−ＯＳＯ₂−ＯＲ’基、Ｎ−ＯＳＯ₂−ＳＲ’基又はＮ−ＯＳＯ₂−Ｎ（Ｒ’）₂基を表し、Ｒ’はアルキル基、アリール基又はヘテロアリール基を表し、ｎは０又は１を表す。）

(In Formula (1) or Formula (2), R ¹ represents an alkyl group, an aryl group, or a heteroaryl group, R ² each independently represents a hydrogen atom, an alkyl group, an aryl group, or a halogen atom; Ar ¹ Represents an o-arylene group or an o-heteroarylene group, X represents an O, S or NR ′ group, Y represents an O, S, NR ′ group, a NOR ′ group, an N—OC (R ′) ₂ group, N—N (R ′) ₂ group, C (R ′) ₂ group, N—OCO—N (R ′) ₂ group, N—OSO ₂ —OR ′ group, N—OSO ₂ —SR ′ group or N— OSO ₂ —N (R ′) ₂ represents a group, R ′ represents an alkyl group, an aryl group or a heteroaryl group, and n represents 0 or 1.

In the formula (1) or formula (2), the alkyl group, aryl group or heteroaryl group in R ¹ may have a substituent.
In the formula (1) or formula (2), the alkyl group in R ¹ is preferably an alkyl group having 1 to 30 carbon atoms which may have a substituent.
Examples of the substituent that the alkyl group in R ¹ may have include a halogen atom, an alkyloxy group, an aryloxy group, an alkylthio group, an arylthio group, an alkyloxycarbonyl group, an aryloxycarbonyl group, and an aminocarbonyl group. .

Examples of the alkyl group in R ¹ include methyl group, ethyl group, n-propyl group, i-propyl group, n-butyl group, s-butyl group, t-butyl group, n-pentyl group, n-hexyl group, n -Octyl group, n-decyl group, n-dodecyl group, trifluoromethyl group, perfluoropropyl group, perfluorohexyl group, benzyl group, phenoxyethyl group, methylthioethyl group, phenylthioethyl group, ethoxycarbonylethyl group, Examples include phenoxycarbonylethyl group and dimethylaminocarbonylethyl group.
Among these, methyl group, ethyl group, n-propyl group, i-propyl group, n-butyl group, s-butyl group, t-butyl group, n-pentyl group, n-hexyl group, n-octyl group, An n-decyl group, an n-dodecyl group, a trifluoromethyl group, a perfluoropropyl group, a perfluorohexyl group, and a benzyl group are preferable.

Further, in the above formula (1) or (2), the aryl group in R ^1, preferably an aryl group having from 6 to 30 atoms in total may be carbon have a substituent.
Examples of the substituent that the aryl group in R ¹ may have include a halogen atom, an alkyl group, an alkyloxy group, an aryloxy group, an alkylthio group, an arylthio group, an alkyloxycarbonyl group, an aryloxycarbonyl group, and an aminocarbonyl group. , A sulfonic acid group, an aminosulfonyl group, and an alkoxysulfonyl group.

As the aryl group in R ¹ , a phenyl group, a p-toluyl group, a p-chlorophenyl group, a pentachlorophenyl group, a pentafluorophenyl group, an o-methoxyphenyl group, a p-phenoxyphenyl group, a p-methylthiophenyl group, p- Phenylthiophenyl group, p-ethoxycarbonylphenyl group, p-phenoxycarbonylphenyl group, p-dimethylaminocarbonylphenyl group, o-toluyl group, o-nitrophenyl group, p-nitrophenyl group, 2,4,6- Examples thereof include a trimethylphenyl group, 2,4,6-triisopropylphenyl group, and 2,4-di (trifluoromethyl) phenyl group.
Among these, a phenyl group, p-toluyl group, p-chlorophenyl group, pentachlorophenyl group, pentafluorophenyl group, o-methoxyphenyl group, and p-phenoxyphenyl group are preferable.

Further, the formula (1) or formula (2), as the heteroaryl group in R ^1, heteroaryl group having a total carbon number of 4-30 which may have a substituent is preferable.
Examples of the substituent that the heteroaryl group in R ¹ may have include a halogen atom, an alkyl group, an alkyloxy group, an aryloxy group, an alkylthio group, an arylthio group, an alkyloxycarbonyl group, an aryloxycarbonyl group, and an aminocarbonyl. Group, sulfonic acid group, aminosulfonyl group and alkoxysulfonyl group.

In the formula (1) or formula (2), at least one of the heteroaryl groups in R ¹ may be a heteroaromatic ring. For example, a heteroaromatic ring and a benzene ring may be condensed. .
The heteroaryl group in R ¹ may have a substituent, the group consisting of a thiophene ring, a pyrrole ring, a thiazole ring, an imidazole ring, a furan ring, a benzothiophene ring, a benzothiazole ring, and a benzimidazole ring And a group in which one hydrogen atom is removed from the ring selected from the above.

Among these, R ¹ in the formula (1) or formula (2) is preferably an alkyl group or an aryl group, and is an alkyl group having 1 to 20 carbon atoms or an aryl group having 6 to 20 carbon atoms. It is more preferable that it is a C1-C16 alkyl group or p-toluyl group, and it is especially preferable that it is a C3-C8 alkyl group or p-toluyl group.

In formula (1) or formula (2), each R ² is preferably independently a hydrogen atom, an alkyl group or an aryl group, more preferably a hydrogen atom or an alkyl group, and a hydrogen atom or carbon number. It is more preferably an alkyl group of 1 to 8, particularly preferably a hydrogen atom or a methyl group.
In the formula (1) or formula (2), the alkyl group or aryl group in R ² may have a substituent.
Examples of the substituent that the alkyl group or aryl group in R ² may have include the same groups as the substituent that the alkyl group or aryl group in R ¹ may have.

The alkyl group for R ² is preferably an alkyl group having 1 to 12 carbon atoms which may have a substituent, and an alkyl group having 1 to 6 carbon atoms which may have a substituent. It is more preferable.
Specific examples of the alkyl group for R ² include methyl group, ethyl group, n-propyl group, i-propyl group, n-butyl group, i-butyl group, s-butyl group, t-butyl group, allyl group, n-pentyl group, n-hexyl group, n-octyl group, n-decyl group, n-dodecyl group, perfluorohexyl group, chloromethyl group, bromomethyl group, methoxymethyl group, benzyl group, phenoxyethyl group, methylthioethyl Group, phenylthioethyl group, ethoxycarbonylethyl group, phenoxycarbonylethyl group, dimethylaminocarbonylethyl group.
Among these, methyl group, ethyl group, n-propyl group, i-propyl group, n-butyl group, i-butyl group, s-butyl group, n-hexyl group, allyl group, chloromethyl group, bromomethyl group, Methoxymethyl group and benzyl group are preferable, methyl group, ethyl group, n-propyl group, i-propyl group, n-butyl group, i-butyl group, s-butyl group and n-hexyl group are more preferable, and methyl group , An ethyl group, an n-propyl group, an n-butyl group, and an n-hexyl group are more preferable, and a methyl group is particularly preferable.

The aryl group for R ² is preferably an aryl group having 6 to 30 carbon atoms which may have a substituent.
Specific examples of the aryl group for R ² include phenyl group, p-toluyl group, o-chlorophenyl group, p-chlorophenyl group, o-methoxyphenyl group, p-phenoxyphenyl group, p-methylthiophenyl group, p-phenyl. Examples thereof include a thiophenyl group, a p-ethoxycarbonylphenyl group, a p-phenoxycarbonylphenyl group, and a p-dimethylaminocarbonylphenyl group.
Among these, a phenyl group, p-toluyl group, o-chlorophenyl group, p-chlorophenyl group, o-methoxyphenyl group, and p-phenoxyphenyl group are preferable.
Examples of the halogen atom for R ² include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom.
Among these, a chlorine atom or a bromine atom is preferable.

In the formula (1) or formula (2), Ar ¹ represents an o-arylene group or an o-heteroarylene group. The o-arylene group and o-heteroarylene group in Ar ¹ may have a substituent.
Examples of the substituent include a halogen atom, an alkyl group, and an alkyloxy group, and these may further have a substituent. Preferred examples of the substituent that the o-arylene group and o-heteroarylene group may have include R ² described later.
Specifically, the o-arylene group and o-heteroarylene group in Ar ¹ may have a substituent, which may have a substituent, 1,2-phenylene group, 1,2-naphthalenediyl group, 2,3-naphthalenediyl group. Group, 2,3-furandiyl group, 2,3-thiophenediyl group, 2,3-quinolinediyl group, 6,7-quinolinediyl group, 7,8-quinolinediyl group and the like.
Among these, Ar ¹ is preferably an o-arylene group, more preferably a 1,2-phenylene group or a 1,2-naphthalenediyl group, and a 1,2-naphthalenediyl group. It is particularly preferred.

In the formula (1) or formula (2), X represents an O, S or NR ′ group.
In the formula (1) or formula (2), X, Ar, the carbon atom of the oxime group, and the carbon atom to which Y is bonded include —C (R ² ) ₂ — as necessary. A 5-membered ring or a 6-membered ring is formed.
In the formula (1) or formula (2), n represents 0 or 1, and when X is O or NR ′, n is preferably 0, and when X is S, n is 1 is preferable.

In the formula (1) or (2), Y represents O, S, NR ′ group, NOR ′ group, N—OC (R ′) ₂ group, NN (R ′) ₂ group, C (R ′ ) Represents ₂ groups, N—OCO—N (R ′) ₂ group, N—OSO ₂ —OR ′ group, N—OSO ₂ —SR ′ group or N—OSO ₂ —N (R ′) ₂ group, , NR ′ group, NOR ′ group, N—OC (R ′) ₂ group, NN (R ′) ₂ group, N—OCO—N (R ′) ₂ group, N—OSO ₂ —OR ′ group, N-OSO ₂ —SR ′ group or N—OSO ₂ —N (R ′) ₂ group is preferable, O or NOR ′ group is more preferable, and O is particularly preferable.

  In the formula (1) or formula (2), R ′ represents an alkyl group, an aryl group or a heteroaryl group, preferably an alkyl group or an aryl group, and an alkyl group having 1 to 20 carbon atoms or 6 carbon atoms. It is more preferably an aryl group having ˜20, further preferably an aryl group having 6 to 20 carbon atoms, and particularly preferably a phenyl group.

  Component A is preferably an oxime sulfonate compound represented by any one of formulas (3) to (8).

（式（３）〜式（８）中、Ｒ¹はアルキル基、アリール基又はヘテロアリール基を表し、Ｒ²はそれぞれ独立に、水素原子、アルキル基、アリール基又はハロゲン原子を表し、Ｒ⁶はそれぞれ独立に、ハロゲン原子、アルキル基、アルキルオキシ基、スルホン酸基、アミノスルホニル基又はアルコキシスルホニル基を表し、ＸはＯ、Ｓ又はＮＲ’基を表し、ＹはＯ、Ｓ、ＮＲ’基、ＮＯＲ’基、Ｎ−ＯＣ（Ｒ’）₂基、Ｎ−Ｎ（Ｒ’）₂基、Ｃ（Ｒ’）₂基、Ｎ−ＯＣＯ−Ｎ（Ｒ’）₂基、Ｎ−ＯＳＯ₂−ＯＲ’基、Ｎ−ＯＳＯ₂−ＳＲ’基又はＮ−ＯＳＯ₂−Ｎ（Ｒ’）₂基を表し、Ｒ’はアルキル基、アリール基又はヘテロアリール基を表し、ｎは０又は１を表し、ｍは０〜６の整数を表し、Ｌは０〜４の整数を表す。）

(In the formula (3) to Formula (8), R ¹ is an alkyl group, an aryl group or heteroaryl group, R ² each independently represents a hydrogen atom, an alkyl group, an aryl group or a halogen atom, R ⁶ Each independently represents a halogen atom, an alkyl group, an alkyloxy group, a sulfonic acid group, an aminosulfonyl group or an alkoxysulfonyl group, X represents an O, S or NR ′ group, and Y represents an O, S or NR ′ group. , NOR ′ group, N—OC (R ′) ₂ group, N—N (R ′) ₂ group, C (R ′) ₂ group, N—OCO—N (R ′) ₂ group, N—OSO ₂ — Represents an OR ′ group, an N—OSO ₂ —SR ′ group or an N—OSO ₂ —N (R ′) ₂ group, R ′ represents an alkyl group, an aryl group or a heteroaryl group, and n represents 0 or 1 M represents an integer of 0 to 6, and L represents an integer of 0 to 4.)

Equation (3) R ¹ in to the formula ^{(8), R 2, X} , Y, R ' and n are, R ¹ in Formula (1) or Formula ^{(2), R 2, X} , Y, R' and Each is synonymous with n, and preferred embodiments are also the same.
In the formulas (3) to (8), examples of the halogen atom for R ⁶ include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom, and a chlorine atom or a bromine atom is preferable.
In said formula (3)-formula (8), the alkyl group and alkyloxy group in R < ⁶ > may have a substituent.
In the formulas (3) to (8), the alkyl group in R ⁶ is preferably an alkyl group having 1 to 30 carbon atoms which may have a substituent.
Examples of the substituent that the alkyl group in R ⁶ may have include a halogen atom, an alkyloxy group, an aryloxy group, an alkylthio group, an arylthio group, an alkyloxycarbonyl group, an aryloxycarbonyl group, and an aminocarbonyl group. .

Examples of the alkyl group in R ⁶ include methyl group, ethyl group, n-propyl group, i-propyl group, n-butyl group, s-butyl group, t-butyl group, n-pentyl group, n-hexyl group, n -Octyl group, n-decyl group, n-dodecyl group, trifluoromethyl group, perfluoropropyl group, perfluorohexyl group, benzyl group, phenoxyethyl group, methylthioethyl group, phenylthioethyl group, ethoxycarbonylethyl group, Examples include phenoxycarbonylethyl group and dimethylaminocarbonylethyl group.
Among these, methyl group, ethyl group, n-propyl group, i-propyl group, n-butyl group, s-butyl group, t-butyl group, n-pentyl group, n-hexyl group, n-octyl group, An n-decyl group, an n-dodecyl group, a trifluoromethyl group, a perfluoropropyl group, a perfluorohexyl group, and a benzyl group are preferable.

In formulas (3) to (8), the alkyloxy group for R ⁶ is preferably an alkyloxy group having 1 to 30 carbon atoms which may have a substituent.
Examples of the substituent that the alkyloxy group in R ⁶ may have include a halogen atom, an alkyloxy group, an aryloxy group, an alkylthio group, an arylthio group, an alkyloxycarbonyl group, an aryloxycarbonyl group, and an aminocarbonyl group. It is done.

Examples of the alkyloxy group in R ⁶ include methyloxy group, ethyloxy group, butyloxy group, hexyloxy group, phenoxyethyloxy group, trichloromethyloxy group, ethoxyethyloxy group, methylthioethyloxy group, phenylthioethyloxy group, ethoxy Examples thereof include a carbonylethyloxy group, a phenoxycarbonylethyloxy group, and a dimethylaminocarbonylethyloxy group.
Among these, a methyloxy group, an ethyloxy group, a butyloxy group, a hexyloxy group, a phenoxyethyloxy group, a trichloromethyloxy group, or an ethoxyethyloxy group is preferable.
In the formulas (3) to (8), examples of the aminosulfonyl group for R ⁶ include a methylaminosulfonyl group, a dimethylaminosulfonyl group, a phenylaminosulfonyl group, a methylphenylaminosulfonyl group, and an aminosulfonyl group.
In the formulas (3) to (8), examples of the alkoxysulfonyl group in R ⁶ include a methoxysulfonyl group, an ethoxysulfonyl group, a propyloxysulfonyl group, and a butyloxysulfonyl group.

In the formulas (3) to (6), m represents an integer of 0 to 6, preferably an integer of 0 to 2, more preferably 0 or 1, and particularly preferably 0. .
Moreover, in said Formula (7) or Formula (8), L represents the integer of 0-4, it is preferable that it is an integer of 0-2, it is more preferable that it is 0 or 1, and it is 0. Particularly preferred.
Further, from the viewpoint of development latitude, it is particularly preferable that m or L is 1 and R ⁶ is an alkoxy group.

  Component A is more preferably an oxime sulfonate compound represented by any of the following formulas (9) to (18).

（式（９）〜式（１８）中、Ｒ¹はアルキル基、アリール基又はヘテロアリール基を表し、Ｒ²はそれぞれ独立に、水素原子、アルキル基、アリール基又はハロゲン原子を表し、Ｒ⁶はそれぞれ独立に、ハロゲン原子、アルキル基、アルキルオキシ基、スルホン酸基、アミノスルホニル基又はアルコキシスルホニル基を表し、Ｒ⁷は水素原子、アルキル基、アリール基又はハロゲン原子を表し、ＸはＯ、Ｓ又はＮＲ’基を表し、ＹはＯ、Ｓ、ＮＲ’基、ＮＯＲ’基、Ｎ−ＯＣ（Ｒ’）₂基、Ｎ−Ｎ（Ｒ’）₂基、Ｃ（Ｒ’）₂基、Ｎ−ＯＣＯ−Ｎ（Ｒ’）₂基、Ｎ−ＯＳＯ₂−ＯＲ’基、Ｎ−ＯＳＯ₂−ＳＲ’基又はＮ−ＯＳＯ₂−Ｎ（Ｒ’）₂基を表し、Ｒ’はアルキル基、アリール基又はヘテロアリール基を表し、ｎは０又は１を表し、ｍは０〜６の整数を表し、Ｌは０〜４の整数を表す。）

(In the formula (9) to Formula (18), R ¹ represents an alkyl group, an aryl group or heteroaryl group, R ² each independently represents a hydrogen atom, an alkyl group, an aryl group or a halogen atom, R ⁶ Each independently represents a halogen atom, an alkyl group, an alkyloxy group, a sulfonic acid group, an aminosulfonyl group or an alkoxysulfonyl group, R ⁷ represents a hydrogen atom, an alkyl group, an aryl group or a halogen atom, X represents O, Y represents O, S, NR ′ group, NOR ′ group, N—OC (R ′) ₂ group, NN (R ′) ₂ group, C (R ′) ₂ group, N-OCO-N (R ') ₂ group, N-OSO ₂ -OR' group, N-OSO ₂ -SR 'group or N-OSO ₂ -N (R') ₂ group is represented, R 'is an alkyl group Represents an aryl group or a heteroaryl group, n represents 0 or 1, and m represents an integer of 0 to 6. , L is an integer of 0-4.)

Equation (9) R ¹ in to Formula ^{(18), R 2, X} , Y, R ' and n are, R ¹ in Formula (1) or Formula ^{(2), R 2, X} , Y, R' and Each is synonymous with n, and preferred embodiments are also the same. Further, R ^6, m and L in the formula (9) to (18), the formula (3) are each and R ^6, m and L synonymous in to (8), the same preferred embodiments also each .
R ⁷ in the above formulas (13) to (16) represents a hydrogen atom, an alkyl group, an aryl group or a halogen atom, preferably a hydrogen atom, an alkyl group or an aryl group, and preferably a hydrogen atom or an alkyl group. Are more preferable, and a hydrogen atom or a methyl group is still more preferable.

  Component A is more preferably an oxime sulfonate compound represented by any of the following formulas (19) to (24).

（式（１９）〜式（２４）中、Ｒ¹はアルキル基、アリール基又はヘテロアリール基を表し、Ｒ⁷は水素原子又はメチル基を表し、Ｒ⁸は水素原子、ハロゲン原子又はアルコキシ基を表し、ＸはＯ又はＳを表し、Ｒ’はアルキル基又はアリール基を表す。）

(In formula (19) to formula (24), R ¹ represents an alkyl group, an aryl group or a heteroaryl group, R ⁷ represents a hydrogen atom or a methyl group, and R ⁸ represents a hydrogen atom, a halogen atom or an alkoxy group. X represents O or S, and R ′ represents an alkyl group or an aryl group.)

R ¹ in formula (19) to formula (24) has the same meaning as R ¹ in formula (1) or formula (2), and the preferred embodiments are also the same.
R ⁷ in formula (21) or formula (22) represents a hydrogen atom or a methyl group, preferably a hydrogen atom when X is O, and preferably a methyl group when X is S. .
R ⁸ in the formulas (19) to (24) represents a hydrogen atom, a halogen atom or an alkoxy group, preferably a hydrogen atom, a chlorine atom, a bromine atom or an alkoxy group having 1 to 20 carbon atoms, An atom, a chlorine atom, a bromine atom, or an alkoxy group having 1 to 8 carbon atoms is more preferable, and a hydrogen atom or a methoxy group is further preferable.
X in the formulas (19) to (23) represents O or S, and is particularly preferably O.
R ′ in the formula (24) represents an alkyl group or an aryl group, preferably an alkyl group having 1 to 20 carbon atoms or an aryl group having 6 to 20 carbon atoms, and an aryl group having 6 to 20 carbon atoms. More preferably, it is a phenyl group.

  Component A is particularly preferably an oxime sulfonate compound represented by any of the following formulas (25) to (29).

（式（２５）〜式（２９）中、Ｒ¹はアルキル基、アリール基又はヘテロアリール基を表し、Ｒ⁷は水素原子又はメチル基を表し、Ｒ⁹は水素原子、臭素原子又はアルコキシ基を表し、Ｒ¹⁰は水素原子又はアルコキシ基を表し、Ｒ¹¹は水素原子又は塩素原子を表す。）

(In Formula (25) to Formula (29), R ¹ represents an alkyl group, an aryl group or a heteroaryl group, R ⁷ represents a hydrogen atom or a methyl group, and R ⁹ represents a hydrogen atom, a bromine atom or an alkoxy group. R ¹⁰ represents a hydrogen atom or an alkoxy group, and R ¹¹ represents a hydrogen atom or a chlorine atom.)

R ¹ in Formula (25) to Formula (29) has the same meaning as R ¹ in Formula (1) or Formula (2), and the preferred embodiment is also the same.
R ⁷ in the formula (28) represents a hydrogen atom or a methyl group, and is preferably a methyl group.
R ⁹ in the formula (25) represents a hydrogen atom, a bromine atom or an alkoxy group, preferably a hydrogen atom, a bromine atom or an alkoxy group having 1 to 20 carbon atoms, and preferably a hydrogen atom or a bromine atom. More preferred.
R ¹⁰ in Formula (26) or Formula (27) represents a hydrogen atom or an alkoxy group, and is preferably a hydrogen atom or an alkoxy group having 1 to 20 carbon atoms, and from the viewpoint of development latitude, a hydrogen atom or It is more preferably an alkoxy group having 1 to 8 carbon atoms, further preferably a hydrogen atom or a methoxy group, and particularly preferably a methoxy group.
R ⁹ in the formula (28) represents a hydrogen atom or a chlorine atom, and is preferably a chlorine atom.

In the oxime sulfonate compound, the steric structure (E, Z) of the oxime may be either one or a mixture.
Specific examples of the oxime sulfonate compound represented by the formula (1) or the formula (2) include the following exemplary compounds, but the present invention is not limited thereto.

  The content of Component A in the photosensitive resin composition of the present invention is preferably 0.1 to 10 parts by weight and more preferably 0.5 to 10 parts by weight with respect to 100 parts by weight of Component B. . When the content of component A is 0.1 parts by weight or more, desired sensitivity is easily obtained, and when it is 10 parts by weight or less, it is easy to ensure the transparency of the cured film.

(Component B) Resin having a structural unit having an acid-decomposable group that decomposes with an acid to generate a carboxyl group or a phenolic hydroxyl group The photosensitive resin composition of the present invention is (Component B) decomposed with an acid to generate a carboxyl group or a phenol. The resin which has a structural unit which has an acid-decomposable group which produces | generates a reactive hydroxyl group is contained.
Here, the “acid-decomposable group” in the present invention means a functional group capable of generating a carboxyl group protected by the acid-decomposable group by decomposing in the presence of an acid.
Hereinafter, the structural unit which comprises a copolymer (component B) is demonstrated in detail.

<Constitutional unit containing acid-decomposable group>
The structural unit having an acid-decomposable group that decomposes with an acid contained in Component B to generate a carboxyl group or a phenolic hydroxyl group (hereinafter also simply referred to as “acid-decomposable group”) is decomposed (dissociated) with an acid, A structural unit having the structure represented by formula (Ia) or (IIa) that generates a carboxyl group, or a structure represented by formula (Ib) or (IIb) that decomposes with an acid to form a phenolic hydroxyl group It is preferable to contain the structural unit which has.

（式中、Ｒ³はアルキル基又はシクロアルキル基を表し、Ｒ⁴はアルキル基を表し、Ｒ³とＲ⁴は環を形成してもよく、Ｒ⁵は第三級アルキル基を表し、Ｒ^5'は第三級アルキル基又はｔｅｒｔ−ブトキシカルボニル基を表し、Ａｒ²及びＡｒ³はそれぞれ独立に、二価の芳香族基を表し、波線部分は他の構造との結合箇所を表す。）

(Wherein R ³ represents an alkyl group or a cycloalkyl group, R ⁴ represents an alkyl group, R ³ and R ⁴ may form a ring, R ⁵ represents a tertiary alkyl group, R ^{5 ′} represents a tertiary alkyl group or a tert-butoxycarbonyl group, Ar ² and Ar ³ each independently represent a divalent aromatic group, and a wavy line represents a bonding site with another structure.)

Among these, the structural unit having the acid-decomposable group preferably has a structure represented by the formula (Ia) and / or the formula (Ib), and has a structure represented by the formula (Ia). Is more preferable, and it is particularly preferable that R ³ and R ⁴ form a ring, which is represented by the formula (Ia).

<When R ³ and R ⁴ do not form a ring>
The alkyl group for R ³ may be linear or branched. As carbon number of the alkyl group in R < ³ >, it is preferable that it is 1-20, it is more preferable that it is 1-10, and it is still more preferable that it is 1-7.
The number of carbon atoms of the cycloalkyl group in R ^3, preferably from 3 to 20, more preferably from 3 to 10, more preferably 5-7.
In addition, when these carbon numbers have a substituent, the carbon number of a substituent is also included.

The alkyl group in R ³ is, for example, methyl group, ethyl group, n-propyl group, i-propyl group, n-butyl group, i-butyl group, sec-butyl group, n-pentyl group, neopentyl group, n- A hexyl group, n-heptyl group, n-octyl group, 2-ethylhexyl group, n-nonyl group, n-decyl group, etc. can be mentioned.
Examples of the cycloalkyl group in R ³ include a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, a cyclohexyl group, a cycloheptyl group, a cyclooctyl group, a norbornyl group, and an isobornyl group.

The alkyl group and cycloalkyl group in R ³ may have a substituent.
Examples of the substituent in the alkyl group and the cycloalkyl group include alkyl groups having 1 to 10 carbon atoms (methyl group, ethyl group, propyl group, butyl group, etc.), cycloalkyl groups having 3 to 10 carbon atoms, and 6 to 6 carbon atoms. 10 aryl groups, halogen atoms (fluorine atom, chlorine atom, bromine atom, iodine atom), cyano group, nitro group, hydroxy group, alkoxy group having 1 to 10 carbon atoms, and the like. It may be further substituted with a substituent.
In addition, the alkyl group or cycloalkyl group in R ³ is preferably an alkyl group having 1 to 10 carbon atoms, a cycloalkyl group having 3 to 10 carbon atoms, or an aralkyl group having 7 to 11 carbon atoms, Is more preferably an alkyl group having 1 to 6, a cycloalkyl group having 3 to 6 carbon atoms, or a benzyl group, more preferably an ethyl group or a cyclohexyl group, and particularly preferably an ethyl group.

The alkyl group in R ⁴ may be linear or branched.
The number of carbon atoms of the alkyl group in R ⁴ is preferably 1-20, more preferably 1-10, and even more preferably 1-7.
In addition, when these carbon numbers have a substituent, the carbon number of a substituent is also included.
Moreover, as an alkyl group in R < ⁴ >, a C1-C6 alkyl group is preferable and a methyl group is especially preferable.

In formula (Ib), Ar ² represents a divalent aromatic group and has OCH (OR ³ ) (R ⁴ ) on the aromatic ring.
The divalent aromatic group in Ar ² is not particularly limited, and examples thereof include a phenylene group, a substituted phenylene group, a naphthylene group, and a substituted naphthylene group, and a phenylene group or a substituted phenylene group is preferable. A phenylene group is more preferable, and a 1,4-phenylene group is still more preferable.
In addition, the divalent aromatic group in Ar ² may have a substituent on the aromatic ring, and examples of the substituent include an alkyl group having 1 to 10 carbon atoms (methyl group, ethyl group, propyl group, Butyl group, etc.), cycloalkyl group having 3 to 10 carbon atoms, aryl group having 6 to 10 carbon atoms, halogen atom (fluorine atom, chlorine atom, bromine atom, iodine atom), cyano group, nitro group, hydroxy group, carbon Examples thereof include an alkoxy group of 1 to 10, and these substituents may be further substituted with the above substituents.

  As the carboxylic acid monomer capable of forming the structural unit having the structure represented by the formula (Ia) by protecting the carboxyl group, the structural unit having an acid-decomposable group by protecting the carboxyl group Can be used, for example, monocarboxylic acids such as acrylic acid, methacrylic acid, crotonic acid, α-methyl-p-carboxystyrene; maleic acid, fumaric acid, citraconic acid, mesaconic acid, itaconic acid And the like. Moreover, as a structural unit which has an acid-decomposable group, the monomer unit derived from the carboxylic acid by which these carboxyl groups were protected can be mentioned as a preferable thing.

As a monomer having a phenolic hydroxyl group capable of forming a structural unit having the structure represented by the formula (Ib) by protecting the phenolic hydroxyl group, acid-decomposable by protecting the phenolic hydroxyl group Any structural unit having a group can be used. Examples thereof include hydroxystyrenes such as p-hydroxystyrene and α-methyl-p-hydroxystyrene, and paragraphs 0011 to 0016 of JP-A-2008-40183. Described compounds, 4-hydroxybenzoic acid derivatives described in paragraphs 0007 to 0010 of Japanese Patent No. 2888454, addition reaction product of 4-hydroxybenzoic acid and glycidyl methacrylate, 4-hydroxybenzoic acid and glycidyl acrylate The addition reaction product of can be mentioned as a preferable one.
Among these, α-methyl-p-hydroxystyrene, compounds described in paragraphs 0011 to 0016 of JP-A-2008-40183, and 4-hydroxybenzoic acid derivatives described in paragraphs 0007 to 0010 of Japanese Patent No. 2888454 An addition reaction product of 4-hydroxybenzoic acid and glycidyl methacrylate and an addition reaction product of 4-hydroxybenzoic acid and glycidyl acrylate are more preferable.
Among these structures, those particularly preferred as the structural unit having an acid-decomposable group are structural units represented by the formula (III).

In formula (III), R ¹⁰ represents an alkyl group or a cycloalkyl group, and preferred embodiments of R ¹⁰ are the same as the preferred embodiments of R ³ in formula (Ia) and formula (Ib).
In formula (III), R ¹¹ represents a hydrogen atom or a methyl group.
Preferable specific examples of the radical polymerizable monomer used for forming the structural unit represented by the formula (III) include, for example, 1-ethoxyethyl methacrylate, 1-ethoxyethyl acrylate, 1-methoxyethyl methacrylate, 1-methoxyethyl acrylate, 1-n-butoxyethyl methacrylate, 1-n-butoxyethyl acrylate, 1-isobutoxyethyl methacrylate, 1-isobutoxyethyl acrylate, 1- (2-ethylhexyloxy) ethyl methacrylate, 1- ( 2-ethylhexyloxy) ethyl acrylate, 1-n-propoxyethyl methacrylate, 1-n-propoxyethyl acrylate, 1-cyclohexyloxyethyl methacrylate, 1-cyclohexyloxyethyl acrylate, 1- ( -Cyclohexylethoxy) ethyl methacrylate, 1- (2-cyclohexylethoxy) ethyl acrylate, 1-benzyloxyethyl methacrylate, 1-benzyloxyethyl acrylate and the like can be mentioned, and particularly preferable ones include 1-ethoxyethyl methacrylate and 1-ethoxyethyl acrylate. These structural units can be used singly or in combination of two or more.

<When R ³ and R ⁴ form a ring>
R ³ and R ⁴ may form a ring. As such an example, 2-tetrahydropyranyl group and 2-tetrahydrofuranyl group are preferable, and 2-tetrahydrofuranyl group is particularly preferable.
Preferable specific examples of the radical polymerizable monomer used to form these structural units include, for example, tetrahydro-2H-pyran-2-yl methacrylate, tetrahydro-2H-pyran-2-yl acrylate, Examples include tetrahydrofuran-2-yl methacrylate and tetrahydrofuran-2-yl acrylate. Particularly preferred are tetrahydrofuran-2-yl methacrylate and tetrahydrofuran-2-yl acrylate.

  As the radical polymerizable monomer used for forming the structural unit having an acid-decomposable group, a commercially available one may be used, or one synthesized by a known method may be used. For example, as shown below, it can be synthesized by reacting (meth) acrylic acid with a vinyl ether compound in the presence of an acid catalyst.

Here, R ¹⁰ and R ¹¹ respectively correspond to R ¹⁰ and R ¹¹ in formula (III).

  The structural unit having an acid-decomposable group is obtained by reacting a carboxyl group or a phenolic hydroxyl group with a vinyl ether compound after polymerizing a protected carboxyl group or a phenolic hydroxyl group-containing monomer with a monomer or a precursor thereof described later. Can also be formed. In addition, the specific example of the preferable monomer unit formed in this way is the same as the monomer unit derived from the preferable specific example of the said radical polymerizable monomer.

In the formulas (IIa) and (IIb), R ⁵ represents a tertiary alkyl group, R ^{5 ′} represents a tertiary alkyl group or a tert-butoxycarbonyl group, and Ar ² represents a divalent aromatic group. Where the wavy line represents the point of connection with another structure.
The tertiary alkyl group for R ⁵ and R ^{5 ′} is preferably one having 4 to 20 carbon atoms, more preferably one having 4 to 14 carbon atoms, and still more preferably one having 4 to 8 carbon atoms.
Tertiary alkyl group for R ^5, a tertiary alkyl group for R 5 ^', tert-butoxycarbonyl group, and the divalent aromatic group in Ar ² may have a substituent, As an alkyl group having 1 to 10 carbon atoms (methyl group, ethyl group, propyl group, butyl group, etc.), a cycloalkyl group having 3 to 10 carbon atoms, an aryl group having 6 to 10 carbon atoms, a halogen atom (fluorine atom) , A chlorine atom, a bromine atom, an iodine atom), a cyano group, a nitro group, a hydroxy group, an alkoxy group having 1 to 10 carbon atoms, and the like. These substituents may be further substituted with the above substituents.

The tertiary alkyl group in R ⁵ and R ^{5 ′} is more preferably at least one selected from the group consisting of groups represented by the following formula (IV).
^{-C (R 12 R 13 R 14} ) (IV)
In the formula, R ¹² , R ^13, and R ¹⁴ are each independently an alkyl group having 1 to 12 carbon atoms, a cycloalkyl group having 3 to 12 carbon atoms, an aryl group having 6 to 12 carbon atoms, or 7 to 12 carbon atoms. It represents an aralkyl group, and any two of R ¹² , R ¹³ and R ¹⁴ may be bonded to each other to form a ring together with the carbon atom to which they are bonded.

The alkyl group having 1 to 12 carbon atoms of R ¹² , R ¹³ and R ¹⁴ in formula (IV) may be linear or branched, and examples thereof include a methyl group, an ethyl group, and n- Propyl group, i-propyl group, n-butyl group, i-butyl group, sec-butyl group, t-butyl group, n-pentyl group, neopentyl group, n-hexyl group, texyl group (2,3-dimethyl- 2-butyl group), n-heptyl group, n-octyl group, 2-ethylhexyl group, n-nonyl group, n-decyl group and the like.
Examples of the cycloalkyl group having 3 to 12 carbon atoms include a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, a cyclohexyl group, a cycloheptyl group, a cyclooctyl group, a norbornyl group, and an isobornyl group.
Examples of the aryl group having 6 to 12 carbon atoms include a phenyl group, a tolyl group, a xylyl group, a cumenyl group, and a 1-naphthyl group.
Examples of the aralkyl group having 7 to 12 carbon atoms include a benzyl group, an α-methylbenzyl group, a phenethyl group, and a naphthylmethyl group.
R ¹² , R ¹³ and R ¹⁴ can be bonded to each other to form a ring together with the carbon atom to which they are bonded. Examples of the ring structure when R ¹² and R ¹³ , R ¹² and R ¹⁴ , or R ¹³ and R ¹⁴ are bonded include a cyclobutyl group, a cyclopentyl group, a cyclohexyl group, a cycloheptyl group, a tetrahydrofuranyl group, and an adamantyl group. And a tetrahydropyranyl group.

R ⁵ in formula (IIa) is preferably a tertiary alkyl group having 4 to 12 carbon atoms, more preferably a tertiary alkyl group having 4 to 8 carbon atoms, and a t-butyl group. More preferably.
R ^{5 ′} in formula (IIb) is preferably a tertiary alkyl group having 4 to 12 carbon atoms or a tert-butoxycarbonyl group, and is preferably a tertiary alkyl group having 4 to 12 carbon atoms. More preferred is a t-butyl group.
In formula (IIb), Ar ³ represents a divalent aromatic group and has OCH (OR ³ ) (R ⁴ ) on the aromatic ring.
The preferred embodiment of Ar ³ in formula (IIb) is the same as the preferred embodiment of Ar ² in formula (Ib).

The structural unit having an acid-decomposable group preferably contains a protected carboxyl group represented by the formula (IIa) and / or a protected phenolic hydroxyl group represented by the formula (IIb). .
As the carboxylic acid monomer capable of forming a monomer unit having a structure represented by the formula (IIa) by protecting the carboxyl group, a structural unit having an acid-decomposable group by protecting the carboxyl group Any carboxylic acid monomer described above in the description of the formula (Ia) can be preferably used.
As a monomer having a phenolic hydroxyl group capable of forming a monomer unit having a structure represented by the formula (IIb) by protecting the phenolic hydroxyl group, acid decomposability is achieved by protecting the phenolic hydroxyl group. Any monomer can be used as long as it can be a structural unit having a group. For example, a monomer having a phenolic hydroxyl group described above in the description of formula (Ib) is preferable.

  Among these structures, a particularly preferable structural unit having an acid-decomposable group is a structural unit represented by the following formula (V).

In the formula (V), R ¹⁵ represents a tertiary alkyl group, and R ¹⁶ represents a hydrogen atom or a methyl group.
In the formula (V), a preferred embodiment of R ^{15 is the same as} the preferred embodiment of R ⁵ in the formula (IIa).
Preferable specific examples of the radical polymerizable monomer used for forming the structural unit represented by the formula (V) include, for example, tert-butyl methacrylate, tert-butyl acrylate, 2-methyl methacrylate Examples thereof include 2-adamantyl, 2-methyl-2-adamantyl acrylate, 1-methylcyclohexyl methacrylate, 1-methylcyclohexyl acrylate, and tert-butyl methacrylate and tert-butyl acrylate are particularly preferable. These radically polymerizable monomers can be used singly or in combination of two or more.

  Preferable specific examples of the structural unit having an acid-decomposable group include the following monomer units.

  The content of monomer units forming the structural unit having an acid-decomposable group in all monomer units constituting Component B is preferably 5 to 60 mol%, more preferably 10 to 50 mol%, and more preferably 10 to 40 mol%. Is particularly preferred. By containing in the above ratio, a photosensitive resin composition having high sensitivity and wide exposure latitude can be obtained.

<Structural unit having a functional group capable of reacting with a carboxyl group or a phenolic hydroxyl group to form a covalent bond>
Component B preferably has a structural unit having a functional group capable of reacting with a carboxyl group or a phenolic hydroxyl group to form a covalent bond.
Examples of the functional group that can react with a carboxyl group or a phenolic hydroxyl group to form a supply bond include an epoxy group, an oxetanyl group, an acid anhydride group, an acid halide group, and an isocyanate group, and contains such a functional group. It is preferred to synthesize component B using a radical polymerizable monomer. Among these functional groups, an epoxy group and / or an oxetanyl group are preferable.
The structural unit having an epoxy group and / or oxetanyl group is preferably a structural unit having an alicyclic epoxy group and / or oxetanyl group, and more preferably a structural unit having an oxetanyl group.
The alicyclic epoxy group is a group in which an aliphatic ring and an epoxy ring form a condensed ring. Specifically, for example, 3,4-epoxycyclohexyl group, 2,3-epoxycyclohexyl group, 2,3 -An epoxy cyclopentyl group etc. are mentioned preferably.
The group having an oxetanyl group is not particularly limited as long as it has an oxetane ring, but a (3-ethyloxetane-3-yl) methyl group can be preferably exemplified.
The constitutional unit having an epoxy group and / or oxetanyl group may have at least one epoxy group or oxetanyl group in one constitutional unit, one or more epoxy groups and one or more oxetanyl groups, two Although it may have the above epoxy groups or two or more oxetanyl groups and is not particularly limited, it preferably has a total of 1 to 3 epoxy groups and / or oxetanyl groups, and epoxy groups and / or oxetanyl groups. It is more preferable to have one or two groups in total, and it is even more preferable to have one epoxy group or oxetanyl group.

  Specific examples of the radical polymerizable monomer used to form the structural unit having an epoxy group include, for example, glycidyl acrylate, glycidyl methacrylate, glycidyl α-ethyl acrylate, and glycidyl α-n-propyl acrylate. Glycidyl α-n-butyl acrylate, 3,4-epoxybutyl acrylate, 3,4-epoxybutyl methacrylate, acrylate-6,7-epoxyheptyl, methacrylic acid-6,7-epoxyheptyl, α-ethylacrylic acid-6,7-epoxyheptyl, o-vinylbenzyl glycidyl ether, m-vinylbenzyl glycidyl ether, p-vinylbenzyl glycidyl ether, cycloaliphatic described in paragraphs 0031 to 0035 of Japanese Patent No. 4168443 Examples include compounds containing an epoxy skeleton That.

  Examples of the radical polymerizable monomer used for forming the structural unit having an oxetanyl group include, for example, (meth) acrylic acid having an oxetanyl group described in paragraphs 0011 to 0016 of JP-A No. 2001-330953. Examples include esters.

  Examples of the radical polymerizable monomer used to form a structural unit having an epoxy group and / or an oxetanyl group are a monomer containing a methacrylic ester structure and a monomer containing an acrylic ester structure. preferable.

  Among these monomers, more preferred are compounds containing an alicyclic epoxy skeleton described in paragraphs 0034 to 0035 of Japanese Patent No. 4168443 and paragraphs 0011 to 0016 of JP 2001-330953 A. (Meth) acrylic acid esters having an oxetanyl group, particularly preferred are (meth) acrylic acid esters having an oxetanyl group described in paragraphs 0011 to 0016 of JP-A No. 2001-330953. Among these, 3,4-epoxycyclohexylmethyl acrylate, 3,4-epoxycyclohexylmethyl methacrylate, (3-ethyloxetane-3-yl) methyl acrylate, and (3-ethyloxetane-3-methacrylate) Yl) methyl, with acrylic acid (3-ethyloxetane-3-yl) methyl and methacrylic acid (3-ethyloxetane-3-yl) methyl being most preferred. These monomers can be used singly or in combination of two or more.

  Preferable specific examples of the structural unit having a functional group capable of reacting with a carboxyl group or a phenolic hydroxyl group to form a covalent bond include the following structural units.

The content of monomer units forming a structural unit having a functional group capable of reacting with a carboxyl group or a phenolic hydroxyl group to form a covalent bond in all monomer units constituting Component B is preferably 10 to 80 mol%, 15-70 mol% is still more preferable, and 20-65 mol% is especially preferable. By containing in the above ratio, the physical properties of the cured film are improved.
Among these structural units, a structural unit having an oxetanyl group is particularly preferable in that the storage stability of the photosensitive composition is excellent.

<Other structural units>
Component B may have other structural units other than the structural unit as long as the effects of the present invention are not hindered.
Examples of the radical polymerizable monomer that forms other structural units include compounds described in paragraphs 0021 to 0024 of JP-A No. 2004-264623.
Among these, (meth) acrylic acid esters having an alicyclic structure such as dicyclopentanyl (meth) acrylate, cyclohexyl (meth) acrylate, and cyclohexyl acrylate are preferable from the viewpoint of improving electric characteristics.
Component B preferably has, as another constituent unit, a constituent unit derived from at least one compound selected from the group consisting of a maleimide derivative, (meth) acrylic acid, and a hydroxyl group-containing (meth) acrylate compound.
As the maleimide derivative, N-butylmaleimide and N-cyclohexylmaleimide are preferable.
As the hydroxyl group-containing (meth) acrylate compound, hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, 3-hydroxypropyl (meth) acrylate, and 4-hydroxybutyl (meth) acrylate are preferable.
Moreover, as a monomer which forms another structural unit, styrene is also preferable.

0-50 mol% is preferable, as for the content rate of the monomer unit which forms another structural unit in all the monomer units which comprise the component B, 0-45 mol% is more preferable, and 5-40 mol% is especially preferable. By containing in the above ratio, the physical properties of the cured film are improved.
The weight average molecular weight of Component B is preferably 1,000 to 100,000, and more preferably 2,000 to 50,000. In addition, it is preferable that the weight average molecular weight in this invention is a polystyrene conversion weight average molecular weight by gel permeation chromatography (GPC).

Hereinafter, although preferable things are illustrated as a component B, this invention is not limited to this.
In addition, it is preferable that the weight average molecular weights of the component B illustrated below are 2,000-50,000.
1-ethoxyethyl methacrylate / tert-butyl methacrylate / glycidyl methacrylate copolymer 1-ethoxyethyl methacrylate / tert-butyl methacrylate / glycidyl methacrylate / methacrylic acid copolymer 1-ethoxyethyl methacrylate / methacrylic acid Tetrahydro-2H-pyran-2-yl / glycidyl methacrylate / methacrylic acid copolymer 1-ethoxyethyl methacrylate / tert-butyl methacrylate / 3,4-epoxycyclohexylmethyl methacrylate copolymer 1-ethoxyethyl methacrylate / Tert-butyl methacrylate / 3,4-epoxycyclohexylmethyl methacrylate / methacrylic acid copolymer 1-ethoxyethyl methacrylate / tert-butyl methacrylate / 3,4-epoxy methacrylate Rohexylmethyl / 4-hydroxybenzoic acid (3-methacryloyloxy-2-hydroxypropyl) ester copolymer 1-ethoxyethyl methacrylate / tert-butyl methacrylate / 3,4-epoxycyclohexylmethyl methacrylate-4-hydroxy Benzoic acid (3-methacryloyloxypropyl) ester copolymer 1-ethoxyethyl methacrylate / tert-butyl methacrylate / 3,4-epoxycyclohexylmethyl methacrylate / 4-hydroxybenzoic acid (3-methacryloyloxypropyl) ester / 2-hydroxyethyl methacrylate copolymer 1-ethoxyethyl methacrylate / tert-butyl methacrylate / 3,4-epoxycyclohexylmethyl methacrylate / 4-hydroxybenzoic acid (3-methacrylo (Luoxypropyl) ester / methyl methacrylate copolymer 1-ethoxyethyl methacrylate / tetrahydro-2H-pyran-2-yl methacrylate / 3,4-epoxycyclohexylmethyl methacrylate / 4-hydroxybenzoic acid (3-methacryloyl) Oxypropyl) ester copolymer 1-ethoxyethyl methacrylate / tetrahydro-2H-pyran-2-yl methacrylate / 3,4-epoxycyclohexylmethyl methacrylate / 4-hydroxybenzoic acid (3-methacryloyloxypropyl) ester / 2-hydroxyethyl methacrylate copolymer

1-ethoxyethyl methacrylate / tert-butyl methacrylate / 3,4-epoxycyclohexylmethyl acrylate / 4-hydroxybenzoic acid (3-methacryloyloxypropyl) ester copolymer 1-ethoxyethyl methacrylate / tert-methacrylic acid Butyl / acrylic acid 3,4-epoxycyclohexylmethyl / 4-hydroxybenzoic acid (3-methacryloyloxypropyl) ester / methacrylic acid 2-hydroxyethyl copolymer 1-ethoxyethyl methacrylate / tert-butyl methacrylate / methacrylic acid (3-Ethyloxetane-3-yl) methyl copolymer 1-ethoxyethyl methacrylate / tert-butyl methacrylate / methacrylic acid (3-ethyloxetane-3-yl) methyl / methacrylic acid copolymer 1-ethoxyethyl acrylate / tert-butyl methacrylate / methacrylic acid (3-ethyloxetane-3-yl) methyl / 4-hydroxybenzoic acid (3-methacryloyloxy-2-hydroxypropyl) ester copolymer methacrylic acid 1 -Ethoxyethyl / tert-butyl methacrylate / methacrylic acid (3-ethyloxetane-3-yl) methyl / 4-hydroxybenzoic acid (3-methacryloyloxypropyl) ester copolymer 1-ethoxyethyl methacrylate / methacrylic acid 2 -Methyl-2-adamantyl / methacrylic acid (3-ethyloxetane-3-yl) methyl / 4-hydroxybenzoic acid (3-methacryloyloxypropyl) ester copolymer 1-ethoxyethyl methacrylate / 1-methyl methacrylate- 1-cyclohexyl Methacrylic acid (3-ethyloxetane-3-yl) methyl / 4-hydroxybenzoic acid (3-methacryloyloxypropyl) ester copolymer 1-ethoxyethyl methacrylate / tert-butyl methacrylate / methacrylic acid (3-ethyloxetane -3-yl) methyl / 4-hydroxybenzoic acid (2-methacryloyloxyethyl) ester copolymer 1-ethoxyethyl methacrylate / tert-butyl methacrylate / methacrylic acid (3-ethyloxetane-3-yl) methyl / 4-Hydroxybenzoic acid (6-methacryloyloxyhexyl) ester copolymer 1-ethoxyethyl methacrylate / tert-butyl methacrylate / methacrylic acid (3-ethyloxetane-3-yl) methyl / 4-hydroxybenzoic acid (3 -Methacryloyleo Xylpropyl) ester / methacrylic acid 2-hydroxyethyl copolymer

1-ethoxyethyl methacrylate / tert-butyl methacrylate / methacrylic acid (3-ethyloxetane-3-yl) methyl / 4-hydroxybenzoic acid (3-methacryloyloxypropyl) ester / methyl methacrylate copolymer methacrylic acid 1 -Ethoxyethyl / tetrahydro-2H-pyran-2-yl methacrylate / methacrylic acid (3-ethyloxetane-3-yl) methyl / 4-hydroxybenzoic acid (3-methacryloyloxypropyl) ester copolymer Ethoxyethyl / tetrahydro-2H-pyran-2-yl methacrylate / methacrylic acid (3-ethyloxetane-3-yl) methyl / 4-hydroxybenzoic acid (3-methacryloyloxypropyl) ester / 2-hydroxyethyl methacrylate Polymer 1-ethoxyethyl crylate / tert-butyl methacrylate / acrylic acid (3-ethyloxetane-3-yl) methyl / 4-hydroxybenzoic acid (3-methacryloyloxypropyl) ester copolymer 1-ethoxyethyl methacrylate / Tert-butyl methacrylate / acrylic acid (3-ethyloxetane-3-yl) methyl / 4-hydroxybenzoic acid (3-methacryloyloxypropyl) ester / methacrylic acid 2-hydroxyethyl copolymer methacrylate 1- (cyclohexyloxy) ) Ethyl / tert-butyl methacrylate / 3,4-epoxycyclohexylmethyl methacrylate copolymer 1- (cyclohexyloxy) ethyl methacrylate / tert-butyl methacrylate / 3,4-epoxycyclohexylmethacrylate methacrylate / 4-hydroxybenzoic acid (3-methacryloyloxypropyl) ester / methacrylic acid 2-hydroxyethyl copolymer 1- (cyclohexyloxy) ethyl methacrylate / tert-butyl methacrylate / methacrylic acid (3-ethyloxetane-3- Yl) methyl copolymer 1- (cyclohexyloxy) ethyl methacrylate / tert-butyl methacrylate / methacrylic acid (3-ethyloxetan-3-yl) methyl / 4-hydroxybenzoic acid (3-methacryloyloxypropyl) ester / 2-hydroxyethyl methacrylate copolymer

1- (Cyclohexyloxy) ethyl methacrylate / tetrahydro-2H-pyran-2-yl methacrylate / 3,4-epoxycyclohexylmethyl methacrylate / 4-hydroxybenzoic acid (3-methacryloyloxypropyl) ester / methacrylic acid 2- Hydroxyethyl copolymer 1- (cyclohexyloxy) ethyl methacrylate / tetrahydro-2H-pyran-2-yl methacrylate / methacrylic acid (3-ethyloxetan-3-yl) methyl / 4-hydroxybenzoic acid (3-methacryloyl) Oxypropyl) ester / 2-hydroxyethyl methacrylate copolymer 4-hydroxybenzoic acid (3-methacryloyloxypropyl) ester 1-ethoxyethyl ether / tert-butyl methacrylate / methacrylic acid (3-ethyl) Xetane-3-yl) methyl / methacrylic acid copolymer 1-ethoxyethyl ether of 4-hydroxybenzoic acid (3-methacryloyloxypropyl) ester / protected tert-butoxycarbonyl group of α-methyl-parahydroxystyrene / methacrylic acid Protection of tert-butyl group of 1-ethoxyethyl ether / 4-hydroxyphenyl methacrylate of acid (3-ethyloxetane-3-yl) methyl / methacrylic acid copolymer 4-hydroxybenzoic acid (2-methacryloyloxyethyl) ester / Methyl methacrylate (3-ethyloxetane-3-yl) methyl / methacrylic acid copolymer 1-ethoxyethyl methacrylate / styrene / glycidyl methacrylate / methacrylic acid copolymer 1-ethoxyethyl methacrylate / N-cyclohexylmale Mi / Glycidyl methacrylate / methacrylic acid copolymer tetrahydrofuran-2-yl methacrylate / methacrylic acid (tricyclo [5.2.1.0 ^2,6 ] decan-8-yl) / methacrylic acid (3-ethyloxetane- 3-yl) methyl / methacrylic acid copolymer tetrahydrofuran-2-yl methacrylate / methacrylic acid (tricyclo [5.2.1.0 ^2,6 ] decan-8-yl) / glycidyl methacrylate / methacrylic acid copolymer Coalescence

Component B can be used alone or in combination of two or more.
The content of Component B in the photosensitive resin composition of the present invention is preferably 20 to 99% by weight, and preferably 40 to 97% by weight, based on the total solid content of the photosensitive resin composition. More preferably, it is 60 to 95% by weight. When the content is within this range, the pattern formability upon development is good. In addition, the solid content amount of the photosensitive resin composition represents an amount excluding volatile components such as a solvent.
In addition, in the photosensitive resin composition of this invention, you may use together resin (component B ') other than the component B in the range which does not prevent the effect of this invention. However, the content of the resin other than Component B (Component B ′) is preferably smaller than the content of Component B from the viewpoint of developability.

(Component C) Solvent The photosensitive resin composition of the present invention contains (Component C) a solvent.
The photosensitive resin composition of the present invention is prepared as a solution in which component A and component B, which are essential components, and further optional components described below are dissolved in (component C) solvent.
A known solvent can be used as the solvent used in the photosensitive resin composition of the present invention. Specifically, ethylene glycol monoalkyl ethers, ethylene glycol dialkyl ethers, ethylene glycol monoalkyl ether acetates, propylene glycol monoalkyl ethers, propylene glycol dialkyl ethers, propylene glycol monoalkyl ether acetates, diethylene glycol dialkyl ether And diethylene glycol monoalkyl ether acetates, dipropylene glycol monoalkyl ethers, dipropylene glycol dialkyl ethers, dipropylene glycol monoalkyl ether acetates, esters, ketones, amides, lactones and the like. Examples of the solvent used in the photosensitive resin composition of the present invention include the solvents described in paragraph 0074 of JP-A-2009-258722.
These solvents can be used singly or in combination of two or more, and it is preferable to use one kind alone or two kinds in combination.

  The content of Component C in the photosensitive resin composition of the present invention is preferably 50 to 3,000 parts by weight, more preferably 100 to 2,000 parts by weight, with respect to 100 parts by weight of Component B. More preferably, it is 150 to 1,500 parts by weight.

(Component D) Sensitizer The photosensitive resin composition of the present invention preferably contains (Component D) a sensitizer.
Any sensitizer that can be used in the present invention can be used without particular limitation as long as it absorbs actinic rays and sensitizes component A with an electron transfer mechanism or an energy transfer mechanism.
As the sensitizer, anthracene derivatives, acridone derivatives, thioxanthone derivatives, coumarin derivatives, base styryl derivatives, and distyrylbenzene derivatives are preferable.
Anthracene derivatives include anthracene, 9,10-dibutoxyanthracene, 9,10-dichloroanthracene, 2-ethyl-9,10-dimethoxyanthracene, 9-hydroxymethylanthracene, 9-bromoanthracene, 9-chloroanthracene, 9 , 10-dibromoanthracene, 2-ethylanthracene and 9,10-dimethoxyanthracene are preferred.
As an acridone derivative, acridone, N-butyl-2-chloroacridone, N-methylacridone, 2-methoxyacridone and N-ethyl-2-methoxyacridone are preferable.
As the thioxanthone derivative, thioxanthone, diethylthioxanthone, 1-chloro-4-propoxythioxanthone, 2-chlorothioxanthone, 2-isopropylthioxanthone, and 4-isopropylthioxanthone are preferable.
As the coumarin derivative, coumarin-1, coumarin-6H, coumarin-110 and coumarin-102 are preferable.
Examples of the base styryl derivative include 2- (4-dimethylaminostyryl) benzoxazole, 2- (4-dimethylaminostyryl) benzothiazole, and 2- (4-dimethylaminostyryl) naphthothiazole.
Examples of the distyrylbenzene derivative include distyrylbenzene, di (4-methoxystyryl) benzene, and di (3,4,5-trimethoxystyryl) benzene.

  Specific examples of the sensitizer include the following. In the following, Me represents a methyl group, Et represents an ethyl group, and Bu represents a butyl group.

A commercially available sensitizer may be used, or it may be synthesized by a known synthesis method.
Moreover, a sensitizer can be used individually by 1 type or in combination of 2 or more types.
The sensitizer is preferably 20 to 300 parts by weight, particularly preferably 30 to 200 parts by weight, based on 100 parts by weight of Component A, from the viewpoint of both sensitivity and transparency.

<Other ingredients>
In the photosensitive resin composition of the present invention, as necessary, the following components (component E) adhesion improver, (component F) surfactant, (component G) cross-linking agent, (component H) are optionally included. Antioxidants, (Component I) basic compounds, (Component J) plasticizers, and (Component K) thermal radical generators, thermal acid generators, ultraviolet absorbers, thickeners, and organic or inorganic Known additives such as suspending agents can be added.

(Component E) Adhesion Improving Agent The photosensitive resin composition of the present invention may contain (Component E) an adhesion improving agent.
The adhesion improver that can be used in the photosensitive resin composition of the present invention is an inorganic material serving as a substrate, for example, a silicon compound such as silicon, silicon oxide, or silicon nitride, a metal such as gold, copper, or aluminum, and an insulating film. It is a compound that improves the adhesion. Specific examples include silane coupling agents and thiol compounds. The silane coupling agent as an adhesion improving agent used in the present invention is for the purpose of modifying the interface, and any known silane coupling agent can be used without any particular limitation.

Preferred silane coupling agents include, for example, γ-aminopropyltrimethoxysilane, γ-aminopropyltriethoxysilane, γ-glycidoxypropyltriacoxysilane, γ-glycidoxypropylalkyldialkoxysilane, γ- Methacryloxypropyltrialkoxysilane, γ-methacryloxypropylalkyldialkoxysilane, γ-chloropropyltrialkoxysilane, γ-mercaptopropyltrialkoxysilane, β- (3,4-epoxycyclohexyl) ethyltrialkoxysilane, vinyltri An alkoxysilane is mentioned.
Of these, γ-glycidoxypropyltrialkoxysilane and γ-methacryloxypropyltrialkoxysilane are more preferable, and γ-glycidoxypropyltrialkoxysilane is more preferable.

These can be used alone or in combination of two or more. These are effective in improving the adhesion to the substrate and are also effective in adjusting the taper angle with the substrate.
0.1-20 weight part is preferable with respect to 100 weight part of component B, and, as for content of the component E in the photosensitive resin composition of this invention, 0.5-10 weight part is more preferable.

(Component F) Surfactant The photosensitive resin composition of the present invention may contain (Component F) a surfactant.
As the surfactant, any of anionic, cationic, nonionic, or amphoteric surfactants can be used, but a preferred surfactant is a nonionic surfactant.
Examples of nonionic surfactants include polyoxyethylene higher alkyl ethers, polyoxyethylene higher alkyl phenyl ethers, higher fatty acid diesters of polyoxyethylene glycol, silicone-based and fluorine-based surfactants. . In addition, the following trade names are KP (manufactured by Shin-Etsu Chemical Co., Ltd.), Polyflow (manufactured by Kyoeisha Chemical Co., Ltd.), F-Top (manufactured by JEMCO), MegaFac (manufactured by DIC Corporation), Florard (Sumitomo 3M) (Manufactured by Co., Ltd.), Asahi Guard, Surflon (manufactured by Asahi Glass Co., Ltd.), PolyFox (manufactured by OMNOVA), and the like.
In addition, as a surfactant, it contains a structural unit A and a structural unit B represented by the following formula (W), and is a weight average in terms of polystyrene measured by gel permeation chromatography using tetrahydrofuran (THF) as a solvent. A preferable example is a copolymer having a molecular weight (Mw) of 1,000 or more and 10,000 or less.

（式（Ｗ）中、Ｒ¹及びＲ³はそれぞれ独立に、水素原子又はメチル基を表し、Ｒ²は炭素数１以上４以下の直鎖アルキレン基を表し、Ｒ⁴は水素原子又は炭素数１以上４以下のアルキル基を表し、Ｌは炭素数３以上６以下のアルキレン基を表し、ｐ及びｑは重合比を表す重量百分率であり、ｐは１０重量％以上８０重量％以下の数値を表し、ｑは２０重量％以上９０重量％以下の数値を表し、ｒは１以上１８以下の整数を表し、ｎは１以上１０以下の整数を表す。）

(In the formula (W), R ¹ and R ³ each independently represent a hydrogen atom or a methyl group, R ² represents a linear alkylene group having 1 to 4 carbon atoms, and R ⁴ represents a hydrogen atom or carbon number. 1 represents an alkyl group having 1 to 4 carbon atoms, L represents an alkylene group having 3 to 6 carbon atoms, p and q are weight percentages representing a polymerization ratio, and p is a numerical value of 10% to 80% by weight. Q represents a numerical value of 20 wt% or more and 90 wt% or less, r represents an integer of 1 or more and 18 or less, and n represents an integer of 1 or more and 10 or less.

The L is preferably a branched alkylene group represented by the following formula (L ′). R ⁵ in the formula (L ′) represents an alkyl group having 1 to 4 carbon atoms, and is preferably an alkyl group having 1 to 3 carbon atoms in terms of compatibility and wettability to the coated surface. Or the alkyl group of 3 is more preferable. The sum (p + q) of p and q is preferably p + q = 100, that is, 100% by weight.

The weight average molecular weight (Mw) of the copolymer is more preferably from 1,500 to 5,000.
These surfactants can be used individually by 1 type or in mixture of 2 or more types.
The amount of component F added in the photosensitive resin composition of the present invention is preferably 10 parts by weight or less, more preferably 0.01 to 10 parts by weight, based on 100 parts by weight of component B. More preferably, the content is 01 to 1 part by weight.

(Component G) Crosslinking agent The photosensitive resin composition of the present invention preferably contains (Component G) a crosslinking agent.
As a crosslinking agent, for example, a compound having two or more epoxy groups or oxetanyl groups in the molecule described below, an alkoxymethyl group-containing crosslinking agent, and a compound having at least one ethylenically unsaturated double bond are added. be able to. By adding a crosslinking agent, the cured film can be made stronger.

<Compound having two or more epoxy groups or oxetanyl groups in the molecule>
Specific examples of compounds having two or more epoxy groups in the molecule include bisphenol A type epoxy resins, bisphenol F type epoxy resins, phenol novolac type epoxy resins, cresol novolac type epoxy resins, aliphatic epoxy resins, and the like. Can do.

  These are available as commercial products. For example, as bisphenol A type epoxy resin, JER827, JER828, JER834, JER1001, JER1002, JER1003, JER1055, JER1007, JER1009, JER1010 (above, manufactured by Japan Epoxy Resin Co., Ltd.), EPICLON860, EPICLON1050, EPICLON1051, EPICLON1051, EPICLON1051 DIC Co., Ltd.), etc., as bisphenol F type epoxy resin, JER806, JER807, JER4004, JER4005, JER4007, JER4010 (above, Japan Epoxy Resin Co., Ltd.), EPICLON830, EPICLON835 (above, DIC Corporation) )), LCE-21, RE-602S (above, Nippon Kayaku Co., Ltd.), etc. As the enol novolac type epoxy resin, JER152, JER154, JER157S70 (above, manufactured by Japan Epoxy Resin Co., Ltd.), EPICLON N-740, EPICLON N-740, EPICLON N-770, EPICLON N-775 (above, DIC Corporation) ) Manufactured by EPICLON N-660, EPICLON N-665, EPICLON N-670, EPICLON N-673, EPICLON N-680, EPICLON N-690, EPICLON N-695 (or more) , DIC Corporation), EOCN-1020 (Nippon Kayaku Co., Ltd.), etc., as aliphatic epoxy resins, ADEKA RESIN EP-4080S, EP-4085S, EP-4088S (above, manufactured by ADEKA Corporation), Celoxide 2021P, Celoxide 2081, Celoxide 2083, Celoxide 2085, EHPE3150, EPOLEAD PB 3600, PB 4700 (above, manufactured by Daicel Chemical Industries, Ltd.) and the like. . In addition, ADEKA RESIN EP-4000S, EP-4003S, EP-4010S, EP-4010S, EP-4011S (above, manufactured by ADEKA Corporation), NC-2000, NC-3000, NC-7300, XD-1000, EPPN-501, EPPN-502 (above, manufactured by ADEKA Corporation) and the like can be mentioned. These can be used alone or in combination of two or more.

  Among these, preferred are bisphenol A type epoxy resin, bisphenol F type epoxy resin, and phenol novolac type epoxy resin. A bisphenol A type epoxy resin is particularly preferable.

As specific examples of the compound having two or more oxetanyl groups in the molecule, Aron oxetane OXT-121, OXT-221, OX-SQ, and PNOX (manufactured by Toagosei Co., Ltd.) can be used.
Moreover, the compound containing an oxetanyl group can be used individually or in mixture with the compound containing an epoxy group.
The addition amount of the compound having two or more epoxy groups or oxetanyl groups in the molecule to the photosensitive resin composition is preferably 1 to 50 parts by weight when the total amount of component B is 100 parts by weight, and 3 to 30 Part by weight is more preferred.

<Alkoxymethyl group-containing crosslinking agent>
As the alkoxymethyl group-containing crosslinking agent, alkoxymethylated melamine, alkoxymethylated benzoguanamine, alkoxymethylated glycoluril, alkoxymethylated urea and the like are preferable. These can be obtained by converting the methylol group of methylolated melamine, methylolated benzoguanamine, methylolated glycoluril, or methylolated urea to an alkoxymethyl group, respectively. The type of the alkoxymethyl group is not particularly limited, and examples thereof include a methoxymethyl group, an ethoxymethyl group, a propoxymethyl group, and a butoxymethyl group. From the viewpoint of the amount of outgas generated, A methoxymethyl group is preferred.
Among these alkoxymethyl group-containing crosslinking agents, alkoxymethylated melamine, alkoxymethylated benzoguanamine, and alkoxymethylated glycoluril are mentioned as preferred crosslinking agents, and alkoxymethylated glycoluril is particularly preferable from the viewpoint of transparency.

  These alkoxymethyl group-containing crosslinking agents are available as commercial products. For example, Cymel 300, 301, 303, 370, 325, 327, 701, 266, 267, 238, 1141, 272, 202, 1156, 1158, 1123, 1170, 1174, UFR65, 300 (above, manufactured by Mitsui Cyanamid Co., Ltd.), Nicarax MX-750, -032, -706, -708, -40, -31, -270, -280, -290, Nicarac MS-11, Nicarak MW-30HM, -100LM, -390, (manufactured by Sanwa Chemical Co., Ltd.) and the like can be preferably used.

  When the alkoxymethyl group-containing crosslinking agent is used in the photosensitive resin composition of the present invention, the addition amount of the alkoxymethyl group-containing crosslinking agent is preferably 0.05 to 50 parts by weight with respect to 100 parts by weight of Component B. 0.5 to 10 parts by weight is more preferable. By adding within this range, preferable alkali solubility during development and excellent solvent resistance of the cured film can be obtained.

<Compound having at least one ethylenically unsaturated double bond>
As the compound having at least one ethylenically unsaturated double bond, a (meth) acrylate compound such as a monofunctional (meth) acrylate, a bifunctional (meth) acrylate, or a trifunctional or higher (meth) acrylate is preferably used. be able to.

  Examples of the monofunctional (meth) acrylate include 2-hydroxyethyl (meth) acrylate, carbitol (meth) acrylate, isobornyl (meth) acrylate, 3-methoxybutyl (meth) acrylate, and 2- (meth) acryloyloxyethyl. And 2-hydroxypropyl phthalate.

  Examples of the bifunctional (meth) acrylate include ethylene glycol (meth) acrylate, 1,6-hexanediol di (meth) acrylate, 1,9-nonanediol di (meth) acrylate, polypropylene glycol di (meth) acrylate, Examples include tetraethylene glycol di (meth) acrylate, bisphenoxyethanol full orange acrylate, and bisphenoxyethanol full orange acrylate.

  Examples of the trifunctional or higher functional (meth) acrylate include trimethylolpropane tri (meth) acrylate, pentaerythritol tri (meth) acrylate, tri ((meth) acryloyloxyethyl) phosphate, pentaerythritol tetra (meth) acrylate, Examples include dipentaerythritol penta (meth) acrylate and dipentaerythritol hexa (meth) acrylate.

These compounds having at least one ethylenically unsaturated double bond are used singly or in combination of two or more.
The proportion of the compound having at least one ethylenically unsaturated double bond in the photosensitive resin composition of the present invention is preferably 50 parts by weight or less, and 30 parts by weight or less with respect to 100 parts by weight of Component B. It is more preferable that By including at least one compound having an ethylenically unsaturated double bond in such a ratio, the heat resistance and surface hardness of the insulating film obtained from the photosensitive resin composition of the present invention can be improved. it can. When adding a compound having at least one ethylenically unsaturated double bond, it is preferable to add (Component K) a thermal radical generator.

(Component H) Antioxidant The photosensitive resin composition of the present invention may contain (Component H) an antioxidant.
As component H, a well-known antioxidant can be contained. By adding Component H, there is an advantage that coloring of the cured film can be prevented, or a decrease in the film thickness due to decomposition can be reduced, and heat-resistant transparency is excellent.
Examples of such antioxidants include phosphorus antioxidants, hydrazides, hindered amine antioxidants, sulfur antioxidants, phenolic antioxidants, ascorbic acids, zinc sulfate, sugars, nitrites, sulfites. Examples thereof include salts, thiosulfates, and hydroxylamine derivatives. Among these, a phenolic antioxidant is particularly preferable from the viewpoint of coloring the cured film and reducing the film thickness. These may be used alone or in combination of two or more.
Examples of commercially available phenolic antioxidants include ADK STAB AO-60 (manufactured by ADEKA), ADK STAB AO-80 (manufactured by ADEKA), and Irganox 1098 (manufactured by Ciba Japan Co., Ltd.). It is done.

The content of component H is preferably 0.1 to 6% by weight, more preferably 0.2 to 5% by weight, based on the total solid content of the photosensitive resin composition. Particularly preferred is ˜4% by weight. By setting it within this range, sufficient transparency of the formed film can be obtained, and the sensitivity at the time of pattern formation can be improved.
As additives other than antioxidants, various ultraviolet absorbers described in “New Development of Polymer Additives (Nikkan Kogyo Shimbun Co., Ltd.)”, metal deactivators, and the like are used in the present invention. You may add to a resin composition.

(Component I) Basic Compound The photosensitive resin composition of the present invention may contain (Component I) a basic compound.
The basic compound can be arbitrarily selected from those used in chemically amplified resists. Examples include aliphatic amines, aromatic amines, heterocyclic amines, quaternary ammonium hydroxides, quaternary ammonium salts of carboxylic acids, and the like.
Specific examples of the basic compound include the compounds described in paragraphs 0052 to 0056 of JP2009-98616A.

The basic compounds that can be used in the present invention may be used singly or in combination of two or more. However, it is preferable to use two or more in combination, and it is more preferable to use two in combination. Preferably, two kinds of heterocyclic amines are used in combination.
The content of Component I in the photosensitive resin composition of the present invention is preferably 0.001 to 1 part by weight, and 0.005 to 0.2 part by weight with respect to 100 parts by weight of Component B. More preferred.

(Component J) Plasticizer The photosensitive resin composition of the present invention may contain (Component J) a plasticizer.
Examples of the plasticizer include dibutyl phthalate, dioctyl phthalate, didodecyl phthalate, polyethylene glycol, glycerin, dimethyl glycerin phthalate, dibutyl tartrate, dioctyl adipate, and triacetyl glycerin.
The addition amount of Component J in the photosensitive resin composition of the present invention is preferably 0.1 to 30 parts by weight, and more preferably 1 to 10 parts by weight with respect to 100 parts by weight of Component B.

(Component K) Thermal radical generator The photosensitive resin composition of the present invention may contain (Component K) a thermal radical generator, and is a compound having at least one ethylenically unsaturated double bond as described above. When such an ethylenically unsaturated compound is contained, it is preferable to contain (Component K) a thermal radical generator.
As the thermal radical generator in the present invention, a known thermal radical generator can be used.
The thermal radical generator is a compound that generates radicals by heat energy and initiates or accelerates the polymerization reaction of the polymerizable compound. By adding a thermal radical generator, the obtained cured film becomes tougher and heat resistance and solvent resistance may be improved.
Preferred thermal radical generators include aromatic ketones, onium salt compounds, organic peroxides, thio compounds, hexaarylbiimidazole compounds, ketoxime ester compounds, borate compounds, azinium compounds, metallocene compounds, active ester compounds, carbon Examples thereof include compounds having a halogen bond, azo compounds, and bibenzyl compounds.
A thermal radical generator may be used individually by 1 type, and it is also possible to use 2 or more types together.
The addition amount of component K in the photosensitive resin composition of the present invention is preferably 0.01 to 50 parts by weight, preferably 0.1 to 20 parts by weight, when component B is 100 parts by weight, from the viewpoint of improving film physical properties. Is more preferable, and 0.5 to 10 parts by weight is most preferable.

(Method for forming cured film)
Next, the formation method of the cured film of this invention is demonstrated.
The method for forming a cured film of the present invention includes the following steps (1) to (5).
(1) Application step of applying the photosensitive resin composition of the present invention onto a substrate (2) Solvent removal step of removing the solvent from the applied photosensitive resin composition (3) Applying the applied photosensitive resin composition An exposure step of exposing with an actinic ray (4) A development step of developing the exposed photosensitive resin composition with an aqueous developer (5) A post-baking step of thermosetting the developed photosensitive resin composition These will be described in order.

In the coating step (1), the photosensitive resin composition of the present invention is coated on a substrate to form a wet film containing a solvent.
In the solvent removal step (2), it is preferable to form a dry coating film on the substrate by removing the solvent from the applied film by vacuum (vacuum) and / or heating.
In the exposure step (3), it is preferable to irradiate the coating film obtained through the solvent removal step with actinic rays having a wavelength of 300 nm to 450 nm. In this step, component A decomposes and acid is generated. Due to the catalytic action of the generated acid, the acid-decomposable group contained in Component B is hydrolyzed to produce a carboxyl group or a phenolic hydroxyl group.

In the region where the acid catalyst is generated, post exposure bake (hereinafter also referred to as “PEB”) can be performed as necessary in order to accelerate the hydrolysis reaction. PEB can promote the formation of a carboxyl group or a phenolic hydroxyl group from an acid-decomposable group.
The acid-decomposable group in the component B in the present invention has a low activation energy for decomposition by an acid and is easily decomposed by an acid derived from an acid generator by exposure to produce a carboxyl group or a phenolic hydroxyl group. A positive image can also be formed by development without performing it.
In addition, by performing PEB at a relatively low temperature, hydrolysis of an acid-decomposable group can be promoted without causing a crosslinking reaction. The temperature at which PEB is performed is preferably 30 ° C. or higher and 130 ° C. or lower, more preferably 40 ° C. or higher and 110 ° C. or lower, and particularly preferably 50 ° C. or higher and 80 ° C. or lower.

In the developing step (4), it is preferable to develop a polymer having a liberated carboxyl group or phenolic hydroxyl group using an alkaline developer. A positive image is formed by removing an exposed area containing a resin composition having a carboxyl group that is easily dissolved in an alkaline developer.
In the post-baking step of (5), the obtained positive image is heated to thermally decompose the acid-decomposable group in Component B to generate a carboxyl group or a phenolic hydroxyl group, and an epoxy group and / or an oxetanyl group. A cured film can be formed by crosslinking. This heating is preferably performed at a high temperature of 150 ° C. or more, more preferably 180 to 250 ° C., and particularly preferably 200 to 250 ° C. The heating time can be appropriately set depending on the heating temperature or the like, but is preferably in the range of 10 to 90 minutes.

When a step of irradiating the development pattern with actinic rays, preferably ultraviolet rays, before the post-baking step is added, the crosslinking reaction can be promoted by an acid generated by actinic ray irradiation.
Next, the formation method of the cured film using the photosensitive resin composition of this invention is demonstrated concretely.

<Method for preparing photosensitive resin composition>
The essential components of component A to component C are mixed at a predetermined ratio and in an arbitrary manner, and dissolved by stirring to prepare a photosensitive resin composition. For example, it is possible to prepare a resin composition by preparing a solution in which component A and component B are previously dissolved in a (component C) solvent and then mixing them in a predetermined ratio. The composition solution prepared as described above can be used after being filtered using a filter having a pore size of 0.2 μm or the like.

<Coating process and solvent removal process>
By applying the photosensitive resin composition of the present invention to a predetermined substrate and removing the solvent by reducing pressure and / or heating (pre-baking), a desired dry coating film can be formed. As the substrate, for example, in the production of a liquid crystal display element, a polarizing plate, a glass plate provided with a black matrix layer and a color filter layer as required, and a transparent conductive circuit layer may be exemplified. The coating method to a board | substrate is not specifically limited, For example, methods, such as a slit coat method, a spray method, a roll coat method, a spin coat method, can be used. Among them, the slit coating method is preferable from the viewpoint of being suitable for a large substrate. Here, the large substrate means a substrate having a side of 1 m or more on each side.

  In addition, (2) the heating conditions in the solvent removal step are ranges in which the acid-decomposable group in component B in the unexposed area is decomposed and component B is not soluble in an alkali developer. Although it depends on the ratio, it is preferably about 80 to 130 ° C. for about 30 to 120 seconds.

<Exposure process>
In the exposure step, it is preferable to irradiate the substrate on which the coating film is provided with actinic rays through a mask having a predetermined pattern. Actinic rays having a wavelength of 300 nm to 450 nm can be preferably used. After the exposure step, heat treatment (PEB) is performed as necessary.
For exposure with actinic rays, a low-pressure mercury lamp, a high-pressure mercury lamp, an ultrahigh-pressure mercury lamp, an LED light source, a chemical lamp, a laser generator, or the like can be used.
When a mercury lamp is used, actinic rays having wavelengths such as g-line (436 nm), i-line (365 nm), h-line (405 nm) can be preferably used, g-line and / or h-line can be more preferably used, and g-line And mixed rays of h rays can be used more preferably. Mercury lamps are preferred in that they are suitable for large area exposure compared to lasers.
In the case of using a laser, 343 nm and 355 nm are used for a solid (YAG) laser, 351 nm (XeF) is used for an excimer laser, and 375 nm and 405 nm are used for a semiconductor laser. Among these, 355 nm and 405 nm are more preferable from the viewpoint of stability and cost. The coating can be irradiated with the laser once or a plurality of times.
The energy density per pulse of the laser is preferably 0.1 mJ / cm ² or more and 10,000 mJ / cm ² or less. In order to sufficiently cure the coating film, 0.3 mJ / cm ² or more is more preferable, and 0.5 mJ / cm ² or more is most preferable. cm ² or less is more preferable, and 100 mJ / cm ² or less is most preferable. The pulse width is preferably 0.1 nsec or more and 30,000 nsec or less. In order not to decompose the color coating film due to the ablation phenomenon, 0.5 nsec or more is more preferable, and 1 nsec or more is most preferable, and in order to improve the alignment accuracy at the time of scanning exposure, 1,000 nsec or less is more preferable, Most preferred is 50 nsec or less.

Furthermore, the frequency of the laser is preferably 1 to 50,000 Hz, and more preferably 10 to 1,000 Hz. If the frequency of the laser is less than 1 Hz, the exposure processing time increases. If the laser frequency exceeds 50,000 Hz, the alignment accuracy decreases during the scan exposure.
In order to shorten the exposure processing time, 10 Hz or more is more preferable, and 100 Hz or more is most preferable. In order to improve the alignment accuracy at the time of scanning exposure, 10,000 Hz or less is more preferable, and 1,000 Hz or less is most preferable.

Compared with a mercury lamp, a laser is preferable in that the focus can be easily reduced and a mask for forming a pattern in the exposure process is not necessary and the cost can be reduced.
There are no particular restrictions on the exposure apparatus that can be used in the present invention. Commercially available exposure apparatuses include Callisto (manufactured by Buoy Technology), AEGIS (manufactured by Buoy Technology), and DF2200G (Dainippon). Screen Manufacturing Co., Ltd.) can be used. In addition, devices other than those described above are also preferably used. If necessary, the irradiation light can be adjusted through a spectral filter such as a long wavelength cut filter, a short wavelength cut filter, or a band pass filter.

  In recent years, in flat panel displays such as liquid crystal displays, in the production process of photocured film members, there has been an active movement to consider switching from aligner exposure to stepper exposure, aiming for higher definition. In view of this, the use of relatively inexpensive gh mixed beam steppers, rather than expensive i-line steppers, is increasing. However, compared to i-line, g-line and h-line have a long wavelength and are included in the visible light region. Therefore, in the conventional photosensitive resin composition that absorbs and cures g-line and h-line, the cured film is transparent. There is a problem that the sensitivity is lowered and sufficient sensitivity cannot be obtained. Since the photosensitive resin composition of the present invention has high sensitivity and is excellent in transparency of a cured film, it can be particularly preferably used when g-line or h-line is used for exposure.

<Development process>
In the development step, it is preferable to form an image pattern by removing the exposed area using a basic developer.
Examples of the basic compound include alkali metal hydroxides such as lithium hydroxide, sodium hydroxide and potassium hydroxide; alkali metal carbonates such as sodium carbonate and potassium carbonate; alkalis such as sodium bicarbonate and potassium bicarbonate Metal bicarbonates; ammonium hydroxides such as tetramethylammonium hydroxide, tetraethylammonium hydroxide and choline hydroxide; aqueous solutions such as sodium silicate and sodium metasilicate can be used. An aqueous solution obtained by adding an appropriate amount of a water-soluble organic solvent such as methanol or ethanol or a surfactant to the alkaline aqueous solution can also be used as a developer.

The pH of the developer is preferably 10.0 to 14.0.
The development time is preferably 30 to 180 seconds, and the developing method may be any of a liquid piling method, a dip method, and the like. After the development, washing with running water is performed for 30 to 90 seconds, and a desired pattern can be formed.

<Post-bake process (crosslinking process)>
For a pattern corresponding to an unexposed area obtained by development, using a heating device such as a hot plate or oven, at a predetermined temperature, for example, 180 to 250 ° C., for a predetermined time, for example, 5-60 minutes on the hot plate, In the case of an oven, heat treatment is performed for 30 to 90 minutes to decompose the acid-decomposable group in component B, generate a carboxyl group, react with the functional group in component B, and crosslink. A protective film or an interlayer insulating film having excellent heat resistance, hardness, and the like can be formed. In addition, when heat treatment is performed, the transparency can be improved by performing the heat treatment in a nitrogen atmosphere.
Prior to the heat treatment, the substrate on which the pattern is formed is re-exposed with actinic rays and then post-baked (re-exposure / post-bake) to generate an acid from component B present in the unexposed portion, thereby performing a crosslinking step. It is preferable to function as a promoting catalyst.
That is, the method for forming a cured film of the present invention preferably includes a re-exposure step in which re-exposure is performed with actinic rays between the development step and the post-bake step.
The exposure in the re-exposure step may be performed by the same means as in the exposure step. In the re-exposure step, the entire surface of the substrate on which the film is formed by the photosensitive resin composition of the present invention is exposed. It is preferable. A preferable exposure amount in the re-exposure step is 100 to 1,000 mJ / cm ² .

With the photosensitive resin composition of the present invention, an interlayer insulating film having excellent insulation and high transparency even when baked at high temperatures can be obtained. Since the interlayer insulating film using the photosensitive resin composition of the present invention has high transparency and excellent cured film physical properties, it is useful for applications of organic EL display devices and liquid crystal display devices.
The organic EL display device and the liquid crystal display device of the present invention are not particularly limited except for having a planarizing film, a protective film, and an interlayer insulating film formed using the photosensitive resin composition of the present invention, Examples include various known organic EL display devices and liquid crystal display devices having various structures.
Moreover, the photosensitive resin composition of this invention and the cured film of this invention are not limited to the said use, It can be used for various uses. For example, in addition to the planarizing film, protective film, and interlayer insulating film, it is suitable for a spacer for keeping the thickness of the liquid crystal layer in the liquid crystal display device constant, a microlens provided on the color filter in the solid-state imaging device, or the like. Can be used.

FIG. 1 is a conceptual diagram illustrating an example of an organic EL display device. A schematic cross-sectional view of a substrate in a bottom emission type organic EL display device is shown, and a planarizing film 4 is provided.
A bottom gate type TFT 1 is formed on a glass substrate 6, and an insulating film 3 made of Si ₃ N ₄ is formed so as to cover the TFT 1. A contact hole (not shown) is formed in the insulating film 3, and then a wiring 2 (height: 1.0 μm) connected to the TFT 1 through the contact hole is formed on the insulating film 3. The wiring 2 is used to connect the TFT 1 with an organic EL element formed between the TFTs 1 or in a later process.
Further, in order to flatten the unevenness due to the formation of the wiring 2, a planarizing layer 4 is formed on the insulating film 3 in a state where the unevenness due to the wiring 2 is embedded.
On the planarizing film 4, a bottom emission type organic EL element is formed. That is, the first electrode 5 made of ITO is formed on the planarizing film 4 so as to be connected to the wiring 2 through the contact hole 7. The first electrode 5 corresponds to the anode of the organic EL element.
An insulating film 8 having a shape covering the periphery of the first electrode 5 is formed. By providing the insulating film 8, a short circuit between the first electrode 5 and the second electrode formed in the subsequent process is prevented. can do.
Further, although not shown in FIG. 1, a hole transport layer, an organic light-emitting layer, and an electron transport layer are sequentially deposited through a desired pattern mask, and then a first layer made of Al is formed on the entire surface above the substrate. An active matrix organic material in which two electrodes are formed and sealed by bonding using a sealing glass plate and an ultraviolet curable epoxy resin, and each organic EL element is connected to a TFT 1 for driving the organic EL element. An EL display device is obtained.

  FIG. 2 is a conceptual cross-sectional view showing an example of the active matrix type liquid crystal display device 10. The color liquid crystal display device 10 is a liquid crystal panel having a backlight unit 12 on the back surface, and the liquid crystal panel includes all pixels disposed between two glass substrates 14 and 15 having a polarizing film attached thereto. The elements of the TFT 16 corresponding to are arranged. Each element formed on the glass substrate is wired with an ITO transparent electrode 19 that forms a pixel electrode through a contact hole 18 formed in the cured film 17. On the ITO transparent electrode 19, an RGB color filter 22 in which a liquid crystal 20 layer and a black matrix are arranged is provided.

(Oxime sulfonate compound)
The oxime sulfonate compound of the present invention is an oxime sulfonate compound represented by formula (1) or formula (2), and can be suitably used as a photoacid generator that generates an acid in response to actinic rays.

（式（１）又は式（２）中、Ｒ¹はアルキル基、アリール基又はヘテロアリール基を表し、Ｒ²はそれぞれ独立に、水素原子、アルキル基、アリール基又はハロゲン原子を表し、Ａｒ¹はｏ−アリーレン基又はｏ−ヘテロアリーレン基を表し、ＸはＯ、Ｓ又はＮＲ’基を表し、ＹはＯ、Ｓ、ＮＲ’基、ＮＯＲ’基、Ｎ−ＯＣ（Ｒ’）₂基、Ｎ−Ｎ（Ｒ’）₂基、Ｃ（Ｒ’）₂基、Ｎ−ＯＣＯ−Ｎ（Ｒ’）₂基、Ｎ−ＯＳＯ₂−ＯＲ’基、Ｎ−ＯＳＯ₂−ＳＲ’基又はＮ−ＯＳＯ₂−Ｎ（Ｒ’）₂基を表し、Ｒ’はアルキル基、アリール基又はヘテロアリール基を表し、ｎは０又は１を表す。）

(In Formula (1) or Formula (2), R ¹ represents an alkyl group, an aryl group, or a heteroaryl group, R ² each independently represents a hydrogen atom, an alkyl group, an aryl group, or a halogen atom; Ar ¹ Represents an o-arylene group or an o-heteroarylene group, X represents an O, S or NR ′ group, Y represents an O, S, NR ′ group, a NOR ′ group, an N—OC (R ′) ₂ group, N—N (R ′) ₂ group, C (R ′) ₂ group, N—OCO—N (R ′) ₂ group, N—OSO ₂ —OR ′ group, N—OSO ₂ —SR ′ group or N— OSO ₂ —N (R ′) ₂ represents a group, R ′ represents an alkyl group, an aryl group or a heteroaryl group, and n represents 0 or 1.

R ¹ , R ² , Ar ¹ , X, Y, R ′ and n in the above formula (1) or formula (2) are the formulas (1) or ( It is synonymous with R ¹ , R ² , Ar ¹ , X, Y, R ′ and n in 2), and preferred embodiments are also the same.

  The oxime sulfonate compound represented by the formula (1) or the formula (2) is preferably an oxime sulfonate compound represented by any one of the following formulas (30) to (37).

（式（３０）〜式（３７）中、Ｒ¹はアルキル基、アリール基又はヘテロアリール基を表し、Ｒ²はそれぞれ独立に、水素原子、アルキル基、アリール基又はハロゲン原子を表し、Ｒ⁶はそれぞれ独立に、ハロゲン原子、アルキル基、アルキルオキシ基、スルホン酸基、アミノスルホニル基又はアルコキシスルホニル基を表し、ＸはＯ、Ｓ又はＮＲ’基を表し、ＹはＯ、Ｓ、ＮＲ’基、ＮＯＲ’基、Ｎ−ＯＣ（Ｒ’）₂基、Ｎ−Ｎ（Ｒ’）₂基、Ｃ（Ｒ’）₂基、Ｎ−ＯＣＯ−Ｎ（Ｒ’）₂基、Ｎ−ＯＳＯ₂−ＯＲ’基、Ｎ−ＯＳＯ₂−ＳＲ’基又はＮ−ＯＳＯ₂−Ｎ（Ｒ’）₂基を表し、ＷはＯ又はＮＲ’基を表し、ＺはＳ又はＮＲ’基を表し、Ｒ’はアリール基又はヘテロアリール基を表し、ｎは０又は１を表し、ｍは０〜６の整数を表し、Ｌは０〜４の整数を表す。）

(In the formula (30) to Formula (37), R ¹ represents an alkyl group, an aryl group or heteroaryl group, R ² each independently represents a hydrogen atom, an alkyl group, an aryl group or a halogen atom, R ⁶ Each independently represents a halogen atom, an alkyl group, an alkyloxy group, a sulfonic acid group, an aminosulfonyl group or an alkoxysulfonyl group, X represents an O, S or NR ′ group, and Y represents an O, S or NR ′ group. , NOR ′ group, N—OC (R ′) ₂ group, N—N (R ′) ₂ group, C (R ′) ₂ group, N—OCO—N (R ′) ₂ group, N—OSO ₂ — OR 'group, N-OSO ₂ -SR' group or N-OSO ₂ -N (R ') ₂ group, W represents O or NR' group, Z represents S or NR 'group, R' Represents an aryl group or a heteroaryl group, n represents 0 or 1, m represents an integer of 0 to 6, and L represents an integer of 0 to 4. It is.)

In the formula (30) to formula (37), the alkyl group, aryl group or heteroaryl group in R ¹ may have a substituent.
In formula (30) to formula (37), the alkyl group for R ¹ is preferably an alkyl group having 1 to 30 carbon atoms which may have a substituent.
Examples of the substituent that the alkyl group in R ¹ may have include a halogen atom, an alkyloxy group, an aryloxy group, an alkylthio group, an arylthio group, an alkyloxycarbonyl group, an aryloxycarbonyl group, and an aminocarbonyl group. .

Examples of the alkyl group in R ¹ include methyl group, ethyl group, n-propyl group, i-propyl group, n-butyl group, s-butyl group, t-butyl group, n-pentyl group, n-hexyl group, n -Octyl group, n-decyl group, n-dodecyl group, trifluoromethyl group, perfluoropropyl group, perfluorohexyl group, benzyl group, phenoxyethyl group, methylthioethyl group, phenylthioethyl group, ethoxycarbonylethyl group, Examples include phenoxycarbonylethyl group and dimethylaminocarbonylethyl group.
Among these, methyl group, ethyl group, n-propyl group, i-propyl group, n-butyl group, s-butyl group, t-butyl group, n-pentyl group, n-hexyl group, n-octyl group, An n-decyl group, an n-dodecyl group, a trifluoromethyl group, a perfluoropropyl group, a perfluorohexyl group, and a benzyl group are preferable.

Further, in the above formula (30) to (37), the aryl group in R ^1, preferably an aryl group having from 6 to 30 atoms in total may be carbon have a substituent.
Examples of the substituent that the aryl group in R ¹ may have include a halogen atom, an alkyl group, an alkyloxy group, an aryloxy group, an alkylthio group, an arylthio group, an alkyloxycarbonyl group, an aryloxycarbonyl group, and an aminocarbonyl group. , A sulfonic acid group, an aminosulfonyl group, and an alkoxysulfonyl group.

As the aryl group in R ¹ , a phenyl group, a p-methylphenyl group, a p-chlorophenyl group, a pentachlorophenyl group, a pentafluorophenyl group, an o-methoxyphenyl group, a p-phenoxyphenyl group, a p-methylthiophenyl group, p -Phenylthiophenyl group, p-ethoxycarbonylphenyl group, p-phenoxycarbonylphenyl group, p-dimethylaminocarbonylphenyl group, o-methylphenyl group, o-nitrophenyl group, p-nitrophenyl group, 2,4, Examples include 6-trimethylphenyl group, 2,4,6-triisopropylphenyl group, and 2,4-di (trifluoromethyl) phenyl group.
Among these, a phenyl group, p-methylphenyl group, p-chlorophenyl group, pentachlorophenyl group, pentafluorophenyl group, o-methoxyphenyl group, and p-phenoxyphenyl group are preferable.

Further, the formula (30) in to (37), as the heteroaryl group in R ^1, heteroaryl group having a total carbon number of 4-30 which may have a substituent is preferable.
Examples of the substituent that the heteroaryl group in R ¹ may have include a halogen atom, an alkyl group, an alkyloxy group, an aryloxy group, an alkylthio group, an arylthio group, an alkyloxycarbonyl group, an aryloxycarbonyl group, and an aminocarbonyl. Group, sulfonic acid group, aminosulfonyl group and alkoxysulfonyl group.

In the formula (30) to formula (37), at least one of the heteroaryl groups in R ¹ may be a heteroaromatic ring. For example, a heteroaromatic ring and a benzene ring may be condensed. .
The heteroaryl group in R ¹ may have a substituent, the group consisting of a thiophene ring, a pyrrole ring, a thiazole ring, an imidazole ring, a furan ring, a benzothiophene ring, a benzothiazole ring, and a benzimidazole ring And a group in which one hydrogen atom is removed from the ring selected from the above.

Among these, R ¹ in the formula (30) to (37), it is preferably an alkyl group or an aryl group having 6 to 20 carbon atoms having 1 to 20 carbon atoms is an alkyl group or an aryl group It is more preferable that it is a C1-C16 alkyl group or p-toluyl group, and it is especially preferable that it is a C3-C8 alkyl group or p-toluyl group.

In Formula (30) to Formula (33), Formula (36) or Formula (37), each R ² is preferably independently a hydrogen atom, an alkyl group or an aryl group, and preferably a hydrogen atom or an alkyl group. More preferably, it is more preferably a hydrogen atom or an alkyl group having 1 to 8 carbon atoms, and particularly preferably a hydrogen atom or a methyl group.
In the formula (30) to formula (33), formula (36) or formula (37), the alkyl group or aryl group in R ² may have a substituent.
Examples of the substituent that the alkyl group or aryl group in R ² may have include the same groups as the substituent that the alkyl group or aryl group in R ¹ may have.

The alkyl group for R ² is preferably an alkyl group having 1 to 12 carbon atoms which may have a substituent, and an alkyl group having 1 to 6 carbon atoms which may have a substituent. It is more preferable.
Specific examples of the alkyl group for R ² include methyl group, ethyl group, n-propyl group, i-propyl group, n-butyl group, i-butyl group, s-butyl group, t-butyl group, allyl group, n-pentyl group, n-hexyl group, n-octyl group, n-decyl group, n-dodecyl group, perfluorohexyl group, chloromethyl group, bromomethyl group, methoxymethyl group, benzyl group, phenoxyethyl group, methylthioethyl Group, phenylthioethyl group, ethoxycarbonylethyl group, phenoxycarbonylethyl group, dimethylaminocarbonylethyl group.
Among these, methyl group, ethyl group, n-propyl group, i-propyl group, n-butyl group, i-butyl group, s-butyl group, n-hexyl group, allyl group, chloromethyl group, bromomethyl group, Methoxymethyl group and benzyl group are preferable, methyl group, ethyl group, n-propyl group, i-propyl group, n-butyl group, i-butyl group, s-butyl group and n-hexyl group are more preferable, and methyl group , An ethyl group, an n-propyl group, an n-butyl group, and an n-hexyl group are more preferable, and a methyl group is particularly preferable.

The aryl group for R ² is preferably an aryl group having 6 to 30 carbon atoms which may have a substituent.
Specific examples of the aryl group for R ² include phenyl group, p-methylphenyl group, o-chlorophenyl group, p-chlorophenyl group, o-methoxyphenyl group, p-phenoxyphenyl group, p-methylthiophenyl group, p- Examples include a phenylthiophenyl group, a p-ethoxycarbonylphenyl group, a p-phenoxycarbonylphenyl group, and a p-dimethylaminocarbonylphenyl group.
Among these, a phenyl group, p-methylphenyl group, o-chlorophenyl group, p-chlorophenyl group, o-methoxyphenyl group, and p-phenoxyphenyl group are preferable.
Examples of the halogen atom for R ² include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom.
Among these, a chlorine atom or a bromine atom is preferable.

In the above formula (30) to formula (34) or formula (37), X represents an O, S or NR ′ group.
In the formulas (30) to (33), n represents 0 or 1, and when X is O or NR ′, n is preferably 0, and when X is S, n is 1 is preferable.

In the formulas (30) to (37), Y represents O, S, NR ′ group, NOR ′ group, N—OC (R ′) ₂ group, NN (R ′) ₂ group, C (R ′ ) Represents ₂ groups, N—OCO—N (R ′) ₂ group, N—OSO ₂ —OR ′ group, N—OSO ₂ —SR ′ group or N—OSO ₂ —N (R ′) ₂ group, , NR ′ group, NOR ′ group, N—OC (R ′) ₂ group, NN (R ′) ₂ group, N—OCO—N (R ′) ₂ group, N—OSO ₂ —OR ′ group, N-OSO ₂ —SR ′ group or N—OSO ₂ —N (R ′) ₂ group is preferable, O or NOR ′ group is more preferable, and O is particularly preferable.

In the formula (35), W represents O or an NR ′ group, preferably NR ′, and more preferably an NPh group (Ph represents a phenyl group).
In the formula (36), Z represents an S or NR ′ group, and is preferably S.

  In the formulas (30) to (37), R ′ represents an aryl group or a heteroaryl group, preferably an aryl group having 6 to 20 carbon atoms or a heteroaryl group having 1 to 20 carbon atoms, A 6 to 20 aryl group is more preferable, and a phenyl group is particularly preferable.

In formula (30) to formula (37), examples of the halogen atom for R ⁶ include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom, and a chlorine atom or a bromine atom is preferable.
In formula (30) to formula (37), the alkyl group and alkyloxy group in R ⁶ may have a substituent.
In formula (30) to formula (37), the alkyl group for R ⁶ is preferably an alkyl group having 1 to 30 carbon atoms which may have a substituent.
Examples of the substituent that the alkyl group in R ⁶ may have include a halogen atom, an alkyloxy group, an aryloxy group, an alkylthio group, an arylthio group, an alkyloxycarbonyl group, an aryloxycarbonyl group, and an aminocarbonyl group. .

Examples of the alkyl group in R ⁶ include methyl group, ethyl group, n-propyl group, i-propyl group, n-butyl group, s-butyl group, t-butyl group, n-pentyl group, n-hexyl group, n -Octyl group, n-decyl group, n-dodecyl group, trifluoromethyl group, perfluoropropyl group, perfluorohexyl group, benzyl group, phenoxyethyl group, methylthioethyl group, phenylthioethyl group, ethoxycarbonylethyl group, Examples include phenoxycarbonylethyl group and dimethylaminocarbonylethyl group.
Among these, methyl group, ethyl group, n-propyl group, i-propyl group, n-butyl group, s-butyl group, t-butyl group, n-pentyl group, n-hexyl group, n-octyl group, An n-decyl group, an n-dodecyl group, a trifluoromethyl group, a perfluoropropyl group, a perfluorohexyl group, and a benzyl group are preferable.

In formula (30) to formula (37), the alkyloxy group for R ⁶ is preferably an alkyloxy group having 1 to 30 carbon atoms which may have a substituent.
Examples of the substituent that the alkyloxy group in R ⁶ may have include a halogen atom, an alkyloxy group, an aryloxy group, an alkylthio group, an arylthio group, an alkyloxycarbonyl group, an aryloxycarbonyl group, and an aminocarbonyl group. It is done.

Examples of the alkyloxy group in R ⁶ include methyloxy group, ethyloxy group, butyloxy group, hexyloxy group, phenoxyethyloxy group, trichloromethyloxy group, ethoxyethyloxy group, methylthioethyloxy group, phenylthioethyloxy group, ethoxy Examples thereof include a carbonylethyloxy group, a phenoxycarbonylethyloxy group, and a dimethylaminocarbonylethyloxy group.
Among these, a methyloxy group, an ethyloxy group, a butyloxy group, a hexyloxy group, a phenoxyethyloxy group, a trichloromethyloxy group, or an ethoxyethyloxy group is preferable.
In formula (30) to formula (37), examples of the aminosulfonyl group for R ⁶ include a methylaminosulfonyl group, a dimethylaminosulfonyl group, a phenylaminosulfonyl group, a methylphenylaminosulfonyl group, and an aminosulfonyl group.
In the formulas (30) to (37), examples of the alkoxysulfonyl group for R ⁶ include a methoxysulfonyl group, an ethoxysulfonyl group, a propyloxysulfonyl group, and a butyloxysulfonyl group.

In the formula (30) to the formula (33), m represents an integer of 0 to 6, preferably an integer of 0 to 2, more preferably 0 or 1, and particularly preferably 0. .
Moreover, in said Formula (34)-Formula (37), L represents the integer of 0-4, it is preferable that it is an integer of 0-2, it is more preferable that it is 0 or 1, and it is 0. Particularly preferred.
Further, from the viewpoint of development latitude, it is particularly preferable that m or L is 1 and R ⁶ is an alkoxy group.

  Moreover, it is more preferable that the oxime sulfonate compound represented by the formula (30) to the formula (37) is an oxime sulfonate compound represented by any of the following formulas (38) to (49).

（式（３８）〜式（４９）中、Ｒ¹はアルキル基、アリール基又はヘテロアリール基を表し、Ｒ⁶はそれぞれ独立に、ハロゲン原子、アルキル基、アルキルオキシ基、スルホン酸基、アミノスルホニル基又はアルコキシスルホニル基を表し、Ｒ⁷は水素原子、アルキル基、アリール基又はハロゲン原子を表し、ＸはＯ又はＳを表し、ＹはＯ、Ｓ、ＮＲ’基、ＮＯＲ’基、Ｎ−ＯＣ（Ｒ’）₂基、Ｎ−Ｎ（Ｒ’）₂基、Ｃ（Ｒ’）₂基、Ｎ−ＯＣＯ−Ｎ（Ｒ’）₂基、Ｎ−ＯＳＯ₂−ＯＲ’基、Ｎ−ＯＳＯ₂−ＳＲ’基又はＮ−ＯＳＯ₂−Ｎ（Ｒ’）₂基を表し、ＷはＯ又はＮＲ’基を表し、ＺはＳ又はＮＲ’基を表し、Ｒ’はアリール基又はヘテロアリール基を表し、ｍは０〜６の整数を表し、Ｌは０〜４の整数を表す。）

(In formula (38) to formula (49), R ¹ represents an alkyl group, an aryl group or a heteroaryl group, and R ⁶ each independently represents a halogen atom, an alkyl group, an alkyloxy group, a sulfonic acid group, or an aminosulfonyl group. R ⁷ represents a hydrogen atom, an alkyl group, an aryl group or a halogen atom, X represents O or S, Y represents O, S, NR ′ group, NOR ′ group, N—OC (R ') ₂ group, NN (R') ₂ group, C (R ') ₂ group, N-OCO-N (R') ₂ group, N-OSO ₂ -OR 'group, N-OSO ₂ -SR "group or _{N-OSO 2 -N (R '} ) represents ₂ group, W is' represents a group, Z is S or NR 'O, or NR a group, R' is an aryl or heteroaryl group And m represents an integer of 0 to 6, and L represents an integer of 0 to 4.)

R ^1, R ⁶ in the formula (38) to Formula (49), Y, W, Z, R ', m and L are, R ¹ in the formula (30) to Formula ^{(37), R 6, Y} , W , Z, R ′, m and L, and the preferred embodiments are also the same.
R ⁷ in Formula (42) to Formula (45), Formula (48), or Formula (49) represents a hydrogen atom, an alkyl group, an aryl group, or a halogen atom, and is a hydrogen atom, an alkyl group, or an aryl group. Preferably, it is a hydrogen atom or an alkyl group, more preferably a hydrogen atom or a methyl group.
X in Formula (38) to Formula (45) or Formula (49) represents O or S, and is particularly preferably O.

  The oxime sulfonate compound represented by the formula (30) to the formula (37) is more preferably an oxime sulfonate compound represented by any of the following formulas (50) to (55).

（式（５０）〜式（５５）中、Ｒ¹はアルキル基、アリール基又はヘテロアリール基を表し、Ｒ⁷は水素原子又はメチル基を表し、Ｒ⁸は水素原子、ハロゲン原子又はアルコキシ基を表し、ＸはＯ又はＳを表し、ＷはＯ又はＮＲ’基を表し、ＺはＳ又はＮＲ’基を表し、Ｒ’はアリール基を表す。）

(In Formula (50) to Formula (55), R ¹ represents an alkyl group, an aryl group or a heteroaryl group, R ⁷ represents a hydrogen atom or a methyl group, and R ⁸ represents a hydrogen atom, a halogen atom or an alkoxy group. X represents O or S, W represents an O or NR ′ group, Z represents an S or NR ′ group, and R ′ represents an aryl group.)

R ^1, W and Z in Formula (50) to (55), the equation (30) have the same meanings as R ^1, W and Z in to (37), preferable embodiments thereof are also the same.
R ⁷ in the formula (52) or the formula (53) represents a hydrogen atom or a methyl group, and is preferably a methyl group.
R ⁸ in the formula (50) to the formula (55) represents a hydrogen atom, a halogen atom or an alkoxy group, and is preferably a hydrogen atom, a chlorine atom, a bromine atom or an alkoxy group having 1 to 20 carbon atoms, An atom, a chlorine atom, a bromine atom, or an alkoxy group having 1 to 8 carbon atoms is more preferable, and a hydrogen atom or a methoxy group is further preferable.
X in the formulas (50) to (52) represents O or S, and is particularly preferably O.
In the formulas (53) to (55), R ′ represents an aryl group, preferably an aryl group having 6 to 20 carbon atoms, and particularly preferably a phenyl group.

  Furthermore, the oxime sulfonate compound represented by the formula (30) to the formula (37) is particularly preferably an oxime sulfonate compound represented by any of the following formulas (56) to (60).

（式（５６）〜式（６０）中、Ｒ¹はアルキル基、アリール基又はヘテロアリール基を表し、Ｒ⁷は水素原子又はメチル基を表し、Ｒ⁹は水素原子、臭素原子又はアルコキシ基を表し、Ｒ¹⁰は水素原子又はアルコキシ基を表し、Ｒ¹¹は水素原子又は塩素原子を表す。）

(In formula (56) to formula (60), R ¹ represents an alkyl group, an aryl group or a heteroaryl group, R ⁷ represents a hydrogen atom or a methyl group, and R ⁹ represents a hydrogen atom, a bromine atom or an alkoxy group. R ¹⁰ represents a hydrogen atom or an alkoxy group, and R ¹¹ represents a hydrogen atom or a chlorine atom.)

R ¹ in formula (56) to formula (60) has the same meaning as R ¹ in formula (30) to formula (37), and the preferred embodiments are also the same.
R ⁷ in the formula (59) represents a hydrogen atom or a methyl group, and is preferably a methyl group.
R ⁹ in the formula (56) represents a hydrogen atom, a bromine atom or an alkoxy group, preferably a hydrogen atom, a bromine atom or an alkoxy group having 1 to 20 carbon atoms, and preferably a hydrogen atom, a bromine atom or a carbon number of 1 It is more preferably an alkoxy group of ˜8, and further preferably a hydrogen atom or a bromine atom.
R ¹⁰ in Formula (57) or Formula (58) represents a hydrogen atom or an alkoxy group, and is preferably a hydrogen atom or an alkoxy group having 1 to 20 carbon atoms, and a hydrogen atom or an alkoxy group having 1 to 8 carbon atoms. It is more preferably a group, and further preferably a hydrogen atom or a methoxy group. R ¹⁰ is preferably an alkoxy group from the viewpoint of development latitude, more preferably an alkoxy group having 1 to 20 carbon atoms, and still more preferably an alkoxy group having 1 to 8 carbon atoms. Particularly preferred is a methoxy group.
R ¹¹ in the formula (59) represents a hydrogen atom or a chlorine atom, and is preferably a chlorine atom.

In the oxime sulfonate compound, the oxime steric structure (E, Z) may be either one or a mixture.
Specific examples of the oxime sulfonate compound represented by the formula (1) include the exemplified compounds A-1 to A-16, but the present invention is not limited thereto.

As the cyclic ketoxime sulfonate compound having a hetero atom in the alicyclic structure,
Journal of Pharmaceutical Science, 1976, vol.65, p.397-399
J. Org. Chem., 1969, vol.34, p.3484-3491
Chemische Berichte, 1908, vol.41, p.233
Chemistry of Heterocyclic Compounds (New York, NY, United States), 2005, vol.41, # 1, p.98-104
However, there are no examples of using these compounds as acid generators, and there is no knowledge about photochemical properties.

  As a result of detailed studies by the present inventors, it has been found that the oxime sulfonate compound of the present invention has absorption of visible light and has photo-decoloring property. That is, the present inventors have found that the oxime sulfonate compound of the present invention has a unique property that the absorbance to visible light greatly decreases after acid generation by exposure, although the mechanism is not clear. Thereby, when the oxime sulfonate compound of this invention is used as a photo-acid generator, it is estimated that it is excellent in the transparency of a cured film.

  Examples of the present embodiment will be described in detail below, but the present embodiment is not limited to these examples. In the following description, “parts” means “parts by weight” unless otherwise specified.

<Synthesis of oxime sulfonate compound>
[Synthesis of A-1]
Aluminum chloride (50.9 g) and chloroacetyl chloride (43.1 g) were added to a suspension of 2-naphthol (50 g) and chlorobenzene (200 mL), and the mixture was heated to 40 ° C. for 2 hours. . Under ice-cooling, the reaction solution was added dropwise to ice (135 g), and concentrated hydrochloric acid (65 mL) and ethyl acetate (275 mL) were added for liquid separation. The organic layer was washed with 4N hydrochloric acid (200 mL) and saturated brine (200 mL), potassium carbonate (95.7 g) was added to the organic layer, reacted at 40 ° C. for 1 hour, and water (150 mL) was added to separate the layers. did. The organic layer was washed with saturated brine (200 mL), activated carbon (2.5 g) was added and stirred for 30 minutes, and then the crystals obtained by filtration and concentration were reslurried with 2-propanol to give a ketone compound. (60 g) was obtained.
The obtained ketone compound (3.0 g) was suspended in tetrahydrofuran (THF, 12 mL), and 2M hydrochloric acid / tetrahydrofuran solution (16.3 mL) and then isopentyl nitrite (2.3 g) were added dropwise under ice cooling. The temperature was raised to room temperature (25 ° C., the same applies to the following) and reacted for 2 hours. The reaction solution was added to water (100 mL) for crystallization, filtered, washed with water, and dried to obtain a ketoxime compound (3.3 g).
The obtained ketoxime compound (2.0 g) was dissolved in acetone (14 mL), triethylamine (1.4 g) and p-toluenesulfonyl chloride (2.3 g) were added under ice cooling, and the temperature was raised to room temperature. And reacted for 1 hour. Water (40 mL) was added to the reaction solution to cause crystallization, and after filtration, reslurry with methanol, filtration, and drying, A-1 (2.2 g) was obtained.
The ¹ H-NMR spectrum (300 MHz, THF-d8) of A-1 is δ = 8.6 (d, 1H), 8.3 (d, 1H), 8.0 (d, 1H), 7 .9 (d, 2H), 7.7 (dd, 1H), 7.6 (dd, 1H) 7.5 (d, 1H), 7.4 (d, 2H), 2.4 (s, 3H) )Met.

[Synthesis of A-2]
A-2 was synthesized in the same manner as A-1, except that 1-propanesulfonyl chloride was used instead of p-toluenesulfonyl chloride in A-1.
In addition, the ¹ H-NMR spectrum (300 MHz, THF-d8) of A-2 is δ = 8.7 (d, 1H), 8.4 (d, 1H), 8.0 (d, 1H), 7 .7 (d, 1H), 7.6 (dd, 1H), 7.5 (d, 1H), 3.5 (t, 2H), 1.9 (qt, 2H), 1.1 (t, 3H).

[Synthesis of A-3]
A-3 was synthesized in the same manner as A-1, except that 1-butanesulfonyl chloride was used instead of p-toluenesulfonyl chloride in A-1.
In addition, the ¹ H-NMR spectrum (300 MHz, CDCl ₃ ) of A-3 is δ = 8.7 (d, 1H), 8.3 (d, 1H), 8.0 (d, 1H), 7. 8 (dd, 1H), 7.6 (dd, 1H), 7.5 (d, 1H), 3.5 (t, 2H), 1.9 (tt, 2H), 1.5 (qt, 2H) ), 1.0 (t, 3H).

[Synthesis of A-4]
A-4 was synthesized in the same manner as A-1, except that 1-octanesulfonyl chloride was used instead of p-toluenesulfonyl chloride in A-1.
The ¹ H-NMR spectrum (300 MHz, CDCl ₃ ) of A-4 is δ = 8.7 (d, 1H), 8.3 (d, 1H), 7.9 (d, 1H), 7. 8 (dd, 1H), 7.6 (dd, 1H), 7.4 (d, 1H), 3.5 (t, 2H), 1.9 (tt, 2H), 1.5 (qt, 2H) ), 1.4-1.2 (m, 8H), 0.9 (t, 3H).

[Synthesis of A-5]
A-5 was synthesized in the same manner as A-1, except that 1-hexadecanesulfonyl chloride was used instead of p-toluenesulfonyl chloride in A-1.
In addition, ¹ H-NMR spectrum (300 MHz, THF-d8) of A-5 is δ = 8.7 (d, 1H), 8.4 (d, 1H), 8.1 (d, 1H), 7 .8 (dd, 1H), 7.6 (dd, 1H), 7.5 (d, 1H), 3.5 (t, 2H), 1.9 (tt, 2H), 1.5 (qt, 2H), 1.4-1.2 (m, 24H), 0.9 (t, 3H).

[Synthesis of A-6]
A-6 was synthesized in the same manner as A-1, except that isopropylsulfonyl chloride was used instead of p-toluenesulfonyl chloride in A-1.
The ¹ H-NMR spectrum (300 MHz, CDCl ₃ ) of A-6 is δ = 8.7 (d, 1H), 8.3 (d, 1H), 7.9 (d, 1H), 7. 8 (dd, 1H), 7.6 (dd, 1H), 7.4 (d, 1H), 4.0-3.9 (m, 1H), 1.5 (d, 6H).

[Synthesis of A-7]
A-7 was synthesized in the same manner as A-4 except that 6-bromo-2-naphthol was used instead of 2-naphthol in A-4.
The ¹ H-NMR spectrum (300 MHz, THF-d8) of A-7 is δ = 8.6 (d, 1H), 8.4 (d, 1H), 8.3 (s, 1H), 7 .8 (d, 1H), 7.6 (d, 1H), 3.5 (t, 2H), 1.8 (tt, 2H), 1.5 (qt, 2H), 1.4-1. 2 (m, 8H), 0.8 (t, 3H).

[Synthesis of A-8]
A-8 was synthesized in the same manner as A-4 except that 7-methoxy-2-naphthol was used instead of 2-naphthol in A-4.
The ¹ H-NMR spectrum (300 MHz, CDCl ₃ ) of A-8 has δ = 8.2 (d, 1H), 8.0 (s, 1H), 7.8 (d, 1H), 7. 2 (d, 1H), 7.2 (d, 1H), 4.0 (s, 3H), 3.5 (t, 2H), 1.9 (tt, 2H), 1.5 (qt, 2H) ), 1.4-1.2 (m, 8H), 0.8 (t, 3H).

[Synthesis of A-9]
A-9 was synthesized in the same manner as A-8, except that p-toluenesulfonyl chloride was used instead of 1-octanesulfonyl chloride in A-8.
The ¹ H-NMR spectrum (300 MHz, THF-d8) of A-9 is δ = 8.3 (d, 1H), 8.0 (s, 1H), 8.0 (d, 2H), 7 .9 (d, 1H), 7.5 (d, 2H), 7.3 (d, 1H), 7.2 (d, 1H), 4.0 (s, 3H), 2.4 (s, 3H).

[Synthesis of A-10]
2,7-dihydroxynaphthalene (24.5 g) is suspended in acetone (150 mL), and potassium carbonate (25.4 g), 2-ethylhexyl bromide (35.4 g), and potassium iodide (7.6 g) are sequentially added. And reacted for 34 hours under reflux. To the reaction solution are added 0.5N hydrochloric acid and ethyl acetate, and the mixture is separated. The organic layer is dried over magnesium sulfate, filtered, and concentrated. The resulting mixture is subjected to silica gel column chromatography (hexane / ethyl acetate = 3: 1 → 2: 1) to give 7- (2-ethylhexyl) -2-naphthol (8.9 g).
The resulting 7- (2-ethylhexyl) -2-naphthol (8.9 g) was subjected to cyclic ketonization, ketoxime formation, and sulfonate formation in the same manner as A-9 to obtain A-10.
In addition, the ¹ H-NMR spectrum (300 MHz, CDCl ₃ ) of A-10 is δ = 8.1 (d, 1H), 8.0-7.9 (m, 3H), 7.7 (d, 2H). ), 7.6 (d, 1H), 7.6 (d, 1H), 4.0 (d, 2H), 2.4 (s, 3H), 1.8 (tt, 1H), 1.5 -1.4 (m, 4H), 1.3-1.2 (m, 4H), 0.9 (t, 3H), 0.8 (t, 3H).

[Synthesis of A-11]
1-naphthol (20.0 g) is dissolved in 1-methyl-2-pyrrolidone (60 mL), potassium carbonate (23.0 g) and ethyl bromoacetate (27.8 g) are added, and the mixture is reacted at 80 ° C. for 7 hours. It was. 1N Hydrochloric acid (100 mL) and ethyl acetate (120 mL) were added to the reaction solution and the phases were separated. The organic layer was dried over magnesium sulfate, filtered and concentrated to obtain a crude esterified product. The crude esterified product was suspended in a 1: 1 mixture of ethanol / water (60 mL), sodium hydroxide (11.1 g) was added, and the mixture was reacted at 60 ° C. for 4 hours. After allowing to cool, 1N hydrochloric acid (150 mL) was added to the reaction mixture, and the mixture was stirred for 30 minutes under ice cooling, filtered, washed with water, then washed with a methanol / water mixture and dried to obtain carboxylic acid (26.9 g). .
To a suspension of the obtained carboxylic acid (5.0 g) in chlorobenzene (20 mL), oxalyl chloride (3.8 g) and 1 drop of N, N-dimethylformamide were added under ice cooling, and the temperature was raised to room temperature. Reacted for hours. To the obtained reaction mixture, aluminum chloride (4.0 g) was added under ice-cooling, and the mixture was allowed to warm to room temperature and reacted for 1 hour, and then 4N hydrochloric acid (60 mL) and ethyl acetate (50 mL) were added under ice-cooling. Addition and liquid separation, the organic layer was dried over magnesium sulfate, filtered and concentrated. The resulting mixture was reslurried and filtered with a hexane / methanol mixture to obtain a ketone compound (3.7 g).
The obtained ketone compound was converted to ketoxime and oxime sulfonate in the same manner as A-1, to obtain A-11.
In addition, the ¹ H-NMR spectrum (300 MHz, THF-d8) of A-11 is δ = 8.3 (d, 1H), 8.0 (d, 2H), 7.9 (d, 1H), 7 7 (d, 1H), 7.7-7.5 (m, 3H), 7.4 (d, 2H), 2.4 (s, 3H).

[Synthesis of A-12]
A-12 was synthesized in the same manner as A-11 except that 1-octanesulfonyl chloride was used instead of p-toluenesulfonyl chloride in A-11.
In addition, the ¹ H-NMR spectrum (300 MHz, CDCl ₃ ) of A-12 is δ = 8.3 (d, 1H), 7.9 (d, 1H), 7.7 (d, 1H), 7. 7-7.5 (m, 3H), 3.5 (t, 2H), 1.9 (tt, 2H), 1.5 (qt, 2H), 1.4-1.2 (m, 8H) , 0.8 (t, 3H).

[Synthesis of A-13]
A-13 was synthesized in the same manner as A-12 except that 4-methoxy-1-naphthol was used instead of 1-naphthol in A-12.
In addition, the ¹ H-NMR spectrum (300 MHz, CDCl ₃ ) of A-13 is δ = 8.4 (d, 1H), 8.3 (d, 1H), 7.8 (dd, 1H), 7. 7 (d, 1H), 6.9 (s, 1H), 4.0 (s, 3H), 3.5 (t, 2H), 1.9 (tt, 2H), 1.5 (qt, 2H) ), 1.4-1.2 (m, 8H), 0.8 (t, 3H).

[Synthesis of A-14]
A-14 was synthesized in the same manner as A-13, except that p-toluenesulfonyl chloride was used instead of 1-octanesulfonyl chloride in A-13.
The ¹ H-NMR spectrum (300 MHz, CDCl ₃ ) of A-14 is δ = 8.3 (d, 1H), 8.2 (d, 1H), 8.0 (d, 2H), 7. 8 (dd, 1H), 7.7 (dd, 1H), 7.4 (d, 2H), 6.8 (s, 1H), 4.0 (s, 3H), 2.5 (s, 3H) )Met.

[Synthesis of A-15]
Crotonic acid (59.3 g) was added to a suspension of 4-chlorobenzenethiol (100 g) and chlorobenzene (100 mL), and triethylamine (28.9 mL) was added dropwise, followed by reaction at 80 ° C. for 6 hours. After cooling to 50 ° C., N, N-dimethylacetamide (0.1 mL) was added to the reaction solution, and thionyl chloride (50.2 mL) was added dropwise to react for 1 hour. The reaction solution was added dropwise to a prepared suspension of aluminum chloride (96.8 g) in chlorobenzene (200 mL) under ice-cooling and reacted at less than 8 ° C. for 4 hours. The reaction solution was poured into 1,000 g of ice, and the organic layer was separated, washed with 500 mL of water, and concentrated to obtain crude crystals. The crude crystals were recrystallized from methanol (150 mL), filtered, and washed with cold methanol to obtain a ketone compound (105 g).
The resulting ketone compound was converted to ketoxime and oxime sulfonate in the same manner as A-1, to obtain A-15.
In addition, the ¹ H-NMR spectrum (300 MHz, CDCl ₃ ) of A-15 is δ = 8.0 (s, 1H), 7.9 (d, 2H), 7.4 (d, 1H), 7. 3 (d, 2H), 7.2 (d, 1H), 4.8 (q, 1H), 2.4 (s, 3H), and 1.6 (d, 3H).

[Synthesis of A-16]
A-16 was synthesized in the same manner as A-1, except that 1-phenyloxyindole was used instead of the ketone compound of A-1 and methanesulfonyl chloride was used instead of p-toluenesulfonyl chloride.
In addition, the ¹ H-NMR spectrum (300 MHz, CDCl ₃ ) of A-16 is δ = 8.1 (d, 1H), 7.6-7.5 (m, 3H), 7.5 (dd, 1H). ), 7.4 (d, 2H), 7.2 (dd, 1H), 6.8 (d, 1H), 3.4 (s, 3H).

[Synthesis of AX-1]
AX-1 was synthesized by the same method as described in JP-A-2003-55341.

In the following synthesis examples, the following symbols represent the following compounds, respectively.
V-65: 2,2′-azobis (2,4-dimethylvaleronitrile)
AIBN: 2,2′-azobisbutyronitrile GMA: glycidyl methacrylate MAA: methacrylic acid HEMA: 2-hydroxyethyl methacrylate EDM: diethylene glycol ethyl methyl ether PGMEA: propylene glycol monomethyl ether acetate St: styrene DCPM: dicyclopentanyl Methacrylate

<Synthesis of Copolymer B-1>
Copolymer B-1 was synthesized by the method shown below.

[Synthesis of 1-ethoxyethyl methacrylate (MAEVE)]
To 144.2 parts (2 molar equivalents) of ethyl vinyl ether, 0.5 part of phenothiazine was added, and 86.1 parts (1 molar equivalent) of methacrylic acid was added dropwise while cooling the reaction system to 10 ° C. or lower. ) For 4 hours. After adding 5.0 parts of pyridinium p-toluenesulfonate, the mixture was stirred at room temperature for 2 hours and allowed to stand overnight at room temperature. To the reaction solution, 5 parts of sodium bicarbonate and 5 parts of sodium sulfate were added, and the mixture was stirred at room temperature for 1 hour. Insoluble matter was filtered and concentrated under reduced pressure at 40 ° C. or lower, and the yellow oily residue was distilled under reduced pressure to obtain a boiling point (bp .) 134.0 parts of 1-ethoxyethyl methacrylate (MAEVE) fraction of 43-45 ° C./7 mmHg was obtained as a colorless oil.

The obtained MAEVE (63.28 parts (0.4 mol)), OXE-30 (55.27 parts (0.3 mol)), MAA (8.61 parts (0.1 mol)), HEMA (26 .03 parts (0.2 mol)) and EDM (110.8 parts) were heated to 70 ° C. under a nitrogen stream. While stirring this mixed solution, a mixed solution of radical polymerization initiator V-65 (manufactured by Wako Pure Chemical Industries, Ltd., 7 parts) and EDM (100.0 parts) was added dropwise over 2.5 hours. After completion of the dropwise addition, the reaction was carried out at 70 ° C. for 4 hours to obtain an EDM solution of copolymer B-1 (solid content concentration: 40%).
The weight average molecular weight (Mw) measured by gel permeation chromatography (GPC) of the obtained copolymer B-1 was 7,000.
In addition, about a solvent, it can also change into a desired solvent by well-known methods, such as pressure reduction distillation, and you may use a desired solvent instead of said EDM.

<Synthesis of Copolymers B-2 to B-10>
Copolymers B-2 to B-10 were respectively synthesized in the same manner as the synthesis of copolymer B-1, except that each monomer used and the amount used thereof were changed to those shown in Table 1 below. .
The synthesis method of tetrahydrofuran-2-yl methacrylate (MATHF) is as follows.

[Synthesis of MATHF]
Methacrylic acid (86 g, 1 mol) was cooled to 15 ° C., and camphorsulfonic acid (4.6 g, 0.02 mol) was added. To the solution, 2-dihydrofuran (71 g, 1 mol, 1.0 equivalent) was added dropwise. After stirring for 1 hour, saturated sodium hydrogen carbonate (500 mL) was added, extracted with ethyl acetate (500 mL), dried over magnesium sulfate, filtered to insoluble matter and concentrated under reduced pressure at 40 ° C. or lower to give a yellow oily residue. Distillation under reduced pressure gave 125 g of tetrahydrofuran-2-yl methacrylate (MATHF) as a colorless oily substance (yield 80%) at a boiling point (bp.) Of 54 to 56 ° C./3.5 mmHg.

<Synthesis of Copolymer B′-1>
In EDM (459.0 parts) in which AIBN (9.0 parts) was dissolved, St (22.50 parts (0.22 mol)), MAA (44.50 parts (0.52 mol)), DCPM (56. 25 parts (0.26 mol)) and GMA (90 parts (0.63 mol)) were mixed with stirring under a nitrogen stream, and the mixture was heated to 80 ° C. and allowed to react for 5 hours. An EDM solution of '-1 (solid content concentration: 32%) was obtained.

<Synthesis of copolymer B'-2>
A copolymer B′-2 was synthesized in the same manner as the copolymer B′-1, except that OXE-30 was used instead of GMA in the copolymer B′-1.

Abbreviations in Table 1 are as follows.
MAEVE: 1-ethoxyethyl methacrylate MACHVE: 1-cyclohexyloxyethyl methacrylate MATHF: tetrahydrofuran-2-yl methacrylate t-BMA: tert-butyl methacrylate GMA: glycidyl methacrylate OXE-30: methacrylate (3-ethyloxetane- 3-yl) methyl (manufactured by Osaka Organic Chemical Industry Co., Ltd.)
MAA: methacrylic acid HEMA: 2-hydroxyethyl methacrylate St: styrene PHS: 4-hydroxystyrene PHSEVE: 4- (1-ethoxyethyloxy) styrene PHSTBOC: 4- (t-butoxycarbonyloxy) styrene CHMI: N-cyclohexyl Maleimide DCPM: Dicyclopentanyl methacrylate In addition, MACHVE and MATPE were synthesized by changing the vinyl ether of MAEVE synthesis to cyclohexyl vinyl ether and dihydrohydropyran, respectively.
PHSEVE was synthesized by changing methacrylic acid in the MAEVE synthesis method to 4-hydroxystyrene.
PHStBOC was obtained by reacting 4-hydroxystyrene and t-butoxycarboxylic anhydride under basic conditions, followed by extraction and purification by silica gel chromatography.

Example 1
Each component was dissolved and mixed so that it might become the following composition, and it filtered with the filter made from a polytetrafluoroethylene with a diameter of 0.2 micrometer, and obtained the photosensitive resin composition of Example 1. FIG.
Oxime sulfonate compound: A-1 2.0 parts Component B: Polyethylene glycol methyl ether acetate (hereinafter abbreviated as PGMEA) solution of copolymer B-1 100.0 parts in solid content Sensitizer: D-1 2.0 parts shown below: Adhesion improving agent: E-1 0.5 parts shown below: Surfactant: 0.02 parts F-1 shown below Crosslinking agent: G-1 shown below 5.0 parts basic compound: 0.01 parts I-1 shown below 0.01 parts basic compound: 0.1 parts I-2 shown below

(Examples 2 to 21 and Comparative Examples 1 and 2)
Except having changed each compound used in Example 1 into the compound of Table 2, it melt-mixed in the same addition amount as Example 1, and the photosensitivity of Examples 2-21 and Comparative Examples 1 and 2 Each resin composition was prepared.
In addition, B'-1 used in Example 15 and B'-2 used in Example 16 were added in 20 parts and 25 parts, respectively, in solid content.

Details of the abbreviations indicating the compounds used in Examples 1 to 21 and Comparative Examples 1 and 2 are as follows.
AX-2: CGI-1397 (structure shown below, manufactured by Ciba Specialty Chemicals)
C-1: Propylene glycol monomethyl ether acetate C-2: Diethylene glycol ethyl methyl ether D-1: DBA (9,10-dibutoxyanthracene, structure shown below, manufactured by Kawasaki Kasei Kogyo Co., Ltd.)
D-2: CPTX (1-chloro-4-propoxythioxanthen-9-one, structure shown below, manufactured by Tokyo Chemical Industry Co., Ltd.)
E-1: KBM-403 (3-glycidoxypropyltrimethoxysilane, structure shown below, manufactured by Shin-Etsu Chemical Co., Ltd.)
F-1: Perfluoroalkyl group-containing nonionic surfactant represented by the following structural formula (W-3) F-2: PolyFox PF-6320 (fluorine surfactant, manufactured by OMNOVA)
G-1: JER157S65 (crosslinking agent, manufactured by Japan Epoxy Resin Co., Ltd.)
I-1: Triphenylimidazole (manufactured by Tokyo Chemical Industry Co., Ltd.)
I-2: 1,8-diazabicyclo [5.4.0] undecene-7 (manufactured by Tokyo Chemical Industry Co., Ltd.)

  Each evaluation shown below was performed about the photosensitive resin composition of Examples 1-21 obtained by the above, and Comparative Examples 1 and 2. FIG. The evaluation results are shown in Table 2.

<Evaluation of sensitivity>
Each photosensitive resin composition is slit-coated on a glass substrate (Corning 1737, 0.7 mm thick (manufactured by Corning)), and then prebaked on a hot plate at 90 ° C. for 120 seconds to volatilize the solvent. A photosensitive resin composition layer having a thickness of 3.0 μm was formed.
Next, the obtained photosensitive resin composition layer was subjected to gh-line exposure with i-line cut through a predetermined mask using a PLA-501F exposure machine (extra-high pressure mercury lamp) manufactured by Canon Inc. And exposed. The exposed photosensitive composition layer was developed with an alkali developer (0.4 wt% tetramethylammonium hydroxide aqueous solution) at 23 ° C./60 seconds, and then rinsed with ultrapure water for 20 seconds.
By these operations, the optimum i-line exposure (Eopt) when resolving 10 μm line and space at 1: 1 was defined as sensitivity. The evaluation criteria are as follows. “1” and “2” are levels that have no practical problem.
1: 100mJ / cm ² less than ^2: 100mJ / cm 2 or more 150 mJ / cm ² less than 3: 150mJ / cm ² or more 200 mJ / cm ² less than 4: 200mJ / cm ² or more

<Evaluation of transparency>
After each photosensitive resin composition was slit-coated on a glass substrate (Corning 1737, 0.7 mm thick (manufactured by Corning)), the solvent was removed by heating on a hot plate at 90 ° C./120 seconds to obtain a film thickness of 3 A photosensitive resin composition layer having a thickness of 0.0 μm was formed.
The obtained photosensitive resin composition layer is subjected to a cumulative irradiation amount of 300 mJ / cm ² (illuminance: 20 mW / cm ² , i-line) using a PLA-501F exposure machine (extra-high pressure mercury lamp) manufactured by Canon Inc. Then, this substrate was heated in an oven at 230 ° C. for 1 hour to obtain a cured film.

The light transmittance of the glass substrate having this cured film was measured at a wavelength in the range of 400 to 800 nm using a spectrophotometer “150-20 type double beam (manufactured by Hitachi, Ltd.)”. The minimum light transmittance at that time is shown in Table 2 as the evaluation of transparency.
The evaluation criteria are as follows. “1” and “2” are levels that have no practical problem.
1: 95% or more 2: 90% or more and less than 95% 3: 88% or more and less than 90% 4: less than 88%

<Evaluation of development latitude>
As shown below, the development latitude was evaluated by evaluating the amount of change in the contact hole diameter when the development time was changed from a short time (40 seconds) to a long time (80 seconds).
Each photosensitive resin composition was applied onto a glass substrate (Corning 1737, 0.7 mm thick (manufactured by Corning)) using a spinner, and then the solvent was removed on a hot plate at 100 ° C. for 60 seconds to form a film. A photosensitive resin composition layer having a thickness of 3.0 μm was formed.
The exposure amount (illuminance: illuminance: 10 μm square contact hole pattern is obtained after developing the photosensitive resin composition layer obtained subsequently with a 0.4 wt% tetramethylammonium hydroxide aqueous solution as a developing solution at 23 ° C. for 60 seconds. 20 mW / cm ² , i line), and exposure was performed through a mask having a 10 μm square pattern opening.
Using the exposed substrate, paddle development was performed at 23 ° C. for 40 seconds and 80 seconds using a 0.4 wt% tetramethylammonium hydroxide aqueous solution as a developer.
When the difference between the contact hole diameter at this time and 10 μm is less than 0.5 μm, it can be said that the development latitude during development of the photosensitive resin composition is good.
1: Less than 0.3 μm 2: Less than 0.3 μm and less than 0.5 μm 3: More than 0.5 μm

  As shown in Table 2, the photosensitive resin compositions of Examples 1 to 21 which are the photosensitive resin compositions of the present invention have sensitivity, transparency, and development latitude in comparison with each comparative example. All gave excellent results with satisfaction.

<Production of organic EL display device>
An organic EL display device using a thin film transistor (TFT) was produced by the following method (see FIG. 1).
A bottom gate type TFT 1 was formed on a glass substrate 6, and an insulating film 3 made of Si ₃ N ₄ was formed so as to cover the TFT 1. Next, a contact hole (not shown) is formed in the insulating film 3, and then a wiring 2 (height 1.0 μm) connected to the TFT 1 through the contact hole is formed on the insulating film 3. . The wiring 2 is used to connect the TFT 1 to the organic EL element formed between the TFTs 1 or in a later process.
Further, in order to flatten the unevenness due to the formation of the wiring 2, the flattening layer 4 was formed on the insulating film 3 in a state where the unevenness due to the wiring 2 was embedded. The planarizing film 4 is formed on the insulating film 3 by spin-coating the photosensitive resin composition of Example 3 on the substrate, pre-baking (90 ° C. × 2 minutes) on a hot plate, and then applying high pressure from above the mask. Using a mercury lamp, i line (365 nm) is 30 mJ / cm ²
After irradiation (illuminance 20 mW / cm ² ), development is performed with an alkaline aqueous solution to form a pattern,
Heat treatment was performed at 230 ° C. for 60 minutes. The applicability when applying the photosensitive resin composition was good, and no wrinkles or cracks were observed in the cured film obtained after exposure, development and baking. Furthermore, the average step of the wiring 2 was 500 nm, and the thickness of the prepared planarizing film 4 was 2,000 nm.

  Next, a bottom emission type organic EL element was formed on the obtained planarization film 4. First, a first electrode 5 made of ITO was formed on the planarizing film 4 so as to be connected to the wiring 2 through the contact hole 7. Thereafter, a resist was applied, prebaked, exposed through a mask having a desired pattern, and developed. Using this resist pattern as a mask, pattern processing was performed by wet etching using an ITO etchant. Thereafter, the resist pattern was stripped using a resist stripping solution (mixed solution of monoethanolamine and dimethyl sulfoxide (DMSO)). The first electrode 5 thus obtained corresponds to the anode of the organic EL element.

Next, an insulating film 8 having a shape covering the periphery of the first electrode 5 was formed. The insulating film 8 was formed by the same method as described above using the photosensitive resin composition of Example 7. By providing this insulating film 8, it is possible to prevent a short circuit between the first electrode 5 and the second electrode formed in the subsequent process.
Furthermore, a hole transport layer, an organic light emitting layer, and an electron transport layer were sequentially deposited through a desired pattern mask in a vacuum deposition apparatus. Next, a second electrode made of Al was formed on the entire surface above the substrate. The obtained board | substrate was taken out from the vapor deposition machine, and it sealed by bonding together using the glass plate for sealing, and an ultraviolet curable epoxy resin.

  As described above, an active matrix type organic EL display device in which each organic EL element is connected to the TFT 1 for driving the organic EL element was obtained. When a voltage was applied through the drive circuit, it was found that the organic EL display device showed good display characteristics and high reliability.

1: TFT (Thin Film Transistor)
2: Wiring 3: Insulating film 4: Flattened film 5: First electrode 6: Glass substrate 7: Contact hole 8: Insulating film 10: Liquid crystal display device 12: Backlight unit 14, 15: Glass substrate 16: TFT
17: Cured film 18: Contact hole 19: ITO transparent electrode 20: Liquid crystal 22: Color filter

Claims (18)

(Component A) an oxime sulfonate compound represented by formula (1) or formula (2),
(Component B) a resin having a structural unit having an acid-decomposable group that decomposes with an acid to produce a carboxyl group or a phenolic hydroxyl group; and
(Component C) A photosensitive resin composition comprising a solvent.

(In Formula (1) or Formula (2), R ¹ represents an alkyl group, an aryl group, or a heteroaryl group, R ² each independently represents a hydrogen atom, an alkyl group, an aryl group, or a halogen atom; Ar ¹ Represents an o-arylene group or an o-heteroarylene group, X represents an O, S or NR ′ group, Y represents an O, S, NR ′ group, a NOR ′ group, an N—OC (R ′) ₂ group, N—N (R ′) ₂ group, C (R ′) ₂ group, N—OCO—N (R ′) ₂ group, N—OSO ₂ —OR ′ group, N—OSO ₂ —SR ′ group or N— OSO ₂ —N (R ′) ₂ represents a group, R ′ represents an alkyl group, an aryl group or a heteroaryl group, and n represents 0 or 1.   The component B further has a structural unit derived from at least one compound selected from the group consisting of a styrene derivative, a maleimide derivative, (meth) acrylic acid, and a hydroxyl group-containing (meth) acrylate compound. Photosensitive resin composition.   The photosensitive resin composition of Claim 1 or 2 in which the component B further has the structural unit which has a functional group which can react with a carboxyl group or a phenolic hydroxyl group and can form a covalent bond. The photosensitive resin according to any one of claims 1 to 3, wherein the acid-decomposable group is a group represented by the formula (Ia), the formula (Ib), the formula (IIa) or the formula (IIb). Composition.

(Wherein R ³ represents an alkyl group or a cycloalkyl group, R ⁴ represents an alkyl group, R ³ and R ⁴ may form a ring, R ⁵ represents a tertiary alkyl group, R ^{5 ′} represents a tertiary alkyl group or a tert-butoxycarbonyl group, Ar ² and Ar ³ each independently represent a divalent aromatic group, and a wavy line represents a bonding site with another structure.) The photosensitive resin composition of any one of Claims 1-4 whose component A is an oxime sulfonate compound represented by either of Formula (3)-Formula (8).

(In the formula (3) to Formula (8), R ¹ is an alkyl group, an aryl group or heteroaryl group, R ² each independently represents a hydrogen atom, an alkyl group, an aryl group or a halogen atom, R ⁶ Each independently represents a halogen atom, an alkyl group, an alkyloxy group, a sulfonic acid group, an aminosulfonyl group or an alkoxysulfonyl group, X represents an O, S or NR ′ group, and Y represents an O, S or NR ′ group. , NOR ′ group, N—OC (R ′) ₂ group, N—N (R ′) ₂ group, C (R ′) ₂ group, N—OCO—N (R ′) ₂ group, N—OSO ₂ — Represents an OR ′ group, an N—OSO ₂ —SR ′ group or an N—OSO ₂ —N (R ′) ₂ group, R ′ represents an alkyl group, an aryl group or a heteroaryl group, and n represents 0 or 1 M represents an integer of 0 to 6, and L represents an integer of 0 to 4.) The photosensitive resin composition of any one of Claims 1-5 whose component A is an oxime sulfonate compound represented by either of following formula (9)-Formula (18).

(In the formula (9) to Formula (18), R ¹ represents an alkyl group, an aryl group or heteroaryl group, R ² each independently represents a hydrogen atom, an alkyl group, an aryl group or a halogen atom, R ⁶ Each independently represents a halogen atom, an alkyl group, an alkyloxy group, a sulfonic acid group, an aminosulfonyl group or an alkoxysulfonyl group, R ⁷ represents a hydrogen atom, an alkyl group, an aryl group or a halogen atom, X represents O, Y represents O, S, NR ′ group, NOR ′ group, N—OC (R ′) ₂ group, NN (R ′) ₂ group, C (R ′) ₂ group, N-OCO-N (R ') ₂ group, N-OSO ₂ -OR' group, N-OSO ₂ -SR 'group or N-OSO ₂ -N (R') ₂ group is represented, R 'is an alkyl group Represents an aryl group or a heteroaryl group, n represents 0 or 1, and m represents an integer of 0 to 6. , L is an integer of 0-4.) The photosensitive resin composition of any one of Claims 1-6 whose component A is an oxime sulfonate compound represented by either of following formula (19)-Formula (24).

(In formula (19) to formula (24), R ¹ represents an alkyl group, an aryl group or a heteroaryl group, R ⁷ represents a hydrogen atom or a methyl group, and R ⁸ represents a hydrogen atom, a halogen atom or an alkoxy group. X represents O or S, and R ′ represents an alkyl group or an aryl group.) The photosensitive resin composition of any one of Claims 1-7 whose component A is an oxime sulfonate compound represented by either of following formula (25)-formula (29).

(In Formula (25) to Formula (29), R ¹ represents an alkyl group, an aryl group or a heteroaryl group, R ⁷ represents a hydrogen atom or a methyl group, and R ⁹ represents a hydrogen atom, a bromine atom or an alkoxy group. R ¹⁰ represents a hydrogen atom or an alkoxy group, and R ¹¹ represents a hydrogen atom or a chlorine atom.) An oxime sulfonate compound represented by any one of the following formulas (30) to (37):

(In the formula (30) to Formula (37), R ¹ represents an alkyl group, an aryl group or heteroaryl group, R ² each independently represents a hydrogen atom, an alkyl group, an aryl group or a halogen atom, R ⁶ Each independently represents a halogen atom, an alkyl group, an alkyloxy group, a sulfonic acid group, an aminosulfonyl group or an alkoxysulfonyl group, X represents an O, S or NR ′ group, and Y represents an O, S or NR ′ group. , NOR ′ group, N—OC (R ′) ₂ group, N—N (R ′) ₂ group, C (R ′) ₂ group, N—OCO—N (R ′) ₂ group, N—OSO ₂ — OR 'group, N-OSO ₂ -SR' group or N-OSO ₂ -N (R ') ₂ group, W represents O or NR' group, Z represents S or NR 'group, R' Represents an aryl group or a heteroaryl group, n represents 0 or 1, m represents an integer of 0 to 6, and L represents an integer of 0 to 4. It is.) The oxime sulfonate compound according to claim 9, which is represented by any one of the following formulas (38) to (49).

(In formula (38) to formula (49), R ¹ represents an alkyl group, an aryl group or a heteroaryl group, and R ⁶ each independently represents a halogen atom, an alkyl group, an alkyloxy group, a sulfonic acid group, or an aminosulfonyl group. R ⁷ represents a hydrogen atom, an alkyl group, an aryl group or a halogen atom, X represents O or S, Y represents O, S, NR ′ group, NOR ′ group, N—OC (R ') ₂ group, NN (R') ₂ group, C (R ') ₂ group, N-OCO-N (R') ₂ group, N-OSO ₂ -OR 'group, N-OSO ₂ -SR "group or _{N-OSO 2 -N (R '} ) represents ₂ group, W is' represents a group, Z is S or NR 'O, or NR a group, R' is an aryl or heteroaryl group And m represents an integer of 0 to 6, and L represents an integer of 0 to 4.) The oxime sulfonate compound according to claim 10, which is represented by any one of the following formulas (50) to (55).

(In Formula (50) to Formula (55), R ¹ represents an alkyl group, an aryl group or a heteroaryl group, R ⁷ represents a hydrogen atom or a methyl group, and R ⁸ represents a hydrogen atom, a halogen atom or an alkoxy group. X represents O or S, W represents an O or NR ′ group, Z represents an S or NR ′ group, and R ′ represents an aryl group.) The oxime sulfonate compound according to claim 11, which is represented by any one of the following formulas (56) to (60).

(In formula (56) to formula (60), R ¹ represents an alkyl group, an aryl group or a heteroaryl group, R ⁷ represents a hydrogen atom or a methyl group, and R ⁹ represents a hydrogen atom, a bromine atom or an alkoxy group. R ¹⁰ represents a hydrogen atom or an alkoxy group, and R ¹¹ represents a hydrogen atom or a chlorine atom.)   The photo-acid generator which is an oxime sulfonate compound of any one of Claims 9-12. (1) The application | coating process which apply | coats the photosensitive resin composition of any one of Claims 1-8 on a board | substrate,
(2) a solvent removal step of removing the solvent from the applied photosensitive resin composition;
(3) An exposure step of exposing the coated photosensitive resin composition with actinic rays,
(4) a developing step of developing the exposed photosensitive resin composition with an aqueous developer, and
(5) a post-baking step of thermosetting the developed photosensitive resin composition;
A method for forming a cured film comprising:   A cured film formed by applying at least one of light and heat to the photosensitive resin composition according to claim 1.   The cured film according to claim 15, which is an interlayer insulating film.   An organic EL display device comprising the cured film according to claim 15 or 16.   A liquid crystal display device comprising the cured film according to claim 15 or 16.

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